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JP6454849B2 - Method for forming metal film on columnar base material - Google Patents
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JP6454849B2 - Method for forming metal film on columnar base material - Google Patents

Method for forming metal film on columnar base material Download PDF

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JP6454849B2
JP6454849B2 JP2014074989A JP2014074989A JP6454849B2 JP 6454849 B2 JP6454849 B2 JP 6454849B2 JP 2014074989 A JP2014074989 A JP 2014074989A JP 2014074989 A JP2014074989 A JP 2014074989A JP 6454849 B2 JP6454849 B2 JP 6454849B2
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base material
columnar base
remelting
metal film
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JP2016074923A (en
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井上 貴博
貴博 井上
展 周
展 周
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Mazda Motor Corp
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Description

本発明は、金属製の母材の表面に定着させた溶射被膜を溶融処理して金属皮膜を得るための金属皮膜の形成方法に関する。特に、先端隅に角部を有する柱状母材を対象とし、この対象の母材表面へ、金属材表面の摩耗、傷付き、表面劣化の修復を目的とした金属皮膜を形成する場合の形成方法に関する。   The present invention relates to a method for forming a metal film for obtaining a metal film by subjecting a sprayed coating fixed on the surface of a metal base material to a melting treatment. In particular, a method for forming a metal film intended for repairing wear, scratches, and surface degradation of a metal material surface on a target base metal surface having a corner at the tip corner. About.

従来、母材表面に、金属粉末の溶射によって溶射被膜を定着させ、この定着させた溶射皮膜を高圧下で再溶融することにより、溶射皮膜を変性させて耐摩耗性、耐熱性、耐食性のある金属皮膜を形成する方法が知られている。この溶射被膜の変性は、再溶融によって溶射皮膜中に含まれる微細気泡やガスを脱気し、また溶射皮膜中の金属酸化物を表面側に浮き上がらせて緻密な金属皮膜を形成すると共に、母材表面への定着力を上げるものである。従来の溶射被膜の再溶融処理を行う際には、ガス炎による加熱、誘導加熱、炉による加熱、或いは、環状の誘導コイルによる誘導加熱が行われる。   Conventionally, the thermal spray coating is fixed on the surface of the base metal by thermal spraying of metal powder, and the fixed thermal spray coating is remelted under high pressure to modify the thermal spray coating to have wear resistance, heat resistance, and corrosion resistance. A method for forming a metal film is known. This modification of the sprayed coating involves degassing fine bubbles and gases contained in the sprayed coating by remelting, and the metal oxide in the sprayed coating rises to the surface side to form a dense metal coating and It increases the fixing power on the material surface. When remelting a conventional sprayed coating, heating by a gas flame, induction heating, heating by a furnace, or induction heating by an annular induction coil is performed.

前記と同様の溶射被覆方法として従来、金属円柱体の外周面に金属基溶射材料を高速溶射ガンにより溶射して緻密な被覆を形成させる被覆方法であって、移動方式による溶射操作を、前記外周面に対する高速ガンの相対走査速度を30〜80dm/minとして溶射スポット内の溶射面の温度上昇を抑えて行うことにより、気孔のない溶射被覆を形成させる方法が開示される。これは溶射したままの状態で緻密な被覆を形成することのできる高速溶射ガンを従来よりも速い速度で走査させて溶射を行うことにより、有害な大きさの気孔が含まれないレベル迄被覆の緻密度を向上させることができる、とされる。 Conventionally, as a spray coating method similar to the above, a coating method in which a metal base sprayed material is sprayed on a peripheral surface of a metal cylinder by a high-speed spray gun to form a dense coating. A method is disclosed in which a thermal spray coating without pores is formed by setting the relative scanning speed of the high-speed gun with respect to the surface to 30 to 80 dm 2 / min while suppressing an increase in the temperature of the spray surface in the spray spot. This is achieved by spraying a high-speed spray gun that can form a dense coating in a sprayed state at a higher speed than before, so that the coating does not contain harmful-sized pores. It is said that the density can be improved.

また金属被覆層の形成方法として従来、母材の表面に、金属材料の一次被覆層を溶射法等を用いて形成し、その後、前記一次被覆層の小領域を局部的に誘導子を用いて誘導加熱し、前記一次被覆層を溶融させると共にその誘導子を前記一次被覆層に沿って相対的に移動させることによってその溶融部を一次被覆層に沿って移動させてゆき、前記溶融部に作用する
電磁攪拌力を利用して、前記一次被覆層に存在していた気孔及び酸化物を除去し、緻密な二次被覆層とする方法が開示される。同方法においては少なくとも前記一次被覆層の溶融時に
おける誘導電流の電流浸透深さを前記一次被覆層の厚さの1.5倍以上とする。そして少なくとも一次被覆層を誘導加熱して溶融させている時における誘導電流の電流浸透深さを一次被覆層の厚さの1.5倍以上とすることにより、一次被覆層の誘
導電流密度を、特に表層の誘導電流密度を小さくでき、これによって溶融層に作用する電磁攪拌力を小さくして被覆層の凹み、くびれ等の発生を防止でき、良好
な品質の金属被覆層を形成できるという効果を有している、とされる。
As a method for forming a metal coating layer, conventionally, a primary coating layer of a metal material is formed on the surface of a base material by using a thermal spraying method or the like, and then a small region of the primary coating layer is locally used with an inductor. Inductive heating causes the primary coating layer to melt and moves the inductor along the primary coating layer by moving the inductor relative to the primary coating layer to act on the melting portion. A method is disclosed in which pores and oxides present in the primary coating layer are removed using an electromagnetic stirring force to form a dense secondary coating layer. In this method, the current penetration depth of the induced current at least when the primary coating layer is melted is 1.5 times or more the thickness of the primary coating layer. And by setting the current penetration depth of the induced current when the primary coating layer is melted by induction heating at least 1.5 times the thickness of the primary coating layer, the induced current density of the primary coating layer is In particular, the induced current density of the surface layer can be reduced, thereby reducing the electromagnetic stirring force acting on the molten layer, preventing the occurrence of dents and constriction in the coating layer, and the effect of being able to form a metal coating layer of good quality. It is said that it has.

特開平09−248606号公報JP 09-248606 A 特開平11−209865号公報JP-A-11-209865

しかしながら、円柱或いは多角形柱といった、先端隅に角部を有する柱状母材に再溶融処理を行う場合には、上記従来の溶射被覆方法或いは金属被覆層の形成方法を適用すると、角部周辺で再溶融後の皮膜厚さに偏りがでたり、或いは平坦部と角部とで組成の緻密度に偏りがでたりする場合があった。これは表面から溶融を行って溶融による変性が表面から進むという関係上、角部の中央近傍では溶融熱が部分的に集中し、溶融エネルギーの過多付与部となる一方、角部の周辺近傍や角部以外の平坦部では逆に溶融熱が比較的不足し、溶融エネルギーの過少付与部となることに基づく、と考えられる。
特に溶射被膜厚さが3〜5mm以上の厚い溶射被膜の場合には、再溶融による被膜厚さや緻密度の偏りが顕著に出やすい傾向がある。前記偏りによって、耐摩耗性、耐熱性、耐食性といった金属皮膜の性状の低下、或いは金属皮膜の表面平滑度の低下を招く可能性がある。そして、再溶融による金属皮膜層を母材の修復補強に用いる場合には、これら性状の低下や表面平滑度の低下は致命的な欠陥に繋がることとなる。
However, when remelting a columnar base material having a corner at the tip corner, such as a cylinder or a polygonal column, the conventional thermal spray coating method or metal coating layer forming method is applied around the corner. In some cases, the film thickness after remelting is uneven, or the density of the composition is uneven between the flat portion and the corner portion. This is because melting is performed from the surface and the modification due to melting proceeds from the surface, so that the heat of fusion is partially concentrated near the center of the corner and becomes an excessive application portion of melting energy, On the other hand, it is considered that the flat part other than the corner part is based on the fact that the heat of fusion is relatively insufficient and becomes a part where the melt energy is insufficiently provided.
In particular, in the case of a thick sprayed coating having a sprayed coating thickness of 3 to 5 mm or more, there is a tendency that the coating thickness and the density deviation due to remelting tend to be noticeable. The unevenness may cause a decrease in the properties of the metal film such as wear resistance, heat resistance, and corrosion resistance, or a decrease in the surface smoothness of the metal film. And when using the metal film layer by remelting for the repair reinforcement of a base material, the fall of these properties and the fall of surface smoothness will lead to a fatal defect.

そこで本発明では、金属皮膜の形成方法において、円柱或いは多角形柱といった、先端隅に角部を有する柱状母材に再溶融処理を行う場合において、溶融熱の部分的な集中や不足を解消し、溶融エネルギーの過多付与部分や過少付与部分の発生を抑制することで、再溶融後の皮膜厚さや組成の緻密度の偏りを解消することを課題とする。また前記偏りに基づく金属皮膜の性状の低下、或いは金属皮膜の表面平滑度の低下を防止することを課題とする。   Therefore, in the present invention, in the method of forming a metal film, when remelting processing is performed on a columnar base material having a corner at the tip corner, such as a cylinder or a polygonal column, partial concentration and deficiency of melting heat is eliminated. It is an object of the present invention to eliminate the unevenness of the film thickness and the composition density after remelting by suppressing the occurrence of an excessively imparted part or an insufficiently imparted part of the melting energy. It is another object of the present invention to prevent a decrease in the properties of the metal film based on the bias or a decrease in the surface smoothness of the metal film.

上記課題を解決すべく本発明では下記(1)〜(6)の手段を講じている。   In order to solve the above problems, the present invention employs the following means (1) to (6).

(1)本発明の柱状母材への金属皮膜の形成方法は、先端面(11)の周縁に角部(1C)を有する柱状母材(1)に対して金属皮膜を形成する方法であって、
前記先端面(11)及び角部(1C)を含む柱状母材(1)の端部全体に、金属粉末の溶射によって溶射被膜を定着させる溶射工程と、
柱状母材(1)の側周部を囲う加熱子(C)によって前記溶射皮膜を再溶融することにより、溶射皮膜を変性させて、前記角部を含む母材表面に金属皮膜を形成する再溶融工程と、を具備してなり、
前記再溶融工程においては、柱状母材(1)を、前記角部を含む先端面(11)が鉛直下方を向いた垂下状態(a)、又は所定の対水平傾斜角(θ)で斜め方向を向いた傾斜状態(b/c)のいずれかの状態で保持し、かつ、柱状母材(1)の柱軸(1A)周りに回転させながら再溶融することを特徴とする。
上記方法によって垂下状態又は傾斜状態とし、かつ柱軸(1A)周りに回転させながら再溶融することで、柱状母材(1)表面の溶射被膜が再溶融時に除かれるのを防ぐことができる。特に角部の溶射被膜は、再溶融時の自重によって膜厚さが薄くなったり偏ったりすることがなく、母材の角部形状に影響されずに他の部分の溶射被膜と同じ状態を保つことができる。すなわち図2に示すように、垂下状態又は傾斜状態で軸回転した状態では、先端面(11)が鉛直下方又は斜め方向を向いたまま角部(1C)が鉛直軸周り又は斜め軸周りに周回転することとなる。軸回転によって再溶融した溶射皮膜層が自重によって流れ落ちるように流動することで、被膜内部が緩やかな速度で混練され、溶射被膜全体で比較的均一に変性される。
ここで前記傾斜状態は、対水平傾斜角度(θ)が下方へ正値を有するように先端面(11)が下方を向いて傾斜した下方傾斜状態(b)であることが好ましい。下方傾斜状態(b)のとき、角部(1C)上に定着した金属皮膜は、再溶融工程において、必ず母材角部の下面又は側面に定着したまま角部から角部表面上に滞留したまま垂下して、結果的に溶射被膜の膜厚さを維持するか膜厚さが大きくなる状態で溶融することとなる。特に対水平傾斜角度(θ)が下方へ15度以上となった下方傾斜状態(b)では、角部(1C)上に定着した金属皮膜は、再溶融時に受ける重力の角度が順次変わっていくため、内部流動によって金属皮膜が均一にローテーションされる。
(1) The method of forming a metal film on the columnar base material of the present invention is a method of forming a metal film on the columnar base material (1) having a corner (1C) at the periphery of the tip surface (11). And
A thermal spraying step of fixing a thermal spray coating to the entire end of the columnar base material (1) including the tip surface (11) and the corners (1C) by thermal spraying of metal powder;
The thermal spray coating is remelted by a heater (C) that surrounds the side periphery of the columnar base material (1), thereby modifying the thermal spray coating to form a metal coating on the base material surface including the corners. A melting step,
In the remelting step, the columnar base material (1) is slanted in a suspended state (a) in which the tip surface (11) including the corners faces vertically downward, or at a predetermined horizontal inclination angle (θ). It is characterized in that it is held in any state of the inclined state (b / c) facing and is remelted while being rotated around the column axis (1A) of the columnar base material (1).
It is possible to prevent the sprayed coating on the surface of the columnar base material (1) from being removed at the time of remelting by making it a suspended state or an inclined state by the above method and remelting while rotating around the column axis (1A). In particular, the sprayed coating at the corner does not become thin or biased due to its own weight during remelting, and remains the same as the sprayed coating at other portions without being affected by the corner shape of the base material. be able to. That is, as shown in FIG. 2, in a state where the shaft is rotated in a hanging state or an inclined state, the corner (1C) rotates around the vertical axis or the oblique axis while the tip surface (11) is directed vertically downward or obliquely. It will rotate. The sprayed coating layer remelted by the shaft rotation flows so as to flow down by its own weight, so that the inside of the coating is kneaded at a moderate speed, and the entire sprayed coating is modified relatively uniformly.
Here, the inclined state is preferably a downward inclined state (b) in which the tip surface (11) is inclined downward so that the horizontal inclination angle (θ) has a positive value downward. In the downward inclined state (b), the metal film fixed on the corner (1C) always stays on the lower surface or side surface of the corner of the base metal and stays on the corner surface from the corner in the remelting process. As a result, it is melted while maintaining the film thickness of the sprayed coating or increasing the film thickness. Particularly in the downward inclination state (b) in which the inclination angle (θ) with respect to horizontal is 15 degrees or more downward, the angle of gravity that the metal film fixed on the corner portion (1C) receives during remelting sequentially changes. Therefore, the metal film is uniformly rotated by the internal flow.

(2)前記柱状母材への金属皮膜の形成方法において、
前記再溶融工程は、柱状母材(1)がそれ自体の柱軸(1A)と交わる所定の往復方向へ一往復以上往復変位しながら再溶融することが好ましい。
上記方法によって、再溶融した溶射皮膜層が回転による慣性力を受けながら、左側方及び右側方への直進的な慣性力を交互に受けることとなる。このため内部流動によって金属皮膜が均一にローテーションされ、角部全体に比較的均一な変性が行われることとなる。
なお、後述の実施例では加熱子(C)と共に水平方向へ2往復以上繰り返し往復変位させながら再溶融させることで、より均一な変性を可能としている。但し、一往復のみ往復変位させながら再溶融したものでもよい。
(2) In the method for forming a metal film on the columnar base material,
In the remelting step, it is preferable that the columnar base material (1) is remelted while being reciprocally displaced one or more times in a predetermined reciprocating direction intersecting with its own column axis (1A).
According to the above method, the re-melted sprayed coating layer receives the inertial force due to the rotation, and alternately receives the linear inertial force to the left side and the right side. Therefore, the metal film is uniformly rotated by the internal flow, and relatively uniform modification is performed on the entire corner.
In the examples described later, more uniform denaturation is possible by re-melting while repeatedly reciprocating in the horizontal direction two or more times with the heater (C). However, it may be remelted while being reciprocated only once.

(3)前記柱状母材への金属皮膜の形成方法において、
前記再溶融工程は、加熱子(C)が柱状母材(1)に対し、柱状母材(1)の柱軸(1A)上の位置を相対変位させる相対変位方向へ相対変位しながら再溶融することが好ましい。
上記方法によって、加熱子(C)が柱状母材(1)の周部を覆った状態のまま柱状母材(1)の柱軸(1A)上の位置を相対変位させる方向へ相対変位することで、軸方向に亘ってより均等な加熱が可能となる。本方法は例えば、加熱子(C)を保持する加熱ホルダー(CH)が再溶融室の室内壁面に固定され、再溶融室内にはフレーム上を往復走行移動可能な固定ヘッド(H)が設けられ、柱状母材(1)が前記固定ヘッド(H)に取り付け固定されたまま、再溶融室内を往復動することによって達成される。
なお後述の実施例では、柱状母材(1)自体が固定ヘッド(H)によって往復スライド走行可能であると共に、加熱子(C)は固定ヘッド(H)先端にて固定ヘッド(H)に対して往復動可能に保持される。すなわち後述の実施例では、複数の棒状枠からなる加熱ホルダー(CH)が、柱状母材(1)の柱軸に沿って柱状母材(1)の取り付け基部周囲を囲うホルダーバンド(HB)によって固定ヘッド(H)の先端側へ延伸固定される。そして加熱子(C)が、この加熱ホルダー(CH)の棒上へスライド可能に保持される。再溶融工程においては、この加熱子(H)が加熱ホルダー(CH)上を往復動することで、固定ヘッド(H)に対して繰り返し相対変位する。このときさらに、固定ヘッド(H)は往復変位しているため、加熱子(H)の絶対速度及び絶対加速度は相対変位速度よりもおおきく、これにより内部流動が積極的に促される。
なお上記形態とは別に、取り付け基部周囲を囲うホルダーバンド(HB)によってヘッド(H)先端に固定されたものとしてもよい。この場合、加熱子(C)は再溶融時に柱状母材(1)に対して相対変位することはない。
(3) In the method for forming a metal film on the columnar base material,
In the remelting step, the heating element (C) remelts relative to the columnar base material (1) in a relative displacement direction in which the position of the columnar base material (1) on the column axis (1A) is relatively displaced. It is preferable to do.
By the above method, the heater element (C) is relatively displaced in a direction in which the position of the columnar base material (1) on the column axis (1A) is relatively displaced while covering the periphery of the columnar base material (1). Thus, more uniform heating is possible in the axial direction. In this method, for example, a heating holder (CH) that holds a heating element (C) is fixed to the wall surface of the remelting chamber, and a fixed head (H) that can reciprocate on the frame is provided in the remelting chamber. This is achieved by reciprocating in the remelting chamber while the columnar base material (1) is attached and fixed to the fixed head (H).
In the embodiments described later, the columnar base material (1) itself can be reciprocally slid by the fixed head (H), and the heater (C) is fixed to the fixed head (H) at the tip of the fixed head (H). So that it can reciprocate. That is, in the examples described later, the heating holder (CH) composed of a plurality of rod-shaped frames is surrounded by a holder band (HB) that surrounds the periphery of the mounting base of the columnar base material (1) along the column axis of the columnar base material (1). It is stretched and fixed to the tip side of the fixed head (H). The heating element (C) is slidably held on the rod of the heating holder (CH). In the remelting step, the heating element (H) reciprocates on the heating holder (CH), so that the heating element (H) is repeatedly relatively displaced with respect to the fixed head (H). Further, at this time, since the fixed head (H) is reciprocally displaced, the absolute velocity and absolute acceleration of the heater (H) are larger than the relative displacement velocity, thereby actively promoting the internal flow.
In addition, it is good also as what was fixed to the front-end | tip of the head (H) with the holder band (HB) surrounding the attachment base part separately from the said form. In this case, the heater (C) is not displaced relative to the columnar base material (1) during remelting.

(4)前記いずれかの柱状母材への金属皮膜の形成方法において、
前記再溶融工程は、柱状母材(1)を、前記角部を含む先端面(11)が所定の対水平傾斜角(θ)で斜め方向を向いた傾斜状態(b)に保持し、かつ、柱状母材(1)の柱軸(1A)周りに回転させながら再溶融するものであって、前記対水平傾斜角(θ)は0度超45度以下に固定されることが好ましい。
角部の溶射被膜は、傾斜状態のままの軸回転と共に重力による外力方向が可変するのであるが、上記方法であれば、柱状母材(1)が水平傾斜角θ:0度超45度以下の所定の傾斜角度、すなわち横向きに近い傾斜状態を保持したまま回転するため、外力方向の可変範囲が90度を超える比較的大きな角度範囲となり、流動による溶射金属の再溶融がより促されるものとなる。
(4) In the method for forming a metal film on any of the columnar base materials,
In the remelting step, the columnar base material (1) is held in an inclined state (b) in which the tip surface (11) including the corner portion is inclined obliquely at a predetermined horizontal inclination angle (θ), and The columnar base material (1) is remelted while being rotated around the column axis (1A), and the horizontal inclination angle (θ) is preferably fixed to more than 0 degree and 45 degrees or less.
The sprayed coating at the corners changes the direction of external force due to gravity while rotating in the inclined state. With the above method, the columnar base material (1) has a horizontal inclination angle θ: greater than 0 ° and less than 45 °. Therefore, the variable range of the external force direction is a relatively large angle range exceeding 90 degrees, and remelting of the sprayed metal by flow is further promoted. Become.

(5)或いは、本発明の柱状母材への金属皮膜の形成方法において、
前記再溶融工程は、高圧環境下の再溶融室内に設けられた固定ヘッド(H)によって、柱状母材(1)を、前記角部を含む先端面(11)が所定範囲の対水平傾斜角(θ)で斜め方向を向いた傾斜状態(b)に保持し、かつ、固定ヘッド(H)の少なくとも内部を軸回転させる軸回転手段(RM)によって、柱状母材(1)を保持したまま柱軸(1A)周りに回転させながら再溶融するものであって、
前記固定ヘッド(H)は柱状母材(1)と共に加熱子(C)を保持するものであり、スライド機構(SF)によって再溶融室内を往復走行可能に取り付けられることが好ましい。
(5) Alternatively, in the method for forming a metal film on the columnar base material of the present invention,
In the remelting step, the columnar base material (1) is fixed to the columnar base material (1) by the fixed head (H) provided in the remelting chamber under a high pressure environment, and the tip end surface (11) including the corner portion is in a predetermined range with respect to the horizontal inclination angle. The columnar base material (1) is held by the shaft rotation means (RM) that is held in the inclined state (b) that is directed obliquely at (θ) and that rotates at least the inside of the fixed head (H). Re-melting while rotating around the column axis (1A),
The fixed head (H) holds the heating element (C) together with the columnar base material (1), and is preferably attached by a slide mechanism (SF) so as to be able to reciprocate in the remelting chamber.

(6)或いは、本発明の柱状母材への金属皮膜の形成方法において、
前記固定ヘッド(H)は、所定の角度範囲内で回動可能なチャック(CK)によって、柱状母材(1)を、対水平傾斜角(θ)が自由変動可能な状態で挟持するものであり、
前記再溶融工程において、軸回転手段(RM)によってチャック(CK)が軸回転することで、柱状母材(1)を、柱軸の対水平傾斜角(θ)が可変しながら軸回転することが好ましい。
(6) Alternatively, in the method for forming a metal film on the columnar base material of the present invention,
The fixed head (H) sandwiches the columnar base material (1) with a chuck (CK) that can be rotated within a predetermined angle range in a state in which the horizontal inclination angle (θ) can be freely changed. Yes,
In the remelting step, the chuck (CK) is axially rotated by the shaft rotating means (RM), so that the columnar base material (1) is rotated while the column shaft has a variable horizontal inclination angle (θ). Is preferred.

本発明は、上記手段によって、円柱或いは多角形柱といった、先端隅に角部を有する柱状母材に再溶融処理を行う場合において、溶融熱の部分的な集中や不足を解消し、溶融エネルギーの過多付与部分や過少付与部分の発生を抑制することで、再溶融後の皮膜厚さや組成の緻密度の偏りを解消し得る金属皮膜の形成方法を提供することとなった。また前記偏りに基づく金属皮膜の性状の低下、或いは金属皮膜の表面平滑度の低下を防止し得る金属皮膜の形成方法を提供することとなった。   The present invention eliminates the partial concentration or deficiency of the melting heat when performing remelting treatment on a columnar base material having a corner at the tip corner, such as a cylinder or a polygonal column, by means of the above means, By suppressing the generation of excessively imparted portions and excessively imparted portions, a metal film forming method capable of eliminating the unevenness of the film thickness after remelting and the density of the composition was provided. In addition, the present invention provides a method for forming a metal film that can prevent deterioration of the properties of the metal film or deterioration of the surface smoothness of the metal film due to the bias.

実施例1の金属皮膜の形成方法の溶射工程における溶射室内の斜視状態図。FIG. 3 is a perspective state diagram of the thermal spray chamber in the thermal spraying process of the metal film forming method according to the first embodiment. 実施例1の金属皮膜の形成方法の溶射工程における溶射部分の一部拡大斜視図。FIG. 3 is a partially enlarged perspective view of a thermal spray portion in a thermal spraying process of the metal film forming method according to the first embodiment. 実施例1の金属皮膜の形成方法の溶射工程における移動ステップの移動方向制御を示す平面図。The top view which shows the movement direction control of the movement step in the thermal spraying process of the formation method of the metal film of Example 1. FIG. 実施例1の金属皮膜の形成方法の再溶融工程における再溶融室内の側面状態図。The side surface state figure in the remelting chamber in the remelting process of the formation method of the metal film of Example 1. FIG. 実施例1の再溶融工程における垂下状態(a)及び傾斜状態(b)の柱状母材(1)先端の状態を示す部分拡大側面図。The partial expansion side view which shows the state of the columnar base material (1) of the drooping state (a) and the inclination state (b) in the remelting process of Example 1. FIG. 上方傾斜状態の柱状母材(1)先端の状態を示す部分拡大側面図。The partial expanded side view which shows the state of the columnar base material (1) tip of an upward inclination state.

以下、本発明を実施するための形態例につき、実施例として示す図面と共に説明する。図1は実施例1の金属皮膜の形成方法の溶射工程における溶射室内の斜視状態図であり、図2はその溶射部分の一部拡大斜視図であり、図3は実施例1の金属皮膜の形成方法の溶射工程における移動ステップの移動方向制御を示す平面図である。また図4は本発明の実施例1の柱状母材への金属皮膜の形成方法の再溶融工程における再溶融室内の側面状態図であり、図5は実施例1の再溶融工程における垂下状態(a)及び下傾斜状態(b)の柱状母材(1)先端の状態を示す部分拡大側面図である。図6は上傾斜状態の柱状母材(1)先端の状態を示す部分拡大側面図である。   DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments for carrying out the present invention will be described below with reference to the drawings shown as embodiments. 1 is a perspective view of a thermal spray chamber in a thermal spraying process of the metal film forming method of Example 1, FIG. 2 is a partially enlarged perspective view of the sprayed portion, and FIG. 3 is a perspective view of the metal film of Example 1. It is a top view which shows the movement direction control of the movement step in the thermal spraying process of a formation method. 4 is a side state diagram in the remelting chamber in the remelting step of the method for forming the metal film on the columnar base material of Example 1 of the present invention, and FIG. 5 is a drooping state in the remelting step of Example 1 ( It is a partial expanded side view which shows the state of the columnar base material (1) tip of a) and a downward inclination state (b). FIG. 6 is a partially enlarged side view showing the state of the tip of the columnar base material (1) in an upwardly inclined state.

以下いずれの実施例においても、本発明の柱状母材への金属皮膜の形成方法は、先端面(11)の周縁に角部(1C)を有する柱状母材(1)に対して金属皮膜を形成する方法である。実施例では先端に段付きによる縮径の短円柱状の先端を有する棒状の円柱体からなる。そして、少なくとも下記基本工程を順に具備する。
(基本工程)
・先端面(11)及び角部(1C)を含む柱状母材(1)の端部全体に、金属粉末の溶射によって溶射被膜を定着させる溶射工程と、
・柱状母材(1)の側周部を囲う加熱子(C)によって前記溶射皮膜を再溶融することにより、溶射皮膜を変性させて、前記角部を含む母材表面に金属皮膜を形成する再溶融工程。
In any of the following examples, the method of forming a metal film on the columnar base material of the present invention is performed by applying a metal film to the columnar base material (1) having a corner (1C) at the periphery of the tip surface (11). It is a method of forming. In the embodiment, it is composed of a rod-like cylindrical body having a short cylindrical tip with a reduced diameter due to a step at the tip. And it comprises at least the following basic steps in order.
(Basic process)
A thermal spraying step of fixing a thermal spray coating on the entire end of the columnar base material (1) including the tip surface (11) and the corners (1C) by thermal spraying of metal powder;
-By remelting the thermal spray coating with a heater (C) surrounding the side periphery of the columnar base material (1), the thermal spray coating is modified to form a metal coating on the surface of the base material including the corners. Remelting process.

(溶射工程)
溶射工程は、ニッケル、コバルトを含むW系自溶性合金の金属マトリックスを含む金属混合粉末を、100TorrのAr減圧雰囲気で密閉した溶射室内に切り出し(吹き出させ)、円柱母材(1)の先端の対象面へ溶射する工程である。自溶性合金は、ニッケル基・コバルト基からなる合金に、ボロン(B)やシリコン(Si)などのフラックス成分を含有させたもので、溶射後にフュージング処理を行うことにより、気孔が少なく、密着強度の高い溶射被膜を得る事が出来る。
(Spraying process)
In the thermal spraying process, a metal mixed powder containing a metal matrix of a W-based self-fluxing alloy containing nickel and cobalt is cut out (blown) in a thermal spray chamber sealed in an Ar reduced pressure atmosphere of 100 Torr, and the tip of the cylindrical base material (1) is cut. This is a step of spraying on the target surface. A self-fluxing alloy is a nickel-based / cobalt-based alloy containing a flux component such as boron (B) or silicon (Si). By fusing treatment after thermal spraying, there are few pores and adhesion strength High thermal spray coating can be obtained.

特に本実施例では、金属混合粉末の切り出し溶射と同時に、母材の対象面の溶射範囲内を焦点とするレーザー補助照射を行う、いわゆる複合溶射工程としている(図1)。レーザーは高いエネルギー密度を有し、ビームの照射強度、照射一及びタイミングを制御することができるため、良好な高密度の溶射被膜を形成し、かつ母材への良好な密着性を確保することができる。複合溶射とはすなわち、所定の最大粒径(mwΦ)の炭化タングステン粉末(mw)を所定の混合割合(Rwc)で結合剤粉末(mc)と混合させた金属粉末(mm)のプラズマ溶射(P)と、レーザービームによるレーザー照射(L)とを、円柱母材(1)表面内の同一の溶射スポット(p)に重畳させて複合照射を行うことで、円柱母材(1)上に溶射皮膜を形成する工程である。本発明の特徴と複合溶射とを組み合わせることで、母材への定着性を確保しつつ、より均一な高密度の金属皮膜を形成することができる。 In particular, in this embodiment, a so-called composite spraying process is performed in which laser-assisted irradiation is performed at the same time as the thermal spraying range of the target surface of the base material at the same time as the thermal spraying of the metal mixed powder (FIG. 1). Since the laser has a high energy density and can control the irradiation intensity, irradiation intensity and timing of the beam, it must form a good high-density sprayed coating and ensure good adhesion to the base material. Can do. Composite spraying means plasma spraying of metal powder (mm) in which tungsten carbide powder (mw) having a predetermined maximum particle size (mwΦ) is mixed with binder powder (mc) at a predetermined mixing ratio (Rwc) (P ) And laser irradiation with a laser beam (L) are superimposed on the same spraying spot (p) in the surface of the cylindrical base material (1), and combined irradiation is performed, thereby spraying on the cylindrical base material (1). This is a step of forming a film. By combining the features of the present invention and the composite thermal spraying, it is possible to form a more uniform high-density metal film while securing the fixing property to the base material.

具体的には、溶射室内の上部一側方から斜め下方向きに固定したレーザーガン(LG)と、同じ溶射室内の上部他側方から反対の斜め下方向きに固定した溶射ガン(PG)と、柱状母材(1)を立設状態で保持する保持穴(FH)付の保持フレーム(F)と、から構成される。保持フレーム(F)は、溶射室内を保持レールに沿って平面視二軸方向へ移動制御可能な直方体からなり、上面から、鉛直方向に穿穴された二本の保持穴(FH)が設けられる。各保持穴(FH)には、円柱の柱状母材(1)(1´)が一本ずつ挿入される。挿入状態では柱状母材(1)の先端の縮径した短円柱部のみが保持穴(FH)の穴縁から上方へ突出した状態となり、他の部分が不要にレーザーや溶射の影響を受けないようにしている。   Specifically, a laser gun (LG) fixed obliquely downward from one upper side of the spraying chamber, and a spray gun (PG) fixed obliquely downward from the other upper side of the same thermal spraying chamber, And a holding frame (F) with a holding hole (FH) for holding the columnar base material (1) in an upright state. The holding frame (F) is a rectangular parallelepiped that can be moved and controlled in the biaxial direction in plan view along the holding rail in the spraying chamber, and is provided with two holding holes (FH) drilled in the vertical direction from the upper surface. . A cylindrical columnar base material (1) (1 ') is inserted into each holding hole (FH) one by one. In the inserted state, only the short cylindrical portion having a reduced diameter at the tip of the columnar base material (1) protrudes upward from the hole edge of the holding hole (FH), and other portions are unnecessarily affected by laser or thermal spraying. I am doing so.

レーザーガン(LG)によるレーザー光と、溶射ガン(PG)による溶射粉末(P)は、柱状母材(1)の先端面(11)内の一部である所定面積範囲(PA)に複合照射される。保持フレーム(F)が平面視にて直交する2軸方向へ平行移動制御可能に載置保持されており、往復方向と垂直な位置すなわち往復動線(図3のR1,R2,R3,R4)を所定間隔ずつずらしながら、溶射室内を平行に往復移動しながら移動可能となっている(図3のR1,R2,R3,R4参照)。そして、中将母材(1)の先端面(11)上にて複合照射された所定面積範囲(PA)が、中将母材(1)の先端面(11)上を、往復動線()
を変えながら並行に往復動する(図2)。これにより先端面(11)全体が先端面の形状縁すなわち角部にまで亘って溶射され、図5や図6に示すような、先端面から角部周囲の側面に亘った溶射被膜が形成される。
The laser beam from the laser gun (LG) and the thermal spray powder (P) from the thermal spray gun (PG) are combined and irradiated to a predetermined area range (PA) that is a part of the tip surface (11) of the columnar base material (1). Is done. The holding frame (F) is placed and held so as to be capable of parallel movement control in two axial directions orthogonal to each other in plan view, and a position perpendicular to the reciprocating direction, that is, a reciprocating line (R1, R2, R3, R4 in FIG. 3). Can be moved while reciprocating in parallel in the thermal spraying chamber while shifting by a predetermined interval (see R1, R2, R3, R4 in FIG. 3). Then, the predetermined area range (PA) irradiated in a complex manner on the tip surface (11) of the lieutenant general base material (1) is reciprocating along the tip surface (11) of the lieutenant general base material (1) ( )
Reciprocating in parallel while changing (Fig. 2). As a result, the entire tip surface (11) is sprayed over the shape edge of the tip surface, that is, the corner, and a sprayed coating is formed from the tip surface to the side surface around the corner as shown in FIGS. The

なお溶射工程においては、
前記プラズマ溶射(P)における金属粉末(mm)の粉末供給速度(mm1)、並びに前記レーザー照射(L)におけるレーザー照射速度(L1)、及びレーザー出力(L2)、のそれぞれを含む設定要素を、それぞれ所定の設定値に設定して制御手段に記憶させる設定ステップと、
前記設定ステップによって設定された設定要素の各設定値に従って前記複合溶射を行いながら溶射スポット(p)を基材表面上で移動させる、複合溶射中の移動ステップと、を含んでなる。
そして前記設定ステップは、エネルギー密度(ED)〔J/mm〕、パワー密度(PD)〔W/mm〕、及び一次増加率Aからなる一次相関関係に従って、所定の混合割合条件に応じた設定要素の各設定値を設定することを特徴とする。
In the thermal spraying process,
Setting elements including each of the powder supply rate (mm1) of the metal powder (mm) in the plasma spraying (P), the laser irradiation rate (L1), and the laser output (L2) in the laser irradiation (L), A setting step for setting each to a predetermined set value and storing it in the control means;
And a moving step during composite spraying, in which the thermal spraying spot (p) is moved on the substrate surface while performing the composite thermal spraying according to the set values of the setting elements set in the setting step.
And the said setting step responded to predetermined | prescribed mixing ratio conditions according to the primary correlation which consists of energy density (ED) [J / mm < 2 >], power density (PD) [W / mm < 2 >], and primary increase rate A. Each setting value of the setting element is set.

〔条件1〕炭化タングステン粉末(mw)の混合割合(Rwc1)が50%以上80%未満の場合:ED〔J/mm〕が3以上7以下、PD〔W/mm2〕が20以上90以下の範囲内であって、かつPDはEDの単位増加あたり4以上15以下の一次増加率A〔W/J〕に応じたPD値に設定される。
〔条件2〕炭化タングステン粉末(mw)の混合割合(Rwc1)が80%以上95%未満の場合:ED〔J/mm〕が6以上16以下、PD〔W/mm2〕が55以上115〔W/mm2〕以下の範囲内であって、かつPDはED〔J/mm〕の単位増加あたり−24〜−6の一次増加率A〔W/J〕に応じたPD値に設定される。
或いは前記設定ステップは、
エネルギー密度(ED)〔J/mm〕及びパワー密度(PD)〔W/mm〕の一次相関関係に従って、以下の混合割合条件に応じた設定要素の各設定値を設定することを特徴とする金属皮膜の形成方法。
〔条件3〕炭化タングステン粉末(mw)の混合割合(Rwc1)が50%以上80%未満の場合:ED〔J/mm〕が3以上12以下、PD〔W/mm〕が60以上120以下の範囲内であって、かつPDがEDの単位増加あたり7〜33の一次減少率−A〔W/J〕(A:正値の一次係数)に応じて設定される。
〔条件4〕炭化タングステン粉末(mw)の混合割合(Rwc1)が80%以上95%未満の場合:ED〔J/mm〕が3以上12以下、PD〔W/mm〕が25以上60以下の範囲内であって、かつPDがEDの単位増加あたり2.5〜5の一次減少率−A〔W/J〕(A:正値の一次係数)に応じて設定される。
[Condition 1] When the mixing ratio (Rwc1) of tungsten carbide powder (mw) is 50% or more and less than 80%: ED [J / mm 2 ] is 3 or more and 7 or less, PD [W / mm2] is 20 or more and 90 or less And PD is set to a PD value corresponding to a primary increase rate A [W / J] of 4 to 15 per unit increase of ED.
[Condition 2] When the mixing ratio (Rwc1) of tungsten carbide powder (mw) is 80% or more and less than 95%: ED [J / mm 2 ] is 6 or more and 16 or less, PD [W / mm2] is 55 or more and 115 [ W / mm 2] or less, and PD is set to a PD value corresponding to a primary increase rate A [W / J] of −24 to −6 per unit increase of ED [J / mm 2 ]. .
Alternatively, the setting step includes
According to the primary correlation of energy density (ED) [J / mm 2 ] and power density (PD) [W / mm 2 ], each setting value of the setting element corresponding to the following mixing ratio condition is set. Forming a metal film.
[Condition 3] When the mixing ratio (Rwc1) of tungsten carbide powder (mw) is 50% or more and less than 80%: ED [J / mm 2 ] is 3 or more and 12 or less, PD [W / mm 2 ] is 60 or more and 120 The PD falls within the following range, and the PD is set according to a primary reduction rate of 7 to 33 per unit increase of ED−A [W / J] (A: primary coefficient of positive value).
[Condition 4] When the mixing ratio (Rwc1) of tungsten carbide powder (mw) is 80% or more and less than 95%: ED [J / mm 2 ] is 3 or more and 12 or less, PD [W / mm 2 ] is 25 or more and 60 Within the following range, PD is set according to a primary reduction rate of 2.5 to 5 per unit increase of ED—A [W / J] (A: primary coefficient of positive value).

また前記設定ステップは、プラズマ溶射における粉末供給ガス流量〔l/min〕が3.0〜4.0以内であって、前記「粉末供給速度(mm1)」〔rpm〕が0.5〔rpm〕以上1.0〔rpm〕以下の場合において、前記「相対移動速度(pV)」〔mm/s〕を10以上30以下に設定するものである。
或いは前記設定ステップは、プラズマ溶射及びレーザー溶射の各溶射距離〔mm〕が共に150mm170以下の場合において、前記「レーザー出力(L2)」〔kw〕を0.5以上40.0以下の範囲内に設定するものである。
In the setting step, the powder supply gas flow rate [l / min] in plasma spraying is within 3.0 to 4.0, and the “powder supply rate (mm1)” [rpm] is 0.5 [rpm]. In the case of 1.0 [rpm] or less, the “relative movement speed (pV)” [mm / s] is set to 10 or more and 30 or less.
Alternatively, in the setting step, when the spraying distances [mm] of plasma spraying and laser spraying are both 150 mm and 170 or less, the “laser output (L2)” [kw] is within the range of 0.5 to 40.0. It is to set.

(装置構成)
複合溶射を行う装置構成として例えば、
一定の溶射距離で前記金属粉末のプラズマ溶射を行うプラズマ溶射機(P)と、
一定の溶射距離でレーザー光を溶射スポット(p)範囲に合わせて焦点化させたレーザー溶射を行うレーザー照射機(L)と、
プラズマ溶射機及びレーザー照射機(L)による溶射スポットへの複合溶射状態を保ったまま、基材上の溶射スポットの位置を相対移動させる保持移動機(V)と、
少なくとも前記プラズマ溶射における金属粉末(mm)の切り出し装置の回転数である「粉末供給速度(mm1)」、並びに、前記レーザー照射における「レーザー出力(L2)」、並びに、溶射スポット(p)を円柱母材(1)の先端面(11)上で相対移動させる「相対移動速度(pV)」のそれぞれを含む設定要素を、それぞれ所定の値に可変制御する制御手段と、を具備してなるものが挙げられる(図1)。
(Device configuration)
As an apparatus configuration for performing composite spraying, for example,
A plasma spraying machine (P) for performing plasma spraying of the metal powder at a constant spraying distance;
A laser irradiator (L) that performs laser spraying by focusing a laser beam on a spraying spot (p) range at a constant spraying distance;
Holding and moving machine (V) for relatively moving the position of the spraying spot on the substrate while maintaining the composite spraying state to the spraying spot by the plasma spraying machine and the laser irradiation machine (L);
At least “powder supply speed (mm1)” which is the rotational speed of a cutting device for metal powder (mm) in plasma spraying, “laser output (L2)” in laser irradiation, and spray spot (p) are cylindrical And a control means for variably controlling the setting elements including each of the “relative movement speeds (pV)” to be relatively moved on the tip surface (11) of the base material (1) to predetermined values. (FIG. 1).

制御手段は、使用する金属粉末(mm)の炭化タングステン粉末(mw)の混合割合(Rwc1)、及び、最大粒径(mwΦ)の各入力値、のそれぞれを記憶する第一記憶領域と、
少なくとも、前記プラズマ溶射における金属粉末(mm)の切り出し装置の回転数である「粉末供給速度(mm1)」と、照射スポット(p)の面積値(PA)と、のそれぞれを記憶する第二記憶領域と、を有してなる。
第一記憶領域に記憶された各入力値を、予め棲み分け設定された各入力値範囲の組み合わせからなる複数の入力域のいずれかに分類し、
分類した入力域に応じて、
第二記憶領域に記憶された少なくとも、前記プラズマ溶射における金属粉末(mm)の切り出し装置の回転数である「粉末供給速度(mm1)」と、前記レーザー照射における「レーザー出力(L2)」と、照射スポット(p)を円柱母材(1)の先端面(11)上で相対移動させる「相対移動速度(pV)」と、のそれぞれを含む設定要素を、照射スポット(p)の面積値(PA)を用いた以下の演算式に従って演算する。
そして、同演算式に基づく各算出値を所定の設定値に自動設定し、表示する。
The control means, a first storage area for storing each input value of the mixing ratio (Rwc1) of the tungsten carbide powder (mw) of the metal powder (mm) to be used and the maximum particle size (mwΦ),
A second memory for storing at least “powder supply speed (mm1)” which is the rotational speed of the metal powder (mm) cutting device in the plasma spraying and the area value (PA) of the irradiation spot (p). And a region.
Each input value stored in the first storage area is classified into one of a plurality of input areas composed of combinations of input value ranges set in advance,
Depending on the classified input area,
“Powder supply speed (mm1)” which is the rotational speed of the metal powder (mm) cutting device in the plasma spraying, and “Laser output (L2)” in the laser irradiation, which are stored in the second memory area, “Relative moving speed (pV)” for relatively moving the irradiation spot (p) on the tip surface (11) of the cylindrical base material (1) is set as an area value of the irradiation spot (p) ( The calculation is performed according to the following calculation formula using PA).
Then, each calculated value based on the calculation formula is automatically set to a predetermined set value and displayed.

〔演算式〕 (L2/PA)=A・(pV/(L2・√PA))+B
但し数式1中のAは、炭化タングステン粉末(mw)及び結合剤粉末(mc)の混合割合(Rwc)に応じ、A1,A2,A3,A4のいずれかから選択される。
(1)1μm以上の最大粒径(mwΦ1)の炭化タングステン粉末(mw)を50%以上80%未満の混合割合(Rwc1)で含む場合:−7<A1<−35(中心値−18)
(2)1μm以上の最大粒径(mwΦ1)の炭化タングステン粉末(mw)を80%以上の混合割合(Rwc2)で含む場合:-2.5<A2<−5(中心値−7)
(3)1μm未満の最大粒径(mwΦ2)の炭化タングステン粉末(mw)を50%以上80%未満の混合割合(Rwc1)で含む場合:4<A3<6(中心値8)
(4)1μm未満の最大粒径(mwΦ2)の炭化タングステン粉末(mw)を80%以上の混合割合(Rwc2)で含む場合:
E2(L2、PA)=A1・E1(L1,L2,PL);但し−5.5<A4<−24(中心値−10)
[Calculation Formula] (L2 / PA) = A · (pV / (L2 · √PA)) + B
However, A in Formula 1 is selected from any of A1, A2, A3, and A4 according to the mixing ratio (Rwc) of the tungsten carbide powder (mw) and the binder powder (mc).
(1) When tungsten carbide powder (mw) having a maximum particle size (mwΦ1) of 1 μm or more is contained in a mixing ratio (Rwc1) of 50% or more and less than 80%: −7 <A1 <−35 (central value−18)
(2) When tungsten carbide powder (mw) having a maximum particle size (mwΦ1) of 1 μm or more is contained at a mixing ratio (Rwc2) of 80% or more: −2.5 <A2 <−5 (central value −7)
(3) When tungsten carbide powder (mw) having a maximum particle size (mwΦ2) of less than 1 μm is contained in a mixing ratio (Rwc1) of 50% or more and less than 80%: 4 <A3 <6 (center value 8)
(4) When containing tungsten carbide powder (mw) having a maximum particle size (mwΦ2) of less than 1 μm at a mixing ratio (Rwc2) of 80% or more:
E2 (L2, PA) = A1 · E1 (L1, L2, PL); provided that −5.5 <A4 <−24 (central value −10)

また前記設定ステップは、炭化タングステン粉末(mw)及び結合剤粉末(mc)の混合割合(Rwc)に応じた、
下記エネルギー密度(E1)〔J/mm〕及びパワー密度(E2)〔W/mm〕の相関関係に従って設定要素の各設定値を設定する。
In addition, the setting step according to the mixing ratio (Rwc) of the tungsten carbide powder (mw) and the binder powder (mc),
Each setting value of the setting element is set according to the correlation of the following energy density (E1) [J / mm 2 ] and power density (E2) [W / mm 2 ].

(粒径が比較的小さいとき)
特に0.1μm以上0.9μm以下の範囲内の最大粒径(mwΦ)では、炭化タングステン粉末の混合割合に応じて、高域パワー密度かつ低域エネルギー密度の第一条件域と、低域パワー密度かつ高域エネルギー密度の第二条件域とに済み分けた、以下の対応値を設定することが好ましいことが判明した。
(条件1)50%≦混合割合R≦80%の場合:PD〔W/mm〕は70以上110以下の範囲内、EDは3以上7以下の範囲内であって、PDはEDの増加に伴って4〜15の一次増加率A〔W/J〕で増加する対応値。
(条件2)80%≦混合割合R≦95%の場合:PD〔W/mm〕は30以上60以下の範囲内、ED〔J/mm〕は6以上16以下の範囲内であって、PDはED〔J/mm〕の増加に伴って−6〜−24の一次増加率A〔W/J〕で減少する対応値。
(When the particle size is relatively small)
Especially for the maximum particle size (mwΦ) in the range of 0.1 μm or more and 0.9 μm or less, depending on the mixing ratio of the tungsten carbide powder, the first condition region of the high frequency power density and the low frequency energy density and the low frequency power It has been found that it is preferable to set the following corresponding values divided into the second condition region of density and high energy density.
(Condition 1) When 50% ≦ mixing ratio R ≦ 80%: PD [W / mm 2 ] is in the range of 70 to 110, ED is in the range of 3 to 7, and PD is an increase in ED The corresponding value increases at a primary increase rate A [W / J] of 4 to 15.
(Condition 2) When 80% ≦ mixing ratio R ≦ 95%: PD [W / mm 2 ] is in the range of 30 to 60 and ED [J / mm 2 ] is in the range of 6 to 16 , PD is a corresponding value that decreases at a primary increase rate A [W / J] of −6 to −24 as ED [J / mm 2 ] increases.

(粒径が比較的大きいとき)
また特に、1.0μm以上2.0μm以下の範囲内の最大粒径(mwΦ)では、
PD〔W/mm2〕が55以上90以下、かつED〔J/mm〕が55以上90以下の範囲内の共通条件域において、炭化タングステン粉末の混合割合に応じた以下の対応値を設定することが好ましいことが判明した。
(条件3)50%≦混合割合R≦80%の場合:PD〔W/mm〕はED〔J/mm〕の増加に伴って4〜15の一次増加率A〔W/J〕で増加する対応値。
(条件4)80%≦混合割合R≦95%の場合:PD〔W/mm〕はED〔J/mm〕の増加に伴って−6〜−24の一次増加率A〔W/J〕で減少する対応値。
(When the particle size is relatively large)
In particular, at the maximum particle size (mwΦ) in the range of 1.0 μm to 2.0 μm,
PD [W / mm @ 2] is 55 or more and 90 or less, and the ED [J / mm 2] is the common condition range in the range of 55 or more and 90 or less, setting the corresponding value of the following in accordance with the mixing ratio of the tungsten carbide powder It turned out to be preferable.
(Condition 3) When 50% ≦ mixing ratio R ≦ 80%: PD [W / mm 2 ] is a primary increase rate A [W / J] of 4 to 15 as ED [J / mm 2 ] increases. The corresponding value to increase.
(Condition 4) When 80% ≦ mixing ratio R ≦ 95%: PD [W / mm 2 ] increases from −6 to −24 in a primary increase rate A [W / J as ED [J / mm 2 ] increases. ] Corresponding value to decrease.

前記設定ステップは、
エネルギー密度(ED)〔J/mm2〕及びパワー密度(PD)〔W/mm2〕の一次相関関係に従って設定要素の各設定値を設定することを特徴とする。
〔case1〕0.1μm以上0.9μm以下の最大粒径(mwΦ)の炭化タングステン粉末(mw)を50%以上80%未満の混合割合(Rwc1)で含む場合:PDはEDの増加に伴って4〜15の増加率A〔W/J〕で増加する。
[case2]最大粒径(mwΦ)が1μm以上2μm以下の場合:
E2(L2、PA)=A・E1(L1,L2,PL)
(1)1μm以上の最大粒径(mwΦ1)の炭化タングステン粉末(mw)を50%以上80%未満の混合割合(Rwc1)で含む場合:−7<A1<−35(中心値−18)
(2)1μm以上の最大粒径(mwΦ1)の炭化タングステン粉末(mw)を80%以上の混合割合(Rwc2)で含む場合:-2.5<A2<-5(中心値−7)
(3)1μm未満の最大粒径(mwΦ2)の炭化タングステン粉末(mw)を50%以上80%未満の混合割合(Rwc1)で含む場合:4<A3<6(中心値8)
(4)1μm未満の最大粒径(mwΦ2)の炭化タングステン粉末(mw)を80%以上の混合割合(Rwc2)で含む場合:
E2(L2、PA)=A1・E1(L1,L2,PL);但し−5.5<A4<−24(中心値−10)
The setting step includes
Each setting value of the setting element is set according to a primary correlation of energy density (ED) [J / mm2] and power density (PD) [W / mm2].
[Case 1] When tungsten carbide powder (mw) having a maximum particle size (mwΦ) of 0.1 μm or more and 0.9 μm or less is contained in a mixing ratio (Rwc1) of 50% or more and less than 80%: PD increases with an increase in ED It increases at an increase rate A [W / J] of 4-15.
[Case 2] When the maximum particle size (mwΦ) is 1 μm or more and 2 μm or less:
E2 (L2, PA) = A · E1 (L1, L2, PL)
(1) When tungsten carbide powder (mw) having a maximum particle size (mwΦ1) of 1 μm or more is contained in a mixing ratio (Rwc1) of 50% or more and less than 80%: −7 <A1 <−35 (central value−18)
(2) When tungsten carbide powder (mw) having a maximum particle size (mwΦ1) of 1 μm or more is included at a mixing ratio (Rwc2) of 80% or more: −2.5 <A2 <−5 (central value −7)
(3) When tungsten carbide powder (mw) having a maximum particle size (mwΦ2) of less than 1 μm is contained in a mixing ratio (Rwc1) of 50% or more and less than 80%: 4 <A3 <6 (center value 8)
(4) When containing tungsten carbide powder (mw) having a maximum particle size (mwΦ2) of less than 1 μm at a mixing ratio (Rwc2) of 80% or more:
E2 (L2, PA) = A1 · E1 (L1, L2, PL); provided that −5.5 <A4 <−24 (central value −10)

ここで発明者は、下記パワー密度(PD)〔W/mm〕及びエネルギー密度(ED)〔J/mm〕の相関関係に従うことで好ましい被膜組織を形成できることを見出した。
(相関式)PD(L2、PA)=A・ED(L1,L2,PL)+B
但し数式1中のAは、炭化タングステン粉末(mw)及び結合剤粉末(mc)の混合割合(Rwc)に応じ、A1,A2,A3,A4のいずれかから選択される。
(1)1μm以上の最大粒径(mwΦ1)の炭化タングステン粉末(mw)を50%以上80%未満の混合割合(Rwc1)で含む場合:−7<A1<−35(中心値−18)
(2)1μm以上の最大粒径(mwΦ1)の炭化タングステン粉末(mw)を80%以上の混合割合(Rwc2)で含む場合:−2.5<A2<−5(中心値−7)
(3)1μm未満の最大粒径(mwΦ2)の炭化タングステン粉末(mw)を50%以上80%未満の混合割合(Rwc1)で含む場合:4<A3<6(中心値8)
(4)1μm未満の最大粒径(mwΦ2)の炭化タングステン粉末(mw)を80%以上の混合割合(Rwc2)で含む場合:
E2(L2、PA)=A1・E1(L1,L2,PL);但し−5.5<A4<−24(中心値−10)
Here, the inventor has found that a preferable coating structure can be formed by following the correlation of the following power density (PD) [W / mm 2 ] and energy density (ED) [J / mm 2 ].
(Correlation equation) PD (L2, PA) = A · ED (L1, L2, PL) + B
However, A in Formula 1 is selected from any of A1, A2, A3, and A4 according to the mixing ratio (Rwc) of the tungsten carbide powder (mw) and the binder powder (mc).
(1) When tungsten carbide powder (mw) having a maximum particle size (mwΦ1) of 1 μm or more is contained in a mixing ratio (Rwc1) of 50% or more and less than 80%: −7 <A1 <−35 (central value−18)
(2) When tungsten carbide powder (mw) having a maximum particle size (mwΦ1) of 1 μm or more is contained at a mixing ratio (Rwc2) of 80% or more: −2.5 <A2 <−5 (central value −7)
(3) When tungsten carbide powder (mw) having a maximum particle size (mwΦ2) of less than 1 μm is contained in a mixing ratio (Rwc1) of 50% or more and less than 80%: 4 <A3 <6 (center value 8)
(4) When containing tungsten carbide powder (mw) having a maximum particle size (mwΦ2) of less than 1 μm at a mixing ratio (Rwc2) of 80% or more:
E2 (L2, PA) = A1 · E1 (L1, L2, PL); provided that −5.5 <A4 <−24 (central value −10)

(再溶融工程)
しかして複合溶射工程後の再溶融工程においては、角部を含む先端面(11)及び側面の全体に亘って均一な溶射被膜を形成した柱状母材(1)を、先端面(11)が鉛直下方を向いた垂下状態(a)、又は所定の対水平傾斜角(θ)で斜め方向を向いた傾斜状態(b/c)のいずれかの状態で保持し、かつ、柱状母材(1)の柱軸(1A)周りに回転させながら再溶融する工程である(図5,6)。特に本発明では減圧雰囲気下で高周波誘導加熱を行う、いわゆるヒュージング加熱処理を行っている。
(Remelting process)
Thus, in the remelting step after the composite spraying step, the tip end surface (11) including the corner portion and the columnar base material (1) on which the uniform sprayed coating is formed over the entire side surface are converted into the tip end surface (11). A columnar base material (1) which is held in either a hanging state (a) facing downward vertically or an inclined state (b / c) facing a diagonal direction at a predetermined horizontal inclination angle (θ) ) And remelting while rotating around the column axis (1A) (FIGS. 5 and 6). In particular, in the present invention, so-called fusing heat treatment is performed in which high-frequency induction heating is performed in a reduced-pressure atmosphere.

特に図5に示す垂下状態(a)又は下傾斜状態(b)とし、かつ柱軸(1A)周りに回転させながら再溶融することで、柱状母材(1)表面の溶射被膜が再溶融時に除かれるのを防ぐことができる。特に角部の溶射被膜は、再溶融時の自重によって膜厚さが薄くなったり偏ったりすることがなく、母材の角部形状に影響されずに他の部分の溶射被膜と同じ状態を保つことができる。すなわち図5に示すように、垂下状態又は下傾斜状態で軸回転した状態では、図6に示す上傾斜状態で軸回転した状態と異なり、先端面(11)が鉛直下方又は斜め方向を向いたまま角部(1C)が鉛直軸周り又は斜め軸周りに周回転することとなる。軸回転によって再溶融した溶射皮膜層が自重によって流れ落ちるように流動することで、被膜内部が緩やかな速度で混練され、溶射被膜全体で比較的均一に変性される。   In particular, the thermal spray coating on the surface of the columnar base material (1) is remelted by re-melting while being rotated around the column axis (1A) in the suspended state (a) or the downward inclined state (b) shown in FIG. It can be prevented from being removed. In particular, the sprayed coating at the corner does not become thin or biased due to its own weight during remelting, and remains the same as the sprayed coating at other portions without being affected by the corner shape of the base material. be able to. That is, as shown in FIG. 5, in the state where the shaft is rotated in the suspended state or the downwardly inclined state, the tip surface (11) is directed vertically downward or obliquely, unlike the state where the shaft is rotated in the upwardly inclined state shown in FIG. The corner (1C) rotates around the vertical axis or the oblique axis. The sprayed coating layer remelted by the shaft rotation flows so as to flow down by its own weight, so that the inside of the coating is kneaded at a moderate speed, and the entire sprayed coating is modified relatively uniformly.

ここで傾斜状態は、対水平傾斜角度(θ)が上方へ正値を有するように先端面(11)が上方を向いて傾斜した上方傾斜状態(c:図6)と、対水平傾斜角度(θ)が下方へ正値を有するように先端面(11)が下方を向いて傾斜した下方傾斜状態(b:図5(b))と、が存在する。このうち特に上方傾斜状態(c:図6)よりも下方傾斜状態(b:図5(b))が更に好ましい。なぜなら、下方傾斜状態(b)のとき、角部(1C)上に定着した金属皮膜は、再溶融工程において、必ず母材角部の下面又は側面に定着したまま角部から角部表面上に滞留したまま垂下して、結果的に溶射被膜の膜厚さを維持するか膜厚さが大きくなる状態で溶融することとなるからであり、再溶融後の金属皮膜厚さを安定して確保することができる。特に対水平傾斜角度(θ)が下方へ15度以上となった下方傾斜状態(b)では、角部(1C)上に定着した金属皮膜は、再溶融時に受ける重力の角度が順次変わっていくため、内部流動によって金属皮膜が均一にローテーションされる。   Here, the inclined state includes an upward inclined state (c: FIG. 6) in which the tip surface (11) is inclined upward so that the horizontal inclination angle (θ) has a positive value upward, and a horizontal inclination angle ( There is a downwardly inclined state (b: FIG. 5B) in which the tip surface (11) is inclined downward so that θ) has a positive value downward. Of these, the downward inclined state (b: FIG. 5B) is more preferable than the upward inclined state (c: FIG. 6). This is because, in the downward inclined state (b), the metal film fixed on the corner (1C) is always fixed on the lower surface or side surface of the base metal corner in the remelting process, from the corner to the corner surface. This is because it dries while staying, and as a result, the film thickness of the sprayed coating is maintained or melted in a state where the film thickness becomes large, and the metal film thickness after remelting is stably secured. can do. Particularly in the downward inclination state (b) in which the inclination angle (θ) with respect to horizontal is 15 degrees or more downward, the angle of gravity that the metal film fixed on the corner portion (1C) receives during remelting sequentially changes. Therefore, the metal film is uniformly rotated by the internal flow.

また再溶融工程は、柱状母材(1)がそれ自体の柱軸(1A)と交わる所定の往復方向へ一往復以上往復変位しながら再溶融することが好ましい。これによって、再溶融した溶射皮膜層が回転による慣性力を受けながら、左側方及び右側方への直進的な慣性力を交互に受けることとなる。このため内部流動によって金属皮膜が均一にローテーションされ、角部全体に比較的均一な変性が行われることとなる。
なお、図4に示す実施例では、スライドモーター(SM)に機械制御されたスライド機構(SF)によって、柱状母材(1)と加熱子(C)とが共に水平方向へ一往復のみ、あるいは2往復以上繰り返し所定の往復長(SL)で往復変位させながら再溶融させることで、より均一な変性を可能としている。スライド機構(SF)は再溶融室内の床面に固定設置されたスライドレール上に嵌入された、複数のスライドアングル(SA)を具備し、このスライドアングル(SA)のスライド移動を、スライドモーター(SM)によって制御する機構となっている。スライドアングル(SA)によって架台支持されたスライドベース(SB)がスライド移動することで、スライドベース(SB)、スライドベース(SB)と一体化して上方延出されたアーム(A)、及びアーム(A)上部に固定された固定ヘッド(H)が一体的構造として並行に往復走行するものとなっている。
In the remelting step, the columnar base material (1) is preferably remelted while being reciprocally displaced one or more times in a predetermined reciprocating direction intersecting with its own column axis (1A). As a result, the re-melted sprayed coating layer is alternately subjected to the inertial force that goes straight to the left and right while receiving the inertial force due to the rotation. Therefore, the metal film is uniformly rotated by the internal flow, and relatively uniform modification is performed on the entire corner.
In the embodiment shown in FIG. 4, both the columnar base material (1) and the heating element (C) are only reciprocated in the horizontal direction by the slide mechanism (SF) mechanically controlled by the slide motor (SM), or More uniform denaturation is possible by re-melting while reciprocating at a predetermined reciprocating length (SL) for two or more reciprocations. The slide mechanism (SF) includes a plurality of slide angles (SA) fitted on slide rails fixedly installed on the floor surface in the remelting chamber, and the slide movement of the slide angles (SA) is performed by a slide motor ( SM). As the slide base (SB) supported by the slide angle (SA) slides, the slide base (SB), the arm (A) integrally extended with the slide base (SB), and the arm ( A) The fixed head (H) fixed to the upper part is reciprocated in parallel as an integral structure.

また再溶融工程は、加熱子(C)が柱状母材(1)に対し、柱状母材(1)の柱軸(1A)上の位置を相対変位させる相対変位方向へ相対変位しながら再溶融することが好ましい。この方法によって、加熱子(C)が柱状母材(1)の周部を覆った状態のまま柱状母材(1)の柱軸(1A)上の位置を相対変位させる方向へ相対変位することで、軸方向に亘ってより均等な加熱が可能となる。本方法は例えば、加熱子(C)を保持する加熱ホルダー(CH)が再溶融室の室内壁面に固定され、再溶融室内にはフレーム上を往復走行移動可能な固定ヘッド(H)が設けられ、柱状母材(1)が前記固定ヘッド(H)に取り付け固定されたまま、再溶融室内を往復動することによって達成される。 In the remelting step, the heating element (C) is remelted while being relatively displaced in the relative displacement direction in which the position of the columnar base material (1) on the column axis (1A) is relatively displaced with respect to the columnar base material (1). It is preferable to do. By this method, the heater element (C) is relatively displaced in the direction in which the position of the columnar base material (1) on the column axis (1A) is relatively displaced while covering the periphery of the columnar base material (1). Thus, more uniform heating is possible in the axial direction. In this method, for example, a heating holder (CH) that holds a heating element (C) is fixed to the wall surface of the remelting chamber, and a fixed head (H) that can reciprocate on the frame is provided in the remelting chamber. This is achieved by reciprocating in the remelting chamber while the columnar base material (1) is attached and fixed to the fixed head (H).

実施例では、柱状母材(1)自体が固定ヘッド(H)によって往復スライド走行可能であると共に、加熱子(C)は固定ヘッド(H)先端にて固定ヘッド(H)に対して往復動可能に保持される。すなわち後述の実施例では、複数の棒状枠からなる加熱ホルダー(CH)が、柱状母材(1)の柱軸に沿って柱状母材(1)の取り付け基部周囲を囲うホルダーバンド(HB)によって固定ヘッド(H)の先端側へ延伸固定される。そして加熱子(C)が、この加熱ホルダー(CH)の棒上へスライド可能に保持される。再溶融工程においては、この加熱子(H)が加熱ホルダー(CH)上を往復動することで、固定ヘッド(H)に対して繰り返し相対変位する。このときさらに、固定ヘッド(H)は往復変位しているため、加熱子(H)の絶対速度及び絶対加速度は相対変位速度よりもおおきく、これにより内部流動が積極的に促される。 In the embodiment, the columnar base material (1) itself can reciprocate by the fixed head (H), and the heater (C) reciprocates relative to the fixed head (H) at the tip of the fixed head (H). Held possible. That is, in the examples described later, the heating holder (CH) composed of a plurality of rod-shaped frames is surrounded by a holder band (HB) that surrounds the periphery of the mounting base of the columnar base material (1) along the column axis of the columnar base material (1). It is stretched and fixed to the tip side of the fixed head (H). The heating element (C) is slidably held on the rod of the heating holder (CH). In the remelting step, the heating element (H) reciprocates on the heating holder (CH), so that the heating element (H) is repeatedly relatively displaced with respect to the fixed head (H). Further, at this time, since the fixed head (H) is reciprocally displaced, the absolute velocity and absolute acceleration of the heater (H) are larger than the relative displacement velocity, thereby actively promoting the internal flow.

なお上記形態とは別に、取り付け基部周囲を囲うホルダーバンド(HB)によってヘッド(H)先端に固定されたものとしてもよい。この場合、加熱子(C)は再溶融時に柱状母材(1)に対して相対変位することはない。 In addition, it is good also as what was fixed to the front-end | tip of the head (H) with the holder band (HB) surrounding the attachment base part separately from the said form. In this case, the heater (C) is not displaced relative to the columnar base material (1) during remelting.

また再溶融工程は、柱状母材(1)を、前記角部を含む先端面(11)が所定の対水平傾斜角(θ)で斜め方向を向いた傾斜状態(b)に保持し、かつ、柱状母材(1)の柱軸(1A)周りに回転させながら再溶融するものであって、前記対水平傾斜角(θ)は0度超45度以下に固定されることが好ましい。角部の溶射被膜は、傾斜状態のままの軸回転と共に重力による外力方向が可変するのであるが、この方法であれば、柱状母材(1)が水平傾斜角θ:0度超45度以下の所定の傾斜角度、すなわち横向きに近い傾斜状態を保持したまま回転するため、外力方向の可変範囲が90度を超える比較的大きな角度範囲となり、流動による溶射金属の再溶融がより促されるものとなる。   In the remelting step, the columnar base material (1) is held in an inclined state (b) in which the front end surface (11) including the corners is directed obliquely at a predetermined horizontal inclination angle (θ), and The columnar base material (1) is remelted while being rotated around the column axis (1A), and the horizontal inclination angle (θ) is preferably fixed to more than 0 degree and 45 degrees or less. The sprayed coating at the corners changes the direction of the external force due to gravity as the shaft rotates while in the inclined state. With this method, the columnar base material (1) has a horizontal inclination angle θ: greater than 0 ° and less than 45 °. Therefore, the variable range of the external force direction is a relatively large angle range exceeding 90 degrees, and remelting of the sprayed metal by flow is further promoted. Become.

実施例では、アーム(A)の上部にアーム(A)と直交する保持軸が組み込まれ、保持軸の一端側に回転締付式のアームヒンジ(AH)を介して、略円筒状の固定ヘッド(H)が固定されてなる(図4)。保持軸の他端側には軸回転手段(RM)たる、駆動軸を有した回転モーターが機械連結されてなる。保持軸内を通る駆動軸の回転駆動によって、固定ヘッド(H)内のチャック(CK)が回転するものとなっている。固定ヘッドはアームヒンジ(AH)の締付調整によって、保持軸と直交する水平なアームヒンジ軸周りに回転し、所定の回転角度(対水平傾斜角(θ))を保持することが可能となっている。 In the embodiment, a holding shaft orthogonal to the arm (A) is incorporated in the upper part of the arm (A), and a substantially cylindrical fixed head is provided on one end side of the holding shaft via a rotary fastening arm hinge (AH). (H) is fixed (FIG. 4). The other end of the holding shaft is mechanically connected to a rotary motor having a drive shaft, which is a shaft rotating means (RM). The chuck (CK) in the fixed head (H) is rotated by the rotational drive of the drive shaft passing through the holding shaft. The fixed head rotates around the horizontal arm hinge axis perpendicular to the holding axis by adjusting the tightening of the arm hinge (AH), and can hold a predetermined rotation angle (versus horizontal inclination angle (θ)). ing.

また固定ヘッド(H)の内部から側方先部へ突出するように複数のチャック(CK)が固定ヘッド(H)の円筒周方向に分散内蔵され、各チャック(CK)同士の近接距離が調節固定されることで、柱状母材(1)をその先端面(11)が側方へ突出した状態で挟持する。またチャック(CK)と軸回転手段(RM)の駆動軸とは、ユニオンソケットを介して軸連結されてなり、固定ヘッド(H)がアームヒンジ(AH)によって0度を超える対水平角度(θ)に固定された場合でも、軸回転手段(RM)の回転軸の駆動力はチャック(CK)の回転力として伝達される。   A plurality of chucks (CK) are distributed and incorporated in the cylindrical circumferential direction of the fixed head (H) so as to protrude from the inside of the fixed head (H) to the side tip, and the proximity distance between the chucks (CK) is adjusted. By fixing, the columnar base material (1) is sandwiched in a state in which the tip end surface (11) protrudes to the side. The chuck (CK) and the drive shaft of the shaft rotating means (RM) are connected to each other through a union socket, and the fixed head (H) is angled with respect to the horizontal (θ) exceeding 0 degrees by the arm hinge (AH). ), The driving force of the rotating shaft of the shaft rotating means (RM) is transmitted as the rotating force of the chuck (CK).

上記構成により、再溶融工程は、高圧環境下の再溶融室内に設けられた固定ヘッド(H)によって、柱状母材(1)を、前記角部を含む先端面(11)が所定範囲の対水平傾斜角(θ)で斜め方向を向いた傾斜状態(b)に保持し、かつ、固定ヘッド(H)の少なくとも内部を軸回転させる軸回転手段(RM)によって、柱状母材(1)を保持したまま柱軸(1A)周りに回転させながら再溶融するものとなっている。
なお前記固定ヘッド(H)は柱状母材(1)と共に加熱子(C)を保持するものであり、スライド機構(SF)によって再溶融室内を往復走行可能に取り付けられる。
With the above configuration, in the remelting step, the columnar base material (1) is paired with the tip surface (11) including the corner portion in a predetermined range by the fixed head (H) provided in the remelting chamber under a high pressure environment. The columnar base material (1) is held by the shaft rotating means (RM) that holds the tilted state (b) facing the oblique direction at the horizontal tilt angle (θ) and rotates the shaft at least inside the fixed head (H). It is remelted while being rotated around the column axis (1A) while being held.
The fixed head (H) holds the heating element (C) together with the columnar base material (1), and is attached so as to be able to reciprocate in the remelting chamber by a slide mechanism (SF).

(他の実施例)上記実施例とは異なる構成として、固定ヘッド(H)は、所定の角度範囲内で回動可能なチャック(CK)によって、柱状母材(1)を、対水平傾斜角(θ)が自由変動可能な状態で挟持するものであり、
前記再溶融工程において、軸回転手段(RM)によってチャック(CK)が軸回転することで、柱状母材(1)を、柱軸の対水平傾斜角(θ)が可変しながら軸回転するものとすることもできる。軸回転の回転位相によって中将母材(1)の対水平傾斜角(θ)が、加熱子(C)と共に自由可変するため、再溶融工程中に溶射被膜が受ける、重力による外力方向を駆動力を用いずに自由可変させることができる。
(Other Embodiments) As a configuration different from the above-described embodiments, the fixed head (H) is configured such that the columnar base material (1) is tilted with respect to the horizontal by a chuck (CK) that can be rotated within a predetermined angle range. (Θ) is sandwiched in a freely variable state,
In the remelting step, the chuck (CK) is rotated by the shaft rotating means (RM) so that the columnar base material (1) is rotated while the angle of inclination (θ) with respect to the column axis is variable. It can also be. Because the rotation angle of the shaft rotation allows the angle of inclination (θ) of the lieutenant general (1) to be freely variable together with the heating element (C), it drives the direction of external force due to gravity that the sprayed coating receives during the remelting process. It can be freely changed without using force.

本発明は上述した実施例に限られることなく、各実施例の方法要素、各実施器具の構成ないし一部要素の一部省略・抽出、他の公知構成ないし他の知られた要素同士の組み合わせ、一部要素の代替置換など、本発明の趣旨を逸脱しない範囲で適宜変更が可能である。   The present invention is not limited to the above-described embodiments, but the method elements of each embodiment, the configuration of each implement, or the partial omission / extraction of some elements, other known configurations or combinations of other known elements The present invention can be modified as appropriate without departing from the spirit of the present invention, such as substitution replacement of some elements.

先端面(11)
角部(1C)
柱状母材(1)
加熱子(C)
柱軸(1A)
垂下状態(a)
傾斜状態(b)
固定ヘッド(H)
対水平傾斜角(θ)
軸回転手段(RM)
スライド機構(SF)
チャック(CK)
Tip surface (11)
Corner (1C)
Columnar base material (1)
Heater (C)
Column axis (1A)
Hanging state (a)
Inclined state (b)
Fixed head (H)
Horizontal tilt angle (θ)
Shaft rotation means (RM)
Slide mechanism (SF)
Chuck (CK)

Claims (3)

先端面の周縁に角部を有する柱状母材に対して金属皮膜を形成する方法であって、
前記先端面及び角部を含む柱状母材の端部全体に、金属粉末の溶射によって溶射被膜を定着させる溶射工程と、
柱状母材の側周部を囲う加熱子によって前記溶射皮膜を再溶融することにより、溶射皮膜を変性させて、前記角部を含む母材表面に金属皮膜を形成する再溶融工程と、を具備してなり、
前記再溶融工程においては、柱状母材を、前記角部を含む先端面が所定の対水平傾斜角で斜め方向を向いた傾斜状態に保持し、かつ、柱状母材の柱軸周りに回転させながら再溶融するものであって、前記対水平傾斜角は0度超45度以下に固定されることを特徴とする、柱状母材への金属皮膜の形成方法。
A method of forming a metal film on a columnar base material having corners on the periphery of the tip surface,
A thermal spraying step of fixing a thermal spray coating by thermal spraying of metal powder on the entire end of the columnar base material including the tip surface and the corners;
A remelting step of modifying the thermal spray coating by remelting the thermal spray coating with a heater surrounding a side periphery of the columnar base material to form a metal coating on the surface of the base material including the corners. And
In the remelting step, the columnar base material is held in an inclined state in which the tip surface including the corner portion is inclined obliquely at a predetermined horizontal inclination angle, and is rotated around the column axis of the columnar base material. The method for forming a metal film on a columnar base material is characterized in that it is remelted while the horizontal inclination angle is fixed to more than 0 degree and 45 degrees or less .
前記再溶融工程は、高圧環境下の再溶融室内に設けられた固定ヘッドによって、柱状母材を、前記角部を含む先端面が所定範囲の対水平傾斜角で斜め方向を向いた傾斜状態に保持し、かつ、固定ヘッドの少なくとも内部を軸回転させる軸回転手段によって、柱状母材を保持したまま柱軸周りに回転させながら再溶融するものであって、
前記固定ヘッドは柱状母材と共に加熱子を保持するものであり、スライド機構によって再溶融室内を往復走行可能に取り付けられる請求項1に記載の柱状母材への金属皮膜の形成方法。
In the remelting step, the columnar base material is inclined by a fixed head provided in a remelting chamber under a high-pressure environment so that the tip surface including the corner portion is inclined obliquely at a predetermined horizontal inclination angle. It is held and re-melted while rotating around the column axis while holding the columnar base material by the shaft rotating means for rotating the shaft at least inside the fixed head,
The method of forming a metal film on a columnar base material according to claim 1, wherein the fixed head holds a heater together with the columnar base material, and is attached so as to be able to reciprocate in the remelting chamber by a slide mechanism .
前記固定ヘッドは、所定の角度範囲内で回動可能なチャックによって、柱状母材を、対水平傾斜角が自由変動可能な状態で挟持するものであり、
前記再溶融工程において、軸回転手段によってチャックが軸回転することで、柱状母材を、柱軸の対水平傾斜角が可変しながら軸回転する請求項1又は2のいずれかに記載の柱状母材への金属皮膜の形成方法。
The fixed head sandwiches the columnar base material with a chuck that can be rotated within a predetermined angle range in a state in which the angle of inclination with respect to the horizontal can be freely changed,
3. The columnar mother according to claim 1, wherein, in the remelting step, the columnar base material is rotated while the axis of the chuck is rotated by the shaft rotating unit while the angle of inclination of the column axis with respect to the horizontal axis is variable. A method for forming a metal film on a material.
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