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JP6079334B2 - Optical semiconductor light emitting device, lighting apparatus, display device, and color rendering control method - Google Patents
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JP6079334B2 - Optical semiconductor light emitting device, lighting apparatus, display device, and color rendering control method - Google Patents

Optical semiconductor light emitting device, lighting apparatus, display device, and color rendering control method Download PDF

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JP6079334B2
JP6079334B2 JP2013054245A JP2013054245A JP6079334B2 JP 6079334 B2 JP6079334 B2 JP 6079334B2 JP 2013054245 A JP2013054245 A JP 2013054245A JP 2013054245 A JP2013054245 A JP 2013054245A JP 6079334 B2 JP6079334 B2 JP 6079334B2
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optical semiconductor
semiconductor light
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fine particles
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JP2014179565A (en
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恭行 栗野
恭行 栗野
大塚 剛史
剛史 大塚
佐藤 洋一
洋一 佐藤
健児 山口
健児 山口
原田 健司
健司 原田
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Sumitomo Osaka Cement Co Ltd
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Description

本発明は、光半導体発光装置、これを備えてなる照明器具、及び表示装置、並びに演色性制御方法に関する。   The present invention relates to an optical semiconductor light emitting device, a lighting fixture including the same, a display device, and a color rendering control method.

白色光半導体発光装置には、青色光半導体素子と黄色蛍光体を組み合わせたものや、近紫外光半導体発光素子と赤色蛍光体、緑色蛍光体、青色蛍光体を組み合わせたもの、赤色光半導体発光素子と緑色光半導体と青色光半導体発光素子を組み合わせたものがある。
これらの光半導体発光装置では、その輝度を上げる目的で屈折率が高い封止材を用いることがあり、封止材の屈折率を高める場合に金属酸化物粒子を封止材に添加する方法がある。
赤色光半導体発光素子(AlGaInP系、屈折率3.2、発光波長630nm)と緑色光半導体(InGaN系、屈折率2.4、発光波長530nm)と青色光半導体発光素子(InGaN系、屈折率2.4、発光波長450nm)を組み合わせた白色光半導体発光装置では、発光色(波長)によって光半導体発光素子の屈折率が異なるため、発光色(波長)によって光半導体発光素子と封止材との屈折率差が異なる。また、封止材の屈折率に波長依存性がある場合、光半導体発光素子の屈折率が発光色(波長)では変わらない場合であっても、発光色によって光半導体発光素子と封止材との屈折率差が異なる。
White light semiconductor light emitting device includes a combination of a blue light semiconductor element and a yellow phosphor, a combination of a near ultraviolet light semiconductor light emitting element and a red phosphor, a green phosphor, a blue phosphor, a red light semiconductor light emitting element And a combination of a green light semiconductor and a blue light semiconductor light emitting element.
In these optical semiconductor light-emitting devices, a sealing material having a high refractive index may be used for the purpose of increasing the luminance, and there is a method of adding metal oxide particles to the sealing material when increasing the refractive index of the sealing material. is there.
Red light semiconductor light emitting device (AlGaInP system, refractive index 3.2, emission wavelength 630 nm) and green light semiconductor light emitting device (InGaN system, refractive index 2.4, light emission wavelength 530 nm) and blue light semiconductor light emitting device (InGaN system, refractive index 2) .4, in a white light semiconductor light emitting device that combines a light emission wavelength of 450 nm), since the refractive index of the light semiconductor light emitting element differs depending on the light emission color (wavelength), The difference in refractive index is different. In addition, when the refractive index of the encapsulant is wavelength-dependent, even if the refractive index of the optical semiconductor light-emitting element does not change depending on the emission color (wavelength), the optical semiconductor light-emitting element and the encapsulant are changed depending on the emission color. The refractive index difference is different.

発光波長の異なる光半導体発光素子を2個以上搭載した光半導体発光装置で、封止材の屈折率に波長依存性があり、波長が短くなるほど屈折率が大きくなるとき、発光波長の短い光半導体発光素子の屈折率と封止材の屈折率との差が小さくなる(封止材の屈折率が高くなることによって、光半導体素子の屈折率に近づく)ことから、発光波長の短い光半導体発光素子から封止材への光取出量が多くなる。この作用は、光半導体発光装置の輝度を高める目的で、高屈折率だがアッベ数が小さい微粒子を封止材に分散させた場合に、より顕著となる。
発光波長の異なる光半導体発光素子を2個以上搭載した光半導体発光装置では、封止材の屈折率に波長依存性が大きいと、短波長側の発光色成分量が長波長側の発光色成分量よりも相対的に多くなり、発光色成分のバランスが変わることで演色性が低下する問題がある。また、3原色光半導体発光素子を搭載した白色光半導体発光装置のように、短波長側の発光色が青色の場合には、白色光中の青色成分量が多くなり、この白色光に人体が長時間曝されると眼の青色光網膜障害、皮膚への生理的ダメージや覚醒レベル、自律神経機能、体内時計、メラトニン分泌等への生理的影響が問題となる。
An optical semiconductor light-emitting device in which two or more optical semiconductor light-emitting elements having different emission wavelengths are mounted, and the refractive index of the encapsulant is wavelength-dependent, and when the refractive index increases as the wavelength decreases, the optical semiconductor with a short emission wavelength Since the difference between the refractive index of the light-emitting element and the refractive index of the sealing material is small (the refractive index of the sealing material is high, the refractive index of the optical semiconductor element is approached). The amount of light extracted from the element to the sealing material increases. This effect becomes more prominent when fine particles having a high refractive index but a small Abbe number are dispersed in the encapsulant for the purpose of increasing the luminance of the optical semiconductor light emitting device.
In an optical semiconductor light-emitting device having two or more optical semiconductor light-emitting elements having different emission wavelengths, if the wavelength dependency of the refractive index of the encapsulant is large, the emission color component amount on the short wavelength side is the emission color component on the long wavelength side. There is a problem that the color rendering property is lowered by the relative increase of the amount and the balance of the luminescent color components being changed. In addition, when the emission color on the short wavelength side is blue, as in a white light semiconductor light-emitting device equipped with three primary color light-emitting semiconductor light-emitting elements, the amount of blue component in white light increases, and the human body Long-term exposure causes problems such as blue light retinopathy of the eye, physiological damage and arousal level to the skin, autonomic nervous function, body clock, melatonin secretion and the like.

演色性を改善する方法として、例えば、
最適な「白色」に調光するために黄色の色調が強い白色光を照射するウォームホワイトLEDと、青色の色調が強い白色光を照射するクールホワイトLEDと、赤、緑、青の光を照射する3原色LEDを備える方法(特許文献1)、
LED素子を積層した可視光LED装置において短波長の光を反射もしくは吸収する光学カラーフィルタをLED素子間に配置してより短波長の光がより長波長のLED素子へ入射することを防ぎ、且つ所望の色を所望の強度で発光させる方法(特許文献2)、
屈折率が1.4以下であり、アッベ数が大きいフッ素含有樹脂を含有した封止材とすることで光を気体中に取りだす効率が高く、色収差が小さい白色LED(特許文献3)、
モノアリルジグリシジルイソシアヌレートやモノアリルイソシアヌレート等の化合物の成分量を変化させることによってアッベ数の変化を抑える方法(特許文献4)、
透明樹脂の硬化後のアッベ数を45以上としガラスフィラーと透明樹脂との屈折率の波長依存性をできるだけ合致させることにより、透明複合体樹脂の透明性を維持する方法(特許文献5)、
等が提案されている。
また、シリコーン樹脂硬化物をレンズ成形用材料として使用する場合には、アッベ数は40以上90以下とすることが好く、40より小さいと色収差が大きくなるとしている(特許文献6)。
As a method for improving color rendering, for example,
Warm white LED that emits white light with strong yellow color tone, cool white LED that emits white light with strong blue color tone, and red, green, and blue light for optimal “white” dimming A method including three primary color LEDs (Patent Document 1),
An optical color filter that reflects or absorbs short wavelength light is arranged between the LED elements in the visible light LED device in which the LED elements are stacked, and prevents light having a shorter wavelength from entering the longer wavelength LED element; and A method of emitting light of a desired color at a desired intensity (Patent Document 2),
A white LED (Patent Document 3) that has a high refractive index and a high efficiency of taking out light into the gas by using a fluorine-containing resin having a large Abbe number and a small chromatic aberration.
A method for suppressing a change in the Abbe number by changing the amount of a component of a compound such as monoallyl diglycidyl isocyanurate or monoallyl isocyanurate (Patent Document 4),
A method of maintaining the transparency of the transparent composite resin by setting the Abbe number after curing of the transparent resin to 45 or more and matching the wavelength dependence of the refractive index of the glass filler and the transparent resin as much as possible (Patent Document 5),
Etc. have been proposed.
Further, when a cured silicone resin is used as a lens molding material, the Abbe number is preferably 40 or more and 90 or less, and if it is smaller than 40, chromatic aberration is increased (Patent Document 6).

特開2009−211819号公報JP 2009-211819 A 特開2008−263127公報JP 2008-263127 A 特許第5020480号公報Japanese Patent No. 5020480 特開2011−105784号公報JP 2011-105784 A 特開2005−029668号公報Japanese Patent Laid-Open No. 2005-029668 特開2012−007002号公報JP 2012-007002 A

特許文献1では、個々の光半導体発光装置の演色性を目的とせず、光半導体発光装置の集合体として演色性を改善しているが、美術品の照明目的であるため高コストの構造であり、一般的な使用には経済的に問題がある。
特許文献2では、光半導体発光素子として演色性の改善を図っているが、光半導体発光装置においては光半導体発光素子が最もコストが高いため、光半導体発光素子のコストをさらに上げることとなり経済的に問題である。
特許文献3、4、6では、封止材のアッベ数を大きくすることによって光半導体発光装置の色収差を小さくしているが、これは封止材から外部空気へ出る光の色収差の低減、つまり色分かれの低減を目的としており、それぞれ発光波長が異なる光半導体発光素子から取出される光の量を制御して演色性を改善するものではない。さらに、特許文献3では、高コストのフッ素含有樹脂を用いることから経済的にも問題がある。特許文献4では、アッベ数の変化を抑えるイソシアヌレート系材料が加熱着色の原因となる。特許文献6では、シリコーン樹脂中の官能基構造によってシリコーン樹脂組成物の屈折率とアッベ数が限定される。
特許文献5では、ガラスフィラーと樹脂との透明複合化を達成するためにアッベ数を近似させることを目的としており、やはり発光波長が異なる光半導体発光素子から取出される光の量を制御して演色性を改善するものではない。
In Patent Document 1, the color rendering properties of individual optical semiconductor light emitting devices are not aimed, but the color rendering properties are improved as an assembly of optical semiconductor light emitting devices. In general use, there is an economic problem.
In Patent Document 2, color rendering is improved as an optical semiconductor light emitting element. However, in an optical semiconductor light emitting device, the cost of the optical semiconductor light emitting element is the highest, which further increases the cost of the optical semiconductor light emitting element. It is a problem.
In Patent Documents 3, 4, and 6, the chromatic aberration of the optical semiconductor light-emitting device is reduced by increasing the Abbe number of the sealing material. This is a reduction in chromatic aberration of light emitted from the sealing material to the outside air, that is, The purpose is to reduce color separation, and it does not improve the color rendering by controlling the amount of light extracted from the optical semiconductor light emitting elements having different emission wavelengths. Furthermore, in patent document 3, there exists a problem also economically from using a high-cost fluorine-containing resin. In Patent Document 4, an isocyanurate-based material that suppresses a change in the Abbe number causes heat coloring. In Patent Document 6, the refractive index and the Abbe number of the silicone resin composition are limited by the functional group structure in the silicone resin.
Patent Document 5 aims to approximate the Abbe number in order to achieve a transparent composite of a glass filler and a resin, and also controls the amount of light extracted from an optical semiconductor light emitting element having a different emission wavelength. It does not improve color rendering.

以上から、本発明は、輝度が高く、演色性が優れた光半導体発光装置、光半導体発光装置を具備してなる照明器具及び表示装置、並びに演色性制御方法を提供することを課題とするものである。   In light of the above, an object of the present invention is to provide an optical semiconductor light emitting device having high luminance and excellent color rendering, a lighting apparatus and a display device including the optical semiconductor light emitting device, and a color rendering control method. It is.

本発明者らは、鋭意検討を進めた結果、光半導体発光装置に具備される発光波長が異なる2個以上の光半導体発光素子を、特定の微粒子を含有する封止組成物を硬化させた、アッベ数が30以上である光半導体封止材によって封止することにより、上記課題が解決されることを見出し、本発明を完成した。
すなわち、本発明は、下記のとおりである。
As a result of diligent investigations, the present inventors have cured two or more photosemiconductor light-emitting elements having different emission wavelengths provided in the photosemiconductor light-emitting device with a sealing composition containing specific fine particles. It discovered that the said subject was solved by sealing with the optical-semiconductor sealing material whose Abbe number is 30 or more, and completed this invention.
That is, the present invention is as follows.

[1]発光波長が異なる光半導体発光素子を2個以上備える光半導体発光装置であって、
微粒子を含有する封止組成物を硬化させた、アッベ数が30以上である光半導体封止材によって上記光半導体発光素子が封止され、
上記微粒子が、アルケニル基、H−Si基、及びアルコキシ基から選ばれた1つ以上の官能基を有する表面修飾材料によって表面修飾され、光半導体発光波長領域において光の吸収の無い材質からなる、平均一次粒径3nm以上、20nm以下の微粒子である光半導体発光装置。
[2]前記微粒子のアッベ数が30以上である、前記[1]に記載の光半導体発光装置。
[3]前記光半導体封止材の波長400nmから波長800nmまでの透過率が70%以上である、前記[1]又は[2]に記載の光半導体発光装置。
[4]前記微粒子の含有量を変化させることによって光半導体封止材の屈折率及びアッベ数を調整して演色性を制御する、前記[1]〜[3]のいずれかに記載の光半導体発光装置の演色性制御方法。
[5]前記[4]に記載の演色性制御方法によって演色性が制御された光半導体発光装置。
[6]前記[1]〜[3]及び[5]のいずれかに記載の光半導体発光装置を具備してなる照明器具。
[7]前記[1]〜[3]及び[5]のいずれかに記載の光半導体発光装置を具備してなる表示装置。
[1] An optical semiconductor light emitting device including two or more optical semiconductor light emitting elements having different emission wavelengths,
The optical semiconductor light-emitting element is sealed by an optical semiconductor sealing material having an Abbe number of 30 or more obtained by curing a sealing composition containing fine particles.
The fine particles are surface-modified with a surface modifying material having one or more functional groups selected from alkenyl groups, H-Si groups, and alkoxy groups, and are made of a material that does not absorb light in the optical semiconductor emission wavelength region. An optical semiconductor light emitting device which is fine particles having an average primary particle size of 3 nm or more and 20 nm or less.
[2] The optical semiconductor light emitting device according to [1], wherein the Abbe number of the fine particles is 30 or more.
[3] The optical semiconductor light-emitting device according to [1] or [2], wherein the optical semiconductor sealing material has a transmittance from a wavelength of 400 nm to a wavelength of 800 nm of 70% or more.
[4] The optical semiconductor according to any one of [1] to [3], wherein the color rendering property is controlled by adjusting the refractive index and Abbe number of the optical semiconductor sealing material by changing the content of the fine particles. Color rendering property control method of light emitting device.
[5] An optical semiconductor light emitting device whose color rendering is controlled by the color rendering control method according to [4].
[6] A lighting fixture comprising the optical semiconductor light-emitting device according to any one of [1] to [3] and [5].
[7] A display device comprising the optical semiconductor light-emitting device according to any one of [1] to [3] and [5].

本発明によれば、短波長側の発光素子からの光取出量と長波長側の発光素子からの光取出量とのバランスを調整でき、演色性を改善させることができることから、輝度が高く、演色性が優れた光半導体発光装置、光半導体発光装置を具備してなる照明器具及び表示装置を提供することができる。
また、本発明によれば微粒子の含有量を変化させることによって光半導体封止材の屈折率及びアッベ数を調整して演色性を制御できることから、光半導体発光装置の演色性制御方法を提供することができる。
According to the present invention, the balance between the amount of light extracted from the light emitting element on the short wavelength side and the amount of light extracted from the light emitting element on the long wavelength side can be adjusted, and the color rendering can be improved. An optical semiconductor light-emitting device having excellent color rendering properties, a lighting fixture and a display device including the optical semiconductor light-emitting device can be provided.
Further, according to the present invention, since the color rendering property can be controlled by adjusting the refractive index and Abbe number of the optical semiconductor sealing material by changing the content of fine particles, a method for controlling the color rendering property of the optical semiconductor light emitting device is provided. be able to.

本発明の光半導体発光装置の一例を示す概略断面図である。It is a schematic sectional drawing which shows an example of the optical semiconductor light-emitting device of this invention. 本発明の光半導体発光装置の他の一例を示す概略断面図である。It is a schematic sectional drawing which shows another example of the optical semiconductor light-emitting device of this invention. 本発明の光半導体発光装置の他の一例を示す概略断面図である。It is a schematic sectional drawing which shows another example of the optical semiconductor light-emitting device of this invention. 本発明の光半導体発光装置の他の一例を示す概略断面図である。It is a schematic sectional drawing which shows another example of the optical semiconductor light-emitting device of this invention. 本発明の光半導体発光装置の他の一例を示す概略断面図である。It is a schematic sectional drawing which shows another example of the optical semiconductor light-emitting device of this invention.

[光半導体発光装置]
本発明の光半導体発光装置は、発光波長が異なる光半導体発光素子を2個以上備える光半導体発光装置であって、微粒子を含有する封止組成物を硬化させた、アッベ数が30以上である光半導体封止材によって上記光半導体発光素子が封止され、上記微粒子が、アルケニル基、H−Si基、及びアルコキシ基から選ばれた1つ以上の官能基を有する表面修飾材料によって表面修飾され、光半導体発光波長領域において光の吸収の無い材質からなる、平均一次粒径3nm以上、20nm以下の微粒子である。
[Optical semiconductor light emitting device]
The optical semiconductor light-emitting device of the present invention is an optical semiconductor light-emitting device including two or more optical semiconductor light-emitting elements having different emission wavelengths, and has an Abbe number of 30 or more obtained by curing a sealing composition containing fine particles. The optical semiconductor light-emitting element is sealed with an optical semiconductor sealing material, and the fine particles are surface-modified with a surface modification material having one or more functional groups selected from alkenyl groups, H-Si groups, and alkoxy groups. These are fine particles having an average primary particle diameter of 3 nm or more and 20 nm or less made of a material that does not absorb light in the optical semiconductor emission wavelength region.

(光半導体発光素子等)
同一の光半導体発光装置内に互いに発光波長が異なる光半導体発光素子を備えた光半導体発光装置としては、例えば、630nm付近の発光波長を有する赤色光半導体発光素子と、530nm付近の発光波長を有する緑色光半導体発光素子と、450nm付近の発光波長を有する青色光半導体発光素子と、の3原色発光素子を備えた白色光半導体発光装置である。
光半導体発光装置内に発光波長が異なる光半導体発光素子が2つ以上備えられた白色光半導体発光装置であれば、光半導体発光装置の光を所望の色に近づけるための光半導体発光素子の数、種類に特に制約はない。
(Optical semiconductor light emitting device, etc.)
As an optical semiconductor light emitting device including optical semiconductor light emitting elements having different emission wavelengths in the same optical semiconductor light emitting device, for example, a red optical semiconductor light emitting element having an emission wavelength of about 630 nm and an emission wavelength of about 530 nm A white light semiconductor light-emitting device including a three-primary-color light-emitting element of a green light semiconductor light-emitting element and a blue light semiconductor light-emitting element having an emission wavelength near 450 nm.
In the case of a white light semiconductor light emitting device in which two or more optical semiconductor light emitting elements having different emission wavelengths are provided in the optical semiconductor light emitting device, the number of optical semiconductor light emitting elements for bringing the light of the optical semiconductor light emitting device closer to a desired color There are no particular restrictions on the type.

また、光半導体発光装置の光を所望の色に合成して近づけるために、発光波長が異なる2つ以上の光半導体発光素子と発光波長を変換する蛍光体とを組み合わせてもよい。上記蛍光体としては、例えば、黄色蛍光体、緑色蛍光体及び赤色蛍光体等の公知の蛍光体を使用することができる。
また、光半導体封止材の形状は、平坦状の他、凸状及び凹状等のレンズ状であってもよく、光半導体封止材の上に樹脂単体層(樹脂のみで構成され微粒子を含有しない層)を設けてもよい。
Further, in order to synthesize and approximate the light of the optical semiconductor light emitting device to a desired color, two or more optical semiconductor light emitting elements having different emission wavelengths and a phosphor that converts the emission wavelength may be combined. As said fluorescent substance, well-known fluorescent substances, such as a yellow fluorescent substance, a green fluorescent substance, and a red fluorescent substance, can be used, for example.
Further, the shape of the optical semiconductor sealing material may be a flat shape or a lens shape such as a convex shape and a concave shape, and a resin single layer (contained only of resin and containing fine particles) on the optical semiconductor sealing material. May be provided.

(光半導体発光装置の態様例)
本発明の光半導体発光装置の態様例として、図1〜図5を用いて説明する。
本発明の光半導体発光装置の態様は、図1に示すように基板の凹部に発光波長が異なる光半導体発光素子10が2個以上配置され、これを覆うように微粒子を含有する封止組成物を硬化させた光半導体封止材層12が設けられている。空気界面相13の表面形状は、特に制約はなく、図1に示すように平坦状の他、図2に示すように凸状(凸レンズ状)であってもよく、凹状であってもよい。
(Example of an optical semiconductor light emitting device)
An embodiment of the optical semiconductor light emitting device of the present invention will be described with reference to FIGS.
As shown in FIG. 1, the embodiment of the optical semiconductor light emitting device of the present invention has two or more optical semiconductor light emitting elements 10 having different emission wavelengths arranged in the concave portion of the substrate, and contains a sealing composition containing fine particles so as to cover it. The optical semiconductor sealing material layer 12 which hardened | cured was provided. The surface shape of the air interface phase 13 is not particularly limited, and may be a flat shape (convex lens shape) or a concave shape as shown in FIG. 2 in addition to a flat shape as shown in FIG.

また、図3に示すように光半導体封止材層12上に、樹脂単体層(樹脂のみで構成され微粒子を含有しない層)14が設けられていてもよい。なお、図3における樹脂単体層14は凸状であるが、平坦状や凹状であってもよい。さらに、本発明の光半導体発光装置が蛍光体を含む場合においては、図4に示すように光半導体発光素子10が配置され、これを覆うように蛍光体11が光半導体封止材層12中に設けられていてもよく、また図5に示すように、蛍光体11は光半導体封止材層12上に設けられた樹脂単体層中14中に設けてもよい。   Further, as shown in FIG. 3, a single resin layer (a layer made of only resin and containing no fine particles) 14 may be provided on the optical semiconductor sealing material layer 12. The single resin layer 14 in FIG. 3 is convex, but it may be flat or concave. Further, in the case where the optical semiconductor light emitting device of the present invention includes a phosphor, the optical semiconductor light emitting element 10 is disposed as shown in FIG. 4, and the phosphor 11 covers the optical semiconductor sealing material layer 12 so as to cover it. As shown in FIG. 5, the phosphor 11 may be provided in a resin single layer 14 provided on the optical semiconductor sealing material layer 12.

(光半導体封止材)
光半導体封止材(以下、単に「封止材」と称すことがある)は、上記光半導体発光素子を封止するものであり、後述する微粒子を含有する封止組成物を硬化させて得られる。
光半導体封止材のアッベ数は30以上であり、演色性をより向上させる観点から、好ましくは35以上であり、より好ましくは40以上である。また、光半導体封止材のアッベ数は通常60以下であり、好ましくは55以下である。アッベ数が30未満であると、封止材の屈折率の波長依存性によって発光波長の短い光半導体発光素子の屈折率と封止材の屈折率との差の広がりを抑えることができず、長波長側の光半導体発光素子の光取出し量に対する短波長側の光半導体発光素子の光取出量が著しく増大してしまい、演色性が低下する。一方、アッベ数をより大きくすることは、アッベ数の大きい微粒子としてAl23を、アッベ数の大きい樹脂としてジメチルシリコーンを選択し、これらを組合せることによって可能であるが、アッベ数が60を超えるようにすると、封止材中のAl23粒子の含有量が多くなるために封止材の粘度が著しく高くなるおそれがあり、封止作業性が低下することがある。また、粒子含有量が多いことから封止材の透明性が低下して輝度が低下することがある。
なお、アッベ数(νd)は、フラウンホーファー線のd線(587nm)、F線(486nm)、C線(656nm)における屈折率からνd=(nd−1)/(nF−nC)の式によって求めることができる。
(Optical semiconductor encapsulant)
The optical semiconductor encapsulant (hereinafter sometimes simply referred to as “encapsulant”) is for encapsulating the above optical semiconductor light-emitting element, and is obtained by curing a sealing composition containing fine particles described later. It is done.
The Abbe number of the optical semiconductor encapsulant is 30 or more, and preferably 35 or more, more preferably 40 or more from the viewpoint of further improving the color rendering. Further, the Abbe number of the optical semiconductor sealing material is usually 60 or less, preferably 55 or less. If the Abbe number is less than 30, the spread of the difference between the refractive index of the optical semiconductor light-emitting element having a short emission wavelength and the refractive index of the sealing material cannot be suppressed due to the wavelength dependence of the refractive index of the sealing material. The light extraction amount of the light semiconductor light emitting element on the short wavelength side with respect to the light extraction amount of the light semiconductor light emitting element on the long wavelength side is remarkably increased, and the color rendering is deteriorated. On the other hand, it is possible to increase the Abbe number by selecting Al 2 O 3 as fine particles having a large Abbe number and dimethyl silicone as a resin having a large Abbe number, and combining them. If it exceeds V, the content of Al 2 O 3 particles in the sealing material increases, so that the viscosity of the sealing material may be remarkably increased, and the sealing workability may be lowered. Moreover, since there is much particle | grain content, the transparency of a sealing material falls and a brightness | luminance may fall.
The Abbe number (ν d ) is calculated from the refractive indices of the Fraunhofer line d line (587 nm), F line (486 nm), and C line (656 nm), ν d = (n d −1) / (n F −n). C ).

また、光半導体封止材は、蛍光体を含まない状態で波長400nmから波長800nmまでの積分球で測定した場合の透過率が、70%以上であることが好ましく、75%以上であることがより好ましく、80%以上であることがさらに好ましい。透過率が70%以上であることで、微粒子によって生じる光散乱や樹脂自体による光吸収を抑え、光半導体発光装置の輝度の低下を抑えることができる。上記のような透過率を得るには、微粒子の粒径や量を調整したり、樹脂自体を選定すればよい。   In addition, the optical semiconductor encapsulant preferably has a transmittance of 70% or more and 75% or more when measured with an integrating sphere having a wavelength of 400 nm to a wavelength of 800 nm in a state where the phosphor is not included. More preferably, it is more preferably 80% or more. When the transmittance is 70% or more, light scattering caused by fine particles and light absorption by the resin itself can be suppressed, and a decrease in luminance of the optical semiconductor light emitting device can be suppressed. In order to obtain the transmittance as described above, the particle size and amount of the fine particles may be adjusted, or the resin itself may be selected.

封止組成物に含まれる微粒子は、光半導体発光波長領域において光の吸収の無い材質からなる。なおここで、光の吸収が無いとは、光の吸収が全く無いということではなく、実質的に吸収を考慮する必要が無いことを意味する。
微粒子のアッベ数は、30以上が好ましく、より好ましくは35以上である。微粒子のアッベ数が30以上であれば、樹脂の中でもアッベ数の小さいジフェニルシリコーンやハロゲン元素を導入した高屈折率樹脂と複合化しても、光半導体封止材としてのアッベ数低下を抑えることができる。
The fine particles contained in the sealing composition are made of a material that does not absorb light in the optical semiconductor emission wavelength region. Here, the fact that there is no light absorption does not mean that there is no light absorption, but means that it is not necessary to consider the absorption substantially.
The Abbe number of the fine particles is preferably 30 or more, more preferably 35 or more. If the Abbe number of the fine particles is 30 or more, even if it is combined with diphenyl silicone having a small Abbe number or a high refractive index resin into which a halogen element is introduced, it is possible to suppress a decrease in Abbe number as an optical semiconductor encapsulant. it can.

微粒子としては、例えば、無機粒子、有機樹脂粒子、有機樹脂粒子中に無機粒子を分散複合化した微粒子が挙げられる。
封止組成物に含まれる樹脂中への単分散性と、樹脂との界面親和性を確保するために表面改質が容易なこととを考慮すると、無機粒子が好ましく、無機粒子の中でも金属酸化物がより好ましく、さらに封止材を着色させることなく、アッベ数が30以上であるSiO2、Al23、ZrO2、CeO2、Y23、La23、Hf23がさらに好ましい。特に、アッベ数が35以上であり、さらに封止材の透明性を保持する観点からナノメートルサイズの粒子径を得ることができるSiO2、Al23、ZrO2が好ましい。
Examples of the fine particles include inorganic particles, organic resin particles, and fine particles obtained by dispersing and compounding inorganic particles in organic resin particles.
In consideration of the monodispersibility in the resin contained in the sealing composition and the ease of surface modification to ensure the interface affinity with the resin, inorganic particles are preferable, and among the inorganic particles, metal oxidation is preferable. things more preferably, without further coloring the sealing material, SiO 2 Abbe number is 30 or more, Al 2 O 3, ZrO 2 , CeO 2, Y 2 O 3, La 2 O 3, Hf 2 O 3 Is more preferable. In particular, SiO 2 , Al 2 O 3 , and ZrO 2 having an Abbe number of 35 or more and capable of obtaining nanometer-sized particle diameters from the viewpoint of maintaining the transparency of the sealing material are preferable.

微粒子の平均一次粒径は、3nm以上、20nm以下であり、4nm以上、15nm以下であることが好ましく、5nm以上、10nm以下であることがより好ましい。
平均一次粒径が3nm未満では、微粒子の相対比表面積が大きいため樹脂への単分散性と樹脂との界面親和性を確保するために微粒子表面を改質する表面修飾材料が多くなり、さらに表面修飾材料と樹脂との反応架橋点が多くなることで封止材組成物の硬化物が脆くなり、環境温度差が生じた場合にクラックが発生する。また、表面修飾した微粒子中の微粒子成分量が減ることから微粒子による封止材のアッベ数制御効果が低下する。また、特に金属酸化物を微粒子として選択した場合は、金属酸化物粒子の結晶性が低くなるため、微粒子による封止材のアッベ数制御効果が低下する。
一方、平均一次粒径が20nmを超えると、微粒子による散乱が大きくなり封止材の透光性を低下させ、光半導体発光装置の輝度が低下してしまう。
The average primary particle size of the fine particles is 3 nm or more and 20 nm or less, preferably 4 nm or more and 15 nm or less, and more preferably 5 nm or more and 10 nm or less.
If the average primary particle size is less than 3 nm, the relative specific surface area of the fine particles is large, so that there are more surface modifying materials that modify the surface of the fine particles in order to ensure monodispersity in the resin and interface affinity with the resin. The cured product of the sealing material composition becomes brittle due to an increase in the reactive crosslinking points between the modifying material and the resin, and cracks occur when an environmental temperature difference occurs. Further, since the amount of the fine particle component in the surface-modified fine particles is reduced, the Abbe number control effect of the sealing material by the fine particles is lowered. In particular, when a metal oxide is selected as the fine particles, the crystallinity of the metal oxide particles is lowered, and the effect of controlling the Abbe number of the sealing material by the fine particles is reduced.
On the other hand, when the average primary particle size exceeds 20 nm, scattering by the fine particles increases, and the translucency of the sealing material is lowered, and the luminance of the optical semiconductor light emitting device is lowered.

封止組成物中における微粒子の含有量は、20〜70質量%であることが好ましく、25〜60質量%であることがより好ましい。さらに封止組成物の注入作業性を可能とするためには、封止組成物の粘度を100Pa・s以下(室温)にすることが好ましいが、この粘度で実用的に封止材のアッベ数を調整することができる観点から、25〜50質量%であることがさらに好ましい。   The content of the fine particles in the sealing composition is preferably 20 to 70% by mass, and more preferably 25 to 60% by mass. Further, in order to enable the injection workability of the sealing composition, the viscosity of the sealing composition is preferably set to 100 Pa · s or less (room temperature). It is more preferable that it is 25-50 mass% from a viewpoint which can adjust.

また封止組成物に含まれる微粒子は、アルケニル基、H−Si基、及びアルコキシ基から選ばれた1つ以上の官能基を有する表面修飾材料によって表面修飾されている。
微粒子を封止材中に分散させるには、微粒子表面と封止組成物に用いられる樹脂との界面親和性を確保する必要がある。アルケニル基、H−Si基、及びアルコキシ基から選ばれた1つ以上の官能基を有する表面修飾材料の構造は、封止組成物に用いられる樹脂と相性が良いことから、上記官能基を有する表面修飾材料で微粒子表面を被覆することにより、微粒子表面と樹脂との界面親和性が確保され、微粒子を封止材中に均一に分散させることができる。
また、微粒子表面と樹脂との界面親和性を、より高めるためや、微粒子を表面修飾するプロセスにおいて、より効率的に上記官能基を有する表面修飾材料を修飾するために、上記官能基を有する表面修飾材料以外の公知の表面修飾材料を併用することができる。
The fine particles contained in the sealing composition are surface modified with a surface modifying material having one or more functional groups selected from alkenyl groups, H-Si groups, and alkoxy groups.
In order to disperse the fine particles in the sealing material, it is necessary to ensure the interface affinity between the fine particle surface and the resin used for the sealing composition. The structure of the surface modification material having one or more functional groups selected from alkenyl groups, H-Si groups, and alkoxy groups has the above functional groups because it is compatible with the resin used in the sealing composition. By coating the surface of the fine particles with the surface modifying material, the interface affinity between the fine particle surface and the resin is ensured, and the fine particles can be uniformly dispersed in the sealing material.
In addition, in order to further enhance the surface affinity between the fine particle surface and the resin, or to modify the surface modifying material having the functional group more efficiently in the process of modifying the surface of the fine particle, the surface having the functional group. A known surface modifying material other than the modifying material can be used in combination.

アルケニル基は樹脂中のH−Si基と架橋し、H−Si基は樹脂中のアルケニル基と架橋し、アルコキシ基は樹脂中のアルコキシ基や表面修飾材料のアルコキシ基と加水分解を経て縮合することから、封止組成物が硬化する過程で微粒子が相分離することなく、分散状態を維持して封止材中に固定化できることと、これらの層の緻密性を向上させることができる。   The alkenyl group crosslinks with the H-Si group in the resin, the H-Si group crosslinks with the alkenyl group in the resin, and the alkoxy group condenses with the alkoxy group in the resin or the alkoxy group of the surface modification material through hydrolysis. Therefore, the fine particles are not phase-separated in the process of curing the sealing composition, and can be fixed in the sealing material while maintaining a dispersed state, and the denseness of these layers can be improved.

アルケニル基、H−Si基、及びアルコキシ基から選ばれた1つ以上の官能基を有する表面修飾材料としては、ビニルトリメトキシシラン、アルコキシ片末端ビニル片末端ジメチルシリコーン、アルコキシ片末端ビニル片末端メチルフェニルシリコーン、アルコキシ片末端ビニル片末端フェニルシリコーン、メタクリロキシプロピルトリメトキシシラン、アクリロキシプロピルトリメトキシシラン、メタクリル酸等炭素−炭素不飽和結合含有脂肪酸、ジメチルハイドロジェンシリコーン、メチルフェニルハイドロジェンシリコーン、フェニルハイドロジェンシリコーン、ジメチルクロロシラン、メチルジクロロシラン、ジエチルクロロシラン、エチルジクロロシラン、メチルフェニルクロロシラン、ジフェニルクロロシラン、フェニルジクロロシラン、トリメトキシシラン、ジメトキシシラン、モノメトキシシラン、トリエトキシシラン、ジエトキシモノメチルシラン、モノエトキシジメチルシラン、メチルフェニルジメトキシシラン、ジフェニルモノメトキシシラン、メチルフェニルジエトキシシラン、ジフェニルモノエトキシシラン、アルコキシ両末端フェニルシリコーン、アルコキシ両末端メチルフェニルシリコーン、アルコキシ基含有ジメチルシリコーンレジン、アルコキシ基含有フェニルシリコーンレジン樹脂、アルコキシ基含有メチルフェニルシリコーンレジン等が挙げられる。   Examples of the surface modifying material having one or more functional groups selected from alkenyl groups, H-Si groups, and alkoxy groups include vinyltrimethoxysilane, alkoxy one-end vinyl one-end dimethyl silicone, alkoxy one-end vinyl one-end methyl. Phenyl silicone, alkoxy one-end vinyl one-end phenyl silicone, methacryloxypropyltrimethoxysilane, acryloxypropyltrimethoxysilane, methacrylic acid and other carbon-carbon unsaturated bond-containing fatty acids, dimethylhydrogensilicone, methylphenylhydrogensilicone, phenyl Hydrogen silicone, dimethylchlorosilane, methyldichlorosilane, diethylchlorosilane, ethyldichlorosilane, methylphenylchlorosilane, diphenylchlorosilane, phenyldichloro Silane, trimethoxysilane, dimethoxysilane, monomethoxysilane, triethoxysilane, diethoxymonomethylsilane, monoethoxydimethylsilane, methylphenyldimethoxysilane, diphenylmonomethoxysilane, methylphenyldiethoxysilane, diphenylmonoethoxysilane, alkoxy Examples include terminal phenyl silicone, alkoxy both-end methyl phenyl silicone, alkoxy group-containing dimethyl silicone resin, alkoxy group-containing phenyl silicone resin, alkoxy group-containing methyl phenyl silicone resin, and the like.

アルケニル基、H−Si基、及びアルコキシ基から選ばれた1つ以上の官能基を有する表面修飾材料の表面修飾量としては、微粒子の質量に対して1質量%以上、80質量%以下が好ましい。1質量%以上とすることで、樹脂に含有する官能基との結合点が多くなり、封止材が硬化する過程で微粒子の相分離が起こりにくくなることから、微粒子の凝集と凝集粒子に起因する散乱を防ぐことができ、透明性を維持することができる。また、硬化体の硬さが低下するのを防ぐことができる。また80質量%以下とすることで、樹脂に含有する官能基との結合点が多くなり過ぎず、その結果、硬化体が脆くなってクラックが発生するのを防ぐことができる。
アルケニル基、H−Si基、及びアルコキシ基から選ばれた1つ以上の官能基を有する表面修飾材料の表面修飾量は、微粒子の質量に対してより好ましくは3質量%以上、70質量%以下であり、さらに好ましくは5質量%以上、60質量%以下である。
The surface modification amount of the surface modification material having one or more functional groups selected from alkenyl groups, H-Si groups, and alkoxy groups is preferably 1% by mass or more and 80% by mass or less with respect to the mass of the fine particles. . When the content is 1% by mass or more, the number of bonding points with the functional group contained in the resin increases, and phase separation of the fine particles hardly occurs during the process of curing the sealing material. Scattering can be prevented and transparency can be maintained. Moreover, it can prevent that the hardness of a hardening body falls. Moreover, by setting it as 80 mass% or less, the coupling | bonding point with the functional group contained in resin does not increase too much, As a result, it can prevent that a hardening body becomes weak and a crack generate | occur | produces.
The surface modification amount of the surface modification material having one or more functional groups selected from an alkenyl group, H-Si group, and alkoxy group is more preferably 3% by mass or more and 70% by mass or less with respect to the mass of the fine particles. More preferably, it is 5 mass% or more and 60 mass% or less.

封止組成物に用いられる樹脂は、光半導体発光装置から放射される光の波長領域において実質的に光の吸収が無く、光半導体発光装置の信頼性(要求される各種性能、耐久性)を損なわない透明樹脂であれば特に限定はされず、透明なシリコーン樹脂、エポキシ樹脂、アクリル樹脂等を用いることができるが、光半導体発光素子の高出力化や照明用途への適用を想定した場合、一般的な光半導体発光素子封止樹脂を用いることが好ましく、特に耐久性の観点からシリコーン系の封止樹脂を用いることが好ましい。シリコーン系の封止樹脂としては、ジメチルシリコーン樹脂、メチルフェニルシリコーン樹脂、ジフェニルシリコーン樹脂、有機変性シリコーン樹脂等が挙げられ、これらは、付加型反応、縮合型反応、ラジカル重合反応によって硬化させる。   The resin used in the encapsulating composition has substantially no light absorption in the wavelength region of light emitted from the optical semiconductor light emitting device, and the reliability (various required performance and durability) of the optical semiconductor light emitting device is achieved. It is not particularly limited as long as it is a transparent resin that is not damaged, and a transparent silicone resin, epoxy resin, acrylic resin, etc. can be used, but when assuming application to high output and lighting applications of an optical semiconductor light emitting element, It is preferable to use a general optical semiconductor light-emitting element sealing resin, and it is particularly preferable to use a silicone-based sealing resin from the viewpoint of durability. Examples of the silicone-based sealing resin include dimethyl silicone resin, methylphenyl silicone resin, diphenyl silicone resin, organically modified silicone resin, and the like, and these are cured by addition type reaction, condensation type reaction, and radical polymerization reaction.

また、微粒子の表面修飾の方法としては、例えば、微粒子に直接、表面修飾材料を混合、噴霧等する乾式方法や、表面修飾材料を溶解させた水や有機溶剤に微粒子を投入し、溶媒中で表面修飾する湿式方法が挙げられる。
表面修飾された微粒子を樹脂中に均一に分散させる方法としては、例えば、表面修飾粒子と樹脂とを二軸混錬機等の機械的方法によって混合して分散させる方法や、表面修飾粒子を有機溶媒中に分散させた分散液と樹脂を混合した後、有機溶媒を乾燥除去する方法がある。
In addition, as a method for surface modification of the fine particles, for example, a dry method in which the surface modifying material is directly mixed and sprayed on the fine particles, or the fine particles are introduced into water or an organic solvent in which the surface modifying material is dissolved, A wet method for surface modification may be mentioned.
Examples of a method for uniformly dispersing the surface-modified fine particles in the resin include, for example, a method in which the surface-modified particles and the resin are mixed and dispersed by a mechanical method such as a biaxial kneader, or the surface-modified particles are organically dispersed. There is a method of drying and removing an organic solvent after mixing a dispersion liquid dispersed in a solvent and a resin.

以上のように得られた封止組成物を光半導体発光素子の上に塗布又は注入、次いで硬化することで本発明に係る光半導体発光装置が作製される。   The optical semiconductor light emitting device according to the present invention is manufactured by applying or injecting the sealing composition obtained as described above onto an optical semiconductor light emitting element and then curing.

[演色性制御方法]
また本発明は、上記微粒子の含有量を変化させることによって光半導体封止材の屈折率及びアッベ数を調整して演色性を制御する、光半導体発光装置の演色性制御方法を提供する。
封止材の屈折率及びアッベ数を微粒子の含有量によって調整できることから、発光波長の異なる光半導体発光素子からの光取出量を調整することで、光半導体発光装置の演色性を制御することができる。
よって、上記演色性制御方法によって演色性を制御することにより、光半導体発光装置の光の短波長と長波長との発光波長のバランスが良く、演色性に優れた光半導体発光装置を提供することができる。
[Color rendering control method]
The present invention also provides a color rendering property control method for an optical semiconductor light emitting device, in which the color rendering property is controlled by adjusting the refractive index and Abbe number of the optical semiconductor sealing material by changing the content of the fine particles.
Since the refractive index and Abbe number of the sealing material can be adjusted by the content of the fine particles, the color rendering properties of the optical semiconductor light emitting device can be controlled by adjusting the amount of light extracted from the optical semiconductor light emitting elements having different emission wavelengths. it can.
Accordingly, by controlling the color rendering properties by the above color rendering property control method, an optical semiconductor light emitting device having a good balance between the emission wavelengths of the short wavelength and the long wavelength of the light of the optical semiconductor light emitting device and having excellent color rendering properties is provided. Can do.

[照明器具及び表示装置]
本発明の光半導体装発光置は、その優れた特性を生かして各用途に利用することができる。本発明の効果が特に顕著に認められるものとしては、これを具備する各種の照明器具及び表示装置である。
[Lighting fixtures and display devices]
The optical semiconductor-equipped light emitting device of the present invention can be used in various applications by taking advantage of its excellent characteristics. The effects of the present invention are particularly noticeable in various lighting fixtures and display devices having the same.

照明器具としては、室内灯、室外灯等の一般照明装置が挙げられる。その他、携帯電話やOA機器等の電子機器のスイッチ部の照明にも適用できる。本発明の光半導体装発光置は輝度が高く、特に演色性に優れていることから、照明器具として用いた場合において、被照明体は自然光と同様の発色を呈し、違和感のない照明として用いることができる。
表示装置としては、例えば携帯電話、携帯情報端末、電子辞書、デジタルカメラ、コンピュータ、薄型テレビ、照明機器及びこれらの周辺機器等のように、小型化、軽量化、薄型化、省電力化、及び太陽光の中でも良好な視認性が得られるような高輝度ならびに良好な演色性が特に求められる機器の表示装置、における発光装置等を挙げることができる。
Examples of the lighting fixture include general lighting devices such as an indoor lamp and an outdoor lamp. In addition, the present invention can also be applied to lighting of a switch unit of an electronic device such as a mobile phone or OA device. Since the light-semiconductor-equipped light emitting device of the present invention is high in luminance and particularly excellent in color rendering, when used as a lighting fixture, the object to be illuminated exhibits the same color as natural light and should be used as a lighting that does not feel uncomfortable. Can do.
As a display device, for example, a mobile phone, a portable information terminal, an electronic dictionary, a digital camera, a computer, a thin TV, a lighting device, and peripheral devices thereof are reduced in size, reduced in weight, reduced in thickness, reduced in power consumption, and Examples thereof include a light-emitting device in a display device of a device that is particularly required to have high luminance and good color rendering such that good visibility can be obtained even in sunlight.

以下の実施例及び比較例において、各種測定方法及び評価方法は下記の通りである。
(微粒子の平均一次粒径)
微粒子の平均一次粒径は、X線回折によって得られるシェラー径とした。
In the following Examples and Comparative Examples, various measurement methods and evaluation methods are as follows.
(Average primary particle size of fine particles)
The average primary particle diameter of the fine particles was the Scherrer diameter obtained by X-ray diffraction.

(微粒子のアッベ数)
水のpHを調整して微粒子の分散性を制御することにより、微粒子10質量%の水分散液を作製した(シリカについては日産化学工業社製のスノーテックスOS(商品名)に、微粒子10質量%となるように水を加えた)。この水分散液にメタノール、プロピレングリコールモノメチルエーテル、N−メチルピロリドンを加え、微粒子5質量%の分散液とし、次いで、スピンコーターによって分散液をシリコンウエハ上に塗布、乾燥させた。上記微粒子含有塗布膜が形成されたシリコンウエハについて、分光エリプソメーター(ジェー・エー・ウラーム製、VASE)にて、波長407nm、594nm、632nm、1523nmにおける屈折率を測定し、内挿近似して、フラウンホーファー線のd線(587nm)、F線(486nm)、C線(656nm)における屈折率nd、nF、nCを求め、これらの値から、封止材のアッベ数νdを、νd=(nd−1)/(nF−nC)の式によって求めた。
(Abbe number of fine particles)
By adjusting the pH of the water to control the dispersibility of the fine particles, an aqueous dispersion of 10% by mass of fine particles was prepared (for silica, Snowtex OS (trade name) manufactured by Nissan Chemical Industries, Ltd., 10 masses of fine particles). % Water was added). Methanol, propylene glycol monomethyl ether, and N-methylpyrrolidone were added to the aqueous dispersion to obtain a dispersion of 5% by mass of fine particles, and then the dispersion was applied onto a silicon wafer by a spin coater and dried. With respect to the silicon wafer on which the fine particle-containing coating film is formed, the refractive index at wavelengths of 407 nm, 594 nm, 632 nm, and 1523 nm is measured with a spectroscopic ellipsometer (manufactured by JA Woollam, VASE), and interpolation approximation is performed. The refractive indices n d , n F , and n C of the d-line (587 nm), F-line (486 nm), and C-line (656 nm) of the Fraunhofer line are obtained, and from these values, the Abbe number ν d of the sealing material is obtained. It was determined by [nu d = formula (n d -1) / (n F -n C).

(封止組成物の粘度)
封止組成物の粘度は、レオメーター、レオストレスRS−6000(HAAKE製)を用いて測定した。なお、封止組成物の粘度は、温度25℃、剪断速度=1.0(1/s)における値を測定した。
(Viscosity of sealing composition)
The viscosity of the sealing composition was measured using a rheometer, Rheostress RS-6000 (manufactured by HAAKE). The viscosity of the sealing composition was measured at a temperature of 25 ° C. and a shear rate = 1.0 (1 / s).

(封止材の透過率)
硬化後の厚さが0.5mmとなる量の封止組成物をガラスシャーレに流し込んだ後、100℃で2時間、次いで、150℃で4時間の加熱処理を行って封止材を得た。封止材をガラスシャーレとともに分光光度計(V−570、日本分光社製)にて積分球を用いて波長400nmから800nmまでの透過率を測定した。なお、ブランク測定としてガラスシャーレのみの透過率も測定した。測定波長範囲では波長400nmにおける透過率が最も低いことから、表には波長400nmにおける透過率を示した。
(Transmission rate of sealing material)
After pouring the sealing composition in an amount of 0.5 mm after curing into a glass petri dish, heat treatment was performed at 100 ° C. for 2 hours and then at 150 ° C. for 4 hours to obtain a sealing material. . The transmittance from a wavelength of 400 nm to 800 nm was measured using an integrating sphere with a spectrophotometer (V-570, manufactured by JASCO Corporation) together with a glass petri dish. In addition, the transmittance | permeability of only a glass petri dish was also measured as a blank measurement. Since the transmittance at a wavelength of 400 nm is the lowest in the measurement wavelength range, the table shows the transmittance at a wavelength of 400 nm.

(封止材のアッベ数)
上記封止材の透過率測定における手法と同様にして得られた封止材について、プリズムカプラー(2010/M、メトリコン社製)にて、波長407nm、594nm、632nm、1523nmにおける屈折率を測定し、内挿近似して、フラウンホーファー線のd線(587nm)、F線(486nm)、C線(656nm)における屈折率nd、nF、nCを求め、これらの値から、封止材のアッベ数νdを、νd=(nd−1)/(nF−nC)の式によって求めた。
(Abbe number of sealing material)
With respect to the sealing material obtained in the same manner as the method for measuring the transmittance of the sealing material, the refractive index at wavelengths of 407 nm, 594 nm, 632 nm, and 1523 nm was measured with a prism coupler (2010 / M, manufactured by Metricon). The refractive index n d , n F , n C of d-line (587 nm), F-line (486 nm), and C-line (656 nm) of the Fraunhofer line is obtained by interpolation approximation, and the sealing material is obtained from these values. The Abbe number ν d was determined by the formula ν d = (n d −1) / (n F −n C ).

(光半導体発光装置の短波長側の発光量の評価)
青色光半導体発光素子(InGaN系、屈折率2.4、発光波長450nm)と緑色光半導体素子(InGaN系、屈折率2.4、発光波長530nm)をそれぞれ単独で搭載した光半導体パッケージに、各実施例及び比較例における封止組成物を空気界面形状が凸状となるように注入、100℃で2時間、次いで150℃で4時間の加熱処理を行い硬化させて、青色及び緑色単色の光半導体発光装置(A)を作製した。
次に、各実施例及び比較例の封止組成物を硬化させた封止材について、波長630nm(赤色)における屈折率をプリズムカプラーで測定した。
次に、硬化後の波長450nm及び530nmにおける屈折率が、該各実施例及び比較例の封止組成物を硬化させた封止材の波長630nmの屈折率となるように微粒子の添加量を調整した封止組成物を作製し、同様に青色光半導体発光素子と緑色光半導体発光素子をそれぞれ単独で搭載した光半導体パッケージに、該微粒子添加量を調整した封止組成物を空気界面形状が凸状となるように注入、硬化させて単色の光半導体発光装置(B)を作製した。
次いで、それぞれの光半導体発光装置の輝度を輝度計(LS−110、コニカミノルタセンシング社製)を用いて測定し、それぞれの発光色での光半導体発光装置(B)の輝度に対する光半導体発光装置(A)の輝度向上率を算出し、封止材の屈折率の波長依存性による光半導体発光装置の短波長側の相対取出増量を見積もった。
(Evaluation of light emission on the short wavelength side of optical semiconductor light emitting devices)
In an optical semiconductor package in which a blue light semiconductor light emitting element (InGaN type, refractive index 2.4, emission wavelength 450 nm) and a green light semiconductor element (InGaN type, refractive index 2.4, emission wavelength 530 nm) are mounted independently, The sealing compositions in Examples and Comparative Examples were injected so that the air interface shape was convex, and were cured by heat treatment at 100 ° C. for 2 hours and then at 150 ° C. for 4 hours to obtain blue and green monochromatic light. A semiconductor light emitting device (A) was produced.
Next, the refractive index in wavelength 630nm (red) was measured with the prism coupler about the sealing material which hardened the sealing composition of each Example and the comparative example.
Next, the addition amount of the fine particles is adjusted so that the refractive index at the wavelengths of 450 nm and 530 nm after curing is the refractive index of the sealing material obtained by curing the sealing compositions of the respective examples and comparative examples at a wavelength of 630 nm. In the same manner, the sealing composition prepared by adjusting the addition amount of the fine particles is projected to an optical semiconductor package in which each of the blue light semiconductor light emitting device and the green light semiconductor light emitting device is independently mounted. A monochromatic optical semiconductor light-emitting device (B) was produced by injecting and curing in a shape.
Subsequently, the brightness | luminance of each optical semiconductor light-emitting device is measured using a luminance meter (LS-110, Konica Minolta Sensing Corp.), and the optical semiconductor light-emitting device with respect to the brightness | luminance of the optical semiconductor light-emitting device (B) in each luminescent color The luminance improvement rate of (A) was calculated, and the relative extraction increase on the short wavelength side of the optical semiconductor light emitting device due to the wavelength dependency of the refractive index of the sealing material was estimated.

(光半導体発光装置の演色性の評価)
青色光半導体発光素子(前記と同一、以下記載がない場合も同様)、緑色光半導体発光素子及び赤色光半導体発光素子(AlGaInP系、屈折率3.2、発光波長630nm)の3波長(色)の発光素子を搭載した光半導体パッケージに、各実施例及び比較例の封止組成物を空気界面形状が凸状となるように注入、100℃で2時間、次いで150℃で4時間の加熱処理を行い硬化させて白色光半導体発光装置を作製した。得られた光半導体発光装置の演色性を、LED分光色度計(Probe4Light、マジャンティス社製)によって測定した。X座標の数値が封止していない3波長(色)の発光素子を搭載した光半導体パッケージで測定したX座標数値0.3に対して、0.025以上小さくなったものを「×」、0.025未満のものを「○」とした。
(Evaluation of color rendering properties of optical semiconductor light emitting devices)
Three wavelengths (colors) of a blue light semiconductor light emitting element (same as above, the same applies when not described below), a green light semiconductor light emitting element and a red light semiconductor light emitting element (AlGaInP system, refractive index 3.2, emission wavelength 630 nm) The sealing composition of each example and comparative example was injected into an optical semiconductor package having the light emitting element mounted so that the air interface shape was convex, and heat treatment was performed at 100 ° C. for 2 hours and then at 150 ° C. for 4 hours. And cured to produce a white light semiconductor light emitting device. The color rendering properties of the obtained optical semiconductor light-emitting device were measured with an LED spectrocolorimeter (Probe 4 Light, manufactured by Magantis). “X” represents a value that is smaller by 0.025 or more than the X coordinate value of 0.3 measured by the optical semiconductor package on which the light emitting element of three wavelengths (colors) whose X coordinate value is not sealed is mounted. The thing less than 0.025 was set as "(circle)".

(光半導体発光装置の輝度の評価)
青色光半導体発光素子、緑色光半導体発光素子、及び赤色光半導体発光素子の3波長(色)の発光素子を搭載した光半導体パッケージに、各実施例及び比較例における封止組成物を空気界面形状が凸状となるように注入、100℃で2時間、次いで150℃で4時間の加熱処理を行い硬化させて白色光半導体発光装置(C)を作製した。
また、各実施例及び比較例の封止組成物に使用した樹脂のみ(微粒子添加なし)を、3波長(色)の発光素子を搭載した光半導体パッケージに空気界面形状が凸状となるように注入、100℃で2時間、次いで150℃で4時間の加熱処理を行い硬化させて白色光半導体発光装置(D)を作製した。
それぞれの光半導体発光装置の輝度を輝度計(LS−110、コニカミノルタセンシング社製)を用いて測定し、白色光半導体発光装置(D)の輝度よりも白色光半導体発光装置(C)の輝度が高かったものを「○」とし、同値を「△」、低いものを「×」とした。
(Evaluation of luminance of optical semiconductor light emitting device)
The sealing composition in each example and comparative example was formed into an air interface shape in an optical semiconductor package on which a light emitting element having three wavelengths (colors) of a blue light semiconductor light emitting element, a green light semiconductor light emitting element, and a red light semiconductor light emitting element was mounted. Were injected so as to have a convex shape, heated at 100 ° C. for 2 hours, and then heated at 150 ° C. for 4 hours to be cured to produce a white light semiconductor light emitting device (C).
In addition, only the resin used in the sealing compositions of the examples and comparative examples (without addition of fine particles) is formed so that the air interface shape is convex in the optical semiconductor package on which the light emitting elements of three wavelengths (colors) are mounted. Injection, heat treatment at 100 ° C. for 2 hours, and then at 150 ° C. for 4 hours and curing were carried out to produce a white light semiconductor light emitting device (D).
The luminance of each optical semiconductor light emitting device is measured using a luminance meter (LS-110, manufactured by Konica Minolta Sensing), and the luminance of the white light semiconductor light emitting device (C) is higher than the luminance of the white light semiconductor light emitting device (D). The ones with high values were “◯”, the equivalent values were “△”, and the ones with low values were “x”.

[実施例1]
(ジルコニア粒子の作製)
オキシ塩化ジルコニウム8水塩2615gを純水40L(リットル)に溶解させたジルコニウム塩溶液に、28%アンモニア水344gを純水20Lに溶解させた希アンモニア水を攪拌しながら加え、ジルコニア前駆体スラリーを調製した。
次いで、このスラリーに、硫酸ナトリウム300gを5Lの純水に溶解させた硫酸ナトリウム水溶液を攪拌しながら加えた。このときの硫酸ナトリウムの添加量は、ジルコニウム塩溶液中のジルコニウムイオンのジルコニア換算値に対して30質量%であった。
次いで、この混合物を、乾燥器を用いて、大気中、130℃にて24時間乾燥させ、固形物を得た。
次いで、この固形物を自動乳鉢で粉砕した後、電気炉を用いて、大気中、520℃にて1時間焼成した。
次いで、この焼成物を純水中に投入し、攪拌してスラリー状とした後、遠心分離器を用いて洗浄を行い、添加した硫酸ナトリウムを十分に除去した後、乾燥器にて乾燥させ、平均一次粒子径5.5nmのジルコニア粒子を得た。
[Example 1]
(Preparation of zirconia particles)
To a zirconium salt solution in which 2615 g of zirconium oxychloride octahydrate is dissolved in 40 L (liter) of pure water, dilute ammonia water in which 344 g of 28% ammonia water is dissolved in 20 L of pure water is added with stirring, and the zirconia precursor slurry is added. Prepared.
Next, an aqueous sodium sulfate solution in which 300 g of sodium sulfate was dissolved in 5 L of pure water was added to this slurry with stirring. The amount of sodium sulfate added at this time was 30% by mass with respect to the zirconia-converted value of zirconium ions in the zirconium salt solution.
Subsequently, this mixture was dried at 130 ° C. for 24 hours in the air using a drier to obtain a solid.
Next, the solid was pulverized in an automatic mortar and then baked at 520 ° C. for 1 hour in the air using an electric furnace.
Next, the fired product is put into pure water, stirred to form a slurry, washed using a centrifuge, and after sufficiently removing the added sodium sulfate, dried in a dryer, Zirconia particles having an average primary particle size of 5.5 nm were obtained.

(表面修飾ジルコニア分散液の作製)
次いで、ジルコニア粒子10gに、トルエン82g、メトキシ基含有メチルフェニルシリコーンレジン(信越工業化学社製、KR9218)4gを加えて、混合し、ビーズミルで5時間、表面修飾処理を行った後、ビーズを除去した。次いで、ビニル基含有修飾材料としてビニルトリメトキシシラン(信越化学工業社製、KBM1003)を4g添加し、130℃にて6時間還流下で修飾・分散処理を行い、ジルコニア透明分散液を調製した。
アルケニル基(ビニル基)含有表面修飾材料による表面修飾量は、ジルコニア粒子の質量に対して40質量%であった。
(Preparation of surface-modified zirconia dispersion)
Next, 82 g of toluene and 4 g of methoxy group-containing methylphenyl silicone resin (manufactured by Shin-Etsu Industrial Chemical Co., Ltd., KR9218) are added to 10 g of zirconia particles, mixed, and subjected to surface modification treatment for 5 hours with a bead mill, and then the beads are removed. did. Next, 4 g of vinyltrimethoxysilane (KBE1003, manufactured by Shin-Etsu Chemical Co., Ltd.) was added as a vinyl group-containing modifying material, and modification / dispersion treatment was performed under reflux at 130 ° C. for 6 hours to prepare a zirconia transparent dispersion.
The surface modification amount by the alkenyl group (vinyl group) -containing surface modification material was 40% by mass with respect to the mass of the zirconia particles.

(微粒子含有封止組成物の作製)
上記ジルコニア透明分散液50gを、ジフェニルシリコーン樹脂として商品名:ASP−1111(信越化学工業社製)7.67gを加え、撹拌した後、減圧乾燥によりトルエンを除去し、表面修飾ジルコニア粒子とジフェニルシリコーン樹脂とを含有した微粒子含有封止組成物(ジルコニア粒子含有量:30質量%)を得た。
前記の方法により、封止組成物の粘度、封止材の透過率及びアッベ数を測定し、光半導体発光装置の短波長側の発光量、演色性及び輝度を評価し、結果を表1に示した。
また、微粒子含有封止組成物の硬化体の各波長における屈折率は、以下表Aに示した通りであった。
(Preparation of fine particle-containing sealing composition)
After adding 7.67 g of the trade name: ASP-1111 (manufactured by Shin-Etsu Chemical Co., Ltd.) as a diphenyl silicone resin, 50 g of the above zirconia transparent dispersion was added and stirred, and then toluene was removed by drying under reduced pressure to obtain surface-modified zirconia particles and diphenyl silicone. A fine particle-containing sealing composition containing resin (zirconia particle content: 30% by mass) was obtained.
According to the above method, the viscosity of the sealing composition, the transmittance of the sealing material and the Abbe number are measured, and the light emission amount, color rendering property and luminance on the short wavelength side of the optical semiconductor light emitting device are evaluated. Indicated.
In addition, the refractive index at each wavelength of the cured body of the fine particle-containing sealing composition was as shown in Table A below.

[実施例2]
微粒子含有封止材組成物の作製において、メチルフェニルシリコーン樹脂として商品名:OE−6630(東レ・ダウコーニング社製)を用いた以外は実施例1と同様にして微粒子含有封止組成物、微粒子含有封止材を備えた光半導体発光装置を作製し、前記の方法により、封止組成物の粘度、封止材の透過率及びアッベ数を測定し、光半導体発光装置の短波長側の発光量、演色性及び輝度を評価し、結果を表1に示した。
また、実施例2の微粒子含有封止組成物の硬化体の各波長における屈折率は、以下表Bに示した通りであった。
[Example 2]
In the production of the fine particle-containing encapsulant composition, the fine particle-containing encapsulant composition and fine particles were obtained in the same manner as in Example 1 except that the trade name: OE-6630 (manufactured by Toray Dow Corning) was used as the methylphenyl silicone resin. An optical semiconductor light emitting device including the encapsulating material is prepared, and the viscosity of the encapsulating composition, the transmittance of the encapsulating material, and the Abbe number are measured by the above-described method, and light emission on the short wavelength side of the optical semiconductor light emitting device The amount, color rendering properties and luminance were evaluated, and the results are shown in Table 1.
Moreover, the refractive index in each wavelength of the hardening body of the fine particle containing sealing composition of Example 2 was as having shown in Table B below.

[実施例3]
実施例1と同様に作製したジルコニア粒子10gにトルエン81gと片末端エポキシ変性シリコーン(信越化学工業社製、X−22−173DX)5gを加え、混合し、ビーズミルで5時間、表面修飾処理を行った後、ビーズを除去した。次いで、H−Si基含有修飾材料としてメチルジクロロシラン(信越化学工業社製、LS−50)を4g添加し、130℃にて6時間還流下で修飾・分散処理を行い、表面修飾ジルコニア透明分散液を調製した。
H−Si基含有表面修飾材料による表面修飾量は、ジルコニア粒子の質量に対して40質量%であった。
次いで、微粒子含有封止材組成物の作製において、ジメチルシリコーン樹脂として商品名:OE−6336(東レ・ダウコーニング社製)を用いて実施例1と同様にして微粒子含有封止組成物、微粒子含有封止材を備えた光半導体発光装置を作製し、前記の方法により、封止組成物の粘度、封止材の透過率及びアッベ数を測定し、光半導体発光装置の短波長側の発光量、演色性及び輝度を評価し、結果を表1に示した。
また、実施例3の微粒子含有封止組成物の硬化体の各波長における屈折率は、以下表Cに示した通りであった。
[Example 3]
To 10 g of zirconia particles produced in the same manner as in Example 1, 81 g of toluene and 5 g of one-end epoxy-modified silicone (Shin-Etsu Chemical Co., Ltd., X-22-173DX) are added, mixed, and subjected to surface modification treatment with a bead mill for 5 hours. After that, the beads were removed. Next, 4 g of methyldichlorosilane (manufactured by Shin-Etsu Chemical Co., Ltd., LS-50) is added as an H—Si group-containing modifying material, and the surface is modified and dispersed at 130 ° C. under reflux for 6 hours to obtain a surface-modified zirconia transparent dispersion. A liquid was prepared.
The surface modification amount by the H—Si group-containing surface modification material was 40% by mass with respect to the mass of the zirconia particles.
Next, in the production of the fine particle-containing sealing material composition, the fine particle-containing sealing composition and the fine particle-containing composition were used in the same manner as in Example 1 using OE-6336 (manufactured by Toray Dow Corning) as the dimethyl silicone resin. An optical semiconductor light emitting device provided with a sealing material is prepared, and the viscosity of the sealing composition, the transmittance of the sealing material and the Abbe number are measured by the above-described method, and the light emission amount on the short wavelength side of the optical semiconductor light emitting device The color rendering properties and luminance were evaluated, and the results are shown in Table 1.
Moreover, the refractive index in each wavelength of the hardening body of the fine particle containing sealing composition of Example 3 was as having shown in Table C below.

[実施例4]
(アルミナ粒子の作製)
アルミニウムイソプロポキシド500gをイソプロパノール10Lに溶解し、純水250gを4時間かけて滴下し、15時間加熱沸騰処理を行った。次いで、室温にて硫酸ナトリウム80gを1.5Lの純水に溶解させた硫酸ナトリウム水溶液を撹拌しながら加えて混合物を得た。この混合物をろ過し、乾燥器を用いて、大気中、130℃にて24時間乾燥させ、固形物を得た。この固形物を自動乳鉢で粉砕した後、電気炉を用いて、大気中、500℃にて3時間焼成した。
次いで、この焼成物を純水中に投入し、攪拌してスラリー状とした後、遠心分離器を用いて洗浄を行い、添加した硫酸ナトリウムを十分に除去した後、乾燥器にて乾燥させ、平均一次粒径8.0nmのアルミナ粒子を得た。
[Example 4]
(Production of alumina particles)
Aluminum isopropoxide (500 g) was dissolved in 10 L of isopropanol, and 250 g of pure water was added dropwise over 4 hours, followed by heating and boiling for 15 hours. Next, an aqueous sodium sulfate solution in which 80 g of sodium sulfate was dissolved in 1.5 L of pure water was added at room temperature with stirring to obtain a mixture. This mixture was filtered and dried using a dryer at 130 ° C. for 24 hours in the air to obtain a solid. The solid was pulverized in an automatic mortar and then baked at 500 ° C. for 3 hours in the air using an electric furnace.
Next, the fired product is put into pure water, stirred to form a slurry, washed using a centrifuge, and after sufficiently removing the added sodium sulfate, dried in a dryer, Alumina particles having an average primary particle size of 8.0 nm were obtained.

(表面修飾アルミナ分散液の作製)
次いで、アルミナ粒子10gにトルエン81gと片末端エポキシ変性シリコーン(信越化学工業社製、X−22−173DX)2gを加え、混合し、ビーズミルで5時間、表面修飾処理を行った後、ビーズを除去した。次いで、ビニル基含有修飾材料としてビニルトリメトキシシラン(信越化学工業社製、KBM1003)を2.5g添加し、130℃にて6時間還流下で修飾・分散処理を行い、表面修飾アルミナ透明分散液を調製した。
アルケニル基(ビニル基)含有表面修飾材料による表面修飾量は、アルミナ粒子の質量に対して25質量%であった。
次いで、上記表面修飾アルミナ透明分散液14.5gにジメチルシリコーン樹脂として商品名:OE−6336(東レ・ダウコーニング社製)2.55gを加え、撹拌した後、実施例1と同様に微粒子含有封止組成物(アルミナ粒子含有量:25質量%)を得て、微粒子含有封止材を備えた光半導体発光装置を作製し、前記の方法により、封止組成物の粘度、封止材の透過率及びアッベ数を測定し、光半導体発光装置の短波長側の発光量、演色性及び輝度を評価し、結果を表1に示した。
また、実施例4の微粒子含有封止組成物の硬化体の各波長における屈折率は、以下表Dに示した通りであった。
(Preparation of surface-modified alumina dispersion)
Next, 81 g of toluene and 2 g of one-end epoxy-modified silicone (X-22-173DX, manufactured by Shin-Etsu Chemical Co., Ltd.) are added to 10 g of alumina particles, mixed, and subjected to surface modification treatment with a bead mill for 5 hours, and then the beads are removed. did. Next, 2.5 g of vinyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., KBM1003) is added as a vinyl group-containing modifying material, and modification / dispersion treatment is performed under reflux at 130 ° C. for 6 hours. Surface-modified alumina transparent dispersion Was prepared.
The amount of surface modification with the alkenyl group (vinyl group) -containing surface modification material was 25% by mass with respect to the mass of the alumina particles.
Next, 2.55 g of a trade name: OE-6336 (manufactured by Toray Dow Corning Co., Ltd.) as a dimethyl silicone resin was added to 14.5 g of the above surface-modified alumina transparent dispersion, stirred, and then encapsulated with fine particles in the same manner as in Example 1. An optical semiconductor light emitting device provided with a fine particle-containing encapsulant was obtained by obtaining a stop composition (alumina particle content: 25% by mass), and the viscosity of the encapsulant and the penetration of the encapsulant were obtained by the above-described methods. The rate and the Abbe number were measured, and the light emission amount, color rendering properties and luminance on the short wavelength side of the optical semiconductor light emitting device were evaluated. The results are shown in Table 1.
Moreover, the refractive index in each wavelength of the hardening body of the fine particle containing sealing composition of Example 4 was as having shown in Table D below.

[実施例5]
微粒子含有封止組成物中のアルミナ粒子含有量を50質量%とした以外は、実施例4と同様にして微粒子含有封止組成物を得て、微粒子含有封止材を備えた光半導体発光装置を作製し、前記の方法により、封止組成物の粘度、封止材の透過率及びアッベ数を測定し、光半導体発光装置の短波長側の発光量、演色性及び輝度を評価し、結果を表1に示した。
また、実施例5の微粒子含有封止組成物の硬化体の各波長における屈折率は、以下表Eに示した通りであった。
[Example 5]
A photo-semiconductor light-emitting device provided with a fine particle-containing sealing composition in the same manner as in Example 4 except that the alumina particle content in the fine particle-containing sealing composition was 50% by mass. The viscosity of the sealing composition, the transmittance of the sealing material, and the Abbe number are measured by the above-described method, and the light emission amount, color rendering property, and luminance on the short wavelength side of the optical semiconductor light emitting device are evaluated. Are shown in Table 1.
Moreover, the refractive index in each wavelength of the hardening body of the fine particle containing sealing composition of Example 5 was as having shown in Table E below.

[実施例6]
実施例4と同様にして作製したアルミナ粒子10gにトルエン82g、メトキシ基含有メチルフェニルシリコーンレジン(信越工業化学社製、KR9218)2gを加えて、混合し、ビーズミルで5時間、表面修飾処理を行った後、ビーズを除去した。次いで、ビニル基含有修飾材料としてビニルトリメトキシシラン(信越化学工業社製、KBM1003)を2.5g添加し、130℃にて6時間還流下で修飾・分散処理を行い、表面修飾アルミナ透明分散液を調製した。
アルケニル基(ビニル基)含有表面修飾材料による表面修飾量は、アルミナ粒子の質量に対して25質量%であった。
次いで、上記表面修飾アルミナ透明分散液50gにメチルフェニルシリコーン樹脂として商品名:OE−6630(東レ・ダウコーニング社製)2.75gを加え、撹拌した後、実施例1と同様に微粒子含有封止組成物(アルミナ粒子含有量:50質量%)を得て、微粒子含有封止材を備えた光半導体発光装置を作製し、前記の方法により、封止組成物の粘度、封止材の透過率及びアッベ数を測定し、光半導体発光装置の短波長側の発光量、演色性及び輝度を評価し、結果を表1に示した。
また、実施例6の微粒子含有封止組成物の硬化体の各波長における屈折率は、以下表Fに示した通りであった。
[Example 6]
82 g of toluene and 2 g of methoxy group-containing methylphenylsilicone resin (manufactured by Shin-Etsu Kogyo Kagaku Co., Ltd., KR9218) are added to 10 g of alumina particles produced in the same manner as in Example 4, mixed, and subjected to surface modification treatment with a bead mill for 5 hours. After that, the beads were removed. Next, 2.5 g of vinyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., KBM1003) is added as a vinyl group-containing modifying material, and modification / dispersion treatment is performed under reflux at 130 ° C. for 6 hours. Surface-modified alumina transparent dispersion Was prepared.
The amount of surface modification with the alkenyl group (vinyl group) -containing surface modification material was 25% by mass with respect to the mass of the alumina particles.
Next, 2.75 g of a trade name: OE-6630 (manufactured by Toray Dow Corning Co., Ltd.) as a methylphenyl silicone resin was added to 50 g of the surface-modified alumina transparent dispersion, stirred, and then encapsulated with fine particles in the same manner as in Example 1. A composition (alumina particle content: 50% by mass) was obtained, and an optical semiconductor light-emitting device equipped with a fine particle-containing encapsulant was produced. By the above-described methods, the viscosity of the encapsulant and the transmittance of the encapsulant were obtained. The Abbe number was measured, and the light emission amount, color rendering properties and luminance on the short wavelength side of the optical semiconductor light emitting device were evaluated. The results are shown in Table 1.
Moreover, the refractive index in each wavelength of the hardening body of the fine particle containing sealing composition of Example 6 was as having shown in Table F below.

[実施例7]
(表面修飾シリカ分散液の作製)
シリカゾル(日産化学工業社製、スノーテックスOS)100gにヘキサン酸2.5gを溶解させたメタノール溶液50gを混合撹拌し、得られたスラリーをエバポレータで溶媒を乾燥除去した。得られたシリカ粒子含有乾燥粉体をX線回折によりシリカ粒子のシェラー径を測定したところ、平均一次粒径は9.5nmであった。さらにシリカ粒子含有乾燥粉体12.5gをトルエン86.5gに混合した。次いで、メトキシ基含有メチルフェニルシリコーンレジン(信越工業化学社製、KR9218)2gを加えて、130℃にて6時間還流下で修飾・分散処理した後、分散液をアルミナカラムに通し、ヘキサン酸を除去した。さらにビニルトリメトキシシラン(信越化学工業社製、KBM1003)を1.5g添加し、130℃にて6時間還流下で修飾・分散処理を行い、表面修飾シリカ透明分散液を調製した。
アルケニル基(ビニル基)含有表面修飾材料による表面修飾量は、シリカ粒子の質量に対して15質量%であった。
上記シリカ透明分散液50gにメチルフェニルシリコーン樹脂として商品名:OE−6630(東レ・ダウコーニング社製)9.95gを加え、撹拌した後、減圧乾燥によりトルエンを除去し、表面修飾ジルコニア粒子とジフェニルシリコーン樹脂とを含有した微粒子含有封止組成物(シリカ粒子含有量:30質量%)を得て、微粒子含有封止材を備えた光半導体発光装置を作製し、前記の方法により、封止組成物の粘度、封止材の透過率及びアッベ数を測定し、光半導体発光装置の短波長側の発光量、演色性及び輝度を評価し、結果を表1に示した。
また、実施例7の微粒子含有封止組成物の硬化体の各波長における屈折率は、以下表Gに示した通りであった。
[Example 7]
(Preparation of surface-modified silica dispersion)
50 g of a methanol solution in which 2.5 g of hexanoic acid was dissolved in 100 g of silica sol (manufactured by Nissan Chemical Industries, Ltd., Snowtex OS) was mixed and stirred, and the solvent was dried and removed with an evaporator. When the Scherrer diameter of the silica particles of the obtained silica particle-containing dry powder was measured by X-ray diffraction, the average primary particle diameter was 9.5 nm. Furthermore, 12.5 g of the silica particle-containing dry powder was mixed with 86.5 g of toluene. Next, 2 g of methoxy group-containing methylphenyl silicone resin (manufactured by Shin-Etsu Chemical Co., Ltd., KR9218) is added, modified and dispersed under reflux at 130 ° C. for 6 hours, the dispersion is passed through an alumina column, and hexanoic acid is added. Removed. Furthermore, 1.5 g of vinyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., KBM1003) was added and subjected to modification / dispersion treatment under reflux at 130 ° C. for 6 hours to prepare a surface-modified silica transparent dispersion.
The amount of surface modification by the alkenyl group (vinyl group) -containing surface modification material was 15% by mass with respect to the mass of the silica particles.
After adding 9.95 g of a trade name: OE-6630 (manufactured by Dow Corning Toray) as a methylphenyl silicone resin to 50 g of the above silica transparent dispersion, toluene is removed by drying under reduced pressure, and surface-modified zirconia particles and diphenyl are added. Obtaining a fine particle-containing encapsulating composition (silica particle content: 30% by mass) containing a silicone resin, producing an optical semiconductor light-emitting device equipped with a fine particle-containing encapsulant, and sealing composition according to the above method The viscosity of the product, the transmittance of the sealing material, and the Abbe number were measured, and the light emission amount, color rendering properties, and luminance on the short wavelength side of the optical semiconductor light emitting device were evaluated. The results are shown in Table 1.
Moreover, the refractive index in each wavelength of the hardening body of the fine particle containing sealing composition of Example 7 was as having shown in Table G below.

[比較例1]
(チタニア粒子の作製)
四塩化チタン242.1gと、塩化スズ(IV)5水和物111.9gとを、5℃の純水1.5L(リットル)に投入し、撹拌して混合溶液を作製した。
次いで、この混合溶液を加温して温度を25℃に調整し、この混合溶液に濃度が10質量%の炭酸アンモニウム水溶液を加えてpHを1.8に調整し、その後、25℃にて24時間熟成し、過剰の塩化物イオンを取り除いた。
次いで、エバポレータを用いて、この混合溶液から水分を除去し、その後乾燥させ、酸
化チタン粒子を作製した。
得られた酸化チタン粒子の平均一次粒子径は5.0nmであった。
上記チタニア粒子を用いた以外は実施例1と同様にして表面修飾チタニア透明分散液を得た。
アルケニル基(ビニル基)含有表面修飾材料による表面修飾量は、チタニア粒子の質量に対して40質量%であった。
さらに、上記チタニア透明分散液を用いた以外は実施例1と同様にしてチタニア微粒子含有ジフェニルシリコーン封止組成物(チタニア粒子含有量:30質量%)を得て、微粒子含有封止材を備えた光半導体発光装置を作製し、前記の方法により、封止組成物の粘度、封止材の透過率及びアッベ数を測定し、光半導体発光装置の短波長側の発光量、演色性及び輝度を評価し、結果を表1に示した。
また、比較例1の微粒子含有封止組成物の硬化体の各波長における屈折率は、以下表Hに示した通りであった。
[Comparative Example 1]
(Production of titania particles)
242.1 g of titanium tetrachloride and 111.9 g of tin (IV) chloride pentahydrate were put into 1.5 L (liter) of pure water at 5 ° C. and stirred to prepare a mixed solution.
Next, the mixed solution is heated to adjust the temperature to 25 ° C., and an aqueous ammonium carbonate solution having a concentration of 10% by mass is added to the mixed solution to adjust the pH to 1.8, and then 24 ° C. at 24 ° C. Aged for time to remove excess chloride ions.
Subsequently, moisture was removed from this mixed solution using an evaporator, and then dried to produce titanium oxide particles.
The average primary particle diameter of the obtained titanium oxide particles was 5.0 nm.
A surface-modified titania transparent dispersion was obtained in the same manner as in Example 1 except that the titania particles were used.
The surface modification amount by the alkenyl group (vinyl group) -containing surface modification material was 40% by mass with respect to the mass of the titania particles.
Further, a titania fine particle-containing diphenyl silicone sealing composition (titania particle content: 30% by mass) was obtained in the same manner as in Example 1 except that the above titania transparent dispersion was used, and provided with a fine particle-containing sealing material. An optical semiconductor light-emitting device is manufactured, and the viscosity of the sealing composition, the transmittance of the sealing material, and the Abbe number are measured by the above-described method, and the light emission amount, color rendering property, and luminance on the short wavelength side of the optical semiconductor light-emitting device are measured. The results are shown in Table 1.
Moreover, the refractive index in each wavelength of the hardening body of the fine particle containing sealing composition of the comparative example 1 was as having shown in Table H below.

[比較例2]
比較例1と同様にして作製したチタニア粒子10gにトルエン81gと片末端エポキシ変性シリコーン(信越化学工業社製、X−22−173DX)5gを加え、混合し、ビーズミルで5時間、表面修飾処理を行った後、ビーズを除去した。次いで、ビニル基含有修飾材料としてビニルトリメトキシシラン(信越化学工業社製、KBM1003)を4g添加し、130℃にて6時間還流下で修飾・分散処理を行い、表面修飾チタニア透明分散液を調製した。
アルケニル基(ビニル基)含有表面修飾材料による表面修飾量は、チタニア粒子の質量に対して40質量%であった。
次いで、上記チタニア透明分散液20g、ジメチルシリコーン樹脂として商品名:OE−6336(東レ・ダウコーニング社製)6.2gを加え、撹拌し、用いて実施例1にならって微粒子含有封止組成物(チタニア粒子含有量:20質量%)、微粒子含有封止材を備えた光半導体発光装置を作製し、前記の方法により、封止組成物の粘度、封止材の透過率及びアッベ数を測定し、光半導体発光装置の短波長側の発光量、演色性及び輝度を評価し、結果を表1に示した。
また、比較例2の微粒子含有封止組成物の硬化体の各波長における屈折率は、以下表Iに示した通りであった。
[Comparative Example 2]
To 10 g of titania particles produced in the same manner as in Comparative Example 1, 81 g of toluene and 5 g of one-end epoxy-modified silicone (manufactured by Shin-Etsu Chemical Co., Ltd., X-22-173DX) are added, mixed, and subjected to surface modification treatment with a bead mill for 5 hours. After doing so, the beads were removed. Next, 4 g of vinyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., KBM1003) is added as a vinyl group-containing modifying material, and modification / dispersion treatment is performed under reflux at 130 ° C. for 6 hours to prepare a surface-modified titania transparent dispersion. did.
The surface modification amount by the alkenyl group (vinyl group) -containing surface modification material was 40% by mass with respect to the mass of the titania particles.
Subsequently, 20 g of the above-mentioned titania transparent dispersion and 6.2 g of a trade name: OE-6336 (manufactured by Toray Dow Corning) as a dimethyl silicone resin were added, stirred, and used in the same manner as in Example 1 to contain a fine particle-containing sealing composition. (Titania particle content: 20% by mass), an optical semiconductor light emitting device provided with a fine particle-containing encapsulant is prepared, and the viscosity of the encapsulating composition, the transmittance of the encapsulant, and the Abbe number are measured by the above-described methods. Then, the light emission amount, color rendering properties and luminance on the short wavelength side of the optical semiconductor light emitting device were evaluated, and the results are shown in Table 1.
Moreover, the refractive index in each wavelength of the hardening body of the fine particle containing sealing composition of the comparative example 2 was as having shown in Table I below.

[比較例3]
実施例1のアルケニル基含有修飾材料を、ヘキシルトリメトキシシラン(信越化学工業社製、KBM3063)を用いてアルキル基含有表面修飾材料に変えた以外は実施例1と同様にして比較例3のジルコニア微粒子含有ジフェニルシリコーン封止組成物を作製し、また微粒子含有封止材を備えた光半導体発光装置を作製した。
しかし、比較例3の微粒子含有封止組成物は加熱硬化の過程で白濁し、透明な硬化体とならなかった。そのため、封止材のアッベ数、光半導体発光装置の短波長側の発光量及び演色性は評価できなかった。封止組成物の粘度、封止材の透過率、及び光半導体発光装置の輝度の評価結果を表1に示した。
[Comparative Example 3]
The zirconia of Comparative Example 3 was the same as Example 1 except that the alkenyl group-containing modified material of Example 1 was changed to an alkyl group-containing surface modified material using hexyltrimethoxysilane (KBE3063, manufactured by Shin-Etsu Chemical Co., Ltd.). A fine particle-containing diphenyl silicone sealing composition was prepared, and an optical semiconductor light emitting device provided with the fine particle-containing sealing material was prepared.
However, the fine particle-containing sealing composition of Comparative Example 3 became cloudy during the heat curing process and did not become a transparent cured product. Therefore, the Abbe number of the sealing material, the light emission amount on the short wavelength side of the optical semiconductor light emitting device, and the color rendering properties could not be evaluated. Table 1 shows the evaluation results of the viscosity of the sealing composition, the transmittance of the sealing material, and the luminance of the optical semiconductor light emitting device.

[比較例4]
ジルコニア粒子の作製として電気炉で大気中520℃を490℃にした以外は実施例1と同様にして平均一次粒径が1.9nmのジルコニア粒子を作製した。
さらに実施例1と同様にして比較例4のジルコニア微粒子含有ジフェニルシリコーン封止組成物を作製した。
しかし、比較例4の微粒子含有封止組成物は粘度が非常に高く、屈折率を測定できる硬化体の作製ができず、また光半導体発光素子を搭載したパッケージに注入することができず、光半導体発光装置を作製することができなかった。そのため、封止材のアッベ数、光半導体発光装置の短波長側の発光量、演色性及び輝度は評価できなかった。封止組成物の粘度、及び封止材の透過率の評価結果を表1に示した。
[Comparative Example 4]
Zirconia particles having an average primary particle size of 1.9 nm were prepared in the same manner as in Example 1 except that 520 ° C. was changed to 490 ° C. in the atmosphere using an electric furnace.
Further, in the same manner as in Example 1, a zirconia fine particle-containing diphenyl silicone sealing composition of Comparative Example 4 was produced.
However, the fine particle-containing encapsulating composition of Comparative Example 4 has a very high viscosity, cannot produce a cured body capable of measuring the refractive index, and cannot be injected into a package equipped with an optical semiconductor light emitting device. A semiconductor light emitting device could not be fabricated. Therefore, the Abbe number of the sealing material, the light emission amount on the short wavelength side of the optical semiconductor light emitting device, the color rendering property and the luminance could not be evaluated. The evaluation results of the viscosity of the sealing composition and the transmittance of the sealing material are shown in Table 1.

[比較例5]
ジルコニア粒子の作製として電気炉で大気中520℃を620℃にした以外は実施例1と同様にして平均一次粒径が21.1nmのジルコニア粒子を作製した。
ジルコニア粒子10gに、トルエン82g、メトキシ基含有メチルフェニルシリコーンレジン(信越工業化学社製、KR9218)1gを加えて、混合し、ビーズミルで5時間、表面修飾処理を行った後、ビーズを除去した。次いで、ビニル基含有修飾材料としてビニルトリメトキシシラン(信越化学工業社製、KBM1003)を1g添加し、130℃にて6時間還流下で修飾・分散処理を行い、ジルコニア透明分散液を調製した。
アルケニル基含有表面修飾材料による表面修飾量は、ジルコニア粒子の質量に対して10質量%であった。
次いで、上記ジルコニア透明分散液50gを、ジフェニルシリコーン樹脂として商品名:ASP−1111(信越化学工業社製)10.67gを加え、撹拌した後、減圧乾燥によりトルエンを除去し、表面修飾ジルコニア粒子とジフェニルシリコーン樹脂とを含有した微粒子含有封止組成物(ジルコニア粒子含有量:30質量%)を作製し、また微粒子含有封止材を備えた光半導体発光装置を作製した。
しかし、比較例5の微粒子含有封止組成物は乳白色をしており、透明な封止組成物、硬化体とはならなかった。そのため、封止材のアッベ数、光半導体発光装置の短波長側の発光量及び演色性は評価できなかった。封止組成物の粘度、封止材の透過率、及び光半導体発光装置の輝度の評価結果を表1に示した。
[Comparative Example 5]
Zirconia particles having an average primary particle size of 21.1 nm were prepared in the same manner as in Example 1 except that 520 ° C. was changed to 620 ° C. in the atmosphere using an electric furnace.
To 10 g of zirconia particles, 82 g of toluene and 1 g of methoxy group-containing methylphenyl silicone resin (manufactured by Shin-Etsu Kogyo Kagaku Co., Ltd., KR9218) were added, mixed, subjected to surface modification treatment for 5 hours with a bead mill, and then the beads were removed. Next, 1 g of vinyltrimethoxysilane (KBE1003, manufactured by Shin-Etsu Chemical Co., Ltd.) was added as a vinyl group-containing modifying material, and modification / dispersion treatment was performed under reflux at 130 ° C. for 6 hours to prepare a zirconia transparent dispersion.
The surface modification amount by the alkenyl group-containing surface modifying material was 10% by mass with respect to the mass of the zirconia particles.
Next, 50 g of the above zirconia transparent dispersion was added as a diphenyl silicone resin with 10.67 g of trade name: ASP-1111 (manufactured by Shin-Etsu Chemical Co., Ltd.), stirred, and then toluene was removed by drying under reduced pressure to obtain surface-modified zirconia particles and A fine particle-containing encapsulating composition (zirconia particle content: 30% by mass) containing diphenyl silicone resin was produced, and an optical semiconductor light-emitting device provided with the fine particle-containing encapsulant was produced.
However, the fine particle-containing sealing composition of Comparative Example 5 was milky white and did not become a transparent sealing composition or a cured product. Therefore, the Abbe number of the sealing material, the light emission amount on the short wavelength side of the optical semiconductor light emitting device, and the color rendering properties could not be evaluated. Table 1 shows the evaluation results of the viscosity of the sealing composition, the transmittance of the sealing material, and the luminance of the optical semiconductor light emitting device.

10、光半導体発光素子
11、蛍光体
12、光半導体封止材層
13、空気界面
14、樹脂単体層
10, optical semiconductor light emitting element 11, phosphor 12, optical semiconductor sealing material layer 13, air interface 14, resin single layer

Claims (6)

発光波長が異なる光半導体発光素子を2個以上備える光半導体発光装置であって、
微粒子と樹脂とを含有する封止組成物を硬化させた、アッベ数が30以上である光半導体封止材によって前記光半導体発光素子が封止され、
前記封止組成物は、前記微粒子が、酸化ジルコニウム又は酸化アルミニウムであり、該微粒子は、アルケニル基、H−Si基、及びアルコキシ基から選ばれた1つ以上の官能基を有する表面修飾材料によって表面修飾され、光半導体発光波長領域において光の吸収の無い材質からな、平均一次粒径3nm以上、20nm以下の微粒子であり、
前記樹脂が、ジメチルシリコーン樹脂、又はフェニル基を有するシリコーン樹脂であ
る光半導体発光装置。
An optical semiconductor light emitting device comprising two or more optical semiconductor light emitting elements having different emission wavelengths,
The sealing composition containing the fine particles and the resin is cured, the Abbe number of the optical semiconductor light emitting element is sealed by the optical semiconductor encapsulation is 30 or more,
The sealing composition, the fine particles are zirconium oxide or aluminum oxide, fine particles, an alkenyl group, by surface modification material having one or more functional groups selected from H-Si group and an alkoxy group, surface-modified, Ri Do from free material absorption of light in the optical semiconductor light-emitting wavelength region, an average primary particle diameter of 3nm or more, Ri Ah at 20nm or less fine particles,
The optical semiconductor light emitting device , wherein the resin is a dimethyl silicone resin or a silicone resin having a phenyl group .
前記光半導体封止材の波長400nmから波長800nmまでの透過率が70%以上である、請求項1に記載の光半導体発光装置。 2. The optical semiconductor light emitting device according to claim 1, wherein a transmittance from a wavelength of 400 nm to a wavelength of 800 nm of the optical semiconductor sealing material is 70% or more. 前記微粒子と前記樹脂の種類及び含有量を調整することによって光半導体封止材の屈折率及びアッベ数を調整して演色性を制御する、請求項1又は2に記載の光半導体発光装置の演色性制御方法。 Controlling the color rendering properties by adjusting the refractive index of the optical semiconductor sealing material and the Abbe number by Rukoto adjusting the type and content of the resin and the fine particles, an optical semiconductor light emitting device according to claim 1 or 2 Color rendering control method. 請求項3に記載の演色性制御方法によって演色性が制御された光半導体発光装置。 An optical semiconductor light emitting device in which color rendering is controlled by the color rendering control method according to claim 3 . 請求項1〜2及び4のいずれかに記載の光半導体発光装置を具備してなる照明器具。 The lighting fixture which comprises the optical semiconductor light-emitting device in any one of Claims 1-2 and 4 . 請求項1〜2及び4のいずれかに記載の光半導体発光装置を具備してなる表示装置。 Display device comprising comprising an optical semiconductor light-emitting device according to any one of claims 1 to 2 and 4.
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