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JP6127438B2 - Fluorinated ether composition, substrate having surface layer formed from the composition, and method for producing the same - Google Patents
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JP6127438B2 - Fluorinated ether composition, substrate having surface layer formed from the composition, and method for producing the same - Google Patents

Fluorinated ether composition, substrate having surface layer formed from the composition, and method for producing the same Download PDF

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JP6127438B2
JP6127438B2 JP2012227839A JP2012227839A JP6127438B2 JP 6127438 B2 JP6127438 B2 JP 6127438B2 JP 2012227839 A JP2012227839 A JP 2012227839A JP 2012227839 A JP2012227839 A JP 2012227839A JP 6127438 B2 JP6127438 B2 JP 6127438B2
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fluorine
compound
surface layer
containing ether
group
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JP2014080473A (en
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百紀 畑中
百紀 畑中
健二 石関
健二 石関
輝 磯部
輝 磯部
陽司 中島
陽司 中島
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AGC Inc
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Asahi Glass Co Ltd
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Description

本発明は、含フッ素エーテル組成物、該組成物から形成された表面層を有する基材およびその製造方法に関する。   The present invention relates to a fluorine-containing ether composition, a substrate having a surface layer formed from the composition, and a method for producing the same.

メガネレンズ、カメラレンズ、タッチパネル、家具等の基材の表面は、指紋、皮脂、汗、化粧品、食品等の汚れが付着しやすい。該汚れは、視認性や、操作性、見栄えに悪影響を及ぼす。そのため、基材の表面には、優れた撥水撥油性を有し、汚れが付着しにくく、付着しても容易に除去できるような防汚性が求められる。また、実際に使用することを鑑みると、基材の表面には防汚性と耐摩耗性も求められる。   Surfaces of base materials such as eyeglass lenses, camera lenses, touch panels, furniture, and the like are likely to be contaminated with fingerprints, sebum, sweat, cosmetics, foods, and the like. The dirt adversely affects visibility, operability, and appearance. Therefore, the surface of the base material is required to have antifouling properties that have excellent water and oil repellency, are less likely to adhere dirt, and can be easily removed even if attached. In consideration of actual use, the surface of the substrate is also required to have antifouling properties and wear resistance.

基材の表面に防汚性および耐摩耗性を付与する方法としては、下記の表面処理剤を用いて基材の表面に表面層を形成させる方法が知られている。
(i)ペルフルオロポリエーテル化合物、酸、水および有機溶媒を含む表面処理剤(特許文献1)。
(ii)数平均分子量が1,100のペルフルオロポリエーテル化合物を含む表面処理剤(特許文献2)。
As a method for imparting antifouling properties and wear resistance to the surface of a substrate, a method of forming a surface layer on the surface of the substrate using the following surface treatment agent is known.
(I) A surface treatment agent containing a perfluoropolyether compound, an acid, water and an organic solvent (Patent Document 1).
(Ii) A surface treatment agent containing a perfluoropolyether compound having a number average molecular weight of 1,100 (Patent Document 2).

国際公開第2002/030848号International Publication No. 2002/030848 国際公開第2009/008380号International Publication No. 2009/008380

しかし、前記(i)、(ii)の表面処理剤では、表面層の耐摩耗性が不充分な場合があった。   However, the surface treatment agents (i) and (ii) may have insufficient surface layer abrasion resistance.

本発明は、撥水撥油性、防汚性および耐摩耗性に優れた表面層を形成できる含フッ素エーテル組成物の提供を目的とする。
本発明は、撥水撥油性、防汚性および耐摩耗性に優れた表面層を有する基材、および該表面層を有する基材の製造方法の提供を目的とする。
An object of this invention is to provide the fluorine-containing ether composition which can form the surface layer excellent in water / oil repellency, antifouling property, and abrasion resistance.
An object of this invention is to provide the base material which has a surface layer excellent in water and oil repellency, antifouling property, and abrasion resistance, and the manufacturing method of the base material which has this surface layer.

本発明は、下記[1]〜[]の構成を有する含フッ素エーテル組成物、該組成物から形成された表面層を有する基材およびその製造方法、ならびにタッチパネルを提供する。
[1]下記含フッ素エーテル化合物(A1)、その部分加水分解縮合物(A2)、または前記含フッ素エーテル化合物(A1)と部分加水分解縮合物(A2)との混合物と、下記媒体(B)と、を含む含フッ素エーテル組成物。
含フッ素エーテル化合物(A1):ポリ(オキシペルフルオロアルキレン)鎖を主鎖に有し、かつ該主鎖の少なくとも一方の末端に加水分解性シリル基を有し、前記ポリ(オキシペルフルオロアルキレン)鎖と前記加水分解性シリル基とがアミド結合またはウレタン結合を有する連結基で結合され、前記加水分解性シリル基1つ当たりの数平均分子量が2,000以上である含フッ素エーテル化合物。
媒体(B):含フッ素有機溶媒と非フッ素系アルコールとを含み、含まれている溶媒のハンセン溶解度パラメータの極性項(dP)の体積平均値が2〜6、水素結合項(dH)の体積平均値が4〜12である媒体。
[2]前記含フッ素エーテル化合物(A1)が、下式(1)で表される化合物である、[1]の含フッ素エーテル組成物。
X−O−R−Y ・・・(1)
ただし、式(1)中の記号は下記の通りである。
:ポリ(オキシペルフルオロアルキレン)鎖。
X:炭素数1〜6のペルフルオロアルキル基またはY。
Y:下式(Y1)〜(Y3)のいずれかで表される基。
−Q−C(O)NH(CHn1−Si(Lm1(R3−m1 ・・・(Y1)
−Q−CHOC(O)NH(CHn2−Si(Lm2(R3−m2 ・・・(Y2)
−Q−C(O)N((CHn3−Si(Lm3(R3−m3 ・・・(Y3)
〜Q:2価の連結基。
〜L:加加水分解性基。
〜R:水素原子または1価の炭化水素基。
m1〜m3:1〜3の整数。
n1〜n3:1〜6の整数
The present invention provides a fluorinated ether composition having the following configurations [1] to [ 7 ], a substrate having a surface layer formed from the composition, a method for producing the same, and a touch panel.
[1] The following fluorinated ether compound (A1), a partially hydrolyzed condensate thereof (A2), or a mixture of the fluorinated ether compound (A1) and the partially hydrolyzed condensate (A2), and the following medium (B) And a fluorine-containing ether composition.
Fluorinated ether compound (A1): having a poly (oxyperfluoroalkylene) chain in the main chain, and having a hydrolyzable silyl group at least at one end of the main chain, A fluorine-containing ether compound in which the hydrolyzable silyl group is bonded to a linking group having an amide bond or a urethane bond, and the number average molecular weight per hydrolyzable silyl group is 2,000 or more.
Medium (B) : a fluorine- containing organic solvent and a non-fluorinated alcohol, the volume average value of the polar term (dP) of the Hansen solubility parameter of the contained solvent is 2 to 6, and the volume of the hydrogen bond term (dH) A medium having an average value of 4 to 12.
[2] The fluorine-containing ether composition according to [1], wherein the fluorine-containing ether compound (A1) is a compound represented by the following formula (1).
X-O- Rf- Y (1)
However, the symbols in formula (1) are as follows.
R f : poly (oxyperfluoroalkylene) chain.
X: C1-C6 perfluoroalkyl group or Y.
Y: a group represented by any one of the following formulas (Y1) to (Y3).
-Q 1 -C (O) NH ( CH 2) n1 -Si (L 1) m1 (R 1) 3-m1 ··· (Y1)
-Q 2 -CH 2 OC (O) NH (CH 2) n2 -Si (L 2) m2 (R 2) 3-m2 ··· (Y2)
-Q 3 -C (O) N ( (CH 2) n3 -Si (L 3) m3 (R 3) 3-m3) 2 ··· (Y3)
Q 1 to Q 3 : a divalent linking group.
L 1 to L 3 : hydrolyzable groups.
R 1 to R 3 : a hydrogen atom or a monovalent hydrocarbon group.
m1 to m3: an integer of 1 to 3.
n1 to n3: an integer of 1 to 6 .

]前記[1]または[2]の含フッ素エーテル組成物を基材の表面に塗布した後、前記媒体(B)を除去することを特徴とする、表面層を有する基材の製造方法。
]前記含フッ素エーテル組成物を前記基材の表面に塗布する方法が、スピンコート法、ワイプコート法、スプレーコート法、スキージーコート法、ディップコート法、ダイコート法、インクジェット法、フローコート法、ロールコート法、キャスト法、ラングミュア・ブロジェット法またはグラビアコート法である、[]の表面層を有する基材の製造方法。
]前記基材の材質が、金属、樹脂、ガラス、セラミック、石、またはこれらの複合材料である、[]または[]の表面層を有する基材の製造方法。
[ 3 ] A method for producing a substrate having a surface layer, wherein the medium (B) is removed after the fluorine-containing ether composition of [1] or [2] is applied to the surface of the substrate. .
[ 4 ] A method of applying the fluorine-containing ether composition to the surface of the substrate is a spin coating method, a wipe coating method, a spray coating method, a squeegee coating method, a dip coating method, a die coating method, an ink jet method, or a flow coating method. The manufacturing method of the base material which has a surface layer of [ 3 ] which is a roll coat method, a cast method, a Langmuir-Blodget method, or a gravure coat method.
[ 5 ] The method for producing a substrate having a surface layer of [ 3 ] or [ 4 ], wherein the material of the substrate is metal, resin, glass, ceramic, stone, or a composite material thereof.

]前記[1]または[2]の含フッ素エーテル組成物から形成されてなる表面層を有する基材。
]前記[1]または[2]の含フッ素エーテル組成物から形成されてなる表面層を入力面に有する、タッチパネル。
[ 6 ] A substrate having a surface layer formed from the fluorine-containing ether composition of [1] or [2] .
[ 7 ] A touch panel having a surface layer formed of the fluorine-containing ether composition of [1] or [2] on an input surface.

本発明の含フッ素エーテル組成物は、撥水撥油性、防汚性および耐摩耗性に優れた表面層を形成できる。
本発明の表面層を有する基材は、撥水撥油性、防汚性および耐摩耗性に優れた表面層を有している。
本発明の表面層を有する基材の製造方法によれば、撥水撥油性、防汚性および耐摩耗性に優れた表面層を有する基材を製造できる。
The fluorine-containing ether composition of the present invention can form a surface layer excellent in water / oil repellency, antifouling property and abrasion resistance.
The base material having the surface layer of the present invention has a surface layer excellent in water / oil repellency, antifouling property and abrasion resistance.
According to the method for producing a substrate having a surface layer of the present invention, a substrate having a surface layer excellent in water / oil repellency, antifouling property and abrasion resistance can be produced.

本明細書においては、式(1)で表される化合物を化合物(1)と記す。他の式で表される化合物も同様に記す。
本明細書においては、式(Y1)で表される基を基(Y1)と記す。他の式で表される基も同様に記す。
本発明における主鎖とは、該主鎖以外のすべての分子鎖が側鎖と見なされるような線状分子鎖である。
本発明における加水分解性シリル基とは、加水分解反応によってシラノール基(Si−OH)を形成し得る基である。
In the present specification, a compound represented by the formula (1) is referred to as a compound (1). The same applies to compounds represented by other formulas.
In this specification, a group represented by the formula (Y1) is referred to as a group (Y1). Groups represented by other formulas are also described in the same manner.
The main chain in the present invention is a linear molecular chain in which all molecular chains other than the main chain are regarded as side chains.
The hydrolyzable silyl group in the present invention is a group capable of forming a silanol group (Si—OH) by a hydrolysis reaction.

〔含フッ素エーテル組成物〕
本発明の含フッ素エーテル組成物は、含フッ素エーテル化合物(A1)、その部分加水分解縮合物(A2)、または前記含フッ素エーテル化合物(A1)と部分加水分解縮合物(A2)との混合物と、媒体(B)と、を含む。本発明の含フッ素エーテル組成物は、必要に応じて触媒(C)および他の添加剤(D)をさらに含んでいてもよい。
[Fluorine-containing ether composition]
The fluorinated ether composition of the present invention comprises a fluorinated ether compound (A1), a partially hydrolyzed condensate thereof (A2), or a mixture of the fluorinated ether compound (A1) and a partially hydrolyzed condensate (A2). And medium (B). The fluorine-containing ether composition of the present invention may further contain a catalyst (C) and other additives (D) as necessary.

(含フッ素エーテル化合物(A1))
含フッ素エーテル化合物(A1)は、ポリ(オキシペルフルオロアルキレン)鎖を主鎖に有し、かつ該主鎖の少なくとも一方の末端に加水分解性シリル基を有する。含フッ素エーテル化合物(A1)は、ポリ(オキシペルフルオロアルキレン)鎖を主鎖に有することによって、ポリ(オキシペルフルオロアルキレン)鎖を有さず、ペルフルオロアルキル基を有する従来のシラン化合物に比べて、基材上に撥水撥油性、防汚性および耐摩耗性に優れた表面層を形成できる。
含フッ素エーテル化合物(A1)は、単一化合物であってもよく、ポリ(オキシペルフルオロアルキレン)鎖、末端基、連結基等が異なる2種類以上の混合物であってもよい。
(Fluorine-containing ether compound (A1))
The fluorine-containing ether compound (A1) has a poly (oxyperfluoroalkylene) chain in the main chain, and has a hydrolyzable silyl group at at least one end of the main chain. The fluorine-containing ether compound (A1) has a poly (oxyperfluoroalkylene) chain in the main chain, and thus does not have a poly (oxyperfluoroalkylene) chain, but has a group compared to a conventional silane compound having a perfluoroalkyl group. A surface layer having excellent water and oil repellency, antifouling properties and abrasion resistance can be formed on the material.
The fluorine-containing ether compound (A1) may be a single compound, or may be a mixture of two or more different poly (oxyperfluoroalkylene) chains, terminal groups, linking groups and the like.

含フッ素エーテル化合物(A1)は、主鎖の一方の末端のみに加水分解性シリル基を有していてもよく、主鎖の両方の末端に加水分解性シリル基を有していてもよい。表面層に防汚性および耐摩耗性を充分に付与する点からは、主鎖の一方の末端のみに加水分解性シリル基を有することが好ましい。
含フッ素エーテル化合物(A1)が有する加水分解性シリル基は、後述するように基材表面の水酸基と化学結合を形成できる。含フッ素エーテル化合物(A1)が主鎖の一方の末端のみに加水分解性シリル基を有する場合、含フッ素エーテル化合物(A1)は該末端のみで基材と結合する。一方、含フッ素エーテル化合物(A1)が主鎖の両方の末端に加水分解性シリル基を有する場合、含フッ素エーテル化合物(A1)は両方の末端で基材と結合する。これにより、主鎖の一方の末端のみに加水分解性シリル基を有する含フッ素エーテル化合物(A1)から形成された表面層中のポリ(オキシペルフルオロアルキレン)鎖は、主鎖の両方の末端に加水分解性シリル基を有する含フッ素エーテル化合物(A1)から形成された表面層中のポリ(オキシペルフルオロアルキレン)鎖に比べて基材上で動きやすい。そのため、主鎖の一方の末端のみに加水分解性シリル基を有する含フッ素エーテル化合物(A1)を用いて形成した表面層は、表面が摩耗されてもその力を効率的に逃がすことができ、耐摩耗性に優れる。
The fluorine-containing ether compound (A1) may have a hydrolyzable silyl group only at one end of the main chain, or may have a hydrolyzable silyl group at both ends of the main chain. From the viewpoint of sufficiently imparting antifouling properties and abrasion resistance to the surface layer, it is preferable to have a hydrolyzable silyl group only at one end of the main chain.
The hydrolyzable silyl group possessed by the fluorine-containing ether compound (A1) can form a chemical bond with the hydroxyl group on the surface of the substrate as described later. When the fluorinated ether compound (A1) has a hydrolyzable silyl group only at one end of the main chain, the fluorinated ether compound (A1) binds to the substrate only at the end. On the other hand, when the fluorine-containing ether compound (A1) has hydrolyzable silyl groups at both ends of the main chain, the fluorine-containing ether compound (A1) binds to the substrate at both ends. As a result, the poly (oxyperfluoroalkylene) chain in the surface layer formed from the fluorine-containing ether compound (A1) having a hydrolyzable silyl group only at one end of the main chain is hydrolyzed at both ends of the main chain. Compared with the poly (oxyperfluoroalkylene) chain in the surface layer formed from the fluorine-containing ether compound (A1) having a decomposable silyl group, it is easy to move on the substrate. Therefore, the surface layer formed using the fluorine-containing ether compound (A1) having a hydrolyzable silyl group only at one end of the main chain can efficiently release the force even when the surface is worn, Excellent wear resistance.

含フッ素エーテル化合物(A1)のポリ(オキシペルフルオロアルキレン)鎖によって、表面層に撥水撥油性が付与され、良好な防汚性が得られる。
ポリ(オキシペルフルオロアルキレン)鎖としては、1種のオキシペルフルオロアルキレン単位のみから構成されていてもよく、炭素数の異なる2種以上のオキシペルフルオロアルキレン単位から構成されていてもよい。
The poly (oxyperfluoroalkylene) chain of the fluorinated ether compound (A1) imparts water / oil repellency to the surface layer and provides good antifouling properties.
The poly (oxyperfluoroalkylene) chain may be composed of only one oxyperfluoroalkylene unit, or may be composed of two or more oxyperfluoroalkylene units having different carbon numbers.

オキシペルフルオロアルキレン単位は、側鎖がなくてもよく、側鎖があってもよい。オキシペルフルオロアルキレン単位としては、表面層に防汚性および耐摩耗性を充分に付与する点からは、炭素数1〜10のオキシペルフルオロアルキレン単位が好ましく、炭素数1〜6のオキシペルフルオロアルキレン単位がより好ましく、炭素数1〜4のオキシペルフルオロアルキレン単位が特に好ましい。   The oxyperfluoroalkylene unit may have no side chain or may have a side chain. As the oxyperfluoroalkylene unit, an oxyperfluoroalkylene unit having 1 to 10 carbon atoms is preferable, and an oxyperfluoroalkylene unit having 1 to 6 carbon atoms is preferable from the viewpoint of sufficiently imparting antifouling properties and abrasion resistance to the surface layer. More preferred is an oxyperfluoroalkylene unit having 1 to 4 carbon atoms.

含フッ素エーテル化合物(A1)は、末端にペルフルオロアルキル基を有すると、表面層における撥水撥油性が特に優れる。
含フッ素エーテル化合物(A1)としては、ポリ(オキシペルフルオロアルキレン)鎖の一端に、酸素原子を介して炭素数1〜6のペルフルオロアルキル基が結合し、ポリ(オキシペルフルオロアルキレン)鎖の他端に、連結基を介して加水分解性シリル基が結合している化合物が好ましい。該化合物から形成された表面層は、より防汚性および耐摩耗性に優れる。
When the fluorine-containing ether compound (A1) has a perfluoroalkyl group at the terminal, the water and oil repellency in the surface layer is particularly excellent.
As the fluorine-containing ether compound (A1), a perfluoroalkyl group having 1 to 6 carbon atoms is bonded to one end of a poly (oxyperfluoroalkylene) chain via an oxygen atom, and the other end of the poly (oxyperfluoroalkylene) chain. A compound in which a hydrolyzable silyl group is bonded via a linking group is preferred. The surface layer formed from the compound is more excellent in antifouling property and wear resistance.

ポリ(オキシペルフルオロアルキレン)鎖と加水分解性シリル基とは、アミド結合またはウレタン結合を有する連結基で結合される。含フッ素エーテル化合物(A1)では、ポリ(オキシペルフルオロアルキレン)鎖と加水分解性シリル基とがアミド結合を有する連結基で結合されることが好ましい。該連結基と媒体(B)との組み合わせにより、加水分解性シリル基と基材とが接触しやすくなり、得られる表面層の耐摩耗性が良好になる。   The poly (oxyperfluoroalkylene) chain and the hydrolyzable silyl group are bonded by a linking group having an amide bond or a urethane bond. In the fluorinated ether compound (A1), it is preferable that the poly (oxyperfluoroalkylene) chain and the hydrolyzable silyl group are bonded with a linking group having an amide bond. The combination of the linking group and the medium (B) facilitates contact between the hydrolyzable silyl group and the substrate, and the resulting surface layer has good wear resistance.

含フッ素エーテル化合物(A1)の加水分解性シリル基1つ当たりの数平均分子量(Mn)は、2,000以上である。具体的には、主鎖の一方の末端のみに加水分解性シリル基を有する含フッ素エーテル化合物(A1)の場合、該含フッ素エーテル化合物(A1)の数平均分子量(Mn)は、2,000以上である。主鎖の両方の末端に加水分解性シリル基を有する含フッ素エーテル化合物(A1)の場合、該含フッ素エーテル化合物(A1)の数平均分子量(Mn)は、4,000以上である。
前記加水分解性シリル基1つ当たりの数平均分子量(Mn)が前記下限値以上であれば、防汚性および耐摩耗性に優れた表面層を形成しやすい。
The number average molecular weight (Mn) per hydrolyzable silyl group of the fluorine-containing ether compound (A1) is 2,000 or more. Specifically, in the case of the fluorinated ether compound (A1) having a hydrolyzable silyl group only at one end of the main chain, the number average molecular weight (Mn) of the fluorinated ether compound (A1) is 2,000. That's it. In the case of the fluorinated ether compound (A1) having hydrolyzable silyl groups at both ends of the main chain, the number average molecular weight (Mn) of the fluorinated ether compound (A1) is 4,000 or more.
When the number average molecular weight (Mn) per one hydrolyzable silyl group is not less than the lower limit, a surface layer excellent in antifouling properties and wear resistance can be easily formed.

含フッ素エーテル化合物(A1)の加水分解性シリル基1つ当たりの数平均分子量(Mn)は、2,000〜10,000が好ましく、2,000〜7,000がより好ましく、3,000〜5,000が特に好ましい。なお、前記加水分解性シリル基1つ当たりの数平均分子量(Mn)が上限値以下であれば、表面層の外観に優れ、カバーガラスなど、電子部材の最表面や、各種物品の表面に使用した際、視界が良好となり、操作性、意匠性が良くなる。
本発明における含フッ素エーテル化合物の数平均分子量(Mn)は、特開2001−208736号公報に記載の方法に従い、ゲルパーミエーションクロマトグラフィ(以下、「GPC」と記す。)によって測定される。
The number average molecular weight (Mn) per hydrolyzable silyl group of the fluorine-containing ether compound (A1) is preferably 2,000 to 10,000, more preferably 2,000 to 7,000, and 3,000 to 5,000 is particularly preferred. In addition, if the number average molecular weight (Mn) per one hydrolyzable silyl group is not more than the upper limit value, the appearance of the surface layer is excellent, and it is used on the outermost surface of electronic members such as cover glass and the surface of various articles. When this is done, the field of view is improved and the operability and design are improved.
The number average molecular weight (Mn) of the fluorinated ether compound in the present invention is measured by gel permeation chromatography (hereinafter referred to as “GPC”) according to the method described in JP-A No. 2001-208736.

含フッ素エーテル化合物(A1)は、公知の含フッ素エーテル化合物と同様の方法で製造できる。たとえば、主鎖の末端にアリル基を有する含フッ素エーテル化合物である前駆体を製造し、該前駆体をヒドロシリル化して末端に加水分解性シリル基を導入する方法が挙げられる。また、主鎖の末端にエステル基を有する含フッ素エーテル化合物である前駆体を製造し、該前駆体にアミノ基と加水分解性シリル基とを有する化合物を反応させる方法が挙げられる。   The fluorine-containing ether compound (A1) can be produced by the same method as known fluorine-containing ether compounds. For example, a method of producing a precursor which is a fluorine-containing ether compound having an allyl group at the terminal of the main chain, hydrosilylating the precursor and introducing a hydrolyzable silyl group at the terminal can be mentioned. Moreover, the method of manufacturing the precursor which is a fluorine-containing ether compound which has an ester group at the terminal of a principal chain, and making this precursor react with the compound which has an amino group and a hydrolyzable silyl group is mentioned.

含フッ素エーテル化合物(A1)としては、化合物(1)が好ましい。
X−O−R−Y ・・・(1)
ただし、式(1)中の記号は下記の通りである。
:ポリ(オキシペルフルオロアルキレン)鎖。
X:炭素数1〜6のペルフルオロアルキル基またはY。
Y:基(Y1)〜(Y3)のいずれか。
−Q−C(O)NH(CHn1−Si(Lm1(R3−m1 ・・・(Y1)
−Q−CHOC(O)NH(CHn2−Si(Lm2(R3−m2 ・・・(Y2)
−Q−C(O)N((CHn3−Si(Lm3(R3−m3 ・・・(Y3)
〜Q:2価の連結基。
〜L:加水分解性基。
〜R:水素原子または1価の炭化水素基。
m1〜m3:1〜3の整数。
n1〜n3:1〜6の整数。
As the fluorine-containing ether compound (A1), the compound (1) is preferable.
X-O- Rf- Y (1)
However, the symbols in formula (1) are as follows.
R f : poly (oxyperfluoroalkylene) chain.
X: C1-C6 perfluoroalkyl group or Y.
Y: any one of groups (Y1) to (Y3).
-Q 1 -C (O) NH ( CH 2) n1 -Si (L 1) m1 (R 1) 3-m1 ··· (Y1)
-Q 2 -CH 2 OC (O) NH (CH 2) n2 -Si (L 2) m2 (R 2) 3-m2 ··· (Y2)
-Q 3 -C (O) N ( (CH 2) n3 -Si (L 3) m3 (R 3) 3-m3) 2 ··· (Y3)
Q 1 to Q 3 : a divalent linking group.
L 1 to L 3 : hydrolyzable groups.
R 1 to R 3 : a hydrogen atom or a monovalent hydrocarbon group.
m1 to m3: an integer of 1 to 3.
n1 to n3: an integer of 1 to 6.

は、1種のオキシペルフルオロアルキレン単位のみから構成されていてもよく、炭素数の異なる2種以上のオキシペルフルオロアルキレン単位から構成されていてもよい。
オキシペルフルオロアルキレン単位の具体例としては、下記の単位が挙げられる。
(CFO)、
(CFCFO)、
(CFCFCFO)、
(CF(CF)CFO)、
(CFCFCFCFO)等。
R f may be composed of only one oxyperfluoroalkylene unit, or may be composed of two or more oxyperfluoroalkylene units having different carbon numbers.
Specific examples of the oxyperfluoroalkylene unit include the following units.
(CF 2 O),
(CF 2 CF 2 O),
(CF 2 CF 2 CF 2 O),
(CF (CF 3 ) CF 2 O),
(CF 2 CF 2 CF 2 CF 2 O) and the like.

としては、Xが炭素数1〜6のペルフルオロアルキル基の場合、表面層に防汚性および耐摩耗性を充分に付与する点から、下式(2)で表される分子鎖が好ましい。
−(CFCFO)(CFCFCFCFO)− ・・・(2)
As R f , when X is a perfluoroalkyl group having 1 to 6 carbon atoms, a molecular chain represented by the following formula (2) is preferable from the viewpoint of sufficiently imparting antifouling property and wear resistance to the surface layer. .
- (CF 2 CF 2 O) d (CF 2 CF 2 CF 2 CF 2 O) e - ··· (2)

ただし、dは、0以上の整数であり、eは、0以上の整数であり、d+eは、5〜15の整数である。なお、(CFCFO)単位および(CFCFCFCFO)単位の結合順序は限定されない。すなわち、(CFCFO)単位および(CFCFCFCFO)単位がランダムに配置されてもよく、(CFCFO)単位と(CFCFCFCFO)単位とが交互に配置されてもよく、複数の単位からなるブロックの2以上が連結してもよい。 However, d is an integer greater than or equal to 0, e is an integer greater than or equal to 0, and d + e is an integer of 5-15. Note that the bonding order of the (CF 2 CF 2 O) unit and the (CF 2 CF 2 CF 2 CF 2 O) unit is not limited. That is, the (CF 2 CF 2 O) unit and the (CF 2 CF 2 CF 2 CF 2 O) unit may be arranged at random, and the (CF 2 CF 2 O) unit and the (CF 2 CF 2 CF 2 CF 2). O) Units may be arranged alternately, and two or more blocks composed of a plurality of units may be connected.

としては、XがYの場合、表面層に防汚性および耐摩耗性を充分に付与する点から、下式(3)で表される分子鎖が好ましい。
−(CFCFO)(CFO)− ・・・(3)
ただし、fは、0以上の整数であり、hは、0以上の整数であり、f+hは、5〜25の整数である。なお、(CFCFO)単位および(CFO)単位の結合順序は限定されない。すなわち、(CFCFO)単位および(CFO)単位がランダムに配置されてもよく、(CFCFO)単位と(CFO)単位とが交互に配置されてもよく、複数の単位からなるブロックの2以上が連結してもよい。
As R f , when X is Y, a molecular chain represented by the following formula (3) is preferable from the viewpoint of sufficiently imparting antifouling properties and wear resistance to the surface layer.
- (CF 2 CF 2 O) f (CF 2 O) h - ··· (3)
However, f is an integer greater than or equal to 0, h is an integer greater than or equal to 0, and f + h is an integer of 5-25. Incidentally, the order of linking (CF 2 CF 2 O) units and (CF 2 O) units is not limited. That is, (CF 2 CF 2 O) units and (CF 2 O) units may be randomly arranged, and (CF 2 CF 2 O) units and (CF 2 O) units may be alternately arranged. Two or more blocks composed of a plurality of units may be connected.

Xとしては、表面層に防汚性および耐摩耗性を充分に付与する点からは、炭素数1〜6のペルフルオロアルキル基が好ましい。ペルフルオロアルキル基は、直鎖状であってもよく、分岐状であってもよい。   X is preferably a C 1-6 perfluoroalkyl group from the viewpoint of sufficiently imparting antifouling properties and abrasion resistance to the surface layer. The perfluoroalkyl group may be linear or branched.

Xのペルフルオロアルキル基の具体例としては、下記の基が挙げられる。
CF−、
CFCF−、
CF(CF−、
CF(CF−、
CF(CF−、
CF(CF−、
CFCF(CF)−等。
Specific examples of the perfluoroalkyl group of X include the following groups.
CF 3 −,
CF 3 CF 2- ,
CF 3 (CF 2 ) 2 −,
CF 3 (CF 2 ) 3 −,
CF 3 (CF 2 ) 4 −,
CF 3 (CF 2 ) 5- ,
CF 3 CF (CF 3) - and the like.

Xとしては、表面層に耐摩擦性および防汚性を充分に付与する点からは、下記の基が好ましい。
CF−、
CFCF−、
CF(CF−。
X is preferably the following group from the viewpoint of sufficiently imparting friction resistance and antifouling property to the surface layer.
CF 3 −,
CF 3 CF 2- ,
CF 3 (CF 2) 2 - .

Yは、基(Y1)〜(Y3)のいずれかである。
Yとしては、含フッ素エーテル組成物の貯蔵安定性、ならびに表面層の防汚性および外観が良好となる点からは、基(Y1)または基(Y2)が好ましく、基(Y1)が特に好ましい。
化合物(1)中にYが2つある場合、すなわちXがYの場合、2つのYは同一であってもよく、異なっていてもよい。
Y is any one of groups (Y1) to (Y3).
Y is preferably a group (Y1) or a group (Y2), particularly preferably a group (Y1), from the viewpoint of improving the storage stability of the fluorine-containing ether composition and the antifouling property and appearance of the surface layer. .
When two Y are present in the compound (1), that is, when X is Y, the two Ys may be the same or different.

〜Qとしては、表面層の防汚性が良好となる点からは、炭素数1〜20のペルフルオロアルキレン基が好ましく、炭素数1〜3のペルフルオロアルキレン基が特に好ましい。 The Q 1 to Q 3, from the viewpoint of antifouling property of the surface layer becomes good is preferably a perfluoroalkylene group having 1 to 20 carbon atoms, particularly preferably a perfluoroalkylene group having 1 to 3 carbon atoms.

〜Lは加水分解性基である。
加水分解性基は、加水分解反応により水酸基となる基である。化合物(1)およびその部分加水分解縮合物の末端のSi−L(Si−L、Si−Lも同様。)は、加水分解反応によりシラノール基(Si−OH)となる。シラノール基は、さらに分子間で縮合反応してSi−O−Si結合を形成する。また、シラノール基は、基材の表面の水酸基(基材−OH)と脱水縮合反応して、化学結合(基材−O−Si)を形成する。化合物(1)は、末端に加水分解性シリル基を有するため、基材との反応性が良好であり、基材の表面に撥水撥油性を付与できる。
L 1 to L 3 are hydrolyzable groups.
The hydrolyzable group is a group that becomes a hydroxyl group by a hydrolysis reaction. Compound (1) and Si-L 1 at the end of the partially hydrolyzed condensate thereof (the same applies to Si-L 2 and Si-L 3 ) become silanol groups (Si-OH) by hydrolysis reaction. The silanol group further undergoes a condensation reaction between molecules to form a Si—O—Si bond. Further, the silanol group undergoes a dehydration condensation reaction with a hydroxyl group (base material-OH) on the surface of the base material to form a chemical bond (base material-O-Si). Since the compound (1) has a hydrolyzable silyl group at the terminal, the reactivity with the base material is good, and water and oil repellency can be imparted to the surface of the base material.

〜Lとしては、アルコキシ基、ハロゲン原子、アシル基、イソシアナート基(−NCO)、アミノ基等が挙げられる。
〜Lとしては、工業的な製造が容易な点から、炭素数1〜4のアルコキシ基またはハロゲン原子が好ましい。ハロゲン原子としては、塩素原子が特に好ましい。L〜Lとしては、化合物(1)の貯蔵安定性に優れる点から、炭素数1〜4のアルコキシ基が好ましい。また、化合物(1)の長期の貯蔵安定性が必要な場合には、L〜Lはエトキシ基が特に好ましい。含フッ素エーテル組成物の塗布後の反応時間を短時間とする場合には、L〜Lはメトキシ基が特に好ましい。
Examples of L 1 to L 3 include an alkoxy group, a halogen atom, an acyl group, an isocyanate group (—NCO), and an amino group.
L 1 to L 3 are preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom from the viewpoint of easy industrial production. As the halogen atom, a chlorine atom is particularly preferable. As L < 1 > -L < 3 >, a C1-C4 alkoxy group is preferable from the point which is excellent in the storage stability of a compound (1). Further, if necessary long-term storage stability of the compound (1) is, L 1 ~L 3 is an ethoxy group is particularly preferred. When the reaction time after application of the fluorine-containing ether composition is short, L 1 to L 3 are particularly preferably methoxy groups.

〜Rは水素原子または1価の炭化水素基である。1価の炭化水素基としては、アルキル基、シクロアルキル基、アルケニル基、アリル基等が挙げられる。
〜Rとしては、1価の炭化水素基が好ましく、1価の飽和炭化水素基が特に好ましい。1価の飽和炭化水素基の炭素数は、合成が簡便である点から、1〜6が好ましく、1〜3がより好ましく、1〜2が特に好ましい。
R 1 to R 3 are a hydrogen atom or a monovalent hydrocarbon group. Examples of the monovalent hydrocarbon group include an alkyl group, a cycloalkyl group, an alkenyl group, and an allyl group.
As R < 1 > -R < 3 >, a monovalent hydrocarbon group is preferable and a monovalent saturated hydrocarbon group is particularly preferable. The number of carbon atoms of the monovalent saturated hydrocarbon group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 to 2 from the viewpoint of easy synthesis.

m1〜m3は2または3が好ましく、3が特に好ましい。化合物(1)の分子中にL〜Lが複数存在することによって、表面層と基材の表面との反応性が良好になる。
m1〜m3が2以上である場合、化合物(1)の1分子中に存在する複数のL〜Lは互いに同じであってもよく、異なっていてもよい。原料の入手容易性や製造容易性の点からは、化合物(1)の1分子中に存在する複数のL〜Lは、互いに同じであることが好ましい。
n1〜n3は2〜4の整数が好ましく、2または3が特に好ましい。
m1 to m3 are preferably 2 or 3, and particularly preferably 3. The presence of a plurality of L 1 to L 3 in the molecule of compound (1) improves the reactivity between the surface layer and the surface of the substrate.
When m1 to m3 are 2 or more, the plurality of L 1 to L 3 present in one molecule of the compound (1) may be the same as or different from each other. From the viewpoint of availability of raw materials and ease of production, the plurality of L 1 to L 3 present in one molecule of the compound (1) are preferably the same as each other.
n1 to n3 are preferably an integer of 2 to 4, and 2 or 3 is particularly preferable.

加水分解性シリル基(−Si(Lm1(R3−m1、−Si(Lm2(R3−m2、−Si(Lm3(R3−m3)としては、−Si(OCH、−SiCH(OCH、−Si(OCHCH、−SiCl、−SiCHCl、−Si(OCOCH、−Si(NCO)が好ましい。工業的な製造における取扱いやすさの点から、加水分解性シリル基は−Si(OCHが特に好ましい。 Hydrolyzable silyl group (-Si (L 1) m1 ( R 1) 3-m1, -Si (L 2) m2 (R 2) 3-m2, -Si (L 3) m3 (R 3) 3-m3 ) Include —Si (OCH 3 ) 3 , —SiCH 3 (OCH 3 ) 2 , —Si (OCH 2 CH 3 ) 3 , —SiCl 3 , —SiCH 3 Cl 2 , —Si (OCOCH 3 ) 3 , — Si (NCO) 3 is preferred. From the viewpoint of ease of handling in industrial production, the hydrolyzable silyl group is particularly preferably —Si (OCH 3 ) 3 .

(部分加水分解縮合物(A2))
部分加水分解縮合物(A2)は、含フッ素エーテル化合物(A1)中の加水分解性シリル基の加水分解性基(L〜L)の一部が加水分解反応することによって形成されたシラノール基(Si−OH)が、分子間で脱水縮合反応して形成されるオリゴマーである。部分加水分解縮合物(A2)中には、少なくとも1つの加水分解性基またはその加水分解により生じた水酸基が存在している。
(Partial hydrolysis condensate (A2))
The partially hydrolyzed condensate (A2) is a silanol formed by hydrolyzing a part of the hydrolyzable groups (L 1 to L 3 ) of the hydrolyzable silyl group in the fluorine-containing ether compound (A1). The group (Si—OH) is an oligomer formed by dehydration condensation reaction between molecules. In the partial hydrolysis-condensation product (A2), at least one hydrolyzable group or a hydroxyl group generated by the hydrolysis is present.

部分加水分解縮合物(A2)は、水および触媒の存在下、含フッ素エーテル化合物(A1)の加水分解性基の一部を加水分解することによって得られる。
触媒としては、酸触媒または塩基触媒等が挙げられる。また、触媒としては、無機触媒または有機触媒等が挙げられる。無機酸触媒としては、塩酸、硝酸等が挙げられる。有機酸触媒としては、カルボキシ基を有する化合物、スルホ基を有する化合物(p−トルエンスルホン酸等。)等が挙げられる。無機塩基触媒としては、アンモニア等が挙げられる。有機塩基触媒としては、フェニルアミン等が挙げられる。
The partial hydrolysis-condensation product (A2) is obtained by hydrolyzing a part of the hydrolyzable group of the fluorine-containing ether compound (A1) in the presence of water and a catalyst.
Examples of the catalyst include an acid catalyst and a base catalyst. Examples of the catalyst include inorganic catalysts and organic catalysts. Examples of the inorganic acid catalyst include hydrochloric acid and nitric acid. Examples of the organic acid catalyst include a compound having a carboxy group, a compound having a sulfo group (p-toluenesulfonic acid, etc.) and the like. Examples of the inorganic base catalyst include ammonia. Examples of the organic base catalyst include phenylamine.

加水分解に用いる水の量は、含フッ素エーテル化合物(A1)が有する加水分解性基に対し、モル換算で0.1〜3倍が好ましい。水の量が下限値以上であれば、含フッ素エーテル化合物(A1)の部分加水分解が充分に進行する。水の量が上限値以下であれば、含フッ素エーテル化合物(A1)およびその部分加水分解縮合物(A2)と、水とが相分離しにくい。
加水分解性基の加水分解は、有機溶媒中で行うことが好ましい。有機溶媒としては、メタノール等のアルコール系有機溶媒が好ましい。
The amount of water used for hydrolysis is preferably 0.1 to 3 times in terms of moles relative to the hydrolyzable group of the fluorine-containing ether compound (A1). If the amount of water is not less than the lower limit, partial hydrolysis of the fluorine-containing ether compound (A1) proceeds sufficiently. If the amount of water is less than or equal to the upper limit, the fluorine-containing ether compound (A1) and its partially hydrolyzed condensate (A2) and water are difficult to phase separate.
The hydrolysis of the hydrolyzable group is preferably performed in an organic solvent. As the organic solvent, alcohol-based organic solvents such as methanol are preferable.

(媒体(B))
媒体(B)は、少なくとも含フッ素有機溶媒を含む。含フッ素有機溶媒とは、分子内にフッ素原子を有する有機溶媒である。媒体(B)が含フッ素有機溶媒を含むことで、含フッ素エーテル組成物において、含フッ素エーテル化合物(A1)または部分加水分解縮合物(A2)が均一に溶解しやすくなる。
媒体(B)に含まれている溶媒のハンセン溶解度パラメータの極性項(dP)の体積平均値は、2〜6である。具体的には、媒体(B)が1種の含フッ素有機溶媒の場合、該含フッ素有機溶媒のハンセン溶解度パラメータの極性項(dP)が2〜6の範囲内である。媒体(B)が2種以上の溶媒を含む場合、各々の溶媒のハンセン溶解度パラメータの極性項(dP)を体積平均した値が2〜6の範囲内である。
媒体(B)に含まれている溶媒のハンセン溶解度パラメータの極性項(dP)の体積平均値は、3〜6が特に好ましい。前記極性項(dP)の体積平均値が前記範囲内であれば、防汚性および耐摩耗性に優れた表面層を形成しやすい。
媒体(B)に含まれている溶媒のハンセン溶解度パラメータの水素結合項(dH)の体積平均値は、4〜12である。具体的には、媒体(B)が1種の含フッ素有機溶媒の場合、該含フッ素有機溶媒のハンセン溶解度パラメータの水素結合項(dH)が4〜12の範囲内である。媒体(B)が2種以上の溶媒を含む場合、各々の溶媒のハンセン溶解度パラメータの水素結合項(dH)を体積平均した値が4〜12の範囲内である。
媒体(B)に含まれている溶媒のハンセン溶解度パラメータの水素結合項(dH)の体積平均値は、7〜12が特に好ましい。前記水素結合項(dH)の体積平均値が前記範囲内であれば、防汚性および耐摩耗性に優れた表面層を形成しやすい。
(Medium (B))
The medium (B) contains at least a fluorine-containing organic solvent. The fluorine-containing organic solvent is an organic solvent having a fluorine atom in the molecule. When the medium (B) contains the fluorine-containing organic solvent, the fluorine-containing ether compound (A1) or the partial hydrolysis-condensation product (A2) is easily dissolved uniformly in the fluorine-containing ether composition.
The volume average value of the polar term (dP) of the Hansen solubility parameter of the solvent contained in the medium (B) is 2-6. Specifically, when the medium (B) is one kind of fluorine-containing organic solvent, the polar term (dP) of the Hansen solubility parameter of the fluorine-containing organic solvent is in the range of 2-6. When the medium (B) contains two or more solvents, the volume average value of the polar terms (dP) of the Hansen solubility parameter of each solvent is in the range of 2-6.
The volume average value of the polar term (dP) of the Hansen solubility parameter of the solvent contained in the medium (B) is particularly preferably from 3 to 6. When the volume average value of the polar term (dP) is within the above range, it is easy to form a surface layer excellent in antifouling property and wear resistance.
The volume average value of the hydrogen bond term (dH) of the Hansen solubility parameter of the solvent contained in the medium (B) is 4 to 12. Specifically, when the medium (B) is one kind of fluorine-containing organic solvent, the hydrogen bond term (dH) of the Hansen solubility parameter of the fluorine-containing organic solvent is in the range of 4-12. When the medium (B) contains two or more solvents, the volume average value of the hydrogen bond term (dH) of the Hansen solubility parameter of each solvent is in the range of 4-12.
The volume average value of the hydrogen bond term (dH) of the Hansen solubility parameter of the solvent contained in the medium (B) is particularly preferably 7-12. When the volume average value of the hydrogen bond term (dH) is within the above range, it is easy to form a surface layer excellent in antifouling property and wear resistance.

なお、ハンセン溶解度パラメータは、ヒルデブランド(Hildebrand)によって導入された溶解度パラメータを、ハンセン(Hansen)が分散項(dD)、極性項(dP)、水素結合項(dH)の3成分に分割し、3次元空間に示したものである。分散項(dD)は、分散力のよる効果を示す。極性項(dP)は、双極子間力による効果を示す。水素結合項(dH)は、水素結合力の効果を示す。
ハンセン溶解度パラメータの定義および計算方法は、下記の文献に記載されている。
Charles M. Hansen著、「Hansen Solubility Parameters: A Users Handbook」、CRCプレス、2007年。
The Hansen solubility parameter is a solubility parameter introduced by Hildebrand. Hansen is divided into three components: a dispersion term (dD), a polar term (dP), and a hydrogen bond term (dH). This is shown in a three-dimensional space. The dispersion term (dD) indicates the effect of dispersion power. The polarity term (dP) indicates the effect due to the force between the dipoles. The hydrogen bond term (dH) indicates the effect of hydrogen bond strength.
The definition and calculation method of the Hansen solubility parameter is described in the following literature.
Charles M. Hansen, “Hansen Solubility Parameters: A Users Handbook”, CRC Press, 2007.

ハンセン溶解度パラメータの文献値が知られていない溶媒については、コンピュータソフトウエア(Hansen Solubility Parameters in Practice(HSPiP))を用いることによって、その化学構造から簡便にハンセン溶解度パラメータを推算できる。
本発明においては、データベースに登録されている溶媒についてはその値を、登録されていない溶媒についてはHSPiPバージョン3による推算値を用いる。
For solvents for which the Hansen solubility parameter literature values are not known, the Hansen solubility parameter can be easily estimated from its chemical structure by using computer software (Hansen Solubility Parameters in Practice (HSPiP)).
In the present invention, the value is used for the solvent registered in the database, and the estimated value according to HSPiP version 3 is used for the solvent not registered.

含フッ素有機溶媒としては、フルオロアルカン、フルオロ芳香族化合物、フルオロアルキルエーテル、フルオロアルキルアミン、フルオロアルコール等が挙げられる。なかでも、含フッ素エーテル化合物(A1)の溶解性の点では、フルオロアルカン、フルオロ芳香族化合物、フルオロアルキルエーテルが好ましく、フルオロアルキルエーテルが特に好ましい。   Examples of the fluorine-containing organic solvent include fluoroalkanes, fluoroaromatic compounds, fluoroalkyl ethers, fluoroalkylamines, fluoroalcohols and the like. Among these, from the viewpoint of solubility of the fluorine-containing ether compound (A1), fluoroalkanes, fluoroaromatic compounds, and fluoroalkyl ethers are preferable, and fluoroalkyl ethers are particularly preferable.

フルオロアルカンとしては、炭素数4〜8の化合物が好ましい。市販品としては、C13H(AC−2000:製品名、旭硝子社製、dP=0、dH=0。)、C13(AC−6000:製品名、旭硝子社製、dP=0、dH=0。)、CCHFCHFCF(バートレル:製品名、デュポン社製、dP=0、dH=0。)等が挙げられる。 As the fluoroalkane, a compound having 4 to 8 carbon atoms is preferable. As commercial products, C 6 F 13 H (AC-2000: product name, manufactured by Asahi Glass Co., Ltd., dP = 0, dH = 0.), C 6 F 13 C 2 H 5 (AC-6000: product name, Asahi Glass Co., Ltd.) Manufactured, dP = 0, dH = 0.), C 2 F 5 CHFCHFCF 3 (Bertrel: product name, manufactured by DuPont, dP = 0, dH = 0) and the like.

フルオロ芳香族化合物としては、ヘキサフルオロベンゼン(dP=0、dH=0。)、トリフルオロメチルベンゼン(dP=5.2、dH=3.5。)、ペルフルオロトルエン(dP=1.7、dH=0.2。)、ビス(トリフルオロメチル)ベンゼン(dP=6.8、dH=0。)等が挙げられる。   Examples of fluoroaromatic compounds include hexafluorobenzene (dP = 0, dH = 0.), Trifluoromethylbenzene (dP = 5.2, dH = 3.5), perfluorotoluene (dP = 1.7, dH). = 0.2.), Bis (trifluoromethyl) benzene (dP = 6.8, dH = 0.) And the like.

フルオロアルキルエーテルとしては、炭素数4〜12の化合物が好ましい。市販品としては、CFCHOCFCFH(AE−3000:製品名、旭硝子社製、dP=4.3、dH=2.8。)、COCH(ノベック−7100:製品名、3M社製、dP=2.2、dH=1。)、COC(ノベック−7200:製品名、3M社製、dP=1.3、dH=1.5。)、C13OCH(ノベック−7300:製品名、3M社製、dP=0.2、dH=0。)等が挙げられる。 As the fluoroalkyl ether, a compound having 4 to 12 carbon atoms is preferable. Examples of commercially available products, CF 3 CH 2 OCF 2 CF 2 H (AE-3000:. Product name, manufactured by Asahi Glass Company, dP = 4.3, dH = 2.8 ), C 4 F 9 OCH 3 ( Novec -7100 : Product name, manufactured by 3M, dP = 2.2, dH = 1.), C 4 F 9 OC 2 H 5 (Novec-7200: product name, manufactured by 3M, dP = 1.3, dH = 1. 5.), C 6 F 13 OCH 3 (Novec-7300: product name, manufactured by 3M, dP = 0.2, dH = 0), and the like.

フルオロアルキルアミンとしては、ペルフルオロトリプロピルアミン(dP=1、dH=0.7。)、ペルフルオロトリブチルアミン(dP=0、dH=0.3。)等が挙げられる。   Examples of the fluoroalkylamine include perfluorotripropylamine (dP = 1, dH = 0.7), perfluorotributylamine (dP = 0, dH = 0.3), and the like.

フルオロアルコールとしては、2,2,3,3−テトラフルオロプロパノール(dP=5.2、dH=12.1。)、2,2,2−トリフルオロエタノール(dP=8.3、dH=16.4。)、ヘキサフルオロイソプロパノール(dP=4.5、dH=14.7。)等が挙げられる。   As the fluoroalcohol, 2,2,3,3-tetrafluoropropanol (dP = 5.2, dH = 12.1), 2,2,2-trifluoroethanol (dP = 8.3, dH = 16). .4.), Hexafluoroisopropanol (dP = 4.5, dH = 14.7), and the like.

媒体(B)は、含フッ素有機溶媒に加えて、必要に応じて非フッ素系有機溶媒、水(dP=16、dH=42.3。)を含んでもよい。非フッ素系有機溶媒とは、分子内にフッ素原子を有さない有機溶媒である。
含フッ素エーテル化合物(A1)およびその部分加水分解縮合物(A2)が有する加水分解性シリル基の加水分解を促進できる点からは、媒体(B)は水を含むことが好ましい。
The medium (B) may contain a non-fluorine-based organic solvent and water (dP = 16, dH = 42.3) as necessary in addition to the fluorine-containing organic solvent. The non-fluorine organic solvent is an organic solvent having no fluorine atom in the molecule.
The medium (B) preferably contains water from the viewpoint of promoting the hydrolysis of the hydrolyzable silyl group of the fluorine-containing ether compound (A1) and the partial hydrolysis-condensation product (A2) thereof.

非フッ素系有機溶媒としては、水素原子および炭素原子のみからなる化合物と、水素原子、炭素原子および酸素原子のみからなる化合物が好ましい。具体的には、非フッ素系有機溶媒としては、炭化水素系有機溶媒、非フッ素系アルコール、非フッ素系ケトン、非フッ素系エーテル、非フッ素系エステル等が挙げられる。非フッ素系アルコールとは、分子内にフッ素原子を有さないアルコールである。非フッ素系ケトン、非フッ素系エーテル、非フッ素系エステルについても同様である。
含フッ素エーテル化合物(A1)を溶解しやすい点では、非フッ素系有機溶媒としては、非フッ素系アルコールが特に好ましい。
As the non-fluorine organic solvent, a compound consisting only of a hydrogen atom and a carbon atom and a compound consisting only of a hydrogen atom, a carbon atom and an oxygen atom are preferable. Specifically, examples of the non-fluorine organic solvent include hydrocarbon organic solvents, non-fluorine alcohols, non-fluorine ketones, non-fluorine ethers, and non-fluorine esters. A non-fluorinated alcohol is an alcohol having no fluorine atom in the molecule. The same applies to non-fluorinated ketones, non-fluorinated ethers, and non-fluorinated esters.
The non-fluorine-based organic solvent is particularly preferably a non-fluorine-based alcohol in that the fluorine-containing ether compound (A1) can be easily dissolved.

炭化水素系有機溶媒としては、ヘキサン(dP=0、dH=0。)、へプタン(dP=0、dH=0。)、シクロヘキサン(dP=0、dH=0.2。)が好ましい。
非フッ素系アルコールとしては、メタノール(dP=12.3、dH=22.3。)、エタノール(dP=8.8、dH=19.4。)、プロパノール(dP=6.8、dH=17.4。)、イソプロパノール(dP=6.1、dH=16.4。)が好ましい。
非フッ素系ケトンとしては、アセトン(dP=10.4、dH=7。)、メチルエチルケトン(dP=9、dH=5.1。)、メチルイソブチルケトン(dP=6.1、dH=4.1。)が好ましい。
非フッ素系エーテルとしては、ジエチルエーテル(dP=2.9、dH=4.6。)、テトラヒドロフラン(dP=5.7、dH=8。)、テトラエチレングリコールジメチルエーテル(dP=4.2、dH=7.3。)が好ましい。
非フッ素系エステルとしては、酢酸エチル(dP=5.3、dH=7.2。)、酢酸ブチル(dP=3.7、dH=6.3。)が好ましい。
As the hydrocarbon organic solvent, hexane (dP = 0, dH = 0.), Heptane (dP = 0, dH = 0.), And cyclohexane (dP = 0, dH = 0.2) are preferable.
Non-fluorinated alcohols include methanol (dP = 12.3, dH = 22.3), ethanol (dP = 8.8, dH = 19.4), propanol (dP = 6.8, dH = 17). .4), isopropanol (dP = 6.1, dH = 16.4).
Non-fluorinated ketones include acetone (dP = 10.4, dH = 7), methyl ethyl ketone (dP = 9, dH = 5.1), methyl isobutyl ketone (dP = 6.1, dH = 4.1). .) Is preferred.
Non-fluorinated ethers include diethyl ether (dP = 2.9, dH = 4.6), tetrahydrofuran (dP = 5.7, dH = 8), tetraethylene glycol dimethyl ether (dP = 4.2, dH). = 7.3.) Is preferred.
As the non-fluorinated ester, ethyl acetate (dP = 5.3, dH = 7.2) and butyl acetate (dP = 3.7, dH = 6.3) are preferable.

媒体(B)としては、フルオロアルカン、フルオロ芳香族化合物およびフルオロアルキルエーテルからなる群から選ばれる少なくとも1種と、水素原子、炭素原子および酸素原子のみからなる非フッ素系有機溶媒からなる群から選択される少なくとも1種とを混合した有機溶媒が好ましい。   The medium (B) is selected from the group consisting of at least one selected from the group consisting of fluoroalkanes, fluoroaromatic compounds and fluoroalkyl ethers and a non-fluorine organic solvent consisting only of hydrogen atoms, carbon atoms and oxygen atoms. An organic solvent mixed with at least one selected from the above is preferable.

媒体(B)中の含フッ素有機溶媒の含有量は、10〜90質量%が好ましく、20〜80質量%がより好ましく、30〜70質量%が特に好ましい。前記含フッ素有機溶媒の含有量が下限値以上であれば、含フッ素エーテル化合物(A1)の溶解性が優れる。前記含フッ素有機溶媒の含有量が上限値以下であれば、含フッ素エーテル化合物(A1)と基材の表面の水酸基との反応性が良好になり、表面層の耐摩耗性が良好となる。   10-90 mass% is preferable, as for content of the fluorine-containing organic solvent in a medium (B), 20-80 mass% is more preferable, and 30-70 mass% is especially preferable. If content of the said fluorine-containing organic solvent is more than a lower limit, the solubility of a fluorine-containing ether compound (A1) will be excellent. If content of the said fluorine-containing organic solvent is below an upper limit, the reactivity of a fluorine-containing ether compound (A1) and the hydroxyl group of the surface of a base material will become favorable, and the abrasion resistance of a surface layer will become favorable.

媒体(B)中の含フッ素有機溶媒および非フッ素系有機溶媒を合計した含有量は、90質量%以上が好ましく、98質量%以上が特に好ましい。前記含有量が下限値以上であれば、含フッ素エーテル化合物(A1)の溶解性が優れる。前記含有量の上限値は、100質量%である。   The total content of the fluorinated organic solvent and the non-fluorinated organic solvent in the medium (B) is preferably 90% by mass or more, and particularly preferably 98% by mass or more. If the said content is more than a lower limit, the solubility of a fluorine-containing ether compound (A1) will be excellent. The upper limit of the content is 100% by mass.

(触媒(C))
本発明の含フッ素エーテル組成物は、必要に応じて触媒(C)をさらに含んでいてもよい。
触媒(C)は、含フッ素エーテル化合物(A1)およびその部分加水分解縮合物(A2)の加水分解反応、脱水縮合反応を促進させる。すなわち、触媒(C)を用いることで、シラノール基の生成、部分加水分解縮合物の形成、基材の表面と表面層との密着が促進される。
(Catalyst (C))
The fluorine-containing ether composition of the present invention may further contain a catalyst (C) as necessary.
The catalyst (C) promotes the hydrolysis reaction and dehydration condensation reaction of the fluorine-containing ether compound (A1) and the partial hydrolysis-condensation product (A2) thereof. That is, by using the catalyst (C), generation of silanol groups, formation of a partial hydrolysis condensate, and adhesion between the surface of the substrate and the surface layer are promoted.

触媒(C)としては、たとえば、部分加水分解縮合物(A2)の項で説明したものと同じものが挙げられ、好ましい態様も同様である。   Examples of the catalyst (C) include those described in the section of the partial hydrolysis-condensation product (A2), and preferred embodiments thereof are also the same.

(他の添加剤(D))
本発明の含フッ素エーテル組成物は、必要に応じて他の添加剤(D)をさらに含んでいてもよい。
他の添加剤(D)としては、紫外線吸収剤、光安定剤、熱硬化安定剤、酸化防止剤、レベリング剤、消泡剤、増粘剤、沈降防止剤、顔料、染料、分散剤、帯電防止剤、界面活性剤(防曇剤、レベリング剤等。)、金属酸化物粒子、各種樹脂(エポキシ樹脂、不飽和ポリエステル樹脂、ポリウレタン樹脂等。)等が挙げられる。
(Other additives (D))
The fluorine-containing ether composition of the present invention may further contain another additive (D) as necessary.
Other additives (D) include UV absorbers, light stabilizers, thermosetting stabilizers, antioxidants, leveling agents, antifoaming agents, thickeners, antisettling agents, pigments, dyes, dispersants, charging Examples thereof include an inhibitor, a surfactant (antifogging agent, leveling agent, etc.), metal oxide particles, various resins (epoxy resin, unsaturated polyester resin, polyurethane resin, etc.).

(組成)
本発明の含フッ素エーテル組成物中の含フッ素エーテル化合物(A1)およびその部分加水分解縮合物(A2)の合計の含有量は、0.005〜1質量%が好ましく、0.005〜0.5質量%がより好ましく、0.005〜0.1質量%が特に好ましい。前記含有量が下限値以上であれば、表面層は耐摩擦性および防汚性に優れる。前記含有量が上限値以下であれば、表面層の外観に優れ、カバーガラスなど、電子部材の最表面や、各種物品の表面に使用した際、視界が良好となり、操作性、意匠性が良くなる。また含フッ素エーテル組成物は貯蔵安定性に優れる。
(composition)
The total content of the fluorinated ether compound (A1) and the partially hydrolyzed condensate (A2) thereof in the fluorinated ether composition of the present invention is preferably 0.005 to 1% by mass, and preferably 0.005 to 0.001. 5 mass% is more preferable and 0.005-0.1 mass% is especially preferable. If the said content is more than a lower limit, a surface layer is excellent in friction resistance and antifouling property. If the content is not more than the upper limit, the surface layer has excellent appearance, and when used on the outermost surface of an electronic member, such as a cover glass, or the surface of various articles, the field of view is good and the operability and design are good. Become. The fluorine-containing ether composition is excellent in storage stability.

本発明の含フッ素エーテル組成物中の媒体(B)の含有量は、99〜99.995質量%が好ましく、99.5〜99.995質量%がより好ましく、99.9〜99.995質量%が特に好ましい。媒体(B)の含有量が上記範囲であれば、表面層の外観に優れ、カバーガラスなど、電子部材の最表面や、各種物品の表面に使用した際、視界が良好となり、操作性、意匠性が良くなる。また、表面層は防汚性と耐摩耗性に優れる。   The content of the medium (B) in the fluorine-containing ether composition of the present invention is preferably 99 to 99.995% by mass, more preferably 99.5 to 99.995% by mass, and 99.9 to 99.995% by mass. % Is particularly preferred. When the content of the medium (B) is in the above range, the surface layer has excellent appearance, and when used on the outermost surface of an electronic member such as a cover glass or the surface of various articles, the field of view is improved, operability, and design. Sexuality is improved. Further, the surface layer is excellent in antifouling property and wear resistance.

本発明の含フッ素エーテル組成物に触媒(C)を含ませる場合、含フッ素エーテル化合物(A1)およびその部分加水分解縮合物(A2)の合計100質量部に対する触媒(C)の含有量は、20〜2,000質量部が好ましく、20〜1,000質量部がより好ましく、20〜200質量部が特に好ましい。   When the catalyst (C) is included in the fluorine-containing ether composition of the present invention, the content of the catalyst (C) with respect to 100 parts by mass in total of the fluorine-containing ether compound (A1) and the partial hydrolysis-condensation product (A2) is It is preferably 20 to 2,000 parts by mass, more preferably 20 to 1,000 parts by mass, and particularly preferably 20 to 200 parts by mass.

本発明の含フッ素エーテル組成物に他の添加剤(D)を含ませる場合、本発明の含フッ素エーテル組成物中の他の添加剤(D)の含有量は、0.001質量%以下が好ましく、0.000001〜0.001質量%が特に好ましい。   When the fluorine-containing ether composition of the present invention contains another additive (D), the content of the other additive (D) in the fluorine-containing ether composition of the present invention is 0.001% by mass or less. Preferably, 0.000001-0.001 mass% is especially preferable.

本発明の含フッ素エーテル組成物の固形分濃度は、0.005〜1質量%が好ましく、0.005〜0.5質量%がより好ましく、0.005〜0.1質量%が特に好ましい。固形分濃度が上記範囲であれば、表面層の外観に優れ、また、表面層は防汚性と耐摩耗性に優れる。   The solid content concentration of the fluorine-containing ether composition of the present invention is preferably 0.005 to 1% by mass, more preferably 0.005 to 0.5% by mass, and particularly preferably 0.005 to 0.1% by mass. When the solid content concentration is in the above range, the appearance of the surface layer is excellent, and the surface layer is excellent in antifouling property and wear resistance.

本発明の含フッ素エーテル組成物は、含フッ素エーテル化合物(A1)と部分加水分解縮合物(A2)の少なくとも一方を用いるため、基材上に撥水撥油性、防汚性に優れた表面層を形成できる。
また、本発明の含フッ素エーテル組成物は、含フッ素エーテル化合物(A1)、部分加水分解縮合物(A2)、または前記含フッ素エーテル化合物(A1)と部分加水分解縮合物(A2)との混合物と、媒体(B)とを組み合わせて用いるため、優れた耐摩耗性を有する表面層を形成できる。これは、以下のように考えられる。
ポリ(オキシペルフルオロアルキレン)鎖と加水分解性シリル基とが、アミド結合またはウレタン結合を有する連結基で結合された含フッ素エーテル化合物では、極性を持たないポリ(オキシペルフルオロアルキレン)鎖と、極性を持ったアミド結合またはウレタン結合を有する連結基を有する。そのため、該含フッ素エーテル化合物は媒体中における溶解が不均一になりやすい。その結果、該含フッ素エーテル化合物の加水分解性シリル基と基材表面の水酸基との反応性が低下し、表面層に充分な耐摩耗性を付与できない場合があった。これに対して、本発明の含フッ素エーテル組成物では、ハンセン溶解度パラメータの極性項(dP)の体積平均値と水素結合項(dH)の体積平均値とを特定の範囲内とした媒体(B)を用いるため、含フッ素エーテル化合物(A1)およびその部分加水分解縮合物(A2)が媒体(B)中に均一に溶解する。そのため、含フッ素エーテル化合物(A1)およびその部分加水分解縮合物(A2)が有する加水分解性シリル基と基材表面の水酸基との反応性が高まり、優れた耐摩耗性を有する表面層を形成できると考えられる。
また、前述したように、含フッ素エーテル組成物に用いる含フッ素エーテル化合物(A1)は、加水分解性シリル基1つ当たりの数平均分子量(Mn)が2,000以上であるため、表面層中での含フッ素エーテル化合物(A1)中のポリ(オキシペルフルオロアルキレン)鎖の運動性が高い。そのため、表面層の表面が摩耗されたときの力を逃がしやすく、優れた耐摩耗性が得られる。
Since the fluorine-containing ether composition of the present invention uses at least one of the fluorine-containing ether compound (A1) and the partially hydrolyzed condensate (A2), the surface layer has excellent water and oil repellency and antifouling properties on the substrate. Can be formed.
Further, the fluorinated ether composition of the present invention comprises a fluorinated ether compound (A1), a partially hydrolyzed condensate (A2), or a mixture of the fluorinated ether compound (A1) and a partially hydrolyzed condensate (A2). And a medium (B) in combination, a surface layer having excellent wear resistance can be formed. This is considered as follows.
In a fluorinated ether compound in which a poly (oxyperfluoroalkylene) chain and a hydrolyzable silyl group are bonded with a linking group having an amide bond or a urethane bond, the non-polar poly (oxyperfluoroalkylene) chain is It has a linking group having an amide bond or urethane bond. Therefore, the fluorine-containing ether compound tends to be non-uniformly dissolved in the medium. As a result, the reactivity between the hydrolyzable silyl group of the fluorine-containing ether compound and the hydroxyl group on the substrate surface is lowered, and there are cases where sufficient abrasion resistance cannot be imparted to the surface layer. In contrast, in the fluorine-containing ether composition of the present invention, the medium (B) in which the volume average value of the polar term (dP) and the volume average value of the hydrogen bond term (dH) of the Hansen solubility parameter are within a specific range. ), The fluorine-containing ether compound (A1) and its partial hydrolysis-condensation product (A2) are uniformly dissolved in the medium (B). Therefore, the reactivity between the hydrolyzable silyl group of the fluorinated ether compound (A1) and its partially hydrolyzed condensate (A2) and the hydroxyl group on the substrate surface is increased, and a surface layer having excellent wear resistance is formed. It is considered possible.
Further, as described above, the fluorine-containing ether compound (A1) used in the fluorine-containing ether composition has a number average molecular weight (Mn) per hydrolyzable silyl group of 2,000 or more. The mobility of the poly (oxyperfluoroalkylene) chain in the fluorine-containing ether compound (A1) is high. Therefore, it is easy to release the force when the surface of the surface layer is worn, and excellent wear resistance is obtained.

〔表面層を有する基材〕
本発明の表面層を有する基材は、本発明の含フッ素エーテル組成物から形成された表面層を有する。
[Base material having surface layer]
The base material having the surface layer of the present invention has a surface layer formed from the fluorine-containing ether composition of the present invention.

(基材)
表面層を形成する対象となる基材は、撥水撥油性の付与が求められている基材であれば特に限定されない。基材の表面の材料としては、金属、樹脂、ガラス、セラミック、石、これらの複合材料が挙げられる。
(Base material)
The base material that is the target for forming the surface layer is not particularly limited as long as the base material is required to be imparted with water and oil repellency. Examples of the material for the surface of the substrate include metals, resins, glasses, ceramics, stones, and composite materials thereof.

本発明の含フッ素エーテル組成物を用いて基材の表面に表面層を形成することによって、基材に良好な撥水撥油性が付与されるとともに、該表面が繰り返し摩耗されても撥水撥油性が低下しにくい優れた耐摩耗性、および基材の表面の指紋汚れを容易に除去できる防汚性が付与される。
本発明の表面層を有する基材は、良好な撥水撥油性を有するとともに、優れた防汚性および耐摩耗性を有するため、タッチパネルを構成する部材として好適である。タッチパネルとは、指等による接触によってその接触位置情報を入力する装置と表示装置とを組み合わせた入力/表示装置(タッチパネル装置)の、入力装置を意味する。タッチパネルは、基材と、入力検出方式に応じて、透明導電膜、電極、配線、IC等とから構成されている。本発明の表面層を有する基材の表面層を有する面をタッチパネルの入力面とすることにより、良好な指紋除去性を有するタッチパネルが得られる。
タッチパネル用基材の材質は、透光性を有する。「透光性を有する」とは、JIS R 3106に準じた垂直入射型可視光透過率が25%以上であることを意味する。
By forming a surface layer on the surface of the substrate using the fluorine-containing ether composition of the present invention, the substrate is provided with good water and oil repellency, and even when the surface is repeatedly worn, It is provided with excellent wear resistance in which oiliness is not easily lowered and antifouling property that can easily remove fingerprint stains on the surface of the substrate.
The substrate having the surface layer of the present invention is suitable as a member constituting a touch panel because it has good water and oil repellency and excellent antifouling properties and wear resistance. The touch panel means an input device of an input / display device (touch panel device) that combines a display device and a device that inputs contact position information by contact with a finger or the like. The touch panel is composed of a base material and a transparent conductive film, an electrode, a wiring, an IC, and the like depending on the input detection method. By using the surface having the surface layer of the substrate having the surface layer of the present invention as the input surface of the touch panel, a touch panel having good fingerprint removability can be obtained.
The material of the base material for touch panels has translucency. “Having translucency” means that the normal incidence visible light transmittance according to JIS R 3106 is 25% or more.

タッチパネル用基材の材質としては、ガラスまたは透明樹脂が好ましい。
ガラスとしては、ソーダライムガラス、アルカリアルミノケイ酸塩ガラス、ホウ珪酸ガラス、無アルカリガラス、クリスタルガラス、石英ガラスが好ましく、化学強化したソーダライムガラス、化学強化したアルカリアルミノケイ酸塩ガラス、および化学強化したホウ珪酸ガラスが特に好ましい。
透明樹脂基材としては、アクリル樹脂、ポリカーボネートが好ましい。
As a material of the base material for touch panels, glass or transparent resin is preferable.
As the glass, soda lime glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystal glass, and quartz glass are preferable, chemically strengthened soda lime glass, chemically strengthened alkali aluminosilicate glass, and chemically strengthened. Borosilicate glass is particularly preferred.
As a transparent resin base material, an acrylic resin and a polycarbonate are preferable.

また、基材としては、液晶ディスプレイ、CRTディスプレイ、プロジェクションディスプレイ、プラズマディスプレイ、ELディスプレイ等の各種ディスプレイの最表面を構成するディスプレイ用基材も好適である。   Further, as the base material, a display base material constituting the outermost surface of various displays such as a liquid crystal display, a CRT display, a projection display, a plasma display, and an EL display is also suitable.

基材の表面に形成される表面層の膜厚は、1〜100nmが好ましく、1〜50nmが特に好ましい。前記表面層の膜厚が下限値以上であれば、撥水撥油性、防汚性および耐摩耗性に優れる表面層が得られやすい。前記表面層の膜厚が上限値以下であれば、利用効率が高い。
なお、膜厚は、たとえば薄膜解析用X線回折計ATX−G(RIGAKU社製)を用いて、X線反射率法によって反射X線の干渉パターンを得て、該干渉パターンの振動周期から算出できる。
1-100 nm is preferable and, as for the film thickness of the surface layer formed in the surface of a base material, 1-50 nm is especially preferable. If the film thickness of the surface layer is not less than the lower limit value, a surface layer excellent in water / oil repellency, antifouling property and abrasion resistance can be easily obtained. If the film thickness of the surface layer is not more than the upper limit value, the utilization efficiency is high.
The film thickness is calculated from the vibration period of the interference pattern obtained by obtaining a reflection X-ray interference pattern by the X-ray reflectivity method using, for example, an X-ray diffractometer ATX-G for thin film analysis (manufactured by RIGAKU). it can.

(製造方法)
本発明の表面層を有する基材の製造方法としては、本発明の含フッ素エーテル組成物を基材の表面に塗布した後、前記媒体(B)を除去する方法が好ましい。
(Production method)
As a method for producing a substrate having a surface layer of the present invention, a method of removing the medium (B) after applying the fluorine-containing ether composition of the present invention to the surface of the substrate is preferable.

含フッ素エーテル組成物の塗布方法としては、公知の手法を適宜用いることができる。
含フッ素エーテル組成物の塗布方法としては、スピンコート法、ワイプコート法、スプレーコート法、スキージーコート法、ディップコート法、ダイコート法、インクジェット法、フローコート法、ロールコート法、キャスト法、ラングミュア・ブロジェット法またはグラビアコート法が好ましい。
As a method for applying the fluorine-containing ether composition, a known method can be appropriately used.
As a method for applying the fluorine-containing ether composition, a spin coating method, a wipe coating method, a spray coating method, a squeegee coating method, a dip coating method, a die coating method, an ink jet method, a flow coating method, a roll coating method, a casting method, Langmuir A blow jet method or a gravure coating method is preferred.

塗布した含フッ素エーテル組成物中の媒体(B)を除去する方法としては、公知の手法を適宜用いることができる。該除去方法としては、加熱、減圧、減圧下での加熱が挙げられる。
加熱する場合の温度は、10〜300℃が好ましく、20〜200℃が特に好ましい。
As a method for removing the medium (B) in the applied fluorine-containing ether composition, a known method can be appropriately used. Examples of the removal method include heating, reduced pressure, and heating under reduced pressure.
10-300 degreeC is preferable and the temperature in the case of heating has especially preferable 20-200 degreeC.

表面層を有する基材を製造する際には、表面層の耐摩耗性を向上させるために、必要に応じて、加水分解シリル基と基材との反応を促進するための操作を行ってもよい。該操作としては、加熱、加湿、光照射等が挙げられる。
また、形成した表面層中の化合物であって他の化合物や基材と化学結合していない化合物は、必要に応じて除去してもよい。具体的な方法としては、たとえば、表面層に溶剤をかけ流す方法や、溶剤をしみ込ませた布でふき取る方法が挙げられる。
When producing a substrate having a surface layer, an operation for promoting the reaction between the hydrolyzed silyl group and the substrate may be performed as necessary in order to improve the abrasion resistance of the surface layer. Good. Examples of the operation include heating, humidification, and light irradiation.
Moreover, you may remove the compound in the formed surface layer and which is not chemically combined with another compound and a base material as needed. Specific methods include, for example, a method of pouring a solvent over the surface layer and a method of wiping with a cloth soaked with a solvent.

以下、実施例によって本発明を詳細に説明するが、本発明は以下の記載によっては限定されない。
例1〜6は実施例であり、例7〜13は比較例である。
略号、測定方法および評価方法を以下に示す。
EXAMPLES Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited by the following description.
Examples 1 to 6 are examples, and examples 7 to 13 are comparative examples.
Abbreviations, measurement methods and evaluation methods are shown below.

(略号)
Mn:数平均分子量。
Mw:質量平均分子量。
TMS:テトラメチルシラン。
R−225:ジクロロペンタフルオロプロパン。
HFIP:ヘキサフルオロイソプロパノール。
R−113:CClFCClF
CFE−419:CClFCClFCFOCFCClF
TFEO:トリフルオロエタノール。
PFA:テトラフルオロエチレン−ペルフルオロ(アルコキシビニルエーテル)共重合体。
DBTDL:ジブチルスズジラウリレート。
IPA:イソプロパノール。
AE3000:アサヒクリンAE−3000(製品名、旭硝子社製)。
VertrelXF(HFC−43−10mee):2H,3H−デカフルオロペンタン。
HFE7200:ノベック−7200(製品名、3M社製)。
MeOH:メタノール。
t−BME:メチル−tert−ブチルエーテル。
AA:酢酸。
HFC365:1,1,1,3,3−ペンタフルオロブタン。
MEK:メチルエチルケトン。
ACT:アセトン。
a:オキシペルフルオロアルキレン単位の数であり、aを付した化合物は、aの値が異なる2種以上の化合物からなる。aの平均値は、化合物のMnから求めた値である。
(Abbreviation)
Mn: Number average molecular weight.
Mw: mass average molecular weight.
TMS: Tetramethylsilane.
R-225: Dichloropentafluoropropane.
HFIP: hexafluoroisopropanol.
R-113: CCl 2 FCClF 2 .
CFE-419: CClF 2 CClFCF 2 OCF 2 CClF 2.
TFEO: trifluoroethanol.
PFA: tetrafluoroethylene-perfluoro (alkoxy vinyl ether) copolymer.
DBTDL: Dibutyltin dilaurate.
IPA: isopropanol.
AE3000: Asahiklin AE-3000 (product name, manufactured by Asahi Glass Co., Ltd.).
Vertrel XF (HFC-43-10mee): 2H, 3H-decafluoropentane.
HFE7200: Novec-7200 (product name, manufactured by 3M).
MeOH: methanol.
t-BME: methyl-tert-butyl ether.
AA: acetic acid.
HFC365: 1,1,1,3,3-pentafluorobutane.
MEK: methyl ethyl ketone.
ACT: Acetone.
a: The number of oxyperfluoroalkylene units, and the compound with a is composed of two or more compounds having different values of a. The average value of a is a value obtained from Mn of the compound.

(Mnの測定)
含フッ素エーテル化合物のMnは、GPCによって測定した。GPCの測定は、特開2001−208736号公報に記載の方法に従い、下記条件にて行った。
移動相:R−225(旭硝子社製、アサヒクリンAK−225SECグレード1)およびHFIPの混合溶媒(R−225/HFIP=99/1(容量比))。
分析カラム:PLgel MIXED−Eカラム(ポリマーラボラトリーズ社製)を2本直列に連結したもの。
分子量測定用標準試料:分子量分布(Mw/Mn)が1.1未満である、Mnが2,000〜10,000のペルフルオロポリエーテル4種および分子量分布(Mw/Mn)が1.1以上である、Mnが1,300のペルフルオロポリエーテル1種。
検出器:蒸発光散乱検出器。
移動相流速:1.0mL/分。
カラム温度:37℃。
(Measurement of Mn)
Mn of the fluorine-containing ether compound was measured by GPC. GPC was measured under the following conditions according to the method described in JP-A No. 2001-208736.
Mobile phase: R-225 (Asahi Glass Co., Ltd., Asahi Clin AK-225 SEC grade 1) and HFIP mixed solvent (R-225 / HFIP = 99/1 (volume ratio)).
Analytical column: Two PLgel MIXED-E columns (manufactured by Polymer Laboratories) connected in series.
Standard sample for molecular weight measurement: 4 types of perfluoropolyethers having a molecular weight distribution (Mw / Mn) of less than 1.1, Mn of 2,000 to 10,000, and a molecular weight distribution (Mw / Mn) of 1.1 or more One perfluoropolyether having a Mn of 1,300.
Detector: Evaporative light scattering detector.
Mobile phase flow rate: 1.0 mL / min.
Column temperature: 37 ° C.

(水接触角)
表面層を有する基材を水平に保持し、表面層の表面に2μLの水を5滴置き、その接触角を測定し、5つの値の平均値を求めた。水接触角が大きいほど撥水性に優れる。
(Water contact angle)
The substrate having the surface layer was held horizontally, 5 drops of 2 μL of water were placed on the surface of the surface layer, the contact angle was measured, and the average of the five values was determined. The greater the water contact angle, the better the water repellency.

(ヘキサデカン接触角)
表面層を有する基材を水平に保持し、表面層の表面に2μLのノルマルヘキサデカンを5滴置き、その接触角を測定し、5つの値の平均値を求めた。ヘキサデカン接触角が大きいほど撥油性に優れる。
(Hexadecane contact angle)
The substrate having the surface layer was held horizontally, 5 drops of 2 μL of normal hexadecane were placed on the surface of the surface layer, the contact angle was measured, and the average value of the 5 values was obtained. The larger the hexadecane contact angle, the better the oil repellency.

(耐摩耗性評価)
スチールウールボンスター(♯0000)を使用し、表面層を有する基材の表面層面を、荷重1kg/cm、速度320cm/分で、3,000往復摩耗した。その後、前記した方法で水接触角を測定した。摩耗後の水接触角が80°以上の場合を◎(良好)、60°以上80°未満の場合を○(可)、60°未満の場合を×(不可)とした。
(Abrasion resistance evaluation)
A steel wool bonster (# 0000) was used, and the surface layer surface of the substrate having the surface layer was subjected to 3,000 reciprocating wear at a load of 1 kg / cm 2 and a speed of 320 cm / min. Thereafter, the water contact angle was measured by the method described above. The case where the water contact angle after wear was 80 ° or more was evaluated as ◎ (good), the case where the water contact angle was 60 ° or more and less than 80 ° was evaluated as ◯ (possible), and the case where the water contact angle was less than 60 ° was evaluated as × (impossible).

(貯蔵安定性評価)
製造した含フッ素エーテル組成物を室温(20〜25℃)で3ヶ月間保管した。その後、該含フッ素エーテル組成物をディップコート法により基材に塗布し、120℃の熱風循環オーブン中で30分間加熱して乾燥させることで、表面層を有する基材を得た。その後、形成した表面層の水接触角を前記した方法により測定した。
3ヶ月間保管した含フッ素エーテル組成物を用いた場合の水接触角と、保管を行わなかった含フッ素エーテル組成物を用いた場合の水接触角の変化が5°未満の場合を○(可)、5°以上の場合を×(不可)とした。
(Storage stability evaluation)
The produced fluorine-containing ether composition was stored at room temperature (20 to 25 ° C.) for 3 months. Then, this fluorine-containing ether composition was apply | coated to the base material by the dip coating method, and the base material which has a surface layer was obtained by heating for 30 minutes and drying in 120 degreeC hot-air circulation oven. Thereafter, the water contact angle of the formed surface layer was measured by the method described above.
○ (possible if the change in water contact angle when using a fluorine-containing ether composition stored for 3 months and the water contact angle when using a fluorine-containing ether composition not stored is less than 5 ° ) X (impossible) when the angle is 5 ° or more.

〔合成例1:化合物(1−1)の合成〕
化合物(1−1)を下記の方法により合成した。
CFCF−O−(CFCFO−CFCFCFCFO)CFCFO−CFCFCFC(O)NH(CH−Si(OCH ・・・(1−1)
ただし、aは4〜10の整数であり、aの平均値は7である。
[Synthesis Example 1: Synthesis of Compound (1-1)]
Compound (1-1) was synthesized by the following method.
CF 3 CF 2 —O— (CF 2 CF 2 O—CF 2 CF 2 CF 2 CF 2 O) a CF 2 CF 2 O—CF 2 CF 2 CF 2 C (O) NH (CH 2 ) 3 —Si ( OCH 3 ) 3 (1-1)
However, a is an integer of 4 to 10, and the average value of a is 7.

300mLの3つ口丸底フラスコに、水素化ホウ素ナトリウムの14.1gを入れ、R−225の350gを加えた。氷浴で冷却しながら撹拌し、窒素雰囲気下、フラスコの内温が10℃を超えないように化合物(4)の100g、メタノールの15.8g、およびR−225の22gを混合した溶液を滴下漏斗からゆっくり滴下した。
CF=CFO−CFCFCFCOOCH ・・・(4)
In a 300 mL three-necked round bottom flask was charged 14.1 g of sodium borohydride and 350 g of R-225 was added. The mixture was stirred while cooling in an ice bath, and a solution in which 100 g of compound (4), 15.8 g of methanol, and 22 g of R-225 were mixed dropwise so that the internal temperature of the flask did not exceed 10 ° C. in a nitrogen atmosphere. Slowly dropped from the funnel.
CF 2 = CFO-CF 2 CF 2 CF 2 COOCH 3 ··· (4)

全量滴下した後、さらにメタノールの10gとR−225の10gを混合した溶液を滴下した。その後、氷浴を取り外し、フラスコの内温を室温までゆっくり昇温させながら撹拌を続けた。室温で12時間撹拌後、再び氷浴を用いて反応液を冷却し、反応液の液性が酸性になるまで塩酸水溶液を滴下した。反応終了後、反応液を水で1回、飽和食塩水で1回洗浄し、有機相を回収した。回収した有機相を硫酸マグネシウムで乾燥した後、固形分をフィルタによりろ過し、エバポレータで濃縮した。回収した濃縮液を減圧蒸留し、化合物(5)の80.6g(収率88%)を得た。
CF=CFO−CFCFCFCHOH ・・・(5)
After the whole amount was dropped, a solution in which 10 g of methanol and 10 g of R-225 were mixed was further dropped. Thereafter, the ice bath was removed, and stirring was continued while slowly raising the internal temperature of the flask to room temperature. After stirring at room temperature for 12 hours, the reaction solution was cooled again using an ice bath, and an aqueous hydrochloric acid solution was added dropwise until the reaction solution became acidic. After completion of the reaction, the reaction solution was washed once with water and once with saturated brine, and the organic phase was recovered. After the collected organic phase was dried with magnesium sulfate, the solid content was filtered through a filter and concentrated with an evaporator. The collected concentrated liquid was distilled under reduced pressure to obtain 80.6 g (yield 88%) of the compound (5).
CF 2 = CFO-CF 2 CF 2 CF 2 CH 2 OH ··· (5)

化合物(5)のNMRスペクトル;
H−NMR(300.4MHz、溶媒:重クロロホルム、基準:TMS) δ(ppm):2.2(1H)、4.1(2H)。
19F−NMR(282.7MHz、溶媒:重クロロホルム、基準:CFCl) δ(ppm):−85.6(2F)、−114.0(1F)、−122.2(1F)、−123.3(2F)、−127.4(2F)、−135.2(1F)。
NMR spectrum of compound (5);
1 H-NMR (300.4 MHz, solvent: deuterated chloroform, standard: TMS) δ (ppm): 2.2 (1H), 4.1 (2H).
19 F-NMR (282.7 MHz, solvent: deuterated chloroform, standard: CFCl 3 ) δ (ppm): −85.6 (2F), −114.0 (1F), −122.2 (1F), −123 .3 (2F), -127.4 (2F), -135.2 (1F).

還流冷却器を接続した100mLのナスフラスコに、TFEOの6.64gを入れ、炭酸カリウムの7.32gを加えた。さらに、窒素雰囲気下、75℃で撹拌しながら、化合物(5)の19.87gを加え、1時間撹拌した。続いてナスフラスコの内温を120℃まで昇温し、130℃以下になるように制御しながら、化合物(5)の113.34gをゆっくりと滴下した。全量滴下した後、ナスフラスコの内温を120℃に保ちながらさらに1時間撹拌し、加熱を止めて室温に下がるまで撹拌を続けた。塩酸水溶液を加えて、過剰の炭酸カリウムを処理し、水とR−225を加えて分液処理を行った。反応液を3回水洗した後、有機相を回収し、エバポレータで濃縮することによって、高粘度のオリゴマーを得た。得られたオリゴマーをR−225の150gで希釈し、シリカゲルカラムクロマトグラフィ(展開溶媒:R−225)に展開して分取した。各フラクションについて、単位数(a+1)の平均値を19F−NMRの積分値から求めた。下式(6)中、(a+1)の平均値が7〜10のフラクションを合わせた化合物(6i)の48.5g、(a+1)の平均値が13〜16のフラクションを合わせた化合物(6ii)の13.2gを得た。
CFCH−O−(CFCFHO−CFCFCFCHO)a+1−H ・・・(6)
6.64 g of TFEO was placed in a 100 mL eggplant flask connected to a reflux condenser, and 7.32 g of potassium carbonate was added. Furthermore, 19.87 g of compound (5) was added with stirring at 75 ° C. under a nitrogen atmosphere, and the mixture was stirred for 1 hour. Subsequently, the internal temperature of the eggplant flask was raised to 120 ° C., and 113.34 g of Compound (5) was slowly added dropwise while controlling the temperature to be 130 ° C. or lower. After the entire amount was dropped, the mixture was further stirred for 1 hour while maintaining the internal temperature of the eggplant flask at 120 ° C., and the heating was stopped and stirring was continued until the temperature decreased to room temperature. A hydrochloric acid aqueous solution was added to treat excess potassium carbonate, and water and R-225 were added to carry out a liquid separation treatment. After the reaction solution was washed with water three times, the organic phase was recovered and concentrated with an evaporator to obtain a highly viscous oligomer. The obtained oligomer was diluted with 150 g of R-225, separated by silica gel column chromatography (developing solvent: R-225). For each fraction, the average value of the number of units (a + 1) was determined from the integrated value of 19 F-NMR. In the following formula (6), 48.5 g of the compound (6i) in which the fractions in which the average value of (a + 1) is 7 to 10 are combined, and the compound (6ii) in which the fractions in which the average value of (a + 1) is 13 to 16 are combined. Of 13.2 g was obtained.
CF 3 CH 2 -O- (CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O) a + 1 -H ··· (6)

化合物(6i)のNMRスペクトル;
H−NMR(300.4MHz、溶媒:重アセトン、基準:TMS) δ(ppm):4.1(2H)、4.8(16H)、6.7〜6.9(8H)。
19F−NMR(282.7MHz、溶媒:重アセトン、基準:CFCl) δ(ppm):−74.2(3F)、−84.3〜−85.1(16F)、−89.4〜−90.5(16F)、−120.2(14F)、−122.0(2F)、−126.6(14F)、−127.0(2F)、−145.1(8F)。
単位数(a+1)の平均値:8。
NMR spectrum of compound (6i);
1 H-NMR (300.4 MHz, solvent: heavy acetone, standard: TMS) δ (ppm): 4.1 (2H), 4.8 (16H), 6.7 to 6.9 (8H).
19 F-NMR (282.7 MHz, solvent: heavy acetone, standard: CFCl 3 ) δ (ppm): −74.2 (3F), −84.3 to −85.1 (16F), −89.4 to -90.5 (16F), -120.2 (14F), -122.0 (2F), -126.6 (14F), -127.0 (2F), -145.1 (8F).
Average number of units (a + 1): 8.

化合物(6ii)のNMRスペクトル;
H−NMR(300.4MHz、溶媒:重アセトン、基準:TMS) δ(ppm):4.1(2H)、4.8(28H)、6.7〜6.9(14H)。
19F−NMR(282.7MHz、溶媒:重アセトン、基準:CFCl) δ(ppm):−74.2(3F)、−84.3〜−85.1(28F)、−89.4〜−90.5(28F)、−120.2(26F)、−122.0(2F)、−126.6(26F)、−127.0(2F)、−145.1(14F)。
単位数(a+1)の平均値:14。
NMR spectrum of compound (6ii);
1 H-NMR (300.4 MHz, solvent: heavy acetone, standard: TMS) δ (ppm): 4.1 (2H), 4.8 (28H), 6.7 to 6.9 (14H).
19 F-NMR (282.7 MHz, solvent: heavy acetone, standard: CFCl 3 ) δ (ppm): −74.2 (3F), −84.3 to −85.1 (28F), −89.4 to -90.5 (28F), -120.2 (26F), -122.0 (2F), -126.6 (26F), -127.0 (2F), -145.1 (14F).
Average number of units (a + 1): 14.

還流冷却器を接続した300mLのナスフラスコに、化合物(6i)の113.33g、フッ化ナトリウムの5.0g、およびR−225の150gを入れ、さらに化合物(7)の84.75gを加えた。
CFCFCFOCF(CF)COF ・・・(7)
To a 300 mL eggplant flask connected with a reflux condenser, 113.33 g of compound (6i), 5.0 g of sodium fluoride, and 150 g of R-225 were added, and 84.75 g of compound (7) was further added. .
CF 3 CF 2 CF 2 OCF (CF 3 ) COF (7)

窒素雰囲気下、その溶液を50℃で13時間撹拌した後、70℃で3時間撹拌した。反応液から加圧ろ過器でフッ化ナトリウムを除去した後、過剰の化合物(7)とR−225を減圧留去した。シリカゲルクロマトグラフィ(展開溶媒:R−225)で高極性の不純物を除去し、下式(8)中、単位数(a+1)の平均値が8である、化合物(8i)の100.67g(収率80%)を得た。
CFCH−O−(CFCFHO−CFCFCFCHO)a+1−C(O)CF(CF)OCFCFCF ・・・(8)
The solution was stirred at 50 ° C. for 13 hours under a nitrogen atmosphere, and then stirred at 70 ° C. for 3 hours. After removing sodium fluoride from the reaction solution with a pressure filter, excess compound (7) and R-225 were distilled off under reduced pressure. Silica gel chromatography (developing solvent: R-225) was used to remove highly polar impurities, and in the following formula (8), the average number of units (a + 1) was 8, and 10.67 g (yield) of compound (8i). 80%).
CF 3 CH 2 -O- (CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O) a + 1 -C (O) CF (CF 3) OCF 2 CF 2 CF 3 ··· (8)

化合物(8i)のNMRスペクトル;
H−NMR(300.4MHz、溶媒:重クロロホルム、基準:TMS) δ(ppm):4.4(16H)、4.9(2H)、6.0−6.2(8H)。
19F−NMR(282.7MHz、溶媒:重クロロホルム、基準:CFCl) δ(ppm):−75.2(3F)、−80.0(1F)、−81.9(3F)、−82.7(3F)、−84.7〜−85.0(16F)、−86.0(1F)、−90.5〜−93.0(16F)、−121.1(2F)、−121.5(14F)、−128.0(16F)、−130.3(2F)、−132.5(1F)、−145.3(8F)。
単位数(a+1)の平均値:8。
NMR spectrum of compound (8i);
1 H-NMR (300.4 MHz, solvent: deuterated chloroform, standard: TMS) δ (ppm): 4.4 (16H), 4.9 (2H), 6.0-6.2 (8H).
19 F-NMR (282.7 MHz, solvent: deuterated chloroform, standard: CFCl 3 ) δ (ppm): −75.2 (3F), −80.0 (1F), −81.9 (3F), −82 .7 (3F), -84.7 to -85.0 (16F), -86.0 (1F), -90.5 to -93.0 (16F), -121.1 (2F), -121 .5 (14F), -128.0 (16F), -130.3 (2F), -132.5 (1F), -145.3 (8F).
Average number of units (a + 1): 8.

オートクレーブ(ニッケル製、内容積1L)を用意し、オートクレーブのガス出口に、0℃に保持した冷却器、フッ化ナトリウムペレット充填層および−10℃に保持した冷却器を直列に設置した。また−10℃に保持した冷却器から凝集した液をオートクレーブに戻す液体返送ラインを設置した。オートクレーブにR−113の750gを投入し、25℃に保持しながら撹拌した。オートクレーブに窒素ガスを25℃で1時間吹き込んだ後、窒素ガスで20体積%に希釈したフッ素ガス(以下、「20%フッ素ガス」と記す。)を、25℃、流速3.2L/時間で1時間吹き込んだ。20%フッ素ガスを同じ流速でオートクレーブに吹き込みながら、化合物(8i)の130gをR−113の448gに溶解した溶液を22時間かけて注入した。20%フッ素ガスを同じ流速でオートクレーブに吹き込みながら、オートクレーブの内圧を0.15MPa(ゲージ圧)まで加圧した。オートクレーブ内を25℃から40℃まで加熱しながら、R−113中に0.015g/mLのベンゼンを含むベンゼン溶液の8mLを注入し、オートクレーブのベンゼン溶液注入口を閉めた。20分撹拌した後、オートクレーブ内を40℃を保持しながら、再びベンゼン溶液の4mLを注入し、注入口を閉めた。同様の操作をさらに7回繰り返した。ベンゼンの注入総量は0.6gであった。20%フッ素ガスを同じ流速でオートクレーブ内に吹き込みながら、1時間撹拌を続けた。オートクレーブ内の圧力を大気圧にして、窒素ガスを1時間吹き込んだ。オートクレーブの内容物をエバポレータで濃縮し、下式(9)中、単位数(a)の平均値が7である、化合物(9i)の152.1g(収率99%)を得た。
CFCF−O−(CFCFO−CFCFCFCFO)CFCFO−CFCFCFCFO−C(O)CF(CF)OCFCFCF ・・・(9)
An autoclave (made of nickel, internal volume 1 L) was prepared, and a cooler maintained at 0 ° C., a sodium fluoride pellet packed layer, and a cooler maintained at −10 ° C. were installed in series at the gas outlet of the autoclave. Moreover, the liquid return line which returns the liquid aggregated from the cooler hold | maintained at -10 degreeC to an autoclave was installed. The autoclave was charged with 750 g of R-113 and stirred while maintaining at 25 ° C. After nitrogen gas was blown into the autoclave at 25 ° C. for 1 hour, fluorine gas diluted to 20% by volume with nitrogen gas (hereinafter referred to as “20% fluorine gas”) was supplied at 25 ° C. and a flow rate of 3.2 L / hour. Blowed for 1 hour. While 20% fluorine gas was blown into the autoclave at the same flow rate, a solution of 130 g of compound (8i) dissolved in 448 g of R-113 was injected over 22 hours. While blowing 20% fluorine gas into the autoclave at the same flow rate, the internal pressure of the autoclave was increased to 0.15 MPa (gauge pressure). While heating the interior of the autoclave from 25 ° C. to 40 ° C., 8 mL of a benzene solution containing 0.015 g / mL benzene was injected into R-113, and the benzene solution inlet of the autoclave was closed. After stirring for 20 minutes, while maintaining the inside of the autoclave at 40 ° C., 4 mL of the benzene solution was again injected and the inlet was closed. The same operation was further repeated 7 times. The total amount of benzene injected was 0.6 g. While 20% fluorine gas was blown into the autoclave at the same flow rate, stirring was continued for 1 hour. The pressure in the autoclave was set to atmospheric pressure, and nitrogen gas was blown for 1 hour. The content of the autoclave was concentrated with an evaporator to obtain 152.1 g (yield 99%) of the compound (9i) having an average number of units (a) of 7 in the following formula (9).
CF 3 CF 2 -O- (CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) a CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O-C (O) CF (CF 3) OCF 2 CF 2 CF 3 (9)

化合物(9i)のNMRスペクトル;
19F−NMR(282.7MHz、溶媒:重クロロホルム、基準:CFCl) δ(ppm):−80.0(1F)、−82.0〜−82.5(6F)、−84.0(30F)、−86.7〜87.8(6F)、−89.2(34F)、−126.5(32F)、−130.4(2F)、−132.4(1F)。
単位数(a)の平均値:7。
NMR spectrum of compound (9i);
19 F-NMR (282.7 MHz, solvent: deuterated chloroform, standard: CFCl 3 ) δ (ppm): −80.0 (1F), −82.0 to −82.5 (6F), −84.0 ( 30F), -86.7-87.8 (6F), -89.2 (34F), -126.5 (32F), -130.4 (2F), -132.4 (1F).
Average number of units (a): 7.

500mLのPFA製丸底ナスフラスコに、化合物(9i)の120gおよびR−225の240gを入れた。氷浴で冷却しながら撹拌し、窒素雰囲気下、メタノールの6.1gを滴下漏斗からゆっくり滴下した。窒素でバブリングしながら12時間撹拌した。反応混合物をエバポレータで濃縮し、下式(10)中、単位数(a)の平均値が7である、化合物(10i)の108.5g(収率100%)を得た。
CFCF−O−(CFCFO−CFCFCFCFO)CFCFO−CFCFCFC(O)OCH ・・・(10)
A 500 mL PFA round bottom eggplant flask was charged with 120 g of compound (9i) and 240 g of R-225. The mixture was stirred while being cooled in an ice bath, and 6.1 g of methanol was slowly dropped from the dropping funnel under a nitrogen atmosphere. The mixture was stirred for 12 hours while bubbling with nitrogen. The reaction mixture was concentrated with an evaporator to obtain 108.5 g (yield: 100%) of compound (10i) having the average number of units (a) of 7 in the following formula (10).
CF 3 CF 2 -O- (CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) a CF 2 CF 2 O-CF 2 CF 2 CF 2 C (O) OCH 3 ··· (10)

化合物(10i)のNMRスペクトル;
H−NMR(300.4MHz、溶媒:重クロロホルム、基準:TMS) δ(ppm):3.9(3H)。
19F−NMR(282.7MHz、溶媒:重クロロホルム、基準:CFCl) δ(ppm):−84.0(30F)、−88.2(3F)、−89.2(34F)、−119.8(2F)、−126.5(30F)。
単位数(a)の平均値:7。
NMR spectrum of compound (10i);
1 H-NMR (300.4 MHz, solvent: deuterated chloroform, standard: TMS) δ (ppm): 3.9 (3H).
19 F-NMR (282.7 MHz, solvent: deuterated chloroform, standard: CFCl 3 ) δ (ppm): −84.0 (30F), −88.2 (3F), −89.2 (34F), −119 .8 (2F), -126.5 (30F).
Average number of units (a): 7.

300mLのナスフラスコに、化合物(10i)の92.5gおよび化合物(11)の6.51gを入れ、12時間撹拌した。
NH(CH−Si(OCH ・・・(11)
In a 300 mL eggplant flask, 92.5 g of compound (10i) and 6.51 g of compound (11) were added and stirred for 12 hours.
NH 2 (CH 2 ) 3 —Si (OCH 3 ) 3 (11)

撹拌終了後、化合物(1−1)を97質量%含む組成物を得た。NMRから、化合物(9i)の98%が化合物(1−1)に変換されていることを確認した。また、化合物(11)のすべてが反応しており、副生物であるメタノールが生成していることを確認した。得られた化合物(1−1)のMnを測定したところ、2,900であった。   After the completion of stirring, a composition containing 97% by mass of compound (1-1) was obtained. From NMR, it was confirmed that 98% of the compound (9i) was converted to the compound (1-1). In addition, it was confirmed that all of the compound (11) had reacted and methanol as a by-product was produced. It was 2,900 when Mn of the obtained compound (1-1) was measured.

化合物(1−1)のNMRスペクトル;
H−NMR(300.4MHz、溶媒:重クロロホルム、基準:TMS) δ(ppm):0.6(2H)、1.6(2H)、2.8(1H)、3.3(2H)、3.5(9H)。
19F−NMR(282.7MHz、溶媒:重クロロホルム、基準:CFCl) δ(ppm):−84.1(30F)、−87.9(3F)、−89.3(34F)、−120.8(2F)、−126.6(28F)、−127.2(2F)。
NMR spectrum of compound (1-1);
1 H-NMR (300.4 MHz, solvent: deuterated chloroform, standard: TMS) δ (ppm): 0.6 (2H), 1.6 (2H), 2.8 (1H), 3.3 (2H) 3.5 (9H).
19 F-NMR (282.7 MHz, solvent: deuterated chloroform, standard: CFCl 3 ) δ (ppm): -84.1 (30F), -87.9 (3F), -89.3 (34F), -120 .8 (2F), -126.6 (28F), -127.2 (2F).

〔合成例2:化合物(1−2)の合成〕
化合物(1−2)を下記の方法により合成した。
CFCF−O−(CFCFO−CFCFCFCFO)CFCFO−CFCFCFC(O)NH(CH−Si(OCH ・・・(1−2)
ただし、aは10〜16の整数であり、aの平均値は13である。
[Synthesis Example 2: Synthesis of Compound (1-2)]
Compound (1-2) was synthesized by the following method.
CF 3 CF 2 —O— (CF 2 CF 2 O—CF 2 CF 2 CF 2 CF 2 O) a CF 2 CF 2 O—CF 2 CF 2 CF 2 C (O) NH (CH 2 ) 3 —Si ( OCH 3 ) 3 (1-2)
However, a is an integer of 10 to 16, and the average value of a is 13.

還流冷却器を接続した200mLのナスフラスコに、合成例1で得た化合物(6ii)の114.72g、フッ化ナトリウムの8.1gおよびR−225の101.72gを入れ、さらに合成例1の化合物(7)の95.18gを加えた。窒素雰囲気下、その溶液を50℃で12時間撹拌した後、室温で終夜撹拌した。加圧ろ過器で反応液からフッ化ナトリウムを除去した後、過剰の化合物(7)とR−225を減圧留去した。さらにシリカゲルクロマトグラフィ(展開溶媒:R−225)で高極性の不純物を除去し、下式(8)中、単位数(a+1)の平均値が14である、化合物(8ii)の94.57g(収率77%)を得た。
CFCH−O−(CFCFHO−CFCFCFCHO)a+1−C(O)CF(CF)OCFCFCF ・・・(8)
In a 200 mL eggplant flask connected to a reflux condenser, 114.72 g of the compound (6ii) obtained in Synthesis Example 1; 8.1 g of sodium fluoride; and 101.72 g of R-225 were added. 95.18 g of compound (7) was added. The solution was stirred at 50 ° C. for 12 hours under a nitrogen atmosphere and then stirred overnight at room temperature. After removing sodium fluoride from the reaction solution with a pressure filter, excess compound (7) and R-225 were distilled off under reduced pressure. Furthermore, high-polarity impurities were removed by silica gel chromatography (developing solvent: R-225), and in the following formula (8), 94.57 g (yield of compound (8ii) having an average number of units (a + 1) of 14). Rate 77%).
CF 3 CH 2 -O- (CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O) a + 1 -C (O) CF (CF 3) OCF 2 CF 2 CF 3 ··· (8)

化合物(8ii)のNMRスペクトル;
H−NMR(300.4MHz、溶媒:重クロロホルム、基準:TMS) δ(ppm):4.4(28H)、4.9(2H)、6.0−6.2(14H)。
19F−NMR(282.7MHz、溶媒:重クロロホルム、基準:CFCl) δ(ppm):−75.2(3F)、−80.0(1F)、−81.9(3F)、−82.7(3F)、−84.7〜−85.0(28F)、−86.0(1F)、−90.5〜−93.0(28F)、−121.1(2F)、−121.5(26F)、−128.0(28F)、−130.3(2F)、−132.5(1F)、−145.3(14F)。
単位数(a+1)の平均値:14。
NMR spectrum of compound (8ii);
1 H-NMR (300.4 MHz, solvent: deuterated chloroform, standard: TMS) δ (ppm): 4.4 (28H), 4.9 (2H), 6.0-6.2 (14H).
19 F-NMR (282.7 MHz, solvent: deuterated chloroform, standard: CFCl 3 ) δ (ppm): −75.2 (3F), −80.0 (1F), −81.9 (3F), −82 .7 (3F), -84.7 to -85.0 (28F), -86.0 (1F), -90.5 to -93.0 (28F), -121.1 (2F), -121 .5 (26F), -128.0 (28F), -130.3 (2F), -132.5 (1F), -145.3 (14F).
Average number of units (a + 1): 14.

オートクレーブ(ニッケル製、内容積3L)を用意し、オートクレーブのガス出口に、0℃に保持した冷却器、フッ化ナトリウムペレット充填層および−10℃に保持した冷却器を直列に設置した。また−10℃に保持した冷却器から凝集した液をオートクレーブに戻す液体返送ラインを設置した。オートクレーブにR−113の2,350gを投入し、25℃に保持しながら撹拌した。オートクレーブに窒素ガスを25℃で1時間吹き込んだ後、20%フッ素ガスを、25℃、流速4.2L/時間で1時間吹き込んだ。20%フッ素ガスを同じ流速で吹き込みながら、オートクレーブに、化合物(8ii)の213gをR−113の732gに溶解した溶液を、29時間かけて注入した。20%フッ素ガスを同じ流速で吹き込みながら、オートクレーブの内圧を0.15MPa(ゲージ圧)まで加圧した。オートクレーブ内を25℃から40℃にまで加熱しながら、R−113中に0.009g/mLのベンゼンを含むベンゼン溶液の4mLを注入し、オートクレーブのベンゼン溶液注入口を閉めた。20分撹拌した後、オートクレーブ内を40℃を保持しながら、再びベンゼン溶液の5mLを注入し、注入口を閉めた。同様の操作をさらに7回繰り返した。ベンゼンの注入総量は0.4gであった。20%フッ素ガスを同じ流速でオートクレーブに吹き込みながら、1時間撹拌を続けた。オートクレーブ内の圧力を大気圧にして、窒素ガスを1時間吹き込んだ。オートクレーブの内容物をエバポレータで濃縮し、下式(9)中、単位数(a)の平均値が13である、化合物(9ii)の250.1g(収率99%)を得た。
CFCF−O−(CFCFO−CFCFCFCFO)CFCFO−CFCFCFCFO−C(O)CF(CF)OCFCFCF ・・・(9)
An autoclave (made of nickel, internal volume 3 L) was prepared, and a cooler maintained at 0 ° C., a sodium fluoride pellet packed layer, and a cooler maintained at −10 ° C. were installed in series at the gas outlet of the autoclave. Moreover, the liquid return line which returns the liquid aggregated from the cooler hold | maintained at -10 degreeC to an autoclave was installed. 2,350 g of R-113 was added to the autoclave and stirred while maintaining at 25 ° C. After nitrogen gas was blown into the autoclave at 25 ° C. for 1 hour, 20% fluorine gas was blown in at 25 ° C. and a flow rate of 4.2 L / hour for 1 hour. While blowing 20% fluorine gas at the same flow rate, a solution of 213 g of compound (8ii) dissolved in 732 g of R-113 was injected into the autoclave over 29 hours. While blowing 20% fluorine gas at the same flow rate, the internal pressure of the autoclave was increased to 0.15 MPa (gauge pressure). While heating the interior of the autoclave from 25 ° C. to 40 ° C., 4 mL of a benzene solution containing 0.009 g / mL benzene was injected into R-113, and the benzene solution inlet of the autoclave was closed. After stirring for 20 minutes, while maintaining the inside of the autoclave at 40 ° C., 5 mL of the benzene solution was again injected, and the inlet was closed. The same operation was further repeated 7 times. The total amount of benzene injected was 0.4 g. While 20% fluorine gas was blown into the autoclave at the same flow rate, stirring was continued for 1 hour. The pressure in the autoclave was set to atmospheric pressure, and nitrogen gas was blown for 1 hour. The content of the autoclave was concentrated with an evaporator to obtain 250.1 g (yield 99%) of the compound (9ii) having the average number of units (a) of 13 in the following formula (9).
CF 3 CF 2 -O- (CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) a CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O-C (O) CF (CF 3) OCF 2 CF 2 CF 3 (9)

化合物(9ii)のNMRスペクトル;
19F−NMR(282.7MHz、溶媒:重クロロホルム、基準:CFCl) δ(ppm):−80.3(1F)、−82.0〜−82.5(6F)、−84.2(54F)、−86.9〜88.0(6F)、−89.4(58F)、−126.6(56F)、−130.4(2F)、−132.4(1F)。
単位数(a)の平均値:13。
NMR spectrum of compound (9ii);
19 F-NMR (282.7 MHz, solvent: deuterated chloroform, standard: CFCl 3 ) δ (ppm): −80.3 (1F), −82.0 to −82.5 (6F), −84.2 ( 54F), -86.9-88.0 (6F), -89.4 (58F), -126.6 (56F), -130.4 (2F), -132.4 (1F).
Average number of units (a): 13.

500mLのPFA製丸底ナスフラスコに、化合物(9ii)の110gおよびR−225の220gを入れた。氷浴で冷却しながら撹拌し、窒素雰囲気下、メタノールの3.5gを滴下漏斗からゆっくり滴下し、窒素でバブリングしながら12時間撹拌した。反応混合物をエバポレータで濃縮し、下式(10)中、単位数(a)の平均値が13である、化合物(10ii)の103g(収率100%)を得た。
CFCF−O−(CFCFO−CFCFCFCFO)CFCFO−CFCFCFC(O)OCH ・・・(10)
A 500 mL PFA round bottom eggplant flask was charged with 110 g of compound (9ii) and 220 g of R-225. The mixture was stirred while being cooled in an ice bath, and 3.5 g of methanol was slowly dropped from the dropping funnel under a nitrogen atmosphere, followed by stirring for 12 hours while bubbling with nitrogen. The reaction mixture was concentrated with an evaporator to obtain 103 g (yield: 100%) of the compound (10ii) having the average number of units (a) of 13 in the following formula (10).
CF 3 CF 2 -O- (CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) a CF 2 CF 2 O-CF 2 CF 2 CF 2 C (O) OCH 3 ··· (10)

化合物(10ii)のNMRスペクトル;
H−NMR(300.4MHz、溶媒:重クロロホルム、基準:TMS) δ(ppm):3.9(3H)。
19F−NMR(282.7MHz、溶媒:重クロロホルム、基準:CFCl) δ(ppm):−84.0(54F)、−88.2(3F)、−89.2(58F)、−119.8(2F)、−126.5(54F)。
単位数(a)の平均値:13。
NMR spectrum of compound (10ii);
1 H-NMR (300.4 MHz, solvent: deuterated chloroform, standard: TMS) δ (ppm): 3.9 (3H).
19 F-NMR (282.7 MHz, solvent: deuterated chloroform, standard: CFCl 3 ) δ (ppm): −84.0 (54F), −88.2 (3F), −89.2 (58F), −119 .8 (2F), -126.5 (54F).
Average number of units (a): 13.

300mLのナスフラスコに、化合物(10ii)の100.5gおよび合成例1の化合物(11)の4.38gを入れ、12時間撹拌した。
撹拌終了後、化合物(1−2)を97質量%含む組成物を得た。NMRから、化合物(10ii)の98%が化合物(1−2)に変換されていることを確認した。また、化合物(11)のすべてが反応しており、副生物であるメタノールが生成していることを確認した。得られた化合物(1−2)のMnを測定したところ、4,900であった。
In a 300 mL eggplant flask, 100.5 g of the compound (10ii) and 4.38 g of the compound (11) of Synthesis Example 1 were added and stirred for 12 hours.
After the completion of stirring, a composition containing 97% by mass of compound (1-2) was obtained. From NMR, it was confirmed that 98% of the compound (10ii) was converted to the compound (1-2). In addition, it was confirmed that all of the compound (11) had reacted and methanol as a by-product was produced. It was 4,900 when Mn of the obtained compound (1-2) was measured.

化合物(1−2)のNMRスペクトル;
H−NMR(300.4MHz、溶媒:重クロロホルム、基準:TMS) δ(ppm):0.6(2H)、1.6(2H)、2.8(1H)、3.3(2H)、3.5(9H)。
19F−NMR(282.7MHz、溶媒:重クロロホルム、基準:CFCl) δ(ppm):−84.1(54F)、−87.9(3F)、−89.3(58F)、−120.8(2F)、−126.6(52F)、−127.2(2F)。
NMR spectrum of compound (1-2);
1 H-NMR (300.4 MHz, solvent: deuterated chloroform, standard: TMS) δ (ppm): 0.6 (2H), 1.6 (2H), 2.8 (1H), 3.3 (2H) 3.5 (9H).
19 F-NMR (282.7 MHz, solvent: deuterated chloroform, standard: CFCl 3 ) δ (ppm): -84.1 (54F), -87.9 (3F), -89.3 (58F), -120 .8 (2F), -126.6 (52F), -127.2 (2F).

〔合成例3:化合物(1−3)の合成〕
化合物(1−3)を下記の方法により合成した。
(CHO)Si−(CHNHC(O)O(CHO−(CFCFO)−(CFO)CFCHO−C(O)NH(CH−Si(OCH ・・・(1−3)
ただし、pは15〜33の整数であり、qは8〜25の整数であり、pの平均値は約26、qの平均値は13である。
[Synthesis Example 3: Synthesis of Compound (1-3)]
Compound (1-3) was synthesized by the following method.
(CH 3 O) 3 Si- ( CH 2) 3 NHC (O) O (CH 2) 2 O- (CF 2 CF 2 O) p - (CF 2 O) q CF 2 CH 2 O-C (O) NH (CH 2) 3 -Si ( OCH 3) 3 ··· (1-3)
However, p is an integer of 15 to 33, q is an integer of 8 to 25, the average value of p is about 26, and the average value of q is 13.

D4000(Solvay Solexis社製、商品名:D4000)の10gおよび触媒であるDBTDLの0.03gをCFE−419の25.0gに溶解した溶液を、窒素雰囲気下で300mLのナスフラスコに入れ、該ナスフラスコの内温を5℃以下に保持した。該ナスフラスコ内に、化合物(12)の1.2gをCFE−419の10.0gに溶解した溶液を1時間かけて穏やかに滴下し、約12時間撹拌した。過剰の化合物(12)およびCFE−419を減圧留去し、室温で液体の化合物の11.0gを得た。
該化合物のNMR分析の結果、D4000中の−CFCHOHの99.1モル%が−CFCHOC(O)NH(CHSi(OCHに変換された化合物であることを確認した。すなわち、化合物(1−3)が主たる生成物であった。得られた化合物(1−3)のMnを測定したところ、4,400であった。
O=C=NCHCHCHSi(OCH・・・(12)
A solution prepared by dissolving 10 g of D4000 (manufactured by Solvay Solexis, trade name: D4000) and 0.03 g of DBTDL as a catalyst in 25.0 g of CFE-419 was placed in a 300 mL eggplant flask under a nitrogen atmosphere. The internal temperature of the flask was kept below 5 ° C. In the eggplant flask, a solution of 1.2 g of compound (12) dissolved in 10.0 g of CFE-419 was gently added dropwise over 1 hour and stirred for about 12 hours. Excess compound (12) and CFE-419 were distilled off under reduced pressure to obtain 11.0 g of a liquid compound at room temperature.
As a result of NMR analysis of the compound, 99.1 mol% of —CF 2 CH 2 OH in D4000 was converted to —CF 2 CH 2 OC (O) NH (CH 2 ) 3 Si (OCH 3 ) 3 It was confirmed that. That is, the compound (1-3) was the main product. It was 4,400 when Mn of the obtained compound (1-3) was measured.
O = C = NCH 2 CH 2 CH 2 Si (OCH 3 ) 3 (12)

化合物(1−3)のNMRスペクトル;
H−NMR(300.4MHz、溶媒:重クロロホルム、基準:TMS) δ(ppm):0.9(4H)、1.8(4H)、3.2(4H)、3.8(18H)、7.0(2H)。
19F−NMR(282.7MHz、溶媒:重クロロホルム、基準:CFCl) δ(ppm):−52.1(11F)、−53.7(11F)、−55.4(4F)、−81.3(8F)、−83.3(4F)、−89.1(34F)、−90.7(18F)。
NMR spectrum of compound (1-3);
1 H-NMR (300.4 MHz, solvent: deuterated chloroform, standard: TMS) δ (ppm): 0.9 (4H), 1.8 (4H), 3.2 (4H), 3.8 (18H) 7.0 (2H).
19 F-NMR (282.7 MHz, solvent: deuterated chloroform, standard: CFCl 3 ) δ (ppm): −52.1 (11F), −53.7 (11F), −55.4 (4F), −81 .3 (8F), -83.3 (4F), -89.1 (34F), -90.7 (18F).

〔合成例4:含フッ素エーテル化合物(F)の合成〕
国際公開第2009/008380号の化合物(A1−1)(CFO[CFCFO]CFC(O)NH(CHSi(OCH、aは7.3)と同様にして、主鎖の一方の末端のみに加水分解性シリル基を有する含フッ素エーテル化合物(F)を合成した。得られた含フッ素エーテル化合物(F)のMnを測定したところ、1,100であった。
[Synthesis Example 4: Synthesis of fluorinated ether compound (F)]
Compound (A1-1) of International Publication No. 2009/008380 (CF 3 O [CF 2 CF 2 O] a CF 2 C (O) NH (CH 2 ) 3 Si (OCH 3 ) 3 , a is 7.3 ), A fluorinated ether compound (F) having a hydrolyzable silyl group only at one end of the main chain was synthesized. It was 1,100 when Mn of the obtained fluorine-containing ether compound (F) was measured.

〔例1〕
(含フッ素エーテル組成物の製造)
媒体(B)として、R−225とIPAとを体積比率34.5/65.5で混合した媒体(極性項(dP)の体積平均値:5.1、水素結合項(dH)の体積平均値:11.2。)の300gを調製した。その後、該媒体に、含フッ素エーテル化合物(A1)として、合成例2で製造した化合物(1−2)の0.15gを溶解し、含フッ素エーテル組成物(X1)を製造した。
[Example 1]
(Production of fluorine-containing ether composition)
As a medium (B), a medium in which R-225 and IPA are mixed at a volume ratio of 34.5 / 65.5 (volume average value of polar term (dP): 5.1, volume average of hydrogen bond term (dH)) 300 g of value: 11.2.) Was prepared. Thereafter, 0.15 g of the compound (1-2) produced in Synthesis Example 2 was dissolved in the medium as the fluorinated ether compound (A1) to produce a fluorinated ether composition (X1).

(表面層を有する基材の製造)
厚さ1mmのガラスの表面に、含フッ素エーテル組成物(X1)をディップコート法により塗布し、120℃の熱風循環オーブン中で30分間加熱して乾燥させることで表面層を形成した。
形成された表面層の水接触角およびヘキサデカン接触角の測定、ならびに耐摩耗性および貯蔵安定性の評価結果を表2に示す。
(Manufacture of a substrate having a surface layer)
A surface layer was formed by applying the fluorine-containing ether composition (X1) to the surface of a glass having a thickness of 1 mm by a dip coating method and heating and drying in a 120 ° C. hot air circulating oven for 30 minutes.
Table 2 shows the measurement results of the water contact angle and the hexadecane contact angle of the formed surface layer, and the evaluation results of the abrasion resistance and storage stability.

〔例2〜13〕
含フッ素エーテル化合物、媒体の種類を表1に示すように変更した以外は、例1と同様にして、含フッ素エーテル組成物(X2)〜(X13)を製造した。
含フッ素エーテル組成物の種類を表1に示すように変更した以外は、例1と同様にして、表面層を有する基材を製造した。
形成された表面層の水接触角およびヘキサデカン接触角の測定、ならびに耐摩耗性および貯蔵安定性の評価結果を表2に示す。
なお、表1における媒体の組成における括弧内の数値は各溶媒の体積比率である。
[Examples 2 to 13]
Fluorinated ether compositions (X2) to (X13) were produced in the same manner as in Example 1 except that the types of the fluorinated ether compound and the medium were changed as shown in Table 1.
A substrate having a surface layer was produced in the same manner as in Example 1 except that the type of the fluorinated ether composition was changed as shown in Table 1.
Table 2 shows the measurement results of the water contact angle and the hexadecane contact angle of the formed surface layer, and the evaluation results of the abrasion resistance and storage stability.
In Table 1, the numerical value in parentheses in the composition of the medium is the volume ratio of each solvent.

Figure 0006127438
Figure 0006127438

Figure 0006127438
Figure 0006127438

例1〜6の含フッ素エーテル組成物(X1)〜(X6)を用いて形成した表面層は、水接触角およびヘキサデカン接触角が大きく、優れた撥水撥油性を発現し、防汚性と耐摩耗性に優れていた。優れた耐摩耗性が得られた要因は、以下のように推察される。溶解度パラメータの極性項(dP)と水素結合項(dH)の体積平均値が特定の範囲内の媒体(B)を用いたことで、含フッ素エーテル化合物(A1)のポリ(オキシペルフルオロアルキレン)鎖と、極性を持った連結基とが共に溶解しやすくなったと考えられる。そのため、加水分解性シリル基の末端の溶解が良好になり、該末端と基材との反応性が高まったと考えられる。
一方、例7〜13の含フッ素エーテル組成物(X7)〜(X13)を用いて形成した表面層は、耐摩耗性が不充分であった。例7の含フッ素エーテル組成物(X7)は、含フッ素エーテル化合物の加水分解性シリル基1つ当たりの数平均分子量が2,000未満であるためと考えられる。例8〜10の含フッ素エーテル組成物(X8)〜(X10)は、媒体の溶解度パラメータの極性項(dP)と水素結合項(dH)の体積平均値が特定の範囲内でなかったためと考えられる。例11の含フッ素エーテル組成物(X11)は、媒体に含フッ素有機溶媒を含まなかったためと考えられる。例12〜13の含フッ素エーテル組成物(X12)〜(X13)は、媒体の溶解度パラメータの極性項(dP)が特定の範囲外だったためと考えられる。
The surface layers formed using the fluorine-containing ether compositions (X1) to (X6) of Examples 1 to 6 have a large water contact angle and hexadecane contact angle, exhibit excellent water and oil repellency, and antifouling properties. Excellent wear resistance. The reason why excellent wear resistance was obtained is assumed as follows. Poly (oxyperfluoroalkylene) chain of the fluorinated ether compound (A1) is obtained by using the medium (B) in which the volume average value of the polar term (dP) and the hydrogen bond term (dH) of the solubility parameter is in a specific range. And the polar linking group are considered to be easily dissolved together. For this reason, it is considered that the end of the hydrolyzable silyl group is better dissolved and the reactivity between the end and the substrate is increased.
On the other hand, the surface layers formed using the fluorine-containing ether compositions (X7) to (X13) of Examples 7 to 13 had insufficient wear resistance. The fluorine-containing ether composition (X7) of Example 7 is considered because the number average molecular weight per hydrolyzable silyl group of the fluorine-containing ether compound is less than 2,000. The fluorine-containing ether compositions (X8) to (X10) of Examples 8 to 10 are considered to be because the volume average values of the polar term (dP) and the hydrogen bond term (dH) of the solubility parameter of the medium were not within a specific range. It is done. It is considered that the fluorinated ether composition (X11) of Example 11 did not contain a fluorinated organic solvent in the medium. In the fluorine-containing ether compositions (X12) to (X13) of Examples 12 to 13, it is considered that the polarity term (dP) of the solubility parameter of the medium was out of a specific range.

Claims (7)

下記含フッ素エーテル化合物(A1)、その部分加水分解縮合物(A2)、または前記含フッ素エーテル化合物(A1)と部分加水分解縮合物(A2)との混合物と、下記媒体(B)と、を含む含フッ素エーテル組成物。
含フッ素エーテル化合物(A1):ポリ(オキシペルフルオロアルキレン)鎖を主鎖に有し、かつ該主鎖の少なくとも一方の末端に加水分解性シリル基を有し、前記ポリ(オキシペルフルオロアルキレン)鎖と前記加水分解性シリル基とがアミド結合またはウレタン結合を有する連結基で結合され、前記加水分解性シリル基1つ当たりの数平均分子量が2,000以上である含フッ素エーテル化合物。
媒体(B):含フッ素有機溶媒と非フッ素系アルコールとを含み、含まれている溶媒のハンセン溶解度パラメータの極性項(dP)の体積平均値が2〜6、水素結合項(dH)の体積平均値が4〜12である媒体。
The following fluorinated ether compound (A1), a partially hydrolyzed condensate thereof (A2), or a mixture of the fluorinated ether compound (A1) and the partially hydrolyzed condensate (A2), and the following medium (B): A fluorine-containing ether composition.
Fluorinated ether compound (A1): having a poly (oxyperfluoroalkylene) chain in the main chain, and having a hydrolyzable silyl group at least at one end of the main chain, A fluorine-containing ether compound in which the hydrolyzable silyl group is bonded to a linking group having an amide bond or a urethane bond, and the number average molecular weight per hydrolyzable silyl group is 2,000 or more.
Medium (B) : a fluorine- containing organic solvent and a non-fluorinated alcohol, the volume average value of the polar term (dP) of the Hansen solubility parameter of the contained solvent is 2 to 6, and the volume of the hydrogen bond term (dH) A medium having an average value of 4 to 12.
前記含フッ素エーテル化合物(A1)が、下式(1)で表される化合物である、請求項1に記載の含フッ素エーテル組成物。
X−O−R−Y ・・・(1)
ただし、式(1)中の記号は下記の通りである。
:ポリ(オキシペルフルオロアルキレン)鎖。
X:炭素数1〜6のペルフルオロアルキル基またはY。
Y:下式(Y1)〜(Y3)のいずれかで表される基。
−Q−C(O)NH(CHn1−Si(L)m(R3−m1 ・・・(Y1)
−Q−CHOC(O)NH(CHn2−Si(Lm2(R3−m2 ・・・(Y2)
−Q−C(O)N((CHn3−Si(Lm3(R3−m3 ・・・(Y3)
〜Q:2価の連結基。
〜L:加水分解性基。
〜R:水素原子または1価の炭化水素基。
m1〜m3:1〜3の整数。
n1〜n3:1〜6の整数。
The fluorine-containing ether composition according to claim 1, wherein the fluorine-containing ether compound (A1) is a compound represented by the following formula (1).
X-O- Rf- Y (1)
However, the symbols in formula (1) are as follows.
R f : poly (oxyperfluoroalkylene) chain.
X: C1-C6 perfluoroalkyl group or Y.
Y: a group represented by any one of the following formulas (Y1) to (Y3).
-Q 1 -C (O) NH ( CH 2) n1 -Si (L 1) m 1 (R 1) 3-m1 ··· (Y1)
-Q 2 -CH 2 OC (O) NH (CH 2) n2 -Si (L 2) m2 (R 2) 3-m2 ··· (Y2)
-Q 3 -C (O) N ( (CH 2) n3 -Si (L 3) m3 (R 3) 3-m3) 2 ··· (Y3)
Q 1 to Q 3 : a divalent linking group.
L 1 to L 3 : hydrolyzable groups.
R 1 to R 3 : a hydrogen atom or a monovalent hydrocarbon group.
m1 to m3: an integer of 1 to 3.
n1 to n3: an integer of 1 to 6.
請求項1または2に記載の含フッ素エーテル組成物を基材の表面に塗布した後、前記媒体(B)を除去することを特徴とする、表面層を有する基材の製造方法。 A method for producing a substrate having a surface layer, wherein the medium (B) is removed after the fluorine-containing ether composition according to claim 1 or 2 is applied to the surface of the substrate. 前記含フッ素エーテル組成物を前記基材の表面に塗布する方法が、スピンコート法、ワイプコート法、スプレーコート法、スキージーコート法、ディップコート法、ダイコート法、インクジェット法、フローコート法、ロールコート法、キャスト法、ラングミュア・ブロジェット法またはグラビアコート法である、請求項に記載の表面層を有する基材の製造方法。 The method of applying the fluorine-containing ether composition to the surface of the substrate includes spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, ink jet, flow coating, and roll coating. The manufacturing method of the base material which has a surface layer of Claim 3 which is a method, a cast method, a Langmuir-Blodget method, or a gravure coat method. 前記基材の材質が、金属、樹脂、ガラス、セラミック、石、またはこれらの複合材料で
ある、請求項またはに記載の表面層を有する基材の製造方法。
The manufacturing method of the base material which has a surface layer of Claim 3 or 4 whose material of the said base material is a metal, resin, glass, a ceramic, a stone, or these composite materials.
請求項1または2に記載の含フッ素エーテル組成物から形成されてなる表面層を有する基材。 Substrate having a surface layer formed by forming a fluorine-containing ether composition according to claim 1 or 2. 請求項1または2に記載の含フッ素エーテル組成物から形成されてなる表面層を入力面に有する、タッチパネル。 The touch panel which has a surface layer formed from the fluorine-containing ether composition of Claim 1 or 2 in an input surface.
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CN105452333B (en) 2013-08-13 2017-08-08 旭硝子株式会社 Fluoropolyether compound, lubricant, liquid composition and article
WO2016121211A1 (en) * 2015-01-29 2016-08-04 ダイキン工業株式会社 Surface treatment agent
JP6780224B2 (en) * 2015-07-28 2020-11-04 Dic株式会社 Coating compositions and articles
CN107922445B (en) * 2015-09-01 2020-07-28 Agc株式会社 Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid, and article
KR102559704B1 (en) * 2017-06-02 2023-07-25 에이지씨 가부시키가이샤 Fluorine-containing ether composition for deposition, article on which deposition film is formed, and manufacturing method thereof
CN111548026B (en) 2017-06-21 2022-04-12 Agc株式会社 Article with water-repellent and oil-repellent layer and its manufacturing method
JP7126891B2 (en) * 2017-08-16 2022-08-29 Agc株式会社 Method for producing fluorine-containing ether compound
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EP3922626B1 (en) 2019-02-08 2024-09-04 Agc Inc. Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid, article, method for producing article, and method for producing fluorine-containing compound
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KR20240134335A (en) 2022-01-11 2024-09-09 에이지씨 가부시키가이샤 Surface treatment agent, article, method of manufacturing article

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000234071A (en) * 1999-02-16 2000-08-29 Tomoegawa Paper Co Ltd Antifouling composition
JP2006201558A (en) * 2005-01-21 2006-08-03 Hitachi Ltd Article or transparent part having liquid repellent layer, optical lens having liquid repellent layer, method for producing the same, and projection type image display apparatus using the optical lens
CN103551075B (en) * 2005-04-01 2016-07-06 大金工业株式会社 Surface modifier
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