JP6432269B2 - Organic acid-containing zirconia fine particle dispersion, surface-modified zirconia fine particle dispersion, method for producing the same, and resin composite composition - Google Patents
Organic acid-containing zirconia fine particle dispersion, surface-modified zirconia fine particle dispersion, method for producing the same, and resin composite composition Download PDFInfo
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- JP6432269B2 JP6432269B2 JP2014209292A JP2014209292A JP6432269B2 JP 6432269 B2 JP6432269 B2 JP 6432269B2 JP 2014209292 A JP2014209292 A JP 2014209292A JP 2014209292 A JP2014209292 A JP 2014209292A JP 6432269 B2 JP6432269 B2 JP 6432269B2
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- Prior art keywords
- zirconia fine
- fine particle
- organic acid
- dispersion
- modified
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- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 title claims description 323
- 239000010419 fine particle Substances 0.000 title claims description 185
- 239000006185 dispersion Substances 0.000 title claims description 117
- 150000007524 organic acids Chemical class 0.000 title claims description 73
- 239000000805 composite resin Substances 0.000 title claims description 37
- 239000000203 mixture Substances 0.000 title claims description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 69
- 239000002245 particle Substances 0.000 claims description 43
- 229920005989 resin Polymers 0.000 claims description 40
- 239000011347 resin Substances 0.000 claims description 40
- -1 organic acid compound Chemical class 0.000 claims description 34
- 239000003607 modifier Substances 0.000 claims description 29
- 235000011054 acetic acid Nutrition 0.000 claims description 23
- 239000007788 liquid Substances 0.000 claims description 20
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 19
- 239000002612 dispersion medium Substances 0.000 claims description 19
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 18
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000002994 raw material Substances 0.000 claims description 11
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 9
- 229910021529 ammonia Inorganic materials 0.000 claims description 9
- 235000019253 formic acid Nutrition 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 9
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 claims description 8
- 239000005695 Ammonium acetate Substances 0.000 claims description 8
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 claims description 8
- 235000019257 ammonium acetate Nutrition 0.000 claims description 8
- 229940043376 ammonium acetate Drugs 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 8
- 235000019260 propionic acid Nutrition 0.000 claims description 8
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 8
- 238000005406 washing Methods 0.000 claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- 150000001412 amines Chemical class 0.000 claims description 6
- 239000007822 coupling agent Substances 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 6
- 238000000926 separation method Methods 0.000 claims description 6
- VZTDIZULWFCMLS-UHFFFAOYSA-N ammonium formate Chemical compound [NH4+].[O-]C=O VZTDIZULWFCMLS-UHFFFAOYSA-N 0.000 claims description 4
- XJMWHXZUIGHOBA-UHFFFAOYSA-N azane;propanoic acid Chemical compound N.CCC(O)=O XJMWHXZUIGHOBA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- YNTQKXBRXYIAHM-UHFFFAOYSA-N azanium;butanoate Chemical compound [NH4+].CCCC([O-])=O YNTQKXBRXYIAHM-UHFFFAOYSA-N 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 39
- 239000003822 epoxy resin Substances 0.000 description 24
- 229920000647 polyepoxide Polymers 0.000 description 24
- 238000000034 method Methods 0.000 description 22
- 229920001296 polysiloxane Polymers 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 239000011164 primary particle Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 229920002050 silicone resin Polymers 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 125000003342 alkenyl group Chemical group 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 238000004381 surface treatment Methods 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 239000004925 Acrylic resin Substances 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 239000011362 coarse particle Substances 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 235000005985 organic acids Nutrition 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- 230000001737 promoting effect Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 229910052938 sodium sulfate Inorganic materials 0.000 description 4
- 235000011152 sodium sulphate Nutrition 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000002845 discoloration Methods 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N hydrochloric acid Substances Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 238000006459 hydrosilylation reaction Methods 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 239000011859 microparticle Substances 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920002635 polyurethane Polymers 0.000 description 3
- 239000004814 polyurethane Substances 0.000 description 3
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000006011 modification reaction Methods 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
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- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
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- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
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- 229920000728 polyester Polymers 0.000 description 2
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- 238000001556 precipitation Methods 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
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- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
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- 125000003944 tolyl group Chemical group 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- 150000003754 zirconium Chemical class 0.000 description 2
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- AYMDJPGTQFHDSA-UHFFFAOYSA-N 1-(2-ethenoxyethoxy)-2-ethoxyethane Chemical compound CCOCCOCCOC=C AYMDJPGTQFHDSA-UHFFFAOYSA-N 0.000 description 1
- SDXHBDVTZNMBEW-UHFFFAOYSA-N 1-ethoxy-2-(2-hydroxyethoxy)ethanol Chemical compound CCOC(O)COCCO SDXHBDVTZNMBEW-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- OEYNWAWWSZUGDU-UHFFFAOYSA-N 1-methoxypropane-1,2-diol Chemical compound COC(O)C(C)O OEYNWAWWSZUGDU-UHFFFAOYSA-N 0.000 description 1
- IEKHISJGRIEHRE-UHFFFAOYSA-N 16-methylheptadecanoic acid;propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CC(C)CCCCCCCCCCCCCCC(O)=O.CC(C)CCCCCCCCCCCCCCC(O)=O.CC(C)CCCCCCCCCCCCCCC(O)=O IEKHISJGRIEHRE-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- KHOUKKVJOPQVJM-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCC(CO)(CO)CO KHOUKKVJOPQVJM-UHFFFAOYSA-N 0.000 description 1
- HLIQLHSBZXDKLV-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-1-phenoxyethanol Chemical compound OCCOCC(O)OC1=CC=CC=C1 HLIQLHSBZXDKLV-UHFFFAOYSA-N 0.000 description 1
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- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
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- ABVVEAHYODGCLZ-UHFFFAOYSA-N tridecan-1-amine Chemical compound CCCCCCCCCCCCCN ABVVEAHYODGCLZ-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Description
本発明は、有機酸含有ジルコニア微粒子分散液、表面修飾ジルコニア微粒子分散液及びその製造方法、樹脂複合組成物に関する。 The present invention relates to an organic acid-containing zirconia fine particle dispersion, a surface-modified zirconia fine particle dispersion, a production method thereof, and a resin composite composition.
従来、各種カメラレンズ、イメージセンサーのマイクロレンズ、DVD等の光ピックアップレンズ、LED封止材等の各種機器に用いられる光学部材には、高い光透過率、高い屈折率等の基本的な光学特性が必要とされる。これらの光学部材には、ポリメチルメタクリレート(PMMA)、ポリシクロヘキシルメタクリレート、ポリカーボネート(PC)等の樹脂を用いた光学レンズや、シリコーン樹脂、エポキシ樹脂を用いた封止材等があり、それらは、高い光透過率、高い屈折率等といった必要とされる光学特性を満たすためにジルコニアやチタニアといった高屈折率微粒子と各種樹脂の複合体が提案されている(例えば、特許文献1及び特許文献2参照)。また、これらのような高屈折率微粒子と各種樹脂の複合体を得るためには、親水性である高屈折率微粒子表面を、疎水性の各種樹脂に合わせて表面修飾剤で表面処理する技術が提案されている(例えば、特許文献3及び特許文献4参照)。 Conventionally, optical members used in various devices such as various camera lenses, microlenses of image sensors, optical pickup lenses such as DVDs, LED sealing materials, etc. have basic optical characteristics such as high light transmittance and high refractive index. Is needed. These optical members include optical lenses using resins such as polymethyl methacrylate (PMMA), polycyclohexyl methacrylate, and polycarbonate (PC), and sealing materials using silicone resins and epoxy resins. In order to satisfy required optical properties such as high light transmittance and high refractive index, composites of various refractive resins such as zirconia and titania with various resins have been proposed (see, for example, Patent Document 1 and Patent Document 2). ). In addition, in order to obtain composites of such high refractive index fine particles and various resins as described above, there is a technique in which the surface of hydrophilic high refractive index fine particles is surface-treated with a surface modifier in accordance with various hydrophobic resins. It has been proposed (see, for example, Patent Document 3 and Patent Document 4).
ところで、光学部材に使用されるような高屈折率微粒子と樹脂の複合体は、光線透過率の低下や粘度上昇によるハンドリング性の低下を防ぐために、樹脂中に高屈折率微粒子ができる限り小さな分散粒径で分散され、かつお互いに相互作用が及ばないように、高屈折率微粒子表面を均一かつ高密度で修飾する必要がある。
このような修飾方法として、炭素数6以上の分枝鎖状炭化水素基とカルボキシル基を含有する化合物とシランカップリング剤等を併用する方法(例えば、特許文献5参照)や、2種以上の表面修飾剤で2段階処理する方法(例えば、特許文献6参照)等が提案されている。
By the way, a composite of high refractive index fine particles and a resin as used in an optical member is dispersed as small as possible in the resin so as to prevent a decrease in light transmittance and a handling property due to an increase in viscosity. It is necessary to modify the surface of the high refractive index fine particles uniformly and at a high density so that they are dispersed with a particle size and do not interact with each other.
As such a modification method, a method in which a compound containing a branched hydrocarbon group having 6 or more carbon atoms and a carboxyl group and a silane coupling agent or the like are used in combination (for example, see Patent Document 5), or two or more types A method of performing a two-step treatment with a surface modifier (for example, see Patent Document 6) has been proposed.
しかしながら、特許文献5のような方法では、炭素数6以上の分枝鎖状炭化水素基とカルボキシル基を含有する化合物が高屈折率微粒子表面に存在するため、特に加熱硬化時や高照度化の使用環境において炭素数6以上の分枝鎖状炭化水素基の劣化等による変色が見られ、耐熱性や耐光性に著しく劣り、樹脂の選択や用途が限定されてしまう等の問題があった。
また、特許文献6のような方法は、高屈折率微粒子表面を高度に修飾する方法としては非常に有効であるが、初期の修飾において高屈折率微粒子が凝集してしまうことや、有機系表面修飾剤で処理する前のジルコニア微粒子分散液を高度に分散させる必要があること等、高屈折率微粒子表面を均一に修飾するにはさらに改善の余地があった。
However, in a method such as Patent Document 5, since a compound containing a branched hydrocarbon group having 6 or more carbon atoms and a carboxyl group is present on the surface of the high refractive index fine particles, particularly during heat curing or high illumination. Discoloration due to deterioration or the like of branched chain hydrocarbon groups having 6 or more carbon atoms was observed in the usage environment, resulting in problems such as extremely poor heat resistance and light resistance, and limited resin selection and applications.
Further, the method as described in Patent Document 6 is very effective as a method for highly modifying the surface of the high refractive index fine particles, but the high refractive index fine particles are aggregated in the initial modification, In order to uniformly modify the surface of the high refractive index fine particles, for example, it is necessary to highly disperse the zirconia fine particle dispersion before the treatment with the modifying agent.
本発明は、上記の課題を解決するためになされたものであって、高い屈折率や高い透明性、及び高いハンドリング性を有する表面修飾ジルコニア微粒子分散液及びその製造方法、並びにこの表面修飾ジルコニア微粒子分散液を作製することが可能な有機酸含有ジルコニア微粒子分散液、並びにこれら分散液を用いた樹脂複合組成物を提供することを目的とする。 The present invention has been made to solve the above problems, and has a surface-modified zirconia fine particle dispersion having a high refractive index, high transparency, and high handling properties, a method for producing the same, and the surface-modified zirconia fine particles. An object of the present invention is to provide an organic acid-containing zirconia fine particle dispersion capable of producing a dispersion, and a resin composite composition using these dispersions.
本発明者等は、ジルコニア微粒子表面に有機酸が吸着させ、この有機酸を有機系表面修飾剤で置換すれば、高い屈折率や高い透明性、及び高いハンドリング性を有する表面修飾ジルコニア微粒子分散液を作製することが容易に可能であり、また遊離した有機酸を有機酸化合物として除去すれば、最終的に耐熱性や耐光性に優れた樹脂複合体が得られることを見出した。
すなわち、本発明は下記の通りである。
The present inventors have adsorbed an organic acid on the surface of zirconia fine particles, and if the organic acid is replaced with an organic surface modifier, a surface-modified zirconia fine particle dispersion having a high refractive index, high transparency, and high handling properties. It was found that a resin composite having excellent heat resistance and light resistance can be finally obtained by removing the free organic acid as an organic acid compound.
That is, the present invention is as follows.
[1] 有機酸と、平均分散粒径が1nm以上かつ20nm以下であるジルコニア微粒子と、分散媒とを含有し、
前記有機酸は、前記ジルコニア微粒子の表面積1m2に対して、0.001g以上かつ0.05g以下であることを特徴とする有機酸含有ジルコニア微粒子分散液。
[1] An organic acid, zirconia fine particles having an average dispersed particle diameter of 1 nm or more and 20 nm or less, and a dispersion medium,
The organic acid-containing zirconia fine particle dispersion, wherein the organic acid is 0.001 g or more and 0.05 g or less with respect to a surface area of 1 m 2 of the zirconia fine particles.
[2] 前記有機酸は、少なくとも蟻酸、酢酸、プロピオン酸及び酪酸のいずれかを含み、
前記分散媒は、少なくとも水を含むことを特徴とする[1]に記載の有機酸含有ジルコニア微粒子分散液。
[3] 有機系表面修飾剤により表面が修飾された表面修飾ジルコニア微粒子と、分散媒と、有機酸化合物とを含有する表面修飾ジルコニア微粒子分散液であって、
前記表面修飾ジルコニア微粒子におけるジルコニア微粒子の平均分散粒径が1nm以上かつ20nm以下であり、
前記有機系表面修飾剤は、少なくともアルコキシシラン化合物、シロキサン化合物及びチタンカップリング剤の群から選択された1種または2種以上であり、
前記有機酸化合物の含有量が、ジルコニア微粒子の質量に対して3質量%未満であることを特徴とする表面修飾ジルコニア微粒子分散液。
[4] 前記有機酸化合物は、少なくとも蟻酸アンモニウム、酢酸アンモニウム、プロピオン酸アンモニウム及び酪酸アンモニウムのいずれかであることを特徴とする[3]に記載の表面修飾ジルコニア微粒子分散液。
[2] The organic acid includes at least any of formic acid, acetic acid, propionic acid and butyric acid,
The organic acid-containing zirconia fine particle dispersion liquid according to [1], wherein the dispersion medium contains at least water.
[3] A surface-modified zirconia fine particle dispersion containing surface-modified zirconia fine particles whose surface is modified with an organic surface modifier, a dispersion medium, and an organic acid compound,
The average dispersed particle diameter of the zirconia fine particles in the surface-modified zirconia fine particles is 1 nm or more and 20 nm or less,
The organic surface modifier is at least one selected from the group consisting of an alkoxysilane compound, a siloxane compound and a titanium coupling agent,
The surface-modified zirconia fine particle dispersion, wherein the content of the organic acid compound is less than 3% by mass with respect to the mass of the zirconia fine particles.
[4] The surface-modified zirconia fine particle dispersion according to [3], wherein the organic acid compound is at least one of ammonium formate, ammonium acetate, ammonium propionate, and ammonium butyrate.
[5] 上記[3]又は[4]に記載の表面修飾ジルコニア微粒子分散液と、樹脂原料とを混合し、その後溶媒を除去することを特徴とする樹脂複合組成物。 [5] A resin composite composition comprising mixing the surface-modified zirconia fine particle dispersion according to [3] or [4] above and a resin raw material, and then removing the solvent.
[6] 上記[3]又は[4]に記載の表面修飾ジルコニア微粒子分散液の製造方法であって、下記工程を含むことを特徴とする表面修飾ジルコニア微粒子分散液の製造方法。
(1)上記[1]又は[2]に記載の有機酸含有ジルコニア微粒子分散液に、有機系表面修飾剤を添加し、ジルコニア微粒子表面の有機酸を前記有機系表面修飾剤で置換する工程。
(2)工程(1)後の分散液に、アンモニアもしくはアミンを添加し、pHを7.5以上に調整することで、含有する前記有機酸を有機酸化合物とする(変換する)工程。
(3)工程(2)後の分散液に固液分離処理を行い、得られた表面修飾ジルコニア微粒子ケーキに洗浄処理を行う工程。
(4)工程(3)で得られた前記表面修飾ジルコニア微粒子ケーキを乾燥し、その後分散媒に再分散させる工程。
[6] A method for producing a surface-modified zirconia fine particle dispersion as described in [3] or [4] above, which comprises the following steps.
(1) A step of adding an organic surface modifier to the organic acid-containing zirconia fine particle dispersion described in [1] or [2], and replacing the organic acid on the surface of the zirconia fine particles with the organic surface modifier.
(2) A step of converting (converting) the organic acid contained into the organic acid compound by adding ammonia or amine to the dispersion after step (1) and adjusting the pH to 7.5 or higher.
(3) A step of subjecting the dispersion after step (2) to a solid-liquid separation treatment and washing the resulting surface-modified zirconia fine particle cake.
(4) A step of drying the surface-modified zirconia fine particle cake obtained in step (3) and then redispersing it in a dispersion medium.
本発明によれば、高い屈折率や高い透明性、及び高いハンドリング性を有する表面修飾ジルコニア微粒子分散液及びその製造方法、並びにこの表面修飾ジルコニア微粒子分散液を作製することが可能な有機酸含有ジルコニア微粒子分散液、並びにこれら分散液を用いた樹脂複合組成物を提供することができる。 According to the present invention, a surface-modified zirconia fine particle dispersion having a high refractive index, high transparency, and high handling properties, a method for producing the same, and an organic acid-containing zirconia capable of producing the surface-modified zirconia fine particle dispersion A fine particle dispersion and a resin composite composition using these dispersions can be provided.
以下、本発明の有機酸含有ジルコニア微粒子分散液、表面修飾ジルコニア微粒子分散液及びその製造方法、樹脂複合組成物について説明する。
なお、下記説明は発明の趣旨をより良く理解させるために具体的に説明するものであり、特に指定のない限り、本発明を限定するものではない。
Hereinafter, the organic acid-containing zirconia fine particle dispersion, the surface-modified zirconia fine particle dispersion, the production method thereof, and the resin composite composition of the present invention will be described.
In addition, the following description is specifically described in order to make the gist of the invention better understood, and does not limit the present invention unless otherwise specified.
[1.有機酸含有ジルコニア微粒子分散液]
本実施形態の有機酸含有ジルコニア微粒子分散液は、有機酸と、ジルコニア微粒子と、分散媒とを含有してなる分散液である。
有機酸の含有量は、ジルコニア微粒子の表面積1m2に対して、0.001g以上かつ0.05gである。
[1. Organic acid-containing zirconia fine particle dispersion]
The organic acid-containing zirconia fine particle dispersion of this embodiment is a dispersion containing an organic acid, zirconia fine particles, and a dispersion medium.
The content of the organic acid is 0.001 g or more and 0.05 g with respect to the surface area of 1 m 2 of the zirconia fine particles.
有機酸としては、水溶性の脂肪酸(モノカルボン酸)が好適に用いられ、例えば、蟻酸、酢酸、プロピオン酸、酪酸等が好ましく、蟻酸、酢酸、プロピオン酸が特に好ましい。これらの有機酸は、単独で用いてもよく、複数種混合して用いてもよい。 As the organic acid, a water-soluble fatty acid (monocarboxylic acid) is suitably used. Formic acid, acetic acid, propionic acid, butyric acid, and the like are preferable, and formic acid, acetic acid, and propionic acid are particularly preferable. These organic acids may be used alone or in combination of two or more.
ここで、有機酸を含有する理由は、有機酸の有するカルボン酸はジルコニア微粒子の表面の水酸基と水素結合して、ジルコニア微粒子の表面に吸着するからである。有機酸は、ジルコニア微粒子の表面への吸着効率も高く、この表面を理想的に被覆することにより、ジルコニア表面の水酸基による粒子間の相互作用を防止し、平均分散粒径の小さく、分散安定性の高い分散液を作ることができるからである。
また、有機酸を含有した場合、分散液のpHを下げてジルコニア微粒子表面のゼータ電位を発生させることで、分散したジルコニア微粒子間に電気的な反発力を生じさせ、分散安定性の高い分散液を作ることができる。
さらに、ジルコニア表面に有機酸が吸着したことによって電気二重層の厚さが薄くなり、結果として系の粘性も低下し、粒子がマイクロフィルターを通過しやすくなるため、ジルコニア微粒子製造工程で発生した粗大な粒子、分散しない粒子を効果的に除去できることから平均分散粒径が1nm以上かつ20nm以下のジルコニア微粒子分散液を安定的に作ることができる。
また、有機酸を含有した場合、ジルコニア表面に吸着した有機酸は、後述するようにアルカリにより容易に除去することができるという利点がある。
Here, the reason for containing the organic acid is that the carboxylic acid contained in the organic acid is hydrogen-bonded with the hydroxyl group on the surface of the zirconia fine particles and adsorbed on the surface of the zirconia fine particles. Organic acids also have high adsorption efficiency on the surface of zirconia fine particles. By ideally covering this surface, the interaction between particles due to hydroxyl groups on the surface of zirconia is prevented, the average dispersed particle size is small, and dispersion stability is reduced. This is because a high dispersion liquid can be made.
In addition, when an organic acid is contained, by generating a zeta potential on the surface of the zirconia fine particles by lowering the pH of the dispersion, an electric repulsive force is generated between the dispersed zirconia fine particles, and the dispersion having high dispersion stability Can be made.
Furthermore, the organic acid adsorbed on the zirconia surface reduces the thickness of the electric double layer, resulting in a decrease in the viscosity of the system and the easier passage of particles through the microfilter. Therefore, zirconia fine particle dispersion having an average dispersed particle diameter of 1 nm or more and 20 nm or less can be stably produced.
Further, when an organic acid is contained, there is an advantage that the organic acid adsorbed on the zirconia surface can be easily removed by alkali as described later.
ここで、有機酸として蟻酸、酢酸、プロピオン酸および酪酸が好ましいとした理由は、ジルコニア微粒子合成時の主溶媒である水に容易に溶解し、かつ後述する表面修飾剤との置換反応が容易に起こるからである。 Here, formic acid, acetic acid, propionic acid and butyric acid are preferred as organic acids because they are easily dissolved in water, which is the main solvent in the synthesis of zirconia fine particles, and can easily be substituted with a surface modifier described later. Because it happens.
この有機酸の含有量は、ジルコニア微粒子の表面積1m2に対して、0.001g以上かつ0.05g以下とし、0.002g以上かつ0.040g以下であることが好ましく、0.003g以上かつ0.035g以下であることがより好ましい。
ここで、有機酸の含有量を前記ジルコニア微粒子の表面積1m2に対して、0.001g以上かつ0.05g以下と限定した理由は、0.001g未満ではジルコニア微粒子の表面を理想的に覆うことができず、またジルコニア微粒子間の電気的反発力が弱くなり、分散液の分散安定性が劣るためである。また、粒子の電気二重層が厚くなりことからマイクロフィルター細孔を通過し難くなる。一方、0.05gを超えると、ジルコニア粒子に対する有機酸(例えば酢酸)が多くなりすぎ、表面修飾剤との置換反応の進行が妨げられる。さらに後述する有機酸(例えば酢酸)化合物の除去が困難になる為である。
The content of the organic acid is 0.001 g or more and 0.05 g or less, preferably 0.002 g or more and 0.040 g or less, preferably 0.003 g or more and 0 or less, per 1 m 2 of the surface area of the zirconia fine particles. More preferably, it is 0.035 g or less.
Here, the reason why the content of the organic acid is limited to 0.001 g or more and 0.05 g or less with respect to the surface area of 1 m 2 of the zirconia fine particles is that the surface of the zirconia fine particles is ideally covered if it is less than 0.001 g. This is because the electric repulsive force between the zirconia fine particles becomes weak and the dispersion stability of the dispersion is poor. Further, since the electric double layer of the particles becomes thick, it becomes difficult to pass through the microfilter pores. On the other hand, if it exceeds 0.05 g, the organic acid (for example, acetic acid) with respect to the zirconia particles becomes too much, and the progress of the substitution reaction with the surface modifier is hindered. Further, it is difficult to remove an organic acid (for example, acetic acid) compound described later.
このジルコニア微粒子の平均分散粒径を1nm以上かつ20nm以下と限定した理由は、平均分散粒径が1nm未満であると、この分散粒子を形成する一次粒子の結晶性が乏しくなり、屈折率等の粒子特性を発現することが難しくなるからであり、一方、平均分散粒径が20nmを超えると、樹脂複合体とした場合に透光性が低下するからである。平均分散粒径は、2nm以上かつ15nm以下であることが好ましい。
このような分散粒径を得るために必要なジルコニア微粒子の平均一次粒径は、上記分散粒径より小さければ特に制限はないが、1nm以上かつ15nm以下であることが好ましく、4nm以上かつ11nm以下であることがより好ましい。当該平均一次粒径を上記範囲とするには、例えばジルコニア微粒子前駆体を、電気炉を用いて焼成する際の温度、時間を調整することによって制御すればよい。
The reason why the average dispersed particle size of the zirconia fine particles is limited to 1 nm or more and 20 nm or less is that when the average dispersed particle size is less than 1 nm, the crystallinity of the primary particles forming the dispersed particles becomes poor, and the refractive index, etc. This is because it becomes difficult to express the particle characteristics. On the other hand, when the average dispersed particle diameter exceeds 20 nm, the translucency is lowered when the resin composite is used. The average dispersed particle size is preferably 2 nm or more and 15 nm or less.
The average primary particle size of the zirconia fine particles necessary for obtaining such a dispersed particle size is not particularly limited as long as it is smaller than the above dispersed particle size, but is preferably 1 nm or more and 15 nm or less, preferably 4 nm or more and 11 nm or less. It is more preferable that In order to make the average primary particle size within the above range, for example, it may be controlled by adjusting the temperature and time when the zirconia fine particle precursor is fired using an electric furnace.
本発明が微粒子材料としてジルコニアに限定した理由は、可視光線に対して透明性に優れかつ高い屈折率、高い光透過率、高い熱安定性、高い硬度、低い吸水率、低い光触媒活性、高い耐候性、耐溶剤性等を示すものであることが好ましいからである。 The reason why the present invention is limited to zirconia as the fine particle material is that it has excellent transparency to visible light and high refractive index, high light transmittance, high thermal stability, high hardness, low water absorption, low photocatalytic activity, and high weather resistance. It is because it is preferable to show a property, solvent resistance, etc.
一方、分散媒は、基本的には水、および水溶性の有機溶媒のうち1種または2種以上を含有したものである。
上記の有機溶媒としては、低級アルコールが好ましく、メタノール、エタノールが特に好ましい。その他の有機溶媒としては、エチレングリコール、ジメチルアセトアミド、N−メチルピロリドンが挙げられる。
On the other hand, the dispersion medium basically contains one or more of water and a water-soluble organic solvent.
As said organic solvent, a lower alcohol is preferable and methanol and ethanol are especially preferable. Examples of other organic solvents include ethylene glycol, dimethylacetamide, and N-methylpyrrolidone.
この有機酸含有ジルコニア微粒子分散液におけるジルコニア微粒子の含有率は、0.1質量%以上かつ50質量%以下が好ましく、1質量%以上かつ30質量%以下がより好ましい。
0.1質量%以上かつ50質量%以下とすることでジルコニア微粒子が良好な分散状態を取りうる。また、この範囲にあることで後述する有機系表面修飾剤で有機酸を置換する工程での収率が良好となり、かつ、ゲル化や凝集沈澱が生じ難くなり、分散液としての特徴を良好に維持できるからである。
The content of the zirconia fine particles in the organic acid-containing zirconia fine particle dispersion is preferably 0.1% by mass or more and 50% by mass or less, and more preferably 1% by mass or more and 30% by mass or less.
When the content is 0.1% by mass or more and 50% by mass or less, the zirconia fine particles can take a good dispersion state. Also, by being in this range, the yield in the step of substituting the organic acid with the organic surface modifier described later is good, and gelation and aggregation precipitation are difficult to occur, and the characteristics as a dispersion liquid are good. This is because it can be maintained.
[2.表面修飾ジルコニア微粒子分散液]
本実施形態の表面修飾ジルコニア微粒子分散液は、有機系表面修飾剤により表面が修飾された表面修飾ジルコニア微粒子と、分散媒と、有機酸化合物を含有する分散液である。
[2. Surface-modified zirconia fine particle dispersion]
The surface-modified zirconia fine particle dispersion of this embodiment is a dispersion containing surface-modified zirconia fine particles whose surface is modified with an organic surface modifier, a dispersion medium, and an organic acid compound.
有機系表面修飾剤としては、C−C結合やシロキサン結合を有する有機化合物であることが好ましく、このような有機化合物としては、アルコキシシラン化合物、シロキサン化合物、チタンカップリング剤の群から選択された1種または2種以上が好適に用いられる。これらの表面修飾剤のうち特に好ましいのは、アルコキシシラン化合物としてはシランカップリング剤であり、シロキサン化合物としては変性シリコーンである。 The organic surface modifier is preferably an organic compound having a C—C bond or a siloxane bond, and such an organic compound is selected from the group of alkoxysilane compounds, siloxane compounds, and titanium coupling agents. One or two or more are preferably used. Of these surface modifiers, a silane coupling agent is particularly preferable as the alkoxysilane compound, and a modified silicone is preferable as the siloxane compound.
シランカップリング剤としては、例えば、ビニルトリメトキシシラン、ビニルトリエトキシシラン、メチルトリメトキシシラン、ジメチルジメトキシシラン、トリメチルメトキシシラン、n−プロピルトリメトキシシラン、n−ブチルトリエトキシシラン、n−ヘキシルトリメトキシシラン、n−ヘキシルトリエトキシシラン、n−オクチルトリエトキシシラン、n−デシルトリメトキシシラン、フェニルトリメトキシシラン、ジフェニルジメトキシシラン、p−スチリルトリメトキシシラン、3−アミノプロピルトリメトキシシラン、3−アクリロキシプロピルトリメトキシシラン、3−(メタ)アクリロキシプロピルトリメトキシシラン、3−メルカプトプロピルトリメトキシシラン、3−メルカプトプロピルトリエトキシシラン等が挙げられる。 Examples of the silane coupling agent include vinyltrimethoxysilane, vinyltriethoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, trimethylmethoxysilane, n-propyltrimethoxysilane, n-butyltriethoxysilane, and n-hexyltri. Methoxysilane, n-hexyltriethoxysilane, n-octyltriethoxysilane, n-decyltrimethoxysilane, phenyltrimethoxysilane, diphenyldimethoxysilane, p-styryltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3- Examples include acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, and 3-mercaptopropyltriethoxysilane. It is.
変性シリコーンとしては、アルコキシ変性シリコーン、カルボキシ変性シリコーン、アルコール変性シリコーン、ポリエーテル変性シリコーン、エポキシ変性シリコーン、メルカプト変性シリコーン、アミノ変性シリコーン、(メタ)アクリレート変性シリコーン、ジメチルシリコーン、メチルハイドロジェンシリコーン等が挙げられる。
また、ビニル基および/またはケイ素原子に結合した官能基を有する変性シリコーンを用いると、ビニル基および/またはケイ素原子に結合した官能基が樹脂を硬化させる際の化学反応に寄与するので好ましい。
なお、本明細書において、「(メタ)アクリレート」とは、メタクリレート及びアクリレートの両方を意味する。
Examples of the modified silicone include alkoxy-modified silicone, carboxy-modified silicone, alcohol-modified silicone, polyether-modified silicone, epoxy-modified silicone, mercapto-modified silicone, amino-modified silicone, (meth) acrylate-modified silicone, dimethyl silicone, and methylhydrogen silicone. Can be mentioned.
Use of a modified silicone having a vinyl group and / or a functional group bonded to a silicon atom is preferred because the functional group bonded to the vinyl group and / or silicon atom contributes to a chemical reaction when the resin is cured.
In the present specification, “(meth) acrylate” means both methacrylate and acrylate.
チタンカップリング剤としては、例えば、イソプロピルトリイソステアロイルチタネート、イソプロピルジ(メタ)アクリルイソステアロイルチタネート、イソプロピルトリ(ドデシル)ベンゼンスルホニルチタネート、ネオペンチル(ジアリル)オキシ−トリ(ジオクチル)ホスフェイトチタネート、ネオペンチル(ジアリル)オキシ−トリネオドデカノイルチタネート等が挙げられる。 Examples of the titanium coupling agent include isopropyl triisostearoyl titanate, isopropyl di (meth) acryl isostearoyl titanate, isopropyl tri (dodecyl) benzenesulfonyl titanate, neopentyl (diallyl) oxy-tri (dioctyl) phosphate titanate, neopentyl ( Diallyl) oxy-trineodecanoyl titanate and the like.
表面が修飾されたジルコニア粒子の修飾部分の質量比は、粒子全体量の5質量%以上かつ200質量%以下であることが好ましく、10質量%以上かつ100質量%以下であることがより好ましく、20質量%以上かつ100質量%以下であることがさらに好ましい。
修飾部分の質量比が5質量%以上かつ200質量%以下であることで、ジルコニア粒子の樹脂への相溶が容易となり、ジルコニア微粒子の屈折率が表面修飾剤の屈折率に引きずられて、実質、ジルコニア微粒子の屈折率が低下することを防ぐことができる。
The mass ratio of the modified portion of the surface-modified zirconia particles is preferably 5% by mass or more and 200% by mass or less, more preferably 10% by mass or more and 100% by mass or less, based on the total amount of particles. More preferably, it is 20 mass% or more and 100 mass% or less.
When the mass ratio of the modified portion is 5% by mass or more and 200% by mass or less, the compatibility of the zirconia particles with the resin is facilitated, and the refractive index of the zirconia fine particles is dragged by the refractive index of the surface modifier. Moreover, it can prevent that the refractive index of zirconia microparticles | fine-particles falls.
後述のように、有機酸とアンモニアとの反応で得られる有機酸化合物としては、蟻酸アンモニウム、酢酸アンモニウム、プロピオン酸アンモニウム、酪酸アンモニウム等が含まれる。洗浄時の除去の容易性から蟻酸アンモニウム、プロピオン酸アンモニウム、酢酸アンモニウムが特に好ましい。 As will be described later, examples of the organic acid compound obtained by the reaction between an organic acid and ammonia include ammonium formate, ammonium acetate, ammonium propionate, and ammonium butyrate. Ammonium formate, ammonium propionate, and ammonium acetate are particularly preferred because of their ease of removal during washing.
有機酸化合物の含有量は、ジルコニア微粒子の質量に対して、3質量%未満とするが、0.001質量%以上かつ3質量%未満とすることが好ましく、0.001質量%以上かつ1質量%以下とすることがより好ましく、0.001質量%以上かつ0.5質量%以下とすることがさらに好ましい。
有機酸化合物の含有量が3質量%以上の場合は、表面修飾ジルコニア微粒子分散液と樹脂原料とを混合し、その後溶媒を除去して樹脂複合組成物を作製後に有機酸化合物が熱や光により分解または変質することで、この樹脂複合組成物の質量減少、変色が生じるおそれがある。なお、有機酸化合物は、後述の二次表面処理剤の反応を促進する触媒的な役割を果たす点で非常に有効である。このことは、有機酸化合物の含有量が0.001質量%未満となると、原因は定かではないが、当該二次表面処理の効率にバラツキが生じ得ることからも分かる。
The content of the organic acid compound is less than 3% by mass with respect to the mass of the zirconia fine particles, but is preferably 0.001% by mass or more and less than 3% by mass, 0.001% by mass or more and 1% by mass. % Or less, more preferably 0.001% by mass or more and 0.5% by mass or less.
When the content of the organic acid compound is 3% by mass or more, the surface-modified zirconia fine particle dispersion is mixed with the resin raw material, and then the solvent is removed to prepare the resin composite composition. By decomposing or changing the quality, there is a risk that the resin composite composition may be reduced in mass or discolored. The organic acid compound is very effective in that it plays a catalytic role for promoting the reaction of the secondary surface treatment agent described later. This can be seen from the fact that when the content of the organic acid compound is less than 0.001 mass%, the cause is not clear, but the efficiency of the secondary surface treatment may vary.
分散媒は、有機溶媒を用いることが好ましい。
上記の有機溶媒としては、例えば、メタノール、エタノール、2−プロパノール、ブタノール、オクタノール等のアルコール類、酢酸エチル、酢酸ブチル、乳酸エチル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、γ−ブチロラクトン等のエステル類、ジエチルエーテル、エチレングリコールモノメチルエーテル(メチルセロソルブ)、エチレングリコールモノエチルエーテル(エチルセロソルブ)、エチレングリコールモノブチルエーテル(ブチルセロソルブ)、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル等のエーテル類、アセトン、メチルエチルケトン、メチルイソブチルケトン、アセチルアセトン、シクロヘキサノン等のケトン類、ベンゼン、トルエン、キシレン、エチルベンゼン等の芳香族炭化水素、ジメチルホルムアミド、N,N−ジメチルアセトアセトアミド、N−メチルピロリドン等のアミド類が好適に用いられ、これらの溶媒のうち1種または2種以上を用いることができる。
The dispersion medium is preferably an organic solvent.
Examples of the organic solvent include alcohols such as methanol, ethanol, 2-propanol, butanol, and octanol, ethyl acetate, butyl acetate, ethyl lactate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, and γ-butyrolactone. Esters such as diethyl ether, ethylene glycol monomethyl ether (methyl cellosolve), ethylene glycol monoethyl ether (ethyl cellosolve), ethylene glycol monobutyl ether (butyl cellosolve), ethers such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, acetone, Methyl ethyl ketone, methyl isobutyl ketone, acetylacetone, cyclohexanone, etc. Amides, aromatic hydrocarbons such as benzene, toluene, xylene and ethylbenzene, and amides such as dimethylformamide, N, N-dimethylacetoacetamide and N-methylpyrrolidone are preferably used. One of these solvents or Two or more kinds can be used.
分散液中には、さらに液状の樹脂モノマーや液状の樹脂オリゴマーといった樹脂原料を含んでもよい。
上記の液状の樹脂モノマーとしては、アクリル酸メチル、メタクリル酸メチル等のアクリル系またはメタクリル系のモノマー、エポキシ系モノマー等が好適に用いられる。
また、上記の液状の樹脂オリゴマーとしては、ウレタンアクリレート系オリゴマー、エポキシアクリレート系オリゴマー、アクリレート系オリゴマー等が好適に用いられる。
The dispersion may further contain a resin raw material such as a liquid resin monomer or a liquid resin oligomer.
As the liquid resin monomer, acrylic or methacrylic monomers such as methyl acrylate and methyl methacrylate, and epoxy monomers are preferably used.
Moreover, as said liquid resin oligomer, a urethane acrylate oligomer, an epoxy acrylate oligomer, an acrylate oligomer, etc. are used suitably.
この表面修飾ジルコニア微粒子分散液における表面修飾ジルコニア微粒子の含有率は、10質量%以上かつ80質量%以下が好ましく、10質量%以上かつ50質量%以下がより好ましい。
ジルコニア微粒子の含有率が10質量%以上かつ80質量%以下であることでジルコニア微粒子を良好な分散状態とすることができる。また、ジルコニア微粒子としての効果を維持し、かつ、ゲル化や凝集沈澱が生じ難くなり、分散液としての特徴を維持することができる。
The content of the surface-modified zirconia fine particles in the surface-modified zirconia fine particle dispersion is preferably 10% by mass to 80% by mass, and more preferably 10% by mass to 50% by mass.
A zirconia fine particle can be made into a favorable dispersion state because the content rate of a zirconia fine particle is 10 mass% or more and 80 mass% or less. Moreover, the effect as a zirconia microparticle is maintained, and it becomes difficult to produce gelatinization and aggregation precipitation, and the characteristic as a dispersion liquid can be maintained.
この表面修飾ジルコニア微粒子分散液は、その特性を損なわない範囲において、他の無機酸化物粒子、分散剤、分散助剤、カップリング剤、帯電防止剤、樹脂ポリマー等を含有していてもよい。他の無機酸化物粒子としては、酸化チタン(TiO2)、酸化亜鉛(ZnO)、酸化セリウム(CeO2)、酸化スズ(SnO2)、アンチモン添加酸化スズ(ATO)、スズ添加酸化インジウム(ITO)等が挙げられる。 This surface-modified zirconia fine particle dispersion may contain other inorganic oxide particles, a dispersant, a dispersion aid, a coupling agent, an antistatic agent, a resin polymer, and the like as long as the characteristics are not impaired. Other inorganic oxide particles include titanium oxide (TiO 2 ), zinc oxide (ZnO), cerium oxide (CeO 2 ), tin oxide (SnO 2 ), antimony-added tin oxide (ATO), tin-added indium oxide (ITO) ) And the like.
また、本発明に係る有機酸含有ジルコニア微粒子分散液と同様に、表面修飾ジルコニア微粒子におけるジルコニア微粒子の平均分散粒径は1nm以上かつ20nm以下であり、その意義や好ましい範囲等も同様である。 Further, like the organic acid-containing zirconia fine particle dispersion according to the present invention, the average dispersed particle size of the zirconia fine particles in the surface-modified zirconia fine particles is 1 nm or more and 20 nm or less, and the meaning, preferred range, and the like are also the same.
[3.樹脂複合組成物]
本実施形態の樹脂複合組成物は、本発明に係る表面修飾ジルコニア微粒子分散液と、樹脂原料とを混合した後に、分散媒を除去した、未硬化の樹脂複合組成物である。
樹脂としては、可視光線、あるいは近赤外線、近紫外線等の所定の波長帯域の光に対して透明性を有する樹脂であればよく、例えば、これらの透明性を有する樹脂を形成するための熱硬化性、可視光線や紫外線や赤外線等による光(電磁波)硬化性、電子線照射による電子線硬化性等の硬化性樹脂原料が好適に用いられる。また、透明性を有する樹脂として熱可塑性樹脂を用いることもできる。
[3. Resin composite composition]
The resin composite composition of the present embodiment is an uncured resin composite composition obtained by mixing the surface-modified zirconia fine particle dispersion according to the present invention and a resin raw material, and then removing the dispersion medium.
The resin may be a resin having transparency with respect to light in a predetermined wavelength band such as visible light, near-infrared light, near-ultraviolet light, etc., for example, thermosetting for forming these transparent resins. Curable resin raw materials such as curable resin, light (electromagnetic wave) curable by visible light, ultraviolet light, infrared light, and the like, and electron beam curable by electron beam irradiation are preferably used. A thermoplastic resin can also be used as the resin having transparency.
この透明性樹脂としては、例えば、ポリメチルメタクリレート(PMMA)、ポリシクロヘキシルメタクリレート等のアクリレート、ポリカーボネート(PC)、ポリスチレン(PS)、ポリエーテル、ポリエステル、ポリアリレート、ポリアクリル酸エステル、ポリアミド、フェノール−ホルムアルデヒド(フェノール樹脂)、ジエチレングリコールビスアリルカーボネート、アクリロニトリル・スチレン共重合体(AS樹脂)、メチルメタクレート・スチレン共重合体(MS樹脂)、ポリ−4−メチルペンテン、ノルボルネン系ポリマー、ポリウレタン、エポキシ、シリコーン等が挙げられ、特に、シリコーン樹脂、エポキシ樹脂、(メタ)アクリレート樹脂、ポリカーボネート樹脂の群から選択される1種または2種以上を含有してなることが好ましい。 Examples of the transparent resin include acrylates such as polymethyl methacrylate (PMMA) and polycyclohexyl methacrylate, polycarbonate (PC), polystyrene (PS), polyether, polyester, polyarylate, polyacrylate, polyamide, phenol- Formaldehyde (phenolic resin), diethylene glycol bisallyl carbonate, acrylonitrile / styrene copolymer (AS resin), methyl methacrylate / styrene copolymer (MS resin), poly-4-methylpentene, norbornene polymer, polyurethane, epoxy, Silicone, etc. are mentioned, and in particular, it contains one or more selected from the group of silicone resins, epoxy resins, (meth) acrylate resins, and polycarbonate resins. It is preferable.
ここで、上記の透明性樹脂のうち、熱硬化性樹脂である、アクリレート樹脂、シリコーン樹脂及びエポキシ樹脂について詳細に説明する。 Here, acrylate resin, silicone resin, and epoxy resin which are thermosetting resins among said transparent resin are demonstrated in detail.
(アクリレート樹脂)
アクリレート樹脂としては、種々の単官能アクリレートおよび/または多官能アクリレートが用いられ、これらのうち1種または2種以上が用いられる。単官能アクリレート及び多官能アクリレートそれぞれの具体例について次に挙げる。
(Acrylate resin)
As the acrylate resin, various monofunctional acrylates and / or polyfunctional acrylates are used, and one or more of these are used. Specific examples of the monofunctional acrylate and the polyfunctional acrylate will be described below.
(a)脂肪族単官能(メタ)アクリレートとしては、ブチル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート等のアルキル(メタ)アクリレート、メトキシプロピレングリコール(メタ)アクリレート、エトキシジエチレングリコール(メタ)アクリレート等のアルコキシアルキレングリコール(メタ)アクリレート、(メタ)アクリルアミド、N−ブトキシメチル(メタ)アクリルアミド等のN−置換アクリルアミド等が挙げられる。 (A) Aliphatic monofunctional (meth) acrylates include alkyl (meth) acrylates such as butyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, methoxypropylene glycol (meth) acrylate, ethoxydiethylene glycol ( Examples include alkoxyalkylene glycol (meth) acrylates such as (meth) acrylate, N-substituted acrylamides such as (meth) acrylamide, and N-butoxymethyl (meth) acrylamide.
(b)脂肪族多官能(メタ)アクリレートとしては、1,6−ヘキサンジオールジ(メタ)アクリレート、1,4−ブタンジオールジ(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、テトラエチレングリコールジ(メタ)アクリレート、トリプロピレングリコールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート、ポリブタンジオールジ(メタ)アクリレート、等のアルキレングリコールジ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート等のトリ(メタ)アクリレートペンタエリスリトールテトラ(メタ)アクリレート、ジ−トリメチロールプロパンテトラアクリレート等のテトラ(メタ)アクリレートジペンタエリスリトール(モノヒドロキシ)ペンタアクリレート等のペンタ(メタ)アクリレート、及び、これらをエチレンオキサイド又はプロピレンオキサイドで変性した(メタ)アクリレート等が挙げられる。 (B) As aliphatic polyfunctional (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) ) Acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, polybutanediol Di (meth) acrylate, alkylene glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, trimethylol propylene Penta (meth) acrylates such as tri (meth) acrylate pentaerythritol tetra (meth) acrylate such as tri (meth) acrylate, tetra (meth) acrylate dipentaerythritol (monohydroxy) pentaacrylate such as di-trimethylolpropane tetraacrylate And (meth) acrylate modified with ethylene oxide or propylene oxide.
(c)脂環式(メタ)アクリレートのうち、単官能型としては、シクロヘキシル(メタ)アクリレート等が、また、多官能型としては、ジシクロペンタジエニルジ(メタ)アクリレート等が挙げられる。 (C) Among the alicyclic (meth) acrylates, the monofunctional type includes cyclohexyl (meth) acrylate, and the polyfunctional type includes dicyclopentadienyl di (meth) acrylate.
(d)芳香族(メタ)アクリレートのうち、単官能型としては、フェニル(メタ)アクリレート、ベンジル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、フェノキシジエチレングリコール(メタ)アクリレート等が、また、多官能型としては、ビスフェノールAジ(メタ)アクリレート等のジアクリレート類、ビスフェノールFジ(メタ)アクリレート等が挙げられる。 (D) Among aromatic (meth) acrylates, monofunctional types include phenyl (meth) acrylate, benzyl (meth) acrylate, phenoxyethyl (meth) acrylate, phenoxydiethylene glycol (meth) acrylate, and the like. Examples of the mold include diacrylates such as bisphenol A di (meth) acrylate, bisphenol F di (meth) acrylate, and the like.
(e)ポリウレタン(メタ)アクリレートとしては、ポリウレタンエーテル(メタ)アクリレート、ポリエステル(メタ)アクリレート等が挙げられる。
(f)エポキシ(メタ)アクリレートとしては、ビスフェノールA型エポキシアクリレート、ノボラック型エポキシアクリレート等が挙げられる。
(E) Examples of the polyurethane (meth) acrylate include polyurethane ether (meth) acrylate and polyester (meth) acrylate.
(F) Examples of the epoxy (meth) acrylate include bisphenol A type epoxy acrylate and novolac type epoxy acrylate.
また、適宜用いられるラジカル重合開始剤としては、ラウロイルパーオキサイド、ベンゾイルパーオキサイド、ジ−t−ブチルパーオキサイド、t−ブチルパーオキシ−2−エチルヘキサノエート、t−ブチルパーオキシイソブチレート、t−ブチルパーオキシピバレート、t−ブチルパーオキシベンゾエート、t−ブチルパーオキシアセテート等の過酸化物系重合開始剤、あるいは2,2’−アゾビスイソブチロニトリル等のアゾ系重合開始剤が挙げられる。 Moreover, as a radical polymerization initiator used suitably, lauroyl peroxide, benzoyl peroxide, di-t-butyl peroxide, t-butylperoxy-2-ethylhexanoate, t-butylperoxyisobutyrate, Peroxide polymerization initiators such as t-butyl peroxypivalate, t-butyl peroxybenzoate and t-butyl peroxyacetate, or azo polymerization initiators such as 2,2′-azobisisobutyronitrile Is mentioned.
(シリコーン樹脂)
シリコーン樹脂は、少なくとも下記の(a)〜(c)の成分から構成されることが好ましい。
(a)1分子中のケイ素原子に結合した官能基のうち少なくとも2つがアルケニル基であるオルガノポリシロキサン
(b)1分子中のケイ素原子に結合した官能基のうち少なくとも2つが水素原子であるか、または分子鎖の両端が水素原子で封鎖された直鎖状のオルガノポリシロキサン
(c)ヒドロシリル化反応用触媒
(Silicone resin)
The silicone resin is preferably composed of at least the following components (a) to (c).
(A) Organopolysiloxane in which at least two functional groups bonded to silicon atoms in one molecule are alkenyl groups (b) Whether at least two functional groups bonded to silicon atoms in one molecule are hydrogen atoms Or a linear organopolysiloxane (c) hydrosilylation catalyst in which both ends of the molecular chain are blocked with hydrogen atoms
(a)成分中のアルケニル基としては、ビニル基、アリル基、ペンテニル基、ヘキセニル基等が挙げられ、特に、ビニル基が好ましい。
また、このアルケニル基以外のケイ素原子に結合した官能基としては、メチル基、エチル基、プロピル基、ブチル基等のアルキル基、フェニル基、トリル基等のアリール基、ベンジル基、フェネチル基等のアラルキル基等が挙げられ、特に、メチル基が好ましい。
(A) As an alkenyl group in a component, a vinyl group, an allyl group, a pentenyl group, a hexenyl group etc. are mentioned, Especially a vinyl group is preferable.
Examples of functional groups bonded to silicon atoms other than alkenyl groups include alkyl groups such as methyl, ethyl, propyl, and butyl groups, aryl groups such as phenyl and tolyl groups, benzyl groups, and phenethyl groups. Examples thereof include an aralkyl group, and a methyl group is particularly preferable.
(b)成分中の水素原子以外のケイ素原子に結合した官能基としては、メチル基、エチル基、プロピル基、ブチル基等のアルキル基、フェニル基、トリル基等のアリール基、ベンジル基、フェネチル基等のアラルキル基等が挙げられ、特に、メチル基が好ましい。
また、(b)成分の含有量は、(a)成分に含まれている合計アルケニル基1モルに対して水素原子が0.1〜10モルの範囲内となる量であることが好ましく、0.1〜5モルの範囲内となる量であることが好ましく、0.5〜2モルの範囲内となる量であることがさらに好ましい。
(B) Functional groups bonded to silicon atoms other than hydrogen atoms in the component include alkyl groups such as methyl group, ethyl group, propyl group and butyl group, aryl groups such as phenyl group and tolyl group, benzyl group and phenethyl. And an aralkyl group such as a group, and a methyl group is particularly preferable.
In addition, the content of the component (b) is preferably an amount such that the hydrogen atoms are in the range of 0.1 to 10 mol with respect to 1 mol of the total alkenyl groups contained in the component (a). The amount is preferably in the range of 1 to 5 mol, and more preferably in the range of 0.5 to 2 mol.
(c)成分のヒドロシリル化反応用触媒は、(a)成分中のアルケニル基と、(b)成分中のケイ素原子に結合した水素原子とのヒドロシリル化反応を促進するための触媒である。このような触媒としては、例えば、白金系触媒、ロジウム系触媒、パラジウム系触媒等が挙げられ、特に、白金系触媒が好ましい。
この白金系触媒としては、白金微粉末、塩化白金酸、白金−オレフィン錯体、白金カルボニル錯体等が挙げられ、特に、塩化白金酸が好ましい。
The catalyst for hydrosilylation reaction of component (c) is a catalyst for promoting a hydrosilylation reaction between an alkenyl group in component (a) and a hydrogen atom bonded to a silicon atom in component (b). Examples of such a catalyst include platinum-based catalysts, rhodium-based catalysts, palladium-based catalysts, and the like, and platinum-based catalysts are particularly preferable.
Examples of the platinum-based catalyst include fine platinum powder, chloroplatinic acid, platinum-olefin complex, platinum carbonyl complex and the like, and chloroplatinic acid is particularly preferable.
また、(c)成分の使用量は、本組成物の硬化を促進させることのできる量、すなわち(a)成分中のアルケニル基と(b)成分中のケイ素原子に結合した水素原子とのヒドロシリル化反応を促進させることのできる量であればよく、特に限定されることはないが、具体的には、本組成物に対して本成分中の金属原子が質量単位で0.01〜500ppmの範囲内であることが好ましく、0.01〜50ppmの範囲内であることがより好ましい。 The amount of component (c) used is an amount capable of promoting the curing of the composition, that is, hydrosilyl of an alkenyl group in component (a) and a hydrogen atom bonded to a silicon atom in component (b). There is no particular limitation as long as it is an amount capable of promoting the chemical reaction, and specifically, the metal atom in the present component is 0.01 to 500 ppm by mass relative to the present composition. It is preferably within the range, and more preferably within the range of 0.01 to 50 ppm.
使用量を0.01〜500ppmの範囲とすることで、本組成物が十分に硬化しやすくなり、かつ、得られた硬化物に着色等の問題が生じにくくなる。
このシリコーン樹脂については、本発明の目的を損なわないかぎり、その他任意の成分として、耐熱剤、染料、顔料、難燃性付与剤等を含有してもよい。
By setting the amount to be used in the range of 0.01 to 500 ppm, the present composition is sufficiently cured, and problems such as coloring are hardly generated in the obtained cured product.
About this silicone resin, unless the objective of this invention is impaired, you may contain a heat-resistant agent, dye, a pigment, a flame retardance imparting agent, etc. as other arbitrary components.
(エポキシ樹脂)
エポキシ樹脂としては、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、水素添加ビスフェノールA型エポキシ樹脂、ビフェニル型エポキシ樹脂等の2官能型のグリシジルエーテル型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、オルソクレゾールノボラック型エポキシ樹脂、アルキル変性トリフェノールメタン型エポキシ樹脂、トリス・ヒドロキシフェニルメタン型エポキシ樹脂、テトラフェニロールエタン型エポキシ樹脂等の多官能型のグリシジルエーテル型エポキシ樹脂、テトラグリシジルジアミノジフェニルメタン型エポキシ樹脂、トリグリシジルイソシアヌレート型エポキシ樹脂、アミノフェノール型エポキシ樹脂、アニリン型エポキシ樹脂、トルイジン型エポキシ樹脂等のグリシジルアミン型エポキシ樹脂等が好適に用いられる。
(Epoxy resin)
Epoxy resins include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, hydrogenated bisphenol A type epoxy resin, biphenyl type epoxy resin, and other bifunctional glycidyl ether type epoxy resins, phenol novolac type Polyfunctional glycidyl ether type epoxy resin such as epoxy resin, orthocresol novolac type epoxy resin, alkyl-modified triphenolmethane type epoxy resin, tris-hydroxyphenylmethane type epoxy resin, tetraphenylolethane type epoxy resin, tetraglycidyl diamino Diphenylmethane type epoxy resin, triglycidyl isocyanurate type epoxy resin, aminophenol type epoxy resin, aniline type epoxy resin, toluidine type epoxy Glycidyl amine type epoxy resins such as a resin is preferably used.
エポキシ樹脂の硬化剤としては、重付加型、触媒型、縮合型のいずれのタイプのものでも使用可能であり、例えば、ジアミノジフェニルメタン、ジアミノジフェニルスルホン、ポリアミド、ジシアンジアミド、ジエチレントリアミン、トリエチレンテトラミン、ヘキサヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、フェノール樹脂等が挙げられる。 As a curing agent for epoxy resin, any of polyaddition type, catalyst type and condensation type can be used. For example, diaminodiphenylmethane, diaminodiphenylsulfone, polyamide, dicyandiamide, diethylenetriamine, triethylenetetramine, hexahydro anhydride Examples include phthalic acid, methyltetrahydrophthalic anhydride, and phenol resin.
また、上述のアクリレート樹脂、シリコーン樹脂、エポキシ樹脂に対しては、その特性を損なわない範囲において、酸化防止剤、離型剤、カップリング剤、帯電防止剤、無機充填剤等を添加してもよい。 In addition, an antioxidant, a release agent, a coupling agent, an antistatic agent, an inorganic filler, etc. may be added to the acrylate resin, silicone resin, and epoxy resin as long as the characteristics are not impaired. Good.
この樹脂複合組成物におけるジルコニア微粒子の含有率は、10質量%以上かつ80質量%以下が好ましく、30質量%以上かつ80質量%以下がより好ましい。
含有率が10質量%以上かつ80質量%以下であることで、有効な屈折率の向上が認められ、かつ、樹脂自体の特性(柔軟性、比重)を維持することができる。
The content of the zirconia fine particles in the resin composite composition is preferably 10% by mass to 80% by mass, and more preferably 30% by mass to 80% by mass.
When the content is 10% by mass or more and 80% by mass or less, an effective improvement in refractive index is recognized, and the characteristics (flexibility and specific gravity) of the resin itself can be maintained.
[4.各態様の製造方法等]
次に本実施形態に係る分散液及び樹脂複合組成物の製造方法等について説明する。
[4. Manufacturing method of each aspect]
Next, a method for producing a dispersion and a resin composite composition according to this embodiment will be described.
(ジルコニア微粒子の製造方法)
本実施形態に係るジルコニア微粒子の製造方法は、平均一次粒径が1nm以上かつ15nm以下で、結晶性のジルコニア微粒子が得られれば特に制限はなく、例えば、特許第5434665号公報で開示されるような公知の技術を用いることができる。
ただし、特許第5434665号公報のような塩酸化合物を出発原料に持つ場合は、設備や部材の腐食を防ぐ意味から、塩素の含有量を100ppm以下まで除去することが好ましい。塩素除去は、例えば限外濾過装置等で可能である。
(Method for producing zirconia fine particles)
The method for producing zirconia fine particles according to the present embodiment is not particularly limited as long as crystalline zirconia fine particles can be obtained with an average primary particle size of 1 nm or more and 15 nm or less. For example, as disclosed in Japanese Patent No. 5434665. Any known technique can be used.
However, when a hydrochloric acid compound such as Japanese Patent No. 5434665 is used as a starting material, it is preferable to remove the chlorine content to 100 ppm or less in order to prevent corrosion of equipment and members. Chlorine removal can be performed with, for example, an ultrafiltration device.
(有機酸含有ジルコニア微粒子分散液の製造方法)
本実施形態に係る有機酸含有ジルコニア微粒子分散液は、平均分散粒径が1nm以上かつ20nm以下であるジルコニア微粒子と、有機酸と、分散媒とを混合し、ビーズミル等で分散処理を行うことで得ることができる。
また特開2009−298658号公報のように、塩酸等の無機酸でジルコニア微粒子を分散させた後に、有機酸を添加してもよい。
(Method for producing organic acid-containing zirconia fine particle dispersion)
The organic acid-containing zirconia fine particle dispersion according to this embodiment is obtained by mixing zirconia fine particles having an average dispersed particle diameter of 1 nm or more and 20 nm or less, an organic acid, and a dispersion medium, and performing a dispersion treatment using a bead mill or the like. Can be obtained.
Further, as disclosed in JP-A-2009-298658, an organic acid may be added after dispersing zirconia fine particles with an inorganic acid such as hydrochloric acid.
(表面修飾ジルコニア微粒子分散液の製造方法)
本実施形態に係る表面修飾ジルコニア微粒子分散液の製造方法は、以下の工程を含む。
(1)本発明に係る有機酸含有ジルコニア微粒子分散液に、有機系表面修飾剤を添加し、ジルコニア微粒子表面の有機酸を有機系表面修飾剤で置換する工程。
(2)工程(1)後の分散液に、アンモニアもしくはアミンを添加し、pHを7.5以上に調整することで、含有する有機酸を有機酸化合物とする工程。
(3)工程(2)後の分散液に固液分離処理を行い、得られた表面修飾ジルコニア微粒子ケーキに洗浄処理を行う工程。
(4)工程(3)で得られた前記表面修飾ジルコニア微粒子ケーキを乾燥し、その後分散媒に再分散させる工程。
以下、各工程について説明する。
(Method for producing surface-modified zirconia fine particle dispersion)
The method for producing a surface-modified zirconia fine particle dispersion according to this embodiment includes the following steps.
(1) A step of adding an organic surface modifier to the organic acid-containing zirconia fine particle dispersion according to the present invention and replacing the organic acid on the surface of the zirconia fine particles with the organic surface modifier.
(2) A step of adding organic acid to the organic acid compound by adding ammonia or amine to the dispersion liquid after step (1) and adjusting pH to 7.5 or higher.
(3) A step of subjecting the dispersion after step (2) to a solid-liquid separation treatment and washing the resulting surface-modified zirconia fine particle cake.
(4) A step of drying the surface-modified zirconia fine particle cake obtained in step (3) and then redispersing it in a dispersion medium.
Hereinafter, each step will be described.
工程(1):
上述したとおり、本実施形態に係る有機酸含有ジルコニア微粒子分散液に含有されるジルコニア微粒子には、ギ酸や酢酸等の有機酸が吸着しており、ジルコニア微粒子は単粒子に近い形で分散媒に分散している。
Step (1):
As described above, organic acids such as formic acid and acetic acid are adsorbed to the zirconia fine particles contained in the organic acid-containing zirconia fine particle dispersion according to this embodiment, and the zirconia fine particles are used as a dispersion medium in a form close to a single particle. Is distributed.
この有機酸含有ジルコニア微粒子分散液に有機系表面修飾剤を添加すると、ジルコニア微粒子表面に吸着した有機酸は容易に有機系表面修飾剤と置換反応を起こし、ジルコニア微粒子表面は徐々に有機系表面修飾剤で修飾され、表面の疎水化が進み、表面修飾されたジルコニア微粒子は凝集し徐々に沈降していく。 When an organic surface modifier is added to this organic acid-containing zirconia fine particle dispersion, the organic acid adsorbed on the surface of the zirconia fine particles easily undergoes a substitution reaction with the organic surface modifier, and the surface of the zirconia fine particles is gradually modified with the organic surface The surface is modified with an agent, and the surface becomes more hydrophobic, and the surface-modified zirconia fine particles aggregate and gradually settle.
ここで、ジルコニア微粒子表面に吸着した有機酸がない場合、ジルコニア微粒子表面の水酸基同士がジルコニア微粒子の凝集に伴い、相互作用を起こし、強固な凝集体を形成するため、重なり合った粒子間の表面修飾反応が進まず、ジルコニア微粒子は不完全な表面修飾状態で修飾反応が終息し、後述する再分散後の分散状態に劣る分散液しか得られない。また、このような不完全な表面修飾状態のジルコニア微粒子は、表面に水酸基等が多く露出し、樹脂複合組成物とした場合に、粒子間や樹脂原料との相互作用により、粘度が上昇し、ハンドリング性を著しく低下させる要因となる。
これに対し、ジルコニア微粒子表面に吸着した有機酸がある場合、ジルコニア微粒子は凝集しても相互作用を起こす基が表面になく、ゆるい凝集体を形成する為、重なり合った粒子間の表面修飾反応も阻害されにくく、理想的な表面修飾状態のジルコニア微粒子が得られる。このため、後述する再分散において分散状態に優れる分散液が得られるのである。
Here, when there is no organic acid adsorbed on the surface of the zirconia fine particles, the hydroxyl groups on the surface of the zirconia fine particles interact with each other as the zirconia fine particles are aggregated to form a strong aggregate. The reaction does not proceed and the zirconia fine particles finish the modification reaction in an incomplete surface modification state, and only a dispersion liquid inferior to the dispersion state after redispersion described later can be obtained. In addition, such incomplete surface-modified zirconia fine particles are exposed to a large amount of hydroxyl groups on the surface, and when the resin composite composition is used, the viscosity increases due to the interaction between the particles and the resin raw material. It becomes a factor which reduces handling property remarkably.
On the other hand, when there is an organic acid adsorbed on the surface of the zirconia fine particles, the zirconia fine particles form a loose agglomerate because there are no groups on the surface that cause an interaction even when agglomerated, so surface modification reaction between the overlapping particles also occurs. Zirconia fine particles with an ideal surface modification state are obtained that are not easily inhibited. For this reason, the dispersion liquid which is excellent in the dispersion state in redispersion described later is obtained.
工程(2):
本実施形態に係る表面修飾ジルコニア微粒子分散液の製造方法では、有機系表面修飾剤で表面修飾されたジルコニア微粒子と、溶媒が混合された分散液に、アンモニアもしくはアミンを添加し、pHを7.5以上に調整することで、有機系表面修飾剤の反応を促進させ、かつ有機系表面修飾剤と置換されずに残ったジルコニア微粒子表面に吸着した有機酸を、アンモニウム塩として容易に除去することができる。
なお、有機系表面修飾剤でジルコニア微粒子を表面修飾する際に、アンモニアを添加する方法は例えば特許第5176380号公報に記載のような方法が挙げられる。
Step (2):
In the method for producing a surface-modified zirconia fine particle dispersion according to this embodiment, ammonia or an amine is added to a dispersion in which a zirconia fine particle surface-modified with an organic surface modifier and a solvent are mixed, and the pH is set to 7. By adjusting to 5 or more, the reaction of the organic surface modifier is promoted, and the organic acid adsorbed on the surface of the zirconia fine particles remaining without being replaced with the organic surface modifier is easily removed as an ammonium salt. Can do.
In addition, when surface-modifying the zirconia microparticles with an organic surface modifier, for example, a method described in Japanese Patent No. 5176380 can be given as a method for adding ammonia.
この段階では、ジルコニア微粒子表面に吸着した有機酸を除去しても、有機系表面修飾剤による立体障害ができているため、有機酸を除去後に生成するジルコニア微粒子表面の水酸基の相互作用は起こらず、問題はない。 At this stage, even if the organic acid adsorbed on the surface of the zirconia fine particles is removed, there is steric hindrance due to the organic surface modifier. ,No problem.
アンモニアもしくはアミン添加により調整するpHを7.5以上に限定した理由は、pH7.5未満ではジルコニア微粒子表面に吸着した有機酸の除去が十分に行えず、残留する有機酸によって、樹脂複合体作製後に有機酸が熱や光により脱離または変質することで、樹脂複合体の質量減少や変形、変色が生じるためである。
なお、アミンとしては脂肪族アミン、例えば、メチルアミン、エチルアミン、プロピルアミン、ブチルアミン、ヘキシルアミン、デシルアミン、トリデシルアミン、ドデシルアミン、オクチルアミン、ノニルアミン、ジメチルドデシルアミン、ジメチルヘキサデシルアミン、ジメチルオクタデシルアミン等が挙げられるが、取り扱い性の観点からアンモニアが好ましい。
The reason why the pH adjusted by adding ammonia or amine is limited to 7.5 or more is that if the pH is less than 7.5, the organic acid adsorbed on the surface of the zirconia fine particles cannot be sufficiently removed, and the resin complex is produced by the remaining organic acid. This is because the organic acid is later desorbed or denatured by heat or light, resulting in a decrease in mass, deformation, or discoloration of the resin composite.
The amine is an aliphatic amine such as methylamine, ethylamine, propylamine, butylamine, hexylamine, decylamine, tridecylamine, dodecylamine, octylamine, nonylamine, dimethyldodecylamine, dimethylhexadecylamine, dimethyloctadecylamine. Among them, ammonia is preferable from the viewpoint of handleability.
工程(3):
当該工程は、工程(2)後の分散液に固液分離処理を行い、得られた表面修飾ジルコニア微粒子ケーキに洗浄処理を行う工程である。
固液分離後の表面修飾ジルコニア微粒子ケーキの洗浄処理(有機酸化合物の除去)には、水やメタノール、エタノール等の低級アルコール等の溶媒を使用することが好ましい。
Step (3):
The said process is a process of performing a solid-liquid separation process to the dispersion liquid after a process (2), and performing the washing process to the obtained surface modification zirconia fine particle cake.
For the washing treatment (removal of organic acid compound) of the surface-modified zirconia fine particle cake after solid-liquid separation, it is preferable to use a solvent such as water, lower alcohols such as methanol and ethanol.
洗浄後の有機酸化合物の含有量は、ジルコニア微粒子の質量に対して、3質量%未満とし、0.001質量%以上かつ3質量%未満が好ましく、0.001質量%以上かつ1質量%以下がより好ましく、0.001質量%以上かつ0.5質量%以下がさらに好ましい。 The content of the organic acid compound after washing is less than 3% by mass with respect to the mass of the zirconia fine particles, preferably 0.001% by mass or more and less than 3% by mass, 0.001% by mass or more and 1% by mass or less. Is more preferable, and 0.001 mass% or more and 0.5 mass% or less are further more preferable.
工程(4):
当該工程(4)は、上述した工程(3)で得られた表面修飾ジルコニア微粒子ケーキから水分等の揮発成分を除去し、分散媒に分散させやすくするとともに、遊離する有機酸やアンモニアを除去するための工程である。
Step (4):
The said process (4) removes volatile components, such as a water | moisture content, from the surface modification zirconia fine particle cake obtained by the process (3) mentioned above, makes it easy to disperse | distribute to a dispersion medium, and removes the free organic acid and ammonia. Process.
表面修飾ジルコニア微粒子ケーキの乾燥には、特に限定されないが、エバポレーターや温風乾燥機、真空加熱乾燥器等の乾燥装置を用いて行われる。
乾燥温度は100℃以上かつ250℃以下が好ましい。100℃以上かつ250℃以下とすることで、未揮発の水分が多く残留するのを防ぎ、分散媒への分散性、分散安定性を良好なものとすることができる。また、表面修飾剤が熱で変質し、分散性、分散安定性の悪化及び変色等も防ぐことができる。
なお、分散媒は既述のものを適宜用いることができる。分散後の分散液中の表面修飾ジルコニア微粒子の濃度は、1質量%以上かつ70質量%とすることが好ましく、1質量%以上かつ50質量%とすることがより好ましい。
Although it does not specifically limit in drying of a surface modification zirconia fine particle cake, It is performed using drying apparatuses, such as an evaporator, a warm air dryer, and a vacuum heating dryer.
The drying temperature is preferably 100 ° C. or higher and 250 ° C. or lower. By setting the temperature to 100 ° C. or more and 250 ° C. or less, it is possible to prevent a large amount of non-volatile water from remaining and to improve the dispersibility in the dispersion medium and the dispersion stability. Further, the surface modifier is denatured by heat, and it is possible to prevent dispersibility, deterioration of dispersion stability, discoloration, and the like.
In addition, the above-mentioned dispersion medium can be appropriately used. The concentration of the surface-modified zirconia fine particles in the dispersion after dispersion is preferably 1% by mass or more and 70% by mass, and more preferably 1% by mass or more and 50% by mass.
(二次表面処理工程)
本実施形態に係る表面修飾ジルコニア微粒子分散液の製造方法では、複合化する樹脂原料の特性に合わせて二次表面処理を行ってもよい。二次表面処理の方法については、特許第5012230号公報の方法で行うことができる。また二次表面処理の後に更に三次表面処理を行ってもよい。
(Secondary surface treatment process)
In the method for producing a surface-modified zirconia fine particle dispersion according to this embodiment, a secondary surface treatment may be performed in accordance with the characteristics of the resin raw material to be combined. About the method of secondary surface treatment, it can carry out by the method of patent 5012230 gazette. Further, a tertiary surface treatment may be further performed after the secondary surface treatment.
(樹脂複合組成物及び樹脂複合体の製造方法)
本実施形態に係る樹脂複合組成物は、本発明に係る表面修飾ジルコニア微粒子分散液と樹脂原料を、ミキサー等を用いて攪拌混合し、真空乾燥等により溶媒を除去して製造される。
本実施形態に係る樹脂複合体は、本発明に係る樹脂複合組成物を用いて製造することができる。当該樹脂複合体の製造方法は、本発明に係る樹脂組成物を金型やパッケージ等に充填し、硬化させればよい。硬化方法としては、使用する樹脂原料や硬化触媒等に合わせて適宜選択すればよく特に限定されないが、例えば加熱による熱硬化方法、紫外線等の照射による光硬化方法等を用いてよい。形状として代表的な例は、微小な凸レンズ部が形成された成形体や、カップ状のパッケージに充填させたLED封止材等があげられる。
(Resin composite composition and resin composite production method)
The resin composite composition according to this embodiment is produced by stirring and mixing the surface-modified zirconia fine particle dispersion according to the present invention and a resin raw material using a mixer or the like, and removing the solvent by vacuum drying or the like.
The resin composite according to the present embodiment can be produced using the resin composite composition according to the present invention. In the method for producing the resin composite, the resin composition according to the present invention may be filled in a mold or a package and cured. The curing method is not particularly limited as long as it is appropriately selected according to the resin raw material to be used, the curing catalyst, and the like. For example, a heat curing method by heating, a photocuring method by irradiation with ultraviolet rays, or the like may be used. Typical examples of the shape include a molded body in which a minute convex lens portion is formed, an LED sealing material filled in a cup-shaped package, and the like.
以下、実施例及び比較例により本発明を具体的に説明するが、本発明はこれら実施例によって限定されるものではない。 EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention concretely, this invention is not limited by these Examples.
[ジルコニア微粒子の作製]
オキシ塩化ジルコニウム8水塩2615gを純水40Lに溶解させたジルコニウム塩溶液に、28%アンモニア水344gを純水20Lに溶解させた希アンモニア水を攪拌しながら加え、ジルコニア前駆体スラリーを調製した。
次いで、このスラリーに、硫酸ナトリウム300gを5Lの純水に溶解させた硫酸ナトリウム水溶液を攪拌しながら加えた。このときの硫酸ナトリウムの添加量は、ジルコニウム塩溶液中のジルコニウムイオンのジルコニア換算値に対して30質量%であった。
[Preparation of zirconia fine particles]
To a zirconium salt solution in which 2615 g of zirconium oxychloride octahydrate was dissolved in 40 L of pure water, dilute ammonia water in which 344 g of 28% ammonia water was dissolved in 20 L of pure water was added with stirring to prepare a zirconia precursor slurry.
Next, an aqueous sodium sulfate solution in which 300 g of sodium sulfate was dissolved in 5 L of pure water was added to this slurry with stirring. The amount of sodium sulfate added at this time was 30% by mass with respect to the zirconia-converted value of zirconium ions in the zirconium salt solution.
次いで、この混合物を、乾燥器を用いて、大気中、130℃にて24時間、乾燥させ、固形物を得た。
次いで、この固形物を自動乳鉢により粉砕した後、電気炉を用いて、大気中、500℃にて1時間焼成した。
次いで、この焼成物を純水中に投入し、攪拌してスラリー状とした後、遠心分離器を用いて洗浄を行い、添加した硫酸ナトリウムを十分に除去した後、乾燥器にて乾燥させ、ジルコニア微粒子ZR1を作製した。
このジルコニア微粒子ZR1の結晶系を、X線回折装置を用いて調べたところ、正方晶ジルコニアであることが確認された。
次いで、透過型電子顕微鏡(TEM)像を撮影し、このTEM像に写った任意の10個の粒子の粒子径を測定し、その平均値を平均一次粒子径として算出した結果、ジルコニア微粒子ZR1の平均一次粒子径は5nmであった。
次いで、BET法により比表面積を測定した結果、ジルコニア微粒子ZR1の比表面積は150m2/gであった。
Next, this mixture was dried in the air at 130 ° C. for 24 hours using a dryer to obtain a solid.
Next, this solid material was pulverized with an automatic mortar and then baked in the air at 500 ° C. for 1 hour using an electric furnace.
Next, the fired product is put into pure water, stirred to form a slurry, washed using a centrifuge, and after sufficiently removing the added sodium sulfate, dried in a dryer, Zirconia fine particles ZR1 were produced.
When the crystal system of the zirconia fine particles ZR1 was examined using an X-ray diffractometer, it was confirmed to be tetragonal zirconia.
Next, a transmission electron microscope (TEM) image was taken, the particle diameter of any 10 particles reflected in the TEM image was measured, and the average value was calculated as the average primary particle diameter. As a result, the zirconia fine particles ZR1 The average primary particle size was 5 nm.
Next, as a result of measuring the specific surface area by the BET method, the specific surface area of the zirconia fine particles ZR1 was 150 m 2 / g.
[有機酸含有ジルコニア微粒子分散液の作製]
(実施例1)
ジルコニア微粒子ZR1を50gと酢酸15gとイオン交換水935gを攪拌混合しジルコニア微粒子を分散させた後に、細孔径50nmのマイクロフィルター(ポリスルホン酸膜)で粗大粒子を除去して酢酸含有ジルコニア微粒子分散液を作製した。
[Preparation of organic acid-containing zirconia fine particle dispersion]
Example 1
After stirring and mixing 50 g of zirconia fine particles ZR1, 15 g of acetic acid and 935 g of ion-exchanged water to disperse the zirconia fine particles, coarse particles were removed with a microfilter (polysulfonic acid film) having a pore diameter of 50 nm to obtain an acetic acid-containing zirconia fine particle dispersion. Produced.
(実施例2)
ジルコニア微粒子ZR1を50gと酢酸250gとイオン交換水700gを攪拌混合しジルコニア微粒子を分散させた後に、細孔径50nmのマイクロフィルター(ポリスルホン酸膜)で粗大粒子を除去して、実施例2の酢酸含有ジルコニア微粒子分散液を作製した。
(Example 2)
50 g of zirconia fine particles ZR1, 250 g of acetic acid, and 700 g of ion-exchanged water were stirred and mixed to disperse the zirconia fine particles, and then the coarse particles were removed with a microfilter (polysulfonic acid film) having a pore diameter of 50 nm. A zirconia fine particle dispersion was prepared.
(実施例3)
実施例1の酢酸を蟻酸にした他は、実施例1と同様な方法を用いて実施例3の蟻酸含有ジルコニア微粒子分散液を作製した。
Example 3
A formic acid-containing zirconia fine particle dispersion of Example 3 was prepared in the same manner as in Example 1 except that the acetic acid of Example 1 was changed to formic acid.
(実施例4)
実施例1の酢酸をプロピオン酸にした他は、実施例1と同様な方法を用いて実施例4のプロピオン酸含有ジルコニア微粒子分散液を作製した。
(Example 4)
A propionic acid-containing zirconia fine particle dispersion of Example 4 was prepared in the same manner as in Example 1 except that the acetic acid of Example 1 was changed to propionic acid.
(比較例1)
ジルコニア微粒子ZR1を50gと酢酸5gとイオン交換水945gを攪拌混合しジルコニア微粒子を分散させた後に、細孔径50nmのマイクロフィルター(ポリスルホン酸膜)で粗大粒子を除去して、比較例1の酢酸含有ジルコニア微粒子分散液を作製した。
(Comparative Example 1)
After stirring and mixing 50 g of zirconia fine particles ZR1, 5 g of acetic acid and 945 g of ion-exchanged water to disperse the zirconia fine particles, coarse particles were removed with a microfilter (polysulfonic acid film) having a pore diameter of 50 nm, and acetic acid contained in Comparative Example 1 was contained. A zirconia fine particle dispersion was prepared.
実施例1〜4と比較例1で使用したジルコニア微粒子ZR1の平均一次粒径、BET比表面積、有機酸含有ジルコニア微粒子分散液中のジルコニア微粒子表面積1m2当たりの酢酸量、平均分散粒径、フィルターパス回数を測定した。これらの結果を表1に示す。 Average primary particle size, BET specific surface area of zirconia fine particles ZR1 used in Examples 1 to 4 and Comparative Example 1, amount of acetic acid per 1 m 2 of zirconia fine particle surface area in organic acid-containing zirconia fine particle dispersion, average dispersed particle size, filter The number of passes was measured. These results are shown in Table 1.
上記の有機酸含有ジルコニア微粒子分散液中のジルコニア微粒子表面積1m2当たりの有機酸量、分散粒径、フィルターパス量の測定方法は以下のとおりである。 The measuring method of the amount of organic acid per 1 m 2 of zirconia fine particle surface area in the organic acid-containing zirconia fine particle dispersion, the dispersed particle size, and the filter pass amount is as follows.
(1)ジルコニア微粒子表面積1m2当たりの有機酸量
ジルコニア微粒子表面積1m2当たりの有機酸量は以下の式より算出した。
「ジルコニア微粒子表面積1m2当たりの有機酸量」=「有機酸配合量」/(「ジルコニア微粒子配合量」×「BET比表面積」)
(1) an organic acid of the organic acid weight zirconia fine surface area 1 m 2 per per zirconia fine surface area 1 m 2 was calculated from the following equation.
“Amount of organic acid per 1 m 2 of zirconia fine particle surface area” = “Amount of organic acid” / (“Amount of zirconia fine particles” × “BET specific surface area”)
(2)平均分散粒径
ジルコニア分散液(Z1)中のジルコニア微粒子の含有率を1質量%に調製した試料の粒度分布を、動的光散乱式粒径分布測定装置(Malvern社製)を用いて測定し、この測定結果から平均分散粒径を求めた。
(3)フィルターパス量
細孔径50nmのマイクロフィルターで酢酸含有ジルコニア微粒子分散液が目詰まりせずに処理できる量を測定した。
(2) Average dispersed particle size Using a dynamic light scattering particle size distribution measuring device (manufactured by Malvern), the particle size distribution of the sample prepared with the zirconia fine particle content in the zirconia dispersion (Z1) being 1% by mass is used. The average dispersed particle size was determined from the measurement results.
(3) Filter pass amount The amount of acetic acid-containing zirconia fine particle dispersion that can be processed without clogging was measured with a microfilter having a pore diameter of 50 nm.
これらの評価結果によれば、実施例1及び実施例2の酢酸含有ジルコニア微粒子分散液、並びに、実施例3及び実施例4の蟻酸含有ジルコニア微粒子分散液及びプロピオン酸含有ジルコニア微粒子分散液は平均分散粒径が十分に小さく、フィルターパス量も用意した酢酸含有ジルコニア微粒子分散液試料の全量(1000ml)を問題なくろ過することができた。
これに対して比較例1の酢酸含有ジルコニア微粒子分散液は、フィルターパス量が280mlで目詰まりを起こしたことから、分散しきれず残った粗大粒子、分散しても電気二重層が厚くフィルターを通過しなかった粒子が相当量あることがわかった。
According to these evaluation results, the acetic acid-containing zirconia fine particle dispersions of Examples 1 and 2 and the formic acid-containing zirconia fine particle dispersions and the propionic acid-containing zirconia fine particle dispersions of Examples 3 and 4 were average dispersed. The total amount (1000 ml) of the acetic acid-containing zirconia fine particle dispersion sample having a sufficiently small particle size and a filter pass amount was successfully filtered.
In contrast, the acetic acid-containing zirconia fine particle dispersion of Comparative Example 1 was clogged with a filter pass amount of 280 ml, so that the coarse particles that could not be dispersed remained, and the electric double layer passed through the filter thickly even when dispersed. It was found that there was a significant amount of particles that did not.
[表面修飾ジルコニア微粒子分散液及び樹脂複合組成物の作製]
(実施例5)
実施例1の酢酸含有ジルコニア微粒子分散液500gに、一次表面修飾剤としてイソブチルトリメトキシシラン12.5gを溶解したメタノール溶液150gを添加し、60℃で3時間攪拌することで表面修飾を行った。
[Production of surface-modified zirconia fine particle dispersion and resin composite composition]
(Example 5)
To 500 g of the acetic acid-containing zirconia fine particle dispersion of Example 1, 150 g of a methanol solution in which 12.5 g of isobutyltrimethoxysilane was dissolved as a primary surface modifier was added, and the surface was modified by stirring at 60 ° C. for 3 hours.
次いで、アンモニア水を添加し、pHを9に調整した分散液を得た。
次いで、この分散液から固液分離により表面修飾ジルコニア微粒子ケーキを回収した。
回収した表面修飾ジルコニア微粒子ケーキをイオン交換水で3回洗浄した後、120℃にて2時間乾燥することにより、表面修飾ジルコニア微粒子を得た。
次いで、この表面修飾ジルコニア微粒子20gに、二次表面処理剤としてトリメトキシ変性アルキルポリシロキサン(重合度約30)10gと、分散媒としてトルエン70gを加え、分散処理後60℃にて6時間撹拌混合することで、表面修飾ジルコニア微粒子分散液を作製した。
Subsequently, aqueous ammonia was added to obtain a dispersion adjusted to pH 9.
Next, the surface-modified zirconia fine particle cake was recovered from the dispersion by solid-liquid separation.
The recovered surface-modified zirconia fine particle cake was washed three times with ion-exchanged water and then dried at 120 ° C. for 2 hours to obtain surface-modified zirconia fine particles.
Next, 10 g of trimethoxy-modified alkylpolysiloxane (degree of polymerization: about 30) as a secondary surface treatment agent and 70 g of toluene as a dispersion medium are added to 20 g of the surface-modified zirconia fine particles, and the mixture is stirred and mixed at 60 ° C. for 6 hours. As a result, a surface-modified zirconia fine particle dispersion was prepared.
この表面修飾ジルコニア微粒子分散液50gに、樹脂原料として粘度10cStのジメチルシリコーン10gを添加し撹拌混合した後に、真空乾燥によりトルエンを除去し、樹脂複合組成物を得た。
(実施例6)
実施例2の酢酸含有ジルコニア微粒子分散液を使用し、実施例5と同様にして表面修飾ジルコニア微粒子分散液および樹脂複合組成物を作製した。
After adding 10 g of dimethyl silicone having a viscosity of 10 cSt as a resin raw material to 50 g of this surface-modified zirconia fine particle dispersion and stirring and mixing, toluene was removed by vacuum drying to obtain a resin composite composition.
(Example 6)
Using the acetic acid-containing zirconia fine particle dispersion of Example 2, a surface-modified zirconia fine particle dispersion and a resin composite composition were produced in the same manner as in Example 5.
(比較例2)
比較例1の酢酸含有ジルコニア微粒子分散液を使用し、実施例5と同様にして表面修飾ジルコニア微粒子分散液および樹脂複合組成物を作製した。
(Comparative Example 2)
Using the acetic acid-containing zirconia fine particle dispersion of Comparative Example 1, a surface-modified zirconia fine particle dispersion and a resin composite composition were produced in the same manner as in Example 5.
(比較例3)
表面修飾ジルコニア微粒子ケーキの洗浄の回数を1回に減らして、酢酸アンモニウム含有量を増加させた他は、実施例5と同様にして表面修飾ジルコニア微粒子分散液および樹脂複合組成物を作製した。
(Comparative Example 3)
A surface-modified zirconia fine particle dispersion and a resin composite composition were prepared in the same manner as in Example 5 except that the number of washings of the surface-modified zirconia fine particle cake was reduced to 1 to increase the ammonium acetate content.
(比較例4)
比較例4として、ジルコニア微粒子を含まないジメチルシリコーンを用意した
(Comparative Example 4)
As Comparative Example 4, dimethyl silicone containing no zirconia fine particles was prepared.
実施例5及び6と比較例2及び3の表面修飾ジルコニア微粒子分散液の平均分散粒径、可視光透過率、酢酸アンモニウム含有量、及び樹脂複合組成物の粘度、耐熱性を測定した。これらの結果を表1に示す。 The average dispersed particle size, visible light transmittance, ammonium acetate content, and viscosity and heat resistance of the resin composite compositions of the surface-modified zirconia fine particle dispersions of Examples 5 and 6 and Comparative Examples 2 and 3 were measured. These results are shown in Table 1.
上記の表面修飾ジルコニア微粒子分散液の平均分散粒径、可視光透過率、酢酸アンモニウム含有量、及び樹脂複合組成物の粘度、耐熱性の測定方法は以下のとおりである。 The average dispersion particle diameter, visible light transmittance, ammonium acetate content, and viscosity and heat resistance of the resin composite composition of the surface-modified zirconia fine particle dispersion are as follows.
(1)平均分散粒径
有機酸含有ジルコニア分散液と同様に測定した。
(2)可視光透過率
分光光度計(V−570、日本分光社製)を用いて、波長350nm〜800nmの範囲で、空気を100%とした場合において、光路長10mmの可視光線の透過率の最低値を測定した。
(3)酢酸アンモニウム含有量
特開2003−149221号公報記載の方法を参考に、水素炎イオン化型検出機を用い、ガスクロマトグラフにより測定を行った。
(4)樹脂複合組成物粘度
回転式粘度計により測定した。
(5)耐熱性
樹脂複合組成物を150℃で500時間保持し、変化を目視で確認した。
(1) Average dispersion particle diameter It measured similarly to the organic acid containing zirconia dispersion liquid.
(2) Visible light transmittance Using a spectrophotometer (V-570, manufactured by JASCO Corporation), the transmittance of visible light having an optical path length of 10 mm when air is 100% in the wavelength range of 350 nm to 800 nm. The lowest value of was measured.
(3) Ammonium acetate content With reference to the method described in Japanese Patent Application Laid-Open No. 2003-149221, measurement was performed by gas chromatography using a flame ionization detector.
(4) Resin composite composition viscosity Measured with a rotary viscometer.
(5) Heat resistance The resin composite composition was held at 150 ° C for 500 hours, and the change was visually confirmed.
これらの評価結果によれば、実施例5と6の表面修飾ジルコニア微粒子分散液は透明性が高く、かつ樹脂複合組成物とした際に粘度上昇が抑えられたハンドリング性良好な、耐熱性に優れる樹脂複合組成物が得られた。
比較例2の表面修飾ジルコニア微粒子分散液は分散粒径が大きく透明性に劣り、かつ樹脂複合組成物の粘度が大幅に上昇した。比較例3では、樹脂複合組成物の耐熱性に劣ることがわかった。
According to these evaluation results, the surface-modified zirconia fine particle dispersions of Examples 5 and 6 have high transparency, good handling properties with reduced viscosity increase when used as resin composite compositions, and excellent heat resistance. A resin composite composition was obtained.
The surface-modified zirconia fine particle dispersion of Comparative Example 2 had a large dispersed particle size and poor transparency, and the viscosity of the resin composite composition was significantly increased. In Comparative Example 3, it was found that the resin composite composition was inferior in heat resistance.
Claims (3)
前記表面修飾ジルコニア微粒子におけるジルコニア微粒子の平均分散粒径が1nm以上かつ20nm以下であり、
前記有機系表面修飾剤は、少なくともアルコキシシラン化合物、シロキサン化合物及びチタンカップリング剤の群から選択された1種または2種以上であり、
前記有機酸化合物は、少なくとも蟻酸アンモニウム、酢酸アンモニウム、プロピオン酸アンモニウム及び酪酸アンモニウムのいずれかであり、
前記有機酸化合物の含有量が、ジルコニア微粒子の質量に対して3質量%未満であることを特徴とする表面修飾ジルコニア微粒子分散液。 A surface-modified zirconia fine particle dispersion containing a surface-modified zirconia fine particle whose surface is modified by an organic surface modifier, a dispersion medium, and an organic acid compound,
The average dispersed particle diameter of the zirconia fine particles in the surface-modified zirconia fine particles is 1 nm or more and 20 nm or less,
The organic surface modifier is at least one selected from the group consisting of an alkoxysilane compound, a siloxane compound and a titanium coupling agent,
The organic acid compound is at least one of ammonium formate, ammonium acetate, ammonium propionate and ammonium butyrate,
The surface-modified zirconia fine particle dispersion, wherein the content of the organic acid compound is less than 3% by mass with respect to the mass of the zirconia fine particles.
(1)有機酸と、平均分散粒径が1nm以上かつ20nm以下であるジルコニア微粒子と、少なくとも水を含む分散媒とを含有し、前記有機酸が、少なくとも蟻酸、酢酸、プロピオン酸及び酪酸のいずれかであり、前記有機酸は、前記ジルコニア微粒子の表面積1m 2 に対して、0.001g以上かつ0.05g以下である、有機酸含有ジルコニア微粒子分散液を用い、
前記有機酸含有ジルコニア微粒子分散液に、有機系表面修飾剤を添加し、ジルコニア微粒子表面の有機酸を前記有機系表面修飾剤で置換する工程。
(2)工程(1)後の分散液に、アンモニアもしくはアミンを添加し、pHを7.5以上に調整することで、含有する前記有機酸を有機酸化合物とする工程。
(3)工程(2)後の分散液に固液分離処理を行い、得られた表面修飾ジルコニア微粒子ケーキに洗浄処理を行う工程。
(4)工程(3)で得られた前記表面修飾ジルコニア微粒子ケーキを乾燥し、その後分散媒に再分散させる工程。 A method for producing a surface-modified zirconia fine particle dispersion according to claim 1 , comprising the following steps.
(1) An organic acid, zirconia fine particles having an average dispersed particle diameter of 1 nm or more and 20 nm or less, and a dispersion medium containing at least water, and the organic acid is at least any of formic acid, acetic acid, propionic acid, and butyric acid The organic acid is an organic acid-containing zirconia fine particle dispersion that is 0.001 g or more and 0.05 g or less with respect to a surface area of 1 m 2 of the zirconia fine particles,
A step of adding an organic surface modifier to the organic acid-containing zirconia fine particle dispersion and replacing the organic acid on the surface of the zirconia fine particles with the organic surface modifier.
(2) A step in which ammonia or an amine is added to the dispersion liquid after step (1) and the pH is adjusted to 7.5 or more to make the contained organic acid an organic acid compound.
(3) A step of subjecting the dispersion after step (2) to a solid-liquid separation treatment and washing the resulting surface-modified zirconia fine particle cake.
(4) A step of drying the surface-modified zirconia fine particle cake obtained in step (3) and then redispersing it in a dispersion medium.
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