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JP6019012B2 - High frequency circuit board - Google Patents
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JP6019012B2 - High frequency circuit board - Google Patents

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JP6019012B2
JP6019012B2 JP2013259739A JP2013259739A JP6019012B2 JP 6019012 B2 JP6019012 B2 JP 6019012B2 JP 2013259739 A JP2013259739 A JP 2013259739A JP 2013259739 A JP2013259739 A JP 2013259739A JP 6019012 B2 JP6019012 B2 JP 6019012B2
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liquid crystal
crystal polymer
metal foil
thermoplastic liquid
circuit board
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JP2014060449A (en
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一行 大森
一行 大森
砂本 辰也
辰也 砂本
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Kuraray Co Ltd
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Description

本発明は、高周波伝送特性に優れ、かつフィルムとの密着性が十分な高周波回路基板に関し、特に、高周波伝送特性に優れ、かつフィルムとの密着性が十分な熱可塑性液晶ポリマーを絶縁層とする高周波回路基板に関する。   The present invention relates to a high-frequency circuit board having excellent high-frequency transmission characteristics and sufficient adhesion to a film, and in particular, a thermoplastic liquid crystal polymer having excellent high-frequency transmission characteristics and sufficient adhesion to a film as an insulating layer. The present invention relates to a high frequency circuit board.

近年、高速伝送の普及に伴い、高速伝送時の伝送損失の小さい材料が求められる。熱可塑性液晶ポリマーフィルムは、高速伝送時の伝送損失の小さい材料として知られているが(特許文献1)、伝送線路となる金属箔の形状、特に金属箔表面の凹凸が大きいと熱可塑性液晶ポリマーフィルムの高速伝送時の伝送損失が小さいという特性が十分に発揮されないことになり、表面粗度が小さい低粗度の金属箔が望ましいということになる(特許文献2)。しかしながら、低粗度の金属箔を用いると金属箔と熱可塑性液晶ポリマーフィルムとの密着性が不十分となるので、伝送損失と密着性の両者の特性を満足させるために種々の試みがなされてきているが、いまだ十分な解決を見ていない。   In recent years, with the spread of high-speed transmission, a material having a small transmission loss during high-speed transmission is required. The thermoplastic liquid crystal polymer film is known as a material having a small transmission loss during high-speed transmission (Patent Document 1). However, if the shape of the metal foil serving as a transmission line, particularly the irregularities on the surface of the metal foil, is large, the thermoplastic liquid crystal polymer film. The characteristic that the transmission loss at the time of high-speed transmission of the film is small is not sufficiently exhibited, and a low-roughness metal foil with a low surface roughness is desirable (Patent Document 2). However, when a low-roughness metal foil is used, the adhesion between the metal foil and the thermoplastic liquid crystal polymer film becomes insufficient, and various attempts have been made to satisfy the characteristics of both transmission loss and adhesion. But still haven't seen enough resolution.

特開2006−179609号公報JP 2006-179609 A WO2005−037538号パンフレットWO2005-037538 pamphlet

本発明は、上記の点に鑑みてなされたものであり、高周波回路における電気信号の伝送損失を低減することができると共に金属箔と樹脂との密着性が高い、高周波回路基板を提供することを目的とするものである。   The present invention has been made in view of the above points, and provides a high-frequency circuit board that can reduce electrical signal transmission loss in a high-frequency circuit and has high adhesion between a metal foil and a resin. It is the purpose.

本発明者らは、金属箔表面の粗度(Rz)、すなわち凹凸の高さだけでなく、粗度(Rz)と凹凸間の間隔()の両面から、金属箔表面の特性を見ることが重要であることを見出し、粗度が特定範囲内にあるとともに、粗度(Rz)と間隔()との比(Rz/)が特定範囲内にあるとき、伝送損失が少なく、かつ、熱可塑性液晶ポリマーと金属箔(回路)との密着性の優れた高周波回路基板が得られることを見出し、本発明に到達した。 The present inventors see the characteristics of the surface of the metal foil not only from the roughness (Rz) of the surface of the metal foil, that is, the height of the unevenness, but also from both sides of the roughness (Rz) and the interval between the unevenness ( S ). And the ratio of the roughness (Rz) to the interval ( S ) (Rz / S ) is within the specific range, and the transmission loss is small, and The present inventors have found that a high-frequency circuit board having excellent adhesion between a thermoplastic liquid crystal polymer and a metal foil (circuit) can be obtained, and the present invention has been achieved.

すなわち、本発明により、表面に凹凸を有する金属箔であって、表面粗度(Rz)が0.5〜5μmの範囲内にあり、表面粗度(Rz)と表面の凹凸間の間隔(S)との比(
Rz/S)が、1.5〜2.5の範囲内(但し、Sが2μm以上を除く)にある表面を有する金属箔に、熱可塑性液晶ポリマーフィルムを積層した積層体からなる、40GHzにおける伝送損失が−0.35db/cmより少なく、前記金属箔と前記熱可塑性液晶フィルム間の接着強度が0.5kgf/cm以上である高周波回路基板が提供される。なお、本発明において表面粗度(Rz)および凹凸間の間隔(S)の測定方法の詳細は後述する。
That is, according to the present invention, a metal foil having irregularities on the surface, the surface roughness (Rz) is in the range of 0.5 to 5 μm, and the distance between the surface roughness (Rz) and the irregularities on the surface (S ) Ratio (
Rz / S) is composed of a laminate in which a thermoplastic liquid crystal polymer film is laminated on a metal foil having a surface in the range of 1.5 to 2.5 (excluding S of 2 μm or more), at 40 GHz. There is provided a high frequency circuit board having a transmission loss of less than −0.35 db / cm and an adhesive strength between the metal foil and the thermoplastic liquid crystal film of 0.5 kgf / cm or more. In the present invention, details of the method for measuring the surface roughness (Rz) and the interval (S) between the irregularities will be described later.

上記高周波回路基板において、表面粗度(Rz)と表面の凹凸間の間隔()との比(Rz/)が、1.5〜2.5の範囲内にあることが好ましく、金属箔は銅箔であることが好ましい。 In the above high-frequency circuit board, the ratio (Rz / S ) of the surface roughness (Rz) to the spacing ( S ) between the surface irregularities is preferably in the range of 1.5 to 2.5, and the metal foil Is preferably a copper foil.

本発明は、特定範囲の表面粗度(Rz)を有し、かつ、表面粗度(Rz)と凹凸間の間隔()との比率(Rz/)が特定範囲内にある金属箔を用いることにより、熱可塑性液晶ポリマーフィルムと金属箔との接着力が高く、かつ、高周波伝送損失の少ない高周波回路基板を得ることができる。 The present invention provides a metal foil having a surface roughness (Rz) in a specific range and a ratio (Rz / S ) between the surface roughness (Rz) and the interval ( S ) between the irregularities within the specific range. By using it, it is possible to obtain a high-frequency circuit board having a high adhesive force between the thermoplastic liquid crystal polymer film and the metal foil and low high-frequency transmission loss.

(金属箔)
本発明において用いられる金属箔として導電性を有するものであれば特に限定されないが、金、銀、銅、ステンレス、ニッケル、アルミニウムなどが例示される。好ましく用いられる金属箔としては、銅箔が挙げられる。銅箔としては、圧延法や電解法によって製造されるいずれのものでも使用することができる。金属箔の好ましい厚さ範囲は、5〜150μmであり、より好ましくは6〜70μm、特に好ましくは9〜35μmの範囲である。
(Metal foil)
Although it will not specifically limit if it has electroconductivity as metal foil used in this invention, Gold, silver, copper, stainless steel, nickel, aluminum etc. are illustrated. Copper foil is mentioned as metal foil used preferably. Any copper foil manufactured by a rolling method or an electrolytic method can be used. A preferable thickness range of the metal foil is 5 to 150 μm, more preferably 6 to 70 μm, and particularly preferably 9 to 35 μm.

(金属箔表面の表面粗度と凹凸間の間隔)
本発明において用いられる金属箔としては、表面粗度(Rz)が0.5〜5μmの範囲内にあることが必要であり、1〜4μmの範囲内にあることが好ましい。表面粗度が0.5μm未満であると、金属箔と熱可塑性液晶ポリマー層との接着性が不十分となる。また、表面粗度が5μmを超えると伝送損失が大きくなり、実用性能を満足しないことがある。
また、本発明において用いられる金属箔としては、表面粗度(Rz)と表面の凹凸間の間隔()との比(Rz/)が、1.5〜2.5の範囲内にあることが必要である。この比が1.5未満の場合には、伝送損失の点では実用性があっても、接着性に乏しくなるので実用的な回路基板を形成することができなくなり、一方、この比が2.5を超えると、接着強度の点では実用性があっても伝送損失が大きくなり、実用的な回路基板を得ることができない。
(Surface roughness on the surface of the metal foil and the spacing between the irregularities)
The metal foil used in the present invention needs to have a surface roughness (Rz) in the range of 0.5 to 5 μm, and preferably in the range of 1 to 4 μm. When the surface roughness is less than 0.5 μm, the adhesion between the metal foil and the thermoplastic liquid crystal polymer layer becomes insufficient. On the other hand, if the surface roughness exceeds 5 μm, the transmission loss increases and the practical performance may not be satisfied.
Moreover, as metal foil used in this invention, ratio (Rz / S ) of surface roughness (Rz) and the space | interval ( S ) between the unevenness | corrugations on the surface exists in the range of 1.5-2.5. It is necessary. When this ratio is less than 1.5, even if it is practical in terms of transmission loss, it becomes difficult to form a practical circuit board because of poor adhesion, while this ratio is 2. If it exceeds 5, transmission loss increases even if it is practical in terms of adhesive strength, and a practical circuit board cannot be obtained.

(金属箔表面の粗面化)
本発明において用いられる、表面粗度(Rz)が0.5〜5μmの範囲内にあり、かつ、表面粗度(Rz)と表面の凹凸間の間隔()との比(Rz/)が1.5〜2.5の範囲内にある金属箔は、金属箔形成過程において表面を細かい凹凸が形成されるように製造されてもよいが、金属箔形成後、金属箔表面を粗化処理することにより得ることも出来る。粗化処理は、金属箔の元箔に金属粒子をめっきで付着させたり、または酸洗浄等により凹凸形成したりすることにより、粒子の大きさ、粒子間の間隔の調節を行って、表面粗度(Rz)、および表面粗度(Rz)と表面の凹凸間()の間隔との比(Rz/)を充足する金属箔表面を得ることができる。めっきで付着させる粒子としては、Cuからなる粒子だけでなく、CuとMoの合金粒子、またはCuとNi、Co、Fe、C、V、Wの群から選ばれる少なくとも1種の元素からなる合金粒子によって形成されていてもよい。本発明で用いられる銅箔としては、三井金属鉱業(株)製のSQ−VLP、日鉱金属(株)製のBHY、STCS、古河電工(株)製のFWJ-WS、F3−WSなどの市販品を用いることもできる。
(Roughening of the metal foil surface)
The ratio (Rz / S ) of the surface roughness (Rz) used in the present invention is in the range of 0.5 to 5 μm and the surface roughness (Rz) and the spacing ( S ) between the irregularities on the surface. The metal foil in the range of 1.5 to 2.5 may be manufactured so that fine irregularities are formed on the surface in the process of forming the metal foil, but after forming the metal foil, the surface of the metal foil is roughened. It can also be obtained by processing. The roughening treatment is performed by adjusting the size of the particles and the interval between the particles by attaching metal particles to the base foil of the metal foil by plating, or by forming irregularities by acid cleaning or the like. It is possible to obtain a metal foil surface satisfying the ratio (Rz / S ) of the degree (Rz) and the surface roughness (Rz) and the distance between the surface irregularities ( S ). The particles to be deposited by plating are not only particles made of Cu but also alloy particles of Cu and Mo, or alloys made of Cu and at least one element selected from the group consisting of Ni, Co, Fe, C, V, and W. It may be formed by particles. As copper foil used in the present invention, SQ-VLP manufactured by Mitsui Mining & Smelting Co., Ltd., BHY and STCS manufactured by Nikko Metal Co., Ltd., FWJ-WS, F3-WS manufactured by Furukawa Electric Co., Ltd., etc. Goods can also be used.

(熱可塑性液晶ポリマーフィルム)
熱可塑性液晶ポリマーフィルムは、溶融成形できる液晶性ポリマー(または溶融時における光学的異方性を有する液晶性ポリマー)から形成され、この熱可塑性液晶ポリマーは、溶融成形できる液晶性ポリマーであればその化学的構成については特に限定されるものではないが、例えば、熱可塑性液晶ポリエステル、又はこれにアミド結合が導入された熱可塑性液晶ポリエステルアミドなどを挙げることができる。
(Thermoplastic liquid crystal polymer film)
The thermoplastic liquid crystal polymer film is formed from a liquid crystal polymer that can be melt-molded (or a liquid crystal polymer that has optical anisotropy at the time of melting), and the thermoplastic liquid crystal polymer is a liquid crystal polymer that can be melt-molded. The chemical structure is not particularly limited, and examples thereof include a thermoplastic liquid crystal polyester or a thermoplastic liquid crystal polyester amide having an amide bond introduced therein.

また熱可塑性液晶ポリマーは、芳香族ポリエステルまたは芳香族ポリエステルアミドに、更にイミド結合、カーボネート結合、カルボジイミド結合やイソシアヌレート結合などのイソシアネート由来の結合等が導入されたポリマーであってもよい。   The thermoplastic liquid crystal polymer may be a polymer in which an isocyanate-derived bond such as an imide bond, a carbonate bond, a carbodiimide bond, or an isocyanurate bond is further introduced into an aromatic polyester or an aromatic polyester amide.

本発明に用いられる熱可塑性液晶ポリマーの具体例としては、以下に例示する(1)から(4)に分類される化合物およびその誘導体から導かれる公知の熱可塑性液晶ポリエステルおよび熱可塑性液晶ポリエステルアミドを挙げることができる。ただし、光学的に異方性の溶融相を形成し得るポリマーを形成するためには、種々の原料化合物の組合せには適当な範囲があることは言うまでもない。   Specific examples of the thermoplastic liquid crystal polymer used in the present invention include known thermoplastic liquid crystal polyesters and thermoplastic liquid crystal polyester amides derived from the compounds (1) to (4) listed below and derivatives thereof. Can be mentioned. However, it goes without saying that there is an appropriate range of combinations of various raw material compounds in order to form a polymer capable of forming an optically anisotropic melt phase.

(1)芳香族または脂肪族ジヒドロキシ化合物(代表例は表1参照)

Figure 0006019012
(1) Aromatic or aliphatic dihydroxy compounds (see Table 1 for typical examples)
Figure 0006019012

(2)芳香族または脂肪族ジカルボン酸(代表例は表2参照)

Figure 0006019012
(2) Aromatic or aliphatic dicarboxylic acids (see Table 2 for typical examples)
Figure 0006019012

(3)芳香族ヒドロキシカルボン酸(代表例は表3参照)

Figure 0006019012
(3) Aromatic hydroxycarboxylic acids (see Table 3 for typical examples)
Figure 0006019012

(4)芳香族ジアミン、芳香族ヒドロキシアミンまたは芳香族アミノカルボン酸(代表例は表4参照)

Figure 0006019012
(4) Aromatic diamine, aromatic hydroxyamine or aromatic aminocarboxylic acid (see Table 4 for typical examples)
Figure 0006019012

これらの原料化合物から得られる液晶ポリマーの代表例として表5および6に示す構造単位を有する共重合体を挙げることができる。   Representative examples of the liquid crystal polymer obtained from these raw material compounds include copolymers having the structural units shown in Tables 5 and 6.

Figure 0006019012
Figure 0006019012

Figure 0006019012
Figure 0006019012

これらの共重合体のうち、p―ヒドロキシ安息香酸および/または6−ヒドロシキ−2−ナフトエ酸を少なくとも繰り返し単位として含む重合体が好ましく、特に、(i)p−ヒドロキシ安息香酸と6−ヒドロシキ−2−ナフトエ酸との繰り返し単位を含む重合体、(ii)p−ヒドロキシ安息香酸および6−ヒドロシキ−2−ナフトエ酸からなる群から選ばれる少なくとも一種の芳香族ヒドロキシカルボン酸と、4,4’−ジヒドロキシビフェニルおよびヒドロキノンからなる群から選ばれる少なくとも一種の芳香族ジオールと、テレフタル酸、イソフタル酸および2,6−ナフタレンジカルボン酸からなる群から選ばれる少なくとも一種の芳香族ジカルボン酸との繰り返し単位を含む重合体が好ましい。   Of these copolymers, a polymer containing at least p-hydroxybenzoic acid and / or 6-hydroxy-2-naphthoic acid as a repeating unit is preferable, and in particular, (i) p-hydroxybenzoic acid and 6-hydroxyoxy- A polymer containing a repeating unit with 2-naphthoic acid, (ii) at least one aromatic hydroxycarboxylic acid selected from the group consisting of p-hydroxybenzoic acid and 6-hydroxy-2-naphthoic acid, and 4,4 ′ A repeating unit of at least one aromatic diol selected from the group consisting of dihydroxybiphenyl and hydroquinone and at least one aromatic dicarboxylic acid selected from the group consisting of terephthalic acid, isophthalic acid and 2,6-naphthalenedicarboxylic acid Polymers containing are preferred.

例えば、(i)の重合体では、熱可塑性液晶ポリマーが、少なくともp−ヒドロキシ安息香酸と6−ヒドロシキ−2−ナフトエ酸との繰り返し単位を含む場合、繰り返し単位(A)のp−ヒドロキシ安息香酸と、繰り返し単位(B)の6−ヒドロシキ−2−ナフトエ酸とのモル比(A)/(B)は、液晶ポリマー中、(A)/(B)=10/90〜90/10程度であるのが望ましく、より好ましくは、(A)/(B)=50/50〜85/15程度であってもよく、さらに好ましくは、(A)/(B)=60/40〜80/20程度であってもよい。   For example, in the polymer (i), when the thermoplastic liquid crystal polymer contains at least repeating units of p-hydroxybenzoic acid and 6-hydroxy-2-naphthoic acid, the repeating unit (A) of p-hydroxybenzoic acid is used. And the molar ratio (A) / (B) of the repeating unit (B) to 6-hydroxy-2-naphthoic acid is (A) / (B) = about 10/90 to 90/10 in the liquid crystal polymer. Desirably, it is desirable that (A) / (B) = about 50/50 to 85/15, and more preferably (A) / (B) = 60/40 to 80/20. It may be a degree.

また、(ii)の重合体の場合、p−ヒドロキシ安息香酸および6−ヒドロシキ−2−ナフトエ酸からなる群から選ばれる少なくとも一種の芳香族ヒドロキシカルボン酸(C)と、4,4’−ジヒドロキシビフェニルおよびヒドロキノンからなる群から選ばれる少なくとも一種の芳香族ジオール(D)と、テレフタル酸、イソフタル酸および2,6−ナフタレンジカルボン酸からなる群から選ばれる少なくとも一種の芳香族ジカルボン酸(E)の、液晶ポリマーにおける各繰り返し単位のモル比は、芳香族ヒドロキシカルボン酸(C):前記芳香族ジオール(D):前記芳香族ジカルボン酸(E)=30〜80:35〜10:35〜10程度であってもよく、より好ましくは、(C):(D):(E)=35〜75:32.5〜12.5:32.5〜12.5程度であってもよく、さらに好ましくは、(C):(D):(E)=40〜70:30〜15:30〜15程度であってもよい。   In the case of the polymer (ii), at least one aromatic hydroxycarboxylic acid (C) selected from the group consisting of p-hydroxybenzoic acid and 6-hydroxy-2-naphthoic acid, and 4,4′-dihydroxy At least one aromatic diol (D) selected from the group consisting of biphenyl and hydroquinone, and at least one aromatic dicarboxylic acid (E) selected from the group consisting of terephthalic acid, isophthalic acid and 2,6-naphthalenedicarboxylic acid. The molar ratio of each repeating unit in the liquid crystal polymer is about aromatic hydroxycarboxylic acid (C): aromatic diol (D): aromatic dicarboxylic acid (E) = about 30-80: 35-10: 35-10. More preferably, (C) :( D) :( E) = 35 to 75: 32.5 to 12.5: 3 May be about .5~12.5, more preferably, (C) :( D) :( E) = 40~70: it may be about 30 to 15: 30-15.

また、芳香族ジカルボン酸に由来する繰り返し構造単位と芳香族ジオールに由来する繰り返し構造単位とのモル比は、(D)/(E)=95/100〜100/95であることが好ましい。この範囲をはずれると、重合度が上がらず機械強度が低下する傾向がある。   Moreover, it is preferable that the molar ratio of the repeating structural unit derived from aromatic dicarboxylic acid and the repeating structural unit derived from aromatic diol is (D) / (E) = 95 / 100-100 / 95. Outside this range, the degree of polymerization does not increase and the mechanical strength tends to decrease.

なお、本発明にいう溶融時における光学的異方性とは、例えば試料をホットステージにのせ、窒素雰囲気下で昇温加熱し、試料の透過光を観察することにより認定できる。   The optical anisotropy at the time of melting referred to in the present invention can be recognized by, for example, placing a sample on a hot stage, heating and heating in a nitrogen atmosphere, and observing the transmitted light of the sample.

熱可塑性液晶ポリマーとして好ましいものは、融点(以下、Mpと称す)が260〜360℃の範囲のものであり、さらに好ましくはMpが270〜350℃のものである。なお、Mpは示差走査熱量計((株)島津製作所DSC)により主吸熱ピークが現れる温度を測定することにより求められる。   The thermoplastic liquid crystal polymer preferably has a melting point (hereinafter referred to as Mp) in the range of 260 to 360 ° C, more preferably Mp of 270 to 350 ° C. Mp is determined by measuring the temperature at which the main endothermic peak appears with a differential scanning calorimeter (Shimadzu Corporation DSC).

前記熱可塑性液晶ポリマーには、本発明の効果を損なわない範囲内で、ポリエチレンテレフタレート、変性ポリエチレンテレフタレート、ポリオレフィン、ポリカーボネート、ポリアリレート、ポリアミド、ポリフェニレンサルファイド、ポリエステルエーテルケトン、フッ素樹脂等の熱可塑性ポリマーを添加してもよい。   The thermoplastic liquid crystal polymer may include a thermoplastic polymer such as polyethylene terephthalate, modified polyethylene terephthalate, polyolefin, polycarbonate, polyarylate, polyamide, polyphenylene sulfide, polyester ether ketone, and fluororesin within a range not impairing the effects of the present invention. It may be added.

本発明に使用される熱可塑性液晶ポリマーフィルムは、熱可塑性液晶ポリマーを押出成形して得られる。熱可塑性液晶ポリマーの剛直な棒状分子の方向を制御できる限り、任意の押出成形法が適用できるが、周知のTダイ法、ラミネート体延伸法、インフレーション法などが工業的に有利である。特にインフレーション法やラミネート体延伸法では、フィルムの機械軸方向(以下、MD方向と略す)だけでなく、これと直交する方向(以下、TD方向と略す)にも応力が加えられ、MD方向とTD方向における誘電特性を制御したフィルムが得られる。   The thermoplastic liquid crystal polymer film used in the present invention is obtained by extrusion molding of a thermoplastic liquid crystal polymer. Any extrusion molding method can be applied as long as the direction of the rigid rod-like molecules of the thermoplastic liquid crystal polymer can be controlled, but the known T-die method, laminate stretching method, inflation method and the like are industrially advantageous. In particular, in the inflation method and the laminate stretching method, stress is applied not only in the mechanical axis direction of the film (hereinafter abbreviated as MD direction) but also in the direction orthogonal to this (hereinafter abbreviated as TD direction). A film with controlled dielectric properties in the TD direction is obtained.

押出成形では、配向を制御するために、延伸処理を伴うのが好ましく、例えば、Tダイ法による押出成形では、Tダイから押出した溶融体シートを、フィルムの機械軸方向(以下、MD方向と略す)だけでなく、これと直交する方向(以下、TD方向と略す)の双方に対して同時に延伸してもよいし、またはTダイから押出した溶融体シートを一旦MD方向に延伸し、ついでTD方向に延伸してもよい。   In extrusion molding, it is preferable to involve a stretching process in order to control the orientation. For example, in extrusion molding by the T-die method, the melt sheet extruded from the T-die is used in the machine axis direction of the film (hereinafter referred to as MD direction). (Not abbreviated), and may be simultaneously stretched in both directions perpendicular to this (hereinafter abbreviated as TD direction), or the melt sheet extruded from the T-die is once stretched in the MD direction. You may extend | stretch in TD direction.

また、インフレーション法による押出成形では、リングダイから溶融押出された円筒状シートに対して、所定のドロー比(MD方向の延伸倍率に相当する)およびブロー比(TD方向の延伸倍率に相当する)で延伸してもよい。   In addition, in the extrusion molding by the inflation method, a predetermined draw ratio (corresponding to a stretching ratio in the MD direction) and a blow ratio (corresponding to a stretching ratio in the TD direction) with respect to a cylindrical sheet melt-extruded from a ring die. May be stretched.

このような押出成形の延伸倍率は、MD方向の延伸倍率(またはドロー比)として、例えば、1.0〜10程度であってもよく、好ましくは1.2〜7程度、さらに好ましくは1.3〜7程度であってもよい。また、TD方向の延伸倍率(またはブロー比)として、例えば、1.5〜20程度であってもよく、好ましくは2〜15程度、さらに好ましくは2.5〜14程度であってもよい。   The stretch ratio of such extrusion molding may be, for example, about 1.0 to 10, preferably about 1.2 to 7, more preferably about 1. as the stretch ratio (or draw ratio) in the MD direction. It may be about 3-7. Further, the draw ratio (or blow ratio) in the TD direction may be, for example, about 1.5 to 20, preferably about 2 to 15, and more preferably about 2.5 to 14.

そして、MD方向とTD方向とのそれぞれの延伸倍率の比(TD方向/MD方向)は、例えば、2.6以下、好ましくは0.4〜2.5程度であってもよい。   And ratio (TD direction / MD direction) of each draw ratio of MD direction and TD direction may be 2.6 or less, for example, about 0.4-2.5 may be sufficient.

また、必要に応じて、押出成形された原反シートに対して、公知または慣用の熱処理(例えば、液晶ポリマーの融点(Mp)以上(例えば、Mp〜Mp+30℃程度、好ましくはMp+10〜Mp+20℃程度)で熱処理を行い、熱可塑性液晶ポリマーフィルムの融点や熱膨張係数を調整してもよい。   Further, if necessary, the extruded raw sheet is subjected to a known or conventional heat treatment (for example, a melting point (Mp) or higher of the liquid crystal polymer (for example, about Mp to Mp + 30 ° C., preferably about Mp + 10 to Mp + 20 ° C.). ) To adjust the melting point and thermal expansion coefficient of the thermoplastic liquid crystal polymer film.

また、熱可塑性液晶ポリマーフィルムには、押出成形した後に、必要に応じて延伸を行ってもよい。延伸方法自体は公知であり、二軸延伸、一軸延伸のいずれを採用してもよいが、分子配向度を制御することがより容易であることから、二軸延伸が好ましい。また、延伸は、公知の一軸延伸機、同時二軸延伸機、逐次二軸延伸機などが使用できる。   The thermoplastic liquid crystal polymer film may be stretched as necessary after extrusion. The stretching method itself is known, and either biaxial stretching or uniaxial stretching may be adopted, but biaxial stretching is preferred because it is easier to control the degree of molecular orientation. For stretching, a known uniaxial stretching machine, simultaneous biaxial stretching machine, sequential biaxial stretching machine or the like can be used.

以上のようにして得られた熱可塑性液晶ポリマーフィルムでは、剛直な棒状分子の方向性が制御された結果、分子配向度を示すSOR(Segment Orientation Ratio)が、例えば、SOR≦1.20(例えば、1.02〜1.20程度)であってもよく、好ましくは1.05〜1.19、さらに好ましくは1.07〜1.19であってもよい。ここで、分子配向度SORとは、分子配向の度合いを与える指標をいい、従来のMOR(Molecular Orientation Ratio)とは異なり、物体の厚さを考慮した値である。本発明で使用する熱可塑性液晶ポリマーフィルムのSORは、MD方向の誘電特性を改善し且つMD方向とTD方向との間における機械的性質および熱的性質のバランスが良好を考慮する必要があり、SORは、後述する実施例に記載された方法により測定された値を示す。   In the thermoplastic liquid crystal polymer film obtained as described above, the SOR (Segment Orientation Ratio) indicating the degree of molecular orientation is, for example, SOR ≦ 1.20 (for example, 1.02 to about 1.20), preferably 1.05 to 1.19, and more preferably 1.07 to 1.19. Here, the molecular orientation SOR refers to an index that gives the degree of molecular orientation, and is a value that takes into account the thickness of an object, unlike conventional MOR (Molecular Orientation Ratio). The SOR of the thermoplastic liquid crystal polymer film used in the present invention needs to improve the dielectric properties in the MD direction and consider the good balance of mechanical and thermal properties between the MD and TD directions, SOR shows the value measured by the method described in the Example mentioned later.

本発明において使用される熱可塑性液晶ポリマーフィルムは、任意の厚みであってもよく、そして、5mm以下の板状またはシート状のものをも包含する。ただし、高周波伝送線路に使用する場合は、厚みが厚いほど伝送損失が小さくなるので、できるだけ厚みを厚くする必要がある。しかしながら電気絶縁層として熱可塑性液晶ポリマーフィルムを単独で用いる場合、そのフィルムの膜厚は、10〜500μmの範囲内にあることが好ましく、15〜200μmの範囲内がより好ましい。フィルムの厚さが薄過ぎる場合には、フィルムの剛性や強度が小さくなることから、フィルム膜厚10〜200μmの範囲のフィルムを積層させて任意の厚みを得る方法を使用してもよい。   The thermoplastic liquid crystal polymer film used in the present invention may have any thickness, and includes a plate or sheet having a thickness of 5 mm or less. However, when it is used for a high-frequency transmission line, the transmission loss decreases as the thickness increases, so it is necessary to increase the thickness as much as possible. However, when a thermoplastic liquid crystal polymer film is used alone as the electrical insulating layer, the film thickness is preferably in the range of 10 to 500 μm, and more preferably in the range of 15 to 200 μm. When the thickness of the film is too thin, the rigidity and strength of the film are reduced. Therefore, a method of obtaining an arbitrary thickness by laminating films having a film thickness in the range of 10 to 200 μm may be used.

(回路基板)
本発明の高周波回路基板は、電気絶縁層である熱可塑性液晶ポリマーフィルムの両面に銅などの金属を電気導電層として形成した積層体からなるものである。熱可塑性液晶ポリマーフィルム面への金属層の形成は、金属箔を真空熱プレス装置や加熱ロール積層設備等を用いて熱圧着することにより行うことができる。熱可塑性液晶ポリマーフィルム層と金属箔との積層体を複数層積層して多層化した回路基板を形成することもできる。熱圧着後、エッチングなどの方法により、金属箔に回路パターンを形成して、配線回路基板を得ることができる。
(Circuit board)
The high-frequency circuit board of the present invention comprises a laminate in which a metal such as copper is formed as an electrically conductive layer on both surfaces of a thermoplastic liquid crystal polymer film that is an electrically insulating layer. Formation of the metal layer on the surface of the thermoplastic liquid crystal polymer film can be performed by thermocompression bonding the metal foil using a vacuum hot press apparatus or a heating roll laminating equipment. A multilayer circuit board can be formed by laminating a plurality of laminates of thermoplastic liquid crystal polymer film layers and metal foils. After thermocompression bonding, a printed circuit board can be obtained by forming a circuit pattern on the metal foil by a method such as etching.

本発明の積層体は、熱可塑性液晶ポリマーフィルムと銅箔との2層構造に限られるものではない。すなわち、積層体は、少なくとも1層の熱可塑性液晶ポリマーフィルムと少なくとも1層の銅箔を含むものであればよく、例えば、下記I)〜III)に示した積層体を例示することができる。
なお、フィルム層は、フィルム1枚からなる単層だけでなく、数枚のフィルムを積層したフィルム積層体であってもよい。
I) 銅箔/フィルム/銅箔
II) フィルム/銅箔/フィルム
III) 銅箔/フィルム/銅箔/フィルム/銅箔
The laminate of the present invention is not limited to a two-layer structure of a thermoplastic liquid crystal polymer film and a copper foil. That is, the laminated body should just contain at least 1 layer of thermoplastic liquid crystal polymer film and at least 1 layer of copper foil, for example, the laminated body shown to following I) -III) can be illustrated.
In addition, the film layer may be not only a single layer composed of one film but also a film laminate in which several films are laminated.
I) Copper foil / film / copper foil II) Film / copper foil / film III) Copper foil / film / copper foil / film / copper foil

本発明において回路基板とは、熱可塑性液晶ポリマーフィルム層からなる基板の片面又は両面に導体層(導電体回路層)が形成されたものをいう。また、導体層と絶縁層とが交互に層形成してなる多層プリント配線板において、該多層プリント配線板の最外層の片面又は両面が導体層(導電体回路層)となっているものも本発明にいう回路基板に含まれる。上記導体層は、パターン加工されて配線回路基板となる。   In the present invention, the circuit board refers to a board in which a conductor layer (conductor circuit layer) is formed on one or both sides of a board made of a thermoplastic liquid crystal polymer film layer. Also, a multilayer printed wiring board in which conductor layers and insulating layers are alternately formed and the outermost layer of the multilayer printed wiring board has a conductor layer (conductor circuit layer) on one side or both sides. It is included in the circuit board referred to in the invention. The conductor layer is patterned to form a printed circuit board.

本発明の高周波回路基板にスルーホールを形成する方法としては、ドリルによる加工法や、炭酸ガスレーザー、YAGレーザー、エキシマレーザーなどのレーザーによる加工法を採用することができる。スルーホール形成時の発熱で、孔内に付着した熱可塑性液晶ポリマーの切削クズ(スミヤ)は、汎用の市販薬剤を用いて、化学的に溶解除去することが好ましい。   As a method for forming a through hole in the high-frequency circuit board of the present invention, a processing method using a drill or a processing method using a laser such as a carbon dioxide laser, a YAG laser, or an excimer laser can be employed. It is preferable to chemically remove and remove cutting waste (smear) of the thermoplastic liquid crystal polymer adhering to the inside of the hole due to heat generated during the formation of the through hole.

また、本発明の高周波回路基板のスルーホールにめっきを施す方法としては、従来周知の方法を採用することができ、無電解銅めっきと電解銅めっきによるパターンめっきおよび/またはパネルめっきを順次施せばよい。   In addition, as a method of plating the through hole of the high-frequency circuit board of the present invention, a conventionally known method can be adopted, and if pattern plating and / or panel plating by electroless copper plating and electrolytic copper plating are sequentially performed, Good.

(高周波回路)
本発明において高周波回路とは、単に高周波信号のみを伝送する回路からなるものだけでなく、高周波信号を低周波信号に変換して、生成された低周波信号を外部へ出力する伝送路や、高周波対応部品の駆動のために供給される電源を供給するための伝送路等、高周波信号ではない信号を伝送する伝送路も同一平面上に併設された回路も含まれる。
(High frequency circuit)
In the present invention, the high-frequency circuit is not only a circuit that transmits only a high-frequency signal, but also a transmission path that converts a high-frequency signal into a low-frequency signal and outputs the generated low-frequency signal to the outside, or a high-frequency circuit. A transmission path for transmitting a signal that is not a high-frequency signal, such as a transmission path for supplying power to drive the corresponding component, is also included.

以下、実施例及び比較例に基づいて本発明をより具体的に説明するが、本発明は以下の実施例に限定されるものではない。   EXAMPLES Hereinafter, although this invention is demonstrated more concretely based on an Example and a comparative example, this invention is not limited to a following example.

(銅箔表面の粗度と凹凸間隔の測定方法)
形状測定顕微鏡(キーエンス(株)製、型式:VK−810)を用い、測定倍率1000倍で銅箔の表面粗度(Rz)および凹凸間の間隔()を測定した。表面粗度の測定はJISB0601―1994に準拠した方法により行った。表面粗度(Rz)は、粗さ曲線からその平均線の方向に基準長さを抜き取り、最高から5番目までの山頂(凸の頂点)の標高の平均値と、最深から5番目までの谷底(凹の底点)の標高の平均値との差をμmで表わしたもので、十点平均粗さを示している。また、凹凸間の間隔()は、粗さ曲線からその平均線の方向に基準長さをJISB0601―1994に準拠した方法により抜き取った一方で、一つの凸部の頂部からそれに隣り合う一つの凹部の底部までの平均線の長さ(凹凸の間隔)を求め、この多数の凹凸間の間隔の算術平均値をμmで表わしたものである。なお、凹凸間の間隔(S)は、三井金属鉱業(株)製のSQ−VLP、日鉱金属(株)製のBHY、STCS、古河電工(株)製のFWJ-WS、F3−WSなどの表7に示す市販品について、表8に示す値である。
(Measurement method of roughness and uneven spacing of copper foil surface)
Using a shape measuring microscope (manufactured by Keyence Corporation, model: VK-810), the surface roughness (Rz) of the copper foil and the spacing ( S ) between the irregularities were measured at a measurement magnification of 1000 times. The surface roughness was measured by a method based on JISB0601-1994. For surface roughness (Rz), the reference length is extracted from the roughness curve in the direction of the average line, the average value of the altitude of the highest peak to the fifth peak (convex peak), and the bottom from the deepest to the fifth peak. The difference from the average value of the altitude of (concave bottom) is expressed in μm, and the ten-point average roughness is shown. Further, the spacing between irregularities (S), the direction to the reference length of the average line from the roughness curve while the Tsu sampling by a method in accordance with JISB0601-1994, in which Karaso top of one of the projections the length of the flat Hitoshisen to the bottom of one recess adjacent the (interval between irregularities) calculated, the arithmetic mean value of the spacing between the number of irregularities is obtained expressed in [mu] m. In addition, the space | interval (S) between unevenness | corrugation is Mitsui Kinzoku Mining Co., Ltd. SQ-VLP, Nikko Metal Co., Ltd. BHY, STCS, Furukawa Electric FWJ-WS, F3-WS etc. The values shown in Table 8 for the commercial products shown in Table 7.

(接着強度の測定方法)
JIS C5016−1994に準拠して、毎分50mmの速度で銅箔を銅箔除去面に対して90°の方向に引きはがしながら、引っ張り試験機[日本電産シンポ(株)製、デジタルフォースゲージFGP-2] により、銅箔の引きはがし強さを測定し、得られた値を接着強度とした。
(Measurement method of adhesive strength)
In accordance with JIS C5016-1994, while pulling the copper foil at a rate of 50 mm per minute in the direction of 90 ° with respect to the copper foil removal surface, a tensile tester [Nidec Sympo Co., Ltd., Digital Force Gauge FGP-2] was used to measure the peel strength of the copper foil, and the obtained value was defined as the adhesive strength.

(伝送損失の測定方法)
マイクロ波ネットワークアナライザー[アジレント(Agilent)社製、型式:8722ES]とプローブ(カスケードマイクロテック社製、型式:ACP40−250)を用いて、測定周波数40GHzで測定した。
(Transmission loss measurement method)
Measurement was performed at a measurement frequency of 40 GHz using a microwave network analyzer [manufactured by Agilent, model: 8722ES] and a probe (manufactured by Cascade Microtech, model: ACP40-250).

(銅箔)
表7に示す銅箔について、上記の測定方法に従って、各銅箔の表面粗度(Rz)および凹凸間の間隔(S)を測定し、表8および表9に示した。
(Copper foil)
About the copper foil shown in Table 7, according to said measuring method, the surface roughness (Rz) of each copper foil and the space | interval (S) between unevenness | corrugations were measured, and it showed in Table 8 and Table 9.

Figure 0006019012
Figure 0006019012

(熱可塑性液晶ポリマーフィルム)
p−ヒドロキシ安息香酸と6−ヒドロキシ−2−ナフトエ酸の共重合物で、融点が280℃である熱可塑性液晶ポリマーを溶融押出し、インフレーション成形することにより得られた、膜厚が50μmの熱可塑性液晶ポリマーフィルム(分子配向度:1.05)を用いた。
(Thermoplastic liquid crystal polymer film)
Thermoplastic having a film thickness of 50 μm obtained by melt-extruding a thermoplastic liquid crystal polymer having a melting point of 280 ° C. and blow-molding with a copolymer of p-hydroxybenzoic acid and 6-hydroxy-2-naphthoic acid. A liquid crystal polymer film (degree of molecular orientation: 1.05) was used.

(回路基板)
上記の熱可塑性液晶ポリマーフィルムの上下に、表7に示す銅箔を重ね合わせ、真空熱プレス装置を用いて、加熱盤を295℃に設定し、4MPaの圧力下、10分間、圧着して、電解銅箔/熱可塑性液晶ポリマーフィルム/電解銅箔の構成の積層体(A)を作製した。得られた積層体の銅箔面に回路パターンを化学エッチング法により作製し、回路パターンを有する積層体(B)を得た。
(Circuit board)
The copper foil shown in Table 7 is overlaid on the upper and lower sides of the above thermoplastic liquid crystal polymer film, and using a vacuum hot press apparatus, the heating platen is set at 295 ° C., and is crimped for 10 minutes under a pressure of 4 MPa, A laminate (A) having a configuration of electrolytic copper foil / thermoplastic liquid crystal polymer film / electrolytic copper foil was produced. A circuit pattern was produced on the copper foil surface of the obtained laminate by a chemical etching method to obtain a laminate (B) having a circuit pattern.

表7に示す各銅箔を用いて作製した積層板について、積層板(A)を用いて接着強度、積層板(B)を用いて伝送損失を測定し、その結果を表8及び表9に示した。   About the laminated board produced using each copper foil shown in Table 7, the transmission strength was measured using the laminated board (A) and the adhesive strength, and the laminated board (B). The results are shown in Table 8 and Table 9. Indicated.

Figure 0006019012
Figure 0006019012

Figure 0006019012
Figure 0006019012

上記の実施例及び比較例の結果から明らかであるように、Rz/S比が、1.5〜2.5の範囲内にある各実施例の結果は、接着強度が、0.5kgf/cm以上であり、かつ、伝送損失が、−0.35よりも損失が少ない値であり、接着強度と伝送損失の両面の点でバランスが取れた積層回路基板であることが分かる。
一方、比較例1,2,5では、伝送損失が−0.35よりも損失が低くても接着強度が0.5kgf/cmより低く実用的に受け入れられない値を示し、また、比較例3,4では、接着強度が0.5kgf/cm以上の高い値を示していても、伝送損失が−0.35よりも損失が大きく、実用的でない結果を示した。
As is clear from the results of the above examples and comparative examples, the results of the examples in which the Rz / S ratio is in the range of 1.5 to 2.5 indicate that the adhesive strength is 0.5 kgf / It can be seen that this is a laminated circuit board that is equal to or greater than cm and has a transmission loss that is less than -0.35, and is balanced in terms of both adhesive strength and transmission loss.
On the other hand, in Comparative Examples 1, 2, and 5, even if the transmission loss is lower than −0.35, the adhesive strength is lower than 0.5 kgf / cm and shows a practically unacceptable value. In 3 and 4, even though the adhesive strength showed a high value of 0.5 kgf / cm or higher, the transmission loss was larger than -0.35, indicating an impractical result.

本発明によれば、伝送損失が少なく、密着性の高い高周波回路基板が得られるので、高速伝送用の各種高周波回路基板として有用であるので、産業上の利用可能性は高い。   According to the present invention, since a high-frequency circuit board with low transmission loss and high adhesion can be obtained, the present invention is useful as various high-frequency circuit boards for high-speed transmission, and thus has high industrial applicability.

以上、本発明の好ましい実施態様を例示的に説明したが、当業者であれば、特許請求の範囲に開示した本発明の範囲及び精神から逸脱することなく多様な修正、付加および置換ができることが理解可能であろう。   While the preferred embodiments of the present invention have been described above by way of example, those skilled in the art can make various modifications, additions and substitutions without departing from the scope and spirit of the present invention disclosed in the claims. It will be understandable.

Claims (2)

表面に凹凸を有する金属箔であって、表面粗度(Rz)が0.5〜5μmの範囲内にあり、表面粗度(Rz)と表面の凹凸間の間隔(S)との比(Rz/S)が、1.5〜2.5の範囲内(但し、Sが2μm以上を除く)にある表面を有する金属箔に、熱可塑性液晶ポリマーフィルムを積層した積層体からなる、40GHzにおける伝送損失が−0.35db/cmより少なく、前記金属箔と前記熱可塑性液晶フィルム間の接着強度が0.5kgf/cm以上である高周波回路基板。 A metal foil having irregularities on the surface, the surface roughness (Rz) is in the range of 0.5 to 5 μm, and the ratio (Rz) between the surface roughness (Rz) and the interval (S) between the irregularities on the surface / S) is composed of a laminate in which a thermoplastic liquid crystal polymer film is laminated on a metal foil having a surface in a range of 1.5 to 2.5 (excluding S of 2 μm or more), and transmission at 40 GHz. A high frequency circuit board having a loss of less than -0.35 db / cm and an adhesive strength between the metal foil and the thermoplastic liquid crystal film of 0.5 kgf / cm or more. 請求項1において、金属箔が銅箔である高周波回路基板。   The high-frequency circuit board according to claim 1, wherein the metal foil is a copper foil.
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