JP6427381B2 - Method of producing ITO particles - Google Patents
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本発明は、圧粉体にしたときに体積抵抗率が低いITO粒子を製造する方法に関するものである。本明細書において、ITOとはインジウム錫酸化物(Indium Tin Oxide)をいう。 The present invention relates to a method of producing ITO particles having a low volume resistivity when made into a green compact. In the present specification, ITO means indium tin oxide.
LCD(Liquid Crystal Display)やPDP(Plasma Display Panel)、有機EL(ElectroLuminescence)、タッチパネル等の表示装置には、透明電極が用いられている。この透明電極は、ITO等からなる透明導電材料によって構成されることが多い。このような透明電極は、通常スパッタリング法などで膜状に形成される(例えば、特許文献1参照)。しかしながらスパッタリング装置は高価であり、かつ、成膜の効率が悪い。このスパッタリング法に代わって、ITO粒子を含む塗料を基板に塗布する方法が提案されている。しかしながら、この塗布方法は、生産性、製造コスト、原材料の利用効率等の点で、スパッタリング法に優れているものの、ITO粒子を含む塗料で成膜した場合、導電経路が粒子間接触によるため、スパッタリング法で成膜された均一な膜と比べて、粒子界面の抵抗が高いことから導電膜全体としての抵抗も高く、その導電性が劣る問題があった。 A transparent electrode is used in a display device such as an LCD (Liquid Crystal Display), a PDP (Plasma Display Panel), an organic EL (ElectroLuminescence), and a touch panel. The transparent electrode is often made of a transparent conductive material made of ITO or the like. Such a transparent electrode is usually formed into a film shape by sputtering or the like (see, for example, Patent Document 1). However, the sputtering apparatus is expensive and the deposition efficiency is poor. Instead of this sputtering method, a method of applying a paint containing ITO particles to a substrate has been proposed. However, although this coating method is superior to the sputtering method in terms of productivity, manufacturing cost, utilization efficiency of raw materials, etc., when forming a film with a paint containing ITO particles, the conductive path is due to interparticle contact, As compared with the uniform film formed by the sputtering method, there is a problem that the resistance as the whole conductive film is high because the resistance of the particle interface is high, and the conductivity is inferior.
この問題を解決するために、立方体形状のITO粒子を製造する方法が開示されている(例えば、特許文献2及び3)。これらの方法によれば、ITO粒子を立方体形状に製造することにより、こうしたITO粒子を含む塗料を基板に塗布して成膜したときに、ITO粒子を空隙の少ない状態で緻密に配置して、粒子界面の抵抗を下げた透明導電膜を得ることができる。 In order to solve this problem, methods of manufacturing cube-shaped ITO particles are disclosed (for example, Patent Documents 2 and 3). According to these methods, the ITO particles are formed into a cubic shape, and when a paint containing such ITO particles is applied to a substrate to form a film, the ITO particles are densely arranged in a state of few voids, A transparent conductive film can be obtained in which the resistance of the particle interface is reduced.
上記特許文献2及び3に示されるITO粒子の製造方法は、いずれもインジウムと錫とを含む前駆体を有機溶媒の存在の下、200℃以上の温度で加熱処理する必要があった。このため、上記特許文献2及び3に示されるITO粒子の製造方法は、有機溶媒の廃液処理を必要とするうえ、オートクレーブのような密閉式の加熱容器を必要とする問題があった。 In the method of producing ITO particles shown in Patent Documents 2 and 3, it is necessary to heat treat a precursor containing indium and tin in the presence of an organic solvent at a temperature of 200 ° C. or more. For this reason, the method of producing ITO particles shown in Patent Documents 2 and 3 requires a waste solution treatment of an organic solvent, and also has a problem of requiring a closed heating container such as an autoclave.
本発明の目的は、廃液処理が簡便な水系溶媒を使用して、低温常圧下で形状の揃った立方体又は直方体のITO粒子を製造する方法を提供することにある。また本発明の別の目的は、圧粉体にしたときに体積抵抗率が低いITO粒子の製造方法を提供することにある。 An object of the present invention is to provide a method for producing cubic or rectangular ITO particles in uniform shape under low temperature and normal pressure using an aqueous solvent which is easy to handle waste liquid. Another object of the present invention is to provide a method for producing ITO particles having a low volume resistivity when made into a green compact.
本発明の第1の観点は、インジウム塩と錫塩と尿素を混合した混合水溶液を60〜100℃の温度で保温してインジウム錫水酸化物粒子を共沈させ、前記インジウム錫水酸化物粒子が共沈した液を固液分離し、前記分離したインジウム錫水酸化物粒子を乾燥した後、熱処理してインジウム錫酸化物前駆体粒子に分解し、前記インジウム錫酸化物前駆体粒子を大気中又は不活性ガスの雰囲気中で熱処理して還元することによりインジウム錫酸化物粒子を得るITO粒子の製造方法であって、前記還元が、前記熱分解により得られたインジウム錫酸化物前駆体粒子を、窒素又はアルゴンの不活性ガスと、水素又は一酸化炭素の還元性ガスとを混合した混合ガス雰囲気下、200〜600℃の温度で0.5〜5時間熱処理することにより行われ、前記還元性ガスの前記混合ガス中の濃度は、前記混合ガスが大気中で爆発限界を超えない濃度であり、前記インジウム錫酸化物粒子の各粒子は、その長軸に対する短軸の比の平均が1.3以下の形状及び寸法の揃った立方体又は直方体であり、前記インジウム錫酸化物粒子は、圧力を0.196〜29.42MPaの範囲で変化させたときの圧粉体の体積抵抗率が2.2×10 -2 〜1.5Ωcmであることを特徴とする。 According to a first aspect of the present invention, indium tin hydroxide particles are coprecipitated by keeping the temperature of a mixed aqueous solution in which indium salt, tin salt and urea are mixed at a temperature of 60 to 100 ° C. The liquid coprecipitated is separated into solid and liquid, and the separated indium tin hydroxide particles are dried and then heat-treated to decompose into indium tin oxide precursor particles, and the indium tin oxide precursor particles are exposed to the atmosphere Alternatively , it is a method for producing ITO particles to obtain indium tin oxide particles by heat treatment and reduction in an atmosphere of an inert gas , wherein the reduction includes indium tin oxide precursor particles obtained by the thermal decomposition. Heat treatment at a temperature of 200 to 600 ° C. for 0.5 to 5 hours in a mixed gas atmosphere in which an inert gas of nitrogen or argon and a reducing gas of hydrogen or carbon monoxide are mixed. The concentration of the reducing gas in the mixed gas is a concentration at which the mixed gas does not exceed the explosion limit in the atmosphere, and each particle of the indium tin oxide particles has an average ratio of the minor axis to the major axis The indium tin oxide particles have a volume resistivity of green compact when the pressure is changed in a range of 0.196 to 29.42 MPa. It is characterized by being 2.2 × 10 −2 to 1.5 Ωcm .
本発明の第2の観点は、第1の観点に基づく発明であって、 前記混合水溶液がインジウム塩と錫塩との混合水溶液に尿素水溶液を添加混合して調製され、前記尿素水溶液を前記インジウム塩及び前記錫塩に対する尿素の反応当量が2〜500倍になるように添加するITO粒子の製造方法である。 A second aspect of the present invention is the invention based on the first aspect, wherein the mixed aqueous solution is prepared by adding and mixing a urea aqueous solution to a mixed aqueous solution of an indium salt and a tin salt, and It is the manufacturing method of the ITO particle | grains added so that the reaction equivalent of urea with respect to a salt and the said tin salt may become 2-500 times.
本発明によれば、特許文献2及び3に示される有機溶媒を使用せずに、100℃以下の低温で常圧下、水系溶媒でITO粒子を製造するため、有機溶媒を用いたときと比べて、ITO粒子の製造時に作業環境が低下せず、火気取扱いに注意を払う必要がなく、廃液処理を簡便に行うことができ、かつオートクレーブのような密閉式の加熱容器を必要としない。また、本発明の方法によれば、製造されるインジウム錫水酸化物粒子から作られるITO粒子が形状及び寸法の揃った立方体又は直方体になり、ITO粒子を圧粉体にしたときに粒子界面の接触面積が増加して、体積抵抗率を低くすることができる。 According to the present invention, since ITO particles are produced with an aqueous solvent under normal pressure at a low temperature of 100 ° C. or lower without using the organic solvents shown in Patent Documents 2 and 3, compared to when using an organic solvent The working environment does not decrease at the time of production of ITO particles, there is no need to pay attention to fire handling, waste liquid treatment can be performed easily, and a closed heating container such as an autoclave is not required. Further, according to the method of the present invention, the ITO particles produced from the indium tin hydroxide particles to be produced become cubes or rectangular parallelepipeds with uniform shape and size , and when the ITO particles are formed into a powder compact, The contact area can be increased to lower the volume resistivity.
次に本発明を実施するための形態を説明する。 Next, an embodiment of the present invention will be described.
本発明のITO粒子は、次の方法で製造される。先ず、第1の工程として、インジウム塩と錫塩との混合水溶液を調製する。第2の工程として、この混合水溶液に尿素水溶液を添加混合し、この尿素水溶液を混合した混合水溶液を60〜100℃の温度で保温して均一沈殿法によりインジウム錫水酸化物粒子を共沈させる。第3の工程として、このインジウム錫水酸化物粒子が共沈した液を固液分離する。第4の工程として、固液分離したインジウム錫水酸化物粒子を乾燥する。第5の工程として、乾燥したインジウム錫水酸化物粒子を熱処理してインジウム錫酸化物前駆体粒子に分解する。最後に第6の工程として、インジウム錫酸化物前駆体粒子を大気中又は不活性ガスの雰囲気中で熱処理して還元することによりインジウム錫酸化物(ITO)粒子を得る。
なお、本発明は、インジウム塩と錫塩との混合水溶液を調製し、この混合水溶液に尿素水溶液を添加混合して尿素水溶液を混合した混合水溶液を調製する方法に限らず、インジウム塩と錫塩と尿素を混合して混合水溶液を調製する方法でもよい。即ち、この方法は、
所定量計量したインジウム塩、スズ塩、尿素の粉末や顆粒を直接所定量の水に投入し、撹拌・溶解して、混合水溶液を調製する方法である。インジウム塩、スズ塩、尿素の粉末や顆粒は混合してから溶解してもよく、溶解する水は保温する温度に事前に加温しておいてもよい。
The ITO particles of the present invention are produced by the following method. First, as a first step, a mixed aqueous solution of indium salt and tin salt is prepared. As a second step, urea aqueous solution is added to and mixed with this mixed aqueous solution, and the mixed aqueous solution obtained by mixing this urea aqueous solution is kept at a temperature of 60 to 100 ° C. to coprecipitate indium tin hydroxide particles by uniform precipitation. . As a third step, the liquid in which the indium tin hydroxide particles are coprecipitated is separated into solid and liquid. As a fourth step, the solid-liquid separated indium tin hydroxide particles are dried. As a fifth step, the dried indium tin hydroxide particles are heat treated to decompose into indium tin oxide precursor particles. Finally, in a sixth step, indium tin oxide (ITO) particles are obtained by reducing indium tin oxide precursor particles by heat treatment in the atmosphere or in an atmosphere of an inert gas.
In the present invention, a mixed aqueous solution of indium salt and tin salt is prepared, and the mixed aqueous solution is added and mixed with an aqueous urea solution to prepare a mixed aqueous solution, but the indium salt and tin salt are not limited. And urea may be mixed to prepare a mixed aqueous solution. That is, this method
In this method, a predetermined amount of indium salt, tin salt, urea powder or granules is directly charged into a predetermined amount of water and stirred and dissolved to prepare a mixed aqueous solution. The indium salt, tin salt, powder or granules of urea may be mixed and then dissolved, and the water to be dissolved may be preheated to a temperature for keeping warm.
第1の工程における錫塩としては、SnC2O4、SnCl2、SnCl4、Sn(NO3) 2、SnBr2及びSnSO4など水溶性の錫の無水塩または水和物塩から選ばれる少なくとも1種の錫化合物が挙げられる。またインジウム錫としてはIn2(C2O4) 3、InCl3、In(NO3) 3、In2(CH3COO) 3及びIn2(SO4)3など水溶性のインジウムの無水塩または水和物塩から選ばれる少なくとも1種のインジウム化合物が挙げられる。錫塩とインジウム塩との混合水溶液は、上記錫塩と上記インジウム塩とを所定の割合で秤量混合した後、純水又はイオン交換水に錫塩とインジウム錫とを各別に溶解して錫塩水溶液及びインジウム水溶液を調製し、これらの水溶液を混合して調製される。別法として、純水又はイオン交換水に所定の割合で秤量混合した錫塩とインジウム錫と一緒に溶解して錫塩とインジウム塩との混合水溶液を調製することもできる。また第1の工程において、別途作製したITO前駆体の種結晶を加えることができる。 The tin salt in the first step is at least selected from water-soluble anhydrous or hydrate salts of tin such as SnC 2 O 4 , SnCl 2 , SnCl 4 , Sn (NO 3 ) 2 , SnBr 2 and SnSO 4. One type of tin compound is mentioned. Moreover, as indium tin, water-soluble indium anhydrous salts or indium salts such as In 2 (C 2 O 4 ) 3 , InCl 3 , In (NO 3 ) 3 , In 2 (CH 3 COO) 3 and In 2 (SO 4 ) 3 At least one indium compound selected from hydrate salts can be mentioned. The mixed aqueous solution of tin salt and indium salt is obtained by weighing and mixing the above-mentioned tin salt and the above-mentioned indium salt in a predetermined ratio, and then separately dissolving tin salt and indium tin in pure water or ion exchanged water to obtain tin salt. An aqueous solution and an indium aqueous solution are prepared, and these aqueous solutions are mixed and prepared. Alternatively, it is possible to prepare a mixed aqueous solution of tin salt and indium salt by dissolving together with tin salt and indium tin weighed and mixed in pure water or ion exchange water at a predetermined ratio. In the first step, seed crystals of an ITO precursor prepared separately can be added.
第2の工程のおける尿素水溶液は、塩基性沈殿剤として使用される。この尿素水溶液の添加量は、インジウム塩及び錫塩に対する尿素の反応当量が2〜500倍になるように設定することが好ましく、反応が完了するまでに要する時間を考慮すると、3〜200倍がより好ましい。2倍未満では、インジウム錫水酸化物粒子の共沈量が少なく、また500倍を超えると、尿素の溶解度に合わせて溶液の濃度が決定されるため、インジウムイオン、スズイオンの濃度が低く、得られるITO粒子の収量が少なくなってしまうことや、pHの制御が困難になる。 The aqueous urea solution in the second step is used as a basic precipitant. The addition amount of this urea aqueous solution is preferably set so that the reaction equivalent of urea to indium salt and tin salt is 2 to 500 times, and considering the time required to complete the reaction, 3 to 200 times More preferable. When the amount is less than 2 times, the coprecipitation amount of indium tin hydroxide particles is small, and when it is more than 500 times, the concentration of the solution is determined according to the solubility of urea. And the control of pH becomes difficult.
本発明の特徴ある点は、尿素水溶液を混合した混合水溶液を60〜100℃の温度、好ましくは70〜100℃の温度で、保温して均一沈殿法を採用することにある。ここで、均一沈殿法とは、均一な水溶液から均質な沈殿物を得る方法をいう。反応系内の温度管理を精密に行うことにより、この共沈生成を溶液内のいずれの場所でも均一に起こすことが可能となる。従来、上記共沈物を得る方法として、例えば、アンモニア水のような塩基性沈殿剤と、錫塩とインジウム塩との混合水溶液とを水浴中に同時に滴下する方法(以下、滴下法という。)が採られてきたが、この方法を採用した場合には、滴下した場所から共沈が起こり、そのため形状の揃ったインジウム錫水酸化物粒子を共沈させることができなかった。 A characteristic feature of the present invention is that the mixed aqueous solution mixed with an aqueous urea solution is kept warm at a temperature of 60 to 100 ° C., preferably 70 to 100 ° C., and a uniform precipitation method is adopted. Here, the homogeneous precipitation method refers to a method of obtaining a homogeneous precipitate from a homogeneous aqueous solution. By precisely controlling the temperature in the reaction system, it is possible to cause this coprecipitation to occur uniformly anywhere in the solution. Conventionally, as a method for obtaining the above coprecipitate, for example, a method in which a basic precipitant such as aqueous ammonia and a mixed aqueous solution of tin salt and indium salt are simultaneously dropped into a water bath (hereinafter referred to as a dropping method). However, when this method is adopted, coprecipitation occurs from the place where the solution is dropped, and therefore, it is not possible to coprecipitate indium tin hydroxide particles having a uniform shape.
しかしながら、本発明の均一沈殿法によれば、次に述べるメカニズムにより、形状の揃ったインジウム錫水酸化物粒子を共沈させることができる。即ち、上記範囲の温度で尿素水溶液を混合した混合水溶液を保温することにより、尿素((NH2) 2CO)の分解反応が進み、アンモニア(NH3)が水溶液中で均一に生成される。生成されたアンモニアにより水溶液のpHが均一に上昇し、インジウムと錫の溶解度が下がることで、水溶液中のインジウムと錫が均一に共沈し、錫含有水酸化インジウムの懸濁液(コロイド液)が生成される。この保温は、例えばウォーターバス中で、容器に入れた上記混合水溶液を撹拌しながら加熱することにより行われる。保温する温度が60℃未満では尿素がアンモニアに十分に分解せず、また目的の一つである常圧下で水溶媒を使用する場合、100℃は超えないことから、上記の温度範囲が設定される。 However, according to the homogeneous precipitation method of the present invention, it is possible to coprecipitate indium tin hydroxide particles having a uniform shape by the mechanism described below. That is, by maintaining the mixed aqueous solution in which the aqueous urea solution is mixed at a temperature in the above range, the decomposition reaction of urea ((NH 2 ) 2 CO) proceeds and ammonia (NH 3 ) is uniformly generated in the aqueous solution. The generated ammonia uniformly raises the pH of the aqueous solution and decreases the solubility of indium and tin, whereby the indium and tin in the aqueous solution are uniformly coprecipitated, and a suspension of tin-containing indium hydroxide (colloidal liquid) Is generated. This heat retention is performed, for example, in a water bath by heating the above-mentioned mixed aqueous solution contained in a container while stirring. The above temperature range is set because urea does not decompose sufficiently into ammonia if the temperature to be kept is less than 60 ° C, and the temperature does not exceed 100 ° C when an aqueous solvent is used under normal pressure which is one of the purposes. Ru.
混合水溶液を保温する時間は、1時間以上、好ましくは5〜24時間である。上記温度範囲で1時間以上保温すれば、尿素が分解しアンモニアが発生する。温度が高いほど、保温時間は短くて済むが、形状の揃ったインジウム錫水酸化物粒子にするためには、上記温度範囲内の低めの温度で長時間保温することが好ましい。尿素水溶液の添加量、保温温度及び保温時間を制御することによって、生成する水酸化物粒子の大きさや粒子の長軸に対する短軸の比率を制御することができる。 The incubation time of the mixed aqueous solution is 1 hour or more, preferably 5 to 24 hours. If the temperature is kept in the above temperature range for 1 hour or more, urea is decomposed to generate ammonia. The higher the temperature, the shorter the heat retention time, but in order to make the indium tin hydroxide particles uniform in shape, it is preferable to keep the temperature for a long time at a lower temperature within the above temperature range. By controlling the addition amount of urea aqueous solution, the incubation temperature and the incubation time, it is possible to control the size of the produced hydroxide particles and the ratio of the minor axis to the major axis of the particles.
第3の工程におけるインジウム錫水酸化物粒子が共沈した液を固液分離する方法としては、遠心分離器にこの液を入れて遠心力により固液分離する遠心洗浄法が生産性が高く好ましい。別法として、インジウム錫水酸化物粒子が共沈した液を容器に入れて放置することにより固形物を沈殿させた後、容器を静かに傾けて上澄み液だけを流し去るデカンテーションを複数回繰り返してもよい。この場合、流し去る上澄み液と同程度の量の純水を加えて攪拌してデカンテーションを行う。上記固液分離により塩化物塩等の不純物が除去され、最終的に得られるITO粒子の抵抗率を低くすることができる。なお、塩化物塩は、大部分が後述する第5の工程の熱処理時に分解・揮発するため、遠心洗浄による除去を行わなくてもよいが、その熱処理に使用する電気炉をその塩で損傷させないように、塩化物塩は十分に除去しておくことが好ましい。 As a method for solid-liquid separation of a liquid in which indium tin hydroxide particles are coprecipitated in the third step, a centrifugal washing method of putting this liquid in a centrifugal separator and performing solid-liquid separation by centrifugal force is preferable because of high productivity . Alternatively, solid solution is precipitated by placing the solution in which indium tin hydroxide particles are coprecipitated in a container, and then the container is gently inclined to allow only the supernatant liquid to flow several times. May be In this case, decantation is performed by adding and stirring pure water in an amount equivalent to that of the supernatant liquid to be drained off. Impurities such as chloride salts are removed by the solid-liquid separation, and the resistivity of the finally obtained ITO particles can be lowered. Since most of the chloride salt is decomposed and volatilized during the heat treatment of the fifth step described later, removal by centrifugal washing may not be necessary, but the electric furnace used for the heat treatment is not damaged by the salt. As such, it is preferable to sufficiently remove the chloride salt.
第4の工程では、固液分離して得られたインジウム錫水酸化物粒子を大気中、好ましくは窒素やアルゴンなどの不活性ガス雰囲気下、80〜200℃の範囲で2〜24時間乾燥する。これにより、インジウム錫水酸化物の乾燥粒子が得られる。 In the fourth step, the indium tin hydroxide particles obtained by solid-liquid separation are dried in the atmosphere, preferably in an inert gas atmosphere such as nitrogen or argon, for 2 to 24 hours in the range of 80 to 200 ° C. . This gives dry particles of indium tin hydroxide.
第5の工程では、乾燥したインジウム錫水酸化物粒子を大気中、300〜900℃の範囲で0.5〜5時間熱処理(焼成)してインジウム錫酸化物前駆体粒子に分解する。即ち水酸化物を酸化物に変換する。300℃以上で完全な酸化物を得ることができ、900℃以下の温度でITO粒子間同士の焼結を回避できる。好ましい熱処理(焼成)温度は350〜800℃である。0.5時間未満では脱水反応が十分でないおそれがある。5時間の上限値は、脱水反応を終了させ、粒子の焼結を抑制する観点から決められる。 In the fifth step, the dried indium tin hydroxide particles are heat-treated (fired) in the atmosphere at a range of 300 to 900 ° C. for 0.5 to 5 hours to be decomposed into indium tin oxide precursor particles. That is, the hydroxide is converted to an oxide. A complete oxide can be obtained at 300 ° C. or higher, and sintering between ITO particles can be avoided at a temperature of 900 ° C. or lower. The preferable heat treatment (baking) temperature is 350 to 800 ° C. If it is less than 0.5 hours, dehydration reaction may not be sufficient. The upper limit of 5 hours is determined from the viewpoint of terminating the dehydration reaction and suppressing sintering of particles.
最後の第6の工程では、熱分解により得られたインジウム錫酸化物前駆体粒子を大気中又は不活性ガスの雰囲気中で熱処理して還元する。窒素やアルゴンなどの不活性ガスと水素や一酸化炭素、アンモニアガス、アルコールを混合した混合ガスなどの還元性ガスとを混合した弱還元雰囲気下が好ましい。還元は、200〜600℃で、0.5〜5時間で行うことが好ましい。この還元処理により、インジウム錫酸化物(ITO)粒子が得られる。この還元処理によりITOの格子間酸素が脱離したり、ITOに酸素欠損が与えられ、ITO粒子が低抵抗化する。混合ガスにおける各ガスの混合比率はITOの結晶に付与しようとする酸素欠損量により適宜決定される。但し混合ガスの還元力が強すぎると、ITO前駆体から絶縁性のInO、金属In、金属Snが析出するため好ましくない。また、水素や一酸化炭素等の混合比率は、混合ガスが大気中で爆発限界を越えない程度の濃度にする。 In the final sixth step, the indium tin oxide precursor particles obtained by thermal decomposition are reduced by heat treatment in the atmosphere or in an inert gas atmosphere. It is preferable to be under a weak reducing atmosphere in which an inert gas such as nitrogen or argon and a reducing gas such as mixed gas of hydrogen, carbon monoxide, ammonia gas, and alcohol mixed with each other are mixed. The reduction is preferably performed at 200 to 600 ° C. for 0.5 to 5 hours. By this reduction treatment, indium tin oxide (ITO) particles are obtained. By this reduction treatment, the interstitial oxygen of ITO is eliminated, the oxygen deficiency is given to the ITO, and the resistance of the ITO particles is lowered. The mixing ratio of each gas in the mixed gas is appropriately determined by the amount of oxygen deficiency to be imparted to the ITO crystal. However, when the reducing power of the mixed gas is too strong, insulating InO, metal In and metal Sn are precipitated from the ITO precursor, which is not preferable. In addition, the mixing ratio of hydrogen and carbon monoxide is such that the mixed gas does not exceed the explosion limit in the atmosphere.
以上の工程を経て、本発明のITO粒子を得ることができる。このITO粒子は、粒子の長軸に対する短軸の比(長軸/短軸比)の平均が1.3以下の立方体又は直方体の形状を有する。全体観察したときに、本発明では、均一沈殿法を採用しているため、各粒子の形状及び寸法は揃っている。このITO粒子の抵抗率は、このITO粒子を容器に充填して加圧することにより得られる圧粉体の状態で測定する。圧粉体にするときの圧力を0.196〜29.42MPa(2〜300kgf/cm2)の範囲で変化させて、その圧粉体の体積抵抗率を測定すると、2.2×10-2〜1.5Ωcmになる。本発明のITO粒子は形状及び寸法の揃った立方体又は直方体であるため、圧粉体にしたときに、粒子を空隙の少ない状態で緻密に配置することができ、粒子界面の抵抗が下がり、従来の滴下法で得られるITO粒子からなる圧粉体と比べて、低い体積抵抗率が得られる。粒子の長軸に対する短軸の比の平均が1.3を超えると、圧粉体にしたときに、粒子を空隙の少ない状態で緻密に配置することができず、低い体積抵抗率が得にくくなる。
Through the above steps, the ITO particles of the present invention can be obtained. The ITO particles have a cube or rectangular parallelepiped shape having an average of the ratio of the minor axis to the major axis of the particle (major axis / minor axis ratio) of 1.3 or less. As observed from the whole, in the present invention, since the uniform precipitation method is adopted, the shape and size of each particle are uniform. The resistivity of this ITO particle is measured in the state of a green compact obtained by filling the container with this ITO particle and pressing it. The volume resistivity of the green compact is measured by changing the pressure for forming the green compact in the range of 0.196 to 29.42 MPa ( 2 to 300 kgf / cm 2 ) and measuring the volume resistivity of the green compact: 2.2 × 10 −2 It will be ~ 1.5 Ω cm. Since the ITO particles of the present invention are cubes or rectangular parallelepipeds of uniform shape and size , when made into a green compact, the particles can be densely arranged with few voids, and the resistance at the particle interface is lowered. Lower volume resistivity is obtained as compared with a green compact comprising ITO particles obtained by the dropping method of When the average of the ratio of the minor axis to the major axis of the particles exceeds 1.3, when forming a green compact, the particles can not be densely arranged with few voids, and it is difficult to obtain a low volume resistivity. Become.
次に本発明の実施例を比較例とともに詳しく説明する。 Next, an example of the present invention will be described in detail along with a comparative example.
<実施例>
先ず、InCl3粉末をイオン交換水に溶解して0.2Mに調整したInCl3水溶液を得た。またSnCl4粉末をイオン交換水に溶解して0.2Mに調整したSnCl4水溶液を得た。InCl3水溶液450mlにSnCl4水溶液50mlを加え、室温下において攪拌し均一に混合して混合水溶液を得た。次に、この混合水溶液に1.55Mに調整した尿素水溶液1000mlを添加した。ウォーターバス中に容器に入れた尿素水溶液を混合した混合水溶液を配置し、この混合水溶液を攪拌しながら、ウォーターバス中で80℃の温度で8時間保温した。これにより、尿素水溶液の分解反応が起こり、この反応で生成されたアンモニア(NH3)により錫含有水酸化インジウムの懸濁液(コロイド液)が生成された。この例では、尿素の添加量は金属塩に対して、反応当量の5倍とした。これにより液の反応終了時の最終pHは5.5に調整された。生成された上記コロイド溶液を遠心洗浄して固液分離し、固液分離したインジウム錫水酸化物粒子を大気中、110℃で15時間乾燥させた。乾燥したインジウム錫水酸化物粒子を大気中、500℃で2時間熱処理(焼成)してインジウム錫酸化物前駆体粒子に分解した。この熱処理後、H2を3vol%、N2を97vol含有する弱還元雰囲気下で、インジウム錫酸化物前駆体粒子を300℃の温度で2時間還元処理し、ITO粒子を得た。このITO粒子をSEM(走査型電子顕微鏡)によって撮像した写真図を図1に示す。
<Example>
First, InCl 3 powder was dissolved in ion exchange water to obtain an InCl 3 aqueous solution adjusted to 0.2M. Also to give a SnCl 4 solution was adjusted SnCl 4 powder 0.2M was dissolved in deionized water. 50 ml of an aqueous solution of SnCl 4 was added to 450 ml of an aqueous solution of InCl 3, and the mixture was uniformly mixed by stirring at room temperature to obtain a mixed aqueous solution. Next, 1000 ml of an aqueous urea solution adjusted to 1.55 M was added to the mixed aqueous solution. The mixed aqueous solution which mixed the urea aqueous solution put into the container in the water bath was arrange | positioned, and it heat-retained at the temperature of 80 degreeC in the water bath for 8 hours, stirring this mixed aqueous solution. This caused a decomposition reaction of the aqueous urea solution, and the ammonia (NH 3 ) generated in this reaction generated a suspension (colloidal liquid) of tin-containing indium hydroxide. In this example, the amount of urea added was 5 times the reaction equivalent of the metal salt. The final pH of the solution at the end of the reaction was adjusted to 5.5. The formed colloidal solution was subjected to centrifugal washing to perform solid-liquid separation, and the solid-liquid separated indium tin hydroxide particles were dried at 110 ° C. for 15 hours in the air. The dried indium tin hydroxide particles were heat-treated (fired) at 500 ° C. for 2 hours in the air to be decomposed into indium tin oxide precursor particles. After the heat treatment, the indium tin oxide precursor particles were reduced at a temperature of 300 ° C. for 2 hours in a weak reducing atmosphere containing 3 vol% of H 2 and 97 vol of N 2 to obtain ITO particles. The photograph which image | photographed this ITO particle by SEM (scanning electron microscope) is shown in FIG.
<比較例>
実施例と同様にして、InCl3水溶液とSnCl4水溶液との混合水溶液を得た。この混合水溶液とアンモニア(NH3)水とを同時に、液温30℃のイオン交換水の水浴中に滴下した。滴下中、水浴は液温30℃、pH7になるように調整した。この滴下は60分で終了した。上記混合水溶液とアンモニア水の同時滴下により、水浴中にインジウム錫水酸化物粒子が共沈した。このインジウム錫水酸化物粒子が共沈した液を、実施例と同様に遠心洗浄、乾燥、熱処理、還元処理を行って、滴下法により、ITO粒子を得た。
Comparative Example
In the same manner as in Example, a mixed aqueous solution of InCl 3 aqueous solution and SnCl 4 aqueous solution was obtained. The mixed aqueous solution and ammonia (NH 3 ) water were simultaneously dropped into a water bath of ion exchange water at a liquid temperature of 30 ° C. During the addition, the water bath was adjusted to pH 7 at a liquid temperature of 30 ° C. The addition ended in 60 minutes. Indium tin hydroxide particles were coprecipitated in a water bath by simultaneous dropping of the mixed aqueous solution and aqueous ammonia. The solution in which the indium tin hydroxide particles were coprecipitated was subjected to centrifugal washing, drying, heat treatment and reduction treatment in the same manner as in Example to obtain ITO particles by a dropping method.
<ITO粒子の評価>
(1) ITO粒子の形状
比較例のITO粒子の形状は、図2から明らかなように、球状、楕円球状、棒状など種々の形状が混在していた。これに対して、実施例のITO粒子の形状は、図1から明らかなように、ほぼ立方体であり、長軸に対する短軸の比は平均1.2であった。実施例のITO粒子は、全体観察すると、その形状及び寸法は揃っていた。
<Evaluation of ITO particles>
(1) Shape of ITO Particles The shape of the ITO particles of the comparative example was, as is apparent from FIG. 2, a mixture of various shapes such as spherical, elliptical and rod shapes. On the other hand, the shape of the ITO particles of the example was almost cubic as apparent from FIG. 1, and the ratio of the minor axis to the major axis was 1.2 on average. The ITO particles of the example had the same shape and size as viewed from the whole.
(2) ITO粒子からなる圧粉体の体積抵抗率
実施例及び比較例で得られた各ITO粒子を圧粉体にした。この圧粉体にするときの印加圧力を変化させて、印加圧力毎に圧粉体の体積抵抗率を測定装置(三菱化学アナリティック製 MCP-PD51)を用いて測定した。具体的には、内径φが25mmのシリンダーにITO粒子2.00gを充填し、0.196〜29.42MPa(2〜300kgf/cm2)の範囲で圧力を変えて、実施例及び比較例で得られたITO粒子からなる各圧粉体を試料として10点作製した。そして各試料の表面抵抗率と試料厚を同時にそれぞれ測定した。印加圧力は上記測定装置に設けた圧力センサにより、表面抵抗率は直流4端子法で測定した。ITO粒子の試料厚とシリンダーの内径φから求めた体積を試料の充填質量で除算して実密度を求め、この実密度を理論密度で除算して相対密度とした。図3にこの印加圧力(横軸)と体積抵抗率(縦軸)の関係を示し、図4にこの印加圧力(横軸)と相対密度(縦軸)関係を示す。
(2) Volume Resistivity of Green Powder Made of ITO Particles The ITO particles obtained in Examples and Comparative Examples were made into green powder. The volume resistivity of the powder compact was measured using a measuring apparatus (MCP-PD51 manufactured by Mitsubishi Chemical Analytic Co., Ltd.) by changing the pressure applied to make the powder compact and changing the pressure applied for each pressure applied. Specifically, a cylinder having an inner diameter φ of 25 mm is filled with 2.00 g of ITO particles, and the pressure is changed in the range of 0.196 to 29.42 MPa ( 2 to 300 kgf / cm 2 ) to obtain Examples and Comparative Examples. Each green compact consisting of the obtained ITO particles was prepared at 10 points as a sample. And the surface resistivity and sample thickness of each sample were simultaneously measured, respectively. The applied pressure was measured by a pressure sensor provided in the above-mentioned measuring apparatus, and the surface resistivity was measured by a direct current four-terminal method. The volume obtained from the sample thickness of the ITO particles and the inner diameter φ of the cylinder is divided by the packing mass of the sample to obtain the actual density, and this actual density is divided by the theoretical density to obtain a relative density. FIG. 3 shows the relationship between the applied pressure (horizontal axis) and the volume resistivity (vertical axis), and FIG. 4 shows the relationship between the applied pressure (horizontal axis) and the relative density (vertical axis).
図3から明らかなように、印加圧力が0.196〜29.42MPa(2〜300kgf/cm2)の範囲において、比較例のITO粒子からなる圧粉体の体積抵抗率は4.5×10−2〜3.0Ωcmであったのに対して、実施例のITO粒子からなる圧粉体の体積抵抗率は2.2×10−2〜1.5Ωcmであった。特に0.98MPa(10kgf/cm2)の圧力を加えたときには、比較例のITO粒子からなる圧粉体の体積抵抗率は2.0Ωcmを越えていた。これに対して実施例のITO粒子からなる圧粉体の体積抵抗率は2.0Ωcm以下であった。以上のことから、実施例のITO粒子を含有する塗料で基板に塗膜を形成した場合、この塗膜の抵抗率は、比較例の滴下法で得られるITO粒子を含有する塗料で形成した塗膜の抵抗率と比べて、低くなることが予想され、高い導電性の塗膜が得られることが見込まれる。更に有機溶媒の代わりに尿素水溶液を用いた実施例では、ITO粒子を製造するときに作業環境が低下せず、火気取扱いに注意を払う必要がなかった。 As apparent from FIG. 3, the volume resistivity of the green compact made of ITO particles of the comparative example is 4.5 × 10 3 in the applied pressure range of 0.196 to 29.42 MPa ( 2 to 300 kgf / cm 2 ). against -2 of a which was ~3.0Omucm, the volume resistivity of the green compact made of ITO particles of example was 2.2 × 10 -2 ~1.5Ωcm. In particular, when a pressure of 0.98 MPa (10 kgf / cm 2 ) was applied, the volume resistivity of the green compact comprising ITO particles of the comparative example exceeded 2.0 Ωcm. On the other hand, the volume resistivity of the green compact made of ITO particles of the example was 2.0 Ωcm or less. From the above, when the coating film is formed on the substrate with the coating material containing the ITO particles of the example, the resistivity of this coating film is the coating material formed with the coating material containing the ITO particles obtained by the dropping method of the comparative example. It is expected to be lower than the resistivity of the film, and it is expected that a highly conductive coating will be obtained. Furthermore, in the example using urea aqueous solution instead of the organic solvent, the working environment did not fall when producing ITO particles, and it was not necessary to pay attention to fire handling.
Claims (2)
前記還元が、前記熱分解により得られたインジウム錫酸化物前駆体粒子を、窒素又はアルゴンの不活性ガスと、水素又は一酸化炭素の還元性ガスとを混合した混合ガス雰囲気下、200〜600℃の温度で0.5〜5時間熱処理することにより行われ、前記還元性ガスの前記混合ガス中の濃度は、前記混合ガスが大気中で爆発限界を超えない濃度であり、
前記インジウム錫酸化物粒子の各粒子は、その長軸に対する短軸の比の平均が1.3以下の形状及び寸法の揃った立方体又は直方体であり、
前記インジウム錫酸化物粒子は、圧力を0.196〜29.42MPaの範囲で変化させたときの圧粉体の体積抵抗率が2.2×10 -2 〜1.5Ωcmであることを特徴とするITO粒子の製造方法。 A mixed aqueous solution in which indium salt, tin salt and urea are mixed is kept warm at a temperature of 60 to 100 ° C. to co-precipitate indium tin hydroxide particles, and solid-liquid separation of the liquid in which the indium tin hydroxide particles are co-precipitated and, wherein after the separated indium tin hydroxide particles was dried, heat-treated and thermally decomposed in an indium tin oxide precursor particles, indium tin by reducing the indium tin oxide precursor particles to heat treatment a manufacturing method of the ITO particles to obtain the oxide particles,
200 to 600 in the mixed gas atmosphere in which the indium tin oxide precursor particles obtained by the thermal decomposition are mixed with an inert gas of nitrogen or argon and a reducing gas of hydrogen or carbon monoxide in the reduction. The heat treatment is performed by heat treatment at a temperature of 0.5 ° C. for 0.5 to 5 hours, and the concentration of the reducing gas in the mixed gas is a concentration at which the mixed gas does not exceed the explosion limit in the atmosphere,
Each particle of the indium tin oxide particles is a cube or a rectangular solid of uniform shape and size of 1.3 or less in average of the ratio of the minor axis to the major axis,
The indium tin oxide particles have a volume resistivity of 2.2 × 10 −2 to 1.5 Ωcm when the pressure is changed in a range of 0.196 to 29.42 MPa. Of producing ITO particles.
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