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JP5895896B2 - Purified gas supply device and purity compensation method for production gas - Google Patents
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JP5895896B2 - Purified gas supply device and purity compensation method for production gas - Google Patents

Purified gas supply device and purity compensation method for production gas Download PDF

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JP5895896B2
JP5895896B2 JP2013090305A JP2013090305A JP5895896B2 JP 5895896 B2 JP5895896 B2 JP 5895896B2 JP 2013090305 A JP2013090305 A JP 2013090305A JP 2013090305 A JP2013090305 A JP 2013090305A JP 5895896 B2 JP5895896 B2 JP 5895896B2
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purity
gas
separation device
air separation
air
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JP2014214901A (en
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秀規 山岸
秀規 山岸
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JFE Steel Corp
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04763—Start-up or control of the process; Details of the apparatus used
    • F25J3/04769—Operation, control and regulation of the process; Instrumentation within the process
    • F25J3/04812—Different modes, i.e. "runs" of operation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04151—Purification and (pre-)cooling of the feed air; recuperative heat-exchange with product streams
    • F25J3/04187—Cooling of the purified feed air by recuperative heat-exchange; Heat-exchange with product streams
    • F25J3/04193—Division of the main heat exchange line in consecutive sections having different functions
    • F25J3/04206—Division of the main heat exchange line in consecutive sections having different functions including a so-called "auxiliary vaporiser" for vaporising and producing a gaseous product
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04248—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion
    • F25J3/04254—Generation of cold for compensating heat leaks or liquid production, e.g. by Joule-Thompson expansion using the cold stored in external cryogenic fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04406—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a dual pressure main column system
    • F25J3/04412—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a dual pressure main column system in a classical double column flowsheet, i.e. with thermal coupling by a main reboiler-condenser in the bottom of low pressure respectively top of high pressure column
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04521—Coupling of the air fractionation unit to an air gas-consuming unit, so-called integrated processes
    • F25J3/04527—Integration with an oxygen consuming unit, e.g. glass facility, waste incineration or oxygen based processes in general
    • F25J3/04551—Integration with an oxygen consuming unit, e.g. glass facility, waste incineration or oxygen based processes in general for the metal production
    • F25J3/04557—Integration with an oxygen consuming unit, e.g. glass facility, waste incineration or oxygen based processes in general for the metal production for pig iron or steel making, e.g. blast furnace, Corex
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04642—Recovering noble gases from air
    • F25J3/04648—Recovering noble gases from air argon
    • F25J3/04654—Producing crude argon in a crude argon column
    • F25J3/04666—Producing crude argon in a crude argon column as a parallel working rectification column of the low pressure column in a dual pressure main column system
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04763—Start-up or control of the process; Details of the apparatus used
    • F25J3/04769—Operation, control and regulation of the process; Instrumentation within the process
    • F25J3/04812—Different modes, i.e. "runs" of operation
    • F25J3/04824—Stopping of the process, e.g. defrosting or deriming; Back-up procedures
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2205/00—Processes or apparatus using other separation and/or other processing means
    • F25J2205/90—Mixing of components
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2210/00—Processes characterised by the type or other details of the feed stream
    • F25J2210/40—Air or oxygen enriched air, i.e. generally less than 30mol% of O2
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2215/00—Processes characterised by the type or other details of the product stream
    • F25J2215/02—Mixing or blending of fluids to yield a certain product
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2245/00—Processes or apparatus involving steps for recycling of process streams
    • F25J2245/50—Processes or apparatus involving steps for recycling of process streams the recycled stream being oxygen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2250/00—Details related to the use of reboiler-condensers
    • F25J2250/30—External or auxiliary boiler-condenser in general, e.g. without a specified fluid or one fluid is not a primary air component or an intermediate fluid
    • F25J2250/40—One fluid being air
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2250/00—Details related to the use of reboiler-condensers
    • F25J2250/30—External or auxiliary boiler-condenser in general, e.g. without a specified fluid or one fluid is not a primary air component or an intermediate fluid
    • F25J2250/50—One fluid being oxygen

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Separation By Low-Temperature Treatments (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)

Description

本発明は、空気分離装置が製造した酸素、窒素、アルゴン等の精製ガスの純度を補償する技術に関する。   The present invention relates to a technique for compensating the purity of purified gas such as oxygen, nitrogen, and argon produced by an air separation device.

空気分離装置が製造した酸素などの精製ガス（工業ガス）は、供給配管を通じて転炉などのガス供給場所に送られたり、液化してローリー出荷する等のために精製ガスを液化して貯蔵タンクに貯蔵されたりする。
また、ガス供給先の使用量変化などによって空気分離装置での精製ガスの発生量（製造量）と使用量とに格差が生じた場合に備え、貯蔵タンクの液を気化して供給できるように気化装置も有している。なお、貯蔵タンク内の液は、液化の過程で濃縮されるため、一般的に液を気化したガスは空気分離装置から得られるガスより純度が高くなる。 Purified gas (industrial gas) such as oxygen produced by the air separation device is sent to a gas supply location such as a converter through a supply pipe, or liquefied purified gas for lorry shipment and storage tank Or stored.
In addition, in order to be able to vaporize and supply the liquid in the storage tank, in case there is a difference between the amount of purified gas generated (manufactured) in the air separation device and the amount used due to changes in the amount used at the gas supply destination, etc. It also has a vaporizer. In addition, since the liquid in a storage tank is concentrated in the process of liquefaction, generally the gas which vaporized the liquid becomes higher purity than the gas obtained from an air separation apparatus.

ここで、空気分離装置で処理する空気量（空気分離装置に取り込まれる空気量）が変化しない場合、空気分離装置で製造されるガスの純度は常に自動で適正な値に制御される。しかし、処理空気量の変更（操業変更）が行われた場合には、空気分離装置に対する自動制御のパラメータ変更が瞬時に対応できないため、空気分離装置で得られる精製ガスの純度が一時的に低下するという課題がある。   Here, when the amount of air processed by the air separation device (the amount of air taken into the air separation device) does not change, the purity of the gas produced by the air separation device is always automatically controlled to an appropriate value. However, when the amount of process air is changed (operation change), automatic control parameter change for the air separation device cannot be handled instantaneously, so the purity of the purified gas obtained by the air separation device is temporarily reduced. There is a problem of doing.

この課題に対して、空気分離装置が製造した精製ガスに対し、当該空気分離装置から得られるガスをさらに精製装置で濃縮した高純度のガスを混入する方法がある（特許文献１を参照）。なお、特許文献１では、低純度のガス系統に対し高純度のガスを混入することでガス純度を使用先の要求に応じた純度に制御することを目的としているが、要求の純度を維持する過程で操業変更による純度低下も補償することが予想される。   In order to solve this problem, there is a method in which a high-purity gas obtained by further concentrating the gas obtained from the air separation device with the purification device is mixed into the purified gas produced by the air separation device (see Patent Document 1). In addition, in patent document 1, although it aims at controlling gas purity to the purity according to the request | requirement of a user by mixing high purity gas with respect to a low purity gas system | strain, the required purity is maintained. In the process, it is expected to compensate for the decrease in purity due to operational changes.

特開２００５−２６４２５９号公報JP 2005-264259 A

上記従来技術では、純度計によって、空気分離装置で製造されたガスの純度の悪化を検出してから高純度の混入を開始して純度補償する構成となっている。このため、空気分離装置で製造される純度低下の速度が速い場合や、純度計から高純度ガスの混入位置までの距離を十分に確保できない場合には、補償開始から補償効果が発現するまでの間で管理値を下回った純度のガスが供給先に供給されるおそれがある。
本発明は、上記のような課題に着目してなされたもので、より確実に目的とする純度補償を可能とすることを目的としている。 In the above prior art, the purity meter detects the deterioration of the purity of the gas produced by the air separation device, and then starts the mixing of high purity to compensate for the purity. For this reason, when the rate of purity reduction produced by the air separation device is fast, or when the distance from the purity meter to the high purity gas mixing position cannot be secured sufficiently, the compensation effect is manifested from the start of compensation. There is a risk that gas having a purity lower than the control value will be supplied to the supply destination.
The present invention has been made by paying attention to the above-described problems, and aims to enable the intended purity compensation more reliably.

上記課題を解決するために、本発明の一態様である精製ガス供給装置は、空気を冷却分離して目的とするガスを精製する空気分離装置と、上記空気分離装置が製造したガスが通過する精製ガス供給路と、上記空気分離装置が製造するガス濃度よりも高純度の高純度ガスを供給可能な高純度ガス供給設備と、上記空気分離装置が製造したガスの純度を検出する純度計と、上記純度計が検出したガスの純度が設定純度未満と判定すると、上記高純度ガス供給設備からの高純度ガスを上記精製ガス供給路に混入することで、提供するガスの純度を補償する純度補償部と、を備え、上記純度補償部は、上記純度計の検出に基づく高純度ガスの混入に加えて、上記空気分離装置に供給される処理空気量の変更を検出すると、予め設定した設定流量の上記高純度ガスを更に上記精製ガス供給路に混入することを特徴とする。   In order to solve the above problems, a purified gas supply device according to one embodiment of the present invention includes an air separation device that cools and separates air and purifies a target gas, and a gas that is produced by the air separation device passes through the purified gas supply device. A purified gas supply path, a high-purity gas supply facility capable of supplying a high-purity gas having a purity higher than the gas concentration produced by the air separation device, and a purity meter for detecting the purity of the gas produced by the air separation device; When the purity of the gas detected by the purity meter is determined to be less than the set purity, the purity of the gas to be provided is compensated by mixing the purified gas from the high purity gas supply facility into the purified gas supply path. A compensation unit, wherein the purity compensation unit detects a change in the amount of the processing air supplied to the air separation device in addition to the mixing of the high purity gas based on the detection of the purity meter. Above of flow rate Further characterized in that mixed into the purified gas supply passage purity gas.

このとき、上記純度補償部は、上記純度計が検出したガスの純度が設定純度未満となったことを検出した後に、上記純度計が検出したガスの純度が設定純度以上となったことを検出すると上記設定流量分の高純度ガスの混入を終了するようにしても良い。
また本発明の一態様である製造ガスの純度補償方法は、空気分離装置に供給される処理空気量の変更を検出すると、空気分離装置が製造した精製ガスに対し、上記空気分離装置が製造するガス濃度よりも高純度の高純度ガスを予め設定した固定流量で混入することを特徴とする。 At this time, after detecting that the purity of the gas detected by the purity meter is less than the set purity, the purity compensation unit detects that the purity of the gas detected by the purity meter is equal to or higher than the set purity. Then, mixing of the high purity gas corresponding to the set flow rate may be terminated.
Moreover, the purity compensation method of the manufacturing gas which is one aspect | mode of this invention will manufacture the said air separation apparatus with respect to the refinement | purification gas which the air separation apparatus manufactured, if the change of the amount of process air supplied to an air separation apparatus is detected. A high purity gas having a purity higher than the gas concentration is mixed at a preset fixed flow rate.

本発明の一態様によれば、空気分離装置が処理する空気量が変更された時点で、一定量の高純度ガスによる補償が行えることで、従来よりも早期に純度補償が開示することで、より確実な純度補償が可能となる。   According to one aspect of the present invention, when the amount of air to be processed by the air separation device is changed, the compensation by a certain amount of high-purity gas can be performed. More reliable purity compensation is possible.

本発明に基づく実施形態に係る純度補償を説明する図である。It is a figure explaining the purity compensation which concerns on embodiment based on this invention. 本発明に基づく実施形態に係る空気分離装置の例を説明する図である。It is a figure explaining the example of the air separation apparatus which concerns on embodiment based on this invention. 純度補償部の処理例を説明する図である。It is a figure explaining the process example of a purity compensation part. 比較例の純度補償の状態を示す模式図である。It is a schematic diagram which shows the state of the purity compensation of a comparative example. 本実施形態での純度補償の状態を示す模式図である。It is a schematic diagram which shows the state of purity compensation in this embodiment.

次に、本発明の実施形態について図面を参照して説明する。
図１は、本実施形態に係る設備構成を説明する模式図である。図２は、空気分離装置の一例を示す模式図である。
本実施形態の精製ガス供給装置は、図１に示すように、空気分離装置１と純度補償装置２とを備える。 Next, embodiments of the present invention will be described with reference to the drawings.
Drawing 1 is a mimetic diagram explaining the equipment composition concerning this embodiment. FIG. 2 is a schematic diagram illustrating an example of an air separation device.
As shown in FIG. 1, the purified gas supply device of this embodiment includes an air separation device 1 and a purity compensator 2.

「空気分離装置１の構成例」
本実施形態の空気分離装置１は、模式図である図２に示すように、深冷分離方式によって原料空気から少なくとも酸素を分離する空気分離装置１である。空気分離装置１は、エアフィルタ１０、原料空気圧縮機１１、水洗冷却塔１２、ＭＳ吸着ユニット１３、熱交換器１４、及び精留塔１５を備える。 “Configuration example of air separation device 1”
As shown in FIG. 2, which is a schematic diagram, the air separation device 1 of the present embodiment is an air separation device 1 that separates at least oxygen from raw material air by a cryogenic separation method. The air separation device 1 includes an air filter 10, a raw material air compressor 11, a washing / cooling tower 12, an MS adsorption unit 13, a heat exchanger 14, and a rectifying tower 15.

原料空気圧縮機１１は、エアフィルタ１０を介して原料空気である大気を吸引して圧縮する。なお、エアフィルタ１０は、吸引した大気中の粉塵を除去する。圧縮した空気は例えば６０℃程度になっている。
水洗冷却塔１２は、原料空気圧縮機１１が圧縮した空気を入力し、その空気に対し冷却水を塔上部から散水して水洗及び冷却を実施する。この水洗冷却塔１２での冷却によって、空気は例えば１０℃程度まで冷却される。 The raw air compressor 11 sucks and compresses the atmospheric air, which is the raw air, through the air filter 10. The air filter 10 removes the sucked dust in the atmosphere. The compressed air is about 60 ° C., for example.
The washing / cooling tower 12 receives the air compressed by the raw material air compressor 11 and sprays cooling water from the top of the tower to perform washing and cooling. The air is cooled to, for example, about 10 ° C. by the cooling in the water cooling tower 12.

ＭＳ吸着ユニット１３は、空気から水分や二酸化炭素を除去する。なお、このＭＳ吸着ユニット１３は、通常２筒式であって、１筒で水分・二酸化炭素を吸着しているときに、もう１筒で吸着した水分・二酸化炭素を大気に放出する。
熱交換器１４は、供給される空気と低温の製品ガスとの間で熱交換させることで、当該空気を低温に冷却する。熱交換器１４は、空気を例えば−２００℃近くまで冷却する。 The MS adsorption unit 13 removes moisture and carbon dioxide from the air. The MS adsorbing unit 13 is usually of a two-cylinder type, and releases moisture / carbon dioxide adsorbed by the other cylinder to the atmosphere when one cylinder adsorbs moisture / carbon dioxide.
The heat exchanger 14 cools the air to a low temperature by causing heat exchange between the supplied air and the low-temperature product gas. The heat exchanger 14 cools air to, for example, close to −200 ° C.

精留塔１５は、各ガスの沸点の差を利用して、空気中の酸素、窒素、及びアルゴンガスを分離する。なお、上記熱交換器１４及び精留塔１５が空気液化分離器を構成する。上記空気液化分離器を構成する熱交換器１４及び精留塔１５は、コールドボックスＣＢ内に配置されている。
上記精留塔１５で分離された酸素、窒素、アルゴンガスは、それぞれ個別の供給路によって製品酸素、製品窒素、製品アルゴンとして取り出される。各供給路は、上記熱交換器１４を介してそれぞれの供給先に向けて延在している。すなわち、精留塔１５で分離された酸素、窒素、アルゴンガスは、熱交換された低温の製品ガスとなる。 The rectification column 15 separates oxygen, nitrogen, and argon gas in the air by using the difference in boiling point between the gases. The heat exchanger 14 and the rectifying column 15 constitute an air liquefaction separator. The heat exchanger 14 and the rectifying column 15 constituting the air liquefaction separator are arranged in the cold box CB.
Oxygen, nitrogen, and argon gas separated in the rectification column 15 are taken out as product oxygen, product nitrogen, and product argon through individual supply paths. Each supply path extends toward each supply destination via the heat exchanger 14. That is, the oxygen, nitrogen, and argon gas separated in the rectification column 15 becomes a low-temperature product gas subjected to heat exchange.

上記精留塔１５における精留塔下部１５ａには液酸が貯留している。精留塔下部１５ａに貯留する液酸は、適宜、過冷却器１６及び低温吸着器１７を介して精留塔上部１５ｂに供給される。符号１８は粗アルゴン塔、符号１９は主凝縮器、符号２０は副凝縮器である。副凝縮器２０を通じて液酸が適宜取り出される。
なお、上記精留塔１５で分離されて取り出された製品酸素は、図２では不図示の酸素供給路を通じて酸素使用設備に供給可能となっている。製鉄設備であれば、酸素使用設備として高炉、転炉、連続鋳造設備などが例示出来る。 Liquid acid is stored in the rectifying column lower portion 15a of the rectifying column 15. The liquid acid stored in the rectifying column lower part 15 a is appropriately supplied to the rectifying column upper part 15 b via the supercooler 16 and the low temperature adsorber 17. Reference numeral 18 denotes a crude argon column, reference numeral 19 denotes a main condenser, and reference numeral 20 denotes a sub-condenser. The liquid acid is appropriately taken out through the sub-condenser 20.
Note that the product oxygen separated and taken out by the rectification column 15 can be supplied to oxygen-using equipment through an oxygen supply path (not shown) in FIG. In the case of an iron manufacturing facility, examples of oxygen-using facilities include blast furnaces, converters, and continuous casting facilities.

また、上記空気分離装置１若しくは他の空気分離装置１で分離した液酸を貯蔵する液酸タンク３０を備える。上記液酸タンク３０は、液酸供給用配管３１を通じて精留塔下部１５ａに接続し、液酸タンク３０内の液酸を精留塔１５内部に注入可能となっている。上記液酸供給用配管３１には、液酸ポンプ３２及び開閉弁３３が設けられている。
また、上記精留塔下部１５ａの底部には、液酸取出用の酸液採取用配管３４が接続されている。その酸液採取用配管３４に介挿する開閉弁３５を開くことで、精留塔下部１５ａに貯留している液酸から液酸のサンプルを採取可能となっている。 Moreover, the liquid acid tank 30 which stores the liquid acid isolate | separated with the said air separator 1 or the other air separator 1 is provided. The liquid acid tank 30 is connected to the rectifying column lower portion 15a through a liquid acid supply pipe 31 so that the liquid acid in the liquid acid tank 30 can be injected into the rectifying column 15. The liquid acid supply pipe 31 is provided with a liquid acid pump 32 and an on-off valve 33.
An acid solution collecting pipe 34 for extracting the liquid acid is connected to the bottom of the rectifying column lower portion 15a. A liquid acid sample can be collected from the liquid acid stored in the rectifying column lower part 15a by opening the on-off valve 35 inserted in the acid liquid collection pipe 34.

図２中、符号４０は、ガス製造制御部である。ガス製造制御部４０は、供給先のガス要求量を取得し、取得したガス要求量に応じて処理空気量を変更する必要があると判定すると、原料空気圧縮機１１で圧縮する空気量を変更すると共に、空気分離装置１を構成する各部のパラメータ設定を変更する。
符号３６は流量計である。その流量計３６は、原料空気圧縮機１１で圧縮されて出力される空気量（処理空気量）を計測する。 In FIG. 2, the code | symbol 40 is a gas production control part. When the gas production control unit 40 acquires the gas request amount of the supply destination and determines that the processing air amount needs to be changed according to the acquired gas request amount, the gas production control unit 40 changes the air amount compressed by the raw material air compressor 11. In addition, the parameter setting of each part constituting the air separation device 1 is changed.
Reference numeral 36 denotes a flow meter. The flow meter 36 measures the amount of air (process air amount) that is compressed and output by the raw material air compressor 11.

「純度補償装置について」
次に、空気分離装置１で製造された精製ガスの供給及びガスの純度補償の処理について、図１を参照して説明する。
ここで、精製ガスとしては、上述の通り酸素、窒素、アルゴンが代表的なガスである。これらの製品ガス毎に次のような純度補償を行えばよい。例えば精製ガスはアルゴンガスである。 “Purity Compensator”
Next, supply of purified gas produced by the air separation device 1 and gas purity compensation processing will be described with reference to FIG.
Here, as the purification gas, oxygen, nitrogen, and argon are typical gases as described above. The following purity compensation may be performed for each product gas. For example, the purified gas is argon gas.

空気分離装置１で製造された精製ガスは、低純度ガス系統の管路４１を介して供給先に供給される。低純度ガス系統の管路４１は精製ガス供給路を構成する。
符号２は、純度補償装置である。純度補償装置２は、空気分離装置１から低純度ガス系統の管路４１を介して供給される精製ガスの純度を、管理純度以上に補償するための装置である。 The purified gas produced by the air separation device 1 is supplied to the supply destination via the pipe line 41 of the low purity gas system. The pipe line 41 of the low purity gas system constitutes a purified gas supply path.
Reference numeral 2 denotes a purity compensator. The purity compensating device 2 is a device for compensating the purity of the purified gas supplied from the air separation device 1 via the pipe line 41 of the low-purity gas system more than the management purity.

純度補償装置２は、図１に示すように、高純度ガス供給設備３、純度補償部８を備える。
本実施形態の高純度ガス供給設備３は、例えば、精製ガスを液化して貯蔵した液化貯蔵タンクである。高純度ガス供給設備３は、空気分離装置１で製造された精製ガスを精製して更に高純度なガスを得る精製装置であっても良い。 As shown in FIG. 1, the purity compensator 2 includes a high purity gas supply facility 3 and a purity compensator 8.
The high-purity gas supply facility 3 of the present embodiment is, for example, a liquefied storage tank that stores liquefied purified gas. The high-purity gas supply facility 3 may be a purification device that purifies the purified gas produced by the air separation device 1 to obtain a higher-purity gas.

高純度ガス供給設備３は、高純度ガス系統の管路４２を介して上記低純度ガス系統の管路４１に接続している。高純度ガス系統の管路４２の途中には、流量計７と流量調節弁６が介装されている。流量計７は、高純度ガス系統の管路４２を流れる高純度ガスの流量を検出し、検出値を純度補償部８に出力する。流量調節弁６は、純度補償部８からの指令に応じて低純度ガス系統の管路４１に供給する高純度ガスの流量を調整する。流量調節弁６は、初期状態では閉状態に設定される。   The high purity gas supply facility 3 is connected to the low purity gas line 41 through a high purity gas line 42. A flow meter 7 and a flow rate control valve 6 are interposed in the middle of the pipe line 42 of the high purity gas system. The flow meter 7 detects the flow rate of the high purity gas flowing through the pipe line 42 of the high purity gas system, and outputs the detected value to the purity compensation unit 8. The flow rate adjusting valve 6 adjusts the flow rate of the high purity gas supplied to the pipe line 41 of the low purity gas system in accordance with a command from the purity compensation unit 8. The flow control valve 6 is set to a closed state in the initial state.

また低純度ガス系統の管路４１における、上記高純度ガス系統の管路４２の接続位置よりも上流側（空気分離装置１側）には、純度計４及び流量計５が介装されている。純度計４は、空気分離装置１で製造された精製ガスの純度を計測し、計測した純度情報を純度補償部８に供給する。流量計５は、空気分離装置１から供給される精製ガスの流量を検出し、検出値を純度補償部８に出力する。
純度補償部８は、上記純度計４が検出したガスの純度が設定純度未満と判定すると、上記高純度ガス供給設備３からの高純度ガスを低純度ガス系統の管路４１に混入し、この高純度ガスの混入に加えて、上記空気分離装置１に供給される処理空気量の変更を検出すると、予め設定した設定流量の上記高純度ガスも混入する処理を行う。 In addition, a purity meter 4 and a flow meter 5 are interposed on the upstream side (air separation device 1 side) of the pipe line 41 of the low-purity gas system from the connection position of the pipe line 42 of the high-purity gas system. . The purity meter 4 measures the purity of the purified gas produced by the air separation device 1 and supplies the measured purity information to the purity compensator 8. The flow meter 5 detects the flow rate of the purified gas supplied from the air separation device 1 and outputs the detected value to the purity compensator 8.
When the purity compensator 8 determines that the purity of the gas detected by the purity meter 4 is less than the set purity, the purity compensator 8 mixes the high purity gas from the high purity gas supply facility 3 into the pipe line 41 of the low purity gas system. When a change in the amount of processing air supplied to the air separation device 1 is detected in addition to the mixing of the high-purity gas, processing for mixing the high-purity gas at a preset flow rate is performed.

次に、純度補償部８の処理例を、図３のフロー図を参照して説明する。
この純度補償部８の処理は、予め設定したサンプリング時間毎に実施される。
純度補償部８は、まずステップＳ１０にて、純度計４が計算した純度が設定純度未満か否かを判定する。設定純度未満の場合にはステップＳ２０に移行し、設定純度以上の場合にはステップＳ３０に移行する。
ステップＳ２０では、純度補償判定スイッチＳＷ１をＯＮに設定してステップＳ３０に移行する。 Next, a processing example of the purity compensation unit 8 will be described with reference to the flowchart of FIG.
The processing of the purity compensation unit 8 is performed every preset sampling time.
The purity compensation unit 8 first determines in step S10 whether the purity calculated by the purity meter 4 is less than the set purity. If the purity is lower than the set purity, the process proceeds to step S20, and if the purity is higher than the set purity, the process proceeds to step S30.
In step S20, the purity compensation determination switch SW1 is set to ON, and the process proceeds to step S30.

ステップＳ３０では、空気分離装置１の操業条件が変更されたか否かを判定する、操業条件が変更された場合には、ステップＳ４０に移行する。操業条件が変更されていない場合にはステップＳ５０に移行する。
空気分離装置１の操業条件が変更されたか否かは、ガス製造制御部４０からの操業変更命令を入力するか否かで判定する。空気分離装置１の流量計３６で検出した流量が、予め設定した変動幅量で変化した場合に、空気分離装置１の操業条件が変更されたと判定しても良い。流量計３６で検出した流量で空気分離装置１の操業条件の変更を検出する場合には、ガス供給先の需要変更以外の操業変更についても検出可能となる。 In step S30, it is determined whether or not the operating condition of the air separation device 1 has been changed. If the operating condition has been changed, the process proceeds to step S40. If the operating conditions have not been changed, the process proceeds to step S50.
Whether or not the operation condition of the air separation device 1 has been changed is determined by whether or not an operation change command from the gas production control unit 40 is input. When the flow rate detected by the flow meter 36 of the air separation device 1 changes by a preset fluctuation range, it may be determined that the operating condition of the air separation device 1 has been changed. When a change in the operation condition of the air separation device 1 is detected with the flow rate detected by the flow meter 36, an operation change other than a change in demand at the gas supply destination can be detected.

ステップＳ４０では、純度補償判定スイッチＳＷ２をＯＮに設定して、ステップＳ５０に移行する。
ステップＳ５０では、純度補償判定スイッチＳＷ１及びＳＷ２が共にＯＦＦという条件を満足しているか、予め設定した終了条件を満足したか否かを判定する。条件を満足していると判定した場合にはステップＳ６０に移行する。それ以外は、ステップＳ７０に移行する。 In step S40, the purity compensation determination switch SW2 is set to ON, and the process proceeds to step S50.
In step S50, it is determined whether or not the purity compensation determination switches SW1 and SW2 both satisfy the condition that they are OFF or whether a preset end condition is satisfied. If it is determined that the condition is satisfied, the process proceeds to step S60. Otherwise, the process proceeds to step S70.

例えば、純度補償判定スイッチＳＷ１及びＳＷ２のいずれかがＯＮになってから、純度計４で計算した純度が設定純度未満となったから再度純度計４で計算した純度が設定純度以上となったときを、予め設定した終了条件とする。なお、純度補償判定スイッチＳＷ１及びＳＷ２をＯＦＦに再設定する条件は異なっていても良い。
ステップＳ６０では、純度補償判定スイッチＳＷ１及びＳＷ２をともにＯＦＦに設定してステップＳ７０に移行する。 For example, when either of the purity compensation determination switches SW1 and SW2 is turned ON, the purity calculated by the purity meter 4 becomes less than the set purity, and the purity calculated by the purity meter 4 again becomes equal to or higher than the set purity. The end condition is set in advance. The conditions for resetting the purity compensation determination switches SW1 and SW2 to OFF may be different.
In step S60, the purity compensation determination switches SW1 and SW2 are both set to OFF, and the process proceeds to step S70.

ステップＳ７０では、純度補償判定スイッチＳＷ１がＯＮか否かを判定する。ＯＮの場合には、ステップＳ８０に移行する。ＯＮでない場合には、ステップＳ９０に移行して純度補償量ＢＳ−ＦＬＯＷに「０」を設定してステップＳ１００に移行する。
ステップＳ８０では、空気分離装置１が製造した精製ガスの純度低下分を補償するための純度補償量ＢＳ−ＦＬＯＷを算出する。純度計４が計算した純度と設定純度との差分と、流量計５が検出した空気分離装置１からの精製ガスの供給量と、高純度ガス供給設備３から供給可能な高純度ガスの純度とに基づき、供給先に供給される精製ガスが設定純度とするための上記高純度ガスの流量を、上記純度補償量ＢＳ−ＦＬＯＷとする。 In step S70, it is determined whether or not the purity compensation determination switch SW1 is ON. If it is ON, the process proceeds to step S80. If it is not ON, the process proceeds to step S90, where the purity compensation amount BS-FLOW is set to “0”, and the process proceeds to step S100.
In step S80, a purity compensation amount BS-FLOW for compensating for the purity reduction of the purified gas produced by the air separation device 1 is calculated. The difference between the purity calculated by the purity meter 4 and the set purity, the amount of purified gas supplied from the air separation device 1 detected by the flow meter 5, and the purity of the high purity gas that can be supplied from the high purity gas supply facility 3 Based on the above, the flow rate of the high-purity gas for setting the purified gas supplied to the supply destination to the set purity is defined as the purity compensation amount BS-FLOW.

ステップＳ１００では、純度補償判定スイッチＳＷ２がＯＮか否かを判定する。純度補償判定スイッチＳＷ２がＯＮの場合にはステップＳ１１０に移行する。そうでない場合にはステップＳ１２０に移行する。
ステップＳ１１０では、純度補償量ＢＳ−ＦＬＯＷに予め設定した固定流量ΔＦを加算してステップＳ１２０に移行する。
ステップＳ１２０では、低純度ガス系統の管路４１に混入する高純度ガスが、算出した純度補償量ＢＳ−ＦＬＯＷとするための指令値を流量調節弁６に供給して、復帰する。 In step S100, it is determined whether or not the purity compensation determination switch SW2 is ON. If the purity compensation determination switch SW2 is ON, the process proceeds to step S110. Otherwise, the process proceeds to step S120.
In step S110, the preset fixed flow rate ΔF is added to the purity compensation amount BS-FLOW, and the process proceeds to step S120.
In step S120, the high-purity gas mixed in the pipe line 41 of the low-purity gas system supplies the command value for setting the calculated purity compensation amount BS-FLOW to the flow control valve 6 and returns.

（動作）
空気分離装置１は、操業条件に変更が無い場合には、空気分離装置１から得られるガスの純度は常に同量の空気を処理する場合には自動で適正な値に制御される。これによって、管理純度以上である設定純度以上の精製ガスを、低純度ガス系統の管路４１を介して供給先に供給する。 (Operation)
When there is no change in the operating conditions, the purity of the gas obtained from the air separation device 1 is automatically controlled to an appropriate value when the same amount of air is processed. As a result, a purified gas that is higher than the set purity that is higher than the management purity is supplied to the supply destination via the pipe line 41 of the low-purity gas system.

一方、供給先での精製ガスの需要が変更されることに応じて、処理空気量の変更（操業変更）を行った場合には、自動制御のパラメータ変更が瞬時に対応できないため、空気分離装置１で製造させる精製ガスの純度が一時的に低下する。これは、処理空気量が増加する方向に変更された場合でも、処理空気量が減少する方向に変更された場合でも発生する。   On the other hand, if the amount of processing air is changed (operation change) in response to a change in the demand for purified gas at the supply destination, the automatic control parameter change cannot be handled instantaneously. The purity of the purified gas produced in 1 is temporarily reduced. This occurs even when the processing air amount is changed in the increasing direction or when the processing air amount is changed in the decreasing direction.

この空気分離装置１から供給された実際の精製ガスの純度が設定純度未満に低下していることを検出すると、その純度低下分を補償する高純度ガスの純度補償量ＢＳ−ＦＬＯＷを算出し、流量調節弁の弁開度を、その純度補償量ＢＳ−ＦＬＯＷに応じた値に設定する。
更に本実施形態では、純度計４に基づき純度の低下を検出する前でも、空気分離装置１の操業条件の変更を検出すると、上記純度補償量ＢＳ−ＦＬＯＷに予め設定した固定流量ΔＦ分だけ上乗せする処理を行う。 When it is detected that the purity of the actual purified gas supplied from the air separation device 1 is lower than the set purity, the purity compensation amount BS-FLOW of the high purity gas that compensates for the purity reduction is calculated, The valve opening degree of the flow control valve is set to a value corresponding to the purity compensation amount BS-FLOW.
Further, in the present embodiment, even when a decrease in purity is detected based on the purity meter 4, if a change in the operating condition of the air separation device 1 is detected, the purity compensation amount BS-FLOW is increased by a preset fixed flow rate ΔF. Perform the process.

このように、操業変更の命令が出た時点で高純度ガスの混入を開始するため、純度補償の応答性を向上することができる。これにより、補償効果の発現までの間においても管理基準の純度を維持した制御が可能となる。
これによって、より確実に管理純度以上の精製ガスを供給先に供給可能となる。
そして、固定流量ΔＦ分だけ固定で混入している高純度ガスは、純度計４で測定される純度が設定値を回復した時点で停止するものとする。 As described above, since the mixing of the high purity gas is started when the operation change command is issued, the responsiveness of the purity compensation can be improved. Thereby, it is possible to perform control while maintaining the purity of the management standard even before the compensation effect is exhibited.
As a result, it is possible to supply purified gas having a management purity or higher to the supply destination more reliably.
The high-purity gas mixed by a fixed flow rate ΔF is stopped when the purity measured by the purity meter 4 recovers the set value.

ここで、上記固定流量ΔＦ分の供給を行わない場合には、純度計４によって低純度系統の純度悪化を検出してから高純度の混入を開始するため、純度低下の速度が速い場合や純度計４から混入装置までの距離を十分に確保できない場合に補償開始から効果が発現するまでの間で管理値を下回った純度のガスが供給される。このため純度低下の速度によっては、図４に示すように、供給先に供給する精製ガスの純度が管理純度未満となるおそれがある。図４中の破線の補償無しは、高純度ガスを混入しなかった場合の精製ガスの純度予測値である。   Here, when the supply for the fixed flow rate ΔF is not performed, the purity meter 4 detects the deterioration of the purity of the low-purity system and then starts the high-purity mixing. When the distance from the total 4 to the mixing device cannot be sufficiently secured, a gas having a purity lower than the control value is supplied from the start of compensation until the effect is manifested. Therefore, depending on the rate of purity reduction, as shown in FIG. 4, the purity of the purified gas supplied to the supply destination may be less than the management purity. The non-compensation indicated by the broken line in FIG. 4 is the predicted value of the purity of the purified gas when the high purity gas is not mixed.

これに対し、本実施形態では、更に上記固定流量ΔＦ分の供給を行うので、図４と同じ操業状態であっても図５に示すような純度の推移となり、供給先に供給する精製ガスの純度を管理純度以上に補償することが可能となる。
上記固定流量分ΔＦは、例えば、管理純度と設定純度との差分以上に設定する。
このように、本実施形態では、純度低下に応じて高純度ガスを混入する補償方法に加えて、純度低下の要因となる空気分離装置１の操業変更と判定すると固定流量ΔＦの高純度ガスを更に混入する。この結果、純度補償の応答性を向上することができ、これにより補償効果の発現までの間においても管理基準の純度を維持した制御が可能となる。また、固定流量ΔＦの大きさは演算していないので、その分だけ早期に補償開始が可能となる。 On the other hand, in the present embodiment, since the supply for the fixed flow rate ΔF is further performed, the purity transition as shown in FIG. 5 occurs even in the same operation state as in FIG. 4, and the purified gas supplied to the supply destination is changed. The purity can be compensated more than the control purity.
The fixed flow amount ΔF is set to be equal to or greater than the difference between the management purity and the set purity, for example.
As described above, in this embodiment, in addition to the compensation method in which high-purity gas is mixed in accordance with a decrease in purity, if it is determined that the operation of the air separation device 1 is changed, which causes a decrease in purity, high-purity gas with a fixed flow rate ΔF is used. Furthermore, it mixes. As a result, it is possible to improve the responsiveness of the purity compensation, and thereby it is possible to perform control while maintaining the purity of the management standard even until the compensation effect is exhibited. Further, since the magnitude of the fixed flow rate ΔF is not calculated, compensation can be started earlier by that amount.

１ 空気分離装置
２ 純度補償装置
３ 高純度ガス供給設備
４ 純度計４
５ 流量計
６ 流量調節弁
７ 流量計
８ 純度補償部
４０ ガス製造制御部
４１ 低純度ガス系統の管路
４２ 高純度ガス系統の管路
ＢＳ−ＦＬＯＷ 純度補償量
ＳＷ１ 純度補償判定スイッチ
ＳＷ２ 純度補償判定スイッチ
ΔＦ 固定流量 DESCRIPTION OF SYMBOLS 1 Air separation device 2 Purity compensation device 3 High-purity gas supply equipment 4 Purity meter 4
5 Flow Meter 6 Flow Control Valve 7 Flow Meter 8 Purity Compensation Unit 40 Gas Production Control Unit 41 Low Purity Gas System Pipe Line 42 High Purity Gas System Pipe Line BS-FLOW Purity Compensation SW1 Purity Compensation Judgment Switch SW2 Purity Compensation Judgment Switch ΔF Fixed flow rate

Claims (3)

空気を冷却分離して目的とするガスを精製する空気分離装置と、
上記空気分離装置が製造したガスが通過する精製ガス供給路と、
上記空気分離装置が製造するガス濃度よりも高純度の高純度ガスを供給可能な高純度ガス供給設備と、
上記空気分離装置が製造したガスの純度を検出する純度計と、
上記純度計が検出したガスの純度が設定純度未満と判定すると、上記高純度ガス供給設備からの高純度ガスを上記精製ガス供給路に混入することで、提供するガスの純度を補償する純度補償部と、を備え、
上記純度補償部は、上記純度計の検出に基づく高純度ガスの混入に加えて、上記空気分離装置に供給される処理空気量の変更を検出すると、予め設定した設定流量の上記高純度ガスを更に上記精製ガス供給路に混入することを特徴とする精製ガス供給装置。 An air separation device for purifying a target gas by cooling and separating air;
A purified gas supply passage through which the gas produced by the air separation device passes,
A high-purity gas supply facility capable of supplying a high-purity gas having a purity higher than the gas concentration produced by the air separation device;
A purity meter for detecting the purity of the gas produced by the air separation device;
Purity compensation that compensates for the purity of the gas to be provided by mixing the high purity gas from the high purity gas supply facility into the purified gas supply path when the purity of the gas detected by the purity meter is determined to be less than the set purity. And comprising
When the purity compensator detects a change in the amount of processing air supplied to the air separation device in addition to the mixing of the high purity gas based on the detection of the purity meter, the high purity gas having a preset set flow rate is detected. Further, the purified gas supply device is mixed into the purified gas supply path. 上記純度補償部は、上記純度計が検出したガスの純度が設定純度未満となったことを検出した後に、上記純度計が検出したガスの純度が設定純度以上となったことを検出すると上記設定流量分の高純度ガスの混入を終了することを特徴とする請求項１に記載した精製ガス供給装置。   The purity compensator detects that the purity of the gas detected by the purity meter is less than the set purity, and then detects that the purity of the gas detected by the purity meter is equal to or higher than the set purity. The purified gas supply device according to claim 1, wherein mixing of high-purity gas corresponding to a flow rate is terminated. 空気分離装置に供給される処理空気量の変更を検出すると、空気分離装置が製造した精製ガスに対し、上記空気分離装置が製造するガス濃度よりも高純度の高純度ガスを予め設定した固定流量で混入することを特徴とする製造ガスの純度補償方法。   When a change in the amount of processing air supplied to the air separation device is detected, a fixed flow rate in which a high-purity gas having a purity higher than the gas concentration produced by the air separation device is set in advance for the purified gas produced by the air separation device. A method for compensating the purity of a production gas, which is mixed in
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