JP6209786B2 - Exhaust gas treatment system - Google Patents

Description

  The present invention relates to an exhaust gas treatment system.

  In general, in a CVD apparatus used for film formation of electronic devices such as semiconductors, liquid crystals, solar cells and LEDs, as a raw material gas, combustible gas, pyrophoric gas, toxic gas, corrosive gas and global warming gas Gases that adversely affect organisms and the environment are used. These source gases are not all consumed in the CVD apparatus, but most of them are exhausted from the CVD apparatus as exhaust gas.

  Exhaust gas containing gases that adversely affect living organisms and the environment, such as combustible gas, pyrophoric gas, toxic gas, corrosive gas, and global warming gas, cannot be released into the atmosphere as it is untreated. Generally, these gases are detoxified by various detoxifying devices that can be detoxified, and then released into the atmosphere.

  By the way, Patent Document 1 describes a combustion type detoxifying device that detoxifies by burning a gas that adversely affects living organisms and the environment as an example of a detoxifying device.

  Patent Document 2 discloses, as an example of another abatement apparatus, a gas that adversely affects organisms and the environment by using a detoxifying agent that has a physical or chemical adsorption reaction with a gas that adversely affects organisms and the environment. A dry abatement device that adsorbs and renders it harmless is described.

  Furthermore, in recent years, an exhaust gas treatment system has been constructed in which a plurality of types or a plurality of the above-described abatement apparatuses are combined. In these exhaust gas treatment systems, a combustion-type abatement device (see Patent Document 1) or the like is provided as a main abatement device that performs detoxification at normal times, and is excluded in an emergency such as when the main abatement device stops abnormally. In general, a dry-type abatement device (see Patent Document 2) or the like is provided as an auxiliary abatement device that performs harm.

  FIG. 3 shows a configuration of a conventional general exhaust gas treatment system 200. As shown in FIG. 3, the conventional exhaust gas processing system 200 includes an exhaust path L101 through which exhaust gas exhausted from the low pressure CVD apparatus 101 flows, a switching valve 104 provided at the secondary side end of the exhaust path L101, The main exhaust path L102 and the sub exhaust path L103 connected to the secondary side of the switching valve 104, the combustion type abatement device 102 provided at the secondary side end of the main exhaust path L102, and the secondary exhaust path L103, respectively. A dry-type abatement device 103 provided at the next side end and exhaust fans 105 and 106 are respectively provided at the subsequent stage of each abatement device.

  Here, the switching valve 104 is connected to the combustion-type abatement apparatus 102 by a signal line c101. In normal times, exhaust gas is supplied to the main exhaust path L102, and in an emergency, exhaust gas is automatically switched to the sub exhaust path L103 and supplied. Note that an emergency is when the combustion-type abatement device 102 has failed and the combustion-type abatement device 102 has stopped abnormally.

  The combustion type detoxifying device 102 detoxifies exhaust gas at normal times. Further, an exhaust fan 105 is provided at the subsequent stage of the combustion type abatement apparatus 102. On the other hand, the dry-type abatement apparatus 103 removes exhaust gas in an emergency. Further, an exhaust fan 106 is provided at the subsequent stage of the dry-type abatement apparatus 103.

  By the way, generally, the pressure of the exhaust gas discharged from the low pressure CVD apparatus 101 is lower than the atmospheric pressure, and the exhaust gas is removed by the combustion type exhaust by the exhaust fan 105 provided at the rear stage of the combustion type detoxifying apparatus 102 in the normal time. Detoxification is performed while being drawn into the harm apparatus 102. On the other hand, the auxiliary exhaust path L103 is normally closed, and the exhaust fan 106 is activated in an emergency to ensure a negative pressure and introduce exhaust gas discharged from the low pressure CVD 101.

Next, a detoxification method for the conventional exhaust gas treatment system 200 will be described.
In the normal state, the switching valve 104 is opened to the main exhaust path L102 side, and the combustion-type abatement device 102 and the exhaust fan 105 are operated to remove the exhaust gas. The exhaust fan 105 operates with a specified exhaust capacity.

  On the other hand, the auxiliary exhaust path L103 side is in a standby state where it can be removed at any time. Specifically, the dry-type abatement apparatus 103 is filled with a new abatement agent, and the exhaust fan 106 is stopped.

  Here, when the combustion-type abatement apparatus 102 stops abnormally and an emergency occurs, the switching valve 104 receives a signal from the combustion-type abatement apparatus 102 and automatically switches to the sub exhaust path L103 side. The exhaust fan 106 is activated. At substantially the same time, the exhaust fan 105 is stopped.

  On the other hand, on the side of the sub-exhaust path L103 where the exhaust gas has flowed, the exhaust gas is detoxified by introducing the exhaust gas into the dry abatement apparatus 103. Under this situation, the low pressure CVD apparatus 101 is safely stopped, and the supply of the source gas is also stopped.

JP 2012-207888 A JP-A-6-047269

  By the way, the exhaust gas of a low pressure CVD apparatus or the like may contain a pyrophoric gas that reacts with oxygen gas components in the air, such as monosilane or disilane, which are raw material gases. In many cases, hydrogen gas, which is highly flammable, is included as a base gas for diluting the source gas.

  Here, in the conventional exhaust gas processing system 200, the sub-exhaust path L103 side is in a state where the path is closed and air at atmospheric pressure remains. Therefore, when the supply of the exhaust gas is switched from the main exhaust path L102 to the sub exhaust path L103, the oxygen gas that is an air component remaining in the sub exhaust path L103 and the exhaust gas flowing from the exhaust path L101 There was a risk that the pyrophoric gas such as monosilane or disilane contained therein or a high concentration of hydrogen gas would mix and react.

  This invention is made | formed in view of the said situation, Comprising: It aims at providing the exhaust-gas processing system which can reduce the oxygen gas density | concentration which remains in a sub exhaust path.

The present invention has the following configuration.
The invention according to claim 1 is an exhaust path through which exhaust gas discharged from the facility and having a component capable of reacting with oxygen gas flows,
Path switching means provided in the exhaust path, for switching between a main exhaust path through which the exhaust gas normally flows, and a sub exhaust path through which the exhaust gas flows when the main abatement apparatus abnormally stops;
A main abatement device provided in the main exhaust path;
A sub-abatement device provided in the sub-exhaust path;
An inert gas supply path connected to the auxiliary exhaust path near the path switching means and supplying an inert gas constantly into the auxiliary exhaust path;
An exhaust gas processing system comprising: concentration measuring means for measuring a gas component concentration in the vicinity of the path switching means in the sub exhaust path .

The invention according to claim 2 is characterized in that the inert gas supply path includes flow rate control means for automatically controlling the supply amount of the inert gas based on the measured value of the gas component concentration. The exhaust gas treatment system according to claim 1 .

The invention according to claim 3 is the exhaust gas treatment system according to claim 1 or 2 , wherein the inert gas is nitrogen gas or a rare gas.

The invention according to claim 4 is the exhaust gas processing system according to any one of claims 1 to 3 , wherein the facility is a low-pressure CVD apparatus.

The invention according to claim 5 is the exhaust according to any one of claims 1 to 4 , wherein the main abatement device is a combustion abatement device or a heater heating abatement device. It is a gas processing system.

The invention according to claim 6 is the exhaust gas treatment system according to any one of claims 1 to 5 , wherein the auxiliary abatement device is a dry abatement device or a wet abatement device. It is.

  According to the exhaust gas processing system of the present invention, the path switching means for switching the exhaust path, the main exhaust path, and the sub exhaust path through which the exhaust gas flows when the main abatement apparatus stops abnormally, and the sub exhaust path An inert gas supply path that is connected near the switching means and constantly supplies an inert gas into the auxiliary exhaust path, and can be continuously purged with the inert gas in the auxiliary exhaust path. The air remaining inside can be reduced. Therefore, it is possible to prevent the reaction between the component capable of reacting with the oxygen gas in the exhaust gas remaining in the exhaust path and the oxygen gas remaining in the sub exhaust path.

1 is a configuration diagram of an exhaust gas treatment system according to a first embodiment to which the present invention is applied. It is a block diagram of the exhaust-gas processing system which is 2nd Embodiment to which this invention is applied. It is a block diagram of the conventional exhaust gas processing system.

Hereinafter, an exhaust gas treatment system 100 according to a first embodiment to which the present invention is applied will be described with reference to the drawings.
FIG. 1 shows a configuration of an exhaust gas processing system 100 according to the first embodiment of the present invention. As shown in FIG. 1, an exhaust gas treatment system 100 includes an exhaust path L1 through which exhaust gas discharged from a low pressure CVD apparatus (equipment) 1 flows, and a switching valve (path) provided at the secondary side end of the exhaust path L1. Switching means) 4, a main exhaust passage L2 and a sub exhaust passage L3 connected to the secondary side of the switching valve 4, respectively, and a combustion-type abatement device (main removal) provided at the secondary side end of the main exhaust passage L2. Harm device) 2, a dry-type abatement device (sub-abatement device) 3 provided at the secondary side end of the sub-exhaust passage L3, and an oxygen concentration meter (concentration) provided near the switching valve 4 of the sub-exhaust passage L3. Measuring means) 7 and exhaust fans 5 and 6 and a high-pressure gas container 8 downstream of each detoxifying device, respectively, and connected to the high-pressure gas container 8 on the upstream side and the switching valve 4 of the auxiliary exhaust path L3 on the downstream side. The inert gas supply path L4 and the pressure reducing valve provided in the inert gas supply path L4 And provided with a mass flow controller (flow rate control means) 10, a is schematically configured.

  Here, a set including the exhaust path L1, the switching valve 4, the main exhaust path L2, the combustion-type abatement apparatus 2, and the exhaust fan 5 is defined as an exhaust gas processing line A. Further, a set including the high pressure gas container 8, the inert gas supply path L4, the pressure reducing valve 9, and the mass flow controller 10 is defined as an inert gas supply line B. Therefore, the first embodiment can be said to be a form in which the exhaust gas treatment line has one line and the inert gas supply line has one line.

  The exhaust path L1 is between the reduced pressure CVD apparatus 1 and the switching valve 4, the main exhaust path L2 is between the switching valve 4 and the combustion-type abatement apparatus 2, and the sub exhaust path L3 is the switching valve 4 and the dry-type abatement apparatus. 3 is a supply path for sending exhaust gas of the low pressure CVD apparatus 1 to each abatement apparatus. These materials are not particularly limited, but are desirably selected as appropriate in accordance with the properties of the components contained in the exhaust gas. Generally, metal piping is used.

  The switching valve 4 is connected to the combustion-type abatement apparatus 2 by a signal line c1. The switching valve 4 is normally defined on the side where the exhaust gas is supplied from the exhaust path L1 to the main exhaust path L2. On the other hand, in an emergency, the switching valve 4 receives a signal from the combustion-type abatement apparatus 2 and automatically switches the exhaust gas supply path from the main exhaust path L2 to the sub exhaust path L3.

  The combustion-type abatement apparatus 2 is an abatement means that removes exhaust gas at normal times. An exhaust fan 5 is provided at the subsequent stage of the combustion type abatement apparatus 2.

  The dry-type abatement apparatus 3 is an abatement means that removes exhaust gas in an emergency. An exhaust fan 6 is provided at the subsequent stage of the dry-type abatement apparatus 3.

  By the way, generally, the pressure of the exhaust gas discharged from the low-pressure CVD apparatus 1 is lower than the atmospheric pressure, and the exhaust gas is removed by the combustion-type abatement by the exhaust fan 5 provided at the subsequent stage of the combustion-type abatement apparatus 2 at the normal time. Detoxification is performed while being drawn into the apparatus 2.

  On the other hand, the auxiliary exhaust path L3 side is in a standby state that can be removed at any time. Specifically, the dry abatement apparatus 3 is filled with a new abatement agent, and the exhaust fan 6 is stopped.

  The oxygen concentration meter 7 is provided near the switching valve 4 in the sub exhaust path L3 in order to measure the oxygen gas concentration in the sub exhaust path L3. The oxygen concentration meter 7 is communicably connected to the mass flow controller 10 via a signal line c2, and can transmit the measured value of the oxygen gas concentration to the mass flow controller 10 as an external signal.

  The high-pressure gas container 8 is a gas supply source filled with an inert gas, but is not limited as long as it is a gas supply source capable of preparing an inert gas. Such a gas supply source is not particularly limited to the high-pressure gas container 8, and for example, a gas production apparatus, a large gas storage tank, or the like can be used.

  The type of inert gas supplied from the high-pressure gas container 8 must be a component that does not react with the component contained in the exhaust gas and does not affect the abatement performance of the sub-abatement device. Specific examples of such an inert gas include nitrogen gas, and rare gases such as helium gas and argon gas.

The pressure reducing valve 9 is not particularly limited to a pressure reducing valve as long as the supply pressure of the inert gas can be adjusted. For example, a control valve or the like can be used.
In the exhaust gas processing system 100 of the present embodiment, an example in which one pressure reducing valve 9 is provided in the inert gas supply path L4 has been described. However, the present invention is not particularly limited to this, and an inert gas supply is provided. A plurality of pressure reducing valves 9 may be provided in the path L4 so that pressure can be reduced in multiple stages.

  The mass flow controller 10 has a function of controlling the inert gas supplied into the sub exhaust path L3 to the minimum supply amount based on the signal of the oxygen gas concentration in the sub exhaust path L3. Specifically, when the measured value of the oxygen gas concentration in the auxiliary exhaust passage L3 rises, the amount of inert gas supplied into the auxiliary exhaust passage L3 is automatically increased, and the oxygen gas concentration is reduced from a specified value. Keep it low. On the other hand, when the measured value of the oxygen gas concentration falls, control is performed so as to automatically reduce the amount of inert gas.

  When the supply amount of the inert gas into the sub exhaust path L3 is large, it is easy to keep the oxygen gas concentration in the sub exhaust path L3 low, but the load on the exhaust fan 6 increases accordingly. Therefore, it is desirable that the supply amount of the inert gas be the minimum necessary. Of course, suppressing the supply amount of the inert gas is desirable in terms of running cost.

Next, a detoxification method using the exhaust gas treatment system 100 described above (that is, an operation method of the exhaust gas treatment system 100) will be described.
First, at the time of normal operation, the switching valve 4 is opened to the main exhaust path L2 side, and the combustion-type abatement device 2 and the exhaust fan 5 are operated to remove the exhaust gas. Further, the exhaust fan 5 operates with a specified exhaust capacity.

  On the other hand, the auxiliary exhaust path L3 side is in a standby state that can be removed at any time. Specifically, the dry abatement apparatus 3 is filled with a new abatement agent, and the exhaust fan 6 is stopped.

  Here, in the exhaust gas treatment system 100 of the present embodiment, it is preferable that the pressure in the main exhaust path L2 be in the range of −5 to −1 kPaG. If the pressure in the main exhaust path L2 is less than −5 kPaG, the load on the exhaust fan 5 is increased, and the exhaust fan is increased in size. On the other hand, when the pressure in the main exhaust path L2 exceeds −1 kPaG, the ability to exhaust the exhaust gas is insufficient in the low pressure CVD, which is not realistic as the pressure of the combustion type abatement apparatus. On the other hand, if the pressure in the main exhaust path L2 is within the above range, the load of the exhaust fan 5 is appropriate, and the exhaust gas from the low pressure CVD can be efficiently abated by the combustion abatement apparatus 2. Therefore, it is preferable.

  Moreover, it is preferable that the pressure in the sub exhaust path 3 shall be -5-0 kPaG. If the pressure in the sub exhaust path L3 is less than −5 kPaG, the load on the exhaust fan 6 becomes large, and the exhaust fan becomes large, which is not preferable because of high cost equipment. On the other hand, when the pressure in the sub exhaust path L3 exceeds 0 kPaG, the exhaust gas cannot be discharged by the low pressure CVD, and there is a risk that the exhaust gas flows backward to the low pressure CVD. On the other hand, when the pressure in the sub exhaust path L3 is within the above range, the load of the exhaust fan 6 is appropriate when the combustion type abatement apparatus 2 is in an emergency stop, and the exhaust from the reduced pressure CVD is efficiently performed. This is preferable because the gas can be removed by the dry removal apparatus 3.

  The oxygen concentration meter 7 continuously measures the value of the oxygen gas concentration in the auxiliary exhaust passage L3. Further, the inert gas is supplied from the high-pressure gas container 8 to the sub exhaust path L3 after the supply pressure is adjusted by the pressure reducing valve 9 and the supply amount is adjusted by the mass flow controller 10. Furthermore, the mass flow controller 10 receives the measured value of the oxygen gas concentration from the oximeter 7 as an external signal, and automatically supplies the inert gas while preventing the oxygen gas concentration in the auxiliary exhaust path L3 from increasing. The amount is controlled to the minimum necessary.

  When the combustion-type abatement apparatus 2 is abnormally stopped and an emergency occurs, the switching valve 4 receives a signal from the combustion-type abatement apparatus 2 and automatically switches to the auxiliary exhaust path L3 side. At the same time, the exhaust fan 6 is started. At substantially the same time, the exhaust fan 5 is stopped.

  On the other hand, on the side of the sub exhaust path L3 into which the exhaust gas flows, the exhaust fan 6 secures a negative pressure, and the exhaust gas is introduced into the dry-type abatement apparatus 3 to remove the exhaust gas. At this time, since the oxygen gas concentration is suppressed in the auxiliary exhaust path L3 by the inert gas, the reaction between the gas component contained in the exhaust gas and oxygen can be prevented. During an emergency, the inert gas continues to be supplied into the auxiliary exhaust path L3 for safety.

Thereafter, as in the case of the first embodiment, the exhaust gas is detoxified by introducing the exhaust gas into the dry detoxification device 3 which is a sub-detoxification device. Under this condition, the low pressure CVD apparatus 1 is safely stopped, and the supply of the source gas is also stopped.
The detoxification by the dry detoxification apparatus 3 which is a sub-detoxification apparatus is stabilized, and the low pressure CVD apparatus 1 is stopped before the dry detoxification apparatus 3 reaches the end of its life. Thereafter, the supply of the exhaust fan 6 and the inert gas is stopped.

  As described above, according to the exhaust gas treatment system 100 of the present embodiment, the oxygen gas concentration in the sub exhaust path L3 is reduced by supplying the necessary minimum amount of inert gas to the sub exhaust path L3 during normal operation. In addition, the amount of inert gas can be suppressed, and the load on the exhaust fan 6 can be reduced. As a result, even when the exhaust gas flows into the sub exhaust path L3 in an emergency, the oxygen gas concentration in the sub exhaust path L3 is reduced, so that the gas components contained in the exhaust gas Reaction can be prevented.

Next, an exhaust gas processing system 110 according to a second embodiment to which the present invention is applied will be described with reference to the drawings.
FIG. 2 is a system diagram showing a configuration of an exhaust gas treatment system 110 according to a second embodiment to which the present invention is applied. As shown in FIG. 2, the exhaust gas treatment system 110 of this embodiment includes exhaust paths L1 and L11, switching valves (path switching means) 4 and 14, main exhaust paths L2 and L12, and a combustion-type abatement device. (Main abatement devices) 2 and 12, exhaust gas treatment lines A and A 'provided with exhaust fans 5 and 15, respectively, high pressure gas containers 8 and 18, and high pressure gas containers 8 and 18 And inert gas supply paths L4, L14 connected to the switching valves 4, 14 side of the auxiliary exhaust path L3, pressure reducing valves 9, 19, and mass flow controllers (flow rate control means) 10, 20, respectively. Connected to the two inert gas supply lines B and B ′, the dry-type abatement device (sub-abatement device) 3, the exhaust fan 6 at the rear stage of the dry-type abatement device 3, and the switching valves 4 and 14. And integrated into the upstream of the entrance of the dry-type abatement device 3 And a sub exhaust path L3, to the switching valve 4, 14 side of the sub exhaust path L3, is schematically configured with respective oximeters and (concentration measurement means) 7, 17, and. It can be said that the exhaust gas processing system 110 of the present embodiment includes two exhaust gas processing lines, two inert gas supply lines, and a shared sub exhaust path L3.

  The switching valve 4 is connected to the combustion-type abatement device 2 via a signal line c1, and the switching valve 14 is connected to the combustion-type abatement device 12 via a signal line c11. When all the exhaust gas treatment lines are in normal operation, the exhaust gas is supplied to the main exhaust paths L2 and L12. On the other hand, when one of the exhaust gas processing lines becomes emergency, only the switching valve of the exhaust gas processing line that has become emergency automatically switches to the sub exhaust path L3, and the exhaust gas is sub exhaust. It is introduced into the route L3. On the other hand, in the exhaust gas processing line in which the state during normal operation continues, the exhaust gas is continuously introduced into the main exhaust path.

  The high-pressure gas containers 8 and 18 are gas supply sources filled with an inert gas. In the present embodiment, an example in which two are provided is described. However, the present invention is not limited to this example, and a configuration in which one inert gas supply source that is shared may be provided.

  Note that the mass flow controllers 10 and 20 have the same functions as those in the first embodiment, and thus description thereof is omitted.

  Next, a detoxification method using the exhaust gas treatment system 110 described above (that is, an operation method of the exhaust gas treatment system 110) will be described.

  When one of the combustion-type abatement devices 2 and 12 is abnormally stopped and an emergency occurs, the switching valves 4 and 14 of the corresponding exhaust gas treatment lines A and A ′ are stopped. 12 is received and automatically switched to the auxiliary exhaust path L3 side and the exhaust fan 6 is activated. At substantially the same time, the corresponding exhaust fans 5 and 15 in the exhaust gas processing line that has become emergency are stopped.

  On the other hand, on the side of the sub exhaust path L3 into which the exhaust gas flows, the exhaust fan 6 is activated to ensure a negative pressure, and the exhaust gas is removed by introducing the exhaust gas into the dry removal apparatus 3. At this time, since the oxygen gas concentration is suppressed in the auxiliary exhaust path L3 by the inert gas, the reaction between the gas component contained in the exhaust gas and oxygen can be prevented. Note that while one of the exhaust gas processing lines A and A 'is in an emergency, the inert gas continues to be supplied into the sub exhaust path L3 for safety.

  Thereafter, as in the case of the first embodiment, the exhaust gas is detoxified by introducing the exhaust gas into the dry detoxification device 3 which is a sub-detoxification device. Under this situation, the low pressure CVD apparatus 1 is safely stopped and the supply of the source gas is also stopped.

  As described above, according to the exhaust gas processing system 110 of the second embodiment, even if the exhaust gas processing system has a plurality of (specifically, two) exhaust gas processing lines A and A ′, the normal operation is performed. Oxygen gas concentration in the sub exhaust path L3 can be reduced by supplying the minimum necessary inert gas to the sub exhaust path L3 from the vicinity of the switching valves 4 and 14 of the sub exhaust path L3. As a result, the load on the exhaust fan 6 can be kept low.

  The technical scope of the present invention is not limited to the first and second embodiments, and various modifications can be made without departing from the spirit of the present invention. For example, in the first and second embodiments described above, the case where there are one and two exhaust gas processing lines has been described. However, the exhaust gas processing system has three or more exhaust gas processing lines. May be.

1 ... Low pressure CVD equipment (equipment)
2 ... Combustion type abatement system (main abatement system)
3 ・ ・ ・ Dry-type abatement device
4, 14 ... Switching valve (route switching means)
5, 6 ... Exhaust fan 7 ... Oxygen concentration meter (concentration measuring means)
8 ... High pressure gas container 9 ... Pressure reducing valve 10 ... Mass flow controller (flow rate adjusting means)
DESCRIPTION OF SYMBOLS 100 ... Exhaust gas processing system A, A '... Exhaust gas processing line B ... Inert gas supply line c1, c2 ... Signal wiring L1 ... Exhaust path L2 ... Main exhaust path L3 ... Sub exhaust path L4 ... Inert gas supply path

Claims (6)

An exhaust path through which exhaust gas exhausted from the facility and having a component capable of reacting with oxygen gas flows;
Path switching means provided in the exhaust path, for switching between a main exhaust path through which the exhaust gas normally flows, and a sub exhaust path through which the exhaust gas flows when the main abatement apparatus abnormally stops;
A main abatement device provided in the main exhaust path;
A sub-abatement device provided in the sub-exhaust path;
An inert gas supply path connected to the auxiliary exhaust path near the path switching means and supplying an inert gas constantly into the auxiliary exhaust path;
An exhaust gas processing system comprising: concentration measuring means for measuring a gas component concentration near the path switching means in the sub exhaust path . 2. The exhaust gas processing according to claim 1 , wherein the inert gas supply path includes a flow rate control unit that automatically controls a supply amount of the inert gas based on a measured value of the gas component concentration. system. The exhaust gas treatment system according to claim 1 or 2, wherein the inert gas is nitrogen gas or a rare gas. The exhaust gas processing system according to any one of claims 1 to 3 , wherein the facility is a low-pressure CVD apparatus. The exhaust gas treatment system according to any one of claims 1 to 4 , wherein the main abatement apparatus is a combustion abatement apparatus or a heater heating abatement apparatus. The exhaust gas treatment system according to any one of claims 1 to 5 , wherein the auxiliary abatement device is a dry abatement device or a wet abatement device.

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