JP6192552B2 - Titanium copper for electronic parts - Google Patents
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Description
本発明はコネクタ等の電子部品用部材として好適なチタン銅に関する。 The present invention relates to titanium copper suitable as a member for electronic parts such as a connector.
近年では携帯端末などに代表される電子機器の小型化が益々進み、従ってそれに使用されるコネクタは狭ピッチ化、低背化及び狭幅化の傾向が著しい。小型のコネクタほどピン幅が狭く、小さく折り畳んだ加工形状となるため、使用する部材には、必要なバネ性を得るための高い強度が求められる。この点、チタンを含有する銅合金(以下、「チタン銅」と称する。)は、比較的強度が高く、応力緩和特性にあっては銅合金中最も優れているため、特に強度が要求される信号系端子用部材として、古くから使用されてきた。 In recent years, electronic devices typified by portable terminals and the like have been increasingly miniaturized, and accordingly, connectors used therefor have a tendency of narrow pitch, low profile, and narrow width. The smaller the connector, the narrower the pin width, and the smaller the folded shape, so that the member to be used is required to have high strength to obtain the necessary spring property. In this regard, a titanium-containing copper alloy (hereinafter referred to as “titanium copper”) has a relatively high strength and is most excellent in the copper alloy in terms of stress relaxation characteristics. As a signal system terminal member, it has been used for a long time.
チタン銅は時効硬化型の銅合金である。溶体化処理によって溶質原子であるTiの過飽和固溶体を形成させ、その状態から低温で比較的長時間の熱処理を施すと、スピノーダル分解によって、母相中にTi濃度の周期的変動である変調構造が発達し、強度が向上する。 Titanium copper is an age-hardening type copper alloy. When a supersaturated solid solution of Ti, which is a solute atom, is formed by solution treatment and heat treatment is performed at a low temperature for a relatively long time from that state, a modulation structure that is a periodic variation of Ti concentration in the parent phase is caused by spinodal decomposition. Develop and improve strength.
チタン銅の結晶組織を観察すると、結晶粒界に沿って「粒界反応相」と呼ばれる連続的に析出した析出物粒子の集団で構成される母相とは異なる相が現出することが知られている。粒界反応相では母相である銅相とCu4Ti相が交互に縞状に析出したラメラ組織が形成されていると考えられる。図1に粒界反応相の例を示す。 When the crystal structure of titanium copper is observed, it is known that a phase different from the parent phase composed of a group of continuously precipitated precipitate particles called “grain boundary reaction phase” appears along the grain boundary. It has been. In the grain boundary reaction phase, it is considered that a lamellar structure in which a copper phase and a Cu 4 Ti phase as a parent phase are alternately deposited in a stripe shape is formed. FIG. 1 shows an example of a grain boundary reaction phase.
粒界反応相がチタン銅の特性に与える影響について着目し、粒界反応相を制御した技術としては、特許文献1〜3が挙げられる。特許文献1及び特許文献2では溶体化処理後に、冷間圧延することなく高温で時効するとともに、冷却速度を速くし過ぎないことで粒界反応相を大きくすることで、強度や曲げ加工性の劣化を抑制し、高導電化を図っている。また、粒界反応相の延性は安定相(Cu3Ti又はCu4Ti)よりも高いことから、粗大化しても強度及び曲げ加工性に悪影響を及ぼしにくいことも記載されている。特許文献3では粒界反応相を積極的に析出させつつ、その形状や大きさについて制御することが記載されている。特許文献3に記載のチタン銅においても、溶体化処理後に高温時効を行っている。 Focusing on the influence of the grain boundary reaction phase on the characteristics of titanium copper, Patent Documents 1 to 3 are listed as techniques for controlling the grain boundary reaction phase. In Patent Document 1 and Patent Document 2, after solution treatment, aging is performed at a high temperature without cold rolling, and the grain boundary reaction phase is increased by not increasing the cooling rate too much. Deterioration is suppressed and high conductivity is achieved. Moreover, since the ductility of the grain boundary reaction phase is higher than that of the stable phase (Cu 3 Ti or Cu 4 Ti), it is described that even if the grain size is increased, the strength and bending workability are hardly adversely affected. Patent Document 3 describes that the shape and size of the grain boundary reaction phase are controlled while actively precipitating. The titanium copper described in Patent Document 3 is also subjected to high temperature aging after the solution treatment.
特許文献1〜3に記載されているように、従来、粒界反応相は特性に好影響を与える析出物であり、積極的に析出させるべきものであるという認識が強かった。また、粒界反応相は不連続に析出する安定相に比べると延性が高いとの認識がなされていた。しかしながら、本発明者の検討結果によれば、粒界に存在している以上、粒界反応相は延性を低下させる要因になっていることを見出した。また、粒界反応相を析出させると、溶体化処理で固溶したTiが強化に寄与するスピノーダル分解ではなく、粒界反応相に使用されていることも、特性向上を妨げていると考えられる。 As described in Patent Documents 1 to 3, conventionally, there has been a strong recognition that the grain boundary reaction phase is a precipitate that has a positive effect on properties and should be positively precipitated. In addition, it has been recognized that the grain boundary reaction phase is more ductile than the stable phase that precipitates discontinuously. However, according to the examination results of the present inventors, it has been found that the grain boundary reaction phase is a factor for reducing ductility as long as it exists at the grain boundary. In addition, when the grain boundary reaction phase is precipitated, it is considered that Ti dissolved in the solution treatment is not used for spinodal decomposition contributing to strengthening but is used for the grain boundary reaction phase, which also hinders improvement of characteristics. .
そこで、本発明は粒界反応相の制御によってチタン銅に対する強度と延性の優れたバランスを得ることを目的とする。 Therefore, an object of the present invention is to obtain an excellent balance between strength and ductility with respect to titanium copper by controlling the grain boundary reaction phase.
粒界反応相の生成を抑制しようとすれば、熱量の小さい熱処理を行うことが有効である。しかしながら、熱量の小さな熱処理ではチタン銅の強化機構であるスピノーダル分解が十分に生じないという問題が生じる。本発明者は、特許文献1〜3に記載の最終溶体化処理→高温時効→冷間圧延というチタン銅の製造手順に対して、最終溶体化処理後、歪みのない状態で、時効処理に先立って低温での予備時効を行うことで、粒界反応相(連続的析出物)の生成を抑制しながらも、チタン銅の強化機構であるスピノーダル分解が促進されることを発見し、強度及び延性のバランスが一層向上したチタン銅の開発に成功した。本発明は以上の知見を背景として完成したものであり、以下によって特定される。 In order to suppress the generation of the grain boundary reaction phase, it is effective to perform heat treatment with a small amount of heat. However, a heat treatment with a small amount of heat causes a problem that spinodal decomposition, which is a strengthening mechanism of titanium copper, does not occur sufficiently. The present inventor, prior to the aging treatment in the state without distortion after the final solution treatment, with respect to the production procedure of titanium copper of the final solution treatment described in Patent Documents 1 to 3 → high temperature aging → cold rolling. It was found that spinodal decomposition, which is a strengthening mechanism of titanium-copper, was promoted by pre-aging at low temperatures, while suppressing the formation of grain boundary reaction phases (continuous precipitates), and strength and ductility. We have succeeded in developing titanium copper with an even better balance. The present invention has been completed against the background of the above findings, and is specified by the following.
本発明は一側面において、Tiを2.0〜4.0質量%含有し、第三元素としてFe、Co、Mg、Si、Ni、Cr、Zr、Mo、V、Nb、Mn、B、及びPからなる群から選択された1種以上を合計で0〜0.5質量%含有し、残部が銅及び不可避的不純物からなる電子部品用チタン銅であって、圧延方向に平行な断面の組織観察において、粒界反応相が明確に確認できる結晶粒における粒界反応相の占める最大の面積率が5〜30%であるチタン銅である。 In one aspect of the present invention, Ti is contained in an amount of 2.0 to 4.0% by mass, and the third element is Fe, Co, Mg, Si, Ni, Cr, Zr, Mo, V, Nb, Mn, B, and 1-0.5% by mass in total of one or more selected from the group consisting of P, the balance being titanium copper for electronic parts consisting of copper and unavoidable impurities, the structure of the cross section parallel to the rolling direction In the observation, the maximum area ratio occupied by the grain boundary reaction phase in the crystal grains in which the grain boundary reaction phase can be clearly confirmed is 5 to 30%.
本発明に係るチタン銅の一実施形態においては、圧延方向に平行な断面の組織観察において、粒界反応相を含有する結晶粒の個数割合が30〜80%である。 In one embodiment of titanium copper according to the present invention, in the observation of the structure of the cross section parallel to the rolling direction, the number ratio of the crystal grains containing the grain boundary reaction phase is 30 to 80%.
本発明に係るチタン銅の別の一実施形態においては、圧延方向と平行な方向の0.2%耐力(YS;MPa)と伸び(El;%)の関係が次式:El≧−0.058×YS+65を満たす。 In another embodiment of the titanium copper according to the present invention, the relationship between 0.2% proof stress (YS; MPa) and elongation (El;%) in the direction parallel to the rolling direction is expressed by the following formula: El ≧ −0. 058 × YS + 65 is satisfied.
本発明に係るチタン銅の更に別の一実施形態においては、圧延方向に平行な断面の組織観察における平均結晶粒径が2〜30μmである。 In still another embodiment of the titanium copper according to the present invention, the average crystal grain size in the observation of the structure of the cross section parallel to the rolling direction is 2 to 30 μm.
本発明は別の一側面において、本発明に係るチタン銅を備えた伸銅品である。 In another aspect, the present invention is a copper rolled product including the titanium copper according to the present invention.
本発明は更に別の一側面において、本発明に係るチタン銅を備えた電子部品である。 In still another aspect, the present invention is an electronic component including the titanium copper according to the present invention.
本発明に係るチタン銅は従来に比べて強度と延性のバランスに優れている。そのため、本発明に係るチタン銅は小型電子機器に好適であり、また、曲げ加工や深絞り加工にも適している。 The titanium-copper according to the present invention has an excellent balance between strength and ductility as compared with the prior art. Therefore, the titanium copper according to the present invention is suitable for small electronic devices, and is also suitable for bending and deep drawing.
(1)Ti濃度
本発明に係るチタン銅においては、Ti濃度を2.0〜4.0質量%とする。チタン銅は、溶体化処理によりCuマトリックス中へTiを固溶させ、時効処理により微細な析出物を合金中に分散させることにより、強度及び導電率を上昇させる。
Ti濃度が2.0質量%未満になると、Ti濃度の幅が生じないか又は小さくなると共に析出物の析出が不充分となり所望の強度が得られない。Ti濃度が4.0質量%を超えると、延性が劣化し、圧延の際に材料が割れやすくなる。強度及び延性のバランスを考慮すると、好ましいTi濃度は2.5〜3.5質量%である。
(1) Ti concentration In titanium copper concerning the present invention, Ti concentration shall be 2.0-4.0 mass%. Titanium copper increases strength and electrical conductivity by dissolving Ti in a Cu matrix by solution treatment and dispersing fine precipitates in the alloy by aging treatment.
When the Ti concentration is less than 2.0% by mass, the range of the Ti concentration does not occur or becomes small, and the precipitation of precipitates becomes insufficient, so that a desired strength cannot be obtained. When the Ti concentration exceeds 4.0% by mass, the ductility deteriorates and the material is easily cracked during rolling. Considering the balance between strength and ductility, the preferable Ti concentration is 2.5 to 3.5% by mass.
(2)第三元素
本発明に係るチタン銅においては、Fe、Co、Mg、Si、Ni、Cr、Zr、Mo、V、Nb、Mn、B、及びPからなる群から選択される第三元素の1種以上を含有させることにより、強度を更に向上させることができる。但し、第三元素の合計濃度が0.5質量%を超えると、延性が劣化し、圧延の際に材料が割れやすくなる。そこで、これら第三元素は合計で0〜0.5質量%含有することができ、強度及び延性のバランスを考慮すると、上記元素の1種以上を総量で0.1〜0.4質量%含有させることが好ましい。
(2) Third element In the titanium copper according to the present invention, a third element selected from the group consisting of Fe, Co, Mg, Si, Ni, Cr, Zr, Mo, V, Nb, Mn, B, and P. By including one or more elements, the strength can be further improved. However, if the total concentration of the third elements exceeds 0.5% by mass, the ductility deteriorates and the material is easily cracked during rolling. Therefore, these third elements can be contained in a total amount of 0 to 0.5% by mass, and considering the balance between strength and ductility, one or more of the above elements are contained in a total amount of 0.1 to 0.4% by mass. It is preferable to make it.
(3)最大侵食率
本発明に係るチタン銅の一実施形態においては、圧延方向に平行な断面の組織観察において、粒界反応相が明確に確認できる結晶粒における粒界反応相の占める最大の面積率(“最大侵食率”という)を規定している。最大侵食率が高くなると延性、更には強度にも悪影響を与えることから、これを抑制することが望ましい。本発明に係るチタン銅は例えば、最大侵食率を30%以下とすることができ、25%以下とすることができ、更には20%以下とすることができる。一方で、最大侵食率を低下させようとして熱量が過度に低い熱処理を行うと、スピノーダル分解の発達が不十分になる、又は、安定相の析出が生じて、実用性に優れた強度や延性を確保できなくなる。本発明に係るチタン銅は例えば、最大侵食率を5%以上とすることができ、10%以上とすることができ、更には15%以上とすることができる。
(3) Maximum erosion rate In one embodiment of the titanium copper according to the present invention, in the observation of the structure of the cross section parallel to the rolling direction, the maximum occupancy of the grain boundary reaction phase in the crystal grains where the grain boundary reaction phase can be clearly confirmed Specifies the area ratio (referred to as “maximum erosion rate”). As the maximum erosion rate increases, ductility and further strength are adversely affected, so it is desirable to suppress this. For example, titanium copper according to the present invention can have a maximum erosion rate of 30% or less, 25% or less, and further 20% or less. On the other hand, if heat treatment is performed with an excessively low calorific value to reduce the maximum erosion rate, the development of spinodal decomposition becomes insufficient, or precipitation of a stable phase occurs, resulting in excellent strength and ductility. Cannot be secured. For example, titanium copper according to the present invention can have a maximum erosion rate of 5% or more, 10% or more, and further 15% or more.
強度と延性の優れたバランスを考えると、最大侵食率は8〜28%が好ましく、10〜25%がより好ましい。 Considering a balance between strength and ductility, the maximum erosion rate is preferably 8 to 28%, more preferably 10 to 25%.
(4)析出粒率
本発明に係るチタン銅の一実施形態においては、圧延方向に平行な断面の組織観察において、粒界反応相を含有する結晶粒の個数割合(“析出粒率”という。)を規定している。析出粒率が高くなると延性、更には強度にも悪影響を与えることから、これを抑制することが望ましい。本発明に係るチタン銅は例えば、析出粒率を80%以下とすることができ、70%以下とすることができ、60%以下とすることができ、50%以下とすることができ、更には40%以下とすることができる。
(4) Precipitated Grain Ratio In one embodiment of titanium copper according to the present invention, the number ratio of crystal grains containing a grain boundary reaction phase (referred to as “precipitated grain ratio”) in the observation of the structure of the cross section parallel to the rolling direction. ). As the precipitation rate increases, the ductility and strength are also adversely affected, so it is desirable to suppress this. For example, the titanium copper according to the present invention can have a precipitation rate of 80% or less, 70% or less, 60% or less, 50% or less, and Can be 40% or less.
一方で、析出粒率を抑制しようとして熱量が過度に低い熱処理を行うと、スピノーダル分解の発達が不十分になる、又は、安定相の析出が生じて、実用性に優れた強度や延性を確保できなくなる。本発明に係るチタン銅は例えば、析出粒率を30%以上とすることができ、40%以上とすることができ、50%以上とすることができ、60%以上とすることができ、更には70%以上とすることができる。 On the other hand, if heat treatment is performed with an excessively low calorie to suppress the rate of precipitated grains, the spinodal decomposition will be insufficiently developed, or stable phase will precipitate, ensuring practical strength and ductility. become unable. For example, the titanium copper according to the present invention can have a precipitation rate of 30% or more, 40% or more, 50% or more, 60% or more, and Can be 70% or more.
強度と延性の優れたバランスを考えると、析出粒率は40〜70%が好ましく、45〜65%がより好ましい。 Considering an excellent balance between strength and ductility, the precipitation rate is preferably 40 to 70%, more preferably 45 to 65%.
(5)0.2%耐力(YS)及び伸び(El)
本発明に係るチタン銅は0.2%耐力と伸びを高い次元で両立することができる。
本発明に係るチタン銅は一実施形態において、JIS−Z2241に従う引張試験を行ったときに、圧延方向に平行な方向の0.2%耐力(YS;MPa)と伸び(El;%)の関係が次式:El≧−0.058×YS+65を満たす。
(5) 0.2% proof stress (YS) and elongation (El)
Titanium copper according to the present invention can achieve both 0.2% proof stress and elongation at a high level.
In one embodiment, the titanium copper according to the present invention is subjected to a tensile test according to JIS-Z2241, and the relationship between 0.2% proof stress (YS; MPa) and elongation (El;%) in a direction parallel to the rolling direction. Satisfies the following formula: El ≧ −0.058 × YS + 65.
本発明に係るチタン銅は好ましい実施形態において、JIS−Z2241に従う引張試験を行ったときに、圧延方向に平行な方向の0.2%耐力(YS;MPa)と伸び(El;%)の関係が次式:El≧−0.058×YS+66を満たす。 In a preferred embodiment, when the titanium copper according to the present invention is subjected to a tensile test according to JIS-Z2241, the relationship between 0.2% proof stress (YS; MPa) and elongation (El;%) in a direction parallel to the rolling direction. Satisfies the following formula: El ≧ −0.058 × YS + 66.
本発明に係るチタン銅はより好ましい実施形態において、JIS−Z2241に従う引張試験を行ったときに、圧延方向に平行な方向の0.2%耐力(YS;MPa)と伸び(El;%)の関係が次式:El≧−0.058×YS+67を満たす。 In a more preferred embodiment, the titanium copper according to the present invention has a 0.2% proof stress (YS; MPa) and an elongation (El;%) in a direction parallel to the rolling direction when a tensile test according to JIS-Z2241 is performed. The relationship satisfies the following formula: El ≧ −0.058 × YS + 67.
本発明に係るチタン銅は典型的な実施形態において、JIS−Z2241に従う引張試験を行ったときに、圧延方向に平行な方向の0.2%耐力(YS;MPa)と伸び(El;%)の関係が次式:−0.058×YS+72≧Elを満たす。 In a typical embodiment, the titanium copper according to the present invention has a 0.2% proof stress (YS; MPa) and an elongation (El;%) in a direction parallel to the rolling direction when a tensile test according to JIS-Z2241 is performed. Satisfies the following formula: −0.058 × YS + 72 ≧ E1.
本発明に係るチタン銅はより典型的な実施形態において、JIS−Z2241に従う引張試験を行ったときに、圧延方向に平行な方向の0.2%耐力(YS;MPa)と伸び(El;%)の関係が次式:−0.058×YS+71≧Elを満たす。 In a more typical embodiment, the titanium copper according to the present invention has a 0.2% proof stress (YS; MPa) and an elongation (El;%) in a direction parallel to the rolling direction when a tensile test according to JIS-Z2241 is performed. ) Satisfies the following formula: −0.058 × YS + 71 ≧ El.
本発明に係るチタン銅は更により典型的な実施形態において、JIS−Z2241に従う引張試験を行ったときに、圧延方向に平行な方向の0.2%耐力(YS;MPa)と伸び(El;%)の関係が次式:−0.058×YS+70≧Elを満たす。 In a still more typical embodiment, the titanium copper according to the present invention is subjected to a tensile test according to JIS-Z2241, and 0.2% proof stress (YS; MPa) and elongation (El; %) Satisfies the following formula: −0.058 × YS + 70 ≧ El.
本発明に係るチタン銅は一実施形態において、JIS−Z2241に従う引張試験を行ったときに圧延方向に平行な方向での0.2%耐力が900MPa以上とすることができ、950MPa以上とすることができ、1000MPa以上とすることができ、更には1050MPa以上とすることができる。 In one embodiment, the titanium copper according to the present invention can have a 0.2% proof stress in a direction parallel to the rolling direction of 900 MPa or more and 950 MPa or more when a tensile test according to JIS-Z2241 is performed. It can be set to 1000 MPa or more, and further can be set to 1050 MPa or more.
本発明に係るチタン銅における0.2%耐力の上限値は、本発明が目的とする強度の点からは特に規制されないが、手間及び費用がかかる上、高強度を得るためにTi濃度を高めると熱間圧延時に割れる危険性があるため、本発明に係るチタン銅の0.2%耐力は一般には1400MPa以下であり、典型的には1300MPa以下であり、より典型的には1200MPa以下であり、更により典型的には1150MPa以下である。 The upper limit value of 0.2% proof stress in the titanium copper according to the present invention is not particularly restricted from the viewpoint of the strength intended by the present invention, but takes time and cost, and increases the Ti concentration to obtain high strength. Therefore, the 0.2% proof stress of the titanium copper according to the present invention is generally 1400 MPa or less, typically 1300 MPa or less, and more typically 1200 MPa or less. Even more typically, it is 1150 MPa or less.
本発明に係るチタン銅は一実施形態において、JIS−Z2241に従う引張試験を行ったときに圧延方向に平行な方向での伸び(El)を4.5%以上とすることができ、5.0%以上とすることができ、6.0%以上とすることができ、7.0%以上とすることができ、8.0%以上とすることができ、9.0%以上とすることができ、更には10.0%以上とすることができる。本発明に係るチタン銅は一実施形態において、JIS−Z2241に従う引張試験を行ったときに圧延方向に平行な方向での伸び(El)を17.0%以下とすることができ、16.0%以下とすることができ、15.0%以下とすることができ、14.0%以下とすることができ、更には13.0%以下とすることができる。 In one embodiment, the titanium copper according to the present invention can have an elongation (El) in a direction parallel to the rolling direction of 4.5% or more when subjected to a tensile test according to JIS-Z2241, % Or more, 6.0% or more, 7.0% or more, 8.0% or more, 9.0% or more Further, it can be made 10.0% or more. In one embodiment, the titanium-copper according to the present invention can have an elongation (El) in a direction parallel to the rolling direction of 17.0% or less when a tensile test according to JIS-Z2241 is performed. % Or less, 15.0% or less, 14.0% or less, and further 13.0% or less.
(6)結晶粒径
チタン銅の強度や延性を向上させるためには、結晶粒が小さいほどよい。そこで、好ましい平均結晶粒径は30μm以下、より好ましくは20μm以下、更により好ましくは10μm以下である。下限については特に制限はないが、結晶粒径の判別が困難となるほど微細化しようとすると未再結晶粒が存在する混粒となるために延性が悪化しやすい。そこで、平均結晶粒径は2μm以上が好ましい。本発明において、平均結晶粒径は光学顕微鏡か電子顕微鏡による観察で圧延方向に平行な断面の組織観察における円相当径で表す。
(6) Crystal grain size In order to improve the strength and ductility of titanium copper, the smaller the crystal grain, the better. Therefore, the preferable average crystal grain size is 30 μm or less, more preferably 20 μm or less, and still more preferably 10 μm or less. Although there is no particular limitation on the lower limit, ductility tends to deteriorate because it becomes a mixed grain in which non-recrystallized grains exist when attempting to make the crystal grain size more difficult to discriminate. Therefore, the average crystal grain size is preferably 2 μm or more. In the present invention, the average crystal grain size is represented by the equivalent circle diameter in the structure observation of the cross section parallel to the rolling direction by observation with an optical microscope or electron microscope.
(7)チタン銅の板厚
本発明に係るチタン銅の一実施形態においては、板厚を0.5mm以下とすることができ、典型的な実施形態においては厚みを0.03〜0.3mmとすることができ、より典型的な実施形態においては厚みを0.08〜0.2mmとすることができる。
(7) Plate thickness of titanium copper In one embodiment of titanium copper according to the present invention, the plate thickness can be 0.5 mm or less, and in a typical embodiment, the thickness is 0.03 to 0.3 mm. In a more typical embodiment, the thickness can be 0.08 to 0.2 mm.
(8)用途
本発明に係るチタン銅は種々の伸銅品、例えば板、条、管、棒及び線に加工することができる。本発明に係るチタン銅は、限定的ではないが、コネクタ、スイッチ、オートフォーカスカメラモジュール、ジャック、端子(例えばバッテリー端子)、リレー等の電子部品の材料として好適に使用することができる。
(8) Applications Titanium copper according to the present invention can be processed into various copper products, such as plates, strips, tubes, bars and wires. The titanium-copper according to the present invention can be suitably used as a material for electronic parts such as, but not limited to, connectors, switches, autofocus camera modules, jacks, terminals (for example, battery terminals), and relays.
(9)製造方法
本発明に係るチタン銅は、特に最終の溶体化処理及びそれ以降の工程で適切な熱処理及び冷間圧延を実施することにより製造可能である。以下に、好適な製造例を工程毎に順次説明する。
(9) Manufacturing Method Titanium copper according to the present invention can be manufactured by carrying out appropriate heat treatment and cold rolling, particularly in the final solution treatment and the subsequent steps. Below, a suitable manufacture example is demonstrated one by one for every process.
<インゴット製造>
溶解及び鋳造によるインゴットの製造は、基本的に真空中又は不活性ガス雰囲気中で行う。溶解において添加元素の溶け残りがあると、強度の向上に対して有効に作用しない。よって、溶け残りをなくすため、FeやCr等の高融点の第三元素は、添加してから十分に攪拌したうえで、一定時間保持する必要がある。一方、TiはCu中に比較的溶け易いので第三元素の溶解後に添加すればよい。従って、Cuに、Fe、Co、Mg、Si、Ni、Cr、Zr、Mo、V、Nb、Mn、B、及びPからなる群から選択される1種又は2種以上を合計で0〜0.5質量%含有するように添加し、次いでTiを2.0〜4.0質量%含有するように添加してインゴットを製造することが望ましい。
<Ingot manufacturing>
Production of ingots by melting and casting is basically performed in a vacuum or in an inert gas atmosphere. If the additive element remains undissolved during melting, it does not effectively act on strength improvement. Therefore, in order to eliminate undissolved residue, it is necessary to add a high melting point third element such as Fe or Cr, and after stirring sufficiently, hold it for a certain time. On the other hand, since Ti is relatively easily dissolved in Cu, it may be added after the third element is dissolved. Therefore, Cu includes one or more selected from the group consisting of Fe, Co, Mg, Si, Ni, Cr, Zr, Mo, V, Nb, Mn, B, and P in total 0 to 0. It is desirable to add it so that it may contain 0.5 mass%, and then to add Ti so that it may contain 2.0-4.0 mass%, and to manufacture an ingot.
<均質化焼鈍及び熱間圧延>
インゴット製造時に生じた凝固偏析や晶出物は粗大なので均質化焼鈍でできるだけ母相に固溶させて小さくし、可能な限り無くすことが望ましい。これは曲げ割れの防止に効果があるからである。具体的には、インゴット製造工程後には、900〜970℃に加熱して3〜24時間均質化焼鈍を行った後に、熱間圧延を実施するのが好ましい。液体金属脆性を防止するために、熱延前及び熱延中は960℃以下とし、且つ、元厚から全体の圧下率が90%までのパスは900℃以上とするのが好ましい。
<Homogenization annealing and hot rolling>
Since the solidified segregation and crystallized matter produced during the production of the ingot are coarse, it is desirable to make it as small as possible by dissolving it in the parent phase as much as possible by homogenization annealing. This is because it is effective in preventing bending cracks. Specifically, after the ingot manufacturing process, it is preferable to perform hot rolling after heating to 900 to 970 ° C. and performing homogenization annealing for 3 to 24 hours. In order to prevent liquid metal embrittlement, it is preferable that the temperature is 960 ° C. or lower before and during hot rolling, and that the pass from the original thickness to 90% of the total rolling reduction is 900 ° C. or higher.
<第一溶体化処理>
その後、冷延と焼鈍を適宜繰り返してから第一溶体化処理を行うのが好ましい。ここで予め溶体化を行っておく理由は、最終の溶体化処理での負担を軽減させるためである。すなわち、最終の溶体化処理では、第二相粒子を固溶させるための熱処理ではなく、既に溶体化されてあるのだから、その状態を維持しつつ再結晶のみ起こさせればよいので、軽めの熱処理で済む。具体的には、第一溶体化処理は加熱温度を850〜900℃とし、2〜10分間行えばよい。そのときの昇温速度及び冷却速度においても極力速くし、ここでは第二相粒子が析出しないようにするのが好ましい。なお、第一溶体化処理は行わなくても良い。
<First solution treatment>
Thereafter, it is preferable to perform the first solution treatment after appropriately repeating cold rolling and annealing. The reason why the solution treatment is performed in advance is to reduce the burden in the final solution treatment. That is, in the final solution treatment, it is not a heat treatment for dissolving the second phase particles, but is already in solution, so it is only necessary to cause recrystallization while maintaining that state. Just heat treatment. Specifically, the first solution treatment may be performed at a heating temperature of 850 to 900 ° C. for 2 to 10 minutes. In this case, it is preferable to increase the heating rate and the cooling rate as much as possible so that the second phase particles do not precipitate. Note that the first solution treatment may not be performed.
<中間圧延>
最終の溶体化処理前の中間圧延における圧下率を高くするほど、最終の溶体化処理における再結晶粒を均一かつ微細に制御できる。従って、中間圧延の圧下率は好ましくは70〜99%である。圧下率は{((圧延前の厚み−圧延後の厚み)/圧延前の厚み)×100%}で定義される。
<Intermediate rolling>
The higher the rolling reduction in the intermediate rolling before the final solution treatment, the more uniformly and finely control the recrystallized grains in the final solution treatment. Therefore, the rolling reduction of intermediate rolling is preferably 70 to 99%. The rolling reduction is defined by {((thickness before rolling−thickness after rolling) / thickness before rolling) × 100%}.
<最終の溶体化処理>
最終の溶体化処理では、析出物を完全に固溶させることが望ましいが、完全に無くすまで高温に加熱すると、結晶粒が粗大化しやすいので、加熱温度は第二相粒子組成の固溶限付近の温度とする(Tiの添加量が2.0〜4.0質量%の範囲でTiの固溶限が添加量と等しくなる温度は730〜840℃程度であり、例えばTiの添加量が3.0質量%では800℃程度)。そしてこの温度まで急速に加熱し、水冷等によって冷却速度も速くすれば粗大な第二相粒子の発生が抑制される。従って、典型的には、730〜840℃のTiの固溶限が添加量と同じになる温度に対して−20℃〜+50℃の温度に加熱し、より典型的には730〜840℃のTiの固溶限が添加量と同じになる温度に比べて0〜30℃高い温度、好ましくは0〜20℃高い温度に加熱する。
<Final solution treatment>
In the final solution treatment, it is desirable to completely dissolve the precipitate, but if heated to a high temperature until it completely disappears, the crystal grains are likely to coarsen, so the heating temperature is close to the solid solution limit of the second phase particle composition. (The temperature at which the solid solubility limit of Ti becomes equal to the addition amount when the addition amount of Ti is in the range of 2.0 to 4.0% by mass is about 730 to 840 ° C., for example, the addition amount of Ti is 3 About 800 ° C. at 0.0 mass%). And if it heats rapidly to this temperature and a cooling rate is also made quick by water cooling etc., generation | occurrence | production of coarse 2nd phase particle | grains will be suppressed. Therefore, it is typically heated to a temperature of −20 ° C. to + 50 ° C. with respect to the temperature at which the solid solubility limit of Ti at 730 to 840 ° C. is the same as the addition amount, and more typically 730 to 840 ° C. Heating is performed at a temperature 0 to 30 ° C higher, preferably 0 to 20 ° C higher than the temperature at which the solid solubility limit of Ti is the same as the addition amount.
また、最終の溶体化処理での加熱時間は短いほうが結晶粒の粗大化を抑制できる。加熱時間は例えば30秒〜10分とすることができ、典型的には1分〜8分とすることができる。この時点で第二相粒子が発生しても微細かつ均一に分散していれば、強度と延性に対してほとんど無害である。しかし粗大なものは最終の時効処理で更に成長する傾向にあるので、この時点での第二相粒子は生成してもなるべく少なく、小さくしなければならない。 Moreover, the coarsening of a crystal grain can be suppressed when the heating time in the final solution treatment is shorter. The heating time can be, for example, 30 seconds to 10 minutes, and typically 1 minute to 8 minutes. Even if the second phase particles are generated at this point, if they are finely and uniformly dispersed, they are almost harmless to strength and ductility. However, since the coarse particles tend to grow further in the final aging treatment, the second phase particles at this point must be made as small as possible even if they are formed.
<予備時効>
最終の溶体化処理に引き続いて、予備時効処理を行う。従来は最終の溶体化処理の後は冷間圧延を行うことが通例であったが、本発明に係るチタン銅を得る上では最終の溶体化処理の後、冷間圧延を行わずに直ちに予備時効処理を行うことが重要である。予備時効処理は次工程の時効処理よりも低温で行われる熱処理であり、予備時効処理及び後述する時効処理を連続して行うことによりチタン銅の母相中のスピノーダル分解を飛躍的に促進することが可能となる。予備時効処理は表面酸化皮膜の発生を抑制するためにAr、N2、H2等の不活性雰囲気で行うことが好ましい。
<Preliminary aging>
Subsequent to the final solution treatment, a preliminary aging treatment is performed. Conventionally, cold rolling is usually performed after the final solution treatment, but in order to obtain titanium copper according to the present invention, after the final solution treatment, it is immediately preliminarily performed without performing cold rolling. It is important to perform an aging treatment. The pre-aging treatment is a heat treatment performed at a lower temperature than the aging treatment of the next step, and the spinodal decomposition in the parent phase of titanium copper is dramatically accelerated by continuously performing the pre-aging treatment and the aging treatment described later. Is possible. The pre-aging treatment is preferably performed in an inert atmosphere such as Ar, N 2 , H 2 or the like in order to suppress the generation of the surface oxide film.
予備時効処理における加熱温度が低すぎても高すぎても上記利点を得るのは困難である。本発明者による検討結果によれば、材料温度150〜250℃で10〜20時間加熱することが好ましく、材料温度160〜230℃で10〜18時間加熱することがより好ましく、170〜200℃で12〜16時間加熱することが更により好ましい。 It is difficult to obtain the above advantages even if the heating temperature in the pre-aging treatment is too low or too high. According to the examination results by the present inventors, it is preferable to heat at a material temperature of 150 to 250 ° C. for 10 to 20 hours, more preferably to heat at a material temperature of 160 to 230 ° C. for 10 to 18 hours, and at 170 to 200 ° C. It is even more preferred to heat for 12-16 hours.
<時効処理>
予備時効処理に引き続いて、時効処理を行う。予備時効処理後、いったん室温まで冷却してもよい。製造効率を考えると、予備時効処理の後、冷却せずに時効処理温度まで昇温して、連続して時効処理を実施することが望ましい。何れの方法であっても得られるチタン銅の特性に違いはない。但し、予備時効はその後の時効処理で均一に第二相粒子を析出させることを目的としているため、予備時効処理と時効処理の間には冷間圧延は実施するべきではない。
<Aging treatment>
An aging process is performed following the preliminary aging process. After the preliminary aging treatment, it may be cooled to room temperature once. Considering the production efficiency, it is desirable that after the preliminary aging treatment, the temperature is raised to the aging treatment temperature without cooling and the aging treatment is continuously performed. There is no difference in the characteristics of titanium copper obtained by any method. However, since the preliminary aging is intended to precipitate the second phase particles uniformly in the subsequent aging treatment, cold rolling should not be performed between the preliminary aging treatment and the aging treatment.
予備時効処理によって溶体化処理で固溶させたチタンが少し析出していることから、時効処理は慣例の時効処理よりもやや低温で実施するべきであり、材料温度300〜450℃で0.5〜20時間加熱することが好ましく、材料温度350〜440℃で2〜18時間加熱することがより好ましく、材料温度375〜430℃で3〜15時間加熱することが更により好ましい。時効処理は予備時効処理と同様の理由により、Ar、N2、H2等の不活性雰囲気で行うことが好ましい。 Since titanium dissolved in the solution treatment by the pre-aging treatment is slightly precipitated, the aging treatment should be performed at a slightly lower temperature than the conventional aging treatment, and the material temperature is 0.5 to 0.5 at a material temperature of 300 to 450 ° C. It is preferably heated for -20 hours, more preferably heated at a material temperature of 350-440 ° C. for 2-18 hours, and even more preferably heated at a material temperature of 375-430 ° C. for 3-15 hours. The aging treatment is preferably performed in an inert atmosphere such as Ar, N 2 and H 2 for the same reason as the preliminary aging treatment.
<最終の冷間圧延>
上記時効処理後、最終の冷間圧延を行う。最終の冷間加工によってチタン銅の強度を高めることができるが、本発明が意図するような強度と延性の良好なバランスを得るためには圧下率を10〜50%、好ましくは20〜40%とすることが望ましい。
<Final cold rolling>
After the aging treatment, the final cold rolling is performed. The strength of titanium copper can be increased by the final cold working, but in order to obtain a good balance between strength and ductility as intended by the present invention, the reduction ratio is 10 to 50%, preferably 20 to 40%. Is desirable.
<歪取焼鈍>
高温暴露時の耐へたり性を向上する観点からは、最終の冷間圧延後に歪取焼鈍を実施することが望まれる。歪取焼鈍を行うことで転位が再配列するからである。歪取焼鈍の条件は慣用の条件でよいが、過度の歪取焼鈍を行うと粗大粒子が析出して強度が低下するため好ましくない。歪取焼鈍は材料温度200〜600℃で10〜600秒行うことが好ましく、250〜550℃で10〜400秒行うことがより好ましく、300〜500℃で10〜200秒行うことが更により好ましい。
<Strain relief annealing>
From the viewpoint of improving sag resistance at high temperature exposure, it is desirable to perform strain relief annealing after the final cold rolling. This is because dislocations are rearranged by performing strain relief annealing. The conditions for strain relief annealing may be conventional conditions. However, excessive strain relief annealing is not preferable because coarse particles precipitate and the strength decreases. The strain relief annealing is preferably performed at a material temperature of 200 to 600 ° C. for 10 to 600 seconds, more preferably 250 to 550 ° C. for 10 to 400 seconds, and even more preferably 300 to 500 ° C. for 10 to 200 seconds. .
なお、当業者であれば、上記各工程の合間に適宜、表面の酸化スケール除去のための研削、研磨、ショットブラスト酸洗等の工程を行なうことができることは理解できるだろう。 A person skilled in the art will understand that steps such as grinding, polishing, and shot blast pickling for removing oxide scale on the surface can be appropriately performed between the above steps.
以下に本発明の実施例(発明例)を比較例と共に示すが、これらは本発明及びその利点をよりよく理解するために提供するものであり、発明が限定されることを意図するものではない。 EXAMPLES Examples (invention examples) of the present invention are shown below together with comparative examples, which are provided for better understanding of the present invention and its advantages, and are not intended to limit the invention. .
表1(表1−1および1−2)に示す合金成分を含有し残部が銅及び不可避的不純物からなるチタン銅の試験片を種々の製造条件で作製し、組織観察及び特性評価を行った。 Titanium copper test pieces containing the alloy components shown in Table 1 (Tables 1-1 and 1-2), the balance being copper and inevitable impurities, were produced under various manufacturing conditions, and the structure observation and characteristic evaluation were performed. .
まず、真空溶解炉にて電気銅2.5kgを溶解し、第三元素を表1に示す配合割合でそれぞれ添加した後、同表に示す配合割合のTiを添加した。添加元素の溶け残りがないよう添加後の保持時間にも十分に配慮した後に、これらをAr雰囲気で鋳型に注入して、それぞれ約2kgのインゴットを製造した。 First, 2.5 kg of electrolytic copper was melted in a vacuum melting furnace, and the third element was added at a blending ratio shown in Table 1, and then Ti at a blending ratio shown in the same table was added. After sufficient consideration was given to the retention time after the addition so that there was no undissolved residue of the added elements, these were injected into the mold in an Ar atmosphere to produce about 2 kg of ingots.
上記インゴットに対して950℃で3時間加熱する均質化焼鈍の後、900〜950℃で熱間圧延を行い、板厚15mmの熱延板を得た。面削による脱スケール後、冷間圧延して素条の板厚(2mm)とし、素条での第一次溶体化処理を行った。第一次溶体化処理の条件は850℃で10分間加熱とし、その後、水冷した。次いで、表1に記載の最終冷間圧延における圧下率及び製品板厚の条件に応じて、圧下率を調整して中間の冷間圧延を行った後、急速加熱が可能な焼鈍炉に挿入して最終の溶体化処理を行い、その後、水冷した。このときの加熱条件は材料温度がTiの固溶限が添加量と同じになる温度(Ti濃度3.0質量%で約800℃、Ti濃度2.0質量%で約730℃、Ti濃度4.0質量%で約840℃)を基準として表1に記載の通りとした。次いで、Ar雰囲気中で表1に記載の条件で予備時効処理及び時効処理を連続して行った。ここでは予備時効処理の後に冷却を行なわなかった。酸洗による脱スケール後、表1に記載の条件で最終冷間圧延を行い、最後に表1に記載の各加熱条件で歪取焼鈍を行って発明例及び比較例の試験片とした。試験片によっては予備時効処理、時効処理又は歪取焼鈍を省略した。 After the homogenization annealing which heats at 950 degreeC with respect to the said ingot for 3 hours, hot rolling was performed at 900-950 degreeC, and the hot rolled sheet with a plate thickness of 15 mm was obtained. After descaling by chamfering, cold rolling was performed to obtain a strip thickness (2 mm), and a primary solution treatment was performed on the strip. The conditions for the primary solution treatment were heating at 850 ° C. for 10 minutes, and then water cooling. Next, after adjusting the rolling reduction and performing intermediate cold rolling according to the rolling reduction and product sheet thickness conditions in the final cold rolling described in Table 1, it is inserted into an annealing furnace capable of rapid heating. The final solution treatment was performed, followed by water cooling. The heating conditions at this time were such that the material temperature was such that the solid solubility limit of Ti was the same as the addition amount (Ti concentration: 3.0% by mass, about 800 ° C., Ti concentration: 2.0% by mass, about 730 ° C., Ti concentration: 4 0.0 mass% and about 840 ° C.) as a standard. Next, preliminary aging treatment and aging treatment were continuously performed in the Ar atmosphere under the conditions described in Table 1. Here, no cooling was performed after the preliminary aging treatment. After descaling by pickling, final cold rolling was performed under the conditions described in Table 1, and finally, strain relief annealing was performed under each heating condition described in Table 1 to obtain test pieces of invention examples and comparative examples. Depending on the specimen, preliminary aging treatment, aging treatment or strain relief annealing was omitted.
作製した製品試料について、次の評価を行った。
(イ)0.2%耐力(YS)
JIS13B号試験片を作製し、この試験片に対してJIS−Z2241に従って引張試験機を用いて圧延方向と平行な方向の0.2%耐力を測定した。
(ロ)伸び(El)
0.2%耐力の測定と同一条件で引張試験を行い、破断点における伸び(%)を測定した。
(ハ)平均結晶粒径
各製品試料の平均結晶粒径の測定は、圧延面をFIBにて切断することで、圧延方向に平行な断面を露出した後、断面を電子顕微鏡(Philips社製 XL30 SFEG)を用いて倍率1000倍で観察し、単位面積当たりの結晶粒の数をカウントして、結晶粒の平均の円相当径を求めた。具体的には、100μm×100μmの枠を作成し、この枠の中に存在する結晶粒の数をカウントした。なお、枠を横切っている結晶粒については、すべて1/2個としてカウントした。枠の面積10000μm2をその合計で除したものが結晶粒1個当たりの面積の平均値である。その面積を持つ真円の直径が円相当径であるので、任意の5箇所の観察視野についての円相当径の平均値を求め、これを平均結晶粒径とした。
(ニ)析出粒率
平均結晶粒径と同様の方法で、圧延方向に平行な断面から任意の200個の結晶粒を観察し、粒界反応相が明確に確認できる結晶粒(具体的には粒界の接線に対して直角な方向の最大幅が0.5μm以上に成長した粒界反応相をもつもの)の割合を算出した。
(ホ)最大侵食率
平均結晶粒径と同様の方法で、圧延方向に平行な断面から任意の200個の結晶粒を観察し、粒界反応相が明確に確認できる結晶粒について粒界反応相の占める面積率をそれぞれ算出し、その最大値を最大侵食率とした。結晶粒について粒界反応相の占める面積率の算出は、粒界反応相を含む個々の結晶粒を選択し、画像解析によって、その全体の面積と粒界反応相のみの面積(一つの結晶粒中に複数の粒界反応相が存在する場合はその合計面積)をそれぞれ算出して行った。
The following evaluation was performed about the produced product sample.
(A) 0.2% yield strength (YS)
A JIS No. 13B test piece was prepared, and 0.2% proof stress in a direction parallel to the rolling direction was measured using a tensile tester according to JIS-Z2241.
(B) Elongation (El)
A tensile test was performed under the same conditions as the measurement of 0.2% proof stress, and the elongation (%) at the breaking point was measured.
(C) Average crystal grain size The average crystal grain size of each product sample was measured by cutting the rolled surface with FIB to expose a cross section parallel to the rolling direction, and then using an electron microscope (XL30 manufactured by Philips). SFEG) was observed at a magnification of 1000 times, the number of crystal grains per unit area was counted, and the average equivalent circle diameter of the crystal grains was determined. Specifically, a frame of 100 μm × 100 μm was created, and the number of crystal grains present in this frame was counted. Note that all the crystal grains crossing the frame were counted as ½. The average value of the area per crystal grain is obtained by dividing the frame area of 10,000 μm 2 by the total. Since the diameter of the true circle having the area is the equivalent circle diameter, an average value of equivalent circle diameters for any five observation visual fields was obtained, and this was used as the average crystal grain size.
(D) Precipitation grain ratio In the same manner as the average grain size, any 200 crystal grains can be observed from a cross section parallel to the rolling direction, and the grain boundary reaction phase can be clearly confirmed (specifically, The ratio of those having a grain boundary reaction phase in which the maximum width in the direction perpendicular to the tangent to the grain boundary grew to 0.5 μm or more was calculated.
(E) Maximum erosion rate In the same manner as the average crystal grain size, arbitrary 200 crystal grains are observed from a cross section parallel to the rolling direction, and the grain boundary reaction phase can be confirmed for the grain boundary reaction phase. The area ratio occupied by each was calculated, and the maximum value was taken as the maximum erosion rate. To calculate the area ratio of the grain boundary reaction phase for the crystal grain, select individual crystal grains including the grain boundary reaction phase, and perform image analysis to determine the total area and the area of only the grain boundary reaction phase (one crystal grain In the case where a plurality of grain boundary reaction phases exist therein, the total area) was calculated.
(考察)
表1(表1−1および1−2)に試験結果を示す。発明例1では最終溶体化処理、予備時効、時効、最終冷間圧延の条件がそれぞれ適切であったことから、粒界反応相の発達が抑制されながらも、スピノーダル分解が促進され、0.2%耐力及び延性の高い次元での両立が達成されていることが分かる。
発明例2は予備時効の加熱温度を発明例1よりも低くしたことでスピノーダル分解及び粒界反応相が抑制されたものの、依然として良好な0.2%耐力及び延性を確保できた。
発明例3は予備時効の加熱温度を発明例1よりも高くしたことでスピノーダル分解が更に促進され、粒界反応相も発達したが、依然として良好な0.2%耐力及び延性を確保できた。
発明例4は時効の加熱温度を発明例1よりも低くしたことでスピノーダル分解及び粒界反応相が抑制されたものの、依然として良好な0.2%耐力及び延性を確保できた。
発明例5は時効の加熱温度を発明例1よりも高くしたことでスピノーダル分解が更に促進され、粒界反応相も発達したが、依然として良好な0.2%耐力及び延性を確保できた。
発明例6は最終冷間圧延における圧下率を発明例1よりも小さくしたことでスピノーダル分解及び粒界反応相が抑制されたものの、依然として良好な0.2%耐力及び延性を確保できた。
発明例7は最終冷間圧延における圧下率を発明例1よりも高くしたことでスピノーダル分解が更に促進され、粒界反応相も発達したが、依然として良好な0.2%耐力及び延性を確保できた。
発明例8では発明例1に対して歪取焼鈍を省略したが、依然として良好な0.2%耐力及び延性を確保できた。
発明例9では発明例1に対して歪取焼鈍における加熱温度を高くしたが、依然として良好な0.2%耐力及び延性を確保できた。
参考例10は発明例1に対して、予備時効、時効、歪取焼鈍における加熱温度をそれぞれ高温側にシフトさせた例である。発明例1に比べて0.2%耐力が低下したが、依然として良好な0.2%耐力及び延性を確保できた。
発明例11は発明例1に対してチタン銅中のTi濃度を下限まで低くした例である。スピノーダル分解が抑制され、強度に低下が見られたが、依然として良好な0.2%耐力及び延性を確保できた。
発明例12は発明例1に対してチタン銅中のTi濃度を上限まで高くした例である。スピノーダル分解が更に促進され、粒界反応相も発達したが、依然として良好な0.2%耐力及び延性を確保できた。
発明例13〜18は発明例1に対して第三元素を種々添加した例であるが、依然として良好な0.2%耐力及び延性を確保できた。
比較例1は最終の溶体化処理温度が低すぎたことで未再結晶領域と再結晶領域が混在する混粒化が起きた。また、粒界反応相の観察はできなかった。
比較例2では予備時効処理を行わなかったことから、粒界反応相が過度に発達し、延性が悪かった。
比較例3は、特開2012−207254号公報に記載の発明例1のチタン銅に概ね相当する。予備時効処理を行わず、また、時効処理を高温で行ったことから、粒界反応相が過度に発達し、延性が悪かった。
比較例4は、特開2012−207254号公報に記載の発明例17のチタン銅に概ね相当する。予備時効処理を行わず、時効処理を高温で行い、更には歪取焼鈍も行ったことから、粒界反応相が過度に発達し、強度と延性のバランスが悪かった。
比較例5は、特開2012−207254号公報に記載の比較例6のチタン銅に概ね相当する。予備時効処理を行わず、時効処理を高温で行ったところ、延性は高いが強度が顕著に低い結果となった。
比較例6は、国際公開第2011/065152号に記載の比較例3のチタン銅に概ね相当する。溶体化処理を高温で行っているが、予備時効処理は行っていないため、粒界反応相が過度に発達し、延性が悪かった。
比較例7は、国際公開第2011/065152号に記載の比較例4のチタン銅に概ね相当する。溶体化処理を低温で行い、予備時効処理を省略したことで、溶体化不足によって回復が不十分となり、延性が不足した。
比較例8は予備時効処理を行ったものの加熱温度が低すぎたことから粒界反応相の抑制効果が不十分となり、延性が悪かった。
比較例9は予備時効における加熱温度が高すぎたために、過時効となって強度が低下し、更には粒界反応相が発達し、延性が悪かった。
比較例10は予備時効後、時効処理を行わなかったことから安定相が多く析出した。そのため、発明例1に対して0.2%耐力が低下した。
比較例11は最終溶体化処理→冷間圧延→時効処理を行ったと評価できるケースである。安定相が発達して0.2%耐力が低下した。
比較例12は時効の加熱温度が低すぎたことから、安定相が多く析出し、発明例1に対して0.2%耐力が低下した。
比較例13は時効の加熱温度が高すぎたために、過時効となって、粒界反応相が過剰に発達した。そのため、発明例1に対して0.2%耐力が低下した。
比較例14は第三元素の添加量が多すぎたことで熱間圧延で割れが発生したため、試験片の製造ができなかった。
比較例15はTi濃度が低すぎたことでスピノーダル分解が不十分となり、発明例1に対して強度不足となった。
比較例16はTi濃度が高すぎたことで熱間圧延で割れが発生したため、試験片の製造ができなかった。
(Discussion)
Table 1 (Tables 1-1 and 1-2) shows the test results. In Invention Example 1, since the conditions of final solution treatment, preliminary aging, aging, and final cold rolling were appropriate, spinodal decomposition was promoted while the development of the grain boundary reaction phase was suppressed, and 0.2. It can be seen that the coexistence in the dimension with high% yield strength and ductility is achieved.
Inventive Example 2 was able to ensure good 0.2% proof stress and ductility although spinodal decomposition and grain boundary reaction phase were suppressed by lowering the pre-aging heating temperature than Inventive Example 1.
Inventive Example 3 made the pre-aging heating temperature higher than Inventive Example 1 to further accelerate the spinodal decomposition and develop a grain boundary reaction phase, but still could ensure good 0.2% yield strength and ductility.
Inventive Example 4 was able to ensure good 0.2% proof stress and ductility, although spinodal decomposition and grain boundary reaction phase were suppressed by lowering the aging heating temperature than Inventive Example 1.
In invention example 5, spinodal decomposition was further promoted by raising the aging heating temperature higher than in invention example 1 and a grain boundary reaction phase was developed, but still good 0.2% proof stress and ductility could be secured.
Inventive Example 6 was able to ensure good 0.2% proof stress and ductility, although spinodal decomposition and grain boundary reaction phase were suppressed by making the rolling reduction in the final cold rolling smaller than Inventive Example 1.
Inventive Example 7 further increased spinodal decomposition by increasing the reduction ratio in the final cold rolling as compared with Inventive Example 1, and developed a grain boundary reaction phase, but still could ensure good 0.2% yield strength and ductility. It was.
In invention example 8, although the stress relief annealing was omitted with respect to invention example 1, good 0.2% proof stress and ductility could still be secured.
In Invention Example 9, the heating temperature in strain relief annealing was higher than that in Invention Example 1, but still good 0.2% proof stress and ductility could be secured.
Reference Example 10 is an example in which the heating temperature in preliminary aging, aging, and strain relief annealing is shifted to the high temperature side with respect to Invention Example 1. Although 0.2% proof stress fell compared with invention example 1, favorable 0.2% proof stress and ductility were still securable.
Invention Example 11 is an example in which the Ti concentration in titanium copper was lowered to the lower limit compared to Invention Example 1. Although spinodal decomposition was suppressed and the strength was reduced, good 0.2% proof stress and ductility were still secured.
Invention Example 12 is an example in which the Ti concentration in titanium copper was increased to the upper limit compared to Invention Example 1. Although spinodal decomposition was further promoted and a grain boundary reaction phase was developed, good 0.2% proof stress and ductility could still be secured.
Inventive Examples 13 to 18 are examples in which the third element was variously added to Inventive Example 1, but still good 0.2% proof stress and ductility could be secured.
In Comparative Example 1, the final solution treatment temperature was too low, resulting in mixed grains in which the non-recrystallized region and the recrystallized region were mixed. Moreover, the grain boundary reaction phase could not be observed.
In Comparative Example 2, since no pre-aging treatment was performed, the grain boundary reaction phase developed excessively and the ductility was poor.
Comparative Example 3 roughly corresponds to the titanium copper of Invention Example 1 described in JP2012-207254A. Since the preliminary aging treatment was not performed and the aging treatment was performed at a high temperature, the grain boundary reaction phase developed excessively and the ductility was poor.
Comparative Example 4 roughly corresponds to titanium copper of Invention Example 17 described in JP2012-207254A. The preliminary aging treatment was not carried out, the aging treatment was carried out at a high temperature, and further the strain relief annealing was carried out, so that the grain boundary reaction phase developed excessively and the balance between strength and ductility was poor.
Comparative Example 5 roughly corresponds to titanium copper of Comparative Example 6 described in JP2012-207254A. When the preliminary aging treatment was not performed and the aging treatment was performed at a high temperature, the ductility was high but the strength was remarkably low.
Comparative Example 6 roughly corresponds to titanium copper of Comparative Example 3 described in International Publication No. 2011/066512. Although the solution treatment was performed at a high temperature, but the pre-aging treatment was not performed, the grain boundary reaction phase developed excessively and the ductility was poor.
Comparative Example 7 roughly corresponds to the titanium-copper of Comparative Example 4 described in International Publication No. 2011/066512. By performing the solution treatment at a low temperature and omitting the preliminary aging treatment, the recovery was insufficient due to the lack of solution treatment, and the ductility was insufficient.
In Comparative Example 8, although the preliminary aging treatment was performed, the heating temperature was too low, so the effect of suppressing the grain boundary reaction phase was insufficient, and the ductility was poor.
In Comparative Example 9, since the heating temperature in the preliminary aging was too high, the strength was lowered due to overaging, and further, a grain boundary reaction phase was developed and the ductility was poor.
In Comparative Example 10, a large amount of stable phase precipitated after preliminary aging because no aging treatment was performed. Therefore, the 0.2% proof stress was reduced with respect to Invention Example 1.
Comparative Example 11 is a case where it can be evaluated that the final solution treatment → cold rolling → aging treatment was performed. The stable phase developed and the 0.2% yield strength decreased.
In Comparative Example 12, since the aging heating temperature was too low, a large number of stable phases were precipitated, and the 0.2% proof stress was lowered with respect to Invention Example 1.
In Comparative Example 13, since the aging heating temperature was too high, it was overaged and the grain boundary reaction phase was excessively developed. Therefore, the 0.2% proof stress was reduced with respect to Invention Example 1.
In Comparative Example 14, since the amount of the third element added was too large, cracking occurred during hot rolling, so that a test piece could not be produced.
In Comparative Example 15, the spinodal decomposition was insufficient because the Ti concentration was too low, and the strength was insufficient with respect to Invention Example 1.
In Comparative Example 16, since the Ti concentration was too high, cracking occurred during hot rolling, and thus the test piece could not be produced.
Claims (4)
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