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JP6156822B2 - Photocatalyst, water splitting electrode, and method for producing hydrogen and / or oxygen - Google Patents
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JP6156822B2 - Photocatalyst, water splitting electrode, and method for producing hydrogen and / or oxygen - Google Patents

Photocatalyst, water splitting electrode, and method for producing hydrogen and / or oxygen Download PDF

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JP6156822B2
JP6156822B2 JP2013254405A JP2013254405A JP6156822B2 JP 6156822 B2 JP6156822 B2 JP 6156822B2 JP 2013254405 A JP2013254405 A JP 2013254405A JP 2013254405 A JP2013254405 A JP 2013254405A JP 6156822 B2 JP6156822 B2 JP 6156822B2
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photocatalyst
oxide particles
electrode
mass
optical semiconductor
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JP2015112509A (en
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寺西 利治
利治 寺西
泰三 吉永
泰三 吉永
一成 堂免
一成 堂免
隆史 久富
隆史 久富
諳珂 熊
諳珂 熊
秋山 誠治
誠治 秋山
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Mitsubishi Chemical Corp
University of Tokyo NUC
Japan Technological Research Association of Artificial Photosynthetic Chemical Process
Kyoto University NUC
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Mitsubishi Chemical Corp
University of Tokyo NUC
Japan Technological Research Association of Artificial Photosynthetic Chemical Process
Kyoto University NUC
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/36Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

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Description

本発明は、太陽光を利用した水分解反応を行うことにより水素及び/又は酸素を製造可能な光触媒に関する。   The present invention relates to a photocatalyst capable of producing hydrogen and / or oxygen by performing a water splitting reaction utilizing sunlight.

近年、光触媒と太陽エネルギーとを用いて水を分解し水素や酸素を製造する技術が注目されている。現在研究が進められている光触媒は、通常、酸化物、酸窒化物或いは窒化物といった光半導体の表面に助触媒が担持されてなるものである。助触媒を担持させることで光触媒の活性を向上させることができる。   In recent years, attention has been focused on a technique for producing hydrogen and oxygen by decomposing water using a photocatalyst and solar energy. The photocatalyst currently being studied is usually one in which a promoter is supported on the surface of an optical semiconductor such as an oxide, oxynitride or nitride. The activity of the photocatalyst can be improved by supporting the cocatalyst.

例えば、非特許文献1には、GaN:ZnOに水素生成助触媒を担持してなる光触媒に対し、さらに、Mnナノ粒子を酸素生成助触媒として共担持する技術が開示されており、当該技術によれば光触媒の活性を向上させることができる。しかしながら、非特許文献1に開示された技術を適用したとしても、酸素生成助触媒を担持しない場合と比較して、光触媒活性は1.3〜1.6倍とわずかな向上に留まる。これは、水分解反応における水素生成反応が律速であるため、或いは、光触媒活性が光触媒表面における反応よりも光触媒自身のバルク特性に大きく依存しているためと考えられる。 For example, Non-Patent Document 1 discloses a technique in which Mn 3 O 4 nanoparticles are co-supported as an oxygen generation co-catalyst with respect to a photocatalyst formed by supporting a hydrogen generation co-catalyst on GaN: ZnO, According to this technique, the activity of the photocatalyst can be improved. However, even if the technique disclosed in Non-Patent Document 1 is applied, the photocatalytic activity is only 1.3 to 1.6 times as small as that in the case of not supporting the oxygen generation promoter. This is presumably because the hydrogen generation reaction in the water splitting reaction is rate limiting, or the photocatalytic activity is more dependent on the bulk properties of the photocatalyst itself than on the photocatalytic surface.

一方、非特許文献2には、GaN:ZnOに水素生成助触媒を担持してなる光触媒に対し、さらに、CoとMnとの酸化物ナノ粒子(Coドープ酸化マンガンナノ粒子)を酸素生成助触媒として共担持する技術が開示されている。非特許文献2によれば、Coドープ率が20%のときに水分解反応の活性がわずかに向上するものの、Coをドープしたことによる目立った効果は得られないものとされている。   On the other hand, Non-Patent Document 2 discloses that a photocatalyst in which a hydrogen generation promoter is supported on GaN: ZnO, and oxide nanoparticles of Co and Mn (Co-doped manganese oxide nanoparticles) are further used as an oxygen generation promoter. As a co-supporting technique. According to Non-Patent Document 2, although the activity of the water splitting reaction is slightly improved when the Co doping rate is 20%, a remarkable effect by doping Co cannot be obtained.

K. Maeda et al., Angew. Chem. Int. Ed. 2010, 49, 4096K. Maeda et al., Angew. Chem. Int. Ed. 2010, 49, 4096 吉永ら、「水完全分解用光触媒の活性向上に向けた新規酸素生成助触媒ナノ粒子の剛性」、日本化学会第93春季年会(2013)Yoshinaga et al., "Rigidity of New Oxygen Generation Cocatalyst Nanoparticles for Improving Activity of Photocatalysts for Complete Water Decomposition", The 93rd Annual Meeting of the Chemical Society of Japan (2013)

本発明は、光触媒活性を大きく向上させ得るような助触媒、光触媒活性が高く光水分解用の触媒として適用可能な光触媒及び当該光触媒を用いた光水分解用電極を提供することを課題とする。   An object of the present invention is to provide a cocatalyst capable of greatly improving the photocatalytic activity, a photocatalyst having a high photocatalytic activity and applicable as a photowater splitting catalyst, and a photowater splitting electrode using the photocatalyst. .

本発明者らは、光半導体の種類によっては、Co及びMnを含む酸化物粒子が光触媒活性を大きく向上させ得る助触媒となり得ることを知見した。すなわち、従来技術においては、酸化マンガンにCoをドープしたことによる目立った効果は認められないとされていたところ、光半導体との相性によって、Coをドープしたことによる効果が顕著となる場合があることを知見した。   The present inventors have found that depending on the type of optical semiconductor, oxide particles containing Co and Mn can serve as promoters that can greatly improve the photocatalytic activity. That is, in the prior art, it has been said that the remarkable effect of doping manganese oxide with Co is not recognized, but the effect of doping with Co may become significant depending on the compatibility with the optical semiconductor. I found out.

本発明は上記知見に基づいてなされたものである。すなわち、
第1の本発明は、Ti、V、Nb及びTaからなる群から選ばれる1種以上の元素を含む光半導体に、助触媒としてCo及びMnを含む酸化物粒子が少なくとも担持されてなる、光触媒である。
The present invention has been made based on the above findings. That is,
The first aspect of the present invention is a photocatalyst comprising at least oxide particles containing Co and Mn as cocatalysts on a photosemiconductor containing one or more elements selected from the group consisting of Ti, V, Nb and Ta. It is.

本発明において、「Ti、Ta、V及びNbからなる群から選ばれる1種以上の元素を含む光半導体」とは、当該元素を含む酸化物、酸窒化物、窒化物、(オキシ)カルコゲナイド等、光触媒として用いられる光半導体を意味する。「光半導体」の形態としては、助触媒を担持し得るような形態であればよく、粒子状、塊状等種々の形態が採用できる。「Co及びMnを含む酸化物粒子」とは、酸化マンガン中にコバルトがドープされてなる形態、酸化コバルト中にマンガンがドープされてなる形態のいずれかを意味する。すなわち、一つの粒子中にCo及びMnが含まれていることを意味し、酸化コバルト粒子と酸化マンガン粒子とを単に混合したものについては「Co及びMnを含む酸化物粒子」には含まれないものとする。「少なくとも担持されてなる」とは、光半導体に当該酸化物粒子に加えてそれ以外の助触媒が担持されていてもよいことを意味する。   In the present invention, “an optical semiconductor containing one or more elements selected from the group consisting of Ti, Ta, V and Nb” means an oxide, oxynitride, nitride, (oxy) chalcogenide, etc. containing the element Means an optical semiconductor used as a photocatalyst. The form of the “photosemiconductor” may be any form that can support a cocatalyst, and various forms such as a particulate form and a massive form can be adopted. “Oxide particles containing Co and Mn” mean either a form in which manganese oxide is doped with cobalt or a form in which cobalt oxide is doped with manganese. That is, it means that Co and Mn are contained in one particle, and those obtained by simply mixing cobalt oxide particles and manganese oxide particles are not included in “oxide particles containing Co and Mn”. Shall. “At least supported” means that the co-catalyst other than the oxide particles may be supported on the optical semiconductor.

第1の本発明において、酸化物粒子におけるCoとMnとのモル比(Co/Mn)が1/50以上1以下であることが好ましい。   In 1st this invention, it is preferable that the molar ratio (Co / Mn) of Co and Mn in oxide particles is 1/50 or more and 1 or less.

第1の本発明において、酸化物粒子の粒子径が1.0nm以上25nm以下であることが好ましい。   In the first aspect of the present invention, the particle diameter of the oxide particles is preferably 1.0 nm or more and 25 nm or less.

第1の本発明において、光半導体100質量部に対し、酸化物粒子が0.005質量部以上1.0質量部以下担持されてなることが好ましい。尚、当該担持量は、光半導体に水素生成助触媒及び酸素生成助触媒の双方を担持させる場合を想定したものである。   In 1st this invention, it is preferable that an oxide particle is carry | supported 0.005 mass part or more and 1.0 mass part or less with respect to 100 mass parts of optical semiconductors. In addition, the said carrying amount assumes the case where both a hydrogen production co-catalyst and an oxygen production co-catalyst are carry | supported on an optical semiconductor.

第2の本発明は、第1の本発明に係る光触媒を用いた光水分解反応用電極である。   The second aspect of the present invention is a photohydrolysis electrode using the photocatalyst according to the first aspect of the present invention.

ただし、光水分解反応用電極とする場合は、光触媒において光半導体100質量部に対し、酸化物粒子が0.008質量部以上20.0質量部以下担持されてなるようにするとよい。或いは、光半導体の表面の20%以上が酸化物粒子に覆われてなるようにするとよい。当該担持量は、光半導体にCo及びMnを含む酸化物粒子のみを助触媒として担持させる場合を想定したものである。   However, when it is set as the electrode for photo-water-splitting reaction, it is good to make it carry | support the oxide particle 0.008 mass part or more and 20.0 mass part or less with respect to 100 mass parts of optical semiconductors in a photocatalyst. Alternatively, it is preferable that 20% or more of the surface of the optical semiconductor is covered with oxide particles. The supported amount assumes a case where only the oxide particles containing Co and Mn are supported on the optical semiconductor as a promoter.

第2の本発明によれば、測定電位0.62V(vs.RHE)における光電流密度0.25mA/cm以上を達成できる。 According to the second aspect of the present invention, a photocurrent density of 0.25 mA / cm 2 or more at a measurement potential of 0.62 V (vs. RHE) can be achieved.

第3の本発明は、第1の本発明に係る光触媒、或いは、第2の本発明に係る光水分解反応用電極を、水又は電解質水溶液に浸漬し、該光触媒又は光水分解反応用電極に光を照射して光水分解を行う、水素及び/又は酸素の製造方法である。   In the third aspect of the present invention, the photocatalyst according to the first aspect of the present invention or the photocatalytic reaction electrode according to the second aspect of the present invention is immersed in water or an aqueous electrolyte solution, and the photocatalyst or the electrode for photocatalytic reaction is used. This is a method for producing hydrogen and / or oxygen, in which light water splitting is performed by irradiating light on the substrate.

本発明においては、Co及びMnを含む酸化物粒子を助触媒として特定の光半導体に担持させることで、助触媒を担持させない場合、或いは、Mnのみを含む酸化物粒子を担持した場合及びCoのみを含む酸化物粒子を担持した場合と比較して、光触媒活性を大きく向上させることが可能である。すなわち、本発明によれば、光触媒活性を大きく向上させ得るような助触媒、光触媒活性が高く光水分解用の触媒として適用可能な光触媒、及び当該光触媒を用いた光水分解用電極を提供することができる。   In the present invention, the oxide particles containing Co and Mn are supported on a specific optical semiconductor as a co-catalyst, so that the co-catalyst is not supported, or the oxide particles containing only Mn are supported and only Co. The photocatalytic activity can be greatly improved as compared with the case of supporting oxide particles containing. That is, according to the present invention, there are provided a cocatalyst capable of greatly improving the photocatalytic activity, a photocatalyst having a high photocatalytic activity and applicable as a photowater splitting catalyst, and a photowater splitting electrode using the photocatalyst. be able to.

光触媒粒子を水中に分散して光水分解反応活性を評価する場合において使用した装置を説明するための図である。It is a figure for demonstrating the apparatus used in the case of disperse | distributing photocatalyst particle | grains in water and evaluating photohydrolysis reaction activity. 各光触媒(光半導体としてSrTiOを用いつつ助触媒を種々変更)の光水分解反応活性の評価結果を示す図である。It is a figure which shows the evaluation result of the photohydrolysis reaction activity of each photocatalyst (Various types of promoters are changed while using SrTiO 3 as an optical semiconductor).

1.光触媒
本発明に係る光触媒は、Ti、V、Nb及びTaからなる群から選ばれる1種以上の元素を含む光半導体に、助触媒としてCo及びMnを含む酸化物粒子が少なくとも担持されてなることを特徴とする。
1. Photocatalyst The photocatalyst according to the present invention comprises at least oxide particles containing Co and Mn as cocatalysts on an optical semiconductor containing one or more elements selected from the group consisting of Ti, V, Nb and Ta. It is characterized by.

1.1.光半導体
本発明に係る光触媒に用いられる光半導体は、Ti、V、Nb及びTaからなる群から選ばれる1種以上の元素を含んでなるものであり、例えば、これらの元素のいずれかを含んだ酸化物、酸窒化物、窒化物、(オキシ)カルコゲナイド等が挙げられる。具体的には、TiO、CaTiO、SrTiO、SrTi、SrTi、KLaTi10、RbLaTi10、CsLaTi10、CsLaTiNbO10,LaTiO、LaTi、LaTi、LaTi:Ba、KaLaZr0.3Ti0.7、LaCaTi、KTiNbO、NaTi13、BaTi、GdTi、YTi、(NaTi、KTi、KTi、CsTi、H−CsTi(H−CsはCsがHでイオン交換されていることを示す。以下同様)、CsTi11、CsTi13、H−CsTiNbO、H−CsTiNbO、SiO−pillared KTi、SiO−pillared KTi2.7Mn0.3、BaTiO、BaTi、AgLi1/3Ti2/3等のチタン含有酸化物;LaTiON等のチタン含有酸窒化物;LaTiCuS、LaTiAgS、SmTi等のチタン含有(オキシ)カルコゲナイド;
BiVO、AgVO等のバナジウム含有酸化物;
Nb17、RbNb17、CaNb、SrNb、BaNb15、NaCaNb10、ZnNb、CsNb11、LaNbO、H−KLaNb、H−RbLaNb、H−CsLaNb、H−KCaNb10、SiO−pillared KCaNb10(Chem.Mater.1996,8,2534.)、H−RbCaNb10、H−CsCaNb10、H−KSrNb10、H−KCaNaNb13)、PbBiNb等のニオブ含有酸化物;CaNbON、BaNbON、SrNbON、LaNbON等のニオブ含有酸窒化物;Ta、KPrTa15、KTaSi13、KTa12、LiTaO、NaTaO、KTaO、AgTaO、KTaO:Zr、NaTaO:La、NaTaO:Sr、NaTa、KTa(pyrochlore)、CaTa、SrTa、BaTa、NiTa、RbTa17、HLa2/3Ta、KSr1.5Ta10、LiCaTa10、KBaTa10、SrTa15、BaTa15、H1.8Sr0.81Bi0.19Ta、Mg−Ta oxide(Chem.Mater.2004 16, 4304−4310)、LaTaO、LaTaO等のタンタル含有酸化物;Ta等のタンタル含有窒化物;CaTaON、SrTaON、BaTaON、LaTaON、YTa、TaON等のタンタル含有酸窒化物 等が用いられる。
1.1. Optical semiconductor The optical semiconductor used in the photocatalyst according to the present invention contains one or more elements selected from the group consisting of Ti, V, Nb, and Ta, and includes, for example, any of these elements. Examples thereof include oxides, oxynitrides, nitrides, (oxy) chalcogenides, and the like. Specifically, TiO 2 , CaTiO 3 , SrTiO 3 , Sr 3 Ti 2 O 7 , Sr 4 Ti 3 O 7 , K 2 La 2 Ti 3 O 10 , Rb 2 La 2 Ti 3 O 10 , Cs 2 La 2 Ti 3 O 10 , CsLaTi 2 NbO 10 , La 2 TiO 5 , La 2 Ti 3 O 9 , La 2 Ti 2 O 7 , La 2 Ti 2 O 7 : Ba, KaLaZr 0.3 Ti 0.7 O 4 , La 4 CaTi 5 O 7 , KTiNbO 5 , Na 2 Ti 6 O 13 , BaTi 4 O 9 , Gd 2 Ti 2 O 7 , Y 2 Ti 2 O 7 , (Na 2 Ti 3 O 7 , K 2 Ti 2 O 5 , K 2 Ti 4 O 9 , Cs 2 Ti 2 O 5 , H + -Cs 2 Ti 2 O 5 (H + -Cs indicates that Cs is ion-exchanged with H + . The same applies hereinafter), Cs 2 Ti 5 O 11, Cs 2 Ti 6 O 13, H + -CsTiNbO 5, H + -CsTi 2 NbO 7, SiO 2 -pillared K 2 Ti 4 O 9, SiO 2 -pillared K 2 Ti 2.7 Mn 0. Titanium-containing oxides such as 3 O 7 , BaTiO 3 , BaTi 4 O 9 , AgLi 1/3 Ti 2/3 O 2 ; titanium-containing oxynitrides such as LaTiO 2 N; La 5 Ti 2 CuS 5 O 7 , La Titanium-containing (oxy) chalcogenides such as 5 Ti 2 AgS 5 O 7 and Sm 2 Ti 2 O 5 S 2 ;
Vanadium-containing oxides such as BiVO 4 and Ag 3 VO 4 ;
K 4 Nb 6 O 17, Rb 4 Nb 6 O 17, Ca 2 Nb 2 O 7, Sr 2 Nb 2 O 7, Ba 5 Nb 4 O 15, NaCa 2 Nb 3 O 10, ZnNb 2 O 6, Cs 2 Nb 4 O 11 , La 3 NbO 7 , H + -KLaNb 2 O 7 , H + -RbLaNb 2 O 7 , H + -CsLaNb 2 O 7 , H + -KCa 2 Nb 3 O 10 , SiO 2 -pillared KCa 2 N 3 O 10 (Chem. Mater. 1996, 8, 2534.), H + -RbCa 2 Nb 3 O 10 , H + -CsCa 2 Nb 3 O 10 , H + -KSr 2 Nb 3 O 10 , H + -KCa 2 NaNb 4 O 13), niobium-containing oxide such PbBi 2 Nb 2 O 9; CaNbO 2 N, BaNbO 2 N, SrNbO 2 , Niobium-containing oxynitride such LaNbON 2; Ta 2 O 5, K 2 PrTa 5 O 15, K 3 Ta 3 Si 2 O 13, K 3 Ta 3 B 2 O 12, LiTaO 3, NaTaO 3, KTaO 3, AgTaO 3 , KTaO 3 : Zr, NaTaO 3 : La, NaTaO 3 : Sr, Na 2 Ta 2 O 6 , K 2 Ta 2 O 6 (pyrochlore), CaTa 2 O 6 , SrTa 2 O 6 , BaTa 2 O 6 , NiTa 2 O 6 , Rb 4 Ta 6 O 17 , H 2 La 2/3 Ta 2 O 7 , K 2 Sr 1.5 Ta 3 O 10 , LiCa 2 Ta 3 O 10 , KBa 2 Ta 3 O 10 , Sr 5 Ta 4 O 15 , Ba 5 Ta 4 O 15 , H 1.8 Sr 0.81 Bi 0.19 Ta 2 O 7 , Mg-Ta oxide (C hem.Matter.2004 16, 4304-4310), LaTaO 4 , La 3 TaO 7 and other tantalum-containing oxides; Ta 3 N 5 and other tantalum-containing nitrides; CaTaO 2 N, SrTaO 2 N, BaTaO 2 N, LaTaO A tantalum-containing oxynitride such as 2 N, Y 2 Ta 2 O 5 N 2 , or TaON is used.

太陽光を利用した光水分解反応をより効率的に生じさせる観点からは、上記各種光半導体のうち、可視光応答型の光半導体を用いることが好ましい。具体的には、LaTiON、BaNbON、BaTaON、TaON、BiVO、Taが好ましく、この中でも特に、LaTiON、BaNbON、BaTaON、TaON、BiVOが好ましい。上記の各種光半導体は、固相法、溶液法等の公知の合成方法によって容易に合成可能である。 From the viewpoint of more efficiently generating a photohydrolysis reaction using sunlight, it is preferable to use a visible light responsive optical semiconductor among the various optical semiconductors. Specifically, LaTiO 2 N, BaNbO 2 N, BaTaO 2 N, TaON, BiVO 4 , and Ta 3 N 5 are preferable. Among these, LaTiO 2 N, BaNbO 2 N, BaTaO 2 N, TaON, and BiVO 4 are particularly preferable. preferable. The above various optical semiconductors can be easily synthesized by a known synthesis method such as a solid phase method or a solution method.

光半導体の形態(形状)については、以下に説明する助触媒を担持して光触媒として機能し得るような形態であれば特に限定されるものではなく、光触媒の設置形態等に合わせて、粒子状、塊状、板状等を適宜選択すればよい。特に、水分解反応用光触媒とする場合は、粒子状の光半導体の表面に助触媒を担持することが好ましい。この場合、粒子径の下限が好ましくは50nm以上であり、上限が好ましくは500μm以下である。尚、本願において「粒子径」とは、定方向接線径(フェレ径)の平均値(平均粒子径)を意味し、XRD、TEM、SEM法等の公知の手段によって測定することができる。   The form (shape) of the photo semiconductor is not particularly limited as long as it is a form capable of supporting a cocatalyst described below and functioning as a photocatalyst. A lump shape, a plate shape, or the like may be appropriately selected. In particular, when a photocatalyst for water splitting reaction is used, it is preferable to support a promoter on the surface of a particulate optical semiconductor. In this case, the lower limit of the particle diameter is preferably 50 nm or more, and the upper limit is preferably 500 μm or less. In the present application, the “particle diameter” means an average value (average particle diameter) of tangential diameters (ferret diameters) in a fixed direction and can be measured by a known means such as XRD, TEM, SEM method.

1.2.助触媒
本発明に係る光触媒は、上記した光半導体に、助触媒としてCo及びMnを含む酸化物粒子が少なくとも担持されてなる。
1.2. Cocatalyst The photocatalyst according to the present invention comprises at least oxide particles containing Co and Mn as cocatalysts on the above-described optical semiconductor.

「Co及びMnを含む酸化物粒子」とは、酸化マンガン中にコバルトがドープされてなる形態、酸化コバルト中にマンガンがドープされてなる形態のいずれであってもよく、Co3−xMn(0<x<3)で示される酸化物とすることが好ましい。当該酸化物粒子におけるCoとMnとのモル比(Co/Mn)は、好ましくは1/50以上1以下であり、下限がより好ましくは1/10以上、特に好ましくは1/9以上であり、上限がより好ましくは4/5以下であり、特に好ましくは2/3以下である。CoとMnとのモル比をこのような範囲に調整することで、光触媒活性を一層向上可能な助触媒とすることができる。 The “oxide particles containing Co and Mn” may be in any form of manganese oxide doped with cobalt or cobalt oxide doped with manganese. Co 3-x Mn x An oxide represented by O 4 (0 <x <3) is preferable. The molar ratio of Co and Mn in the oxide particles (Co / Mn) is preferably 1/50 or more and 1 or less, the lower limit is more preferably 1/10 or more, and particularly preferably 1/9 or more, The upper limit is more preferably 4/5 or less, and particularly preferably 2/3 or less. By adjusting the molar ratio of Co and Mn to such a range, it can be set as the promoter which can improve photocatalytic activity further.

当該酸化物粒子は、上記した光半導体の表面に担持可能な程度の大きさであればよい。光半導体の表面に酸化物粒子を担持させるためには、粒子状、塊状、板状等の光半導体よりも酸化物粒子が小さい必要がある。特に粒子径が50nm以上500μm以下の光半導体粒子の表面に、粒子径が1.0nm以上25nm以下の酸化物粒子を担持させる形態が好ましい。酸化物粒子の粒子径は下限がより好ましくは1.2nm以上、さらに好ましくは1.5nm以上であり、上限がより好ましくは20nm以下、さらに好ましくは10nm以下である。酸化物粒子の粒子径をこのような範囲に調整することで、光触媒活性を一層向上可能な助触媒とすることができる。   The oxide particles may be of a size that can be supported on the surface of the optical semiconductor. In order to carry oxide particles on the surface of the optical semiconductor, it is necessary that the oxide particles are smaller than the optical semiconductor such as particles, lumps, and plates. In particular, a mode in which oxide particles having a particle diameter of 1.0 nm to 25 nm are supported on the surface of the optical semiconductor particles having a particle diameter of 50 nm to 500 μm is preferable. The lower limit of the particle diameter of the oxide particles is more preferably 1.2 nm or more, still more preferably 1.5 nm or more, and the upper limit is more preferably 20 nm or less, still more preferably 10 nm or less. By adjusting the particle diameter of the oxide particles to such a range, a promoter capable of further improving the photocatalytic activity can be obtained.

このようなナノサイズの酸化物粒子を製造する方法としては、例えば以下の方法が挙げられる。すなわち、マンガン原料(オレイン酸マンガン等)とコバルト原料(ステアリン酸コバルト等)とを有機溶媒(1−オクタデセン等)に溶解させ、減圧脱気し、窒素置換のうえ、温度を上昇させながら還流し、その後放冷することで、沈殿物としてCo及びMnを含む酸化物ナノ粒子が得られる。得られた酸化物ナノ粒子はテトラヒドロフラン等の溶媒において適宜分散させることで凝集を防ぐことができる。このようにして得られる酸化物ナノ粒子は、NaCl型のMnOとCoOの固溶体となる。   Examples of methods for producing such nano-sized oxide particles include the following methods. That is, a manganese raw material (manganese oleate, etc.) and a cobalt raw material (cobalt stearate, etc.) are dissolved in an organic solvent (1-octadecene, etc.), degassed under reduced pressure, replaced with nitrogen, and refluxed while raising the temperature. Then, by allowing to cool, oxide nanoparticles containing Co and Mn as precipitates are obtained. Aggregation can be prevented by appropriately dispersing the obtained oxide nanoparticles in a solvent such as tetrahydrofuran. The oxide nanoparticles thus obtained become a solid solution of NaCl-type MnO and CoO.

1.3.光半導体表面への助触媒の担持
本発明に係る光触媒は、上記した光半導体表面に少なくとも上記した酸化物粒子を助触媒として担持してなる。「少なくとも」とは、当該酸化物粒子に加えてそれ以外の助触媒を共担持させても良い趣旨である。例えば、周期表第6族〜第10族から選ばれる1つ以上の元素を含む化合物を助触媒として共担持させることができる。具体的には、水素生成用助触媒として、Pt、Pd、Rh、Ru、Ni、Au、Fe、Ru−Ir、Pt−Ir、NiO、RuO、IrO、Rh、NiS、MoS、NiMoS、Cr−Rh複合酸化物、コアシェル型Rh/Cr、Pt/Cr2が挙げられ、酸素生成用助触媒として、Cr、Sb、Nb、Th、Mn、Fe、Co、Ni、Ru、Rh、Irの金属、これらの酸化物又は複合酸化物(ただし、Co及びMnを含む酸化物を除く)が挙げられる。
1.3. Loading of promoter on the surface of an optical semiconductor The photocatalyst according to the present invention is formed by supporting at least the oxide particles described above as a promoter on the surface of an optical semiconductor. "At least" means that other promoters may be co-supported in addition to the oxide particles. For example, a compound containing one or more elements selected from Groups 6 to 10 of the periodic table can be co-supported as a promoter. Specifically, Pt, Pd, Rh, Ru, Ni, Au, Fe, Ru—Ir, Pt—Ir, NiO, RuO 2 , IrO 2 , Rh 2 O 3 , NiS, MoS are used as promoters for hydrogen generation. 2 , NiMoS, Cr—Rh composite oxide, core-shell type Rh / Cr 2 O 3 , and Pt / Cr 2 O 3 , and as a catalyst for oxygen generation, Cr, Sb, Nb, Th, Mn, Fe, Co , Ni, Ru, Rh, and Ir, and oxides or composite oxides thereof (excluding oxides containing Co and Mn).

光半導体への酸化物粒子の担持量については、光触媒活性を向上可能な量であれば特に限定されるものではない。例えば、粒子径が50nm以上500μm以下の光半導体粒子の表面に、粒子径が1.0nm以上25nm以下の酸化物粒子を担持させる場合において、さらに当該酸化物粒子に加えてそれ以外の他の助触媒(上記の水素生成用助触媒等)を共担持させたい場合は、光半導体(光半導体粒子)100質量部に対し、当該酸化物粒子を0.005質量部以上1.0質量部以下担持することが好ましい。下限はより好ましくは0.008質量部以上、さらに好ましくは0.01質量部以上であり、上限はより好ましくは0.8質量部以下、さらに好ましくは0.5質量部以下である。これにより光半導体表面の一部のみを当該酸化物粒子で覆うことができ、当該酸化物粒子で覆われていない光半導体表面にその他の助触媒を担持させることができる。このような形態は、一の光触媒粒子の表面において水素生成反応と酸素生成反応との双方を生じさせて光水分解を行う場合等に好適である。   The amount of oxide particles supported on the optical semiconductor is not particularly limited as long as it is an amount capable of improving the photocatalytic activity. For example, in the case where oxide particles having a particle diameter of 1.0 nm to 25 nm are supported on the surface of an optical semiconductor particle having a particle diameter of 50 nm or more and 500 μm or less, in addition to the oxide particles, other assistants other than the oxide particles are used. When it is desired to co-support a catalyst (such as the above-mentioned hydrogen generating co-catalyst), the oxide particles are supported by 0.005 parts by mass or more and 1.0 parts by mass or less with respect to 100 parts by mass of the optical semiconductor (photo semiconductor particles). It is preferable to do. The lower limit is more preferably 0.008 parts by mass or more, still more preferably 0.01 parts by mass or more, and the upper limit is more preferably 0.8 parts by mass or less, still more preferably 0.5 parts by mass or less. Thereby, only a part of the surface of the optical semiconductor can be covered with the oxide particles, and another promoter can be supported on the surface of the optical semiconductor not covered with the oxide particles. Such a form is suitable for the case where photohydrolysis is performed by causing both a hydrogen generation reaction and an oxygen generation reaction on the surface of one photocatalyst particle.

或いは、光半導体の表面に当該酸化物粒子のみを助触媒として担持させてもよい。例えば、粒子径が50nm以上500μm以下の光半導体粒子の表面に、粒子径が1.0nm以上25nm以下の酸化物粒子のみを担持させる場合は、光半導体(光半導体粒子)100質量部に対し、当該酸化物粒子を0.008質量部以上20.0質量部以下担持することが好ましい。下限はより好ましくは0.009質量部以上、さらに好ましくは0.010質量部以上であり、上限はより好ましくは5.0質量部以下、さらに好ましくは3.0質量部以下、特に好ましくは2.0質量部以下である。これにより光半導体表面の略全体を当該酸化物粒子で均一に覆うことができ、光触媒活性が向上する。このような形態は、光触媒を光水分解反応用電極に適用する場合に好適である。   Alternatively, only the oxide particles may be supported as a promoter on the surface of the optical semiconductor. For example, when only the oxide particles having a particle diameter of 1.0 nm or more and 25 nm or less are supported on the surface of the optical semiconductor particle having a particle diameter of 50 nm to 500 μm, with respect to 100 parts by mass of the optical semiconductor (photo semiconductor particle), It is preferable to support the oxide particles in an amount of 0.008 parts by mass to 20.0 parts by mass. The lower limit is more preferably 0.009 parts by mass or more, further preferably 0.010 parts by mass or more, and the upper limit is more preferably 5.0 parts by mass or less, still more preferably 3.0 parts by mass or less, particularly preferably 2 0.0 parts by mass or less. Thereby, almost the entire surface of the optical semiconductor can be uniformly covered with the oxide particles, and the photocatalytic activity is improved. Such a form is suitable when a photocatalyst is applied to an electrode for photohydrolysis reaction.

尚、共担持させる場合おいて、助触媒全体の担持量は少なすぎても効果がなく、多すぎると助触媒自身が光を吸収・散乱するなどして光触媒の光吸収を妨げたり、再結合中心として働いたりしてかえって触媒活性が低下してしまう。このような観点から、光触媒における助触媒全体(当該酸化物粒子及びそれ以外の助触媒の合計)の担持量は、光半導体100質量部に対して、好ましくは0.008質量部以上5.0質量部以下、より好ましくは0.009質量部以上3.0質量部以下、特に好ましくは0.010質量部以上2.0質量部以下である。   In the case of co-supporting, if the amount of the entire cocatalyst supported is too small, there will be no effect. Otherwise, the catalytic activity is reduced. From such a viewpoint, the supported amount of the entire cocatalyst in the photocatalyst (the total of the oxide particles and other cocatalysts) is preferably 0.008 parts by mass or more and 5.0 parts by mass with respect to 100 parts by mass of the optical semiconductor. It is not more than mass parts, more preferably not less than 0.009 parts by mass and not more than 3.0 parts by mass, particularly preferably not less than 0.010 parts by mass and not more than 2.0 parts by mass.

光半導体表面に当該酸化物粒子を担持させる方法としては、特に限定されるものではないが、当該酸化物粒子を含む分散溶液に光半導体を含浸し、光半導体の表面に酸化物粒子を吸着させたうえで適宜焼成に供することで光半導体表面に酸化物粒子を担持する方法が好ましい。この方法は、酸化物粒子としてナノサイズの粒子を、光半導体表面全体に均一に担持させたい場合に好適である。例えば、酸化物粒子と光半導体粒子とを有機溶媒(テトラヒドロフラン等)内で混合し、任意に超音波処理をした後、さらに光半導体粒子の表面に酸化物粒子を吸着させるための適当な結合剤(16−ヒドロキシヘキサデカン酸等)を添加する。その後、適宜攪拌をしたうえで、洗浄処理に供することで、光半導体粒子の表面に酸化物粒子が吸着した光触媒前駆体が得られる。当該前駆体を任意に焼成することで、光半導体の表面に酸化物粒子が均一に担持された光触媒を得ることができる。   The method for supporting the oxide particles on the surface of the optical semiconductor is not particularly limited, but the dispersion containing the oxide particles is impregnated with the optical semiconductor, and the oxide particles are adsorbed on the surface of the optical semiconductor. In addition, a method of supporting oxide particles on the surface of the optical semiconductor by appropriately subjecting to firing is preferable. This method is suitable when it is desired to uniformly support nano-sized particles as oxide particles on the entire surface of the optical semiconductor. For example, a suitable binder for adsorbing oxide particles on the surface of the optical semiconductor particles after mixing the oxide particles and the optical semiconductor particles in an organic solvent (such as tetrahydrofuran) and optionally subjecting to ultrasonic treatment. (16-hydroxyhexadecanoic acid etc.) is added. Thereafter, the photocatalyst precursor in which the oxide particles are adsorbed on the surface of the optical semiconductor particles is obtained by appropriately stirring and then subjecting to washing treatment. By arbitrarily firing the precursor, a photocatalyst in which oxide particles are uniformly supported on the surface of the optical semiconductor can be obtained.

或いは光半導体膜上にディップコートやドロップキャスト、スプレー塗布、静電塗布、スピンコートのような方法によって酸化物粒子を塗布することで、光半導体表面に酸化物粒子を担持させることもできる。   Alternatively, the oxide particles can be supported on the surface of the optical semiconductor by applying the oxide particles on the optical semiconductor film by a method such as dip coating, drop casting, spray coating, electrostatic coating, or spin coating.

以上の通り、本発明に係る光触媒によれば、特定の光半導体の表面にCo及びMnを含む酸化物粒子を助触媒として担持させることで、光触媒活性が大きく向上する。これは、酸化マンガンにCoをドープしたことによる目立った効果は認められないとされていた従来技術からは想到できない顕著且つ特有の効果である。   As described above, according to the photocatalyst according to the present invention, the photocatalytic activity is greatly improved by supporting oxide particles containing Co and Mn on the surface of a specific optical semiconductor as a promoter. This is a remarkable and peculiar effect that cannot be conceived from the prior art, in which a conspicuous effect due to Co doping of manganese oxide is not recognized.

2.光水分解反応用電極
光触媒を実際に水の分解に使用する場合における光触媒の形態については特に限定されるものではなく、水中に光触媒粒子を分散させる形態、光触媒粒子を固めて成形体として当該成形体を水中に設置する形態、基材上に光触媒層を設けて積層体とし当該積層体を水中に設置する形態、集電体上に光触媒を固定化して光水分解反応用電極とし対極とともに水中に設置する形態等が挙げられる。特に、光水分解反応を大規模にて行う場合、バイアスを付与して水分解反応を促進できる観点から、光水分解反応用電極とするとよい。
2. Electrode for photohydrolysis reaction There is no particular limitation on the form of the photocatalyst when the photocatalyst is actually used for water decomposition, the form in which the photocatalyst particles are dispersed in water, the photocatalyst particles are solidified and formed as a molded body A configuration in which the body is placed in water, a photocatalyst layer is provided on the base material to form a laminate, and the laminate is placed in water, a photocatalyst is immobilized on the current collector as an electrode for photohydrolysis reaction, The form etc. which are installed in are mentioned. In particular, in the case of performing the water-splitting reaction on a large scale, it is preferable to use the electrode for the water-splitting reaction from the viewpoint of applying a bias to promote the water-splitting reaction.

光水分解反応用電極は公知の方法により作製可能である。例えば、いわゆる粒子転写法(Chem. Sci., 2013,4, 1120-1124)によって容易に作製可能である。すなわち、ガラス等の第1の基材上に光触媒粒子を載せて、光触媒層と第1の基材層との積層体を得る。得られた積層体の光触媒層表面に蒸着等によって導電層(集電体)を設ける。ここで、光触媒層の導電層側表層にある光触媒粒子が導電層に固定化される。その後、導電層表面に第2の基材を接着し、第1の基材層から導電層及び光触媒層を剥がす。光触媒粒子の一部は導電層の表面に固定化されているので、導電層とともに剥がされ、結果として、光触媒層と導電層と第2の基材層とを有する光水分解反応用電極を得ることができる。
或いは、光触媒粒子が分散されたスラリーを集電体の表面に塗布して乾燥させることで、光水分解反応用電極を得てもよいし、光触媒粒子と集電体とを加圧成形等して一体化することで光水分解反応用電極を得てもよい。また、光触媒粒子が分散されたスラリー中に集電体を浸漬し、電圧を印可して光触媒粒子を電気泳動により集電体上に集積してもよい。
或いは、助触媒の担持を後工程で行うような形態であってもよい。例えば、上記した粒子転写法において、光触媒粒子ではなく光半導体粒子を用いて、同様の方法で光半導体層と導電層と第2の基材層とを有する積層体を得て、その後、光半導体層の表面に助触媒としての酸化物粒子を担持させることで、光水分解反応用電極を得てもよい。
The electrode for photohydrolysis reaction can be produced by a known method. For example, it can be easily produced by a so-called particle transfer method (Chem. Sci., 2013, 4, 1120-1124). That is, the photocatalyst particles are placed on a first substrate such as glass to obtain a laminate of the photocatalyst layer and the first substrate layer. A conductive layer (current collector) is provided on the photocatalyst layer surface of the obtained laminate by vapor deposition or the like. Here, the photocatalyst particles in the surface layer on the conductive layer side of the photocatalyst layer are fixed to the conductive layer. Then, a 2nd base material is adhere | attached on the conductive layer surface, and a conductive layer and a photocatalyst layer are peeled from a 1st base material layer. Since some of the photocatalyst particles are immobilized on the surface of the conductive layer, the photocatalyst particles are peeled off together with the conductive layer, and as a result, a photohydrolysis reaction electrode having a photocatalyst layer, a conductive layer, and a second base material layer is obtained. be able to.
Alternatively, a slurry in which photocatalyst particles are dispersed may be applied to the surface of the current collector and dried to obtain a photohydrolysis electrode, or the photocatalyst particles and the current collector may be subjected to pressure molding or the like. May be integrated to obtain a photohydrolysis electrode. Alternatively, the current collector may be immersed in a slurry in which the photocatalyst particles are dispersed, the voltage is applied, and the photocatalyst particles may be accumulated on the current collector by electrophoresis.
Alternatively, a form in which the promoter is supported in a later step may be used. For example, in the above-described particle transfer method, a laminated body having a photo semiconductor layer, a conductive layer, and a second base material layer is obtained in the same manner using photo semiconductor particles instead of photo catalyst particles, and then the photo semiconductor An electrode for photohydrolysis reaction may be obtained by supporting oxide particles as a promoter on the surface of the layer.

上述したように、本発明に係る光触媒を光水分解反応用電極に適用する場合、電極性能を向上させる観点から、光触媒において、光半導体100質量部に対して酸化物粒子が0.008質量部以上20質量部以下担持されていることが好ましい。或いは、同様の観点から、光半導体の表面の20%以上が当該酸化物粒子に覆われてなることが好ましい。光半導体表面における酸化物粒子の被覆率は、光触媒粒子を一方向から見た場合における光半導体が占める部分と酸化物粒子が占める部分とを、SEM−EDS等によって特定することで算出することができる。例えば、SEM写真図における光半導体部分の面積と酸化物粒子部分の面積とを特定し、(酸化物粒子部分の面積)/{(光半導体部分の面積)+(酸化物粒子部分の面積)}により被覆率を算出することができる。   As described above, when the photocatalyst according to the present invention is applied to the electrode for photohydrolysis reaction, from the viewpoint of improving electrode performance, in the photocatalyst, the oxide particles are 0.008 parts by mass with respect to 100 parts by mass of the optical semiconductor. It is preferable that 20 parts by mass or less is supported. Alternatively, from the same viewpoint, it is preferable that 20% or more of the surface of the optical semiconductor is covered with the oxide particles. The coverage of the oxide particles on the surface of the optical semiconductor can be calculated by specifying the portion occupied by the optical semiconductor and the portion occupied by the oxide particles when the photocatalyst particles are viewed from one direction by SEM-EDS or the like. it can. For example, the area of the optical semiconductor portion and the area of the oxide particle portion in the SEM photograph are specified, and (area of the oxide particle portion) / {(area of the optical semiconductor portion) + (area of the oxide particle portion)} Thus, the coverage can be calculated.

本発明に係る光触媒を用いることにより光水分解反応用電極の性能が向上する。具体的には光源AM1.5G(100mW/cm)、測定電位0.62(vs.RHE)における光電流密度0.25mA/cm以上、好ましくは0.29mA/cm以上、さらに好ましくは0.35mA/cm以上を達成可能である。光電流密度が0.25mA/cm以上において、変換効率0.2%以上の水分解が可能となり、植物と同等以上の変換効率を達成することができる。 By using the photocatalyst according to the present invention, the performance of the photocatalytic reaction electrode is improved. Specifically, the photocurrent density at a light source AM1.5G (100 mW / cm 2 ) and a measurement potential of 0.62 (vs. RHE) is 0.25 mA / cm 2 or more, preferably 0.29 mA / cm 2 or more, more preferably 0.35 mA / cm 2 or more can be achieved. When the photocurrent density is 0.25 mA / cm 2 or more, water splitting with a conversion efficiency of 0.2% or more is possible, and a conversion efficiency equal to or higher than that of plants can be achieved.

3.水素及び/又は酸素の製造方法
本発明においては、上記した光触媒、或いは、上記した光水分解反応用電極を、水又は電解質水溶液に浸漬し、当該光触媒又は光水分解反応用電極に光を照射して光水分解を行うことで、水素及び/又は酸素を製造することができる。
3. Method for producing hydrogen and / or oxygen In the present invention, the above-mentioned photocatalyst or the above-mentioned photocatalytic reaction electrode is immersed in water or an aqueous electrolyte solution, and the photocatalyst or photocatalytic reaction electrode is irradiated with light. Then, hydrogen and / or oxygen can be produced by performing photo-water decomposition.

例えば、上述のように導電体で構成される集電体上に光触媒を固定化して光水分解反応用電極を得る一方、対極として水素生成触媒を担持した導電体を使用し、液体状又は気体状の水を供給しながら光を照射し、水分解反応を進行させる。必要に応じて電極間に電位差を設けることで、水分解反応を促進することができる。或いは、対極として水素生成触媒を担持した光半導体を使用してもよい。この場合、光半導体としては水素生成反応を触媒する公知の光半導体を用いることができる。   For example, as described above, a photocatalyst is immobilized on a current collector made of a conductor to obtain an electrode for photohydrolysis reaction, while a conductor carrying a hydrogen generation catalyst is used as a counter electrode, and the liquid or gas The water splitting reaction proceeds by irradiating light while supplying water in the form of water. The water splitting reaction can be promoted by providing a potential difference between the electrodes as necessary. Alternatively, an optical semiconductor carrying a hydrogen generation catalyst may be used as the counter electrode. In this case, a known optical semiconductor that catalyzes a hydrogen generation reaction can be used as the optical semiconductor.

一方、絶縁基材上に光触媒粒子を固定化した固定化物に、又は、光触媒粒子を加圧成形等した成形体に、水を供給しながら光を照射して水分解反応を進行させてもよい。或いは、光触媒粒子を水又は電解質水溶液に分散させて、ここに光を照射して水分解反応を進行させてもよい。この場合、必要に応じて攪拌することで、反応を促進することができる。   On the other hand, the water splitting reaction may proceed by irradiating light while supplying water to a fixed product in which the photocatalyst particles are fixed on the insulating substrate or to a molded body obtained by pressure molding the photocatalyst particles. . Alternatively, the photocatalyst particles may be dispersed in water or an aqueous electrolyte solution, and light may be irradiated to proceed with the water splitting reaction. In this case, the reaction can be promoted by stirring as necessary.

水素及び/又は酸素の製造時の反応条件については特に限定されるものではないが、例えば反応温度を0℃以上200℃以下とし、反応圧力を2MPa(G)以下とする。
照射光は650nm以下の波長を有する可視光、又は紫外光である。照射光の光源としては太陽や、キセノンランプ、メタルハライドランプ等の太陽光近似光を照射可能なランプ、水銀ランプ、LED等が挙げられる。
The reaction conditions during the production of hydrogen and / or oxygen are not particularly limited. For example, the reaction temperature is 0 ° C. or higher and 200 ° C. or lower, and the reaction pressure is 2 MPa (G) or lower.
The irradiation light is visible light or ultraviolet light having a wavelength of 650 nm or less. Examples of the light source of irradiation light include the sun, a lamp capable of irradiating approximate sunlight, such as a xenon lamp and a metal halide lamp, a mercury lamp, and an LED.

以上のように、本発明によれば、特定の光半導体にCo及びMnを含む酸化物粒子を担持させることで、光水分解反応に対して十分な触媒活性を有する光触媒を得ることができ、水分解反応用電極等として大規模に水素及び/又は酸素を製造することができる。   As described above, according to the present invention, by supporting oxide particles containing Co and Mn on a specific optical semiconductor, a photocatalyst having sufficient catalytic activity for the photo-water splitting reaction can be obtained. Hydrogen and / or oxygen can be produced on a large scale as an electrode for water splitting reaction or the like.

以下、実施例により本発明をさらに具体的に説明するが、本発明は、その要旨を超えない限り、以下の実施例により制限されるものではない。   EXAMPLES Hereinafter, although an Example demonstrates this invention further more concretely, this invention is not restrict | limited by a following example, unless the summary is exceeded.

(実施例1)SrTiO
1.1.CoドープMnO(CoMn1−xO固溶体)ナノ粒子の作製
CoドープMnOナノ粒子(Coドープ量40モル%)の合成法を以下に示す。
Example 1 SrTiO 3
1.1. Preparation of Co - doped MnO (Co x Mn 1-x O solid solution) nanoparticles A method for synthesizing Co-doped MnO nanoparticles (Co-doped 40 mol%) is shown below.

窒素雰囲気下でエタノール(30mL)、蒸留水(40mL)、ヘキサン(70mL)の混合溶媒中に硝酸マンガン(40mmol)とオレイン酸ナトリウム(80mmol)を溶解し、70℃で一晩加熱した。分液漏斗で有機相を分取し、溶媒を留去した後、減圧乾燥を3日間行った。生成したオレイン酸マンガン(0.24mmol)とステアリン酸コバルト(0.16mmol)を1−オクタデセン(10mL)中で混合し、次のような手順で加熱処理を行った。混合物を減圧下120℃で1時間加熱し、続いて温度を10℃・min−1で300℃まで昇温した。300℃にてマグネチックスターラーで30分間撹拌した後、室温まで冷却した。生成物をアセトン、エタノールで洗浄した後、THFに分散させてCoドープMnOナノ粒子を得た。TEM(日本電子(JEOL)社製、JEM−1011、加速電圧100kV)での観察の結果、CoドープMnOナノ粒子の平均直径はおよそ9nmであった。 Under a nitrogen atmosphere, manganese nitrate (40 mmol) and sodium oleate (80 mmol) were dissolved in a mixed solvent of ethanol (30 mL), distilled water (40 mL), and hexane (70 mL), and heated at 70 ° C. overnight. The organic phase was separated with a separatory funnel and the solvent was distilled off, followed by drying under reduced pressure for 3 days. The produced manganese oleate (0.24 mmol) and cobalt stearate (0.16 mmol) were mixed in 1-octadecene (10 mL), and heat treatment was performed in the following procedure. The mixture was heated at 120 ° C. under reduced pressure for 1 hour, and then the temperature was raised to 300 ° C. at 10 ° C. · min −1 . After stirring with a magnetic stirrer at 300 ° C. for 30 minutes, the mixture was cooled to room temperature. The product was washed with acetone and ethanol, and then dispersed in THF to obtain Co-doped MnO nanoparticles. As a result of observation with TEM (manufactured by JEOL, JEM-1011, acceleration voltage 100 kV), the average diameter of the Co-doped MnO nanoparticles was about 9 nm.

他のCoドープ率を有するCoドープMnOナノ粒子(Coドープ量:0モル%、10モル%、20モル%、および30モル%)の合成は、上記の合成条件および金属前駆体の総量を0.4mmolに保ち、オレイン酸マンガンとステアリン酸コバルト比を変えることによって行った。   The synthesis of Co-doped MnO nanoparticles having other Co doping ratios (Co-doping amount: 0 mol%, 10 mol%, 20 mol%, and 30 mol%) is performed by setting the above synthesis conditions and the total amount of metal precursor to 0. .4 mmol and was performed by changing the ratio of manganese oleate to cobalt stearate.

1.2.酸化物ナノ粒子の光半導体への担持
SrTiO(和光純薬工業株式会社製、99.9%)に対してSrClを十倍量加え、1100℃で10時間加熱し水洗することによりSrTiOを調製した。調製したSrTiO(150mg)をCoドープMnOナノ粒子(SrTiOに対して、計0.05質量%のCoドープMnOナノ粒子)を分散させたTHFに懸濁した。超音波処理を行った後、16−ヒドロキシヘキサデカン酸のTHF溶液(4mM、4.5mL)を懸濁液に加え、3時間撹拌した。この処理で全てのCoドープMnOナノ粒子はSrTiO表面に吸着した。CoドープMnOナノ粒子の吸着したSrTiOを空気中で室温から5K・min−1の速度で400℃まで昇温し、トータルで3時間焼成した。焼成後、CoドープMnOナノ粒子は、CoMn3−xに変化したが、粒子サイズに大きな変化は見られなかった。CoドープMnOナノ粒子が全量吸着していることはUV−visスペクトルで確認されており、Co及びMnのSrTiOに対する金属担持量は、仕込み量と同じく0.05質量%である。以上のようにしてCoMn3−x/SrTiOを得た。
1.2. Supporting oxide nanoparticles on optical semiconductor SrCl 3 is added to SrTiO 3 (99.9%, Wako Pure Chemical Industries, Ltd., 99.9%), heated at 1100 ° C. for 10 hours, and washed with water to obtain SrTiO 3. Was prepared. The prepared SrTiO 3 (150 mg) was suspended in THF in which Co-doped MnO nanoparticles (a total of 0.05% by mass of Co-doped MnO nanoparticles with respect to SrTiO 3 ) were dispersed. After sonication, 16-hydroxyhexadecanoic acid in THF (4 mM, 4.5 mL) was added to the suspension and stirred for 3 hours. By this treatment, all Co-doped MnO nanoparticles were adsorbed on the SrTiO 3 surface. SrTiO 3 on which Co-doped MnO nanoparticles were adsorbed was heated from room temperature to 400 ° C. at a rate of 5 K · min −1 in air and calcined for a total of 3 hours. After firing, the Co-doped MnO nanoparticles changed to Co x Mn 3-x O 4 , but no significant change in particle size was seen. It is confirmed by UV-vis spectrum that all the Co-doped MnO nanoparticles are adsorbed, and the amount of metal supported on SrTiO 3 by Co and Mn is 0.05% by mass, the same as the charged amount. To obtain a Co x Mn 3-x O 4 / SrTiO 3 as described above.

1.3.全分解の測定方法及び測定結果
<Rh/Cr(core/shell)/SrTiO/CoMn3−xの調製>
上記の通り調製したCoMn3−x/SrTiOをNaRhCl(SrTiOに対して0.3質量%Rh)水溶液に懸濁し、図1(a)に示す装置を用い、空気の非存在下で光(λ>300nm)を4時間照射しRh(III)を金属Rhに光還元した。Rhの析出の後、得られたサンプルをCr(NO水溶液(0.8mM、SrTiOに対して0.5質量%Cr)に懸濁し、再度光(λ>300nm)を4時間照射しCr(NOをCrに還元した。光照射はカットオフフィルターを備えた300Wキセノンランプを使用した。光照射時には冷却水を使用し溶液温度を室温に保つようにした。生成物を蒸留水でよく洗浄し、十分に乾燥させ、Rh/Cr(core/shell)/SrTiO/CoMn3−xを得た。
1.3. <Preparation of Rh / Cr 2 O 3 (core / shell) / SrTiO 3 / Co x Mn 3-x O 4> total degradation of measurement method and measurement results
Co x Mn 3-x O 4 / SrTiO 3 prepared as described above was suspended in an aqueous solution of Na 3 RhCl 6 (0.3% by mass Rh with respect to SrTiO 3 ), and the apparatus shown in FIG. Rh (III) was photoreduced to metal Rh by irradiation with light (λ> 300 nm) for 4 hours in the absence of air. After precipitation of Rh, the obtained sample was suspended in a Cr (NO 3 ) 3 aqueous solution (0.8 mM, 0.5% by mass Cr with respect to SrTiO 3 ), and again irradiated with light (λ> 300 nm) for 4 hours. was Cr (NO 3) 3 was reduced to Cr 2 O 3. For the light irradiation, a 300 W xenon lamp equipped with a cutoff filter was used. Cooling water was used during light irradiation to keep the solution temperature at room temperature. The product was thoroughly washed with distilled water and dried thoroughly to obtain Rh / Cr 2 O 3 (core / shell) / SrTiO 3 / Co x Mn 3-x O 4 .

<Rh/Cr(core/shell)/SrTiOの調製>
CoMn3−x/SrTiOの代わりに、未担持のSrTiOを用い、これに上述したようにしてRh/Cr(core/shell)を担持し、さらに空気中で室温から5K・min−1の速度で400℃まで昇温し、トータルで3時間焼成することで、Rh/Cr(core/shell)/SrTiOを調製した。
<Preparation of Rh / Cr 2 O 3 (core / shell) / SrTiO 3 >
Instead of Co x Mn 3−x O 4 / SrTiO 3 , unsupported SrTiO 3 was used, and Rh / Cr 2 O 3 (core / shell) was supported thereon as described above. Was heated to 400 ° C. at a rate of 5 K · min −1 and calcined for a total of 3 hours to prepare Rh / Cr 2 O 3 (core / shell) / SrTiO 3 .

<光水分解反応>
光照射装置として、図1に示す装置を使用した。当該装置においては、300Wキセノンランプ(λ>300nm)とカットオフフィルターとを備えるものとした。上記で調製した光触媒0.1gと100mL純水とを閉鎖循環系に接続した反応容器内で数回脱気し、空気の残っていないことを確認した。その後に光照射を開始し、ガスの生成量を測定した。生成ガスの定量はガスクロマトグラフィーを使用した。結果を図2に示す。
<Light water splitting reaction>
As the light irradiation device, the device shown in FIG. 1 was used. The apparatus is provided with a 300 W xenon lamp (λ> 300 nm) and a cutoff filter. The photocatalyst 0.1 g prepared above and 100 mL pure water were degassed several times in a reaction vessel connected to a closed circulation system, and it was confirmed that no air remained. Thereafter, light irradiation was started, and the amount of gas produced was measured. Gas chromatography was used for quantification of the product gas. The results are shown in FIG.

図2に示す結果から明らかなように、Rh/Crに加えて、助触媒としてCo及びMnを含有する酸化物を共担持させた場合は、Mn酸化物を助触媒として共担持させた場合、或いは、Rh/Crのみを担持させた場合と比較して、水素ガス生成量、酸素ガス生成量ともに増大している。具体的には、Coドープ量が増大するほどガス生成量が増大し、光触媒活性が向上することが分かる。 As is clear from the results shown in FIG. 2, when Co and Mn-containing oxides are co-supported as promoters in addition to Rh / Cr 2 O 3 , Mn oxides are co-supported as promoters. When compared with the case where only Rh / Cr 2 O 3 is supported, both the hydrogen gas generation amount and the oxygen gas generation amount are increased. Specifically, it can be seen that as the amount of Co-doping increases, the amount of gas generation increases and the photocatalytic activity improves.

(実施例2−1〜2−5)BiVO
2.1.CoドープMnO(CoMn1−xO固溶体)ナノ粒子の作製
上述した方法と同様の方法により、CoドープMnOナノ粒子(Coドープ量10モル%、20モル%、30モル%、40モル%)を作製した。
(Examples 2-1 to 2-5) BiVO 4
2.1. Preparation of Co-doped MnO (Co x Mn 1-x O solid solution) nanoparticles Co-doped MnO nanoparticles (Co doping amount 10 mol%, 20 mol%, 30 mol%, 40 mol%) by the same method as described above ) Was produced.

2.2.酸化物ナノ粒子の光半導体への担持
J. Am. Chem. Soc. 1999, 121, 11459-11467 に記載の方法により、BiVOを合成した。具体的にはV(関東化学社製、99.0%)とBi(NO・5HO(関東化学社製、99.9%)の水溶液を室温で3日間撹拌することによりBiVOを得た。
得られたBiVO(130mg)をCoドープMnOナノ粒子(BiVOに対して、0.2質量%もしくは1.0質量%)を分散させたTHF(13mL)に懸濁した。超音波処理を行った後、16−ヒドロキシヘキサデカン酸のTHF溶液(4mM、3.9mL)を懸濁液に加え、3時間撹拌した。この処理で全てのCoドープMnOナノ粒子はBiVO表面に吸着した。CoドープMnOの吸着したBiVOを空気中で室温から5K・min−1の速度で400℃まで昇温し、トータルで3時間焼成することにより担持を行った。
2.2. Oxide nanoparticles supported on optical semiconductors
BiVO 4 was synthesized by the method described in J. Am. Chem. Soc. 1999, 121, 11459-11467. Specifically V 2 O 5 (manufactured by Kanto Chemical Co., Inc., 99.0%) and Bi (NO 3) 3 · 5H 2 O ( Kanto Chemical Co., 99.9%) is stirred for 3 days at room temperature an aqueous solution of As a result, BiVO 4 was obtained.
The obtained BiVO 4 (130 mg) was suspended in THF (13 mL) in which Co-doped MnO nanoparticles (0.2% by mass or 1.0% by mass with respect to BiVO 4 ) were dispersed. After sonication, 16-hydroxyhexadecanoic acid in THF (4 mM, 3.9 mL) was added to the suspension and stirred for 3 hours. By this treatment, all Co-doped MnO nanoparticles were adsorbed on the BiVO 4 surface. BiVO 4 adsorbed with Co-doped MnO was heated from room temperature to 400 ° C. at a rate of 5 K · min −1 in air and supported by firing for a total of 3 hours.

2.3.光水分解反応用電極の作製
ナノ粒子を担持したBiVO(30mg)を1mLの2−プロパノールに懸濁させ、この懸濁液200μLを第1のガラス基材(ソーダライムガラス30×30mm)上に滴下、乾燥を3回繰り返して光触媒層を形成した。次に、コンタクト層となるTiを真空蒸着法により積層した。装置はULVAC VPC−260Fを使用し、0.5μm程度積層した。次に、集電層となるAuを真空蒸着法により2μm程度積層した。その後、エポキシ樹脂を用いて集電層に第2のガラス基材(ソーダライムガラス)を接着した。最後に第1のガラス基材を除去し、純水中で10分間超音波洗浄することで、光触媒層/Tiコンタクト層/Au層を備えた光水分解反応用電極を得た。比較例3は電極として、Snを用いた以外は同様の方法で電極を作製した。
2.3. Production of Electrode for Photo-Water-Splitting Reaction BiVO 4 (30 mg) supporting nanoparticles was suspended in 1 mL of 2-propanol, and 200 μL of this suspension was placed on the first glass substrate (soda lime glass 30 × 30 mm). The photocatalyst layer was formed by repeating dropwise addition and drying three times. Next, Ti used as a contact layer was laminated | stacked by the vacuum evaporation method. The apparatus used ULVAC VPC-260F, and laminated | stacked about 0.5 micrometer. Next, about 2 μm of Au serving as a current collecting layer was laminated by vacuum deposition. Then, the 2nd glass base material (soda lime glass) was adhere | attached on the current collection layer using the epoxy resin. Finally, the first glass substrate was removed, and ultrasonic cleaning was performed in pure water for 10 minutes to obtain a photowater decomposition reaction electrode having a photocatalyst layer / Ti contact layer / Au layer. In Comparative Example 3, an electrode was produced by the same method except that Sn was used.

2.4.全分解の測定方法及び測定結果
以下の測定条件によって、光水分解反応用電極を用いて電解液の分解を行った。測定電位0.62Vにおける光電流密度を評価の指標とした。結果を以下の表1に示す。
2.4. Measurement Method and Measurement Result of Total Decomposition The electrolytic solution was decomposed using the photo-water decomposition reaction electrode under the following measurement conditions. The photocurrent density at a measurement potential of 0.62 V was used as an evaluation index. The results are shown in Table 1 below.

<測定条件>
・ 光源 AM1.5ソーラーシミュレーター[AM1.5G(100mW/cm)]
・ pH=7.0 電解液Kpi(KHPO溶液/KHPO溶液)、100mL
・ アルゴン雰囲気
・ 参照電極 Ag/AgCl、対電極Ptワイヤ
・ LSV測定(E=−0.4V、E=0.8V、T=1s、T=10ms/V)
・ 測定電位 0.62V
<Measurement conditions>
・ Light source AM1.5 solar simulator [AM1.5G (100 mW / cm 2 )]
PH = 7.0 Electrolyte Kpi (KH 2 PO 4 solution / K 2 HPO 4 solution), 100 mL
・ Argon atmosphere ・ Reference electrode Ag / AgCl, counter electrode Pt wire ・ LSV measurement (E 0 = −0.4 V, E 1 = 0.8 V, T 0 = 1 s, T 1 = 10 ms / V)
・ Measurement potential 0.62V

(比較例1−1〜1−3)
2.5.Coナノ粒子の作製
Langmuir,2010,26,478 に記載の方法により、Coナノ粒子を合成した。具体的には、 窒素雰囲気下でオルトジクロロベンゼン(12mL)のジオクチルアミン(0.70mmol)とオレイン酸(0.62mmol)を溶解し、さらに炭酸コバルト(0.6mmol)のオレイン酸溶液3mLを加え、182℃で2時間加熱した。室温まで冷却後、生成物をエタノールで洗浄した後、ヘキサンに分散させてCoナノ粒子を得た。TEM(日本電子(JEOL)社製、JEM−1011、加速電圧100kV)での観察の結果、Coナノ粒子の平均直径はおよそ8nmであった。
得られたCoナノ粒子を実施例2と同様の方法によりBiVOへ担持させた後、光水分解反応用電極を作製した。
(Comparative Examples 1-1 to 1-3)
2.5. Preparation of Co nanoparticles
Co nanoparticles were synthesized by the method described in Langmuir, 2010, 26, 478. Specifically, in a nitrogen atmosphere, dioctylamine (0.70 mmol) of orthodichlorobenzene (12 mL) and oleic acid (0.62 mmol) are dissolved, and 3 mL of an oleic acid solution of cobalt carbonate (0.6 mmol) is further added. And heated at 182 ° C. for 2 hours. After cooling to room temperature, the product was washed with ethanol and then dispersed in hexane to obtain Co nanoparticles. As a result of observation with TEM (manufactured by JEOL, JEM-1011, acceleration voltage 100 kV), the average diameter of the Co nanoparticles was about 8 nm.
After the obtained Co nanoparticles were supported on BiVO 4 by the same method as in Example 2, an electrode for water photolysis reaction was produced.

表1に示す結果から明らかなように、助触媒としてCo及びMnを含有する酸化物を担持させた場合は、助触媒を担持しない場合、助触媒としてMn酸化物を担持させた場合、或いは、助触媒としてCo酸化物を担持させた場合と比較して、光水分解反応による光電流密度が増大している。   As is clear from the results shown in Table 1, when an oxide containing Co and Mn is supported as a promoter, when a promoter is not supported, when a Mn oxide is supported as a promoter, or Compared with the case where Co oxide is supported as a co-catalyst, the photocurrent density by the photohydrolysis reaction is increased.

以上の通り、Ti、V、Nb及びTaからなる群から選ばれる1種以上の元素を含む光半導体においては、助触媒としてCo及びMnを含む酸化物粒子を担持させることで、光触媒活性を向上させることが可能であることが示された。   As described above, in an optical semiconductor containing one or more elements selected from the group consisting of Ti, V, Nb and Ta, the photocatalytic activity is improved by supporting oxide particles containing Co and Mn as promoters. It was shown that it is possible to

本発明に係る光触媒は高い水分解活性を有し、太陽光を利用した水分解反応を行うことにより水素及び/又は酸素を製造する光水分解反応に特に好適に用いられる。   The photocatalyst according to the present invention has a high water splitting activity, and is particularly preferably used for a photowater splitting reaction that produces hydrogen and / or oxygen by performing a water splitting reaction using sunlight.

Claims (9)

Ti、V、Nb及びTaからなる群から選ばれる1種以上の元素を含む光半導体に、助触媒としてCo及びMnを含む酸化物粒子が少なくとも担持されてなる、光触媒。   A photocatalyst obtained by supporting at least oxide particles containing Co and Mn as promoters on a photo semiconductor containing one or more elements selected from the group consisting of Ti, V, Nb and Ta. 前記酸化物粒子におけるCoとMnとのモル比(Co/Mn)が1/50以上1以下である、請求項1に記載の光触媒。   The photocatalyst according to claim 1, wherein a molar ratio (Co / Mn) of Co and Mn in the oxide particles is 1/50 or more and 1 or less. 前記酸化物粒子の粒子径が1nm以上25nm以下である、請求項1又は2に記載の光触媒。   The photocatalyst according to claim 1 or 2, wherein a particle diameter of the oxide particles is 1 nm or more and 25 nm or less. 前記光半導体100質量部に対し、前記酸化物粒子が0.005質量部以上1.0質量部以下担持されてなる、請求項1〜3のいずれかに記載の光触媒。   The photocatalyst in any one of Claims 1-3 with which the said oxide particle is carry | supported 0.005 mass part or more and 1.0 mass part or less with respect to 100 mass parts of said optical semiconductors. 請求項1〜3のいずれかに記載の光触媒を用いた光水分解反応用電極。   The electrode for photo-water-splitting reaction using the photocatalyst in any one of Claims 1-3. 前記光半導体100質量部に対し、前記酸化物粒子が0.008質量部以上20質量部以下担持されてなる、請求項5に記載の光水分解反応用電極。   The electrode for photohydrolysis reaction according to claim 5, wherein the oxide particles are supported by 0.008 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the optical semiconductor. 前記光半導体の表面の20%以上が前記酸化物粒子に覆われてなる、請求項5又は6に記載の光水分解反応用電極。   The electrode for photohydrolysis reaction according to claim 5 or 6, wherein 20% or more of the surface of the optical semiconductor is covered with the oxide particles. 測定電位0.62V(vs.RHE)における光電流密度が0.25A/cm以上である、請求項5〜7のいずれかに記載の光水分解反応用電極。 The electrode for photohydrolysis reaction according to claim 5, wherein the photocurrent density at a measurement potential of 0.62 V (vs. RHE) is 0.25 A / cm 2 or more. 請求項1〜4のいずれかに記載の光触媒、或いは、請求項5〜8のいずれかに記載の光水分解反応用電極を、水又は電解質水溶液に浸漬し、該光触媒又は光水分解反応用電極に光を照射して光水分解を行う、水素及び/又は酸素の製造方法。   The photocatalyst according to any one of claims 1 to 4 or the photocatalytic reaction electrode according to any one of claims 5 to 8 is immersed in water or an aqueous electrolyte solution to be used for the photocatalyst or the photohydrolysis reaction. A method for producing hydrogen and / or oxygen, wherein light is decomposed by irradiating an electrode with light.
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