JP6287366B2 - Method for producing electrophotographic photoreceptor, electrophotographic photoreceptor - Google Patents
Method for producing electrophotographic photoreceptor, electrophotographic photoreceptor Download PDFInfo
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- JP6287366B2 JP6287366B2 JP2014045380A JP2014045380A JP6287366B2 JP 6287366 B2 JP6287366 B2 JP 6287366B2 JP 2014045380 A JP2014045380 A JP 2014045380A JP 2014045380 A JP2014045380 A JP 2014045380A JP 6287366 B2 JP6287366 B2 JP 6287366B2
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- polycarbonate resin
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- 238000004519 manufacturing process Methods 0.000 title claims description 44
- 108091008695 photoreceptors Proteins 0.000 title claims description 25
- 239000004431 polycarbonate resin Substances 0.000 claims description 92
- 229920005668 polycarbonate resin Polymers 0.000 claims description 79
- 238000000576 coating method Methods 0.000 claims description 64
- 239000011248 coating agent Substances 0.000 claims description 60
- 238000000034 method Methods 0.000 claims description 55
- 239000002904 solvent Substances 0.000 claims description 34
- 125000003118 aryl group Chemical group 0.000 claims description 24
- 150000001875 compounds Chemical class 0.000 claims description 23
- 238000005809 transesterification reaction Methods 0.000 claims description 19
- 150000004650 carbonic acid diesters Chemical class 0.000 claims description 18
- 239000003054 catalyst Substances 0.000 claims description 18
- 229910052736 halogen Inorganic materials 0.000 claims description 16
- 150000002367 halogens Chemical class 0.000 claims description 16
- 239000011342 resin composition Substances 0.000 claims description 16
- 238000006068 polycondensation reaction Methods 0.000 claims description 13
- 238000004898 kneading Methods 0.000 claims description 10
- 125000001424 substituent group Chemical group 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 106
- 239000000243 solution Substances 0.000 description 40
- 229920005989 resin Polymers 0.000 description 33
- 239000011347 resin Substances 0.000 description 33
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- 238000002844 melting Methods 0.000 description 22
- 230000008018 melting Effects 0.000 description 22
- 229920000402 bisphenol A polycarbonate polymer Polymers 0.000 description 21
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- 239000000463 material Substances 0.000 description 18
- 239000011230 binding agent Substances 0.000 description 17
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 16
- 239000000203 mixture Substances 0.000 description 16
- -1 etc. Substances 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 13
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 239000008188 pellet Substances 0.000 description 9
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 9
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical class C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 7
- 150000001339 alkali metal compounds Chemical class 0.000 description 7
- 239000002609 medium Substances 0.000 description 7
- 239000012074 organic phase Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
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- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000008346 aqueous phase Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 5
- 150000001341 alkaline earth metal compounds Chemical class 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 239000002356 single layer Substances 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 150000001639 boron compounds Chemical class 0.000 description 4
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000003618 dip coating Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 4
- 238000006384 oligomerization reaction Methods 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 4
- UBOXGVDOUJQMTN-UHFFFAOYSA-N 1,1,2-trichloroethane Chemical compound ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 3
- 229910000024 caesium carbonate Inorganic materials 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 2
- ICSNLGPSRYBMBD-UHFFFAOYSA-N 2-aminopyridine Chemical compound NC1=CC=CC=N1 ICSNLGPSRYBMBD-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000003868 ammonium compounds Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 150000001573 beryllium compounds Chemical class 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- QYJXDIUNDMRLAO-UHFFFAOYSA-N butyl 4-methylbenzenesulfonate Chemical compound CCCCOS(=O)(=O)C1=CC=C(C)C=C1 QYJXDIUNDMRLAO-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 2
- FZFAMSAMCHXGEF-UHFFFAOYSA-N chloro formate Chemical group ClOC=O FZFAMSAMCHXGEF-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
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- 150000002681 magnesium compounds Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
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- UBQKCCHYAOITMY-UHFFFAOYSA-N pyridin-2-ol Chemical compound OC1=CC=CC=N1 UBQKCCHYAOITMY-UHFFFAOYSA-N 0.000 description 2
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- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 2
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- PJAWEFMLSSLAIM-UHFFFAOYSA-N (2,3,4-trimethylphenyl)boron Chemical compound [B]C1=CC=C(C)C(C)=C1C PJAWEFMLSSLAIM-UHFFFAOYSA-N 0.000 description 1
- IHPFDBSMYWRYHQ-UHFFFAOYSA-N (2-benzylphenyl)-diphenylborane Chemical compound C=1C=CC=C(B(C=2C=CC=CC=2)C=2C=CC=CC=2)C=1CC1=CC=CC=C1 IHPFDBSMYWRYHQ-UHFFFAOYSA-N 0.000 description 1
- GCLVVFYKIZYIIL-UHFFFAOYSA-N (2-butylphenyl)-diphenylborane Chemical compound CCCCC1=CC=CC=C1B(C=1C=CC=CC=1)C1=CC=CC=C1 GCLVVFYKIZYIIL-UHFFFAOYSA-N 0.000 description 1
- KBIWOGUYLGWUTF-UHFFFAOYSA-N (2-methylphenyl)-diphenylborane Chemical compound CC1=CC=CC=C1B(C=1C=CC=CC=1)C1=CC=CC=C1 KBIWOGUYLGWUTF-UHFFFAOYSA-N 0.000 description 1
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
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- HSNJERRVXUNQLS-UHFFFAOYSA-N 1-(4-tert-butylphenyl)propan-2-one Chemical compound CC(=O)CC1=CC=C(C(C)(C)C)C=C1 HSNJERRVXUNQLS-UHFFFAOYSA-N 0.000 description 1
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- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 1
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- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
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- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
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- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
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- 238000007664 blowing Methods 0.000 description 1
- NIKBCKTWWPVAIC-UHFFFAOYSA-N butyl benzenesulfonate Chemical compound CCCCOS(=O)(=O)C1=CC=CC=C1 NIKBCKTWWPVAIC-UHFFFAOYSA-N 0.000 description 1
- SXVFRTBMWHHATP-UHFFFAOYSA-M butyl(triphenyl)azanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[N+](C=1C=CC=CC=1)(CCCC)C1=CC=CC=C1 SXVFRTBMWHHATP-UHFFFAOYSA-M 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
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- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Inorganic materials [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 150000001716 carbazoles Chemical class 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
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- 125000004093 cyano group Chemical group *C#N 0.000 description 1
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- 150000005690 diesters Chemical class 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- GRWZHXKQBITJKP-UHFFFAOYSA-L dithionite(2-) Chemical compound [O-]S(=O)S([O-])=O GRWZHXKQBITJKP-UHFFFAOYSA-L 0.000 description 1
- TVIDDXQYHWJXFK-UHFFFAOYSA-N dodecanedioic acid Chemical compound OC(=O)CCCCCCCCCCC(O)=O TVIDDXQYHWJXFK-UHFFFAOYSA-N 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical class CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 1
- VRZVPALEJCLXPR-UHFFFAOYSA-N ethyl 4-methylbenzenesulfonate Chemical compound CCOS(=O)(=O)C1=CC=C(C)C=C1 VRZVPALEJCLXPR-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- KVFVBPYVNUCWJX-UHFFFAOYSA-M ethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(C)C KVFVBPYVNUCWJX-UHFFFAOYSA-M 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229960004979 fampridine Drugs 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- JJOJFIHJIRWASH-UHFFFAOYSA-N icosanedioic acid Chemical compound OC(=O)CCCCCCCCCCCCCCCCCCC(O)=O JJOJFIHJIRWASH-UHFFFAOYSA-N 0.000 description 1
- IPJIKGJKMCILGV-UHFFFAOYSA-N imidazo[1,2-a]pyridin-6-ylboronic acid Chemical compound C1=C(B(O)O)C=CC2=NC=CN21 IPJIKGJKMCILGV-UHFFFAOYSA-N 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
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- 159000000002 lithium salts Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- VUQUOGPMUUJORT-UHFFFAOYSA-N methyl 4-methylbenzenesulfonate Chemical compound COS(=O)(=O)C1=CC=C(C)C=C1 VUQUOGPMUUJORT-UHFFFAOYSA-N 0.000 description 1
- CZXGXYBOQYQXQD-UHFFFAOYSA-N methyl benzenesulfonate Chemical compound COS(=O)(=O)C1=CC=CC=C1 CZXGXYBOQYQXQD-UHFFFAOYSA-N 0.000 description 1
- KPTPYMHWVGAEGG-UHFFFAOYSA-M methyl(triphenyl)azanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[N+](C=1C=CC=CC=1)(C)C1=CC=CC=C1 KPTPYMHWVGAEGG-UHFFFAOYSA-M 0.000 description 1
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- ODKLEQPZOCJQMT-UHFFFAOYSA-N n,n-diethylpyridin-4-amine Chemical compound CCN(CC)C1=CC=NC=C1 ODKLEQPZOCJQMT-UHFFFAOYSA-N 0.000 description 1
- WLFOHIVICZSIKG-UHFFFAOYSA-N n,n-dimethyl-1h-imidazol-2-amine Chemical compound CN(C)C1=NC=CN1 WLFOHIVICZSIKG-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
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- 239000002245 particle Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
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- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 230000037048 polymerization activity Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- JTTWNTXHFYNETH-UHFFFAOYSA-N propyl 4-methylbenzenesulfonate Chemical compound CCCOS(=O)(=O)C1=CC=C(C)C=C1 JTTWNTXHFYNETH-UHFFFAOYSA-N 0.000 description 1
- OCNPXKLQSGAGKT-UHFFFAOYSA-N propyl benzenesulfonate Chemical compound CCCOS(=O)(=O)C1=CC=CC=C1 OCNPXKLQSGAGKT-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 159000000008 strontium salts Chemical class 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- XKXIQBVKMABYQJ-UHFFFAOYSA-M tert-butyl carbonate Chemical compound CC(C)(C)OC([O-])=O XKXIQBVKMABYQJ-UHFFFAOYSA-M 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- ZJKOMXZUJBYOOK-UHFFFAOYSA-M tetraphenylazanium;hydroxide Chemical compound [OH-].C1=CC=CC=C1[N+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 ZJKOMXZUJBYOOK-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 239000003017 thermal stabilizer Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- IGNTWNVBGLNYDV-UHFFFAOYSA-N triisopropylphosphine Chemical compound CC(C)P(C(C)C)C(C)C IGNTWNVBGLNYDV-UHFFFAOYSA-N 0.000 description 1
- HADKRTWCOYPCPH-UHFFFAOYSA-M trimethylphenylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C1=CC=CC=C1 HADKRTWCOYPCPH-UHFFFAOYSA-M 0.000 description 1
- KCTAHLRCZMOTKM-UHFFFAOYSA-N tripropylphosphane Chemical compound CCCP(CCC)CCC KCTAHLRCZMOTKM-UHFFFAOYSA-N 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
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Images
Landscapes
- Photoreceptors In Electrophotography (AREA)
Description
本発明は、電子写真方式のプリンターや複写機、複合機等に用いられる電子写真感光体、及びその電子写真感光体の製造方法に関するものである。 The present invention relates to an electrophotographic photosensitive member used for an electrophotographic printer, a copying machine, a multifunction machine, and the like, and a method for manufacturing the electrophotographic photosensitive member.
電子写真技術は、即時性、高品質の画像が得られること等から、近年では、静電式複写機、ファクシミリ、レーザビームプリンターなどに広く使われ応用されてきている。これらの画像形成装置に使用される電子写真感光体は、電荷発生剤、電荷輸送剤及びバインダー樹脂を含む感光層を、導電性支持基体上に形成した、いわゆる有機感光体が主流である。従来、有機感光体のバインダー樹脂として用いられるポリカーボネート樹脂は、ビスフェノール類とホスゲンとを溶液中で反応させる、界面法(界面重縮合法)や溶液法のような溶剤法で製造された樹脂が主流であった(特許文献1参照)。一方、人体及び環境への悪影響を削減できることから、溶剤法以外に、ビスフェノールと炭酸ジエステルとをエステル交換反応により重縮合反応させる溶融法で製造された樹脂が、安価な製法として広く用いられている(特許文献2、3参照)。また、前記特許文献に記載されるようなエンジニアリングプラスチックとして広く使用されているビスフェノール−A−ポリカーボネート以外でも、溶融法によるビスフェノール−C−ポリカーボネートを、電子写真感光体に用いることで耐オゾン特性を向上させた例も近年報告されている(特許文献4参照)。溶融法による連続製法で製造されたビスフェノール−A−ポリカーボネート樹脂は、ハロゲン系溶剤等の環境負荷の大きい有機溶剤を使用しないこと、重合工程あるいはオリゴマー工程でホスゲンを使用しない等、環境面で優れる上、感光体に使用したときの電気特性も優れる。しかしながら、前記ビスフェノール−A−ポリカーボネートは、溶媒に対する溶解性に乏しく、例えば一般に電子写真感光体用の塗布液に用いられるテトラヒドロフランやトルエンのような非ハロゲン溶媒には特に溶解しにくい。また、テトラヒドロフランやトルエンと比較してビスフェノール−A−ポリカーボネートを溶解し、電子写真感光体用感光層の塗布液として使用可能なクロロベンゼン等のハロゲン溶媒は、人体及び環境への悪影響が懸念されている。 In recent years, electrophotographic technology has been widely used and applied to electrostatic copying machines, facsimiles, laser beam printers, and the like because of its immediacy and high quality images. The electrophotographic photoreceptors used in these image forming apparatuses are mainly so-called organic photoreceptors in which a photosensitive layer containing a charge generator, a charge transport agent, and a binder resin is formed on a conductive support substrate. Conventionally, polycarbonate resins used as binder resins for organic photoreceptors are mainly resins produced by a solvent method such as an interface method (interface polycondensation method) or a solution method in which bisphenols and phosgene are reacted in a solution. (See Patent Document 1). On the other hand, since the adverse effects on the human body and the environment can be reduced, in addition to the solvent method, a resin produced by a melting method in which bisphenol and carbonic acid diester are polycondensed by transesterification is widely used as an inexpensive production method. (See Patent Documents 2 and 3). In addition to bisphenol-A-polycarbonate, which is widely used as an engineering plastic as described in the above-mentioned patent document, ozone resistance is improved by using bisphenol-C-polycarbonate produced by a melting method for an electrophotographic photoreceptor. An example of this has been reported recently (see Patent Document 4). The bisphenol-A-polycarbonate resin produced by the continuous process using the melting method is superior in terms of the environment, such as not using an organic solvent with a large environmental load such as a halogen-based solvent, and not using phosgene in the polymerization process or oligomer process. Also, the electrical characteristics when used in the photoreceptor are excellent. However, the bisphenol-A-polycarbonate is poor in solubility in a solvent, and is particularly difficult to dissolve in a non-halogen solvent such as tetrahydrofuran or toluene generally used in a coating solution for an electrophotographic photoreceptor. In addition, halogen solvents such as chlorobenzene, which dissolve bisphenol-A-polycarbonate and can be used as a coating solution for a photosensitive layer for an electrophotographic photosensitive member, as compared with tetrahydrofuran and toluene, are concerned about adverse effects on the human body and the environment. .
前記溶融法による連続製法で製造されたビスフェノール−A−ポリカーボネートを用いつつ、非ハロゲン溶媒使用により電子写真感光体の感光層を形成できれば、人体及び環境への負荷も少なく、コスト的にも有利な電子写真感光体を提供できるが、前記ビスフェノール−A−ポリカーボネートを単独で用いた場合には、感光層形成用塗布液の調製が困難である上、長期保存が不可能であった。そこで、前記ビスフェノール−A−ポリカーボネートを他の樹脂と混合して感光層形成用塗布液を調製する手段が考えられたが、単純に樹脂同士を混合した場合には、前記ビスフェノール−A−ポリカーボネートが非ハロゲン溶媒に溶解せず、電子写真感光体を製造することが出来なかった。 If the photosensitive layer of the electrophotographic photosensitive member can be formed by using a non-halogen solvent while using the bisphenol-A-polycarbonate produced by the continuous production method by the melting method, the burden on the human body and the environment is small, which is advantageous in terms of cost. An electrophotographic photosensitive member can be provided, but when the bisphenol-A-polycarbonate is used alone, it is difficult to prepare a coating solution for forming a photosensitive layer, and long-term storage is impossible. Therefore, a means for preparing a coating solution for forming a photosensitive layer by mixing the bisphenol-A-polycarbonate with another resin has been considered. However, when the resins are simply mixed, the bisphenol-A-polycarbonate is The electrophotographic photosensitive member could not be produced because it was not dissolved in a non-halogen solvent.
本発明者は、上記課題を解決すべく鋭意研究を重ねた結果、炭酸ジエステルと芳香族ジ
ヒドロキシ化合物とのエステル交換反応によって生成する、特定構造単位を有するポリカ
ーボネート樹脂(A)及びポリカーボネート樹脂(B)を溶融混練して樹脂組成物を調製
する工程、非ハロゲン溶媒を用いて、該樹脂組成物を含有する感光層形成用塗布液を調製
する工程、該感光層形成用塗布液を用いて感光層を形成する工程、を有する電子写真感光
体の製造方法を見出した。即ち本発明の要旨は以下の<1>〜<3>に存する。
<1>感光層を有する電子写真感光体を製造する電子写真感光体の製造方法において、該
製造方法が、
炭酸ジエステルと芳香族ジヒドロキシ化合物とのエステル交換反応によって生成する、
下記式(1)で表される構造単位を有するポリカーボネート樹脂(A)及び下記式(2)
で表される構造単位を有するポリカーボネート樹脂(B)を溶融混練して樹脂組成物を調
製する工程、
非ハロゲン溶媒を用いて、該樹脂組成物を含有する感光層形成用塗布液を調製する工程
、
該感光層形成用塗布液を用いて感光層を形成する工程、
を有することを特徴とする電子写真感光体の製造方法。
As a result of intensive studies to solve the above problems, the present inventor has produced a polycarbonate resin (A) and a polycarbonate resin (B) having a specific structural unit, which are produced by a transesterification reaction between a carbonic acid diester and an aromatic dihydroxy compound. A step of preparing a resin composition by melt kneading, a step of preparing a coating solution for forming a photosensitive layer containing the resin composition using a non-halogen solvent, and a photosensitive layer using the coating solution for forming a photosensitive layer The manufacturing method of the electrophotographic photoreceptor which has the process of forming this was discovered. That is, the gist of the present invention resides in the following <1> to < 3 >.
<1> In the method for producing an electrophotographic photosensitive member for producing an electrophotographic photosensitive member having a photosensitive layer, the production method comprises:
Produced by a transesterification reaction between a carbonic acid diester and an aromatic dihydroxy compound.
Polycarbonate resin (A) having a structural unit represented by the following formula (1) and the following formula (2)
A step of preparing a resin composition by melt-kneading a polycarbonate resin (B) having a structural unit represented by:
Using a non-halogen solvent to prepare a coating solution for forming a photosensitive layer containing the resin composition;
Forming a photosensitive layer using the coating solution for forming a photosensitive layer;
A process for producing an electrophotographic photosensitive member, comprising:
<2>前記樹脂組成物におけるポリカーボネート樹脂(A)の含有割合が、ポリカーボネ
ート樹脂(A)及びポリカーボネート樹脂(B)の合計量に対して5%〜25%であるこ
とを特徴とする、<1>に記載の電子写真感光体の製造方法。
<3>前記ポリカーボネート樹脂(A)が、下記式(3)で表される芳香族ジヒドロキシ
化合物と、下記一般式(4)で表される炭酸ジエステルとを、触媒の存在下、重縮合によ
り得られるポリカーボネート樹脂であり、前記ポリカーボネート樹脂(B)が、下記式(
5)で表される芳香族ジヒドロキシ化合物と、下記一般式(4)で表される炭酸ジエステ
ルとを、触媒の存在下、重縮合により得られるポリカーボネート樹脂であることを特徴と
する、<1>又は<2>に記載の電子写真感光体の製造方法。
<2> content of the polycarbonate resin (A) in the resin composition, characterized in that 5% to 25% relative to the total weight of the polycarbonate resin (A)及Beauty port polycarbonate resin (B) <1> The method for producing an electrophotographic photosensitive member according to <1>.
<3> The polycarbonate resin (A) is obtained by polycondensation of an aromatic dihydroxy compound represented by the following formula (3) and a carbonic acid diester represented by the following general formula (4) in the presence of a catalyst. The polycarbonate resin (B) is represented by the following formula (
5) an aromatic dihydroxy compound represented by, and a carbonic acid diester represented by the following general formula (4), wherein the presence of a catalyst, a polycarbonate resin obtained by polycondensation, <1> Or the manufacturing method of the electrophotographic photoreceptor as described in <2> .
(式(4)中、A1及びA2は、それぞれ独立に、置換基を有していてもよい炭素数1〜
18の脂肪族基、又は、置換基を有していてもよい芳香族基を表す。)
(In the formula (4), A 1 and A 2 each independently optionally carbon atoms 1 may have a substituent
18 aliphatic groups or an aromatic group which may have a substituent is represented. )
本発明によれば、安価大量生産が可能で、環境面で優れる溶融法で製造されたビスフェノール−A−ポリカーボネート樹脂とビスフェノール−C−ポリカーボネート樹脂を溶融混練した組成物とすることで、従来、非ハロゲン溶媒に不溶なビスフェノール−A−ポリカーボネート樹脂を、非ハロゲン溶媒への溶解を可能にし、環境面でも優れ、感光層を均一に形成できる電子写真感光体の製造方法を提供することが可能になる。 According to the present invention, a composition obtained by melt-kneading a bisphenol-A-polycarbonate resin and a bisphenol-C-polycarbonate resin produced by a melting method that is inexpensive and mass-produced and is environmentally superior has been conventionally used. It is possible to provide a method for producing an electrophotographic photosensitive member that can dissolve a bisphenol-A-polycarbonate resin insoluble in a halogen solvent in a non-halogen solvent, is excellent in terms of environment, and can uniformly form a photosensitive layer. .
以下、本発明を実施するための形態(以下、発明の実施の形態)について詳細に説明する。尚、本発明は、以下の実施の形態に限定されるものではなく、その要旨の範囲内で種々変形して実施することが出来る。また、使用する図面は本実施の形態を説明するためのものであり、実際の大きさを表すものではない。
<樹脂組成物を調製する工程>
本発明の電子写真感光体の製造方法は、炭酸ジエステルと芳香族ジヒドロキシ化合物とのエステル交換反応によって生成する、下記式(1)で表される構造単位を有するポリカ
ーボネート樹脂(A)及び下記式(2)で表される構造単位を有するポリカーボネート樹脂(B)を溶融混練して樹脂組成物を調製する工程を有する。
Hereinafter, modes for carrying out the present invention (hereinafter, embodiments of the present invention) will be described in detail. The present invention is not limited to the following embodiments, and various modifications can be made within the scope of the invention. The drawings used are for explaining the present embodiment and do not represent the actual size.
<Process for preparing resin composition>
The method for producing an electrophotographic photosensitive member of the present invention comprises a polycarbonate resin (A) having a structural unit represented by the following formula (1), which is produced by a transesterification reaction between a carbonic acid diester and an aromatic dihydroxy compound, and the following formula ( 2) A step of preparing a resin composition by melt-kneading the polycarbonate resin (B) having the structural unit represented by 2).
[ポリカーボネート樹脂]
本発明に係るポリカーボネート樹脂(A)及び(B)は、原料として芳香族ジヒドロキシ化合物及び炭酸ジエステルを用い、エステル交換触媒の存在下、連続的に溶融重縮合反応を行うことにより、製造されることが好ましい(以下、溶融法と称することがある)。本発明に係る溶融法ポリカーボネート樹脂を電子写真感光体の感光層のバインダー樹脂として使用した場合に、電気特性及び耐オゾン特性が界面法ポリカーボネート樹脂を使用した場合に比べて良好となる。電荷輸送のトラップとなり易く、繰り返し使用した場合の電気特性の悪化要因となる窒素原子含有の触媒を溶融法では使用しないこと、溶融法では溶剤法で生成する、化学的に不安定な特定末端基(クロロホルメート基)が生成しない、等が溶剤法と比較して良好な電気特性及び耐オゾン特性の要因と考えられる。ポリカーボネート樹脂(A)及び(B)はの粘度平均分子量は、感光体の耐摩耗性の観点から10000以上、好ましくは15000以上、より好ましくは20000以上であり、混練効率の観点から70000以下、好ましくは50000以下、より好ましくは40000以下である。
[Polycarbonate resin]
The polycarbonate resins (A) and (B) according to the present invention are produced by continuously performing a melt polycondensation reaction in the presence of a transesterification catalyst using an aromatic dihydroxy compound and a carbonic acid diester as raw materials. Is preferable (hereinafter sometimes referred to as a melting method). When the melt-process polycarbonate resin according to the present invention is used as a binder resin for the photosensitive layer of an electrophotographic photoreceptor, electrical characteristics and ozone resistance are improved as compared with the case where an interfacial polycarbonate resin is used. Do not use nitrogen atom-containing catalysts that tend to trap charge transport and cause deterioration of electrical characteristics when used repeatedly in the melting method, and chemically unstable specific end groups generated by the solvent method in the melting method. The fact that (chloroformate group) is not formed is considered to be a factor of good electrical characteristics and ozone resistance as compared with the solvent method. The viscosity average molecular weight of the polycarbonate resins (A) and (B) is 10,000 or more, preferably 15000 or more, more preferably 20000 or more from the viewpoint of abrasion resistance of the photoreceptor, and 70000 or less, preferably from the viewpoint of kneading efficiency. Is 50000 or less, more preferably 40000 or less.
[ポリカーボネート樹脂の製造方法]
溶融法によるポリカーボネート樹脂の製造方法は、原料である芳香族ジヒドロキシ化合物と炭酸ジエステルとの原料混合溶融液を調製し(原調工程)、前記原料混合溶融液を、エステル交換反応触媒の存在下、溶融状態で複数の反応槽を用いて多段階で重縮合反応をさせる(重縮合工程)ことによって行われることが好ましい。反応方式は、バッチ式、連続式、又はバッチ式と連続式の組合せのいずれでもよい。反応槽は、複数基の竪型撹拌反応槽、及び必要に応じてこれに続く少なくとも1基の横型撹拌反応槽が用いられる。通常、これらの反応槽は直列に設置され、連続的に処理が行われる。重縮合工程後、反応を停止させ、重縮合反応液中の未反応原料や反応副生物を脱揮除去する工程や、熱安定剤、離型剤、色剤等を添加する工程、ポリカーボネート樹脂を所定の粒径に形成する工程等を適宜追加してもよい。
[Production method of polycarbonate resin]
The method for producing a polycarbonate resin by a melting method is to prepare a raw material mixed melt of an aromatic dihydroxy compound and a carbonic acid diester that are raw materials (original preparation process), and the raw material mixed melt in the presence of a transesterification catalyst. It is preferable to carry out the polycondensation reaction in multiple stages using a plurality of reaction vessels in a molten state (polycondensation step). The reaction system may be any of a batch system, a continuous system, or a combination of a batch system and a continuous system. As the reaction tank, a plurality of vertical stirring reaction tanks and, if necessary, at least one horizontal stirring reaction tank subsequent thereto are used. Usually, these reaction tanks are installed in series and processed continuously. After the polycondensation process, the reaction is stopped, the unreacted raw materials and reaction byproducts in the polycondensation reaction liquid are devolatilized and removed, the process of adding a thermal stabilizer, mold release agent, colorant, etc., polycarbonate resin You may add suitably the process etc. which form in a predetermined particle size.
[芳香族ジヒドロキシ化合物]
本発明に係るポリカーボネート樹脂の原料である芳香族ジヒドロキシ化合物としては、具体的には下記式(3)で表される芳香族ジヒドロキシ化合物と下記式(5)で表される芳香族ジヒドロキシ化合物が挙げられる。前記式(5)で表される芳香族ジヒドロキシ化合物は、水酸基に隣接してメチル基が一つ存在するため、適度に水酸基の酸化が立体的にブロックされると同時に、例えば水酸基に2つのメチル基が隣接した場合と比較して、メチル基が重合反応に関しての立体障害とならないこと、さらには重合体の溶解性が高いこと、電荷輸送物質との相溶性が高く、電気特性や機械物性の観点で有利である、といった
利点を有する。
[Aromatic dihydroxy compounds]
Specific examples of the aromatic dihydroxy compound that is a raw material of the polycarbonate resin according to the present invention include an aromatic dihydroxy compound represented by the following formula (3) and an aromatic dihydroxy compound represented by the following formula (5). It is done. Since the aromatic dihydroxy compound represented by the formula (5) has one methyl group adjacent to the hydroxyl group, the oxidation of the hydroxyl group is appropriately blocked sterically, and at the same time, for example, two methyl groups are added to the hydroxyl group. Compared to the case where the groups are adjacent to each other, the methyl group does not become a steric hindrance with respect to the polymerization reaction, and the solubility of the polymer is high, the compatibility with the charge transporting material is high, and the electrical properties and mechanical properties are low. It is advantageous from the viewpoint.
[炭酸ジエステル]
本発明に係るポリカーボネート樹脂の原料である炭酸ジエステルとしては、下記一般式(4)で示される化合物が挙げられる。
[Carbonated diester]
Examples of the carbonic acid diester that is a raw material of the polycarbonate resin according to the present invention include compounds represented by the following general formula (4).
ここで、式(4)中、式(4)中、A1及びA2は、それぞれ独立に、置換基を有していてもよい炭素数1〜18の脂肪族基、又は、置換基を有していてもよい芳香族基を表す。A1,A2は、同一でも相互に異なるものでもよい。A1及びA2の有していてもよい置換基としては、ハロゲン原子、炭素数1〜10のアルキル基、炭素数1〜10のアルコキシ基、フェニル基、フェノキシ基、ビニル基、シアノ基、エステル基、アミド基、ニトロ基等が挙げられる。脂肪族基としては、メチル基、エチル基、プロピル基、t−ブチル等が挙げられる。芳香族基としては、フェニル基、ナフチル基、トリル基等が挙げられ、炭酸ジエステル化合物の具体例としては、例えば、ジフェニルカーボネート、ジトリルカーボネート等の置換ジフェニルカーボネート、ジメチルカーボネート、ジエチルカーボネート、ジ−t−ブチルカーボネート等のジアルキルカーボネートが挙げられる。これらの中でも、その反応性の観点、およびコストの観点からジフェニルカーボネート(以下、「DPC」と称する場合がある。)、置換ジフェニルカーボネートが好ましい。これらの炭酸ジエステルは、単独又は2種以上を混合して用いることができる。 Here, in Formula (4), in Formula (4), A 1 and A 2 each independently represent an aliphatic group having 1 to 18 carbon atoms which may have a substituent, or a substituent. An aromatic group that may be present. A 1 and A 2 may be the same or different from each other. Examples of the substituent that A 1 and A 2 may have include a halogen atom, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a phenyl group, a phenoxy group, a vinyl group, a cyano group, Examples include an ester group, an amide group, and a nitro group. Examples of the aliphatic group include a methyl group, an ethyl group, a propyl group, and t-butyl. Examples of the aromatic group include a phenyl group, a naphthyl group, and a tolyl group. Specific examples of the carbonic acid diester compound include, for example, substituted diphenyl carbonate such as diphenyl carbonate and ditolyl carbonate, dimethyl carbonate, diethyl carbonate, and di- Examples thereof include dialkyl carbonates such as t-butyl carbonate. Among these, diphenyl carbonate (hereinafter sometimes referred to as “DPC”) and substituted diphenyl carbonate are preferable from the viewpoint of reactivity and cost. These carbonic acid diesters can be used alone or in admixture of two or more.
本発明に係る溶融法によるポリカーボネート樹脂の製造方法において、これらの炭酸ジエステルの使用量は、通常、芳香族ジヒドロキシ化合物1モルに対して、炭酸ジエステル化合物が1.01モル〜1.30モル、好ましくは1.02モル〜1.20モルの比で用いられる。前記炭酸ジエステルのモル比が過度に小さいと、エステル交換反応速度が低下し、所望の分子量を有するポリカーボネート樹脂の生産が困難となったり、得られるポリカーボネート樹脂の末端水酸基濃度が高くなり、熱安定性が悪化したりする傾向にある。また、前記炭酸ジエステルのモル比が過度に大きいと、エステル交換の反応速度が低下し、所望の分子量を有するポリカーボネート樹脂の生産が困難となる傾向となる他、樹脂中の炭酸ジエステル化合物の残存量が多くなり、電気特性の劣化や臭気の原因となることが
あり、好ましくない。 なお、溶融法によるポリカーボネート樹脂の製造においては、
界面法や溶液法等の溶剤法で使用されるホスゲンが重合工程で使用されないため、末端にクロロホルメート残基が存在しないのに対し、溶剤法によるポリカーボネート樹脂の製造では末端にクロロホルメート残基及びその変性基が残る点が異なる。
In the method for producing a polycarbonate resin by the melting method according to the present invention, the amount of these carbonic acid diesters used is usually 1.01 mol to 1.30 mol of carbonic acid diester compound, preferably 1 mol of aromatic dihydroxy compound. Is used in a ratio of 1.02 mol to 1.20 mol. If the molar ratio of the carbonic acid diester is excessively small, the transesterification rate decreases, making it difficult to produce a polycarbonate resin having a desired molecular weight, or increasing the terminal hydroxyl group concentration of the resulting polycarbonate resin, resulting in thermal stability. Tend to get worse. In addition, if the molar ratio of the carbonic acid diester is excessively large, the reaction rate of the transesterification decreases, and it becomes difficult to produce a polycarbonate resin having a desired molecular weight, and the residual amount of the carbonic acid diester compound in the resin. Increases, which may cause deterioration of electrical characteristics and odor. In the production of polycarbonate resin by the melting method,
Since phosgene used in solvent methods such as the interfacial method and solution method is not used in the polymerization process, there is no chloroformate residue at the terminal, whereas in the production of polycarbonate resin by the solvent method, residual chloroformate is not present at the terminal. The difference is that the group and its modifying group remain.
[エステル交換反応]
本発明に係る溶融法によるポリカーボネート樹脂の製造方法において、炭酸ジエステルと芳香族ジヒドロキシ化合物とのエステル交換反応は、反応効率の観点から、触媒存在下行われることが好ましい。エステル交換触媒としては、通常、エステル交換法によりポリカーボネート樹脂を製造する際に用いられる触媒が挙げられ、特に限定されない。例えば、アルカリ金属化合物、アルカリ土類金属化合物、ベリリウム化合物、マグネシウム化合物、塩基性ホウ素化合物、塩基性リン化合物、塩基性アンモニウム化合物、アミン系化合物等の塩基性化合物が挙げられる。これらの中でも、実用的にはアルカリ金属化合物、アルカリ土類金属化合物が好ましい。これらのエステル交換触媒は、単独で使用してもよく、2種類以上を組み合わせて使用してもよい。
[Transesterification]
In the method for producing a polycarbonate resin by the melting method according to the present invention, the transesterification reaction between the carbonic acid diester and the aromatic dihydroxy compound is preferably performed in the presence of a catalyst from the viewpoint of reaction efficiency. Examples of the transesterification catalyst include, but are not particularly limited to, catalysts used when producing a polycarbonate resin by a transesterification method. Examples thereof include basic compounds such as alkali metal compounds, alkaline earth metal compounds, beryllium compounds, magnesium compounds, basic boron compounds, basic phosphorus compounds, basic ammonium compounds, and amine compounds. Among these, alkali metal compounds and alkaline earth metal compounds are preferable for practical use. These transesterification catalysts may be used alone or in combination of two or more.
エステル交換触媒の使用量は、通常、全芳香族ジヒドロキシ化合物1モルに対して1×10-9モル〜1×10-3モルの範囲で用いられるが、成形特性や色相に優れたポリカーボネート樹脂を得るためには、エステル交換触媒の量は、アルカリ金属化合物及び/又はアルカリ土類金属化合物を用いる場合、全芳香族ジヒドロキシ化合物1モルに対して、好ましくは1.0×10-8モル〜1×10-4モルの範囲内、より好ましくは1.0×10-8モル〜1×10-5モルの範囲内であり、特に好ましくは1.0×10-7モル〜5.0×10-6モルの範囲内である。上記下限量より少なければ、所望の分子量のポリカーボネート樹脂を製造するのに必要な重合活性が得られず、上記上限量より多い場合は、ポリマー色相が悪化し、分岐成分量が多すぎて流動性が低下し、目標とする溶融特性の優れたポリカーボネート樹脂が製造できない。 The amount of transesterification catalyst used is usually in the range of 1 × 10 −9 mol to 1 × 10 −3 mol with respect to 1 mol of the wholly aromatic dihydroxy compound, but a polycarbonate resin excellent in molding characteristics and hue is used. In order to obtain, the amount of the transesterification catalyst is preferably 1.0 × 10 −8 mol to 1 mol per 1 mol of the wholly aromatic dihydroxy compound when an alkali metal compound and / or an alkaline earth metal compound is used. It is in the range of × 10 −4 mol, more preferably in the range of 1.0 × 10 −8 mol to 1 × 10 −5 mol, and particularly preferably in the range of 1.0 × 10 −7 mol to 5.0 × 10. Within the range of -6 moles. If the amount is less than the above lower limit amount, the polymerization activity necessary for producing a polycarbonate resin having a desired molecular weight cannot be obtained. If the amount is more than the above upper limit amount, the polymer hue deteriorates, the amount of branching components is too large, and the fluidity. The polycarbonate resin having excellent target melting characteristics cannot be produced.
アルカリ金属化合物としては、アルカリ金属の水酸化物、炭酸塩、炭酸水素化合物等の無機アルカリ金属化合物;アルカリ金属のアルコール類、フェノール類、有機カルボン酸類との塩等の有機アルカリ金属化合物等が挙げられる。ここで、アルカリ金属としては、例えば、リチウム、ナトリウム、カリウム、ルビジウム、セシウム等が挙げられる。
これらのアルカリ金属化合物の中でも、セシウム化合物が好ましく、特に、炭酸セシウム、炭酸水素セシウム、水酸化セシウムが感光体用途として適切な重合度を可能とし、残留触媒としての除去の容易さの観点から好ましい。
Examples of the alkali metal compound include inorganic alkali metal compounds such as alkali metal hydroxides, carbonates and hydrogencarbonate compounds; organic alkali metal compounds such as salts with alkali metal alcohols, phenols and organic carboxylic acids. It is done. Here, as an alkali metal, lithium, sodium, potassium, rubidium, cesium etc. are mentioned, for example.
Among these alkali metal compounds, a cesium compound is preferable, and cesium carbonate, cesium hydrogen carbonate, and cesium hydroxide are particularly preferable from the viewpoint of ease of removal as a residual catalyst that enables an appropriate degree of polymerization for use as a photoreceptor. .
アルカリ土類金属化合物としては、例えば、アルカリ土類金属の水酸化物、炭酸塩等の無機アルカリ土類金属化合物;アルカリ土類金属のアルコール類、フェノール類、有機カルボン酸類との塩等が挙げられる。ここで、アルカリ土類金属としては、例えば、カルシウム、ストロンチウム、バリウム等が挙げられる。
また、ベリリウム化合物及びマグネシウム化合物としては、例えば、当該金属の水酸化物、炭酸塩等の無機金属化合物;前記金属のアルコール類、フェノール類、有機カルボン酸類との塩等が挙げられる。
Examples of the alkaline earth metal compound include inorganic alkaline earth metal compounds such as alkaline earth metal hydroxides and carbonates; alkaline earth metal alcohols, phenols, salts with organic carboxylic acids, and the like. It is done. Here, examples of the alkaline earth metal include calcium, strontium, barium and the like.
Examples of the beryllium compound and magnesium compound include inorganic metal compounds such as metal hydroxides and carbonates; salts of the metals with alcohols, phenols, and organic carboxylic acids.
塩基性ホウ素化合物としては、ホウ素化合物のナトリウム塩、カリウム塩、リチウム塩、カルシウム塩、マグネシウム塩、バリウム塩、ストロンチウム塩等が挙げられる。ここで、ホウ素化合物としては、例えば、テトラメチルホウ素、テトラエチルホウ素、テトラプロピルホウ素、テトラブチルホウ素、トリメチルエチルホウ素、トリメチルベンジルホウ素、トリメチルフェニルホウ素、トリエチルメチルホウ素、トリエチルベンジルホウ素、トリエチルフェニルホウ素、トリブチルベンジルホウ素、トリブチルフェニルホウ素、テトラフェニルホウ素、ベンジルトリフェニルホウ素、メチルトリフェニルホウ素、ブチ
ルトリフェニルホウ素等が挙げられる。
Examples of basic boron compounds include sodium salts, potassium salts, lithium salts, calcium salts, magnesium salts, barium salts, strontium salts, and the like of boron compounds. Here, as the boron compound, for example, tetramethylboron, tetraethylboron, tetrapropylboron, tetrabutylboron, trimethylethylboron, trimethylbenzylboron, trimethylphenylboron, triethylmethylboron, triethylbenzylboron, triethylphenylboron, tributyl Examples include benzylboron, tributylphenylboron, tetraphenylboron, benzyltriphenylboron, methyltriphenylboron, and butyltriphenylboron.
塩基性リン化合物としては、例えば、トリエチルホスフィン、トリ−n−プロピルホスフィン、トリイソプロピルホスフィン、トリ−n−ブチルホスフィン、トリフェニルホスフィン、トリブチルホスフィン等の3価のリン化合物、又はこれらの化合物から誘導される4級ホスホニウム塩等が挙げられる。
塩基性アンモニウム化合物としては、例えば、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシド、テトラプロピルアンモニウムヒドロキシド、テトラブチルアンモニウムヒドロキシド、トリメチルエチルアンモニウムヒドロキシド、トリメチルベンジルアンモニウムヒドロキシド、トリメチルフェニルアンモニウムヒドロキシド、トリエチルメチルアンモニウムヒドロキシド、トリエチルベンジルアンモニウムヒドロキシド、トリエチルフェニルアンモニウムヒドロキシド、トリブチルベンジルアンモニウムヒドロキシド、トリブチルフェニルアンモニウムヒドロキシド、テトラフェニルアンモニウムヒドロキシド、ベンジルトリフェニルアンモニウムヒドロキシド、メチルトリフェニルアンモニウムヒドロキシド、ブチルトリフェニルアンモニウムヒドロキシド等が挙げられる。
Examples of the basic phosphorus compound include trivalent phosphine compounds such as triethylphosphine, tri-n-propylphosphine, triisopropylphosphine, tri-n-butylphosphine, triphenylphosphine, and tributylphosphine, or derivatives thereof. And quaternary phosphonium salts.
Examples of the basic ammonium compound include tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, trimethylethylammonium hydroxide, trimethylbenzylammonium hydroxide, trimethylphenylammonium hydroxide, Triethylmethylammonium hydroxide, triethylbenzylammonium hydroxide, triethylphenylammonium hydroxide, tributylbenzylammonium hydroxide, tributylphenylammonium hydroxide, tetraphenylammonium hydroxide, benzyltriphenylammonium hydroxide, methyltriphenylammonium hydroxide Sid, butyl triphenyl ammonium hydroxide, and the like.
アミン系化合物としては、例えば、4−アミノピリジン、2−アミノピリジン、N,N−ジメチル−4−アミノピリジン、4−ジエチルアミノピリジン、2−ヒドロキシピリジン、2−メトキシピリジン、4−メトキシピリジン、2−ジメチルアミノイミダゾール、2−メトキシイミダゾール、イミダゾール、2−メルカプトイミダゾール、2−メチルイミダゾール、アミノキノリン等が挙げられる。 Examples of the amine compound include 4-aminopyridine, 2-aminopyridine, N, N-dimethyl-4-aminopyridine, 4-diethylaminopyridine, 2-hydroxypyridine, 2-methoxypyridine, 4-methoxypyridine, 2 -Dimethylaminoimidazole, 2-methoxyimidazole, imidazole, 2-mercaptoimidazole, 2-methylimidazole, aminoquinoline and the like.
本発明に係る溶融法によるポリカーボネート樹脂の製造方法において、炭酸ジエステルと芳香族ジヒドロキシ化合物とのエステル交換反応終了後に、エステル交換触媒を中和失活させるための触媒失活剤を添加しても良い。このような処理により得られたポリカーボネート樹脂の耐熱性、耐加水分解性が向上する。
このような触媒失活剤としては、スルホン酸やスルホン酸エステルのようなpKaが3以下の酸性化合物が好ましく、具体的にはベンゼンスルホン酸、p−トルエンスルホン酸、ベンゼンスルホン酸メチル、ベンゼンスルホン酸エチル、ベンゼンスルホン酸プロピル、ベンゼンスルホン酸ブチル、p−トルエンスルホン酸メチル、p−トルエンスルホン酸エチル、p−トルエンスルホン酸プロピル、並びにp−トルエンスルホン酸ブチルなどが挙げられる。これらの中でも、p−トルエンスルホン酸並びにp−トルエンスルホン酸ブチルが好適に用いられる。
In the method for producing a polycarbonate resin by the melting method according to the present invention, a catalyst deactivator for neutralizing and deactivating the transesterification catalyst may be added after completion of the transesterification reaction between the carbonic acid diester and the aromatic dihydroxy compound. . The heat resistance and hydrolysis resistance of the polycarbonate resin obtained by such treatment are improved.
As such a catalyst deactivator, an acidic compound having a pKa of 3 or less, such as sulfonic acid and sulfonic acid ester, is preferable. Specifically, benzenesulfonic acid, p-toluenesulfonic acid, methyl benzenesulfonate, benzenesulfone Examples include ethyl acetate, propyl benzenesulfonate, butyl benzenesulfonate, methyl p-toluenesulfonate, ethyl p-toluenesulfonate, propyl p-toluenesulfonate, and butyl p-toluenesulfonate. Among these, p-toluenesulfonic acid and butyl p-toluenesulfonate are preferably used.
[溶融混練]
ポリカーボネート樹脂(A)とポリカーボネート樹脂(B)とを溶融混練する方法について説明する。 ポリカーボネート樹脂(A)のペレットもしくはフレークとポリカーボ
ネート樹脂(B)のペレットもしくはフレークとを、例えばニーダーや二軸押出機、単軸押出機等の混合装置を用いて溶融混練することにより樹脂組成物を得ることができる。ポリカーボネート樹脂(A)のペレットもしくはフレークとポリカーボネート樹脂(B)のペレットもしくはフレークは予め固体状態で混合し、その後混練されても良いし、又はどちらか一方を先に前記混合装置で溶融させ、そこへもう一方のポリカーボネート樹脂を添加し、混練しても良い。混練させる温度に特に限定されないが、混合均一性及び鉛筆硬度の観点から、240℃以上が好ましく、260℃以上がより好ましく、280℃以上がさらに好ましい。また、色調の観点から350℃以下が好ましく、320℃以下が特に好ましい。
[Melting and kneading]
A method for melt-kneading the polycarbonate resin (A) and the polycarbonate resin (B) will be described. The resin composition is obtained by melt-kneading the pellets or flakes of the polycarbonate resin (A) and the pellets or flakes of the polycarbonate resin (B) using, for example, a kneader, a twin screw extruder, a single screw extruder or the like. Can be obtained. The pellets or flakes of the polycarbonate resin (A) and the pellets or flakes of the polycarbonate resin (B) may be mixed in advance in a solid state and then kneaded, or one of them may be first melted by the mixing device. The other polycarbonate resin may be added and kneaded. Although it does not specifically limit to the temperature to knead | mix, From a viewpoint of mixing uniformity and pencil hardness, 240 degreeC or more is preferable, 260 degreeC or more is more preferable, and 280 degreeC or more is further more preferable. Moreover, 350 degrees C or less is preferable from a viewpoint of a color tone, and 320 degrees C or less is especially preferable.
前記樹脂組成物におけるポリカーボネート樹脂(A)の含有割合は、ポリカーボネート樹脂(A)及び下記式(2)で表される構造単位を有するポリカーボネート樹脂(B)の
合計含有量に対して、コストの観点から、下限は質量比で1%以上が好ましく、5%以上がより好ましい。また、溶解性の観点から、上限は質量比で30%以下が好ましく、25%以下がより好ましい。
The content ratio of the polycarbonate resin (A) in the resin composition is a viewpoint of cost relative to the total content of the polycarbonate resin (A) and the polycarbonate resin (B) having a structural unit represented by the following formula (2). Therefore, the lower limit is preferably 1% or more and more preferably 5% or more by mass ratio. In addition, from the viewpoint of solubility, the upper limit is preferably 30% or less, more preferably 25% or less in terms of mass ratio.
<電子写真感光体>
次に、感光体の構成要素について説明する。感光体は、導電性支持体上に、必要に応じて陽極酸化層、導電層、下引き層を設け、その上に単層型あるいは積層型の感光層を設け、更に必要に応じて保護層を設けて構築される。 導電性支持体、陽極酸化層、下引き
層については、公知の、例えば特開2007−293319号公報に開示されている公知の例を使用することが出来る。
<Electrophotographic photoreceptor>
Next, constituent elements of the photoreceptor will be described. The photoreceptor is provided with an anodized layer, a conductive layer, and an undercoat layer on a conductive support, if necessary, on which a single layer type or a laminated type photosensitive layer is provided, and further a protective layer if necessary. Is built. For the conductive support, the anodized layer, and the undercoat layer, known examples disclosed in, for example, JP-A-2007-293319 can be used.
[感光層]
感光層の形式としては、電荷発生材料と電荷輸送材料とが同一層に存在し、バインダー樹脂中に分散された単層型と、電荷発生材料がバインダー樹脂中に分散された電荷発生層及び電荷輸送材料がバインダー樹脂中に分散された電荷輸送層の二層からなる機能分離型(積層型)とが挙げられるが、本発明に用いられる電子写真感光体の感光層は、いずれの形式であってもよい。また、積層型感光層としては、導電性支持体側から電荷発生層、電荷輸送層をこの順に積層して設ける順積層型感光層と、逆に導電性支持体側から電荷輸送層、電荷発生層の順に積層して設ける逆積層型感光層とがあり、いずれを採用することも可能であるが、最もバランスの取れた光導電性を発揮できる順積層型感光層が好ましい。
[Photosensitive layer]
As the type of the photosensitive layer, a charge generation material and a charge transport material are present in the same layer and are dispersed in a binder resin, a charge generation layer in which a charge generation material is dispersed in a binder resin, and a charge. Examples include a functional separation type (laminated type) composed of two layers of a charge transport layer in which a transport material is dispersed in a binder resin. The photosensitive layer of the electrophotographic photosensitive member used in the present invention is of any type. May be. In addition, as the laminated photosensitive layer, a charge-generating layer and a charge transport layer are laminated in this order from the conductive support side, and conversely, a charge transport layer and a charge generation layer are formed from the conductive support side. There are reverse laminated photosensitive layers provided in order, and any of them can be adopted, but a forward laminated photosensitive layer that can exhibit the most balanced photoconductivity is preferable.
上述した溶融法により得られた上記式(1)で表される構造を有するポリカーボネート樹脂と上記式(2)で表される構造を有するポリカーボネート樹脂との樹脂組成物を、前記感光層中でバインダー樹脂として使用する。当該バインダー樹脂は、どの層中で使用されても構わないが、積層型感光層の電荷輸送層中、あるいは単層型感光層中であることが好ましく、積層型感光層の電荷輸送層中で使用されることがより好ましい。前記樹脂組成物は、単独でも、他の樹脂と混合して使用してもよい。混合しても良いバインダー樹脂としては、例えば、ブタジエン樹脂、スチレン樹脂、酢酸ビニル樹脂、アクリル酸エステル樹脂、メタクリル酸エステル樹脂、ビニルアルコール樹脂、エチルビニルエーテル等のビニル化合物の重合体及び共重合体、ポリビニルブチラール樹脂、ポリビニルホルマール樹脂、部分変性ポリビニルアセタール、ポリエステル樹脂、ポリアリレート樹脂、ポリアミド樹脂、ポリウレタン樹脂、セルロースエステル樹脂、フェノキシ樹脂、シリコン樹脂、シリコン−アルキッド樹脂、ポリ−N−ビニルカルバゾール樹脂等が挙げられる。耐刷性の観点から、中でも、ポリエステル樹脂、ポリアリレート樹脂が好ましい。 A resin composition comprising a polycarbonate resin having a structure represented by the above formula (1) and a polycarbonate resin having a structure represented by the above formula (2) obtained by the melting method described above is bonded to a binder in the photosensitive layer. Used as a resin. The binder resin may be used in any layer, but is preferably in the charge transport layer of the multilayer photosensitive layer or in the single-layer photosensitive layer, and in the charge transport layer of the multilayer photosensitive layer. More preferably it is used. The resin composition may be used alone or in combination with other resins. Examples of binder resins that may be mixed include polymers and copolymers of vinyl compounds such as butadiene resins, styrene resins, vinyl acetate resins, acrylic ester resins, methacrylic ester resins, vinyl alcohol resins, and ethyl vinyl ethers, Polyvinyl butyral resin, polyvinyl formal resin, partially modified polyvinyl acetal, polyester resin, polyarylate resin, polyamide resin, polyurethane resin, cellulose ester resin, phenoxy resin, silicon resin, silicon-alkyd resin, poly-N-vinylcarbazole resin, etc. Can be mentioned. Of these, polyester resins and polyarylate resins are preferred from the viewpoint of printing durability.
また、前記電荷輸送層は、複数層でも構わず、その場合はどの層が前記樹脂組成物を含有してもよい。前記バインダー樹脂と電荷輸送材料の含有割合は、通常は、バインダー樹脂100質量部に対して電荷輸送材料を20質量部以上の比率で使用する。中でも、残留電位低減の観点から30質量部以上が好ましい。一方、感光層の熱安定性の観点から、電荷輸送材料を通常は150質量部以下の比率で使用する。中でも、電荷輸送材料とバインダー樹脂との相溶性の観点から110質量部以下が好ましく、耐摩耗性の観点から80質量部以下がより好ましく、耐傷性の観点から70質量部以下が更に好ましい。 The charge transport layer may be a plurality of layers, and in that case, any layer may contain the resin composition. As for the content ratio of the binder resin and the charge transport material, the charge transport material is usually used at a ratio of 20 parts by mass or more with respect to 100 parts by mass of the binder resin. Especially, 30 mass parts or more is preferable from a viewpoint of residual potential reduction. On the other hand, from the viewpoint of thermal stability of the photosensitive layer, the charge transport material is usually used at a ratio of 150 parts by mass or less. Among these, 110 parts by mass or less is preferable from the viewpoint of compatibility between the charge transport material and the binder resin, 80 parts by mass or less is more preferable from the viewpoint of wear resistance, and 70 parts by mass or less is still more preferable from the viewpoint of scratch resistance.
[積層型感光層]
(電荷発生層)
電荷発生層は、公知の、例えば特開2007−293319号公報に開示されている例を使用することが出来る。
(電荷輸送層 )
電荷輸送層は、電荷輸送材料、バインダー樹脂と、必要に応じて使用されるその他の成分とを含有する。このような電荷輸送層は、具体的には、電荷輸送材料と、バインダー樹
脂として本願のポリカーボネート樹脂と、添加剤等を溶剤に溶解又は分散して塗布液を作製し、これを順積層型感光層の場合には電荷発生層上に、また、逆積層型感光層の場合には導電性支持体上に(下引き層を設ける場合は下引き層上に)塗布、乾燥して得ることができる。
[Laminated photosensitive layer]
(Charge generation layer)
As the charge generation layer, a known example disclosed in, for example, Japanese Patent Application Laid-Open No. 2007-293319 can be used.
(Charge transport layer)
The charge transport layer contains a charge transport material, a binder resin, and other components used as necessary. Specifically, such a charge transporting layer is prepared by dissolving or dispersing a charge transporting material, the polycarbonate resin of the present application as a binder resin, and an additive in a solvent to prepare a coating solution, which is then subjected to a sequential lamination type photosensitive. In the case of a layer, it can be obtained by coating and drying on a charge generation layer, and in the case of a reverse lamination type photosensitive layer, on a conductive support (or on an undercoat layer if an undercoat layer is provided). it can.
電荷輸送材料としては、公知のカルバゾール誘導体、ヒドラゾン化合物、芳香族アミン誘導体、エナミン誘導体、ブタジエン誘導体及びこれらの誘導体が複数結合されたものが好ましい。更に具体的には、特開平2−230255号、特開昭63−225660号、特開昭58−198043号、特公昭58−32372号、および、特公平7−21646号の各公報に記載の化合物が好ましく使用される。これらの電荷輸送材料は、何れか1種を単独で用いても良く、複数種のものを任意の組み合わせで併用しても良い。 As the charge transport material, a known carbazole derivative, hydrazone compound, aromatic amine derivative, enamine derivative, butadiene derivative, and a material in which a plurality of these derivatives are bonded are preferable. More specifically, it is described in JP-A-2-230255, JP-A-63-225660, JP-A-58-198043, JP-B-58-32372, and JP-B-7-21646. Compounds are preferably used. Any one of these charge transport materials may be used alone, or a plurality of types may be used in any combination.
電荷輸送層の膜厚は特に制限されないが、長寿命、画像安定性の観点、更には高解像度の観点から、通常5μm以上、好ましくは10μm以上、また、通常50μm以下、好ましくは45μm以下、更に好ましくは30μm以下の範囲とする。
積層型感光体、単層型感光体ともに、感光層又はそれを構成する各層には、成膜性、可撓性、塗布性、耐汚染性、耐ガス性、耐光性等を向上させる目的で、周知の酸化防止剤、可塑剤、紫外線吸収剤、電子吸引性化合物、レベリング剤、可視光遮光剤等の添加物を含有させても良い。
The thickness of the charge transport layer is not particularly limited, but is usually 5 μm or more, preferably 10 μm or more, and usually 50 μm or less, preferably 45 μm or less, from the viewpoint of long life, image stability, and high resolution. The range is preferably 30 μm or less.
For the purpose of improving film-forming properties, flexibility, coating properties, stain resistance, gas resistance, light resistance, etc., in both the photosensitive layer and each layer constituting it, both in the multilayer type photosensitive member and the single layer type photosensitive member. Additives such as well-known antioxidants, plasticizers, ultraviolet absorbers, electron-withdrawing compounds, leveling agents, and visible light shielding agents may be included.
[その他の機能層]
また、積層型感光体、単層型感光体ともに、上記手順により形成された感光層を最上層、即ち表面層としてもよいが、その上に更に別の層を設け、これを表面層としてもよい。例えば、感光層の損耗を防止したり、帯電器等から発生する放電生成物等による感光層の劣化を防止・軽減する目的で、保護層を設けても良い。保護層は、光硬化型、熱硬化型、電子線硬化型等の硬化型保護層、無機フィラーを分散させた保護層等、公知のものを使用することができる。
[Other functional layers]
Further, in both the laminated type photoreceptor and the single layer type photoreceptor, the photosensitive layer formed by the above procedure may be the uppermost layer, that is, the surface layer, but another layer may be provided on the photosensitive layer and used as the surface layer. Good. For example, a protective layer may be provided for the purpose of preventing the photosensitive layer from being worn out or preventing or reducing the deterioration of the photosensitive layer due to discharge products generated from a charger or the like. As the protective layer, known ones such as a curable protective layer such as a photo-curing type, a thermosetting type, and an electron beam curable type, and a protective layer in which an inorganic filler is dispersed can be used.
<感光層形成用塗布液を調製する工程>
前記感光層は、含有させる物質を非ハロゲン溶媒に溶解又は分散させて感光形成用塗布液を調製する。塗布液の作製に用いられる溶媒又は分散媒は、非ハロゲン系溶媒のみを用いることが好ましく、添加物等は入っていてもよい。非ハロゲン系溶媒とは、ハロゲン原子を分子構造中に有さない溶媒を言う。非ハロゲン溶媒の具体例としては、テトラヒドロフラン、1,4−ジオキサン、ジオキソラン、ジメトキシエタン等のエーテル類、ギ酸メチル、酢酸エチル等のエステル類、アセトン、メチルエチルケトン、シクロペンタノン、シクロヘキサノン、4−メトキシ−4−メチル−2−ペンタノン等のケトン類、ベンゼン、トルエン、キシレン等の芳香族炭化水素類、n−ブチルアミン、イソプロパノールアミン、ジエチルアミン、トリエタノールアミン、エチレンジアミン、トリエチレンジアミン等の含窒素化合物類、アセトニトリル、N−メチルピロリドン、N,N−ジメチルホルムアミド、ジメチルスルホキシド等の非プロトン性極性溶媒類等が挙げられる。また、これらは1種を単独で用いてもよいし、2種以上を併用してもよい。また、2種以上を任意の組み合わせ及び種類で併用してもよい。この中でも、相溶性の観点から、エーテル類及び芳香族炭化水素類の併用が好ましく、テトラヒドロフランとトルエンの併用が特に好ましい。
<Step of preparing a coating solution for forming a photosensitive layer>
The photosensitive layer is prepared by dissolving or dispersing a substance to be contained in a non-halogen solvent to prepare a photosensitive forming coating solution. As the solvent or dispersion medium used for preparing the coating liquid, it is preferable to use only a non-halogen solvent, and additives and the like may be contained. The non-halogen solvent refers to a solvent having no halogen atom in the molecular structure. Specific examples of the non-halogen solvent include ethers such as tetrahydrofuran, 1,4-dioxane, dioxolane and dimethoxyethane, esters such as methyl formate and ethyl acetate, acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone and 4-methoxy- Ketones such as 4-methyl-2-pentanone, aromatic hydrocarbons such as benzene, toluene and xylene, nitrogen-containing compounds such as n-butylamine, isopropanolamine, diethylamine, triethanolamine, ethylenediamine and triethylenediamine, acetonitrile And aprotic polar solvents such as N-methylpyrrolidone, N, N-dimethylformamide, and dimethyl sulfoxide. Moreover, these may be used individually by 1 type and may use 2 or more types together. Moreover, you may use 2 or more types together by arbitrary combinations and kinds. Among these, from the viewpoint of compatibility, the combined use of ethers and aromatic hydrocarbons is preferable, and the combined use of tetrahydrofuran and toluene is particularly preferable.
前記ポリカーボネート樹脂と溶媒の質量比[ポリカーボネート樹脂/溶媒]が、8/100〜30/100となるように感光層形成用塗布液を調整することが好ましい。前記電荷輸送物質との溶解性の観点から、25/100以下がより好ましく、20/100以下が更に好ましい。塗布性の観点から、10/100以上がより好ましく、12/100以上が更に好ましい。 It is preferable to adjust the coating solution for forming a photosensitive layer so that the mass ratio of the polycarbonate resin to the solvent [polycarbonate resin / solvent] is 8/100 to 30/100. From the viewpoint of solubility with the charge transport material, 25/100 or less is more preferable, and 20/100 or less is more preferable. From the viewpoint of applicability, 10/100 or more is more preferable, and 12/100 or more is more preferable.
例えば、単層型感光体、及び機能分離型感光体の電荷輸送層の場合には、塗布液の固形分濃度を通常5質量%以上、好ましくは10質量%以上、また、通常40質量%以下、好ましくは35質量%以下の範囲とする。また、塗布液の粘度を使用時の温度において通常10mPa・s以上、好ましくは50mPa・s以上、また、通常500mPa・s以下、好ましくは400mPa・s以下の範囲とする。 For example, in the case of a charge transport layer of a single layer type photoreceptor or a function separation type photoreceptor, the solid content concentration of the coating solution is usually 5% by mass or more, preferably 10% by mass or more, and usually 40% by mass or less. The range is preferably 35% by mass or less. In addition, the viscosity of the coating solution is usually 10 mPa · s or higher, preferably 50 mPa · s or higher, and usually 500 mPa · s or lower, preferably 400 mPa · s or lower, at the temperature during use.
<感光層を形成する工程>
前記感光層形成用塗布液は導電性支持体上に浸漬塗布、スプレー塗布、ノズル塗布、バーコート、ロールコート、ブレード塗布等の公知の方法により、各層ごとに順次塗布・乾燥工程を繰り返すことにより形成される。感光層形成用塗布液の塗布方法としては、浸漬コーティング法、スプレーコーティング法、スピナーコーティング法、ビードコーティング法、ワイヤーバーコーティング法、ブレードコーティング法、ローラーコーティング法、エアーナイフコーティング法、カーテンコーティング法等が挙げられるが、効率性、生産性の観点から、浸漬コーティング法が好ましい。
塗布液の乾燥は、室温における指触乾燥後、通常30℃以上、200℃以下の温度範囲で、1分から2時間の間、静止又は送風下で加熱乾燥させることが好ましい。また、加熱温度は一定であってもよく、乾燥時に温度を変更させながら加熱を行っても良い。
<Process for forming photosensitive layer>
The coating solution for forming the photosensitive layer is formed by repeating coating and drying processes sequentially for each layer by a known method such as dip coating, spray coating, nozzle coating, bar coating, roll coating, blade coating on a conductive support. It is formed. As coating methods for the photosensitive layer forming coating solution, dip coating method, spray coating method, spinner coating method, bead coating method, wire bar coating method, blade coating method, roller coating method, air knife coating method, curtain coating method, etc. In view of efficiency and productivity, the dip coating method is preferable.
The coating solution is preferably dried by touching at room temperature, followed by heating or drying in a temperature range of usually 30 ° C. or more and 200 ° C. or less for 1 minute to 2 hours, while still or blowing. Further, the heating temperature may be constant, or heating may be performed while changing the temperature during drying.
[各層の形成方法]
上記した感光体を構成する各層は、含有させる物質を溶剤に溶解または分散させて得られた塗布液を、導電性支持体上に浸漬塗布、スプレー塗布、ノズル塗布、バーコート、ロールコート、ブレード塗布等の公知の方法により、各層ごとに順次塗布・乾燥工程を繰り返すことにより形成される。塗布液の作製に用いられる溶媒または分散媒に特に制限は無いが、具体例としては、テトラヒドロフラン、1,4−ジオキサン、1,3−ジオキソラン、ジメトキシメタン、ジメトキシエタン、アニソール等のエーテル類、ギ酸メチル、酢酸エチル等のエステル類、アセトン、メチルエチルケトン、シクロヘキサノン、4−メトキシ−4−メチル−2−ペンタノン等のケトン類、ベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジクロロメタン、クロロホルム、1,2−ジクロロエタン、1,1,2−トリクロロエタン、1,1,1−トリクロロエタン、テトラクロロエタン、1,2−ジクロロプロパン、トリクロロエチレン等の塩素化炭化水素類、n−ブチルアミン、イソプロパノールアミン、ジエチルアミン、トリエタノールアミン、エチレンジアミン、トリエチレンジアミン等の含窒素化合物類、アセトニトリル、N−メチルピロリドン、N,N−ジメチルホルムアミド、ジメチルスルホキシド等の非プロトン性極性溶剤類等が挙げられる。これらは1種を単独で用いてもよいし、2種以上を任意の組み合わせおよび種類で併用してもよい。また、環境負荷低減の観点から、非ハロゲン系溶媒が好ましい。
[Method for forming each layer]
Each layer constituting the above-described photoreceptor is formed by dip coating, spray coating, nozzle coating, bar coating, roll coating, blade coating on a conductive support obtained by dissolving or dispersing a substance to be contained in a solvent. It is formed by repeating a coating / drying step sequentially for each layer by a known method such as coating. There are no particular restrictions on the solvent or dispersion medium used for the preparation of the coating solution, but specific examples include ethers such as tetrahydrofuran, 1,4-dioxane, 1,3-dioxolane, dimethoxymethane, dimethoxyethane, anisole, and formic acid. Esters such as methyl and ethyl acetate, ketones such as acetone, methyl ethyl ketone, cyclohexanone and 4-methoxy-4-methyl-2-pentanone, aromatic hydrocarbons such as benzene, toluene and xylene, dichloromethane, chloroform, 1, Chlorinated hydrocarbons such as 2-dichloroethane, 1,1,2-trichloroethane, 1,1,1-trichloroethane, tetrachloroethane, 1,2-dichloropropane, trichloroethylene, n-butylamine, isopropanolamine, diethylamine, triethanol Ami , Ethylenediamine, nitrogen-containing compounds such as triethylenediamine, acetonitrile, N- methylpyrrolidone, N, N- dimethylformamide, aprotic polar solvents such as dimethyl sulfoxide and the like. These may be used individually by 1 type and may use 2 or more types together by arbitrary combinations and kinds. Moreover, a non-halogen solvent is preferable from the viewpoint of reducing environmental burden.
[塗布液の製造方法]
形成する層に含有させる物質を溶媒に溶解又は分散させて塗布液を得ることができる。例えば、積層型感光層の電荷輸送層の場合、以下の方法により製造することが可能である。即ち、電荷輸送材料、バインダー樹脂、必要に応じて併用するバインダー樹脂、添加剤等を、有機溶剤中に常温あるいは加温しながら攪拌、溶解し、必要に応じて任意のフィルターでろ過し、塗布液を調整する。この際、感光層の潤滑性、離型性を高める目的で不溶性の微粒子を添加する場合には、適当な分散手段によって分散液としても良い。
[Method for producing coating liquid]
A coating solution can be obtained by dissolving or dispersing a substance to be contained in a layer to be formed in a solvent. For example, in the case of a charge transport layer of a laminated photosensitive layer, it can be produced by the following method. That is, charge transport material, binder resin, binder resin used in combination as necessary, additives, etc. are stirred and dissolved in an organic solvent at room temperature or while heating, and filtered with an optional filter as necessary. Adjust the liquid. At this time, when insoluble fine particles are added for the purpose of improving the lubricity and releasability of the photosensitive layer, the dispersion may be prepared by an appropriate dispersing means.
[画像形成装置、カートリッジ]
図1に示すように、画像形成装置は、電子写真感光体1、帯電装置2、露光装置3、現像装置4を備えて構成され、さらに必要に応じて転写装置5、クリーニング装置6および定着装置7が設けられる。電子写真感光体1は前述した本発明の電子写真感光体であれば特に制限はないが、図1ではその一例として、円筒状の導電性支持体上に前述した感光層
形成用塗布液を塗布、形成したドラム状の電子写真感光体を示している。シート状支持体の表面に上述した感光層を形成し、超音波融着によってエンドレスベルト状とした感光体に使用した液体現像方式とすることも可能である。負帯電、正帯電のいずれの方式にも使用できる。上記ドラム状感光体1、帯電手段2、現像手段4及びクリーニング手段6等の構成要素の内の複数のものをドラムカートリッジとして一体に結合して構成し、このドラムカートリッジを複写機やレーザービームプリンタ等の電子写真装置本体に対して着脱可能な構成にしてもよい。
[Image forming apparatus, cartridge]
As shown in FIG. 1, the image forming apparatus includes an electrophotographic photosensitive member 1, a charging device 2, an exposure device 3, and a developing device 4, and further includes a transfer device 5, a cleaning device 6, and a fixing device as necessary. 7 is provided. The electrophotographic photosensitive member 1 is not particularly limited as long as it is the above-described electrophotographic photosensitive member of the present invention. In FIG. 1, as an example, the above-described photosensitive layer forming coating solution is applied onto a cylindrical conductive support. 2 shows a drum-shaped electrophotographic photosensitive member formed. It is also possible to adopt a liquid developing system used for a photoreceptor in which the above-described photosensitive layer is formed on the surface of a sheet-like support and is made into an endless belt by ultrasonic fusion. It can be used for either negative charging or positive charging. A plurality of components such as the drum-shaped photosensitive member 1, the charging unit 2, the developing unit 4, and the cleaning unit 6 are integrally combined as a drum cartridge, and the drum cartridge is configured as a copying machine or a laser beam printer. It may be configured to be detachable from the electrophotographic apparatus main body.
以下、実施例により本発明を更に詳細に説明するが、本発明は、その要旨を超えない限り、以下の実施例により限定されるものではない。 なお、下記記載中、「部」は「質量
部」を表わす。
EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited by a following example, unless the summary is exceeded. In the following description, “part” represents “part by mass”.
<ポリカーボネート樹脂の製造>
[製造例1]ビスフェノール−A−ポリカーボネートの合成(溶融法)
2,2−ビス(4−ヒドロキシフェニル)プロパン(以下、「BPA」と略記する場合がある。)(本州化学社製)37.60kg(約147mol)とジフェニルカーボネート(DPC)32.20kg(約150mol)に、炭酸セシウムの水溶液を、炭酸セシウムがBPC1mol当たり2μmolとなるように添加して混合物を調整した。次に該混合物を、攪拌機、熱媒ジャケット、真空ポンプ、還流冷却器を具備した内容量200Lの第1反応器に投入した。次に、第1反応器内を1.33kPa(10Torr)に減圧
し、続いて、窒素で大気圧に復圧する操作を5回繰り返し、第1反応器の内部を窒素置換した。窒素置換後、熱媒ジャケットに温度230℃の熱媒を通じて第1反応器の内温を徐々に昇温させ、混合物を溶解させた。その後、300rpmで撹拌機を回転させ、熱媒ジャケット内の温度をコントロールして、第1反応器の内温を220℃に保った。そして、第1反応器の内部で行われるBPCとDPCのオリゴマー化反応により副生するフェノールを留去しながら、40分間かけて第1反応器内の圧力を絶対圧で101.3kPa(760Torr)から13.3kPa(100Torr)まで減圧した。 続いて、第1
反応器内の圧力を13.3kPaに保持し、フェノールをさらに留去させながら、80分間、エステル交換反応を行った。
<Manufacture of polycarbonate resin>
[Production Example 1] Synthesis of bisphenol-A-polycarbonate (melting method)
2,2-bis (4-hydroxyphenyl) propane (hereinafter sometimes abbreviated as “BPA”) (Honshu Chemical Co., Ltd.) 37.60 kg (about 147 mol) and diphenyl carbonate (DPC) 32.20 kg (about 150 mol), an aqueous solution of cesium carbonate was added so that the amount of cesium carbonate was 2 μmol per 1 mol of BPC to prepare a mixture. Next, the mixture was charged into a first reactor having an internal volume of 200 L equipped with a stirrer, a heating medium jacket, a vacuum pump, and a reflux condenser. Next, the operation of depressurizing the inside of the first reactor to 1.33 kPa (10 Torr) and then restoring the pressure to the atmospheric pressure with nitrogen was repeated 5 times, and the inside of the first reactor was replaced with nitrogen. After nitrogen substitution, the internal temperature of the first reactor was gradually raised through a heat medium having a temperature of 230 ° C. through the heat medium jacket to dissolve the mixture. Then, the stirrer was rotated at 300 rpm, the temperature in the heating medium jacket was controlled, and the internal temperature of the first reactor was kept at 220 ° C. The pressure in the first reactor was 101.3 kPa (760 Torr) in absolute pressure over 40 minutes while distilling off phenol produced as a by-product by the oligomerization reaction of BPC and DPC performed in the first reactor. To 13.3 kPa (100 Torr). Next, the first
The pressure in the reactor was maintained at 13.3 kPa, and a transesterification reaction was performed for 80 minutes while further distilling off phenol.
その後、系内を窒素で絶対圧で101.3kPaに復圧の上、ゲージ圧で0.2MPaまで昇圧し、予め200℃以上に加熱した移送配管を経由して、第1反応器内のオリゴマーを、第2反応器に圧送した。尚、第2反応器は内容量200Lであり、攪拌機、熱媒ジャケット、真空ポンプ並びに還流冷却管を具備しており、内圧は大気圧、内温は240℃に制御していた。次に、第2反応器内に圧送したオリゴマーを38rpmで攪拌し、熱媒ジャケットにて内温を昇温し、第2反応器内を40分かけて絶対圧で101.3kPaから13.3kPaまで減圧した。その後、昇温を継続し、さらに40分かけて、内圧を絶対圧で13.3kPaから399Pa(3Torr)まで減圧し、留出するフェノールを系外に除去した。さらに、昇温を続け、第2反応器内の絶対圧が70Pa(約0.5Torr)に到達後、70Paを保持し、重縮合反応を行った。第2反応器内の最終的な内部温度は285℃であった。第2反応器の攪拌機が予め定めた所定の攪拌動力となったときに、重縮合反応を終了した。 Thereafter, the inside of the system was restored to the absolute pressure of 101.3 kPa with nitrogen, the gauge pressure was increased to 0.2 MPa, and the oligomer in the first reactor was passed through a transfer pipe heated to 200 ° C. or higher in advance. Was pumped to the second reactor. The second reactor had an internal volume of 200 L, was equipped with a stirrer, a heat medium jacket, a vacuum pump and a reflux condenser, and the internal pressure was controlled to atmospheric pressure and the internal temperature was controlled to 240 ° C. Next, the oligomer fed into the second reactor was stirred at 38 rpm, the internal temperature was raised with a heating medium jacket, and the inside of the second reactor was absolute pressure from 101.3 kPa to 13.3 kPa over 40 minutes. The pressure was reduced to. Thereafter, the temperature increase was continued, and the internal pressure was reduced from 13.3 kPa to 399 Pa (3 Torr) as an absolute pressure over an additional 40 minutes, and phenol distilled out was removed out of the system. Further, the temperature was continuously raised, and after the absolute pressure in the second reactor reached 70 Pa (about 0.5 Torr), the pressure was maintained at 70 Pa, and a polycondensation reaction was performed. The final internal temperature in the second reactor was 285 ° C. The polycondensation reaction was completed when the stirrer of the second reactor reached a predetermined stirring power.
次いで、第2反応器内を、窒素により絶対圧で101.3kPaに復圧の上、ゲージ圧で0.2MPaまで昇圧し、第2反応器の槽底からポリカーボネート樹脂をストランド状で抜き出し、水槽で冷却しながら、回転式カッターを使用してペレット化した。得られたポリカーボネート樹脂の粘度平均分子量は25,000であった。 Next, the inside of the second reactor is restored to 101.3 kPa in absolute pressure with nitrogen, and the gauge pressure is increased to 0.2 MPa, and the polycarbonate resin is extracted in a strand form from the bottom of the second reactor, The mixture was pelletized by using a rotary cutter while being cooled at the same time. The resulting polycarbonate resin had a viscosity average molecular weight of 25,000.
[製造例2]ビスフェノール−C−ポリカーボネートの合成(溶融法)
製造例1において、BPAに代えて、2,2−ビス(4−ヒドロキシ-3−メチルフェ
ニル)プロパン(以下、「BPC」と略記する場合がある。)を使用した以外は、製造例1と同様にポリカーボネート樹脂(B)を製造した。粘度平均分子量は26,000であった。
[Production Example 2] Synthesis of bisphenol-C-polycarbonate (melting method)
In Production Example 1, Production Example 1 was used except that 2,2-bis (4-hydroxy-3-methylphenyl) propane (hereinafter sometimes abbreviated as “BPC”) was used instead of BPA. Similarly, a polycarbonate resin (B) was produced. The viscosity average molecular weight was 26,000.
[製造例3]ポリカーボネート樹脂(A)とポリカーボネート樹脂(B)の樹脂組成物
製造例1のようにして得られたビスフェノール−A−ポリカーボネート樹脂(A)を15部、ビスフェノール−B−ポリカーボネート樹脂(B)を85部で配合し、二軸押出機(日本製鋼所社製「TEX30XCT」)により、バレル温度290℃で混練し、ポリカーボネート樹脂組成物ペレット(C)を得た。
[Production Example 3] Resin composition of polycarbonate resin (A) and polycarbonate resin (B) 15 parts of bisphenol-A-polycarbonate resin (A) obtained as in Production Example 1 and bisphenol-B-polycarbonate resin ( B) was blended in 85 parts, and kneaded at a barrel temperature of 290 ° C. by a twin-screw extruder (“TEX30XCT” manufactured by Nippon Steel Works) to obtain a polycarbonate resin composition pellet (C).
[製造例4]ビスフェノール−C−ポリカーボネートの合成(溶剤法)
BPC(本州化学社製)13.80kg/時、水酸化ナトリウム(NaOH)5.8kg/時及び水93.5kg/時を、ハイドロサルファイト0.017kg/時の存在下に、35℃で溶解した後、25℃に冷却した水相と5℃に冷却した塩化メチレン61.9kg/時の有機相とを、各々内径6mm、外径8mmのフッ素樹脂製配管に供給し、これに接続する内径6mm、長さ34mのフッ素樹脂製パイプリアクターにおいて、ここに別途導入される0℃に冷却した液化ホスゲン7.2kg/時と接触させた。
[Production Example 4] Synthesis of bisphenol-C-polycarbonate (solvent method)
BPC (Honshu Chemical Co., Ltd.) 13.80 kg / hr, sodium hydroxide (NaOH) 5.8 kg / hr and water 93.5 kg / hr were dissolved at 35 ° C. in the presence of hydrosulfite 0.017 kg / hr After that, an aqueous phase cooled to 25 ° C. and an organic phase of 61.9 kg / hour of methylene chloride cooled to 5 ° C. are supplied to a fluororesin pipe having an inner diameter of 6 mm and an outer diameter of 8 mm, respectively. In a fluororesin pipe reactor having a length of 6 mm and a length of 34 m, the reactor was brought into contact with 7.2 kg / hour of liquefied phosgene cooled to 0 ° C. separately introduced here.
上記原料は、ホスゲンとパイプリアクター内を1.7m/秒の線速度にて20秒間流通する間に、ホスゲン化、オリゴマー化反応が行われる。このとき、反応温度は、断熱系で塔頂温度60℃に達した。反応物の温度は、次のオリゴマー化槽に入る前に35℃まで外部冷却を行い調節した。オリゴマー化に際し、触媒としてトリエチルアミン5g/時(BPC1molに対して0.9×10-3mol)、分子量調節剤としてp−t−ブチルフェノール0.153kg/時を用い、これらは各々、オリゴマー化槽に導入した。 The raw material is subjected to phosgenation and oligomerization reaction while flowing through phosgene and a pipe reactor at a linear velocity of 1.7 m / second for 20 seconds. At this time, the reaction temperature reached a tower top temperature of 60 ° C. in the heat insulation system. The temperature of the reaction product was adjusted by external cooling to 35 ° C. before entering the next oligomerization tank. In the oligomerization, triethylamine 5 g / hour (0.9 × 10 −3 mol relative to 1 mol of BPC) was used as a catalyst, and pt-butylphenol 0.153 kg / hour was used as a molecular weight regulator. Introduced.
この様にして、パイプリアクターより得られるオリゴマー化された乳濁液を、さらに内容積50リットルの撹拌機付き反応槽に導き、窒素ガス(N2)雰囲気下30℃で撹拌し
、オリゴマー化することで、水相中に存在する未反応のBPCのナトリウム塩(BPC−Na)を消費させ、その後、水相と油相を静置分離し、オリゴマーの塩化メチレン溶液を得た。
In this way, the oligomerized emulsion obtained from the pipe reactor is further guided to a reaction vessel equipped with a stirrer having an internal volume of 50 liters and stirred at 30 ° C. in a nitrogen gas (N 2) atmosphere to be oligomerized. Then, unreacted sodium salt of BPC (BPC-Na) present in the aqueous phase was consumed, and then the aqueous phase and the oil phase were allowed to stand and separate to obtain an oligomeric methylene chloride solution.
上記オリゴマーの塩化メチレン溶液のうち、23kgを、内容積70Lのファウドラー翼付き反応槽に仕込み、これに希釈用塩化メチレン10kgを追加し、さらに25質量%水酸化ナトリウム水溶液2.2kg、水6kg及びトリエチルアミン2.2g(BPC1molに対して1.1×10-3mol)を加え、窒素ガス雰囲気下30℃で撹拌し、60分間重縮合反応を行ってポリカーボネート樹脂を得た。 Of the above methylene chloride solution of oligomer, 23 kg was charged into a reaction vessel equipped with an internal volume of 70 L, Faudler blade, and 10 kg of methylene chloride for dilution was added thereto, and further 25 kg of 25% by weight sodium hydroxide aqueous solution, 6 kg of water and 2.2 g of triethylamine (1.1 × 10 −3 mol relative to 1 mol of BPC) was added, and the mixture was stirred at 30 ° C. in a nitrogen gas atmosphere, and a polycondensation reaction was performed for 60 minutes to obtain a polycarbonate resin.
次いで、塩化メチレン30kg及び水7kgを加え、20分間撹拌した後、撹拌を停止し、水相と有機相を分離した。分離した有機相に、0.1N塩酸20kgを加え15分間撹拌し、トリエチルアミン及び小量残存するアルカリ成分を抽出した後、撹拌を停止し、水相と有機相を分離した。
更に、分離した有機相に、純水20kgを加え、15分間撹拌した後、撹拌を停止し、水相と有機相を分離した。この操作を抽出排水中の塩素イオンが検出されなくなるまで(3回)繰り返した。得られた精製された有機相を、40℃温水中にフィードすることで粉化し、乾燥後、ポリカーボネート樹脂のフレーク状粉末を得た。粘度平均分子量は30,000であった。
Next, 30 kg of methylene chloride and 7 kg of water were added, and after stirring for 20 minutes, stirring was stopped and the aqueous phase and the organic phase were separated. To the separated organic phase, 20 kg of 0.1N hydrochloric acid was added and stirred for 15 minutes to extract triethylamine and a small amount of remaining alkali component, and then stirring was stopped to separate the aqueous phase and the organic phase.
Further, 20 kg of pure water was added to the separated organic phase, and the mixture was stirred for 15 minutes, and then the stirring was stopped to separate the aqueous phase and the organic phase. This operation was repeated (three times) until no chlorine ions were detected in the extracted waste water. The obtained purified organic phase was pulverized by feeding into 40 ° C. warm water and dried to obtain a flaky powder of polycarbonate resin. The viscosity average molecular weight was 30,000.
<感光体の製造および評価>
[実施例1]
感光体用の塗布液を、下記のように製造した。
[下引き層形成用塗布液の製造]
下引き層形成用塗布液は以下のように作製した。平均一次粒子径40nmのルチル型酸化チタン(石原産業社製「TTO55N」)と、該酸化チタンに対して3質量%のメチルジメトキシシラン(東芝シリコーン社製「TSL8117」)とを、ヘンシェルミキサーにて混合して得られた表面処理酸化チタンを、メタノール/1−プロパノールの重量比が7/3の混合溶媒中でボールミルにより分散させることにより、表面処理酸化チタンの分散スラリーとした。該分散スラリーと、メタノール/1−プロパノール/トルエンの混合溶媒及び、ε−カプロラクタム/ビス(4−アミノ−3−メチルシクロヘキシル)メタン/ヘキサメチレンジアミン/デカメチレンジカルボン酸/オクタデカメチレンジカルボン酸の組成モル比率が、60%/15%/5%/15%/5%からなる共重合ポリアミドのペレットとを加熱しながら撹拌、混合してポリアミドペレットを溶解させた後、超音波分散処理を行なうことにより、メタノール/1−プロパノール/トルエンの重量比が7/1/2で、表面処理酸化チタン/共重合ポリアミドを重量比3/1で含有する、固形分濃度18.0%の下引き層形成用塗布液を作製した。
<Manufacture and evaluation of photoconductor>
[Example 1]
A coating solution for a photoreceptor was produced as follows.
[Manufacture of coating solution for forming undercoat layer]
The undercoat layer forming coating solution was prepared as follows. Rutile type titanium oxide having an average primary particle diameter of 40 nm (“TTO55N” manufactured by Ishihara Sangyo Co., Ltd.) and 3% by mass of methyldimethoxysilane (“TSL8117” manufactured by Toshiba Silicone Co., Ltd.) with respect to the titanium oxide were used in a Henschel mixer The surface-treated titanium oxide obtained by mixing was dispersed by a ball mill in a mixed solvent having a methanol / 1-propanol weight ratio of 7/3 to obtain a surface-treated titanium oxide dispersed slurry. Composition of the dispersion slurry, a mixed solvent of methanol / 1-propanol / toluene, and ε-caprolactam / bis (4-amino-3-methylcyclohexyl) methane / hexamethylenediamine / decamethylenedicarboxylic acid / octadecamethylenedicarboxylic acid The copolyamide pellets with a molar ratio of 60% / 15% / 5% / 15% / 5% are stirred and mixed with heating to dissolve the polyamide pellets, and then subjected to ultrasonic dispersion treatment. To form a subbing layer with a solid content concentration of 18.0%, containing a methanol / 1-propanol / toluene weight ratio of 7/1/2 and a surface-treated titanium oxide / copolymerized polyamide at a weight ratio of 3/1. A coating solution was prepared.
[電荷発生層形成用塗布液の製造]
電荷発生層形成用塗布液は以下のように作製した。電荷発生物質として、CuKα線によるX線回折においてブラッグ角(2θ±0.2)が27.3゜に強い回折ピークを示す、Y型(別称D型)オキシチタニウムフタロシアニン20部と1,2−ジメトキシエタン280部とを混合し、サンドグラインドミルで1時間粉砕して微粒化分散処理を行なった。続いてこの微細化処理液に、ポリビニルブチラール(電気化学工業(株)製、商品名「デンカブチラール」#6000C)10部を、1,2−ジメトキシエタンの255部と4−メトキシ−4−メチル−2−ペンタノンの85部との混合液に溶解させて得られたバインダー液、及び230部の1,2−ジメトキシエタンを混合して電荷発生層形成用塗布液Lを調製した。
[Manufacture of coating solution for forming charge generation layer]
The charge generation layer forming coating solution was prepared as follows. As a charge generation material, 20 parts of Y-type (also known as D-type) oxytitanium phthalocyanine and 1,2- 1, which show a strong diffraction peak at 27.3 ° in the Bragg angle (2θ ± 0.2) in X-ray diffraction by CuKα rays. 280 parts of dimethoxyethane were mixed and pulverized with a sand grind mill for 1 hour for atomization dispersion treatment. Subsequently, 10 parts of polyvinyl butyral (trade name “Denka Butyral” # 6000C, manufactured by Denki Kagaku Kogyo Co., Ltd.) was added to 255 parts of 1,2-dimethoxyethane and 4-methoxy-4-methyl. A binder liquid obtained by dissolving in 85 parts of 2-pentanone and 230 parts of 1,2-dimethoxyethane were mixed to prepare a coating solution L for forming a charge generation layer.
[電荷輸送層形成用塗布液Aの製造]
電荷輸送層形成用塗布液は以下のように作製した。下記の電荷輸送材料CTを35部、前記ポリカーボネート樹脂組成物(C)ペレットを100部、酸化防止剤として、チバスペシャルティーケミカルズ社製、商品名IRGANOX1076を8重量部、レベリング剤としてシ
リコーンオイル0.05部をテトラヒドロフラン(以下適宜THFと略)とトルエン(以下適宜TLと略)の混合溶媒(THF70重量%、TL 30重量%)572部に混合し
、電荷輸送層形成用塗布液を調製した。
[Manufacture of Coating Solution A for Charge Transport Layer Formation]
The charge transport layer forming coating solution was prepared as follows. 35 parts of the following charge transport material CT, 100 parts of the above-mentioned polycarbonate resin composition (C) pellets, 8 parts by weight of IRGANOX 1076 manufactured by Ciba Specialty Chemicals Co., Ltd. as an antioxidant, and 0. 1 of silicone oil as a leveling agent. 05 parts was mixed with 572 parts of a mixed solvent (THF 70 wt%, TL 30 wt%) of tetrahydrofuran (hereinafter abbreviated as THF as appropriate) and toluene (hereinafter abbreviated as TL as appropriate) to prepare a coating solution for forming a charge transport layer.
[感光体の製造]
直径30mm、長さ246mm、肉厚0.75mmの3003系アルミニウム合金製チューブ上に、前記のように得られた下引き層形成用塗布液を、乾燥後の膜厚が約1.5μmになるように浸漬塗布し、室温で乾燥して下引き層を設けた。続いて、前記のようにして得られた電荷発生層形成用塗布液を、上記下引層上に、乾燥後の膜厚が約0.3μmになるように浸漬塗布し、室温で乾燥して電荷発生層を設けた。前記のようにして得られた
電荷輸送層形成用塗布液Aを、前記電荷発生層上に、乾燥後の膜厚が約18μmになるように浸漬塗布し、125°で20分間乾燥し、感光体(D)を製造した。
[Manufacture of photoconductor]
On the 3003 series aluminum alloy tube having a diameter of 30 mm, a length of 246 mm, and a wall thickness of 0.75 mm, the coating film for forming the undercoat layer obtained as described above has a film thickness after drying of about 1.5 μm. In this way, it was dip coated and dried at room temperature to provide an undercoat layer. Subsequently, the charge generation layer forming coating solution obtained as described above is dip-coated on the undercoat layer so that the film thickness after drying is about 0.3 μm, and dried at room temperature. A charge generation layer was provided. The charge transport layer forming coating solution A obtained as described above is dip-coated on the charge generation layer so that the film thickness after drying is about 18 μm, dried at 125 ° for 20 minutes, and photosensitive Body (D) was produced.
<画像試験>
感光体Dを、沖データ製タンデムフルカラープリンタ C3100(DCローラー帯電
、LED露光、接触非磁性一成分現像)の感光体カートリッジに搭載して、気温23℃、相対湿度50%下において、印字率5%で、10000枚の連続印字を行った。その結果、感光体Dは安定した画像濃度で、画質は良好であった。
<Image test>
The photoconductor D is mounted on a photoconductor cartridge of a tandem full-color printer C3100 (DC roller charging, LED exposure, contact non-magnetic single component development) manufactured by Oki Data, and the printing rate is 5 at a temperature of 23 ° C. and a relative humidity of 50%. %, Continuous printing of 10,000 sheets was performed. As a result, the photoconductor D had a stable image density and good image quality.
[比較例1]
電荷輸送層形成用塗布液Aの製造において、ポリカーボネート樹脂組成物(C)に代えて、製造例1の溶融法で得られた、ビスフェノール−A−ポリカーボネート樹脂(A)を15部、ビスフェノール−C−ポリカーボネート樹脂(B)85部を、溶融混練せずにそのまま用いた以外は実施例1と同様に混合したところ、ビスフェノール−A−ポリカーボネート樹脂(A)が溶解せず、電荷輸送層形成用塗布液を得ることが出来なかった。
[Comparative Example 1]
In the production of the coating liquid A for forming a charge transport layer, in place of the polycarbonate resin composition (C), 15 parts of bisphenol-A-polycarbonate resin (A) obtained by the melting method of Production Example 1 was obtained. -85 parts of the polycarbonate resin (B) was mixed in the same manner as in Example 1 except that it was used as it was without being melt kneaded. As a result, the bisphenol-A-polycarbonate resin (A) was not dissolved and the charge transport layer coating was applied. The liquid could not be obtained.
上記の結果より、ビスフェノール−A−ポリカーボネート樹脂(A)とビスフェノール−C−ポリカーボネート樹脂(B)を溶融混練のよる組成物ペレットにすることで、非ハロゲン溶媒で電子写真感光体用の塗布液を調液することが出来、その塗布液を塗布することにより製造された電子写真感光体は、良好な特性を示すことが分かった。 From the above results, a coating solution for an electrophotographic photosensitive member can be prepared with a non-halogen solvent by forming a composition pellet by melt-kneading bisphenol-A-polycarbonate resin (A) and bisphenol-C-polycarbonate resin (B). It has been found that the electrophotographic photosensitive member that can be prepared and applied by applying the coating solution exhibits good characteristics.
[比較例2]
電荷輸送層形成用塗布液Aの製造において、ポリカーボネート樹脂組成物(C)に代えて、製造例1の溶融法で得られたビスフェノール−A−ポリカーボネート樹脂(A)を15部、製造例4の溶剤法で得られたビスフェノール−C−ポリカーボネート樹脂(B)85部を、溶融混練せずにそのまま用いた以外は実施例1と同様に混合したところ、ビスフェノール−A−ポリカーボネート樹脂(A)が溶解せず、電荷輸送層形成用塗布液を得ることが出来なかった。
[Comparative Example 2]
In the production of the coating liquid A for forming a charge transport layer, in place of the polycarbonate resin composition (C), 15 parts of the bisphenol-A-polycarbonate resin (A) obtained by the melting method of Production Example 1 were used. When 85 parts of bisphenol-C-polycarbonate resin (B) obtained by the solvent method was mixed as in Example 1 except that it was used as it was without being melt-kneaded, bisphenol-A-polycarbonate resin (A) was dissolved. Thus, a coating liquid for forming a charge transport layer could not be obtained.
[比較例3]
電荷輸送層形成用塗布液Aの製造において、ポリカーボネート樹脂組成物(C)に代えて、製造例2の溶融法で得られたビスフェノール−C−ポリカーボネート樹脂(B)を15部、溶剤法による市販のビスフェノール−A−ポリカーボネート樹脂(A)(三菱エンジニアプラスチック社製 E−2000(粘度平均分子量22,000))85部を、溶融混練せずにそのまま用いた以外は実施例1と同様に混合したところ、ビスフェノール−A−ポリカーボネート樹脂(A)が溶解せず、電荷輸送層形成用塗布液を得ることが出来なかった。
[Comparative Example 3]
In the production of the coating liquid A for forming a charge transport layer, in place of the polycarbonate resin composition (C), 15 parts of bisphenol-C-polycarbonate resin (B) obtained by the melting method of Production Example 2 is commercially available by a solvent method. 85 parts of bisphenol-A-polycarbonate resin (A) (E-2000 (viscosity average molecular weight 22,000) manufactured by Mitsubishi Engineer Plastics) was mixed in the same manner as in Example 1 except that it was used as it was without being melt kneaded. However, the bisphenol-A-polycarbonate resin (A) was not dissolved, and a coating liquid for forming a charge transport layer could not be obtained.
[比較例4]
電荷輸送層形成用塗布液Aの製造において、ポリカーボネート樹脂組成物(C)に代えて、製造例1の溶融法で得られたビスフェノール−A−ポリカーボネート樹脂(A)を100部を用いた以外は実施例1と同様に混合したところ、ビスフェノール−A−ポリカーボネート樹脂(A)が溶解せず、電荷輸送層形成用塗布液を得ることが出来なかった。
[Comparative Example 4]
Except for using 100 parts of the bisphenol-A-polycarbonate resin (A) obtained by the melting method of Production Example 1 instead of the polycarbonate resin composition (C) in the production of the coating liquid A for forming a charge transport layer. When mixed in the same manner as in Example 1, the bisphenol-A-polycarbonate resin (A) was not dissolved, and a charge transport layer forming coating solution could not be obtained.
1 感光体(電子写真感光体)
2 帯電装置(帯電ローラ;帯電部)
3 露光装置(露光部)
4 現像装置(現像部)
5 転写装置
6 クリーニング装置(クリーニング部)
7 定着装置
41 現像槽
42 アジテータ
43 供給ローラー
44 現像ローラー
45 規制部材
71 上部定着部材(加圧ローラー)
72 下部定着部材(定着ローラー)
73 加熱装置
T トナー
P 記録紙(用紙,媒体)
1 Photoconductor (Electrophotographic photoconductor)
2 Charging device (charging roller; charging unit)
3 Exposure equipment (exposure section)
4 Development device (development unit)
5 Transfer device 6 Cleaning device (cleaning part)
7 Fixing
72 Lower fixing member (fixing roller)
73 Heating device T Toner P Recording paper (paper, medium)
Claims (3)
方法が、
炭酸ジエステルと芳香族ジヒドロキシ化合物とのエステル交換反応によって生成する、
下記式(1)で表される構造単位を有するポリカーボネート樹脂(A)及び下記式(2)
で表される構造単位を有するポリカーボネート樹脂(B)を溶融混練して樹脂組成物を調
製する工程、
非ハロゲン溶媒を用いて、該樹脂組成物を含有する感光層形成用塗布液を調製する工程
、
該感光層形成用塗布液を用いて感光層を形成する工程、
を有することを特徴とする電子写真感光体の製造方法。
Produced by a transesterification reaction between a carbonic acid diester and an aromatic dihydroxy compound.
Polycarbonate resin (A) having a structural unit represented by the following formula (1) and the following formula (2)
A step of preparing a resin composition by melt-kneading a polycarbonate resin (B) having a structural unit represented by:
Using a non-halogen solvent to prepare a coating solution for forming a photosensitive layer containing the resin composition;
Forming a photosensitive layer using the coating solution for forming a photosensitive layer;
A process for producing an electrophotographic photosensitive member, comprising:
樹脂(A)及びポリカーボネート樹脂(B)の合計含有量に対して質量比で5%〜25%
であることを特徴とする、請求項1に記載の電子写真感光体の製造方法。 Content of the polycarbonate resin (A) in the resin composition is 5% to 25% by weight ratio to the total amount of the polycarbonate resin (A)及Beauty port polycarbonate resin (B)
The method for producing an electrophotographic photosensitive member according to claim 1, wherein:
物と、下記一般式(4)で表される炭酸ジエステルとを、触媒の存在下、重縮合により得
られるポリカーボネート樹脂であり、前記ポリカーボネート樹脂(B)が、下記式(5)
で表される芳香族ジヒドロキシ化合物と、下記一般式(4)で表される炭酸ジエステルと
を、触媒の存在下、重縮合により得られるポリカーボネート樹脂であることを特徴とする
、請求項1又は2記載の電子写真感光体の製造方法。
18の脂肪族基、又は、置換基を有していてもよい芳香族基を表す。) The polycarbonate resin (A) is obtained by polycondensation of an aromatic dihydroxy compound represented by the following formula (3) and a carbonic acid diester represented by the following general formula (4) in the presence of a catalyst. And the polycarbonate resin (B) is represented by the following formula (5):
A polycarbonate resin obtained by polycondensation of an aromatic dihydroxy compound represented by the following general formula (4) and a carbonic acid diester represented by the following general formula (4) in the presence of a catalyst: A method for producing the electrophotographic photosensitive member according to claim.
18 aliphatic groups or an aromatic group which may have a substituent is represented. )
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Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0822133A (en) * | 1975-08-01 | 1996-01-23 | Mitsubishi Chem Corp | Electrophotographic photoreceptor |
| JP2692105B2 (en) * | 1988-02-15 | 1997-12-17 | ミノルタ株式会社 | Laminated photoconductor |
| JPH06308757A (en) * | 1993-04-19 | 1994-11-04 | Mitsubishi Kasei Corp | Electrophotographic photoreceptor and method for producing the electrophotographic photoreceptor |
| JPH1081737A (en) * | 1996-09-05 | 1998-03-31 | Nippon Steel Chem Co Ltd | Resin composition, method for producing the same, and coating film or electrophotographic photosensitive member using the same |
| JP3531499B2 (en) * | 1998-06-25 | 2004-05-31 | 富士ゼロックス株式会社 | Electrophotographic photoreceptor and electrophotographic apparatus using high molecular weight polycarbonate |
| JP2004021045A (en) * | 2002-06-18 | 2004-01-22 | Mitsubishi Chemicals Corp | Electrophotographic photoreceptor |
| CN103109236B (en) * | 2010-09-14 | 2015-03-25 | 佳能株式会社 | Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus, and method of manufacturing electrophotographic photosensitive member |
| JP5522090B2 (en) * | 2011-03-03 | 2014-06-18 | 三菱化学株式会社 | Electrophotographic photosensitive member, process cartridge, and image forming apparatus |
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