JP6447807B2 - FILTER BOX, MANUFACTURING METHOD THEREFOR, FILTER DEVICE, AND EXPOSURE DEVICE - Google Patents

Description

  The present invention relates to, for example, a filter box that holds a filter for removing impurities in a gas, a filter device including the filter box, an exposure device including the filter device, and a semiconductor element, a liquid crystal using the exposure device, and the like. The present invention relates to a device manufacturing method for manufacturing a display element, an imaging element, or the like. The present invention also relates to a manufacturing method for manufacturing the filter box.

  In this type of exposure apparatus, in order to obtain high exposure accuracy, an exposure main body including a part of an illumination optical system, a reticle stage, a projection optical system, a wafer stage, and the like is installed in a box-shaped chamber, In this chamber, an air conditioner that is controlled to a predetermined temperature and supplies clean gas (for example, air) that has passed through a dust filter by a downflow method and a sideflow method is provided.

  Further, when using short-wavelength light such as KrF excimer laser (wavelength 248 nm) or ArF excimer laser (wavelength 193 nm) as the exposure light, a very small amount in the space (for example, the internal space of the lens barrel) through which the exposure light passes. When there is an organic gas (organic gas), the transmittance of exposure light decreases, and a reaction between the exposure light and the organic gas may cause a cloudy substance on the surface of an optical element such as a lens element. . Further, it is desirable to remove gas (alkaline gas) of an alkaline substance that reacts with the photoresist (photosensitive material) applied to the wafer from the gas supplied into the chamber.

  Therefore, conventionally, a plurality of chemical filters for removing organic gas and / or alkali gas from the gas supplied into the chamber are provided in the gas intake portion of the air conditioner of the exposure apparatus. (For example, refer to Patent Document 1).

US Pat. No. 7,416,574

  In the conventional exposure apparatus, a plurality of chemical filters are stacked while being positioned in the casing. Therefore, when exchanging these chemical filters, it is necessary to sequentially carry out the used chemical filters and then stack the unused chemical filters while aligning them with each other. For this reason, there is a possibility that the replacement time of the chemical filter becomes long, or a positional shift occurs between the plurality of chemical filters, and the airtightness between the chemical filters is lowered.

Furthermore, in the exposure apparatus, the number of stages of chemical filters to be installed is increased in response to further improvement in required exposure accuracy, and therefore it is necessary to efficiently replace the chemical filters.
In view of such circumstances, an aspect of the present invention aims to efficiently replace a filter.

According to the first aspect, the filter box for accommodating the filter is provided on at least two end surfaces of the frame so that the frame holding the filter and the height from the bottom of the frame are different from each other. And an end of the projection provided on the frame on the back side of the frame facing the housing when the filter box is housed in the corresponding housing. A filter box is provided in which the projection is located at the same position as the back surface and the front end of the projection facing the back surface of the frame is located between the center of gravity of the frame and the front surface.

According to the second aspect, it is a filter device that accommodates a filter, comprising the filter box of the aspect of the present invention, and a box-shaped accommodating portion that accommodates the filter box, on the inner surface of the accommodating portion, When the frame is placed on the upper surface of the support portion of the housing portion, a filter device provided with a convex placement portion that contacts the projection portion is provided.
According to a third aspect, there is provided a method for manufacturing a filter box according to an aspect of the present invention, in which a used filter is taken out from a frame of the filter box, and an unused filter is filled in the frame. The height of the protrusion provided on the frame from the bottom of the frame is adjusted according to the type of the filled filter.

According to the fourth aspect, in an exposure apparatus that exposes a substrate through a pattern with exposure light, a chamber that houses an exposure main body that exposes the substrate, at least one filter box of the aspect of the present invention, and An exposure apparatus is provided that includes an air conditioner that blows gas taken in from the outside of the chamber into the chamber through the filter box.
According to a fifth aspect, there is provided a device manufacturing method including exposing a photosensitive substrate using the exposure apparatus according to the aspect of the present invention, and processing the exposed photosensitive substrate.

  According to the aspect of the present invention, for example, by providing a mounting portion (guide portion) corresponding to the protruding portion of the filter box on the side of the housing portion that houses the filter box, the filter box and thus the filter can be replaced efficiently. Can be done.

1 is a partially cutaway view showing a configuration of an exposure apparatus according to an example of an embodiment. It is a perspective view which shows the filter apparatus in FIG. It is a perspective view which shows the state which took out the upper filter box from the filter apparatus. (A) is the front view in which the filter apparatus of FIG. 2 was partially cut away, and (B) is an enlarged view showing the drive unit in FIG. 4 (A). (A) is a perspective view which shows the 1st filter box in FIG. 2, (B) is a perspective view which shows a 2nd filter box. (A) is a cross-sectional view showing the upper filter box in the casing, (B) is a cross-sectional view showing a state in which the upper guide rail member is raised, and (C) is an enlarged view showing an end portion and a drive portion of the guide rail member. FIG. 4D is an enlarged view showing an end portion of the raised guide rail member. (A) is a flowchart which shows an example of the replacement | exchange method of a filter box, (B) is a flowchart which shows an example of the manufacturing method of a filter box. (A) is sectional drawing which shows the state which has taken out the upper filter box of the upper stage in a casing, (B) is sectional drawing which shows the state which has taken out the lower filter box. (A) is sectional drawing which shows the state which inserted the lower filter box of the upper stage in a casing, (B) is sectional drawing which shows the state which mounted the lower filter box on the partition plate, (C) is upper part It is sectional drawing which shows the state which inserts a filter box. FIG. 11A is a partially cutaway front view showing a modified filter device, and FIG. 11B is an enlarged view showing a drive unit in FIG. It is a flowchart which shows an example of the manufacturing process of an electronic device.

Hereinafter, an exemplary embodiment of the present invention will be described with reference to FIGS. 1 to 9C.
FIG. 1 shows an exposure apparatus EX according to this embodiment. In FIG. 1, an exposure apparatus EX holds a light source unit 2 that generates exposure light (exposure illumination light) EL, an illumination optical system ILS that illuminates a reticle R (mask) with exposure light EL, and a reticle R. And a projection optical system PL that projects an image of the pattern of the reticle R onto the surface of a semiconductor wafer (hereinafter simply referred to as a wafer) W coated with a photoresist (photosensitive material) W. Yes. Further, the exposure apparatus EX includes a wafer stage WST that holds and moves the wafer W, other drive mechanisms and sensors, a reticle library 9 that stores a plurality of reticles, a plurality of unexposed and / or A wafer cassette 7 for storing exposed wafers and a main controller (not shown) for comprehensively controlling the operation of the exposure apparatus EX are provided. These members from the light source unit 2 to the main control device (not shown) are installed on the upper surface of the first floor FL1 in the clean room of the semiconductor device manufacturing factory, for example.

  Further, the exposure apparatus EX includes a box-like highly airtight chamber 10 installed on the floor FL1, and the inside of the chamber 10 is formed by a partition member 10d having two openings opened and closed by shutters 24R and 24W, for example. The chamber is divided into an exposure chamber 10a and a loader chamber 10b. An exposure body 4 including an illumination optical system ILS, a reticle stage RST, a projection optical system PL, and a wafer stage WST is installed in the exposure chamber 10a, and the reticle library 9 and the wafer cassette 7 are placed in the loader chamber 10b. A reticle loader system and a wafer loader system are installed.

  Further, the exposure apparatus EX includes an overall air conditioning system for air conditioning the entire interior of the chamber 10. This overall air conditioning system is installed on the upper surface of the second floor FL2 of the machine room below the first floor FL1, and is installed on the upper surface of the floor FL2 with a filter device 26 having a plurality of stacked chemical filters. An air conditioner 30 having an air conditioning main body 31, a large air outlet 18 installed in the upper part of the exposure chamber 10 a, and a small air outlet 19 R disposed on the bottom surface of the sub-chamber 22 that houses the illumination optical system ILS. And a small air outlet 19W disposed in the vicinity of the projection optical system PL. The filter device 26 removes predetermined impurities from the air AR, which is an air conditioning gas taken in from the outside, and supplies the air from which impurities have been removed to the air conditioning main body 31 via the first duct 32 as indicated by an arrow A1. (Details will be described later).

  The air conditioner 30 includes a first duct 32, an air conditioning main body 31, a second duct 35 that connects the air conditioning main body 31 and the inside of the chamber 10 through an opening provided in the floor FL1, and, for example, A dustproof filter 36 such as an ULPA filter (Ultra Low Penetration Air-filter) that is disposed in the middle and removes fine particles from the air flowing inside is provided. The ducts 32 and 35 and the pipe 25 are formed using a material that generates a small amount of contaminants, such as stainless steel or fluororesin.

  The air conditioning body 31 includes a temperature controller 33A that controls the temperature of air supplied through the first duct 32, a humidity controller 33B that controls the humidity of the air, and the air to the second duct 35 side. And a fan motor 34 for blowing air. The temperature of the air is controlled to, for example, 23 ° C. within a range of 20 ° C. to 30 ° C., and is supplied to the inside of the exposure chamber 10 a through the second duct 35 and the outlet 18 in a down flow manner. The inside of the chamber 10 is set to a positive pressure state by the supply of air. The air in the second duct 35 is supplied into the exposure chamber 10a through the branch pipes 35a and 35b and the corresponding outlets 19W and 19R. Part of the air in the exposure chamber 10a also flows into the loader chamber 10b.

  As an example, the air that has flowed through the inside of the chamber 10 (exposure chamber 10a) flows into the exhaust duct 44 under the floor through a large number of openings 45a provided in the bottom surface of the chamber 10 and a large number of openings 45b provided in the floor FL1. The air in the exhaust duct 44 is exhausted after being purified through a filter (not shown). Note that all or part of the air flowing through the exhaust duct 44 can be returned to the filter device 26 side and reused.

  Hereinafter, in FIG. 1, the Z-axis is taken in parallel to the optical axis AX of the projection optical system PL, and the X-axis is perpendicular to the paper surface of FIG. 1 within a plane perpendicular to the Z-axis (in the present embodiment, substantially horizontal). A description will be given taking the Y axis parallel to the paper surface of FIG. As an example, the exposure apparatus EX of the present embodiment is a scanning exposure type, and the scanning direction of the reticle R and the wafer W during scanning exposure is the Y direction. The rotation directions around the X axis, Y axis, and Z axis are also referred to as θx, θy, and θz directions.

  First, the light source unit 2 installed on the floor FL1 outside the chamber 10 is an exposure light source that generates ArF excimer laser light (wavelength 193 nm) as exposure light EL, and a beam that guides the exposure light EL to the illumination optical system ILS. And a light transmission optical system. The exit end of the exposure light EL of the light source unit 2 is disposed in the exposure chamber 10a through the opening at the upper side of the chamber 10 in the + Y direction. As an exposure light source, an ultraviolet pulse laser light source such as a KrF excimer laser light source (wavelength 248 nm), a harmonic generation light source of a YAG laser, a harmonic generation device of a solid laser (semiconductor laser, etc.), or a mercury lamp (i-line etc.) ) Etc. can also be used.

  The illumination optical system ILS disposed in the upper portion of the chamber 10 includes an illuminance uniformizing optical system including an optical integrator, a reticle blind, as disclosed in, for example, US Patent Application Publication No. 2003/0025890. And a condenser optical system. The illumination optical system ILS illuminates a slit-like illumination area elongated in the X direction of the pattern surface of the reticle R defined by the reticle blind with the exposure light EL with a substantially uniform illuminance.

Of the pattern areas formed on the reticle R, the image of the pattern in the illumination area is imaged on the surface of the wafer W via the projection optical system PL that is telecentric on both sides and the projection magnification β is reduced (for example, 1/4). Projected.
A lower frame 12 is installed on the floor FL 1 in the exposure chamber 10 a of the chamber 10 via a plurality of pedestals 11. A flat base member 13 is fixed to the center of the lower frame 12. For example, a flat wafer base WB is supported via three anti-vibration tables 14, and the wafer stage WST can be moved in the X and Y directions via an air bearing on the upper surface parallel to the XY plane of the wafer base WB. And is rotatable in the θz direction. Further, an optical system frame 16 is supported on the upper end of the lower frame 12 via, for example, three anti-vibration tables 15 arranged so as to surround the wafer base WB. The projection optical system PL is disposed in the central opening of the optical system frame 16, and the upper frame 17 is fixed on the optical system frame 16 so as to surround the projection optical system PL.

  Further, a Y-axis laser interferometer 21WY is fixed to an end portion in the + Y direction on the bottom surface of the optical system frame 16, and an X-axis laser interferometer (not shown) is fixed to an end portion in the + X direction on the bottom surface. . Wafer interferometers composed of these interferometers each irradiate a reflecting surface (or moving mirror) on the side surface of wafer stage WST with a measurement beam of a plurality of axes, for example, a reference mirror (not shown) on the side surface of projection optical system PL. ) Is used as a reference to measure the X- and Y-direction positions of wafer stage WST and the rotation angles in θx, θy, and θz directions, and supply the measured values to a main controller (not shown).

  A stage control system in a main controller (not shown) has a drive mechanism (not shown) including a linear motor based on the measured value of the wafer interferometer and the measured value of an autofocus sensor (not shown). The wafer stage WST is controlled so that the position and speed of the wafer stage WST in the X and Y directions and the rotation angle in the θz direction are controlled, and the surface of the wafer W is focused on the image plane of the projection optical system PL. The Z stage (not shown) is controlled. An alignment system ALG and the like for aligning the reticle R and the wafer W are also provided. Instead of the laser interferometer, a so-called encoder device having a diffraction grating and a plurality of detection heads that detect a relative displacement with respect to the diffraction grating by irradiating the diffraction grating with a measurement light beam is used for the wafer stage WST. The position may be measured.

On the other hand, a sub-chamber 22 that houses the illumination optical system ILS is fixed to the upper portion of the upper frame 17 in the + Y direction. Further, the reticle stage RST is mounted on the upper surface of the upper frame 17 parallel to the XY plane so that the reticle stage RST can move at a constant speed in the Y direction, and can move in the X direction and rotate in θz. Yes.
A Y-axis laser interferometer 21RY is fixed to the + Y direction end of the upper surface of the upper frame 17, and an X-axis laser interferometer (not shown) is fixed to the + X direction end of the upper surface. A reticle interferometer including these interferometers irradiates a movable mirror 21MY or the like provided on the reticle stage RST with a plurality of axes of measurement beams, for example, to provide a reference mirror (not shown) on the side surface of the projection optical system PL. As a reference, the positions of the reticle stage RST in the X direction and Y direction, and the rotation angles in the θz, θx, and θy directions are measured, and the measured values are supplied to a main controller (not shown).

The stage control system in the main control device (not shown) is configured such that the speed and position of the reticle stage RST in the Y direction via a drive mechanism (not shown) including a linear motor based on the measurement value of the reticle interferometer, etc. The position in the X direction and the rotation angle in the θz direction are controlled.
Further, when the exposure apparatus EX of the present embodiment is a liquid immersion type, a local liquid immersion mechanism (not shown) including, for example, a ring-shaped nozzle head disposed on the lower surface of the optical member at the lower end of the projection optical system PL. Thus, a predetermined liquid (pure water or the like) is supplied to a local liquid immersion region between the optical member at the tip of the projection optical system PL and the wafer W. As the local immersion mechanism, an immersion mechanism disclosed in, for example, US Patent Application Publication No. 2007/242247 can be used. When the exposure apparatus EX is a dry type, it is not necessary to provide the liquid immersion mechanism.

In the loader chamber 10b, a reticle library 9 and a reticle loader 8 which is a horizontal articulated robot are installed on the upper surface of an upper support base 67. The reticle loader 8 exchanges the reticle R between the reticle library 9 and the reticle stage RST through an opening opened and closed by the shutter 24R of the partition member 10d.
Inside the loader chamber 10 b, a wafer cassette 7 and a horizontal articulated robot 6 a for taking in and out the wafer between the wafer cassette 7 are installed on the upper surface of the lower support stand 68. Above the horizontal articulated robot 6a, a wafer transfer device 6b constituting the wafer loader 6 together with the horizontal articulated robot 6a is installed. Wafer transfer device 6b transfers wafer W between horizontal articulated robot 6a and wafer stage WST through an opening opened and closed by shutter 24W of partition member 10d.

  Then, at the time of exposure by the exposure apparatus EX, alignment of the reticle R and the wafer W is first performed. Thereafter, the exposure of the exposure light EL to the reticle R is started, and a reticle stage RST is projected while projecting a partial image of the pattern of the reticle R onto one shot area on the surface of the wafer W via the projection optical system PL. The pattern image of the reticle R is transferred to the shot area by a scanning exposure operation that moves the wafer stage WST in synchronization with the Y direction using the projection magnification β of the projection optical system PL as a speed ratio (synchronous scanning). After that, by repeating the step movement of the wafer W in the X and Y directions via the wafer stage WST and the above scanning exposure operation, the reticle is applied to all shot areas of the wafer W by the step-and-scan method. An R pattern image is transferred.

  Next, the exposure apparatus EX of the present embodiment maintains the illumination characteristics (illuminance uniformity, etc.) of the illumination optical system ILS and the imaging characteristics (resolution, etc.) of the projection optical system in a predetermined state, and the reticle R, projection In order to perform exposure with high exposure accuracy (resolution, positioning accuracy, etc.) while maintaining the atmosphere (space) in which the optical system PL and the wafer W are installed in a predetermined environment, as described above, the inside of the chamber 10 An overall air conditioning system including an air conditioner 30 that supplies temperature-controlled clean air in a downflow manner is provided.

  The entire air conditioning system includes a local air conditioning unit. That is, clean air whose temperature is controlled is supplied from the branch pipes 35b and 35a of the second duct 35 to the blowing portion 19R on the bottom surface of the sub chamber 22 and the blowing portion 19W on the bottom surface of the optical system frame 16, respectively. In this case, the blowing portions 19R and 19W are disposed on the optical paths of the measurement beams of the Y-axis laser interferometer 21RY for the reticle stage RST and the Y-axis laser interferometer 21WY for the wafer stage WST, respectively. The blowing units 19R and 19W blow out the temperature-controlled air on the optical path of the measurement beam with a substantially uniform wind speed distribution by a down flow method (or a side flow method). Similarly, temperature-controlled air is locally supplied to the optical path of the measurement beam of the X-axis laser interferometer. Accordingly, the positions of reticle stage RST and wafer stage WST can be measured with high accuracy by reticle interferometer 21R, wafer interferometer 21W, and the like.

  A local air conditioner 60 is installed in the loader chamber 10b. The local air conditioner 60 is disposed above the reticle library 9 and the wafer cassette 7, a small fan motor 61 disposed on the bottom surface of the support base 68, a duct 62 that supplies air blown by the fan motor 61 to the upper part. The blowout ports 65 and 66 are provided. The front end of the duct 62 is divided into branch pipes 62R and 62W that supply air to the outlets 65 and 66, respectively. Further, a dust-proof filter such as a ULPA filter is installed in the vicinity of the air inlets of the air outlets 65 and 66, and a filter box for storing a chemical filter for removing predetermined impurities in the duct 62 in the vicinity of the fan motor 61. 63 and 64 are installed. As an example, the chemical filter of the filter box 63 removes an organic gas (organic gas), and the chemical filter of the filter box 64 removes an alkaline gas (an alkaline substance gas) and an acidic gas (an acidic substance gas). Remove.

  When the local air conditioner 60 is operated in the loader chamber 10b, the air blown from the fan motor 61 is sent from the outlets 65 and 66 through the filter boxes 63 and 64 and the duct 62 in a downflow manner, respectively. The wafer cassette 7 is supplied to the space in which it is placed. The air flowing around the reticle library 9 is returned to the fan motor 61 through the periphery of the support base 67, the periphery of the wafer cassette 7 below the support base 67, and the periphery of the support base 68. The air supplied from the outlet 66 to the periphery of the wafer cassette 7 is returned to the fan motor 61 through the periphery of the support base 68. The air returned to the fan motor 61 is again supplied into the loader chamber 10b from the outlets 65 and 66 via the filter boxes 63 and 64 and the dustproof filter. Thus, the air in the loader chamber 10b is kept clean by the local air conditioner 60.

  Next, the configuration of the filter device 26 connected to the air conditioner 30 in the overall air conditioning system of the present embodiment will be described. The filter device 26 includes a box-shaped casing 28 elongated in the Z direction, and partition plates 42A, 42B, and 42C that divide the space in the casing 28 into four spaces S1, S2, S3, and S4 from the top. Further, the filter device 26 includes a plurality of two-stage first filter boxes 38 that are stacked on the upper surface (in the space S1) of the upper partition plate 42A, and the upper surface (in the space S2) of the middle partition plate 42B. A plurality of second-stage filter boxes 40 (see FIG. 2) that are stacked and installed on the upper surface (in the space S3) of the lower partition plate 42C. And a filter box 38. The number of filter boxes 38 and 40 installed in the spaces S1 to S3 is arbitrary. For example, only one filter box 38 and 40 may be installed in each of the spaces S1 and S2, and the space S3 (partition The plate 42C) can be omitted.

  2 and 3 show schematic configurations of the filter device 26 in FIG. 2 and 3, the casing 28 and the like are represented by a two-dot chain line, and in FIG. 2, some of the corresponding members in FIG. 3 are not shown. Yes. In FIG. 2, the filter device 26 has a plurality of hinges in order to open the windows 28d, 28e, 28f of the three spaces S1, S2, S3 of the casing 28 when the filter boxes 38, 40 are replaced. It has three doors 29A, 29B, and 29C that can be opened and closed via a mechanism (not shown). The window side of the casing 28 closed by the doors 29A to 29C is referred to as the front surface 28j of the casing, the surface opposite to the front surface 28j (depth side) of the casing 28 is referred to as the back surface 28k, and the front surface 28j and back surface of the casing 28 The surfaces on the −Y direction side and + Y direction side connecting 28k to the side are referred to as side surfaces 28g and 28h, respectively. Cylindrical intake portions 28a and 28b for taking in air AR for air conditioning from outside are connected to the upper plate 28c of the casing 28 at predetermined intervals in the X direction, and the air AR passes through the intake portions 28a and 28b. 28 flows into the upper space S1. Note that ducts (not shown) may be connected to the intake portions 28a and 28b, respectively, and outdoor air, for example, may be taken in via these ducts.

  In the casing 28 of FIG. 2, four filter boxes 38 are stacked on the upper surface of the uppermost partition plate 42A so as to be in close contact with each other in the X direction and in the Z direction, and the lowermost stage 42A. The four filter boxes 38 stacked on the upper surface of the partition plate 42C so as to be in close contact with each other in two steps in the X direction and in two steps in the Z direction are respectively box-shaped (rectangular A chemical filter 51 for removing an organic gas (organic gas) is held in a frame 50. Flat rails 52A and 52B (see FIG. 5A) that are elongated in the X direction are respectively fixed to the side surfaces of the frame 50 in the −Y direction and the + Y direction at different heights from the bottom surface of the frame 50. As an example, the rail portion 52A is fixed to a position higher than the rail portion 52B with respect to the bottom surface of the frame 50 (see FIG. 4A).

  In addition, the four filter boxes 40 stacked so as to be in close contact with each other in the X direction and in the Z direction on the upper surface of the middle partition plate 42B are box-shaped (each having an upper and lower opening). A chemical filter 56 for removing an alkaline gas (an alkaline substance gas) such as ammonia or amine and an acidic gas (an acidic substance gas) is held in a rectangular frame 55. Flat rails 57A and 57B (see FIG. 5B) elongated in the X direction are also fixed to the side surfaces of the frame 55 in the −Y direction and the + Y direction, respectively, at different heights from the bottom surface of the frame 55. . As an example, contrary to the case of the filter box 38, the rail portion 57A is fixed to a position lower than the rail portion 57B with respect to the bottom surface of the frame 55 (see FIG. 4A).

  In the present embodiment, the shapes of the frames 50 and 55 are the same as each other, but the rail portions 52B and 52B have a height h1 from the mounting surface of the rail portions 52A and 57B (for example, the upper surfaces of the partition plates 42A and 42B). The height h2 (see FIG. 4A) from the placement surface (for example, the partition plates 42A and 42B) of 57A is set low. The height of each filter box 38,40 is 125-200 mm as an example, and the weight of each filter box 38,40 is about 10-20 kg as an example.

  As the organic gas removal chemical filter 51, for example, an activated carbon filter or a ceramic filter can be used. Further, as the chemical filter 56 for removing alkaline gas and acid gas, an additive activated carbon filter, an ion exchange resin filter, an ion exchange fiber filter, an additive ceramic filter, or the like can be used. Also, the frames 50 and 55, the rail portions 52A and 57A, the partition plates 42A to 42C, the casing 28, and the doors 29A to 29C are each made of a material that is corrosion resistant and has little degassing, for example, an oxide film (aluminum oxide or the like) on the surface. ) Is formed (alumite-treated aluminum), stainless steel, or the like. Note that the frames 50 and 55 and the like can be formed of a material (such as a plywood covered with polyethylene or a fluorine-based resin) including a resin material that has corrosion resistance and little degassing.

  By removing the organic gas, the transmittance of the exposure light EL is improved in the exposure chamber 10a of the chamber 10, and the optical element is formed on the surface by the interaction between the organic gas and the exposure light EL. Generation of cloudy material is suppressed. Further, by removing the alkaline gas and the acid gas, a change in the photoresist characteristics of the wafer W in the chamber 10 of FIG. 1 is suppressed. In particular, when the photoresist is a chemically amplified photoresist, if there is an alkaline gas such as ammonia or amine in the air, the generated acid may react to form a slightly soluble layer on the photoresist surface. . Therefore, removal of alkaline gases such as ammonia and amines is particularly effective.

The configuration of the chemical filter in the filter boxes 63 and 64 in the loader chamber 10b in FIG. 1 is the same as the configuration of the chemical filters 51 and 56. However, the filter boxes 63 and 64 are smaller than the filter boxes 38 and 40.
In FIG. 2, the first and second guide rail members 48A having the same shape along the inner surfaces of the side surfaces 28g and 28h and the rear surface 28k of the casing 28 above the partition plate 42A and at a predetermined interval in the Z direction. 48B is arranged. As shown in FIG. 3, the guide rail members 48 </ b> A and 48 </ b> B are arranged in the Y direction at intervals wider than the width of the filter box 38 in the Y direction, and are two elongated flat plate-like shapes extending parallel to the X direction. Rail portions 48A1, 48A2 and 48B1, 48B2, and plate-like connecting portions 48A3, 48B3 elongated in the Y direction for connecting the ends of the rail portions 48A1, 48A2, 48B1, 48B2 in the −X direction are provided. However, in this embodiment, since the height (Z-direction position) of the rail portion 52A in the −Y direction of the filter box 38 is set higher than the rail portion 52B in the + Y direction, the rail portion in the −Y direction. The heights of 48A1 and 48B1 are set higher than the heights of the rail portions 48A2 and 48B2 in the + Y direction connected thereto. The guide rail members 48A and 48B are placed in the + X direction (the filter box 38 in the casing 28) in the side surfaces 28g and 28h of the casing 28 so as to face the end portions in the + X direction of the rail portions 48A1, 48A2 and 48B1 and 48B2. Two sets of drive units 74A and 74B are provided (details will be described later) for moving in a direction that intersects at 45 degrees counterclockwise with respect to the (drawing direction) (hereinafter referred to as a driving direction).

  When the two first-stage and second-stage filter boxes 38 are sequentially installed on the partition plate 42A in the casing 28 and when the filter boxes 38 are taken out from the casing 28, the rails of the guide rail members 48A and 48B. The portions 48A1, 48A2 and 48B1, 48B2 smoothly move the rail portions 52A, 52B of the first-stage and second-stage filter boxes 38 in the X direction, and position the frame 50 of the filter box 38 in the Y direction. Used to do. Further, the connecting portions 48A3 and 48B3 of the guide rail members 48A and 48B are used for positioning the first-stage and second-stage filter boxes 38 in the X direction, respectively. The rail portions 52A and 52B of the two first-stage filter boxes 38 in a state of being placed on the partition plate 42A are in contact with the upper surfaces of the rail portions 48A1 and 48A2 of the first guide rail member 48A, and the partition plate 42A. The rail portions 52A and 52B of the two second-stage filter boxes 38 placed on the upper surfaces of the two first-stage filter boxes 38 are the upper surfaces of the rail portions 48B1 and 48B2 of the second guide rail member 48B. The -X direction surface (rear surface) of the frame 50 of the first (−X direction side) filter box 38 of the first and second stages is in contact with the connecting portions 48A3 and 48B3, respectively. ing. The first-stage and second-stage filter boxes 38 are fixed by their own weights to the upper surfaces of the partition plate 42A and the first-stage filter box 38, respectively.

  Similarly, in FIG. 3, in order to smoothly move the first-stage and second-stage filter boxes 40 on the partition plate 42 </ b> B in the X direction and perform positioning in the X direction and the Y direction, First and second guide rail members 49A and 49B having the same shape as the guide rail member 48A are disposed along the inner surface of the upper casing 28 and at a predetermined interval in the Z direction. Two sets of drive portions 74A and 74B for moving the guide rail members 49A and 49B in the drive direction are provided in the side surfaces 28g and 28h of the casing 28, respectively. However, since the height of the rail portion 57A in the −Y direction of the filter box 40 is set lower than the rail portion 57B in the + Y direction (see FIG. 4A), −Y of the guide rail members 49A and 49B. The height of the rail portion in the direction is set lower than the rail portion in the + Y direction.

  Further, in order to smoothly move the first-stage and second-stage filter boxes 38 on the partition plate 42C in the X direction and to perform positioning in the X direction and the Y direction, the casing 28 above the partition plate 42C First and second guide rail members 48C and 48D having the same shape as the guide rail member 48A are arranged along the inner surface and at a predetermined interval in the Z direction. Two sets of drive portions 74A and 74B for moving the guide rail members 48C and 48D in the drive direction are provided in the side surfaces 28g and 28h of the casing 28, respectively. The guide rail member 48A and the like can be formed of a material having the same corrosion resistance as the partition plate 42A and the like and less degassing, such as anodized aluminum or stainless steel. The guide rail member 48A and the like may be formed by bending one elongated rail-like member, but may be formed by fixing the rail portions 48A1 and 48A2 to both ends of the connecting portion 48A3 by welding or screwing. .

  Further, the interval in the Y direction between the rail portions 48A1 and 48A2 of the guide rail member 48A is wider than the width in the Y direction of the frame 50 of the filter box 38, and the rail portion 52A in the −Y direction from the side surface in the + Y direction of the frame 50. Is set to be narrower than the outer surface (equal to the width from the side surface in the −Y direction of the frame 50 to the outer surface of the rail portion 52B in the + Y direction) (see FIG. 4A). For this reason, the filter box 38 can be reliably moved in the X direction along the rail portions 48A1 and 48A2. The same applies to the guide rail member 49A.

In addition, a handle portion 70 made of a recess for an operator to hold when the filter boxes 38 and 40 are exchanged is provided at two positions separated in the Y direction on the surface (front surface) in the + X direction of the filter boxes 38 and 40. It is attached.
In the present embodiment, the heights of the rail portions 52A and 52B of the filter box 38 are different, and the heights of the rail portions 57A and 57B of the filter box 40 are different from those of the rail portions 52A and 52B. Accordingly, the heights of the rail portions 48A1, 48A2 of the guide rail member 48A (or 48B, 48C, 48D) with respect to the partition plate 42A (or 42C) are different, and two of the guide rail members 49A (or 49B) with respect to the partition plate 42B are used. The height of the rail part is different in the opposite direction. For this reason, it is prevented that the filter box 40 having the chemical filter 56 for removing the alkaline gas and the acidic gas is installed on the partition plates 42A and 42C, and the organic gas is removed on the partition plate 42B. Therefore, the installation of the filter box 38 having the chemical filter 51 is prevented.
The rail portions 52A and 52B of the filter box 38 described above only need to have at least different bottom surface heights of the rail portions 52A and 52B that can contact the guide rail members 48A and 48B. The heights of the upper surfaces (surfaces opposite to the above-described bottom surfaces) of the rail portions 52A and 52B that do not contact with each other are not necessarily different. Similarly, the height of the rail portions 57A and 57B of the filter box 40 may be different as long as at least the bottom surfaces of the rail portions 52A and 52B that can contact the guide rail members 49A and 49B are different.

  In FIG. 2, the doors 29A, 29B, 29C of the casing 28 include the doors 29A-29C and the doors 29A-29C when the windows 28d-28f of the casing 28 are closed. Gaskets 46A, 46B, and 46C for sealing between the two are fixed. The gaskets 46 </ b> A to 46 </ b> C can be formed of a material having excellent corrosion resistance and little degassing, such as a Teflon (registered trademark) sheet or a silicon rubber sheet.

  Next, FIG. 4A is a view showing the casing 28 of the filter device 26 of FIG. 2 as viewed from the front (front side) and the filter boxes 38 and 40 on the front side in section. 4A, the partitions 42A, 42B, and 42C have two openings 42Aa and 42Ab that have the same shape and are spaced apart from each other in the X direction for passing the air AR that has passed through the filter boxes 38 and 40, respectively. (See FIG. 3), 42Ba, 42Bb, and 42Ca, 42Cb are formed. The centers of the openings 42Aa, 42Ab (or 42Ca, 42Cb) and 42Ba, 42Bb substantially coincide with the centers of the openings of the bottom surfaces of the two filter boxes 38 and 40 mounted so as to cover them. In FIG. 3, the openings 42Aa and 42Ab are circular, but the openings 42Aa and 42Ab may be rectangular or square.

  In addition, the bottom surfaces of the rectangular frame-like frames 50 and 55 of the filter boxes 38 and 40 are respectively mounted with mounting surfaces (the upper surface of the partition plate 42A or the like, or the upper surfaces of the first-stage frames 50 and 55). A rectangular frame-shaped gasket 54 is fixed to improve the airtightness between the two. The opening of the gasket 54 is set to a size that can surround the openings 42Aa, 42Ab (or 42Ca, 42Cb) and 42Ba, 42Bb on the surface on which the corresponding filter boxes 38, 40 are placed. The size is set so as to fit between the outer outline and the inner outline of the upper ends of the rectangular frame-like frames 50 and 55 of the filter boxes 38 and 40. For this reason, when the second-stage filter boxes 38, 40 are stacked on the first-stage filter boxes 38, 40, the gasket 54 of the second-stage filter boxes 38, 40 becomes the first-section filter box. 38 and 40 do not protrude toward the chemical filters 51 and 56 side.

The gasket 54 can be formed of a material having excellent corrosion resistance and less degassing, for example, a Teflon (registered trademark) sheet or a silicon rubber sheet. The material of the gasket 54 may be the same as the material of the gaskets 46A, 46B, and 46C in FIG.
Further, as an example, branch duct portions 32 a and 32 b having a circular cross section (or a rectangular shape or the like) are provided on the bottom surface of the partition plate 42 C so as to surround the openings 42 Ca and 42 Cb, and the side surfaces of the branch duct portions 32 a and 32 b and the casing 28 are provided. A merging portion 32c (see FIG. 2) that connects the opening 28i of 28g is provided, and the first duct 32 of FIG. 2 is connected so as to cover the opening 28i. As an example, a shutter mechanism that opens and closes a gas flow path may be provided in the branch duct portions 32a and 32b so that gas containing impurities does not flow into the first duct 32 during replacement of the filter boxes 38 and 40. Good.

  4A, when the doors 29A to 29C (see FIG. 2) of the casing 28 are closed, the upper plate 28c provided with the intake portions 28a and 28b of the casing 28 and the partition plate 42A After passing through the chemical filter 51 of the two-stage filter box 38, the gas in the space S1 sandwiched between the two flows through the openings 42Aa and 42Ab and flows into the space S2 sandwiched between the partition plates 42A and 42B. The gas in the space S2 always passes through the chemical filter 56 of the two-stage filter box 40 and then flows into the space S3 sandwiched between the partition plates 42B and 42C through the openings 42Ba and 42Bb. Similarly, the gas in the space S3 passes through the chemical filter 51 of the two-stage filter box 38, and then passes through the openings 42Ca and 42Cb, the branch duct portions 32a and 32b, and the junction portion 32c, and the second gas in FIG. 1 duct 32 flows. Therefore, the air AR flowing in from the intake portions 28a and 28b at the upper part of the casing 28 must always have a filter box 38 for removing organic gas at two stages, a filter box 40 for removing alkaline gas and acid gas at two stages, and 1 is supplied to the air conditioner 30 of FIG. 1 through the two-stage organic gas removal filter box 38, air in which impurities are highly removed is supplied into the chamber 10.

  In FIG. 4, the guide rail members 48A to 48D, 49A, and 49B are movable along the above moving direction by bolts 72 at two locations separated in the X direction with respect to the side surfaces 28g and 28h of the casing 28, respectively. It is supported. Since the guide rail members 48A to 48D, 49A, and 49B are supported in the same manner, the guide rail members 48A and 48B are typically described as support methods.

  FIGS. 6A and 6B, FIGS. 8A and 8B, and FIGS. 9A to 9C are respectively an upper plate 28c and a partition plate 42A in the casing 28 of FIG. The arrangement | positioning of the member arrange | positioned between is shown. In FIG. 6 (A), two long and narrow strips in the direction inclined at approximately 45 degrees counterclockwise with respect to the + X direction at both ends in the X direction of one rail 48A1 and 48B1 of the guide rail members 48A and 48B, respectively. Holes 48A1a, 48A1b and 48B1a, 48B1b are formed, and the rail portions 48A1, 48B1 are supported on the side surface 28g (see FIG. 4 (A)) of the casing 28 by bolts 72 through these long holes 48A1a, 48A1b and 48B1a, 48B1b. Has been.

  Further, as shown by the elongated hole 48B1a of the rail portion 48B1 in FIG. 6C, the surface of the rail portion 48B1 facing the filter box 38 around the elongated hole 48B1a is approximately ½ of the thickness of the rail portion 48B1. A countersunk portion C6a having a depth of about is formed, the shaft portion of the bolt 72 is inserted into the elongated hole 48B1a, and a head portion C6b having a large diameter of the bolt 72 is installed in the countersunk portion C6a (FIG. 4A). )reference). A screw portion having a diameter smaller than that of the shaft portion at the tip of the bolt 72 is fixed to the screw hole of the side surface 28g. Since the other long holes 48A1a, 48A1b, and 48B1b are similarly supported by the bolts 72, the rail portions 48A1 and 48B1 can be translated along the long holes 48A1a, 48A1b and 48B1a, 48B1b, respectively. Similarly, the other rail portions 48A2 and 48B2 (see FIG. 3) of the guide rail members 48A and 48B are also symmetrical with the rail portions 48A1 and 48B1, respectively, by bolts 72 through the long holes (not shown), and the side surfaces 28h of the casing 28 are. It is supported by. For this reason, the guide rail members 48A and 48B are supported so as to be movable along the longitudinal direction of the long hole 48A1a and the like as a whole.

  Further, in FIG. 6A, drive portions 74A having the same configuration are installed on the side surface 28g of the casing 28 (see FIG. 4A) so as to face the ends in the + X direction of the rail portions 48A1 and 48B1. ing. As shown in FIG. 6C, a rectangular opening 48B1c is formed at the end in the + X direction of one rail part 48B1, and screw parts 48B1d and 48B1e parallel to the X direction so as to pass through the opening 48B1c. Is formed. The drive portion 74A includes a fixing portion 76 fixed to the side surface 28g of the casing 28 by bolts 80 at two locations away from each other in the Z direction, and an elongated hole 76a provided in the fixing portion 76 in the Z direction (FIG. 4 ( B), and a hexagon socket head bolt 78 having a shaft portion inserted through (see B). The screw portion 78a at the tip of the bolt 78 is screwed into the screw portions 48B1d and 48B1e (or only the screw portion 48B1d) of the rail portion 48B1, and the bolt 78 can move in the Z direction along the elongated hole 76a in this state. It is.

  For this reason, as shown in FIG. 6D, when the bolt 78 of the drive unit 74A is tightened and the bolt 78 is further tightened after the head portion 78b of the bolt 78 comes into contact with the fixed portion 76, the rail portion 48B1. Approaches the fixed part 76 side. At this time, the rail portion 48B1 moves in the moving direction B2, which is the direction along the long hole 48B1a, and the gasket 54 of the filter box 38 is detached from the placement surface MP (here, the upper surface of the first-stage filter box 38). The head portion 78b of the bolt 78 moves in the Z direction B3 along the elongated hole 76a. And when the front-end | tip of rail part 48B1 contacts the fixing | fixed part 76, rail part 48B1 stops. Similarly, in the rail portion 48A1, the rail portion 48A1 can be moved in the moving direction along the long holes 48A1a and 48A1b by tightening the bolts 78 of the corresponding drive portions 74A.

  4A, rail portions 48A2 of the guide rail members 48A and 48B are provided by two drive portions 74B (configured symmetrically with the drive portion 74A) fixed to the upper side surface 28h of the partition plate 42A. , 48B2 can be moved in the moving direction. Actually, the rails 48A1 and 48B1 are moved in the movement direction almost simultaneously by the two drive parts 74A and 74B, or the rail part 48A1 (or 48B1) is moved in the movement direction by a predetermined amount by one drive part 74A. By alternately repeating the moving operation and the operation of moving the rail portion 48A2 (or 48B2) by a predetermined amount in the moving direction by the other driving portion 74B, the guide rail member 48A (or 48B) as a whole moves in the moving direction. The gasket 54 of the filter box 38 can be easily detached from the mounting surface. Similarly, the guide rail members 49A and 49B on the partition plate 42B and the guide rail members 48C and 48D on the partition plate 42C can be moved in the moving direction by the drive portions 74A and 74B shown in FIG.

  As shown in FIG. 6A, when the bolt 78 of the drive unit 74A is loosened and the head part 78b of the bolt 78 is separated from the fixed part 76, the guide rail members 48A and 48B are respectively connected to the filter box 38. It is biased in the −Z direction by the load and moves downward (in the direction opposite to the moving direction B2) along the long holes 48A1a and 48B1b. At this time, since there is a margin in the movement stroke of the guide rail members 48A, 48B in the direction opposite to the movement direction B2, almost no force acts from the guide rail members 48A, 48B to the filter box 38 side. For this reason, each filter box 38 is stably mounted on a mounting surface by its own weight.

  Next, the configuration of the filter boxes 38 and 40 will be described with reference to FIGS. 5 (A) and 5 (B). Coordinate systems (X, Y, Z) in FIGS. 5A and 5B are coordinate systems when the filter boxes 38 and 40 are installed in the casing 28 in FIG. As shown in FIG. 5A, the surface of the frame 50 of the filter box 38 that faces the doors 29 </ b> A to 29 </ b> C (see FIG. 2) of the casing 28 when inserted into the casing 28 is the front surface 50 a ( The first surface), the surface facing the back surface 28k of the casing 28 is the back surface 50b (second surface) of the frame 50, and the surfaces facing the side surfaces 28g and 28h of the casing 28 are the side surfaces 50c and 50d (third and third) of the frame 50. 4 sides). For this reason, the side surfaces 50c and 50d of the frame 50 are orthogonal to the front surface 50a and the back surface 50b. However, at least one of the front surface 50a and the back surface 50b may be inclined around an axis parallel to the Y axis with respect to a surface (ZY surface) perpendicular to the side surfaces 50c and 50d of the frame 50. As an example, the frame 50 has a rectangular frame shape in which the width in the Y direction (the interval between the side surfaces 50c and 50d) is slightly wider than the width in the X direction. 5A, for convenience of explanation, the width in the Y direction of the frame 50 is narrower than the width in the X direction, and the width in the Z direction of the rail portions 52A and 52B is the height of the frame 50. On the other hand, it is expressed larger (the same applies to the frame 55 and rail portions 57A and 57B in FIG. 5B).

  Further, an end surface on the upper side (the direction in which gas flows) of the front surface 50a and the rear surface 50b of the frame 50 is referred to as an upper surface 50f, and an end surface facing the upper surface 50f is referred to as a bottom surface 50e. Each surface 55a to 55f of the frame 55 of the filter box 40 in FIG. 5B described later is also specified in the same manner as each surface 50a to 50f of the frame 50 of the filter box 38. The frames 50 and 55 having the same shape are filled with chemical filters 51 and 56, respectively. Two handles 70 are attached to the front surfaces 50a and 55a of the frames 50 and 55, and the bottom surfaces 50e and 55e of the frames 50 and 55 are attached. Each is fitted with a rectangular frame-shaped gasket 54.

  As shown in FIG. 5 (A), the pair of side surfaces 50c and 50d of the frame 50 of the filter box 38 are positioned at heights h1 and h2 from the bottom surface of the gasket 54 and parallel to the X direction from the back surface 50b side. Flat rail portions 52A and 52B are fixed by a plurality of (two in FIG. 5A) bolts 73 arranged in the X direction. The width of the rail portions 52A and 52B in the Z direction is about 1/5 to 1/10 of the height of the frame 50. The heights h1 and h2 are not necessarily measured from the bottom surface of the gasket 54. For example, when the gasket 54 is not provided, the heights h1 and h2 may be set based on the bottom surface 50e of the frame 50.

  The end portions in the −X direction of the rail portions 52A and 52B are substantially at the same position as the back surface 50b or slightly shifted to the front surface 50e side from the back surface 50b. Further, the length L2 in the X direction of the rail portions 52A and 52B exceeds 1/2 of the width L1 in the X direction of the frame 50 (the distance between the front surface 50a and the back surface 50b) and is 4/4 of the width L1. It is set to about 5 or less. Therefore, the end portions in the + X direction of the rail portions 52 </ b> A and 52 </ b> B are shifted to the front surface 50 a side from the position of the center of gravity G of the filter box 38. Therefore, when the filter box 38 is accommodated in the casing 28 or removed from the casing 28, the rail portions 52A and 52B of the filter box 38 are mounted on the rail portions 48A1 and 48A2 of the guide rail member 48A of FIG. The filter box 38 can be stably moved in the X direction along the rail portions 48A1 and 48A2.

  In addition to the plurality of screw holes 50c2 for the bolts 73 for fixing the rail portion 52A, the side surface 50c of the frame 50 has a plurality of screw holes 50c1 at positions shifted to the bottom surface 50e side from the screw holes 50c2. Is formed. The side surface 50d of the frame 50 has a plurality of screw holes (not shown) for bolts 73 for fixing the rail portion 52B symmetrically with the plurality of screw holes on the side surface 50c, and an upper surface than these screw holes. A plurality of screw holes (not shown) at positions shifted to the 50f side are formed.

  As shown in FIG. 5B, the pair of side surfaces 55c and 55d of the frame 55 of the filter box 40 are positioned at heights h2 and h1 from the bottom surface of the gasket 54 and parallel to the X direction from the back surface 55b side. Rail portions 57A and 57B having the same shape as the rail portions 52A and 52B are fixed by a plurality of (two in FIG. 5B) bolts 73 arranged in the X direction. The difference between the heights h1 and h2 is, for example, about the width in the Z direction of the rail portion 52A (57A). The difference in the outer shape between the filter box 40 and the filter box 38 is that the difference in height between the rail portions 57A and 57B (= h2−h1) is the difference in height between the rail portions 52A and 52B (= h1−h2). It is only a point that is opposite to the sign of. In addition to the plurality of screw holes 55c1 for the bolts 73 for fixing the rail portions 57A and 57B, the side surfaces 55c and 55d of the frame 55 are shifted to the upper surface 55f or the bottom surface 55e side from the screw holes 55c1 and the like. A plurality of screw holes 50c2 and the like at the predetermined positions are formed.

  In this case, the height from the bottom surface 55e of the screw hole 55c2 of the frame 55 is the same as the height from the bottom surface 50e of the screw hole 50c2 of the frame 50, and the height from the bottom surface 55e of the screw hole 55c1 of the frame 55 is The height of the screw hole 50c1 of the frame 50 is set to be the same as the height from the bottom surface 50e. Therefore, the chemical filter 56 is temporarily filled in the frame 50, the rails 52A and 52B are connected to the rails 52A and 52B by the bolts 73 through the screw holes 50c1 and the like of the side surfaces 50c and 50d of the frame 50, and the rail 52A is more than the rail 52B. The frame 50 filled with the chemical filter 56 can be used as the filter box 40 by being fixed so as to be lowered. Conversely, the chemical filter 51 is temporarily filled in the frame 55, the rails 57A and 57B are connected to the rails 57A and 57B by the bolts 73 through the screw holes 50c2 on the side surfaces 55c and 55d of the frame 55, and the rail portion 57A is more than the rail portion 57B. The frame 55 filled with the chemical filter 51 can be used as the filter box 38 by being fixed so as to be higher.

  Here, an example of a method for manufacturing the filter boxes 38 and 40 will be described with reference to the flowchart of FIG. First, in step 130, an operator (not shown) takes out the used chemical filter 51 from the frame 50 of the filter box 38 in FIG. 5A and fills the frame 50 with the unused chemical filter 51 or 56 ( Step 132). Then, it is confirmed whether or not the positions of the rail portions 52A and 52B are correct (step 134). At this time, when the filled filter is the chemical filter 51, the position (height h1 and h2) of the rail portions 52A and 52B is correct, and thus the filter box 38 is correctly manufactured. On the other hand, when the filled filter is the chemical filter 56, the positions of the rail portions 52A and 52B are different, and the operation shifts to step 136. Then, the operator loosens the bolt 73 and removes the rail portions 52A and 52B from the frame 50, and then attaches the rail portions 52A and 52B to the frame 50 using the screw holes 50c1 and the like so as to have the heights h2 and h1. . Accordingly, the height of the rail portions 52A and 52B from the bottom surface of the gasket 54 is changed to the height for the chemical filter 56, so that the manufactured filter box can be used as the filter box 40 of FIG. .

According to this filter box manufacturing method, the filter box 38 or 40 can be efficiently manufactured using the same frame 50 (or 55) only by changing the position of the rail portions 52A and 52B (or 57A and 57B). .
Next, an example of an operation for replacing the filter boxes 38 and 40 in the spaces S1 to S3 of the casing 28 of FIG. 2 will be described with reference to the flowchart of FIG.

  At this time, it is assumed that the operation of the air conditioner 30 in FIG. 1 is stopped. First, in step 102 of FIG. 7A, as shown in FIG. 6A, an operator (not shown) opens the door 29A that closes the upper space S1 that is the upper surface of the partition plate 42A. Then, as shown in FIG. 6 (B), the operator tightens the bolts 78 of the drive parts 74A and 74B (see FIG. 3) for the second guide rail member 48B in the upper stage, and then moves the guide rail member 48B. The gasket 54 of the two second-stage used filter boxes 38 is detached from the upper surface of the first-stage filter box 38 by pulling up in the moving direction B2. Thereafter, in step 104, the operator places his / her hand on the handle portion 70 (see FIG. 3) of the filter box 38 on the second door 29A side (second), and the rail portions 52A and 52B of the filter box 38. Is slid along the upper surfaces of the rail portions 48B1 and 48B2 of the guide rail member 48B, and the filter box 38 is taken out of the casing 28. Thereafter, as shown in FIG. 8A, the operator slides the second-stage back (first) filter box 38 in the + X direction along the upper surfaces of the rail portions 48B1 and 48B2, and then changes the direction. The filter box 38 is taken out of the casing 28 along B4.

  In the next step 106, the operator tightens the bolts 78 of the upper drive portions 74A and 74B (see FIG. 3) for the first guide rail member 48A, and pulls up the guide rail member 48A in the moving direction B2. The gaskets 54 of the two first-stage used filter boxes 38 are separated from the upper surface of the partition plate 42A. Thereafter, in step 108, as in step 104, as shown in FIG. 8B, the operator moves the second and first filter boxes 38 of the first stage to the rail portions 48A1 and 48A2 of the guide rail member 48A. After sliding in the + X direction along the upper surface, the filter box 38 is sequentially removed from the casing 28 along the direction B6.

In the next step 110, the operator, as shown in FIG. 9A, the bolt 78 (drive) of the two pairs of drive portions 74A and 74B (see FIG. 3) for the first and second guide rail members 48A. The bolt is loosened, and the tip of the threaded portion 78a of each bolt 78 is moved into the opening 48B1c such as the rail portion 48B1 (see FIG. 6C). At this time, as shown in FIG. 9A, the tip of the head portion 78b of each bolt 78 protrudes in the + X direction (the direction outside the casing 28) from the front surface DP of the space S1 closed by the door 29A. Yes. Thus, by moving the front end portion of the head portion 78b to the position in the + X direction from the front surface DP, that is, the position where the door 29A is not completely closed, as described later, the guide rail members 48A and 48B are moved in the above moving direction. Can be lowered to the required position along the opposite direction.
Hereinafter, in FIG. 5A and FIG. 5B, the filter box 38 (or 40) having the frame 50 (or 55) filled with the unused chemical filter 51 (or 56) is replaced with a filter for replacement. This is called a box.

  In the next step 110, as shown in FIGS. 9A and 3, the operator replaces the rail portions 52A and 52B of the first replacement filter box 38 in the first stage with the rail portions of the guide rail member 48A. 48A1 and 48A2 are mounted on the upper surface, and as indicated by an arrow B7, the rail portions 52A and 52B are slid in the −X direction along the rail portions 48A1 and 48A2, and the rear surface 50b of the frame 50 of the filter box 38 (see FIG. 5 (A)) is brought into contact with the connecting portion 48A3 of the guide rail member 48A.

Subsequently, at step 112, the operator moves the rail portions 52A and 52B of the second replacement filter box 38 at the first stage indicated by a two-dot chain line in FIG. The back surface 50b (see FIG. 5A) of the frame 50 of the filter box 38 is brought into contact with the frame 50 of the first filter box 38 by sliding in the −X direction along the portions 48A1 and 48A2.
In the next step 114, the operator removes the bolts 78 (drive bolts) of the pair of drive portions 74A and 74B (see FIG. 3) for the first guide rail member 48A from the state shown in FIG. 9B. loosen. Accordingly, the rail portions 48A1 and 48A2 of the guide rail member 48A are moved along the elongated holes 48A1a and the like by the loads of the two filter boxes 38, respectively, in the direction opposite to the moving direction B2 in FIG. .) Moves to B9, and the bolt 78 of the drive unit 74A moves along the fixed unit 76 in the -Z direction as indicated by the arrow B11. As shown in FIG. 9C, the two filter boxes 38 in the first stage are stably installed on the partition plate 42A by their own weights with the respective gaskets 54 in close contact with the upper surface of the partition plate 42A. Is done. In this state, almost no force is applied to the filter box 38 from the guide rail member 48A. At this time, the operator may press the two filter boxes 38 in the −Z direction so that the two filter boxes 38 are in close contact with the partition plate 42A. Further, the head portion of the bolt 78 of the drive unit 74A is located away from the fixed unit 76 in the + X direction.

In the next step 116, as in steps 110 and 112, the first and second filter boxes 38 in the second stage are sequentially moved along the guide rail member 48B as indicated by an arrow B12 in FIG. Moving in the X direction, the two filter boxes 38 are placed on the guide rail member 48B.
In the next step 118, the operator loosens the bolts 78 of the pair of drive portions 74A and 74B (see FIG. 3) for the second guide rail member 48B. As a result, the rail portions 48B1 and 48B2 of the guide rail member 48B are moved in the installation direction along the elongated holes 48B1a and the like by the loads of the two filter boxes 38, and the bolts 78 of the drive portion 74A are moved along the fixed portion 76 − Move in the Z direction. Then, as shown in FIG. 6C, the two filter boxes 38 in the second stage have two gaskets 54 in the first stage in a state where the gaskets 54 are in close contact with the upper surface of the filter box 38 in the first stage. It is installed on the upper surface of the filter box 38.

In the next step 120, the same operations as in steps 102 to 118 are repeated to replace the two filter boxes 40 and 38 on the partition plate 42B (middle) and the partition plate 42C (lower) in FIG. Replace with boxes 40 and 38. Thereafter, the doors 29A to 29C in FIG. 2 are closed, air conditioning in the chamber 10 is started using the filter device 26 and the air conditioner 30 (step 122), and exposure by the exposure apparatus EX is performed (step 124).
According to this filter box replacement method, when the filter boxes 38 and 40 are installed in the casing 28 and when the filter boxes 38 and 40 are removed from the casing 28, the rail portions 52A of the frames 50 and 55 of the filter box 38 are used. , 52B and 57A, 57B are moved along the guide rail members 48A to 48D and 49A, 49B in the casing 28, respectively, so that the filter boxes 38, 40 can be installed and removed efficiently. Further, when the filter box 38 is installed, the frame 50 of the filter box 38 is positioned along, for example, the rail portions 48A1 and 48A2 and the connecting portion 48A3 of the guide rail member 48A, thereby positioning the filter box 38 in the casing 28. It can be done easily and accurately. The same applies to the filter box 40.

  As described above, the exposure apparatus EX of the present embodiment includes the entire air conditioning system including the filter device 26 and the air conditioner 30. The filter device 26 includes a filter box 38 that accommodates the chemical filter 51 (filter), a box-shaped casing 28 (accommodating portion) that accommodates the filter box 38, and a convex guide provided on the inner surface of the casing 28. Rail member 48A (mounting portion). The filter box 38 has a frame-like frame 50 that holds the chemical filter 51 and at least two side surfaces 50c and 50d (end surfaces) of the frame 50 so that the height from the bottom surface 50e of the frame 50 is different from each other. Rail portions 52A and 52B (protrusions) provided.

According to the present embodiment, the rail portions 52A and 52B of the filter box 38 are relatively moved along the guide rail members 48A (rail portions 48A1 and 48A2) provided on the casing 28, whereby the casing of the filter box 38 is obtained. 28 can be efficiently installed and removed from the casing 28, and the chemical filter 51 can be replaced efficiently, and the chemical filter 51 can be easily positioned after the replacement.
Note that when the filter box 38 is installed in the casing 28, the protrusion of the filter box 38 (for example, the rail portions 52A and 52B) is not slid along the corresponding member, and the protrusion is supported from above. It may be placed on.

  Further, the difference in height between the rail portions 57A and 57B (projections) of the filter box 40 that accommodates another type of chemical filter 56, and the height of the rail portions 52A and 52B of the filter box 38 that accommodates the chemical filter 51. Therefore, it is possible to prevent the filter boxes 38 and 40 (chemical filters 51 and 56) from being installed in the wrong positions.

  The filter box 38 of the present embodiment includes a frame 50 that holds the chemical filter 51, and a frame-shaped gasket 54 (seal member) provided on the bottom surface 50e among the top surface 50f and the bottom surface 50e of the frame 50. Rail portions 52A and 52B as a pair of convex sliding portions respectively disposed substantially parallel to the bottom surface 50e on two opposing side surfaces 50c and 50d between the upper surface 50f and the bottom surface 50e of the frame 50. Is provided. Further, the partition plate 42A on which the bottom surface 50e of the frame 50 is placed on the inner surface of the casing 28, and the pair of rail portions 52A and 52B of the frame 50 when the frame 50 is placed on the upper surface of the partition plate 42A. Rail portions 48A1 and 48A2 are provided as a pair of convex guide portions parallel to the upper surface of the partition plate 42A for guiding movement in a direction parallel to the upper surface of the partition plate 42A.

  According to the present embodiment, the rails 52A and 52B of the frame 50 are brought into contact with the rails 48A1 and 48A2, and the rails 52A and 52B are moved relative to the rails 48A1 and 48A2, thereby the filter box. 38, the filter box 38 and the partition plate 42A are sealed by the gasket 54. For this reason, all the gas in the casing 28 passes the chemical filter 51 of the filter box 38, and an impurity can be removed with high precision.

  Further, the exposure apparatus EX of the present embodiment accommodates the exposure main body 4 that exposes the wafer W in the exposure apparatus that exposes the wafer W (substrate) through the pattern of the reticle R and the projection optical system PL with the exposure light EL. And a filter device 26 according to the present embodiment, and an air conditioner 30 that blows air taken in from the outside of the chamber 10 into the chamber 10 through the filter device 26.

According to the present embodiment, the filter boxes 38 and 40 can be exchanged efficiently in the filter device 26, so that the exposure apparatus can be efficiently maintained, and impurities in the air in the chamber 10 can be removed. Can be removed with high accuracy.
In the present embodiment, a frame provided with rail portions 52A and the like similar to the frames 50 and 55 of the filter boxes 38 and 40 is also used as the frame of the filter boxes 63 and 64 of the local air conditioner 60 in the loader chamber 10b. In use, the filter boxes 63 and 64 may be accommodated in a casing having a guide member similar to the rail portions 48A1 and 48A2 (guide rail member 48A) in the casing 28.

In the above embodiment, the following modifications are possible.
First, in the above embodiment, for example, the rail portions 52A and 52B of the side surfaces 50c and 50d of the frame 50 of the filter box 38 of FIG. On the other hand, instead of the rail portion 52A (the same applies to the rail portion 52B), a short flat plate member fixed along the X direction at two locations (or three or more locations) separated in the X direction on the side surface 50c. (At least two portions whose distances from the bottom surface 50e are substantially equal to each other) may be used.

Further, instead of the rail portion 52A (the same applies to the rail portion 52B), a rotating body that is rotatably provided at two locations (three or more locations) apart from each other in the X direction of the side surface 50c may be used.
Further, the bottom surfaces of the rail portions 52A and 52B of the frame 50 (portions that come into contact with the guide rail member 48A) are not linear, and may be, for example, a plurality of arcs with a predetermined period.

In the above embodiment, the sign of the height difference between the rail parts 52A and 52B of the filter box 38 and the sign of the height difference between the rail parts 57A and 57B of the filter box 40 are opposite. The absolute value of the difference between the heights of the 38 rail portions 52A and 52B may be different from the absolute value of the height of the rail portions 57A and 57B of the filter box 40.
Further, for example, the sign of the height difference between the rail parts 52A and 52B of the filter box 38 is the same as the sign of the height difference between the rail parts 57A and 57B of the filter box 40, and the rail part 57A of the filter box 40 , 57B may be different from the absolute value of the height difference between the rail portions 52A, 52B of the filter box 38.

  In addition, the height of the rail portions 52A and 52B of the filter box 38 is set to the same height (for example, h1), the height of the rail portions 57A and 57B of the filter box 40 is the same, and the height of the rail portions 52A and 52B is set. May be set to a different height (for example, h2). In this case, it is possible to prevent the filter boxes 38 and 40 from being installed at wrong positions by setting the guide rail members 48A and 49A to the corresponding heights. Further, the filter boxes 38 and 40 may have the same outer shape. In this case, the filter boxes 38 and 40 may be identified by attaching an identifiable label to the chemical filters 51 and 56 (or the frames 50 and 55), for example.

  Further, the chemical filter 51 (filter medium) of the filter box 38 removes organic gas (organic matter) in the gas passing through the filter box 38, and the chemical filter 56 (filter medium) of the filter box 40 is the gas passing therethrough. Since the alkaline gas and acidic gas therein are removed, air from which impurities are highly removed can be supplied into the chamber 10 in which the exposure main body 4 is accommodated.

The filter in the filter box 40 may be, for example, a filter that removes at least one of an alkaline substance and an acidic substance in a gas passing through the filter box 40.
Moreover, as a filter in the filter boxes 38 and 40, arbitrary filters (filter material) other than a chemical filter can be used. For example, as the filters of the filter boxes 38 and 40, it is also possible to use a dustproof filter for removing minute particles (particles) such as a HEPA filter or a ULPA filter.

  Furthermore, in the filter device 26 of the present embodiment, a total of two rows and four stages of filter boxes 38 and two rows and two stages of filter boxes 40 are installed, but the number of filter boxes 38 is arbitrary, The number of filter boxes 40 is also arbitrary. Further, the filter device 26 may be provided with only one or a plurality of stages of filter boxes 38 or one or a plurality of stages of filter boxes 40.

Further, the casing 28 of the filter device 26 is partitioned into a plurality of spaces by partition plates 42A to 42C, but the filter boxes 38 and 40 are simply stacked alternately, for example, without partitioning the casing 28 by the partition plates 42A to 42C. It is also possible.
Further, as in the modification shown in FIGS. 10A and 10B, the rail portions 52A, 52A of the filter box 38 are provided above the drive portions 74A, 74B (or the guide rail members 48A, 48B) on the inner surface of the casing 28. Convex members 74A ′ and 74B ′ may be provided at intervals through which 52B can pass. In addition, convex members 74A ′ and 74B ′ may be provided on the inner surface of the casing 28 corresponding to the rail portions 57A and 57B of the other filter box 40 at intervals through which the rail portions 57A and 57B can pass, respectively. . In this case, since the guide rail members 48A, 48B and the like move in the vertical direction (Z direction), the members 74A ′ and 74B ′ may also be movable in the Z direction. When the filter box 38 is accommodated in the casing 28, the filter box 38 is inserted so that the rail parts 52A and 52B of the filter box 38 pass between the drive parts 74A and 74B and the members 74A ′ and 74B ′, respectively. Thus, the filter box 38 can be easily installed. The same applies to the filter box 40.

  Further, when an electronic device (or a micro device) such as a semiconductor device is manufactured using the exposure apparatus EX of the above embodiment, the electronic device performs a function / performance design of the electronic device as shown in FIG. 221, manufacturing a mask (reticle) based on this design step 222, manufacturing a substrate (wafer) as a base material of the device and applying a resist 223, mask pattern by the exposure apparatus of the above-described embodiment A substrate (sensitive substrate), a process for developing the exposed substrate, a substrate processing step 224 including heating (curing) and etching process of the developed substrate, a device assembly step (dicing process, bonding process, package process) 225) as well as the inspection step 22 It is manufactured through the like.

Therefore, this device manufacturing method includes forming the pattern of the photosensitive layer on the substrate using the exposure apparatus of the above embodiment, and processing the substrate on which the pattern is formed (step 224). Yes. According to the exposure apparatus, the maintenance cost can be reduced and the exposure accuracy can be improved, so that the electronic device can be manufactured at a low cost with high accuracy.
In the above embodiment, air is used as the air conditioning gas. Instead, nitrogen gas or a rare gas (such as helium or neon), or a mixed gas of these gases may be used. .

Further, the present invention can be applied not only to a scanning exposure type projection exposure apparatus but also to exposure using a batch exposure type (stepper type) projection exposure apparatus.
The present invention can also be applied when exposure is performed using a proximity type or contact type exposure apparatus that does not use a projection optical system.
In addition, the present invention is not limited to application to a semiconductor device manufacturing process. For example, a manufacturing process of a display device such as a liquid crystal display element or a plasma display formed on a square glass plate, or an imaging element (CCD, etc.), micromachines, MEMS (Microelectromechanical Systems), thin film magnetic heads, and various devices such as DNA chips can be widely applied. Furthermore, the present invention can also be applied to a manufacturing process when manufacturing a mask (photomask, reticle, etc.) on which mask patterns of various devices are formed using a photolithography process.

  As described above, the present invention is not limited to the above-described embodiment, and it is needless to say that various configurations can be taken without departing from the gist of the present invention.

  EX ... exposure device, R ... reticle, PL ... projection optical system, W ... wafer, 4 ... exposure body, 10 ... chamber, 26 ... filter device, 28 ... casing, 30 ... main air conditioner, 38, 40 ... filter box 42A to 42C ... partition plates, 48A to 48D, 49A, 49B ... guide rail members, 50, 55 ... frames, 51, 56 ... chemical filters, 52A, 52B, 57A, 57B ... rail sections, 60 ... local air conditioners, 70 ... handle part

Claims (17)

A filter box containing a filter,
A frame holding the filter;
A protrusion provided on each of at least two end faces of the frame such that the height from the bottom of the frame is different from each other ;
When the filter box is accommodated in the corresponding accommodating portion, the end of the protrusion provided on the frame on the back side of the frame facing the accommodating portion is at the same position as the back surface,
The front end portion of the protrusion that faces the back surface of the frame is a filter box that is located between the center of gravity of the frame and the front surface.   The filter box according to claim 1, wherein heights of the protrusions from the bottom of the frame are different from each other depending on a type of the filter. The filter box according to claim 1 or 2 , wherein a plurality of screw hole portions in a plurality of rows are formed in parallel with the bottom portion on an end surface of the frame where the protrusion portion is provided. The bottom surface of the protruding portion can contact the support portion of the housing portion,
The filter box according to any one of claims 1 to 3 , wherein heights of the bottom surfaces of the protrusions are different from each other. The protrusions filter box according to any one of claims 1 to 4, which is a plate-like member to a direction parallel to the longitudinal direction to the end face of each of the frames. The filter box as described in any one of Claims 1-5 which has a handle part provided in the said flame | frame. The said filter is a filter box as described in any one of Claims 1-6 which removes the organic substance in the gas which passes the said filter. The filter box according to any one of claims 1 to 7 , wherein the filter removes at least one of an alkaline substance and an acidic substance in a gas passing through the filter. A filter device for accommodating a filter,
The filter box according to any one of claims 1 to 8 ,
A box-shaped storage section for storing the filter box,
A filter device in which a convex placement portion is provided on the inner surface of the housing portion, which contacts the projection when the frame is placed on the upper surface of the support portion of the housing portion. In the housing part,
When the frame is placed on the upper surface of the support portion, a height adjusting mechanism is provided for lowering the height of the placement portion from the support portion and separating the placement portion from the projection portion. The filter device according to claim 9 . Each of the placement parts is a flat plate member having a longitudinal direction in a direction parallel to the upper surface of the support part,
The height adjustment mechanism is
Two elongated holes that are respectively provided at both ends in the longitudinal direction of the mounting portion and are elongated in a direction oblique to the normal direction of the upper surface of the support portion;
Two pin members respectively engaged with two sets of the two long hole portions and provided at the same height from the upper surface of the support portion;
Two drives for moving the pair of the mounting parts in a direction parallel to the upper surface of the support part in a state where the two elongated holes of the mounting part are respectively engaged with the two pin members. The filter device according to claim 10 , further comprising: The accommodating portion is
A window part through which the filter box passes when placing the filter box on the upper surface of the support part;
An opening and closing part for opening and closing the window part,
The filter device according to claim 11 , wherein at least a part of the two drive units mechanically interferes with the opening / closing unit in a state where the placement unit is not separated from the protrusion of the frame. In the housing part, a connecting member for connecting an end part on the side facing the end part on the side where the frame of the placement part is put in and out is provided,
The filter device according to any one of claims 9 to 12 , wherein the connecting member performs positioning in a direction parallel to an upper surface of the support portion of the frame. The height of the mounting portion from the support portion is different from each other depending on the type of the filter,
The height from the bottom of the frame of the protrusions of the filter box, filter apparatus according to any one of the corresponding pre-described mutually different claims in accordance with the height of the part 9-13. It is a manufacturing method of the filter box as described in any one of Claims 1-8 ,
Removing the used filter from the frame of the filter box;
Filling the frame with the unused filter;
Adjusting the height of the protrusion provided on the frame from the bottom of the frame according to the type of the filled filter;
A method for manufacturing a filter box. In an exposure apparatus that exposes a substrate through a pattern with exposure light,
A chamber for storing an exposure main body for exposing the substrate;
The filter device according to any one of claims 9 to 14 ,
An air conditioner for blowing gas taken from outside the chamber into the chamber via the filter device;
An exposure apparatus comprising: Exposing a photosensitive substrate using the exposure apparatus according to claim 16 ;
Processing the exposed photosensitive substrate.

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