JP6430235B2 - (Meth) acrylate compound having anthracene skeleton and cured product thereof - Google Patents
(Meth) acrylate compound having anthracene skeleton and cured product thereof Download PDFInfo
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- JP6430235B2 JP6430235B2 JP2014257415A JP2014257415A JP6430235B2 JP 6430235 B2 JP6430235 B2 JP 6430235B2 JP 2014257415 A JP2014257415 A JP 2014257415A JP 2014257415 A JP2014257415 A JP 2014257415A JP 6430235 B2 JP6430235 B2 JP 6430235B2
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- meth
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- acrylate
- compound
- acid
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- -1 acrylate compound Chemical class 0.000 title description 38
- 125000005577 anthracene group Chemical group 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims description 57
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 125000002947 alkylene group Chemical group 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 56
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 24
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 19
- 239000002904 solvent Substances 0.000 description 16
- 125000004432 carbon atom Chemical group C* 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 11
- 150000002430 hydrocarbons Chemical group 0.000 description 11
- 239000004925 Acrylic resin Substances 0.000 description 9
- 229920000178 Acrylic resin Polymers 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 9
- 239000002585 base Substances 0.000 description 9
- 239000003505 polymerization initiator Substances 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 7
- 239000003112 inhibitor Substances 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000003085 diluting agent Substances 0.000 description 6
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 150000007530 organic bases Chemical class 0.000 description 6
- 239000003504 photosensitizing agent Substances 0.000 description 6
- 239000011342 resin composition Substances 0.000 description 6
- 238000012719 thermal polymerization Methods 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 5
- SXGIRTCIFPJUEQ-UHFFFAOYSA-N 9-anthracen-9-ylanthracene Chemical group C1=CC=CC2=CC3=CC=CC=C3C(C=3C4=CC=CC=C4C=C4C=CC=CC4=3)=C21 SXGIRTCIFPJUEQ-UHFFFAOYSA-N 0.000 description 5
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 239000003377 acid catalyst Substances 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 150000007529 inorganic bases Chemical class 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 125000003342 alkenyl group Chemical group 0.000 description 4
- 125000000304 alkynyl group Chemical group 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- SZIFAVKTNFCBPC-UHFFFAOYSA-N 2-chloroethanol Chemical compound OCCCl SZIFAVKTNFCBPC-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 150000008282 halocarbons Chemical class 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004128 high performance liquid chromatography Methods 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 150000002978 peroxides Chemical class 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 3
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 3
- 125000005270 trialkylamine group Chemical group 0.000 description 3
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000011973 solid acid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- 125000000081 (C5-C8) cycloalkenyl group Chemical group 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- XKSUVRWJZCEYQQ-UHFFFAOYSA-N 1,1-dimethoxyethylbenzene Chemical compound COC(C)(OC)C1=CC=CC=C1 XKSUVRWJZCEYQQ-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- 150000005206 1,2-dihydroxybenzenes Chemical class 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- BPXVHIRIPLPOPT-UHFFFAOYSA-N 1,3,5-tris(2-hydroxyethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound OCCN1C(=O)N(CCO)C(=O)N(CCO)C1=O BPXVHIRIPLPOPT-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- ZQXZUOJNJXNUEO-UHFFFAOYSA-N 10-(10-oxo-9h-anthracen-9-yl)-10h-anthracen-9-one Chemical compound C12=CC=CC=C2C(=O)C2=CC=CC=C2C1C1C2=CC=CC=C2C(=O)C2=CC=CC=C21 ZQXZUOJNJXNUEO-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- SHJIJMBTDZCOFE-UHFFFAOYSA-N 2-[2-[2-(2-hydroxyethoxy)ethoxy]ethoxy]-1-methoxyethanol Chemical compound COC(O)COCCOCCOCCO SHJIJMBTDZCOFE-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical class NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- XJZHFAPNVZDMES-UHFFFAOYSA-N 2-methyl-5-[4-[10-(4-methyl-3-oxopent-4-enoxy)anthracen-1-yl]anthracen-9-yl]oxypent-1-en-3-one Chemical group C(C(=C)C)(=O)CCOC1=C2C=CC=C(C2=CC2=CC=CC=C12)C1=CC=CC2=C(C3=CC=CC=C3C=C12)OCCC(C(=C)C)=O XJZHFAPNVZDMES-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
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- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
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- 239000004593 Epoxy Substances 0.000 description 1
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- 229910019142 PO4 Inorganic materials 0.000 description 1
- QVHMSMOUDQXMRS-UHFFFAOYSA-N PPG n4 Chemical compound CC(O)COC(C)COC(C)COC(C)CO QVHMSMOUDQXMRS-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
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- BEUGBYXJXMVRFO-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-phenylmethanone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=CC=C1 BEUGBYXJXMVRFO-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
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- 229910000102 alkali metal hydride Inorganic materials 0.000 description 1
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- 150000003973 alkyl amines Chemical class 0.000 description 1
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- VSGNNIFQASZAOI-UHFFFAOYSA-L calcium acetate Chemical compound [Ca+2].CC([O-])=O.CC([O-])=O VSGNNIFQASZAOI-UHFFFAOYSA-L 0.000 description 1
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- 229960005147 calcium acetate Drugs 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
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- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
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- 239000003729 cation exchange resin Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
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- 238000007796 conventional method Methods 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 239000012933 diacyl peroxide Substances 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
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- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- HHEAADYXPMHMCT-UHFFFAOYSA-N dpph Chemical class [O-][N+](=O)C1=CC([N+](=O)[O-])=CC([N+]([O-])=O)=C1[N]N(C=1C=CC=CC=1)C1=CC=CC=C1 HHEAADYXPMHMCT-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
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- 150000002148 esters Chemical class 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- ORBFAMHUKZLWSD-UHFFFAOYSA-N ethyl 2-(dimethylamino)benzoate Chemical compound CCOC(=O)C1=CC=CC=C1N(C)C ORBFAMHUKZLWSD-UHFFFAOYSA-N 0.000 description 1
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- 125000000623 heterocyclic group Chemical group 0.000 description 1
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- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910001960 metal nitrate Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
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- 150000004682 monohydrates Chemical class 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 150000004978 peroxycarbonates Chemical class 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003017 phosphorus Chemical class 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical compound C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 description 1
- UFUASNAHBMBJIX-UHFFFAOYSA-N propan-1-one Chemical compound CC[C]=O UFUASNAHBMBJIX-UHFFFAOYSA-N 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
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- 150000003335 secondary amines Chemical class 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- SWAXTRYEYUTSAP-UHFFFAOYSA-N tert-butyl ethaneperoxoate Chemical compound CC(=O)OOC(C)(C)C SWAXTRYEYUTSAP-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000003017 thermal stabilizer Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
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- 150000007964 xanthones Chemical class 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
本発明は、高屈折率を有する、高分子材料向けの9,9’−ビアントリル骨格を有する二官能性(メタ)アクリレート化合物に関する。 The present invention relates to a bifunctional (meth) acrylate compound having a 9,9'-bianthryl skeleton for a polymer material having a high refractive index.
光学用オーバーコート剤、ハードコート剤、反射防止膜、眼鏡レンズ、光ファイバー、光導波路、ホログラム等の光学材料用途として、ビスフェノール類(ビスフェノールA等)のジアクリレート又はビスフェノール類のエチレンオキシド付加体のジアクリレート等の多官能性アクリレートが使用されている(特許文献1等)。このような多官能性アクリレートには、耐湿性、耐熱性、高屈折率等の特性の向上が求められている。 Diacrylates of bisphenols (bisphenol A, etc.) or bisphenols ethylene oxide adducts for use as optical materials such as optical overcoat agents, hard coat agents, antireflection films, spectacle lenses, optical fibers, optical waveguides, holograms, etc. Etc. are used (Patent Document 1, etc.). Such polyfunctional acrylates are required to have improved properties such as moisture resistance, heat resistance, and high refractive index.
多官能性アクリレートの耐熱性を向上させる方法として、例えば、特許文献2では、フルオレン骨格を有するジ(メタ)アクリレートが報告されている。 As a method for improving the heat resistance of the polyfunctional acrylate, for example, Patent Document 2 reports di (meth) acrylate having a fluorene skeleton.
しかしながら、光学材料用途では多種の特性が要求されているため、高分子化合物に優れた物性を付与するための新規単量体の提供が依然として渇望されている。 However, since various properties are required for use in optical materials, it is still desired to provide a novel monomer for imparting excellent physical properties to a polymer compound.
本発明は、アクリレート硬化物に優れた物性(特に屈折率)を付与できる新規な(メタ)アクリレート化合物を提供することを目的とする。また、本発明は新規な(メタ)アクリレート化合物を用いて得られた高屈折率を有する硬化物を提供することを目的とする。 An object of this invention is to provide the novel (meth) acrylate compound which can provide the outstanding physical property (especially refractive index) to acrylate hardened | cured material. Another object of the present invention is to provide a cured product having a high refractive index obtained by using a novel (meth) acrylate compound.
本発明者等は、鋭意検討を重ねた結果、9,9’−ビアントリルの構造を有する(メタ)アクリレート化合物を単量体に用いることで、高い屈折率を有する硬化物が得られることを見出し、本発明を完成するに至った。 As a result of intensive studies, the present inventors have found that a cured product having a high refractive index can be obtained by using a (meth) acrylate compound having a 9,9′-bianthryl structure as a monomer. The present invention has been completed.
即ち、本発明は、下記項に記載の化合物及びその製造方法、当該化合物を含む硬化性組成物、並びにその硬化物に関する。 That is, this invention relates to the compound as described in the following item, its manufacturing method, the curable composition containing the said compound, and its hardened | cured material.
項1.下記一般式(1): Item 1. The following general formula (1):
で表される化合物。
A compound represented by
項2.下記一般式(2): Item 2. The following general formula (2):
で表される化合物と、(メタ)アクリル酸又はその誘導体とを反応させる工程を含む、前記項1に記載の化合物の製造方法。
The manufacturing method of the compound of said claim | item 1 including the process with which the compound represented by (meth) acrylic acid or its derivative (s) is made to react.
項3.前記項1に記載の化合物を含む、硬化性組成物。 Item 3. A curable composition comprising the compound according to item 1.
項4.前記項3に記載の硬化性組成物を硬化させた、硬化物。 Item 4. Hardened | cured material which hardened the curable composition of the said claim | item 3.
本発明の化合物は、硬化物の前駆体として用いることができる。また、本発明の化合物を用いて得られた硬化物は、屈折率が向上することが期待される。 The compound of the present invention can be used as a precursor of a cured product. Moreover, the refractive index of the cured product obtained using the compound of the present invention is expected.
以下、本発明について詳細に説明する。 Hereinafter, the present invention will be described in detail.
1.一般式(1)で表される(メタ)アクリレート
本発明は一般式(1):
1. The (meth) acrylate represented by the general formula (1) The present invention is represented by the general formula (1):
で表される、(メタ)アクリレートに関する。
It is related with (meth) acrylate represented by these.
前記R1a、R1b、R2a及びR2bは、同一又は異なって、炭化水素基、基:−OR5a、基:−SR5b、基:−(CO)−R5c、基:−(CO)−O−R5d、ハロゲン原子、ニトロ基、シアノ基、又は置換アミノ基を示す。 R 1a , R 1b , R 2a and R 2b are the same or different and each represents a hydrocarbon group, group: —OR 5a , group: —SR 5b , group: — (CO) —R 5c , group: — (CO ) —O—R 5d , a halogen atom, a nitro group, a cyano group, or a substituted amino group.
炭化水素基としては、アルキル基、シクロアルキル基、アリール基、アラルキル基、アルケニル基、シクロアルケニル基、アルキニル基等を挙げることができる。 Examples of the hydrocarbon group include an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, an alkenyl group, a cycloalkenyl group, and an alkynyl group.
アルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基等の炭素数1〜12のアルキル基、好ましくは炭素数1〜8のアルキル基を挙げることができる。 Examples of the alkyl group include an alkyl group having 1 to 12 carbon atoms such as a methyl group, an ethyl group, a propyl group, an isopropyl group, and a butyl group, preferably an alkyl group having 1 to 8 carbon atoms.
シクロアルキル基としては、シクロヘキシル基等の炭素数5〜8のシクロアルキル基を挙げることができる。 Examples of the cycloalkyl group include cycloalkyl groups having 5 to 8 carbon atoms such as a cyclohexyl group.
アリール基としては、フェニル基、トリル基、キシリル基、ナフチル基等の炭素数6〜10のアリール基を挙げることができる。 Examples of the aryl group include aryl groups having 6 to 10 carbon atoms such as a phenyl group, a tolyl group, a xylyl group, and a naphthyl group.
アラルキル基としては、ベンジル基、フェネチル基等の炭素数6〜10のアリール基を有する炭素数1〜4のアルキル基を挙げることができる。 Examples of the aralkyl group include an alkyl group having 1 to 4 carbon atoms having an aryl group having 6 to 10 carbon atoms such as a benzyl group and a phenethyl group.
アルケニル基としては、エテニル基、プロペニル基、1−ブテニル基等の炭素数1〜12のアルケニル基、好ましくは炭素数1〜8のアルケニル基を挙げることができる。 Examples of the alkenyl group include alkenyl groups having 1 to 12 carbon atoms such as ethenyl group, propenyl group and 1-butenyl group, preferably alkenyl groups having 1 to 8 carbon atoms.
シクロアルケニル基としては、シクロヘキセニル基等の炭素数5〜8のシクロアルケニル基を挙げることができる。 As a cycloalkenyl group, C5-C8 cycloalkenyl groups, such as a cyclohexenyl group, can be mentioned.
アルキニル基としては、エチニル基、プロピニル基、1−オクチニル基等の炭素数1〜12のアルキニル基、好ましくは炭素数1〜8のアルキニル基を挙げることができる。 Examples of the alkynyl group include alkynyl groups having 1 to 12 carbon atoms such as ethynyl group, propynyl group and 1-octynyl group, preferably alkynyl groups having 1 to 8 carbon atoms.
ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等を挙げることができる。これらの中でも、耐熱性の観点よりフッ素原子であることが好ましい。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferable from the viewpoint of heat resistance.
置換アミノ基としては、エチル基等のアルキル基等の基が1又は2個(好ましくは2個)置換したアミノ基を挙げることができる。 Examples of the substituted amino group include an amino group substituted with 1 or 2 (preferably 2) groups such as an alkyl group such as an ethyl group.
m1a、m1b、m2a及びm2bは同一又は異なって、0〜4の整数を示す。好ましくは0〜2の整数であり、より好ましくは0又は1である。 m1a, m1b, m2a and m2b are the same or different and represent an integer of 0 to 4. Preferably it is an integer of 0-2, More preferably, it is 0 or 1.
R5a、R5b、R5c及びR5dは、炭化水素基を示す。R5a、R5b、R5c及びR5dにおける炭化水素基としては、上記R1a、R1b、R2a及びR2bにおいて例示した炭化水素基を挙げることができる。 R 5a , R 5b , R 5c and R 5d represent a hydrocarbon group. Examples of the hydrocarbon group in R 5a , R 5b , R 5c and R 5d include the hydrocarbon groups exemplified in the above R 1a , R 1b , R 2a and R 2b .
R3a及びR3bは同一又は異なって、アルキレン基を示す。R3a及びR3bは、エチレン基、プロピレン基、トリメチレン基、1,2−ブタジイル基、テトラメチレン基等の炭素数2〜6のアルキレン基であることが好ましく、炭素数2〜4のアルキレン基であることがより好ましく、炭素数2〜3のアルキレン基であることがさらに好ましく、エチレン基であることが特に好ましい。 R 3a and R 3b are the same or different and each represents an alkylene group. R 3a and R 3b are preferably alkylene groups having 2 to 6 carbon atoms such as ethylene group, propylene group, trimethylene group, 1,2-butadiyl group, tetramethylene group, etc., and alkylene groups having 2 to 4 carbon atoms. It is more preferable that it is C2-C3 alkylene group, and it is especially preferable that it is ethylene group.
na及びnbは同一又は異なって1以上の整数を示す。好ましくは1〜14の整数であり、より好ましくは1〜10の整数である。 na and nb are the same or different and represent an integer of 1 or more. Preferably it is an integer of 1-14, More preferably, it is an integer of 1-10.
本発明の一般式(1)で表される化合物は、9,9’−ビアントラセン骨格を有しており、硬化物の作製に使用した場合に、得られる硬化物の屈折率等の物性を向上することが期待される。 The compound represented by the general formula (1) of the present invention has a 9,9′-bianthracene skeleton, and when used for the production of a cured product, the physical properties such as the refractive index of the obtained cured product. It is expected to improve.
また、9,9’−ビアントラセン骨格は、2つのアントラセン部位が互いに直交している特徴的な構造を有し、結晶中において密なパッキング構造を有することが予測される。そのため、本発明の一般式(1)の化合物を用いた高分子化合物において、高い耐熱性を示すことが期待される。 Further, the 9,9'-bianthracene skeleton has a characteristic structure in which two anthracene sites are orthogonal to each other, and is predicted to have a dense packing structure in the crystal. Therefore, the polymer compound using the compound of the general formula (1) of the present invention is expected to exhibit high heat resistance.
2.(メタ)アクリレートの製造方法
一般式(1)で表される(メタ)アクリレートは、例えば、下記式(2):
2. (Meth) acrylate Production Method The (meth) acrylate represented by the general formula (1) is, for example, the following formula (2):
で表される化合物と、(メタ)アクリル酸又はその誘導体とを反応させることにより製造できる。
It can manufacture by making the compound represented by (meth) acrylic acid or its derivative (s) react.
前記式(2)で表される化合物との反応に使用する(メタ)アクリル酸又はその誘導体において、(メタ)アクリル酸誘導体としては、例えば、(メタ)アクリル酸低級アルキルエステル(例えば、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル等のC1−4アルキル(メタ)アクリレート等)、(メタ)アクリル酸ハライド(例えば、(メタ)アクリル酸クロライド等)、(メタ)アクリル酸無水物等が挙げられる。 In the (meth) acrylic acid or derivative thereof used for the reaction with the compound represented by the formula (2), examples of the (meth) acrylic acid derivative include (meth) acrylic acid lower alkyl ester (for example, (meth) ) Methyl acrylate, ethyl (meth) acrylate, C1-4 alkyl (meth) acrylate such as butyl (meth) acrylate), (meth) acrylic acid halide (for example, (meth) acrylic acid chloride, etc.), ( And (meth) acrylic anhydride.
(メタ)アクリル酸又はその誘導体の割合は、下記式(2)で表される化合物1モルに対して、例えば、2〜20モル、好ましくは2.2〜10モル、さらに好ましくは2.5〜5モル程度であってもよい。 The ratio of (meth) acrylic acid or a derivative thereof is, for example, 2 to 20 mol, preferably 2.2 to 10 mol, more preferably 2.5 to 1 mol of the compound represented by the following formula (2). About 5 mol may be sufficient.
反応では、適宜、触媒(酸触媒、塩基触媒等)を使用してもよい。酸触媒としては、エステル化酸触媒であれば特に限定されず、例えば、無機酸(硫酸、塩酸、リン酸等)、有機酸[スルホン酸(メタンスルホン酸、エタンスルホン酸、トリフルオロメタンスルホン酸等のアルカンスルホン酸、p−トルエンスルホン酸等のアレーンスルホン酸等)等]等が例示でき、固体化酸[担体に酸(硫酸、リン酸、ヘテロポリ酸等の無機酸、有機酸)を担持させた固体化酸(固体リン酸等)]、陽イオン交換樹脂、金属酸化物(ZnO等)、金属ハロゲン化物(CuCl2等)、金属塩系触媒[金属硫酸塩(NiSO4等)、金属リン酸塩(Zr、Ti等の遷移金属のリン酸塩等)、金属硝酸塩(Zn(NO3)2・6H2O等)等]、天然鉱物(酸性白土、ベントナイト、カオリン、モンモリロナイト等)等の固体酸触媒も含まれる。酸触媒は、単独で又は2種以上組み合わせてもよい。 In the reaction, a catalyst (an acid catalyst, a base catalyst, etc.) may be appropriately used. The acid catalyst is not particularly limited as long as it is an esterification acid catalyst. For example, inorganic acid (sulfuric acid, hydrochloric acid, phosphoric acid, etc.), organic acid [sulfonic acid (methanesulfonic acid, ethanesulfonic acid, trifluoromethanesulfonic acid, etc.) And alkane sulfonic acid, arene sulfonic acid such as p-toluene sulfonic acid) etc.], etc., and solidified acid [supporting acid (inorganic acid such as sulfuric acid, phosphoric acid, heteropoly acid, organic acid) supported on the carrier] Solid acid (solid phosphoric acid etc.)], cation exchange resin, metal oxide (ZnO etc.), metal halide (CuCl 2 etc.), metal salt catalyst [metal sulfate (NiSO 4 etc.), metal phosphorus salt (Zr, phosphate of a transition metal such as Ti, etc.), metal nitrate (Zn (NO 3) 2 · 6H 2 O , etc.), etc.], natural minerals (acid clay, bentonite, kaolin, montmorillonite, etc.), etc. A solid acid catalyst is also included. The acid catalysts may be used alone or in combination of two or more.
塩基触媒としては、例えば、金属炭酸塩(炭酸ナトリウム等のアルカリ金属又はアルカリ土類金属炭酸塩、炭酸水素ナトリウム等のアルカリ金属又はアルカリ土類金属炭酸水素塩等)、カルボン酸金属塩(酢酸ナトリウム、酢酸カルシウム等の酢酸アルカリ金属又はアルカリ土類金属塩等)、金属水酸化物(水酸化ナトリウム等のアルカリ金属水酸化物、水酸化カルシウム等のアルカリ土類金属水酸化物等)等の無機塩基;アミン類[例えば、第3級アミン類(トリエチルアミン、トリイソプロピルアミン、トリブチルアミン等のトリアルキルアミン、N,N−ジメチルアニリン等の芳香族第3級アミン、ピリジン等の複素環式第3級アミン)等]等の有機塩基等が例示できる。塩基触媒は単独で又は2種以上組み合わせてもよい。 Examples of the base catalyst include metal carbonates (alkali metals such as sodium carbonate or alkaline earth metal carbonates, alkali metals such as sodium hydrogen carbonate or alkaline earth metal hydrogen carbonates), carboxylic acid metal salts (sodium acetate, etc. Inorganic such as alkali metal acetate or alkaline earth metal salt such as calcium acetate), metal hydroxide (alkali metal hydroxide such as sodium hydroxide, alkaline earth metal hydroxide such as calcium hydroxide) Bases; amines [for example, tertiary amines (trialkylamines such as triethylamine, triisopropylamine and tributylamine, aromatic tertiary amines such as N, N-dimethylaniline, and heterocyclic thirds such as pyridine) Organic bases such as secondary amine) and the like. The base catalysts may be used alone or in combination of two or more.
触媒(酸触媒、塩基触媒等)の使用量は、触媒の種類にもよるが、例えば、前記式(2)で表される化合物1モルに対して、例えば、0.01〜10モル、好ましくは0.05〜5モル、さらに好ましくは0.1〜3モル程度であってもよい。 The amount of catalyst (acid catalyst, base catalyst, etc.) used depends on the type of catalyst, but for example 0.01 to 10 moles, preferably 1 mole relative to 1 mole of the compound represented by the formula (2). May be about 0.05 to 5 mol, more preferably about 0.1 to 3 mol.
また、上記反応は、必要に応じて、重合禁止剤(熱重合禁止剤)の存在下で行ってもよい。重合禁止剤としては、ヒドロキノン類(例えば、ヒドロキノン;ヒドロキノンモノメチルエーテル(メトキノン)等のヒドロキノンモノアルキルエーテル等)、カテコール類(例えば、t−ブチルカテコール等のアルキルカテコール等)、アミン類(例えば、ジフェニルアミン等)、2,2−ジフェニル−1−ピクリルヒドラジル、4−ヒドロキシ−2,2,6,6−テトラメチルピペラジン−1−オキシル等が例示できる。重合禁止剤は単独で又は2種以上組み合わせてもよい。 Moreover, you may perform the said reaction in presence of a polymerization inhibitor (thermal polymerization inhibitor) as needed. Polymerization inhibitors include hydroquinones (eg, hydroquinone; hydroquinone monoalkyl ethers such as hydroquinone monomethyl ether (methoquinone)), catechols (eg, alkyl catechols such as t-butylcatechol), amines (eg, diphenylamine) Etc.), 2,2-diphenyl-1-picrylhydrazyl, 4-hydroxy-2,2,6,6-tetramethylpiperazine-1-oxyl and the like. The polymerization inhibitors may be used alone or in combination of two or more.
重合禁止剤の使用量は、例えば、(メタ)アクリル酸又はその誘導体100重量部に対して、0.1〜10重量部、好ましくは0.3〜8重量部、さらに好ましくは0.5〜5重量部程度であってもよい。 The amount of the polymerization inhibitor used is, for example, 0.1 to 10 parts by weight, preferably 0.3 to 8 parts by weight, more preferably 0.5 to 100 parts by weight with respect to 100 parts by weight of (meth) acrylic acid or a derivative thereof. It may be about 5 parts by weight.
反応は、無溶媒中で行ってもよく、溶媒中で行ってもよい。溶媒(有機溶媒)としては、炭化水素類(ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、ベンゼン、トルエン、キシレン等の芳香族炭化水素類等)、ハロゲン化炭化水素類(塩化メチレン、クロロホルム、四塩化炭素等)、エーテル系溶媒(ジエチルエーテル等のジアルキルエーテル類、テトラヒドロフラン、ジオキサン等の環状エーテル類、アニソール等)、ケトン類(アセトン、メチルエチルケトン等のジアルキルケトン類等)等が挙げられる。溶媒は、単独で又は2種以上組み合わせてもよい。なお、前記触媒が液体である場合、前記触媒を溶媒として使用してもよい。 The reaction may be performed in the absence of a solvent or in a solvent. Solvents (organic solvents) include hydrocarbons (aliphatic hydrocarbons such as hexane, heptane, and octane, aromatic hydrocarbons such as benzene, toluene, and xylene), halogenated hydrocarbons (methylene chloride, chloroform, etc.) And carbon tetrachloride), ether solvents (dialkyl ethers such as diethyl ether, cyclic ethers such as tetrahydrofuran and dioxane, anisole and the like), ketones (dialkyl ketones such as acetone and methyl ethyl ketone), and the like. The solvents may be used alone or in combination of two or more. In addition, when the said catalyst is a liquid, you may use the said catalyst as a solvent.
反応温度や反応時間は、使用する(メタ)アクリル酸又はその誘導体の種類に応じて適宜選択できる。反応時間は、例えば、30分〜48時間、通常、1〜36時間、好ましくは2〜24時間程度である。 The reaction temperature and reaction time can be appropriately selected according to the type of (meth) acrylic acid or its derivative used. The reaction time is, for example, 30 minutes to 48 hours, usually 1 to 36 hours, preferably about 2 to 24 hours.
反応は、還流しながら行ってもよく、副生する水やアルコール類を除去しながら行ってもよい。また、反応は、攪拌しながら行ってもよく、空気中又は不活性雰囲気(窒素、希ガス等)中で行ってもよく、常圧、加圧下又は減圧下で行ってもよい。特に、減圧下で反応させると、着色を低減したり、反応時間を短縮できる。 The reaction may be performed while refluxing, or may be performed while removing by-product water and alcohols. The reaction may be performed with stirring, may be performed in air or in an inert atmosphere (nitrogen, rare gas, etc.), and may be performed under normal pressure, increased pressure, or reduced pressure. In particular, when the reaction is performed under reduced pressure, coloring can be reduced and the reaction time can be shortened.
上記式(2)で表される化合物は、特に限定されないが、例えば、下記反応式: Although the compound represented by the said Formula (2) is not specifically limited, For example, following Reaction Formula:
の反応のように、一般式(3)で表される化合物と一般式(4)で表される化合物とを、不活性雰囲気下、塩基存在下、反応させることにより、一般式(2)で表される化合物を製造することができる。特に、一般式(2)においてna=nb=1の化合物(AD−EO)では、原料の入手容易性から当該方法が好ましい。なお、一般式(3)で表される化合物は、特開2013−107847号公報に記載された方法等により公知化合物から製造することができる。
As in the reaction of (2), the compound represented by the general formula (3) and the compound represented by the general formula (4) are reacted in the presence of a base in an inert atmosphere to obtain a general formula (2) The compounds represented can be produced. In particular, in the case of the compound (AD-EO) in which na = nb = 1 in the general formula (2), this method is preferable from the viewpoint of availability of raw materials. In addition, the compound represented by General formula (3) can be manufactured from a well-known compound by the method etc. which were described in Unexamined-Japanese-Patent No. 2013-107847.
当該反応で用いる塩基としては、有機塩基及び無機塩基を併用して用いる。本発明において、有機塩基及び無機塩基を組み合わせて用いることで、副反応である一般式(4)の化合物の脱ハロゲン化水素化反応に優先して当該反応を進行させることができる。 As a base used in the reaction, an organic base and an inorganic base are used in combination. In the present invention, by using an organic base and an inorganic base in combination, the reaction can be advanced in preference to the dehydrohalogenation reaction of the compound of the general formula (4), which is a side reaction.
有機塩基としては、トリアルキルアミン(トリエチルアミン等)等のアルキルアミン、ピリジン等の含窒素芳香族塩基等が好ましく、特にトリエチルアミンが好ましい。無機塩基としては、水酸化ナトリウム等のアルカリ金属水酸化物、水素化ナトリウム等のアルカリ金属水素化物が好ましく、特に水酸化ナトリウムが好ましい。 As the organic base, alkylamines such as trialkylamine (triethylamine and the like), nitrogen-containing aromatic bases such as pyridine and the like are preferable, and triethylamine is particularly preferable. As the inorganic base, alkali metal hydroxides such as sodium hydroxide and alkali metal hydrides such as sodium hydride are preferable, and sodium hydroxide is particularly preferable.
上記Xで示されるハロゲン原子としては、塩素原子、臭素原子が好ましい。 The halogen atom represented by X is preferably a chlorine atom or a bromine atom.
当該反応は溶媒を用いても用いなくともよい。当該反応で用いる溶媒の具体例としては、トルエン等の炭化水素系溶媒、テトラヒドロフラン等のエーテル系溶媒、ジクロロメタン等のハロゲン化炭化水素系溶媒、ジメチルスルホキシド等の非プロトン性極性溶媒等を挙げることができる。 The reaction may or may not use a solvent. Specific examples of the solvent used in the reaction include hydrocarbon solvents such as toluene, ether solvents such as tetrahydrofuran, halogenated hydrocarbon solvents such as dichloromethane, and aprotic polar solvents such as dimethyl sulfoxide. it can.
当該反応は、不活性雰囲気下で行われる。例えば、アルゴン雰囲気下、窒素雰囲気下等で反応を行うことができる。必要に応じて、液体の原料や溶媒に不活性ガスをバブリングしておき、液体中に残存する空気を予め除去することが好ましい。 The reaction is performed under an inert atmosphere. For example, the reaction can be performed in an argon atmosphere, a nitrogen atmosphere, or the like. If necessary, it is preferable that an inert gas is bubbled in a liquid raw material or solvent to remove air remaining in the liquid in advance.
当該反応における一般式(4)で表される化合物の使用量は、一般式(3)の化合物 1モルに対して2モル以上であればよく、過剰量を用いてもよい。一般式(4)の化合物が液体である場合、溶媒量の一般式(3)の化合物を用いることもできる。 The usage-amount of the compound represented by General formula (4) in the said reaction should just be 2 mol or more with respect to 1 mol of compounds of General formula (3), and may use an excess amount. When the compound of the general formula (4) is a liquid, the amount of the compound of the general formula (3) can also be used.
当該反応における有機塩基の使用量は、一般式(3)の化合物 1モルに対して、2モル以上であればよく、過剰量を用いてもよい。具体的には、一般式(3)の化合物 1モルに対して、5〜100モルであることが好ましく、5〜20モルであることがより好ましい。 The usage-amount of the organic base in the said reaction should just be 2 mol or more with respect to 1 mol of compounds of General formula (3), and may use an excess amount. Specifically, it is preferably 5 to 100 mol, more preferably 5 to 20 mol, per 1 mol of the compound of the general formula (3).
当該反応における無機塩基の使用量は、一般式(3)の化合物 1モルに対して、2モル以上であればよく、過剰量を用いてもよい。具体的には、一般式(3)の化合物 1モルに対して、5〜50モルであることが好ましく、10〜30モルであることがより好ましい。 The usage-amount of the inorganic base in the said reaction should just be 2 mol or more with respect to 1 mol of compounds of General formula (3), and may use an excess amount. Specifically, the amount is preferably 5 to 50 mol, more preferably 10 to 30 mol, relative to 1 mol of the compound of the general formula (3).
当該反応における反応温度は、例えば、室温〜100℃で行うことができる。反応時間は反応が十分に進行する程度であればよい。 The reaction temperature in the said reaction can be performed at room temperature-100 degreeC, for example. The reaction time only needs to be such that the reaction proceeds sufficiently.
一般式(4)で表される化合物、有機塩基及び無機塩基は、一度に加えてもよいが、複数回に亘って段階的に加えてもよい。 The compound represented by the general formula (4), the organic base and the inorganic base may be added at once, but may be added stepwise over a plurality of times.
本発明の一般式(1)においてna及び/又はnbが2以上である化合物は、上記反応のように、対応する一般式(2)で表される化合物を用いて製造してもよい。また、一般式(1)においてna及びnbが1である化合物を得た後、アルキレングリコール鎖を伸長することによっても得ることができる。 In the general formula (1) of the present invention, a compound in which na and / or nb is 2 or more may be produced using a compound represented by the corresponding general formula (2) as in the above reaction. Moreover, after obtaining the compound whose na and nb are 1 in General formula (1), it can obtain also by extending | stretching an alkylene glycol chain.
アルキレングリコール鎖を伸長する方法としては、既知の方法を用いればよい。具体的には、例えば、特開2001−139651号公報に記載の方法等を挙げることができる。 As a method for extending the alkylene glycol chain, a known method may be used. Specifically, for example, a method described in JP-A-2001-139651 can be exemplified.
なお、生成した化合物(前記式(1)で表される化合物及び/又は前記式(2)で表される化合物)は、慣用の方法、例えば、濾過、濃縮、抽出、晶析、再結晶、カラムクロマトグラフィー等の分離手段や、これらを組み合わせた分離手段により分離精製してもよい。 The produced compound (the compound represented by the formula (1) and / or the compound represented by the formula (2)) can be obtained by a conventional method such as filtration, concentration, extraction, crystallization, recrystallization, Separation and purification may be performed by separation means such as column chromatography or a combination of these.
3.(メタ)アクリル系樹脂及びその硬化物
本発明の化合物は、高い屈折率を有することが期待される。従って、本発明の化合物を用いて高屈折率である熱又は光硬化性(メタ)アクリル系樹脂が作製される。熱又は光硬化性樹脂は、通常、重合開始剤等を含む樹脂組成物を構成してもよい。本発明は、このような前記化合物を含む樹脂組成物をも包含する。
3. (Meth) acrylic resin and cured product thereof The compound of the present invention is expected to have a high refractive index. Therefore, a heat or photocurable (meth) acrylic resin having a high refractive index is produced using the compound of the present invention. The heat or photocurable resin may usually constitute a resin composition containing a polymerization initiator or the like. The present invention also includes a resin composition containing such a compound.
本発明の熱又は光硬化性(メタ)アクリル系樹脂(熱又は光硬化性(メタ)アクリル系樹脂成分)は、前記一般式(1)の化合物のみで構成してもよく、また、他の多官能性(メタ)アクリレートと組み合わせて用いてもよい。熱又は光硬化性(メタ)アクリル系樹脂を本発明の化合物のみで構成すると、硬化物に9,9’−ビアントリル骨格を高濃度で導入することができる。他の多官能性(メタ)アクリレートとしては、例えば、二官能性(メタ)アクリレート{アルキレングリコールジ(メタ)アクリレート[エチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、1,4−ブタンジオールジ(メタ)アクリレート等のC2−10アルキレングリコールジ(メタ)アクリレート等]、ポリアルキレングリコールジ(メタ)アクリレート[ジ乃至テトラエチレングリコールジ(メタ)アクリレート(なお、以下において、例えば、「ジ乃至テトラエチレングリコール」等というとき、ジエチレングリコール、トリエチレングリコール、テトラエチレングリコールを含む)、ポリエチレングリコールジ(メタ)アクリレート、ジ乃至テトラプロピレングリコールジ(メタ)アクリレート、ポリテトラメチレングリコールジ(メタ)アクリレート等のポリC2−4アルキレングリコールジ(メタ)アクリレート等]、ビスフェノールA(又はそのC2−3アルキレンオキシド付加体)のジ(メタ)アクリレート}、三官能以上の多官能性(メタ)アクリレート[例えば、グリセリントリ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、トリス(ヒドロキシエチル)イソシアヌレートトリ(メタ)アクリレート、ペンタエリスリトールトリ又はテトラ(メタ)アクリレート等のトリ又はテトラオールのトリ又はテトラ(メタ)アクリレート;ジトリメチロールプロパンテトラ(メタ)アクリレート;ジペンタエリスリトールテトラ乃至ヘキサ(メタ)アクリレート等]、ウレタン(メタ)アクリレート、エポキシ(メタ)アクリレート、ポリエステル(メタ)アクリレート、前記式(1)で表される化合物の範疇に属さないフルオレン骨格を有する多官能性(メタ)アクリレート{9,9−ビス(4−(メタ)アクリロイルオキシフェニル)フルオレン、9,9−ビス(4−(メタ)アクリロイルオキシ−3−メチルフェニル)フルオレン等の9,9−ビス((メタ)アクリロイルオキシフェニル)フルオレン類;9,9−ビス[4−(2−(メタ)アクリロイルオキシエトキシ)−3−メチルフェニル]フルオレン等の9,9−ビス[(メタ)アクリロイルオキシ(ポリ)エトキシフェニル]フルオレン類等}等が挙げられる。これらの他の多官能性(メタ)アクリレートは、単独で又は2種以上組み合わせてもよい。 The heat or photocurable (meth) acrylic resin (heat or photocurable (meth) acrylic resin component) of the present invention may be composed of only the compound of the general formula (1). It may be used in combination with a polyfunctional (meth) acrylate. When the heat- or photo-curable (meth) acrylic resin is composed only of the compound of the present invention, the 9,9'-bianthryl skeleton can be introduced into the cured product at a high concentration. Other polyfunctional (meth) acrylates include, for example, bifunctional (meth) acrylate {alkylene glycol di (meth) acrylate [ethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, 1,4- C2-10 alkylene glycol di (meth) acrylate such as butanediol di (meth) acrylate], polyalkylene glycol di (meth) acrylate [di to tetraethylene glycol di (meth) acrylate (in the following, for example, “ "Di to tetraethylene glycol" includes diethylene glycol, triethylene glycol and tetraethylene glycol), polyethylene glycol di (meth) acrylate, di to tetrapropylene glycol di (meth) acrylate. Rate, poly (C2-4 alkylene glycol di (meth) acrylate) such as polytetramethylene glycol di (meth) acrylate, etc.], di (meth) acrylate of bisphenol A (or its C2-3 alkylene oxide adduct)}, trifunctional Polyfunctional (meth) acrylates [for example, glycerin tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, tris (hydroxyethyl) isocyanurate tri (meth) acrylate, pentaerythritol tri or tetra (meth) acrylate Tri or tetraol tri or tetra (meth) acrylate; ditrimethylolpropane tetra (meth) acrylate; dipentaerythritol tetra to hexa (meth) acrylate, etc.], urethane (meth) acrylate Polyfunctional (meth) acrylate having a fluorene skeleton that does not belong to the category of the rate, epoxy (meth) acrylate, polyester (meth) acrylate, and the compound represented by the formula (1) {9,9-bis (4- ( 9,9-bis ((meth) acryloyloxyphenyl) fluorenes such as (meth) acryloyloxyphenyl) fluorene, 9,9-bis (4- (meth) acryloyloxy-3-methylphenyl) fluorene; 9,9-bis [(meth) acryloyloxy (poly) ethoxyphenyl] fluorenes etc.] such as bis [4- (2- (meth) acryloyloxyethoxy) -3-methylphenyl] fluorene} and the like. These other polyfunctional (meth) acrylates may be used alone or in combination of two or more.
他の多官能性(メタ)アクリレートの割合は、前記式(1)で表される化合物100重量部に対して、例えば、1〜100重量部、好ましくは2〜60重量部、さらに好ましくは5〜30重量部程度であってもよい。 The ratio of the other polyfunctional (meth) acrylate is, for example, 1 to 100 parts by weight, preferably 2 to 60 parts by weight, more preferably 5 to 100 parts by weight of the compound represented by the formula (1). About 30 parts by weight may be used.
なお、前記樹脂組成物は、必要に応じて、重合開始剤、希釈剤等を含んでいてもよい。 In addition, the said resin composition may contain the polymerization initiator, the diluent, etc. as needed.
重合開始剤には、熱重合開始剤や光重合開始剤が含まれる。熱重合開始剤と光重合開始剤とを組み合わせてもよい。熱重合開始剤としては、ジアルキルパーオキサイド類(ジ−t−ブチルパーオキサイド、ジクミルパーオキサイド等)、ジアシルパーオキサイド類[ジアルカノイルパーオキサイド(ラウロイルパーオキサイド等)、ジアロイルパーオキサイド(ベンゾイルパーオキサイド等)等]、過酸エステル類(過酢酸t−ブチル等)、ケトンパーオキサイド類、パーオキシカーボネート類、パーオキシケタール類等の有機過酸化物;アゾニトリル化合物[2,2’−アゾビス(イソブチロニトリル)等]、アゾアミド化合物、アゾアミジン化合物等のアゾ化合物等が含まれる。熱重合開始剤は、単独で又は2種以上組み合わせて使用してもよい。 The polymerization initiator includes a thermal polymerization initiator and a photopolymerization initiator. You may combine a thermal-polymerization initiator and a photoinitiator. Examples of thermal polymerization initiators include dialkyl peroxides (di-t-butyl peroxide, dicumyl peroxide, etc.), diacyl peroxides [dialkanoyl peroxide (lauroyl peroxide, etc.), dialoyl peroxide (benzoyl peroxide). Oxides, etc.], peroxyesters (t-butyl peracetate, etc.), organic peroxides such as ketone peroxides, peroxycarbonates, peroxyketals; azonitrile compounds [2,2′-azobis ( Isobutyronitrile) and the like, and azo compounds such as azoamide compounds and azoamidine compounds. You may use a thermal-polymerization initiator individually or in combination of 2 or more types.
光重合開始剤としては、例えば、ベンゾイン類(ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル等のベンゾインアルキルエーテル類等)、アセトフェノン類(アセトフェノン、2−ヒドロキシ−2−メチル−1−フェニルプロパン−1−オン等)、アミノアセトフェノン類{2−メチル−1−[4−(メチルチオ)フェニル]−2−モルホリノアミノプロパノン−1等}、アントラキノン類(アントラキノン、2−メチルアントラキノン等)、チオキサントン類(2,4−ジメチルチオキサントン、2,4−ジエチルチオキサントン、2−クロロチオキサントン等)、ケタール類(アセトフェノンジメチルケタール、ベンジルジメチルケタール等)、ベンゾフェノン類(ベンゾフェノン等)、キサントン類等が例示できる。これらの光重合開始剤は、単独で又は2種以上を組み合わせて用いてもよい。 Examples of the photopolymerization initiator include benzoins (benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin alkyl ethers such as benzoin isopropyl ether), and acetophenones (acetophenone, 2-hydroxy-2-methyl-1-phenyl). Propan-1-one, etc.), aminoacetophenones {2-methyl-1- [4- (methylthio) phenyl] -2-morpholinoaminopropanone-1 etc.}, anthraquinones (anthraquinone, 2-methylanthraquinone, etc.), Thioxanthones (2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-chlorothioxanthone, etc.), ketals (acetophenone dimethyl ketal, benzyldimethyl ketal, etc.), benzophenones (benzopheno Etc.), xanthones and the like. These photopolymerization initiators may be used alone or in combination of two or more.
また、光重合開始剤は、光増感剤と組み合わせてもよい。光増感剤としては、第3級アミン類{例えば、トリアルキルアミン、トリアルカノールアミン(トリエタノールアミン等)、N,N−ジメチルアミノ安息香酸エチル[p−(ジメチルアミノ)安息香酸エチル等]、N,N−ジメチルアミノ安息香酸アミル[p−(ジメチルアミノ)安息香酸アミル等]等のジアルキルアミノ安息香酸アルキルエステル、4,4−ビス(ジエチルアミノ)ベンゾフェノン(ミヒラーズケトン)等のビス(ジアルキルアミノ)ベンゾフェノン、4−(ジメチルアミノ)ベンゾフェノン等のジアルキルアミノベンゾフェノン等}等の慣用の光増感剤等が挙げられる。光増感剤は、単独で又は2種以上組み合わせてもよい。 Moreover, you may combine a photoinitiator with a photosensitizer. As photosensitizers, tertiary amines {for example, trialkylamines, trialkanolamines (triethanolamine, etc.), ethyl N, N-dimethylaminobenzoate [ethyl p- (dimethylamino) benzoate, etc.] N, N-dimethylaminobenzoic acid amyl [p- (dimethylamino) benzoic acid amyl etc.] and other dialkylaminobenzoic acid alkyl esters, 4,4-bis (diethylamino) benzophenone (Michler's ketone) and other bis (dialkylamino) Conventional photosensitizers such as benzophenone and dialkylaminobenzophenone such as 4- (dimethylamino) benzophenone}. The photosensitizers may be used alone or in combination of two or more.
重合開始剤(及び光増感剤の総量)の使用量は、熱又は光硬化性(メタ)アクリル系樹脂100重量部に対して0.1〜30重量部(例えば、1〜30重量部)、好ましくは1〜20重量部(例えば、5〜15重量部)、さらに好ましくは1.5〜10重量部程度であってもよい。また、光増感剤の使用量は、重合開始剤(光重合開始剤)100重量部に対して、5〜200重量部、好ましくは10〜150重量部、さらに好ましくは20〜100重量部程度であってもよい。 The amount of the polymerization initiator (and the total amount of the photosensitizer) used is 0.1 to 30 parts by weight (for example, 1 to 30 parts by weight) with respect to 100 parts by weight of the heat or photocurable (meth) acrylic resin. 1 to 20 parts by weight (for example, 5 to 15 parts by weight), more preferably about 1.5 to 10 parts by weight. Moreover, the usage-amount of a photosensitizer is 5-200 weight part with respect to 100 weight part of polymerization initiators (photoinitiator), Preferably it is 10-150 weight part, More preferably, it is about 20-100 weight part. It may be.
希釈剤としては、反応性希釈剤、非反応性希釈剤(溶媒)が含まれる。反応性希釈剤としては、特に限定されず、重合性単量体、例えば、(メタ)アクリル酸アルキル[(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル等の(メタ)アクリル酸C1−20アルキル、好ましくは(メタ)アクリル酸C1−10アルキル等]、メタアクリル酸シクロアルキル[(メタ)アクリル酸シクロヘキシル等の(メタ)アクリル酸C5−8シクロアルキル等]、(メタ)アクリル酸アリール[(メタ)アクリル酸フェニル等]、ヒドロキシアルキル(メタ)アクリレート[(2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、2−ヒドロキシブチル(メタ)アクリレート等のヒドロキシC2−10アルキル(メタ)アクリレート等]、(ポリ)オキシアルキレングリコールモノ(メタ)アクリレート(ジエチレングリコールモノ(メタ)アクリレート、メトキシテトラエチレングリコールモノ(メタ)アクリレート、ポリエチレングリコールモノ(メタ)アクリレート等の(ポリ)オキシC2−6アルキレングリコールモノ(メタ)アクリレート)、アルコキシアルキル(メタ)アクリレート[(メタ)アクリル酸2−メトキシエチル、(メタ)アクリル酸3−メトキシブチル等の(メタ)アクリル酸C1−4アルコキシアルキル等]、N−置換(メタ)アクリルアミド(N,N−ジメチル(メタ)アクリルアミド等のN,N−ジC1−4アルキル(メタ)アクリルアミド、N−メチロール(メタ)アクリルアミド等のN−ヒドロキシC1−4アルキル(メタ)アクリルアミド等)、アミノアルキル(メタ)アクリレート(N,N−ジメチルアミノエチルアクリレート等)、グリシジル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート等の(メタ)アクリル系モノマー、非(メタ)アクリル系モノマー(例えば、芳香族ビニル系単量体(スチレン等)等)等を好適に使用できる。これらの化合物は単独で又は2種以上組み合わせてもよい。 Diluents include reactive diluents and non-reactive diluents (solvents). The reactive diluent is not particularly limited, and is a polymerizable monomer such as alkyl (meth) acrylate [methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, etc. Meth) acrylic acid C1-20 alkyl, preferably (meth) acrylic acid C1-10 alkyl and the like], methacrylic acid cycloalkyl [(meth) acrylic acid cyclohexyl and other (meth) acrylic acid C5-8 cycloalkyl etc.], Aryl (meth) acrylate [phenyl (meth) acrylate, etc.], hydroxyalkyl (meth) acrylate [(2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate) Hydroxy C2-10 alkyl (meth) acrylate, etc.], (poly) o Sialkylene glycol mono (meth) acrylate ((poly) oxy C2-6 alkylene glycol mono (meth) acrylate such as diethylene glycol mono (meth) acrylate, methoxytetraethylene glycol mono (meth) acrylate, polyethylene glycol mono (meth) acrylate) , Alkoxyalkyl (meth) acrylate [2-methoxyethyl (meth) acrylate, (meth) acrylic acid C1-4 alkoxyalkyl such as 3-methoxybutyl, etc.], N-substituted (meth) acrylamide ( N, N-diC1-4 alkyl (meth) acrylamide such as N, N-dimethyl (meth) acrylamide, N-hydroxy C1-4 alkyl (meth) acrylamide such as N-methylol (meth) acrylamide), (Meth) acrylic monomers such as noalkyl (meth) acrylate (N, N-dimethylaminoethyl acrylate), glycidyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, and non- (meth) acrylic monomers (for example, aromatic A vinyl group monomer (such as styrene) can be suitably used, etc. These compounds may be used alone or in combination of two or more.
反応性希釈剤の割合は、熱又は光硬化性(メタ)アクリル系樹脂100重量部に対して、例えば、1〜1000重量部、好ましくは5〜500重量部、さらに好ましくは10〜200重量部程度であってもよい。 The ratio of the reactive diluent is, for example, 1 to 1000 parts by weight, preferably 5 to 500 parts by weight, and more preferably 10 to 200 parts by weight with respect to 100 parts by weight of the heat or photocurable (meth) acrylic resin. It may be a degree.
溶媒としては、例えば、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類;クロロホルム、ジクロロエタン、1,1,2,2−テトラクロロエタン等のハロゲン化炭化水素;エチルメチルケトン、シクロヘキサノン等のケトン類;トルエン、キシレン等の芳香族炭化水素類;セロソルブ、メチルセロソルブ、カルビトール、メチルカルビトール、プロピレングリコールモノメチルエーテル等のグリコールエーテル類;カルボン酸エステル(酢酸メチル、酢酸エチル、酢酸ブチル、セロソルブアセテート、ブチルセロソルブアセテート、カルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールモノメチルエーテルアセテート等の酢酸エステル等)、炭酸エステル(炭酸プロピレン等)等のエステル類;石油エーテル、石油ナフサ、ソルベントナフサ等の石油系溶剤等が例示できる。溶媒は、単独で又は2種以上を組み合わせて用いることができる。 Examples of the solvent include aliphatic hydrocarbons such as hexane, heptane, and octane; halogenated hydrocarbons such as chloroform, dichloroethane, and 1,1,2,2-tetrachloroethane; ketones such as ethyl methyl ketone and cyclohexanone; Aromatic hydrocarbons such as toluene and xylene; glycol ethers such as cellosolve, methyl cellosolve, carbitol, methyl carbitol, propylene glycol monomethyl ether; carboxylic acid esters (methyl acetate, ethyl acetate, butyl acetate, cellosolve acetate, butyl cellosolve) Acetates such as acetate, carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether acetate, etc.), esters such as carbonate esters (propylene carbonate, etc.); , Petroleum naphtha, petroleum solvents such as solvent naphtha may be cited. A solvent can be used individually or in combination of 2 or more types.
溶媒の割合は、例えば、熱又は光硬化性(メタ)アクリル系樹脂100重量部に対して、1〜500重量部の範囲から選択でき、例えば、10〜400重量部、好ましくは20〜300重量部、さらに好ましくは30〜200重量部程度であってもよい。 The ratio of the solvent can be selected from the range of 1 to 500 parts by weight, for example, 10 to 400 parts by weight, preferably 20 to 300 parts by weight with respect to 100 parts by weight of the heat or photocurable (meth) acrylic resin. Part, more preferably about 30 to 200 parts by weight.
また、熱又は光硬化性(メタ)アクリル系樹脂組成物は、慣用の添加剤、例えば、着色剤、安定剤(熱安定剤、酸化防止剤、紫外線吸収剤等)、充填剤、帯電防止剤、難燃剤、難燃助剤、レベリング剤、シランカップリング剤、重合禁止剤(又は熱重合禁止剤)等を含んでいてもよい。添加剤は、単独で又は2種以上組み合わせて使用してもよい。 In addition, heat or photocurable (meth) acrylic resin compositions can be prepared by using conventional additives such as colorants, stabilizers (thermal stabilizers, antioxidants, ultraviolet absorbers, etc.), fillers, antistatic agents. , A flame retardant, a flame retardant aid, a leveling agent, a silane coupling agent, a polymerization inhibitor (or a thermal polymerization inhibitor) and the like may be included. You may use an additive individually or in combination of 2 or more types.
本発明には、前記式(1)で表される化合物(前記混合物を含む。以下同じ)又は前記樹脂組成物の硬化物も含まれる。このような硬化物は、前記式(1)で表される化合物又はその樹脂組成物を硬化処理することにより製造できる。例えば、フィルム状の硬化物は、基材に対して、前記式(1)で表される化合物又はその樹脂組成物を塗布して塗膜(又は薄膜)を形成した後、硬化処理を施すことにより製造してもよい。なお、フィルム状の塗膜(又は薄膜)の厚みは、用途に応じて選択でき、例えば、0.1〜1000μm、好ましくは1〜500μm、さらに好ましくは5〜300μm程度であってもよい。また、三次元的形状(例えば、レンズ状等)の硬化物は、注型成形等を利用して製造できる。 The present invention also includes a compound represented by the formula (1) (including the mixture, the same applies hereinafter) or a cured product of the resin composition. Such a cured product can be produced by curing the compound represented by the formula (1) or a resin composition thereof. For example, a film-like cured product is applied to the base material by applying the compound represented by the formula (1) or a resin composition thereof to form a coating film (or thin film) and then performing a curing treatment. You may manufacture by. In addition, the thickness of a film-form coating film (or thin film) can be selected according to a use, for example, 0.1-1000 micrometers, Preferably it is 1-500 micrometers, More preferably, about 5-300 micrometers may be sufficient. In addition, a cured product having a three-dimensional shape (for example, a lens shape) can be manufactured by using cast molding or the like.
以下に、実施例に基づいて本発明をより詳細に説明するが、本発明はこれらの実施例によって限定されるものではない。 Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples.
なお、各種特性の測定や評価は以下の方法によって行った。 Various characteristics were measured and evaluated by the following methods.
(NMR)
NMRスペクトルは、Bruker BIOSPIN社製 AVANCE III HD (300MHz)を用いて測定した。
(NMR)
The NMR spectrum was measured using AVANCE III HD (300 MHz) manufactured by Bruker BIOSPIN.
(HPLC)
島津製作所(株)製HPLCシステムを用いて、
カラム:東ソー社製TSKgel ODS-80TM (TOSOH) 4.6 mm X 25 cm
測定条件:水/アセトニトリル= 20/80、温度40 ℃、流量 1.0 mL/min
の条件にて測定した。
(HPLC)
Using an HPLC system manufactured by Shimadzu Corporation,
Column: manufactured by Tosoh Corporation TSKgel ODS-80T M (TOSOH) 4.6 mm X 25 cm
Measurement conditions: Water / acetonitrile = 20/80, temperature 40 ° C, flow rate 1.0 mL / min
The measurement was performed under the following conditions.
参考例1
10,10’−ジ−(2−ヒドロキシエトキシ)−9,9’−ビアントリル(以下において、「AD-EO」とする)の製造
攪拌機、アルゴンインレット及び温度計を備えた、1Lセパラブルフラスコ中に、9,9’−ビアントラセン−10,10’(9H,9’H)−ジオン (15.2g、0.039mol)及び2−クロロエタノール(300mL)を仕込み、30分間アルゴンをバブリングした。その後、アルゴン雰囲気下で、攪拌しながら、トリエチルアミン(30mL)及び水酸化ナトリウム(顆粒、20.0g)を加え、50℃で40分間加熱した。その後、70℃にて、2時間加熱した後、追加の2−クロロエタノール(50mL)、トリエチルアミン(5mL)及び水酸化ナトリウム(10g)を加え、1時間加熱攪拌した後、さらに、追加の2−クロロエタノール(50mL)、トリエチルアミン(5mL)及び水酸化ナトリウム(10g)を加え、15時間加熱攪拌した。400mLの水を反応混合物に加えて、沈殿物を濾取し、メタノール(100mL)で洗浄した後、得られた固体を真空乾燥した。トルエンを用いて乾燥後の固体を再結晶し、AD-EO(13.3g、収率71%、薄黄色固体)を得た。
Reference example 1
Production of 10,10′-di- (2-hydroxyethoxy) -9,9′-bianthryl (hereinafter referred to as “AD-EO”) In a 1 L separable flask equipped with a stirrer, argon inlet and thermometer 9,9′-Bianthracene-10,10 ′ (9H, 9′H) -dione (15.2 g, 0.039 mol) and 2-chloroethanol (300 mL) were bubbled with argon for 30 minutes. Thereafter, triethylamine (30 mL) and sodium hydroxide (granule, 20.0 g) were added with stirring under an argon atmosphere, and the mixture was heated at 50 ° C. for 40 minutes. Then, after heating at 70 ° C. for 2 hours, additional 2-chloroethanol (50 mL), triethylamine (5 mL) and sodium hydroxide (10 g) were added, and the mixture was heated and stirred for 1 hour. Chloroethanol (50 mL), triethylamine (5 mL) and sodium hydroxide (10 g) were added, and the mixture was stirred with heating for 15 hr. 400 mL of water was added to the reaction mixture, the precipitate was collected by filtration, washed with methanol (100 mL), and the resulting solid was dried in vacuo. The solid after drying using toluene was recrystallized to obtain AD-EO (13.3 g, yield 71%, light yellow solid).
AD-EOの1H−NMRスペクトルは以下のとおりである。
1H NMR (300 MHz, CDCl3) δ2.54 (t, J = 5.9 Hz, 2H), 4.33 (m, 4H), 4.56 (t, J = 4.2 Hz, 4H), 7.12 (d, J = 8.6 Hz, Ar, 4H) 7.20 (t, J = 7.5 Hz, Ar, 4H), 7.50 (t, J = 7.5 Hz, Ar, 4H), 8.52 (d, J = 8.6 Hz, Ar, 4H)。
The 1 H-NMR spectrum of AD-EO is as follows.
1 H NMR (300 MHz, CDCl 3 ) δ2.54 (t, J = 5.9 Hz, 2H), 4.33 (m, 4H), 4.56 (t, J = 4.2 Hz, 4H), 7.12 (d, J = 8.6 Hz, Ar, 4H) 7.20 (t, J = 7.5 Hz, Ar, 4H), 7.50 (t, J = 7.5 Hz, Ar, 4H), 8.52 (d, J = 8.6 Hz, Ar, 4H).
実施例1Example 1
10,10’-ジ-(2-アクリロイルエトキシ)-ビアントリル(以下において、「AD-EO-A」とする)の製造Production of 10,10'-di- (2-acryloylethoxy) -bianthryl (hereinafter referred to as "AD-EO-A")
AD-EO-Aの1H−NMRスペクトルは以下のとおりである。
1H NMR (300 MHz, CDCl3) δ4.69 (dd, J = 3.5, 5.4 Hz, 4H), 4.83 (dd, J= 3.5, 5.4 Hz, 4H), 6.00 (dd, J = 1.4, 10.4 Hz, 2H), 6.35 (dd, J = 10.4, 17.3 Hz,2H), 6.58 (dd, J = 1.4, 17.3 Hz, 2H), 7.10 (d, J = 8.6 Hz, Ar, 4H) 7.16 (t, J = 7.5 Hz, Ar, 4H), 7.48 (t, J = 7.5 Hz, Ar, 4H), 8.50 (d, J = 8.6 Hz, Ar, 4H).
The 1 H-NMR spectrum of AD-EO-A is as follows.
1 H NMR (300 MHz, CDCl 3 ) δ4.69 (dd, J = 3.5, 5.4 Hz, 4H), 4.83 (dd, J = 3.5, 5.4 Hz, 4H), 6.00 (dd, J = 1.4, 10.4 Hz , 2H), 6.35 (dd, J = 10.4, 17.3 Hz, 2H), 6.58 (dd, J = 1.4, 17.3 Hz, 2H), 7.10 (d, J = 8.6 Hz, Ar, 4H) 7.16 (t, J = 7.5 Hz, Ar, 4H), 7.48 (t, J = 7.5 Hz, Ar, 4H), 8.50 (d, J = 8.6 Hz, Ar, 4H).
実施例2Example 2
10,10’-ジ-(2-メタクリロイルエトキシ)-ビアントリル(以下において、「AD-EO-MA」とする)の製造Production of 10,10'-di- (2-methacryloylethoxy) -bianthryl (hereinafter referred to as "AD-EO-MA")
AD-EO-MAの1H−NMRスペクトルは以下のとおりである。
1H NMR (300 MHz, CDCl3) δ2.07 (s, 6H), 4.68 (dd, J = 3.2, 5.4 Hz, 4H), 4.79 (dd, J = 3.2, 5.4 Hz, 4H), 5.69 (t, J = 1.5 Hz, 2H), 6.28 (s,2H), 7.07 (d, J = 8.6 Hz, Ar, 4H) 7.12 (t, J = 7.5 Hz, Ar, 4H), 7.46 (t, J = 7.5 Hz, Ar, 4H), 8.50 (d, J = 8.6 Hz, Ar, 4H).
(薄膜の作製)
AD-EO-A(0.20 g)を1,1,2,2―テトラクロロエタン(9.80 g)に溶解した。この溶液にIrgacure 184 (BASF社製)(5 mg)を加えた。この溶液を、水切放ガラス基板上に、スピンコート(500 rpm, 5 秒、その後、1000 rpm, 5秒)し、薄膜を形成した。
The 1 H-NMR spectrum of AD-EO-MA is as follows.
1 H NMR (300 MHz, CDCl 3 ) δ2.07 (s, 6H), 4.68 (dd, J = 3.2, 5.4 Hz, 4H), 4.79 (dd, J = 3.2, 5.4 Hz, 4H), 5.69 (t , J = 1.5 Hz, 2H), 6.28 (s, 2H), 7.07 (d, J = 8.6 Hz, Ar, 4H) 7.12 (t, J = 7.5 Hz, Ar, 4H), 7.46 (t, J = 7.5 Hz, Ar, 4H), 8.50 (d, J = 8.6 Hz, Ar, 4H).
(Preparation of thin film)
AD-EO-A (0.20 g) was dissolved in 1,1,2,2-tetrachloroethane (9.80 g). Irgacure 184 (BASF) (5 mg) was added to this solution. This solution was spin-coated (500 rpm, 5 seconds, then 1000 rpm, 5 seconds) on a drained glass substrate to form a thin film.
(硬化膜の作製)
上記薄膜を、UV照射機(H015−L31:アイグラフィックス(株)製)を用いて、500mJ/cm2でフィルムに光照射し、硬化膜を作製した。
(Production of cured film)
The thin film was irradiated with light at 500 mJ / cm 2 using a UV irradiation machine (H015-L31: manufactured by Eye Graphics Co., Ltd.) to prepare a cured film.
上記硬化膜の膜厚、及び屈折率を大塚電子(株)製FE−3000を用いて測定したところ、膜厚は400−700μmであり、589nmにおける屈折率は、1.674であった。 When the film thickness and refractive index of the cured film were measured using FE-3000 manufactured by Otsuka Electronics Co., Ltd., the film thickness was 400-700 μm, and the refractive index at 589 nm was 1.673.
Claims (4)
で表される化合物。 The following general formula (1):
A compound represented by
で表される化合物と、(メタ)アクリル酸又はその誘導体とを反応させる工程を含む、請求項1に記載の化合物の製造方法。 The following general formula (2):
The manufacturing method of the compound of Claim 1 including the process with which the compound represented by (meth) acrylic acid or its derivative (s) is made to react.
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