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JP5941317B2 - Metal coated fiber - Google Patents
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JP5941317B2 - Metal coated fiber - Google Patents

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JP5941317B2
JP5941317B2 JP2012076402A JP2012076402A JP5941317B2 JP 5941317 B2 JP5941317 B2 JP 5941317B2 JP 2012076402 A JP2012076402 A JP 2012076402A JP 2012076402 A JP2012076402 A JP 2012076402A JP 5941317 B2 JP5941317 B2 JP 5941317B2
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metal
plating
organic fiber
base material
electroless plating
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JP2013204125A (en
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敦史 望月
敦史 望月
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Achilles Corp
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Description

本発明は、電線の中心線や信号線、シールド線などの用途に使用できる金属被覆繊維に関する。   The present invention relates to a metal-coated fiber that can be used for applications such as a center line, a signal line, and a shield line of an electric wire.

従来の電線やシールド線には銅線が用いられ、自動車、電子機器、オーディオ機器等に使用されている。しかし、頻繁に屈曲やねじれが加わる用途では金属疲労により、銅線が断線しやすい問題があった。更に、取り付け加工時の引張りにより、銅線が断線しやすい問題もあった。   Copper wires are used for conventional electric wires and shield wires, and are used in automobiles, electronic devices, audio devices and the like. However, in applications where bending and twisting are frequently applied, there is a problem that the copper wire is likely to break due to metal fatigue. Further, there is a problem that the copper wire is easily broken due to the tension during the mounting process.

これら問題を解決するために、特許文献1では有機繊維基材の表面に金属箔を巻き付けたもの、特許文献2〜4では有機繊維基材の表面に金属めっきを施したものが提案されている。   In order to solve these problems, Patent Document 1 proposes a metal foil wound around the surface of an organic fiber substrate, and Patent Documents 2 to 4 propose a material obtained by performing metal plating on the surface of an organic fiber substrate. .

特開平01−107415号公報JP-A-01-107415 特開2000−096431号公報JP 2000-096431 A 特開2010−059532号公報JP 2010-059532 A 特開2009−242839号公報JP 2009-242839 A

しかしながら、特許文献1では、有機繊維基材を使用しているために、銅線などの金属素線に比べて屈曲性と引張強度は向上するものの、有機繊維基材の外周に金属箔を螺旋状に巻きつける間隔が狭いと、屈曲性が不十分になる問題があった。   However, in Patent Document 1, since an organic fiber base material is used, flexibility and tensile strength are improved as compared with a metal wire such as a copper wire, but a metal foil is spiraled around the outer periphery of the organic fiber base material. When the interval of winding in the shape is narrow, there is a problem that the flexibility is insufficient.

また、特許文献2や3では、有機繊維基材の表面を酸・アルカリ溶液で処理(エッチング)することにより、有機繊維基材の表面に微細な凹凸を形成させアンカー効果によって密着性を向上させることができる。しかしながら、有機繊維基材の表面に微細な凹凸を形成するため、有機繊維基材の強度が低下する問題があった。また、有機繊維基材を窒素やアルゴンガスを用いてプラズマ処理する方法も検討されたが、こちらにおいても有機繊維基材の強度が低下する問題があった。   Further, in Patent Documents 2 and 3, by treating (etching) the surface of the organic fiber substrate with an acid / alkali solution, fine irregularities are formed on the surface of the organic fiber substrate and the adhesion is improved by the anchor effect. be able to. However, since fine irregularities are formed on the surface of the organic fiber substrate, there is a problem that the strength of the organic fiber substrate is lowered. Moreover, although the method of plasma-processing an organic fiber base material using nitrogen or argon gas was also examined, there also existed a problem which the intensity | strength of an organic fiber base material also falls here.

また、特許文献4では、有機金属錯体を含む超臨界流体を有機繊維基材に接触させ、その後活性化処理を行うことにより、有機繊維基材の表面に凹凸を設けることなく、金属めっきとの密着性を向上させることができる。しかしながら、この方法では専用の設備で高温、高圧にする必要があるため煩雑である。更に、使用する有機金属錯体が高価であるために、生産性が悪くコストが高くなる問題があった。   Further, in Patent Document 4, a supercritical fluid containing an organometallic complex is brought into contact with an organic fiber substrate, and then an activation treatment is performed, so that the surface of the organic fiber substrate is not uneven, and metal plating is performed. Adhesion can be improved. However, this method is complicated because it is necessary to set the temperature and pressure to high with dedicated equipment. Furthermore, since the organometallic complex to be used is expensive, there is a problem that productivity is low and cost is high.

そこで、本発明は、有機繊維基材の表面に設ける金属めっき膜との密着性に優れると共に、めっき処理後において有機繊維基材自体の引張強度の低下が小さく、屈曲性にも優れた金属被覆繊維を提供することを目的とする。   Therefore, the present invention is excellent in adhesion with a metal plating film provided on the surface of the organic fiber base material, and has a small decrease in tensile strength of the organic fiber base material itself after the plating treatment, and also has excellent flexibility. The object is to provide fibers.

本発明の金属被覆繊維は、有機繊維基材の表面上に、複素環を有する高分子化合物層と酸化剤として機能し且つ無電解めっきの触媒能力を有する金属塩とから構成されるめっき下地層を設け、該めっき下地層上に無電解めっき法により金属めっき膜を設けた金属被覆繊維であって、有機繊維基材は、下記式1の撚糸係数kが500〜3146の範囲であり、金属被覆繊維の引張強度は、前記めっき下地層および前記無電解めっき法による金属めっき膜を設ける前の有機繊維基材の引張強度を100%とした時の90〜100%を保持することを特徴とする。(式1)k=T×√D (T=撚糸回数(T/m)、D=総繊度(dtex))
The metal-coated fiber of the present invention is a plating base layer composed of a polymer compound layer having a heterocyclic ring and a metal salt that functions as an oxidizing agent and has an electroless plating catalytic ability on the surface of an organic fiber substrate. A metal-coated fiber in which a metal plating film is provided on the plating base layer by an electroless plating method, and the organic fiber base material has a twist coefficient k of the following formula 1 in the range of 500 to 3146, and a metal The tensile strength of the coated fiber is maintained at 90 to 100% when the tensile strength of the organic fiber base material is set to 100% before providing the plating base layer and the metal plating film by the electroless plating method. To do. (Expression 1) k = T × √D (T = number of twisted yarns (T / m), D = total fineness (dtex))

本発明の金属被覆繊維は、有機繊維基材の表面に設ける金属めっき膜との密着性に優れると共に、めっき処理後において有機繊維基材自体の引張強度の低下が小さく、屈曲性にも優れたものである。   The metal-coated fiber of the present invention has excellent adhesion to the metal plating film provided on the surface of the organic fiber substrate, and after the plating treatment, the decrease in the tensile strength of the organic fiber substrate itself is small and the flexibility is excellent. Is.

撚糸係数k≦4200の有機繊維基材に、めっき下地層および無電解めっき法により金属めっき膜を設けた金属被覆繊維を説明する図である。It is a figure explaining the metal-coated fiber which provided the metal plating film by the metal-plating base layer and the electroless-plating method in the organic fiber base material of the twist yarn coefficient k <= 4200. 撚糸係数kが4200を超える有機繊維基材に、めっき下地層および無電解めっき法により金属めっき膜を設けた金属被覆繊維を説明する図である。It is a figure explaining the metal coating fiber which provided the metal plating film by the metal-plating base layer and the electroless-plating method in the organic fiber base material whose twist yarn coefficient k exceeds 4200.

本発明について詳細に説明する。
本発明は、有機繊維基材の表面上に、複素環を有する高分子化合物層と酸化剤として機能し且つ無電解めっきの触媒能力を有する金属塩とから構成されるめっき下地層を設け、該めっき下地層上に無電解めっき法により金属めっき膜を設けた金属被覆繊維であって、有機繊維基材は、下記式1の撚糸係数kが500〜3146の範囲であることを特徴とする。
(式1)k=T×√D (T=撚糸回数(T/m)、D=総繊度(dtex))
また、得られる金属被覆繊維は、図1に示すようにめっき下地層や金属めっき膜が有機繊維基材の内部まで浸透するため、金属被覆繊維の抵抗が低くなる。更に、有機繊維基材と金属めっき膜との密着性にも優れる。その上、得られる金属被覆繊維の引張強度は、前記めっき下地層および前記無電解めっき法による金属めっき膜を設ける前の有機繊維基材の引張強度を100%とした時の90〜100%を保持する。
The present invention will be described in detail.
The present invention provides, on the surface of an organic fiber base material, a plating base layer composed of a polymer compound layer having a heterocyclic ring and a metal salt that functions as an oxidizing agent and has a catalytic ability for electroless plating, A metal-coated fiber in which a metal plating film is provided on a plating base layer by an electroless plating method, and the organic fiber base material has a twist coefficient k of the following formula 1 in a range of 500 to 3146 .
(Expression 1) k = T × √D (T = number of twisted yarns (T / m), D = total fineness (dtex))
Moreover, since the metal-plating base layer and a metal plating film osmose | permeate the inside of an organic fiber base material as shown in FIG. 1, the metal-coated fiber obtained becomes low in resistance of metal coating fiber. Furthermore, it is excellent also in the adhesiveness of an organic fiber base material and a metal plating film. In addition, the tensile strength of the resulting metal-coated fiber is 90 to 100% when the tensile strength of the organic fiber substrate before the plating base layer and the metal plating film by the electroless plating method are taken as 100%. Hold.

(1)有機繊維基材
本発明に使用する前記有機繊維基材としては、下記式1の撚糸係数kが500〜3146の範囲のものである。(式1)k=T×√D (T=撚糸回数(T/m)、D=総繊度(dtex))
このように「撚糸係数k」とは、T=撚糸回数に、√D=総繊度を掛け算した値である。また、撚糸係数kが500〜3146の値となるように、特定のD=総繊度(dtex)の有機繊維を、特定のT=撚糸回数(T/m)で撚糸した有機繊維基材を用いる。撚糸係数kが3146を超えると、図2に示すようにめっき下地層や金属めっき膜が有機繊維基材の内部まで浸透せず、得られる金属被覆繊維の抵抗が高くなる、更に、有機繊維基材と金属めっき膜との密着性にも劣る。撚糸係数kが500未満であると、有機繊維基材をアルカリ溶液へ浸漬させると、引張強度が低下する場合がある。なお、撚糸係数kが500〜3146の有機繊維基材を用いて得られた金属被覆繊維の引張強度は、めっき下地層および無電解めっき法による金属めっき膜を設ける前の有機繊維基材の引張強度を100%とした時の90%以上を保持しやすい。
(1) Organic fiber substrate The organic fiber substrate used in the present invention has a twisting coefficient k of the following formula 1 in the range of 500 to 3146 . (Expression 1) k = T × √D (T = number of twisted yarns (T / m), D = total fineness (dtex))
Thus, “twisted yarn coefficient k” is a value obtained by multiplying T = twisted yarn count by √D = total fineness. Further, an organic fiber base material obtained by twisting an organic fiber having a specific D = total fineness (dtex) at a specific T = twisting number of yarns (T / m) so that the twisting coefficient k is a value of 500 to 3146 is used. . When the twisting coefficient k exceeds 3146 , the plating base layer and the metal plating film do not penetrate into the inside of the organic fiber base as shown in FIG. 2, and the resistance of the resulting metal-coated fiber is increased. The adhesion between the material and the metal plating film is also poor. If the twisted yarn coefficient k is less than 500, the tensile strength may be lowered when the organic fiber substrate is immersed in an alkaline solution. In addition, the tensile strength of the metal-coated fiber obtained using the organic fiber base material having a twisting coefficient k of 500 to 3146 is the tensile strength of the organic fiber base material before providing the plating base layer and the metal plating film by the electroless plating method. It is easy to keep 90% or more when the strength is 100%.

また、ここでいう「D=総繊度(dtex)」とは、糸の太さを表すものである。糸の断面は真円ではなく様々な形が考えられることから、長さと重さの比でその太さを表現する。フィラメント糸の場合は『デシテックス(dtex)』が用いられる。なお、デシテックスは10,000mあたりのグラム数である。   Further, “D = total fineness (dtex)” here represents the thickness of the yarn. Since the cross-section of the thread is not a perfect circle, but can have various shapes, the thickness is expressed by the ratio of length to weight. In the case of a filament yarn, “decitex (dtex)” is used. Decitex is the number of grams per 10,000 m.

また、ここでいう「T=撚糸回数(T/m)」とは、1mあたりの撚り回数である。   Further, “T = twisted yarn number (T / m)” here is the number of twists per 1 m.

本発明の有機繊維基材の材料としては、特に限定されないが、アラミド繊維、芳香族ポリエステル繊維、ポリパラフェニレンベンゾビスオキサゾール繊維などの高強度特性を有するものが望ましい。   The material of the organic fiber base material of the present invention is not particularly limited, but materials having high strength properties such as aramid fiber, aromatic polyester fiber, polyparaphenylene benzobisoxazole fiber are desirable.

また、本発明の有機繊維基材は、めっき下地層を形成する前に該基材表面に親水化処理を行ってもよい。該基材表面に親水化処理を施すことで、複素環を有する化合物層が該基材表面から発生した官能基と水素結合し、密着性を高めることができる。また、めっき下地層(=複素環を有する化合物と金属塩とを含有する層)を形成しやすくなり、無電解めっき法による金属めっき膜の析出性と密着性が良好になる。
該基材表面を親水化処理する方法としては、任意の適切な方法が採用され得る。前記親水化処理は、例えば、乾式処理でもよく、湿式処理でもよい。乾式処理としては、例えば、コロナ放電処理、プラズマ処理(窒素やアルゴンガスを用いたプラズマ処理は除く)及びグロー放電処理などの放電処理;オゾン処理;UVオゾン処理;紫外線処理及び電子線処理などの電離活性線処理などが挙げられる。湿式処理としては、例えば、水、アセトンなどの溶媒を用いた超音波処理;アルカリ処理;アンカーコート処理などが挙げられる。これらの処理は、単独で行ってもよいし、2つ以上を組み合せて行ってもよい。
In addition, the organic fiber substrate of the present invention may be subjected to a hydrophilic treatment on the surface of the substrate before forming the plating base layer. By subjecting the surface of the base material to a hydrophilic treatment, the compound layer having a heterocyclic ring can be hydrogen-bonded with a functional group generated from the surface of the base material, thereby improving adhesion. Moreover, it becomes easy to form a plating underlayer (= a layer containing a compound having a heterocyclic ring and a metal salt), and the deposition and adhesion of the metal plating film by the electroless plating method are improved.
Any appropriate method can be adopted as a method for hydrophilizing the substrate surface. The hydrophilic treatment may be, for example, a dry treatment or a wet treatment. Examples of the dry treatment include discharge treatment such as corona discharge treatment, plasma treatment (excluding plasma treatment using nitrogen or argon gas) and glow discharge treatment; ozone treatment; UV ozone treatment; ultraviolet ray treatment and electron beam treatment. Examples include ionizing active ray treatment. Examples of the wet treatment include ultrasonic treatment using a solvent such as water and acetone; alkali treatment; anchor coat treatment. These processes may be performed independently or in combination of two or more.

(2)めっき下地層
本発明のめっき下地層は、複素環を有する高分子化合物層と酸化剤として機能し且つ無電解めっきの触媒能力を有する金属塩とから構成される。
(2) Plating underlayer The plating underlayer of the present invention is composed of a polymer compound layer having a heterocyclic ring and a metal salt that functions as an oxidizing agent and has a catalytic ability for electroless plating.

本発明に使用する複素環を有する化合物としては、例えば、ピロール、N−メチルピロール、N−エチルピロール、N−フェニルピロール、N−ナフチルピロール、N−メチル−3−メチルピロール、N−メチル−3−エチルピロール、N−フェニル−3−メチルピロール、N−フェニル−3−エチルピロール、3−メチルピロール、3−エチルピロール、3−n−ブチルピロール、3−メトキシピロール、3−エトキシピロール、3−n−プロポキシピロール、3−n−ブトキシピロール、3−フェニルピロール、3−トルイルピロール、3−ナフチルピロール、3−フェノキシピロール、3−メチルフェノキシピロール、3−アミノピロール、3−ジメチルアミノピロール、3−ジエチルアミノピロール、3−ジフェニルアミノピロール、3−メチルフェニルアミノピロール及び3−フェニルナフチルアミノピロール等のピロール誘導体;チオフェン、3−メチルチオフェン、3−n−ブチルチオフェン、3−n−ペンチルチオフェン、3−n−ヘキシルチオフェン、3−n−ヘプチルチオフェン、3−n−オクチルチオフェン、3−n−ノニルチオフェン、3−n−デシルチオフェン、3−n−ウンデシルチオフェン、3−n−ドデシルチオフェン、3−メトキシチオフェン、3−ナフトキシチオフェン及び3,4−エチレンジオキシチオフェン等のチオフェン誘導体等が挙げられ、好ましくはピロール、チオフェン及び3,4−エチレンジオキシチオフェン等が挙げられ、より好ましくはピロールが挙げられる。   Examples of the compound having a heterocyclic ring used in the present invention include pyrrole, N-methylpyrrole, N-ethylpyrrole, N-phenylpyrrole, N-naphthylpyrrole, N-methyl-3-methylpyrrole, N-methyl- 3-ethylpyrrole, N-phenyl-3-methylpyrrole, N-phenyl-3-ethylpyrrole, 3-methylpyrrole, 3-ethylpyrrole, 3-n-butylpyrrole, 3-methoxypyrrole, 3-ethoxypyrrole, 3-n-propoxypyrrole, 3-n-butoxypyrrole, 3-phenylpyrrole, 3-toluylpyrrole, 3-naphthylpyrrole, 3-phenoxypyrrole, 3-methylphenoxypyrrole, 3-aminopyrrole, 3-dimethylaminopyrrole 3-diethylaminopyrrole, 3-diphenylaminopyrrole Pyrrole derivatives such as 3-methylphenylaminopyrrole and 3-phenylnaphthylaminopyrrole; thiophene, 3-methylthiophene, 3-n-butylthiophene, 3-n-pentylthiophene, 3-n-hexylthiophene, 3-n- Heptylthiophene, 3-n-octylthiophene, 3-n-nonylthiophene, 3-n-decylthiophene, 3-n-undecylthiophene, 3-n-dodecylthiophene, 3-methoxythiophene, 3-naphthoxythiophene and Examples include thiophene derivatives such as 3,4-ethylenedioxythiophene, preferably pyrrole, thiophene, and 3,4-ethylenedioxythiophene, and more preferably pyrrole.

また、前記複素環を有する化合物を高分子化する際の処理温度は、本発明に使用される複素環を有する化合物の種類によって適宜選択されるが、好ましくは10℃〜130℃である。   The treatment temperature for polymerizing the compound having a heterocyclic ring is appropriately selected depending on the type of the compound having a heterocyclic ring used in the present invention, and is preferably 10 ° C to 130 ° C.

本発明に使用する酸化剤として機能し且つ無電解めっきの触媒能力を有する金属塩としては、例えば、硝酸銀、酢酸銀、硫酸銀、過塩素酸銀等、フッ化銀、亜硝酸銀、塩化銀、臭化銀、プロピオン酸銀、酒石酸銀、メチルエチル酢酸銀、トリメチル酢酸銀、炭酸銀、シュウ酸銀、雷酸銀の銀塩;硝酸銅、硫酸銅、塩化銅、塩素酸銅、過塩素酸銅、臭化銅、酢酸銅、炭酸銅、シュウ酸銅等の銅塩;硝酸ニッケル、硫酸ニッケル、塩化ニッケル、臭化ニッケル、酢酸ニッケル、炭酸ニッケル、シュウ酸ニッケル等のニッケル塩;硫酸パラジウム、硝酸パラジウム、酢酸パラジウム、塩化パラジウム、臭化パラジウム、ヨウ化パラジウム等のパラジウム塩などが挙げられる。この中でも、ハロゲン化物が好ましく、特に塩化パラジウムが好ましい。   Examples of the metal salt that functions as an oxidizing agent used in the present invention and has the electroless plating catalytic ability include, for example, silver nitrate, silver acetate, silver sulfate, silver perchlorate, silver fluoride, silver nitrite, silver chloride, Silver bromide, silver propionate, silver tartrate, silver methyl ethyl acetate, silver trimethyl acetate, silver carbonate, silver oxalate, silver thrombate; copper nitrate, copper sulfate, copper chloride, copper chlorate, perchloric acid Copper salts such as copper, copper bromide, copper acetate, copper carbonate, copper oxalate; nickel salts such as nickel nitrate, nickel sulfate, nickel chloride, nickel bromide, nickel acetate, nickel carbonate, nickel oxalate; palladium sulfate, Examples thereof include palladium salts such as palladium nitrate, palladium acetate, palladium chloride, palladium bromide, palladium iodide and the like. Among these, halides are preferable, and palladium chloride is particularly preferable.

本発明のめっき下地層(複素環を有する高分子化合物層及び該層に吸着された無電解めっきの触媒能力を有する金属塩から構成される)の形成方法としては、以下の(a)乃至(c)のいずれかを採用することができる。
(a)前記有機繊維基材を、(i)複素環を有する化合物と(ii)酸化剤として機能し且つ無電解めっきの触媒能力を有する金属塩とを含む水溶液に浸漬し、そして引き上げる工程を含む方法
(b)前記有機繊維基材を、前記複素環を有する化合物を含む水溶液に浸漬し、そして引き上げた材料を、前記金属塩を含む水溶液に浸漬する工程を含む方法
(c)前記有機繊維基材を、前記金属塩を含む水溶液に浸漬し、そして引き上げた材料を、前記複素環を有する化合物を含む蒸気に接触する工程を含む方法 前記各方法は、当業者に既知である手段を利用して行うことができる。
As a method for forming the plating underlayer of the present invention (consisting of a polymer compound layer having a heterocyclic ring and a metal salt having electroless plating catalytic ability adsorbed on the layer), the following (a) to ( Any of c) can be adopted.
(A) a step of immersing the organic fiber base material in an aqueous solution containing (i) a compound having a heterocyclic ring and (ii) a metal salt that functions as an oxidizing agent and has a catalytic ability for electroless plating, and then pulling up (B) a method comprising: immersing the organic fiber substrate in an aqueous solution containing the compound having a heterocyclic ring; and immersing the pulled material in an aqueous solution containing the metal salt (c) the organic fiber A method comprising the steps of immersing a substrate in an aqueous solution containing the metal salt and contacting the pulled material with a vapor containing the compound having a heterocyclic ring. Each method utilizes means known to those skilled in the art. Can be done.

前記(a)の方法において、前記複素環を有する化合物及び金属塩を含む水溶液を調製する場合、複素環を有する化合物と金属塩(=複素環を有する化合物/金属塩)の濃度比は0.1〜80であり、好ましくは0.1〜40である。濃度比が0.1未満であると複素環を有する化合物の酸化状態及び重合化が不十分となり、また金属塩についても還元状態が不十分となるため、無電解めっきの触媒として作用することが困難となる。一方、濃度比が80より大きいと、金属塩が材料上に均一に付着することができないため、その後のめっき処理よりにおいて、金属めっき膜も均一に形成しない虞があるからである。
また、材料を、前記複素環を有する化合物及び金属塩を含む水溶液に浸漬させる工程の処理温度は、10℃〜130℃であり、処理時間は、0.1分〜120分、好ましくは20分〜60分である。
In the method (a), when an aqueous solution containing the compound having a heterocyclic ring and a metal salt is prepared, the concentration ratio of the compound having a heterocyclic ring and the metal salt (= compound having a heterocyclic ring / metal salt) is 0. It is 1-80, Preferably it is 0.1-40. When the concentration ratio is less than 0.1, the oxidation state and polymerization of the compound having a heterocyclic ring are insufficient, and the reduction state of the metal salt is also insufficient, so that it can act as a catalyst for electroless plating. It becomes difficult. On the other hand, if the concentration ratio is greater than 80, the metal salt cannot be uniformly deposited on the material, so that the metal plating film may not be formed uniformly in the subsequent plating process.
The treatment temperature in the step of immersing the material in the aqueous solution containing the compound having a heterocyclic ring and the metal salt is 10 ° C. to 130 ° C., and the treatment time is 0.1 minute to 120 minutes, preferably 20 minutes. ~ 60 minutes.

前記(b)の方法において、前記複素環を有する化合物を含む水溶液の濃度は、5×10-4〜0.9Mであり、好ましくは0.01〜0.5Mである。
また、材料を、前記複素環を有する化合物を含む水溶液に浸漬させる工程の処理温度は、10℃〜130℃であり、処理時間は、0.1分〜50分、好ましくは1分〜40分である。
In the method (b), the concentration of the aqueous solution containing the compound having a heterocyclic ring is 5 × 10 −4 to 0.9M, preferably 0.01 to 0.5M.
Further, the treatment temperature of the step of immersing the material in the aqueous solution containing the compound having a heterocyclic ring is 10 ° C. to 130 ° C., and the treatment time is 0.1 minute to 50 minutes, preferably 1 minute to 40 minutes. It is.

前記(b)及び(c)の方法において、好ましい、前記金属塩を含む水溶液としては、0.02%塩化パラジウム−0.01%塩酸水溶液(pH3)である。
また、材料を、前記金属塩を含む水溶液に浸漬させる工程における処理温度は、10℃〜130℃であり、処理時間は、0.1分〜50分、好ましくは1分〜40分である。
In the methods (b) and (c), a preferable aqueous solution containing the metal salt is 0.02% palladium chloride-0.01% hydrochloric acid aqueous solution (pH 3).
The treatment temperature in the step of immersing the material in the aqueous solution containing the metal salt is 10 ° C. to 130 ° C., and the treatment time is 0.1 minute to 50 minutes, preferably 1 minute to 40 minutes.

前記(c)の方法において、複素環を有する化合物を含む蒸気としては、上記の複素環を有する化合物を含む水溶液を気化させた蒸気でもよいが、好ましくは複素環を有する化合物そのものを気化させた蒸気である。
また、複素環を有する化合物を含む蒸気に接触させる工程における処理温度は、10℃〜130℃であり、処理時間は、0.1分〜40分、好ましくは1分〜30分であり、処理圧力は、常圧若しくは減圧状態であってもよい。
In the method (c), the vapor containing the compound having a heterocyclic ring may be a vapor obtained by vaporizing an aqueous solution containing the compound having a heterocyclic ring, but preferably the compound itself having a heterocyclic ring is vaporized. Steam.
The treatment temperature in the step of contacting with the vapor containing the compound having a heterocyclic ring is 10 ° C. to 130 ° C., the treatment time is 0.1 minutes to 40 minutes, preferably 1 minute to 30 minutes, The pressure may be normal pressure or reduced pressure.

(3) 金属めっき膜
本発明の金属めっき膜は、めっき下地層上に無電解めっき法により設けられる。
つまり、上記(a)乃至(c)の方法で、有機繊維基材の表面にめっき下地層を設けられたものは、金属を析出させるためのめっき液に浸され、これにより無電解めっき法による金属めっき膜が形成される。
めっき液としては、通常、無電解めっきに使用されるめっき液であれば、特に限定されない。すなわち、無電解めっきに使用できる金属としては、例えば、銅、金、銀、ニッケル、及びクロム等、全て適用することができるが、銅が好ましい。無電解めっき浴の具体例としては、具体的には、ATSアドカッパーIW浴(奥野製薬工業(株)製)等が挙げられる。
無電解めっきの処理温度は、20℃〜50℃、好ましくは30℃〜40℃であり、処理時間は10分〜40分、好ましくは15分〜30分である。
(3) Metal Plating Film The metal plating film of the present invention is provided on the plating base layer by an electroless plating method.
That is, in the method of (a) to (c) above, the surface of the organic fiber base material provided with the plating underlayer is immersed in a plating solution for depositing a metal, thereby using an electroless plating method. A metal plating film is formed.
The plating solution is not particularly limited as long as it is a plating solution usually used for electroless plating. That is, as a metal that can be used for electroless plating, for example, copper, gold, silver, nickel, chromium, and the like can be applied, but copper is preferable. Specific examples of the electroless plating bath include ATS add-copper IW bath (Okuno Pharmaceutical Co., Ltd.) and the like.
The treatment temperature for electroless plating is 20 ° C. to 50 ° C., preferably 30 ° C. to 40 ° C., and the treatment time is 10 minutes to 40 minutes, preferably 15 minutes to 30 minutes.

また、無電解めっき法により形成された金属めっき膜の厚みは、0.3〜3μmとすることが好ましい。この金属めっき膜の厚みが3μmを超えると、柔軟性が低下する場合があり、厚みが0.3μm未満であると、例えば電線の中心線や信号線、シールド材として機能しない場合がある。   Moreover, it is preferable that the thickness of the metal plating film formed by the electroless plating method is 0.3 to 3 μm. When the thickness of the metal plating film exceeds 3 μm, the flexibility may be lowered, and when the thickness is less than 0.3 μm, for example, the metal plating film may not function as a center line, a signal line, or a shielding material of the electric wire.

また、無電解めっき法により形成された金属めっき膜上に、溶融錫めっきや電気めっきを行ってもよい。特に、耐熱性の高い有機繊維基材を使用した場合、溶融錫めっきが有効である。   Alternatively, hot tin plating or electroplating may be performed on a metal plating film formed by an electroless plating method. In particular, when an organic fiber base material having high heat resistance is used, hot-dip tin plating is effective.

また、本発明の金属被覆繊維は、電線の中心線や信号線、シールド材として使用する際、必要に応じて撚りを加えてもよ
The metal coated fibers of the present invention, the center lines and signal lines of the electric wire, when used as a shield material, but it may also be added to twist as needed.

次に、本発明を実施例により更に詳細に説明するが、本発明は実施例に限定されるものでない。   EXAMPLES Next, although an Example demonstrates this invention still in detail, this invention is not limited to an Example.

[実施例1]
<めっき下地層形成方法>
ピロールモノマー6.5mM、塩化パラジウム水溶液0.25mM、及び塩酸10mMをイオン交換水に加えて、この水溶液を混合した。そして、この混合液へ、D:総繊度が110dtex、T:撚糸回数が100T/m、つまり、k:撚糸係数が1048のアラミド繊維(Kevlar 東レ・デュポン(株)製)からなる基材を80℃で30分間浸漬し、その後、イオン交換水で洗浄し、乾燥させてめっき下地層を形成した。
<無電解めっき>
次に、前記めっき下地層を形成したアラミド繊維からなる基材を、無電解めっき浴(メルプレートCU5100P浴、メルテックス(株)製)に50℃で20分間浸漬して銅膜を形成し、金属被覆繊維を得た。
[Example 1]
<Plating underlayer formation method>
Pyrrol monomer 6.5 mM, palladium chloride aqueous solution 0.25 mM, and hydrochloric acid 10 mM were added to ion-exchanged water, and this aqueous solution was mixed. Then, a base material made of aramid fibers (Kevlar Toray DuPont Co., Ltd.) having D: total fineness of 110 dtex, T: number of twisted yarns of 100 T / m, that is, k: twisting factor of 1048, is added to this mixed solution. Immersion at 30 ° C. for 30 minutes, followed by washing with ion-exchanged water and drying to form a plating underlayer.
<Electroless plating>
Next, the base material made of aramid fibers on which the plating base layer is formed is immersed in an electroless plating bath (Melplate CU5100P bath, manufactured by Meltex Co., Ltd.) at 50 ° C. for 20 minutes to form a copper film, Metal-coated fibers were obtained.

[実施例3]
D:総繊度が110dtex、T:撚糸回数が300T/m、つまり、k:撚糸係数が3146のアラミド繊維からなる基材を用いた以外は実施例1と同様の操作を行い、めっき下地層を形成した。
その後、実施例1と同様の操作にて無電解めっきを行って銅膜を形成し、金属被覆繊維を得た。
[Example 3]
D: Total fineness is 110 dtex, T: Twisted yarn count is 300 T / m, that is, k: The same operation as in Example 1 is used except that a base material made of aramid fiber having a twist yarn coefficient of 3146 is used. Formed.
Thereafter, electroless plating was performed in the same manner as in Example 1 to form a copper film, and metal coated fibers were obtained.

[比較例1]
(有機繊維基材の前処理:エッチング)
D:総繊度が110dtex、T:撚糸回数が100T/m、つまり、k:撚糸係数が1048のアラミド繊維からなる基材を、塩基性繊維クリーニング-表面活性剤溶液に25℃で3分間浸漬し、イオン交換水で洗浄した。次に90%硫酸溶液に30℃で30秒間浸漬し、イオン交換水で洗浄した。
(触媒付与)
前処理を行ったアラミド繊維基材を、Sn−Pd系コロイドを含む35%塩酸水溶液 に30℃で3分間浸漬し、水洗した。
(活性化)。
次に98%硫酸溶液100mL/Lに40℃で3分間浸漬し、水洗した。
(無電解めっき)
触媒付与と活性化を行ったアラミド繊維からなる基材を、無電解めっき浴(メルプレートCU5100P浴 メルテックス(株)製)に50℃で20分間浸漬して銅膜を形成し、金属被覆繊維を得た。
[Comparative Example 1]
(Pretreatment of organic fiber substrate: Etching)
D: Total fineness of 110 dtex, T: Twisting yarn number of 100 T / m, that is, k: Substrate made of aramid fiber having a twisting coefficient of 1048 is immersed in a basic fiber cleaning-surfactant solution at 25 ° C. for 3 minutes. And washed with ion-exchanged water. Next, it was immersed in a 90% sulfuric acid solution at 30 ° C. for 30 seconds and washed with ion-exchanged water.
(Catalyst added)
The pretreated aramid fiber substrate was immersed in a 35% hydrochloric acid aqueous solution containing Sn—Pd colloid for 3 minutes at 30 ° C. and washed with water.
(activation).
Next, it was immersed in a 98% sulfuric acid solution 100 mL / L for 3 minutes at 40 ° C. and washed with water.
(Electroless plating)
A base material made of aramid fibers subjected to catalyst application and activation is immersed in an electroless plating bath (Melplate CU5100P bath Meltex Co., Ltd.) for 20 minutes at 50 ° C. to form a copper film, and metal coated fibers Got.

[比較例2]
(有機繊維基材の前処理:プラズマ)
D:総繊度が110dtex、T:撚糸回数が100T/m、つまり、k:撚糸係数が1048のアラミド繊維からなる基材に、ダイレクト方式のグロー放電プラズマ処理装置にてプラズマ処理(電圧:15kV、窒素ガス:25L/min、処理時間:10秒)を実施した。
(触媒付与)
前処理を行ったアラミド繊維からなる基材を、Sn−Pd系コロイドを含む35%塩酸水溶液 に30℃で3分間浸漬し、水洗した。
(活性化)。
次に98%硫酸溶液100mL/Lに40℃で3分間浸漬し、水洗した。
(無電解めっき)
触媒付与と活性化を行ったアラミド繊維からなる基材を、無電解めっき浴(メルプレートCU5100P浴 メルテックス(株)製)に50℃で20分間浸漬して銅膜を形成し、金属被覆繊維を得た。
[Comparative Example 2]
(Pretreatment of organic fiber substrate: Plasma)
D: Total fineness is 110 dtex, T: Twist yarn number is 100 T / m, that is, k: Plasma treatment (voltage: 15 kV, voltage) on a substrate made of aramid fiber with a twist coefficient of 1048 Nitrogen gas: 25 L / min, treatment time: 10 seconds).
(Catalyst added)
The pre-treated aramid fiber substrate was immersed in a 35% aqueous hydrochloric acid solution containing Sn—Pd colloid for 3 minutes at 30 ° C. and washed with water.
(activation).
Next, it was immersed in a 98% sulfuric acid solution 100 mL / L for 3 minutes at 40 ° C. and washed with water.
(Electroless plating)
A base material made of aramid fibers subjected to catalyst application and activation is immersed in an electroless plating bath (Melplate CU5100P bath Meltex Co., Ltd.) for 20 minutes at 50 ° C. to form a copper film, and metal coated fibers Got.

[比較例3]
D:総繊度が110dtex、T:撚糸回数が450T/m、つまり、k:撚糸係数が4720のアラミド繊維からなる基材を用いた以外は実施例1と同様の操作を行い、めっき下地層を形成した。
その後、実施例1と同様の操作にて無電解めっきを行って銅膜を形成し、金属被覆繊維を得た。
[Comparative Example 3]
D: Total fineness is 110 dtex, T: Twisted yarn count is 450 T / m, that is, k: The same procedure as in Example 1 is used except that a base material made of aramid fiber having a twist coefficient of 4720 is used, and the plating underlayer is formed. Formed.
Thereafter, electroless plating was performed in the same manner as in Example 1 to form a copper film, and metal coated fibers were obtained.

[参考例]
直径0.1mmの銅線10本を束ねたものを用いた。
[Reference example]
A bundle of 10 copper wires having a diameter of 0.1 mm was used.

上記で製造した実施例1と3、並びに比較例1〜3の金属被覆繊維において、各種の評価試験を行い、その結果を表1に纏めた。また、参考例の銅線においては、抵抗値と屈曲性の評価試験を行った。尚、評価試験項目及びその評価方法・評価基準は以下の通りである。
Various evaluation tests were performed on the metal-coated fibers of Examples 1 and 3 and Comparative Examples 1 to 3 manufactured above, and the results are summarized in Table 1. In addition, the copper wire of the reference example was subjected to an evaluation test of resistance value and flexibility. The evaluation test items, evaluation methods and evaluation criteria are as follows.

<抵抗値>
得られた金属被覆繊維について、デジタルテスター(CUSTOM CDM−2000D)を用いて、2端子間の距離を1mとし抵抗を測定した。
<Resistance value>
About the obtained metal-coated fiber, the distance between two terminals was set to 1 m using a digital tester (CUSTOM CDM-2000D), and the resistance was measured.

<密着性>
得られた金属被覆繊維にテープを貼り付け、荷重2Kgのローラーで圧着した。その後テープを引き剥がし、めっき膜のテープへの移行を評価した。評価基準は以下の通りとした。
○:めっき膜のテープへの移行なし
×:めっき膜のテープへの移行あり
<Adhesion>
A tape was affixed to the obtained metal-coated fiber, and pressure-bonded with a roller having a load of 2 kg. Thereafter, the tape was peeled off, and the migration of the plating film to the tape was evaluated. The evaluation criteria were as follows.
○: No transfer of plating film to tape ×: Transfer of plating film to tape

<引張強度>
得られた金属被覆繊維について、JIS L1013化学繊維フィラメント糸試験方法に準じて、引張試験を実施した。なお、めっき下地層および前記無電解めっき法による金属めっき膜を設ける前の有機繊維基材の引張強度を100%とし、得られた金属被覆繊維の引張強度を相対的に評価した。
<Tensile strength>
The obtained metal-coated fiber was subjected to a tensile test according to the JIS L1013 chemical fiber filament yarn test method. In addition, the tensile strength of the organic fiber base material before providing a plating base layer and the metal plating film by the said electroless-plating method was set to 100%, and the tensile strength of the obtained metal-coated fiber was evaluated relatively.

<屈曲性>
(試験前)
屈曲試験前に、得られた金属被覆繊維について、デジタルテスター(CUSTOM CDM−2000D)を用いて、2端子間の距離を0.1mとし抵抗を測定した。
(試験後)
MIT 耐折度試験機(テスター産業(株))にて、荷重2.9N、屈曲角度270°、屈曲半径0.38mm、屈曲速度175回/分の条件下で、得られた金属被覆繊維を100回屈曲させた後、デジタルテスター(CUSTOM CDM−2000D)を用いて、2端子間の距離を0.1mとし抵抗を測定した。
<Flexibility>
(Before test)
Before the bending test, the resistance of the metal-coated fiber obtained was measured using a digital tester (CUSTOM CDM-2000D) with a distance between two terminals of 0.1 m.
(After test)
Using the MIT folding resistance tester (Tester Sangyo Co., Ltd.), the obtained metal-coated fiber was loaded under the conditions of a load of 2.9 N, a bending angle of 270 °, a bending radius of 0.38 mm, and a bending speed of 175 times / minute. After bending 100 times, the resistance was measured using a digital tester (CUSTOM CDM-2000D) with the distance between the two terminals being 0.1 m.

Claims (1)

有機繊維基材の表面上に、複素環を有する高分子化合物層と酸化剤として機能し且つ無電解めっきの触媒能力を有する金属塩とから構成されるめっき下地層を設け、該めっき下地層上に無電解めっき法により金属めっき膜を設けた金属被覆繊維であって、
有機繊維基材は、下記式1の撚糸係数kが500〜3146の範囲であり、
金属被覆繊維の引張強度は、前記めっき下地層および前記無電解めっき法による金属めっき膜を設ける前の有機繊維基材の引張強度を100%とした時の90〜100%を保持することを特徴とする金属被覆繊維。
(式1)k=T×√D (T=撚糸回数(T/m)、D=総繊度(dtex))
On the surface of the organic fiber base material, a plating base layer composed of a polymer compound layer having a heterocyclic ring and a metal salt that functions as an oxidizing agent and has a catalytic ability for electroless plating is provided. A metal-coated fiber provided with a metal plating film by an electroless plating method,
The organic fiber base material has a twist coefficient k of the following formula 1 in the range of 500 to 3146,
The tensile strength of the metal-coated fiber is maintained at 90 to 100% when the tensile strength of the organic fiber base material is 100% before providing the plating base layer and the metal plating film by the electroless plating method. Metal coated fiber.
(Expression 1) k = T × √D (T = number of twisted yarns (T / m), D = total fineness (dtex))
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