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JP6435652B2 - Manufacturing method of glass base material - Google Patents
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JP6435652B2 - Manufacturing method of glass base material - Google Patents

Manufacturing method of glass base material Download PDF

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JP6435652B2
JP6435652B2 JP2014122738A JP2014122738A JP6435652B2 JP 6435652 B2 JP6435652 B2 JP 6435652B2 JP 2014122738 A JP2014122738 A JP 2014122738A JP 2014122738 A JP2014122738 A JP 2014122738A JP 6435652 B2 JP6435652 B2 JP 6435652B2
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core tube
base material
glass base
heating temperature
quartz
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JP2016003150A (en
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川崎 希一郎
希一郎 川崎
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Sumitomo Electric Industries Ltd
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Description

本発明は、ガラス母材の製造方法に関する。   The present invention relates to a method for producing a glass base material.

多孔質ガラス母材を脱水・焼結により透明化するために、石英炉心管を用いて加熱する加熱炉により、透明化したガラス母材を製造する方法が知られている(例えば、特許文献1参照)。また、脱水・焼結処理で多孔質ガラス母材をトラバースさせながら加熱する方法が知られている(例えば、特許文献2参照)。   In order to make a porous glass base material transparent by dehydration and sintering, a method of manufacturing a transparent glass base material by a heating furnace heated using a quartz furnace core tube is known (for example, Patent Document 1). reference). Further, a method of heating a porous glass base material while traversing it by dehydration / sintering treatment is known (for example, see Patent Document 2).

特開平11−1336号公報Japanese Patent Laid-Open No. 11-1336 特開平11−199262号公報JP-A-11-199262

多孔質ガラス母材を脱水・焼結するために石英炉心管を用いて加熱する加熱炉では、通常腐食性のガスを用いて処理する。このため、通常の製品負荷時には炉内を負圧にし、1500〜1600℃に加熱して処理を行う。しかしながら、石英炉心管が結晶化(失透)していない場合は、1500℃以上に加熱して内部を負圧にすると、石英炉心管が熱変形する可能性がある。
石英炉心管が熱変形すると、石英炉心管が縮径し、ガラス母材を脱水・焼結処理する際に、石英炉心管の内面にガラス母材が接触するおそれがある。
In a heating furnace in which a porous glass base material is heated using a quartz furnace core tube for dehydration and sintering, it is usually processed using a corrosive gas. For this reason, during normal product loading, the inside of the furnace is set to a negative pressure and heated to 1500 to 1600 ° C. for processing. However, when the quartz core tube is not crystallized (devitrified), the quartz core tube may be thermally deformed by heating to 1500 ° C. or higher and making the inside negative pressure.
When the quartz core tube is thermally deformed, the diameter of the quartz core tube is reduced, and when the glass base material is dehydrated and sintered, the glass base material may come into contact with the inner surface of the quartz core tube.

そこで、本発明の目的は、ガラス母材を脱水・焼結処理する際に、石英炉心管が結晶化(失透)していない場合でも石英炉心管の熱変形を防ぐことができるガラス母材の製造方法を提供することにある。   Accordingly, an object of the present invention is to provide a glass base material capable of preventing thermal deformation of the quartz core tube even when the quartz core tube is not crystallized (devitrified) when the glass base material is dehydrated and sintered. It is in providing the manufacturing method of.

上記課題を解決することのできる本発明のガラス母材の製造方法は、ガラス母材を石英炉心管内に挿入し、加熱処理により前記ガラス母材を透明化するガラス母材の製造方法であって、
前記石英炉心管が失透する以前に前記加熱処理を行う第1加熱温度を、前記石英炉心管の失透後に前記加熱処理を行う第2加熱温度より低い温度とする。
The glass base material manufacturing method of the present invention capable of solving the above-mentioned problems is a glass base material manufacturing method in which a glass base material is inserted into a quartz furnace core tube and the glass base material is made transparent by heat treatment. ,
The first heating temperature at which the heat treatment is performed before the quartz furnace core tube is devitrified is lower than the second heating temperature at which the heat treatment is performed after the quartz furnace core tube is devitrified.

本発明によれば、ガラス母材を脱水・焼結処理する際に、石英炉心管が結晶化(失透)していない場合でも石英炉心管の熱変形を防ぐことができる。   According to the present invention, when the glass base material is dehydrated and sintered, thermal deformation of the quartz core tube can be prevented even when the quartz core tube is not crystallized (devitrified).

本発明の第1実施形態に係るガラス母材の製造方法に使用される加熱装置の概略構成図である。1 is a schematic configuration diagram of a heating device used in a method for producing a glass base material according to a first embodiment of the present invention. 本発明の第2実施形態に係るガラス母材の製造方法に使用される加熱装置の概略構成図である。It is a schematic block diagram of the heating apparatus used for the manufacturing method of the glass base material which concerns on 2nd Embodiment of this invention. 比較例における、20本の多孔質ガラス母材を加熱処理した後の石英炉心管のヒートゾーン部近傍の模式図である。It is a schematic diagram of the heat zone part vicinity of the quartz furnace core tube after heat-processing 20 porous glass base materials in a comparative example.

[本願発明の実施形態の説明]
本願発明の実施形態に係るガラス母材の製造方法は、
(1) ガラス母材を石英炉心管内に挿入し、加熱処理により前記ガラス母材を透明化するガラス母材の製造方法であって、
前記石英炉心管が失透する以前に前記加熱処理を行う第1加熱温度を、前記石英炉心管の失透後に前記加熱処理を行う第2加熱温度より低い温度とする。
石英炉心管は、新規に使用開始した直後は、失透していないため、ガラス母材を透明化するときの設定温度を高くしすぎると、熱変形する場合がある。一方、石英炉心管は高熱の処理を繰り返すことにより失透が進むため、熱によりガラスの状態が変化しにくくなる。よって、失透後はガラス母材を透明化させるための温度にまで温度を上げても変形が進まなくなる。このため、石英炉心管が失透する以前はガラス母材を脱水・焼結処理する際の加熱温度を低めにすることで、石英炉心管が失透する前の状態でも熱変形を防ぐことができる。
[Description of Embodiment of Present Invention]
A method for producing a glass base material according to an embodiment of the present invention is as follows:
(1) A method for producing a glass base material, wherein the glass base material is inserted into a quartz furnace core tube, and the glass base material is made transparent by heat treatment,
The first heating temperature at which the heat treatment is performed before the quartz furnace core tube is devitrified is lower than the second heating temperature at which the heat treatment is performed after the quartz furnace core tube is devitrified.
Since the quartz furnace core tube is not devitrified immediately after the start of new use, if the set temperature for making the glass base material transparent is too high, it may be thermally deformed. On the other hand, since the devitrification of the quartz furnace tube progresses by repeating the high-temperature treatment, the glass state hardly changes due to heat. Therefore, after devitrification, even if the temperature is raised to the temperature for making the glass base material transparent, the deformation does not proceed. For this reason, before the quartz core tube is devitrified, the heating temperature when dehydrating and sintering the glass base material is lowered to prevent thermal deformation even before the quartz core tube is devitrified. it can.

(2) 前記第1加熱温度を、1400℃以上且つ前記第2加熱温度より10℃以上低い温度とする。
第1加熱温度を1400℃以上且つ第2加熱温度より10℃以上低い温度としたので、失透していない石英炉心管であっても、熱変形させることなく加熱することができる。
(2) The first heating temperature is 1400 ° C. or higher and 10 ° C. or lower than the second heating temperature.
Since the first heating temperature is 1400 ° C. or more and 10 ° C. or more lower than the second heating temperature, even a quartz core tube that has not been devitrified can be heated without being thermally deformed.

(3) 前記加熱処理は、前記ガラス母材をトラバースさせて、前記石英炉心管の一部の周辺に設けられた加熱部により加熱を行う処理であり、
前記石英炉心管が失透する以前の第1トラバース速度を前記石英炉心管の失透後の第2トラバース速度より遅くする。
ガラス母材をトラバースさせて、石英炉心管の一部の周辺に設けられた加熱部により加熱を行う場合において、石英炉心管が失透する以前はガラス母材を脱水・焼結処理する際の加熱温度を低めにすることで、石英炉心管が失透する前の状態でも熱変形を防ぐことができる。さらに第1トラバース速度を第2トラバース速度より遅くすることで、第1加熱温度が第2加熱温度より低くてもガラス母材を透明化させることができる。
(3) The heat treatment is a treatment in which the glass base material is traversed and heated by a heating unit provided around a part of the quartz furnace core tube,
The first traverse speed before devitrification of the quartz furnace core tube is made slower than the second traverse speed after devitrification of the quartz furnace core tube.
When the glass base material is traversed and heated by a heating part provided around a part of the quartz core tube, before the quartz core tube is devitrified, the glass base material is subjected to dehydration and sintering treatment. By lowering the heating temperature, thermal deformation can be prevented even before the quartz core tube is devitrified. Furthermore, by making the first traverse speed slower than the second traverse speed, the glass base material can be made transparent even if the first heating temperature is lower than the second heating temperature.

(4) 前記第1加熱温度を1400℃以上且つ1600℃以下、前記第1トラバース速度を1mm/分以上且つ7mm/分以下とし、
前記第2加熱温度を1450℃以上且つ1700℃以下、前記第2トラバース速度を2mm/分以上且つ10mm/分以下とする。
第1加熱温度を1400℃以上且つ1600℃以下、第1トラバース速度を1mm/分以上且つ7mm/分以下とすることで、第1加熱温度が第2加熱温度より低くても、ガラス母材を透明化させることができ、且つ石英炉心管が失透する前の状態でも熱変形を防ぐことができる。
また、第2加熱温度を1450℃以上且つ1700℃以下とし、第2トラバース速度を2mm/分以上且つ10mm/分以下とすることで、石英炉心管の失透後は、ガラス母材に対する脱水・焼結処理の処理速度を上げることができる。
(4) The first heating temperature is 1400 ° C. or more and 1600 ° C. or less, the first traverse speed is 1 mm / min or more and 7 mm / min or less,
The second heating temperature is 1450 ° C. to 1700 ° C., and the second traverse speed is 2 mm / min to 10 mm / min.
Even if the first heating temperature is lower than the second heating temperature by setting the first heating temperature to 1400 ° C. or more and 1600 ° C. or less and the first traverse speed to 1 mm / min or more and 7 mm / min or less, the glass base material It can be made transparent, and thermal deformation can be prevented even before the quartz core tube is devitrified.
In addition, by setting the second heating temperature to 1450 ° C. or more and 1700 ° C. or less and the second traverse speed to 2 mm / min or more and 10 mm / min or less, after devitrification of the quartz furnace core tube, The processing speed of the sintering process can be increased.

[本願発明の実施形態の詳細]
本発明の実施形態に係るガラス母材の製造方法の具体例を、以下に図面を参照しつつ説明する。
なお、本発明はこれらの例示に限定されるものではなく、特許請求の範囲によって示され、特許請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。
[Details of the embodiment of the present invention]
Specific examples of the method for producing a glass base material according to the embodiment of the present invention will be described below with reference to the drawings.
In addition, this invention is not limited to these illustrations, is shown by the claim, and intends that all the changes within the meaning and range equivalent to a claim are included.

図1は、本発明の実施形態に係るガラス母材の製造方法に用いられる加熱装置の概略構成図である。
図1に示すように、加熱装置1は、石英炉心管2、ヒータ3、筐体4を有する加熱炉5と、ガス導入部6、温度制御部7、温度計8、排気部9、トラバース機構10を備えている。
FIG. 1 is a schematic configuration diagram of a heating device used in a method for producing a glass base material according to an embodiment of the present invention.
As shown in FIG. 1, the heating apparatus 1 includes a quartz furnace core tube 2, a heater 3, a heating furnace 5 having a housing 4, a gas introduction unit 6, a temperature control unit 7, a thermometer 8, an exhaust unit 9, and a traverse mechanism. 10 is provided.

加熱炉5は、上部が閉塞され被加熱材となる多孔質ガラス母材12を上下に移動可能に収容する石英炉心管2を備えている。また、筐体4内には、石英炉心管2の外周側に熱源であるヒータ3が設けられている。石英炉心管2の内部において、ヒータ3の加熱は、ヒートゾーン部11を中心に行われるように設計されており、多孔質ガラス母材12の加熱処理は、主にヒートゾーン部11内で行われる。
また、ヒータ3(加熱部)による加熱温度を測定するための温度計8がヒータ3の近くに設けられている。ヒータ3は、温度計8によって測定された加熱温度に基づいて、温度制御部7により加熱制御される。
The heating furnace 5 includes a quartz furnace core tube 2 that contains a porous glass base material 12 that is closed at the top and that is a material to be heated so as to be movable up and down. In addition, a heater 3 as a heat source is provided in the casing 4 on the outer peripheral side of the quartz furnace core tube 2. Inside the quartz core tube 2, the heater 3 is designed to be heated around the heat zone portion 11, and the heat treatment of the porous glass base material 12 is mainly performed in the heat zone portion 11. Is called.
A thermometer 8 for measuring the heating temperature by the heater 3 (heating unit) is provided near the heater 3. The heater 3 is heated and controlled by the temperature control unit 7 based on the heating temperature measured by the thermometer 8.

また、石英炉心管2の外には、シード棒13によって吊り下げられた多孔質ガラス母材12を上下にトラバースさせるトラバース機構10が設けられている。
また、加熱装置1には、石英炉心管2内へヘリウムガス等の不活性ガスや、塩素やフッ化物ガスなどの腐食性ガスなどを導入するガス導入部6が設けられている。また、不要なガスを石英炉心管2から排出する排気部9が設けられている。
In addition, a traverse mechanism 10 for traversing the porous glass base material 12 suspended by the seed rod 13 up and down is provided outside the quartz furnace tube 2.
The heating device 1 is also provided with a gas introduction unit 6 for introducing an inert gas such as helium gas or a corrosive gas such as chlorine or fluoride gas into the quartz furnace core tube 2. In addition, an exhaust unit 9 for exhausting unnecessary gas from the quartz furnace core tube 2 is provided.

次に、第1実施形態のガラス母材の製造方法について説明する。
ガス導入部6から所定量の不活性ガスを導入しながら、排気部9から不要なガスを排出し、大気圧より減圧した炉内圧でヒータ3を加熱させる。
多孔質ガラス母材12をトラバース機構10によってトラバースさせながら、多孔質ガラス母材12の全体を脱水・焼結処理して透明化した透明ガラス母材を得る。石英炉心管2が失透していない場合は、ヒータ3による加熱温度を第1加熱温度とし、トラバース機構10によるトラバースの速度は第1トラバース速度とする。石英炉心管2が変形せず、且つガラス母材を十分に透明化させることができるように、第1加熱温度は1400℃以上且つ1600℃以下、第1トラバース速度は1mm/分以上且つ7mm/分以下とする。
Next, the manufacturing method of the glass base material of 1st Embodiment is demonstrated.
While introducing a predetermined amount of inert gas from the gas introduction unit 6, unnecessary gas is discharged from the exhaust unit 9, and the heater 3 is heated at a furnace pressure reduced from atmospheric pressure.
While the porous glass preform 12 is traversed by the traverse mechanism 10, the entire porous glass preform 12 is dehydrated and sintered to obtain a transparent glass preform. When the quartz furnace core tube 2 is not devitrified, the heating temperature by the heater 3 is the first heating temperature, and the traverse speed by the traverse mechanism 10 is the first traverse speed. The first heating temperature is 1400 ° C. or higher and 1600 ° C. or lower, and the first traverse speed is 1 mm / min or higher and 7 mm / second so that the quartz core tube 2 is not deformed and the glass base material can be sufficiently transparent. Less than minutes.

ヒートゾーン部11に面する石英炉心管2の石英ガラスが失透(ガラスの結晶化)するまでは、上記した範囲の条件でのガラス母材の製造方法を繰り返し実施する。
石英炉心管2が失透した後は、ヒータ3による加熱温度を第2加熱温度とし、トラバース機構10によるトラバースの速度は第2トラバース速度とする。この第2加熱温度および第2トラバース速度で多孔質ガラス母材12の全体を脱水・焼結処理して透明化した透明ガラス母材を得る。第2加熱温度は第1加熱温度より高い温度(例えば、1450℃以上且つ1700℃以下)とし、第2トラバース速度は第1トラバース速度より速い速度(例えば、2mm/分以上且つ10mm/分以下)とする。
つまり、本実施形態では、石英炉心管2が失透する以前の第1トラバース速度を石英炉心管の失透後の第2トラバース速度より遅くし、且つ、石英炉心管2が失透する以前の加熱処理の第1加熱温度を石英炉心管の失透後の加熱処理の第2加熱温度より低い温度とする。
Until the quartz glass of the quartz furnace core tube 2 facing the heat zone section 11 is devitrified (glass crystallization), the method for producing a glass base material under the above-described conditions is repeatedly performed.
After the quartz furnace core tube 2 is devitrified, the heating temperature by the heater 3 is set to the second heating temperature, and the traverse speed by the traverse mechanism 10 is set to the second traverse speed. The entire porous glass base material 12 is dehydrated and sintered at the second heating temperature and the second traverse speed to obtain a transparent glass base material that is transparent. The second heating temperature is higher than the first heating temperature (for example, 1450 ° C. or more and 1700 ° C. or less), and the second traverse speed is faster than the first traverse speed (for example, 2 mm / min or more and 10 mm / min or less). And
That is, in the present embodiment, the first traverse speed before the quartz core tube 2 is devitrified is made slower than the second traverse speed after the quartz core tube is devitrified, and before the quartz core tube 2 is devitrified. The first heating temperature of the heat treatment is set to a temperature lower than the second heating temperature of the heat treatment after devitrification of the quartz core tube.

以上のように、石英炉心管2の一部の周辺にヒータ(加熱部)3を備え、多孔質ガラス母材12を石英炉心管2内に挿入しトラバースさせる場合において、石英炉心管2が失透する以前は加熱温度を低めにすることで、石英炉心管2が失透する前の状態でも熱変形を防ぐことができる。さらに第1トラバース速度を第2トラバース速度より遅くすることで、加熱温度を低めにしても(第1加熱温度が第2加熱温度より低くても)ガラス母材を透明化させることができる。
また、石英炉心管2の失透後は、温度を上げても石英炉心管2は変形しにくくなるので、第1加熱温度より高い第2加熱温度、且つ第1トラバース速度より速い第2トラバース速度で脱水・焼結処理することにより、多孔質ガラス母材12の脱水・焼結処理の速度を上げることができる。
As described above, when the heater (heating unit) 3 is provided around a part of the quartz core tube 2 and the porous glass base material 12 is inserted into the quartz core tube 2 and traversed, the quartz core tube 2 is lost. By lowering the heating temperature before passing through, thermal deformation can be prevented even before the quartz core tube 2 is devitrified. Furthermore, by making the first traverse speed slower than the second traverse speed, the glass base material can be made transparent even if the heating temperature is lowered (even if the first heating temperature is lower than the second heating temperature).
Further, after the quartz core tube 2 is devitrified, the quartz core tube 2 is not easily deformed even if the temperature is increased. Therefore, the second heating temperature higher than the first heating temperature and the second traverse speed higher than the first traverse speed. By performing dehydration / sintering treatment at, the speed of the dehydration / sintering treatment of the porous glass base material 12 can be increased.

次に、本発明の第2実施形態に係るガラス母材の製造方法に使用される加熱装置について、図2を参照して説明する。
図2において、第1実施形態と同一の箇所には、同一の符号を付けてその説明を適宜省略する。
第2実施形態は、第1実施形態の加熱炉5を均熱炉とした例であり、加熱装置21の筐体4内には、石英炉心管2の外周側に略均等に設けられた熱源であるヒータ23を備えている。ヒータ23は、例えば加熱炉の上下方向(図2の縦方向)に複数段(図2では3段)に分かれて設けられ、石英炉心管2内に収容された多孔質ガラス母材12を均等に加熱する。第2実施形態では、ヒータ23(加熱部)毎に加熱温度を測定するための温度計8がそれぞれのヒータ23の近くに設けられている。各ヒータ23は、温度計8によって測定された加熱温度に基づいて、温度制御部7により適切な加熱温度となるように加熱制御される。なお、第2実施形態では、トラバース機構10は加熱処理時には使用しないので図示を省略する。
Next, a heating apparatus used in the glass base material manufacturing method according to the second embodiment of the present invention will be described with reference to FIG.
In FIG. 2, the same parts as those in the first embodiment are denoted by the same reference numerals, and the description thereof is omitted as appropriate.
The second embodiment is an example in which the heating furnace 5 of the first embodiment is a soaking furnace, and the heat source provided substantially uniformly on the outer peripheral side of the quartz furnace core tube 2 in the casing 4 of the heating device 21. The heater 23 is provided. For example, the heater 23 is divided into a plurality of stages (three stages in FIG. 2) in the vertical direction of the heating furnace (vertical direction in FIG. 2), and the porous glass base material 12 accommodated in the quartz furnace core tube 2 is evenly distributed. Heat to. In the second embodiment, thermometers 8 for measuring the heating temperature for each heater 23 (heating unit) are provided in the vicinity of each heater 23. Each heater 23 is controlled to be heated by the temperature control unit 7 based on the heating temperature measured by the thermometer 8 so as to have an appropriate heating temperature. Note that in the second embodiment, the traverse mechanism 10 is not used during the heat treatment and is not shown.

次に、第2実施形態のガラス母材の製造方法について説明する。
ガス導入部6から所定量の不活性ガスを導入しながら、排気部9から不要なガスを排出し、大気圧より減圧した炉内圧でヒータ23を加熱させる。
そして、石英炉心管2が失透していない場合には、ヒータ23による加熱温度を第1加熱温度として、多孔質ガラス母材12を脱水・焼結処理して透明化した透明ガラス母材を得る。このとき、石英炉心管2が変形せず、且つガラス母材を十分に透明化させることができるように、第1加熱温度は1400℃以上とする。
Next, the manufacturing method of the glass base material of 2nd Embodiment is demonstrated.
While introducing a predetermined amount of inert gas from the gas introduction unit 6, unnecessary gas is discharged from the exhaust unit 9, and the heater 23 is heated at a furnace pressure reduced from atmospheric pressure.
When the quartz core tube 2 is not devitrified, a transparent glass base material made transparent by dehydrating and sintering the porous glass base material 12 with the heating temperature of the heater 23 as the first heating temperature. obtain. At this time, the first heating temperature is set to 1400 ° C. or higher so that the quartz furnace core tube 2 is not deformed and the glass base material can be made sufficiently transparent.

石英炉心管2の石英ガラスが失透(ガラスの結晶化)するまでは、上記した条件でのガラス母材の製造方法を繰り返し実施する。
石英炉心管2が失透した後は、ヒータ23による加熱温度を第1加熱温度より10℃以上高い第2加熱温度として、多孔質ガラス母材12の全体を脱水・焼結処理し、透明化したガラス母材を得る。
つまり、本実施形態では、石英炉心管2が失透する以前に加熱処理を行う第1加熱温度を、石英炉心管2の失透後に加熱処理を行う第2加熱温度より低い温度とする。
なお、第2加熱温度より低い第1加熱温度で十分透明化させるためには、第1加熱温度で加熱する時間を第2加熱温度で加熱する時間より長くするなどして、適宜調整すれば良い。
Until the quartz glass of the quartz furnace core tube 2 is devitrified (glass crystallization), the method for producing a glass base material under the above-described conditions is repeatedly performed.
After the quartz core tube 2 is devitrified, the entire porous glass base material 12 is dehydrated and sintered by making the heating temperature by the heater 23 a second heating temperature that is 10 ° C. or more higher than the first heating temperature to make it transparent. A glass base material is obtained.
That is, in the present embodiment, the first heating temperature at which the heat treatment is performed before the quartz furnace core tube 2 is devitrified is set to a temperature lower than the second heating temperature at which the heat treatment is performed after the quartz furnace core tube 2 is devitrified.
In order to achieve transparency sufficiently at the first heating temperature lower than the second heating temperature, the heating time at the first heating temperature may be appropriately adjusted, for example, by making the heating time longer than the heating time at the second heating temperature. .

以上のように、石英炉心管2内に収容された多孔質ガラス母材12を均等に加熱する場合において、石英炉心管2が失透する以前は、ガラス母材を十分に透明化させることができる温度の範囲内で、脱水・焼結処理する際の加熱温度を低めにすることで、失透する前の状態でも石英炉心管2の熱変形を防ぐことができる。また、石英炉心管2の失透後は、温度を上げても石英炉心管2の変形しにくくなるという特性があるので、第1加熱温度より高い第2加熱温度とすることにより、多孔質ガラス母材12の脱水・焼結処理の速度を上げることができる。   As described above, when the porous glass preform 12 accommodated in the quartz furnace core tube 2 is heated uniformly, the glass preform can be sufficiently transparentized before the quartz furnace core tube 2 is devitrified. By lowering the heating temperature during the dehydration / sintering process within the range of possible temperatures, thermal deformation of the quartz core tube 2 can be prevented even before devitrification. In addition, after devitrification of the quartz core tube 2, there is a characteristic that the quartz core tube 2 is not easily deformed even if the temperature is raised. Therefore, by setting the second heating temperature higher than the first heating temperature, The speed of dehydration / sintering treatment of the base material 12 can be increased.

[実施例1]
図1に示す第1実施形態の加熱装置を用いて、上述の第1実施形態のガラス母材の製造方法で透明化したガラス母材を製造した。具体的には、内径200mmの透明な(失透していない)石英炉心管を新規に使用し、第1加熱温度1500℃、第1トラバース速度4mm/分として、外径160mmの多孔質ガラス母材12を加熱処理して透明化させ、ガラス母材を製造した。前記方法で連続10本の多孔質ガラス母材12を加熱処理した後、加熱温度を1510℃、トラバース速度5mm/分に上げてさらに20本の多孔質ガラス母材12を加熱処理し、その後、加熱温度を1530℃、トラバース速度6mm/分に上げて30本の多孔質ガラス母材12を加熱処理して透明化させ、ガラス母材を製造した。このとき、各製造条件においてガラス母材は問題なく透明化され、石英炉心管2は大きな変形もなく失透していることが確認できた。
そして、石英炉心管2の失透後も、外径160mmの多孔質ガラス母材12を挿入可能であることを確認できた。失透後は、加熱温度を1550℃、トラバース速度8mm/分に上げて外径160mmの多孔質ガラス母材12の加熱処理を継続して行った。
[Example 1]
Using the heating device of the first embodiment shown in FIG. 1, a glass base material made transparent by the glass base material manufacturing method of the first embodiment described above was manufactured. Specifically, a transparent (non-devitrified) quartz furnace core tube having an inner diameter of 200 mm is newly used, and the first heating temperature is 1500 ° C. and the first traverse speed is 4 mm / min. The material 12 was heat treated to make it transparent, and a glass base material was manufactured. After the heat treatment of 10 continuous porous glass base materials 12 by the above-mentioned method, the heating temperature is increased to 1510 ° C. and the traverse speed is 5 mm / min, and further 20 porous glass base materials 12 are heat-treated, The heating temperature was increased to 1530 ° C. and the traverse speed was 6 mm / min to heat-treat 30 porous glass base materials 12 to make them transparent, thereby producing glass base materials. At this time, it was confirmed that the glass base material was transparentized without any problems under each manufacturing condition, and the quartz core tube 2 was devitrified without significant deformation.
It was confirmed that the porous glass preform 12 having an outer diameter of 160 mm can be inserted even after devitrification of the quartz furnace core tube 2. After devitrification, the heating temperature was increased to 1550 ° C. and the traverse speed was 8 mm / min, and the porous glass preform 12 having an outer diameter of 160 mm was continuously heated.

[実施例2]
図2に示す第2実施形態の加熱装置を用いて、内径200mmの透明な(失透していない)石英炉心管を新規に使用し、第1加熱温度1450℃とし、外径160mmの多孔質ガラス母材12を室温から1450℃まで10時間かけて徐々に加熱することで透明化させた。前記方法で連続して20本の多孔質ガラス母材12を加熱処理して透明化させた後、第1加熱温度1500℃とし、室温から1500℃まで9時間かけて徐々に加熱することで連続して30本の多孔質ガラス母材12を加熱処理した。このとき、石英炉心管2は大きな変形もなく、失透していることが確認でき、多孔質ガラス母材12が石英炉心管2に接触することもなかった。失透後は、加熱温度を1550℃に上げて、外径160mmの多孔質ガラス母材12の加熱処理を継続して行った。
[Example 2]
Using a heating apparatus according to the second embodiment shown in FIG. 2, a transparent (non-devitrified) quartz furnace core tube having an inner diameter of 200 mm is newly used, the first heating temperature is 1450 ° C., and the outer diameter is 160 mm. The glass base material 12 was made transparent by gradually heating from room temperature to 1450 ° C. over 10 hours. After the 20 porous glass base materials 12 are continuously heat-treated and transparentized by the above-mentioned method, the first heating temperature is set to 1500 ° C., and then gradually heated from room temperature to 1500 ° C. over 9 hours. 30 porous glass base materials 12 were heat-treated. At this time, it was confirmed that the quartz furnace core tube 2 was not deformed and devitrified, and the porous glass preform 12 did not come into contact with the quartz furnace core tube 2. After devitrification, the heating temperature was raised to 1550 ° C., and the heat treatment of the porous glass preform 12 having an outer diameter of 160 mm was continued.

[比較例1]
図1に示す加熱装置を用いて、内径200mmの透明な(失透していない)石英炉心管2を新規に使用し、第1加熱温度1550℃、第1トラバース速度8mm/分として、外径160mmの多孔質ガラス母材12を加熱処理して透明化させ、ガラス母材を製造した。前記方法で連続して20本の多孔質ガラス母材12に対する加熱処理を実施した。このとき、多孔質ガラス母材12は問題なく透明化できたものの、石英炉心管2は内側に凹むように変形した。このときの石英炉心管2のヒートゾーン部11近傍の模式図を図3に示す。
図3に示すように、石英炉心管2が内側に変形して内径が小さくなっていることが確認された(加熱炉内を減圧して加熱処理を行ったため内側に変形した)。図3の状態の石英炉心管2に、外径160mmの多孔質ガラス母材12を挿入したところ、多孔質ガラス母材12が石英炉心管の内面に接触する問題が生じた。
[Comparative Example 1]
Using the heating apparatus shown in FIG. 1, a transparent (non-devitrified) quartz core tube 2 having an inner diameter of 200 mm is newly used, with a first heating temperature of 1550 ° C. and a first traverse speed of 8 mm / min. A 160 mm porous glass preform 12 was heat treated to be transparent, and a glass preform was produced. The heat treatment for 20 porous glass base materials 12 was continuously performed by the above method. At this time, the porous glass preform 12 could be made transparent without problems, but the quartz furnace core tube 2 was deformed so as to be recessed inward. A schematic diagram of the vicinity of the heat zone 11 of the quartz core tube 2 at this time is shown in FIG.
As shown in FIG. 3, it was confirmed that the quartz furnace core tube 2 was deformed inward and the inner diameter was reduced (deformed inward because the inside of the heating furnace was depressurized and subjected to heat treatment). When the porous glass preform 12 having an outer diameter of 160 mm was inserted into the quartz furnace core tube 2 in the state shown in FIG. 3, there was a problem that the porous glass preform 12 contacted the inner surface of the quartz furnace core tube.

[比較例2]
図2に示す第2実施形態の加熱装置を用いて、内径200mmの透明な(失透していない)石英炉心管を新規に使用し、第1加熱温度1500℃とし、外径160mmの多孔質ガラス母材12を室温から1500℃まで9時間かけて徐々に加熱することで透明化させた。前記方法で連続して20本の多孔質ガラス母材12を加熱処理して透明化させることができたが、石英炉心管2が内側に凹むように変形した。
[Comparative Example 2]
Using the heating apparatus of the second embodiment shown in FIG. 2, a transparent (non-devitrified) quartz furnace core tube having an inner diameter of 200 mm is newly used, the first heating temperature is 1500 ° C., and the outer diameter is 160 mm. The glass base material 12 was made transparent by gradually heating from room temperature to 1500 ° C. over 9 hours. Although 20 porous glass base materials 12 were continuously heat-treated and transparentized by the above method, the quartz furnace core tube 2 was deformed so as to be recessed inward.

以上の結果から、図1の加熱装置を用いた場合、石英炉心管2が失透する以前に多孔質ガラス母材12を脱水・焼結処理する際の第1加熱温度を、失透後の第2加熱温度(1550℃)よりも低い温度(1500℃〜1530℃)とすることで、石英炉心管2が失透する前の状態でも熱変形しないことがわかる。
また、図1の加熱装置を用いた場合、石英炉心管2が失透する以前の第1トラバース速度を失透後の第2トラバース速度(8mm/分)よりも遅い速度(4mm/分〜6mm/分)とすることで、加熱温度が失透後の加熱温度より低くてもガラス母材を問題なく透明化できることがわかる。
さらに、第1加熱温度を(例えば1500℃から1530℃まで)上げていくとともに、第1トラバース速度を(例えば4mm/分から6mm/分まで)速くしていくことにより、石英炉心管2の熱変形を防ぎつつ製造時間を短縮することができる。
また、図2の加熱装置を用いた場合は、石英炉心管2が失透する以前に多孔質ガラス母材12を脱水・焼結処理する際の第1加熱温度を、失透後の第2加熱温度(1500℃)よりも低い温度(1450℃)とすることで、石英炉心管2が失透する前の状態でも熱変形しないことがわかる。
From the above results, when the heating device of FIG. 1 is used, the first heating temperature when the porous glass preform 12 is dehydrated and sintered before the quartz furnace core tube 2 is devitrified is determined after devitrification. It can be seen that by setting the temperature (1500 ° C. to 1530 ° C.) lower than the second heating temperature (1550 ° C.), the quartz core tube 2 is not thermally deformed even before devitrification.
When the heating device of FIG. 1 is used, the first traverse speed before devitrification of the quartz core tube 2 is lower than the second traverse speed (8 mm / min) after devitrification (4 mm / min to 6 mm). / Min), it can be seen that even if the heating temperature is lower than the heating temperature after devitrification, the glass base material can be transparentized without any problem.
Further, by increasing the first heating temperature (for example, from 1500 ° C. to 1530 ° C.) and increasing the first traverse speed (for example, from 4 mm / min to 6 mm / min), thermal deformation of the quartz core tube 2 is achieved. The manufacturing time can be shortened while preventing this.
When the heating apparatus of FIG. 2 is used, the first heating temperature when the porous glass preform 12 is dehydrated and sintered before the quartz core tube 2 is devitrified is set to the second temperature after devitrification. It can be seen that by setting the temperature (1450 ° C.) lower than the heating temperature (1500 ° C.), the quartz furnace core tube 2 is not thermally deformed even before devitrification.

1、21 加熱装置
2 石英炉心管
3、23 ヒータ
4 筐体
5 加熱炉
6 ガス導入部
7 温度制御部
8 温度計
9 排気部
10 トラバース機構
11 ヒートゾーン部
12 多孔質ガラス母材
13 シード棒
DESCRIPTION OF SYMBOLS 1,21 Heating apparatus 2 Quartz furnace core tube 3, 23 Heater 4 Case 5 Heating furnace 6 Gas introduction part 7 Temperature control part 8 Thermometer 9 Exhaust part 10 Traverse mechanism 11 Heat zone part 12 Porous glass base material 13 Seed stick

Claims (4)

ガラス母材を石英炉心管内に挿入し、加熱処理により前記ガラス母材を透明化するガラス母材の製造方法であって、
前記石英炉心管が失透する以前に前記加熱処理を行う第1加熱温度を、前記石英炉心管の失透後に前記加熱処理を行う第2加熱温度より低い温度とし、
前記第1加熱温度を1530℃以下とする、ガラス母材の製造方法。
A glass base material is inserted into a quartz furnace core tube, and the glass base material is made transparent by heat treatment.
The first heating temperature for performing the heat treatment before devitrification of the quartz furnace core tube is set to a temperature lower than the second heating temperature for performing the heat treatment after devitrification of the quartz furnace core tube ,
The manufacturing method of the glass base material which makes the said 1st heating temperature 1530 degreeC or less .
前記第1加熱温度を、1400℃以上且つ前記第2加熱温度より10℃以上低い温度とする、請求項1に記載のガラス母材の製造方法。   The method for producing a glass base material according to claim 1, wherein the first heating temperature is set to 1400 ° C or higher and 10 ° C or lower than the second heating temperature. 前記加熱処理は、前記ガラス母材をトラバースさせて、前記石英炉心管の一部の周辺に設けられた加熱部により加熱を行う処理であり、
前記石英炉心管が失透する以前の第1トラバース速度を前記石英炉心管の失透後の第2トラバース速度より遅くする、請求項1または請求項2に記載のガラス母材の製造方法。
The heat treatment is a treatment in which the glass base material is traversed and heated by a heating unit provided around a part of the quartz furnace core tube,
The method for producing a glass base material according to claim 1 or 2, wherein a first traverse speed before devitrification of the quartz furnace core tube is made slower than a second traverse speed after devitrification of the quartz furnace core tube.
前記第1加熱温度を1400℃以上、前記第1トラバース速度を1mm/分以上且つ7mm/分以下とし、
前記第2加熱温度を1450℃以上且つ1700℃以下、前記第2トラバース速度を2mm/分以上且つ10mm/分以下とする、請求項3に記載のガラス母材の製造方法。
It said first heating temperature 1400 ° C. than on, the first traverse rate was 1 mm / min or more and 7 mm / min or less,
The manufacturing method of the glass base material of Claim 3 which makes said 2nd heating temperature 1450 degreeC or more and 1700 degrees C or less, and makes said 2nd traverse speed 2 mm / min or more and 10 mm / min or less.
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