JP5897061B2 - Stereolithography apparatus and stereolithography method - Google Patents

Description

  The present invention relates to an optical modeling apparatus and an optical modeling method, and more particularly to an optical modeling apparatus and an optical modeling method for forming a three-dimensional object by scanning light from a light source using a photocurable liquid resin, and particularly a high shape. The present invention relates to an optical modeling apparatus and an optical modeling method capable of realizing both accuracy and high-speed modeling.

  In order to make 3D shape data designed by 3D CAD system and 3D shape data measured by 3D measuring machine into 3D shape, 3D shape is obtained by using uncured liquid photocurable composition. A technique for modeling a shape defined by data has been developed. Sci. Instrum. 52. NO. 11 Nov. 1981 page 1770-.

  Recently, an optical modeling apparatus has been developed to realize this modeling method. This apparatus exposes an uncured photocurable composition (hereinafter also referred to as an uncured resin liquid) to form a cured layer and sequentially laminates the cured layer into a three-dimensional object. The data of cross-sectional shape of each layer is created from the three-dimensional shape data by using an electronic computer etc., and the uncured resin liquid is selectively exposed based on the data, so that the model or model at the time of product development A complicated three-dimensional object such as

  An example of this type of stereolithography apparatus is described in Japanese Patent Laid-Open No. 3-227222. In this apparatus, laser light is scanned with respect to the liquid level of the modeling tank containing the uncured resin liquid to cure the uncured resin liquid in the vicinity of the liquid surface to a predetermined shape, and the cured layer is submerged in the modeling tank. Thereafter, the next cross-sectional layer is laminated while adhering thereto. The laser beam scanning device (scanning device) includes, for example, a first reflecting mirror that rotates while reflecting a laser beam from a laser light source and scans the laser beam in a first scanning direction, and a first reflecting mirror. And a second reflecting mirror that rotates in a second scanning direction perpendicular to the first scanning direction by rotating while reflecting the light of each of the reflecting mirrors. Drive control is performed corresponding to the modeling pattern of the hardened layer.

  More specifically, the optical modeling apparatus includes a liquid resin container that stores a photocurable composition, and a modeling table that is moved by an elevator in a direction close to and away from the liquid level of the resin stored in the liquid resin container. Irradiate the laser beam to cure the photocurable composition between the modeling table and the liquid surface to form a cured layer, and control the elevator to move the modeling table downward by a predetermined distance. A control means for separating the liquid surface by the layer thickness and a recoater for flattening the modeling surface (liquid surface) to a predetermined thickness are provided. A three-dimensional object is formed by laminating a cured layer by a so-called free liquid surface method in which a photocurable composition having a layer thickness formed on a cured layer laminated on a modeling table is selectively exposed by an optical system means.

  For example, as shown in FIG. 1, the configuration of a conventional stereolithography apparatus generates a radiation beam 12 with a radiation apparatus 10 (for example, a laser). The radiation beam 12 passes through a modulator 14, which is preferably an acousto-optic modulator (AOM). The modulated radiation beam 12 ′ then passes through the deflection means 16. The deflecting means includes two mirrors 20 and 22, each mirror having an axis (not shown) that can reflect the beam to the surface 46 in the X and Y directions. Here, the X direction and the Y direction are perpendicular to each other and parallel to the surface 46. The mirrors 20 and 22 are rotated about corresponding axes by motors 24 and 26, respectively, and the radiation beam 12 is directed toward a predetermined position of the liquid photocurable composition 40 contained in the container 44 in the X and Y directions, respectively. It is designed to deflect while controlling. The beam causes photocuring of a predetermined portion of the composition to a substantially constant light curing depth. The photocuring depth is defined as the maximum or peak thickness between the surface 46 and the opposite side of the photocured thin layer, measured in a cross section perpendicular to the scanning direction. Setting means such as a modeling table 41 and an elevator motor 42 are provided in the container 44, and the elevator motor moves the modeling table 41 to precisely control the position of the modeling table in the container 44. It has become. Layer forming means, such as a doctor knife 43, is placed in the container 44 above the shaping table 41, which forms an overlying thin layer of the liquid photocurable composition.

  In the conventional optical image forming apparatus, as shown in FIG. 2, the electrical parts such as a servo motor, a personal computer, and wiring for moving the modeling table in the vertical direction are fixed in the housing 103 on the wall 107 side from the AA part. Therefore, a maintenance space is required between the back surface 109 and the wall 107 and on the left and right rear sides. For example, when the servo motor breaks down, the housing 103 is moved to the dotted line portion on the wall side by dividing it along the AA portion in FIG. It was necessary to repair the servo motor disposed in the housing 103 of the electrical component when a person entered a gap formed between them.

  Further, during transportation, it is necessary to separate the housing 103 of the electrical equipment section and the housing 105 of the main body at the A-A section in FIG. In order to disconnect, it was necessary to disconnect all the wirings, and it was necessary to reattach all these wirings when the apparatus was installed.

  Conventionally, the optical system placement chamber is a sealed space, and optical devices such as a laser transmitter, mechanical shutter, AOM, reflection mirror, dynamic focus, focus lens, and galvano scanner have been placed.

  Conventional optical modeling apparatuses generally use a fluorescent tube as a modeling room lamp.

  Conventionally, the liquid surface for one layer is solidified by irradiating the modeling surface of the modeling room with laser light adjusted in the optical system positioning chamber by a galvano scanner under control between the modeling room and the optical system positioning chamber. The window was open. A shutter that can be opened and closed is attached to the window so that model waste, liquid resin, and the like do not adhere to the mirror of the galvano scanner when the modeling is completed and the modeling table on which the model is formed is removed from the modeling apparatus. . The shutter was manually opened and closed by the operator.

  In addition, in order to maintain the laser intensity at the start of modeling or during modeling at the specified laser intensity, a laser power monitor for measuring the intensity of the laser beam is placed near the modeling liquid surface outside the modeling area, and laser light is emitted by the galva scanner. Was irradiated on the light receiving surface of the laser power monitor. The laser power monitor was placed at this position because of the limitation of the laser beam swing angle by the galvano scanner. When the laser intensity measured by the power monitor is weaker or stronger than the predetermined laser intensity, the AOM and the laser generation source are adjusted to control the laser intensity to the predetermined laser intensity.

Conventionally, in an optical modeling apparatus, when replacing the type of liquid resin, the Z frame part used by the resin layer among the arm parts attached to the elevator so that different types of resin are mixed and the resin is not damaged It was made the structure which isolate | separates by.
The Z frame was moved to the lowest position by the Z frame, and the operator removed the handle with the handle, placed on the bottom of the modeling tank by human power, and replaced the resin for each modeling tank. In addition, the Z frame after the replacement is also attached by the operator holding the handle and screwing it.

Conventionally, the modeling table needs to be accurately positioned and securely fixed so that it does not move during modeling. Therefore, the modeling table has been fixed to the frame of the elevator in the Z direction with hexagonal bolts. This is because when the modeling table is displaced, an accurate modeling object cannot be obtained.
In addition, when removing the model from the modeling table after the modeling is completed, if the model is removed from the modeling table in the modeling chamber, the support scraps fall into the liquid resin tank, and the effect of resin thickening and the next model Since there is a risk of becoming garbage, the modeling table is removed and the modeled object is removed from the modeling table outside the optical modeling apparatus.

  Conventionally, the liquid level of the liquid resin tank in the modeling chamber is measured by a liquid level sensor installed in the modeling chamber with dust removal attached to the liquid resin tank every measurement, and the dust removal is removed after the measurement is completed. It was.

  In such a photo-hard shaping apparatus, when the settling amount per time of the hardened layer is large, the uncured liquid is introduced onto the hardened layer from the surroundings only by letting the hardened layer settle. However, when the amount of sedimentation per one time is small, the uncured liquid is not introduced onto the cured layer only by allowing the cured layer to settle by the viscosity or surface tension of the uncured liquid. Alternatively, it may take a long time for the uncured liquid to be introduced onto the cured layer. Therefore, there is a technique in which the uncured liquid is introduced onto the cured layer by once settling the cured layer and then the thickness of the uncured liquid is decreased by raising the cured layer. However, according to this technique, the liquid level is rippled due to the descending and rising of the hardened layer, and it takes time until the liquid level becomes calm, so it is difficult to shorten the recording time.

  In order to solve such problems, the cured layer is allowed to settle, and then the uncoated liquid is extruded over the entire surface of the recorder by running the recoater over the cured layer, thereby curing the uncured liquid. Technology to be introduced on the layer has been developed. As a recorder, one using a smooth plate is known. Phenomenon that uncured liquid enters the gap between the lower surface of the recoater and the upper surface of the hardened layer (inhalation action), and the hardened liquid is moved by the recoater due to the viscous resistance between the lower surface of the recoater The uncured liquid is introduced into the upper surface of the cured layer by a phenomenon of being dragged (a drag action). However, according to this method, it is difficult to introduce a sufficient amount of the uncured liquid onto the upper surface of the cured layer, and if the cured layer is greatly spread, a portion that is not recorded, that is, a remaining surface of the recording is generated. In order to prevent this, the smooth plate or brush must be reciprocated many times, and again, it takes time for the recording.

  In order to solve such a problem, a technique for providing a recess on the lower surface of the recorder has been developed. When such a recorder is used, the uncured liquid is stored in the recess of the recorder, and in addition to the suction action and the drag action, it is stored in the gap between the lower surface of the recorder and the upper surface of the hardened layer. Since the uncured liquid is introduced into the upper surface of the cured layer also by the action of reducing the stored amount, a large amount of uncured liquid can be introduced into the upper surface of the cured layer.

Conventionally, liquid smelting for stereolithography, when the number of days of use has elapsed, the moisture in the resin escapes into the air and decreases, or absorbs moisture in the air and increases, and when stereolithography is performed, predetermined conditions are met. There was a problem that it did not harden or was too hard.
For example, when a photocurable liquid resin is used under high humidity, there is a problem that the amount of water in the resin increases, and the molded article can be made soft. In addition, when a photocurable liquid resin is used under high dryness, there is a problem that the amount of water in the resin is reduced and the surface of the shape becomes rough.
Therefore, it is necessary to protect the unused liquid resin from being exposed to ultraviolet rays and to store it in a storage for keeping the moisture concentration of the liquid resin at a predetermined value.

Japanese Patent Laid-Open No. 3-227222

Rev. Sci. Instrum. 52. NO. 11 Nov. 1981

  However, during maintenance, as shown in FIG. 1, it is necessary to take a wide maintenance space 102 around the stereolithography apparatus, which requires a wasteful installation space. In addition, after the operation test is completed, all the wiring is removed for shipment, so there may be cases where the delivery destination does not operate normally due to wiring mistakes or poor contact.

  However, since heat-generating devices such as a laser transmitter and a galvano scanner are arranged in the sealed space, there is a problem that accuracy is deteriorated because the temperature of the optical system is increased and the temperature of the optical device is also increased.

  Furthermore, although a sealed space is formed, a through-cavity for passing laser light is formed between the optical system placement chamber and the modeling chamber, so a liquid resin (liquid photocurable composition) scattered in the air in the modeling chamber ) Floating substances and contaminants containing components may flow into the optical system placement chamber through the penetration cavity and adhere to the optical system equipment, which may have an adverse effect. For example, there is a problem in that the intensity of the laser beam reflected by the mirror decreases when attached to a galvanometer mirror or a reflection mirror.

When a fluorescent tube is used in a modeling chamber, there is a problem that the photocurable resin is cured by ultraviolet rays emitted from the fluorescent tube. Therefore, measures were taken to prevent ultraviolet rays from coming into contact with the photocurable resin in the bathtub by wrapping a fluorescent tube with an ultraviolet cut film or placing an ultraviolet cut acrylic plate directly under the fluorescent tube. However, as a result of taking the above measures, the modeling room lamp reflects the color of the film or the acrylic plate and becomes a modeling room lamp such as orange or yellow, and it is difficult to confirm the color and shape.
In addition, since the fluorescent tube has a short life, it has to be replaced frequently and has a problem in terms of cost including man-hours and countermeasure costs.

Therefore, an object of the present invention is to provide an optical modeling apparatus that is inexpensive and can instantly confirm the color and shape of the modeling chamber.
However, because the operator was manually opening and closing. Frequently, the operator forgot to close the shutter and started working in the modeling room, causing the trouble of soiling the galvanometer mirror. For this reason, useless work time and costs such as replacement of mirrors have occurred.
Even if the shutter was closed during the work, there was a work mistake that the user forgot to open the shutter after the work was finished and the laser was not irradiated when remodeling. In addition, because the laser power monitor was placed near the liquid level in the modeling room, resin scraps and liquid resin often adhered to the power monitor when removing the model. There is also a problem that the light receiving surface is dirty and the laser power cannot be measured.

  However, when removing the Z frame, it is located above the bottom of the tank and it is very heavy, so the operator cannot damage the liquid resin tank without being able to support it, or attach the modeling table attached to the Z frame and Z frame. There was a risk of injury. Furthermore, since the heavy Z frame was supported and removed by human power, there was a problem that it took time to remove.

  In addition, when a modeling table that is frequently attached and detached is fixed with bolts, there is a problem that it takes time to attach and detach the modeling table.

  However, there is a problem that the resin is attached to the dust removal, and the resin is difficult to place because it is difficult to handle or hang down.

  However, even if a recoater having a recess on the lower surface is used, if the viscosity of the photocurable liquid increases, the amount stored in the recess of the recorder decreases, and the uncured liquid is replenished in the recess. Since it takes time to do this, the time required for recoating becomes longer. Accordingly, an object of the present invention is to provide a photo-curing modeling apparatus provided with a recoater that can shorten the time required for replenishing the uncured liquid into the recess of the recoater. Another object of the present invention is to provide a photo-curing modeling method including a recording process that can shorten the time required for replenishing the uncured liquid into the recess of the recorder.

  However, there is a problem that it is costly to maintain a storage of constant humidity in addition to the protection of ultraviolet rays.

According to the present invention, the thin layer of the uncured photo-curing resin is selectively irradiated with light, and the step of forming the cross-sectional cured layer corresponding to the light irradiation region is repeated to form a three-dimensional structure in which the cross-sectional cured layer is laminated. An optical modeling apparatus for modeling an optically cured model, wherein a dust prevention mechanism is attached to the uncured photocurable resin in a liquid resin tank storing the uncured photocurable resin, A liquid level sensor is disposed so as to measure the liquid level of the uncured photo-curing resin in the liquid reservoir in the protection mechanism, and the liquid level sensor is relative to the liquid resin tank. An optical modeling apparatus is provided, which is fixed and remains fixed even when the dust removal mechanism moves .
Further, according to the present invention, the cross-section hardened layer is laminated by repeating the process of selectively irradiating a thin layer of an uncured photocurable resin and forming a cross-section hardened layer corresponding to the light irradiation area. A three-dimensional photo-curing model, and a dust prevention mechanism in the liquid resin tank storing the uncured photo-curing resin, attached to the uncured photo-curing resin, A liquid level sensor is arranged to measure the liquid level height of the uncured photocurable resin in the liquid reservoir in the dust prevention mechanism, and the liquid level sensor includes a recoater and the uncured photocuring. There is also provided an optical modeling apparatus characterized by measuring a relative position of the liquid with the liquid surface of the conductive resin.
Further, according to the present invention, the cross-section cured layer is laminated by repeating the process of selectively irradiating a thin layer of an uncured photocurable resin and forming a cross-section cured layer corresponding to the light irradiation area. An optical modeling method for modeling a three-dimensional photo-cured model, and a step of attaching dust protection to the uncured photo-curing resin in a liquid resin tank storing the uncured photo-curing resin; , look-containing and a step of measuring the liquid level of the uncured photocurable resin said dodging dust, the step of measuring the liquid level height is fixed relative to the liquid resin tank An optical modeling method characterized in that the liquid level sensor measures the liquid level height of the uncured photo-curing resin that has removed the dust in a state where it is fixed even if the dust removal moves. Is provided.
And according to this invention, this cross-section hardened layer is laminated | stacked by repeating the process of selectively irradiating the thin layer of uncured photocurable resin, and shaping the cross-section hardened layer corresponding to a light irradiation area | region. An optical modeling method for modeling a three-dimensional photo-cured model, and a step of attaching dust protection to the uncured photo-curing resin in a liquid resin tank storing the uncured photo-curing resin; Measuring the liquid level height of the uncured photocurable resin from which the dust is prevented based on the relative position between the recoater and the liquid level of the uncured photocurable resin, An optical modeling method characterized by this is also provided.
In a stereolithography apparatus for producing a three-dimensional object by sequentially curing and laminating a liquid photocurable composition layer by layer, a modeling container filled with the liquid photocurable composition and installed in the modeling container A modeling table that is movable in the vertical direction, supply means for supplying the liquid photocurable composition in the modeling container onto the modeling table, and liquid light supplied onto the modeling table by the supply means A recoater that is movable in the horizontal direction for smoothing the surface of the curable composition to form a liquid photocurable composition layer, and an exposure means for selectively exposing the surface of the liquid photocurable composition. In the stereolithography apparatus provided, an electrical equipment-related equipment mounting portion of a sliding type or the rearmost side that moves parallel to the plane is provided on the planar rearmost surface of the optical molding apparatus.

Therefore, in the present invention, a step of selectively irradiating a thin layer of an uncured photocurable resin with a light beam moving along a scanning line to form a cross-sectional cured layer corresponding to the light irradiation area In the method of modeling the three-dimensional photocured modeled product in which the cross-section cured layer is laminated by repeating
A blower mechanism for sending air into the optical system placement chamber in which the optical system equipment is placed is provided.

An optical modeling apparatus according to the present invention creates a three-dimensional shape model using a photocurable resin, includes a casing and a modeling chamber therein, and an LED whose light source is a solid light-emitting element as an internal lamp in the modeling chamber It is desirable that the solid-state light emitting element is white.
The solid state light emitting device can be used as long as it does not emit ultraviolet light.

  Therefore, in the present invention, a plate-like shutter fixed to two rails is interlocked with a door for an operator to access the modeling room by a motor, and when the door is opened, the shutter is moved to a closed position. When the door is closed, the shutter is moved to the open position. Whether the door is opened or closed is determined by an electrical switch. Further, in the present invention, the laser power monitor is fixed to the optical system arrangement chamber side of the shutter, and the laser intensity is measured by moving the shutter to a predetermined position.

Therefore, in the present invention, a step of selectively irradiating a thin layer of an uncured photocurable resin with a light beam moving along a scanning line to form a cross-sectional cured layer corresponding to the light irradiation area In the method of modeling the three-dimensional photocured modeled product in which the cross-section cured layer is laminated by repeating
The Z frame attached to the frame of the elevator for raising and lowering the modeling table was fixed with a long bolt.

Therefore, in the present invention, a step of selectively irradiating a thin layer of an uncured photocurable resin with a light beam moving along a scanning line to form a cross-sectional cured layer corresponding to the light irradiation area In the method of modeling the three-dimensional photocured modeled product in which the cross-section cured layer is laminated by repeating
In the liquid resin tank, a dust prevention liquid reservoir was attached to the liquid level, and a liquid level sensor was arranged to measure the liquid level in the dust prevention liquid reservoir.

Therefore, in the present invention, a step of selectively irradiating a thin layer of an uncured photocurable resin with a light beam moving along a scanning line to form a cross-sectional cured layer corresponding to the light irradiation area In the method of modeling the three-dimensional photocured modeled product in which the cross-section cured layer is laminated by repeating
A liquid resin reservoir parallel to the recoater blade having a space opened at the bottom is provided, and when the liquid resin reservoir is submerged in the liquid resin, the trapped air is exhausted and the liquid resin reservoir is A check valve that is closed to prevent the outside air from entering the liquid resin reservoir when the resin reservoir is lifted from the liquid resin is provided.

  Therefore, in the present invention, a step of selectively irradiating a thin layer of an uncured photocurable resin with a light beam moving along a scanning line to form a cross-sectional cured layer corresponding to the light irradiation area In the method of modeling the three-dimensional photocured model in which the cross-section cured layer is laminated by repeating the above, a moisture supply mechanism is provided in the liquid resin tank in order to maintain the moisture ratio in the liquid resin.

  By adopting such a configuration, it is possible to greatly reduce the arrangement space of the optical molding apparatus. Furthermore, it can be made compact by consolidating the electrical components and arranging the electrical devices in the vertical direction.

  According to the present invention, since air is always sent into the optical system arrangement chamber, the optical system device can be air-cooled. Further, air can flow from the optical system placement chamber to the modeling chamber, and floating substances containing the liquid resin component scattered in the modeling chamber can be prevented from entering the optical system placement chamber. Furthermore, it is possible to prevent floating substances such as contamination from the outside air from entering the optical system placement chamber.

For this reason, it is not necessary to use a fluorescent tube that emits ultraviolet rays as the light source of the modeling room lamp, and it is possible to use a solid light emitting element such as an LED.
As a result, it is possible to provide an inexpensive stereolithography apparatus that is less frequently replaced and requires no UV countermeasures.

  According to the present invention, it is possible to eliminate work mistakes caused by the operator forgetting to open and close the shutter. In addition, since the laser power monitor is fixedly attached to the optical system chamber of the shutter, it is possible to prevent failure due to dirt on the light receiving surface of the laser power monitor and to irradiate the modeling chamber with laser light during laser power measurement. Therefore, it is possible to prevent the liquid resin from being unnecessarily cured by the leaked laser light and deteriorating the liquid resin.

  According to the present invention, the Z frame attached to the frame of the elevator can be quickly removed from the liquid resin tank without burden on the operator, and the liquid resin tank of the optical modeling apparatus can be quickly replaced. become.

  According to the present invention, the modeling table can be quickly replaced, and the time until the next modeling can be started can be greatly shortened.

  According to the present invention, it is possible to prevent contamination due to the liquid resin adhering to dust removal.

  Since the present invention is configured as described above, the time for replenishing the uncured liquid into the recorder can be shortened even when a photocurable liquid having a high viscosity is used. In addition, since a mechanism for discharging the air inside the recorder to the outside is provided, the replenishment of the uncured liquid into the recorder is not insufficient.

  According to the present invention, the moisture content of the liquid resin can be maintained at an optimum moisture content for enjoying the predetermined performance of the liquid resin for a long period of time regardless of the high humidity / dry state. It can be shaped without degrading quality.

It is the schematic of the conventional optical modeling apparatus. It is a layout view of a conventional stereolithography apparatus. It is a general-view figure of the 1st Example of the optical modeling apparatus of this invention. FIG. 4 is a top view of FIG. 3. FIG. 4 is a side view of FIG. 3. FIG. 4 is a front view of FIG. 3. It is a side view of the 3rd Example of the optical molding apparatus 100 of this invention. It is a rear view of 3rd Example of the optical molding apparatus 100 of this invention. It is an arrangement | positioning top view of the optical modeling apparatus of the 3rd Example of the optical molding apparatus 100 of this invention. It is the figure which looked at the table 127 from the upper surface. Only the linear guide 129 with the table 127 attached is shown. It is the schematic of the 4th Example of the optical system arrangement | positioning chamber which provided the ventilation mechanism. It is the schematic of the 5th Example of the optical system arrangement | positioning chamber which provided the ventilation mechanism. It is the schematic of the 6th Example of the optical system arrangement | positioning chamber which provided the ventilation mechanism. It is the schematic of the 7th Example of the optical system arrangement | positioning chamber which provided the ventilation mechanism. It is the figure which looked at the illumination in the modeling room of this invention from the front of the modeling room (8th Example). It is BB sectional drawing of FIG. 16 which shows arrangement | positioning of the illumination in the modeling chamber of this invention (8th Example). It is the conceptual diagram which looked at the slide shutter of this invention from the optical system arrangement | positioning chamber. It is a conceptual diagram which shows the state which closed the slide shutter. It is a conceptual diagram which shows the state which opened the slide shutter. It is a conceptual diagram which shows the state which has arrange | positioned the slide shutter to the intensity | strength of a laser beam in a measurement position. It is a front view which shows the elevator of this invention. It is HH sectional drawing of FIG. It is II sectional drawing of FIG. It is the side view seen from the J direction of the frame which connects LM guide and Z frame of FIG. It is the side view seen from the D direction of the frame which connects LM guide and Z frame of FIG. It is the side view seen from the E direction of the frame which connects LM guide and Z frame of FIG. It is FF sectional drawing of FIG. It is GG sectional drawing of FIG. It is the schematic which shows the relationship between the conventional elevator and a liquid resin tank. It is the schematic which shows the exchangeable Z-frame (length) of a present Example. It is the schematic which shows the exchangeable Z frame (short) of a present Example. It is the schematic which attached the exchangeable Z frame of the present Example to the elevator in the modeling room of the optical modeling apparatus. It is a top view at the time of fixing the modeling table 601 to the elevator frame 603. FIG. It is an enlarged view of the one end side fixing | fixed part for fixing the modeling table 601 to the elevator frame 603 with a positioning accuracy with the enlarged view of the K section of FIG. It is an enlarged view of the other end side fixing | fixed part for fixing the modeling table 601 to the elevator frame 603 with a positioning accuracy with the enlarged view of the L section of FIG. It is the arrow view which looked at FIG. 36 from the side. It is a figure which shows the instrument for removing the modeling table 601 of this invention. It is the schematic which attached in order to remove the apparatus of FIG. 38 for a modeling table. It is the schematic which shows the state which removed the modeling table with the instrument of FIG. It is the schematic which shows the liquid resin tank of this invention. It is a figure which shows the state which sunk the dust removal mechanism 705 in liquid resin. It is a figure which shows the state which lifts the dust removal mechanism 705 completely from liquid resin. It is the figure which saw through the relative position of the liquid level sensor in the state where the dust removal mechanism 705 is immersed in liquid resin. It is the figure which saw through the relative position of the liquid level sensor in the state fully fried from liquid resin. It is a figure which shows the apparatus for measuring the relative position with the liquid level of the recoater 751 by the liquid level sensor 703. FIG. It is the arrangement schematic of the block for dead spaces of a liquid resin tank. It is side surface sectional drawing of the recoater of this invention. It is an upper surface sectional view of the recoater of the present invention. It is an enlarged view of the vertical maintenance mechanism of the movable blade of this invention. It is a longitudinal cross-sectional view in the reverse support valve part of a recoater (at the time of a blade fall). It is a longitudinal cross-sectional view in the reverse support valve part of a recoater (when a braid | blade raises). It is sectional drawing of the non-return valve part of this invention. It is a horizontal sectional view of a check valve part of the present invention. It is a horizontal sectional view of the valve of the check valve part of the present invention. It is the schematic of the 1st Example of the moisture adjusting device of this invention. It is the schematic of the 2nd Example of the moisture adjusting device of this invention.

FIG. 3 shows an overview of the first embodiment of the optical modeling apparatus of the present invention. FIG. 4 shows a top view of FIG. FIG. 5 shows a side view of FIG. FIG. 6 shows a front view of FIG.
Reference numeral 121 denotes a control computer monitor. Reference numeral 123 denotes a control computer keyboard. The monitor 121 and the keyboard 123 can be rotated integrally and rotated in the horizontal direction. Reference numeral 125 denotes an operation switch of the optical modeling apparatus.

The third embodiment of the present invention will be described in detail below.
FIG. 7 is a side view of a third embodiment of the optical molding apparatus 100 of the present invention. FIG. 8 is a perspective view showing a mounting state and a maintenance state of the slide type electrical component viewed from the back side of the optical molding apparatus of the present invention. FIG. 9 is an arrangement top view of the optical modeling apparatus of the third embodiment. As shown in FIGS. 7 and 8, the housing 103 of the electrical component slides parallel to the wall surface on the back and moves to the dotted line portion to expose the electrical device on the opposite side of the wall surface of the housing 103 of the electrical component. By adopting such a structure, it is not necessary to provide a maintenance space 151 between the back surface and the separation surface of the optical molding apparatus 100 as shown in FIG. Conventionally, in order to stably fix a laser power source, a rectangular parallelepiped laser power source has a surface having the largest area arranged parallel to the ground. Further, since the monitor is arranged on the upper surface of the control computer main body, the surface having the largest area of the rectangular parallelepiped control computer main body is arranged parallel to the ground. However, in this embodiment, by providing a slide type laser power source and dedicated vertical spaces 143 and 145 dedicated to the computer, the laser power source 143 and the control computer main body 145 are the most in the back of the housing 103 of the electrical component. It is possible to stably fix and arrange the upper and lower surfaces in the housing 103 of the electrical component face-to-face with a large area, and shorten the length in the back direction perpendicular to the sliding direction of the housing 103 of the electrical component. In addition, maintenance space can be eliminated. Here, FIG. 10 is a top view of a table 127 on which a personal computer monitor 121, a keyboard 123, and a mouse 125 are placed. FIG. 11 shows only the linear guide 129 with the table 127 mounted. As shown in FIG. 7, it is arranged on the linear guide 129 for sliding in the vertical direction formed on the side surface of the housing 103 and the table 127 rotating in the horizontal direction, so that the operator can easily work. The table 127 can be freely arranged, and workability is greatly improved. The table 127 can be arranged also on the side surface of the opposite housing 103, so that the degree of freedom of arrangement of the optical molding apparatus is increased.
As described above, since the depth of the optical molding apparatus 100 itself can be shortened, the installation space can be significantly reduced as compared with the conventional case. Furthermore, electrical equipment such as a balloon pump 109 for adjusting the liquid level and a servo motor is arranged in the housing 103 of the electrical equipment section on the opposite side to the sliding direction, and the electrical equipment section housing 103 of the electrical equipment section on the opposite side to the sliding direction is arranged. By using the door 117 whose side wall opens and closes, the space in which the electrical equipment such as the pump 109 and the servo motor is arranged can be easily exposed to the outside, and the pump 109 is divided by the A-A portion as in the past. This eliminates the need to access electrical equipment such as servo motors and servo motors, further improving maintainability.
As described above, the electrical component has a compact structure with a small depth and can easily access the electrical device without dividing the optical molding apparatus during maintenance. It can be made into an integrated housing that does not need to be separated, and there is no need to separate the main unit from the main unit as in conventional machines for transportation and maintenance, and the wiring time for unloading, loading and maintenance can be greatly reduced and rewiring Wiring mistakes can be eliminated.

FIG. 12 is a schematic view of a fourth embodiment of the optical system arrangement chamber 261 provided with the air blowing mechanism of the present invention.
Laser light emitted from the laser oscillator 201 enters the AOM 203 and is emitted from the AOM 203 with a predetermined intensity. A mechanical shutter 205 is disposed between the laser oscillator 201 and the AOM 203 so that laser light can be turned on and off mechanically. The laser beam emitted from the AOM 203 is reflected 90 degrees at two reflection mirrors 207 by the two reflection mirrors 207 because the optical system placement chamber is narrow, and enters the dynamic focus 209. The dynamic focus 209 controls the diameter of the laser beam on the liquid resin liquid surface. Instead of the dynamic focus 209, an Fθ lens can be attached after the carbano scanner 213. The laser light emitted from the dynamic focus 209 is adjusted in focus on the liquid resin liquid surface by the focus lens 211 and then irradiated to the liquid resin liquid surface under the control of the carbano scanner 213 to laminate the modeled object. These optical systems are usually arranged on an optical surface plate 231 (which does not need to use a stone surface plate) made of a stone surface plate that is hardly deformed due to a temperature change or a honeycomb material dedicated to optical equipment. Fans 215 and 217 for forcibly taking in the outside air are attached to the opposing wall surfaces of the optical system housing, and the outside air cools the optical system equipment between the optical system placement chamber and the modeling room. It flows into the modeling room through the penetration cavity for letting the laser light through.
Next, a fifth embodiment of the present invention will be described with reference to FIG.
In FIG. 13, the description of the same configuration as in FIG. 12 is omitted. In the present embodiment, a fan 215 for forcibly taking outside air is attached to the wall surface of the casing closest to the laser oscillator 201 having the largest calorific value among the optical system equipment, and the outside air cools the optical system equipment. Then, it flows into the modeling chamber through the through-cavity for passing the laser beam between the optical system arranging chamber and the modeling chamber.
Next, a sixth embodiment of the present invention will be described with reference to FIG.
14, the description of the same configuration as in FIG. 12 is omitted. In this embodiment, optical devices other than the laser oscillator 201 and the galvano scanner 213 that generate a large amount of heat are covered with a duct 221, and outside air from the fan 215 flows into the duct 221 and passes through the galvano scanner 213. Exhausted into the modeling chamber. The duct 221 has a hole in the path of laser light.
Next, a fourth embodiment of the present invention will be described with reference to FIG. In FIG. 15, the description of the same configuration as in FIG. 12 is omitted. In this embodiment, optical devices other than the laser transmitter 201 and the galvano scanner 213 having a large calorific value among the optical devices are covered with a duct 221, and outside air from the fan 215 is caused to flow into the duct 221 so that the galvano scanner 213 is used. It is exhausted into the modeling room. The duct 221 has a hole in the path of laser light.

As the light source of the modeling room lamp, it is desirable to use white as a solid-state light-emitting element, which has no wavelength in the ultraviolet region and can clearly see the color of the object.
In addition, it is more desirable that the light source is arranged directly above the bathtub that creates the three-dimensional pair shape model.

  The light source desirably emits light having a wavelength only in the visible light region, and preferably has no wavelength in the ultraviolet region. From that point of view, a white LED is used.

  The light source preferably includes a plurality of solid state light emitting elements at predetermined intervals in the arc tube.

16 and 17 show the overall configuration of an optical modeling apparatus according to an embodiment of the present invention.
FIG. 16 is a view of the illumination in the modeling chamber of the present invention as viewed from the front of the modeling chamber (eighth embodiment). FIG. 17 is a cross-sectional view taken along the line BB of FIG. 16 showing the arrangement of illumination in the modeling chamber of the present invention (eighth embodiment).

This stereolithography apparatus includes a casing and a modeling chamber therein, and a three-dimensional shape model is created in the modeling chamber 301.
There is a modeling tank for storing resin since it is formed using a photocurable resin for modeling.
Among the above-described configurations, the light source of the modeling room lamp is particularly noteworthy.
Hereinafter, this point will be described in detail.

  The light source 305 of the modeling room lamp preferably emits only visible light that emits as little ultraviolet light as possible. In this embodiment, a white light LED is used.

  The interior lamp LED of the modeling room may have a narrower irradiation range than conventional fluorescent lamps as a characteristic, and by placing it directly above the bathtub that creates the 3D shape model, the shape and color of the 3D shape model are easy In this embodiment, since a galvano scanner 217 for creating a three-dimensional shape model is arranged immediately above the bathtub in this embodiment, a light emitting tube including a plurality of LED solid state light emitting elements is provided. The irradiation range of the interior lamp of the modeling room 301 is widened, and irradiation is performed at an angle from the upper back corner as viewed from the front in the modeling room.

  The preferred embodiment of the present invention has been described above. However, this embodiment is an example for explaining the present invention, and the present invention is not limited to this embodiment. The present invention can be implemented in various other forms.

FIG. 18 is a conceptual diagram of the slide shutter 401 of the present invention as viewed from the optical system placement chamber. Laser light is transmitted from the optical system placement chamber to the modeling chamber on the optical surface plate 403 for fixing the optical system such as a galvano scanner 421 (not shown in FIG. 18) and the top plate 405 that partitions the modeling room and the optical system placement chamber side. A through cavity 407 for passing through is vacant. Two rail frames 413 for fixing a linear rail 411 for moving the slide shutter 401 are fixed to the frame 409 in the modeling chamber with screws 415. One linear rail 411 is fixed to each of the lower surfaces of the two rail frames 413. Each rail is connected to a guide 413 of the slide shutter 401 and is driven in a direction parallel to the rail 411 by a motor 415 fixed to the slide shutter 401.
A laser power monitor 417 is attached to the slide shutter 401 with a screw 419.
Next, the operation of the slide shutter 401 will be described with reference to FIGS. 19, 20, and 21 shown in the CC cross section of FIG. FIG. 19 shows a state in which the slide shutter 401 is closed. FIG. 20 shows a state where the slide shutter 401 is opened. FIG. 21 shows a state in which the slide shutter 401 is moved so that the laser power monitor 417 is arranged at a predetermined measurement position. The slide shutter 401 is automatically driven by the motor 415 when the door that opens and closes for the operator of the optical modeling apparatus to open, and is positioned so as to cover the through cavity 407 as shown in FIG. Move and be fixed. As a result, the operator can forget to close the slide shutter 401 and perform the operation as in the prior art, and the operation mistake that the liquid resin, modeling waste, etc. are scattered during the operation and the mirror of the galvano scanner is soiled can be eliminated.
Next, as shown in FIG. 20, the slide shutter 401 is automatically driven by the motor 415 when the door that opens and closes for the operator of the optical modeling apparatus to work, and the through-cavity 407. Moves to a position where it does not overlap and is fixed. As a result, it is possible to eliminate a work mistake that a worker forgets to open the slide shutter 401 and starts modeling as in the conventional case, the laser light cannot be irradiated onto the resin liquid surface, the position of the galvanometer mirror, initialization of the computer, etc. There is no wasted time for readjustment. The door opening / closing detection can use a contact-type switch system, an optical system, or the like.
Next, as shown in FIG. 21, the slide shutter 401 is equipped with a power monitor 417 such as a thermal type or a quantum type on the optical system arrangement chamber side in order to measure the intensity of laser light under a predetermined condition. It is moved and fixed to a predetermined position for measuring the laser power. For example, the intensity of laser light may change before or during stereolithography, and if a model is created with laser light of different intensity, the solidified area, depth, hardness, etc. of the liquid resin will change and accuracy will increase. I can not make a good model. Therefore, the laser light intensity is measured at a predetermined interval before the modeling starts or before each layer is modeled, and when the laser beam deviates from the predetermined laser light intensity, the laser beam is controlled by AOM, laser power supply, scanner control, etc. It is important to maintain a predetermined strength.

  FIG. 22 is a front view showing an elevator according to the present invention. 23 is a cross-sectional view taken along line HH in FIG. 24 is a cross-sectional view taken along the line II of FIG. FIG. 25 is a side view of the frame connecting the LM guide and the Z frame of FIG. 22 viewed from the J direction. FIG. 26 is a side view of the frame connecting the LM guide and the Z frame of FIG. 22 as viewed from the D direction. FIG. 27 is a side view of the frame connecting the LM guide and the Z frame of FIG. 22 as viewed from the E direction. 28 is a cross-sectional view taken along line FF in FIG. 29 is a cross-sectional view taken along the line GG in FIG.

  As shown in FIG. 22, the elevator 500 has an LM guide rail 505 attached between an upper frame 501 and a lower frame 503 of the stereolithography apparatus, and a movable frame 509 that connects the movable element 507 of the rail and the Z frame. Is fixed. The movable frame 509 is attached to a ball screw 511 or a linear motor, and is driven in the vertical direction (lifting direction).

  As shown in FIGS. 25 to 29, the movable frame 509 is screwed to the movable element 507 with bolts 513 at 24 locations. The movable frame 509 includes a T-shaped skeleton 515, a Z frame mounting block 517, and a Z frame side block 519. The T-shaped skeleton 515 is provided with 24 through holes 523 in a mounting portion 521 to the mover 507, and is fixed to the mover 507 with bolts 525. Further, even if the Z frame is attached by six reinforcing ribs 527, the reinforcement is strengthened so as not to be deformed to the LM rail side. In addition, eight through holes 531 are formed between the two reinforcing ribs 527 at both ends of the horizontal portion 529 of the T-shaped skeleton 515, and each Z frame mounting block 517 is attached by eight bolts 533. ing. A Z frame side block 519 is attached to the Z frame attachment block 517.

A through-hole 535 is opened in the T-shaped skeleton 515 and the Z-frame attachment block 517, and a screw hole 537 is opened on an extension line of the through-hole 535 of the Z frame side block 519. The Z frame mounting block 517 and the Z frame side block 519 are fixed by a long bolt 539 that penetrates the through hole 535 and the screw hole 537. The depth of the screw hole 537 formed in the Z frame side block 519 and the length of the bolt 539 are lowered by the elevator to the lowest position, and the bolt 539 is loosened from the state where the Z frame is not attached to the bottom of the liquid resin layer. The depth and length are such that the Z frame can be gripped even when the Z frame is attached to the bottom of the liquid resin layer.
Further, by changing the length of the intermediate arm 541 of the Z frame, it is possible to cope with liquid resin tanks having different depths. 543 changes the length of 541. FIG. 31 is a schematic diagram in which a long Z frame is used when making a high-value increase product in the state where the resin tank is deepest in this embodiment. FIG. 32 is a schematic view of the exchangeable Z frame of the present embodiment, in which the resin layer is shallowed with a balloon and a short exchangeable Z frame is used. FIG. 33 is a schematic view in which the interchangeable Z frame of the present embodiment is attached to an elevator in the modeling chamber of the optical modeling apparatus.

The present invention is described in detail below.
FIG. 34 is a top view when the modeling table 601 is fixed to the elevator frame 603. FIG. 35 is an enlarged view of part A in FIG. 34, and is an enlarged view of one end side fixing part for fixing the modeling table 601 to the elevator frame 603 with high positioning accuracy. FIG. 36 is an enlarged view of part B of FIG. 34, and is an enlarged view of the other end side fixing part for fixing the modeling table 601 to the elevator frame 603 with high positioning accuracy. FIG. 37 is a C direction arrow view of FIG. 36 viewed from the side.
As shown in FIGS. 34 and 35, the modeling table 601 has two recesses 603 for positioning on one end side. A positioning pin 605 that is fixed to the frame 603 of the elevator on the pedestal 607 and extends in the horizontal direction is fixed to the position corresponding to the recess 603 of the modeling table 601 with two bolts 609 through the pedestal 607. . The pin 605 has a tip portion and a concave portion 603 formed in a tapered shape so that the pin 605 can be positioned with higher accuracy. An operator can easily position the one end portion of the modeling table 601 in the left, right, up, down, and rotational directions with high accuracy simply by inserting 605 into the two recesses 603.
Next, as shown in FIGS. 34, 36, and 37, a fixing member 613 formed with a downward recessed portion 611 for positioning is fixed to the other end side of the modeling table 601 with three bolts 615. The fixing member 613 is made of a magnetic material, or a magnetic material is fixed next to the recess 611. A second fixing member 619 having a convex member 617 inserted into the concave portion 611 is fixed to the frame 603 of the elevator facing the concave portion 611 of the fixing member 613 by three bolts 621. A permanent magnet 623 such as an alnico magnet, KS steel, MK steel, ferrite magnet, samarium cobalt magnet, or neodymium magnet is fixed next to the convex member 617 of the second fixing member 619. The frame 603 of the elevator and the modeling table 601 are positioned, and the frame 603 of the elevator and the modeling table 601 are strongly fixed by the attraction force between the fixing member 613 and the permanent magnet 623 that are opposed to the permanent magnet 623. Do not move during modeling. The fixing member 613 can be fixed in a well-balanced manner by being arranged at two positions on both ends on the other end side.
With this configuration, as shown in FIG. 38, the operator inserts one end of the L-shaped tool 633 into the modeling table 601 removal hole 631 formed on the modeling table 601, and the L-shaped The modeling table 601 can be easily detached from the elevator frame 603 against the magnetic force by rotating the other end with the bending portion 635 of the tool 633 as a fulcrum. Further, by making the permanent magnet 623 an electromagnet, a magnetic force is generated when the current is turned on, the modeling table 601 is fixed so as not to move, and when the current is turned off, the magnetic force is turned off and the modeling table 601 can be easily removed. It can also be done.
In this embodiment, pins are formed on the frame 603 side of the elevator, but they may be formed on the modeling table 601 side. The permanent magnet is also fixed on the frame 603 side of the elevator, but may be fixed on the modeling table 601 side.
Next, how to remove the modeling table 601 will be described with reference to FIGS.
FIG. 38 shows an instrument for removing the modeling table 601 of the present invention. FIG. 39 is a schematic view in which the instrument of FIG. 38 is attached to remove the modeling table. FIG. 40 is a schematic view showing a state in which the modeling table is removed with the instrument of FIG.
For removing the modeling table 601, first, as shown in FIG. 39, one end 641 side of the two instruments 645 is inserted into two holes 643 on the modeling table 601 side. Next, hold the handle 647 of the instrument 645 and rotate 649 around the fulcrum until the tooth-shaped handle 647 is parallel. As a result, the one end 641 from the fulcrum of the instrument 645 rises in the direction of gravity, and moves the modeling table 601 and the frame 603 away from each other against the magnetic force. By adopting such a configuration, it is possible to remove the easy modeling table 601 with a simple configuration.

An embodiment of a dust removal mechanism in a resin tank of an optical modeling apparatus according to the present invention will be described. First, a schematic configuration of the resin tank of the optical modeling apparatus will be described with reference to FIG. Reference numeral 700 denotes a liquid resin tank 721, and reference numeral 701 denotes a dust removal mechanism 705 for the liquid level sensor 703. The dust removal mechanism 705 is fixed to the side surface of the frame of the liquid resin tank 721 with a fixing screw 707. Reference numerals 723, 725, and 727 are arrangement positions of a balloon fixing table for adjusting the amount of resin according to the lowest position of the modeling table. There is no need to replace the resin tank with a shallow depth when modeling a molded object that does not require depth by placing a balloon between the tables and inflating it. That is, it is possible to form a modeled object with different depths in the same resin tank without significantly increasing or decreasing the amount of liquid resin. Reference numeral 727 denotes an air supply port to the balloon, which is connected to a pump (not shown). Reference numeral 728 denotes a resin supply port for increasing or decreasing the resin in the liquid resin tank 721.
Next, the dust removal mechanism 705 will be described with reference to FIGS. FIG. 42 is a diagram showing a state where the dust removal mechanism 705 is immersed in a liquid resin. FIG. 43 is a diagram showing a state where the dust removal mechanism 705 is completely fried from the liquid resin. FIG. 44 is a perspective view of the relative position of the liquid level sensor when the dust removal mechanism 705 is immersed in the liquid resin. FIG. 45 is a perspective view of the relative position of the liquid level sensor when the dust removal mechanism 705 is completely lifted from the liquid resin.
The bottom surface of the dust removal mechanism 705 of the present embodiment is configured to have a net-like shape, a cavity, or the like so as to remove dust and have the same height as the other liquid surfaces in the dust removal surrounded by the peripheral wall.
42 to 45, the dust removal mechanism 705 is fixed to the liquid resin tank 721 of the dust removal mechanism 705 without changing the fixing position to the fixing surface 131 without removing the fixing screw 707 with respect to the fixing screw 707. A notch 733 is formed for switching between a state immersed in the water and a state fully fried. 42 and 44 show a state where the dust removal mechanism 705 is fixed at the top of the notch 733 and is immersed in a liquid resin. From this state, the fixing screw 707 is loosened, the dust removal mechanism 705 is moved upward, and when the lowest point of the notch 733 is reached, the dust removal mechanism 705 is moved slightly to the right, and the fixing screw 707 is inserted into the recess 735 of the notch 733. By fitting and fixing again, the dust removal mechanism 705 is fixed to the liquid resin tank and completely fried from the liquid resin as shown in FIGS. Therefore, the operator can be prevented from being troubled by the place where the dust removal mechanism 705 is placed, and the complicated work of attaching and detaching can also be eliminated.
As shown in FIGS. 44 and 45, the liquid level sensor is fixed relative to the liquid resin tank, and remains fixed even if the dust removal mechanism 705 moves. Thereby, there is no need to readjust the liquid level sensor 703. As shown in FIG. 44, the dust removal mechanism 705 fixes the dust removal mechanism 705 and the frame 709 of the stereolithography apparatus by a fixing screw 707. The dust removal mechanism 705 can be moved to the upper right side by loosening the fixing screw 707. The fixing screw 707 has a screw detachment prevention mechanism 711 to prevent the fixing screw 707 from being lost.
Another function of the dust removal mechanism 705 is to prevent intrusion of dust, bubbles, etc. floating on the liquid surface in the liquid reservoir 713 when the liquid reservoir 713 is submerged in the resin. The liquid level sensor 703 measures the distance from the liquid level sensor to the liquid level as necessary, such as during modeling. As a specific example of the liquid level sensor 703, light emitted from the light emitting element is reflected by the liquid level of the liquid reservoir of the dust removal mechanism 705, and the reflected light is received by the light receiving element in time. Measure. By using the dust removal mechanism 705, erroneous measurement of the distance from the liquid level sensor 703 to the liquid level due to dust or bubbles floating on the liquid level can be prevented.
FIG. 46 shows an apparatus for measuring the relative position of the recoater 751 with the liquid level by the liquid level sensor 703. A recoater level 757 having a flat plate 755 extending in the horizontal direction at the same height as the recoater 751 cutting edge 753 is mounted on the recoater 751, and the top surface of the recoater 751 of the recoater 751 having the same height as the cutting edge 753 is liquid level. By measuring with the sensor 703, the recoater blade edge 753 and the liquid resin surface are adjusted to have the same height. In this case, the dust removal mechanism 705 is fixed in a state where it is completely lifted from the liquid surface so as not to interfere with the flat plate 755.
FIG. 47 is a view for saving the resin by fixing the block 761 so as not to interfere with the arm in the dead space in the liquid resin tank which is not necessary for optical modeling for raising and lowering the arm of the table elevator in the liquid resin tank. It is the schematic of a structure. Thereby, useless resin which does not contribute to optical modeling can be eliminated.

FIG. 48 is a side sectional view of the recoater of the present invention. FIG. 49 is a top sectional view of the recoater of the present invention. FIG. 50 is an enlarged view of the vertical maintaining mechanism of the movable blade of the present invention. FIG. 51 is a vertical cross-sectional view of the recoater at the reversely supported valve portion (when the blade is lowered). FIG. 52 is a longitudinal sectional view of the reverse support valve portion of the recoater (when the blade is raised). FIG. 53 is a cross-sectional view of the check valve portion of the present invention. FIG. 54 is a horizontal sectional view of the check valve portion of the present invention. FIG. 55 is a horizontal sectional view of the check valve portion of the present invention.
In the figure, reference numeral 801 denotes a blade. The blade 801 extends in the horizontal direction, and the cross-sectional shape is an inverted U shape as shown in FIG. A space opened downward is formed inside the blade 801, and the blade 801 is submerged in a liquid resin as shown in FIG. Liquid resin is accumulated in the space opened downward in the raid 801, and when the blade 801 is returned to the recoat position as shown in FIG. 52, the liquid resin accumulated in the space is prevented from escaping. The liquid surface is flattened while supplying the liquid resin to the liquid surface during recoating.
The blade 801 is driven by a motor 803 as shown in FIGS. At this time, vertical guides 805 are provided on the recoater at both ends of the recoater so that the blade 801 moves horizontally even if the blade 801 moves up and down. 50, a cylindrical member 807 having a large diameter is fixed to a blade 801 as shown in FIG. 50, and the rail 805 is fixed to a recoater housing 809 and passed through a hollow cylindrical rail member 811 so that the rail 805 is horizontal. It is possible to move up and down while maintaining.
When the blade 801 is submerged in the liquid resin and then lifted again, the blade 801 is filled with the liquid resin and becomes heavier, and the spring is extended when the blade is submerged to reduce the burden on the motor 803 and shorten the time for lifting. Three 813 are attached between the blade 801 and the housing 809.
Further, a check valve 815 is attached to the upper surface of the blade 801 as shown in FIGS. As shown in FIG. 51, the check valve 815 is closed at the recoat position by the first valve portion 821. The first valve portion 821 is closed by bringing the valve body 825 into close contact with the valve seat 829 formed in the hole 827 that communicates with the space in the blade 801 by the spring force of the spring 823. Next, the first valve portion 821 is opened when being submerged in the liquid resin shown in FIG. 52 from the recoat position shown in FIG. 51, and then the second valve body 831 shown in FIGS. Residual air in 801 escapes into the atmosphere. As shown in FIGS. 53 to 55, the details of the second valve body 831 are as follows. The second valve body 837 is inserted so that the pin 833 is provided in the cylinder and supported by the pin 833. The second valve body 837 falls and closes the hole 827. When the valve is opened, the pressure in the blade 801 increases, and the air is pushed up by the internal air so that the air is released. Further, when the blade 801 is returned from the state shown in FIG. 52 to the recoat position shown in FIG. 51, the pressure in the blade 801 becomes negative, so that the force that the valve body 837 closes the hole 827 by atmospheric pressure works. The liquid resin does not leak.
A drop prevention member 841 is attached to the upper end of the pin 833 so that the second valve body 837 does not come off.

FIG. 56 shows a first embodiment of the present invention.
In a liquid resin 903 in the liquid resin tank 901, water or an aqueous solution 905 is placed in a corrosion-resistant container, for example, a glass container, and the mouth 907 of the container is covered with a special film 111 through which only water passes. A semipermeable membrane is used as a special membrane. The container is submerged in the liquid resin so that the mouth 907 of the container faces downward so that the water or aqueous solution 905 in the container is always in contact with a special film. By doing so, since a predetermined amount of water flows from the special film into the liquid resin at a predetermined ratio, the moisture concentration of the liquid resin is set to the predetermined moisture concentration without providing a special constant humidity layer even in a dry state. Can be maintained. Furthermore, by using a special aqueous solution, the moisture in the resin layer can be removed even if the moisture concentration in the liquid resin increases not only in a dry state but also in a high humidity state. Can be maintained.
As the semipermeable membrane, a porous membrane such as regenerated cellulose (cellophane), acetylcellulose, polyacrylonitrile, Teflon (registered trademark), polyester polymer alloy, Visking, Millipore or polysulfone is used. As characteristics of this example, 4.5 g of pure water was put in a 200 cc beaker in an atmosphere with a humidity of about 20% RH, and when the surface area of the porous film was 0.74 cm 2, the pore diameter of the porous film was large. The tendency for the amount of water movement to be larger was observed. As a relatively large hole diameter, φ = 0.2 μm to 10.0 μm was used.
When a porous film having a small pore diameter of about 2 nm is used, the flow rate of water is reduced, but components in the resin rarely enter the beaker through the porous film. Therefore, the osmotic pressure is not affected. Therefore, the amount of moisture movement is adjusted by the surface area of the membrane.
FIG. 57 shows a second embodiment of the present invention.
Reference numeral 951 denotes an elevator for the modeling table, which is moved up and down by an arm 953 in the vertical direction of the arrow. Reference numeral 955 denotes a flat tank 957 of water or an aqueous solution having an inlet 959. The lower surface of the tank 207 is covered with a permeable membrane 961 as the bottom surface of the tank 957, and water in the tank permeates into the liquid resin from the outer osmotic membrane 961 or moisture in the liquid resin penetrates into the tank. By disposing the tank directly under the modeling table, there is also an advantage that the moisture in the liquid resin is agitated without unevenness of the concentration by the lifting and lowering operation of the modeling table.

The optical three-dimensional modeling apparatus of the present invention effectively uses a high-quality three-dimensional modeled object having excellent dimensional accuracy and appearance and high strength at a high modeling speed and high modeling accuracy with high productivity. be able to.
And the optical three-dimensional model | molding apparatus of this invention can be effectively used for manufacture of the various three-dimensional model | molding thing ranging from small size to large size.
In the case of the optical three-dimensional modeling apparatus of the present invention, models for precision parts, electrical / electronic parts, furniture, building structures, automobile parts, various containers, castings, molds, mother molds, etc. Smoothly design parts for complex heat transfer circuits, parts for analysis planning of heat transfer behavior of complex structures, and other various 3D objects with complicated shapes and structures with high modeling speed and dimensional accuracy Can be manufactured.

DESCRIPTION OF SYMBOLS 10 Radiation apparatus 12 Radiation beam 12 'Modulated radiation beam 14 Modulator 16 Deflection means 20, 22 Mirror 24, 26 Motor 40 Liquid photocurable composition 41 Modeling table 42 Elevator motor 43 Doctor knife 40 Container 100 Optical molding apparatus DESCRIPTION OF SYMBOLS 103 Case of electrical part 105 Case of main body 107 Wall 109 Rear surface, Pump 111 Membrane 117 Door 121 Monitor of control computer 123 Keyboard of control computer 125 Operation switch of stereolithography apparatus, mouse 127 Table 129 Linear guide 131 Fixed surface 143 Laser Power supply 145 Control computer main body 151 Maintenance space 201 Laser oscillator 203 AOM
205 Mechanical shutter 207 Reflection mirror 209 Dynamic focus 211 Focus lens 213 Carbano scanner 215, 217 Fan 221 Duct

Claims (8)

By selectively irradiating a thin layer of an uncured photocurable resin with light, and repeating the process of forming a cross-section cured layer corresponding to the light irradiation area, a three-dimensional photo-cured model in which the cross-section hardened layer is laminated is obtained. An optical modeling apparatus for modeling,
In the liquid resin tank storing the uncured photocurable resin, a dust prevention mechanism is attached to the uncured photocurable resin, and the uncured photocuring of the liquid reservoir in the dust prevention mechanism is performed. Place the liquid level sensor to measure the liquid level of the adhesive resin ,
The liquid level sensor
It is fixed relative to the liquid resin tank, and remains fixed even if the dust removal mechanism moves .
An optical modeling apparatus characterized by that. The dust removal mechanism is
It is fixed to the frame of the optical modeling apparatus by a fixing screw, and can be moved by loosening the fixing screw.
The optical modeling apparatus according to claim 1 . The liquid level sensor
Measure the relative position between the recoater and the liquid level of the uncured photocurable resin ,
The optical modeling apparatus according to claim 1 or 2, characterized in that By selectively irradiating a thin layer of an uncured photocurable resin with light, and repeating the process of forming a cross-section cured layer corresponding to the light irradiation area, a three-dimensional photo-cured model in which the cross-section hardened layer is laminated is obtained. An optical modeling apparatus for modeling,
In the liquid resin tank storing the uncured photocurable resin, a dust prevention mechanism is attached to the uncured photocurable resin, and the uncured photocuring of the liquid reservoir in the dust prevention mechanism is performed. Place the liquid level sensor to measure the liquid level of the adhesive resin ,
The liquid level sensor
Measure the relative position between the recoater and the liquid level of the uncured photocurable resin ,
An optical modeling apparatus characterized by that. The recoater is equipped with a recoater level having a flat plate extending in the horizontal direction at the same height as the cutting edge of the recoater,
The upper surface having the same height as the cutting edge of the flat plate recoater is measured by the liquid level sensor so that the cutting edge of the recoater and the liquid level of the uncured photocurable resin are adjusted to the same height. ,
The optical modeling apparatus according to claim 3 or 4 , wherein The dust removal mechanism is
It is fixed in a state where it is completely fried from the liquid level of the uncured photocurable resin so as not to interfere with the flat plate,
The optical modeling apparatus according to claim 5 . By selectively irradiating a thin layer of an uncured photocurable resin with light, and repeating the process of forming a cross-section cured layer corresponding to the light irradiation area, a three-dimensional photo-cured model in which the cross-section hardened layer is laminated is obtained. An optical modeling method for modeling,
Attaching dust prevention to the uncured photocurable resin in a liquid resin tank storing the uncured photocurable resin;
Measuring a liquid level of the uncured photocurable resin dodging the dust, only including,
The step of measuring the liquid level is:
The liquid level sensor fixed relative to the liquid resin tank allows the liquid level height of the uncured photo-curing resin to prevent the dust in a fixed state even if the dust removal moves. To measure ,
An optical modeling method characterized by that. By selectively irradiating a thin layer of an uncured photocurable resin with light, and repeating the process of forming a cross-section cured layer corresponding to the light irradiation area, a three-dimensional photo-cured model in which the cross-section hardened layer is laminated is obtained. An optical modeling method for modeling,
Attaching dust prevention to the uncured photocurable resin in a liquid resin tank storing the uncured photocurable resin;
Measuring the liquid level height of the uncured photocurable resin that prevents the dust based on the relative position between the recoater and the liquid level of the uncured photocurable resin , and
An optical modeling method characterized by that.