JP6156390B2 - Method for removing silanol compound, chemical filter and exposure apparatus - Google Patents
Method for removing silanol compound, chemical filter and exposure apparatus Download PDFInfo
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- B01J20/3248—Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one type of heteroatom selected from a nitrogen, oxygen or sulfur, these atoms not being part of the carrier as such
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D2257/55—Compounds of silicon, phosphorus, germanium or arsenic
- B01D2257/553—Compounds comprising hydrogen, e.g. silanes
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Description
本発明は、シラノール化合物を含有する被処理空気中のシラノール化合物を除去するためのシラノール化合物の除去方法に関する。また、本発明は、該シラノール化合物の除去方法を実施するためのケミカルフィルタ及び露光装置に関する。 The present invention relates to a silanol compound removing method for removing a silanol compound in air to be treated containing the silanol compound. The present invention also relates to a chemical filter and an exposure apparatus for carrying out the method for removing the silanol compound.
半導体・液晶をはじめとする産業では、製品の歩留まりや品質、信頼性を確保するため、クリーンルーム内の空気や製品表面の汚染制御が重要である。特に、半導体産業分野では、製品の高集積度化に伴い、回路パターンが微細化しているため、半導体の製造に用いられる露光工程においては、露光波長が短波長化してきている。現在では、光源として、波長が248nmであるKrFエキシマレーザーや、波長が193nmであるArFエキシマレーザーが用いられている。 In industries such as semiconductors and liquid crystals, control of air in clean rooms and product surfaces is important to ensure product yield, quality, and reliability. In particular, in the semiconductor industry field, circuit patterns are miniaturized as products are highly integrated, so that the exposure wavelength has become shorter in the exposure process used for semiconductor manufacturing. At present, a KrF excimer laser having a wavelength of 248 nm and an ArF excimer laser having a wavelength of 193 nm are used as a light source.
半導体の製造では、ウエハの表面に水酸基があるとレジストがはじかれるので、ウエハの処理過程として、フォトレジスト塗布前にウエハの水酸基を除去し、疎水性を増すために、ヘキサメチルジシラザン(HMDS)が使用される。このHMDSが加水分解すると、トリメチルシラノールが生成する。そして、トリメチルシラノールは、上記露光工程において、エネルギーの高い短波長の光と光化化学反応を起こし、露光装置の露光レンズに付着し、ヘイズ(曇り)の原因となり、露光障害を引き起こす。 In semiconductor manufacturing, when a hydroxyl group is present on the wafer surface, the resist is repelled. Therefore, as a wafer processing process, hexamethyldisilazane (HMDS) is used to remove the hydroxyl group of the wafer before applying the photoresist and increase the hydrophobicity. ) Is used. When this HMDS is hydrolyzed, trimethylsilanol is produced. And in the said exposure process, trimethylsilanol raise | generates photochemical reaction with light with a short wavelength with high energy, adheres to the exposure lens of an exposure apparatus, causes a haze (cloudiness), and causes exposure trouble.
このような背景から、特許文献1(特開2009−295765号公報)には、シラノール類を、水酸基が存在する繊維状無機化合物に接触させて、該繊維状無機化合物に化学結合でシラノール類を捕集除去する基体の浄化方法が開示されている。 From such a background, Patent Document 1 (Japanese Patent Application Laid-Open No. 2009-295765) discloses that silanols are brought into contact with a fibrous inorganic compound in which a hydroxyl group is present, and the silanols are chemically bonded to the fibrous inorganic compound. A method for purifying a substrate to be collected and removed is disclosed.
また、特許文献2(特開2011−166085号公報)には、多孔質体から構成される多数の吸着剤を備え、前記多数の吸着剤の少なくとも一部は、金属触媒(白金又はパラジウム)が担持されているケミカルフィルタが開示されている。該ケミカルフィルタでは、金属触媒が担持されているフィルタ部で、シラノール化合物を二量化し、その二量体を金属触媒が担持されていないフィルタ部で吸着させる方法が採用されている。 Patent Document 2 (Japanese Patent Application Laid-Open No. 2011-166085) includes a large number of adsorbents composed of a porous body, and at least a part of the large number of adsorbents includes a metal catalyst (platinum or palladium). A supported chemical filter is disclosed. The chemical filter employs a method in which a silanol compound is dimerized in a filter portion on which a metal catalyst is supported, and the dimer is adsorbed on a filter portion on which the metal catalyst is not supported.
また、特許文献3(特開2012−30164号公報)には、シラノール化合物を含む空気を減湿して相対湿度33%以下とする減湿手段と、前記減湿手段で減湿された空気をろ過して、前記シラノール化合物を除去するケミカルフィルタとを備えることを特徴とする空気浄化システムが開示されている。 Patent Document 3 (Japanese Patent Application Laid-Open No. 2012-30164) describes a dehumidifying means that dehumidifies air containing a silanol compound to a relative humidity of 33% or less, and air dehumidified by the dehumidifying means. An air purification system comprising a chemical filter for filtering and removing the silanol compound is disclosed.
なお、半導体製造用の露光装置の光学系空間の空気や、半導体製造用のクリーンルーム内の空気は、通常、相対湿度が30〜55%に調節されている。 Note that the relative humidity of the air in the optical system space of the exposure apparatus for semiconductor manufacture and the air in the clean room for semiconductor manufacture is usually adjusted to 30 to 55%.
ところが、引用文献1では、無機状繊維化合物の表面温度を70〜300℃に保持する機構が必要であり、温湿度が極めて精密に制御されている露光装置等に搭載するには、現実的ではなく、また、コスト高になってしまう。 However, in Cited Document 1, a mechanism for maintaining the surface temperature of the inorganic fiber compound at 70 to 300 ° C. is necessary, and it is practical to mount it on an exposure apparatus or the like in which the temperature and humidity are extremely precisely controlled. It will also be expensive.
また、引用文献2では、高価な金属触媒が使用されていること、金属触媒が担持されている部分と、シラノール化合物の二量体を吸着させる部分とが必要となるため、フィルタ層が厚くなってしまい、経済的ではない。 Further, in Cited Document 2, an expensive metal catalyst is used, a part on which the metal catalyst is supported, and a part for adsorbing the dimer of the silanol compound are required, so that the filter layer becomes thick. It is not economical.
また、引用文献3では、減湿を行うための除湿装置が必要になるため、コスト高になってしまう。 In Cited Document 3, since a dehumidifying device for dehumidifying is required, the cost increases.
従って、本発明の課題は、被処理空気中のシラノール化合物の除去効果が高いシラノール化合物の除去方法を提供することにある。 Therefore, the subject of this invention is providing the removal method of the silanol compound with the high removal effect of the silanol compound in to-be-processed air.
本発明者らは、上記従来技術における課題を解決すべく、鋭意研究を重ねた結果、(1)シラノール化合物、特に、トリメチルシラノールを、含酸素官能基が導入されている活性炭に接触させることにより、含酸素官能基の作用で、シラノール化合物を二量化させることができ、そして、シラノール化合物を二量化させることにより、活性炭に吸着され易くすることができること、活性炭中の含酸素官能基の量を0.5mmol/g以上と多くすることにより、シラノール化合物、特に、トリメチルシラノール化合物の除去効果が高くなること、(2)ところが、0.5mmol/g以上の含酸素官能基を有する活性炭で、細孔径が小さいマイクロ孔を多く有するものは、被処理空気の相対湿度が45%程度以下だと、高いシラノール化合物の除去効果を示すが、被処理空気の相対湿度が50〜55%程度になると、45%程度以下の場合に比べ、シラノール化合物の除去効果が低くなってしまうこと、そして、(3)0.5mmol/g以上の含酸素官能基を有する活性炭の細孔径分布を調節し、細孔径が大きなマイクロ孔を多くすることにより、被処理空気の相対湿度が50〜55%程度であっても、45%程度以下の場合と比べたときのシラノール化合物の除去性能の低下を小さくすることができること等を見出し、本発明を完成させるに至った。 As a result of intensive studies to solve the above-described problems in the prior art, the present inventors have made (1) bringing a silanol compound, particularly trimethylsilanol, into contact with activated carbon into which an oxygen-containing functional group has been introduced. The silanol compound can be dimerized by the action of the oxygen-containing functional group, and by dimerizing the silanol compound, it can be easily adsorbed on the activated carbon, and the amount of the oxygen-containing functional group in the activated carbon can be reduced. By increasing the amount to 0.5 mmol / g or more, the effect of removing silanol compounds, particularly trimethylsilanol compound, is enhanced. (2) However, the activated carbon having an oxygen-containing functional group of 0.5 mmol / g or more Those having many micropores with small pore diameters have high silanol compounds when the relative humidity of the air to be treated is about 45% or less. Although the removal effect is shown, when the relative humidity of the air to be treated is about 50 to 55%, the removal effect of the silanol compound becomes lower than that of about 45% or less, and (3) 0.5 mmol Even if the relative humidity of the air to be treated is about 50 to 55% by adjusting the pore size distribution of activated carbon having an oxygen-containing functional group of / g or more and increasing the number of micropores having a large pore size, 45% As a result, the inventors have found that the reduction in silanol compound removal performance can be reduced as compared with the case of less than about the case, and have completed the present invention.
すなわち、本発明(1)は、含酸素官能基を有する活性炭であり、該含酸素官能基を有する活性炭1g当たりの含酸素官能基の量が0.5mmol/g以上であり、窒素吸着等温線からMP法により求められる微分細孔容積分布において、マイクロ孔のピークのピークトップが0.8〜1.1nmにある含酸素官能基を有する活性炭に、シラノール化合物を含有する被処理空気を接触させて、シラノール化合物を二量化させ、生成した該シラノール化合物の二量体を、該含酸素官能基を有する活性炭に吸着させることにより、該被処理空気中の該シラノール化合物を除去することを特徴とするシラノール化合物の除去方法を提供するものである。 That is, the present invention (1) is activated carbon having an oxygen-containing functional group, the amount of oxygen-containing functional groups per 1 g of the activated carbon having the oxygen-containing functional group is 0.5 mmol / g or more, and a nitrogen adsorption isotherm In the differential pore volume distribution obtained by the MP method, the activated carbon having an oxygen-containing functional group having a peak top of the micropores in the range of 0.8 to 1.1 nm is brought into contact with the air to be treated containing the silanol compound. The silanol compound is dimerized, and the dimer of the produced silanol compound is adsorbed on the activated carbon having the oxygen-containing functional group to remove the silanol compound in the air to be treated. The present invention provides a method for removing silanol compounds.
また、本発明(2)は、含酸素官能基を有する活性炭であり、該含酸素官能基を有する活性炭1g当たりの含酸素官能基の量が0.5mmol/g以上であり、窒素吸着等温線からMP法により求められる微分細孔容積分布において、マイクロ孔のピークのピークトップが0.8〜1.1nmにある含酸素官能基を有する活性炭が用いられていることを特徴とする本発明(1)のシラノール化合物の除去方法を実施するためのケミカルフィルタを提供するものである。 Further, the present invention (2) is activated carbon having an oxygen-containing functional group, the amount of oxygen-containing functional group per 1 g of the activated carbon having the oxygen-containing functional group is 0.5 mmol / g or more, and a nitrogen adsorption isotherm In the differential pore volume distribution determined by the MP method from the present invention, activated carbon having an oxygen-containing functional group having a peak top of a micropore peak of 0.8 to 1.1 nm is used ( The present invention provides a chemical filter for carrying out the silanol compound removal method of 1).
また、本発明(3)は、本発明(2)のケミカルフィルタを有することを特徴とする露光装置を提供するものである。 The present invention (3) provides an exposure apparatus having the chemical filter of the present invention (2).
本発明によれば、被処理空気中のシラノール化合物の除去効果が高いシラノール化合物の除去方法を提供することができる。また、本発明によれば、被処理空気中のシラノール化合物の除去効果が高いケミカルフィルタを提供することができる。また、本発明によれば、トリメチルシラノールの露光レンズへの付着による露光障害が少ない露光装置を提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the removal method of the silanol compound with the high removal effect of the silanol compound in to-be-processed air can be provided. Moreover, according to this invention, the chemical filter with the high removal effect of the silanol compound in to-be-processed air can be provided. Further, according to the present invention, it is possible to provide an exposure apparatus with few exposure obstacles due to adhesion of trimethylsilanol to the exposure lens.
本発明のシラノール化合物の除去方法は、含酸素官能基を有する活性炭であり、該含酸素官能基を有する活性炭1g当たりの含酸素官能基の量が0.5mmol/g以上であり、窒素吸着等温線からMP法により求められる微分細孔容積分布において、マイクロ孔のピークのピークトップが0.8〜1.1nmにある含酸素官能基を有する活性炭に、シラノール化合物を含有する被処理空気を接触させて、シラノール化合物を二量化させ、生成した該シラノール化合物の二量体を、該含酸素官能基を有する活性炭に吸着させることにより、該被処理空気中の該シラノール化合物を除去することを特徴とするシラノール化合物の除去方法である。 The method for removing a silanol compound of the present invention is activated carbon having an oxygen-containing functional group, the amount of the oxygen-containing functional group per 1 g of the activated carbon having the oxygen-containing functional group is 0.5 mmol / g or more, and the nitrogen adsorption isotherm. In the differential pore volume distribution obtained by the MP method from the line, the treated air containing the silanol compound is contacted with activated carbon having an oxygen-containing functional group whose peak top of the micropore is 0.8 to 1.1 nm. The silanol compound is dimerized, and the produced dimer of the silanol compound is adsorbed on the activated carbon having the oxygen-containing functional group to remove the silanol compound in the air to be treated. And a method for removing the silanol compound.
本発明のシラノール化合物の除去方法に係る含酸素官能基を有する活性炭は、含酸素官能基が導入されている活性炭である。つまり、含酸素官能基を有する活性炭とは、活性炭の炭素原子に、含酸素官能基が結合している活性炭である。言い換えると、本発明のシラノール化合物の除去方法に係る含酸素官能基を有する活性炭は、酸化処理された活性炭であり、酸化処理により含酸素官能基が導入された活性炭である。 The activated carbon having an oxygen-containing functional group according to the method for removing a silanol compound of the present invention is an activated carbon into which an oxygen-containing functional group has been introduced. That is, the activated carbon having an oxygen-containing functional group is activated carbon in which an oxygen-containing functional group is bonded to a carbon atom of the activated carbon. In other words, the activated carbon having an oxygen-containing functional group according to the method for removing a silanol compound of the present invention is activated carbon that has been subjected to oxidation treatment, and activated carbon into which an oxygen-containing functional group has been introduced by oxidation treatment.
含酸素官能基としては、カルボニル基、水酸基、ラクトン基、カルボキシル基、キノン基、無水カルボン酸基等が挙げられる。そして、含酸素官能基を有する活性炭は、含酸素官能基として、少なくとも、カルボニル基、水酸基、ラクトン基及びカルボキシル基のうちの1種又は2種以上を有することが好ましく、少なくとも、カルボニル基、水酸基、ラクトン基及びカルボキシル基を有することが特に好ましい。 Examples of the oxygen-containing functional group include a carbonyl group, a hydroxyl group, a lactone group, a carboxyl group, a quinone group, and a carboxylic anhydride group. The activated carbon having an oxygen-containing functional group preferably has at least one or more of a carbonyl group, a hydroxyl group, a lactone group and a carboxyl group as the oxygen-containing functional group, and at least a carbonyl group, a hydroxyl group It is particularly preferable to have a lactone group and a carboxyl group.
含酸素官能基を有する活性炭の1g当たりの含酸素官能基の量は、0.5mmol/g以上、好ましくは0.8〜3.0mmol/g、特に好ましくは1.0〜2.5mmol/gである。含酸素官能基を有する活性炭の1g当たりの含酸素官能基の量が、上記範囲にあることにより、シラノール化合物の除去効果が高くなる。 The amount of the oxygen-containing functional group per 1 g of the activated carbon having an oxygen-containing functional group is 0.5 mmol / g or more, preferably 0.8 to 3.0 mmol / g, particularly preferably 1.0 to 2.5 mmol / g. It is. When the amount of the oxygen-containing functional group per 1 g of the activated carbon having the oxygen-containing functional group is within the above range, the effect of removing the silanol compound is enhanced.
なお、含酸素官能基を有する活性炭の1g当たりの含酸素官能基の量及び各官能基の量は、以下のようにして求められる。先ず、含酸素官能基を有する活性炭を、115℃に調節した恒温乾燥器で8〜10時間真空乾燥後、乾燥剤としてシリカゲルを入れたデシケータ中で放冷する。次いで、4個の50ml共栓三角フラスコ(A、B、C、D)を用意し、各三角フラスコに、冷却した活性炭1gを0.1mgまで正確に量り取る。次いで、三角フラスコ(D)にN/10炭酸水素ナトリウム水溶液を、三角フラスコ(C)にN/10炭酸ナトリウム水溶液を、三角フラスコ(B)にN/10水酸化ナトリウム水溶液を、三角フラスコ(A)にN/10ナトリウムエトキシドエタノール溶液を、25ml加え、160rpm、25℃にて24時間振盪する。振盪後、遠心分離にて上澄みと沈殿に分離し、上澄み液10mlを20mlビーカーに正確に量り、pH計を用いてpHが4になるまで、N/10塩酸で滴定する。次いで、塩酸滴定量から、次式により、活性炭1g当たりの各塩基の消費量を算出する。
塩基消費量(mmol/g)=(0.1×(10−HCl滴定量)×25)/10
滴定の結果、炭酸水素ナトリウムの消費量がD(mmol/g)、炭酸ナトリウムの消費量がC(mmol/g)、水酸化ナトリウムの消費量がB(mmol/g)、ナトリウムエトキシドの消費量がA(mmol/g)であった場合、活性炭1g当たりの含酸素官能基の量は「A(mmol/g)」であり、また、カルボニル基の量は「A−B(mmol/g)」、水酸基の量は「B−C(mmol/g)」、ラクトン基の量は「C−D(mmol/g)」、カルボキシル基の量は「D(mmol/g)」となる。In addition, the amount of oxygen-containing functional groups per gram of activated carbon having oxygen-containing functional groups and the amount of each functional group are determined as follows. First, activated carbon having an oxygen-containing functional group is vacuum-dried for 8 to 10 hours in a constant temperature dryer adjusted to 115 ° C., and then allowed to cool in a desiccator containing silica gel as a desiccant. Next, four 50 ml stoppered Erlenmeyer flasks (A, B, C, D) are prepared, and 1 g of cooled activated carbon is accurately weighed to 0.1 mg in each Erlenmeyer flask. Next, an N / 10 sodium hydrogen carbonate aqueous solution was added to the Erlenmeyer flask (D), an N / 10 sodium carbonate aqueous solution was added to the Erlenmeyer flask (C), an N / 10 sodium hydroxide aqueous solution was added to the Erlenmeyer flask (B), and an Erlenmeyer flask (A ) 25 ml of N / 10 sodium ethoxide ethanol solution is added to the solution and shaken at 160 rpm at 25 ° C. for 24 hours. After shaking, the supernatant and precipitate are separated by centrifugation, and 10 ml of the supernatant is accurately weighed into a 20 ml beaker and titrated with N / 10 hydrochloric acid until the pH is 4 using a pH meter. Next, the consumption of each base per gram of activated carbon is calculated from the hydrochloric acid titration amount according to the following formula.
Base consumption (mmol / g) = (0.1 × (10-HCl titration) × 25) / 10
As a result of titration, the consumption of sodium bicarbonate was D (mmol / g), the consumption of sodium carbonate was C (mmol / g), the consumption of sodium hydroxide was B (mmol / g), and the consumption of sodium ethoxide When the amount was A (mmol / g), the amount of oxygen-containing functional groups per gram of activated carbon was “A (mmol / g)”, and the amount of carbonyl groups was “A-B (mmol / g). ) ", The amount of hydroxyl groups is" BC (mmol / g) ", the amount of lactone groups is" CD (mmol / g) ", and the amount of carboxyl groups is" D (mmol / g) ".
本発明のシラノール化合物の除去方法に係る含酸素官能基を有する活性炭は、窒素吸着等温線からMP法により求められる微分細孔容積分布において、マイクロ孔のピークのピークトップが、0.8〜1.1nm、好ましくは0.9〜1.0nmにある。含酸素官能基を有する活性炭の微分細孔容積分布におけるマイクロ孔のピークのピークトップが上記範囲にあることにより、シラノール化合物の除去効果が高く、且つ、被被処理空気の相対湿度が50〜55%であっても、45%程度以下の場合と比べたときのシラノール化合物の除去効果の低下を小さくすることができるという効果を奏する。 The activated carbon having an oxygen-containing functional group according to the method for removing a silanol compound of the present invention has a micropore peak peak top of 0.8 to 1 in a differential pore volume distribution determined by an MP method from a nitrogen adsorption isotherm. .1 nm, preferably 0.9-1.0 nm. When the peak top of the micropore peak in the differential pore volume distribution of the activated carbon having an oxygen-containing functional group is in the above range, the removal effect of the silanol compound is high, and the relative humidity of the air to be treated is 50 to 55. Even if it is%, there exists an effect that the fall of the removal effect of the silanol compound when compared with the case of about 45% or less can be made small.
窒素吸着等温線とは、窒素ガス吸着法により、材料を一定温度にし、圧力と吸着量の変化を測定したものである。MP法とは、吸着剤(多孔質炭素材料)に窒素を吸着させることにより、吸着等温線を求め、そして、この吸着等温線を吸着層の厚さtに対する細孔容積に変換し(tプロットする)、そして、このプロットの曲率(吸着層の厚さtの変化量に対する細孔容積の変化量)に基づき細孔分布曲線を得るものである。窒素吸着等温線からMP法により求められる微分細孔容積分布とは、窒素吸着等温線からMP法により算出される細孔径とその体積の関係を示すものであり、図1に示すように、横軸に細孔径(nm)を、縦軸にdV/dD(細孔径D(nm)の変化量に対する細孔容積V(cm3/g)の変化割合)をプロットして得られる細孔容積に関する分布図である。なお、図1は、活性炭の微分細孔容積分布を示す模式的なグラフである。The nitrogen adsorption isotherm is obtained by measuring changes in pressure and the amount of adsorption while keeping the material at a constant temperature by a nitrogen gas adsorption method. In the MP method, an adsorption isotherm is obtained by adsorbing nitrogen to an adsorbent (porous carbon material), and the adsorption isotherm is converted into a pore volume with respect to the thickness t of the adsorption layer (t plot). And a pore distribution curve is obtained based on the curvature of this plot (the amount of change in the pore volume with respect to the amount of change in the thickness t of the adsorption layer). The differential pore volume distribution obtained by the MP method from the nitrogen adsorption isotherm indicates the relationship between the pore diameter calculated by the MP method from the nitrogen adsorption isotherm and its volume, and as shown in FIG. It relates to the pore volume obtained by plotting the pore diameter (nm) on the axis and dV / dD (change ratio of the pore volume V (cm 3 / g) to the amount of change of the pore diameter D (nm)) on the vertical axis. It is a distribution map. FIG. 1 is a schematic graph showing the differential pore volume distribution of activated carbon.
そして、微分細孔容積分布において、マイクロ孔のピークのピークトップが0.8〜1.1nmにあるとは、微分細孔容積分布図のマイクロ孔の範囲に見られるピークのピークトップの位置が、0.8〜1.1nmの範囲にあることを指す。なお、マイクロ孔とは、細孔径が0nmより大きく2nm以下の細孔を指す。よって、窒素吸着等温線からMP法により求められる微分細孔容積分布において、マイクロ孔のピークのピークトップが0.8〜1.1nmにある活性炭では、マイクロ孔である0nmより大きく2nm以下の細孔について、窒素吸着等温線からMP法により、細孔径に対するdV/dDの値を求めたときに、dV/dDの最大値となるときの細孔径の値が、0.8〜1.1nmの範囲にある。 In the differential pore volume distribution, the peak top of the micropore peak is in the range of 0.8 to 1.1 nm. The position of the peak top of the peak seen in the micropore range of the differential pore volume distribution diagram is , 0.8 to 1.1 nm. Micropores refer to pores having a pore diameter greater than 0 nm and 2 nm or less. Therefore, in the differential pore volume distribution obtained by the MP method from the nitrogen adsorption isotherm, the activated carbon having the peak top of the micropores in the range of 0.8 to 1.1 nm is finer than 0 nm which is the micropores and 2 nm or less. For the pores, when the value of dV / dD with respect to the pore diameter was determined from the nitrogen adsorption isotherm by the MP method, the value of the pore diameter when the maximum value of dV / dD was 0.8 to 1.1 nm. Is in range.
図1中、符号Xの微分細孔容積分布は、0nmより大きく2nm以下の範囲では、細孔径が0.9nmの位置にピークトップがある。よって、符号Xの微分細孔容積分布を有する活性炭では、微分細孔容積分布において、マイクロ孔のピークのピークトップが0.9nmにある。また、図1中、符号Yの微分細孔容積分布は、0nmより大きく2nm以下の範囲では、細孔径が0.7nmの位置にピークトップがある。よって、符号Yの微分細孔容積分布を有する活性炭では、微分細孔容積分布において、マイクロ孔のピークのピークトップが0.7nmにある。 In FIG. 1, the differential pore volume distribution indicated by symbol X has a peak top at a position where the pore diameter is 0.9 nm in the range from 0 nm to 2 nm. Therefore, in the activated carbon having the differential pore volume distribution of X, the peak top of the micropore peak is 0.9 nm in the differential pore volume distribution. Further, in FIG. 1, the differential pore volume distribution indicated by the symbol Y has a peak top at a position where the pore diameter is 0.7 nm in the range from 0 nm to 2 nm. Therefore, in the activated carbon having the differential pore volume distribution of Y, the peak top of the micropore peak is 0.7 nm in the differential pore volume distribution.
本発明のシラノール化合物の除去方法に係る含酸素官能基を有する活性炭は、窒素吸着等温線からMP法により求められる微分細孔容積分布において、細孔径が0nmより大きく2nm以下の細孔の細孔容積に対する細孔径が0.7〜1.2nmの細孔の細孔容積の割合((細孔径が0.7〜1.2nmの細孔の細孔容積の総和(cm3/g)/細孔径が0nmより大きく2nm以下の細孔の細孔容積の総和(cm3/g))×100)が、好ましくは70〜100%、特に好ましくは80〜100%、更に好ましくは90〜100%である。含酸素官能基を有する活性炭の微分細孔容積分布における細孔径が0nmより大きく2nm以下の細孔の細孔容積に対する細孔径が0.7〜1.2nmの細孔の細孔容積の割合が上記範囲にあることにより、シラノール化合物の除去効果が高く、且つ、被処理空気の相対湿度が50〜55%であっても、45%程度以下の場合と比べたときのシラノール化合物の除去効果の低下を小さくすることができるという効果が高まる。The activated carbon having an oxygen-containing functional group according to the method for removing a silanol compound of the present invention has pore diameters of pores having a pore diameter of more than 0 nm and 2 nm or less in a differential pore volume distribution determined by the MP method from a nitrogen adsorption isotherm. Ratio of pore volume of pores having a pore diameter of 0.7 to 1.2 nm to the volume ((total sum of pore volumes of pores having a pore diameter of 0.7 to 1.2 nm (cm 3 / g) / fine The total pore volume (cm 3 / g)) × 100) of pores having a pore diameter of more than 0 nm and 2 nm or less is preferably 70 to 100%, particularly preferably 80 to 100%, and more preferably 90 to 100%. It is. The ratio of the pore volume of pores having a pore diameter of 0.7 to 1.2 nm to the pore volume of pores having a pore diameter of more than 0 nm and not more than 2 nm in the differential pore volume distribution of activated carbon having an oxygen-containing functional group is By being in the above range, the silanol compound removal effect is high, and even if the relative humidity of the air to be treated is 50 to 55%, the removal effect of the silanol compound when compared with the case where it is about 45% or less. The effect that reduction can be made small increases.
本発明のシラノール化合物の除去方法に係る含酸素官能基を有する活性炭のBET比表面積は、好ましくは1700m2/g以上、特に好ましくは1900〜2600m2/gである。含酸素官能基を有する活性炭のBET比表面積が上記範囲にあることにより、シラノール化合物の除去効果が高く、且つ、被処理空気の相対湿度が50〜55%であっても、45%程度以下の場合と比べたときのシラノール化合物の除去効果の低下を小さくすることができるという効果が高まる。BET specific surface area of the activated carbon with oxygen-containing functional groups according to the method for removing the silanol compound of the present invention is preferably 1700 m 2 / g or more, particularly preferably 1900~2600m 2 / g. When the BET specific surface area of the activated carbon having an oxygen-containing functional group is in the above range, the removal effect of the silanol compound is high, and even if the relative humidity of the air to be treated is 50 to 55%, it is about 45% or less. The effect that the fall of the removal effect of the silanol compound when compared with the case can be made small increases.
本発明のシラノール化合物の除去方法に係る含酸素官能基を有する活性炭のマイクロ孔容積は、好ましくは1.0cm3/g以上、特に好ましくは1.05〜1.25cm3/gである。なお、マイクロ孔容積とは、細孔径が0nmより大きく2nm以下の細孔の細孔容積の総和を指す。含酸素官能基を有する活性炭のマイクロ孔容積が上記範囲にあることにより、シラノール化合物の除去効果が高く、且つ、被処理空気の相対湿度が50〜55%であっても、45%程度以下の場合と比べたときのシラノール化合物の除去効果の低下を小さくすることができるという効果が高まる。Micro pore volume of the activated carbon with oxygen-containing functional groups according to the method for removing the silanol compound of the present invention is preferably 1.0 cm 3 / g or more, particularly preferably 1.05~1.25cm 3 / g. The micropore volume refers to the total pore volume of pores having a pore diameter greater than 0 nm and 2 nm or less. When the micropore volume of the activated carbon having an oxygen-containing functional group is within the above range, the removal effect of the silanol compound is high, and even if the relative humidity of the air to be treated is 50 to 55%, it is about 45% or less. The effect that the fall of the removal effect of the silanol compound when compared with the case can be made small increases.
本発明のシラノール化合物の除去方法に係る含酸素官能基を有する活性炭は、マイクロ孔以外に、細孔径が2nmを超え50nm以下であるメソ孔、及び細孔径が50nmを超えるマクロ孔を有する。 The activated carbon having an oxygen-containing functional group according to the method for removing a silanol compound of the present invention has, in addition to micropores, mesopores having a pore diameter of more than 2 nm and not more than 50 nm, and macropores having a pore diameter of more than 50 nm.
含酸素官能基を有する活性炭を製造する方法としては、活性炭を気相又は液相で酸化する方法が挙げられる。 Examples of a method for producing activated carbon having an oxygen-containing functional group include a method of oxidizing activated carbon in a gas phase or a liquid phase.
含酸素官能基を有する活性炭の製造の原料となる活性炭としては、特に制限されないが、ヤシ殻系活性炭、木質炭系活性炭、ピッチ系活性炭、フェノール樹脂系活性炭が挙げられる。原料活性炭の物性又は性状は、製造目的とする含酸素官能基を有する活性炭の物性又は性状に合わせて、適宜選択される。 Although it does not restrict | limit especially as activated carbon used as the raw material of manufacture of the activated carbon which has an oxygen-containing functional group, A coconut shell type | system | group activated carbon, a wood charcoal type activated carbon, a pitch type activated carbon, and a phenol resin type activated carbon are mentioned. The physical properties or properties of the raw material activated carbon are appropriately selected according to the physical properties or properties of the activated carbon having an oxygen-containing functional group to be produced.
活性炭を気相で酸化する方法としては、活性炭を、オゾンガスで酸化する方法、塩素ガスで酸化する方法、空気中で加熱することにより空気酸化する方法、酸素処理と窒素酸化物処理の併用、酸素ガス又は空気による低温プラズマ処理等が挙げられる。 As a method of oxidizing activated carbon in the gas phase, a method of oxidizing activated carbon with ozone gas, a method of oxidizing with chlorine gas, a method of air oxidation by heating in air, a combination of oxygen treatment and nitrogen oxide treatment, oxygen Examples thereof include low-temperature plasma treatment with gas or air.
また、活性炭を液相で酸化する方法としては、活性炭を、オゾン水溶液、硝酸水溶液、過酸化水素水溶液、硫酸溶液、塩素酸溶液、ヨウ素酸溶液、次亜塩素酸溶液、臭素水溶液、過マンガン酸カリウム溶液等に浸漬する方法が挙げられる。液相での活性炭の酸化を行った後は、酸化処理された活性炭を、純水で十分に洗浄し、80〜120℃程度で乾燥する。 In addition, as a method of oxidizing activated carbon in the liquid phase, activated carbon is converted into ozone aqueous solution, nitric acid aqueous solution, hydrogen peroxide aqueous solution, sulfuric acid solution, chloric acid solution, iodic acid solution, hypochlorous acid solution, bromine aqueous solution, permanganic acid. The method of immersing in a potassium solution etc. is mentioned. After the activated carbon is oxidized in the liquid phase, the oxidized activated carbon is sufficiently washed with pure water and dried at about 80 to 120 ° C.
活性炭の酸化条件は、適宜選択されるが、活性炭1g当たりの含酸素官能基の量が、0.5mmol/g以上となる条件、好ましくは0.8〜3.0mmol/gとなる条件、特に好ましくは1.0〜2.5mmol/gとなる条件が選択される。 The oxidation conditions of the activated carbon are selected as appropriate, but the condition that the amount of oxygen-containing functional groups per 1 g of activated carbon is 0.5 mmol / g or more, preferably 0.8 to 3.0 mmol / g, particularly Preferably, a condition of 1.0 to 2.5 mmol / g is selected.
そして、活性炭を酸化することにより、活性炭の炭素の一部が酸化されて、含酸素官能基へと変換され、含酸素官能基を有する活性炭が得られる。 Then, by oxidizing the activated carbon, a part of the carbon of the activated carbon is oxidized and converted to an oxygen-containing functional group, and activated carbon having an oxygen-containing functional group is obtained.
本発明のシラノール化合物の除去方法では、含酸素官能基を有する活性炭には、シラノール化合物を含有する被処理空気を接触させる。 In the silanol compound removal method of the present invention, the activated carbon having an oxygen-containing functional group is brought into contact with the air to be treated containing the silanol compound.
被処理空気は、特に制限されないが、例えば、半導体製造用の露光装置の光学系設置空間の空気等のシラノール化合物を含有する空気である。 The air to be processed is not particularly limited, but is air containing a silanol compound such as air in an optical system installation space of an exposure apparatus for manufacturing a semiconductor.
被処理空気に含有されているシラノール化合物は、シラノール基(−Si−OH)を有する化合物である。シラノール化合物としては、分子量が300以下のシラノール化合物が好ましく、分子量が200以下のシラノール化合物が特に好ましい。更に好ましくは、シラノール化合物としては、トリメチルシラノール、トリエチルシラノール等が挙げられる。そして、本発明のシラノール化合物の除去方法では、被処理空気がトリメチルシラノールを含有する場合に、特に顕著な効果を奏する。 The silanol compound contained in the air to be treated is a compound having a silanol group (—Si—OH). As the silanol compound, a silanol compound having a molecular weight of 300 or less is preferable, and a silanol compound having a molecular weight of 200 or less is particularly preferable. More preferably, examples of the silanol compound include trimethylsilanol and triethylsilanol. And in the removal method of the silanol compound of this invention, when a to-be-processed air contains a trimethylsilanol, there exists a remarkable effect.
被処理空気中のシラノール化合物の含有量は、特に制限されないが、例えば、半導体製造用の露光装置の光学系設置空間の空気の場合、通常、0.3〜8.0ppbである。 The content of the silanol compound in the air to be treated is not particularly limited. For example, in the case of air in an optical system installation space of an exposure apparatus for manufacturing a semiconductor, it is usually 0.3 to 8.0 ppb.
含酸素官能基を有する活性炭に被処理空気を接触させる方法としては、特に制限されず、例えば、含酸素官能基を有する活性炭を充填容器に充填して、含酸素官能基を有する活性炭層を形成し、その活性炭層に被処理空気を通過させる方法、含酸素官能基を有する活性炭を担体に担持し、その担体内に被処理空気を通過させる方法等が挙げられる。 The method of bringing the air to be treated into contact with the activated carbon having an oxygen-containing functional group is not particularly limited. For example, the activated carbon having an oxygen-containing functional group is formed by filling activated carbon having an oxygen-containing functional group into a filling container. Examples thereof include a method of allowing the air to be treated to pass through the activated carbon layer, a method of supporting the activated carbon having an oxygen-containing functional group on a carrier, and allowing the air to be treated to pass through the carrier.
含酸素官能基を有する活性炭に被処理空気を接触させるときの温度は、5〜40℃、好ましくは10〜30℃である。 The temperature at which the air to be treated is brought into contact with the activated carbon having an oxygen-containing functional group is 5 to 40 ° C, preferably 10 to 30 ° C.
含酸素官能基を有する活性炭に被処理空気を接触させるときの被処理空気の供給は、被処理空気中のシラノール化合物の含有量、含酸素官能基を有する活性炭の使用量等により、適宜選択される。 The supply of the air to be treated when the air to be treated is brought into contact with the activated carbon having the oxygen-containing functional group is appropriately selected depending on the content of the silanol compound in the air to be treated, the amount of the activated carbon having the oxygen-containing functional group, and the like. The
本発明のシラノール化合物の除去方法では、含酸素官能基を有する活性炭にシラノール化合物を含有する被処理空気を接触させることにより、下記式(1)に示すように、含酸素官能基を有する活性炭中の含酸素官能基の酸素原子の非共有電子対と、シラノール化合物中のシラノール基の水素原子とが結合し、次いで、近隣に存在している含酸素官能基の酸素原子の非共有電子対にシラノール基の水素原子が結合している2つのシラノール化合物が、脱水縮合して、二量化するものと考えられる。二量化反応は、「2R3SiOH→R3SiOSiR3+H2O」である。
式(1):In the method for removing a silanol compound of the present invention, an activated carbon having an oxygen-containing functional group is brought into contact with activated carbon having an oxygen-containing functional group by bringing the treated air containing the silanol compound into contact with the activated carbon having an oxygen-containing functional group as shown in the following formula (1). The unshared electron pair of the oxygen atom of the oxygen-containing functional group and the hydrogen atom of the silanol group in the silanol compound are bonded to each other, and then to the unshared electron pair of the oxygen atom of the oxygen-containing functional group present in the vicinity Two silanol compounds to which the hydrogen atom of the silanol group is bonded are considered to undergo dehydration condensation and dimerization. The dimerization reaction is “2R 3 SiOH → R 3 SiOSiR 3 + H 2 O”.
Formula (1):
本発明者らは、活性炭に導入されている含酸素官能基の作用により、5〜40℃、好ましくは10〜30℃の低温でも、シラノール化合物の二量化が起こること、及びシラノール化合物を二量化することにより、除去対象物の分子量を大きくすることができるので、活性炭に吸着され易くすることができること、活性炭中の含酸素官能基の量を特定の範囲とすることにより、シラノール化合物の除去効果が高くなることを見出した。そして、含酸素官能基を有する活性炭の1g当たりの含酸素官能基の量を、0.5mmol/g以上、好ましくは0.8〜3.0mmol/g、特に好ましくは1.0〜2.5mmol/gとすることにより、シラノール化合物の除去効果が高くなることを見出した。そのため、本発明のシラノール化合物の除去方法によれば、従来、分子量が小さいために、活性炭では吸着除去し難いと考えられていたトリメチルシラノール等の低分子量のシラノール化合物であっても、活性炭に吸着させて除去することができる。また、本発明のシラノール化合物の除去方法によれば、5〜40℃、好ましくは10〜30℃と低温で、被処理空気中のシラノール化合物の除去を行うことができる。 The present inventors have found that dimerization of the silanol compound occurs even at a low temperature of 5 to 40 ° C., preferably 10 to 30 ° C., due to the action of the oxygen-containing functional group introduced into the activated carbon, and the silanol compound is dimerized. Since the molecular weight of the object to be removed can be increased, it can be easily adsorbed on the activated carbon, and the amount of oxygen-containing functional groups in the activated carbon is within a specific range, thereby removing the silanol compound. Found to be higher. And the amount of the oxygen-containing functional group per 1 g of the activated carbon having an oxygen-containing functional group is 0.5 mmol / g or more, preferably 0.8 to 3.0 mmol / g, particularly preferably 1.0 to 2.5 mmol. It was found that the effect of removing the silanol compound is enhanced by setting the amount to / g. Therefore, according to the silanol compound removal method of the present invention, even low-molecular weight silanol compounds such as trimethylsilanol, which have been conventionally considered difficult to adsorb and remove with activated carbon due to its low molecular weight, are adsorbed on activated carbon. Can be removed. Moreover, according to the removal method of the silanol compound of this invention, the removal of the silanol compound in to-be-processed air can be performed at 5-40 degreeC, Preferably it is 10-30 degreeC low temperature.
更に、本発明者らは、含酸素官能基の量が0.5mmol/g以上、好ましくは0.8〜3.0mmol/g、特に好ましくは1.0〜2.5mmol/gである含酸素官能基を有する活性炭であっても、細孔径が小さいマイクロ孔を多く有する活性炭は、被処理空気の相対湿度が50〜55%になると、45%程度以下の場合に比べ、シラノール化合物の除去性能が低くなってしまうことを見出した。そして、相対湿度と活性炭の水分吸着量との関係について検討を重ねたところ、微分細孔容積分布におけるマイクロ孔のピークのピークトップが0.8nm未満にある活性炭は、相対湿度を低湿度から高湿度に変化させた場合、相対湿度が45%程度以下では、空気中の水分を殆ど吸収しないが、相対湿度が45%程度より高くなると水分を吸収し始め、相対湿度が50%程度より高くなると水分の吸収量が多くなること、それに対して、微分細孔容積分布におけるマイクロ孔のピークのピークトップが0.8〜1.1nmにある活性炭は、相対湿度を低湿度から高湿度に変化させた場合、相対湿度が55%程度以下では、空気中の水分を殆ど吸収せず、水分を吸収し始めるのは相対湿度55%程度より高くなったときであり、水分の吸収量が多くなり始めるのは相対湿度60%程度より高くなったときであることを見出した。これらのことから、1g当たりの含酸素官能基の量が、0.5mmol/g以上、好ましくは0.8〜3.0mmol/g、特に好ましくは1.0〜2.5mmol/gである含酸素官能基を有する活性炭について、その細孔分布を調節して、微分細孔容積分布におけるマイクロ孔のピークのピークトップが0.8〜1.1nmにあるようにすることにより、被処理空気の相対湿度が45%より高く55%以下であっても、更には、50〜55%であっても、45%以下の場合と比べたときのシラノール化合物の除去性能の低下を小さくすることができることを見出した。 Furthermore, the present inventors have found that the amount of oxygen-containing functional group is 0.5 mmol / g or more, preferably 0.8 to 3.0 mmol / g, particularly preferably 1.0 to 2.5 mmol / g. Even if the activated carbon has a functional group, the activated carbon having many micropores with small pore diameters has a silanol compound removal performance when the relative humidity of the air to be treated is 50 to 55%, compared with the case where the relative humidity is about 45% or less. Found that it would be lower. When the relationship between the relative humidity and the amount of moisture adsorbed by the activated carbon was repeatedly examined, activated carbon with a peak top of the micropore peak in the differential pore volume distribution of less than 0.8 nm was found to increase the relative humidity from low to high. When the humidity is changed, when the relative humidity is about 45% or less, the moisture in the air is hardly absorbed. However, when the relative humidity becomes higher than about 45%, the moisture starts to be absorbed, and when the relative humidity becomes higher than about 50%. On the other hand, activated carbon with a peak top of the micropore peak in the differential pore volume distribution of 0.8 to 1.1 nm changes the relative humidity from low humidity to high humidity. When the relative humidity is about 55% or less, the moisture in the air is hardly absorbed and the moisture starts to be absorbed when the relative humidity becomes higher than about 55%. Begin increases have found that it is when it becomes higher than the relative humidity of approximately 60%. From these, the amount of oxygen-containing functional groups per gram is 0.5 mmol / g or more, preferably 0.8 to 3.0 mmol / g, particularly preferably 1.0 to 2.5 mmol / g. By adjusting the pore distribution of the activated carbon having an oxygen functional group so that the peak top of the micropore peak in the differential pore volume distribution is 0.8 to 1.1 nm, Even if the relative humidity is higher than 45% and 55% or less, or even 50 to 55%, the decrease in the removal performance of the silanol compound when compared with the case where it is 45% or less can be reduced. I found.
このことから、本発明のシラノール化合物の除去方法では、被処理空気の相対湿度を45%より高く55%以下としても、更に、50〜55%としても、相対湿度を45%以下とした場合と比べたときのシラノール化合物の除去効果の低下が小さく、シラノール化合物の除去効果が高いという効果を示す。そのため、被処理空気の相対湿度が45%より高く55%以下である場合、更に、50〜55%である場合には、本発明のシラノール化合物の除去方法は、含酸素官能基の量が0.5mmol/g未満である含酸素官能基を有する活性炭を用いるシラノール化合物の除去方法に比べ、シラノール化合物の除去効果が高くなるという効果を有する。そして、更に、含酸素官能基を有する活性炭の微分細孔容積分布における細孔径が0nmより大きく2nm以下の細孔の細孔容積に対する細孔径が0.7〜1.2nmの細孔の細孔容積の割合を上記範囲とすること、含酸素官能基を有する活性炭のBET比表面積を上記範囲とすること、含酸素官能基を有する活性炭のマイクロ孔容積を上記範囲とすること等により、効果が高くなる。 Therefore, in the silanol compound removal method of the present invention, the relative humidity of the air to be treated is higher than 45% and lower than or equal to 55%, or even 50 to 55%, and the relative humidity is lower than 45%. When compared, the decrease in the removal effect of the silanol compound is small and the effect of removing the silanol compound is high. Therefore, when the relative humidity of the air to be treated is higher than 45% and 55% or lower, and further 50 to 55%, the silanol compound removal method of the present invention has an oxygen-containing functional group amount of 0. Compared to the silanol compound removal method using activated carbon having an oxygen-containing functional group of less than 0.5 mmol / g, the effect of removing the silanol compound is enhanced. Further, the pore diameter of the pore having a pore diameter of 0.7 to 1.2 nm with respect to the pore volume of the pore having a pore diameter distribution of greater than 0 nm and 2 nm or less in the differential pore volume distribution of the activated carbon having an oxygen-containing functional group By setting the volume ratio in the above range, setting the BET specific surface area of the activated carbon having an oxygen-containing functional group in the above range, setting the micropore volume of the activated carbon having an oxygen-containing functional group in the above range, etc., the effect can be obtained. Get higher.
また、本発明のシラノール化合物の除去方法では、被処理空気の相対湿度を45%より高く55%以下としても、更に、50〜55%としても、相対湿度を45%以下とした場合と比べたときのシラノール化合物の除去性能の低下を小さくすることができるので、被処理空気の相対湿度が30〜55%の範囲で、シラノール化合物の除去効果が高く且つ安定しているという効果を有する。そして、更に、含酸素官能基を有する活性炭の微分細孔容積分布における細孔径が0nmより大きく2nm以下の細孔の細孔容積に対する細孔径が0.7〜1.2nmの細孔の細孔容積の割合を上記範囲とすること、含酸素官能基を有する活性炭のBET比表面積を上記範囲とすること、含酸素官能基を有する活性炭のマイクロ孔容積を上記範囲とすること等により、効果が高くなる。 Moreover, in the removal method of the silanol compound of this invention, even if the relative humidity of the to-be-processed air is higher than 45% and 55% or less, and also 50-55%, compared with the case where relative humidity is 45% or less. Since the decrease in the removal performance of the silanol compound can be reduced, the effect of removing the silanol compound is high and stable when the relative humidity of the air to be treated is in the range of 30 to 55%. Further, the pore diameter of the pore having a pore diameter of 0.7 to 1.2 nm with respect to the pore volume of the pore having a pore diameter distribution of greater than 0 nm and 2 nm or less in the differential pore volume distribution of the activated carbon having an oxygen-containing functional group By setting the volume ratio in the above range, setting the BET specific surface area of the activated carbon having an oxygen-containing functional group in the above range, setting the micropore volume of the activated carbon having an oxygen-containing functional group in the above range, etc., the effect can be obtained. Get higher.
なお、本発明のシラノール化合物の除去方法は、被処理空気の相対湿度が45%以下である場合にも、含酸素官能基の量が0.5mmol/g未満である含酸素官能基を有する活性炭を用いるシラノール化合物の除去方法に比べ、シラノール化合物の除去効果が高くなるという効果を有する。そして、更に、含酸素官能基を有する活性炭の微分細孔容積分布における細孔径が0nmより大きく2nm以下の細孔の細孔容積に対する細孔径が0.7〜1.2nmの細孔の細孔容積の割合を上記範囲とすること、含酸素官能基を有する活性炭のBET比表面積を上記範囲とすること、含酸素官能基を有する活性炭のマイクロ孔容積を上記範囲とすること等により、効果が高くなる。 The method for removing a silanol compound of the present invention is an activated carbon having an oxygen-containing functional group in which the amount of oxygen-containing functional group is less than 0.5 mmol / g even when the relative humidity of the air to be treated is 45% or less. Compared with the silanol compound removal method using, the effect of removing the silanol compound is enhanced. Further, the pore diameter of the pore having a pore diameter of 0.7 to 1.2 nm with respect to the pore volume of the pore having a pore diameter distribution of greater than 0 nm and 2 nm or less in the differential pore volume distribution of the activated carbon having an oxygen-containing functional group By setting the volume ratio in the above range, setting the BET specific surface area of the activated carbon having an oxygen-containing functional group in the above range, setting the micropore volume of the activated carbon having an oxygen-containing functional group in the above range, etc., the effect can be obtained. Get higher.
本発明のケミカルフィルタは、本発明のシラノール化合物の除去方法を実施するためのケミカルフィルタであり、含酸素官能基を有する活性炭であり、該含酸素官能基を有する活性炭1g当たりの含酸素官能基の量が0.5mmol/g以上であり、窒素吸着等温線からMP法により求められる微分細孔容積分布において、マイクロ孔のピークのピークトップが0.8〜1.1nmにある含酸素官能基を有する活性炭が用いられていることを特徴とするケミカルフィルタである。 The chemical filter of the present invention is a chemical filter for carrying out the silanol compound removal method of the present invention, and is an activated carbon having an oxygen-containing functional group, and the oxygen-containing functional group per 1 g of the activated carbon having the oxygen-containing functional group. In the differential pore volume distribution determined by the MP method from the nitrogen adsorption isotherm, the oxygen-containing functional group in which the peak top of the micropore peak is in the range of 0.8 to 1.1 nm It is a chemical filter characterized by using activated carbon having
本発明のケミカルフィルタに係る含酸素官能基を有する活性炭は、本発明のシラノール化合物の除去方法に係る含酸素官能基を有する活性炭と同様である。つまり、本発明のケミカルフィルタは、本発明のシラノール化合物の除去方法に係る含酸素官能基を有する活性炭が用いられている。 The activated carbon having an oxygen-containing functional group according to the chemical filter of the present invention is the same as the activated carbon having an oxygen-containing functional group according to the method for removing a silanol compound of the present invention. In other words, the chemical filter of the present invention uses activated carbon having an oxygen-containing functional group according to the silanol compound removal method of the present invention.
本発明のケミカルフィルタとしては、含酸素官能基を有する活性炭であり、該含酸素官能基を有する活性炭1g当たりの含酸素官能基の量が0.5mmol/g以上であり、窒素吸着等温線からMP法により求められる微分細孔容積分布において、マイクロ孔のピークのピークトップが0.8〜1.1nmにある含酸素官能基を有する活性炭が、通気性を有する充填容器に充填され、活性炭層が形成されているケミカルフィルタが挙げられる。 The chemical filter of the present invention is activated carbon having an oxygen-containing functional group, and the amount of the oxygen-containing functional group per 1 g of the activated carbon having the oxygen-containing functional group is 0.5 mmol / g or more. In the differential pore volume distribution obtained by the MP method, activated carbon having an oxygen-containing functional group with a peak top of the micropores in the range of 0.8 to 1.1 nm is filled in a gas-filled container, and the activated carbon layer A chemical filter in which is formed.
また、本発明のケミカルフィルタとしては、含酸素官能基を有する活性炭であり、該含酸素官能基を有する活性炭1g当たりの含酸素官能基の量が0.5mmol/g以上であり、窒素吸着等温線からMP法により求められる微分細孔容積分布において、マイクロ孔のピークのピークトップが0.8〜1.1nmにある含酸素官能基を有する活性炭が、担体に担持されているケミカルフィルタが挙げられる。 Further, the chemical filter of the present invention is activated carbon having an oxygen-containing functional group, the amount of oxygen-containing functional groups per 1 g of the activated carbon having the oxygen-containing functional group is 0.5 mmol / g or more, and the nitrogen adsorption isotherm. In the differential pore volume distribution obtained from the line by the MP method, there is a chemical filter in which activated carbon having an oxygen-containing functional group having a peak top of a micropore peak of 0.8 to 1.1 nm is supported on a carrier. It is done.
担体に含酸素官能基を有する活性炭が担持されている本発明のケミカルフィルタにおいて、含酸素官能基を有する活性炭が担持される担体としては、特に制限されず、ケミカルフィルタの担体として用いられるものであればよく、例えば、無機繊維で構成される無機繊維質基材(ペーパー)をハニカム構造やプリーツ構造に成形した無機繊維質担体、有機繊維で構成される有機繊維質基材(ペーパー)をハニカム構造やプリーツ構造に成形した有機繊維質担体等が挙げられる。これらのうち、担体としては、プリーツ構造が、単位体積あたりの活性炭量を増やせること、低圧力損失であることから、好ましい。 In the chemical filter of the present invention in which activated carbon having an oxygen-containing functional group is supported on the carrier, the carrier on which the activated carbon having an oxygen-containing functional group is supported is not particularly limited and is used as a carrier for a chemical filter. For example, an inorganic fibrous base material (paper) composed of inorganic fibers is formed into a honeycomb structure or a pleated structure, and an organic fibrous base material (paper) composed of organic fibers is honeycomb. Examples thereof include an organic fibrous carrier molded into a structure or a pleated structure. Among these, as the carrier, a pleated structure is preferable because it can increase the amount of activated carbon per unit volume and has a low pressure loss.
担体に含酸素官能基を有する活性炭が担持されている本発明のケミカルフィルタでは、含酸素官能基を有する活性炭の担持方法は特に制限されない。例えば、担体に含酸素官能基を有する活性炭が担持されている本発明のケミカルフィルタにおいて、含酸素官能基を有する活性炭は、担体にバインダーを用いて担持されていてもよいし、また、無機繊維質又は有機繊維質のシートにより、含酸素官能基を有する活性炭が挟み込むまれることにより、担持されていてもよい。 In the chemical filter of the present invention in which activated carbon having oxygen-containing functional groups is supported on the carrier, the method for supporting activated carbon having oxygen-containing functional groups is not particularly limited. For example, in the chemical filter of the present invention in which activated carbon having an oxygen-containing functional group is supported on a carrier, the activated carbon having an oxygen-containing functional group may be supported on a carrier by using a binder, or an inorganic fiber Activated carbon having oxygen-containing functional groups may be supported by a sheet of quality or organic fiber so as to be supported.
そして、本発明のケミカルフィルタ内に、シラノール化合物を含有する被処理空気、例えば、半導体製造用の露光装置の光学系設置空間の空気を導入し、ケミカルフィルタ内に被処理空気を通過させて、担体に担持されている含酸素官能基を有する活性炭に、被処理空気を接触させることにより、本発明のケミカルフィルタを用いて、本発明のシラノール化合物の除去方法を実施することができる。 And, into the chemical filter of the present invention, air to be treated containing a silanol compound, for example, air in an optical system installation space of an exposure apparatus for manufacturing a semiconductor is introduced, and the air to be treated is passed through the chemical filter, The method for removing a silanol compound of the present invention can be carried out using the chemical filter of the present invention by bringing the air to be treated into contact with activated carbon having an oxygen-containing functional group supported on a carrier.
上述したように、本発明のシラノール化合物の除去方法に係る含酸素官能基を有する活性炭は、被処理空気の相対湿度が45%より高く55%以下、更には、50〜55%であっても、相対湿度が45%以下である場合と比べたときのシラノール化合物の除去性能の低下が小さく、シラノール化合物の除去性能が高いので、そのような活性炭が用いられている本発明のケミカルフィルタは、被処理空気の相対湿度が45%より高く55%以下である場合、更に、50〜55%である場合に、含酸素官能基の量が0.5mmol/g未満である含酸素官能基を有する活性炭を用いるケミカルフィルタに比べ、シラノール化合物の除去性能が高くなるという効果を有する。また、本発明のケミカルフィルタは、被処理空気の相対湿度が30〜55%の範囲で、シラノール化合物の除去性能が高く且つ安定しているという効果を有する。また、本発明のケミカルフィルタは、被処理空気の相対湿度が45%以下である場合にも、含酸素官能基の量が0.5mmol/g未満である含酸素官能基を有する活性炭を用いるケミカルフィルタに比べ、シラノール化合物の除去性能が高くなるという効果を有する。 As described above, the activated carbon having an oxygen-containing functional group according to the method for removing a silanol compound of the present invention has a relative humidity of air to be treated higher than 45% and 55% or lower, and even 50 to 55%. The chemical filter of the present invention in which such activated carbon is used because the decrease in the removal performance of the silanol compound when compared with the case where the relative humidity is 45% or less is small and the removal performance of the silanol compound is high. When the relative humidity of the air to be treated is higher than 45% and lower than or equal to 55%, and further 50 to 55%, the oxygen-containing functional group has an oxygen-containing functional group of less than 0.5 mmol / g. Compared to a chemical filter using activated carbon, the silanol compound removal performance is enhanced. Moreover, the chemical filter of this invention has the effect that the removal performance of a silanol compound is high and stable in the range whose relative humidity of to-be-processed air is 30 to 55%. In addition, the chemical filter of the present invention is a chemical that uses activated carbon having an oxygen-containing functional group in which the amount of the oxygen-containing functional group is less than 0.5 mmol / g even when the relative humidity of the air to be treated is 45% or less. Compared to the filter, the silanol compound removal performance is enhanced.
本発明の露光装置は、本発明のケミカルフィルタを有する露光装置である。 The exposure apparatus of the present invention is an exposure apparatus having the chemical filter of the present invention.
本発明の露光装置に係るケミカルフィルタは、本発明のケミカルフィルタと同様である。 The chemical filter according to the exposure apparatus of the present invention is the same as the chemical filter of the present invention.
本発明の露光装置の構造は、特に制限されず、通常、半導体の製造に用いられている露光装置であればよい。 The structure of the exposure apparatus of the present invention is not particularly limited, and may be any exposure apparatus that is usually used for semiconductor manufacturing.
本発明の露光装置には、光学系部材と露光対象物が設置され外部空気とは遮断可能な光学系設置空間が設けられている。また、本発明の露光装置は、光学系設置空間内の空気を抜き出し、再び、光学系設置空間内に戻す光学系設置空間内の空気の循環経路と、クリーンルーム内の空気を光学系設置空間内に取り込む外部空気取り込み経路と、を有する。そして、本発明の露光装置では、循環経路中及び外部空気取り込み経路中のそれぞれに、本発明のケミカルフィルタが設置される。 The exposure apparatus of the present invention is provided with an optical system installation space in which an optical system member and an exposure object are installed and can be shielded from external air. Further, the exposure apparatus of the present invention extracts the air in the optical system installation space and returns the air in the optical system installation space back to the optical system installation space and the air in the clean room in the optical system installation space. And an external air intake path for intake. In the exposure apparatus of the present invention, the chemical filter of the present invention is installed in each of the circulation path and the external air intake path.
本発明の露光装置は、リレーレンズ系、コンデンサーレンズ系及び投影光学系レンズ(以下、光学系部材とも記載する。)並びに露光対象物の設置部を有する。そして、本発明の露光装置では、外部空気とは遮断可能な小室内に、光学系部材及び露光対象物が設置されることにより、光学系部材及び露光対象物が設置される設置部の空間(以下、光学系設置空間とも記載する。)は、外部空気とは遮断されている。 The exposure apparatus of the present invention includes a relay lens system, a condenser lens system, a projection optical system lens (hereinafter also referred to as an optical system member), and an installation portion for an exposure object. In the exposure apparatus of the present invention, the optical system member and the exposure object are installed in a small chamber that can be cut off from the outside air, so that the space of the installation part in which the optical system member and the exposure object are installed ( Hereinafter, it is also referred to as an optical system installation space.) Is cut off from outside air.
本発明の露光装置は、光学系設置空間内の空気を抜き出し、再び、光学系設置空間内に戻す光学系設置空間内の空気の循環経路と、クリーンルーム内の空気を光学系設置空間内に取り込む外部空気取り込み経路と、を有し、その循環経路中と外部空気取り込み経路中のそれぞれに、本発明のケミカルフィルタが設置されている。そして、本発明の露光装置では、循環経路において、光学系設置空間から抜き出された光学系設置空間内の空気が、循環経路内に設置されているケミカルフィルタを通過することにより、抜き出された光学系設置空間内の空気中のシラノール化合物、特に、トリメチルシラノールが除去される。トリメチルシラノール等のシラノール化合物が除去された空気は、再び、光学系設置空間に戻される。また、本発明の露光装置では、外部空気取り込み経路において、クリーンルームから取り込こまれる空気が、外部空気取り込み経路内に設置されているケミカルフィルタを通過することにより、取り込まれたクリーンルーム内の空気中のシラノール化合物、特に、トリメチルシラノールが除去される。トリメチルシラノール等のシラノール化合物が除去された空気は、光学系設置空間に供給される。 In the exposure apparatus of the present invention, air in the optical system installation space is extracted and returned to the optical system installation space, and the air circulation path in the optical system installation space and the air in the clean room are taken into the optical system installation space. An external air intake path, and the chemical filter of the present invention is installed in each of the circulation path and the external air intake path. In the exposure apparatus of the present invention, the air in the optical system installation space extracted from the optical system installation space in the circulation path is extracted by passing through the chemical filter installed in the circulation path. In addition, silanol compounds in the air in the optical system installation space, particularly trimethylsilanol, are removed. The air from which silanol compounds such as trimethylsilanol have been removed is returned to the optical system installation space again. In the exposure apparatus of the present invention, in the external air intake path, the air taken in from the clean room passes through the chemical filter installed in the external air intake path, so that the air in the clean room taken in The silanol compound, especially trimethylsilanol, is removed. The air from which silanol compounds such as trimethylsilanol have been removed is supplied to the optical system installation space.
(分析方法及び評価方法)
<含酸素官能基量の測定方法>
測定対象の活性炭を、115℃に調節した恒温乾燥器で8〜10時間真空乾燥後、乾燥剤としてシリカゲルを入れたデシケータ中で放冷した。次いで、4個の50ml共栓三角フラスコ(A、B、C、D)を用意し、各三角フラスコに、冷却した活性炭1gを0.1mgまで正確に量り取った。次いで、三角フラスコ(D)にN/10炭酸水素ナトリウム水溶液を、三角フラスコ(C)にN/10炭酸ナトリウム水溶液を、三角フラスコ(B)にN/10水酸化ナトリウム水溶液を、三角フラスコ(A)にN/10ナトリウムエトキシドエタノール溶液を、25ml加え、160rpm、25℃にて24時間振盪した。振盪後、遠心分離にて上澄みと沈殿に分離し、上澄み液10mlを20mlビーカーに正確に量り、pH計を用いてpHが4になるまで、N/10塩酸で滴定した。次いで、塩酸滴定量から、次式により、活性炭1g当たりの各塩基の消費量を算出した。
塩基消費量(mmol/g)=(0.1×(10−HCl滴定量)×25)/10
炭酸水素ナトリウムの消費量がD(mmol/g)、炭酸ナトリウムの消費量がC(mmol/g)、水酸化ナトリウム水溶液の消費量がB(mmol/g)、ナトリウムエトキシドの消費量がA(mmol/g)であった場合、活性炭1g当たりの含酸素官能基量は「A(mmol/g)」であり、また、カルボニル基の量は「A−B(mmol/g)」、水酸基の量は「B−C(mmol/g)」、ラクトン基の量は「C−D(mmol/g)」、カルボキシル基の量は「D(mmol/g)」である。(Analysis method and evaluation method)
<Measurement method of oxygen-containing functional group amount>
The activated carbon to be measured was vacuum-dried for 8 to 10 hours in a constant temperature dryer adjusted to 115 ° C., and then allowed to cool in a desiccator containing silica gel as a desiccant. Next, four 50 ml stoppered Erlenmeyer flasks (A, B, C, D) were prepared, and 1 g of cooled activated carbon was accurately weighed to 0.1 mg in each Erlenmeyer flask. Next, an N / 10 sodium hydrogen carbonate aqueous solution was added to the Erlenmeyer flask (D), an N / 10 sodium carbonate aqueous solution was added to the Erlenmeyer flask (C), an N / 10 sodium hydroxide aqueous solution was added to the Erlenmeyer flask (B), and an Erlenmeyer flask (A ) 25 ml of N / 10 sodium ethoxide ethanol solution was added to the solution and shaken at 160 rpm at 25 ° C. for 24 hours. After shaking, the mixture was separated into a supernatant and a precipitate by centrifugation, and 10 ml of the supernatant was accurately weighed in a 20 ml beaker and titrated with N / 10 hydrochloric acid until the pH reached 4 using a pH meter. Next, the consumption of each base per gram of activated carbon was calculated from the hydrochloric acid titration amount by the following formula.
Base consumption (mmol / g) = (0.1 × (10-HCl titration) × 25) / 10
The consumption of sodium bicarbonate is D (mmol / g), the consumption of sodium carbonate is C (mmol / g), the consumption of aqueous sodium hydroxide is B (mmol / g), and the consumption of sodium ethoxide is A (Mmol / g), the oxygen-containing functional group amount per 1 g of activated carbon is “A (mmol / g)”, and the carbonyl group amount is “A-B (mmol / g)”. Is “BC (mmol / g)”, the amount of lactone group is “CD (mmol / g)”, and the amount of carboxyl group is “D (mmol / g)”.
<微分細孔容積分布の測定>
測定対象の活性炭を、日本ベル株式会社製ベルソープminiで測定し、窒素吸着等温線を求めた。次いで、得られた窒素吸着等温線からMP法により、微分細孔容積分布を求めた。<Measurement of differential pore volume distribution>
The activated carbon to be measured was measured with bell soap mini manufactured by Nippon Bell Co., Ltd., and the nitrogen adsorption isotherm was determined. Subsequently, the differential pore volume distribution was determined by the MP method from the obtained nitrogen adsorption isotherm.
<トリメチルシラノールの除去試験>
図1に示すように、内径20mm、長さ300mmの中空ガラス管2内に、支持部材4で試験試料を挟み込むようにして、厚さ5mm又は7mm(被処理空気の通気方向の長さ)の試験試料層(活性炭層)3を形成させて、トリメチルシラノール除去試験装置1を作製した。
次いで、150ppbのトリメチルシラノール含有空気(温度:23℃、所定の相対湿度)を、ガス入口21から供給し、ガス出口22から排出して、試験試料層3に被処理空気を風速0.3m/秒で通気した。所定時間が経過する毎に、通気時のガス入口21側のトリメチルシラノール含有空気と、ガス出口22側のトリメチルシラノール含有空気を、専用の分析用炭素系吸着管にて捕集し、ガスクロマトグラフ質量分析計を用いて分析し、各捕集空気のトリメチルシラノール濃度を分析した。下記式により、各経時時間のトリメチルシラノール除去率を求めた。
トリメチルシラノール除去率(%)=((入口側のトリメチルシラノール濃度−出口側のトリメチルシラノール濃度)/入口側のトリメチルシラノール濃度)×100<Trimethylsilanol removal test>
As shown in FIG. 1, a test sample is sandwiched between hollow glass tubes 2 having an inner diameter of 20 mm and a length of 300 mm with a support member 4 so as to have a thickness of 5 mm or 7 mm (length in the ventilation direction of air to be treated). A test sample layer (activated carbon layer) 3 was formed to produce a trimethylsilanol removal test apparatus 1.
Next, 150 ppb of trimethylsilanol-containing air (temperature: 23 ° C., predetermined relative humidity) is supplied from the gas inlet 21, discharged from the gas outlet 22, and the air to be treated is supplied to the test sample layer 3 at a wind speed of 0.3 m / Aerated in seconds. Every time a predetermined time elapses, the trimethylsilanol-containing air on the gas inlet 21 side during ventilation and the trimethylsilanol-containing air on the gas outlet 22 side are collected by a dedicated analytical carbon-based adsorption tube, and the mass of the gas chromatograph Analysis was performed using an analyzer, and the concentration of trimethylsilanol in each collected air was analyzed. The trimethylsilanol removal rate for each elapsed time was determined by the following formula.
Trimethylsilanol removal rate (%) = ((trimethylsilanol concentration at the inlet side−trimethylsilanol concentration at the outlet side) / trimethylsilanol concentration at the inlet side) × 100
<90%除去寿命>
上記トリメチルシラノールの除去試験で求めたトリメチルシラノールの除去率の経時変化から、トリメチルシラノールの除去率が90%に達する時間を、90%除去寿命(時間)とした。<90% removal life>
From the time-dependent change in the trimethylsilanol removal rate determined in the trimethylsilanol removal test, the time required for the trimethylsilanol removal rate to reach 90% was defined as 90% removal life (hours).
(実施例1)
破砕形状の平均粒径が32/60メッシュ(0.25〜0.50mm)、比表面積が2400m2/gである活性炭a 20gを、1%オゾン雰囲気に8時間曝露して、酸化を行った。得られた含酸素官能基を有する活性炭Aの含酸素官能基量を測定したところ、含酸素官能基量は1.25mmol/g、カルボニル基量は0.41mmol/g、水酸基量は0.45mmol/g、ラクトン基量は0.23mmol/g、カルボキシル基量は0.16mmol/gであった。また、含酸素官能基を有する活性炭Aの微分細孔容積分布を求めたところ、マイクロ孔のピークのピークトップの位置は、0.9nmであり、細孔径が0nmより大きく2nm以下の細孔の細孔容積に対する細孔径が0.7〜1.2nmの細孔の細孔容積の割合は、94%であった。また、含酸素官能基を有する活性炭Aの比表面積は2400m2/gであり、細孔径0nmより大きく2nm以下のマイクロ孔容積は1.12cm3/gであった。
次いで、図1に示すトリメチルシラノール除去試験装置1に、含酸素官能基を有する活性炭Aを充填し、150ppbのトリメチルシラノール含有空気として、温度が23℃、相対湿度が表1に示す相対湿度の150ppbのトリメチルシラノール含有空気を用いて、トリメチルシラノールの除去試験を行った。その結果を表1に示す。Example 1
Oxidation was performed by exposing 20 g of activated carbon a having an average particle size of crushed shape of 32/60 mesh (0.25 to 0.50 mm) and a specific surface area of 2400 m 2 / g to 1% ozone atmosphere for 8 hours. . When the amount of oxygen-containing functional groups of the obtained activated carbon A having oxygen-containing functional groups was measured, the amount of oxygen-containing functional groups was 1.25 mmol / g, the amount of carbonyl groups was 0.41 mmol / g, and the amount of hydroxyl groups was 0.45 mmol. / G, the amount of lactone groups was 0.23 mmol / g, and the amount of carboxyl groups was 0.16 mmol / g. Further, when the differential pore volume distribution of the activated carbon A having an oxygen-containing functional group was obtained, the position of the peak top of the micropore peak was 0.9 nm, and the pore diameter was larger than 0 nm and smaller than 2 nm. The ratio of the pore volume of pores having a pore diameter of 0.7 to 1.2 nm to the pore volume was 94%. Moreover, the specific surface area of the activated carbon A having an oxygen-containing functional group was 2400 m 2 / g, and the micropore volume of the pore diameter larger than 0 nm and 2 nm or less was 1.12 cm 3 / g.
Next, the trimethylsilanol removal test apparatus 1 shown in FIG. 1 is filled with activated carbon A having an oxygen-containing functional group, and 150 ppb of trimethylsilanol-containing air having a temperature of 23 ° C. and a relative humidity of 150 ppb of the relative humidity shown in Table 1. Trimethylsilanol removal test was conducted using the trimethylsilanol-containing air. The results are shown in Table 1.
(比較例1)
破砕形状の平均粒径が32/60メッシュ(0.25〜0.50mm)、比表面積が1500m2/gである活性炭b 20gを、1%オゾン雰囲気に8時間曝露して、酸化を行った。得られた含酸素官能基を有する活性炭cの含酸素官能基量を測定したところ、含酸素官能基量は1.57mmol/g、カルボニル基量は0.35mmol/g、水酸基量は0.59mmol/g、ラクトン基量は0.33mmol/g、カルボキシル基量は0.30mmol/gであった。また、含酸素官能基を有する活性炭cの微分細孔容積分布を求めたところ、マイクロ孔のピークのピークトップの位置は、0.7nmであり、細孔径が0nmより大きく2nm以下の細孔の細孔容積に対する細孔径が0.7〜1.2nmの細孔の細孔容積の割合は、43%であった。また、含酸素官能基を有する活性炭cの比表面積は1500m2/gであり、細孔径0nmより大きく2nm以下のマイクロ孔容積は0.65cm3/gであった。
次いで、図1に示すトリメチルシラノール除去試験装置1に、含酸素官能基を有する活性炭cを充填し、150ppbのトリメチルシラノール含有空気として、温度が23℃、相対湿度が表2に示す相対湿度の150ppbのトリメチルシラノール含有空気を用いて、トリメチルシラノールの除去試験を行った。その結果を表2に示す。(Comparative Example 1)
Oxidation was performed by exposing 20 g of activated carbon b having an average particle size of crushed shape of 32/60 mesh (0.25 to 0.50 mm) and a specific surface area of 1500 m 2 / g to 1% ozone atmosphere for 8 hours. . The amount of oxygen-containing functional groups of the obtained activated carbon c having oxygen-containing functional groups was measured. The amount of oxygen-containing functional groups was 1.57 mmol / g, the amount of carbonyl groups was 0.35 mmol / g, and the amount of hydroxyl groups was 0.59 mmol. / G, the amount of lactone groups was 0.33 mmol / g, and the amount of carboxyl groups was 0.30 mmol / g. Further, when the differential pore volume distribution of the activated carbon c having an oxygen-containing functional group was obtained, the position of the peak top of the peak of the micropore was 0.7 nm, and the pore diameter was larger than 0 nm and smaller than 2 nm. The ratio of the pore volume of pores having a pore diameter of 0.7 to 1.2 nm to the pore volume was 43%. Moreover, the specific surface area of the activated carbon c having an oxygen-containing functional group was 1500 m 2 / g, and the micropore volume larger than 0 nm and not more than 2 nm was 0.65 cm 3 / g.
Next, the trimethylsilanol removal test apparatus 1 shown in FIG. 1 is filled with activated carbon c having an oxygen-containing functional group, and the temperature is 23 ° C. and the relative humidity is 150 ppb of the relative humidity shown in Table 2 as air containing 150 ppb of trimethylsilanol. Trimethylsilanol removal test was conducted using the trimethylsilanol-containing air. The results are shown in Table 2.
(比較例2)
破砕形状の平均粒径が32/60メッシュ(0.25〜0.50mm)、比表面積が1500m2/gである活性炭bの含酸素官能基量を測定したところ、含酸素官能基量は0.39mmol/g、カルボニル基量は0.14mmol/g、水酸基量は0.20mmol/g、ラクトン基量は0.02mmol/g、カルボキシル基量は0.03mmol/gであった。また、活性炭bの微分細孔容積分布を求めたところ、マイクロ孔のピークのピークトップの位置は、0.7nmであり、細孔径が0nmより大きく2nm以下の細孔の細孔容積に対する細孔径が0.7〜1.2nmの細孔の細孔容積の割合は、43%であった。また、活性炭bの比表面積は1500m2/gであり、細孔径0nmより大きく2nm以下のマイクロ孔容積は0.65cm3/gであった。
次いで、図1に示すトリメチルシラノール除去試験装置1に、含酸素官能基を有する活性炭bを充填し、150ppbのトリメチルシラノール含有空気として、温度が23℃、相対湿度が表3に示す相対湿度の150ppbのトリメチルシラノール含有空気を用いて、トリメチルシラノールの除去試験を行った。その結果を表3に示す。(Comparative Example 2)
When the oxygen-containing functional group amount of the activated carbon b having a crushed shape average particle size of 32/60 mesh (0.25 to 0.50 mm) and a specific surface area of 1500 m 2 / g was measured, the oxygen-containing functional group amount was 0. .39 mmol / g, the amount of carbonyl groups was 0.14 mmol / g, the amount of hydroxyl groups was 0.20 mmol / g, the amount of lactone groups was 0.02 mmol / g, and the amount of carboxyl groups was 0.03 mmol / g. Further, when the differential pore volume distribution of the activated carbon b was determined, the position of the peak top of the micropore peak was 0.7 nm, and the pore diameter relative to the pore volume of pores having a pore diameter of more than 0 nm and 2 nm or less. The ratio of the pore volume of pores having a diameter of 0.7 to 1.2 nm was 43%. Moreover, the specific surface area of the activated carbon b was 1500 m 2 / g, and the micropore volume of the pore diameter larger than 0 nm and 2 nm or less was 0.65 cm 3 / g.
Next, the trimethylsilanol removal test apparatus 1 shown in FIG. 1 is filled with activated carbon b having oxygen-containing functional groups, and 150 ppb of trimethylsilanol-containing air having a temperature of 23 ° C. and a relative humidity of 150 ppb of the relative humidity shown in Table 3. Trimethylsilanol removal test was conducted using the trimethylsilanol-containing air. The results are shown in Table 3.
実施例1、比較例1及び比較例2の活性炭の90%除去寿命と被処理空気の相対湿度の関係を、図3に示す。この結果から分かるように、実施例1の活性炭Aは、相対湿度が35〜55%の全範囲で、比較例2の活性炭bに比べ、除去寿命特性が高くなり、また、相対湿度50〜55%での除去寿命特性は、相対湿度が45%以下の場合と比べたときの除去寿命特性の低下が小さく、相対湿度が35〜55%で安定した除去性能を有することが分かった。一方、比較例1の活性炭cは、相対湿度が45%以下だと、比較例2の活性炭bに比べ、非常に高い除去寿命特性を示すものの、相対湿度が50%以上になると、相対湿度が45%以下の場合に比べて、除去寿命特性が大きく低下し、相対湿度が55%の場合には、比較例2の活性体bよりも除去寿命特性が低くなってしまった。 FIG. 3 shows the relationship between the 90% removal life of the activated carbons of Example 1, Comparative Example 1 and Comparative Example 2 and the relative humidity of the air to be treated. As can be seen from the results, the activated carbon A of Example 1 has a higher removal life characteristic than the activated carbon b of Comparative Example 2 in the entire range of relative humidity of 35 to 55%, and the relative humidity of 50 to 55. It was found that the removal life characteristics at% showed a small reduction in the removal life characteristics when compared with the case where the relative humidity was 45% or less, and stable removal performance at a relative humidity of 35 to 55%. On the other hand, the activated carbon c of Comparative Example 1 shows a very high removal life characteristic compared to the activated carbon b of Comparative Example 2 when the relative humidity is 45% or less. However, when the relative humidity is 50% or more, the relative humidity is Compared with the case of 45% or less, the removal life characteristic was greatly reduced, and when the relative humidity was 55%, the removal life characteristic was lower than that of the active substance b of Comparative Example 2.
(シラノール化合物の二量体の吸着量の分析)
実施例1−A、比較例1−B及び比較例2−Bにおいて、トリメチルシラノール除去試験を行った後の活性炭(実施例1では217.3時間試験後のもの、比較例1では234.1時間試験後のもの、比較例2では99.3時間試験後のもの)を、それぞれ、バイアル瓶に0.1g採取した。次いで、バイアル瓶に、ジクロロメタン2mLを加えてから振とうし、抽出を行った。次いで、抽出液を、GC−MSにて定量分析し、活性炭に吸着されていた物質中のトリメチルシラノールとトリメチルシラノールの二量体の比率を求めた。その結果、実施例1−Aでは、トリメチルシラノールが5質量%、トリメチルシラノールの二量体が95質量%であった。また、比較例1−Bでは、トリメチルシラノールが12質量%、トリメチルシラノールの二量体が88質量%であった。また、比較例2−Bでは、トリメチルシラノールが76質量%、トリメチルシラノールの二量体が24質量%であった。(Analysis of adsorption amount of dimer of silanol compound)
In Example 1-A, Comparative Example 1-B, and Comparative Example 2-B, activated carbon after the trimethylsilanol removal test (in Example 1, after 217.3 hours test, in Comparative Example 1, 234.1) 0.1 g of the sample after the time test and the sample after 99.3 hours in Comparative Example 2 were collected in a vial. Next, 2 mL of dichloromethane was added to the vial and shaken for extraction. Subsequently, the extract was quantitatively analyzed by GC-MS, and the ratio of the trimer of trimethylsilanol and trimethylsilanol in the substance adsorbed on the activated carbon was determined. As a result, in Example 1-A, trimethylsilanol was 5 mass%, and the dimer of trimethylsilanol was 95 mass%. In Comparative Example 1-B, the content of trimethylsilanol was 12% by mass and the dimer of trimethylsilanol was 88% by mass. In Comparative Example 2-B, trimethylsilanol was 76% by mass, and the trimethylsilanol dimer was 24% by mass.
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