JP6205441B2 - アーク蒸発装置 - Google Patents
アーク蒸発装置 Download PDFInfo
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- JP6205441B2 JP6205441B2 JP2016012305A JP2016012305A JP6205441B2 JP 6205441 B2 JP6205441 B2 JP 6205441B2 JP 2016012305 A JP2016012305 A JP 2016012305A JP 2016012305 A JP2016012305 A JP 2016012305A JP 6205441 B2 JP6205441 B2 JP 6205441B2
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- 238000010891 electric arc Methods 0.000 claims description 76
- 230000008020 evaporation Effects 0.000 claims description 54
- 238000001704 evaporation Methods 0.000 claims description 54
- 238000001514 detection method Methods 0.000 claims description 38
- 238000005259 measurement Methods 0.000 claims description 20
- 238000007599 discharging Methods 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 description 12
- 230000004048 modification Effects 0.000 description 10
- 238000012986 modification Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000002159 abnormal effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910001172 neodymium magnet Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F7/00—Magnets
- H01F7/02—Permanent magnets [PM]
- H01F7/0273—Magnetic circuits with PM for magnetic field generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
- H01J37/32064—Circuits specially adapted for controlling the arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32614—Consumable cathodes for arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Physical Vapour Deposition (AREA)
Description
上記実施形態では、検出部9は、点火ロッド6の電位を測定する電位測定部10と、ターゲット接触判断部12とを有し、ターゲット接触判断部12が点火ロッド6の電位が所定の電位以下であるか否かによって、点火ロッド6がターゲット3の側面3bに接触したか否かを判断しているが、本発明はこれに限定されるものではない。本発明では、接触部(点火ロッド6)の移動中において、当該接触部がターゲット3の側面3bに接触したか否かを検出することが可能な構成であれば、種々の形態の検出部を採用することが可能である。
2 チャンバ
2a 主壁
3 ターゲット
3a 先端面
3b 側面
4 ターゲット送り部
5 点火機構
6 点火ロッド(接触部)
7 ロータリアクチュエータ(接触部駆動部)
8 アーク電源
9 検出部
10 電位測定部
12 ターゲット接触判断部
13 制御部
16 回転角度変換部(角度測定部)
17 出力電流測定部
A 軸方向
Q 送り方向
R 旋回方向
T 領域
Claims (5)
- 軸方向の一方の端面である先端面と、当該先端面の周縁に連続して前記軸方向に延びる側面とを有し、アーク放電によって前記先端面から溶解して蒸発する棒状のターゲットと、
前記ターゲットの前記先端面との間で放電するための電極と、
前記ターゲットと前記電極との間に電圧を印加することによって前記先端面と前記電極との間でアーク放電を発生させるアーク電源と、
前記ターゲットを前記先端面が前進する方向で前記軸方向に沿って移動させるターゲット送り部と、
前記ターゲットの送り方向における所定の位置において、前記ターゲットの前記側面に対して前記送り方向と交差する交差方向から接触可能な形状を有する接触部と、
前記接触部を前記側面から前記交差方向に離れた退避位置から前記交差方向に沿って前記ターゲットが送り込まれる領域へ進入するように移動させる接触部駆動部と、
前記接触部の移動中において、前記接触部が前記ターゲットの前記側面に接触したか、前記接触部が前記ターゲットの前記側面に接触することなく前記交差方向に沿って前記領域に進入したかを検出する検出部と、
を備えており、
前記接触部は、導電性を有する棒状の部材であって、
前記接触部は、前記ターゲットとの間に電圧が印加された状態で当該ターゲットの前記側面に接触することによって、前記先端面と前記電極との間のアーク放電を開始させ、
前記接触部駆動部は、前記ターゲットの前記側面から前記交差方向に離間して配置され、前記軸方向と平行に延びる中心軸回りに回転する駆動軸を有し、当該駆動軸から前記軸方向と直交する方向に延びる前記接触部を旋回することにより、当該接触部を前記退避位置から前記交差方向に沿って前記領域へ進入するように回転移動させる構成を有するアーク蒸発装置。 - 前記検出部は、
前記接触部の電位を測定する電位測定部と、
前記接触部の移動中において、前記電位測定部によって測定された前記接触部の電位によって、前記接触部が前記ターゲットの前記側面に接触したか、前記接触部が前記ターゲットの前記側面に接触することなく前記交差方向に沿って前記領域に進入したかを判断する判断部と、
を有している、
請求項1に記載のアーク蒸発装置。 - 前記検出部は、
前記接触部が前記退避位置から前記領域へ移動中において、前記アーク電源の出力の変化に基づいて、前記接触部が前記ターゲットの前記側面に接触したか、前記接触部が前記ターゲットの前記側面に接触することなく前記交差方向に沿って前記領域に進入したかを判断する判断部と、
を有する、
請求項1に記載のアーク蒸発装置。 - 前記接触部駆動部は、前記接触部が前記側面に接触したときに当該接触部が静止する程度の駆動力で前記接触部を回転移動させ、
前記検出部は、
前記接触部の旋回角度を検出する角度測定部と、
前記角度測定部によって測定された前記接触部の旋回角度が所定の角度以上であるか否かによって、前記接触部が前記ターゲットの前記側面に接触したか、前記接触部が前記ターゲットの前記側面に接触することなく前記交差方向に沿って前記領域に進入したかを判断する判断部と、
を有する
請求項1に記載のアーク蒸発装置。 - 前記検出部が前記接触部の前記退避位置から前記領域への移動中において前記接触部が前記ターゲットの前記側面に接触しなかったことを検出したときに、前記ターゲットを前記先端面が前進する方向で前記軸方向に沿って移動させるように前記ターゲット送り部を制御する制御部をさらに備えている
請求項1乃至4の何れか1項に記載のアーク蒸発装置。
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016012305A JP6205441B2 (ja) | 2016-01-26 | 2016-01-26 | アーク蒸発装置 |
| BR112018015304-4A BR112018015304B1 (pt) | 2016-01-26 | 2017-01-06 | Dispositivo de evaporação por arco |
| US16/070,732 US10844473B2 (en) | 2016-01-26 | 2017-01-06 | Arc evaporation device |
| MX2018009020A MX2018009020A (es) | 2016-01-26 | 2017-01-06 | Dispositivo de evaporacion de arco. |
| PCT/JP2017/000295 WO2017130662A1 (ja) | 2016-01-26 | 2017-01-06 | アーク蒸発装置 |
| CN201780007847.4A CN108495948B (zh) | 2016-01-26 | 2017-01-06 | 电弧蒸发装置 |
| EP17743896.7A EP3388547A4 (en) | 2016-01-26 | 2017-01-06 | ARC EVAPORATION DEVICE |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016012305A JP6205441B2 (ja) | 2016-01-26 | 2016-01-26 | アーク蒸発装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2017145428A JP2017145428A (ja) | 2017-08-24 |
| JP6205441B2 true JP6205441B2 (ja) | 2017-09-27 |
Family
ID=59398250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016012305A Active JP6205441B2 (ja) | 2016-01-26 | 2016-01-26 | アーク蒸発装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10844473B2 (ja) |
| EP (1) | EP3388547A4 (ja) |
| JP (1) | JP6205441B2 (ja) |
| CN (1) | CN108495948B (ja) |
| BR (1) | BR112018015304B1 (ja) |
| MX (1) | MX2018009020A (ja) |
| WO (1) | WO2017130662A1 (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG11202106614UA (en) | 2018-12-20 | 2021-07-29 | Oerlikon Surface Solutions Ag Pfaeffikon | Cathodic arc ignition device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4827235B1 (ja) | 1970-10-24 | 1973-08-20 | ||
| JP2644146B2 (ja) * | 1992-08-28 | 1997-08-25 | 株式会社神戸製鋼所 | アーク放電診断方法及び装置 |
| JP4827235B2 (ja) * | 2005-09-07 | 2011-11-30 | 株式会社リケン | アーク式蒸発源及び成膜体の製造方法 |
| JP5965058B2 (ja) * | 2013-05-23 | 2016-08-03 | キヤノンアネルバ株式会社 | 成膜装置 |
| SG11201606347XA (en) * | 2014-03-18 | 2016-09-29 | Canon Anelva Corp | Deposition apparatus |
-
2016
- 2016-01-26 JP JP2016012305A patent/JP6205441B2/ja active Active
-
2017
- 2017-01-06 WO PCT/JP2017/000295 patent/WO2017130662A1/ja not_active Ceased
- 2017-01-06 BR BR112018015304-4A patent/BR112018015304B1/pt active IP Right Grant
- 2017-01-06 CN CN201780007847.4A patent/CN108495948B/zh active Active
- 2017-01-06 EP EP17743896.7A patent/EP3388547A4/en not_active Withdrawn
- 2017-01-06 MX MX2018009020A patent/MX2018009020A/es unknown
- 2017-01-06 US US16/070,732 patent/US10844473B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US10844473B2 (en) | 2020-11-24 |
| CN108495948A (zh) | 2018-09-04 |
| MX2018009020A (es) | 2019-03-28 |
| BR112018015304A2 (ja) | 2018-12-18 |
| JP2017145428A (ja) | 2017-08-24 |
| EP3388547A1 (en) | 2018-10-17 |
| US20190024228A1 (en) | 2019-01-24 |
| CN108495948B (zh) | 2020-09-29 |
| BR112018015304B1 (pt) | 2023-04-18 |
| EP3388547A4 (en) | 2019-08-14 |
| WO2017130662A1 (ja) | 2017-08-03 |
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