Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP6089378B2 - Plasma processing equipment - Google Patents
[go: Go Back, main page]

JP6089378B2 - Plasma processing equipment - Google Patents

Plasma processing equipment Download PDF

Info

Publication number
JP6089378B2
JP6089378B2 JP2015510973A JP2015510973A JP6089378B2 JP 6089378 B2 JP6089378 B2 JP 6089378B2 JP 2015510973 A JP2015510973 A JP 2015510973A JP 2015510973 A JP2015510973 A JP 2015510973A JP 6089378 B2 JP6089378 B2 JP 6089378B2
Authority
JP
Japan
Prior art keywords
plasma
plasma processing
treatment
processing apparatus
long workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015510973A
Other languages
Japanese (ja)
Other versions
JPWO2014167626A1 (en
Inventor
沖野 晃俊
晃俊 沖野
秀一 宮原
秀一 宮原
英伸 堤
英伸 堤
順仁 中崎
順仁 中崎
貴之 小川
小川  貴之
啓太 水津
啓太 水津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sunline Co Ltd
Original Assignee
Sunline Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sunline Co Ltd filed Critical Sunline Co Ltd
Publication of JPWO2014167626A1 publication Critical patent/JPWO2014167626A1/en
Application granted granted Critical
Publication of JP6089378B2 publication Critical patent/JP6089378B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material
    • DTEXTILES; PAPER
    • D01NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
    • D01FCHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
    • D01F6/00Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof
    • D01F6/02Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from homopolymers obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • D01F6/04Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from homopolymers obtained by reactions only involving carbon-to-carbon unsaturated bonds from polyolefins
    • DTEXTILES; PAPER
    • D01NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
    • D01FCHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
    • D01F6/00Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof
    • D01F6/02Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from homopolymers obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • D01F6/08Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from homopolymers obtained by reactions only involving carbon-to-carbon unsaturated bonds from polymers of halogenated hydrocarbons
    • D01F6/12Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from homopolymers obtained by reactions only involving carbon-to-carbon unsaturated bonds from polymers of halogenated hydrocarbons from polymers of fluorinated hydrocarbons
    • DTEXTILES; PAPER
    • D01NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
    • D01FCHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
    • D01F6/00Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof
    • D01F6/78Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from copolycondensation products
    • D01F6/80Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from copolycondensation products from copolyamides
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00Physical treatment of fibres, threads, yarns, fabrics or fibrous goods made from such materials, e.g. by ultrasonic waves, corona discharge, irradiation, electric currents or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02Sonic or ultrasonic waves; Corona discharge
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00Physical treatment of fibres, threads, yarns, fabrics or fibrous goods made from such materials, e.g. by ultrasonic waves, corona discharge, irradiation, electric currents or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02Sonic or ultrasonic waves; Corona discharge
    • D06M10/025Corona discharge or low temperature plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348Dielectric barrier discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32541Shape
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/327Arrangements for generating the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/336Changing physical properties of treated surfaces
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/2465Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated by inductive coupling, e.g. using coiled electrodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Textile Engineering (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Fluid Mechanics (AREA)
  • Plasma Technology (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatment Of Fiber Materials (AREA)

Description

本発明は、長尺状の被処理物に対してプラズマを接触させることにより、プラズマ処理を施すプラズマ処理方法およびプラズマ処理装置並びにプラズマ処理を施した長尺物に関する。   The present invention relates to a plasma processing method and a plasma processing apparatus that perform plasma processing by bringing plasma into contact with a long object to be processed, and a long object that has been subjected to plasma processing.

近年、表面にカラフルな塗装や糸の滑りや柔軟性などの機能性を向上させるための樹脂材のコーティングが施された釣り糸が数多く見られるようになり、当該塗料や樹脂材の剥離の抑制が課題となっている。   In recent years, many fishing lines have been coated with a resin coating to improve functionality such as colorful paint, thread sliding and flexibility on the surface, and the peeling of the paint and resin material has been suppressed. It has become a challenge.

塗装や樹脂コーティングが施された釣り糸の製造工程は、図14に示すように、まずはステップ(a)において樹脂ペレットから糸状に成形を行う。次に、ステップ(b)において未染色の糸の表面に付着した汚れや油分を除去するために界面活性剤を含む水溶液にて水洗が行われ、続いてステップ(c)において糸に付着した水分を除去するために乾燥させる。次に、ステップ(d)において洗浄された糸に対して染色液を塗布または糸を染色液中に浸漬して染色が施される。染色された糸は、ステップ(e)において熱を加えて染料の固着が行われ、塗装が施される。   As shown in FIG. 14, in the manufacturing process of a fishing line to which painting or resin coating has been applied, first, a resin pellet is formed into a thread shape in step (a). Next, in order to remove dirt and oil adhering to the surface of the undyed yarn in step (b), washing with an aqueous solution containing a surfactant is performed, and subsequently, moisture adhering to the yarn in step (c). Dry to remove. Next, a dyeing solution is applied to the yarn washed in step (d) or dyed by immersing the yarn in the dyeing solution. The dyed yarn is heated in step (e) to fix the dye, and is coated.

なお、この製造工程においては、糸に染色を施す前にステップ(a)の水洗およびステップ(b)の乾燥を行うことにより、糸表面への染色液のぬれ性を向上させている。   In this manufacturing process, the wettability of the dyeing liquid onto the yarn surface is improved by washing with water in step (a) and drying in step (b) before dyeing the yarn.

さらに、ステップ(f)において再度の水洗および乾燥を行った後、ステップ(g)において糸の表面を改質するための表面改質剤が塗布され、ステップ(h)において釣り糸の機能性を向上させるための樹脂コーティングが施される。   Further, after washing and drying again in step (f), a surface modifier for modifying the surface of the line is applied in step (g), and the functionality of the fishing line is improved in step (h). A resin coating is applied for the purpose.

釣り糸に限らず、繊維材の製造工程においてこのように基材の表面に改質処理を行うことは一般的であり、様々な方法が報告されている。特許文献1においては、大気圧グロー放電プラズマを用いて合成繊維や化学繊維、これらからなる布、織布および不織布に表面処理を施すことが記載されている。特許文献1に記載の実施例によれば、ポリエステルの布に大気圧グロー放電プラズマ処理を施すことにより、表面を親水化することが記載されており、これによって表面への水性インキによるフレキソ印刷を容易とするなどの効果が記載されている。   In addition to fishing lines, it is common to perform a modification treatment on the surface of the base material in the fiber material manufacturing process, and various methods have been reported. Patent Document 1 describes that surface treatment is performed on synthetic fibers and chemical fibers, cloths, woven fabrics, and nonwoven fabrics made of these using atmospheric pressure glow discharge plasma. According to an embodiment described in Patent Document 1, it is described that a surface of a polyester cloth is hydrophilized by performing an atmospheric pressure glow discharge plasma treatment, thereby flexographic printing with water-based ink on the surface. The effect of making it easy is described.

さらに、基材にプラズマを接触させることにより、基材表面の殺菌やクリーニングを行うことも可能であり、様々な用途が考えられる。   Furthermore, it is possible to sterilize or clean the surface of the substrate by bringing the substrate into contact with plasma, and various applications are conceivable.

また、特許文献2においては、円筒管の外周面に複数の電極を設け、長さ方向に電位差をもたせるように前記電極に電圧を印加することによって大気圧下において、管内にグロー放電プラズマを発生させる装置について記載されている。   In Patent Document 2, a plurality of electrodes are provided on the outer peripheral surface of a cylindrical tube, and a glow discharge plasma is generated in the tube under atmospheric pressure by applying a voltage to the electrodes so as to have a potential difference in the length direction. The device to be made is described.

特許文献1:特開平6−182195号公報
特許文献2:特開平4−334543号公報
Patent Document 1: JP-A-6-182195 Patent Document 2: JP-A-4-334543

しかし、プラズマ処理は表面改質において非常に優れているものの、処理室内のプラズマの密度分布にはバラツキがあり、繊維のような円柱状の長尺物の表面に対して均一に処理を施すためには、ある程度の処理時間を設ける必要がある。   However, although plasma treatment is very excellent in surface modification, there is variation in the plasma density distribution in the treatment chamber, and the surface of a cylindrical long object such as a fiber is treated uniformly. It is necessary to provide a certain amount of processing time.

また、本発明者等が、特許文献2に記載の装置を用いて、電気伝導性のある糸にプラズマ処理を施す実験を行ったところ、電極と電気伝導性のある糸との間で異常放電が発生し、電気伝導性のある糸にまとわりつくようにプラズマが生成されてしまい、正常にプラズマを生成することが困難であった。この実験から、特許文献2に記載の装置を用いて電気伝導性のある糸に対してプラズマ処理を施すことが困難であるという問題点が明らかとなった。   In addition, when the present inventors conducted an experiment in which plasma treatment was performed on an electrically conductive yarn using the apparatus described in Patent Document 2, abnormal discharge was generated between the electrode and the electrically conductive yarn. Was generated, and plasma was generated so as to cling to the electrically conductive yarn, making it difficult to generate plasma normally. From this experiment, it became clear that it was difficult to perform plasma treatment on the electrically conductive yarn using the apparatus described in Patent Document 2.

また、釣り糸に限らず、繊維やチューブなどの長尺物や長尺物からなる布帛の表面に対して改質処理を行いたいという要望は多い。   In addition, there is a great demand to perform a modification treatment on the surface of not only fishing lines but also long objects such as fibers and tubes and fabrics made of long objects.

これらの課題を解決するべく、本発明においては、密度分布にバラツキのあるプラズマ中において、プラズマ密度の高い領域を選択的に通過させることにより、長尺状の被処理物に対して高速にプラズマ処理を施すとともに、長尺状の被処理物の表面に満遍なく均一な表面処理を可能とするプラズマ処理方法および前記プラズマ処理方法を用い、操作性に優れたプラズマ処理装置並びにプラズマ処理を施した長尺物を提供することを目的とする。   In order to solve these problems, in the present invention, a plasma having a high density is selectively passed through a plasma having a varied density distribution, so that the plasma can be rapidly applied to a long object. A plasma processing method and a plasma processing apparatus excellent in operability using the plasma processing method and the plasma processing method capable of performing uniform and uniform surface treatment on the surface of a long workpiece while performing the treatment The purpose is to provide a scale.

本発明のプラズマ処理装置は、対向して配置され、平面視において互いが重なり合う範囲の中心付近の密度が最も高く、外周方向に向かって徐々に密度が低くなるような密度分布とされたプラズマを発生させる平板状の上側電極および下側電極と、前記上側電極と前記下側電極との間における前記上側電極の下面において、少なくとも前記上側電極の下面全面を覆うように配置された絶縁板と、長尺状の被処理物の搬送方向と平行に配置され、前記絶縁板と前記下側電極との間に所定の間隙を形成した状態で前記下側電極上に前記絶縁板を支持する一対のスペーサーと、前記間隙における前記プラズマの密度の高い領域であって、長尺状の被処理物の搬送方向における少なくとも中央部に設けられ、前記間隙において長尺状の被処理物をプラズマ密度が高い領域を進むようにガイドするガイド部とを備え、前記上側電極と前記下側電極が対向する位置において、前記絶縁板および前記下側電極の前記間隙側の内面の少なくとも一方には、プラズマ生成用ガスを前記間隙に導入するためのプラズマ生成用ガス導入口が開口しており、前記ガイド部は、長尺状の被処理物の搬送経路を形成する1つまたは複数の保持部を有し、搬送される前記長尺状の被処理物に対して搬送方向軸回りのひねりを加えるように前記長尺状の被処理物を回転させる回転装置を備えることを特徴とする。 Flop plasma processing apparatus of the present invention is arranged to face, the highest density near the center of the range to one another overlap in a plan view, gradually density toward the outer circumferential direction is set to the density distribution such that lower plasma A flat plate-shaped upper electrode and lower electrode, and an insulating plate disposed so as to cover at least the entire lower surface of the upper electrode on the lower surface of the upper electrode between the upper electrode and the lower electrode; And a pair which is arranged in parallel with the conveying direction of the long workpiece and supports the insulating plate on the lower electrode in a state where a predetermined gap is formed between the insulating plate and the lower electrode. Spacers and a high-density region of the plasma in the gap, which is provided at least in the center in the conveying direction of the elongated object to be processed. A guide portion that guides so as to travel in a region having a high density, and at a position where the upper electrode and the lower electrode face each other, at least one of the inner surface on the gap side of the insulating plate and the lower electrode The plasma generation gas introduction port for introducing the plasma generation gas into the gap is opened, and the guide portion is one or a plurality of holding portions that form a transport path for a long object to be processed It has a, characterized in that it comprises a rotating device for rotating said elongated of the object to apply a twist in the conveying direction axis with respect to said elongated of the object to be conveyed.

このような、本発明のプラズマ処理装置によれば、プラズマの密度が高い領域に長尺状の被処理物を進ませながらプラズマを接触させることにより、長尺状の被処理物に対して容易に密度の高いプラズマを接触させてプラズマ処理を施すことを可能とするとともに、長尺状の被処理物の表面に満遍なく均一な表面処理を容易に施すことを可能とする。 Such, according to the flop plasma processing apparatus of the present invention, by contacting the plasma while advancing the elongated object to be processed to the density of the plasma region having a high relative elongated object to be processed A plasma treatment can be easily performed by contacting a high-density plasma, and a uniform surface treatment can be easily and uniformly applied to the surface of a long object.

本発明のプラズマ処理方法によれば、密度分布にバラツキのあるプラズマ中において、プラズマ密度の高い領域を選択的に通過させて長尺状の被処理物に対して高速にプラズマ処理を施すとともに、長尺状の被処理物の表面に満遍なく均一な表面処理を施すことが可能である。   According to the plasma processing method of the present invention, in a plasma with a variation in density distribution, a plasma processing is performed at high speed on a long workpiece by selectively passing a region having a high plasma density, Uniform surface treatment can be performed evenly on the surface of a long workpiece.

また、本発明のプラズマ処理装置によれば、操作性に優れたプラズマ処理装置を提供することができる。   Moreover, according to the plasma processing apparatus of this invention, the plasma processing apparatus excellent in operativity can be provided.

さらに、本発明のプラズマ処理装置によれば、導電性の材料からなる長尺状の被処理物に対しても、効果的なプラズマ処理を施すことができる。   Furthermore, according to the plasma processing apparatus of the present invention, it is possible to perform effective plasma processing even on a long object to be processed made of a conductive material.

またさらに、本発明のプラズマ処理方法およびプラズマ処理装置を用いることにより、所望の表面改質が施された長尺物を得ることができる。   Furthermore, by using the plasma processing method and the plasma processing apparatus of the present invention, it is possible to obtain a long product having a desired surface modification.

本発明の第1実施形態のプラズマ処理装置を示す概略斜視図The schematic perspective view which shows the plasma processing apparatus of 1st Embodiment of this invention. 図1に示す本発明のプラズマ処理装置の一部を切断した拡大斜視図FIG. 1 is an enlarged perspective view of a part of the plasma processing apparatus of the present invention shown in FIG. 図1に示す本発明のプラズマ処理装置の要部断面図Sectional drawing of the principal part of the plasma processing apparatus of this invention shown in FIG. 直線状に長尺状の被処理物をガイドしたガイド部の様子を示す概略断面図Schematic cross-sectional view showing the state of a guide section that guides a long object to be processed linearly 螺旋状に長尺状の被処理物をガイドした様子を示す概略断面図Schematic cross-sectional view showing a state of guiding a long object to be processed spirally 単位筒を連結して第1筒状部を形成した場合の本発明のプラズマ処理装置を示す斜視図The perspective view which shows the plasma processing apparatus of this invention at the time of connecting a unit cylinder and forming a 1st cylindrical part. 絶縁管を配置した場合の本発明のプラズマ処理装置の一部を切断した拡大斜視図The expanded perspective view which cut | disconnected some plasma processing apparatuses of this invention at the time of arrange | positioning an insulating tube 本発明の第2実施形態のプラズマ処理装置の一部を切断した拡大斜視図The expanded perspective view which cut | disconnected a part of plasma processing apparatus of 2nd Embodiment of this invention. 本発明の第3実施形態のプラズマ処理装置を示す側面図Side view showing a plasma processing apparatus according to a third embodiment of the present invention. 本発明の第3実施形態において第2筒状部を複数個配設した場合のプラズマ処理装置を示す側面図The side view which shows the plasma processing apparatus at the time of arrange | positioning two or more 2nd cylindrical parts in 3rd Embodiment of this invention. 単位筒および連結部材を連結して第1筒状部および第2筒状部を形成した場合の本発明のプラズマ処理装置を示す側面図The side view which shows the plasma processing apparatus of this invention at the time of connecting a unit cylinder and a connection member and forming a 1st cylindrical part and a 2nd cylindrical part. 本発明の第4実施形態のプラズマ処理装置を示す斜視図The perspective view which shows the plasma processing apparatus of 4th Embodiment of this invention. 図12に示す本発明のプラズマ処理装置の断面図で、(a)は長手方向における断面図、(b)はB−B断面図It is sectional drawing of the plasma processing apparatus of this invention shown in FIG. 12, (a) is sectional drawing in a longitudinal direction, (b) is BB sectional drawing. 釣り糸の製造工程を示すフローチャートFlow chart showing fishing line manufacturing process

以下に、本発明のプラズマ処理方法およびプラズマ処理装置の具体的な実施形態を図1乃至図8を用いて説明する。   Hereinafter, specific embodiments of the plasma processing method and the plasma processing apparatus of the present invention will be described with reference to FIGS.

本発明のプラズマ処理方法は、長尺状の被処理物に対してプラズマを接触させることによりプラズマ処理を施す方法であり、プラズマの密度分布にはバラツキがあり、長尺状の被処理物をプラズマの密度が高い領域を選択的に通過させながら長尺状の被処理物にプラズマ処理を施すようにされている。   The plasma processing method of the present invention is a method of performing plasma processing by bringing a plasma into contact with a long object to be processed, and there is a variation in the density distribution of the plasma. Plasma treatment is performed on a long workpiece while selectively passing through a region having a high plasma density.

長尺状の被処理物としては、繊維、撚糸、組紐などからなる糸、パイプ、ナノチューブおよびこれらを組み合わせたものであり、無機物および有機物などいかなる材質のものでも良い。特に、無機物は、ステンレス、タングステン、鋼などであり、有機物はポリアミド樹脂、フッ素系樹脂、ポリエステル樹脂、ポリオレフィン樹脂から形成された糸およびこれらの複合糸などである。   The long object to be processed includes fibers, twisted yarns, braided yarns, pipes, nanotubes, and combinations thereof, and may be made of any material such as inorganic materials and organic materials. In particular, the inorganic substance is stainless steel, tungsten, steel, and the like, and the organic substance is a polyamide resin, a fluorine resin, a polyester resin, a yarn formed from a polyolefin resin, and a composite yarn thereof.

具体的には、ナイロン6、ナイロン66、ナイロン12等およびそれらの共重合体からなるポリアミドポリマー、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンサクシネート等およびそれらの共重合体からなるポリエステルポリマー、ポリエチレン、ポリプロピレン等のポリオレフィンポリマー、ポリフッ化ビニリデン、ポリテトラフルオロエチレン等のフッ素系ポリマー、アクリロニトリルを主鎖とするアクリル系ポリマー、ポリウレタン系ポリマー、ポリ乳酸等の繊維形成性を有するポリマーからなるモノフィラメント、マルチフィラメントおよびこれらのカットファイバーからなる紡績糸、またはそれらの混繊糸、混紡糸などの複合糸とされる。なお、これらの繊維の直径は、装置内において糸切れなどの不具合が生じないものであれば、どのような直径とされてもよい。   Specifically, nylon 6, nylon 66, nylon 12, etc., and polyamide polymers comprising these copolymers, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polybutylene succinate, etc., and polyesters comprising these copolymers Polymers, polyolefin polymers such as polyethylene and polypropylene, fluorine polymers such as polyvinylidene fluoride and polytetrafluoroethylene, acrylic polymers having acrylonitrile as the main chain, polyurethane polymers, and polymers having fiber-forming properties such as polylactic acid A spun yarn composed of monofilament, multifilament and cut fibers thereof, or a composite yarn such as a blended yarn or a blended yarn is used. The diameters of these fibers may be any diameter as long as they do not cause problems such as yarn breakage in the apparatus.

本発明のプラズマ処理方法を用いた本発明のプラズマ処理装置の第1実施形態について説明する。   A first embodiment of the plasma processing apparatus of the present invention using the plasma processing method of the present invention will be described.

本発明の第1実施形態のプラズマ処理装置1は、図1に示すように、円筒管からなる第1筒状部2と、電源Pから電力を付与され、第1筒状部2の外周面に密着するようにして長手方向に少なくとも2個以上配設されたリング状電極3と、第1筒状部2の内部に対してプラズマ生成用ガスを導入するためのプラズマ生成用ガス導入部4とが備えられている。本実施形態のように、第1筒状部2を円筒管とした場合、少なくとも2個以上配設されたリング状電極3に対して隣接するリング状電極3の電荷が正電荷と負電荷とが順に交互となるように、長手方向に電位差を設て電圧を印加すると、第1筒状部2の内部では、プラズマの密度分布にバラツキが生じ、電流密度の高い内壁近傍のプラズマの密度が最も高く、径方向における中心部へ近づく程プラズマの密度が低くなり、また、第1筒状部2の長手方向に対して一様の密度分布を現す。   As shown in FIG. 1, the plasma processing apparatus 1 according to the first embodiment of the present invention is provided with a first cylindrical portion 2 formed of a cylindrical tube and an outer peripheral surface of the first cylindrical portion 2 to which power is applied from a power source P. At least two or more ring-shaped electrodes 3 arranged in the longitudinal direction so as to be in close contact with each other, and a plasma generating gas introducing portion 4 for introducing a plasma generating gas into the first cylindrical portion 2 And are provided. When the first cylindrical portion 2 is a cylindrical tube as in the present embodiment, the charges of the ring electrode 3 adjacent to the ring electrodes 3 arranged at least two or more are positive and negative charges. When a voltage is applied with a potential difference in the longitudinal direction so that the alternating currents are alternately arranged, the plasma density distribution varies within the first cylindrical portion 2, and the plasma density near the inner wall where the current density is high The density is the highest and the density of the plasma decreases as it approaches the central portion in the radial direction, and a uniform density distribution appears in the longitudinal direction of the first cylindrical portion 2.

第1筒状部2の内部には、図2に示すように、第1筒状部2の長手方向に配設された複数個の円盤状のガイド部材5aからなるガイド部5が設けられている。ガイド部材5aには、図3に示すように、第1筒状部2の内部に現れるプラズマ密度の高い領域、すなわち、第1筒状部2の内壁近傍において、ガイド部材5aよりも小径とされた同心円5b上に中心を有し、ガイド部材5aの厚さ方向に貫通した少なくとも1つ以上の支持孔5cが形成されている。また、ガイド部材5aの中心部には、貫通孔5dが形成されている。   As shown in FIG. 2, a guide portion 5 including a plurality of disk-shaped guide members 5 a disposed in the longitudinal direction of the first tubular portion 2 is provided inside the first tubular portion 2. Yes. As shown in FIG. 3, the guide member 5 a has a smaller diameter than the guide member 5 a in the region where the plasma density appears inside the first cylindrical portion 2, that is, in the vicinity of the inner wall of the first cylindrical portion 2. At least one support hole 5c having a center on the concentric circle 5b and penetrating in the thickness direction of the guide member 5a is formed. A through hole 5d is formed at the center of the guide member 5a.

長尺状の被処理物Wに対してプラズマ処理を施す際には、図4に示すように、支持孔5cに長尺状の被処理物Wを通して支持し、プラズマの密度が高い領域、すなわち、第1筒状部2の内壁近傍へガイドするようにされている。   When performing the plasma treatment on the long workpiece W, as shown in FIG. 4, it is supported through the long workpiece W in the support hole 5c and has a high plasma density. The first cylindrical portion 2 is guided to the vicinity of the inner wall.

このような、本発明の第1実施形態のプラズマ処理装置1とすることにより、プラズマ密度にバラツキのあるプラズマを用いてプラズマ処理を施す場合においても、長尺状の被処理物Wの表面に対し、高密度のプラズマを接触させてプラズマ処理を施すことができるので、高速なプラズマ処理を可能とする。   By using the plasma processing apparatus 1 according to the first embodiment of the present invention as described above, even when plasma processing is performed using plasma with variations in plasma density, the surface of the long workpiece W is applied to the surface. On the other hand, since plasma processing can be performed by contacting high-density plasma, high-speed plasma processing is possible.

また、図5に示すように、ガイド部材5aを第1筒状部2の長手方向中心軸に対して、各ガイド部材5a間の支持孔5cが所定角度ずつ角度をなすように設け、各支持孔5cに対して長尺状の被処理物Wを通して支持させた際に、長尺状の被処理物Wを第1筒状部2のプラズマの密度が高い領域、すなわち、内壁近傍を螺旋状に進ませるようにガイドする形状に各ガイド部材5aを形成するとよい。   Further, as shown in FIG. 5, the guide member 5a is provided so that the support holes 5c between the guide members 5a form a predetermined angle with respect to the longitudinal central axis of the first cylindrical portion 2, and each support is provided. When the long workpiece W is supported with respect to the hole 5c, the elongated workpiece W is spirally formed in a region where the plasma density of the first cylindrical portion 2 is high, that is, in the vicinity of the inner wall. Each guide member 5a may be formed in a shape that guides it so as to advance to the right.

このような、ガイド部材5aとすることにより、例えば、1番目のガイド部材5a(1)に対して、2番目のガイド部材5a(2)を第1筒状部2の長手方向中心軸周りに45°傾きを設けて形成すると、長尺状の被処理物Wがガイド部材5a(1)からガイド部材5a(2)へ移動することによって、ガイド部材5a(1)において、高密度のプラズマに接触していた長尺状の被処理物Wの外周面の位置から中心軸周りに45°ずれた当該外周面の部分に高密度のプラズマが接触するようになる。従って、45°ずつ傾きを設けて第1筒状部2の長手方向に配置された8個のガイド部材5aの(1)から(8)によって被処理物Wを螺旋状に進ませて通過させることで、長尺状の被処理物Wの外周面全面に対して高密度のプラズマを接触させることができるので、長尺状の被処理物の表面に満遍なく均一な表面処理を施すことを可能とする。   By adopting such a guide member 5a, for example, the second guide member 5a (2) is moved around the longitudinal central axis of the first tubular portion 2 with respect to the first guide member 5a (1). When formed with an inclination of 45 °, the long workpiece W moves from the guide member 5a (1) to the guide member 5a (2), so that high density plasma is generated in the guide member 5a (1). High-density plasma comes into contact with the portion of the outer peripheral surface that is shifted by 45 ° around the central axis from the position of the outer peripheral surface of the long workpiece W that has been in contact. Accordingly, the workpiece W is spirally advanced and passed by the eight guide members 5a disposed in the longitudinal direction of the first tubular portion 2 with an inclination of 45 ° in accordance with (1) to (8). As a result, high-density plasma can be brought into contact with the entire outer peripheral surface of the long workpiece W, so that the surface of the long workpiece can be uniformly and uniformly treated. And

さらに、各ガイド部材5a間の距離が同じ場合には、ガイド部材5aに設ける傾きをより大きくすることにより、被処理物Wが第1筒状部2の内周面を1周するために必要な第1筒状部2の長手方向への距離を短くすることができるので、プラズマ処理装置1を小型化することが可能となる。具体的には、傾きを45°設ける場合には、第1筒状部2の内周面を1周するのにガイド部材5aが8個必要であるのに対し、傾きを90°設けた場合には、第1筒状部2の内周面を1周するのにガイド部材5aが4個でよく、第1筒状部2の長手方向の長さを1/2以下とすることができる。   Furthermore, when the distance between each guide member 5a is the same, it is necessary for the workpiece W to make one round of the inner peripheral surface of the first cylindrical portion 2 by increasing the inclination provided in the guide member 5a. Since the distance to the longitudinal direction of the 1st cylindrical part 2 can be shortened, the plasma processing apparatus 1 can be reduced in size. Specifically, when the inclination is provided at 45 °, eight guide members 5a are required to make one round of the inner peripheral surface of the first tubular portion 2, whereas the inclination is provided at 90 °. The number of guide members 5a may be four to make one round of the inner peripheral surface of the first tubular portion 2, and the length of the first tubular portion 2 in the longitudinal direction can be ½ or less. .

なお、図4のように長尺状の被処理物Wをガイド部材5aの支持孔5cに支持させた状態で、各ガイド部材5aを所定角度ずつ回転させて、図5のように長尺状の被処理物Wを第1筒状部2の長手方向に対して螺旋状に進ませるようにしてもよい。   In the state where the long workpiece W is supported in the support hole 5c of the guide member 5a as shown in FIG. 4, each guide member 5a is rotated by a predetermined angle to obtain a long shape as shown in FIG. The workpiece W may be spirally advanced with respect to the longitudinal direction of the first cylindrical portion 2.

また、図6に示すように、複数の単位筒2aを連結させることによって1つの第1筒状部2とすることができる。このような、第1筒状部2とすることにより、ガイド部材5aの支持部5cに対して長尺状の被処理物Wを通した後に単位筒2aを連結させて第1筒状部2を形成するので、長尺状の被処理物Wとして形状安定性に乏しい材料に処理を施す場合においても、容易にセットすることができ、プラズマ処理装置1の操作性を向上させることができる。さらに、ガイド部材5aを回転させて長尺状の被処理物Wを螺旋状に進ませるようにする場合には、単位筒2aに角度を設けながら連結することによって容易に長尺状の被処理物Wを螺旋状に進ませるようにすることができる。   Moreover, as shown in FIG. 6, it can be set as the 1st cylindrical part 2 by connecting the some unit cylinder 2a. By setting it as the 1st cylindrical part 2 like this, after passing the elongate to-be-processed object W with respect to the support part 5c of the guide member 5a, the unit cylinder 2a is connected, and the 1st cylindrical part 2 is connected. Therefore, even when a material having poor shape stability is processed as the long workpiece W, it can be easily set and the operability of the plasma processing apparatus 1 can be improved. Furthermore, when the guide member 5a is rotated so that the long workpiece W is advanced in a spiral shape, it is easily connected to the unit tube 2a while providing an angle. The object W can be made to advance spirally.

また、図7に示すように、第1筒状部2の内部のガイド部材5aの貫通孔5dによって形成される第1筒状部2の円心軸近傍の空間に細い筒状の絶縁管6を挿通させて配設する。この絶縁管6の外周面と第1筒状部2の内壁とで形成される空間のみにプラズマ生成用ガスを導入してプラズマを生成するようにすることによって、プラズマ生成用ガスの使用量を抑えてランニングコストの低廉化を図ることができる。   Further, as shown in FIG. 7, a thin cylindrical insulating tube 6 is formed in a space near the center axis of the first cylindrical portion 2 formed by the through hole 5d of the guide member 5a inside the first cylindrical portion 2. Is inserted and arranged. The plasma generation gas is introduced only into the space formed by the outer peripheral surface of the insulating tube 6 and the inner wall of the first cylindrical portion 2 to generate plasma, thereby reducing the amount of plasma generation gas used. The running cost can be reduced by suppressing the running cost.

また、絶縁管6の内部に冷却水などの冷媒を導入することにより、プラズマの温度上昇を防ぐことができるので、熱に弱い長尺状の被処理物Wに対してもプラズマ処理を施すことができる。   Moreover, since the temperature of the plasma can be prevented by introducing a coolant such as cooling water into the insulating tube 6, the plasma treatment is also performed on the long workpiece W that is weak against heat. Can do.

次に、本発明のプラズマ処理装置1の第2実施形態について説明する。
本発明の第2実施形態においては、図8に示すように、リング状電極3が第1筒状部2の外周面の全長に亘るように形成され、絶縁管6の内部には、銅の円柱棒からなる導電材料7が絶縁管6の内壁と密着させた状態で挿入されている。このとき、第1筒状部2の内壁と絶縁管6の外周面とで形成される空間にプラズマ生成用ガスを導入するとともに、電源Pを用いてリング状電極3と導電材料7とに電力を付与し、第1筒状部の径方向に電位差を設けるように電圧を印加して誘電体バリア放電を発生させることによってプラズマを生成することができる。
Next, a second embodiment of the plasma processing apparatus 1 of the present invention will be described.
In the second embodiment of the present invention, as shown in FIG. 8, the ring-shaped electrode 3 is formed so as to extend over the entire length of the outer peripheral surface of the first cylindrical portion 2, and the inside of the insulating tube 6 is made of copper. A conductive material 7 made of a cylindrical rod is inserted in close contact with the inner wall of the insulating tube 6. At this time, a plasma generating gas is introduced into a space formed by the inner wall of the first tubular portion 2 and the outer peripheral surface of the insulating tube 6, and power is supplied to the ring-shaped electrode 3 and the conductive material 7 using the power source P. And generating a dielectric barrier discharge by applying a voltage so as to provide a potential difference in the radial direction of the first cylindrical portion, thereby generating plasma.

第1筒状部2の内壁と絶縁管6の外周面とで形成される空間には、ガイド部材5aが長手方向に複数個配設され、長尺状の被処理物Wを前記空間内において支持してガイドするようにされている。   In a space formed by the inner wall of the first tubular portion 2 and the outer peripheral surface of the insulating tube 6, a plurality of guide members 5a are arranged in the longitudinal direction, and the long workpiece W is placed in the space. It is designed to support and guide.

本第2実施形態においては、導電材料7を銅の円柱棒として説明をおこなったが、効率よく放電を発生させるためには、絶縁管6の内壁と導電材料7の外周面との密着性の高さが重要であり、導電材料7として、例えば塩化ナトリウム水溶液や海水などの電解質水溶液または水銀などの導電性の液体を用いることがより好ましく、絶縁管6の内壁への密着性を非常に高くして効率よく誘電体バリア放電を発生させることができる。   In the second embodiment, the conductive material 7 has been described as a copper cylindrical rod. However, in order to efficiently generate a discharge, the adhesion between the inner wall of the insulating tube 6 and the outer peripheral surface of the conductive material 7 is improved. The height is important, and it is more preferable to use, for example, an aqueous electrolyte solution such as a sodium chloride aqueous solution or seawater or a conductive liquid such as mercury as the conductive material 7, and the adhesion to the inner wall of the insulating tube 6 is extremely high. Thus, dielectric barrier discharge can be generated efficiently.

また、前記導電性の液体を絶縁管6の内部において常に流動させるように形成する。例えば、導電性の液体を貯留しておくタンクを設け、タンクから絶縁管6の内部へ導電性の液体を導入するとともに、絶縁管6の内部からタンクへ導電性の液体を導出して、タンクと絶縁管6の内部において導電性の液体を循環させるようにすることが好ましい。導電性の液体を常に流動させることによって、給電しながら冷却することができ、冷媒としての作用も期待できる。なお、導電性の液体をタンク内または流路において冷却することにより、冷媒としての効果をさらに高めることも可能である。   In addition, the conductive liquid is formed to always flow inside the insulating tube 6. For example, a tank for storing a conductive liquid is provided, the conductive liquid is introduced from the tank into the insulating tube 6, and the conductive liquid is led from the inside of the insulating tube 6 to the tank. It is preferable to circulate the conductive liquid inside the insulating tube 6. By always flowing a conductive liquid, it can be cooled while supplying power, and an effect as a refrigerant can also be expected. In addition, the effect as a refrigerant | coolant can further be improved by cooling a conductive liquid in a tank or a flow path.

このような、第2実施形態のプラズマ処理装置1とすることにより、よりプラズマが高密度な領域を形成することができ、長尺状の被処理物Wに対して高速に満遍なく均一なプラズマ処理を施すことを可能とする。   By using the plasma processing apparatus 1 of the second embodiment as described above, it is possible to form a region where the plasma is denser, and to uniformly treat the long workpiece W at high speed uniformly. Can be applied.

<実施例1>
以下に、本発明のプラズマ処理方法を用いた実施例について説明する。
本発明のプラズマ処理装置1を用いて、長尺状の被処理物Wに対してプラズマ処理を施し、その処理効果の検討を行った。
<Example 1>
Examples using the plasma processing method of the present invention will be described below.
Using the plasma processing apparatus 1 of the present invention, the long workpiece W was subjected to plasma processing, and the processing effect was examined.

長尺状の被処理物Wには、直径0.243mmのポリアミドモノフィラメント(ナイロン6とナイロ66の85/15の共重合体のものを用いた。)、直径0.268mmのポリフッ化ビニリデンモノフィラメントおよび100デニール/96フィラメントの超高分子量ポリエチレン繊維を4本組み合わせて製紐した400デニール/384フィラメントの超高分子量ポリエチレン繊維を用いた。   For the long workpiece W, a polyamide monofilament having a diameter of 0.243 mm (an 85/15 copolymer of nylon 6 and Nylon 66), a polyvinylidene fluoride monofilament having a diameter of 0.268 mm, and A 400 denier / 384 filament ultrahigh molecular weight polyethylene fiber made by combining four 100 denier / 96 filament ultrahigh molecular weight polyethylene fibers was used.

<サンプルの作成方法>
以下に、詳しいサンプルの作成方法について述べる。
長尺状の被処理物Wは、所定のプラズマ処理装置設置範囲(本実施例においては、約1mの設置範囲を設けた。)を設けて設置された2台のニップローラ付糸送りロールによって、未処理の長尺状の被処理物Wが巻かれた原糸ボビンから巻取りボビンへと搬送されるようセットされている。
<How to create a sample>
The following describes how to create a detailed sample.
The long workpiece W is provided by two yarn feed rolls with a nip roller provided with a predetermined plasma processing apparatus installation range (in this embodiment, an installation range of about 1 m is provided). The unprocessed long workpiece W is set so as to be conveyed from the raw yarn bobbin wound with the winding bobbin.

本発明のプラズマ処理装置1の処理効果を明確とするべく、本発明のプラズマ処理装置1の他に、比較用にマルチガスプラズマジェット処理装置(株式会社プラズマコンセプト東京製のマルチガスプラズマ)を用い、それぞれプラズマ処理装置設置範囲に配置し、長尺状の被処理物Wに対してプラズマ処理を行った。   In order to clarify the processing effect of the plasma processing apparatus 1 of the present invention, in addition to the plasma processing apparatus 1 of the present invention, a multi-gas plasma jet processing apparatus (multi-gas plasma manufactured by Plasma Concept Tokyo Co., Ltd.) is used for comparison. These were disposed in the plasma processing apparatus installation range, and the plasma treatment was performed on the long workpiece W.

各プラズマ処理装置の態様について説明する。   The aspect of each plasma processing apparatus will be described.

本発明のプラズマ処理装置1は、図1に示す態様の装置を用い、直径3mm、長さ1mのガラス管からなる第1筒状部2に複数の銅製のリング状電極3をそれぞれ約1cmの間隔を設けて配置した約18cmのプラズマ照射範囲を形成した。第1筒状部2の一端側(図1における右側端)には、プラズマ生成用ガスを導入するためのプラズマ生成用ガス導入部4が形成され、第1筒状部2の他端側にはプラズマ生成用ガスが排出されるのを抑制するために、図示を省略した粘着性のフィルムが開口を狭めるように設けられている。複数のリング状電極3には、それぞれ電源装置から電力が付与され、第1筒状部2の長手方向に電位差が設けられるように電圧が印加されている。   The plasma processing apparatus 1 of the present invention uses the apparatus of the embodiment shown in FIG. 1, and a plurality of ring-shaped electrodes 3 made of copper are each about 1 cm on a first cylindrical part 2 made of a glass tube having a diameter of 3 mm and a length of 1 m. A plasma irradiation range of about 18 cm arranged at intervals was formed. A plasma generation gas introduction portion 4 for introducing a plasma generation gas is formed on one end side (the right end in FIG. 1) of the first cylindrical portion 2, and on the other end side of the first cylindrical portion 2. In order to suppress discharge of the plasma generating gas, an adhesive film (not shown) is provided so as to narrow the opening. Electric power is applied to each of the plurality of ring electrodes 3 from a power supply device, and a voltage is applied so that a potential difference is provided in the longitudinal direction of the first cylindrical portion 2.

比較用のマルチガスプラズマジェット処理装置は、長手方向における略中央部にプラズマ導入口が設けられた直径8mm、長さ1mのプラスチック管を備え、当該プラズマ導入口にマルチガスプラズマジェット発生装置の噴射口を接続することにより、管内部において、プラスチック管の両端に向かって逆方向へそれぞれプラズマが流れるようにプラズマを導入するようにされている。   A comparative multi-gas plasma jet processing apparatus includes a plastic tube having a diameter of 8 mm and a length of 1 m provided with a plasma inlet at a substantially central portion in the longitudinal direction, and the multi-gas plasma jet generator is injected into the plasma inlet. By connecting the ports, the plasma is introduced so that the plasma flows in opposite directions toward both ends of the plastic tube inside the tube.

被処理物へのプラズマ処理は、プラスチック管の一方の端部から原糸ボビンから引き出された長尺状の被処理物Wを導入し、他方の端部から処理済みの長尺状の被処理物Wを導出して巻取ボビンに巻き取るようにすることで、所定の搬送速度で原糸ボビンから巻取ボビンへ搬送しながら、プラスチック管の内部において長尺状の被処理物Wの表面に対してプラズマを接触させて行う。   The plasma treatment to the workpiece is performed by introducing the long workpiece W drawn from the raw yarn bobbin from one end of the plastic tube and treating the long workpiece to be processed from the other end. The surface of the long workpiece W inside the plastic pipe while being transported from the raw yarn bobbin to the winding bobbin at a predetermined transport speed by deriving the object W and winding it on the winding bobbin. Is performed by bringing a plasma into contact with the substrate.

プラズマ生成用ガスには、アルゴンガス、ヘリウムガス、酸素ガスおよび炭酸ガスの単体のガスまたは混合ガスを用いた。   A single gas or mixed gas of argon gas, helium gas, oxygen gas and carbon dioxide gas was used as the plasma generating gas.

そして、処理効果を測定するためのサンプルは、処理後の長尺状の被処理物Wを巻取りボビンに糸と糸との間に間隔の無いように整列させて単層に巻き付けて作成する。本実施例では、巻取りボビンとして、直径50mm、巻幅65mmのボビンを用いた。   A sample for measuring the treatment effect is prepared by winding a long processed object W after treatment on a winding bobbin so that there is no space between the yarns and winding them around a single layer. . In this example, a bobbin having a diameter of 50 mm and a winding width of 65 mm was used as the winding bobbin.

<接触角の測定方法>
また、サンプルの接触角の測定方法について述べる。
測定装置には、FIBROsystemAB社(Sweden)製の携帯式接触角計PG−Xを用いた。測定は、サンプルが整列して巻き付けられた糸上に測定装置をセットし、当該糸上に純水を滴下して、整列した糸列と純水との接触角を検出した。なお、接触角は、値が小さいほど親水性の表面であることを示し、値が大きいほど撥水性の表面であることを示す。
<Measurement method of contact angle>
A method for measuring the contact angle of the sample will be described.
A portable contact angle meter PG-X manufactured by FIBROsystemAB (Sweden) was used as the measurement apparatus. In the measurement, a measuring device was set on the yarn on which the samples were aligned and wound, and pure water was dropped on the yarn to detect the contact angle between the aligned yarn row and pure water. In addition, a contact angle shows that it is a hydrophilic surface, so that a value is small, and it shows that it is a water-repellent surface, so that a value is large.

まず、マルチガスプラズマジェット処理装置を用いて、それぞれの被処理物へのガス種による処理効果の違いについて検討を行った。各サンプルのプラズマ処理に用いたガス種、ガス流量、サンプルの搬送速度および処理前/処理後の接触角の結果を表1に示す。なお、表中において、F1はポリアミドモノフィラメントを示し、F2はポリフッ化ビニリデンモノフィラメントを示し、F3は超高分子量ポリエチレン繊維を示す。   First, using a multi-gas plasma jet processing apparatus, the difference in the processing effect depending on the gas type on each object to be processed was examined. Table 1 shows the results of the gas type, gas flow rate, sample transport speed, and contact angle before / after treatment used for plasma treatment of each sample. In the table, F1 represents a polyamide monofilament, F2 represents a polyvinylidene fluoride monofilament, and F3 represents an ultrahigh molecular weight polyethylene fiber.

Figure 0006089378
Figure 0006089378

素材がF1としてのポリアミドモノフィラメントの場合、表1のNo.1に示すように、アルゴンガス100体積%に対して酸素ガス1体積%を添加したプラズマ生成用ガスを用いてプラズマ処理を施すことにより、処理前の接触角が81.7°であったのに対して、処理後の接触角は0.0°であり、高い親水化効果が得られた。
No.2およびNo.3に示すように、ヘリウムガス100体積%に対して炭酸ガス1体積%を添加したプラズマ生成用ガスを用いてプラズマ処理を施した場合、ガス流量を5L/minとしたNo.2においては、処理前の接触角が81.7°、処理後の接触角が69.3°と、わずかに親水化効果が認められ、ガス流量を10L/minとしたNo.3においては、処理前の接触角が81.7°、処理後の接触角が0.0°と、高い親水化効果が認められた。
No.4およびNo.5に示すように、へリムガス100体積%に対して酸素ガス1体積%を添加したプラズマ生成用ガスを用いてプラズマ処理を施した場合、ガス流量5L/minとしたNo.4においては、処理前の接触角が81.7°、処理後の接触角が67.7°と、わずかに親水化効果が認められ、ガス流量10L/minとしたNo.5においては、処理前の接触角が81.7°、処理後の接触角が85.7°と、逆に撥水化効果が認められる結果となった。
When the material is polyamide monofilament as F1, No. in Table 1 As shown in FIG. 1, the contact angle before the treatment was 81.7 ° by performing the plasma treatment using the plasma generation gas in which the oxygen gas 1 volume% was added to the argon gas 100 volume%. On the other hand, the contact angle after the treatment was 0.0 °, and a high hydrophilic effect was obtained.
No. 2 and no. As shown in FIG. 3, when the plasma treatment was performed using a plasma generation gas in which 1% by volume of carbon dioxide gas was added to 100% by volume of helium gas, No. 3 with a gas flow rate of 5 L / min. In No. 2, the contact angle before the treatment was 81.7 °, the contact angle after the treatment was 69.3 °, a slight hydrophilizing effect was observed, and the gas flow rate was 10 L / min. In No. 3, the contact angle before the treatment was 81.7 °, and the contact angle after the treatment was 0.0 °, and a high hydrophilic effect was recognized.
No. 4 and no. As shown in FIG. 5, when the plasma treatment was performed using a plasma generating gas in which 1 volume% of oxygen gas was added to 100 volume% of the herim gas, No. 5 having a gas flow rate of 5 L / min. In No. 4, the contact angle before the treatment was 81.7 °, the contact angle after the treatment was 67.7 °, a slight hydrophilizing effect was observed, and a gas flow rate of 10 L / min. In No. 5, the contact angle before the treatment was 81.7 °, and the contact angle after the treatment was 85.7 °.

また、素材がF2としてのポリフッ化ビニリデンモノフィラメントの場合、No.6に示すように、アルゴンガス100体積%に対して酸素ガス1体積%を添加したプラズマ生成用ガスを用いてプラズマ処理を施すことにより、処理前の接触角が91.7°であったのに対して、処理後の接触角は99.9°と、接触角が大きくなる結果を示し、撥水化効果が得られた。
No.7に示すように、ヘリウムガス100体積%に対して炭酸ガス1体積%を添加したプラズマ生成用ガスを用いてプラズマ処理を施した場合、処理前の接触角が91.7°、処理後の接触角が77.2°と、わずかに親水化効果が認められた。
反対に、No.8に示すように、ヘリウムガス100体積%に対して酸素ガス1体積%を添加したプラズマ生成用ガスを用いてプラズマ処理を施した場合には、処理前の接触角が91.7°、処理後の接触角が96.3°と、接触角が大きくなり撥水化効果が認められる結果となった。
When the material is polyvinylidene fluoride monofilament as F2, No. As shown in FIG. 6, the contact angle before the treatment was 91.7 ° by performing the plasma treatment using the plasma generation gas in which the oxygen gas 1 volume% was added to the argon gas 100 volume%. On the other hand, the contact angle after treatment was 99.9 °, indicating that the contact angle was large, and a water repellency effect was obtained.
No. As shown in FIG. 7, when plasma treatment is performed using a plasma generation gas in which 1% by volume of carbon dioxide gas is added to 100% by volume of helium gas, the contact angle before treatment is 91.7 °, A slight hydrophilizing effect was observed with a contact angle of 77.2 °.
Conversely, no. As shown in FIG. 8, when plasma processing is performed using a plasma generating gas in which 1% by volume of oxygen gas is added to 100% by volume of helium gas, the contact angle before processing is 91.7 °, When the subsequent contact angle was 96.3 °, the contact angle increased and the water repellency effect was observed.

同様に、素材がF3としての超高分子量ポリエチレン繊維の場合、処理前の段階で親水性を示し、純水を滴下すると約1秒30で浸透した。No.9およびNo.10に示すように、炭酸ガス100体積%およびアルゴンガス100体積%のプラズマ生成用ガスを用いてプラズマ処理を施すことにより、滴下された純水が一瞬で浸透するほど高い親水性を示す結果となった。   Similarly, when the raw material was ultra-high molecular weight polyethylene fiber as F3, it showed hydrophilicity before the treatment, and it penetrated in about 1 second 30 when pure water was dropped. No. 9 and no. As shown in FIG. 10, by performing plasma treatment using a plasma generation gas of carbon dioxide gas 100 volume% and argon gas 100 volume%, the result shows that the dripped pure water is so hydrophilic that it permeates in an instant. became.

次に、本発明のプラズマ処理装置または比較用のマルチガスプラズマジェット処理装置を用い、ポリアミドモノフィラメント(F1)およびポリフッ化ビニリデンモノフィラメント(F2)に対してプラズマ処理を施した場合の接触角を測定し、本発明のプラズマ処理装置の処理効果について検討を行った。各サンプルの処理に用いた処理装置、ガス種、ガス流量、サンプルの搬送速度および処理前/処理後の接触角を測定した結果を表2に示す。   Next, using the plasma processing apparatus of the present invention or the comparative multi-gas plasma jet processing apparatus, the contact angle is measured when the polyamide monofilament (F1) and the polyvinylidene fluoride monofilament (F2) are subjected to plasma processing. The processing effect of the plasma processing apparatus of the present invention was examined. Table 2 shows the results of measurement of the processing apparatus, gas type, gas flow rate, sample transport speed, and contact angle before / after processing used for processing each sample.

Figure 0006089378
Figure 0006089378

素材がF1としてのポリアミドモノフィラメントの場合、表2のNo.Ny1およびNo.Ny2に示すように、本発明のプラズマ処理装置および比較用のマルチガスプラズマジェット処理装置のどちらの処理装置を用いてプラズマ処理を施したサンプルにおいても、共に、処理前の接触角が81.7°、処理後の接触角が0.0°と、親水化効果が認められた。しかし、比較用のマルチガスプラズマジェット処理装置を用いて処理を行ったサンプルにおいては、水滴の接触角にムラが認められたため、被処理物に対して満遍なく均一な処理が施されていないと考えられる。これに対し、本発明のプラズマ処理装置を用いたサンプルにおいては、このような水滴の接触角のムラは認められず、被処理物の表面に満遍なく均一な処理が施すことができた。   When the material is polyamide monofilament as F1, No. in Table 2 Ny1 and No. As shown by Ny2, in the samples subjected to the plasma treatment using either the plasma treatment device of the present invention or the comparative multi-gas plasma jet treatment device, the contact angle before the treatment is 81.7. The hydrophilization effect was recognized with a contact angle of 0.0 ° after treatment. However, in the sample processed using the comparative multi-gas plasma jet processing apparatus, since the contact angle of the water droplets was uneven, it was considered that the object was not uniformly processed uniformly. It is done. On the other hand, in the sample using the plasma processing apparatus of the present invention, such unevenness in the contact angle of water droplets was not recognized, and the surface of the object to be processed could be uniformly treated.

同様に、素材がF2としてのポリフッ化ビニリデンモノフィラメントの場合、No.FC1およびNo.FC2に示すように、本発明のプラズマ処理装置を用いてプラズマ処理を施したサンプルにおいては、処理前の接触角が91.7°、処理後の接触角が0.0°となり、高い親水化効果が認められたのに対して、比較用のマルチガスプラズマジェット処理装置を用いたサンプルにおいては、処理前の接触角が91.7°、処理前の接触角が96.3°と水滴の接触角が増加する結果となった。   Similarly, when the material is a polyvinylidene fluoride monofilament as F2, No. FC1 and No. As shown in FC2, in the sample subjected to the plasma treatment using the plasma treatment apparatus of the present invention, the contact angle before treatment is 91.7 °, the contact angle after treatment is 0.0 °, and high hydrophilization. While the effect was recognized, in the sample using the comparative multi-gas plasma jet processing apparatus, the contact angle before the treatment was 91.7 ° and the contact angle before the treatment was 96.3 °. As a result, the contact angle increased.

以上の結果から、本発明のプラズマ処理装置を用いることにより、被処理物に対して満遍なく均一なプラズマ処理を施すことが可能であり、高い表面改質効果が得られることが明らかとなった。   From the above results, it has been clarified that by using the plasma processing apparatus of the present invention, it is possible to uniformly and uniformly perform plasma processing on an object to be processed, and a high surface modification effect can be obtained.

また、素材がF2としてのポリフッ化ビニリデンモノフィラメントを用いて、本発明のプラズマ処理装置における処理効果を検討するべく、被処理物の搬送速度を変化させてプラズマ処理を施した場合のサンプルに対する純水の接触角の結果を表2のNo.FC1、No.FC3およびNo.FC4を用いて説明する。   Further, using polyvinylidene fluoride monofilament as the material F2, pure water for the sample when the plasma treatment is performed by changing the conveyance speed of the object to be treated in order to examine the treatment effect in the plasma treatment apparatus of the present invention. The contact angle results of No. FC1, No. FC3 and No. This will be described using FC4.

搬送速度5m/minおよび10m/minの場合は、No.FC1およびNo.FC3に示すように、処理前の接触角が91.7°であったのに対して、処理後の接触角は0.0°となり、No.FC1およびNo.FC3ともに純水が一瞬で浸透するほどの高い親水化効果が認められた。さらに搬送速度を速めて搬送速度20m/minとした場合には、No.FC4に示すように、処理前の接触角が91.7°、処理後の接触角が75.1°と、わずかに親水化効果が認められたものの、純水が浸透するまでの表面改質には至らなかった。この結果から、被処理物へのプラズマの照射時間を長くする程、表面改質効果が高いことが分かる。   When the transfer speed is 5 m / min or 10 m / min, No. FC1 and No. As shown in FC3, the contact angle before treatment was 91.7 °, whereas the contact angle after treatment was 0.0 °. FC1 and No. In both FC3, high hydrophilization effect was recognized so that pure water could permeate in an instant. Furthermore, when the conveyance speed is increased to a conveyance speed of 20 m / min, no. As shown in FC4, although the contact angle before treatment was 91.7 ° and the contact angle after treatment was 75.1 °, a slight hydrophilic effect was observed, but surface modification until pure water penetrated It did not reach. From this result, it can be seen that the longer the plasma irradiation time to the object to be processed, the higher the surface modification effect.

このように、本発明のプラズマ処理装置を用いることにより、長尺状の被処理物Wに対して、高い表面改質効果を得ることができる。さらに、被処理物の表面に対して、満遍なく均一なプラズマ処理を施すことができる。   Thus, by using the plasma processing apparatus of the present invention, it is possible to obtain a high surface modification effect on the long workpiece W. Furthermore, a uniform and uniform plasma treatment can be performed on the surface of the workpiece.

また、本発明のプラズマ処理装置1の第3実施形態について説明する。
本発明の第3実施形態においては、図9に示すように、例えば、タングステンや鋼などの電気伝導性を有する長尺状の被処理物Wにプラズマ処理を施す場合においても安定にプラズマを生成して、良好なプラズマ処理を可能とするべく発明された実施形態であり、第1筒状部2に対して、直交して貫通するように一体に形成された少なくとも1つの第2筒状部8を備えている。また、プラズマ生成用ガス導入部4から第1筒状部2の内部にプラズマ生成用ガスを導入するとともに、リング状電極3に対して長手方向に電位差を設けるように電圧を印加することにより、第1筒状部2の内部において生成されたプラズマが第2筒状部8の内部に導入されるようにされている。
In addition, a third embodiment of the plasma processing apparatus 1 of the present invention will be described.
In the third embodiment of the present invention, as shown in FIG. 9, for example, plasma is stably generated even when a plasma treatment is performed on a long workpiece W having electrical conductivity such as tungsten or steel. In addition, the embodiment was invented to enable good plasma processing, and at least one second cylindrical portion integrally formed so as to penetrate perpendicularly to the first cylindrical portion 2. 8 is provided. Further, by introducing a plasma generating gas from the plasma generating gas introducing portion 4 into the first cylindrical portion 2 and applying a voltage so as to provide a potential difference in the longitudinal direction with respect to the ring-shaped electrode 3, Plasma generated inside the first cylindrical portion 2 is introduced into the second cylindrical portion 8.

なお、第2筒状部8に開閉自在な栓を設けることにより、第1筒状部2において、長尺状の被処理物に対してプラズマ処理を施すことができる。   In addition, by providing a plug that can be freely opened and closed in the second cylindrical portion 8, it is possible to perform plasma processing on the long object to be processed in the first cylindrical portion 2.

この時、リング状電極3においては、図9に示すように、第2筒状部8に隣接する位置に配置されたリング状電極3が接地されることが好ましく、第2筒状部8と第1筒状部2とが交差する部分を電気伝導性を有する長尺状の被処理物Wが通過する際においても、隣接するリング状電極3が接地状態であるため、異常放電が発生することがなく、安定にプラズマを生成して、第2筒状部8の内部へプラズマを導入することができる。   At this time, in the ring-shaped electrode 3, as shown in FIG. 9, the ring-shaped electrode 3 disposed at a position adjacent to the second cylindrical portion 8 is preferably grounded. Even when the elongated workpiece W having electrical conductivity passes through the portion where the first cylindrical portion 2 intersects, abnormal discharge occurs because the adjacent ring-shaped electrode 3 is in the grounded state. In this way, plasma can be stably generated and introduced into the second cylindrical portion 8.

さらに、第1筒状部2の両端部にそれぞれプラズマ生成用ガス導入部4を設けるようにされることが好ましく、両側から導入されるプラズマ生成用ガスの流れによって第2筒状部8に対して生成されたプラズマが導入されやすくなるとともに、より高密度のプラズマを第2筒状部8の内部に導入することができるので、長尺状の被処理物Wに対して高速にプラズマ処理を施すことができる。   Further, it is preferable that the plasma generating gas introducing portions 4 are provided at both ends of the first cylindrical portion 2 respectively, and the second cylindrical portion 8 is made to flow by the flow of the plasma generating gas introduced from both sides. Since the plasma generated in this way can be easily introduced and a higher density plasma can be introduced into the second cylindrical portion 8, plasma processing can be performed on the long workpiece W at high speed. Can be applied.

また、第1筒状部2に対して、複数の第2筒状部8を設ける場合には、図10に示すように、第2筒状部8と第2筒状部8との間であって、一対のリング状電極3を両側にそれぞれ設けるように中央にプラズマ生成用ガスを導入するためのプラズマ生成用ガス導入部4をさらに設けるとよい。   Further, when a plurality of second cylindrical portions 8 are provided for the first cylindrical portion 2, as shown in FIG. 10, between the second cylindrical portion 8 and the second cylindrical portion 8. Therefore, it is preferable to further provide a plasma generation gas introduction portion 4 for introducing a plasma generation gas at the center so that a pair of ring-shaped electrodes 3 are provided on both sides.

プラズマ生成用ガスに対して、処理効果を向上させるために酸素ガス、炭酸ガスおよび水素ガスなどのガスを添加する場合や、化学蒸着を目的として蒸着物を添加する場合には、第2筒状部8の内部に直接導入するようにしてプラズマ処理を行うことが好ましい。   In the case of adding a gas such as oxygen gas, carbon dioxide gas and hydrogen gas in order to improve the processing effect to the plasma generating gas, or when adding a deposit for the purpose of chemical vapor deposition, the second cylindrical shape is used. It is preferable to perform the plasma treatment so as to be directly introduced into the portion 8.

また、第1筒状部2が複数の単位筒2aを長手方向に連結させて形成する場合には、図11に示すように、第1筒状部2と第2筒状部8とが交差する部分に、十字型の連結部材9を設けて、連結部材9の対向する一対の開口部9a、9cに単位筒2aを連結して第1筒状部2とするとともに、連結部材9の対向するその他の一対の開口部9b、9dを第2筒状部8とするようにされている。このように、プラズマ処理装置1を単位筒2aと連結部材9とを連結して形成することによって、長尺状の被処理物Wを単位筒2aおよび連結部材9に通した後に、単位筒2aおよび連結部材9とを連結させてプラズマ処理が可能な状態に組み立ててプラズマ処理を施すようにすることができるので、操作性に優れたプラズマ処理装置とすることを可能とする。   Further, when the first cylindrical portion 2 is formed by connecting a plurality of unit cylinders 2a in the longitudinal direction, the first cylindrical portion 2 and the second cylindrical portion 8 intersect as shown in FIG. A cross-shaped connecting member 9 is provided in the portion to be connected, and the unit tube 2a is connected to a pair of openings 9a, 9c facing the connecting member 9 to form the first cylindrical portion 2, and the connecting member 9 is opposed to the unit tube 2a. The other pair of openings 9b, 9d is configured as the second cylindrical portion 8. In this way, by forming the plasma processing apparatus 1 by connecting the unit cylinder 2a and the connecting member 9, after passing the long workpiece W through the unit cylinder 2a and the connecting member 9, the unit cylinder 2a. Since the plasma processing can be performed by connecting the connecting member 9 and the connecting member 9 so that the plasma processing can be performed, the plasma processing apparatus having excellent operability can be obtained.

このような、本発明の第3実施形態のプラズマ処理装置1とすることにより、第2筒状部8に電気伝導性を有する長尺状の被処理物Wを通して、第1筒状部2によって生成されたプラズマと長尺状の被処理物Wとを第2筒状部8の内部において接触させて、長尺状の被処理物Wにプラズマ処理を施すようにされるので、電気伝導性を有する長尺状の被処理物Wとリング状電極3との間で異常放電することを抑制することができ、安定にプラズマを生成して、電気伝導性を有する長尺状の被処理物Wへのプラズマ処理を容易に行うことを可能とする。   By using the plasma processing apparatus 1 of the third embodiment of the present invention as described above, the first cylindrical portion 2 passes through the long cylindrical workpiece W having electrical conductivity through the second cylindrical portion 8. Since the generated plasma and the long workpiece W are brought into contact with each other inside the second cylindrical portion 8 and the long workpiece W is subjected to plasma treatment, the electrical conductivity is increased. It is possible to suppress abnormal discharge between the long object to be processed W and the ring-shaped electrode 3, generate plasma stably, and have a long object to be electrically conductive. Plasma processing to W can be easily performed.

また、本発明のプラズマ処理装置1の第4実施形態について説明する。本発明の第4実施形態においては、図12に示すように、対向して配置され、それぞれ電源Pから電力を印加される平板状の上側電極10aおよび下側電極10bと、上側電極10aと下側電極10bとの間における、上側電極10aの下面に配置された絶縁板11と、長尺状の被処理物Wの搬送方向と平行に配置され、絶縁板11と下側電極10bとの間に所定の間隙12aを形成した状態で下側電極10b上に絶縁板11を支持する一対のスペーサー12と、絶縁板11と下側電極10bによって形成される間隙12aの間において、長尺状の被処理物Wをプラズマ密度が高い領域を進むようにガイドするガイド部5とを備える。   In addition, a fourth embodiment of the plasma processing apparatus 1 of the present invention will be described. In the fourth embodiment of the present invention, as shown in FIG. 12, flat upper electrode 10a and lower electrode 10b, which are arranged to face each other and to which power is applied from power source P, respectively, and upper electrode 10a and lower electrode are applied. Between the insulating plate 11 and the lower electrode 10b, the insulating plate 11 is arranged on the lower surface of the upper electrode 10a between the side electrode 10b and the insulating plate 11 and the lower electrode 10b. Between the pair of spacers 12 that support the insulating plate 11 on the lower electrode 10b and the gap 12a formed by the insulating plate 11 and the lower electrode 10b in a state where a predetermined gap 12a is formed on the long electrode 10b. And a guide unit 5 that guides the workpiece W so as to travel in a region where the plasma density is high.

また、上側電極10aには、プラズマ生成用ガスを導入するためのプラズマ生成用ガス導入口13が形成され、絶縁板11には、上側電極10aに形成されたプラズマ生成用ガス導入口13から導入されたプラズマ生成用ガスを絶縁板11と下側電極10bとの間に形成された間隙12aに噴出させるための複数のプラズマ生成用ガス噴出口14が間隙12aの内面側に開口している。   The upper electrode 10a is formed with a plasma generating gas inlet 13 for introducing a plasma generating gas, and the insulating plate 11 is introduced from the plasma generating gas inlet 13 formed in the upper electrode 10a. A plurality of plasma generation gas outlets 14 for injecting the generated plasma generation gas into the gap 12a formed between the insulating plate 11 and the lower electrode 10b are opened on the inner surface side of the gap 12a.

第4実施形態のプラズマ処理装置1においては、プラズマ生成用ガスを導入した状態で、上側電極10aおよび下側電極10bに対して電源Pから電力を印加することにより、誘導体バリア放電を生じさせて絶縁板11と下側電極10bとによって形成される間隙12a内にプラズマを生成するようにされている。   In the plasma processing apparatus 1 of the fourth embodiment, a dielectric barrier discharge is generated by applying power from the power source P to the upper electrode 10a and the lower electrode 10b with the plasma generation gas introduced. Plasma is generated in a gap 12a formed by the insulating plate 11 and the lower electrode 10b.

このような、第4実施形態のプラズマ処理装置1においては、上側電極10aと下側電極10bとが重なり合う範囲の中心付近に位置する間隙12a内の密度が高く、当該中心から外周方向に向かって徐々に密度が低くなるようなプラズマが形成される。   In the plasma processing apparatus 1 of the fourth embodiment as described above, the density in the gap 12a located near the center of the range where the upper electrode 10a and the lower electrode 10b overlap is high, and from the center toward the outer circumferential direction. Plasma is formed such that the density gradually decreases.

このため、ガイド部5は、図13(a)および(b)に示すように、長尺状の被処理物Wの搬送経路を形成する複数の円環状の保持部15aと、各保持部15aを間隙12a内の所定位置に固定する脚部15bとを有するガイド部材15からなり、長尺状の被処理物Wを当該プラズマの密度が高い領域を通過させるように絶縁板11と下側電極10bとが重なり合う範囲の長手方向(図13(a)における紙面方向左右)の中心であって、少なくとも、上側電極10aと下側電極10bとが重なり合う範囲の略中心付近に配置されている。   For this reason, as shown to Fig.13 (a) and (b), the guide part 5 has the some annular | circular shaped holding | maintenance part 15a which forms the conveyance path | route of the elongate to-be-processed object W, and each holding | maintenance part 15a. Of the insulating plate 11 and the lower electrode so as to allow the long workpiece W to pass through the region where the plasma density is high. 10b is located at the center in the longitudinal direction (left and right in the paper direction in FIG. 13A) of the overlapping range, and at least near the approximate center of the overlapping range of the upper electrode 10a and the lower electrode 10b.

なお、ガイド部材15は、本実施形態に限定されるものではなく、例えば、複数の丸形の貫通孔が形成された薄板、半月型の凹部が形成されたクシ状薄板もしくは、円管など様々な形状とすることができ、保持部15bについてもU字型、Y字型など長尺状の被処理物Wを保持できる形状であればよい。   The guide member 15 is not limited to this embodiment. For example, the guide member 15 may be a thin plate with a plurality of round through holes, a comb-like thin plate with a half-moon-shaped recess, or a circular tube. Any shape can be used as long as the holding portion 15b can hold a long workpiece W such as a U shape or a Y shape.

このような、本発明の第4実施形態のプラズマ処理装置1とすることにより、プラズマ密度にバラツキのあるプラズマを用いてプラズマ処理を施す場合においても、長尺状の被処理物Wの表面に対して、高密度のプラズマを接触させて高速なプラズマ処理を可能とする。   By using the plasma processing apparatus 1 according to the fourth embodiment of the present invention as described above, even when plasma processing is performed using plasma with variations in plasma density, the surface of the long workpiece W is applied to the surface. On the other hand, high-density plasma processing is possible by bringing high-density plasma into contact.

さらに、長尺状の被処理物Wを公知の回転装置を用いて、長尺状の被処理物Wの搬送方向軸回りにひねりを加えるように回転させながら搬送することで、長尺状の被処理物Wの表面に満遍なく均一な表面処理を施すことができる。   Furthermore, by using a known rotating device, the long workpiece W is transported while being rotated so as to be twisted around the conveyance direction axis of the long workpiece W, so that the long workpiece W A uniform and uniform surface treatment can be applied to the surface of the workpiece W.

また、本発明のプラズマ処理装置1を用いてプラズマ処理を施した長尺物は、染色剤や樹脂コーティング剤との親和性に極めて優れており、長尺物の表面に施した染色や樹脂コーティングの剥離の少ない釣り糸や繊維を提供することを可能とする。   Moreover, the long object which performed the plasma process using the plasma processing apparatus 1 of this invention is very excellent in affinity with a dyeing agent or a resin coating agent, and the dyeing | staining and resin coating which were given to the surface of the long object It is possible to provide fishing lines and fibers with less peeling.

<実施例2>
本発明の第4実施形態におけるプラズマ処理装置1を用いて、長尺状の被処理物Wに対してプラズマ処理を施すとともに、表面処理剤を塗布し、プラズマ処理による表面処理剤の耐摩耗効果の検討を行った。
<Example 2>
The plasma processing apparatus 1 according to the fourth embodiment of the present invention is used to perform plasma processing on the long workpiece W and to apply a surface treatment agent, so that the abrasion resistance effect of the surface treatment agent by the plasma treatment is applied. Was examined.

長尺状の被処理物Wには、直径0.33mmの円形断面のナイロンモノフィラメントを用いた。なお、プラズマ処理装置1における処理条件は、間隙12aが2mm、印加電圧35kV、周波数200Hz、プラズマ生成ガスとして酸素ガスを用い、長尺状の被処理物Wの搬送速度10m/minにてプラズマ処理を施した。また、表面処理剤として、アミノ変性シリコーン10%濃度のエマルジョン液(マーポシールコートEX−5G、松本油脂製薬株式会社製)を用いた。   As the long workpiece W, a nylon monofilament having a circular cross section with a diameter of 0.33 mm was used. The processing conditions in the plasma processing apparatus 1 are as follows: the gap 12a is 2 mm, the applied voltage is 35 kV, the frequency is 200 Hz, oxygen gas is used as the plasma generation gas, and the long workpiece W is transported at a speed of 10 m / min. Was given. Moreover, the emulsion liquid (Marposal coat EX-5G, Matsumoto Yushi Seiyaku Co., Ltd. product) of amino-modified silicone 10% density | concentration was used as a surface treating agent.

プラズマ処理後に表面改質剤を塗布したサンプルAおよびプラズマ処理を施さずに表面改質剤を塗布したサンプルBについて、釣り竿によるキャスティング試験を行い、0回、50回、100回および300回のキャスティング後におけるサンプルAおよびサンプルBへの純水の接触角を測定した結果を表3に示す。   Sample A with the surface modifier applied after the plasma treatment and Sample B with the surface modifier applied without the plasma treatment were subjected to a casting test with a fishing rod, and were cast 0, 50, 100, and 300 times. Table 3 shows the results of measuring the contact angle of pure water to sample A and sample B later.

Figure 0006089378
Figure 0006089378

表3に示すように、キャスティング試験0回のものは、サンプルAおよびサンプルBともに、接触角110°および接触角107°と、非常に優れた撥水性を示していた。これにより、サンプルAおよびサンプルBともに、撥水性樹脂からなる表面改質剤が長尺状の被処理物Wの表面に均一に塗布されていることがわかる。   As shown in Table 3, the samples with no casting test showed very excellent water repellency, with a contact angle of 110 ° and a contact angle of 107 °, for both Sample A and Sample B. Thereby, it can be seen that in both sample A and sample B, the surface modifier made of water-repellent resin is uniformly applied to the surface of the elongated workpiece W.

キャスティング試験後において、プラズマ処理後に表面改質剤を塗布したサンプルAについては、50回キャスティング後が94°、100回キャスティング後が90°、300回キャスティング後が94°とキャスティングを行うことによってわずかに撥水性が落ちたものの、優れた撥水性を保持していた。   After the casting test, Sample A, to which the surface modifier was applied after the plasma treatment, was slightly obtained by performing casting at 94 ° after 50 times casting, 90 ° after 100 times casting, and 94 ° after 300 times casting. Although the water repellency dropped, the water repellency was maintained.

また、プラズマ処理を施さずに表面改質剤を塗布したサンプルBについては、50回キャスティング後が62°、100回キャスティング後が62°、300回キャスティング後が60°となり、サンプルAと比較すると、大幅に撥水性が損なわれていることが分かる。   Sample B coated with the surface modifier without plasma treatment was 62 ° after 50 times casting, 62 ° after 100 times casting, and 60 ° after 300 times casting. It can be seen that the water repellency is greatly impaired.

この結果から、キャスティング時の摩擦によって長尺状の被処理物Wの表面に塗布した表面改質剤が摩耗もしくは剥離していることを示し、本発明のプラズマ処理装置1を用いて表面改質剤を塗布する前にプラズマ処理を施すことにより、長尺状の被処理物Wと表面改質剤との接着性が大幅に向上することが明らかとなった。   From this result, it is shown that the surface modifier applied to the surface of the long workpiece W is worn or peeled off due to friction during casting, and surface modification is performed using the plasma processing apparatus 1 of the present invention. It was revealed that the adhesiveness between the long workpiece W and the surface modifier is significantly improved by performing the plasma treatment before applying the agent.

また、プラズマ処理後に表面改質剤を塗布したサンプルAにおいては、キャスティング回数を重ねても糸の滑り感や撥水性が損なわれず、キャスト時の糸の放出感に優れるなどの良好な使用感も得られることがわかった。   In addition, in sample A in which the surface modifier is applied after the plasma treatment, even when casting is repeated, the feeling of slipping and water repellency of the yarn is not impaired, and a good feeling of use such as excellent yarn release feeling during casting is also obtained. It turns out that it is obtained.

なお、本発明のプラズマ処理装置は、第1実施形態乃至第4実施形態に限定されるものではなく、本発明の特徴を逸脱しない範囲において種々の変更が可能であり、例えば、第1実施形態および第2実施形態において、ガイド部材5aは円盤に複数の支持孔5cが形成された形状として説明を行っているが、第1筒状部2の内壁の円周部にセラミックス製のスネール型、ドックテール型またはループ型の既存の糸道ガイドを設置することにより長尺状の被処理物Wをガイドするように形成してもよい。   The plasma processing apparatus of the present invention is not limited to the first to fourth embodiments, and various modifications can be made without departing from the features of the present invention. For example, the first embodiment In the second embodiment, the guide member 5a is described as a shape in which a plurality of support holes 5c are formed in a disk. However, a ceramic snare type is provided on the circumferential portion of the inner wall of the first cylindrical portion 2. You may form so that the elongate to-be-processed object W may be guided by installing the existing thread path guide of a dock tail type or a loop type.

また、例えば、第4実施形態において、下側電極10bにプラズマ生成用ガス導入口13を形成し、下側電極10b側から間隙12aにプラズマ生成用ガスを導入するようにしてもよく、絶縁板11および下側電極10bの間隙12a側の内面にそれぞれプラズマ生成用ガスを導入するためのプラズマ生成用ガス導入口13を開口するように形成して、上側電極10aおよび下側電極10bの両側からプラズマ生成用ガスを導入するようにしてもよい。   Further, for example, in the fourth embodiment, the plasma generation gas inlet 13 may be formed in the lower electrode 10b, and the plasma generation gas may be introduced into the gap 12a from the lower electrode 10b side. 11 and the lower electrode 10b are formed so as to open plasma generating gas inlets 13 for introducing a plasma generating gas into the inner surface of the gap 12a side from both sides of the upper electrode 10a and the lower electrode 10b. A plasma generating gas may be introduced.

1 プラズマ処理装置
2 第1筒状部
2a 単位筒
3 リング状電極
4 プラズマ生成用ガス導入部
5 ガイド部
5a ガイド部材
5b 同心円
5c 支持孔
5d 貫通孔
6 絶縁管
7 導電材料
8 第2筒状部
9 連結部材
9a,9b、9c、9d 開口部
10a 上側電極
10b 下側電極
11 絶縁板
12 スペーサー
12a 間隙
13 プラズマ生成用ガス導入口
15 ガイド部材
15a 保持部
W 長尺状の被処理物
P 電源
DESCRIPTION OF SYMBOLS 1 Plasma processing apparatus 2 1st cylindrical part 2a Unit cylinder 3 Ring-shaped electrode 4 Plasma generation gas introduction part 5 Guide part 5a Guide member 5b Concentric circle 5c Support hole 5d Through-hole 6 Insulating tube 7 Conductive material 8 Second cylindrical part DESCRIPTION OF SYMBOLS 9 Connection member 9a, 9b, 9c, 9d Opening part 10a Upper electrode 10b Lower electrode 11 Insulating plate 12 Spacer 12a Gap 13 Plasma generating gas introduction port 15 Guide member 15a Holding part W Long-form to-be-processed object P Power supply

Claims (1)

対向して配置され、平面視において互いが重なり合う範囲の中心付近の密度が最も高く、外周方向に向かって徐々に密度が低くなるような密度分布とされたプラズマを発生させる平板状の上側電極および下側電極と、
前記上側電極と前記下側電極との間における前記上側電極の下面において、少なくとも前記上側電極の下面全面を覆うように配置された絶縁板と、
長尺状の被処理物の搬送方向と平行に配置され、前記絶縁板と前記下側電極との間に所定の間隙を形成した状態で前記下側電極上に前記絶縁板を支持する一対のスペーサーと、
前記間隙における前記プラズマの密度の高い領域であって、長尺状の被処理物の搬送方向における少なくとも中央部に設けられ、前記間隙において長尺状の被処理物をプラズマ密度が高い領域を進むようにガイドするガイド部とを備え、
前記上側電極と前記下側電極が対向する位置において、前記絶縁板および前記下側電極の前記間隙側の内面の少なくとも一方には、プラズマ生成用ガスを前記間隙に導入するためのプラズマ生成用ガス導入口が開口しており、
前記ガイド部は、長尺状の被処理物の搬送経路を形成する1つまたは複数の保持部を有し、
搬送される前記長尺状の被処理物に対して搬送方向軸回りのひねりを加えるように前記長尺状の被処理物を回転させる回転装置を備えることを特徴とするプラズマ処理装置。
A flat plate-like upper electrode that generates plasma having a density distribution that is disposed opposite to each other and has the highest density in the vicinity of the center of the overlapping range in plan view and gradually decreases in the outer circumferential direction; A lower electrode;
On the lower surface of the upper electrode between the upper electrode and the lower electrode, an insulating plate disposed so as to cover at least the entire lower surface of the upper electrode;
A pair of parallel plates disposed in parallel with the conveying direction of the long workpiece, and supporting the insulating plate on the lower electrode in a state where a predetermined gap is formed between the insulating plate and the lower electrode. Spacers,
The plasma has a high plasma density in the gap, and is provided at least in the center in the conveying direction of the long workpiece, and the long workpiece in the gap advances through the high plasma density region. And a guide portion for guiding
At a position where the upper electrode and the lower electrode face each other, at least one of the insulating plate and the inner surface on the gap side of the lower electrode, a plasma generating gas for introducing a plasma generating gas into the gap The inlet is open,
The guide portion may have a single or plurality of holders forming the conveying path of the elongated object to be processed,
A plasma processing apparatus, comprising: a rotating device that rotates the long workpiece to be twisted about a conveyance direction axis with respect to the long workpiece to be conveyed.
JP2015510973A 2013-04-08 2013-04-08 Plasma processing equipment Active JP6089378B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2013/060626 WO2014167626A1 (en) 2013-04-08 2013-04-08 Plasma treatment method, plastma treatment device and long plasma-treated object

Publications (2)

Publication Number Publication Date
JPWO2014167626A1 JPWO2014167626A1 (en) 2017-02-16
JP6089378B2 true JP6089378B2 (en) 2017-03-08

Family

ID=51689063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015510973A Active JP6089378B2 (en) 2013-04-08 2013-04-08 Plasma processing equipment

Country Status (4)

Country Link
US (1) US10192722B2 (en)
EP (1) EP2985074A4 (en)
JP (1) JP6089378B2 (en)
WO (1) WO2014167626A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6542053B2 (en) * 2015-07-15 2019-07-10 株式会社東芝 Plasma electrode structure and plasma induced flow generator
WO2017090270A1 (en) * 2015-11-24 2017-06-01 株式会社サンライン Thread and method for production of same
JP7021764B2 (en) * 2017-03-31 2022-02-17 株式会社サンライン fishing line
US10262836B2 (en) * 2017-04-28 2019-04-16 Seongsik Chang Energy-efficient plasma processes of generating free charges, ozone, and light
KR102183006B1 (en) * 2019-02-13 2020-11-25 경북대학교 산학협력단 Atmospheric pressure plasma device
CN111465160A (en) * 2020-05-14 2020-07-28 国网重庆市电力公司电力科学研究院 A plasma jet generating device and system
US12581586B2 (en) 2021-05-14 2026-03-17 Eli Lilly And Company Systems and methods for igniting plasma within tubes
KR20230051871A (en) 2021-10-12 2023-04-19 삼성전자주식회사 Substrate processing apparatus and method thereof

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3746858A (en) * 1971-12-21 1973-07-17 Us Agriculture Shrinkproofing of wool by low temperature plasma treatment
JPS5938323B2 (en) * 1977-03-26 1984-09-17 株式会社日立国際電気 Carbon fiber continuous heat treatment equipment
JPS6155430A (en) 1984-08-27 1986-03-19 Agency Of Ind Science & Technol Hybrid vibration suppressing method
US4625092A (en) * 1984-11-30 1986-11-25 Plasma Energy Corporation Plasma arc bulk air heating apparatus
JP2553361B2 (en) * 1987-09-14 1996-11-13 馨 岡本 Coated fishing line
JPH0718792Y2 (en) * 1990-08-27 1995-05-01 東レ株式会社 Yarn body plasma processing equipment
JPH04334543A (en) * 1991-05-07 1992-11-20 Masuhiro Kokoma Method and apparatus for atmospheric in-pipe pressure glow plasma reaction
JP3039060B2 (en) * 1991-11-27 2000-05-08 東レ株式会社 Method for producing polyhexamethylene adipamide fiber
JP3286816B2 (en) 1992-12-24 2002-05-27 イーシー化学株式会社 Atmospheric pressure glow discharge plasma treatment method
EP1115141A1 (en) * 2000-01-06 2001-07-11 TePla AG Method and device for the surface treatment of a filamentary body
US6417511B1 (en) * 2000-07-17 2002-07-09 Agilent Technologies, Inc. Ring pole ion guide apparatus, systems and method
JP4023302B2 (en) 2002-11-22 2007-12-19 松下電工株式会社 Plasma processing apparatus and plasma processing method
US20060219754A1 (en) 2005-03-31 2006-10-05 Horst Clauberg Bonding wire cleaning unit and method of wire bonding using same
JP2007162093A (en) 2005-12-15 2007-06-28 Dialight Japan Co Ltd Film deposition method and film deposition device practicing the same
US7411353B1 (en) * 2007-05-11 2008-08-12 Rutberg Alexander P Alternating current multi-phase plasma gas generator with annular electrodes
JP5274791B2 (en) 2007-06-11 2013-08-28 矢崎総業株式会社 Surface modification apparatus and surface modification method thereof
US9255330B2 (en) * 2010-07-09 2016-02-09 Vito Nv Method and device for atmospheric pressure plasma treatment
JP5946119B2 (en) 2011-10-28 2016-07-05 沖野 晃俊 Plasma processing method, plasma processing apparatus, and manufacturing method of long object

Also Published As

Publication number Publication date
WO2014167626A1 (en) 2014-10-16
EP2985074A1 (en) 2016-02-17
US10192722B2 (en) 2019-01-29
US20160071698A1 (en) 2016-03-10
JPWO2014167626A1 (en) 2017-02-16
EP2985074A4 (en) 2017-02-01

Similar Documents

Publication Publication Date Title
JP6089378B2 (en) Plasma processing equipment
US9205595B2 (en) Method and apparatus for treating an elongated object with plasma
US6083355A (en) Electrodes for plasma treater systems
US3600122A (en) Method of grafting ethylenically unsaturated monomer to a polymeric substrate
JP5946119B2 (en) Plasma processing method, plasma processing apparatus, and manufacturing method of long object
US20110308457A1 (en) Apparatus and method for treating an object
US4968918A (en) Apparatus for plasma treatment
US8227051B1 (en) Apparatus and method for carbon fiber surface treatment
JP6224139B2 (en) Plasma processing equipment
GB809273A (en) Manufacture of synthetic filaments
JP6190267B2 (en) Hydrophilic treatment equipment
WO2013027698A1 (en) Steam drawing device
US20030168009A1 (en) Plasma processing within low-dimension cavities
US8501278B2 (en) Method and apparatus for the treatment of individual filaments of a multifilament yarn
JP2011153365A (en) Continuously-plating method of fiber bundle, and continuously plating apparatus
CN113230904B (en) Continuous modification equipment and hydrophilic modification method for e-PTFE hollow fiber membrane yarn
JP2009535513A (en) Web seal device
CN114616373A (en) Fabric substrate with carbon-based coating and method of making the same
JP2012526194A (en) Apparatus and method for continuous electrolytic surface finishing of bars
EP3011082A1 (en) Apparatus for electrolytic or electrochemical action on wire
JP7302142B2 (en) Conductor softening device and conductor softening method
Oliveira et al. Surface modification on polyamide 6.6 with double barrier discharge (DBD) plasma to optimise dyeing process by direct dyes
JP2000204179A (en) Continuous plasma surface treatment method and apparatus for sheet-like material
Rosace et al. Influence of low‐temperature plasma conditions on wicking properties of PA/PU knitted fabric
US20050123681A1 (en) Method and apparatus for the treatment of individual filaments of a multifilament yarn

Legal Events

Date Code Title Description
TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20161115

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20161207

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20170120

R150 Certificate of patent or registration of utility model

Ref document number: 6089378

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250