JP6447553B2 - プローバ - Google Patents
プローバ Download PDFInfo
- Publication number
- JP6447553B2 JP6447553B2 JP2016055901A JP2016055901A JP6447553B2 JP 6447553 B2 JP6447553 B2 JP 6447553B2 JP 2016055901 A JP2016055901 A JP 2016055901A JP 2016055901 A JP2016055901 A JP 2016055901A JP 6447553 B2 JP6447553 B2 JP 6447553B2
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- JP
- Japan
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- unit
- probe card
- measurement unit
- test head
- transport
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2868—Complete testing stations; systems; procedures; software aspects
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2893—Handling, conveying or loading, e.g. belts, boats, vacuum fingers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
- H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
- H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
- H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
- H10P74/27—Structural arrangements therefor
- H10P74/277—Circuits for electrically characterising or monitoring manufacturing processes, e.g. circuits in tested chips or circuits in testing wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2887—Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Automation & Control Theory (AREA)
- Manufacturing & Machinery (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
に沿ってY軸方向にスライド移動して開口14bを介してメンテナンスエリアA2側に引き出される(図12(b)参照)。これにより、テストヘッド44のメンテナンス(例えば、テストヘッド内部の基板交換等)が可能となる。
まず、搬送ユニット16がウエハWをウエハ収納部12aから検査(例えば、高温検査又は低温検査)が実施される測定部14内に搬送する場合の動作例について説明する。
次に、搬送ユニット16がプローブカードPCをプローブカード収納部12bから検査(例えば、高温検査又は低温検査)が実施される測定部14内に搬送する場合の動作例について説明する。
次に、テストヘッド44をメンテナンスエリアA2側に引き出す場合の動作例について説明する。
次に、ポゴフレーム46をメンテナンスエリアA2側に引き出す場合の動作例について説明する。
Claims (7)
- 搬送エリアとメンテナンスエリアとの間に配置された複数の測定部であって、ウエハ上に形成された半導体素子の検査の際に用いられる被メンテナンス装置と、前記被メンテナンス装置を前記メンテナンスエリア側に引き出す引出機構と、を備えた複数の測定部と、
搬送物を搬送先の測定部内に搬送する搬送ユニットと、
前記メンテナンスエリア側から前記測定部に前記搬送物を装填する装填部と、
を備え、
前記測定部は、前記搬送エリア側及び前記メンテナンスエリア側から前記搬送物が装填されることが可能であるプローバ。 - 前記搬送ユニットは、前記搬送物が前記半導体素子の検査用である場合には前記搬送物を前記測定部へ装填し、
前記装填部は、前記搬送物が前記測定部の位置の校正に用いられる場合には前記搬送物を前記測定部へ装填する請求項1に記載のプローバ。 - 前記搬送ユニットは、前記搬送物が環境の制御が必要な場合には前記搬送物を前記測定部へ装填し、
前記装填部は、前記搬送物が環境の制御が必要でない場合には前記搬送物を前記測定部へ装填する請求項1又は2に記載のプローバ。 - 前記装填部が前記測定部に装填する前記搬送物は、校正用プローブカードである請求項1から3のいずれか1項に記載のプローバ。
- 前記搬送ユニットが前記測定部に装填する前記搬送物は、測定用プローブカードである請求項1から4のいずれか1項に記載のプローバ。
- 前記被メンテナンス装置の引出方向と前記搬送物の搬送方向とが一直線状であり、
前記被メンテナンス装置はテストヘッドである、
請求項1から5のいずれか1項に記載のプローバ。 - 前記被メンテナンス装置の引出方向と前記搬送物の搬送方向とが一直線状であり、
前記被メンテナンス装置はテストヘッドとプローブカードとの間に配置されるポゴフレームである、
請求項1から5のいずれか1項に記載のプローバ。
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016055901A JP6447553B2 (ja) | 2016-03-18 | 2016-03-18 | プローバ |
| PCT/JP2016/060790 WO2017158852A1 (ja) | 2016-03-18 | 2016-03-31 | プローバ |
| US16/132,278 US10510574B2 (en) | 2016-03-18 | 2018-09-14 | Prober |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016055901A JP6447553B2 (ja) | 2016-03-18 | 2016-03-18 | プローバ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2017174852A JP2017174852A (ja) | 2017-09-28 |
| JP6447553B2 true JP6447553B2 (ja) | 2019-01-09 |
Family
ID=59852121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016055901A Active JP6447553B2 (ja) | 2016-03-18 | 2016-03-18 | プローバ |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10510574B2 (ja) |
| JP (1) | JP6447553B2 (ja) |
| WO (1) | WO2017158852A1 (ja) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5085534B2 (ja) | 2005-04-27 | 2012-11-28 | エイアー テスト システムズ | 電子デバイスを試験するための装置 |
| US7800382B2 (en) | 2007-12-19 | 2010-09-21 | AEHR Test Ststems | System for testing an integrated circuit of a device and its method of use |
| US8030957B2 (en) | 2009-03-25 | 2011-10-04 | Aehr Test Systems | System for testing an integrated circuit of a device and its method of use |
| TWI782508B (zh) | 2016-01-08 | 2022-11-01 | 美商艾爾測試系統 | 電子測試器中裝置之熱控制的方法與系統 |
| EP3589965B1 (en) | 2017-03-03 | 2023-12-06 | AEHR Test Systems | Electronics tester |
| US11194259B2 (en) * | 2018-08-30 | 2021-12-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Equipment module with enhanced protection from airborne contaminants, and method of operation |
| JP7390934B2 (ja) | 2020-03-03 | 2023-12-04 | 東京エレクトロン株式会社 | 検査装置 |
| KR102949167B1 (ko) | 2020-10-07 | 2026-04-06 | 에어 테스트 시스템즈 | 일렉트로닉스 테스터 |
| US12394678B2 (en) * | 2021-11-03 | 2025-08-19 | Samsung Electronics Co., Ltd. | Test apparatus and method for a semiconductor device |
| JP2024020816A (ja) * | 2022-08-02 | 2024-02-15 | 東京エレクトロン株式会社 | 検査システム |
| KR102806586B1 (ko) * | 2022-10-18 | 2025-05-16 | 주식회사엔피엑스 | 습기 제거부를 구비한 기판 검사 장치 |
| CN121114724A (zh) | 2022-12-30 | 2025-12-12 | 雅赫测试系统公司 | 电子测试器 |
| KR102932829B1 (ko) * | 2024-01-04 | 2026-03-03 | 주식회사 쎄믹스 | 프로브 카드 핸들링 장치 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0732175B2 (ja) | 1988-02-12 | 1995-04-10 | 東京エレクトロン株式会社 | プローブカード自動交換機能付プローブ装置 |
| JPH0758168A (ja) | 1993-08-19 | 1995-03-03 | Tokyo Electron Ltd | プローブ装置 |
| US5912555A (en) | 1995-04-10 | 1999-06-15 | Tokyo Electron Limited | Probe apparatus |
| JP3326751B2 (ja) | 1995-04-10 | 2002-09-24 | 東京エレクトロン株式会社 | テストヘッドの移動方法及び装置並びにプローブ装置 |
| JP2000124274A (ja) | 1998-10-21 | 2000-04-28 | Tokyo Seimitsu Co Ltd | プローバ |
| JP2000150596A (ja) | 1998-11-10 | 2000-05-30 | Tokyo Seimitsu Co Ltd | プローバ |
| JP2002158266A (ja) | 2000-11-20 | 2002-05-31 | Seiko Epson Corp | 半導体測定装置 |
| JP2009277773A (ja) | 2008-05-13 | 2009-11-26 | Micronics Japan Co Ltd | プロービング装置 |
| JP5343488B2 (ja) | 2008-09-26 | 2013-11-13 | 東京エレクトロン株式会社 | プローブ装置 |
| JP2011035724A (ja) * | 2009-08-03 | 2011-02-17 | Canon Inc | 情報処理装置、データ処理方法およびプログラム |
| JP4482616B1 (ja) | 2009-08-07 | 2010-06-16 | 株式会社アドバンテスト | 試験装置および試験方法 |
| JP5664938B2 (ja) | 2013-02-01 | 2015-02-04 | 株式会社東京精密 | プローバ及びプローブ検査方法 |
| JP2014179379A (ja) * | 2013-03-13 | 2014-09-25 | Tokyo Electron Ltd | ウエハ検査装置及び該装置の整備方法 |
| JP6271257B2 (ja) * | 2014-01-08 | 2018-01-31 | 東京エレクトロン株式会社 | 基板検査装置及びプローブカード搬送方法 |
| US9577770B2 (en) * | 2015-05-08 | 2017-02-21 | APS Soutions GmbH | Method for analyzing the RF performance of a probe card, detector assembly and system for analyzing the RF performance of a probe card |
-
2016
- 2016-03-18 JP JP2016055901A patent/JP6447553B2/ja active Active
- 2016-03-31 WO PCT/JP2016/060790 patent/WO2017158852A1/ja not_active Ceased
-
2018
- 2018-09-14 US US16/132,278 patent/US10510574B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017158852A1 (ja) | 2017-09-21 |
| US10510574B2 (en) | 2019-12-17 |
| JP2017174852A (ja) | 2017-09-28 |
| US20190019711A1 (en) | 2019-01-17 |
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