JP6401619B2 - Radiation image conversion panel - Google Patents

Description

  The present invention relates to a radiation image conversion panel including a phosphor layer composed of a plurality of columnar crystals.

  Conventionally, a radiation image conversion panel in which a photostimulable phosphor layer composed of a plurality of columnar crystals is formed on a substrate as a support is known (see, for example, Patent Documents 1 to 3). In a radiation image conversion panel using a stimulable phosphor layer, for example, a radiation image such as an X-ray image is incident on the panel, and information on the radiation image is accumulated and recorded in the phosphor layer. Then, a radiation image is reproduced by a light image of stimulated emission generated when the panel is irradiated with excitation light having a predetermined wavelength. Such a radiation image conversion panel is used as, for example, a dental imaging plate.

JP 2000-230979 A JP 2006-98241 A JP 2014-48058 A

  In the reproduction of a radiation image using a radiation image conversion panel provided with a stimulable phosphor layer, as described above, the panel is irradiated with excitation light and the latent image of the radiation image recorded on the phosphor layer is read out. Thus, a step of reproducing the radiation image is performed. Further, the radiation image conversion panel can be repeatedly used by erasing the latent image recorded on the phosphor layer by irradiating the panel with erasing light after reproducing the radiation image.

  Therefore, in the use of the radiation image conversion panel described above, the process of setting the panel in a reading scanner device or the like and reading out the latent image is repeatedly performed on the same panel. For this reason, generally, the surface of the phosphor layer of the radiation image conversion panel is required to have scratch resistance. As a specific configuration, for example, a configuration in which a protective film for imparting scratch resistance to the panel is further formed on the moisture-resistant protective film on the moisture-resistant protective film formed on the phosphor layer. It is done. In addition, as a specific method for forming the scratch-resistant protective film, for example, a configuration in which a protective film having scratch resistance is bonded to the panel surface via an adhesive layer can be used.

  However, in the configuration in which the scratch-resistant protective film is simply bonded to the surface of the radiation image conversion panel, the latent image is read out from the scanner end by the scanner device in the repeated use of the panel or the panel is handled from the end of the panel. There is a problem that peeling of the protective film occurs. Problems such as peeling of the scratch-resistant protective film similarly occur in handling and the like of radiation image conversion panels using phosphor layers other than the stimulable phosphor layer.

  Patent Document 1 (Japanese Patent Application Laid-Open No. 2000-230979) discloses that an end portion of a laminate in which a phosphor layer containing a stimulable phosphor and a protective layer are formed on a support is covered with a coating agent. A configuration for sealing is described. However, such a configuration in which the coating agent is additionally provided at the end of the panel causes problems such as an increase in the manufacturing process of the panel and an increase in manufacturing cost.

  The present invention has been made to solve the above problems, and provides a radiation image conversion panel capable of suppressing the occurrence of peeling or the like of a scratch-resistant protective film provided on a phosphor layer. The purpose is to do.

  In order to achieve such an object, a radiation image conversion panel according to the present invention includes (1) a support, and (2) a phosphor layer provided on the main surface of the support and made of a plurality of columnar crystals, (3) a moisture-resistant protective film formed on the phosphor layer; and (4) a scratch-resistant protective film formed on the moisture-resistant protective film, and (5) a direction orthogonal to the main surface of the support. As seen from the above, the area of the scratch-resistant protective film is smaller than both the area of the phosphor layer and the area of the moisture-resistant protective film.

  In the radiation image conversion panel described above, in a configuration in which a phosphor layer having a columnar crystal structure, a moisture-resistant protective film, and a scratch-resistant protective film are sequentially formed on the support, the direction orthogonal to the main surface of the support The area of the scratch-resistant protective film is smaller than the areas of the phosphor layer and the moisture-resistant protective film as viewed from (the stacking direction of the phosphor layer and each protective film). At this time, a blank area where no scratch-resistant protective film exists is generated at the end of the radiation image conversion panel. Such a blank area suppresses the occurrence of peeling of the scratch-resistant protective film from the edge of the panel.

  Here, in the radiation image conversion panel having the above configuration, when viewed from the direction orthogonal to the main surface of the support, the end portion of the scratch-resistant protective film has a distance of 0.01 mm or more from the end portion of the moisture-resistant protective film. The position is preferably 0 mm or less. In this way, by setting the distance d between the ends of the scratch-resistant protective film corresponding to the width of the blank area at the edge of the panel and the moisture-resistant protective film to 0.01 mm ≦ d ≦ 1.0 mm. In addition, it is possible to suitably realize suppression of occurrence of peeling of the scratch-resistant protective film.

  The radiation image conversion panel may further include a resin layer formed between the support and the phosphor layer. Thus, by providing the resin layer on the main surface of the support, the adhesion between the support and the phosphor layer can be improved.

  The radiation image conversion panel may include a second moisture-resistant protective film formed to cover the support, the phosphor layer, and the moisture-resistant protective film. In this case, the scratch-resistant protective film is preferably formed on the second moisture-resistant protective film.

  In addition, with respect to the phosphor layer composed of a plurality of columnar crystals used in the radiation image conversion panel, specifically, for example, the phosphor layer is composed of a stimulable phosphor or an instantaneous light emitting phosphor. It is also good. Further, the phosphor layer may be composed of a phosphor using CsBr or CsI as a base material.

  Further, the radiation image conversion panel may be configured such that the scratch-resistant protective film is bonded onto the moisture-resistant protective film via an adhesive layer. In this case, the area of the adhesive layer is smaller than both the area of the phosphor layer and the area of the moisture-resistant protective film as in the area of the scratch-resistant protective film as viewed from the direction orthogonal to the main surface of the support. It is preferable.

  In the radiation image conversion panel, the phosphor layer may be composed of a stimulable phosphor, and the adhesive layer may be composed of a material that absorbs excitation light for the phosphor layer. Thus, by making the adhesive layer function as an excitation light absorbing layer, the sharpness of the reproduced radiation image can be improved.

  As for the material of the protective film used for the radiation image conversion panel, specifically, for example, the moisture-resistant protective film (lower protective film) may be made of polyparaxylylene. The scratch-resistant protective film (upper protective film) may be composed of a material (for example, urethane acrylic resin) that is a combination of two or more materials selected from acrylic resins, urethane resins, and silica. good.

  According to the radiation image conversion panel of the present invention, in a configuration in which a phosphor layer having a columnar crystal structure, a moisture-resistant protective film, and a scratch-resistant protective film are sequentially formed on a support, the main surface of the support is provided. Scratch-resistant protection from the edge of the panel by making the area of the scratch-resistant protective film smaller than both the area of the phosphor layer and the area of the moisture-resistant protective film when viewed from the orthogonal direction It is possible to suppress the occurrence of film peeling and the like.

It is side surface sectional drawing which shows the structure of 1st Embodiment of a radiation image conversion panel. It is side surface sectional drawing which shows the structure of 2nd Embodiment of a radiographic image conversion panel. It is an image shown about the radiation image conversion panel of the sample A which is a comparative example. It is an image shown about the radiation image conversion panel of the sample B which is an Example. (A) Side surface sectional drawing which shows the modification of the radiation image conversion panel shown in FIG. 1, (b) Side surface sectional drawing which shows another modification.

  Hereinafter, embodiments of a radiation image conversion panel according to the present invention will be described in detail with reference to the drawings. In the description of the drawings, the same elements are denoted by the same reference numerals, and redundant description is omitted. Further, the dimensional ratios in the drawings do not necessarily match those described.

  FIG. 1 is a side sectional view showing the configuration of the first embodiment of the radiation image conversion panel. The radiation image conversion panel 1A according to the present embodiment detects a radiation image such as an X-ray image incident on the panel by converting it into an optical image, and has, for example, a rectangular plate-like planar shape. Such a radiation image conversion panel 1A is used, for example, for a dental imaging plate or a radiation image sensor.

  As shown in FIG. 1, the radiation image conversion panel 1 </ b> A includes a support 10, a phosphor layer 20 having a columnar crystal structure provided on a main surface (upper surface in FIG. 1) 11 of the support 10, and a phosphor. A moisture-resistant protective film 30 formed on the layer 20 and a scratch-resistant protective film 50 formed on the moisture-resistant protective film 30 are provided.

  The support 10 is made of a substrate made of a predetermined material such as a resin substrate, and preferably has a certain flexibility. Specific examples of the material constituting the support 10 include aluminum, stainless steel, polyimide, polyetheretherketone, polyethylene naphthalate, and polyethylene terephthalate. Moreover, the thickness of the support body 10 is set in the range of 5 micrometers or more and 500 micrometers or less, for example.

  In the configuration example shown in FIG. 1, a resin layer 15 is formed on the main surface 11 of the support 10. As a material constituting the resin layer 15, specifically, for example, a thermoplastic resin mainly composed of polyester, acrylic, urethane resin, or the like can be used. Moreover, the layer thickness of the resin layer 15 is set, for example in the range of 0.5 micrometer or more and 50 micrometers or less. In addition, as the resin layer 15, it is particularly preferable to use a resin layer coated on the support 10 with a layer thickness of 1 μm or more and 10 μm or less. In the configuration example of FIG. 1, the configuration in which the resin layer 15 is formed on one side of the support 10 is shown, but the configuration in which the resin layer is formed on both sides of the support 10 may be used. Thus, the warp of the support 10 can be suppressed by forming the resin layers on both sides.

  On the main surface 11 of the support 10, a phosphor layer 20 composed of a plurality of columnar crystals 21 is formed via the resin layer 15. As a material constituting the phosphor layer 20, for example, a stimulable phosphor is used. When the phosphor layer 20 is a photostimulable phosphor layer, the photostimulable phosphor layer 20 absorbs and accumulates and records incident radiation, and accumulates when irradiated with excitation light of a predetermined wavelength. It emits light according to the energy of the radiation.

  Specifically, for example, CsBr: Eu, which is CsBr doped with Eu, can be used as the stimulable phosphor constituting the phosphor layer 20. The layer thickness of the phosphor layer 20 is set in a range of 10 μm or more and 500 μm or less, for example. In addition, when a particularly high resolution is required, the layer thickness of the phosphor layer 20 is preferably set in the range of 50 μm or more and 200 μm or less.

  Moreover, it is preferable that the predetermined part by the side of the support body 10 among the columnar crystal structures of the fluorescent substance layer 20 has a spiral structure in which the columnar crystals 21 extend spirally. In this case, the spiral structure portion of the phosphor layer 20 functions as a light reflection layer (see Patent Document 3: Japanese Patent Laid-Open No. 2014-48058). The thickness of the spiral structure portion is set, for example, in the range of 0.5 μm to 50 μm. As the thickness of the spiral structure portion increases, the amount of light that can be reflected by the spiral structure portion increases. In addition, the material which comprises the fluorescent substance layer 20 is not restricted to the above-mentioned stimulable fluorescent substance, For example, you may use an instantaneous light emission fluorescent substance.

  A moisture-resistant protective film (lower protective film) 30 is formed on the phosphor layer 20. The moisture-resistant protective film 30 functions as a moisture-proof film for suppressing the phosphor layer 20 from absorbing moisture in the air. In this configuration example, the moisture-resistant protective film 30 is formed so as to cover the entire upper surface, lower surface, and side surfaces of the structure including the support 10, the resin layer 15, and the phosphor layer 20. Specifically, for example, polyparaxylylene can be used as the material constituting the moisture-resistant protective film 30. The film thickness of the moisture-resistant protective film 30 is set, for example, in the range of 2 μm to 20 μm.

  In addition, about the formation range of the moisture-resistant protective film 30, it should just be formed so that the upper surface of the fluorescent substance layer 20 may be covered. However, the moisture-resistant protective film 30 covers at least the entire phosphor layer 20 (in the configuration example of FIG. 1, the upper surface and the side surface) in order to sufficiently suppress moisture absorption by the phosphor layer 20. Preferably, it is formed so as to cover the entire phosphor layer 20, the support 10 and the like.

  A scratch-resistant protective film (upper protective film) 50 is formed on the moisture-resistant protective film 30 with an adhesive layer 40 and a base film 45 interposed therebetween. The scratch-resistant protective film 50 functions as a protective film for preventing damage caused when the radiation image conversion panel 1A is handled, transported, or read by the scanner device. In this configuration example, a protective film in which the scratch-resistant protective film 50 is formed on the base film 45 is bonded to the moisture-resistant protective film 30 via the adhesive layer 40.

  Further, the scratch-resistant protective film 50 has an area of the scratch-resistant protective film 50 that is equal to the area of the phosphor layer 20 and the moisture-resistant layer as viewed from the direction orthogonal to the main surface 11 of the support 10 (upward in FIG. 1). It is comprised so that it may become smaller than any of the area of the property protection film 30. Further, in this configuration example, the adhesive layer 40 also has substantially the same area as the scratch-resistant protective film 50, and therefore, the adhesive layer 40 is viewed from the direction orthogonal to the main surface 11 of the support 10. The area is configured to be smaller than both the area of the phosphor layer 20 and the area of the moisture-resistant protective film 30. Such an area condition is the same for the base film 45.

  Specifically, for example, urethane acrylic resin can be used as the material constituting the scratch-resistant protective film 50. Further, the film thickness of the scratch-resistant protective film 50 is set, for example, in the range of 2 μm to 20 μm.

  The effect of the radiation image conversion panel 1A according to the above embodiment will be described.

  In the radiation image conversion panel 1 </ b> A shown in FIG. 1, a phosphor layer 20 having a columnar crystal structure composed of a plurality of columnar crystals 21, a moisture-resistant protective film 30, and a scratch-resistant protective film 50 are sequentially formed on a support 10. In the formed configuration, the area of the scratch-resistant protective film 50 (the area of the upper surface) as viewed from the direction orthogonal to the main surface 11 of the support 10 (the stacking direction of the phosphor layer 20 and the protective films 30 and 50). ) Is smaller than both the area of the phosphor layer 20 and the area of the moisture-resistant protective film 30. At this time, a blank area in which the scratch-resistant protective film 50 is not present is generated at the end of the radiation image conversion panel 1A, as indicated by the width d of the area in FIG. By such a blank area, it is possible to suppress the occurrence of peeling of the scratch-resistant protective film 50 from the end portion of the panel 1A.

  In the radiation image conversion panel 1A having the above-described configuration, the blank area where the scratch-resistant protective film 50 is not present is the entire periphery of the panel 1A (for example, when the panel 1A is a rectangular plate, the entire four sides thereof). Is preferably provided. In the above configuration, the blank area from the end portion of the scratch-resistant protective film 50 to the end portion of the moisture-resistant protective film 30 in the peripheral portion of the panel 1A is more than the inner region where the scratch-resistant protective film 50 exists. The luminance of the emitted light is high, and for example, the region looks white with the naked eye. In the conventional configuration in which the peripheral portion of the panel described in Patent Document 1 is sealed with a coating agent, the region sealed with the coating agent does not contribute to image formation. On the other hand, in the above-described configuration in which the peripheral portion of the panel 1A is a blank area where the scratch-resistant protective film 50 is not present, this blank area can also be an area contributing to image formation.

  Here, in the radiation image conversion panel 1 </ b> A having the above configuration, when viewed from the stacking direction orthogonal to the main surface 11 of the support 10, the end portion of the scratch-resistant protective film 50 extends from the end portion of the moisture-resistant protective film 30. It is preferable that the distance d (see FIG. 1) is in a position of 0.01 mm to 1.0 mm.

  Thus, the distance d between the ends of the scratch-resistant protective film 50 and the moisture-resistant protective film 30 corresponding to the width of the blank area provided at the edge of the panel 1A is set to 0.01 mm ≦ d ≦ 1. By setting the thickness within a range of 0.0 mm, it is possible to suitably realize suppression of occurrence of peeling or the like of the scratch-resistant protective film 50. Specifically, by setting the distance d between the end portions of the protective films 50 and 30 to 0.01 mm or more, the protective film by providing a blank area where the scratch-resistant protective film 50 does not exist at the end portion of the panel 1A. The effect of suppressing the occurrence of 50 peeling can be sufficiently obtained. Further, by setting the distance d between the end portions of the protective films 50 and 30 to 1.0 mm or less, it is possible to prevent the margin area from becoming excessively large.

  The radiation image conversion panel 1A may further include a resin layer 15 such as a thermoplastic resin layer formed between the support 10 and the phosphor layer 20, as shown in FIG. Thus, by providing the resin layer 15 on the main surface 11 of the support 10, adhesion between the support 10 and the phosphor layer 20 can be improved.

  For the phosphor layer 20 composed of a plurality of columnar crystals 21 used in the radiation image conversion panel 1A, specifically, for example, the phosphor layer 20 is composed of a stimulable phosphor or an instantaneous light emitting phosphor. It is preferable that The phosphor layer 20 is preferably made of a phosphor using CsBr or CsI as a base material. Here, CsBr is mainly used as a base material of the stimulable phosphor. CsI is mainly used as a base material of the instantaneous light emitting phosphor.

  The radiation image conversion panel 1 </ b> A may have a configuration in which the scratch-resistant protective film 50 is bonded to the moisture-resistant protective film 30 via the adhesive layer 40. With this configuration, the scratch-resistant protective film 50 that satisfies the above-described area conditions can be suitably formed on the moisture-resistant protective film 30. In this case, the area of the adhesive layer 40 is the same as the area of the scratch-resistant protective film 50 and the area of the phosphor layer 20 and the moisture-resistant protective film as viewed from the direction orthogonal to the main surface 11 of the support 10. It is preferably smaller than any of the 30 areas.

  Further, in the radiation image conversion panel 1A, when the phosphor layer 20 is made of a stimulable phosphor, the adhesive layer 40 is made of a material that absorbs excitation light applied to the phosphor layer 20. It is also good that it is. Thus, by making the adhesive layer 40 function as an excitation light absorbing layer, it is possible to improve the sharpness of the radiation image reproduced by the radiation image conversion panel 1A. In this case, an adhesive layer colored in a predetermined color (for example, blue) can be used as the adhesive layer 40. Such an excitation light absorbing layer is not limited to the adhesive layer 40, and the scratch-resistant protective film 50 or the base film 45 may be configured to function as the excitation light absorbing layer.

  As for the material of the protective films 30 and 50 used in the radiation image conversion panel 1A, specifically, for example, the moisture-resistant protective film (lower protective film) 30 may be made of polyparaxylylene. preferable. The scratch-resistant protective film (upper protective film) 50 is a material obtained by combining and mixing two or more materials selected from acrylic resins, urethane resins, and silica, such as urethane acrylic resins and acrylic silica resins. It is preferable that it is comprised from these. Examples of such materials that are commercially available include Super Diamond Clear from Kansai Paint and AP ink from JUJO. Further, materials other than those described above may be used for the materials of the protective films 30 and 50.

  An example of a method for manufacturing the radiation image conversion panel 1A shown in FIG. 1 will be described. First, the support 10 made of a predetermined material and coated with the resin layer 15 on the main surface 11 is set in a vacuum deposition apparatus using a jig or the like. Then, vacuum evaporation is performed using two kinds of evaporation sources, ie, a base material (main material, CsBr, CsI, etc.) and a dope material (Eu, TlI, etc.), and the resin layer 15 on the main surface 11 of the support 10 is formed. In addition, the phosphor layer 20 having a columnar crystal structure is formed with a predetermined film thickness.

  Next, an annealing process is performed at a temperature of, for example, 150 ° C. to 200 ° C. in the air atmosphere on the structure including the support 10, the resin layer 15, and the phosphor layer 20 taken out from the vacuum apparatus after cooling. After cooling, a moisture-resistant protective film 30 is formed so as to cover the entire support 10, the resin layer 15, and the phosphor layer 20. Thereafter, the base film 45 on which the scratch-resistant protective film 50 is formed is bonded onto the moisture-resistant protective film 30 via the adhesive layer 40 under the condition that the above-described blank area is formed at the edge of the panel surface. The radiation image conversion panel 1A shown in FIG. 1 is produced.

  FIG. 2 is a side sectional view showing the configuration of the second embodiment of the radiation image conversion panel. The configuration of the radiation image conversion panel 1 </ b> B according to the present embodiment includes the support 10, the resin layer 15, the phosphor layer 20 having a plurality of columnar crystals 21, the adhesive layer 40, the base film 45, and the scratch-resistant protective film 50. 1 is the same as the configuration of the radiation image conversion panel 1A of the first embodiment shown in FIG. 1, but the configuration of the moisture-resistant protective film is different.

  A moisture-resistant protective film 32 that functions as a moisture-proof film is formed on the phosphor layer 20. The moisture-resistant protective film 32 is formed so as to cover only the upper surface of the phosphor layer 20 (the surface opposite to the support 10). In this configuration example, in addition to the moisture-resistant protective film 32, a second moisture-resistant protective film (second lower protective film) 35 that also functions as a moisture-proof film is formed. The second moisture-resistant protective film 35 is formed so as to cover the entire upper surface, lower surface, and side surface of the structure including the support 10, the resin layer 15, the phosphor layer 20, and the moisture-resistant protective film 32.

  A scratch-resistant protective film 50 is formed on the second moisture-resistant protective film 35 via an adhesive layer 40 and a base film 45. Further, the scratch-resistant protective film 50 has an area of the scratch-resistant protective film 50 as viewed from a direction orthogonal to the main surface 11 of the support 10, an area of the phosphor layer 20, an area of the moisture-resistant protective film 32, And it is comprised so that it may become smaller than any of the area of the 2nd moisture-resistant protective film 35.

  As shown in FIG. 2, the radiation image conversion panel 1 </ b> B includes a second moisture-resistant protective film 35 formed so as to cover the support 10, the phosphor layer 20, and the moisture-resistant protective film 32. The film 50 may be formed on the second moisture-resistant protective film 35. Even in such a configuration, similarly to the radiation image conversion panel 1A of FIG. 1, a blank area where the scratch-resistant protective film 50 does not exist is generated at the end of the radiation image conversion panel 1B. By such a blank area, it is possible to suppress the peeling of the scratch-resistant protective film 50 from the end of the panel 1B.

  Here, the radiation image conversion panel 1A shown in FIG. 1 shows a basic structure in the case of manufacturing each panel one by one. On the other hand, the configuration of the radiation image conversion panel 1B shown in FIG. 2 can be suitably used as an application structure in the case of manufacturing a single panel by cutting a large panel, for example.

  In this case, after forming the resin layer 15, the phosphor layer 20, and the moisture-resistant protective film 32 on the support 10, the panel is cut into a predetermined size using a laser or a punching die. In this way, by cutting the panel after forming the moisture-resistant protective film 32, it is possible to prevent the phosphor layer 20 from being deteriorated (deliquescent) due to the atmosphere in the cutting process, and to be damaged by handling and laser cutting. It is possible to protect the surface of the phosphor layer 20 from contamination caused by debris generated by the above. Furthermore, the protection of the panel in a cutting process can be made still more thorough by forming on the moisture-resistant protective film 32 the peeling protection sheet which peels after a cutting process. Then, a second moisture-resistant protective film 35 is formed so as to cover the entire cut support 10, resin layer 15, phosphor layer 20, and moisture-resistant protective film 32. Thereafter, the base film 45 on which the scratch-resistant protective film 50 is formed is bonded onto the second moisture-resistant protective film 35 via the adhesive layer 40 under the condition that the above-described blank area is formed at the edge of the panel surface. Thus, the radiation image conversion panel 1B shown in FIG. 2 is produced.

  About the suppression effect of generation | occurrence | production of peeling of the abrasion-resistant protective film by the radiation image conversion panel which has the said structure, it confirmed using the sample. Here, the applied structure shown in FIG. 2 was used as the structure of the radiation image conversion panel. Further, as the material of the phosphor layer 20, CsBr: Eu, which is a stimulable phosphor, was used. The panel size was 31 mm × 41 mm. This is a common size for dental imaging plates.

  Two types of panels A and B were prepared as the radiation image conversion panels to be evaluated. Sample A was a panel having a conventional structure in which a scratch-resistant protective film was formed so that no blank area was present at the edge of the panel surface. Sample B was a panel having a structure shown in FIG. 2 in which a scratch-resistant protective film was formed under an area condition in which a blank area was present at the edge of the panel surface. With respect to these samples A and B, reading with a scanner device was performed 50 times, and the occurrence of peeling of the scratch-resistant protective film was confirmed.

  As for the specific configurations of Samples A and B, a 9 μm-thick polyparaxylylene film is used as the moisture-resistant protective film, and a 10 μm-thick polyparaxylylene film is used as the second moisture-resistant protective film. A film was used, and a urethane acrylic resin film having a film thickness of 3 μm was used as the scratch-resistant protective film. The distance between the end portions of the scratch-resistant protective film and the moisture-resistant protective film in Sample B was d = 0.2 mm. This satisfies a preferable condition of 0.01 mm ≦ d ≦ 1.0 mm for the distance between the end portions (the width of the blank area).

  FIG. 3 is an image showing a radiation image conversion panel of Sample A as a comparative example. FIG. 4 is an image showing the radiation image conversion panel of Sample B as an example. These images in FIGS. 3 and 4 show the state of the radiation image conversion panel after 50 readings by the scanner device described above.

  As shown in FIG. 3, in the sample A having a conventional structure in which the scratch-resistant protective film is formed so that no blank area exists at the edge of the panel surface, the protective film is peeled off at the panel edge. On the other hand, as shown in FIG. 4, in the sample B having a structure in which the scratch-resistant protective film is formed under the area condition in which the blank area exists at the edge of the panel surface, the protective film is peeled off due to the effect of the blank area. Can be confirmed.

  The radiation image conversion panel according to the present invention is not limited to the above-described embodiments and configuration examples, and various modifications are possible. Here, FIGS. 5A and 5B are side sectional views showing modifications of the radiation image conversion panel shown in FIG. The configuration of the radiation image conversion panel shown in FIG. 5 (a) is the same as that of the radiation image conversion panel 1A shown in FIG. 1, but a thermoplastic resin layer between the support 10 and the phosphor layer 20 is used. This is different in that the resin layer 15 is not provided. Thus, the resin layer 15 between the support 10 and the phosphor layer 20 may be configured not to be provided if not necessary.

  The configuration of the radiation image conversion panel shown in FIG. 5B is the same as that of the radiation image conversion panel 1 </ b> A shown in FIG. 1, but adhesion between the moisture-resistant protective film 30 and the base film 45 is performed. The difference is that the layer 40 is not provided. As described above, the adhesive layer 40 for bonding the base film 45 and the scratch-resistant protective film 50 to the moisture-resistant protective film 30 may also be configured not to be provided if unnecessary. For example, when the base film 45 and the scratch-resistant protective film 50 can be bonded only by a process such as heating by selecting the material of the moisture-resistant protective film 30, or on the moisture-resistant protective film 30 by a method other than bonding. For example, when the scratch-resistant protective film 50 is provided, the adhesive layer 40 is unnecessary.

  In addition, as with the adhesive layer 40, the base film 45 may be configured not to be provided if unnecessary. 5 (a) and 5 (b) show a modification of the configuration of the radiation image conversion panel 1A shown in FIG. 1, but the radiation image shown in FIG. 2 having the second moisture-resistant protective film 35 is shown. The conversion panel 1B can be similarly modified in configuration.

  INDUSTRIAL APPLICATION This invention can be utilized as a radiation image conversion panel which can suppress generation | occurrence | production of peeling etc. of the abrasion-resistant protective film provided on the fluorescent substance layer.

  DESCRIPTION OF SYMBOLS 1A, 1B ... Radiation image conversion panel, 10 ... Support body, 11 ... Main surface, 15 ... Resin layer, 20 ... Phosphor layer, 21 ... Columnar crystal, 30, 32 ... Moisture-resistant protective film, 35 ... Second moisture resistance Protective film, 40 ... adhesive layer, 45 ... base film, 50 ... scratch-resistant protective film.

Claims (10)

A support;
A phosphor layer provided on the main surface of the support and composed of a plurality of columnar crystals;
A moisture-resistant protective film formed on the phosphor layer;
A scratch-resistant protective film formed on the moisture-resistant protective film,
Radiation characterized in that the area of the scratch-resistant protective film is smaller than both the area of the phosphor layer and the area of the moisture-resistant protective film as viewed from the direction orthogonal to the main surface of the support. Image conversion panel.   When viewed from a direction orthogonal to the main surface of the support, the end portion of the scratch-resistant protective film is located at a distance of 0.01 mm or more and 1.0 mm or less from the end portion of the moisture-resistant protective film. The radiation image conversion panel according to claim 1, wherein:   The radiation image conversion panel according to claim 1, further comprising a resin layer formed between the support and the phosphor layer.   A second moisture-resistant protective film formed to cover the support, the phosphor layer, and the moisture-resistant protective film; and the scratch-resistant protective film is formed on the second moisture-resistant protective film. The radiation image conversion panel according to claim 1, wherein the radiation image conversion panel is provided.   The radiation image conversion panel according to any one of claims 1 to 4, wherein the phosphor layer is composed of a stimulable phosphor or an instantaneous light emitting phosphor.   6. The radiation image conversion panel according to claim 1, wherein the phosphor layer is made of a phosphor having CsBr or CsI as a base material. The scratch-resistant protective film is bonded onto the moisture-resistant protective film via an adhesive layer,
The area of the adhesive layer is smaller than both the area of the phosphor layer and the area of the moisture-resistant protective film as viewed from a direction orthogonal to the main surface of the support. The radiation image conversion panel according to claim 6. The phosphor layer is composed of a stimulable phosphor,
The radiation image conversion panel according to claim 7, wherein the adhesive layer is made of a material that absorbs excitation light for the phosphor layer.   The radiation image conversion panel according to claim 1, wherein the moisture-resistant protective film is made of polyparaxylylene.   The said scratch-resistant protective film is comprised from the material which combined 2 or more types of materials chosen from acrylic resin, urethane type resin, and a silica, The any one of Claims 1-9 characterized by the above-mentioned. Radiation image conversion panel.