JP6355960B2 - CLINICAL INSPECTION DEVICE AND CONTAINER CLEANING METHOD - Google Patents

Description

  Embodiments described herein relate generally to a clinical testing apparatus and a container cleaning method.

  A clinical test is performed in order to objectively evaluate the state of a subject such as a patient. A clinical laboratory apparatus is mainly used for this clinical examination. An example of a clinical examination apparatus is an automatic analyzer.

  The automatic analyzer is intended for test items such as biochemical test items and immunological test items, and it mixes samples such as blood and urine collected from the subject (hereinafter also referred to as samples) and reagents for each test item. Changes in color tone and turbidity caused by the reaction of the liquid are optically measured by a measuring unit such as a spectrophotometer or a turbidimetric meter. In response to the result obtained by the measurement by the measurement unit, the automatic analyzer generates analysis data represented by the concentration of various test item components in the sample, the activity of the enzyme, and the like. The mixed liquid after the measurement becomes waste liquid, and this waste liquid is discharged outside the automatic analyzer.

  The automatic analyzer cleans the reaction vessel used for the measurement and repeatedly uses them. The reaction vessel is cleaned by a cleaning device. The cleaning device performs a cleaning operation for cleaning the inner wall of the reaction container with respect to the reaction container moved to a predetermined reaction container cleaning position. This cleaning operation includes a cleaning operation for sucking and discharging the stored waste liquid, and a cleaning operation for discharging the cleaning liquid into the reaction vessel and suctioning the discharged cleaning liquid. Here, the cleaning liquid includes a cleaning detergent, cleaning water, and the like. The cleaning device further performs a drying operation for drying the inner wall of the reaction vessel with respect to the inner wall of the reaction vessel. Hereinafter, the reaction container may be simply referred to as “container”. In addition, the mixed liquid, waste liquid, and the like may be collectively referred to as “liquid”.

  Thus, the reaction vessel is repeatedly washed by the washing device. This washing is performed so that no residue remains on the entire inner wall of the reaction vessel. Thereby, normal analysis data can be obtained by generating a new mixed solution in the washed reaction vessel and measuring the mixed solution.

JP 2009-115661 A

  However, even if the entire inner wall of the reaction vessel is cleaned, residues may adhere to the cleaned inner wall. This residue includes waste liquid, cleaning liquid, and the like. When a new mixed solution is generated in the reaction vessel with the residue attached to the inner wall, the residue is mixed into this mixed solution. When this mixed solution is subjected to absorption measurement, abnormal analysis data may be generated.

  In order to maintain high reliability of measurement, it is necessary to prevent the residue from adhering to the inner wall of the reaction vessel used when the mixed solution is generated. Therefore, it is necessary to keep the performance of the cleaning device for cleaning the inner wall of the reaction vessel high.

  This embodiment is intended to solve the above-described problems, and an object thereof is to provide a clinical laboratory test apparatus and a container cleaning method capable of maintaining high measurement reliability.

In order to solve the above-described problems, the clinical examination apparatus according to this embodiment includes a measurement unit, a drive unit, a cleaning device, a cleaning device drive unit, and a control unit. A measurement part measures the component of the liquid dispensed to the container in a measurement position. The drive unit is a cleaning position that cleans the liquid, including the rising part of the liquid adhering to the tube wall, after the measurement is completed and the liquid that has become waste is discharged, and then rises along the tube wall of the container Move the container to The cleaning device is provided at a cleaning position, and supplies a cleaning liquid from the outside to the container to perform the first cleaning, and supplies a rinsing liquid from the outside to the container to perform the second cleaning. And a second cleaning unit. The cleaning device drive unit drives the first cleaning unit and the second cleaning unit so as to supply the cleaning liquid and the rinsing liquid, respectively, into the container. The controller performs the second cleaning after the first cleaning, and the first position where the cleaning liquid contacts the inner wall of the container in the first cleaning is the same as or lower than the position of the liquid level of the waste liquid, and In the second cleaning, the drive unit and the cleaning device drive unit are controlled so that the second position where the rinsing liquid comes into contact with the inner wall of the container is higher than the first position and includes the rising portion of the waste liquid. .

The block diagram which shows the whole structure of the automatic analyzer which concerns on embodiment. The figure which shows the detail of a structure of an analysis part, and the control structure of an analysis part. The figure which showed an example of the structure of a washing | cleaning apparatus. The block diagram of the washing | cleaning apparatus for wash | cleaning a reaction container. The figure which showed a series of washing | cleaning operation | movement with the washing | cleaning liquid supplied to each reaction container. The figure which showed a series of washing | cleaning operation | movement with the washing | cleaning liquid supplied to each reaction container. The figure which showed a series of washing | cleaning operation | movement with the washing | cleaning liquid supplied to each reaction container.

  The configuration of the automatic analyzer 10 will be described with reference to FIGS. FIG. 1 is a block diagram showing the overall configuration of the automatic analyzer 10.

[Overall configuration of automatic analyzer]
As shown in FIG. 1, the automatic analyzer 10 includes an analysis unit 24, a drive control unit 25, a data processing unit 30, a system control unit 70, an operation unit 80, an output unit 40, and a storage unit 50. Have

[Data processing section]
The data processing unit 30 includes a calculation unit 31 and a data storage unit 32. The calculation unit 31 receives the measurement result output from the analysis unit 24, calculates the concentration of the specific substance in the mixed solution, and creates analysis data, calibration data, and the like. The data storage unit 32 temporarily stores these data.

[System controller]
The system control unit 70 controls the drive control unit 25, the data processing unit 30, and the output unit 40 in an integrated manner. The operation unit 80 inputs various command signals to the system control unit 70.

[Output section]
The output unit 40 outputs information received from the data processing unit 30, the operation unit 80, and the like to the outside through print output, display output, a network, and the like based on control of the system control unit 70. For example, the display unit 41 and the printing unit 42 are used for this external output. Examples of the information received by the output unit 40 include various data generated by the data processing unit 30, reaction curves, and the like. Further, information received by the output unit 40 includes information on operation input input from the operation unit 80.

(Operation section)
Examples of the operation unit 80 include those having an independent operation input function such as a mouse and a keyboard. Further, the operation unit 80 may be combined with the display unit 41. This is a combination of an operation input function such as a touch panel and a display function. The operation unit 80 inputs, for example, what is directly input to the system control unit 70 as a command to the automatic analyzer 10. For example, an object such as a button displayed on the display unit 41 is selected with a mouse or the like. As a result, a command corresponding to this operation is input to the system control unit 70 as a command to the automatic analyzer 10.

[Storage section]
The storage unit 50 stores information received from the data processing unit 30, the operation unit 80, and the like. Further, the storage unit 50 outputs information stored based on the control of the system control unit 70 to each unit.

[Analysis Department]
The analysis unit 24 generates a mixed solution containing each liquid of the sample and the reagent, and measures the components of the mixed solution. The measurement result is output to the data processing unit 30 or the like. Examples of the measurement data include test data. The analysis unit 24 measures a plurality of items for one specimen.

(Detailed configuration of the analysis unit)
FIG. 2 is a diagram illustrating the detailed configuration of the analysis unit 24 and the control configuration of the analysis unit 24. The configuration of the analysis unit 24 will be described in detail with reference to FIG.

  The sample is accommodated in the sample container 61. The sample container 61 is placed on the sample transport means. An example of the sample transport means is a rotatable circular disk sampler 6, and the sample container 61 is placed on a rotatable sample rack (not shown) constituting the disk sampler 6. Examples of the sample transport means include a rack sampler (not shown) that linearly moves the sample rack on the transport path, and the sample container 61 is placed on a sample rack constituting the rack sampler (not shown).

  The reagent is accommodated in the reagent container 4. The reagent container 4 is placed in the first reagent container 2 and the second reagent container 3. The reagent container 4 stores various first reagents that selectively react to the item of the specimen, or various second reagents paired with the first reagent. The reagent container 4 containing the first reagent is placed in the first reagent store 2, and the reagent container 4 containing the second reagent is placed in the second reagent store 3. In the first reagent store 2 and the second reagent store 3, a rotatable circular reagent rack 1 is stored. Each reagent container 4 is accommodated in the reagent rack 1 in a ring shape. Hereinafter, the first reagent store 2 and the second reagent store 3 may be collectively referred to as “reagent store”.

  The reaction vessel 51 is placed in the reaction chamber 5. In the reaction container 51, a sample and a reagent are dispensed. The sample and the reagent are dispensed by the sample probe 7, the first reagent probe 8, and the second reagent probe 9. Hereinafter, the first reagent probe 8 and the second reagent probe 9 may be collectively referred to as “reagent probes”.

  A stirring unit 11, a photometric unit 12, and a cleaning device 13 are further provided on the outer periphery of the reaction chamber 5.

  The stirring unit 11 is a stirring unit that performs a stirring operation on the reaction vessel 51 stopped at a predetermined stirring position. The stirring operation refers to an operation of stirring the sample dispensed in the reaction vessel 51 and the reagents (first reagent and second reagent) to generate a mixed solution in the reaction vessel 51.

  The photometric unit 12 is a measurement unit that performs a measurement operation on the reaction vessel 51 stopped at the photometric position. The measurement operation refers to an operation for measuring the absorbance of the mixed solution stored in the reaction vessel 51.

(Cleaning device)
The cleaning device 13 includes a suction pipe 120, a supply pipe 121, a supply pump 122, a suction pump 123, a closing valve 124, and an adjustment valve 125. The cleaning device 13 is a cleaning unit that performs a cleaning operation on the reaction vessel 51 stopped at a predetermined cleaning position. The cleaning operation refers to an operation of sucking the waste liquid stored in the reaction vessel 51 to wash and dry the inner wall of the reaction vessel 51. The “waste liquid” here is a mixed liquid after measurement. Hereinafter, the “waste liquid” and the liquid generated by cleaning the inner wall of the reaction vessel 51 are collectively referred to as “waste liquid”. Details of the cleaning device 13 will be described later.

(Drive control unit)
The drive control unit 25 includes a drive unit 26, a control unit 27, and a cleaning device drive unit 700, and controls and drives each analysis unit of the analysis unit 24.

(Control part)
The control unit 27 gives instructions to various drive units included in the drive unit 26 to control the drive of each analysis unit of the analysis unit 24 corresponding to the drive unit.

(Drive part)
The drive unit 26 includes a sample chamber drive unit 104, a sample probe drive unit 105, a reagent store drive unit 204, a reagent probe drive unit 205, and a reaction chamber drive unit 304.

  In response to an instruction from the control unit 27, the sample storage drive unit 104 drives the sample transport mechanism. The sample probe driving unit 105 drives the sample probe 7 in response to an instruction from the control unit 27. Reagent storage drive unit 204 receives an instruction from control unit 27 and drives the reagent storage. Reagent probe drive unit 205 receives instructions from control unit 27 and drives the reagent probes (first reagent probe 8 and second reagent probe 9). The reaction chamber drive unit 304 drives the reaction chamber 5 in response to an instruction from the control unit 27. The cleaning unit driving unit 703, the discharge processing unit 701, and the supply processing unit 702 will be described in detail in the description of the cleaning apparatus 13.

  Next, a configuration for performing a sample dispensing operation in the analysis unit 24 and a drive control unit 25 for controlling this operation will be described. The sample dispensing operation refers to an operation of dispensing the sample accommodated in the sample container 61 into the reaction container 51. In this description, the sample transport means is the disk sampler 6, but the drive unit 26 can be driven in the same manner even if the sample transport means is a rack sampler.

  The disk sampler 6 includes a rotatable sample rack (not shown). A plurality of sample containers 61 are placed on the sample rack in a state of being arranged in the circumferential direction. The sample rack is driven by the sample storage drive unit 104 to rotate in the circumferential direction. The sample storage drive unit 104 rotates the sample rack to move the plurality of sample containers 61 sequentially to a prescribed sample suction position.

  As described above, the reaction chamber 5 includes a rotatable cassette member (not shown). This cassette member rotates in the circumferential direction by being driven by the reaction chamber drive unit 304. The reaction chamber driving unit 304 rotates the cassette member to sequentially move the plurality of reaction vessels 51 to the prescribed sample discharge positions.

  The sample probe driving unit 105 rotates the sample probe 7 to a predetermined suction position and operates the sample probe 7 from a predetermined height position (hereinafter referred to as an upper position) (hereinafter referred to as a work position). ). The sample probe driving unit 105 drives the sample probe 7 and sucks the sample from the sample container 61 moved to the specified sample suction position. The sucked sample is held inside the sample probe 7. Thereafter, the sample probe driving unit 105 raises the sample probe 7 from the working position to the upper position and rotates the sample probe 7 to a specified sample discharge position. The sample probe driving unit 105 drives the sample probe 7 to discharge the sucked sample into the reaction container 51 that has been moved to a specified sample discharge position.

  Next, the configuration for performing the reagent dispensing operation in the analysis unit 24 and the drive control unit 25 for controlling this operation will be described. The reagent dispensing operation refers to an operation of dispensing the reagent accommodated in the reagent container 4 into the reaction container 51.

  As described above, the first reagent storage 2 includes the rotatable reagent rack 1. The reagent rack 1 rotates in the circumferential direction by being driven by the reagent storage drive unit 204. The reagent storage drive unit 204 rotates the reagent rack 1 to move the plurality of reagent containers 4 in order to the prescribed first reagent suction position.

  The reaction chamber drive unit 304 further rotates a cassette member (not shown) to sequentially move the plurality of reaction containers 51 into which the samples are dispensed at the specified sample discharge position to the specified first reagent discharge position. Move. The reagent probe driving unit 205 rotates the first reagent probe 8 to the prescribed first reagent suction position, and lowers the first reagent probe 8 from the upper position to the working position. The reagent probe driving unit 205 sucks the first reagent from the reagent container 4 moved to the specified first reagent suction position. Thereafter, the reagent probe driving unit 205 drives the first reagent probe 8, raises the first reagent probe 8 from the working position to a predetermined position, rotates the first reagent probe 8 to the prescribed first reagent discharge position, and sucks the first reagent probe 8. One reagent is discharged into the reaction container 51 moved to the specified first reagent discharge position.

  The reaction chamber drive unit 304 further rotates a cassette member (not shown) to sequentially define the plurality of reaction containers 51 into which the first reagent has been dispensed at the prescribed first reagent discharge position. Move to reagent discharge position. The reagent probe driving unit 205 can drive the second reagent probe 9 in the same manner as the first reagent probe 8. When the second reagent is not used in the measurement by the automatic analyzer 10, this operation is omitted.

  Next, the configuration for performing the stirring operation in the analysis unit 24 and the drive control unit 25 for controlling this operation will be described. The reaction chamber drive unit 304 further rotates the cassette member (not shown) to sequentially move the plurality of reaction containers 51 into which the reagent is dispensed at the specified reagent discharge position to the specified stirring position. Here, the prescribed reagent discharge position is one of a prescribed first reagent dispensing position and a prescribed second reagent dispensing position. A stirring unit 11 is arranged at a predetermined stirring position. The stirrer unit 11 is driven by the stirrer drive unit 305 to give a stirring force to the liquid. For example, the stirrer drive unit 305 applies a voltage to a stirrer (not shown) provided in the stirrer unit 11 to apply a stirring force to the liquid contacting the stirrer. Thereby, the stirring unit 11 stirs the sample accommodated in the reaction container 51 stopped at the predetermined stirring position, the first reagent, and the like, and generates a mixed liquid in the reaction container 51.

  Next, a configuration for performing a measurement operation in the analysis unit 24 will be described. The reaction chamber drive unit 304 further rotates a cassette member (not shown) to sequentially move the plurality of reaction vessels 51 containing the mixed solution to a prescribed measurement position. A photometric unit 12 is arranged at the measurement position. The photometry unit 12 is controlled by the system control unit 70, performs a measurement operation on the reaction vessel 51, and outputs the obtained measurement data to the data processing unit 30. Receiving this measurement data, the data processing unit 30 specifies the absorbance of the specific substance from the measurement data, and obtains the concentration of the specific substance in the mixed solution. Thereby, it becomes possible to measure the component contained in a liquid mixture. The liquid mixture after the measurement becomes waste liquid.

  Next, a configuration for performing a cleaning operation in the analysis unit 24 and a drive control unit 25 for controlling the operation will be described.

  The reaction chamber drive unit 304 further rotates a cassette member (not shown) to sequentially move the plurality of reaction vessels 51 containing the waste liquid to a prescribed cleaning position. That is, the reaction chamber drive unit 304 rotates a cassette member (not shown) to place a predetermined reaction container in a specified sample dispensing position, a specified reagent discharge position, a specified stirring position, and a specified measurement. Transport in order of position, and finally transport to a specified cleaning position. A cleaning device 13 is disposed at the cleaning position.

  The cleaning device 13 is driven by the cleaning device driving unit 700 to perform a cleaning operation on the reaction vessel 51. A detailed configuration of the cleaning device 13 and details of driving by the cleaning device driving unit 700 will be described later.

  As described above, the control unit 27 controls each drive unit included in the drive unit 26. The control unit 27 further controls various drive units including a pump (not shown) for sucking and discharging the sample, a solenoid valve (not shown), and an actuator (not shown).

  The control unit 27 causes the storage unit 50 to store control information for controlling each drive unit included in the drive unit 26. The control unit 27 reads control information from the storage unit 50 and controls each drive unit included in the drive unit 26. The control unit 27 controls each operation of lowering and raising of each component including the sample probe 7, the reagent probe (the first reagent probe 8 and the second reagent probe 9), and the cleaning device 13.

(Washing device drive)
Next, a detailed configuration of the cleaning device 13 and details of driving of the cleaning device 13 by the cleaning device driving unit 700 will be described with reference to FIGS. 3 and 4. FIG. 3 is a diagram illustrating an example of the configuration of the cleaning device 13 for cleaning the reaction vessel 51, and FIG. 4 is a diagram illustrating an example of the cleaning unit 141 of each cleaning unit that configures the cleaning device 13.

  The cleaning device driving unit 700 includes a cleaning unit driving unit 703, a discharge processing unit 701, and a supply processing unit 702.

  As shown in FIG. 3, seven cleaning positions P <b> 1 to P <b> 7 and a drying position P <b> 8 are provided to perform cleaning a plurality of times from the front side to the back side in the moving direction of the reaction container 51. When the cleaning operation by the cleaning device 13 is completed, the reaction vessel drive unit 304 moves the reaction vessel 51 from the cleaning position P1 at the front end on the near side in the moving direction to the drying position P8 at the far side in the moving direction. Are sequentially moved one by one. Thereby, a series of washing | cleaning is performed by arrange | positioning the reaction container 51 in order for every cycle in washing | cleaning position P1-P7 in which washing | cleaning operation | movement was prescribed | regulated for every position, and drying position P8.

  The cleaning device 13 includes a supply unit 140, a cleaning unit 141, and a discharge unit 142. Supply unit 140 and cleaning unit 141 are connected by a supply channel. The supply unit 140 supplies the cleaning liquid to the cleaning unit 141 through this supply channel. Examples of the cleaning liquid include pure water, an alkaline detergent, and an acidic detergent. Hereinafter, the alkaline detergent and the acidic detergent may be collectively referred to as “detergent”. The cleaning unit 141 cleans the reaction vessel 51 stopped at each cleaning position using the cleaning liquid supplied from the supply unit 140. The cleaning unit 141 and the discharge unit 142 are connected by a discharge channel independent of the supply unit 140. The discharge unit 142 discharges the waste liquid stored in the reaction container 51 from the reaction container 51 through the discharge channel.

  As shown in FIG. 4, the cleaning unit 141 includes cleaning units 13A to 13G and a drying unit 13H that clean and dry the reaction containers 51 stopped at the cleaning positions P1 to P7 and the drying position P8, respectively. As shown in FIG. 5, the cleaning unit 13A, the cleaning unit 13D, the cleaning unit 13E, and the cleaning unit 13F have the same configuration. Further, the cleaning unit 13B and the cleaning unit 13C have the same configuration.

  The cleaning unit 13A and the cleaning units 13D to 13F include a nozzle unit 130 that includes two nozzles. The nozzle unit 130 includes a suction nozzle 1301 and a discharge nozzle 1302, which are arranged in parallel. These correspond to the suction pipe 120 and the supply pipe 121, respectively. Each of the suction nozzle 1301 and the discharge nozzle 1302 has a right cylindrical shape having openings at both ends, and one end is held by the holding portion 1303. The nozzle unit 130 is provided in a cleaning unit that stores liquid in the reaction vessel 51 in the cleaning process. The nozzle unit 130 is called, for example, “two nozzles”. In this case, the suction nozzle 1301 provided in the cleaning unit 13A corresponds to the first suction nozzle, and the discharge nozzle 1302 corresponds to the first supply nozzle. The suction nozzle 1301 provided in the cleaning units 13D to 13F corresponds to a second suction nozzle, and the discharge nozzle 1302 corresponds to a second supply nozzle.

  The upper end portion of the nozzle unit 130 is held by a holding portion 1303. The holding unit 1303 holds the nozzle unit 130 so that the flow path can be connected to the opening at the upper end of the nozzle unit 130. As a result, the opening at the upper end of the suction nozzle 1301 is connected to the discharge flow path communicating with the tank 134D, and the opening at the upper end of the discharge nozzle 1302 is connected to the supply flow path corresponding to each cleaning unit. The lower end of the suction nozzle 1301 is a suction port 1301a, and the lower end of the discharge nozzle 1302 is a discharge port 1302a. The suction nozzle 1301 is formed longer than the discharge nozzle 1302. Therefore, in the nozzle unit 130, the position of the suction port is lower than the position of the discharge port. For example, when the waste liquid accumulated in the reaction container 51 is sucked by the suction nozzle 1301 that moves downward, the waste liquid can be sucked at a position between the suction port 1301a and the discharge port 1302a. At this time, since the suction port 1301a is provided below the discharge port 1302a, the discharge port 1302a does not come into contact with the liquid surface of the waste liquid to be contaminated. As a result, it is possible to reduce the contamination of the liquid with the waste liquid when the liquid is supplied into the reaction container 51 from above the suction position while the waste liquid accumulated in the reaction container 51 is sucked. Here, the liquid includes a cleaning liquid and a rinsing liquid (the same applies hereinafter).

  The cleaning unit 13B includes a shower nozzle 131. The shower nozzle 131 is a double nozzle in which a discharge nozzle 1312 is formed so as to surround the suction nozzle 1311. Both the suction nozzle 1311 and the discharge nozzle 1312 constituting the shower nozzle 131 have a right cylindrical shape having openings at both ends, and the outer diameter of the discharge nozzle 1312 is smaller than the outer diameter of the suction nozzle 1311. The suction nozzle 1311 and the discharge nozzle 1312 each have a right cylindrical shape with openings at both ends, and one end is held by the holding portion 1313. The shower nozzle 131 is provided in a cleaning unit having a cleaning step of cleaning the inner wall without storing liquid in the reaction vessel 51 in the cleaning process. In this case, the suction nozzle 1311 corresponds to a first suction nozzle, and the discharge nozzle 1312 corresponds to a first supply nozzle.

  The holding unit 1313 holds the shower nozzle 131 so that a flow path can be connected to the opening at the upper end of each nozzle. As a result, the opening at the upper end of the suction nozzle 1311 is connected to the discharge flow path communicating with the tank 134D, and the opening at the upper end of the discharge nozzle 1312 is connected to the supply flow path corresponding to each cleaning unit. The lower end of the suction nozzle 1311 is a suction port 1311a, and the lower end of the discharge nozzle 1312 is a discharge port 1312a. The suction nozzle 1311 is formed longer than the discharge nozzle 1312. For this reason, in the shower nozzle 131, the suction port is positioned vertically below the discharge port. Therefore, in the shower nozzle 131, the position of the suction port 1311a is lower than the position of the discharge port 1312a. For example, when the waste liquid accumulated in the reaction vessel 51 is sucked by the suction nozzle 1311 that moves downward, the waste liquid can be sucked at a position between the suction port 1311a and the discharge port 1312a. At this time, since the suction port 1311a is provided below the discharge port 1312a, the discharge port 1312a does not come into contact with the liquid surface of the waste liquid to be contaminated. As a result, when the cleaning liquid is supplied into the reaction container 51 from above the suction position while the waste liquid accumulated in the reaction container 51 is sucked, it is possible to reduce the contamination of the liquid with the waste liquid.

  The shower nozzle 131 is configured by, for example, a suction nozzle 1311 and a discharge nozzle 1312 being provided coaxially. Further, the discharge port 1312a is formed outside the shower nozzle 131 so that oblique discharge can be performed. Therefore, the cleaning liquid discharged from the discharge port 1312a expands in an umbrella shape as it goes vertically downward. Accordingly, the shower nozzle 131 can directly apply the cleaning liquid to the inner wall of the reaction vessel 51. Further, the shower nozzle 131 can apply the cleaning liquid to a predetermined height position on the inner wall of the reaction vessel 51. At this time, the shower nozzle 131 is stopped at a predetermined position by the cleaning unit driving unit 703. At this time, a cleaning liquid having a predetermined flow rate and a predetermined pressure is supplied to the shower nozzle 131 by the supply processing unit 702. The cleaning liquid sprayed from the discharge port 1312 a makes a predetermined angle with respect to the inner wall of the reaction vessel 51. This angle can be set by the flow rate and pressure of the cleaning liquid supplied to the shower nozzle 131.

  The cleaning unit 13G includes a suction nozzle 132. The suction nozzle 132 has a right cylindrical shape having openings at both ends, and one end is held by the holding portion 1323. The holding unit 1323 holds the flow path so as to be connectable to the opening at the upper end. Thereby, the opening of the upper end portion of the suction nozzle 132 is connected to the discharge flow path communicating with the tank 134E. The opening at the lower end of the suction nozzle 1301 serves as a suction port 132a.

  The drying unit 13 </ b> H includes a suction drying unit 133 in which a drying tip 1332 is provided at the lower end portion of the nozzle 1331. The nozzle 1331 has, for example, a cylindrical shape having openings at both ends, and the upper end portion is held by the holding portion 1333. The holding unit 1333 holds the nozzle 1331 so that the flow path can be connected to the opening at the upper end of the nozzle 1331. Thereby, the upper end part of the nozzle 1331 is connected to the discharge flow path. A plurality of suction holes (not shown) are provided in a portion of the side surface of the nozzle 1331 where the dry tip 1332 is provided.

  The cleaning unit drive unit 703 raises and lowers each cleaning unit between a predetermined position and a work position based on an instruction from the control unit 27. The cleaning unit driving unit 703 can raise and lower the cleaning units 13A to 13G and the drying unit 13H, for example, independently of each other. In addition, the cleaning unit driving unit 703 can uniformly raise and lower the cleaning units 13A to 13G and the drying unit 13H, for example. The control unit 27 can operate the cleaning units 13A to 13G and the drying unit 13H uniformly by instructing the cleaning unit driving unit 703 to perform synchronous control. The cleaning unit drive unit 703 corresponds to a cleaning unit drive unit.

  The cleaning units 13A to 13G and the holding units of the drying unit 13H are connected to each other, and the cleaning unit driving unit 703 raises and lowers the holding unit, thereby cleaning unit 13A. ~ 13G and the drying unit 13H can be operated uniformly. When these cleaning units are operated uniformly, the vertical position of the suction ports (suction ports 1301a, 1312a, and 132a) in each cleaning unit and the vertical position of the bottom of the drying tip 1332 of the drying unit 13H It becomes the same position. Accordingly, the cleaning operation at each cleaning position and the drying operation at the drying position can be performed simultaneously, and these operations can be ended simultaneously. By simultaneously completing the cleaning operation and the drying operation, the plurality of reaction vessels 51 can be moved to the next cleaning position or the drying position at the same time.

  The configuration of the cleaning unit drive unit 703 moves each cleaning unit and the drying unit 13H up and down so that each suction port provided in each cleaning unit reciprocates between an upper position and a position near the liquid surface. Let For example, in response to an instruction from the control unit 27, a generation unit (not shown) obtains the required time t from a predetermined number of pulses n and a predetermined distance s for moving each cleaning unit. The distance s is, for example, the distance between the upper position of each suction port and the position near the liquid level. The control unit 27 stores the required time t in the storage unit 50 as control information. The cleaning unit drive unit 703 can be raised and lowered within a distance s from the number of pulses n and the required time t. When the positions of the suction ports provided in the cleaning units in the vertical direction are the same and the cleaning units operate uniformly, the cleaning unit drive unit 703 raises the cleaning units within a predetermined distance s. And can be lowered.

  The supply unit 140 includes a tank 134A containing pure water, a tank 134B containing alkaline detergent, and a tank 134C containing acidic detergent. These tanks are connected to the supply-side connecting portions of the corresponding cleaning units (cleaning units 13A to 13F) through supply channels. The connecting portion on the supply side of the cleaning unit is connected so as to be able to communicate with a discharge nozzle provided in the cleaning unit. The supply unit 140 includes a cleaning liquid supply unit. The cleaning liquid supply means supplies the cleaning liquid from these tanks to the corresponding cleaning unit via the supply channel. The supply processing unit 702 controls the cleaning liquid supply unit to supply the cleaning liquid from these tanks to the corresponding cleaning unit. Examples of the cleaning liquid supply means include a pump, a solenoid valve, and an actuator for supplying the cleaning liquid into the reaction vessel 51.

  The tank 134A stores pure water for washing and rinsing. That is, pure water has a function as a cleaning liquid and a function as a rinsing liquid. The tank 134A is connected to a supply-side connecting portion of the cleaning unit 13A, the cleaning unit 13D, the cleaning unit 13E, and the cleaning unit 13F via a supply channel. This supply flow path is provided with at least a pure water supply pump 135A (denoted as “P” in the drawing), and, if necessary, a shutoff valve 136A (denoted as “GV” in the drawing) and a flow rate. A regulating valve 137A (shown as “CV” in the figure) is provided. These correspond to the supply pump 122, the closing valve 124, and the regulating valve 125, respectively.

  The pure water supply pump 135A is an example of a cleaning liquid supply unit that is driven by the supply processing unit 702 to transport pure water from the tank 134A toward the cleaning unit 13A and the cleaning units 13D to 13F. The pure water supply pump 135A is provided for each cleaning unit, for example. Since the pure water supply pump 135A is provided independently for each cleaning unit, the supply processing unit 702 can perform pure water supply control for each cleaning unit. Examples of the pure water supply control include timing for supplying pure water to the cleaning unit, supply flow rate, supply time, and the like. The pure water supplied to the supply flow path by the pure water supply pump 135A reaches, for example, the cleaning unit 13A, and this cleaning liquid is supplied from the discharge nozzle 1302 toward the space formed in the reaction vessel 51.

  In addition, for example, one pure water supply pump 135A may be provided for a plurality of cleaning units. In this case, the pure water supply pump 135A has one supply port and a plurality of discharge ports. Pure water is supplied to these cleaning units by connecting these discharge ports and connecting portions on the supply side of the respective cleaning units through supply channels. In this case, the pure water supply pump 135A is controlled by the supply processing unit 702 to continuously supply the cleaning liquid to the supply flow path. Each of these supply flow paths is provided with a shut-off valve 136A and a flow rate adjusting valve 137A that can be independently controlled.

  As an example in which the supply unit 140 supplies the cleaning liquid to the cleaning unit 141, a configuration and control when pure water is supplied from the tank 134A to the cleaning unit 13A via the pure water supply pump 135A will be described. The configuration and control described below can be similarly applied to the cleaning units 13D to 13F.

  The shut-off valve 136A is provided on a supply flow path that connects a discharge port of the pure water supply pump 135A and a connection portion (not shown) on the supply side of the cleaning unit 13A. The shut-off valve 136A is an example of a cleaning liquid supply unit that performs a pure water supply stop operation and a pure water supply operation. The pure water supply stop operation and the pure water supply operation are performed based on control by the supply processing unit 702. The deionized water supply stop operation is an operation for shutting off the supply flow path, and the shut-off section (valve element) (not shown) provided in the shut-off valve 136A is operated, so that the shut-off section (valve element) is connected to the supply flow path. It means completely blocking. The pure water supply operation is an opening operation of the supply channel, and means that the supply channel is completely opened by the operation of a blocking portion (valve element) that completely blocks the supply channel. The shutoff valve 136A can shut off the transport of pure water in the supply flow path at the position where the shutoff valve 136A is provided by performing a shutoff operation. By performing the opening operation, the shutoff valve 136A can supply the pure water blocked by the shutoff valve 136A to the cleaning unit via the supply flow path.

  The closing valve 136 </ b> A has a configuration as an electromagnetic valve that can be controlled by the supply processing unit 702. The shut-off valve 136A may be anything as long as it has a configuration capable of blocking and opening the supply flow path, and for example, a conventionally known valve such as a gate valve, a diaphragm valve, or a ball valve is used. be able to. Among these valves, those having a quick response of the opening / closing operation to the control by the supply processing unit 702 are selected. This valve has, for example, an opening / closing function and does not have a flow rate adjusting function. At this time, the closing operation of the valve corresponds to the blocking operation, and the opening operation corresponds to the opening operation.

  When the pure water supply pump 135A continuously supplies the cleaning liquid toward each cleaning unit, the supply processing unit 702 supplies the pure water supplied into the reaction vessel 51 from the discharge port 1302a to the stop valve 136A. Supply timing and supply time can be controlled.

  The flow rate adjusting valve 137A is provided in a supply flow path that connects a discharge port of the pure water supply pump 135A and a supply port (not shown) connected to the discharge nozzle 1302 of the cleaning unit 13A. The flow regulating valve 137A is provided on the downstream side of the closing valve 136A in the supply flow path. The flow rate adjusting valve 137A is an example of a cleaning liquid supply unit that performs a flow rate adjusting operation on the cleaning liquid flowing in the supply flow path. The flow rate adjusting valve 137A is configured to be able to adjust the flow rate of the cleaning liquid flowing in the supply flow path. The shut-off valve 136A performs a flow rate adjusting operation on the pure water flowing through the supply channel by limiting the flow rate in the supply channel. In the flow rate adjustment operation, a blocking portion (valve element) (not shown) provided in the flow rate adjustment valve 137A is operated, and this blocking portion (valve element) closes a part of the flow path. Thereby, a supply flow path cross-sectional area can be made small. The flow rate adjustment valve 137A can adjust the flow rate of the cleaning liquid flowing in the supply flow path, for example, in the flow rate adjustment valve 137A by performing the flow rate adjustment operation.

  The flow rate adjustment valve 137 </ b> A has a configuration as an electromagnetic valve that can be controlled by the supply processing unit 702. The flow rate adjusting valve 137A may be any type as long as it has a configuration capable of adjusting the flow rate of pure water flowing in the supply flow path. For example, a conventionally known valve such as a throttle valve, Or the like can be used. Among these, the flow rate adjusting valve 137A is selected to have a high supply accuracy of pure water with respect to the control by the supply processing unit 702. The supply accuracy of pure water is high when the difference between the flow rate set by the supply processing unit 702 and the flow rate of pure water actually supplied from the discharge nozzle 1302 to the reaction vessel 51 stopped at the cleaning position is small. It is.

  When the pure water supply pump 135A continuously supplies the cleaning liquid toward the respective cleaning units, the supply processing unit 702 causes the reaction vessel stopped at the cleaning position P1 from the discharge nozzle 1302 to the flow rate adjustment valve 137A. The flow rate of pure water supplied to 51 can be controlled.

  Further, the control unit 27 includes a timing unit (not shown), and this timing unit measures the time during which the shutoff valve 136A is “open” while the pure water supply pump 135A is being driven in the supply unit 140. To do. The amount of pure water supplied to the reaction vessel 51 placed at the cleaning position P1 can be known from the time measured by the time measuring unit and the opening degree of the flow regulating valve 137A.

  In this manner, the supply processing unit 702 controls the supply timing and supply time of pure water supplied into the reaction vessel 51 stopped at each cleaning position with respect to the closing valve 136A. Furthermore, the supply processing unit 702 controls the flow rate of pure water supplied into the reaction vessel 51 stopped at each cleaning position with respect to the flow rate adjustment valve 137A. The supply processing unit 702 appropriately controls the supply time and flow rate of pure water so that the supply processing unit 702 can supply a desired amount of pure water into the reaction vessel 51 stopped at each stop position. . Further, by setting the position where the shutoff valve 136A and the flow rate adjustment valve 137A are provided in the vicinity of the cleaning unit, the distance between these valves and the cleaning unit is shortened. Thereby, compared with the case where pure water supply control to the cleaning unit is performed by the pure water supply pump 135A, pressure loss due to the pipe forming the supply flow path can be minimized, and the supply accuracy of pure water can be reduced. Can be high. Furthermore, since the distance between the shutoff valve 136A and the cleaning unit is short, the response speed of the pure water supply by the discharge nozzle 1302 can be increased.

  The tank 134B stores an alkaline detergent for cleaning. The tank 134B is connected to the cleaning unit 13B through a supply channel. This supply flow path is provided with at least an alkaline detergent supply pump 135B (denoted as “P” in the drawing), and, if necessary, a shut-off valve 136B (denoted as “GV” in the drawing) and a flow rate. A regulating valve 137B (represented as “CV” in the figure) is provided.

  The alkaline detergent supply pump 135B, the closing valve 136B, and the flow rate adjusting valve 137B are configured similarly to the pure water supplying pump 135A, the closing valve 136A, and the flow rate adjusting valve 137A by replacing pure water with an alkaline detergent. be able to. These are controlled by the supply processing unit 702 as described above.

  The tank 134C stores an acidic detergent for cleaning. The tank 134C is connected to the cleaning unit 13C through a supply channel. The supply flow path is provided with at least an acidic detergent supply pump 135C (denoted as “P” in the drawing), and if necessary, a shut-off valve 136C (denoted as “GV” in the drawing) and a flow rate. A regulating valve 137C (represented as “CV” in the figure) is provided.

  The acidic detergent supply pump 135C, the closing valve 136C, and the flow rate adjusting valve 137C are configured in the same manner as the pure water supplying pump 135A, the closing valve 136A, and the flow rate adjusting valve 137A by replacing pure water with acidic detergent. be able to. These are controlled by the supply processing unit 702 as described above.

  The discharge unit 142 includes a tank 134D that stores a high concentration waste liquid and a tank 134E that stores a low concentration waste liquid. The discharge part 142 has a waste liquid transporting means. The waste liquid transporting means transports the waste liquid sucked by each cleaning unit to one or both of the tank 134D and the tank 134E. The discharge processing unit 701 controls the waste liquid transporting means to suck the waste liquid from the reaction vessel 51 stopped at each cleaning position, and transport this waste liquid to the tank 134D or the like. Examples of the waste liquid transporting means include a pump for discharging the waste liquid from the reaction vessel 51 to the outside.

  The tank 134D and the connection part on the discharge side of the cleaning units 13A to 13F are connected by a discharge flow path. The discharge flow path is provided with a waste liquid discharge pump 138A (denoted as “P” in the drawing). The connection part on the discharge side of the cleaning unit is connected so as to be able to communicate with a suction nozzle provided in the cleaning unit. The waste liquid discharge pump 138 </ b> A corresponds to the suction pump 123.

  The waste liquid discharge pump 138A is driven by the supply processing unit 702 to suck the waste liquid stored in the reaction vessel 51 stopped at the cleaning position, and transports the waste liquid toward the tank 134D. For example, the waste liquid discharge pump 138A may be provided independently for each cleaning unit, or may be provided for a plurality of cleaning units.

  When the waste liquid discharge pump 138A is provided independently for each cleaning unit, the supply processing unit 702 can control the waste liquid discharge pump 138A to control waste liquid discharge for each cleaning unit. it can. When one waste liquid discharge pump 138A is provided for a plurality of cleaning units, waste liquid discharge control is uniformly performed for the plurality of cleaning units. For example, the following configuration is adopted. Thus, waste liquid discharge control can be performed for each cleaning unit. A shut-off valve (not shown) is provided in each of the discharge flow paths connecting the waste liquid discharge pump 138A and each cleaning unit. In this case, the waste liquid discharge pump 138A continuously transports the waste liquid toward the tank 134D. The stop valve has a configuration that can be controlled by the supply processing unit 702. The supply processing unit 702 can control the discharge of the waste liquid for each cleaning unit by controlling the opening and closing of the stop valve. The waste liquid sucked from the reaction vessel 51 by the waste liquid discharge pump 138A reaches the tank 134D and is stored.

  The tank 134E, the cleaning unit 13G, the drying unit 13H, and the connection part of the cleaning unit are connected by a discharge channel. The discharge flow path is provided with a waste liquid discharge pump 138B (denoted as “P” in the drawing). The connecting portion of the cleaning unit 13G is connected so as to be able to communicate with a suction nozzle provided in the cleaning unit 13G. The connecting portion of the drying unit 13H cleaning unit is connected to a suction hole provided in the drying unit 13H so as to be able to communicate therewith.

  The waste liquid discharge pump 138B has the same configuration as the waste liquid discharge pump 138A. The supply processing unit 702 can drive the waste liquid discharge pump 138B in the same manner as the waste liquid discharge pump 138A.

  Further, the waste liquid discharging operation in the cleaning units 13A to 13G and the drying unit 13H may be performed by one waste liquid discharge pump. In this case, the waste liquid is collectively sucked from the cleaning units 13A to 13G and the drying unit 13H by the waste liquid discharge pump and stored in the tank.

[Operation of automatic analyzer]
Hereinafter, an operation example of the automatic analyzer 10 according to this embodiment will be described. When the reaction vessel 51 is washed in the washing apparatus 13, the automatic analyzer 10 is driven and controlled so that the position of the rinse liquid collected in the reaction vessel 51 is higher than the position of the washing solution that touches the inner wall of the reaction vessel 51. The unit 25 and the cleaning device 13 were configured. As a result, the rise of the liquid due to the surface tension of the waste liquid can be kept low on the inner wall of the reaction vessel 51. Here, “liquid rising” means that the liquid rises on the inner wall of the reaction container 51 due to an action such as the surface tension of the liquid stored in the reaction container 51. “Liquid rising” is also referred to as “liquid rising”. Further, since the position of the liquid level of the rinsing liquid is set to a position higher than the position where the waste liquid is supposed to rise along the tube wall of the reaction vessel 51, dirt due to the waste liquid remains on the inner wall of the reaction vessel 51. Can be reduced. This liquid rise is caused by, for example, the action of the surface tension between the inner wall of the reaction vessel 51 and the liquid, the action of a jet that collides with the inner wall of the reaction vessel 51, and the like.

  The memory | storage part 50 memorize | stores the program corresponding to each step of the flow of the process example demonstrated below previously. The CPU built in the system control unit 70, the drive control unit 25, etc. reads the program stored in the storage unit 50, and executes the processing corresponding to the read program, thereby realizing the processing of each flow.

  As described above, when the supply unit 140, the cleaning unit 141, and the discharge unit 142 are operated, the reaction vessel 51 stopped at the cleaning positions P1 to P7 is cleaned, and the reaction vessel 51 stopped at the drying position P8 is dried. Is done. The reaction chamber driving unit 304 moves the reaction vessel 51 from the previous cleaning position to the next cleaning position every predetermined time for each cycle of the cleaning operation. One cycle of the cleaning operation refers to a series of cleaning operations in which each probe moves downward and moves upward at each cleaning position. This predetermined time is the time required for the reaction vessel 51 stopped at the washing positions P1 to P7 to return to these positions. That is, the time required for the reaction chamber 5 to make one rotation. In the reaction container 5, the predetermined time is, for example, 16 to 20 seconds. Moreover, in the washing | cleaning apparatus 13, 8 cycles are required for washing | cleaning and drying of the reaction container 51 which accommodates the liquid mixture which measured. That is, the reaction container 51 is subjected to a washing operation and a drying operation for each cycle at the washing positions P1 to P7 and the drying position P8.

  5 to 7 are diagrams showing a series of cleaning operations using the cleaning liquid supplied to each reaction vessel. As shown in FIGS. 5-7, the washing | cleaning apparatus 13 performs washing | cleaning and drying operation | movement with respect to the reaction container 51 stopped in each washing | cleaning position.

  Hereinafter, a cleaning process and a drying process in each cycle for one reaction vessel 51 to be cleaned will be described. The cleaning process and the drying process in each cycle represented by steps are performed simultaneously at each cleaning position and drying position by, for example, uniform operation of each cleaning unit. Further, since each cleaning unit operates uniformly, the cleaning process and the drying process in each cycle are simultaneously completed at each cleaning position and drying position. Thereby, simultaneously with this end, the reaction vessel 51 can be moved to the next washing position or drying position.

  At the cleaning position P1, the cleaning unit 13A performs the first cycle cleaning process on the reaction vessel 51. This may be referred to as a cycle 1 cleaning operation. When the cleaning operation in cycle 1 is completed, the reaction vessel 51 moves to the cleaning position P2. At the cleaning position P2, the cleaning unit 13B performs the second cycle cleaning process on the reaction vessel 51 moved to the cleaning position P2. This may be referred to as a cycle 2 cleaning operation. When the cleaning operation in cycle 2 is completed, the reaction vessel 51 moves to the cleaning position P3. The cleaning unit 13C performs the third cycle cleaning process on the reaction vessel 51 moved to the cleaning position P3. This may be referred to as a cycle 3 cleaning operation. When the cleaning operation in cycle 3 is completed, the reaction vessel 51 moves to the cleaning position P4. In the cleaning position P4, the cleaning unit 13D performs the fourth cycle cleaning process on the reaction vessel 51 moved to the cleaning position P4. This may be referred to as a cycle 4 cleaning operation. When the cleaning operation of cycle 4 is completed, the reaction vessel 51 moves to the cleaning position P5. At the cleaning position P5, the cleaning unit 13E performs the fifth cycle cleaning process on the reaction vessel 51 moved to the cleaning position P5. This may be referred to as a cycle 5 cleaning operation. When the cleaning operation in cycle 5 is completed, the reaction vessel 51 moves to the cleaning position P6. At the cleaning position P6, the cleaning unit 13F performs the sixth cycle cleaning process on the reaction vessel 51 that has moved to the cleaning position P6. This may be referred to as a cycle 6 cleaning operation. When the cleaning operation in cycle 6 is completed, the reaction vessel 51 moves to the cleaning position P7. At the cleaning position P7, the cleaning unit 13G performs the seventh cycle cleaning process on the reaction vessel 51 moved to the cleaning position P7. This may be referred to as a cycle 7 cleaning operation. When the cleaning operation of cycle 7 is completed, the reaction vessel 51 moves to the drying position P8. In the drying position P8, the drying unit 13H performs the eighth cycle of the drying process on the reaction vessel 51 moved to the drying position P8. This may be referred to as a cycle 8 drying operation. When the drying operation in cycle 8 is completed, the reaction vessel 51 is transported to the sample dispensing position, and a new sample or the like is dispensed. In this way, the reaction vessel 51 shifts to the cleaning of the next cycle by sequentially moving the cleaning position.

  Next, the cleaning operation at the cleaning positions P1 to P7 and the drying operation at the drying position P8 will be described.

  Steps 1 (steps 1-1 to 1-6) shown in FIGS. 5 to 7 show details of a one-cycle cleaning operation and a drying operation by the cleaning device 13. One cycle of operation at the cleaning position P1 corresponds to one cycle of cleaning operation in cycle 1. Similarly, the operation of one cycle at the cleaning positions P2 to P7 corresponds to the cleaning operation of one cycle at cycles 2 to 7. Similarly, one cycle of operation at the drying position P8 corresponds to one cycle of drying operation at cycle 8.

  When the operation of one cycle is completed, the reaction chamber driving unit 304 rotates the reaction chamber 5 and stops at the cleaning positions P1 to P7 and the drying position P8 as shown in Step 1-7. Each reaction vessel 51 is stopped at a position shifted by one in the rotation direction of the reaction chamber 5. Thereby, the reaction vessel 51 stopped at the cleaning positions P1 to P7 stops at the cleaning positions P2 to P7 and the drying position P8 in step 2 (step 2-1) shown in FIG. Step 2 corresponds to step 1, and the cleaning device drive unit 700 performs the same cleaning as in step 1 for each reaction vessel 51 whose cleaning position is shifted by one in the rotation direction of the reaction chamber 5. One cycle of operation is performed.

  As described above, when the cleaning operation in step 1 by the cleaning device driving unit 700 is completed for each reaction container 51, the reaction container driving unit 304 shifts the reaction containers 51 one by one in the rotation direction. Stop at the wash position. The cleaning device driving unit 700 performs the cleaning operation of Step 1 for one cycle for each reaction vessel 51 stopped at the cleaning position. Each time the cleaning operation in Step 1 for each reaction vessel 51 is completed, the reaction vessel drive unit 304 shifts and stops the reaction vessels 51 one by one in the rotation direction. As a result, the reaction vessel 51 that has been stopped at the cleaning position P1 is sequentially moved to the cleaning positions P2 to P7 by the reaction chamber driving unit 304, cleaned at these cleaning positions, and finally moved to the drying position P8. And dried at the drying position P8.

  Hereinafter, the configuration of the cleaning device 13 and the drive control unit 25 for driving the cleaning device 13 will be described. In this description, the cleaning operations at the cleaning positions P1 to P7 correspond to the cleaning operations of the cycles 1 to 7, respectively, and the drying operation at the drying position P8 corresponds to the drying operation of the cycle 8.

  The reaction chamber drive unit 304 moves the reaction vessel 51 from the previous cleaning position to the next cleaning position every predetermined time. As a result, the reaction vessel 51 in which the washing and drying cycles (cycle 1 to cycle 8) are shifted one by one in the rotation direction of the reaction vessel 51 is stopped at the washing positions P1 to P7 and the drying position P8. That is, the reaction vessel 51 that has not been cleaned by the cleaning device 13 stops at the cleaning position P1 that is the start position, whereas the cycle 1 by the cleaning device 13 occurs at the drying position P8 that is the end position. The reaction vessel 51 in which the cleaning operations of ˜7 are completed is stopped.

  This description is made in the form of tracking the reaction vessel 51 stopped at the cleaning position P1 in Step 1-1 of cycle 1. That is, the cleaning operation of cycle 1 to cycle 7 and the drying operation of cycle 8 for the reaction vessel 51 will be described in order.

  In response to an instruction from the control unit 27, the cleaning unit drive unit 703 moves the cleaning unit and the drying unit 13H up and down by a predetermined distance.

[Cycle 1]
The cleaning operation of cycle 1 (the operation at the cleaning position P1 shown in FIGS. 5 to 7) will be described in the order of steps 1-1 to 2-1. The cleaning operation of cycle 1 is performed at the cleaning position P1. At the cleaning position P1, the first waste liquid E accommodated in the reaction container 51 is sucked and discharged from the suction port 1301a of the cleaning unit 13A, and is also introduced into the reaction container 51 from the discharge port 1302a of the cleaning unit 13A. Of pure water is supplied. The first waste liquid E is a mixed liquid after measurement.

(Step 1-1)
In response to the instruction from the control unit 27, the reaction vessel driving unit 304 moves the reaction vessel 51 from the previous cleaning position to the next cleaning position every predetermined time. The reaction vessel 51 that has not been cleaned by the cleaning device 13 stops at the cleaning position P1. The reaction container 51 contains a first waste liquid E that is a mixed liquid after completion of the measurement, and the first waste liquid E that has risen due to surface tension adheres to the inner wall of the reaction container 51. . The first waste liquid E that has risen adheres to the inner wall at a position higher than position B, which is the height of the liquid level of the first waste liquid E that intersects the central axis of the reaction vessel 51. Here, “the height of the liquid level” is defined as the height at which the liquid level and the central axis of the reaction vessel 51 intersect, and so on. The position B is calculated in advance based on the amount of liquid dispensed into the reaction vessel 51 and the correspondence information between the liquid amount and the liquid height, and the calculation result is stored in the storage unit 50. The position B can be, for example, an intermediate position between the bottom position and the top position of the reaction vessel 51. Here, the intermediate position includes a position in the vicinity of the intermediate position.

  Also, as shown in FIG. 5, the highest position among positions where the first waste liquid E adheres to the inner wall is defined as position A. The position A refers to the highest position of the height of the portion LO where the first waste liquid E rises along the inner wall of the reaction vessel 51. The portion LO corresponds to an example of a “liquid rising portion”. The position A can be obtained by measurement each time, but can be obtained from past empirical data. This data is stored in the storage unit 50, for example. In general, since the amount of sample and reagent dispensed into the reaction vessel 51 is a substantially constant amount, the position A also has a substantially constant height. In addition, when the characteristics or amount of the sample, reagent, etc. vary depending on the contents of the examination, the position A may be calculated in advance for each characteristic or amount, and this calculation result may be adopted. The position A can be calculated, for example, by determining the contact angle between the liquid mixture to be used and the inner wall of the reaction vessel 51 from the wettability of the reaction vessel 51. The so-called capillary phenomenon that rises up the inner wall of the container can be determined by the difference between the interfacial tension at the solid-liquid interface and the surface tension of the solid. If the interfacial tension at the solid-liquid interface is greater than the surface tension of the solid, the liquid rises on the inner wall surface. At this time, when the reaction vessel 51 is a cylindrical vessel, the height h at which the liquid level rises is, for example, T is the surface tension, θ is the contact angle, ρ is the density of the liquid, g is the acceleration of gravity, and r is the inner diameter of the tube. , H = 2T cos θ / ρgr. When the reaction vessel 51 is a rectangular tube vessel, the height h at which the liquid level rises can be obtained by setting the square root obtained by dividing the bottom area by π to r.

  Further, when the position A is detected by measurement, for example, the comparison container data is acquired by photographing the reaction container 51 placed at the cleaning position P1 by a photographing unit (not shown). Next, the difference between the comparison video data and the reference video acquired in advance is taken, and the distribution of the first waste liquid E in the reaction vessel 51 is detected. The reference image is, for example, an image of the empty reaction vessel 51 placed at the cleaning position P1. Next, the highest position of the first waste liquid E is detected from the detected distribution of the first waste liquid E. Thereby, the position A can be detected.

(Steps 1-2 to 1-3)
In response to the instruction from the control unit 27, the cleaning unit driving unit 703 drives the cleaning unit 13A to move the suction port 1301a from the upper position above the reaction vessel 51 to the bottom portion near the bottom in the reaction vessel 51. The cleaning unit 13A is moved downward so as to be moved to the vicinity position. The distance between the upper position and the bottom vicinity position is stored in advance in the storage unit 50, and the control unit 27 lowers the cleaning unit 13A for a time calculated based on this distance. At this time, the discharge port 1302a is also moved to the vicinity of the position near the bottom. In response to an instruction from the control unit 27, the discharge processing unit 701 drives the discharge unit 142 to suck the first waste liquid E in the reaction vessel 51 from the suction port 1301a. Discharge into the tank 134D. Specifically, the discharge processing unit 701 drives the waste liquid discharge pump 138A to suck the first waste liquid E from the suction port 1301a. The sucked first waste liquid E is transported to the tank 134D through the flow path.

  An example of the suction of the first waste liquid E will be described below. As a first example, the discharge processing unit 701 stops the downward movement of the cleaning unit 13A when the suction port 1301a reaches the bottom vicinity position that is the lowest point. After this stop, the discharge processing unit 701 can suck the first waste liquid E in the reaction vessel 51 from the suction port 1301a. Further, as a second example, the cleaning unit 13A may suck the first waste liquid E in the reaction vessel 51 from the suction port 1301a while moving the suction port 1301a downward from the upper position to the position near the bottom, for example. it can. The discharge processing unit 701 drives the cleaning unit 13A to start suction when the height of the suction port 1301a reaches the position B. At this time, by appropriately setting the descending speed of the cleaning unit 13A and the suction speed from the suction port 1301a, the cleaning unit 13A sucks the first waste liquid E and the discharge port 1302a uses the liquid of the first waste liquid E. This can be done without touching the surface. The suction speed is proportional to the speed at which the first waste liquid E stored in the reaction container 51 is lowered by suction, for example.

  The first waste liquid E remains on the inner wall of the reaction vessel 51 after the first waste liquid E is discharged by the cleaning unit 13A. The first waste liquid E adheres to the portion of the inner wall of the reaction vessel 51 up to the height of the position A shown in FIG.

(Step 1-4)
When the flow rate of the first waste liquid E sucked from the suction port 1301a becomes almost zero, the discharge processing unit 701 outputs to the control unit 27 that the first waste liquid E has been discharged from the reaction vessel 51. In response to the input from the discharge processing unit 701, the control unit 27 instructs the cleaning unit drive unit 703 to move the cleaning unit 13A upward. Upon receiving an instruction from the control unit 27, the cleaning unit drive unit 703 drives the cleaning unit 13A to move the cleaning unit 13A upward so that the discharge port 1302a is moved from the vicinity of the bottom portion to the upper position. . Further, upon receiving an instruction from the control unit 27, the supply processing unit 702 drives the supply unit 140 to supply first pure water as a cleaning liquid into the reaction vessel 51 from the discharge port 1302a. When the first pure water is supplied, for example, in the supply unit 140, the pure water supply pump 135A is driven so as to supply the first pure water toward the close valve 136A, and the valve of the close valve 136A is driven. Is fully open for a desired time, and the flow regulating valve 137A has a desired opening. As a result, a desired amount of first pure water is supplied to the reaction vessel 51 from the tank 134A.

  An example of the supply of the first pure water into the reaction vessel 51 will be described below. As a first example of the supply of the first pure water, it is possible to temporarily stop the upward movement of the cleaning unit 13 </ b> A and then supply the first pure water into the reaction vessel 51. The cleaning unit drive unit 703 temporarily stops the upward movement of the cleaning unit 13A when the discharge port 1302a reaches a predetermined height position (for example, position D) in the reaction vessel 51. At this time, the supply processing unit 702 drives the supply unit 140 to supply the first pure water to the reaction vessel 51 through the discharge port 1302a. The information on the predetermined height position is stored in, for example, the storage unit 50, and the cleaning unit drive unit 703 moves the cleaning unit 13A upward for the time calculated from this information. The supply processing unit 702 drives the supply unit 140 to supply first pure water from the tank 134A into the reaction vessel 51 through the discharge port 1302a. The cleaning unit drive unit 703 resumes the upward movement of the cleaning unit 13 </ b> A when the second waste liquid W <b> 1 containing the first pure water is stored in the reaction container 51 to a predetermined height position.

  An example of detecting the second waste liquid W1 stored in the reaction vessel 51 up to a predetermined height position will be described as an example.

  As a first example of a form for detecting that the second waste liquid W1 is stored up to a predetermined height position, the liquid level of the second waste liquid W1 is provided by a liquid level detection mechanism (not shown) provided in the discharge nozzle 1302. Is detected. The liquid level detection mechanism can detect the liquid level by touching the discharge port 1302a with the liquid level. When the first pure water is supplied from the discharge port 1302a, the liquid level detection mechanism detects the liquid level when the second waste liquid W1 touches the discharge port 1302a. At this time, since the discharge port 1302a is at a predetermined height position, it can be known that the liquid level of the second waste liquid W1 is at a predetermined height position in the reaction vessel 51. The supply processing unit 702 can store the second waste liquid W1 up to a predetermined height position by stopping the driving of the supply unit 140 simultaneously with the detection. As the liquid level detection mechanism, a conventionally known configuration such as a capacitance type or an electrode type can be appropriately selected.

  As a second example of a form for detecting that the second waste liquid W1 has been stored up to a predetermined height position, the reaction vessel 51 is calculated from the amount of the first pure water supplied to the reaction vessel 51 by the supply unit 140. Detecting the liquid height of the second waste liquid W1 stored in step S1. In the storage unit 50, correspondence information between the liquid amount and the liquid height in the reaction vessel 51 (hereinafter referred to as correspondence information between the liquid amount and the liquid height) and the first waste liquid remaining in the reaction vessel 51 after suction. Information on the liquid amount of E is stored in advance. Further, the amount of the first pure water supplied to the reaction vessel 51 by the supply unit 140 is the time during which the pure water supply pump 135A is driven and the closing valve 136A is “open”, and the flow rate adjustment valve. It can be calculated from the opening degree of 137A. The amount of the second waste liquid W1 stored in the reaction vessel 51 includes the amount of the first waste liquid E remaining in the reaction vessel 51 after suction and the amount of the first pure water supplied to the reaction vessel 51. It becomes the sum of. At this time, since the amount of the first waste liquid E remaining in the reaction vessel 51 after the suction is very small, it may be ignored. A calculation unit (not shown) provided in the control unit 27 calculates the amount of liquid at which the liquid level becomes a predetermined height position in the reaction vessel 51. When ignoring the amount of the first waste liquid E remaining in the reaction vessel 51 after the suction, the supply processing unit 702 has the amount of the first pure water supplied to the reaction vessel 51 through the discharge port 1302a. The supply unit 140 is driven so that the liquid amount calculated by the calculation unit is obtained. The supply processing unit 702 can store the second waste liquid W1 up to a predetermined height position by driving the supply unit 140 in this way. In this example, since the position of the discharge port 1302a when supplying the first pure water to the reaction vessel 51 can be arbitrarily determined, for example, when supplying the first pure water to the reaction vessel 51, The suction port 1301a and the discharge port 1302a can be prevented from coming into contact with the second waste liquid W1.

  As a second example of the supply of the first pure water, the cleaning unit driving unit 703 moves the cleaning unit 13A upward from the vicinity of the bottom portion to the upper position of the discharge port 1302a. The supply processing unit 702 starts driving the supply unit 140 with the start of the upward movement, and supplies the first pure water into the reaction vessel 51 from the discharge port 1302a with the upward movement. When the second waste liquid W1 is stored up to a predetermined height position, the supply processing unit 702 stops driving the supply unit 140. The example mentioned above can be used suitably for the form which detects that the 2nd waste liquid W1 stored to the predetermined | prescribed height position. At this time, the cleaning unit drive unit 703 controls the rising speed of the cleaning unit 13A at such a speed that the second waste liquid W1 does not touch the suction port 1301a and the discharge port 1302a. Hereinafter, the detection of each liquid level position and the supply of the cleaning liquid to the reaction vessel 51 shall be performed appropriately using the method described in the above example.

  The first pure water supplied into the reaction vessel 51 is mixed with the first waste liquid E remaining in the reaction vessel 51. Thereby, the second waste liquid W1 is stored in the region up to the position D in the reaction vessel 51. When the first pure water is supplied to the reaction vessel 51, the control unit 27 can drive the discharge unit 142 to suck the second waste liquid W1 in the reaction vessel 51 from the suction port 1301a. Thereby, a swirling flow from the discharge port 1302a to the suction port 1301a is generated in the second waste liquid W1 in the reaction vessel 51. The second waste liquid W1 is agitated by this swirling flow, and the flow collides with the inner wall of the reaction vessel 51. As a result, the first waste liquid E adhering to the inner wall of the reaction vessel 51 can be efficiently removed. When the supply of the first pure water by the supply unit 140 and the discharge of the second waste liquid W1 by the discharge unit 142 are simultaneously performed on the reaction vessel 51, the supply amount of the first pure water and the second The amount of difference in the discharge capital of the waste liquid W1 is defined as the amount of storage of the second waste liquid W1 in the reaction vessel 51.

  The position D that is the height of the liquid level of the second waste liquid W1 is lower than the position A. That is, since the second waste liquid W1 rises on the inner wall of the reaction vessel 51, the position D of the liquid level of the second waste liquid is set so that the highest position of the raised second waste liquid is lower than the position A. Is set. The reason why the position D is set lower than the position A is that the height of the first waste liquid E adhering to the inner wall of the reaction vessel 51 varies as the first pure water is injected into the reaction vessel 51. In order to prevent the height position from exceeding the position A. Further, the first pure water itself injected into the reaction vessel 51 rises up the inner wall of the reaction vessel 51, so that the height of the liquid level of the waste liquid containing the first pure water exceeds the position A. Is to prevent. When the position D is the first position, the position A corresponds to the second position.

  The position D can be the same position as the position B, for example. Further, the position D can be set lower than the position B, for example. Information on these positions D is stored in the storage unit 50 in advance, and the supply processing unit 702 drives the supply unit 140 based on this information. The position D corresponds to the position A, for example, and correspondence information between the position A and the position D is stored in the storage unit 50 in advance. The supply processing unit 702 drives the supply unit 140 based on the information on the position A and the correspondence information between the position A and the position D.

  The second waste liquid W1 rising up on the inner wall of the reaction vessel 51 is mixed with the first waste liquid E adhering to the inner wall of the reaction vessel 51 to become the third waste liquid L1. The waste liquid concentration of the third waste liquid L1 is smaller than the first waste liquid E and larger than the second waste liquid W1. The waste liquid concentration refers to the concentration at which the components of the mixed liquid after measurement are included. The cleaning operation in this step corresponds to an example of the first cleaning performed by the cleaning unit 13A corresponding to an example of the first cleaning unit. Further, the highest position where the third waste liquid L1 will rise is a position lower than the position A. The portion formed by the third waste liquid L1 corresponds to an example of a “liquid rising portion”.

(Steps 1-5 to 1-6)
When the supply amount of the first pure water into the reaction vessel 51 reaches a prescribed liquid amount, the control unit 27 instructs the supply processing unit 702 to stop driving the supply unit 140. Thereby, supply of the 1st pure water to the reaction container 51 by the washing | cleaning apparatus 13 stops. In the case where the driving of the supply unit 140 by the supply processing unit 702 and the upward movement of the cleaning unit 13A by the cleaning unit driving unit 703 are simultaneously performed, the cleaning unit driving unit 703 has the suction port 1301a reaching the upper position. Then, the upward movement of the cleaning unit 13A is stopped. Further, when the supply unit 140 is driven by the supply processing unit 702 after the cleaning unit driving unit 703 stops the upward movement of the cleaning unit 13A, the supply of the first pure water into the reaction vessel 51 is performed. When the amount reaches the prescribed liquid amount, the cleaning unit drive unit 703 resumes the upward movement of the cleaning unit 13A. Similarly, when the suction port 1301a reaches the upper position, the cleaning unit drive unit 703 stops the upward movement of the cleaning unit 13A.

(Step 1-7)
In cycle 1, when the processing of steps 1-1 to 1-6 is performed and the cleaning operation of cycle 1 is completed, reaction chamber drive unit 304 moves reaction vessel 51 in the rotation direction. The reaction chamber drive unit 304 stops the reaction vessel 51 that has been stopped at the cleaning position P1 at the cleaning position P2 that is shifted by one in the rotational direction (step 2-1), and this cleaning position P2 Thus, the cleaning operation of cycle 2 is performed. As the reaction vessel 51 moves, the reaction vessels 51 that have stopped at the cleaning positions P2 to P7 similarly stop at the cleaning positions P3 to P8. At the cleaning position P1, for example, the reaction container 51 in which the mixed liquid after measurement is stored is newly stopped, and the cleaning operation of cycle 1 is similarly performed on the reaction container 51.

  When moving the reaction vessel 51 stopped at the cleaning position P1 in the rotation direction, the reaction chamber drive unit 304 stops the reaction vessel 51 at the cleaning position P2 after rotating the reaction chamber 5 at least once. . In this case, the reaction vessel 51 rotates the reaction chamber 5 at least once in a state where the second waste liquid W1 is stored therein. At this time, the second waste liquid W1 comes into contact with the third waste liquid L1 by the rotating centrifugal force, vibration, and the like. Since the waste liquid concentration of the second waste liquid W1 is lower than the waste liquid concentration of the third waste liquid L1, the third waste liquid L1 attached to the inner wall of the reaction vessel 51 is washed by this contact. The time for which the reaction vessel 51 rotates is, for example, 10 to 20 seconds or 15 to 20 seconds. The same applies to the reaction vessels 51 that have stopped at the washing positions P2 to P7.

[Cycle 2]
The cleaning operation of cycle 2 (the operation at the cleaning position P2 shown in FIGS. 5 to 7) will be described in the order of steps 1-1 to 2-1. The cleaning operation of cycle 2 is performed at the cleaning position P2. In the cleaning operation of cycle 2, step 1-1 corresponds to step 2-1 of cycle 1. At the cleaning position P2, the second waste liquid W1 stored in the reaction container 51 is sucked and discharged from the suction port 1311a of the cleaning unit 13B, and the inside (inner wall) of the reaction container 51 using an alkaline detergent as a cleaning liquid. ) Is washed. This cleaning is performed by spraying an alkaline detergent in an umbrella shape toward the inner wall of the reaction vessel 51 from the discharge port 1312a of the cleaning unit 13B. The injected alkaline detergent reaches the bottom along the side wall of the inner wall of the reaction vessel 51. At this time, the suction port 1311a of the cleaning unit 13B is stopped at a position near the bottom, and the fourth waste liquid D1, which is a waste liquid containing an alkaline detergent, is sucked and discharged from the suction port 1311a.

(Step 1-1)
In response to the instruction from the control unit 27, the cleaning unit driving unit 703 drives the cleaning unit 13B to move the suction port 1311a from the upper position above the reaction container 51 to the vicinity of the bottom in the reaction container 51. The cleaning unit 13B is moved downward so as to be moved to the position. In response to an instruction from the control unit 27, the discharge processing unit 701 drives the discharge unit 142 to suck the second waste liquid W1 in the reaction vessel 51 from the suction port 1301a, and the second waste liquid W1 is drawn. Discharge into the tank 134D.

  As a first example of the discharge of the second waste liquid W1, the discharge processing unit 701 drives the waste liquid discharge pump 138A to suck the second waste liquid W1 in the reaction vessel 51 from the suction port 1311a. The waste liquid W1 is discharged into the tank 134D. At this time, the cleaning unit driving unit 703 stops the cleaning unit 13B at a position where the position of the suction port 1301a is near the bottom, which is the lowest point. At this time, the control unit 27 instructs the discharge processing unit 701 to suck the first waste liquid E in the reaction vessel 51 from the suction port 1301a.

  As a first example of the discharge of the second waste liquid W1, the cleaning device drive unit 700 drives the cleaning unit 13B so as to move the suction port 1311a downward from the upper position to the position near the bottom, while in the reaction vessel 51. The second waste liquid W1 is sucked from the suction port 1311a. When the height of the suction port 1311a reaches the position D by the downward movement, the control unit 27 instructs the discharge processing unit 701 to perform the liquid discharge operation. Upon receiving an instruction from the control unit 27, the discharge processing unit 701 drives the discharge unit 142 to start sucking the second waste liquid W1. The cleaning unit 13B continues the suction of the second waste liquid W1 while moving downward. The cleaning unit 13B stops the suction of the second waste liquid W1 when the height of the suction port 1311a reaches the position near the bottom, which is the lowest point, by the downward movement. At this time, by appropriately setting the descending speed of the cleaning unit 13B and the suction speed from the suction port 1311a, the cleaning unit 13A sucks the first waste liquid E and the discharge port 1302a uses the liquid of the first waste liquid E. This can be done without touching the surface. Here, the suction speed is proportional to the speed at which the second waste liquid W1 accommodated in the reaction vessel 51 is lowered by suction, for example.

(Step 1-2)
The cleaning unit drive unit 703 temporarily stops the downward movement of the cleaning unit 13B when the suction port 1311a reaches the position near the bottom, which is the lowest point. The second waste liquid W1 and the third waste liquid L1 remain on the inner wall of the reaction vessel 51 after the second waste liquid W1 is discharged by the cleaning unit 13B. The second waste liquid W1 and the third waste liquid L1 are both attached to the inner wall of the reaction vessel 51. The second waste liquid W1 adheres to, for example, a portion up to the height of the position D on the inner wall of the reaction vessel 51. The third waste liquid L1 adheres to the portion of the inner wall of the reaction vessel 51 from the height of the position D to the height of the position A.

(Step 1-3)
Next, the supply processing unit 702 controls the supply unit 140 to supply an alkaline detergent to the cleaning unit 13B. An alkaline detergent is sprayed in an umbrella shape toward the inner wall of the reaction vessel 51 from the discharge port 1312a of the cleaning unit 13B. This alkaline detergent is supplied to the reaction vessel 51 as a cleaning liquid. The injected alkaline detergent collides with the inner wall of the reaction vessel 51. The position (height) where the alkaline detergent collides with the inner wall is position C. The position C is lower than the position A, for example. That is, the alkaline detergent is sprayed on the inner wall of the reaction vessel 51 at a position lower than the highest position where the first waste liquid E will rise on the inner wall of the reaction vessel 51. The reason why the position C is set lower than the position A is that the height position of the first waste liquid E adhering to the inner wall of the reaction vessel 51 fluctuates due to the alkaline detergent being injected into the reaction vessel 51. This is to prevent the height position from exceeding position A. Moreover, it is for preventing the height position of the liquid level of the waste liquid containing alkaline detergent exceeding the position A because the alkaline detergent itself injected into the reaction container 51 rises up the inner wall of the reaction container 51. When the position C is the first position, the position A corresponds to the second position.

  The position C can be higher than the position near the bottom. That is, the shower nozzle 131 is configured such that the position of the discharge port 1312a is higher than the position C when the suction port 1311a is in the position near the bottom. The position C is higher than the position D and lower than the position B, for example. Further, the position C may be the same position as the position B or the position D, for example. Further, based on the position C, the height position of the discharge port 1312a when the alkaline detergent is sprayed can be set. The cleaning unit drive unit 703 stops the cleaning unit 13B at a position where the height position of the discharge port 1312a is lower than the position A when the alkaline detergent is sprayed. Further, the spray angle of the alkaline detergent sprayed from the discharge port 1312a can be changed by pressure, flow rate, and the like. Correspondence information between the injection angle, pressure, flow rate, and the like is stored in the storage unit 50 in advance. The supply processing unit 702 drives the supply unit 140 based on the correspondence information, and supplies alkaline detergent to the discharge port 1312a.

  The discharge processing unit 701 continues to control the discharge unit 142 even when the supply of the alkaline detergent into the reaction container 51 is started. By this control, the fourth waste liquid D1 containing an alkaline detergent is sucked and discharged from the suction port 1311a following the suction and discharge of the second waste liquid W1. In other words, when the flow rate of the second waste liquid W1 sucked from the suction port 1311a becomes almost zero, the supply processing unit 702 drives the cleaning unit 13B as described above to make the reaction vessel 51 alkaline from the discharge port 1312a. While supplying the detergent, the discharge processing unit 701 drives the cleaning unit 13B to suck and discharge the fourth waste liquid D1 from the suction port 1311a. As described above, since the supply of the alkaline detergent and the discharge of the fourth waste liquid D1 are performed simultaneously in the reaction vessel 51, the alkaline detergent is not stored in the reaction vessel 51, and the reaction vessel 51 is not in the inner wall. The alkaline detergent can be prevented from overflowing.

  As described above, when the alkaline detergent collides at the position C on the inner wall of the reaction vessel 51, the alkaline detergent spreads to a position higher than the position C on the inner wall. This position is lower than position A. Further, this position may be a position B that is the position of the liquid surface height of the first waste liquid E. At this time, the position C is lower than the position B. For this reason, the third waste liquid L1 is mixed with an alkaline detergent to become the fifth waste liquid L2. For example, the fifth waste liquid L2 has a lower waste liquid concentration than the third waste liquid L1. The cleaning operation in this step corresponds to an example of the first cleaning performed by the cleaning unit 13B corresponding to an example of the first cleaning unit. In addition, the highest position where the alkaline detergent will spread (liquid rise) is a position lower than position A. The portion formed by the fifth waste liquid L2 corresponds to an example of a “liquid rising portion”.

(Step 1-4)
When the amount of the alkaline detergent supplied to the reaction vessel 51 reaches a predetermined amount, the supply processing unit 702 instructs the cleaning unit 13B to stop supplying the alkaline detergent. Further, the discharge processing unit 701 indicates to the control unit 27 that the fourth waste liquid D1 has been discharged from the reaction container 51 when the flow rate of the fourth waste liquid D1 sucked from the suction port 1311a becomes almost zero. Is output. The control unit 27 receives an input from the discharge processing unit 701 and instructs the cleaning unit driving unit 703 to move the cleaning unit 13B upward. The fourth waste liquid D1 and the fifth waste liquid L2 remain on the inner wall of the reaction vessel 51 after the fourth waste liquid D1 is discharged by the cleaning unit 13B. Both the fourth waste liquid D1 and the fifth waste liquid L2 are attached to the inner wall of the reaction vessel 51. The fourth waste liquid D1 is attached to, for example, a portion of the inner wall of the reaction vessel 51 up to the height of the position C or the height near the position C. The fifth waste liquid L2 is attached to the portion of the inner wall of the reaction vessel 51 from the position C or from the height in the vicinity of the position C to the height of the position A.

(Steps 1-5 to 1-6)
When the suction port 1301a reaches the upper position, the cleaning unit drive unit 703 stops the upward movement of the cleaning unit 13B.

(Step 1-7)
When the cleaning operation of cycle 2 is completed by performing the processing of steps 1-1 to 1-6, the reaction container driving unit 304 moves the reaction vessel 51 in the rotation direction. The reaction chamber drive unit 304 stops the reaction vessel 51 that has been stopped at the cleaning position P2 at the cleaning position P3 that is shifted by one in the rotational direction (step 2-1), and this cleaning position P3. Thus, the cleaning operation of cycle 3 is performed. This operation is performed in the same manner as in step 1-7 of cycle 1. That is, the reaction vessel 51 stops at the cleaning position P3 after, for example, rotating at least once in the reaction chamber 5.

[Cycle 3]
The cleaning operation in cycle 3 (the operation at the cleaning position P3 shown in FIGS. 5 to 7) will be described in the order of steps 1-1 to 2-1. The cleaning operation of cycle 3 is performed at the cleaning position P3. In the cleaning operation of cycle 3, step 1-1 corresponds to step 2-1 of cycle 2. At the cleaning position P3, the inside (inner wall) of the reaction vessel 51 is cleaned using an acidic detergent that is a cleaning liquid. This cleaning is performed by spraying the acidic detergent in an umbrella shape toward the inner wall of the reaction vessel 51 from the discharge port 1312a of the cleaning unit 13C. The sprayed acidic detergent reaches the bottom along the side wall of the inner wall of the reaction vessel 51. At this time, the suction port 1311a of the cleaning unit 13C is stopped at a position near the bottom, and the sixth waste liquid D2, which is a waste liquid containing an acidic detergent, is sucked and discharged from the suction port 1311a.

(Step 1-1)
In response to the instruction from the control unit 27, the cleaning unit drive unit 703 drives the cleaning unit 13C to move the suction port 1311a from the upper position above the reaction container 51 to the vicinity of the bottom in the reaction container 51. The cleaning unit 13C is moved downward so as to be moved to the position.

(Step 1-2)
The cleaning unit drive unit 703 temporarily stops the downward movement of the cleaning unit 13C when the suction port 1311a reaches the position near the bottom, which is the lowest point.

(Step 1-3)
Next, the supply processing unit 702 controls the supply unit 140 to supply the acidic detergent to the cleaning unit 13C. The acidic detergent is sprayed in an umbrella shape toward the inner wall of the reaction vessel 51 from the discharge port 1312a of the cleaning unit 13C. This acidic detergent is supplied to the reaction vessel 51 as a cleaning liquid. The sprayed acidic detergent collides with the inner wall of the reaction vessel 51. The position (height) where the acidic detergent collides with the inner wall is position C. The position C is appropriately set to the position described in step 1-3 of cycle 2. The configuration described in Step 1-3 of cycle 2 can be used as appropriate for the shower nozzle 131.

  The discharge processing unit 701 starts control of the discharge unit 142 when the supply of the acidic detergent into the reaction vessel 51 is started. From the suction port 1311a, suction and discharge of the sixth waste liquid D2 including the acidic detergent is performed. Thus, since the supply of the acid detergent and the discharge of the sixth waste liquid D2 are performed simultaneously in the reaction container 51, the acidic detergent is not stored in the reaction container 51, and the inner wall of the reaction container 51 The acid detergent can be prevented from overflowing. The cleaning process of the reaction vessel 51 using the detergent performed in the cycle 2 and the cycle 3 corresponds to the first cleaning. In this case, the detergent corresponds to the first cleaning liquid. Moreover, you may include the washing | cleaning process of the reaction container using the pure water performed in the cycle 1 in 1st washing | cleaning. In this case, the pure water corresponds to the first cleaning liquid.

  As described above, when the acidic detergent collides with the inner wall of the reaction vessel 51 at the position C, the acidic detergent spreads to a position higher than the position C on the inner wall. This position is lower than position A. The reason why the position C is set to a position lower than the position A is that the acidic detergent is injected into the reaction vessel 51, thereby changing the height position of the first waste liquid E adhering to the inner wall of the reaction vessel 51. This is to prevent the height position from exceeding position A. Moreover, it is for preventing the height position of the liquid level of the waste liquid containing an acidic detergent from exceeding the position A because the acidic detergent itself injected into the reaction container 51 rises up the inner wall of the reaction container 51.

  As described above, when the acidic detergent collides with the inner wall of the reaction vessel 51 at the position C, the acidic detergent spreads to a position higher than the position C on the inner wall. This position may be a position B that is the position of the liquid surface height of the first waste liquid E. At this time, the position C is lower than the position B. From this, alkaline detergent is mixed with the 5th waste liquid L2, and it becomes the 7th waste liquid L3. For example, the seventh waste liquid L3 has a lower waste liquid concentration than the third waste liquid L1. Moreover, since the 7th waste liquid L3 contains alkaline detergent and acidic detergent, the salt produced | generated by both neutralizing reaction is contained. This salt is, for example, water-soluble. The cleaning operation in this step corresponds to an example of the first cleaning performed by the cleaning unit 13C corresponding to an example of the first cleaning unit. In addition, the highest position where the acidic detergent will spread (become liquid) is lower than position A. The portion formed by the fifth waste liquid L2 corresponds to an example of a “liquid rising portion”.

(Step 1-4)
When the amount of the acidic detergent supplied to the reaction vessel 51 reaches a predetermined amount, the supply processing unit 702 instructs the cleaning unit 13C to stop supplying the acidic detergent. Further, when the flow rate of the sixth waste liquid D2 sucked from the suction port 1311a becomes almost zero, the discharge processing unit 701 outputs to the control unit 27 that the sixth waste liquid D2 has been discharged from the reaction vessel 51. . The control unit 27 receives an input from the discharge processing unit 701 and instructs the cleaning unit driving unit 703 to move the cleaning unit 13C upward. The sixth waste liquid D2 and the seventh waste liquid L3 remain on the inner wall of the reaction vessel 51 after the sixth waste liquid D2 is discharged by the cleaning unit 13C. Both the sixth waste liquid D2 and the seventh waste liquid L3 are attached to the inner wall of the reaction vessel 51. The sixth waste liquid D2 is attached to, for example, a portion of the inner wall of the reaction vessel 51 up to the height of the position C or the height near the position C. The seventh waste liquid L3 is attached to the portion of the inner wall of the reaction vessel 51 from position C or from the height in the vicinity of position C to the height of position A.

(Steps 1-5 to 1-6)
When the suction port 1301a reaches the upper position, the cleaning unit drive unit 703 stops the upward movement of the cleaning unit 13C.

(Step 1-7)
When the cleaning operation of cycle 3 is completed by performing the processing of steps 1-1 to 1-6, the reaction vessel driving unit 304 moves the reaction vessel 51 in the rotation direction. The reaction chamber drive unit 304 stops the reaction container 51 that has been stopped at the cleaning position P3, at the cleaning position P4 that is shifted by one in the rotational direction (step 2-1), and this cleaning position P4. Thus, the cleaning operation of cycle 4 is performed. This operation is performed in the same manner as in step 1-7 of cycle 1. That is, the reaction vessel 51 stops at the cleaning position P4 after, for example, rotating at least once in the reaction chamber 5.

[Cycle 4]
The cleaning operation in cycle 4 will be described in the order of steps 1-1 to 2-1. The cleaning operation of cycle 4 is performed at the cleaning position P4. In the cleaning operation of cycle 4, step 1-1 corresponds to step 2-1 of cycle 3. At the cleaning position P4, the second pure water, which is a rinsing liquid, is supplied into the reaction vessel 51 from the discharge port 1302a of the cleaning unit 13D.

(Step 1-1)
In response to the instruction from the control unit 27, the cleaning unit driving unit 703 drives the cleaning unit 13D to move the suction port 1301a from the upper position above the reaction container 51 to the vicinity of the bottom in the reaction container 51. The cleaning unit 13D is moved downward so as to be moved to the position.

(Step 1-2)
When the suction port 1301a reaches the position near the bottom, which is the lowest point, the control unit 27 instructs the cleaning unit drive unit 703 to temporarily stop the downward movement of the cleaning unit 13D. In response to an instruction from the control unit 27, the cleaning unit drive unit 703 temporarily stops the downward movement.

(Steps 1-3 to 1-5)
When the suction port 1301a reaches the position near the bottom, which is the lowest point, the control unit 27 causes the cleaning unit drive unit 703 to temporarily stop the downward movement of the cleaning unit 13D, and then lifts the cleaning unit 13D. Instruct to move. Upon receiving an instruction from the control unit 27, the cleaning unit drive unit 703 drives the cleaning unit 13D to move the cleaning unit 13D upward so as to move the discharge port 1302a from the vicinity of the bottom portion to the upper position. . Further, upon receiving an instruction from the control unit 27, the supply processing unit 702 drives the supply unit 140 to supply second pure water as a rinsing liquid into the reaction vessel 51 from the discharge port 1302a. As the second pure water, for example, the same one as the first pure water is used. The second pure water is stored, for example, in the tank 134A, and the second pure water can be supplied in the same manner as the first pure water. As a result, the second pure water having a desired liquid amount is supplied to the reaction vessel 51 from the tank 134A.

  The supply of the second pure water into the reaction vessel 51 is given in step 1-4 of cycle 1 by replacing the cleaning unit 13A with the cleaning unit 13D and the first pure water with the second pure water, for example. Further, it can be performed in the same manner as the first example and the second example. In the first example, the position at which the upward movement of the cleaning unit 13A is temporarily stopped is, for example, the position A. That is, the second pure water is supplied until the liquid level reaches the position A in the reaction vessel 51. The second pure water supplied into the reaction container 51 is mixed with the sixth waste liquid D2 remaining in the reaction container 51 to generate an eighth waste liquid W2. Accordingly, the eighth waste liquid W2 is stored in the region up to the position A in the reaction vessel 51. That is, the second pure water is stored up to the highest position where the first waste liquid E will rise on the inner wall of the reaction vessel 51. When the second pure water is supplied to the reaction vessel 51, the control unit 27 can drive the discharge unit 142 to suck the eighth waste liquid W2 in the reaction vessel 51 from the suction port 1301a. Thereby, a swirling flow from the discharge port 1302a to the suction port 1301a is generated in the eighth waste liquid W2 in the reaction vessel 51. When the supply of the second pure water by the supply unit 140 and the discharge of the eighth waste liquid W2 by the discharge unit 142 are simultaneously performed on the reaction vessel 51, the supply amount of the second pure water and the eighth The amount of difference from the discharge amount of the waste liquid W2 is set as the storage amount of the eighth waste liquid W2 in the reaction vessel 51.

  The eighth waste liquid W2 is stored up to the position A in the reaction vessel 51, so that the seventh waste liquid L3 is mixed with the eighth waste liquid W2. In this case, the mixed liquid of the seventh waste liquid L3 and the eighth waste liquid W2 is also referred to as the eighth waste liquid W2. Thus, the inner wall of the reaction vessel 51 to which the seventh waste liquid L3 is attached is rinsed with the eighth waste liquid W2. The seventh waste liquid L3 has a significantly lower waste liquid concentration than the first waste liquid E. Further, the total amount of the seventh waste liquid L3 is significantly smaller than the total amount of the first waste liquid E. Furthermore, the total amount of the seventh waste liquid L3 is significantly smaller than the total amount of the second pure water supplied to the reaction vessel 51. Therefore, the waste liquid concentration of the eighth waste liquid W2 is significantly lower than the waste liquid concentration of the first waste liquid E. Further, the cleaning operation of these steps corresponds to an example of the second cleaning performed by the cleaning unit 13D corresponding to an example of the second cleaning unit. The portion formed by the seventh waste liquid L3 corresponds to an example of a “liquid rising portion”.

(Step 1-6)
When the suction port 1301a reaches the upper position, the cleaning unit drive unit 703 stops the upward movement of the cleaning unit 13D.

(Step 1-7)
When the cleaning operation of cycle 4 is completed by performing the processing of steps 1-1 to 1-6, the reaction vessel driving unit 304 moves the reaction vessel 51 in the rotation direction. The reactor drive unit 304 stops the reaction vessel 51 that has been stopped at the cleaning position P4, at the cleaning position P5 that is shifted by one in the rotational direction (step 2-1), and this cleaning position P5. Thus, the cleaning operation of cycle 5 is performed. This operation is performed in the same manner as in step 1-7 of cycle 1.

  For example, the reaction container 51 stops at the cleaning position P5 after rotating at least once in the reaction chamber 5. In this case, the reaction vessel 51 rotates the reaction chamber 5 at least once in a state where the eighth waste liquid W2 is stored therein. The time for which the reaction vessel 51 rotates can be set, for example, in the same manner as the time mentioned in Step 1-7 of cycle 1.

  In this cycle, the inner wall of the reaction vessel 51 is rinsed at once to the position of height A with the second pure water. That is, the cleaning operation in cycles 1 to 3 does not change the maximum height of the waste liquid adhering to the inner wall of the reaction vessel 51, and reduces the waste liquid concentration of the waste liquid to some extent, Rinse all the way up to the height A position with pure water. In other words, if the maximum height of the waste liquid adhering to the inner wall fluctuates by washing the inner wall of the reaction vessel 51 with a detergent or the like, the waste liquid may remain on the inner wall after the washing. Therefore, the maximum height of the waste liquid and detergent that rises up the inner wall is set to the maximum height (for example, position A) obtained by empirical rules, and based on this, the cleaning operation of cycles 1 to 3 is performed. It is possible to prevent the waste liquid from remaining on the inner wall after the cleaning.

[Cycle 5]
The cleaning operation in cycle 5 will be described in the order of steps 1-1 to 2-1. The cleaning operation of cycle 5 is performed at the cleaning position P5. At the cleaning position P5, the eighth waste liquid W2 stored in the reaction container 51 is sucked and discharged from the suction port 1301a of the cleaning unit 13E, and is rinsed into the reaction container 51 from the discharge port 1302a of the cleaning unit 13E. The third pure water is supplied.

(Step 1-1)
In response to the instruction from the control unit 27, the cleaning unit drive unit 703 drives the cleaning unit 13E to move the suction port 1301a from the upper position above the reaction vessel 51 to the bottom portion near the bottom in the reaction vessel 51. The cleaning unit 13E is moved downward so as to be moved to the vicinity position. At this time, the discharge port 1302a is also moved to the vicinity of the position near the bottom. In response to an instruction from the control unit 27, the discharge processing unit 701 drives the discharge unit 142 to suck the eighth waste liquid W2 in the reaction vessel 51 from the suction port 1301a, and the eighth waste liquid W2 is sucked. Discharge into the tank 134D. Specifically, the discharge processing unit 701 drives the waste liquid discharge pump 138A to suck the eighth waste liquid W2 from the suction port 1301a. The sucked eighth waste liquid W2 is transported to the tank 134D through the flow path.

  The suction of the eighth waste liquid W2 is exemplified in the description of steps 1-2 to 1-3 of cycle 1 by replacing the cleaning unit 13A with the cleaning unit 13E and the first waste liquid E with the eighth waste liquid W2, for example. Further, it can be performed in the same manner as the first example and the second example. In the second example, the discharge processing unit 701 drives the cleaning unit 13E to start suction when the height of the suction port 1301a reaches the position A.

  The eighth waste liquid W2 remains on the inner wall of the reaction vessel 51 after the eighth waste liquid W2 is discharged by the cleaning unit 13E. The eighth waste liquid W2 adheres to the inner wall of the reaction vessel 51. The first waste liquid E adheres to the portion of the inner wall of the reaction vessel 51 up to the height of the position A shown in FIG.

(Step 1-2)
When the suction port 1301a reaches the position near the bottom, which is the lowest point, the control unit 27 instructs the cleaning unit drive unit 703 to temporarily stop the downward movement of the cleaning unit 13E. In response to an instruction from the control unit 27, the cleaning unit drive unit 703 temporarily stops the downward movement. Further, the control unit 27 instructs the discharge processing unit 701 to stop driving the discharge unit 142. In response to an instruction from the control unit 27, the discharge processing unit 701 stops the suction and discharge of the eighth waste liquid W2.

(Steps 1-3 to 1-5)
When the suction port 1301a reaches the position near the bottom, which is the lowest point, the control unit 27 causes the cleaning unit drive unit 703 to temporarily stop the downward movement of the cleaning unit 13E, and then lifts the cleaning unit 13E. Instruct to move. Upon receiving an instruction from the control unit 27, the cleaning unit drive unit 703 drives the cleaning unit 13E to move the cleaning unit 13E upward so that the discharge port 1302a is moved from the vicinity of the bottom portion to the upper position. . In response to an instruction from the control unit 27, the supply processing unit 702 drives the supply unit 140 to supply third pure water as a rinsing liquid from the discharge port 1302 a into the reaction vessel 51.

  For example, the same third pure water as the second pure water is used. The supply of the third pure water to the reaction vessel 51 can be performed in the same manner as steps 1-3 to 1-6 of cycle 4 by replacing the second pure water with the third pure water. The third pure water supplied into the reaction vessel 51 is supplied until the liquid level reaches the position A in the reaction vessel 51. The third pure water is mixed with the eighth waste liquid W2 remaining in the reaction vessel 51 to generate a ninth waste liquid W3. Thus, the ninth waste liquid W3 is stored in the region up to the position A in the reaction vessel 51. That is, the second pure water is stored up to the highest position where the first waste liquid E will rise on the inner wall of the reaction vessel 51. When the third pure water is supplied to the reaction vessel 51, the control unit 27 can drive the discharge unit 142 to suck the ninth waste liquid W3 in the reaction vessel 51 from the suction port 1301a. Thereby, a swirling flow from the discharge port 1302a to the suction port 1301a is generated in the ninth waste liquid W3 in the reaction vessel 51. When the supply of the third pure water by the supply unit 140 and the discharge of the ninth waste liquid W3 by the discharge unit 142 are simultaneously performed on the reaction vessel 51, the supply amount of the third pure water and the ninth The amount of difference from the discharge amount of the waste liquid W3 is defined as the storage amount of the eighth waste liquid W2 in the reaction vessel 51.

  By storing the ninth waste liquid W3 up to the position A in the reaction vessel 51, the inner wall of the reaction vessel 51 to which the eighth waste liquid W2 is attached is rinsed by the ninth waste liquid W3. The ninth waste liquid W3 has a lower waste liquid concentration than the eighth waste liquid W2. Therefore, the waste liquid concentration of the ninth waste liquid W3 is further lower than the waste liquid concentration of the eighth waste liquid W2. In the reaction vessel 51, the liquid level height of the eighth waste liquid W2 and the liquid level height of the ninth waste liquid W3 were made equal. Therefore, for example, even if the eighth waste liquid W2 rises on the inner wall of the reaction vessel 51 and adheres to a position higher than the position A, the ninth waste liquid W3 rises to the vicinity of the position. The eighth waste liquid W2 adhering to a position higher than the position A can be rinsed with the ninth waste liquid W3. The cleaning operation in these steps corresponds to an example of the second cleaning performed by the cleaning unit 13E corresponding to an example of the second cleaning unit.

(Step 1-6)
When the suction port 1301a reaches the upper position, the cleaning unit drive unit 703 stops the upward movement of the cleaning unit 13E.

(Step 1-7)
When the cleaning operation of cycle 4 is completed by performing the processing of steps 1-1 to 1-6, the reaction vessel driving unit 304 moves the reaction vessel 51 in the rotation direction. The reaction chamber drive unit 304 stops the reaction vessel 51 that has stopped at the cleaning position P5, at the cleaning position P6 that is shifted by one in the rotational direction (step 2-1), and this cleaning position P6. Thus, the cleaning operation of cycle 6 is performed. This operation is performed in the same manner as in step 1-7 of cycle 1.

  For example, the reaction vessel 51 stops at the washing position P6 after rotating at least one turn in the reaction chamber 5. In this case, the reaction vessel 51 rotates the reaction chamber 5 at least once in a state where the ninth waste liquid W3 is stored therein. When the eighth waste liquid W2 rises and adheres to the inner wall of the reaction vessel 51, the ninth waste liquid W3 comes into contact with the eighth waste liquid W2 by the rotating centrifugal force, vibration, and the like. Since the ninth waste liquid W3 has a lower waste liquid concentration than the eighth waste liquid W2, the eighth waste liquid W2 adhering to the inner wall of the reaction vessel 51 is rinsed by the ninth waste liquid W3 by this contact. The time for which the reaction vessel 51 rotates can be set, for example, in the same manner as the time mentioned in Step 1-7 of cycle 1.

  In this cycle, the inner wall of the reaction vessel 51 is rinsed to the position of height A with the third pure water. The cleaning operations of the cycle 5 and the cycle 6 can be omitted when it is determined that the waste liquid concentration of the eighth waste liquid W2 generated by rinsing with the second pure water is equal to or lower than a predetermined concentration. The waste liquid concentration of the eighth waste liquid W2 is determined from the type of the first waste liquid E, for example.

[Cycle 6]
The cleaning operation of cycle 6 is performed at the cleaning position P6. At the cleaning position P6, the ninth waste liquid W3 accommodated in the reaction container 51 is sucked and discharged from the suction port 1301a of the cleaning unit 13F, and is rinsed into the reaction container 51 from the discharge port 1302a of the cleaning unit 13F. The 4th pure water which is is supplied. In the cleaning operation of cycle 6, the cleaning unit 13E is the cleaning unit 13F, the eighth waste liquid W2 is the ninth waste liquid W3, the third pure water is the fourth pure water, the ninth waste liquid W3 is the tenth waste liquid. W4 can be performed in the same manner as the cleaning operation in cycle 5. Here, the tenth waste liquid W4 contains the fourth pure water.

  In the cycle, the fourth pure water is supplied as the rinsing liquid to the reaction vessel 51 by the washing process of steps 1-1 to 1-6, and the tenth waste liquid W4 is supplied to the height of the position A of the reaction vessel 51. Is stored. Therefore, even if the ninth waste liquid W3 rises on the inner wall of the reaction vessel 51 and adheres to a position higher than the position A, the tenth waste liquid W4 rises to the vicinity of the position. The ninth waste liquid W3 adhering to a position higher than A can be rinsed with the tenth waste liquid W4. Further, the cleaning operation in steps 1-3 to 1-5 corresponds to an example of a second cleaning performed by a cleaning unit 13F corresponding to an example of a second cleaning unit.

  Further, in step 1-7, the reaction vessel 51 is cleaned at a position shifted by at least one turn in the turning direction of the reaction vessel 5 with the tenth waste liquid W4 stored therein. Stop (step 2-1) at position P7. In this cleaning position P7, the cleaning operation of cycle 7 is performed. When the ninth waste liquid W3 comes up and adheres to the inner wall of the reaction vessel 51, the tenth waste liquid W4 comes into contact with the ninth waste liquid W3 by the rotating centrifugal force, vibration, and the like. Since the tenth waste liquid W4 has a lower waste liquid concentration than the ninth waste liquid W3, the ninth waste liquid W3 adhering to the inner wall of the reaction vessel 51 is rinsed by the eighth waste liquid W2 by this contact. The time for which the reaction vessel 51 rotates can be set, for example, in the same manner as the time mentioned in Step 1-7 of cycle 1.

[Cycle 7]
The cleaning operation of cycle 7 will be described in the order of steps 1-1 to 2-1. The cleaning operation of cycle 7 is performed at the cleaning position P7. At the cleaning position P7, the tenth waste liquid W4 stored in the reaction vessel 51 is discharged from the suction port 132a of the cleaning unit 13G.

(Step 1-1)
In response to the instruction from the control unit 27, the cleaning unit driving unit 703 drives the cleaning unit 13G, so that the suction port 132a is located near the bottom in the reaction vessel 51 from the upper position above the reaction vessel 51. The cleaning unit 13G is moved downward so as to be moved to the vicinity position. Further, upon receiving an instruction from the control unit 27, the discharge processing unit 701 drives the discharge unit 142 to suck the tenth waste liquid W4 in the reaction vessel 51 from the suction port 132a, and the tenth waste liquid W4 is drawn. Discharge into the tank 134E. Specifically, the discharge processing unit 701 sucks the tenth waste liquid W4 from the suction port 132a by driving the waste liquid discharge pump 138B. The sucked tenth waste liquid W4 is transported to the tank 134E through the discharge channel.

  The suction of the tenth waste liquid W4 is exemplified in the description of steps 1-2 to 1-3 of cycle 1 by replacing the cleaning unit 13A with the cleaning unit 13G and the first waste liquid E with the tenth waste liquid W4, for example. Further, it can be performed in the same manner as the first example and the second example. In the second example, the discharge processing unit 701 drives the cleaning unit 13G to start suction when the height of the suction port 132a reaches the position A.

(Step 1-2)
When the suction port 132a reaches a predetermined position which is the lowest point, the control unit 27 instructs the cleaning unit drive unit 703 to temporarily stop the downward movement of the cleaning unit 13E. Examples of the predetermined position include a position slightly higher than the position near the bottom that is the lowest point. The reason is that the drying operation by the cycle 8 can be efficiently performed by intentionally leaving the tenth waste liquid W4 in the reaction vessel 51. Therefore, the length of the suction nozzle 132 is shorter than the length of the suction nozzle 1301 and the suction nozzle 1311. When the suction port 132a reaches a predetermined position that is the lowest point, the control unit 27 instructs the discharge processing unit 701 to stop driving the discharge unit 142. Upon receiving an instruction from the control unit 27, the discharge processing unit 701 stops the suction and discharge operations of the tenth waste liquid W4.

(Steps 1-3 to 1-5)
When the suction port 1301a reaches a predetermined position which is the lowest point, the control unit 27 causes the cleaning unit drive unit 703 to temporarily stop the downward movement of the cleaning unit 13G, and then lifts the cleaning unit 13G. Instruct to move. In response to an instruction from the control unit 27, the cleaning unit drive unit 703 drives the cleaning unit 13G to move the cleaning unit 13G upward so that the suction port 132a is moved from the vicinity of the predetermined position to the upper position. .

(Step 1-6)
When the suction port 132a reaches the upper position, the cleaning unit drive unit 703 stops the upward movement of the cleaning unit 13F.

(Step 1-7)
When the cleaning operation of cycle 7 is completed by performing the processing of steps 1-1 to 1-6, the reaction container driving unit 304 moves the reaction vessel 51 in the rotation direction. The reaction chamber drive unit 304 stops the reaction container 51 that has been stopped at the cleaning position P7 at the drying position P8 that is shifted by one in the rotational direction (step 2-1), and this drying position P8. Thus, the drying operation of cycle 8 is performed. This operation is performed in the same manner as in step 1-7 of cycle 1.

[Cycle 8]
The drying operation in cycle 8 will be described in the order of steps 1-1 to 2-1. The drying operation of cycle 8 is performed at the drying position P8. At the drying position P8, the tenth waste liquid W4 is discharged from the suction hole (not shown) of the drying unit 13H, and the inner wall of the reaction vessel 51 is dried by the drying tip 1332. As the dry tip 1332, a porous tip having water absorption is used. The drying chip 1332 enters and retracts into the reaction vessel 51 stopped at the drying position P8, thereby absorbing the tenth waste liquid W4 adhering to the reaction vessel 51 and drying the reaction vessel 51.

(Step 1-1)
Upon receiving an instruction from the control unit 27, the cleaning unit driving unit 703 drives the drying unit 13 </ b> H so that the lower end surface of the drying chip 1332 moves from the upper position above the reaction container 51 to the bottom of the reaction container 51. The drying unit 13H is moved so as to be moved to a position near the bottom near the bottom.

(Step 1-2)
When the lower end surface of the drying tip 1332 reaches the position near the bottom, which is the lowest point, the control unit 27 instructs the cleaning unit driving unit 703 to temporarily stop the downward movement of the drying unit 13H.

(Step 1-3)
When the lower end surface of the dry chip 1332 reaches the position near the bottom, the control unit 27 instructs the discharge processing unit 701 to start driving the discharge unit 142. In response to the instruction from the control unit 27, the discharge processing unit 701 starts the suction and discharge operations of the tenth waste liquid W4. Specifically, the discharge processing unit 701 receives an instruction from the control unit 27, drives the discharge unit 142, and the tenth waste liquid remaining in the reaction vessel 51 from the suction hole (not shown) via the drying chip 1332. Aspirate W4. The sucked tenth waste liquid W4 is discharged into the tank 134E. Specifically, the discharge processing unit 701 drives the waste liquid discharge pump 138B to suck the tenth waste liquid W4 from this suction hole. The sucked tenth waste liquid W4 is transported to the tank 134E through the discharge channel. At this time, the tenth waste liquid W4 can be infiltrated into the entire dry chip 1332 by leaving a predetermined amount of the tenth waste liquid W4 in the reaction vessel 51. Thereby, the instantaneous pressure of the suction by the waste liquid discharge pump 138B can be increased. As a result, the tenth waste liquid W4 can be efficiently sucked. The suction and discharge operations may be started simultaneously with the start of the lowering operation of the drying unit 13H.

(Steps 1-4 to 1-5)
When the lower end surface of the drying chip 1332 reaches the position near the bottom, which is the lowest point, the control unit 27 causes the cleaning unit driving unit 703 to temporarily stop the lowering movement of the drying unit 13H, and then to the drying unit 13H. Instruct them to move up. In response to the instruction from the control unit 27, the cleaning unit drive unit 703 moves the drying unit 13H upward so that the lower end surface of the drying chip 1332 is moved from the vicinity of the bottom portion to the upper position. During the upward movement, the discharge processing unit 701 continues the suction operation of the tenth waste liquid W4 in the reaction vessel 51.

(Step 1-6)
When the lower end surface of the drying chip 1332 reaches the upper position, the cleaning unit driving unit 703 stops the upward movement of the drying unit 13H.

(Step 1-7)
When the process of steps 1-1 to 1-6 is performed and the drying operation of the cycle 8 is completed, the reaction container driving unit 304 moves the reaction vessel 51 in the rotation direction. The reaction container driving unit 304 stops the reaction vessel 51 that has been stopped at the drying position P8 at a position (not shown) that is shifted by one in the rotation direction. The reaction vessel 51 stopped at this position can be used for the next sample and reagent dispensing.

  In the description of the above cycles 1 to 8, the cleaning unit drive unit 703 moves each cleaning unit and the drying unit 13H independently, but the cleaning unit drive unit 703 includes the cleaning units 13A to 13G and The drying unit 13H can be operated uniformly. That is, the cleaning device driving unit 700 can simultaneously perform the operations in the cycles 1 to 8 at each cleaning position.

  In this case, the cleaning unit drive unit 703 moves each cleaning unit down and up so that the suction port 1301a and the suction port 1311a provided in each cleaning unit have the same height. The cleaning unit drive unit 703 includes a suction port 132a provided in the cleaning unit 13G, and the suction port 1301a and the suction port 1311a provided in each cleaning unit have the same height, or these suction ports. The cleaning unit 13G is moved down and moved up so that the position becomes higher. Further, the cleaning unit drive unit 703 includes a bottom surface of the drying chip 1332 provided in the drying unit 13H, and the suction port 1301a and the suction port 1311a provided in each cleaning unit have the same height, or these The drying unit 13H is lowered and moved upward so that the position is higher than the suction port. In each cleaning unit, since the supply port is provided at a position higher than the suction port, the reaction chamber drive unit 304 is at the timing when the suction port 1301a that moves up and the suction port 1311a reach the upper position. The reaction chamber 5 is rotated.

  The cleaning device 13 provided in the automatic analyzer 10 of this embodiment, when the waste liquid concentration of the waste liquid to be subjected to the cleaning process is high, the liquid used in the cleaning process and the waste liquid generated in the cleaning process. The positions (for example, positions B, C, and D) that touch the inner wall of the reaction vessel 51 are lowered. Further, when the concentration of the waste liquid to be cleaned is low, the position of the liquid used in the cleaning process and the position of the waste liquid generated in the cleaning process that touches the inner wall of the reaction vessel 51 (for example, position A) is increased. To do. The waste liquid having a high waste liquid concentration refers to, for example, a waste liquid that does not contain a rinsing liquid. Further, the waste liquid having a low waste liquid concentration means, for example, a waste liquid containing a rinsing liquid. As a liquid level height of a waste liquid with a high waste liquid concentration, for example, the liquid level height of a mixed liquid after measurement is equal to or lower than the liquid level height. Further, the height of the inner wall may be a height at which the detergent touches. The liquid level height of the waste liquid having a low waste liquid concentration is, for example, equal to or lower than the highest position where the mixed liquid after the measurement will rise on the inner wall of the reaction vessel 51. Is mentioned.

  In addition, the cleaning unit 13 </ b> A and the cleaning units 13 </ b> D to 13 </ b> F can be configured using the shower nozzle 131 instead of the nozzle unit 130. In this case, the position where the pure water hits the inner wall of the reaction vessel 51 is in the vicinity of the liquid level position of the waste liquid stored at each position described above. Since the shower nozzle 131 is likely to be clogged with an opening in the cleaning process and expensive, the cleaning unit 13 </ b> A and the cleaning units 13 </ b> D to 13 </ b> F are preferably configured using the nozzle unit 130. In addition, the cleaning unit 13B and the cleaning unit 13C can be configured by the nozzle unit 130. In that case, since the detergent cannot be applied directly to the inner wall of the reaction vessel 51, the detergent is stored in the reaction vessel 51. The liquid level of the detergent is set at, for example, a position having the same height as the position B or a position lower than the position B (for example, position C and position D) in consideration of liquid rising on the inner wall. The

  The position A can also be set with respect to the positions B to D. For example, the height of the position A can be set by multiplying the height of the position B, the position C, or the position D by a predetermined multiple. For example, the position A can be a height obtained by multiplying the height of the position B, the position C, or the position D by an arbitrary number in the range of 1.3 to 3 times. Specifically, the height obtained by multiplying the height of the position B, the position C, or the position D by 1.3 times, 1.5 times, 2 times, 2.5 times, or 3 times is the position A. And If the height of the position A set in this case exceeds the total height of the reaction vessel 51, the position of the top of the reaction vessel 51 is set to the position A.

  The configuration and operation of the drive control unit 25 and the cleaning device 13 have been described above in order from cycle 1 to cycle 8.

[Operation and effect of automatic analyzer]
In the automatic analyzer 10 of this embodiment, when the reaction vessel 51 is washed by the washing device 13, the cleaning liquid (first pure water, alkaline detergent, and acidic detergent) that contacts the inner wall of the reaction vessel 51 in cycles 1 to 3. ) With respect to the position of the drive controller 25 and the cleaning device so as to increase the level of the rinse liquid (second to fourth pure water) stored in the reaction vessel 51 in cycles 4 to 6. 13 was constructed. That is, the cleaning operation in cycles 1 to 3 does not change the maximum height of the waste liquid adhering to the inner wall of the reaction vessel 51, and reduces the waste liquid concentration of the waste liquid to some extent, The inner wall of the reaction vessel 51 is rinsed with pure water all at once to the highest position where the liquid will rise. In other words, if the maximum height of the waste liquid adhering to the inner wall fluctuates by washing the inner wall of the reaction vessel 51 with a detergent or the like, the waste liquid may remain on the inner wall after the washing. Therefore, the maximum height of the waste liquid and detergent that rises up the inner wall is set to the maximum height (for example, position A) obtained by empirical rules, and based on this, the cleaning operation of cycles 1 to 3 is performed. It is possible to prevent the waste liquid from remaining on the inner wall after the cleaning.

  In addition, the first pure water was brought into contact with the portion LO where the first waste liquid E came up and adhered to the inner wall of the reaction vessel 51 to produce a third waste liquid L1. . The third waste liquid L1 has a lower waste liquid concentration than the first waste liquid E. A detergent (an alkaline detergent and an acidic detergent) was sprayed on the inner wall, and the jet collided to diffuse the detergent on the inner wall. Thereby, the detergent was brought into contact with the third waste liquid L1, and the fifth waste liquid L2 and the seventh waste liquid L3 were made to come into contact. The fifth waste liquid L2 has a lower waste liquid concentration than the third waste liquid L1. The seventh waste liquid L3 has a lower waste liquid concentration than the fifth waste liquid L2. In this manner, the concentration of the waste liquid that has risen from the inner wall of the reaction vessel 51 can be lowered stepwise in a region lower than the highest position where the liquid will rise. Thereby, it is possible to reduce the concentration of the waste liquid that has risen without raising the highest position where the liquid would have risen.

  After reducing the waste liquid concentration of the waste liquid that has risen, a large amount of pure water was supplied to rinse the inner wall, so that the waste liquid concentration of the waste liquid generated by this rinsing can be reduced. Further, since this rinsing is performed a plurality of times, the waste liquid concentration of the finally generated waste liquid can be made almost zero. In addition, even if the waste liquid generated by this rinsing rises on the inner wall of the reaction vessel 51 and adheres to a position higher than the highest position where the first waste liquid E has risen, Since the rinsing liquid rises to the vicinity of the position, the waste liquid adhering to the position can be rinsed.

  Further, the reaction vessel 51 to which pure water as the rinsing liquid is supplied, for example, rotates at least once in the reaction chamber 5 and then stops at the next cleaning position. In this case, the reaction vessel 51 rotates the reaction chamber 5 at least once in a state where the waste liquid is stored therein. When a waste liquid having a higher concentration of waste liquid than the waste liquid rises and adheres on the inner wall of the reaction vessel 51, the waste liquid concentration has a lower waste liquid concentration due to the rotating centrifugal force, vibration, etc. Waste liquid comes into contact. By this contact, the waste liquid having a high waste liquid concentration attached to the inner wall of the reaction vessel 51 can be rinsed with the waste liquid having a low waste liquid concentration. That is, when cleaning the reaction vessel 51, the control unit 27 controls the cleaning device 13 to change the position where the liquid touches the inner wall of the reaction vessel 51 according to the waste liquid concentration of the waste liquid. This liquid includes a liquid (detergent, pure water, etc.) used in the cleaning process and a waste liquid generated in the cleaning process.

  Furthermore, the cleaning device 13 is configured so that the suction ports of the nozzle unit 130 and the shower nozzle 131 provided in each cleaning unit are equal, and each cleaning unit is configured to be operable in synchronization. The cleaning process of the plurality of reaction vessels 51 can be performed simultaneously by one ascending and descending movement.

  As a result, the cleaning device 13 can reliably clean the inner wall of the reaction vessel 51, and drastically less waste liquid from washing remains on the inner wall of the reaction vessel 51 due to liquid rising or the like. can do. That is, the amount of the residue attached to the inner wall of the reaction vessel 51 cleaned by the cleaning device 13 provided in the automatic analyzer 10 of this embodiment can be drastically reduced. As a result, the automatic analyzer 10 can perform measurement using the reaction vessel 51, and can maintain high measurement reliability.

  The configuration described in the above embodiment can be applied to clinical examination apparatuses other than the automatic analyzer.

  Examples of clinical testing apparatuses include clinical analyzers such as automatic analyzers, blood gas analyzers, electrophoresis apparatuses, and liquid chromatography apparatuses, nuclear medicine apparatuses such as radioimmunoassay apparatuses, latex agglutination reaction measuring apparatuses, and nephelometers. Blood test equipment such as immune serum test equipment, automatic blood cell counter, blood coagulation measurement equipment, microbe classification and identification equipment, bacteria culture test equipment such as blood culture test equipment and DNA / RNA measurement equipment, urine analysis equipment, fecal occult blood measurement equipment, etc. Urinalysis equipment, pathological examination equipment such as automatic tissue cell staining equipment, physiological function testing equipment, other clinical examination equipment such as micropipette, washing device dispensing device, and centrifuge.

  Although several embodiments of the present invention have been described, these embodiments are presented by way of example and are not intended to limit the scope of the invention. These embodiments can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the spirit of the invention. These embodiments and their modifications are included in the scope and gist of the invention, and are also included in the invention described in the claims and the equivalents thereof.

DESCRIPTION OF SYMBOLS 1 Reagent rack 2 1st reagent storage 3 2nd reagent storage 4 Reagent container 5 Reaction storage 6 Disc sampler 7 Sample probe 8 1st reagent probe 9 2nd reagent probe 10 Automatic analyzer 11 Stirring unit 12 Photometric unit 13 Washing device 13A- H Washing unit 24 Analysis unit 25 Drive control unit 26 Drive unit 27 Control unit 30 Data processing unit 40 Output unit 41 Display unit 42 Printing unit 50 Storage unit 51 Reaction vessel 61 Sample container 70 System control unit 80 Operation unit 104 Sample storage drive Part 105 Sample probe driving part 130 Nozzle unit 131 Shower nozzle 132 Suction nozzle 132a Suction port 133 Suction drying unit 134A to E Tank 135A Pure water supply pump 135B Alkaline detergent supply pump 135C Acid detergent supply pump 136A to C Closure valve 37A to C Flow rate adjusting valves 138A, 138B Waste liquid discharge pump 140 Supply unit 141 Wash unit 142 Discharge unit 204 Reagent storage drive unit 205 Reagent probe drive unit 304 Reactor drive unit 305 Stirring device drive unit 700 Cleaning device drive 701 Discharge processing unit 702 Supply processing unit 703 Cleaning unit drive unit 1301 Suction nozzle 1301a Suction port 1302 Ejection nozzle 1302a Ejection port 1303 Holding unit 1311 Suction nozzle 1311a Suction port 1312 Ejection nozzle 1312a Ejection port 1313 Holding unit 1323 Holding unit 1323 1332 Dry chips

Claims (6)

A measurement unit for measuring the components of the liquid dispensed into the container at the measurement position;
After the measurement is completed and the liquid that is the waste liquid is discharged, the waste liquid including the rising portion of the waste liquid adhering to the tube wall is washed by rising along the tube wall of the container. A drive unit for moving the container to a cleaning position;
A first cleaning unit that is provided at the cleaning position and that supplies a cleaning liquid into the container from the outside to perform a first cleaning, and a second cleaning liquid that supplies a rinsing liquid from the outside into the container to perform a second cleaning. A cleaning device comprising two cleaning units;
A cleaning device driving unit for driving the first cleaning unit and the second cleaning unit so as to supply the cleaning liquid and the rinsing liquid, respectively, into the container;
The second cleaning is performed after the first cleaning, and the first position where the cleaning liquid contacts the inner wall of the container in the first cleaning is the same as or lower than the position of the liquid level of the waste liquid. And the second position where the rinsing liquid contacts the inner wall of the container in the second cleaning is higher than the first position and includes the rising part of the waste liquid, A control unit for controlling the cleaning device drive unit;
Comprising
Clinical laboratory equipment. Before SL cleaning device drive unit, the first cleaning unit, and includes a cleaning unit driving unit for vertically moving the second cleaning portion,
The first cleaning portion includes at least a first discharge nozzle for sucking the housed before Symbol container waste liquid discharge, the washing liquid in the container in which the waste liquid is discharged, supplied to said first position A first supply nozzle that
The second cleaning unit includes at least a second discharge nozzle for sucking the waste liquid contained in the prior SL container unloading, the rinsing liquid to the container in which the waste liquid is discharged, to said second position A second supply nozzle for supplying,
The cleaning unit driving unit, the first cleaning unit, and, by vertically moving the second cleaning unit, the cleaning liquid is supplied to said first position, said rinsing liquid the second To the position of
The clinical examination apparatus according to claim 1 characterized by things. The cleaning apparatus includes a first supply unit for supplying the cleaning liquid to the first cleaning unit, and a second supply unit for supplying the rinsing liquid to the second cleaning unit,
The cleaning unit driving unit moves the first cleaning unit up and down, and the height of the first discharge port provided in the first supply nozzle is at least equal to or lower than the height of the first position. The first supply unit supplies the cleaning liquid to the first supply nozzle, and the cleaning device drive unit moves the second cleaning unit downward to move the first supply nozzle to the first supply nozzle. When the height of the second discharge port provided in the second supply nozzle is at least equal to or lower than the height of the second position, the second supply section is provided with respect to the second supply nozzle. Supplying the rinsing liquid;
The clinical examination apparatus according to claim 2 characterized by things. The first cleaning is performed on the container in which waste liquid having a high concentration of waste liquid is accommodated, and the second cleaning is performed on the container in which waste liquid having a low concentration of waste liquid is accommodated. The concentration is determined by the content rate of the waste liquid component after the measurement is completed.
The clinical examination apparatus according to claim 2 or claim 3, characterized by that. The cleaning liquid is a detergent, and the rinsing liquid is pure water.
The clinical examination apparatus according to any one of claims 1 to 4 , wherein the clinical examination apparatus is characterized. After moving the container containing the liquid whose component has been analyzed to the cleaning position and discharging the liquid as waste liquid,
In the cleaning position, a first cleaning is performed by supplying a cleaning liquid from the outside to a position equal to or lower than the position of the liquid level of the waste liquid in the container,
After the first cleaning, a second cleaning is performed in which a rinsing liquid is supplied from the outside into the container. The second cleaning is a first cleaning in which the cleaning liquid contacts the inner wall of the container in the first cleaning. rather higher than the first position, and the rinsing liquid to a second position including the Crawling portion of the waste liquid is carried out so as to contact the inner wall of the container,
Container cleaning method.

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