JP6049355B2 - 蒸発源 - Google Patents
蒸発源 Download PDFInfo
- Publication number
- JP6049355B2 JP6049355B2 JP2012188691A JP2012188691A JP6049355B2 JP 6049355 B2 JP6049355 B2 JP 6049355B2 JP 2012188691 A JP2012188691 A JP 2012188691A JP 2012188691 A JP2012188691 A JP 2012188691A JP 6049355 B2 JP6049355 B2 JP 6049355B2
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- vapor deposition
- deposition material
- evaporation source
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
1a 充填面
2 ルツボ
2a・2b 分割体
3 加熱部
4 収納体
5 ルツボ受け部
6 ルツボ支持部
7 開口部
8 突出部
9 シール部材
Claims (7)
- 蒸着材料が充填されるルツボと、このルツボを囲うように設けられた加熱部と、前記ルツボ及び前記加熱部を収納配設する収納体とから成る蒸発源であって、前記ルツボの外側面にして前記蒸着材料の充填面よりも高くルツボの開口位置よりも低い位置にルツボ受け部を設け、前記収納体の内側に設けたルツボ支持部により前記ルツボ受け部を支持して、前記ルツボの外底面が前記収納体の内底面から離間した状態で前記ルツボを前記収納体に収納配設し得るように構成し、前記ルツボ受け部と前記ルツボ支持部との接触点は、前記加熱部よりルツボ側に設けたことを特徴とする蒸発源。
- 蒸着材料が通過する開口部を長手方向に沿って複数設けたことを特徴とする請求項1記載の蒸発源。
- 前記ルツボ受け部及び前記ルツボ支持部を夫々複数設けたことを特徴とする請求項1,2のいずれか1項に記載の蒸発源。
- 前記ルツボ受け部及び前記ルツボ支持部は、前記加熱部により加熱されるように構成したことを特徴とする請求項1〜3のいずれか1項に記載の蒸発源。
- 前記ルツボの外側面に前記収納体の内側面に向かって突出する突出部を設け、この突出部に前記ルツボ受け部を設けたことを特徴とする請求項1〜4のいずれか1項に記載の蒸発源。
- 前記ルツボは複数の分割体同士を互いに当接させて形成し、この分割体同士の当接部にシール部材を設けたことを特徴とする請求項1〜5のいずれか1項に記載の蒸発源。
- 前記収納体と前記加熱部との間に熱反射部材を設けたことを特徴とする請求項1〜6のいずれか1項に記載の蒸発源。
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012188691A JP6049355B2 (ja) | 2012-08-29 | 2012-08-29 | 蒸発源 |
| TW102127956A TWI589716B (zh) | 2012-08-29 | 2013-08-05 | Evaporation source |
| KR1020157007556A KR102049629B1 (ko) | 2012-08-29 | 2013-08-09 | 증발원 |
| PCT/JP2013/071621 WO2014034410A1 (ja) | 2012-08-29 | 2013-08-09 | 蒸発源 |
| CN201380044630.2A CN104603321B (zh) | 2012-08-29 | 2013-08-09 | 蒸发源 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012188691A JP6049355B2 (ja) | 2012-08-29 | 2012-08-29 | 蒸発源 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014047365A JP2014047365A (ja) | 2014-03-17 |
| JP2014047365A5 JP2014047365A5 (ja) | 2015-10-08 |
| JP6049355B2 true JP6049355B2 (ja) | 2016-12-21 |
Family
ID=50183226
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012188691A Active JP6049355B2 (ja) | 2012-08-29 | 2012-08-29 | 蒸発源 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6049355B2 (ja) |
| KR (1) | KR102049629B1 (ja) |
| CN (1) | CN104603321B (ja) |
| TW (1) | TWI589716B (ja) |
| WO (1) | WO2014034410A1 (ja) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6291696B2 (ja) * | 2014-07-28 | 2018-03-14 | 株式会社Joled | 蒸着装置および蒸発源 |
| KR101528709B1 (ko) * | 2014-09-30 | 2015-06-16 | 에스엔유 프리시젼 주식회사 | 증착 균일도를 향상시키는 증착 용기 |
| KR101615913B1 (ko) * | 2014-11-12 | 2016-05-13 | 에스엔유 프리시젼 주식회사 | 박막증착장치 |
| CN106893981B (zh) * | 2017-03-30 | 2019-01-25 | 南京大学 | 一种用于提高蒸发束流稳定性的坩埚和具有该坩埚的源炉 |
| JP6990301B2 (ja) * | 2017-09-14 | 2022-01-12 | アルファ プラス カンパニー リミテッド | 真空蒸発源 |
| CN107604318B (zh) * | 2017-09-27 | 2019-10-15 | 京东方科技集团股份有限公司 | 坩埚加热装置 |
| CN107805782B (zh) * | 2017-11-27 | 2019-09-20 | 深圳市华星光电半导体显示技术有限公司 | 一种蒸镀装置 |
| CN107916401B (zh) * | 2017-12-15 | 2023-09-22 | 合肥鑫晟光电科技有限公司 | 蒸镀坩埚和蒸镀装置 |
| JP6526880B1 (ja) * | 2018-06-29 | 2019-06-05 | キヤノントッキ株式会社 | 蒸発源及び蒸着装置 |
| CN113574202B (zh) * | 2019-05-13 | 2022-12-02 | 株式会社爱发科 | 蒸镀单元及具有该蒸镀单元的真空蒸镀装置 |
| JP7088891B2 (ja) * | 2019-09-26 | 2022-06-21 | キヤノントッキ株式会社 | 蒸発源装置及び蒸着装置 |
| WO2021065081A1 (ja) * | 2019-10-04 | 2021-04-08 | 株式会社アルバック | 真空蒸着装置用の蒸着源 |
| KR102935162B1 (ko) | 2021-07-13 | 2026-03-06 | 주식회사 선익시스템 | 증발원 |
| US20240226925A9 (en) * | 2022-10-25 | 2024-07-11 | Svmtech Co., Ltd. | Linear evaporation source |
| WO2026052986A1 (en) * | 2024-09-05 | 2026-03-12 | Applied Materials, Inc. | Evaporation source, deposition system and method for depositing a material |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06108236A (ja) * | 1992-09-25 | 1994-04-19 | Mitsubishi Electric Corp | 薄膜形成装置 |
| JPH07300666A (ja) * | 1994-04-27 | 1995-11-14 | Nissin Electric Co Ltd | シリコン蒸発用分子線源およびこれに用いるるつぼの製造方法 |
| JPH09209126A (ja) * | 1996-02-08 | 1997-08-12 | Idemitsu Kosan Co Ltd | 真空蒸着装置 |
| KR100434438B1 (ko) * | 2002-11-18 | 2004-06-04 | 주식회사 야스 | 증착 공정용 원추형 노즐 증발원 |
| JP2005154903A (ja) * | 2003-11-26 | 2005-06-16 | Samsung Sdi Co Ltd | 蒸着膜形成方法及び蒸着膜形成装置 |
| JP2006104513A (ja) | 2004-10-04 | 2006-04-20 | Toyota Industries Corp | 蒸発源におけるるつぼの冷却方法及び蒸発源 |
| JP4696710B2 (ja) | 2005-06-15 | 2011-06-08 | ソニー株式会社 | 蒸着成膜装置および蒸着源 |
| KR100712217B1 (ko) * | 2005-09-30 | 2007-04-27 | 삼성에스디아이 주식회사 | 증발원 및 이를 이용한 진공증착기 |
| KR100784953B1 (ko) * | 2006-05-23 | 2007-12-11 | 세메스 주식회사 | 다수의 도가니를 이용한 유기발광소자 박막 제작을 위한선형증발원 |
| JP5520871B2 (ja) * | 2011-03-31 | 2014-06-11 | 株式会社日立ハイテクノロジーズ | 蒸着装置 |
-
2012
- 2012-08-29 JP JP2012188691A patent/JP6049355B2/ja active Active
-
2013
- 2013-08-05 TW TW102127956A patent/TWI589716B/zh active
- 2013-08-09 CN CN201380044630.2A patent/CN104603321B/zh active Active
- 2013-08-09 KR KR1020157007556A patent/KR102049629B1/ko active Active
- 2013-08-09 WO PCT/JP2013/071621 patent/WO2014034410A1/ja not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| TWI589716B (zh) | 2017-07-01 |
| JP2014047365A (ja) | 2014-03-17 |
| WO2014034410A1 (ja) | 2014-03-06 |
| KR102049629B1 (ko) | 2019-11-28 |
| TW201425613A (zh) | 2014-07-01 |
| KR20150044961A (ko) | 2015-04-27 |
| CN104603321B (zh) | 2016-10-26 |
| CN104603321A (zh) | 2015-05-06 |
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