JP6385288B2 - Spectral characteristic measuring device - Google Patents
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Description
本発明は、分光特性測定装置に関する。 The present invention relates to a spectral characteristic measuring apparatus.
分光特性の測定技術として、波長分散型分光法、或いはフーリエ分光法と呼ばれる分光技術を用いた手法が知られている(非特許文献1参照)。波長分散型分光法は、測定試料を透過した光、或いは測定試料面で反射した光(以下「物体光」ともいう。)を回折格子や音響光学可変波長フィルタ(AOTF;Acousto-Optic Tunable Filter)に照射したときに得られる回折光の回折角が、当該物体光の波長に応じて異なる原理を利用した分光法である。 As a technique for measuring spectral characteristics, a technique using a spectral technique called wavelength dispersion spectroscopy or Fourier spectroscopy is known (see Non-Patent Document 1). Wavelength-dispersion spectroscopy uses light that has passed through the measurement sample or reflected from the measurement sample surface (hereinafter also referred to as “object light”) as a diffraction grating or an acousto-optic tunable filter (AOTF). Is a spectroscopic method that uses a principle in which the diffraction angle of the diffracted light obtained when the light is irradiated differs depending on the wavelength of the object light.
一方、フーリエ分光法(FTIR(フーリエ変換赤外分光光度計:Fourier Transform Infrared Spectroscopy))は、マイケルソン型の2光束干渉光学系を用いた位相シフト干渉を利用した分光測定技術である。この方法では物体光をハーフミラーなどのビームスプリッタにより2つに分岐し、それぞれの光束をミラーにより反射させて再度ハーフミラーに到達させ、これら2つの光束を合流させて干渉現象を観察する。2つに分岐した光束のうちの一方(参照光)を反射するミラーは参照ミラーと呼ばれる。フーリエ分光法では、参照ミラーを光の波長よりも短い分解能で高精度に移動させて干渉光強度を変化させ、いわゆるインターフェログラムを得る。そして、このインターフェログラムを数学的にフーリエ変換することにより分光特性を取得する。 On the other hand, Fourier spectroscopy (FTIR (Fourier Transform Infrared Spectroscopy)) is a spectroscopic measurement technique using phase shift interference using a Michelson type two-beam interference optical system. In this method, the object light is split into two by a beam splitter such as a half mirror, the respective light fluxes are reflected by the mirror, reach the half mirror again, and these two light fluxes are merged to observe the interference phenomenon. A mirror that reflects one of the two branched light beams (reference light) is called a reference mirror. In Fourier spectroscopy, the reference mirror is moved with high resolution at a resolution shorter than the wavelength of light to change the intensity of interference light to obtain a so-called interferogram. Then, spectral characteristics are obtained by mathematically Fourier transforming the interferogram.
測定試料から射出される物体光は散乱光線、屈折光線、反射光線等の様々な光線からなり、これら光線の方向も様々である。このように多様な方向の光線成分が回折格子や参照ミラーに照射されると、分光精度が低下する。そのため、いずれの分光法においても物体光の空間的コヒーレンシー(可干渉性)を高めるために、微小開口を有するピンホールやスリットを用いて物体光のうち特定方向の光線成分のみを回折格子や参照ミラーに照射させている。しかしながら、ピンホールやスリットを用いると、大半の物体光がピンホールやスリットを通過せず測定に供しないことから、光の利用効率が低い。 The object light emitted from the measurement sample is composed of various light beams such as scattered light, refracted light, reflected light, and the directions of these light beams are various. When light components in various directions are irradiated on the diffraction grating and the reference mirror in this way, the spectral accuracy is lowered. Therefore, to increase the spatial coherency (coherence) of the object light in any spectroscopic method, only a light component in a specific direction of the object light using a pinhole or slit having a minute aperture is used as a diffraction grating or a reference. The mirror is illuminated. However, when a pinhole or slit is used, most of the object light does not pass through the pinhole or slit and is not used for measurement, so that the light use efficiency is low.
これに対して、特許文献1には、測定試料から発せられる無指向の光線を対物レンズにより平行光束にした上で、結像レンズにより結像面上に集光させて測定試料の2次元の共役像を形成する手法が開示されている。この手法では、多波長光源からの光を測定試料に照射し、その透過光又は反射光を対物レンズに入射させ、平行光束にする。また、図1に示すように、環状の固定ミラーと、該固定ミラーの内側に配置された円板状の可動ミラーから成る位相可変フィルターにより平行光束の一部と残りの平行光束との間に任意の位相差を与える。そして、結像面上に配置されたCCDカメラなどの2次元アレイデバイスの各画素において多波長の干渉強度を検出することにより、干渉強度変化であるインターフェログラムを取得する。 On the other hand, in Patent Document 1, an omnidirectional light beam emitted from a measurement sample is converted into a parallel light beam by an objective lens, and then condensed on an image formation surface by an imaging lens, and the two-dimensional image of the measurement sample is collected. A technique for forming a conjugate image is disclosed. In this method, a measurement sample is irradiated with light from a multi-wavelength light source, and the transmitted light or reflected light is incident on an objective lens to form a parallel light flux. Further, as shown in FIG. 1, a phase variable filter comprising an annular fixed mirror and a disk-shaped movable mirror disposed inside the fixed mirror causes a part of the parallel light beam to be separated from the remaining parallel light beam. Arbitrary phase difference is given. Then, by detecting the multi-wavelength interference intensity at each pixel of a two-dimensional array device such as a CCD camera arranged on the imaging plane, an interferogram that is a change in interference intensity is acquired.
上記可動ミラーはピエゾ素子などにより高精度に機械的に移動される。これにより、物体光間の位相シフト干渉による結像強度変化(インターフェログラム)を全ての画素で同時に観察できる。そして、これらのインターフェログラムを数学的にフーリエ変換することにより2次元の分光特性分布を取得することができる。 The movable mirror is mechanically moved with high accuracy by a piezoelectric element or the like. Thereby, the imaging intensity change (interferogram) due to the phase shift interference between the object lights can be simultaneously observed in all the pixels. A two-dimensional spectral characteristic distribution can be obtained by mathematically Fourier transforming these interferograms.
また、特許文献2には、空間的位相シフト法と呼ばれる手法が開示されている。さらに、マイケルソン干渉計を用いた位相シフト干渉による分光測定技術として、例えば、アルゴ社のFTIR方式の赤外線中長波長域用スペクトルイメージ分光システム、Zygo社の垂直走査型低コヒーレンス干渉法(Coherence Scanning Interferometry)による立体形状計測装置、フルフィールドOCT(Optical Coherence Tomography)と呼ばれる断層計測方式などが知られている。 Patent Document 2 discloses a technique called a spatial phase shift method. Furthermore, spectroscopic measurement techniques based on phase shift interference using a Michelson interferometer include, for example, Argo's FTIR infrared spectral image spectroscopy system for infrared mid- and long-wavelength regions, Zygo's vertical scanning low-coherence interferometry (Coherence Scanning). A three-dimensional shape measuring device using Interferometry, a tomographic method called full-field OCT (Optical Coherence Tomography), and the like are known.
ところが、上記した従来の分光測定技術には次のような問題があった。
まず、物体面上の各輝点を面積の無い理想的な点光源として光学的にモデル化して考える。これらの理想的な輝点は、レンズによるフラウンフォーファ回折により像面上にエアリー(Airy)の回折像と呼ばれる同心円状の明暗縞から成る共役な輝点像を形成する(図2参照)。エアリーの回折像の中心の円形の明るい領域はエアリーディスクと呼ばれ、エアリーディスクの中心から回折像の最初の暗環(第1暗輪体)の幅方向中心までの距離の2倍、すなわち第1暗輪体の直径Rは下記式(1)で得られることが知られている。
R=1.22λ/N.A. (1)
ここでλは光の波長、N.A.(Numerical Aperture)はレンズの数値開口数(N.A.=n×sinθ)である。また、nは屈折率であり、θはレンズ中心から有効径の角度である。
However, the above-described conventional spectroscopic measurement technique has the following problems.
First, each bright spot on the object plane is optically modeled and considered as an ideal point light source having no area. These ideal luminescent spots form a conjugate luminescent spot image consisting of concentric bright and dark stripes called an Airy diffraction image on the image plane by Fraunhofer diffraction by a lens (see FIG. 2). . The circular bright region at the center of the Airy diffraction image is called an Airy disk, which is twice the distance from the center of the Airy disk to the center in the width direction of the first dark ring of the diffraction image (first dark ring), that is, It is known that the diameter R of one dark ring is obtained by the following formula (1).
R = 1.22λ / N. A. (1)
Here, λ is the wavelength of light, and NA (Numerical Aperture) is the numerical numerical aperture (NA = n × sin θ) of the lens. Further, n is a refractive index, and θ is an angle of an effective diameter from the lens center.
エアリーの回折像は、1つの輝点から発せられた多光線の干渉縞として物理的に理解される。すなわち、エアリーディスクの中心では多光線全ての位相が揃っており、光線同士が強め合うため明るい領域となる。また、暗環は、エアリーディスクの中心からの各光線の角度に応じて幾何的に決定される光路長差に応じた位相差により、光線同士が弱め合うため暗い領域となる。 The Airy diffraction image is physically understood as multi-beam interference fringes emitted from one bright spot. That is, at the center of the Airy disk, the phases of all the multi-beams are aligned, and the light beams strengthen each other, resulting in a bright area. Further, the dark ring becomes a dark region because the light beams weaken each other due to the phase difference according to the optical path length difference geometrically determined according to the angle of each light beam from the center of the Airy disk.
1つの輝点から発せられた多光線(物体光束)の半分に位相差π[rad.]を与えると、初期状態(位相差0[rad.])では明るかったエアリーディスクの中心が暗く変化し、暗かった暗環部分は明るく変化する。物体光束に与える位相差を変化させること(以下「位相シフト操作」ともいう。)に伴うエアリーディスクの中心での明暗の変化(干渉光強度変化)をフォトダイオードアレイ検出器等の光検出器で検出するのが、従来の手法によるインターフェログラムの取得原理である。 When the phase difference π [rad.] Is given to half of the multiple rays (object luminous flux) emitted from one bright spot, the center of the bright Airy disk changes darkly in the initial state (phase difference 0 [rad.]). The dark ring part that was dark changes brightly. Changes in light and dark (interference light intensity change) at the center of the Airy disk caused by changing the phase difference given to the object beam (hereinafter also referred to as “phase shift operation”) can be detected by a photodetector such as a photodiode array detector. What is detected is the principle of acquiring an interferogram by a conventional method.
ところが、上述したように、物体面は無数の輝点の集まりからなるため、位相シフト操作を行っても明暗の変化を検出できない場合がある。それは、物体面を構成する無数の輝点を、レーリー基準と呼ばれる距離をおいて存在する2つの輝点からなるペア(以下「輝点ペア」という)の群として考えることにより説明がつく。 However, as described above, since the object surface is composed of an infinite number of bright spots, there may be cases where a change in brightness cannot be detected even if a phase shift operation is performed. This can be explained by considering the innumerable bright spots constituting the object plane as a group of pairs (hereinafter referred to as “bright spot pairs”) consisting of two bright spots existing at a distance called the Rayleigh criterion.
図3に示すように、レーリー基準とは、2つのエアリーの回折像の、エアリーディスクの中心間の距離が第1暗輪体の半径(r=0.61λ/N.A.)に相当する条件をいう。この条件では、輝点ペアから形成される2つのエアリーの回折像は、暗環とエアリーディスクの中心が重なり合っており、互いに打ち消し合う関係にある。この関係は位相シフト操作を行っても変化しないため、位相シフト操作に伴うエアリーディスクの中心位置での干渉強度変化を検出することができない。すなわち、輝点ペアから形成される2つのエアリーの回折像のうちの一方のエアリーディスクの中心領域の輝度を検出する画素を注目画素とすると(図3参照)、該注目画素においては、一方のエアリーディスクの中心が明るい初期状態(位相差0[rad.])では、他方のエアリーディスクの暗環が一方のエアリーディスクの中心に重なる。また、位相差π[rad.]与えた場合は、一方のエアリーディスクの中心が暗くなり、これに、明るい領域に変化した他方のエアリーディスクの暗環領域が重なる。このため、いずれの状態でも当該画素で検出される輝度値はほとんど変化しない。 As shown in FIG. 3, the Rayleigh criterion refers to a condition in which the distance between the centers of the Airy discs of the two Airy diffraction images corresponds to the radius of the first dark ring (r = 0.61λ / NA). Under this condition, the two Airy diffraction images formed from the bright spot pair have a dark ring and the center of the Airy disk overlapping each other and cancel each other. Since this relationship does not change even when the phase shift operation is performed, a change in interference intensity at the center position of the Airy disk accompanying the phase shift operation cannot be detected. That is, when a pixel that detects the luminance of the central region of one Airy disk of two Airy diffraction images formed from a bright spot pair is a pixel of interest (see FIG. 3), In the initial state where the center of the Airy disk is bright (phase difference 0 [rad.]), The dark ring of the other Airy disk overlaps the center of one Airy disk. When the phase difference π [rad.] Is given, the center of one Airy disk becomes dark, and the dark ring area of the other Airy disk that has changed to a bright area overlaps this. For this reason, the luminance value detected by the pixel hardly changes in any state.
上記現象はいずれの輝点ペアから形成される2つのエアリーの回折像においても生じるため、上記のような輝点ペアが物体面上に無数に存在していると考えると、位相シフト操作に伴う干渉強度変化を検出することができないことになり、インターフェログラムの鮮明度が劣化する。 Since the above phenomenon occurs in two Airy diffraction images formed from any pair of bright spots, considering that there are innumerable bright spot pairs as described above on the object plane, the phase shift operation is accompanied. The change in interference intensity cannot be detected, and the clarity of the interferogram deteriorates.
そこで、本発明者は、中赤外光領域(波長:8μm〜14μm)の光を照射したときにほぼ全ての光を吸収する物体(以下「黒体」という。)の表面に金網を配置し、分光特性を測定する実験を行った。図4(a)はデジタルカメラによる金網の撮影画像(光学倍率:1倍)を示し、図4(b)は金網を配置した黒体表面に中赤外領域の光を照射したときの赤外線カメラによる撮影画像(中赤外画像)を示す。また、図4(c)は金網が存在しない黒体表面(図4(b)において(b−1)で示す領域)のインターフェログラムおよびこれをフーリエ変換して得られたスペクトル、図4(d)は金網のエッジ部分の領域(図4(b)において(b−2)で示す領域)のインターフェログラムおよびこれをフーリエ変換して得られたスペクトルを示す。 Therefore, the present inventor arranges a wire mesh on the surface of an object (hereinafter referred to as “black body”) that absorbs almost all light when irradiated with light in the mid-infrared light region (wavelength: 8 μm to 14 μm). An experiment was conducted to measure the spectral characteristics. FIG. 4A shows a captured image (optical magnification: 1 ×) of a wire mesh by a digital camera, and FIG. 4B is an infrared camera when light in the mid-infrared region is irradiated on the black body surface on which the wire mesh is arranged. A photographed image (mid-infrared image) is shown. FIG. 4C shows an interferogram of a black body surface (a region indicated by (b-1) in FIG. 4B) and a spectrum obtained by Fourier-transforming this, FIG. d) shows the interferogram of the region of the edge part of the wire mesh (the region indicated by (b-2) in FIG. 4B) and the spectrum obtained by Fourier transforming this.
図4(b)から分かるように、黒体の表面は一様な光強度分布を有するため、中赤外画像では模様がほとんど無く(低空間周波数)、全面が光った状態にある。このような低空間周波数領域は多数の輝点ペアから成るとみなされ、インターフェログラムの鮮明度が極めて低くなる(図4(c))。これに対して、金網のエッジ部分では光強度を打ち消し合う輝点ペアが存在しないため、高い鮮明度でインターフェログラムが取得される(図4(d))。つまり、黒体であってもその表面に金網を配置することで、一様な光強度分布にバラツキが生じ、光強度を打ち消し合う輝点ペアをなくすことができる。 As can be seen from FIG. 4B, since the surface of the black body has a uniform light intensity distribution, the mid-infrared image has almost no pattern (low spatial frequency) and the entire surface is in a shining state. Such a low spatial frequency region is considered to be composed of a large number of bright point pairs, and the sharpness of the interferogram is extremely low (FIG. 4C). On the other hand, since there is no bright point pair that cancels out the light intensity at the edge portion of the wire mesh, an interferogram is acquired with high definition (FIG. 4D). That is, even if it is a black body, by arranging a wire mesh on the surface, a uniform light intensity distribution varies, and it is possible to eliminate bright spot pairs that cancel light intensity.
上記知見に基づき、本発明者は、低空間周波数領域でのインターフェログラムの鮮明度を向上する方法として、共役面に格子像を形成する手法を提案した(特許文献3)。この方法では、物体面の像を共役結像光学系により一旦、物体面と光学的に共役な像面上に形成する。そして、この共役面上に振幅型回折格子を設置して輝点を間引くことにより、光強度を打ち消し合う輝点ペアの数を減らす。振幅型回折格子は、入射光に対し透明部と不透明部を交互に配列したものであり、例えば光を透過する材質から成る板状部材の表面に1乃至複数の光を遮断する薄膜を形成したものや、複数の微小な線材を一定間隔で配置したものなどがある。この手法によるインターフェログラムの鮮明度の向上効果は、例えば、2012年に開催された日本光学会年次学術講演会(Optics & Photonics Japan 2012)で報告している(非特許文献2参照)。 Based on the above findings, the present inventor has proposed a method of forming a lattice image on a conjugate plane as a method for improving the sharpness of an interferogram in a low spatial frequency region (Patent Document 3). In this method, an image of an object plane is once formed on an image plane optically conjugate with the object plane by a conjugate imaging optical system. Then, by installing an amplitude type diffraction grating on this conjugate plane and thinning out the bright spots, the number of bright spot pairs that cancel out the light intensity is reduced. The amplitude type diffraction grating is formed by alternately arranging transparent portions and opaque portions with respect to incident light. For example, a thin film that blocks one or more lights is formed on the surface of a plate member made of a material that transmits light. And a plurality of minute wires arranged at regular intervals. The effect of improving the clarity of interferograms by this method has been reported, for example, at the Optical Society & Photonics Japan 2012 held in 2012 (see Non-Patent Document 2).
しかしながら、特許文献3は振幅型回折格子を用いることを教示するに過ぎず、光強度を打ち消し合う輝点ペアの数を減らすことができる具体的な条件、例えば振幅型回折格子の透明部の幅や間隔(ピッチ)等と干渉光強度を検出するためのカメラの画素ピッチ等との関係は特許文献3には開示されていない。従って、分光測定装置を設計する際には、透明部の幅やピッチが異なる複数の振幅型回折格子を用意し、実際にインターフェログラムを取得してその鮮明度を評価しながら振幅型回折格子の透明部の幅やピッチ等の適切な値を決定するといった試行錯誤が必要であった。 However, Patent Document 3 only teaches the use of an amplitude type diffraction grating, and specific conditions that can reduce the number of bright spot pairs that cancel the light intensity, such as the width of the transparent portion of the amplitude type diffraction grating, are disclosed. Patent Document 3 does not disclose the relationship between the interval and pitch (pitch) and the like and the pixel pitch of the camera for detecting the interference light intensity. Therefore, when designing a spectroscopic measurement device, prepare a plurality of amplitude type diffraction gratings with different widths and pitches of the transparent portion, and actually acquire an interferogram and evaluate the sharpness of the amplitude type diffraction grating. Trial and error such as determining appropriate values such as the width and pitch of the transparent part of the film was necessary.
本発明が解決しようとする課題は、鮮明なインターフェログラムを取得可能な分光特性測定装置を提供することである。 The problem to be solved by the present invention is to provide a spectral characteristic measuring apparatus capable of acquiring a clear interferogram.
上記課題を解決するために成された本発明に係る分光特性測定装置は、
a) 被測定物の測定領域内に位置する複数の測定点からそれぞれ発せられた測定光を第1の測定光及び第2の測定光に分割する分割光学系と、
b) 前記第1の測定光及び前記第2の測定光の間に連続的な光路長差分布を付与する光路長差付与手段と、
c) 連続的な光路長差分布が付与された前記第1の測定光及び前記第2の測定光を結像面上で干渉させて干渉光を形成する結像光学系と、
d) 前記結像面に配置された前記干渉光の光強度を検出する検出部であって、直線上に等間隔で配置された複数の画素を有する干渉光検出部と、
e) 前記干渉光検出部で検出された前記干渉光の光強度に基づき、前記被測定物の測定点のインターフェログラムを求め、このインターフェログラムをフーリエ変換することによりスペクトルを取得する処理部と、
f) 前記被測定物の測定領域と前記分割光学系の間に配置された、該分割光学系と共通の共役面を有するとともに、該共役面に前記測定点からの測定光を結像する共役面結像光学系と、
g) 前記共役面に配置された、周期的に並ぶ透光部と遮光部とを有する振幅型回折格子と
を備え、
前記干渉光検出部の複数の画素の間隔をp、光学倍率をm、前記振幅型回折格子の透光部の幅をW、隣り合う2つの透光部の中心間距離をDとすると、WおよびDが以下の式(1)および式(2)
W=(p×2)/(m+1) ・・・ (1)
D=(p×2)/ m ・・・ (2)
によりそれぞれ定義されることを特徴とする。
The spectral characteristic measuring apparatus according to the present invention, which has been made to solve the above problems,
a) a splitting optical system that divides measurement light emitted from a plurality of measurement points located in the measurement region of the object to be measured into first measurement light and second measurement light;
b) Optical path length difference providing means for providing a continuous optical path length difference distribution between the first measurement light and the second measurement light;
c) an imaging optical system that forms interference light by causing interference between the first measurement light and the second measurement light to which a continuous optical path length difference distribution is applied, on an imaging surface;
d) a detection unit for detecting the light intensity of the interference light arranged on the imaging surface, the interference light detection unit having a plurality of pixels arranged at equal intervals on a straight line;
e) A processing unit that obtains an interferogram of the measurement point of the object to be measured based on the light intensity of the interference light detected by the interference light detection unit, and obtains a spectrum by Fourier transforming the interferogram When,
f) A conjugate that is arranged between the measurement region of the object to be measured and the divided optical system and has a conjugate plane in common with the divided optical system and forms an image of the measurement light from the measurement point on the conjugate plane. A surface imaging optical system;
g) an amplitude-type diffraction grating having a periodically arranged light-transmitting part and a light-shielding part arranged on the conjugate plane,
When the interval between the plurality of pixels of the interference light detection unit is p, the optical magnification is m, the width of the light transmission part of the amplitude diffraction grating is W, and the distance between the centers of two adjacent light transmission parts is D, W And D are the following formulas (1) and (2)
W = (p × 2) / (m + 1) (1)
D = (p × 2) / m (2)
Respectively.
また、本発明に係る分光特性測定装置は、
a) 被測定物の測定領域内に位置する複数の測定点からそれぞれ発せられた測定光を第1の像面上に収束させる共役面結像光学系と、
b) 前記第1の像面上に配置された、周期的に並ぶ透光部と遮光部とを有する振幅型回折格子と、
c) 前記振幅型回折格子の透光部を通過した前記測定光を第1の測定光及び第2の測定光に分割する分割光学系と、
d) 前記第1の測定光及び前記第2の測定光の間に連続的な光路長差分布を付与する光路長差付与手段と、
e) 連続的な光路長差分布が付与された前記第1の測定光及び前記第2の測定光を結像面上で干渉させて干渉光を形成する結像光学系と、
f) 前記結像面に配置された前記干渉光の光強度を検出する検出部であって、等間隔で配置された複数の画素を有する干渉光検出部と、
g) 前記干渉光検出部で検出された前記干渉光の光強度に基づき、前記被測定物の測定点のインターフェログラムを求め、このインターフェログラムをフーリエ変換することによりスペクトルを取得する処理部とを備え、
前記干渉光検出部の複数の画素の間隔をp、光学倍率をm、前記振幅型回折格子の透光部の幅をW、隣り合う2つの透光部の中心間距離をDとすると、WおよびDが以下の式(1)および式(2)
W=(p×2)/(m+1) ・・・ (1)
D=(p×2)/ m ・・・ (2)
によりそれぞれ定義されることを特徴とする。
In addition, the spectral characteristic measuring apparatus according to the present invention is
a) a conjugate plane imaging optical system for converging measurement light emitted from a plurality of measurement points located in the measurement region of the object to be measured on the first image plane;
b) an amplitude-type diffraction grating that is disposed on the first image plane and includes a periodically arranged light-transmitting portion and a light-shielding portion;
c) a splitting optical system that splits the measurement light that has passed through the light-transmitting portion of the amplitude-type diffraction grating into first measurement light and second measurement light;
d) optical path length difference providing means for providing a continuous optical path length difference distribution between the first measurement light and the second measurement light;
e) an imaging optical system that forms interference light by causing interference between the first measurement light and the second measurement light to which a continuous optical path length difference distribution is applied on the imaging surface;
f) a detection unit for detecting the light intensity of the interference light arranged on the imaging surface, the interference light detection unit having a plurality of pixels arranged at equal intervals;
g) A processing unit that obtains an interferogram of a measurement point of the object to be measured based on the light intensity of the interference light detected by the interference light detection unit, and obtains a spectrum by Fourier transforming the interferogram And
When the interval between the plurality of pixels of the interference light detection unit is p, the optical magnification is m, the width of the light transmission part of the amplitude diffraction grating is W, and the distance between the centers of two adjacent light transmission parts is D, W And D are the following formulas (1) and (2)
W = (p × 2) / (m + 1) (1)
D = (p × 2) / m (2)
Respectively.
例えば、可視光領域のレーザ光源と、該可視光の波長(5×10-7m)の数倍程度の細長い1本のスリットと、スクリーンを並べて配置し、レーザ光源からの単色光をスリットに通過させると、スリットの幅よりもわずかに広い幅の縞模様の光(干渉縞)がスクリーン上に現れる。これは、単色光がスリットを通過する際に生じる回折により、一部の単色光と残りの単色光が干渉して強め合ったり弱めあったりするからである。図5(a)はスクリーン上に現れる干渉縞の強度分布とスリットの関係を示す図である。このとき、干渉縞の明るい部分(明点)と暗い部分(暗点)になる回折角θとスリットの幅w、光の波長λとの関係は次の式で表される。
明点の条件:w・sinθ=0,(N+1/2)λ
暗点の条件:w・sinθ=N・λ (Nは自然数)
例えば図5(b)に示すように、w・sinθ1=λを満たす角度θ1は、光路長差が1波長となる回折角となる。
For example, a laser light source in the visible light region, an elongated slit several times the wavelength of the visible light (5 × 10 −7 m), and a screen are arranged side by side, and monochromatic light from the laser light source is placed in the slit. When the light is allowed to pass, striped light (interference fringes) slightly wider than the width of the slit appears on the screen. This is because a part of monochromatic light and the remaining monochromatic light interfere with each other and are strengthened or weakened due to diffraction generated when the monochromatic light passes through the slit. FIG. 5A shows the relationship between the intensity distribution of interference fringes appearing on the screen and the slits. At this time, the relationship between the diffraction angle θ, the slit width w, and the light wavelength λ, where the interference fringes are bright (light spots) and dark (dark spots), is expressed by the following equation.
Bright spot condition: w · sinθ = 0, (N + 1/2) λ
Dark spot condition: w · sinθ = N · λ (N is a natural number)
For example, as shown in FIG. 5B, an angle θ1 that satisfies w · sin θ1 = λ is a diffraction angle at which the optical path length difference is one wavelength.
一方、本発明においては、分割光学系と共通の共役面を有するとともに、該共役面に前記測定点からの測定光を結像する共役面結像光学系を設け、前記共役面に振幅型回折格子を配置した。振幅型回折格子とは、周期的に配列された複数の透光部と遮光部を有する光学部品である。透光部は光が通過するものであれば良く、基本的には開口部である。従って、以下では、透光部を開口部として説明する。
共役面に振幅型回折格子を配置したことにより、結像面には振幅型回折格子の開口部を通過した光の像(開口像)が形成される。図6は、第1測定光と第2測定光の間の位相差が0(rad.)及びπ(rad.)のときの結像面における開口像の強度分布、及び振幅型回折格子の開口と画素の配置を示す図である。開口像の中心から第1暗輪帯までの強度分布が3個の画素で検出されるように該画素を配置すると、第1測定光と第2測定光の間の位相差の変化に伴う強度変化を各画素により検出することができる。ただし、位相差がπのときの第1暗輪帯の輝度値は位相差が0のときの中心部の輝度値よりも低いため、この配置では、位相差の変化に伴う輝度値の変化が中心画素に比べて残り2個の各画素では小さくなる。
On the other hand, in the present invention, a conjugate plane imaging optical system for imaging the measurement light from the measurement point is provided on the conjugate plane, and the amplitude type diffraction is provided on the conjugate plane. A grid was placed. An amplitude type diffraction grating is an optical component having a plurality of light transmitting portions and light shielding portions arranged periodically. The light-transmitting portion may be anything that allows light to pass through, and is basically an opening. Therefore, in the following description, the translucent part is described as an opening.
By arranging the amplitude type diffraction grating on the conjugate plane, an image (aperture image) of light passing through the opening of the amplitude type diffraction grating is formed on the imaging plane. FIG. 6 shows the intensity distribution of the aperture image on the image plane when the phase difference between the first measurement light and the second measurement light is 0 (rad.) And π (rad.), And the aperture of the amplitude type diffraction grating. It is a figure which shows arrangement | positioning of a pixel. When the pixels are arranged so that the intensity distribution from the center of the aperture image to the first dark ring zone is detected by three pixels, the intensity associated with the change in the phase difference between the first measurement light and the second measurement light. Changes can be detected by each pixel. However, since the luminance value of the first dark ring zone when the phase difference is π is lower than the luminance value of the central portion when the phase difference is 0, in this arrangement, the luminance value changes due to the change of the phase difference. The remaining two pixels are smaller than the central pixel.
図7は、結像面に形成される2個の隣接する開口像の第1暗輪帯が重複するように振幅型回折格子の開口部の間隔を設定したときの2個の開口像の強度分布、及びこの強度分布を5個の画素で検出する場合の振幅型回折格子と画素の配置を示しており、図8はそのときの3個の画素から得られるインターフェログラムを示している。この構成では、中心に位置する画素に両方の開口像の第1暗輪帯がオーバーラップするため、この中心画素の検出値は2個の開口像の第1暗輪帯の強度の和となる。従って、第1暗輪帯が明るく変化したとき(位相差がπのとき)の当該画素の検出輝度値は、その両側の画素が検出するエアリーディスクの輝度値と同等になる。また、図8に示すように、画素列ごとに位相がπずれたインターフェログラムが得られる。 FIG. 7 shows the intensity of two aperture images when the interval between the apertures of the amplitude type diffraction grating is set so that the first dark ring zones of two adjacent aperture images formed on the imaging plane overlap. The distribution and the arrangement of the amplitude diffraction grating and the pixel when this intensity distribution is detected by five pixels are shown. FIG. 8 shows an interferogram obtained from the three pixels at that time. In this configuration, since the first dark ring zone of both aperture images overlaps the pixel located at the center, the detection value of the center pixel is the sum of the intensities of the first dark ring zones of the two aperture images. . Therefore, when the first dark ring zone changes brightly (when the phase difference is π), the detected luminance value of the pixel is equivalent to the luminance value of the Airy disk detected by the pixels on both sides. Further, as shown in FIG. 8, an interferogram having a phase shift of π for each pixel column is obtained.
このとき、振幅型回折格子の開口幅をWとすると、結像面上に形成される開口像の幅は2Wになる。これは、開口像の第一暗点を生じる方向θが、sinθ=λ/Wにより求まるからである。すなわち、図9および図10に示すように、結像光学系の理論空間解像度dはd=λ/N.A.により決定されるが、一つの開口部から生じる回折光は第一暗点までに多くの光量が存在することから、N.A.≒sinθに相当するとみなすことができる。これを実効的なN.A.と呼ぶことにする。この場合、理論空間解像度d=λ/N.A.≒λ/sinθ=Wとなる。つまり、開口幅Wから生じる回折光によるエアリーディスクの直径は、開口幅Wに等しいとみなすことができる。ところで、コンボリューションの考えに基づけば、物体面上で開口幅Wは、結像面上では開口幅W×光学倍率m+理論空間解像度dとなる。前述のように、理論空間解像度d=開口幅Wであることから、開口像の幅は、開口幅W×(光学倍率m+1)により求めることができる。つまり、光学倍率が1のときの開口像の幅は2Wとなる。 At this time, if the aperture width of the amplitude type diffraction grating is W, the width of the aperture image formed on the image plane is 2W. This is because the direction θ in which the first dark spot of the aperture image is generated is obtained by sin θ = λ / W. That is, as shown in FIG. 9 and FIG. 10, the theoretical spatial resolution d of the imaging optical system is determined by d = λ / NA, but the diffracted light generated from one aperture has a large amount up to the first dark spot. Since there is an amount of light, it can be regarded as equivalent to NA≈sin θ. This is called effective N.A. In this case, the theoretical spatial resolution d = λ / N.A.≈λ / sin θ = W. That is, the diameter of the Airy disk by the diffracted light generated from the opening width W can be regarded as being equal to the opening width W. By the way, based on the idea of convolution, the aperture width W on the object plane becomes aperture width W × optical magnification m + theoretical spatial resolution d on the image plane. As described above, since the theoretical spatial resolution is d = aperture width W, the width of the aperture image can be obtained by aperture width W × (optical magnification m + 1). That is, the width of the aperture image when the optical magnification is 1 is 2W.
なお、無限遠補正光学系の場合、前記レンズのN.A.は対物レンズと結像レンズの2つについて考えなくてはならない。理論空間解像度はどちらか小さい方のN.A.によって決定されることから、前記レンズのN.A.は、対物レンズと結像レンズの2つのN.A.のうち、小さい方の値を用いる。 In the case of an infinity correction optical system, the NA of the lens must be considered for the objective lens and the imaging lens. Since the theoretical spatial resolution is determined by the smaller NA, the NA of the lens uses the smaller one of the two NAs of the objective lens and the imaging lens.
この開口像の幅が隣り合う2画素の間隔(画素ピッチ)になるように、開口幅W、光学倍率mを設定する。例えば、画素ピッチpが30μm、光学倍率mが1倍の場合は、30μm×2=W×(1+1)となり、開口幅Wは画素ピッチ30μmと等しくすれば良い。また、開口部の中心間距離も結像面上では2画素のピッチになることから、開口部の中心間距離=画素ピッチ×2/光学倍率により算出することができる。従って、画素ピッチpが30μmの場合は、開口部の中心間距離= 30μm×2/1=60μmと算出することができる。また、開口部と開口部の間の遮光部の幅は30μmとなる。つまり、画素ピッチが30μmである干渉光検出部を用いる場合には、振幅型回折格子の開口幅Wを30μm、開口部の中心間距離Dを60μmに設定すれば良い。 The aperture width W and the optical magnification m are set so that the width of the aperture image becomes an interval (pixel pitch) between two adjacent pixels. For example, when the pixel pitch p is 30 μm and the optical magnification m is 1, 30 μm × 2 = W × (1 + 1), and the aperture width W may be equal to the pixel pitch 30 μm. Further, since the distance between the centers of the openings is also a pitch of 2 pixels on the imaging surface, it can be calculated by the distance between the centers of the openings = pixel pitch × 2 / optical magnification. Therefore, when the pixel pitch p is 30 μm, the distance between the centers of the openings = 30 μm × 2/1 = 60 μm can be calculated. Further, the width of the light shielding part between the openings is 30 μm. That is, when an interference light detection unit having a pixel pitch of 30 μm is used, the aperture width W of the amplitude type diffraction grating may be set to 30 μm and the center distance D of the apertures may be set to 60 μm.
ただし、以上の説明は物理的なレンズN.A.よりも実効的なN.A.の方が小さい場合に当てはまるが、中赤外光のように波長λが長く、実効的なN.A.がレンズN.Aよりも大きい場合には当てはまらない。これについて、図11を参照して説明する。 However, the above explanation applies when the effective NA is smaller than the physical lens NA, but when the wavelength λ is long and the effective NA is larger than the lens NA as in the case of mid-infrared light. Is not true. This will be described with reference to FIG.
ここでは、測定波長帯域8μm〜14μmのマイクロボロメーター(画素ピッチ:23.5μm)を干渉光検出部とした場合を例に挙げて説明する。
測定波長帯域の中では最長波長の回折光の第一暗点を生じる方向θが最も大きくなるため、この場合は、波長14μmの光の回折光の実効的なN.A.がレンズのN.A.内に収まらなくてはならない。しかし、例えば、光学倍率1倍、画素ピッチ23.5μmの場合、開口幅Wは23.5μm(D=23.5×2/(1+1)=23.5μm)になる。この開口幅の最長波長の実効的なN.A.を方向θを用いて表すと、
N.A. = n・sinθ (nは屈折率)
となり、大気の屈折率は1、sinθ=14/23.5≒0.60であるため、0.60以上のN.A.を有するレンズを用いれば良いが、場合によっては0.30程度のN.A.のレンズを用いなければならないことがある。
Here, a case where a microbolometer (pixel pitch: 23.5 μm) having a measurement wavelength band of 8 μm to 14 μm is used as an interference light detection unit will be described as an example.
In the measurement wavelength band, the direction θ that generates the first dark spot of the diffracted light with the longest wavelength is the largest, so in this case, the effective NA of the diffracted light with the wavelength of 14 μm does not fit within the NA of the lens. must not. However, for example, when the optical magnification is 1 and the pixel pitch is 23.5 μm, the aperture width W is 23.5 μm (D = 23.5 × 2 / (1 + 1) = 23.5 μm). When the effective NA of the longest wavelength of the aperture width is expressed using the direction θ,
NA = n · sinθ (where n is the refractive index)
Since the refractive index in the atmosphere is 1, and sinθ = 14 / 23.5≈0.60, a lens having an NA of 0.60 or more may be used. However, in some cases, a lens having an NA of about 0.30 may be used. .
逆に、実効的な開口数N.A.を0.60の半分の0.30にするためには、開口幅Wを23.5μmの2倍の47μmにすれば良いが、この場合、結像面上での開口像の幅が、47μm×2=94μmとなってしまい、画素ピッチ23.5μmの4倍(つまり4画素の幅)になってしまう。この場合、例えば、1つの開口像を今までの3画素ではなく、5画素で分割して検出しなくてはならない。しかし、中心画素と位相がπずれた両端の2画素に比べて、さらに最外周に有る2つの画素(図中灰色で示す)は結像強度が極めて弱くなる。そこで、隣接する開口像とのオーバーラップを、今までの1画素ではなく、更に多い2画素に増やすようなレイアウトが必要となる。このようなレイアウトにより、実質、中心画素と両端2画素により結像強度変化を取得することが可能になる。 Conversely, in order to reduce the effective numerical aperture NA to 0.30 which is half of 0.60, the aperture width W may be set to 47 μm, which is twice 23.5 μm. The width is 47 μm × 2 = 94 μm, which is four times the pixel pitch 23.5 μm (that is, the width of 4 pixels). In this case, for example, one aperture image must be detected by being divided by 5 pixels instead of the conventional 3 pixels. However, the two pixels (shown in gray in the figure) at the outermost periphery are much weaker than the two pixels at both ends whose phases are shifted by π from the center pixel. Therefore, a layout is required to increase the overlap with the adjacent aperture image to two more pixels instead of the conventional one pixel. With such a layout, it is possible to acquire a change in imaging intensity substantially by the center pixel and the two pixels at both ends.
つまり、本発明においては、前記分割光学系を構成する対物レンズの開口数N.A.が実効的な開口数N.A.よりも小さいとき、前記振幅型回折格子の開口部の幅W、該開口部の中心間距離Dは、以下の式(3)および式(4)
W=(p×4)/(m+1) ・・・ (3)
D=(p×3)/ m ・・・ (4)
により規定される値にそれぞれ設定すれば良い。
That is, in the present invention, when the numerical aperture NA of the objective lens constituting the split optical system is smaller than the effective numerical aperture NA, the width W of the aperture of the amplitude type diffraction grating, and the center of the aperture The distance D is expressed by the following equations (3) and (4).
W = (p × 4) / (m + 1) (3)
D = (p × 3) / m (4)
May be set to the values specified by.
例えば、光学倍率1倍、画素ピッチ23.5μmの場合は、以下のようになる。
開口幅=23.5×4/(1+1)=47μm
開口部中心間距離=23.5×3/1=70.5μm
この開口パターンを持つ振幅型回折格子では、遮光部の幅は23.5μmということになる。
For example, when the optical magnification is 1 and the pixel pitch is 23.5 μm, it is as follows.
Opening width = 23.5 × 4 / (1 + 1) = 47μm
Center distance between openings = 23.5 x 3/1 = 70.5μm
In the amplitude type diffraction grating having this opening pattern, the width of the light shielding portion is 23.5 μm.
上記のように、本発明によれば、測定点(物体面)と共役な面上に振幅型回折格子を配置し、そこで空間的な周期変化を付与された光により干渉光を得るようにした。そのため、どのような試料からでも干渉光を得ることができ、鮮明なインターフェログラムを取得することができる。しかも、本発明では、振幅型回折格子の構成(透光部の幅W、隣り合う透光部の中心間距離D)を、干渉光検出部が有する複数の画素の間隔(画素ピッチ)p、光学倍率mを用いて算出できるため、分光特性測定装置の構成を簡単に設計することができる。 As described above, according to the present invention, the amplitude type diffraction grating is arranged on the plane conjugate with the measurement point (object plane), and the interference light is obtained by the light given the spatial periodic change there. . Therefore, interference light can be obtained from any sample, and a clear interferogram can be obtained. In addition, according to the present invention, the configuration of the amplitude type diffraction grating (the width W of the translucent part, the distance D between the centers of the adjacent translucent parts) is the interval between the plurality of pixels (pixel pitch) p, Since the calculation can be performed using the optical magnification m, the configuration of the spectral characteristic measuring apparatus can be designed easily.
本発明は、輝点間の干渉強度打ち消し合いを無くして、鮮明なインターフェログラムを取得可能な条件、具体的には、測定波長帯域、光学倍率、使用するカメラの画素ピッチなど、様々な光学観察条件ごとに、振幅型回折格子の適切な透光部の幅、あるいは遮光部の幅の最適な設計値を容易に算出できる条件を提供するものである。
例えば、遮光部の幅を広くすると、輝点の間隔が広くなって打ち消し合いを無くすことができるが、遮光部の幅を過度に広くすると輝度値を全く検出できない画素を生じることになる。また、遮光部の幅を狭くすると、近接する輝点間の打ち消し合いにより鮮明度が劣化してしまう。一方、透光部の幅を狭くしすぎると光量不足になり、広くしすぎると1つの透光部内で輝点間の打ち消し合いを生じてしまう。発明者は、このような事象を順に検証していくことにより適切な条件を得た。以下、具体的な実施例について述べる。
The present invention eliminates the interference intensity cancellation between bright spots, and can obtain a clear interferogram, specifically various optical wavelengths such as a measurement wavelength band, an optical magnification, and a pixel pitch of a camera to be used. The present invention provides a condition for easily calculating the optimum design value of the width of the light transmitting part or the width of the light shielding part of the amplitude type diffraction grating for each observation condition.
For example, if the width of the light-shielding part is widened, the bright spot interval becomes wide and cancellation can be eliminated. However, if the width of the light-shielding part is excessively wide, a pixel whose luminance value cannot be detected is generated. Further, when the width of the light shielding portion is narrowed, the sharpness deteriorates due to cancellation between adjacent bright spots. On the other hand, if the width of the light-transmitting portion is too narrow, the amount of light is insufficient, and if it is too wide, cancellation between bright spots occurs in one light-transmitting portion. The inventor obtained appropriate conditions by sequentially verifying such events. Specific examples will be described below.
図12に示すように、本実施例の分光特性測定装置は、共役面結像光学系と結像型2次元フーリエ分光光学系により構成されている。共役面結像光学系では、測定対象(物体面)の像を広角レンズや顕微対物レンズなど、観察条件である視野範囲や倍率に応じたレンズを用いて物体面と光学的に共役な面を形成する。この共役面は結像型2次元フーリエ分光光学系の物体面となり、該共役面に多重スリットを配置する。この多重スリットが本発明の振幅型回折格子に相当し、周期的に配列された開口部(本発明の透光部に相当する)を有する。開口部と開口部の間の部分が遮光部となる。結像型2次元フーリエ分光光学系は、対物レンズと結像レンズによる無限遠補正結像光学系であり、光学的なフーリエ変換面の近傍に位相可変フィルターを設置している。 As shown in FIG. 12, the spectral characteristic measuring apparatus of the present embodiment is composed of a conjugate plane imaging optical system and an imaging type two-dimensional Fourier spectroscopy optical system. In the conjugate plane imaging optical system, an image of the object to be measured (object plane) is optically conjugated to the object plane using a lens according to the viewing range and magnification, which are observation conditions, such as a wide-angle lens and a micro objective lens. Form. This conjugate plane becomes the object plane of the imaging type two-dimensional Fourier spectroscopic optical system, and multiple slits are arranged on the conjugate plane. The multiple slits correspond to the amplitude type diffraction grating of the present invention, and have openings (corresponding to the light transmitting portions of the present invention) arranged periodically. A portion between the opening and the opening serves as a light shielding portion. The imaging type two-dimensional Fourier spectroscopic optical system is an infinitely corrected imaging optical system using an objective lens and an imaging lens, and a phase variable filter is provided in the vicinity of an optical Fourier transform plane.
位相可変フィルターは、主軸に対して約45度傾けて設置されており、垂直方向の上下に配置された固定ミラー部と可動ミラー部を有する。可動ミラー部は、図示しない駆動機構により矢印で示す方向に移動される。なお、固定ミラー部と可動ミラー部を上下のどちらに配置しても良いが、ここでは上側に可動ミラー部を、下側に固定ミラー部を配置している。
また、左右に固定ミラー部と可動ミラー部を配置することも可能であるが、この構成では、可動ミラー部を大きく移動させた場合に、固定ミラー部が可動ミラー部の影になって光線が遮られる場合が生じるので、上下方向に配置する方が好ましい。
The phase variable filter is installed with an inclination of about 45 degrees with respect to the main axis, and has a fixed mirror portion and a movable mirror portion arranged vertically in the vertical direction. The movable mirror unit is moved in the direction indicated by the arrow by a drive mechanism (not shown). In addition, although a fixed mirror part and a movable mirror part may be arrange | positioned in any of upper and lower sides, here, the movable mirror part is arrange | positioned at the upper side and the fixed mirror part is arrange | positioned at the lower side.
It is also possible to arrange a fixed mirror part and a movable mirror part on the left and right, but in this configuration, when the movable mirror part is moved greatly, the fixed mirror part becomes a shadow of the movable mirror part and the light beam is emitted. Since it may be interrupted, it is preferable to arrange in the vertical direction.
図12中、位相可変フィルターの固定ミラー部と可動ミラー部を上下に重ねている方向を垂直軸、垂直軸と直交する方向を水平軸と定義する。共役面と結像面(2次元受光アレイデバイス)上で、この垂直軸と水平軸に相当する方向を同様に定義する。共役面上に配置する多重スリットは、水平軸に開口部の長手方向が、垂直軸に開口部の幅方向が位置するように配置する。結像型2次元フーリエ分光光学系は任意の倍率で設計可能であるが、本実施例では光学倍率を1倍にした例について述べる。 In FIG. 12, the direction in which the fixed mirror portion and the movable mirror portion of the phase variable filter are vertically overlapped is defined as the vertical axis, and the direction orthogonal to the vertical axis is defined as the horizontal axis. On the conjugate plane and the imaging plane (two-dimensional light receiving array device), directions corresponding to the vertical axis and the horizontal axis are defined in the same manner. The multiple slits arranged on the conjugate plane are arranged such that the longitudinal direction of the opening is located on the horizontal axis and the width direction of the opening is located on the vertical axis. The imaging type two-dimensional Fourier spectroscopic optical system can be designed with an arbitrary magnification. In this embodiment, an example in which the optical magnification is set to 1 will be described.
計測波長帯域0.4μm〜0.8μm、無限補正光学系には対物レンズ(焦点距離:100mm、N.A.=0.24)と結像レンズ(焦点距離:100mm、N.A.=0.24)により光学倍率1倍で、CCDカメラ(画素ピッチ:11μm×11μm)上に結像させている。また、共役面結像光学系のレンズには、双曲面ミラー(最大画角50[deg.])を用いた全方位分光イメージング装置である。この光学条件の場合、下記のように多重スリットの開口部の幅(以下、開口幅ともいう)、開口部の中心間距離が求まる。
開口幅W = 画素ピッチ×2/(光学倍率+1)
=11μm×2/(1+1)=11μm
開口部中心間距離D= 画素ピッチ×2/光学倍率
=11μm×2/1=22μm
以上より、開口幅11μm、遮光幅11μmの多重スリットに設計すれば良いことが分かる。
この場合に、実効的なN.A.が、レンズのN.A.よりも小さいことが要求されるため、それを確認する。
本実施例においては、実効的なN.A.=sinθ=最長波長/開口幅=0.8μm/11μm≒0.073となる。
一方、対物レンズと結像レンズのN.A.は双方とも0.24であることから、実効的なN.A.は十分に小さく、条件を満たしていることが確認できた。
Measurement wavelength band 0.4μm to 0.8μm, CCD camera with optical magnification of 1x with objective lens (focal length: 100mm, NA = 0.24) and imaging lens (focal length: 100mm, NA = 0.24) for infinite correction optical system An image is formed on (pixel pitch: 11 μm × 11 μm). The lens of the conjugate plane imaging optical system is an omnidirectional spectroscopic imaging apparatus using a hyperboloidal mirror (maximum angle of view 50 [deg.]). In the case of this optical condition, the width of the opening of the multiple slit (hereinafter also referred to as opening width) and the distance between the centers of the openings are obtained as follows.
Aperture width W = pixel pitch × 2 / (optical magnification + 1)
= 11 μm × 2 / (1 + 1) = 11 μm
Opening center distance D = pixel pitch × 2 / optical magnification
= 11 μm × 2/1 = 22 μm
From the above, it can be seen that a multiple slit having an opening width of 11 μm and a light shielding width of 11 μm may be designed.
In this case, since the effective NA is required to be smaller than the NA of the lens, it is confirmed.
In this embodiment, effective NA = sin θ = longest wavelength / aperture width = 0.8 μm / 11 μm≈0.073.
On the other hand, since the NA of the objective lens and the imaging lens are both 0.24, it was confirmed that the effective NA was sufficiently small and the condition was satisfied.
次に、図13および図14を参照して、上記事例における多重スリットの具体的なレイアウトについて述べる。
可動ミラー部と固定ミラー部を上下に配置すると、位相シフトに伴う干渉像の変化の方向により異方性を生じる。これは、垂直軸を通る断面では、固定ミラー部と可動ミラー部に半分ずつの光線が照射されるが、水平軸を通る断面では、固定ミラー部、或いは可動ミラー部のみに光線が照射されることになるからである。つまり、垂直軸を通る断面でみると、位相シフト操作に伴って、多光線干渉として干渉強度が変化するが、水平軸を通る断面でみると、物体光束内において相対的な位相差が生じず、位相シフト操作に伴う干渉強度変化は生じないことになる。このような異方性を考慮すると、垂直軸方向には輝点間の位相の打ち消し合いを解消するための開口部と遮光部の組み合わせが必要であるが、水平軸方向には輝点間の位相の打ち消し合いが生じないことから遮光部は必要ないことになる。つまり、図13および図14に示すように、多重スリットは水平方向に延びる開口部を有していれば良い。後述の同心円レイアウトの位相可変フィルターでは矩形状の開口部を二次元配置しなくてはならず、遮光部の面積が広くなることと比較すると、本実施例に係る多重スリットの方が光の利用効率が高いことが判る。
Next, a specific layout of the multiple slits in the above example will be described with reference to FIGS.
When the movable mirror part and the fixed mirror part are arranged vertically, anisotropy is generated depending on the direction of change of the interference image accompanying the phase shift. In the cross section passing through the vertical axis, half of the light beam is irradiated to the fixed mirror part and the movable mirror part, but in the cross section passing through the horizontal axis, the light beam is irradiated only to the fixed mirror part or the movable mirror part. Because it will be. In other words, when viewed from a cross section passing through the vertical axis, the interference intensity changes as multi-beam interference with the phase shift operation, but when viewed from a cross section passing through the horizontal axis, no relative phase difference occurs in the object beam. The interference intensity change due to the phase shift operation does not occur. In consideration of such anisotropy, the vertical axis direction requires a combination of an opening and a light-shielding part to cancel the phase cancellation between the bright spots. Since no phase cancellation occurs, the light-shielding portion is not necessary. That is, as shown in FIGS. 13 and 14, the multiple slits only need to have an opening extending in the horizontal direction. In the phase variable filter having a concentric layout described later, the rectangular openings must be arranged two-dimensionally, and the multiple slits according to the present embodiment use light more than the area of the light-shielding portion is increased. It turns out that efficiency is high.
図15および図16に、本実施例に係る分光特性測定装置を用いて実験室内の風景を全方位で分光イメージングした結果を示す。図15(a)はカラー画像、(b)は白黒画像である。これらの画像には、実験室内の上方にある天井の蛍光灯、下方にある光学除震台、側方にあるホワイトボードが撮影されている。また、図16(a)は可視光画像であり、(b)は位相シフト操作に伴う結像強度変化であるインターフェログラムの鮮明度を擬似カラー画像で示したものである。図16(c)は蛍光灯の輝線スペクトルを、(d)は擬似カラー画像から得られたスペクトルを示す。このように、全域にわたって十分な干渉鮮明度を得ることができており、本実施例の効果を実証することができた。また、照明光源でもある天井の蛍光灯固有の輝線スペクトルが、擬似カラー画像から得られたスペクトルの波長550nm、610nmの位置に存在することを確認することができた。 15 and 16 show the results of spectral imaging of the scenery in the laboratory in all directions using the spectral characteristic measuring apparatus according to this example. FIG. 15A is a color image, and FIG. 15B is a monochrome image. In these images, the fluorescent lamp on the ceiling above the laboratory, the optical vibration isolation table below, and the white board on the side are photographed. FIG. 16A is a visible light image, and FIG. 16B is a pseudo color image showing the sharpness of an interferogram, which is a change in imaging intensity accompanying a phase shift operation. FIG. 16C shows the emission line spectrum of the fluorescent lamp, and FIG. 16D shows the spectrum obtained from the pseudo color image. In this way, sufficient interference sharpness could be obtained over the entire area, and the effect of this example could be verified. Moreover, it was confirmed that the bright line spectrum unique to the fluorescent lamp on the ceiling, which is also the illumination light source, exists at the positions of wavelengths 550 nm and 610 nm of the spectrum obtained from the pseudo color image.
図17および図18は、本発明の第2実施例に係る分光特性測定装置の特徴を説明するための図である。本実施例に係る分光特性測定装置の構成は第1実施例と略同じであるため、図示および説明を省略する。
図12に示す分光特性測定装置では、図17に示すように、左端の画素の中心および右端の画素の中心の両方にそれぞれ多重スリットの開口像の中心が位置するように配置した方が、該開口像の鮮明度が高くなる。換言すると、開口像の鮮明度を高くするためには、多重スリットの開口部の長手方向の中心軸と、画素列の中心軸を高精度に位置決めできる必要がある。そこで、本実施例に係る分光特性測定装置では、多重スリットの傾きを調整する調整機構を設けた。この調整機構は、位置決めのために多重スリットの開口部を垂直軸方向に移動させる場合の最大移動量が、高々1個の開口部の幅に相当する量であることに着目した簡易的な調整機構である。
17 and 18 are diagrams for explaining the characteristics of the spectral characteristic measuring apparatus according to the second embodiment of the present invention. Since the configuration of the spectral characteristic measuring apparatus according to this embodiment is substantially the same as that of the first embodiment, illustration and description thereof are omitted.
In the spectral characteristic measuring apparatus shown in FIG. 12, as shown in FIG. 17, it is preferable that the center of the aperture image of the multi-slit is positioned at both the center of the left end pixel and the center of the right end pixel. The sharpness of the aperture image is increased. In other words, in order to increase the sharpness of the aperture image, it is necessary to be able to position the central axis in the longitudinal direction of the opening of the multiple slit and the central axis of the pixel column with high accuracy. Therefore, in the spectral characteristic measuring apparatus according to the present embodiment, an adjustment mechanism for adjusting the inclination of the multiple slits is provided. This adjustment mechanism is a simple adjustment that pays attention to the fact that the maximum movement amount when moving the opening of the multiple slit in the vertical axis direction for positioning is an amount corresponding to the width of one opening at most. Mechanism.
具体的には、図18に示すように、調整機構20は、多重スリット10の周りを取り囲む矩形枠部201と該矩形枠部201の上部に配置された2本のねじ202、203と、矩形枠部201の下辺と多重スリット10の間に配置された弾性部材204から成る。弾性部材204は例えばウレタンゴム、シリコーンゴム等の合成ゴムから成る。2本のねじ202、203の矩形枠部201へのねじ込み量をそれぞれ独立的に調整することにより弾性部材204の変形量が変化し、多重スリット10の傾きを調整することができる。なお、多重スリット10の傾きを調整する際に開口部が変形することを防止するため、多重スリット10の下端部の遮光部の幅を狭くして弾性変形しやすくすると良い。 Specifically, as shown in FIG. 18, the adjustment mechanism 20 includes a rectangular frame portion 201 that surrounds the multiple slits 10, two screws 202 and 203 disposed on the rectangular frame portion 201, and a rectangular shape. The elastic member 204 is disposed between the lower side of the frame portion 201 and the multiple slit 10. The elastic member 204 is made of synthetic rubber such as urethane rubber or silicone rubber. By independently adjusting the screwing amounts of the two screws 202 and 203 into the rectangular frame portion 201, the deformation amount of the elastic member 204 changes, and the inclination of the multiple slit 10 can be adjusted. In order to prevent the opening from being deformed when the inclination of the multiple slit 10 is adjusted, the width of the light shielding portion at the lower end of the multiple slit 10 may be narrowed to facilitate elastic deformation.
第3実施例に係る分光特性測定装置は、測定波長帯域が8μm〜14μmのマイクロボロメーター(画素ピッチ:23.5μm)を干渉光検出部として用いた例である。ここでは、物理的なレンズのN.A.よりも実効的なN.A.の方が大きいものとする。
上述したように、この場合の多重スリットの開口幅および開口部の中心間距離と画素ピッチとの関係は次の式で表される。
開口幅W = 画素ピッチp×4/(光学倍率m+1)
開口部中心間距離D = 画素ピッチp×3/光学倍率m
また、本実施例では、ゲルマニューム素材の中赤外用対物レンズ(焦点距離:20mm、N.A.:0.30)および結像レンズ(焦点距離:20mm、N.A.:0.30)を用いて、光学倍率1倍の無限遠補償結像光学系を構築した。さらに、共役面結像光学系では、光学倍率を0.02倍とした。
The spectral characteristic measurement apparatus according to the third embodiment is an example in which a microbolometer (pixel pitch: 23.5 μm) having a measurement wavelength band of 8 μm to 14 μm is used as the interference light detection unit. Here, it is assumed that the effective NA is larger than the NA of the physical lens.
As described above, the relationship between the aperture width of the multiple slits, the distance between the centers of the apertures, and the pixel pitch in this case is expressed by the following equation.
Aperture width W = pixel pitch p × 4 / (optical magnification m + 1)
Opening center distance D = pixel pitch p × 3 / optical magnification m
Further, in this example, a germanium material mid-infrared objective lens (focal length: 20 mm, NA: 0.30) and an imaging lens (focal length: 20 mm, NA: 0.30) are used, and the optical magnification is 1 infinite. An adaptive imaging optical system was constructed. Further, in the conjugate plane imaging optical system, the optical magnification is set to 0.02.
このとき、光学倍率を1倍、画素ピッチを23.5μmとすると、開口幅Wおよび開口部の中心間距離Dは以下のようになる。
開口幅W=23.5×4/(1+1)=47μm
開口部中心間距離D=23.5×3/1=70.5μm
このレイアウトでは、多重スリットの遮光部の幅は23.5μmになる。
At this time, when the optical magnification is 1 and the pixel pitch is 23.5 μm, the opening width W and the center distance D of the opening are as follows.
Aperture width W = 23.5 × 4 / (1 + 1) = 47μm
Distance between center of opening D = 23.5 × 3/1 = 70.5μm
In this layout, the width of the light shielding portion of the multiple slit is 23.5 μm.
図19に、上記条件のもと、黒体に中赤外領域の光を照射したときの分光イメージング結果を示す。多重スリットを用いることにより、上述したような金網を用いなくても黒体表面の全体で高い鮮明度のインターフェログラムを取得できることが分かる。また、フーリエ変換により得られた分光特性は、プランクの法則に従っていることも確認できた。そこで、図20に示すように、顔全体の輻射光分光イメージングを行った。これは、身体から発せられる輻射光の中赤外領域での分光特性分布を示す。このように、テクスチャー投影などの構造的な照明をすること無く、低空間周波数の全顔において高い鮮明度のインターフェログラムが取得可能であることが実証された。 FIG. 19 shows a spectral imaging result when a black body is irradiated with light in the mid-infrared region under the above conditions. It can be seen that by using multiple slits, a high-definition interferogram can be obtained over the entire black body surface without using a wire mesh as described above. It was also confirmed that the spectral characteristics obtained by the Fourier transform were in accordance with Planck's law. Therefore, as shown in FIG. 20, radiation spectrum imaging of the entire face was performed. This shows the spectral characteristic distribution in the mid-infrared region of the radiation emitted from the body. Thus, it has been demonstrated that a high-definition interferogram can be obtained for all faces at low spatial frequencies without structural illumination such as texture projection.
図21〜図24は本発明の第4実施例を示す。図21(a)は第4実施例に係る分光特性測定装置の概略構成図、(b)は多重スリットの正面図、(c)は位相シフタの正面図である。この実施例では、可動ミラー部と固定ミラー部が同心円状に配置された位相シフタを用いた。このような位相シフタでは、垂直軸、水平軸の双方において輝点の打ち消しが生じることから、開口部の周辺に遮光部が必要となる。このため、本実施例では、2次元配置された複数の矩形状の開口部を有する多重スリットを用いた。 21 to 24 show a fourth embodiment of the present invention. FIG. 21A is a schematic configuration diagram of the spectral characteristic measuring apparatus according to the fourth embodiment, FIG. 21B is a front view of a multiple slit, and FIG. 21C is a front view of a phase shifter. In this embodiment, a phase shifter in which the movable mirror portion and the fixed mirror portion are arranged concentrically is used. In such a phase shifter, since bright points are canceled on both the vertical axis and the horizontal axis, a light shielding portion is required around the opening. Therefore, in this embodiment, a multiple slit having a plurality of rectangular openings arranged two-dimensionally is used.
2次元受光アレイデバイスの画素ピッチは、通常、垂直軸方向、水平軸方向で同じ大きさであるが、図22に示すように異ならせることも可能である。この場合は、垂直軸方向、水平軸方向それぞれの画素ピッチを用いて、多重スリットの開口部の垂直軸方向、水平軸方向の長さ(幅)が、それぞれ段落[0040]に示す式を満たすように設計すれば良い。一見、開口部と開口部の斜め方向の間隔、つまり遮光部の斜め方向の長さが大きくなっているように感じるが、図23に示すように開口部の斜め方向の長さ(幅)も大きくなるため、設計指針を満たした値となる。すなわち、垂直軸、水平軸の両方向の画素ピッチが等しい場合、斜め方向の画素ピッチは√2倍となる。一方、斜め方向の開口部の幅、開口部の中心間距離も同様に√2倍となることから、設計指針を満たす。以上から、本実施例では、画素のレイアウトと多重スリットの開口部のレイアウトを相似形にすれば良い。 The pixel pitch of the two-dimensional light receiving array device is usually the same size in the vertical axis direction and the horizontal axis direction, but may be different as shown in FIG. In this case, using the pixel pitches in the vertical axis direction and the horizontal axis direction, the lengths (widths) of the openings of the multiple slits in the vertical axis direction and the horizontal axis direction satisfy the expressions shown in paragraph [0040], respectively. Should be designed as follows. At first glance, it seems that the distance between the opening and the oblique direction, that is, the length of the light shielding part in the oblique direction is increased, but the length (width) of the opening in the oblique direction is also as shown in FIG. Since it becomes larger, the value satisfies the design guidelines. That is, when the pixel pitch in both the vertical axis and the horizontal axis is equal, the pixel pitch in the oblique direction is √2. On the other hand, the width of the opening in the oblique direction and the distance between the centers of the openings are also doubled in the same manner, so that the design guideline is satisfied. From the above, in this embodiment, the layout of the pixels and the layout of the openings of the multiple slits may be similar.
なお、製造上の容易さから、多重スリットとして円形状の開口部を2次元配置したピンホールアレイを用いても良い。ただし、この場合は、斜め方向の開口幅が半径で決まることから、水平軸、垂直軸の両方向で同じであり、設計指針より短くなってしまう。つまり、図24中、星印で示す部分の遮光部の中心当たりの画素の鮮明度が劣化してしまう。従って、矩形状の開口部と円形状の開口部のいずれを選定するかは、製造の容易さ、確保したい面内鮮明度の均一性を考慮して決定すると良い。 For ease of manufacture, a pinhole array in which circular openings are two-dimensionally arranged as multiple slits may be used. However, in this case, since the opening width in the oblique direction is determined by the radius, it is the same in both the horizontal axis and the vertical axis, and is shorter than the design guideline. That is, in FIG. 24, the sharpness of the pixel around the center of the light-shielding portion indicated by the star symbol is deteriorated. Accordingly, whether to select a rectangular opening or a circular opening may be determined in consideration of ease of manufacture and uniformity of in-plane sharpness to be secured.
図25は、本発明の第5実施例に係る分光特性測定装置を示す。本実施例は、特許文献2に記載の分光特性測定装置に共役面結像光学系を追加した例である。この共役面結像光学系の共役面に図26に示す多重スリットを配置する。この多重スリットは、直線上に並ぶ4個の矩形状の開口部を有する。
本実施例では、1直線上の分光分布が1個の画素により空間的な干渉縞であるインターフェログラムとして取得される。結像ライン方向(図中鉛直方向)の軸を垂直軸、それと直交する方向である空間的位相シフト方向の軸を水平軸と称する。
FIG. 25 shows a spectral characteristic measuring apparatus according to the fifth embodiment of the present invention. The present embodiment is an example in which a conjugate plane imaging optical system is added to the spectral characteristic measuring apparatus described in Patent Document 2. Multiple slits shown in FIG. 26 are arranged on the conjugate plane of this conjugate plane imaging optical system. This multiple slit has four rectangular openings arranged in a straight line.
In this embodiment, the spectral distribution on one straight line is acquired as an interferogram that is a spatial interference fringe by one pixel. The axis in the imaging line direction (vertical direction in the figure) is referred to as the vertical axis, and the axis in the spatial phase shift direction that is orthogonal to the axis is referred to as the horizontal axis.
垂直軸方向には、輝点間の位相シフトの打ち消し合いが生じるため、上記した手法により開口幅と開口部の中心間距離を定める。なお、水平軸方向の開口幅を、視野開口幅と称する。これは、計測した視野の幅、あるいは空間解像度に応じて設定すれば良い。視野幅を狭くして空間解像度を高くすれば、視野開口幅が狭くなり、その結果、光量が小さくなって測定感度が低下する。測定感度を向上させるために視野開口幅を広げると、空間解像度が低下する。このトレードオフは、測定対象や光学条件に沿って判断して設定する。 In the vertical axis direction, phase shift cancellation between luminescent spots occurs, so the aperture width and the distance between the centers of the apertures are determined by the method described above. The opening width in the horizontal axis direction is referred to as the visual field opening width. This may be set in accordance with the measured visual field width or spatial resolution. If the field width is narrowed and the spatial resolution is increased, the field opening width is narrowed. As a result, the amount of light is reduced and the measurement sensitivity is lowered. If the field opening width is increased in order to improve the measurement sensitivity, the spatial resolution decreases. This trade-off is determined and set according to the measurement target and optical conditions.
図27および図28は、本発明の第6実施例を示す。この実施例は、一般的なマイケルソン干渉計を用いた位相シフト干渉光学系に本発明を適用した例である。これは、例えば、マイケルソン干渉計を用いた、FTIR(フーリエ変換赤外分光法:Fourier Transform Infrared Spectroscopy)方式の分光イメージ装置、垂直走査型低コヒーレンス干渉法(Coherence Scanning Interferometry)による立体形状計測装置、更にフルフィールドOCT(Optical Coherence Tomography)と呼ばれる光干渉断層像装置などにも有効な手法である。 27 and 28 show a sixth embodiment of the present invention. In this embodiment, the present invention is applied to a phase shift interference optical system using a general Michelson interferometer. This includes, for example, FTIR (Fourier Transform Infrared Spectroscopy) type spectroscopic image equipment using a Michelson interferometer, and three-dimensional shape measurement equipment using vertical scanning type low coherence interferometry (Coherence Scanning Interferometry). Furthermore, it is an effective technique for an optical coherence tomography apparatus called full-field OCT (Optical Coherence Tomography).
従来のマイケルソン型位相シフト干渉光学系に、共役面結像光学系を新たに設置し、その共役面に多重スリットを設置している。第4実施例と同様に、マイケルソン干渉系は光学的な異方性を持たないため、図21(b)に示す、2次元配置された複数の矩形状の開口部を有する多重スリットを用いる。 A conjugate plane imaging optical system is newly installed in the conventional Michelson type phase shift interference optical system, and multiple slits are installed on the conjugate plane. Similar to the fourth embodiment, the Michelson interference system does not have optical anisotropy, and therefore, a multiple slit having a plurality of rectangular openings arranged two-dimensionally as shown in FIG. 21B is used. .
なお、本発明は、図28に示すような立体形状計測装置やフルフィールドOCTに用いられている、垂直走査型低コヒーレンス干渉法に適用しても良い。図28では、マイケルソン型位相シフト干渉光学系に、共役面結像光学系を新たに設置し、その共役面に本事例も同様に矩形開口アレイを設置している。
このように、輝点間の位相の打ち消し合いを防止することにより、特に空間周波数の低い模様を有する計測対象全面での干渉強度鮮明度の向上が可能となる。
The present invention may be applied to a vertical scanning type low coherence interferometry used in a three-dimensional shape measuring apparatus and a full field OCT as shown in FIG. In FIG. 28, a conjugate plane imaging optical system is newly installed in the Michelson type phase shift interference optical system, and a rectangular aperture array is similarly installed in the conjugate plane in this example.
In this way, by preventing the cancellation of the phase between the bright spots, it is possible to improve the clearness of the interference intensity on the entire surface of the measurement object having a particularly low spatial frequency pattern.
10…多重スリット
20…調整機構
201…矩形枠部
202、203…ねじ
204…弾性部材
DESCRIPTION OF SYMBOLS 10 ... Multiple slit 20 ... Adjustment mechanism 201 ... Rectangular frame part 202, 203 ... Screw 204 ... Elastic member
Claims (5)
b) 前記第1の測定光及び前記第2の測定光の間に連続的な光路長差分布を付与する光路長差付与手段と、
c) 連続的な光路長差分布が付与された前記第1の測定光及び前記第2の測定光を結像面上で干渉させて干渉光を形成する結像光学系と、
d) 前記結像面に配置された前記干渉光の光強度を検出する検出部であって、直線上に等間隔で配置された複数の画素を有する干渉光検出部と、
e) 前記干渉光検出部で検出された前記干渉光の光強度に基づき、前記被測定物の測定点のインターフェログラムを求め、このインターフェログラムをフーリエ変換することによりスペクトルを取得する処理部と、
f) 前記被測定物の測定領域と前記分割光学系の間に配置された、該分割光学系と共通の共役面を有するとともに、該共役面に前記測定点からの測定光を結像する共役面結像光学系と、
g) 前記共役面に配置された、周期的に並ぶ透光部と遮光部とを有する振幅型回折格子と
を備え、
前記干渉光検出部の複数の画素の間隔をp、光学倍率をm、前記振幅型回折格子の透光部の幅をW、隣り合う2つの透光部の中心間距離をDとすると、WおよびDが以下の式(1)および式(2)
W=(p×2)/(m+1) ・・・ (1)
D=(p×2)/ m ・・・ (2)
によりそれぞれ定義されることを特徴とする分光特性測定装置。 a) a splitting optical system that divides measurement light emitted from a plurality of measurement points located in the measurement region of the object to be measured into first measurement light and second measurement light;
b) Optical path length difference providing means for providing a continuous optical path length difference distribution between the first measurement light and the second measurement light;
c) an imaging optical system that forms interference light by causing interference between the first measurement light and the second measurement light to which a continuous optical path length difference distribution is applied, on an imaging surface;
d) a detection unit for detecting the light intensity of the interference light arranged on the imaging surface, the interference light detection unit having a plurality of pixels arranged at equal intervals on a straight line;
e) A processing unit that obtains an interferogram of the measurement point of the object to be measured based on the light intensity of the interference light detected by the interference light detection unit, and obtains a spectrum by Fourier transforming the interferogram When,
f) A conjugate that is arranged between the measurement region of the object to be measured and the divided optical system and has a conjugate plane in common with the divided optical system and forms an image of the measurement light from the measurement point on the conjugate plane. A surface imaging optical system;
g) an amplitude-type diffraction grating having a periodically arranged light-transmitting part and a light-shielding part arranged on the conjugate plane,
When the interval between the plurality of pixels of the interference light detection unit is p, the optical magnification is m, the width of the light transmission part of the amplitude diffraction grating is W, and the distance between the centers of two adjacent light transmission parts is D, W And D are the following formulas (1) and (2)
W = (p × 2) / (m + 1) (1)
D = (p × 2) / m (2)
The spectral characteristic measuring device is defined by
b) 前記第1の像面上に配置された、周期的に並ぶ透光部と遮光部とを有する振幅型回折格子と、
c) 前記振幅型回折格子の透光部を通過した前記測定光を第1の測定光及び第2の測定光に分割する分割光学系と、
d) 前記第1の測定光及び前記第2の測定光の間に連続的な光路長差分布を付与する光路長差付与手段と、
e) 連続的な光路長差分布が付与された前記第1の測定光及び前記第2の測定光を結像面上で干渉させて干渉光を形成する結像光学系と、
f) 前記結像面に配置された前記干渉光の光強度を検出する検出部であって、等間隔で配置された複数の画素を有する干渉光検出部と、
g) 前記干渉光検出部で検出された前記干渉光の光強度に基づき、前記被測定物の測定点のインターフェログラムを求め、このインターフェログラムをフーリエ変換することによりスペクトルを取得する処理部とを備え、
前記干渉光検出部の複数の画素の間隔をp、光学倍率をm、前記振幅型回折格子の透光部の幅をW、隣り合う2つの透光部の中心間距離をDとすると、WおよびDが以下の式(1)および式(2)
W=(p×2)/(m+1) ・・・ (1)
D=(p×2)/ m ・・・ (2)
によりそれぞれ定義されることを特徴とする分光特性測定装置。 a) a conjugate plane imaging optical system for converging measurement light emitted from a plurality of measurement points located in the measurement region of the object to be measured on the first image plane;
b) an amplitude-type diffraction grating that is disposed on the first image plane and includes a periodically arranged light-transmitting portion and a light-shielding portion;
c) a splitting optical system that splits the measurement light that has passed through the light-transmitting portion of the amplitude-type diffraction grating into first measurement light and second measurement light;
d) optical path length difference providing means for providing a continuous optical path length difference distribution between the first measurement light and the second measurement light;
e) an imaging optical system that forms interference light by causing interference between the first measurement light and the second measurement light to which a continuous optical path length difference distribution is applied on the imaging surface;
f) a detection unit for detecting the light intensity of the interference light arranged on the imaging surface, the interference light detection unit having a plurality of pixels arranged at equal intervals;
g) A processing unit that obtains an interferogram of a measurement point of the object to be measured based on the light intensity of the interference light detected by the interference light detection unit, and obtains a spectrum by Fourier transforming the interferogram And
When the interval between the plurality of pixels of the interference light detection unit is p, the optical magnification is m, the width of the light transmission part of the amplitude diffraction grating is W, and the distance between the centers of two adjacent light transmission parts is D, W And D are the following formulas (1) and (2)
W = (p × 2) / (m + 1) (1)
D = (p × 2) / m (2)
The spectral characteristic measuring device is defined by
b) 前記第1の測定光及び前記第2の測定光の間に連続的な光路長差分布を付与する光路長差付与手段と、
c) 連続的な光路長差分布が付与された前記第1の測定光及び前記第2の測定光を結像面上で干渉させて干渉光を形成する結像光学系と、
d) 前記結像面に配置された前記干渉光の光強度を検出する検出部であって、直線上に等間隔で配置された複数の画素を有する干渉光検出部と、
e) 前記干渉光検出部で検出された前記干渉光の光強度に基づき、前記被測定物の測定点のインターフェログラムを求め、このインターフェログラムをフーリエ変換することによりスペクトルを取得する処理部と、
f) 前記被測定物の測定領域と前記分割光学系の間に配置された、該分割光学系と共通の共役面を有するとともに、該共役面に前記測定点からの測定光を結像する共役面結像光学系と、
g) 前記共役面に配置された、周期的に並ぶ透光部と遮光部とを有する振幅型回折格子と
を備え、
前記分割光学系を構成する対物レンズの開口数N.A.が実効的な開口数N.A.よりも小さいとき、
前記干渉光検出部の複数の画素の間隔をp、光学倍率をm、前記振幅型回折格子の透光部の幅をW、隣り合う2つの透光部の中心間距離をDとすると、WおよびDが以下の式(3)および式(4)
W=(p×4)/(m+1) ・・・ (3)
D=(p×3)/ m ・・・ (4)
によりそれぞれ定義されることを特徴とする分光特性測定装置。 a) a splitting optical system that divides measurement light emitted from a plurality of measurement points located in the measurement region of the object to be measured into first measurement light and second measurement light;
b) Optical path length difference providing means for providing a continuous optical path length difference distribution between the first measurement light and the second measurement light;
c) an imaging optical system that forms interference light by causing interference between the first measurement light and the second measurement light to which a continuous optical path length difference distribution is applied, on an imaging surface;
d) a detection unit for detecting the light intensity of the interference light arranged on the imaging surface, the interference light detection unit having a plurality of pixels arranged at equal intervals on a straight line;
e) A processing unit that obtains an interferogram of the measurement point of the object to be measured based on the light intensity of the interference light detected by the interference light detection unit, and obtains a spectrum by Fourier transforming the interferogram When,
f) A conjugate that is arranged between the measurement region of the object to be measured and the divided optical system and has a conjugate plane in common with the divided optical system and forms an image of the measurement light from the measurement point on the conjugate plane. A surface imaging optical system;
g) an amplitude-type diffraction grating having a periodically arranged light-transmitting part and a light-shielding part arranged on the conjugate plane,
When the numerical aperture NA of the objective lens constituting the split optical system is smaller than the effective numerical aperture NA,
When the interval between the plurality of pixels of the interference light detection unit is p, the optical magnification is m, the width of the light transmission part of the amplitude diffraction grating is W, and the distance between the centers of two adjacent light transmission parts is D, W And D are the following formulas (3) and (4)
W = (p × 4) / (m + 1) (3)
D = (p × 3) / m (4)
The spectral characteristic measuring device is defined by
b) 前記第1の像面上に配置された、周期的に並ぶ透光部と遮光部とを有する振幅型回折格子と、
c) 前記振幅型回折格子の透光部を通過した前記測定光を第1の測定光及び第2の測定光に分割する分割光学系と、
d) 前記第1の測定光及び前記第2の測定光の間に連続的な光路長差分布を付与する光路長差付与手段と、
e) 連続的な光路長差分布が付与された前記第1の測定光及び前記第2の測定光を結像面上で干渉させて干渉光を形成する結像光学系と、
f) 前記結像面に配置された前記干渉光の光強度を検出する検出部であって、等間隔で配置された複数の画素を有する干渉光検出部と、
g) 前記干渉光検出部で検出された前記干渉光の光強度に基づき、前記被測定物の測定点のインターフェログラムを求め、このインターフェログラムをフーリエ変換することによりスペクトルを取得する処理部とを備え、
前記分割光学系を構成する対物レンズの開口数N.A.が実効的な開口数N.A.よりも小さいとき、
前記干渉光検出部の複数の画素の間隔をp、光学倍率をm、前記振幅型回折格子の透光部の幅をW、隣り合う2つの透光部の中心間距離をDとすると、WおよびDが以下の式(3)および式(4)
W=(p×4)/(m+1) ・・・ (3)
D=(p×3)/ m ・・・ (4)
によりそれぞれ定義されることを特徴とする分光特性測定装置。 a) a conjugate plane imaging optical system for converging measurement light emitted from a plurality of measurement points located in the measurement region of the object to be measured on the first image plane;
b) an amplitude-type diffraction grating that is disposed on the first image plane and includes a periodically arranged light-transmitting portion and a light-shielding portion;
c) a splitting optical system that splits the measurement light that has passed through the light-transmitting portion of the amplitude-type diffraction grating into first measurement light and second measurement light;
d) optical path length difference providing means for providing a continuous optical path length difference distribution between the first measurement light and the second measurement light;
e) an imaging optical system that forms interference light by causing interference between the first measurement light and the second measurement light to which a continuous optical path length difference distribution is applied on the imaging surface;
f) a detection unit for detecting the light intensity of the interference light arranged on the imaging surface, the interference light detection unit having a plurality of pixels arranged at equal intervals;
g) A processing unit that obtains an interferogram of a measurement point of the object to be measured based on the light intensity of the interference light detected by the interference light detection unit, and obtains a spectrum by Fourier transforming the interferogram And
When the numerical aperture NA of the objective lens constituting the split optical system is smaller than the effective numerical aperture NA,
When the interval between the plurality of pixels of the interference light detection unit is p, the optical magnification is m, the width of the light transmission part of the amplitude diffraction grating is W, and the distance between the centers of two adjacent light transmission parts is D, W And D are the following formulas (3) and (4)
W = (p × 4) / (m + 1) (3)
D = (p × 3) / m (4)
The spectral characteristic measuring device is defined by
前記分割光学系が、前記測定光を平行光線化して前記第1透過部及び前記第2透過部に入射させる対物レンズを有し、
前記結像光学系が、前記測定光のうち前記第1透過部を透過した第1測定光と前記第2透過部を透過した第2測定光が入射する、前記第1透過部と前記第2透過部の境界面と前記第1透過部の入射面との交線に平行な軸を有する、シリンドリカルレンズを有し、
前記干渉光検出部が、前記シリンドリカルレンズに入射した前記第1測定光と前記第2測定光の干渉光の強度分布を検出し、
前記処理部が、前記干渉光検出部で検出される前記干渉光の強度分布に基づき前記被測定物の測定点のインターフェログラムを求め、このインターフェログラムをフーリエ変換することによりスペクトルを取得する
ことを特徴とする請求項1〜4のいずれかに記載の分光特性測定装置。 The optical path length difference providing means is such that a first transmission part whose incident surface and output surface are parallel, and one of the incident surface and the output surface is on the same plane as the incident surface or the output surface of the first transmission part, A transmissive optical member comprising a wedge-shaped second transmissive portion, the other of which is inclined with respect to one of the entrance surface and the exit surface;
The splitting optical system has an objective lens that collimates the measurement light and makes it incident on the first transmission part and the second transmission part,
The imaging optical system includes the first transmission unit and the second transmission unit in which the first measurement light transmitted through the first transmission unit and the second measurement light transmitted through the second transmission unit are incident. A cylindrical lens having an axis parallel to a line of intersection between the boundary surface of the transmission part and the incident surface of the first transmission part;
The interference light detection unit detects an intensity distribution of interference light of the first measurement light and the second measurement light incident on the cylindrical lens;
The processing unit obtains an interferogram of a measurement point of the object to be measured based on an intensity distribution of the interference light detected by the interference light detection unit, and obtains a spectrum by performing a Fourier transform on the interferogram. The spectral characteristic measuring apparatus according to any one of claims 1 to 4.
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