JP5899010B2 - ANANTHOLENE COMPOUND AND PROCESS FOR PRODUCING THE SAME - Google Patents
ANANTHOLENE COMPOUND AND PROCESS FOR PRODUCING THE SAME Download PDFInfo
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- JP5899010B2 JP5899010B2 JP2012049515A JP2012049515A JP5899010B2 JP 5899010 B2 JP5899010 B2 JP 5899010B2 JP 2012049515 A JP2012049515 A JP 2012049515A JP 2012049515 A JP2012049515 A JP 2012049515A JP 5899010 B2 JP5899010 B2 JP 5899010B2
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- 150000001875 compounds Chemical class 0.000 title claims description 82
- 238000000034 method Methods 0.000 title claims description 14
- 125000005843 halogen group Chemical group 0.000 claims description 27
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 16
- 229910052740 iodine Inorganic materials 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 8
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims description 7
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 125000004434 sulfur atom Chemical group 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910000000 metal hydroxide Inorganic materials 0.000 claims description 4
- 150000004692 metal hydroxides Chemical class 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 125000002252 acyl group Chemical group 0.000 claims description 3
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 125000004185 ester group Chemical group 0.000 claims description 3
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 3
- 125000004437 phosphorous atom Chemical group 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical group S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 125000005358 mercaptoalkyl group Chemical group 0.000 claims 2
- 125000004429 atom Chemical group 0.000 claims 1
- -1 anthanthrene compound Chemical class 0.000 description 33
- 238000006243 chemical reaction Methods 0.000 description 32
- YFIJJNAKSZUOLT-UHFFFAOYSA-N Anthranthrene Natural products C1=C(C2=C34)C=CC=C2C=CC3=CC2=CC=CC3=CC=C1C4=C32 YFIJJNAKSZUOLT-UHFFFAOYSA-N 0.000 description 19
- 239000004065 semiconductor Substances 0.000 description 17
- 239000000243 solution Substances 0.000 description 12
- 125000001424 substituent group Chemical group 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 9
- 239000002585 base Substances 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 8
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 8
- 238000005160 1H NMR spectroscopy Methods 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 6
- 238000007363 ring formation reaction Methods 0.000 description 6
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 5
- 230000008030 elimination Effects 0.000 description 5
- 238000003379 elimination reaction Methods 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 5
- 239000002243 precursor Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- PJKVFARRVXDXAD-UHFFFAOYSA-N 2-naphthaldehyde Chemical group C1=CC=CC2=CC(C=O)=CC=C21 PJKVFARRVXDXAD-UHFFFAOYSA-N 0.000 description 4
- RWUAVQBAQUVXMG-UHFFFAOYSA-N 4-(3-formyl-2-hydroxy-5,6,8-triiodonaphthalen-1-yl)-3-hydroxy-5,7,8-triiodonaphthalene-2-carbaldehyde Chemical group Oc1c(C=O)cc2c(I)c(I)cc(I)c2c1-c1c(O)c(C=O)cc2c(I)c(I)cc(I)c12 RWUAVQBAQUVXMG-UHFFFAOYSA-N 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- HFYVIGDULLDRMK-UHFFFAOYSA-N C1=C(I)C(I)=C2C=C(C=O)C(O)=CC2=C1I Chemical compound C1=C(I)C(I)=C2C=C(C=O)C(O)=CC2=C1I HFYVIGDULLDRMK-UHFFFAOYSA-N 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical group 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 3
- 150000004004 2-naphthaldehydes Chemical class 0.000 description 3
- 0 C*c1c(*)c(*)c(*)c2c(*)c(NO)c(*)c(-c(c(c(N)c(*)c(*)c3*)c3c(*)c3NO)c3N)c12 Chemical compound C*c1c(*)c(*)c(*)c2c(*)c(NO)c(*)c(-c(c(c(N)c(*)c(*)c3*)c3c(*)c3NO)c3N)c12 0.000 description 3
- FEPYSAJHNAPJIH-UHFFFAOYSA-N C1=C(I)C(I)=C2C=C(C=O)C(OS(=O)(=O)C(F)(F)F)=CC2=C1I Chemical compound C1=C(I)C(I)=C2C=C(C=O)C(OS(=O)(=O)C(F)(F)F)=CC2=C1I FEPYSAJHNAPJIH-UHFFFAOYSA-N 0.000 description 3
- RIIHWYZIXUSBHL-UHFFFAOYSA-N C1=CC(=CC2=C1C=CC(=C2I)I)C=O Chemical compound C1=CC(=CC2=C1C=CC(=C2I)I)C=O RIIHWYZIXUSBHL-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001242 acetic acid derivatives Chemical class 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 230000026030 halogenation Effects 0.000 description 3
- 238000005658 halogenation reaction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 235000010265 sodium sulphite Nutrition 0.000 description 3
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical group C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical group C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 238000006356 dehydrogenation reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 238000005691 oxidative coupling reaction Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 2
- 235000011056 potassium acetate Nutrition 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003797 solvolysis reaction Methods 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- 125000004665 trialkylsilyl group Chemical group 0.000 description 2
- 125000005951 trifluoromethanesulfonyloxy group Chemical group 0.000 description 2
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 description 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- 125000004916 (C1-C6) alkylcarbonyl group Chemical group 0.000 description 1
- 125000006700 (C1-C6) alkylthio group Chemical group 0.000 description 1
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 description 1
- 125000006713 (C5-C10) cycloalkyl group Chemical group 0.000 description 1
- RDZHCKRAHUPIFK-UHFFFAOYSA-N 1,3-diiodo-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(I)C(=O)N(I)C1=O RDZHCKRAHUPIFK-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 description 1
- 125000005915 C6-C14 aryl group Chemical group 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- VGEXGCHOEOCOIZ-UHFFFAOYSA-N O=Cc(c(O1)c(c2c(cc3I)Oc4c(C=O)cc56)-c4c5c1cc(I)c6I)cc2c3I Chemical compound O=Cc(c(O1)c(c2c(cc3I)Oc4c(C=O)cc56)-c4c5c1cc(I)c6I)cc2c3I VGEXGCHOEOCOIZ-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 238000006161 Suzuki-Miyaura coupling reaction Methods 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical group C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000004171 alkoxy aryl group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003435 aroyl group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 1
- 125000005279 aryl sulfonyloxy group Chemical group 0.000 description 1
- 150000003976 azacycloalkanes Chemical group 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- VSGNNIFQASZAOI-UHFFFAOYSA-L calcium acetate Chemical compound [Ca+2].CC([O-])=O.CC([O-])=O VSGNNIFQASZAOI-UHFFFAOYSA-L 0.000 description 1
- 239000001639 calcium acetate Substances 0.000 description 1
- 235000011092 calcium acetate Nutrition 0.000 description 1
- 229960005147 calcium acetate Drugs 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 150000003997 cyclic ketones Chemical class 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005695 dehalogenation reaction Methods 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
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- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
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- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
Description
本発明は、新規なアンタントレン系化合物およびその製造方法に関する。 The present invention relates to a novel anthanthrene compound and a method for producing the same.
近年、シリコンに代表される無機半導体に代わる材料として、有機半導体が注目されている。このような有機半導体は、例えば、有機エレクトロルミネセンス素子(OLED)、太陽電池やトランジスタなどに用いられており、特に、無機半導体に比べフレキシブル性に優れ、また、分子構造を制御することで溶媒に可溶化できるため、ロール・ツー・ロールによる印刷で形成するプリンテッドエレクトロニクス分野などにおいて期待されている。 In recent years, organic semiconductors have attracted attention as materials that can replace inorganic semiconductors typified by silicon. Such organic semiconductors are used, for example, in organic electroluminescence elements (OLEDs), solar cells, transistors, and the like. In particular, they are superior in flexibility compared to inorganic semiconductors, and are controlled by controlling the molecular structure. Therefore, it is expected in the field of printed electronics formed by roll-to-roll printing.
このような有機半導体のうち、低分子の有機半導体としては、ペンタセンに代表されるアセン骨格を有する分子が、高い半導体特性を示すことが知られている。しかしながら、アセン骨格は、分子内に反応活性部位を持ち、酸化されやすいため大気安定性に課題があり、より安定な分子が求められている。 Among such organic semiconductors, as a low molecular organic semiconductor, it is known that a molecule having an acene skeleton typified by pentacene exhibits high semiconductor characteristics. However, since the acene skeleton has a reactive site in the molecule and is easily oxidized, there is a problem in atmospheric stability, and a more stable molecule is required.
このような安定性の問題などの改善を目的として、例えば、ペリ(peri)−キサンテノキサンテン骨格を有する特定のアンタントレン系化合物が有機半導体として開発されつつあり[例えば、特開2010−6794号公報(特許文献1)、特表2009−544743号号公報(特許文献2)、Chem.Mater.2009,21,552−556頁(非特許文献1)など]、このような有機半導体のデバイスへの応用が期待される。なお、これらの文献には、種々のアンタントレン骨格を有する化合物が開示されているが、アンタトレン(ジオキサアンタントレン)骨格の特定の置換位置にホルミル基(さらにはハロゲン原子)が置換した化合物については開示がない。 For the purpose of improving such a stability problem, for example, a specific antanthrene-based compound having a peri-xanthenoxanthene skeleton is being developed as an organic semiconductor [for example, Japanese Patent Application Laid-Open No. 2010-6794 Gazette (patent document 1), Japanese translations of PCT publication No. 2009-544743 (patent document 2), Chem. Mater. 2009, 21, 552-556 (Non-Patent Document 1) etc.], application to such an organic semiconductor device is expected. Although these documents disclose compounds having various anthanthrene skeletons, the compounds in which a formyl group (and further a halogen atom) is substituted at a specific substitution position of an anthanthrene (dioxaanthanthrene) skeleton are disclosed. Is not disclosed.
なお、このようなアンタントレン化合物は、例えば、特許文献2にも開示されているように、1,1’−ビ−2−ナフトール類の酸化カップリングなどにより合成されている。しかしながら、このような方法では、1,1’−ビ−2−ナフトール類の置換基の位置や構造によっては酸化カップリング反応が進行しにくく低収率になる場合がある。 Such an anthanthrene compound is synthesized, for example, by oxidative coupling of 1,1′-bi-2-naphthols as disclosed in Patent Document 2. However, in such a method, depending on the position and structure of the substituent of 1,1'-bi-2-naphthols, the oxidative coupling reaction may not proceed easily and the yield may be low.
また、特開2011−12001号公報(特許文献3)には、臭素化されたジオキサアンタントレンの反応(鈴木−宮浦カップリング反応)を利用して、p−エチルフェニル基などの置換基を導入したり、オリゴマー化する技術が開示されている。しかし、このような方法では、官能基を高い位置選択性で導入するのが難しく、分子設計上の課題がある。 JP 2011-12001 (Patent Document 3) discloses a substituent such as a p-ethylphenyl group using a reaction of brominated dioxaanthanthrene (Suzuki-Miyaura coupling reaction). Techniques for introducing or oligomerizing are disclosed. However, in such a method, it is difficult to introduce a functional group with high regioselectivity, and there is a problem in molecular design.
このような状況下、新たなアンタントレン系化合物や合成方法の開発が求められている。 Under such circumstances, development of new anthanthrene compounds and synthesis methods is demanded.
従って、本発明の目的は、有機半導体やその中間体(前駆体)などとして有用な新規アンタントレン系化合物を提供することにある。 Accordingly, an object of the present invention is to provide a novel anthanthrene compound useful as an organic semiconductor or an intermediate (precursor) thereof.
本発明の他の目的は、上記のようなアンタントレン系化合物を効率よく製造できる方法を提供することにある。 Another object of the present invention is to provide a method capable of efficiently producing the above-described anthanthrene-based compound.
本発明者は、前記課題を達成するため鋭意検討した結果、2,2’−ジヒドロキシ(又はメルカプト)−3,3’−ジホルミル−8,8’−ジハロ−1,1’−ビナフチル骨格を有する化合物などが、意外にも、1位と8’位との間および1’位と8位との間でそれぞれ容易にハロゲン化水素などの脱離を伴って環化し、ジオキサアンタントレン骨格などを形成すること、このような反応により得られる新規なアンタントレン系化合物(ジオキサアンタントレン骨格を有する化合物など)は、有機半導体としてそのまま用いることができる他、官能基であるホルミル基(さらにはハロゲン原子などの置換基)を有しているため、容易に変性(置換基の変換)が可能であり、所望の有機半導体の中間体(又は前駆体)として好適であることを見出し、本発明を完成した。 As a result of intensive studies to achieve the above object, the present inventor has a 2,2′-dihydroxy (or mercapto) -3,3′-diformyl-8,8′-dihalo-1,1′-binaphthyl skeleton. Surprisingly, a compound or the like is easily cyclized between the 1-position and the 8′-position and between the 1′-position and the 8-position with elimination of hydrogen halide or the like, and a dioxaanthanthrene skeleton, etc. In addition to being able to be used as an organic semiconductor as is, a novel antanthrene-based compound obtained by such a reaction (such as a compound having a dioxaanthanthrene skeleton) can be used as a functional group, a formyl group (further, Since it has a substituent (such as a halogen atom), it can be easily modified (substituent conversion) and is suitable as an intermediate (or precursor) for a desired organic semiconductor. And, to complete the present invention.
すなわち、本発明の化合物は、下記式(1)で表される。 That is, the compound of the present invention is represented by the following formula (1).
(式中、Eは酸素原子又は硫黄原子、R1〜R4は同一又は異なって水素原子又は置換基を示し、R1とR2、R2とR3又はR3とR4は互いに結合して環を形成していてもよい。)
上記式(1)において、R1〜R4の少なくとも1つがハロゲン原子(臭素原子、ヨウ素原子など)であってもよく、特に、R2〜R4の少なくとも1つがハロゲン原子(特に、ヨウ素原子)であってもよい。代表的には、式(1)において、R1が水素原子であり、R2〜R4の少なくとも2つがヨウ素原子であってもよく、特に式(1)において、Eが酸素原子であり、R1およびR4が水素原子であり、R2およびR3がヨウ素原子であってもよい。
(In the formula, E represents an oxygen atom or a sulfur atom, R 1 to R 4 are the same or different and represent a hydrogen atom or a substituent, and R 1 and R 2 , R 2 and R 3, or R 3 and R 4 are bonded to each other. And may form a ring.)
In the above formula (1), at least one of R 1 to R 4 may be a halogen atom (bromine atom, iodine atom, etc.), and in particular, at least one of R 2 to R 4 is a halogen atom (particularly an iodine atom). ). Typically, in formula (1), R 1 may be a hydrogen atom, and at least two of R 2 to R 4 may be iodine atoms. In particular, in formula (1), E is an oxygen atom, R 1 and R 4 may be a hydrogen atom, and R 2 and R 3 may be an iodine atom.
本発明には、下記式(2)で表される化合物を、反応(環化反応)させる(又は式(2)で表される化合物からHXを脱離させる)ことにより、前記化合物(前記式(1)で表される化合物)を製造する方法も含まれる。 In the present invention, the compound represented by the following formula (2) is reacted (cyclization reaction) (or HX is eliminated from the compound represented by the formula (2)), whereby the compound (the above formula: A method for producing a compound represented by (1) is also included.
(式中、Xは基−EHと反応して脱離可能な脱離基を示し、E、R1〜R4は前記と同じ。)
上記式(2)において、Xは、ハロゲン原子、特に、ヨウ素原子であってもよい。
(In the formula, X represents a leaving group that can be removed by reacting with the group -EH, and E and R 1 to R 4 are the same as above.)
In the above formula (2), X may be a halogen atom, particularly an iodine atom.
前記方法では、塩基(例えば、カルボン酸金属塩および金属水酸化物から選択された少なくとも1種)の存在下で、式(2)で表される化合物を反応させてもよい。 In the method, the compound represented by the formula (2) may be reacted in the presence of a base (for example, at least one selected from carboxylic acid metal salts and metal hydroxides).
前記のように、本発明の式(1)で表される化合物(ジオキサアンタントレン系化合物など)は、有機半導体又はその中間体として好適である。そのため、本発明には、前記式(1)で表される化合物(又はその誘導体)を含む電子デバイス(例えば、光電変換素子、スイッチング素子及び整流素子から選択された一種)も含まれる。 As described above, the compound represented by the formula (1) of the present invention (such as a dioxaanthanthrene compound) is suitable as an organic semiconductor or an intermediate thereof. Therefore, the present invention also includes an electronic device (for example, one selected from a photoelectric conversion element, a switching element, and a rectifying element) including the compound represented by the formula (1) (or a derivative thereof).
また、本発明には、前記式(1)で表される化合物の前駆体となりうる化合物の新規な製造方法が含まれる。すなわち、この方法は、下記式(2a−1)で表される化合物を製造する方法であって、
下記式(2b−1)で表される化合物と、N,N−ジハロ−5,5−ジアルキルヒダントイン(例えば、N,N−ジヨード−5,5−ジメチルヒダントイン)とを反応させて下記式(2b−2)で表される化合物を得る工程と、
この工程で得られた(2b−2)で表される化合物とN,N−ジハロ−5,5−ジアルキルヒダントインおよびトリフルオロメタンスルホン酸とを反応させて下記式(2c−1)で表される化合物を得る工程と、
この工程で得られた下記式(2c−1)で表される化合物を加溶媒分解して下記式(2a−1)で表される化合物を得る工程とを含む。
Further, the present invention includes a novel method for producing a compound that can be a precursor of the compound represented by the formula (1). That is, this method is a method for producing a compound represented by the following formula (2a-1),
A compound represented by the following formula (2b-1) and N, N-dihalo-5,5-dialkylhydantoin (for example, N, N-diiodo-5,5-dimethylhydantoin) are reacted to form the following formula ( A step of obtaining a compound represented by 2b-2);
The compound represented by (2b-2) obtained in this step is reacted with N, N-dihalo-5,5-dialkylhydantoin and trifluoromethanesulfonic acid and represented by the following formula (2c-1). Obtaining a compound;
And solvolysis of the compound represented by the following formula (2c-1) obtained in this step to obtain a compound represented by the following formula (2a-1).
(式中、X1はハロゲン原子、R1a〜R4aは水素原子又はハロゲン原子であり、R1a〜R4aの少なくとも1つ(例えば、R2a及び/又はR3a)はハロゲン原子である。) (Wherein, X 1 is a halogen atom, R 1a to R 4a are hydrogen atoms or halogen atoms, and at least one of R 1a to R 4a (for example, R 2a and / or R 3a ) is a halogen atom. )
本発明の新規な化合物は、特定位置にホルミル基を有する新規なアンタントレン系化合物であり、有機半導体やその中間体(前駆体)などとして有用である。また、本発明の方法では、このようなアンタントレン系化合物を、環化反応させる(代表的には塩基の存在下で反応させる)という簡便又は容易な方法により、効率よく製造できる。 The novel compound of the present invention is a novel anthrene compound having a formyl group at a specific position, and is useful as an organic semiconductor or an intermediate (precursor) thereof. In the method of the present invention, such an anthanthrene compound can be efficiently produced by a simple or easy method of cyclization reaction (typically reaction in the presence of a base).
[アンタントレン系化合物]
本発明の化合物(アンタントレン系化合物、アンタントレン骨格を有する化合物)は、下記式(1)で表される。
[Anthanthrene compounds]
The compound of the present invention (anthanthrene-based compound, compound having an anthanthrene skeleton) is represented by the following formula (1).
(式中、Eは酸素原子又は硫黄原子、R1〜R4は同一又は異なって水素原子又は置換基を示し、R1とR2、R2とR3又はR3とR4は互いに結合して環を形成していてもよい。)
上記式(1)において、Eは酸素原子又は硫黄原子であり、2つのEは同一又は異なっていてもよい。好ましいEは酸素原子であってもよい。
(In the formula, E represents an oxygen atom or a sulfur atom, R 1 to R 4 are the same or different and represent a hydrogen atom or a substituent, and R 1 and R 2 , R 2 and R 3, or R 3 and R 4 are bonded to each other. And may form a ring.)
In said formula (1), E is an oxygen atom or a sulfur atom, and two E may be the same or different. Preferred E may be an oxygen atom.
前記式(1)において、R1〜R4で表される置換基としては、特に限定されず、例えば、炭化水素基[例えば、アルキル基(例えば、メチル、エチル、プロピル、イソプロピル、ブチル、s−ブチル、t−ブチル、ペンチル基などの直鎖状又は分岐鎖状C1−10アルキル基、好ましくはC1−6アルキル基、さらに好ましくはC1−4アルキル基)、ハロアルキル基(例えば、クロロメチル、トリクロロメチル、トリフルオロメチル、テトラフルオロプロピル基などのハロC1−4アルキル基など)、アルケニル基(例えば、ビニル、プロペニル、イソプロペニル、ブテニル基などのC2−6アルケニル基、好ましくはC2−4アルケニル基)、シクロアルキル基(例えば、シクロヘキシル基などのC5−10シクロアルキル基)、アリール基(例えば、フェニル基、メチルフェニル基(トリル基)、エチルフェニル基、ジメチルフェニル基(キシリル基)、ナフチル基などのC6−14アリール基)、アラルキル基(例えば、ベンジル、フェネチル基などのC6−10アリール−C1−4アルキル基)など]、ハロゲン原子(例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子など)、ヒドロキシル基、メルカプト基、(チオ)エーテル基[例えば、アルコキシ基(例えば、メトキシ、エトキシ、ブトキシ、t−ブトキシ基などのC1−6アルコキシ基)、アルキルチオ基(例えば、メチルチオ基などの上記アルコキシ基に対応するC1−6アルキルチオ基など)、アリールオキシ基(フェノキシ基などのC6−10アリールオキシ基)など]、ヒドロキシアルキル基(例えば、ヒドロキシメチル、ヒドロキシエチル基などのヒドロキシC1−10アルキル基)、メルカプトアルキル基(例えば、メルカプトメチル、メルカプトエチル基などのメルカプトC1−10アルキル基)、ホルミル基、アシル基[例えば、アルキルカルボニル基(例えば、アセチル、プロピオニル基などのC1−6アルキル−カルボニル基)、アロイル基(例えば、ベンゾイル基など)など]、カルボキシル基、エステル基[例えば、アルコキシ−カルボニル基(メトキシカルボニル、エトキシカルボニル、ブトキシカルボニル基などのC1−6アルコキシ−カルボニル基)、アリールオキシカルボニル基(フェノキシカルボニル基など)など]、アミノ基、置換アミノ基(例えば、ジメチルアミノ基などのアルキルアミノ基)、カルバモイル基、ニトロ基、シアノ基、ケイ素原子含有基{例えば、シリル基[例えば、トリアルキルシリル基(例えば、トリメチルシリル基、t−ブチルジメチルシリル基などのC1−10トリアルキルシリル基)などの置換シリル基]など}、リン原子含有基{例えば、ホスフィノ基[例えば、ジアリールホスフィノ基(例えば、ジフェニルホスフィノ基などのC6−10アリールホスフィノ基)など]、ホスフィニル基[例えば、ジアリールホスフィニル基(例えば、ジフェニルホスフィニル基などのジC6−10アリールホスフィニル基)など]など}、これらの置換基同士が結合した置換基[例えば、アルコキシアリール基(例えば、メトキシフェニル基などのC1−4アルコキシC6−10アリール基)など]などが挙げられる。 In the formula (1), the substituent represented by R 1 to R 4 is not particularly limited, and examples thereof include hydrocarbon groups [eg, alkyl groups (eg, methyl, ethyl, propyl, isopropyl, butyl, s A linear or branched C 1-10 alkyl group such as -butyl, t-butyl, pentyl group, preferably a C 1-6 alkyl group, more preferably a C 1-4 alkyl group), a haloalkyl group (for example, Halo C 1-4 alkyl groups such as chloromethyl, trichloromethyl, trifluoromethyl, tetrafluoropropyl groups, etc.), alkenyl groups (for example, C 2-6 alkenyl groups such as vinyl, propenyl, isopropenyl, butenyl groups, preferably Is a C2-4 alkenyl group), a cycloalkyl group (for example, a C5-10 cycloalkyl group such as a cyclohexyl group). , Aryl groups (eg, C 6-14 aryl groups such as phenyl group, methylphenyl group (tolyl group), ethylphenyl group, dimethylphenyl group (xylyl group), naphthyl group), aralkyl groups (eg, benzyl, phenethyl group) C 6-10 aryl-C 1-4 alkyl group, etc.]], halogen atom (eg, fluorine atom, chlorine atom, bromine atom, iodine atom etc.), hydroxyl group, mercapto group, (thio) ether group [eg, An alkoxy group (for example, a C 1-6 alkoxy group such as methoxy, ethoxy, butoxy, t-butoxy group), an alkylthio group (for example, a C 1-6 alkylthio group corresponding to the above alkoxy group such as a methylthio group), an aryloxy group (C 6-10 aryloxy groups such as phenoxy group), hydroxyalkyl Kill group (e.g., hydroxymethyl, hydroxy C 1-10 alkyl group such as hydroxyethyl group), mercapto group (e.g., mercaptomethyl, mercapto C 1-10 alkyl group such as mercaptoethyl group), a formyl group, an acyl group [For example, alkylcarbonyl groups (for example, C 1-6 alkyl-carbonyl groups such as acetyl and propionyl groups), aroyl groups (for example, benzoyl groups and the like)], carboxyl groups, ester groups [for example, alkoxy-carbonyl groups ( methoxycarbonyl, ethoxycarbonyl, C 1-6 alkoxy such as butoxycarbonyl group - carbonyl group), aryloxycarbonyl group (such as phenoxycarbonyl group), alkylamino such as an amino group, a substituted amino group (e.g., dimethylamino group Group), a carbamoyl group, a nitro group, C 1-10 trialkylsilyl group such as a cyano group, a silicon atom-containing group {e.g., silyl group [for example, trialkylsilyl group (e.g., trimethylsilyl group, t- butyl dimethylsilyl group A substituted silyl group such as)], a phosphorus atom-containing group {eg, a phosphino group [eg, a diarylphosphino group (eg, a C 6-10 arylphosphino group such as diphenylphosphino group)], a phosphinyl group [ For example, a diarylphosphinyl group (for example, a diC 6-10 arylphosphinyl group such as a diphenylphosphinyl group)], etc.], a substituent in which these substituents are bonded to each other [for example, an alkoxyaryl group ( For example, a C 1-4 alkoxy C 6-10 aryl group such as a methoxyphenyl group)] and the like Can be mentioned.
また、式(1)において、R1とR2、R2とR3又はR3とR4は、それぞれ、互いに結合して環を形成していてもよい[又は、R1とR2、R2とR3又はR3とR4が互いに結合して二価の基を形成してもよい]。このような環としては、例えば、炭化水素環[例えば、シクロアルカン環(例えば、シクロペンタン、シクロヘキサン環などのC5−10シクロアルカン環)、アレーン環(例えば、ベンゼン環、ナフタレン環などの単環式又は縮合多環式C6−14アレーン環)]、複素環[例えば、オキサシクロアルカン環(例えば、オキサシクロペンタン環、オキサシクロヘキサン環などのオキサC4−6シクロアルカン環)、アザシクロアルカン環、チオシクロアルカン環など]などが挙げられる。代表的な環は、アレーン環、複素環などが挙げられ、特に、アンタントレン骨格(例えば、ジオキサアンタントレン骨格)とともに芳香環を形成した環であってもよい。なお、環は、さらに、前記例示の置換基が置換した環であってもよい。また、R2はR1及びR3と、R3はR2およびR4と、それぞれ環を形成してもよい。例えば、R2がR1およびR3の双方(又はR3がR2およびR4の双方)とベンゼン環を形成する場合には、ナフタレン環を形成し、R1〜R4のすべてがベンゼン環を形成する場合には、アンタントレン骨格を構成するナフタレン環とともにフェナントレン環を形成する。 In Formula (1), R 1 and R 2 , R 2 and R 3, or R 3 and R 4 may be bonded to each other to form a ring [or R 1 and R 2 , R 2 and R 3 or R 3 and R 4 may be bonded to each other to form a divalent group]. Examples of such rings include hydrocarbon rings [eg, cycloalkane rings (eg, C 5-10 cycloalkane rings such as cyclopentane and cyclohexane rings), arene rings (eg, benzene rings, naphthalene rings, etc.). Cyclic or condensed polycyclic C 6-14 arene ring)], hetero ring [eg, oxacycloalkane ring (eg, oxa C 4-6 cycloalkane ring such as oxacyclopentane ring, oxacyclohexane ring), azacyclo Alkane ring, thiocycloalkane ring, etc.]. Typical rings include an arene ring, a heterocyclic ring, and the like, and in particular, a ring that forms an aromatic ring together with an anthanthrene skeleton (for example, a dioxaanthanthrene skeleton) may be used. The ring may further be a ring substituted with the above-mentioned exemplified substituents. R 2 may form a ring with R 1 and R 3 , and R 3 may form a ring with R 2 and R 4 , respectively. For example, when R 2 forms a benzene ring with both R 1 and R 3 (or R 3 is both R 2 and R 4 ), a naphthalene ring is formed, and all of R 1 to R 4 are benzene. In the case of forming a ring, a phenanthrene ring is formed together with a naphthalene ring constituting an anthanthrene skeleton.
式(1)において、R1〜R4はそれぞれ同一又は異なっていてもよい。また、2つのR1、2つのR2、2つの2つのR3、2つのR4は、それぞれ、同一又は異なっていてもよく、特に同一であってもよい。 In the formula (1), R 1 to R 4 may be the same or different from each other. Two R 1 s , two R 2 s , two two R 3 s , and two R 4 s may be the same or different, and particularly the same.
好ましい態様では、式(1)において、R1〜R4の少なくとも1つがハロゲン原子(臭素原子、ヨウ素原子など、特にヨウ素原子)であってもよく、特に、R2〜R4の少なくとも2つ(特に、R2およびR3)がハロゲン原子(特に、ヨウ素原子)であってもよい。なお、このような好ましい態様において、すべてがハロゲン原子でない場合、R1〜R4の残りは、水素原子又はハロゲン原子以外の置換基であってもよい。 In a preferred embodiment, in formula (1), at least one of R 1 to R 4 may be a halogen atom (bromine atom, iodine atom, etc., particularly iodine atom), and in particular, at least two of R 2 to R 4 (In particular, R 2 and R 3 ) may be a halogen atom (particularly an iodine atom). In such a preferred embodiment, when all are not halogen atoms, the rest of R 1 to R 4 may be hydrogen atoms or substituents other than halogen atoms.
以下に代表的なR1〜R4の組み合わせを示す。 The typical combinations of R 1 to R 4 are shown below.
[製造方法]
本発明のアンタントレン系化合物は、特に限定されないが、下記式(2)で表される化合物(2,2’−ジヒドロキシ又はジメルカプト−3,3’−ジホルミル−8,8’−ジハロ−1,1’−ビナフチル骨格を有する化合物など)を反応させる(環化反応させる)ことにより、効率よく得ることができる。すなわち、下記式(2)で表される化合物を反応させると、下記式(2)において、1位と8’位との間および1’位と8位との間でそれぞれHX(脱ハロゲン化水素など)の脱離を伴って環化反応(−E−を形成する反応)が生じ、本発明の化合物が得られる。
[Production method]
The anthanthrene compound of the present invention is not particularly limited, but is a compound represented by the following formula (2) (2,2′-dihydroxy or dimercapto-3,3′-diformyl-8,8′-dihalo-1, The compound can be efficiently obtained by reacting (cyclizing) a compound having a 1′-binaphthyl skeleton or the like. That is, when a compound represented by the following formula (2) is reacted, in the following formula (2), HX (dehalogenation) is present between the 1-position and the 8′-position and between the 1′-position and the 8-position, respectively. A cyclization reaction (a reaction forming -E-) occurs with elimination of hydrogen and the like, and the compound of the present invention is obtained.
(式中、Xは基−EHと反応して脱離可能な脱離基を示し、E、R1〜R4は前記と同じ。)
上記式(2)において、基Xとしては、基−EH(又は基−EHを構成する水素原子)、すなわち、ヒドロキシル基又はメルカプト基(ヒドロキシル基又はメルカプト基を構成する)との反応により、HXの脱離を伴って環化(−E−の形成)可能であれば特に限定されず、例えば、ハロゲン原子(塩素原子、臭素原子、ヨウ素原子など)、アルカンスルホニルオキシ基(メタンスルホニルオキシ基などのC1−4アルカンスルホニルオキシ基)、ハロアルカンスルホニルオキシ基(例えば、トリフルオロメタンスルホニルオキシ基などのハロC1−4アルカンスルホニルオキシ基)、アリールスルホニルオキシ基(例えば、トシル基などのC6−10アリールスルホニルオキシ基)などが挙げられる。中でも、ハロゲン原子(特に、ヨウ素原子)が好ましい。なお、2つのXは同一又は異なる基であってもよく、通常同一であってもよい。また、式(2)において、R1〜R4は、好ましい態様も含めて、前記式(1)の場合と同様である。
(In the formula, X represents a leaving group that can be removed by reacting with the group -EH, and E and R 1 to R 4 are the same as above.)
In the above formula (2), the group X is a group -EH (or a hydrogen atom constituting the group -EH), that is, HX by reaction with a hydroxyl group or a mercapto group (constituting a hydroxyl group or a mercapto group). There is no particular limitation as long as cyclization (formation of -E-) is possible with elimination of, for example, halogen atom (chlorine atom, bromine atom, iodine atom, etc.), alkanesulfonyloxy group (methanesulfonyloxy group, etc.) C 1-4 alkanesulfonyloxy group) of haloalkane sulfonyloxy group (e.g., halo C 1-4 alkanesulfonyloxy group such as trifluoromethanesulfonyloxy group), an arylsulfonyl group (e.g., such as tosyl group C 6- 10 arylsulfonyloxy group) and the like. Among these, a halogen atom (particularly an iodine atom) is preferable. The two Xs may be the same or different groups, and may usually be the same. Moreover, in Formula (2), R < 1 > -R < 4 > is the same as that of the said Formula (1) including a preferable aspect.
式(2)で表される化合物は、特に限定されず、下記式(2a)で表される化合物同士を慣用の方法(例えば、WO2011/111762号公報に記載の方法)を利用してカップリング(脱水素カップリング)させることにより製造できる。 The compound represented by the formula (2) is not particularly limited, and the compounds represented by the following formula (2a) are coupled using a conventional method (for example, a method described in WO2011 / 111762). It can be produced by (dehydrogenation coupling).
(式中、X、R1〜R4は前記と同じ。)
なお、上記式(2a)で表される化合物は、1位の水素原子間で選択的に脱水素カップリングしやすいが、必要に応じて1位の水素原子間で脱水素カップリングした化合物(すなわち、式(2)で表される化合物)を反応生成物から分離して用いてもよい。また、式(2a)で表される化合物として、R1〜R4が異なる化合物を組み合わせて用いることで、2つのR1、R2、R3及び/又はR4が異なる式(2)で表される化合物が得られる。
(In the formula, X and R 1 to R 4 are the same as above.)
The compound represented by the formula (2a) is easily selectively dehydrogenated between the hydrogen atoms at the 1-position, but if necessary, the compound (dehydrogenated coupling between the hydrogen atoms at the 1-position ( That is, the compound represented by the formula (2) may be used separately from the reaction product. Further, the compound represented by the formula (2a), by using a combination of R 1 to R 4 are different compounds, the two R 1, R 2, R 3 and / or R 4 in a different formula (2) The compound represented is obtained.
(式(2a)で表される化合物)
式(2a)で表される化合物(2−ナフトアルデヒド類)は、市販品を利用してもよく、慣用の方法(例えば、WO2011/111762号公報に記載の方法)により合成したものを使用してもよい。
(Compound represented by Formula (2a))
As the compound (2-naphthaldehydes) represented by the formula (2a), a commercially available product may be used, and a compound synthesized by a conventional method (for example, a method described in WO2011 / 111762) is used. May be.
例えば、式(2a)で表される化合物のうち、Xがハロゲン原子である化合物は、下記式で表される化合物(2b)と、N,N−ジハロ−5,5−ジアルキルヒダントイン(例えば、N,N−ジヨード−5,5−ジメチルヒダントインなど)およびトリフルオロメタンスルホン酸とを反応させて下記式(2c)で表される化合物を製造し、この化合物(2b)を加溶媒分解(加水分解、加メタノール分解など)することにより得ることができる。なお、加溶媒分解は、アルカリや酸の存在下で行ってもよい。 For example, among the compounds represented by the formula (2a), a compound in which X is a halogen atom includes a compound (2b) represented by the following formula and an N, N-dihalo-5,5-dialkylhydantoin (for example, N, N-diiodo-5,5-dimethylhydantoin and the like) and trifluoromethanesulfonic acid are reacted to produce a compound represented by the following formula (2c), and this compound (2b) is solvolyzed (hydrolyzed). , Methanol decomposition, etc.). The solvolysis may be performed in the presence of an alkali or an acid.
(式中、X1はハロゲン原子、R1〜R4は前記と同じ。)
すなわち、上記反応では、3位にトリフルオロメタンスルホニルオキシ基が導入されるとともに、2−ナフトアルデヒド類の5位がハロゲン化される。
(In the formula, X 1 is a halogen atom, and R 1 to R 4 are the same as above.)
That is, in the above reaction, a trifluoromethanesulfonyloxy group is introduced at the 3-position, and the 5-position of 2-naphthaldehydes is halogenated.
なお、この反応では、式(2b)において、少なくとも2−ナフトアルデヒド類の8位がハロゲン化されるが、式(2b)において、R1〜R4が水素原子である化合物を用いて、式(2c)においてR1〜R4の少なくとも1つおよびX1がハロゲン原子である化合物を得ることもできる。例えば、下記式(2b−1)で表される化合物と、N,N−ジハロ−5,5−ジアルキルヒダントイン(例えば、N,N−ジヨード−5,5−ジメチルヒダントインなど)およびトリフルオロメタンスルホン酸とを反応させて下記式(2c−1)で表される化合物を製造してもよい。 In this reaction, in formula (2b), at least 8-position of 2-naphthaldehydes is halogenated, but in formula (2b), a compound in which R 1 to R 4 are hydrogen atoms is used. In (2c), a compound in which at least one of R 1 to R 4 and X 1 are a halogen atom can also be obtained. For example, a compound represented by the following formula (2b-1), N, N-dihalo-5,5-dialkylhydantoin (such as N, N-diiodo-5,5-dimethylhydantoin) and trifluoromethanesulfonic acid May be reacted to produce a compound represented by the following formula (2c-1).
(式中、X1はハロゲン原子、R1a〜R4aは水素原子又はハロゲン原子であり、R1a〜R4aの少なくとも1つ(例えば、R2a及び/又はR3a)はハロゲン原子である。)
また、このような反応では、2−ナフトアルデヒドの5位と6〜9位とのハロゲン化速度の差を利用して、段階的にハロゲン化することもできる。例えば、酸触媒(例えば、トリフルオロメタンスルホン酸など)の存在下、前記式(2b−1)で表される化合物と、N,N−ジハロ−5,5−ジアルキルヒダントインとを反応させて下記式(2b−2)で表される化合物を製造し、得られた(2b−2)で表される化合物とN,N−ジハロ−5,5−ジアルキルヒダントインおよびトリフルオロメタンスルホン酸とを反応させて前記式(2c−1)で表される化合物を製造してもよい。
(Wherein, X 1 is a halogen atom, R 1a to R 4a are hydrogen atoms or halogen atoms, and at least one of R 1a to R 4a (for example, R 2a and / or R 3a ) is a halogen atom. )
In such a reaction, halogenation can be carried out stepwise by utilizing the difference in halogenation rate between 5-position and 6-9 position of 2-naphthaldehyde. For example, the compound represented by the above formula (2b-1) is reacted with N, N-dihalo-5,5-dialkylhydantoin in the presence of an acid catalyst (for example, trifluoromethanesulfonic acid) to form the following formula. The compound represented by (2b-2) was produced, and the obtained compound represented by (2b-2) was reacted with N, N-dihalo-5,5-dialkylhydantoin and trifluoromethanesulfonic acid. You may manufacture the compound represented by the said Formula (2c-1).
(式中、R1a〜R4aは水素原子又はハロゲン原子であり、R1a〜R4aの少なくとも1つ(例えば、R2a及び/又はR3a)はハロゲン原子である。)
なお、上記反応において、式(2b−1)で表される化合物とN,N−ジハロ−5,5−ジアルキルヒダントインの割合は、2−ナフトアルデヒドの8位でのハロゲン化を生じにくくするという観点から、式(2b−1)で表される化合物1モルに対して、N,N−ジハロ−5,5−ジアルキルヒダントインを3モル以下(例えば、1〜2.8モル)、好ましくは1.2〜2.5モル、さらに好ましくは1.3〜2.3モル、特に1.5〜2.1モル程度であってもよい。
(In the formula, R 1a to R 4a are hydrogen atoms or halogen atoms, and at least one of R 1a to R 4a (for example, R 2a and / or R 3a ) is a halogen atom.)
In the above reaction, the proportion of the compound represented by formula (2b-1) and N, N-dihalo-5,5-dialkylhydantoin is less likely to cause halogenation at the 8-position of 2-naphthaldehyde. From the viewpoint, 1 mol of the compound represented by the formula (2b-1) is 3 mol or less (for example, 1 to 2.8 mol) of N, N-dihalo-5,5-dialkylhydantoin, preferably 1 It may be about 2 to 2.5 mol, more preferably about 1.3 to 2.3 mol, particularly about 1.5 to 2.1 mol.
本発明の反応(環化反応)は、通常、塩基の存在下で行ってもよい。塩基を用いることで、基−EHの水素引き抜きによりナフトキシアニオンの生成、生成したナフトキシアニオンの基−Xが置換した炭素原子への求核攻撃および基Xの脱離(付加脱離)という一連の反応が進行しやすく、容易に環構造が形成されるようである。塩基としては、特に限定されないが、例えば、有機塩基{例えば、有機酸塩[例えば、酢酸塩(例えば、酢酸ナトリウム、酢酸カリウム、酢酸カルシウムなどの酢酸アルカリ又はアルカリ土類金属塩)などのカルボン酸塩(カルボン酸金属塩など)]、金属アルコキシド(例えば、ナトリウムメトキシド、ナトリウムエトキシド、カリウムt−ブトキシドなどのアルカリ金属アルコキシド)、アミン類[例えば、トリアルキルアミン(トリエチルアミンなど)などの第3級アミン]など}、無機塩基[例えば、金属水酸化物(例えば、水酸化ナトリウム、水酸化カリウム、水酸化カルシウムなどの水酸化アルカリ又はアルカリ土類金属塩)、金属炭酸塩(例えば、炭酸リチウム、炭酸カリウム、炭酸ナトリウム、炭酸セシウムなどのアルカリ又はアルカリ土類金属炭酸塩)、金属炭酸水素塩(例えば、炭酸水素カリウム、炭酸水素ナトリウムなどのアルカリ又はアルカリ土類金属炭酸水素塩)、アンモニアなど]などが例示できる。塩基は、単独で又は2種以上組み合わせてもよい。 The reaction (cyclization reaction) of the present invention may be usually performed in the presence of a base. By using a base, the naphthoxy anion is generated by hydrogen abstraction of the group -EH, the nucleophilic attack to the carbon atom substituted by the group -X of the generated naphthoxy anion, and the elimination (addition elimination) of the group X. It seems that a series of reactions easily proceed and a ring structure is easily formed. Examples of the base include, but are not limited to, carboxylic acids such as organic bases {eg, organic acid salts [eg, acetates (eg, alkali acetates or alkaline earth metal salts such as sodium acetate, potassium acetate, calcium acetate)]. Salts (such as carboxylic acid metal salts)], metal alkoxides (for example, alkali metal alkoxides such as sodium methoxide, sodium ethoxide, potassium t-butoxide), amines [for example, trialkylamine (such as triethylamine)) Secondary amines], inorganic bases [eg, metal hydroxides (eg, alkali hydroxides or alkaline earth metal salts such as sodium hydroxide, potassium hydroxide, calcium hydroxide), metal carbonates (eg, lithium carbonate) , Alkalis such as potassium carbonate, sodium carbonate, cesium carbonate Alkaline earth metal carbonates), the metal hydrogen carbonate (e.g., potassium hydrogen carbonate, alkali or alkaline earth metal bicarbonates, such as sodium bicarbonate), ammonia, etc.], and others. The bases may be used alone or in combination of two or more.
本発明では、カルボン酸塩[例えば、酢酸塩などのアルカン酸塩(例えば、C1−4アルカン酸塩)]、金属水酸化物などの汎用の塩基であっても、効率よく脱ハロゲン化水素反応などを促進できる。そのため、本発明の方法は、極めて簡便かつ汎用性に優れている。 In the present invention, even a general base such as a carboxylate [e.g., an alkanoate such as acetate (e.g., C1-4 alkanoate)] or a metal hydroxide is efficiently dehydrohalogenated. Reaction can be promoted. Therefore, the method of the present invention is extremely simple and excellent in versatility.
塩基の割合は、式(2)で表される化合物1モルに対して、例えば、0.1〜30モル当量(例えば、0.5〜25モル当量)程度の範囲から選択でき、1〜20モル当量、好ましくは1.5〜15モル当量(例えば、1.8〜12モル)、さらに好ましくは2モル当量以上(例えば、2〜10モル当量)であってもよい。 The ratio of the base can be selected from a range of, for example, about 0.1 to 30 molar equivalents (for example, 0.5 to 25 molar equivalents) with respect to 1 mol of the compound represented by the formula (2). The molar equivalent may be 1.5 to 15 molar equivalents (for example, 1.8 to 12 moles), more preferably 2 molar equivalents or more (for example, 2 to 10 molar equivalents).
また、反応において、必要に応じて、金属触媒を使用してもよい。金属触媒としては、例えば、パラジウム触媒[例えば、パラジウム化合物(酢酸パラジウム、塩化パラジウムなど)、タングステン触媒など]などの遷移金属触媒などが挙げられる。金属触媒は単独で又は2種以上組み合わせてもよい。 In the reaction, a metal catalyst may be used as necessary. Examples of the metal catalyst include transition metal catalysts such as palladium catalysts [eg, palladium compounds (palladium acetate, palladium chloride, etc.), tungsten catalysts, etc.]. The metal catalysts may be used alone or in combination of two or more.
金属触媒の割合は、例えば、式(2)で表される化合物1モルに対して、例えば、0.0001〜3モル、好ましくは0.0005〜1モル、さらに好ましくは0.001〜0.5モル(例えば、0.005〜0.3モル)程度であってもよい。また、金属触媒の割合は、塩基1モルに対して、例えば、0.00001〜1モル、好ましくは0.0001〜0.5モル、さらに好ましくは0.001〜0.3モル(例えば、0.005〜0.1モル)程度であってもよい。 The ratio of the metal catalyst is, for example, 0.0001 to 3 mol, preferably 0.0005 to 1 mol, and more preferably 0.001 to 0.00 mol per 1 mol of the compound represented by the formula (2). About 5 mol (for example, 0.005-0.3 mol) may be sufficient. The ratio of the metal catalyst is, for example, 0.00001 to 1 mol, preferably 0.0001 to 0.5 mol, more preferably 0.001 to 0.3 mol (for example, 0 mol) with respect to 1 mol of the base. 0.005 to 0.1 mol).
なお、反応は、溶媒の存在下又は非存在下で行うことができる。溶媒としては、反応において不活性であれば特に限定されず、例えば、炭化水素類(例えば、ヘキサン、ヘプタン、オクタン、デカンなどの脂肪族炭化水素類;シクロヘキサン、シクロペンタンなどの脂環族炭化水素類;ベンゼン、トルエン、キシレンなどの芳香族炭化水素類など)、ハロゲン化炭化水素類(例えば、塩化メチレン、クロロホルムなどのハロアルカンなど)、エステル類(例えば、酢酸エチル、酢酸ブチル、プロピレングリコールモノメチルエーテルモノアセテートなどの酢酸エステル類)、ケトン類(例えば、アセトン、エチルメチルケトンなどの鎖状ケトン類;シクロヘキサノンなどの環状ケトン類)、エーテル類(例えば、ジエチルエーテル、ジブチルエーテル、プロピレングリコールモノメチルエーテル、ジエチレングリコールジメチルエーテルなどの鎖状エーテル;ジオキサン、テトラヒドロフランなどの環状エーテル類)、アルコール系溶媒(例えば、メタノール、エタノール、イソプロパノール、ブタノールなどのアルカノール類)、ニトリル系溶媒(例えば、アセトニトリル、ベンゾニトリルなど)、ニトロ系溶媒(例えば、ニトロベンゼンなど)、アミド類(ジメチルホルムアミドなど)、水などが挙げられる。これらの溶媒は単独で又は2種以上組み合わせてもよい。 The reaction can be performed in the presence or absence of a solvent. The solvent is not particularly limited as long as it is inert in the reaction. For example, hydrocarbons (for example, aliphatic hydrocarbons such as hexane, heptane, octane and decane; alicyclic hydrocarbons such as cyclohexane and cyclopentane) Aromatic hydrocarbons such as benzene, toluene and xylene), halogenated hydrocarbons (such as haloalkanes such as methylene chloride and chloroform), esters (such as ethyl acetate, butyl acetate, propylene glycol monomethyl ether) Acetates such as monoacetate), ketones (eg, chain ketones such as acetone and ethyl methyl ketone; cyclic ketones such as cyclohexanone), ethers (eg, diethyl ether, dibutyl ether, propylene glycol monomethyl ether, Jeechile Chain ethers such as glycol dimethyl ether; cyclic ethers such as dioxane and tetrahydrofuran), alcohol solvents (eg, alkanols such as methanol, ethanol, isopropanol, and butanol), nitrile solvents (eg, acetonitrile, benzonitrile, etc.), Nitro solvents (for example, nitrobenzene and the like), amides (dimethylformamide and the like), water and the like can be mentioned. These solvents may be used alone or in combination of two or more.
反応は、冷却下、常温下又は加温下のいずれでおこなってもよく、特に加温下で行ってもよい。反応温度は、特に限定されないが、例えば、30〜200℃(例えば、40〜180℃)、好ましくは50〜160℃、さらに好ましくは60〜150℃(例えば、70〜130℃)程度であってもよく、通常50〜150℃(例えば、60〜100℃)程度であってもよい。なお、反応時間は、反応温度に応じて適宜選択でき、ガスクロマトグラフィーなどを利用して式(1)で表される化合物の生成の程度を確認しながら調整してもよい。 The reaction may be carried out under cooling, at room temperature or under heating, and particularly under heating. Although reaction temperature is not specifically limited, For example, 30-200 degreeC (for example, 40-180 degreeC), Preferably it is 50-160 degreeC, More preferably, it is about 60-150 degreeC (for example, 70-130 degreeC), It may be about 50-150 degreeC (for example, 60-100 degreeC) normally. In addition, reaction time can be suitably selected according to reaction temperature, and you may adjust, confirming the grade of the production | generation of the compound represented by Formula (1) using gas chromatography etc.
反応は、常圧下、加圧下、又は減圧下のいずれで行ってもよく、また、還流させて行ってもよい。なお、反応は、酸化性雰囲気中で行ってもよいが、通常、非酸化性雰囲気中[例えば、窒素ガス、希ガス(ヘリウム、アルゴンなど)中など]で行ってもよい。 The reaction may be performed under normal pressure, increased pressure, or reduced pressure, or may be performed under reflux. The reaction may be performed in an oxidizing atmosphere, but may be generally performed in a non-oxidizing atmosphere [for example, in a nitrogen gas or a rare gas (such as helium or argon)].
反応終了後、慣用の分離精製手段、例えば、濃縮、乾固、晶析、再結晶、濾過、抽出、蒸留、クロマトグラフィなどの方法を利用して、生成物を単離してもよい。 After completion of the reaction, the product may be isolated using a conventional separation and purification means such as concentration, drying, crystallization, recrystallization, filtration, extraction, distillation, chromatography and the like.
以下に、実施例に基づいて本発明をより詳細に説明するが、本発明はこれらの実施例によって限定されるものではない。 Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples.
[合成例]
以下のようにして、2つの合成方法にて、5,5’,6,6’,8,8’−ヘキサヨード−3,3’−ジホルミル−2,2’−ジヒドロキシ−1,1’−ビナフチルを合成した。
[Synthesis example]
In the following two synthesis methods, 5,5 ′, 6,6 ′, 8,8′-hexaiodo-3,3′-diformyl-2,2′-dihydroxy-1,1′-binaphthyl was synthesized as follows. Was synthesized.
[合成例1]
(1)5,7,8−トリヨード−3−(トリフルオロメチルスルホニル)オキシ−2−ナフトアルデヒドの調製
窒素雰囲気下でN,N’−ジヨード−5,5−ジメチルヒダントイン(17.0g,44.7mmol)にCH2Cl2(160mL)を加えた後、60℃にてトリフルオロメタンスルホン酸(7.93mL,89.6mmol)を滴下し、その後、2−ナフトアルデヒド(2.00g,12.8mmol)をCH2Cl2(40mL)に溶解させた溶液も同様に滴下した。60℃で3時間撹拌させた後、反応液に亜硫酸ナトリウム水溶液を加えてクエンチを行った。有機層を水および飽和食塩水で洗浄し、硫酸マグネシウムで乾燥後、ろ過・濃縮した。得られた茶褐色粘体にアセトニトリルを加えて溶かし、−20℃で一晩再結晶を行うことで、下記式で表される化合物、すなわち、5,7,8−トリヨード−3−(トリフルオロメチルスルホニル)オキシ−2−ナフトアルデヒド(3.36g,38%)を得た。
[Synthesis Example 1]
(1) Preparation of 5,7,8-triiodo-3- (trifluoromethylsulfonyl) oxy-2-naphthaldehyde N, N′-diiodo-5,5-dimethylhydantoin (17.0 g, 44 under nitrogen atmosphere) 7 mmol), CH 2 Cl 2 (160 mL) was added, trifluoromethanesulfonic acid (7.93 mL, 89.6 mmol) was added dropwise at 60 ° C., and then 2-naphthaldehyde (2.00 g, 12. 8 mmol) was dissolved in CH 2 Cl 2 (40 mL) in the same manner. After stirring at 60 ° C. for 3 hours, the reaction solution was quenched by adding an aqueous sodium sulfite solution. The organic layer was washed with water and saturated brine, dried over magnesium sulfate, filtered and concentrated. Acetonitrile is added to the obtained brown viscous body and dissolved, and recrystallization is performed overnight at −20 ° C., whereby a compound represented by the following formula, that is, 5,7,8-triiodo-3- (trifluoromethylsulfonyl) ) Oxy-2-naphthaldehyde (3.36 g, 38%) was obtained.
1H−NMR(CDCl3)δ:10.35(s,1H),8.89(s,1H),8.65(s,1H),8.13(s,1H)
13C−NMR(CDCl3)δ:185.90,149.37,147.01,143.54,135.78,135.20,129.13,126.69,119.21(q,J=319.7Hz),116.36,112.56,99.73。
1 H-NMR (CDCl 3 ) δ: 10.35 (s, 1H), 8.89 (s, 1H), 8.65 (s, 1H), 8.13 (s, 1H)
13 C-NMR (CDCl 3 ) δ: 185.90, 149.37, 147.01, 143.54, 135.78, 135.20, 129.13, 126.69, 119.21 (q, J = 319.7 Hz), 116.36, 112.56, 99.73.
(2)5,7,8−トリヨード−3−ヒドロキシ−2−ナフトアルデヒドの調製
合成した5,7,8−トリヨード−3−(トリフルオロメチルスルホニルオキシ)−2−ナフトアルデヒド(1.00g,1.47mmol)に1,4−ジオキサン(4.70mL)、メタノール(2.20mL)を加えた後、1規定の水酸化ナトリウム水溶液(4.40mL,4.40mmol)を滴下し、室温で12時間撹拌した。反応終了後、反応溶液に6規定塩酸水溶液を加えてクエンチを行った。懸濁液をろ過にかけ、残留物を水で流し洗った後に自然乾燥を行い、下記式で表される化合物、すなわち、5,7,8−トリヨード−3−ヒドロキシ−2−ナフトアルデヒド(793mg,98%)を得た。
(2) Preparation of 5,7,8-triiodo-3-hydroxy-2-naphthaldehyde Synthesized 5,7,8-triiodo-3- (trifluoromethylsulfonyloxy) -2-naphthaldehyde (1.00 g, 1,4-dioxane (4.70 mL) and methanol (2.20 mL) were added to 1.47 mmol), and then a 1N aqueous sodium hydroxide solution (4.40 mL, 4.40 mmol) was added dropwise thereto. Stir for hours. After completion of the reaction, the reaction solution was quenched by adding 6N hydrochloric acid aqueous solution. The suspension was subjected to filtration, and the residue was washed with water, followed by air drying, and the compound represented by the following formula, ie, 5,7,8-triiodo-3-hydroxy-2-naphthaldehyde (793 mg, 98%).
1H−NMR(CDCl3)δ:10.52(s,1H),10.20(s,1H),8.58(s,1H),8.51(s,1H),7.59(s,1H)。 1 H-NMR (CDCl 3 ) δ: 10.52 (s, 1H), 10.20 (s, 1H), 8.58 (s, 1H), 8.51 (s, 1H), 7.59 ( s, 1H).
(3)5,5’,6,6’,8,8’−ヘキサヨード−3,3’−ジホルミル−2,2’−ジヒドロキシ−1,1’−ビナフチルの調製
塩化鉄六水和物(1.97g,7.29mmol)と合成した5,7,8−トリヨード−3−ヒドロキシ−2−ナフトアルデヒド(200mg,364μmol)をすり鉢ですりつぶし混ぜ合わせた。得られた混合物を50mLのサンプル管に入れ、H20を0.2mL加え1分間ゆっくりと撹拝した。それをμリアクター(四国計測工業(株))を用いて210wで780秒間加熱撹拌した。反応後6規定のHClを30mL加え15時間撹拌したのち、水でろ過し乾燥させることで黄褐色の粗生成物を得た。これをブロモベンゼンに溶かし、フラッシュカラムクロマトグラフィー(クロロホルム)で精製することで橙色固体を得た。この操作をもう一度繰り返すことで下記式で表される化合物、すなわち、5,5’,6,6’,8,8’−ヘキサヨード−3,3’−ジホルミル−2,2’−ジヒドロキシ−1,1’−ビナフチルを得た。
(3) Preparation of 5,5 ′, 6,6 ′, 8,8′-hexaiodo-3,3′-diformyl-2,2′-dihydroxy-1,1′-binaphthyl Iron chloride hexahydrate (1 .97 g, 7.29 mmol) and 5,7,8-triiodo-3-hydroxy-2-naphthaldehyde synthesized (200 mg, 364 μmol) were ground in a mortar and mixed. The resulting mixture was placed in a 50 mL sample tube, 0.2 mL of H 2 O was added and slowly stirred for 1 minute. It was stirred with heating at 210 w for 780 seconds using a μ reactor (Shikoku Keiki Kogyo Co., Ltd.). After the reaction, 30 mL of 6N HCl was added and stirred for 15 hours, followed by filtration with water and drying to obtain a tan crude product. This was dissolved in bromobenzene and purified by flash column chromatography (chloroform) to obtain an orange solid. By repeating this operation once more, a compound represented by the following formula, that is, 5,5 ′, 6,6 ′, 8,8′-hexaiodo-3,3′-diformyl-2,2′-dihydroxy-1, 1'-binaphthyl was obtained.
1H−NMR(CDCl3)δ11.07(s,2H),10.13(s,2H),8.82(s,2H),8.67(s,2H)。 1 H-NMR (CDCl 3) δ11.07 (s, 2H), 10.13 (s, 2H), 8.82 (s, 2H), 8.67 (s, 2H).
[合成例2]
(1)7,8−ジヨード−2−ナフトアルデヒドの調製
窒素雰囲気下でN,N’−ジヨード−5,5−ジメチルヒダントイン(4.88g,12.8mmol)にCH2Cl2(50mL)を加えた懸濁溶液にトリフルオロメタンスルホン酸(1.13mL,12.8mmol)を滴下した後、2−ナフトアルデヒド(1.00g,6.40mmol)をCH2Cl2(10mL)に溶解させた溶液も同様に滴下した。室温で30分間撹拌させた後、反応液に亜硫酸ナトリウム水溶液を加えてクエンチを行った。有機層を水および飽和食塩水で洗浄し、硫酸マグネシウムで乾燥後、濾過・濃縮し、黄色固体の粗生成物(2.46g)を得た。粗生成物をシリカゲルカラムクロマトグラフィー(クロロホルム)で精製し、下記式で表される化合物、すなわち、7,8−ジヨード−2−ナフトアルデヒド(2.26g,87%)を得た。
[Synthesis Example 2]
(1) Preparation of 7,8-diiodo-2-naphthaldehyde N 2 N′-Diiodo-5,5-dimethylhydantoin (4.88 g, 12.8 mmol) was added CH 2 Cl 2 (50 mL) under a nitrogen atmosphere. A solution of 2-naphthaldehyde (1.00 g, 6.40 mmol) dissolved in CH 2 Cl 2 (10 mL) after dropwise addition of trifluoromethanesulfonic acid (1.13 mL, 12.8 mmol) to the added suspension solution. Was also dropped in the same manner. After stirring at room temperature for 30 minutes, the reaction solution was quenched by adding an aqueous sodium sulfite solution. The organic layer was washed with water and saturated brine, dried over magnesium sulfate, filtered and concentrated to give a crude product (2.46 g) as a yellow solid. The crude product was purified by silica gel column chromatography (chloroform) to obtain a compound represented by the following formula, that is, 7,8-diiodo-2-naphthaldehyde (2.26 g, 87%).
1H−NMR(CDCl3)δ:10.27(s,1H),8.52(d,J=1.6Hz,1H),8.16(d,J=8.8Hz,IH),8.03(dd,J=8.6,1.4Hz,1H),7.90(d,J=7.6Hz,1H),7.85(d,J=7.6Hz,1H).
13C−NMR(CDCl3)δ:191.29,140.79,139.22,138.89,137.65,135,83,134.35,134.31,125.21,102.08,100.36。
1 H-NMR (CDCl 3 ) δ: 10.27 (s, 1H), 8.52 (d, J = 1.6 Hz, 1H), 8.16 (d, J = 8.8 Hz, IH), 8 .03 (dd, J = 8.6, 1.4 Hz, 1H), 7.90 (d, J = 7.6 Hz, 1H), 7.85 (d, J = 7.6 Hz, 1H).
13 C-NMR (CDCl 3 ) δ: 191.29, 140.79, 139.22, 138.89, 137.65, 135, 83, 134.35, 134.31, 125.21, 102.08, 100.36.
(2)5,7,8−トリヨード−3−(トリフルオロメチルスルホニルオキシ)−2−ナフトアルデヒドの調製
窒素雰囲気下でN,N’−ジヨード−5,5−ジメチルヒダントイン(186mg,490μmol)にCH2Cl2(2.0mL)を加えた懸濁溶液にトリフルオロメタンスルホン酸(174μL,1.97mmol)を滴下した後、得られた7,8−ジヨード−2−ナフトアルデヒド(100mg,245μmol)をCH2Cl2(3.0mL)に溶解させた溶液も同様に滴下した。室温で30分間撹絆させた後、反応液に亜硫酸ナトリウム水溶液を加えてクエンチを行った。有機層を水および飽和食塩水で洗浄し、硫酸マグネシウムで乾燥後、ろ過・濃縮し、下記式で表される化合物、すなわち、5,7,8−トリヨード−3−(トリフルオロメチルスルホニルオキシ)−2−ナフトアルデヒド(134mg,80%)を得た。
(2) Preparation of 5,7,8-triiodo-3- (trifluoromethylsulfonyloxy) -2-naphthaldehyde To N, N′-diiodo-5,5-dimethylhydantoin (186 mg, 490 μmol) under nitrogen atmosphere After trifluoromethanesulfonic acid (174 μL, 1.97 mmol) was added dropwise to the suspension solution to which CH 2 Cl 2 (2.0 mL) was added, the resulting 7,8-diiodo-2-naphthaldehyde (100 mg, 245 μmol) was obtained. A solution in which CH 2 Cl 2 (3.0 mL) was dissolved was also added dropwise. After stirring for 30 minutes at room temperature, an aqueous sodium sulfite solution was added to the reaction solution to quench it. The organic layer is washed with water and saturated brine, dried over magnesium sulfate, filtered and concentrated, and a compound represented by the following formula, ie, 5,7,8-triiodo-3- (trifluoromethylsulfonyloxy) 2-Naphthaldehyde (134 mg, 80%) was obtained.
1H−NMR(CDCl3)δ10.35(s,1H),8.89(s,1H),8.65(s,1H),8.13(s,1H)
13C−NMR(CDCl3)δ185.90,149.37,147.01,143.54,135.78,135.20,129.13,126.69,119.21(q,J=319.7Hz),116.36,112.56,99.73。
1 H-NMR (CDCl 3 ) δ 10.35 (s, 1H), 8.89 (s, 1H), 8.65 (s, 1H), 8.13 (s, 1H)
13 C-NMR (CDCl 3 ) δ 185.90, 149.37, 147.01, 143.54, 135.78, 135.20, 129.13, 126.69, 119.21 (q, J = 319. 7 Hz), 116.36, 112.56, 99.73.
[実施例1]
窒素雰囲気下で、合成例1で得た化合物(5,5’,6,6’,8,8’−ヘキサヨード−3,3’−ジホルミル−2,2’−ジヒドロキシ−1,1’−ビナフチル)0.100g,(0.091mmol)、酢酸カリウム(AcOK)75.5mg(0.547mmol)、酢酸パラジウム(Pd(Oac)2)1.15mg(5.1μmol)をジムロートを付けた二口フラスコに入れ、エチルメチルケトン(MeCOEt)を2.5ml加えて120℃で3時間撹拌した。反応後、溶媒を濃縮し、ろ紙上でクロロホルムと水を用いて洗浄することで生成物(純度98%以上)を得た。生成物をNMRおよび高分解能質量分析(HMRS)にて分析し、下記化合物であることを確認した。
[Example 1]
Under a nitrogen atmosphere, the compound (5,5 ′, 6,6 ′, 8,8′-hexaiodo-3,3′-diformyl-2,2′-dihydroxy-1,1′-binaphthyl obtained in Synthesis Example 1 was used. ) 0.100 g, (0.091 mmol), potassium acetate (AcOK) 75.5 mg (0.547 mmol), palladium acetate (Pd (Oac) 2 ) 1.15 mg (5.1 μmol) with a Dimroth flask Then, 2.5 ml of ethyl methyl ketone (MeCOEt) was added and stirred at 120 ° C. for 3 hours. After the reaction, the solvent was concentrated, and the product (purity 98% or more) was obtained by washing with chloroform and water on the filter paper. The product was analyzed by NMR and high resolution mass spectrometry (HMRS) and confirmed to be the following compound.
1H−NMR(DMSO−D6):δ10.43(s,2H),8.17(s,2H),8.16(s,2H)
HRMS(FAB+) M+ calcd for C22H6I4O4 841.6445, found 841.6456。
1 H-NMR (DMSO-D 6 ): δ 10.43 (s, 2H), 8.17 (s, 2H), 8.16 (s, 2H)
HRMS (FAB +) M + calcd for C 22 H 6 I 4 O 4 841.6445, found 841.6456.
[実施例2]
窒素雰囲気下で、合成例2で得た化合物(5,5’,6,6’,8,8’−ヘキサヨード−3,3’−ジホルミル−2,2’−ジヒドロキシ−1,1’−ビナフチル)0.050g(0.0456mmol)、水酸化カリウム(KOH)5.62g(0.100mmol)を、ジムロートを付けた二口フラスコに入れ、テトラヒドロフラン(THF)を3.0ml加えて80℃で5時間撹拌した。反応後、室温まで冷やし、ろ紙上でTHFと酢酸エチル(AcOEt)を用いて洗浄することで生成物(純度98%以上)を得た。生成物をNMRおよびHMRSにて分析し、下記化合物(すなわち、実施例1で得られた化合物同じ)であることを確認した。
[Example 2]
Under a nitrogen atmosphere, the compound (5,5 ′, 6,6 ′, 8,8′-hexaiodo-3,3′-diformyl-2,2′-dihydroxy-1,1′-binaphthyl obtained in Synthesis Example 2 was used. ) 0.050 g (0.0456 mmol) and potassium hydroxide (KOH) 5.62 g (0.100 mmol) were placed in a two-necked flask equipped with a Dimroth, and 3.0 ml of tetrahydrofuran (THF) was added thereto at 80 ° C. for 5 hours. Stir for hours. After the reaction, the product was cooled to room temperature and washed with THF and ethyl acetate (AcOEt) on a filter paper to obtain a product (purity 98% or more). The product was analyzed by NMR and HMRS, and confirmed to be the following compound (that is, the same compound obtained in Example 1).
1H−NMR(DMSO−D6):δ10.43(s,2H),8.17(s,2H),8.16 (s,2H)
HRMS(FAB+) M+ calcd for C22H6I4O4 841.6445, found 841.6456
1 H-NMR (DMSO-D 6 ): δ 10.43 (s, 2H), 8.17 (s, 2H), 8.16 (s, 2H)
HRMS (FAB +) M + calcd for C 22 H 6 I 4 O 4 841.6445, found 841.6456
本発明の新規なアンタントレン系化合物は、有機半導体として利用できる他、ホルミル基(さらには置換基としてのハロゲン原子)を有しているため、有機半導体の中間体(又は前駆体)として利用できる。また、本発明の方法では、上記のようなアンタントレン系化合物を、脱ハロゲン化水素などを伴う環化反応により、容易にかつ効率よく得ることができる。 The novel ananthrene compound of the present invention can be used as an organic semiconductor, and can also be used as an intermediate (or precursor) of an organic semiconductor because it has a formyl group (and a halogen atom as a substituent). . Moreover, in the method of the present invention, the above-described anthanthrene compounds can be easily and efficiently obtained by a cyclization reaction involving dehydrohalogenation.
有機半導体としては、様々なデバイス、例えば、光電変換素子(太陽電池素子、有機エレクトロルミネセンス素子など)、整流素子(ダイオード)、トランジスタなどが挙げられる。 Examples of the organic semiconductor include various devices such as photoelectric conversion elements (solar cell elements, organic electroluminescence elements, etc.), rectifying elements (diodes), transistors, and the like.
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