JP6050630B2 - Substrate processing apparatus and substrate processing system - Google Patents

Description

  The present invention relates to a substrate processing apparatus such as a vacuum drying apparatus, and more particularly to its structure.

  Low-pressure drying apparatuses, which are apparatuses for drying a coating film such as a photoresist formed on a substrate such as a glass substrate for a liquid crystal display or a wafer for a semiconductor element, are already known (for example, Patent Document 1 and Patent Document 2). reference). The vacuum drying apparatus accelerates evaporation of solvent components in the coating film by reducing the pressure in the chamber with a vacuum means such as a vacuum pump while the substrate on which the coating film is formed is placed in the chamber (processing vessel). This is a device for quickly drying the coating film.

JP 2006-105524 A JP 2008-124366 A

  The vacuum drying apparatus disclosed in Patent Document 1 carries in and out a substrate between a chamber and the outside by a transfer arm provided in a transfer robot outside the apparatus. That is, the substrate is loaded and unloaded when the transfer arm that horizontally supports the substrate from below enters the chamber.

  On the other hand, glass substrates for liquid crystal displays are becoming larger in size (for example, the length of one side exceeds 2000 mm). Moreover, the board | substrate for solar cells is progressing thickening (for example, 2 mm thickness or more). Along with these, it is necessary to increase the size of the transfer arm and the transfer robot. Such an increase in size is a factor that increases the cost of the apparatus.

  In addition, in the case of carrying by the carrying arm, there is a problem that the larger the substrate, the more easily the substrate is bent at the time of carrying and it becomes difficult to hold it horizontally. In particular, the transfer arm only performs a certain pre-programmed operation while supporting the substrate from below, and it is difficult to control the bending state of the substrate. Misalignment, contact with the chamber, etc., damage to the substrate due to collision and the like.

  In addition, there is also a problem that the processing speed of the transfer robot imposes a processing tact on the entire production line.

  On the other hand, the reduced-pressure drying apparatus disclosed in Patent Document 2 takes in and out the substrate by roller conveyance (roller conveyance) in place of conveyance by the conveyance arm in view of the problems caused by the increase in size of the substrate as described above. It is configured as follows. Specifically, in the vacuum drying apparatus disclosed in Patent Document 2, a plurality of rollers (rollers) are disposed in the chamber, and a part of the rollers can be rotated by a bearing provided on the chamber side wall or the like. It is supported and connected to a rotational drive source provided outside the chamber.

  However, in the case of the reduced-pressure drying apparatus disclosed in Patent Document 2, the volume of the chamber is increased by installing a roller. The larger the chamber volume, the longer the time required for decompression, or a greater power (or larger and larger installation area) decompression means is required. This is not desirable from the viewpoint of manufacturing cost.

  In addition, since a plurality of rollers penetrates the chamber that needs to be kept in a reduced pressure state, a mechanism for preventing leakage at the bearing portion of the chamber is essential, and there is a problem that the apparatus configuration becomes complicated.

  SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and a substrate processing apparatus capable of stably carrying in and out even a large-sized substrate or a thick substrate, and having a reduced chamber volume, and a substrate including the substrate processing apparatus. An object is to provide a processing system.

In order to solve the above-mentioned problems, the invention of claim 1 is an apparatus for performing predetermined processing on a substrate, and includes an upper lid that can be opened and closed, and a base provided with support means for supporting a rectangular substrate. A chamber in which a sealed substrate housing space is formed by placing the upper lid on the base, and the substrate carried from the outside of the chamber at a transfer position defined above the base. A conveyor that supports and conveys the substrate carried out of the chamber from below, a conveyor moving mechanism that can move the conveyor between the conveyance position and a retracted position outside the chamber, and the conveyor fixed relative to the substrate extends along the direction to be conveyed, and a substrate guide to correct the attitude of the carried-in said substrate, said conveyor moving mechanism, the substrate is transported The conveyor is moved to the transport position, and the substrate is supported when the substrate is supported by the support means and the substrate is subjected to a predetermined process in the sealed state. It moves to the said save position, It is characterized by the above-mentioned.

  Invention of Claim 2 is a substrate processing apparatus of Claim 1, Comprising: The conveyance direction of the said board | substrate by the said conveyor and the movement direction of the said conveyor by the said conveyor moving mechanism are orthogonally crossed in a horizontal surface. Features.

  A third aspect of the present invention is the substrate processing apparatus according to the second aspect, wherein the conveyor includes two conveyors spaced apart from each other in a direction orthogonal to the substrate transport direction in a horizontal plane, and the conveyor transport mechanism. According to each of the conveyors, and the conveyance of the substrate is located above the base and has a lower position of each of two side end portions parallel to the conveyance direction of the substrate. Each conveyor is set to a transfer position, and the respective conveyors support the substrate from below at the position, and the movement of the respective conveyors to the retracted position by the respective conveyor moving mechanisms causes the respective conveyors to move to each other. It is performed in the direction to separate.

  Invention of Claim 4 is the substrate processing apparatus of Claim 3, Comprising: The said support means is provided in the upper surface of the said base so that raising / lowering is possible, and the said 2 side edge part is provided by each said conveyor. With respect to the substrate supported from below, the support means rises and comes into contact with the substrate from below and further rises, whereby the substrate is transferred from the conveyor to the support means. To do.

  A fifth aspect of the present invention is the substrate processing apparatus according to any one of the first to fourth aspects, wherein the atmospheric pressure in the sealed substrate storage space is exhausted to depressurize the substrate storage space. A pressure reducing means, and when the substrate has a coating film formed on the surface thereof, the coating film is dried by decompressing the substrate housing space according to a predetermined profile. To do.

  A sixth aspect of the present invention is a substrate processing system, wherein the substrate processing apparatus according to any one of the first to fifth aspects and the chamber are disposed in association with the chamber and receive the substrate with respect to the conveyor. A delivery conveyor for delivery, and a delivery conveyor disposed along with the chamber for receiving the substrate from the conveyor.

  According to the first to fifth aspects of the present invention, since the substrate is transported by the conveyor, it is possible to stably carry in / out a large-sized substrate or a thick substrate, and the substrate is transported by the transport robot and the transport arm. Compared with this case, the entire conveyance system is simplified, and the time required for conveyance is shortened. In addition, since the conveyor that transports the substrate is paid out to a retracted position outside the chamber by the conveyor translation mechanism, it is formed in the chamber as compared with an apparatus that performs processing while the substrate transport mechanism is placed inside the chamber. Reduction of the volume of the storage space is realized.

  In particular, according to the fifth aspect of the present invention, the volume of the accommodation space formed in the chamber can be reduced as compared with an apparatus that performs drying under reduced pressure while the substrate transport mechanism is disposed inside the chamber. Therefore, the time required for decompression is shortened, and as a result, the processing time of the decompression drying process is shortened. In addition, since the accommodation space that is an exhaust target is small, the exhaust mechanism itself is also downsized. Furthermore, since there is no drive member or the like connecting the external drive means and the internal transport mechanism at the side of the chamber, there is no fear of leakage from the side during decompression of the chamber. As a result, a reduced-pressure drying apparatus that is small in size, shortens the processing time, and is excellent in terms of stability of the reduced-pressure processing is realized.

  Further, according to the invention of claim 6, since the carry-in of the substrate from the outside and the carry-out of the substrate to the outside are also carried out by the conveyor, it is possible to stably carry even a large-sized substrate or a thick substrate, and A substrate processing system in which a housing space for processing a substrate is miniaturized is realized.

It is a perspective view which shows roughly the principal part of the substrate processing apparatus 100 which concerns on this Embodiment. FIG. 2 is a block diagram showing components related mainly to operation control of the substrate processing apparatus 100. It is a figure which shows the structure of the base 1a, and the arrangement position of the conveyor 2. FIG. It is a figure which shows the flow of a series of processes until a board | substrate is carried in with respect to the substrate processing apparatus 100, and is carried out outside through a reduced-pressure drying process. It is a figure which shows the mode at the time of starting carrying in of the board | substrate W. FIG. It is a figure which shows the state which the board | substrate W stopped in the stop position. It is a figure which shows the state after the plate raising / lowering mechanism 52 raises the lift plate 12. FIG. It is a figure which shows the state which the two conveyors 2 reached | attained the retracted position P2. It is a figure which shows the state after the lift plate 12 descend | falls. FIG. 4 is a view showing a state in which a substrate W supported by support pins 13 is accommodated in the chamber 1 with the upper lid 1b closed. It is a figure which shows a mode when the upper cover 1b is opened after air release. It is a figure which shows the state after the lift plate 12 raises. It is a figure which shows the state after the conveyor 2 is inserted and arrange | positioned in the conveyance position P1. It is a figure which shows the state by which the board | substrate W was delivered to the conveyor. It is a figure which shows the state by which the board | substrate W was delivered to the carrying-out conveyor C2.

<Configuration of substrate processing apparatus>
The substrate processing apparatus 100 according to the present embodiment decompresses a coating film such as metal nanoparticle ink (nanometal ink) formed on the surface (main surface) of a rectangular substrate such as a glass substrate for solar cells. This is a so-called vacuum drying apparatus that is dried under an atmosphere. FIG. 1 is a perspective view schematically showing a main part of a substrate processing apparatus 100 according to the present embodiment. FIG. 2 is a block diagram showing components related mainly to operation control of the substrate processing apparatus 100.

  As shown in FIG. 1, the substrate processing apparatus 100 mainly includes a chamber 1, two (one pair) conveyors 2, and two (one pair) conveyor translation mechanisms 3. The chamber 1 is a container for accommodating a substrate on which a coating film has been formed, which is a processing target in the drying process. The conveyor 2 is a conveying means that supports the substrate from below and conveys the substrate linearly in a horizontal posture. The conveyor translation mechanism 3 is a conveyor movement mechanism that translates each conveyor 2 in a direction perpendicular to the substrate transport direction in a horizontal plane.

  In FIG. 1, right-handed XYZ coordinates are given with the substrate transport direction as the X axis, the translational movement direction of the conveyor 2 as the Y axis, and the vertical direction as the Z axis (FIGS. 3 and 5). The same applies to the following).

  The chamber 1 is composed of a flat base 1a having a rectangular shape in plan view, and an upper lid 1b having a hollow rectangular parallelepiped shape whose lower side is open. The base 1a is fixed to a base (not shown) so that the upper surface thereof is horizontal. On the other hand, the upper lid 1b can be raised and lowered in the Z-axis direction by an upper lid lifting mechanism 51 (not shown in FIG. 1). When the upper lid 1b is lowered by the operation of the upper lid raising / lowering mechanism 51 and the upper lid 1b is placed on the base 1a so that the side peripheral portion on the lower side of the upper lid 1b matches the outer edge portion of the upper surface of the base 1a. A substrate storage space (substrate processing space) in a sealed state is formed above the base 1a. As a result, the chamber 1 is in a state capable of being dried under reduced pressure. The upper lid elevating mechanism 51 is configured by, for example, an air cylinder.

  Note that an O-ring 11 is fitted into a place on the upper surface of the base 1a where the side peripheral portion of the upper lid 1b is placed. Thereby, the airtightness in the chamber 1 in a reduced pressure drying process is ensured.

  FIG. 3 is a diagram showing a configuration of the base 1a and an arrangement position of the conveyor 2. As shown in FIG. FIG. 3A is a top view, and FIG. 3B is a side view. However, the O-ring 11 is omitted in FIG.

  A lift plate 12 that can be moved up and down in the Z-axis direction is provided at a central portion on the upper surface side of the base 1a. On the upper surface of the lift plate 12, a plurality of support pins 13 that support the substrate during drying under reduced pressure are erected in the positive direction of the Z axis. 1 and 3 illustrate the case where eight support pins 13 are provided on the lift plate 12, but the number and arrangement of the support pins 13 are not limited to the illustrated mode. The lifting and lowering of the lift plate 12 is realized by the plate lifting and lowering mechanism 52 lifting and lowering the plate support 52 a attached to the back surface of the lift plate 12.

  Further, although not shown, the chamber 1 is provided with an exhaust port 14 at an appropriate position. The exhaust port 14 is provided on one or both of the base 1a and the upper lid 1b. For example, it is suitable to be provided at a position where the lift plate 12 on the upper surface of the base 1a does not exist or on the upper surface of the upper lid 1b. In any case, the exhaust port 14 is connected to an exhaust mechanism 53 such as a vacuum pump. With the upper lid 1b placed on the base 1a and the accommodation space being formed inside the chamber 1, the exhaust mechanism 53 is operated, and the atmospheric gas inside the chamber 1 is exhausted through the exhaust port 14, A decompression in the chamber 1 is realized.

  The two (one pair) conveyors 2 convey the substrate linearly in a horizontal posture while supporting the two side end portions of the substrate from below. Each of the two conveyors 2 is provided at both ends of the chamber 1 in the Y-axis direction so that the longitudinal direction extends along the X-axis direction.

  More specifically, each conveyor 2 is a belt conveyor having a configuration in which an endless belt 23 is stretched between a driving roller 21 and a driven roller 22 that are separated from each other along the X-axis direction. Each drive roller 21 is connected to a motor 25 via a shaft 24. In the substrate processing apparatus 100, the substrate 2 is transported by the conveyor 2 only when the conveyor 2 is at a transport position P1 described later. That is, in a state where the conveyor 2 is at the transport position P1, the motor 25 rotates the driving roller 21 to move the endless belt 23 around the driving roller 21 and the driven roller 22, so that the Y is placed on the endless belt 23. The substrate on which both end portions in the axial direction are placed is transported in the X-axis direction.

  As described above, in the substrate processing apparatus according to the present embodiment, since the substrate is transported by the conveyor 2, even a large substrate or a thick substrate can be stably carried in and out. In addition, as compared with the case where the transfer is performed by the transfer robot and transfer arm as in the apparatus disclosed in Patent Document 1, the entire transfer system is simplified and the time required for transfer is shortened. As a result, cost reduction is achieved.

  Two (one pair) conveyor translation mechanisms 3 are provided in association with each conveyor 2. The conveyor translation mechanism 3 is configured such that the conveyor 2 provided along the X-axis direction has a conveying position P1 above the base 1a and a retracted position P2 outside the base 1a (outside the chamber 1) as shown in FIG. It is a mechanism to translate between.

  Each of the conveyor translation mechanisms 3 includes a conveyor support 31 that supports the conveyor 2 from the side, a motor support 32 that supports the motor 25, and a slide formed by fixing the conveyor support 31 and the motor support 32. A sliding mechanism 33 that translates the moving body 33a relative to the sliding portion 33b, a pair of guide members 34 that guide the sliding body 33a during translation, and a sliding portion 33b and a guide A base 35 to which the member 34 is fixed is mainly provided.

  The sliding mechanism 33 is composed of, for example, a linear slider or a ball screw. Movement of the conveyor 2 between the transport position P1 and the retracted position P2 is realized by the translational movement of the sliding body 33a with respect to the sliding portion 33b fixedly provided along the Y-axis direction. In the following description, moving the conveyor 2 in the direction from the transport position P1 to the retreat position P2 is also referred to as paying out the conveyor 2, and the conveyor 2 is moved in the direction from the retreat position P2 to the transport position P1. This is also referred to as inserting the conveyor 2.

  The guide member 34 is a rod-like member extending in the Y-axis direction, for example. The guide member 34 is fitted into the recessed portion of the guided member 33c having a concave shape in cross section provided at the lower portion of the sliding body 33a, thereby ensuring the stability of translational movement along the Y-axis direction of the sliding body 33a. .

  By providing the conveyor translation mechanism 3 having such a configuration, in the substrate processing apparatus 100 according to the present embodiment, the conveyor 2 that transports the substrate can be retracted outside the chamber 1 during the vacuum drying process. It can be done. Details of the retracting of the conveyor 2 will be described later.

  A substrate guide 36 is fixed to the conveyor support 31 of the conveyor translation mechanism 3. More specifically, the board guide 36 is a member that is supported from below by the conveyor support 31 and whose longitudinal direction extends along the X-axis direction. The board guide 36 is parallel to the conveyor 2 and at a position that is substantially the same height as the board in a state where the board is transported on the conveyor 2 (a state where the board is arranged on the endless belt 23). , Provided. Preferably, the board guide 36 has the same length as the conveyor 2 in the X-axis direction.

  The substrate guide 36 has an action of correcting the posture of the substrate carried in from the outside when the posture in the horizontal plane is not parallel to the X-axis direction. More specifically, when a substrate having an inappropriate posture is carried in, the substrate contacts somewhere on the substrate guide 36 during the conveyance, and as a result, the posture is corrected. Because of this action, the substrate guide 36 has a certain elasticity at least on the side facing the substrate being transferred.

  In FIG. 1, the substrate guide 36 having a configuration in which a plurality of unit guides 36a are arranged is illustrated, but the configuration of the substrate guide 36 is not limited to this. The substrate guide 36 may have a configuration in which an endless belt is wound around both ends of the two driven rollers. In such a case, when the substrate conveyed by the conveyor 2 comes into contact with the endless belt, the posture of the substrate is changed to a correct state while the endless belt keeps the contact state and moves around while moving the substrate. become.

  Since the board guide 36 is fixed to the conveyor support 31 of the conveyor translation mechanism 3, it naturally moves together with the conveyor 2 when the conveyor 2 is discharged and inserted.

  As shown in FIG. 2, the substrate processing apparatus 100 further includes a control unit 4. The control unit 4 comprehensively controls the operation of each unit of the substrate processing apparatus 100. Specifically, the control unit 4 moves the upper lid 1 b by the upper lid lifting mechanism 51, lifts the lift plate 12 by the plate lifting mechanism 52, exhausts from the exhaust port 14 by the exhaust mechanism 53, or by the sliding mechanism 33. The translation movement of the conveyor 2 and the driving of the driving roller 21 by the motor 25 are controlled.

<Substrate processing flow>
Next, the flow of substrate processing in the substrate processing apparatus 100 having the above-described configuration will be described. FIG. 4 is a diagram showing a flow of a series of processes from when a substrate is loaded into the substrate processing apparatus 100 to when it is unloaded through a vacuum drying process. 5 to 15 are diagrams schematically showing the state of the substrate processing apparatus 100 in a typical aspect in the series of processes. In each of FIGS. 5 to 15, the figure with the branch number (a) is a top view, and the figure with the branch number (b) is a side view as seen from the side where the substrate is carried out.

  First, a substrate W to be processed, that is, a substrate W on which a coating film is formed, is carried into the substrate processing apparatus 100 with the upper lid 1b opened (step S1). FIGS. 5A and 5B are views showing a state at the time when the loading of the substrate W is started. At the start of loading, the conveyor 2 is at the transfer position P1, and the lift plate 12 is lowered as shown in FIG. 5 (b).

  Specifically, as indicated by an arrow AR1 in FIG. 5A, the substrate W is transported in the positive direction of the X axis by a pair of carry-in conveyors C1 provided outside the apparatus and transferred to the conveyor 2. . In the conveyor 2 to which the substrate W has been delivered, the endless belt 23 rotates by the motor 25 rotating the drive roller 21, whereby the substrate W moves in the X axis positive direction. The conveyor 2 may be operated from the time when the substrate W is delivered, or may be operated before the substrate W is delivered. The motor 25 stops rotating when the substrate W reaches a predetermined stop position. Thereby, the board | substrate W stops in the said stop position (step S2). 6A and 6B are views showing a state in which the substrate W is stopped at the stop position.

  Further, as described above, since the substrate guide 36 is provided in parallel with the conveyor 2 in the present embodiment, even if the substrate W is loaded in a posture inclined with respect to the X-axis direction in the horizontal plane, Thus, the posture is corrected, and when the stop position is reached, the substrate W is in a posture parallel to the X-axis direction.

  When the substrate W stops at the stop position, a plate lifting mechanism 52 is attached to the rear surface of the lift plate 12 to raise the lift plate 12 in the positive Z-axis direction as indicated by an arrow AR2 in FIG. The plate support 52a thus moved is raised.

  FIGS. 7A and 7B are views showing a state after the plate elevating mechanism 52 raises the lift plate 12. As shown in FIG. 7B, the lift plate 12 rises to a height at which the support pins 13 provided on the surface of the lift plate 12 abut against the back surface of the substrate W and the substrate W is separated from the conveyor 2. As a result, the substrate W is transferred from the conveyor 2 to the lift plate 12 (more strictly, to the support pins 13) (step S3).

  Subsequently, when the conveyor translation mechanism 3 is operated, the two conveyors 2 are respectively in the horizontal plane as shown by arrows AR3 and AR4 in FIGS. 7A and 7B, respectively. It is paid out in the direction away from W (step S4). FIGS. 8A and 8B are views showing a state where the two conveyors 2 have reached the retreat position P2.

  When the conveyor 2 reaches the retreat position P2, as shown by an arrow AR5 in FIG. 8B, the lift plate 12 is lowered until the back surface thereof comes into contact with the base 1a (step S5). FIGS. 9A and 9B are views showing a state after the lift plate 12 is lowered.

  When the loading of the substrate W and the delivery of the conveyor 2 are completed by the above procedure, the upper lid lifting mechanism 51 is operated, whereby the upper lid 1b of the chamber 1 is closed and the inside of the chamber 1 is sealed (step S6). . FIGS. 10A and 10B are views showing a state where the upper lid 1 b is closed and the substrate W supported by the support pins 13 is accommodated in the chamber 1. However, in FIGS. 10A and 10B, the thickness of the upper lid 1b is omitted for simplicity of illustration.

  In FIG. 10 and the subsequent drawings, for convenience of illustration, the carry-in conveyor C1 is omitted, but the carry-in conveyor C1 is arranged on the side of the substrate processing apparatus 100 in the mode shown in FIGS. In the aspect which is always installed in the direction, and it is arrange | positioned at the side of the substrate processing apparatus 100 whenever the board | substrate W is carried in, such as carrying a board | substrate from another place, when the carrying-in conveyor C1 itself moves. There may be.

  When the chamber 1 is in a sealed state, the exhaust mechanism 53 is operated, and the atmospheric gas in the chamber 1 is sucked through the exhaust port 14, thereby reducing the pressure in the chamber 1. By performing depressurization according to a depressurization profile that has parameters such as suction degree (vacuum degree) and suction time set according to the material and thickness of the coating film on the substrate W to be dried, A reduced-pressure drying process of the coating film on the substrate W is realized (step S7). A known technique can be applied for setting the decompression profile.

  In the case of the present embodiment, since the conveyor 2 that has transported the substrate W is paid out to the retracted position P2 outside the chamber 1 by the conveyor translation mechanism 3, it is the substrate W that is accommodated in the chamber 1 during the decompression drying process. Only the lift plate 12 is provided. Thereby, for example, as compared with an apparatus that performs drying under reduced pressure while the substrate transport mechanism is disposed inside the chamber as disclosed in Patent Document 2, the chamber 1 can be downsized more strictly. Reduction of the volume of the accommodation space formed in 1 is implement | achieved. Specifically, the distance d1 between the substrate W shown in FIG. 10B and the lower surface of the upper lid 1b facing the substrate W and the distance d2 between the side edge of the substrate W and the inner surface of the upper lid 1b are within a possible range. (To the extent that no inconvenience occurs in the vacuum drying process).

  Thus, since the volume of the accommodation space in the chamber 1 is small, in the present embodiment, the time required for decompression is shortened, and as a result, the treatment time of the decompression drying process is shortened.

  Further, since the accommodation space to be exhausted is small, the exhaust mechanism 53 itself is also miniaturized, and the cost of the substrate processing apparatus 100 is also reduced from this point.

  Furthermore, unlike the device disclosed in Patent Document 2, a driving member for connecting a driving means outside the chamber 1 and a transport mechanism inside the chamber 1 to the side of the chamber 1 (to the side of the upper lid 1b), etc. Therefore, there is no fear of leakage from the side of the chamber 1 when the pressure in the chamber 1 is reduced. That is, the substrate processing apparatus 100 according to the present embodiment is also excellent in terms of stability of the decompression process.

  When the decompression drying process using the predetermined decompression profile is completed, the exhaust mechanism 53 introduces the atmosphere into the chamber 1 through the exhaust port 14, thereby opening the chamber 1 to the atmosphere (step S 8). A supply port for introducing air may be provided separately. Further, the pressure may be returned by supplying an inert gas such as nitrogen instead of the atmosphere. Subsequently, the upper lid 1b is opened by the upper lid lifting mechanism 51 (step S9). FIGS. 11A and 11B are views showing a state when the upper lid 1b is opened after the atmosphere is released.

  FIGS. 11A and 11B show a state in which a pair of unloading conveyors C2 used for unloading the substrate W are attached to the substrate processing apparatus 100. A mode of being permanently installed on the side of the substrate processing apparatus 100 or a mode of being disposed on the side of the substrate processing apparatus 100 each time the substrate W is carried out may be used. In the latter case, the substrate may be transported to another place by moving the carry-out conveyor C2 itself.

  When the upper lid 1b is opened, the plate raising / lowering mechanism 52 raises the lift plate 12 as shown by the arrow AR6 in FIG. 11B (step S10). FIGS. 12A and 12B are views showing a state after the lift plate 12 is lifted. When the lift plate 12 is raised, the conveyor translation mechanism 3 inserts the conveyor 2 in the retreat position P2 into the chamber 1, as indicated by arrows AR7 and AR8 in FIGS. 12 (a) and 12 (b), respectively. (Step S11). FIGS. 13A and 13B are views showing a state after the conveyor 2 is inserted and disposed at the transport position P1.

  When the conveyor 2 is disposed at the transport position P1, the plate lifting mechanism 52 lowers the lift plate 12 as indicated by an arrow AR9 in FIG. As a result, the substrate W supported by the support pins 13 of the lift plate 12 is supported by the conveyor 2. That is, the substrate W is transferred from the lift plate 12 to the conveyor 2 (step S12). 14A and 14B are views showing a state where the substrate W is transferred to the conveyor 2. When the substrate W is delivered to the conveyor 2, the motor 25 of the conveyor 2 operates, and the substrate W is conveyed in the positive direction of the X axis as indicated by an arrow AR10, and is received by the adjacent carry-out conveyor C2. Passed. As a result, the substrate W is unloaded from the substrate processing apparatus 100 (step S13). FIGS. 15A and 15B are views showing a state where the substrate W is transferred to the carry-out conveyor C2.

  As described above, according to the substrate processing apparatus according to the present embodiment, since the substrate is transported by the conveyor, it is possible to stably carry in and out even a large substrate or a thick substrate, Compared with the case of carrying by a carrying robot and a carrying arm, the whole carrying system is simplified, and the time required for carrying is shortened.

  In addition, since the conveyor that transports the substrate is discharged to the retracted position outside the chamber by the conveyor translation mechanism, only the substrate and the lift plate that supports the substrate are accommodated in the chamber during the decompression drying process. Thereby, the volume of the accommodation space formed in the chamber can be reduced as compared with an apparatus that performs drying under reduced pressure while the substrate transport mechanism is disposed inside the chamber. Therefore, the time required for decompression is shortened, and as a result, the processing time of the decompression drying process is shortened. In addition, since the accommodation space that is an exhaust target is small, the exhaust mechanism itself is also downsized.

  Furthermore, since there is no drive member or the like connecting the external drive means and the internal transport mechanism at the side of the chamber, there is no fear of leakage from the side during decompression of the chamber.

  Therefore, the substrate processing apparatus according to the present embodiment is small, has a reduced processing time, and is excellent in terms of stability of the decompression process.

<Modification>
In the above-described embodiment, a belt conveyor having an endless belt is used as the conveyor 2. However, instead of this, a plurality of rollers (rollers) are along the conveyance direction, and the rotation axis is the conveyance of the substrate. The aspect using a roller conveyor arrange | positioned in the aspect orthogonal to a direction may be sufficient. In such a case, it is preferable that some of the plurality of rollers be drive rollers that are driven by external driving means.

  Also, the carry-in conveyor C1 and the carry-out conveyor C2 may be belt conveyors or roller conveyors.

  In the above-described embodiment, the support pins 13 that support the substrate are provided on the lift plate 12, and the lift plate 12 is moved up and down, but instead, a plurality of support pins 13 are directly connected. The aspect which raises / lowers may be sufficient.

  Further, in the above-described embodiment, the substrate is carried in and out only in one direction in the positive direction of the X axis, and the carry-in conveyor C1 and the carry-out conveyor C2 are arranged at the carry-in position and the carry-out position, respectively. However, instead of this, a mode in which the substrate is carried in and out at the same location may be employed. For example, the carry-in conveyor C1 also serves as a carry-out conveyor, and after the vacuum drying process is performed according to the above-described processing flow, the substrate W transferred to the conveyor 2 is moved in the negative direction of the X axis by the conveyor 2. May be transferred to the carry-in conveyor C1.

  Further, in the above-described embodiment, the conveyor 2 is paid out in the Y-axis direction by the conveyor translation mechanism 3, but this is not an essential aspect, as long as it does not interfere with the chamber 1 and other components. A mode of paying out in another direction may be employed. In such a case, a specific saving mode may be determined according to the surrounding environment of the substrate processing apparatus.

  In addition, in the above-described embodiment, the substrate processing apparatus is described as an apparatus that performs a reduced-pressure drying process. However, the processing container is removed by retracting a conveyor, which is a transport unit, outside the storage container that performs the processing. The technical idea of downsizing can be applied to other than the substrate processing apparatus for vacuum drying processing.

  For example, the substrate processing apparatus may perform heat treatment inside the chamber. For example, when the substrate processing apparatus heats the substrate supported by the support pins using the heating plates provided above and below the inner surface of the chamber, the substrate is transferred to the support pins as in the above embodiment. By configuring the substrate processing apparatus so that the subsequent conveyor is discharged out of the chamber, the space in the chamber where the heat treatment is performed can be further reduced. Thereby, shortening of heat processing time and the improvement of the uniformity of a heating are implement | achieved.

  Moreover, although the process with respect to the board | substrate for solar cells was demonstrated in the above-mentioned embodiment, the process target in the substrate processing apparatus which concerns on this invention is not restricted to this. For example, the same processing can be performed on a glass substrate for liquid crystal on which a photoresist film is formed. Thereby, even if it is a glass substrate for liquid crystals enlarged, the capacity | capacitance in a chamber can be made small and the effect similar to the above-mentioned embodiment can be acquired.

1 chamber 1a (chamber) base 1b (chamber) top lid 2 conveyor 12 lift plate 13 support pin 21 drive roller 22 driven roller 23 endless belt 24 shaft 25 motor 3 conveyor translation mechanism 31 conveyor support 32 motor support 33 slide Moving mechanism 33a Sliding body 33b Sliding part 33c Guided member 34 Guide member 35 Base 36 Substrate guide 4 Control unit 100 Substrate processing apparatus C1 Loading conveyor C2 Unloading conveyor P1 Transfer position P2 Retraction position W Substrate

Claims (6)

An apparatus for performing predetermined processing on a substrate,
A chamber in which an openable / closable upper lid and a base provided with supporting means for supporting a rectangular substrate are formed, and a sealed substrate housing space is formed by placing the upper lid on the base; ,
A conveyer that supports and conveys the substrate carried in from the outside of the chamber and the substrate carried out of the chamber from below at a conveyance position defined above the base;
A conveyor moving mechanism capable of moving the conveyor between the transfer position and a retracted position outside the chamber;
A substrate guide that is fixed with respect to the conveyor, extends along a direction in which the substrate is transported, and corrects the posture of the loaded substrate;
With
The conveyor moving mechanism moves the conveyor to the transport position when the substrate is transported, and the substrate is supported by the support means in the sealed chamber with respect to the substrate. When the process is performed, the conveyor is moved to the retracted position.
A substrate processing apparatus. The substrate processing apparatus according to claim 1,
The conveyance direction of the substrate by the conveyor and the movement direction of the conveyor by the conveyor moving mechanism are orthogonal to each other in a horizontal plane.
A substrate processing apparatus. The substrate processing apparatus according to claim 2,
The conveyor is provided in a horizontal plane and spaced apart from each other in a direction orthogonal to the substrate transport direction, and the conveyor transport mechanism is provided for each conveyor,
The conveyance of the substrate is the lower position of each of two side end portions above the base and parallel to the conveyance direction of the substrate as the conveyance position of the respective conveyor, By supporting the substrate from below in position,
The movement of the respective conveyors to the retracted position by the respective conveyor moving mechanisms is performed in directions in which the respective conveyors are separated from each other.
A substrate processing apparatus. The substrate processing apparatus according to claim 3, wherein
The support means is provided to be movable up and down on the upper surface of the base,
With respect to the substrate in which the two side end portions are supported from below by each of the conveyors, the support means rises and comes into contact with the substrate from below and further rises, whereby the substrate is removed from the conveyor. Passed to the support means,
A substrate processing apparatus. The substrate processing apparatus according to claim 1, wherein:
Decompression means for depressurizing the substrate housing space by exhausting the atmospheric gas in the sealed substrate housing space;
Further comprising
When the substrate has a coating film formed on the surface thereof, the coating film is dried by depressurizing the substrate housing space according to a predetermined profile.
A substrate processing apparatus. A substrate processing apparatus according to any one of claims 1 to 5,
A carry-in conveyor that is disposed in association with the chamber and delivers the substrate to the conveyor;
An unloading conveyor disposed along with the chamber for receiving the substrate from the conveyor;
A substrate processing system comprising:

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