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JP6364282B2 - Charged particle beam equipment - Google Patents
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JP6364282B2 - Charged particle beam equipment - Google Patents

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JP6364282B2
JP6364282B2 JP2014174724A JP2014174724A JP6364282B2 JP 6364282 B2 JP6364282 B2 JP 6364282B2 JP 2014174724 A JP2014174724 A JP 2014174724A JP 2014174724 A JP2014174724 A JP 2014174724A JP 6364282 B2 JP6364282 B2 JP 6364282B2
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vibration
charged particle
particle beam
transfer function
excitation
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JP2016051536A (en
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信行 牧
信行 牧
井上 智博
智博 井上
桃井 康行
康行 桃井
小田井 正樹
正樹 小田井
博紀 小川
博紀 小川
水落 真樹
真樹 水落
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Hitachi High Tech Corp
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本発明は、走査電子顕微鏡などの荷電粒子線装置に係り、特に振動抑制を可能とする加振機構が設けられた荷電粒子線装置に関する。   The present invention relates to a charged particle beam apparatus such as a scanning electron microscope, and more particularly to a charged particle beam apparatus provided with an excitation mechanism that enables vibration suppression.

近年の半導体素子の微細化に伴い、製造装置、半導体素子を測定、検査、或いは評価する装置にもそれに対応した高精度化が要求されている。通常、半導体ウェハ上に形成したパターンの形状寸法を評価したり、形成されたウェハの欠陥を検査するために、荷電粒子線装置のひとつである走査型電子顕微鏡(以下、SEMと称す)が用いられる。   Accompanying the recent miniaturization of semiconductor elements, manufacturing apparatuses and apparatuses for measuring, inspecting, or evaluating semiconductor elements are required to have high precision corresponding thereto. Usually, a scanning electron microscope (hereinafter referred to as SEM), which is one of charged particle beam devices, is used to evaluate the geometric dimensions of a pattern formed on a semiconductor wafer and inspect defects of the formed wafer. It is done.

SEMによるウェハの検査では、荷電粒子光学鏡筒(以下、光学鏡筒と称す)の内部で、超高真空環境下で発生させた荷電粒子線をウェハ上に照射し、ウェハから放出された二次電子を検出することによって観察画像を取得し、その明暗の変化からパターンエッジを判断して寸法を導き出したり、欠陥を観察したりする。前記した半導体の微細化に対応するためには、高い観察倍率において、よりノイズの少ない二次電子像を得ることが重要である。検査対象であるウェハに対して光学鏡筒が振動すると、荷電粒子線の照射位置が変動し、観察画像に歪みが生じたり、パターンエッジが振動して見えたりする。上記のように、光学鏡筒の振動は、観察画像の画質低下を招き、さらにはSEMの分解能低下の一因となり得るため、これを抑える工夫が必要である。   In the inspection of a wafer by SEM, a charged particle beam generated in an ultra-high vacuum environment is irradiated on the wafer inside a charged particle optical column (hereinafter referred to as an optical column), and the two emitted from the wafer. An observation image is acquired by detecting the secondary electrons, and a pattern edge is determined from the change in brightness to derive a dimension, or a defect is observed. In order to cope with the miniaturization of the semiconductor described above, it is important to obtain a secondary electron image with less noise at a high observation magnification. When the optical lens barrel vibrates with respect to the wafer to be inspected, the irradiation position of the charged particle beam changes, and the observed image is distorted or the pattern edge appears to vibrate. As described above, the vibration of the optical lens barrel causes a reduction in the image quality of the observation image, and further contributes to a reduction in the resolution of the SEM.

特許文献1には、高速かつ高精度な振動抑制を実現する機構として、光学鏡筒に加速度センサと加振アクチュエータを搭載し、加速度センサにより取得した振動情報に基づいて加振アクチュエータを駆動し、光学鏡筒振動を相殺する振動抑制技術が開示されている。   In Patent Document 1, as a mechanism for realizing high-speed and high-precision vibration suppression, an acceleration sensor and a vibration actuator are mounted on an optical barrel, and the vibration actuator is driven based on vibration information acquired by the acceleration sensor. A vibration suppression technique that cancels out optical barrel vibration is disclosed.

特許第5162417号公報(対応米国特許USP8,553,199)Japanese Patent No. 5162417 (corresponding US Pat. No. 8,553,199)

しかしながら、特許文献1に示された技術によれば、外乱振動による光学鏡筒の振動抑制は可能であるが、光学鏡筒の振動に対する荷電粒子線の照射位置の変動の影響が確認できていないため、光学鏡筒の主要振動(振幅が大きい周波数成分)を抑制しても荷電粒子線の照射位置の変動が低減されない可能性がある。   However, according to the technique disclosed in Patent Document 1, it is possible to suppress the vibration of the optical barrel due to disturbance vibration, but the influence of the fluctuation of the irradiation position of the charged particle beam on the vibration of the optical barrel has not been confirmed. For this reason, even if the main vibration (frequency component having a large amplitude) of the optical barrel is suppressed, there is a possibility that the fluctuation of the irradiation position of the charged particle beam is not reduced.

また、荷電粒子線の照射位置の変動は低次の光学鏡筒振動の影響が大きいことは事実であるが、ナノメートルオーダの変動を抑制しようとすると光学鏡筒の高次振動の影響も無視できなくなり、加速度センサの配置位置によっては、光学鏡筒振動の節を検出する可能性があり、光学鏡筒の主要振動を検出できない恐れがある。それを回避するために多くの加速度センサを配置することはコストが増大し、制御が煩雑になるため現実的ではない。   In addition, it is true that fluctuations in the irradiation position of charged particle beams are greatly influenced by low-order optical lens barrel vibrations, but if we try to suppress fluctuations in the nanometer order, the effects of higher-order vibrations in the optical lens barrel are ignored. Depending on the position of the acceleration sensor, there is a possibility that a node of the optical lens barrel vibration may be detected, and the main vibration of the optical lens barrel may not be detected. In order to avoid this, it is not practical to arrange a large number of acceleration sensors because the cost increases and the control becomes complicated.

以下に、振動を検出する検出器の検出信号に基づいて、適正な加振を行うことを目的とする荷電粒子線装置を提案する。   In the following, a charged particle beam apparatus intended to perform appropriate excitation based on the detection signal of a detector that detects vibration is proposed.

上記目的を達成するための一態様として、荷電粒子源から放出された荷電粒子ビームを試料に照射する荷電粒子光学鏡筒と、振動を検知する振動検出器と、当該振動検出器の検出信号に基づいて、前記荷電粒子光学鏡筒を加振する加振装置とを備えた荷電粒子線装置であって、前記検出信号と、当該検出信号と前記荷電粒子ビームの照射によって得られる信号に基づく像ゆれとの関情報に基づいて、前記加振装置を制御する制御装置と、前記関連情報を記憶する記憶媒体を備え、前記記憶媒体には、前記加振装置の加振情報と前記検出信号との関係を示す伝達関数(G1)と前記加振情報と前記像ゆれの関係を示す伝達関数(G2)、及び前記検出信号と前記像ゆれとの関係を示す伝達関数(G2/G1)の少なくとも一方が記憶されている荷電粒子線装置を提案する。
As one aspect for achieving the above object, a charged particle optical column that irradiates a sample with a charged particle beam emitted from a charged particle source, a vibration detector that detects vibration, and a detection signal of the vibration detector The charged particle beam apparatus includes a vibration device that vibrates the charged particle optical column, and the image is based on the detection signal and the signal obtained by irradiation of the detection signal and the charged particle beam. based on the relevant information of the swing, and a control device for controlling the vibrating device, comprising a storage medium for storing the related information, the said storage medium, the detection signal and the vibration information of the vibrator A transfer function (G1) indicating the relationship between the excitation information and the image shake, and a transfer function (G2 / G1) indicating the relationship between the detection signal and the image shake. At least one is remembered To propose a charged particle beam apparatus.

上記構成によれば、振動検出器の振動検出に基づいて、適正な加振制御を行うことが可能となる。   According to the above configuration, appropriate excitation control can be performed based on the vibration detection of the vibration detector.

荷電粒子線装置全体を示す図である。(実施例1)It is a figure which shows the whole charged particle beam apparatus. Example 1 荷電粒子線装置の上視図である。It is a top view of a charged particle beam device. 加振装置による加振条件を取得する工程を示すフローチャートである。It is a flowchart which shows the process of acquiring the vibration conditions by a vibration apparatus. 荷電粒子線装置に対する加振制御を行う制御系ブロック図である。It is a control system block diagram which performs excitation control with respect to a charged particle beam apparatus. 荷電粒子線装置全体を示す図である。(実施例2)It is a figure which shows the whole charged particle beam apparatus. (Example 2) 荷電粒子光学鏡筒の固有振動モードを示す図である。It is a figure which shows the natural vibration mode of a charged particle optical lens-barrel.

光学鏡筒の振動がSEMに与える影響について説明する。半導体の微細化に伴い、ウェハの検出すべき欠陥サイズも小さくしなければならない状況にあり、荷電粒子線照射時の光学鏡筒にはナノメートルオーダの振動抑制が求められる。同時に時間当たりに検出する欠陥数については多くしなければならない。さらには、半導体デバイスのウェハサイズの主流はφ300mmからφ450mmに移行されることが予測される。以上のように、SEMが大型化する中で、高分解能化と高スループット化を実現しなければならない。   The influence of the vibration of the optical barrel on the SEM will be described. With the miniaturization of semiconductors, the defect size to be detected on the wafer must be reduced, and the optical column during charged particle beam irradiation is required to suppress vibrations on the order of nanometers. At the same time, the number of defects detected per hour must be increased. Furthermore, the mainstream of the wafer size of semiconductor devices is expected to shift from φ300 mm to φ450 mm. As described above, high resolution and high throughput must be realized as the SEM becomes larger.

SEMによるウェハの検査では、ウェハを搭載保持する試料ステージを観察位置に移動させる必要がある。試料ステージを停止する際の反力により試料室が加振されて光学鏡筒が振動してしまう。試料ステージの移動時間は、装置全体のスループットに大きく影響するため、さらなるスループット向上のためには、試料ステージには高速移動が要求される。高速移動に伴い、試料ステージを停止する際の反力はさらに大きくなるなか、光学鏡筒の振動を速やかに減衰させ、荷電粒子線の照射位置の変動を抑制する必要がある。   In the inspection of a wafer by SEM, it is necessary to move the sample stage on which the wafer is mounted to the observation position. The sample chamber is vibrated by the reaction force when the sample stage is stopped, and the optical barrel vibrates. Since the movement time of the sample stage greatly affects the throughput of the entire apparatus, the sample stage is required to move at a high speed in order to further improve the throughput. Along with the high-speed movement, while the reaction force when stopping the sample stage is further increased, it is necessary to quickly attenuate the vibration of the optical column and suppress the fluctuation of the irradiation position of the charged particle beam.

以下に説明する実施例は、光学鏡筒の振動情報から想定される照射位置の変動を算出し、その値に基づき光学鏡筒を制御加振することで実際の照射位置の変動を抑制し、高精度に観察画像を取得できる荷電粒子線装置に関するものである。   The embodiment described below calculates the fluctuation of the irradiation position assumed from the vibration information of the optical barrel, suppresses the fluctuation of the actual irradiation position by controlling and exciting the optical barrel based on the value, The present invention relates to a charged particle beam apparatus capable of acquiring an observation image with high accuracy.

後述する実施例では例えば、試料を載置する試料ステージと前記試料ステージを内部で支持する試料室と、前記試料室上部に荷電粒子線を前記試料に照射する光学鏡筒を備える荷電粒子線装置であって、前記光学鏡筒の振動を検出する振動検出手段を前記光学鏡筒に配置し、前記光学鏡筒に対して水平方向に加振するための加振手段を一端は前記鏡筒に固定し、もう一端を前記試料室に固定するよう複数配置し、加振手段を制御する制御器を備え、前記制御器は、前記試料に照射する荷電粒子線のずれ量(以下、像ゆれと称す)を求める像ゆれ検出手段と、前記光学鏡筒の振動から像ゆれまでの伝達関数を算出するよう前記加振手段を制御する調整手段と、前記伝達関数を算出するための伝達関数演算手段と、前記伝達関数を記憶する記憶部と、前記伝達関数と前記光学鏡筒の振動情報に基づいた想定像ゆれを算出する想定像ゆれ演算手段と、前記想定像ゆれを相殺するよう前記加振手段を制御する加振制御手段を有し、前記伝達関数を算出するための調整工程では、像ゆれを抑制する周波数範囲を定め加振を実施するよう前記加振手段を制御し、前記制御器で前記伝達関数を算出、記憶し、前記試料の検査を実施する検査工程では、前記光学鏡筒の振動情報が前記制御器に入力され、前記伝達関数に基づいた想定像ゆれを算出し、前記想定像ゆれを相殺するよう加振手段を制御する荷電粒子線装置について、図面を用いて説明する。   In an embodiment to be described later, for example, a charged particle beam apparatus including a sample stage on which a sample is placed, a sample chamber that supports the sample stage inside, and an optical column that irradiates the sample with a charged particle beam on the sample chamber. The vibration detecting means for detecting the vibration of the optical barrel is arranged in the optical barrel, and the vibration means for exciting the optical barrel in the horizontal direction is arranged at one end on the barrel. A plurality of controllers are arranged so that the other end is fixed to the sample chamber, and a controller for controlling the excitation means is provided. The controller controls the amount of deviation of the charged particle beam (hereinafter referred to as image fluctuation) that irradiates the sample. Image fluctuation detecting means for calculating the transfer function, adjusting means for controlling the excitation means so as to calculate a transfer function from vibration of the optical barrel to image fluctuation, and transfer function calculating means for calculating the transfer function And a storage unit for storing the transfer function , Assumed image fluctuation calculation means for calculating an assumed image fluctuation based on the transfer function and vibration information of the optical barrel, and an excitation control means for controlling the excitation means so as to cancel the assumed image fluctuation. In the adjustment step for calculating the transfer function, the excitation unit is controlled so as to perform the excitation by setting a frequency range for suppressing image fluctuation, and the transfer function is calculated and stored by the controller, In an inspection process for inspecting a sample, vibration information of the optical column is input to the controller, and an assumed image shake based on the transfer function is calculated, and an excitation unit is provided to cancel the assumed image shake. A charged particle beam apparatus to be controlled will be described with reference to the drawings.

上述のような構成によれば、試料ステージの停止時の反力や外乱振動に対して像ゆれを高精度に低減できる荷電粒子線装置を提供することができる。また、鏡筒の構造高剛性化を図らなくとも、像ゆれの低減が可能となる。また、鏡筒の励振源を抑制せずとも像ゆれの低減が可能となる。   According to the configuration as described above, it is possible to provide a charged particle beam apparatus that can reduce image fluctuation with high accuracy against reaction force and disturbance vibration when the sample stage is stopped. Further, the image shake can be reduced without increasing the structure of the lens barrel. Further, it is possible to reduce the image shake without suppressing the excitation source of the lens barrel.

本実施例では、SEMや集束イオンビーム装置等の他の荷電粒子線装置、或いは他の測定、検査装置であって、特に半導体の測定、検査、或いは評価を目的とした装置に適用可能な光学鏡筒であって、像ゆれを高精度に抑制することが可能な光学鏡筒の振動抑制機構について、以下、図面を用いて説明する。   In this embodiment, the optical system can be applied to other charged particle beam devices such as an SEM and a focused ion beam device, or other measurement / inspection devices, particularly for the purpose of measuring, inspecting, or evaluating semiconductors. An optical barrel vibration suppression mechanism that is a lens barrel and can suppress image shake with high accuracy will be described below with reference to the drawings.

図1は、荷電粒子線装置全体を示す図である。本実施例では代表的な荷電粒子線装置であるSEMを用いた半導体検査装置を例に説明するが、本実施例は半導体検査装置に限定されるものではない。   FIG. 1 is a diagram showing the entire charged particle beam apparatus. In the present embodiment, a semiconductor inspection apparatus using an SEM that is a representative charged particle beam apparatus will be described as an example. However, the present embodiment is not limited to the semiconductor inspection apparatus.

試料115は、図示していないが試料室103に取り付けられるロードロック室から挿入される。ロードロック室は大気状態からターボ分子ポンプとドライポンプで真空排気され真空状態に達する。その後、前記試料115は前記試料室103内部のX方向移動可能なXテーブル111とY方向移動可能なYテーブル112を備えた試料ステージ116に載せられる。前記試料室103は、図示していないがターボ分子ポンプとドライポンプにより常に真空状態に維持されている。前記試料115は前記試料ステージ116により、一次電子線105の照射可能な位置に移動し検査を開始する。   Although not shown, the sample 115 is inserted from a load lock chamber attached to the sample chamber 103. The load lock chamber is evacuated from the atmospheric state by a turbo molecular pump and a dry pump and reaches a vacuum state. Thereafter, the sample 115 is placed on a sample stage 116 having an X table 111 movable in the X direction and a Y table 112 movable in the Y direction inside the sample chamber 103. Although not shown, the sample chamber 103 is always maintained in a vacuum state by a turbo molecular pump and a dry pump. The sample 115 is moved to a position where the primary electron beam 105 can be irradiated by the sample stage 116, and inspection is started.

光学鏡筒102の内部は、図示していないがイオンポンプにより超高真空状態に維持されている。前記光学鏡筒102内部の電子銃104から発生した前記一次電子線105は収束レンズ106で絞られ、対物レンズ107により焦点を合わせた状態で走査偏光器108により観察する前記試料115の表面を二次元状に走査しながら、照射される。前記一次電子線105を照射された前記試料115から放出された二次電子109は二次電子検出器110により検出され、像ゆれ検出手段121に入力される。前記像ゆれ検出手段121は、検出された二次電子量をもとに前記試料115のパターン形状を画像として表示する機能を有し、また、表示された画像情報から例えばパターンエッジの振動振幅を計測し、FFT処理により周波数軸に対する振動振幅として取得し、その情報を像ゆれと決定する機能を有している。   Although not shown, the inside of the optical barrel 102 is maintained in an ultrahigh vacuum state by an ion pump. The primary electron beam 105 generated from the electron gun 104 inside the optical barrel 102 is focused by a converging lens 106, and the surface of the sample 115 observed by the scanning polarizer 108 in a state of being focused by the objective lens 107 is two. Irradiated while scanning in a dimension. Secondary electrons 109 emitted from the sample 115 irradiated with the primary electron beam 105 are detected by a secondary electron detector 110 and input to an image shake detection means 121. The image fluctuation detecting means 121 has a function of displaying the pattern shape of the sample 115 as an image based on the detected amount of secondary electrons, and for example, the vibration amplitude of the pattern edge is displayed from the displayed image information. It has a function of measuring and acquiring as vibration amplitude with respect to the frequency axis by FFT processing and determining the information as image shake.

前記光学鏡筒102は根元を前記試料室103で支持され、前記光学鏡筒102には、振動検出手段113が配置され、前記光学鏡筒102の振動情報を検出できる。なお、前記振動検出手段113は、例えば加速度検出計であって、水平2軸方向(X,Y方向)の加速度を取得することを可能とする。   The base of the optical column 102 is supported by the sample chamber 103, and vibration detection means 113 is disposed in the optical column 102 so that vibration information of the optical column 102 can be detected. The vibration detection means 113 is, for example, an acceleration detector, and can acquire acceleration in the horizontal biaxial directions (X and Y directions).

前記光学鏡筒102は根元には、一端を前記光学鏡筒102に固定し、もう一端を前記試料室103に固定した加振手段114を図2のように水平方向に対になるよう配置し、前記光学鏡筒102を水平方向(X,Y方向)に加振することを可能とする。なお、前記加振手段114は、例えば圧電素子であって、発生加振力を加振情報として出力できるものである。   At the base of the optical barrel 102, vibration means 114 having one end fixed to the optical barrel 102 and the other end fixed to the sample chamber 103 are arranged in pairs in the horizontal direction as shown in FIG. The optical barrel 102 can be vibrated in the horizontal direction (X, Y direction). The excitation means 114 is, for example, a piezoelectric element, and can generate a generated excitation force as excitation information.

本実施例では、前記光学鏡筒102の振動による像ゆれの影響を事前に調べる調整を行ってから、前記試料115の検査を実施する。調整工程と検査工程の制御方法について説明する。前記加振手段114を制御するための制御器145は、調整手段120と前記像ゆれ検出手段121と想定像ゆれ演算手段122と加振制御手段123と記憶部207を備える。   In the present embodiment, the sample 115 is inspected after making adjustments for examining in advance the influence of image fluctuation due to vibration of the optical barrel 102. A control method of the adjustment process and the inspection process will be described. The controller 145 for controlling the vibration means 114 includes an adjustment means 120, the image fluctuation detection means 121, an assumed image fluctuation calculation means 122, an excitation control means 123, and a storage unit 207.

調整工程は、前記調整手段120により前記加振手段114を制御し、前記光学鏡筒102を加振し、その時の像ゆれ情報と前記加振手段114の加振情報と前記光学鏡筒102の振動情報を前記想定像ゆれ演算手段122に入力し、前記光学鏡筒102の振動から像ゆれまでの伝達関数を算出し、前記記憶部207に記憶する。   In the adjustment step, the adjusting unit 120 controls the vibration unit 114 to vibrate the optical column 102, and the image shake information at that time, the vibration information of the vibration unit 114, and the optical column 102 Vibration information is input to the assumed image shake calculation means 122, a transfer function from vibration of the optical barrel 102 to image shake is calculated, and stored in the storage unit 207.

検査工程では、前記試料ステージ116停止時の反力や環境外乱により前記光学鏡筒102が励振され、このときの前記光学鏡筒102の振動情報と前記記憶部207に記憶された前記伝達関数から想定される像ゆれを算出し、前記加振制御手段123へ入力し、前記加振手段123で前記想定される像ゆれを相殺するよう前記加振手段114を制御することで高精度に像ゆれを抑制する。   In the inspection process, the optical column 102 is excited by reaction force or environmental disturbance when the sample stage 116 is stopped, and vibration information of the optical column 102 at this time and the transfer function stored in the storage unit 207 are used. An assumed image shake is calculated, input to the vibration control means 123, and the vibration means 114 is controlled by the vibration means 123 so as to cancel the assumed image shake. Suppress.

加振装置による加振条件を取得する手順を、図3を用いて説明する。ステップ300では、前記調整手段120において、操作者が調整範囲の設定を行う。操作者の作業は以上であり、その後は、自動で調整を行う。   A procedure for acquiring the vibration conditions by the vibration device will be described with reference to FIG. In step 300, in the adjustment means 120, the operator sets an adjustment range. The operation of the operator is as described above, and thereafter, adjustment is automatically performed.

例えば、調整値を周波数1Hzから100Hzで1Hz刻みとすると、その後の調整は、1Hz毎に100回行われる。ステップ301では、1Hzで前記光学鏡筒102を加振する。ステップ302では、前記加振手段114の加振情報と、前記光学鏡筒102の振動情報と、像ゆれ情報を取得する。   For example, if the adjustment value is 1 Hz from a frequency of 1 Hz to 100 Hz, the subsequent adjustment is performed 100 times every 1 Hz. In step 301, the optical barrel 102 is vibrated at 1 Hz. In step 302, vibration information of the vibration means 114, vibration information of the optical barrel 102, and image shake information are acquired.

ステップ303では、前記想定像ゆれ演算手段122により前記加振情報から前記光学鏡筒102の振動情報までの伝達関数(G1)と、前記加振情報から前記像ゆれ情報までの伝達関数G2を算出し、前記伝達関数G1と前記伝達関数G2から前記光学鏡筒102の振動から像ゆれまでの伝達関数(G2/G1)206を算出する。ステップ304では、記憶部207に記憶する。ステップ305では、100Hzまでの調整が完了するまで、ステップ301の工程から繰り返す。   In step 303, the assumed image shake calculating means 122 calculates a transfer function (G1) from the excitation information to the vibration information of the optical barrel 102, and a transfer function G2 from the excitation information to the image shake information. Then, a transfer function (G2 / G1) 206 from vibration of the optical barrel 102 to image shake is calculated from the transfer function G1 and the transfer function G2. In step 304, the information is stored in the storage unit 207. In step 305, the process from step 301 is repeated until the adjustment to 100 Hz is completed.

伝達関数(G2/G1)は、言わば振動検出手段113(振動検出器)によって得られた検出信号と、試料から放出された荷電粒子に基づいて形成される画像のゆれとの関連情報であり、当該関連情報を予め取得しておけば、振動検出手段113の検出信号の検出に基づいて、像ゆれを予測することができ、当該像ずれを相殺するように光学鏡筒を加振することによって、適正に像ゆれを抑制することが可能となる。なお、関連情報は、振動検出手段113の出力値と、加振手段114の制御信号との関係を示す関係式として記憶するようにしても良いし、周波数と加振条件との関係を示すテーブルを作成し、所定の記憶媒体に記憶しておくようにしても良いが、本実施例では伝達関数(G2/G1)を関連情報とし、当該関連情報から、制御信号を生成する例について説明する。   The transfer function (G2 / G1) is so-called information related to the detection signal obtained by the vibration detection means 113 (vibration detector) and the fluctuation of the image formed based on the charged particles emitted from the sample. If the relevant information is acquired in advance, the image shake can be predicted based on the detection of the detection signal of the vibration detecting means 113, and the optical barrel is vibrated so as to cancel the image shift. Thus, it is possible to appropriately suppress image shake. The related information may be stored as a relational expression indicating the relationship between the output value of the vibration detecting unit 113 and the control signal of the vibrating unit 114, or a table indicating the relationship between the frequency and the excitation condition. However, in this embodiment, an example in which the transfer function (G2 / G1) is used as related information and a control signal is generated from the related information will be described. .

図4は、荷電粒子線装置に対する加振制御を行う制御系ブロック図である。調整工程で算出、記憶した前記伝達関数(G2/G1)206をフィードバック要素とし、フィードバック制御を行い、像ゆれを抑制する。前記試料ステージ116停止時の反力や外乱振動による外乱加振力210と加振力209は、前記光学鏡筒102に入力され、光学鏡筒振動情報124として出力される。前記光学鏡筒振動情報124は、前記想定像ゆれ伝達関数(G2/G1)206に入力され、想定像ゆれ126を出力する。像ゆれ目標値はゼロであり前記想定前記像ゆれ126は符号を反転し前記加振制御手段123に入力され、想定像ゆれ相殺加振信号127として出力される。前記想定像ゆれ相殺加振信号127は、前記加振手段114に入力され、前記加振力209として出力される。以上の制御を繰り返し行い、像ゆれを抑制し続ける。   FIG. 4 is a block diagram of a control system that performs excitation control on the charged particle beam apparatus. The transfer function (G2 / G1) 206 calculated and stored in the adjustment step is used as a feedback element, and feedback control is performed to suppress image shake. A disturbance excitation force 210 and an excitation force 209 due to reaction force and disturbance vibration when the sample stage 116 is stopped are input to the optical barrel 102 and output as optical barrel vibration information 124. The optical barrel vibration information 124 is input to the assumed image shake transfer function (G2 / G1) 206 and outputs an assumed image shake 126. The target image shake value is zero, and the assumed image shake 126 is inverted in sign and input to the vibration control means 123 and output as an assumed image shake canceling excitation signal 127. The assumed image shake canceling excitation signal 127 is input to the excitation unit 114 and output as the excitation force 209. The above control is repeated to suppress image shake.

上記本実施例によれば、調整工程において算出した前記想定像ゆれ伝達関数(G2/G1)206を用いて、検査工程において、前記光学鏡筒振動情報124に基づき想定される像ゆれを制御の対象とし、光学鏡筒102を加振制御することで高精度な像ゆれ抑制が可能となる。また、前記光学鏡筒102の構造高剛性化を図らなくとも、像ゆれの低減が可能となる。また、前記光学鏡筒102の励振源を抑制、振動経路の絶縁をせずとも像ゆれの低減が可能となる。   According to the present embodiment, the assumed image fluctuation transfer function (G2 / G1) 206 calculated in the adjustment process is used to control the assumed image fluctuation based on the optical barrel vibration information 124 in the inspection process. By subjecting the optical barrel 102 to vibration control, the image shake can be suppressed with high accuracy. In addition, the image shake can be reduced without increasing the structural rigidity of the optical barrel 102. Further, it is possible to reduce the image shake without suppressing the excitation source of the optical barrel 102 and without insulating the vibration path.

図5は、図1に例示した荷電粒子線装置とは異なる位置に、加振手段114を設置した例を示す図である。なお、制御方法については図1と同様であり、図示していない。前記光学鏡筒102は根元には、一端を前記光学鏡筒102に固定し、もう一端を前記試料室103に固定した前記加振手段114を垂直方向に配置し、前記光学鏡筒102を垂直方向(Z方向)に加振することが可能である。前記加振手段114の垂直方向に加振することにより前記光学鏡筒102に曲げモーメントを発生させて、前記光学鏡筒102の加振し像ゆれを抑制する。   FIG. 5 is a diagram illustrating an example in which the excitation unit 114 is installed at a position different from the charged particle beam apparatus illustrated in FIG. 1. The control method is the same as in FIG. 1 and is not shown. At the base of the optical barrel 102, the vibration means 114 having one end fixed to the optical barrel 102 and the other end fixed to the sample chamber 103 is arranged in the vertical direction, and the optical barrel 102 is placed vertically. It is possible to vibrate in the direction (Z direction). By applying vibration in the vertical direction of the vibration means 114, a bending moment is generated in the optical barrel 102, and the shake of the optical barrel 102 is suppressed.

本実施例によれば、前記加振手段114追加、取付け高さの調整、変更、が容易になり、光学鏡筒102の振動挙動に対して、例えば、外乱振動により光学鏡筒102が図6に示すような振動モードで励起された場合、その振動モードの腹に対して加振手段114の一端を固定すれば、小さな加振力でも振動抑制が可能となる。また、高次の振動モードに対しても同様で、予め実験や計算により光学鏡筒の高次の固有振動モードを確認、予測しておけば最小限の加振力を備えた加振手段114を見積もることが可能となる。   According to the present embodiment, the addition of the excitation means 114 and the adjustment and change of the mounting height are facilitated. With respect to the vibration behavior of the optical barrel 102, for example, the optical barrel 102 is shown in FIG. When excited in a vibration mode as shown in Fig. 5, if one end of the vibration means 114 is fixed to the antinode of the vibration mode, vibration can be suppressed even with a small vibration force. The same applies to higher-order vibration modes. If the higher-order natural vibration mode of the optical column is confirmed and predicted in advance by experiments and calculations, the vibration means 114 having a minimum vibration force is provided. Can be estimated.

101 荷電粒子線装置
102 光学鏡筒
103 試料室
104 電子銃
105 一次電子線
106 収束レンズ
107 対物レンズ
108 走査偏光器
109 二次電子
110 二次電子検出器
111 Xテーブル
112 Yテーブル
113 振動検出手段
114 加振手段
115 試料
116 試料ステージ
120 調整手段
121 像ゆれ検出手段
122 想定像ゆれ演算手段
123 加振制御手段
124 光学鏡筒振動情報
126 想定像ゆれ情報
127 想定像ゆれ相殺加振指令
145 制御器
206 想定像ゆれ伝達関数(G2/G1)
207 記憶部
209 加振力
210 外乱加振力
DESCRIPTION OF SYMBOLS 101 Charged particle beam apparatus 102 Optical barrel 103 Sample chamber 104 Electron gun 105 Primary electron beam 106 Converging lens 107 Objective lens 108 Scanning polarizer 109 Secondary electron 110 Secondary electron detector 111 X table 112 Y table 113 Vibration detection means 114 Exciting means 115 Sample 116 Sample stage 120 Adjusting means 121 Image fluctuation detecting means 122 Assumed image fluctuation calculating means 123 Excitation control means 124 Optical barrel vibration information 126 Assumed image fluctuation information 127 Assumed image fluctuation canceling excitation command 145 Controller 206 Assumed image transfer function (G2 / G1)
207 Storage unit 209 Excitation force 210 Disturbance excitation force

Claims (7)

荷電粒子源から放出された荷電粒子ビームを試料に照射する荷電粒子光学鏡筒と、振動を検知する振動検出器と、当該振動検出器の検出信号に基づいて、前記荷電粒子光学鏡筒を加振する加振装置とを備えた荷電粒子線装置であって、
前記検出信号と、当該検出信号と前記荷電粒子ビームの照射によって得られる信号に基づく像ゆれとの関情報に基づいて、前記加振装置を制御する制御装置と、前記関連情報を記憶する記憶媒体を備え、
前記記憶媒体には、前記加振装置の加振情報と前記検出信号との関係を示す伝達関数(G1)と前記加振情報と前記像ゆれの関係を示す伝達関数(G2)、及び前記検出信号と前記像ゆれとの関係を示す伝達関数(G2/G1)の少なくとも一方が記憶されていることを特徴とする荷電粒子線装置。
A charged particle optical column that irradiates a sample with a charged particle beam emitted from a charged particle source, a vibration detector that detects vibration, and the charged particle optical column added based on a detection signal of the vibration detector. A charged particle beam device including a vibration exciting device,
And the detection signal, based on the relevant information of the image shake based on the signal obtained by the irradiation of the detection signal and the charged particle beam, and a control device for controlling the vibrator, a storage for storing the relevant information With media,
The storage medium includes a transfer function (G1) indicating a relationship between the vibration information of the vibration generator and the detection signal, a transfer function (G2) indicating a relationship between the vibration information and the image shake, and the detection. A charged particle beam apparatus , wherein at least one of transfer functions (G2 / G1) indicating a relationship between a signal and the image fluctuation is stored .
請求項1において、
前記記憶媒体には、前記関連情報が周波数単位で記憶されていることを特徴とする荷電粒子線装置。
In claim 1,
The charged particle beam apparatus, wherein the storage medium stores the related information in units of frequency.
請求項1において、
前記制御装置は、異なる周波数の前記加振装置の加振条件ごとに、前記関連情報を取得することを特徴とする荷電粒子線装置。
In claim 1,
The said control apparatus acquires the said relevant information for every vibration condition of the said vibration apparatus of a different frequency, The charged particle beam apparatus characterized by the above-mentioned.
請求項において、
前記制御装置は、異なる周波数の前記加振装置の加振条件ごとに、前記加振装置の加振情報と前記検出信号との関係を示す伝達関数(G1)と前記加振情報と前記像ゆれの関係を示す伝達関数(G2)、及び前記検出信号と前記像ゆれとの関係を示す伝達関数(G2/G1)の少なくとも一方を取得することを特徴とする荷電粒子線装置。
In claim 3 ,
The control device, for each excitation condition of the excitation device having a different frequency, the transfer function (G1) indicating the relationship between the excitation information of the excitation device and the detection signal, the excitation information, and the image fluctuation. And a transfer function (G2 / G1) indicating a relationship between the detection signal and the image fluctuation, and at least one of the transfer function (G2) indicating the relationship between the detection signal and the image fluctuation.
試料を載置する試料ステージと、前記試料ステージを内部で転支する試料室と、前記試料室上部に荷電粒子線を前記試料に照射する光学鏡筒を備える荷電粒子線装置において、
前記光学鏡筒の振動を検出する振動検出手段を前記光学鏡筒に配置し、前記光学鏡筒に対して水平方向に加振するための加振手段を一端は前記光学鏡筒に固定し、もう一端を前記試料室に固定するよう複数配置し、加振手段を制御する制御器を備え、前記制御器は、前記試料に照射する荷電粒子線のずれ量を表す像ゆれを求める像ゆれ検出手段と、前記光学鏡筒の振動から像ゆれまでの伝達関数を算出するよう前記加振手段を制御する調整手段と、前記伝達関数を算出するための伝達関数演算手段と、前記伝達関数を記憶する記憶部と、前記伝達関数と前記光学鏡筒の振動情報に基づいた想定像ゆれを算出する想定像ゆれ演算手段と、前記想定像ゆれを相殺するよう前記加振手段を制御する加振制御手段を有し、
前記伝達関数を算出するための調整工程で、像ゆれを抑制する周波数範囲を定め加振を実施するよう前記加振手段を制御し、前記制御器で前記伝達関数を算出、記憶し、
前記試料の検査を実施する検査工程で、前記光学鏡筒の振動情報が前記制御器に入力され、前記伝達関数に基づいた想定像ゆれを算出し、前記想定像ゆれを相殺するよう加振手段を制御することを特徴とする荷電粒子線装置。
In a charged particle beam apparatus comprising: a sample stage for placing a sample; a sample chamber that internally supports the sample stage; and an optical column that irradiates the sample with a charged particle beam at the upper part of the sample chamber;
A vibration detecting means for detecting vibration of the optical barrel is arranged in the optical barrel, and one end of the vibration means for exciting the optical barrel in the horizontal direction is fixed to the optical barrel, A plurality of controllers are arranged so that the other end is fixed to the sample chamber, and a controller for controlling the vibration means is provided, and the controller detects image fluctuations for obtaining an image fluctuation representing a deviation amount of the charged particle beam applied to the sample. Means, adjustment means for controlling the excitation means so as to calculate a transfer function from vibration of the optical barrel to image shake, transfer function calculation means for calculating the transfer function, and storing the transfer function Storage unit, an assumed image shake calculation unit that calculates an assumed image shake based on the transfer function and vibration information of the optical barrel, and an excitation control that controls the excitation unit to cancel the assumed image shake Having means,
In the adjustment step for calculating the transfer function, the excitation means is controlled so as to implement a vibration by setting a frequency range for suppressing image fluctuation, and the transfer function is calculated and stored by the controller,
In the inspection process for inspecting the sample, vibration information of the optical barrel is input to the controller, and an assumed image shake based on the transfer function is calculated, and an excitation means is used to cancel the assumed image shake. A charged particle beam device characterized by controlling
請求項において、
前記加振手段が、圧電式の加振手段であり、前記加振手段は一端は前記光学鏡筒に固定し、もう一端が前記試料室に固定し、前記光学鏡筒の円筒面に、水平2軸方向に対向に配置しことを特徴とする荷電粒子線装置。
In claim 5 ,
Wherein the vibrating means is a vibrating means of the piezoelectric type, the vibrating means is one end is fixed to the front Symbol optical science barrel, the other end is fixed to the sample chamber, the cylinder before Symbol optical science barrel A charged particle beam device, characterized in that it is disposed on a surface so as to face each other in two horizontal axes.
請求項において、
前記加振手段の加振方向が、前記光学鏡筒に対して垂直方向であることを特徴とする荷電粒子線装置。
In claim 5 ,
The vibration direction of the vibrating means, the charged particle beam apparatus which is a direction perpendicular to the front Symbol optical science barrel.
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