JP6462343B2 - Method for producing Li-containing composite oxide - Google Patents
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本発明は、Li含有複合酸化物の製造方法、さらには得られたLi含有複合酸化物を用いた全固体型リチウムイオン二次電池用固体電解質に関する。 The present invention relates to a method for producing a Li-containing composite oxide, and further to a solid electrolyte for an all solid-state lithium ion secondary battery using the obtained Li-containing composite oxide.
Li5La3Nb2O12に代表されるガーネット型固体電解質は, 三次元経路によるイオン拡散, 化学的・熱的安定性および広い電位窓をもつため,全固体型リチウムイオン二次電池(LIB) 用固体電解質への応用が期待される。実際に全固体型LIB に応用するためには,良好なイオン拡散経路を形成した高品質な単結晶が望まれる。また,固体/固体界面の接合が求められる。一般に,全固体型LIBにおける電解質と活物質の固体接合面は点接触になりやすく,界面イオン移動の観点からは,抵抗が大きく望ましくない。また,活物質表面に固体電解質を接触させると,リチウムイオンに対する化学ポテンシャルの異なる固体界面として,空間電荷層が形成される。これにより,固体電解質から活物質側にリチウムイオンが移動し,固体電解質の組成が最適組成から変化し,界面に大きな抵抗成分が生成する。これは,活物質/固体電解質界面でのイオン移動を妨げる要因となる。以上の点から,集電体および電極活物質の耐熱温度を考慮した低温での,活物質と固体電解質の良好な接合界面をもつ積層体とその形成方法の開発は急務と言われている。 Garnet-type solid electrolytes typified by Li 5 La 3 Nb 2 O 12 have ion diffusion through three-dimensional pathways, chemical and thermal stability, and a wide potential window, so all-solid-state lithium ion secondary batteries (LIBs) ) Application to solid electrolyte is expected. In order to actually apply to all-solid-state LIB, high-quality single crystals with good ion diffusion paths are desired. In addition, solid / solid interface bonding is required. In general, the solid interface between the electrolyte and the active material in all-solid-type LIB tends to be in point contact, which is undesirable from the viewpoint of interfacial ion migration. In addition, when a solid electrolyte is brought into contact with the active material surface, a space charge layer is formed as a solid interface having a different chemical potential for lithium ions. As a result, lithium ions move from the solid electrolyte to the active material side, the composition of the solid electrolyte changes from the optimum composition, and a large resistance component is generated at the interface. This is a factor that hinders ion migration at the active material / solid electrolyte interface. In view of the above, it is said that the development of a laminate having a good bonding interface between the active material and the solid electrolyte at a low temperature in consideration of the heat resistance temperature of the current collector and the electrode active material and the formation method thereof are said to be urgent.
パーソナルコンピュータ、携帯電話等の機器類に用いられている二次電池においては、イオンを移動させる媒体として有機溶媒等の液状の電解質が汎用されている。このような液状電解質を用いた電池においては、 その漏洩、発火等の問題を生ずる可能性がある。これに対し、液状電解質に替えて固体電解質を使用するとともに、他の電池要素を全て固体で構成した全固体型LIBは、高エネルギー密度とすることが可能であるとともに、電解質が焼結したセラミックスであるので、発火や漏液の恐れがなく、腐食により電池性能の劣化等の問題も生じにくい。 In secondary batteries used in devices such as personal computers and mobile phones, liquid electrolytes such as organic solvents are widely used as a medium for moving ions. A battery using such a liquid electrolyte may cause problems such as leakage and ignition. In contrast, an all-solid-type LIB in which a solid electrolyte is used instead of a liquid electrolyte and all other battery elements are made of solid can be made to have a high energy density, and a ceramic in which the electrolyte is sintered. Therefore, there is no risk of ignition or leakage, and problems such as deterioration of battery performance due to corrosion hardly occur.
そのような固体電解質であるガーネット型固体電解質粒子は、主に固相反応法(非特許文献1および2)によって合成されている。しかし, 固相反応法により作製された粒子は不定形多結晶体である。 Garnet-type solid electrolyte particles that are such solid electrolytes are mainly synthesized by a solid-phase reaction method (Non-patent Documents 1 and 2). However, particles produced by the solid-phase reaction method are amorphous polycrystals.
また、全固体型LIBの作製法には, 作製した電極および電解質材料をプレス加工して積層体を形成する手法が挙げられる。しかし,この手法には良好な電極/ 電解質界面を形成できないという課題がある。そのため,簡単なプロセスで良好な電極/ 固体電解質界面を形成できる手法が求められる。 In addition, as a method for producing the all-solid-state LIB, there is a method of forming a laminate by pressing the produced electrode and electrolyte material. However, this method has a problem that a good electrode / electrolyte interface cannot be formed. Therefore, a technique that can form a good electrode / solid electrolyte interface with a simple process is required.
本発明は,良好なリチウムイオンの拡散経路をもつ高品質なLi5La3Nb2O12等のLi含有複合酸化物単結晶を電極活物質層から直接育成された積層体とそれを効率よく製造する方法を提供する。 The present invention provides a laminate in which a Li-containing composite oxide single crystal such as a high-quality Li 5 La 3 Nb 2 O 12 having a good lithium ion diffusion path is directly grown from an electrode active material layer, and the laminate efficiently. A method of manufacturing is provided.
本発明は上記の問題を解決するために、以下の発明を提供するものである。
(1)電極活物質層の表面に、Li含有複合酸化物の金属成分の一つである金属層を設ける;金属層の表面にLi含有複合酸化物の出発の出発原料およびフラックスを含む溶液または分散体を塗布する;ならびにLi含有複合酸化物の出発原料およびフラックスを含む溶液または分散体が塗布された表面を含む集電体を加熱し、ついで冷却することにより電極活物質層上にLi含有複合酸化物結晶層を形成する;ことを特徴とするLi含有複合酸化物の製造方法。
(2)Li含有複合酸化物が、ガーネット型、ペロブスカイト型,LISICON (・-Li3PO4)型、NASICON型またはLi-・-アルミナ型複合酸化物である上記(1)に記載のLi含有複合酸化物の製造方法。
(3)ガーネット型複合酸化物が、一般式Li5La3M2O12(M=Nbおよび/またはTa)またはLi7‐xLa3Zr2−xM’xO12(M'はNb,TaまたはAl、0≦x≦2)で示され上記(2)に記載のLi含有複合酸化物の製造方法。
(4)ぺロブスカイト型複合酸化物が、一般式(LiLn)TiO3(Ln=レアメタル)で示される上記(2)に記載のLi含有複合酸化物の製造方法。
(5)LISICON型複合酸化物が、Li 14 ZrGe 4 O 16 または一般式Li 1+x M 2−x M x III P 3 O 12 (M=Ti,Zr,GeまたはHf;MIII=Al,InまたはSc、0≦x≦2)で示される上記(2)に記載のLi含有複合酸化物の製造方法。
(6)Li含有複合酸化物の出発原料が、それぞれの金属成分の酸化物、水酸化物、金属塩またはアルコキシドである上記(1)〜(5)のいずれかに記載のLi含有複合酸化物の製造方法。
(7)フラックスがLiOH・H2O(融点:471℃),Li2CO3(融点:720℃),LiCl(融点:605℃),LsiNO3(融点:873℃),Li2SO4(融点:860℃),LiBO2(融点:849℃),Li6B4O9(融点:754℃),KOH(融点:406℃),NaCl(融点:801℃),KCl(融点:770℃)KNO3(融点:334℃),NaNO3(融点:308℃),K2CO3(融点:633℃),Na2CO3(融点:851℃)から選ばれる少なくとも1種を含んでいる上記(1)〜(6)のいずれかに記載のLi含有複合酸化物の製造方法。
(8)金属膜が、二次電池の電極活物質上に成膜された、Li含有複合酸化物の金属成分の1つである金属膜である上記(1)〜(7)のいずれかに記載のLi含有複合酸化物の製造方法。
(9)二次電池が、リチウムイオン二次電池またはナトリウムイオン二次電池である上記(8)に記載のLi含有複合酸化物の製造方法。
(10)Li含有複合酸化物の金属成分の1つである金属膜が、NbまたはZrである上記(8)または(9)に記載のLi含有複合酸化物の製造方法。
(11)Li含有複合酸化物がLi5La3Nb2O12である上記(1)〜(10)のいずれかに記載のLi含有複合酸化物の製造方法。
(12)Li含有複合酸化物がLi 7 La 3 Zr 2 O 12 である上記(1)〜(10)のいずれかに記載のLi含有複合酸化物の製造方法。
(13)Li含有複合酸化物結晶層が、Li含有複合酸化物の単結晶粒子が積層された積層構造体である上記(1)〜(12)のいずれかに記載のLi含有複合酸化物の製造方法。
The present invention provides the following inventions in order to solve the above problems.
(1) A metal layer that is one of the metal components of a Li-containing composite oxide is provided on the surface of the electrode active material layer; a solution containing a starting material and a flux of the Li-containing composite oxide on the surface of the metal layer or Applying the dispersion; and heating the collector containing the solution or dispersion containing the Li-containing composite oxide starting material and flux, and then cooling the Li-containing composite electrode on the electrode active material layer A method for producing a Li-containing composite oxide, comprising : forming a composite oxide crystal layer.
(2) The Li-containing composite oxide according to the above (1), wherein the Li-containing composite oxide is a garnet type, perovskite type, LISICON (· -Li 3 PO 4 ) type, NASICON type, or Li- · -alumina type composite oxide A method for producing a composite oxide.
(3) The garnet-type composite oxide has a general formula of Li 5 La 3 M 2 O 12 (M = Nb and / or Ta) or Li 7-x La 3 Zr 2−x M ′ x O 12 (M ′ is Nb) , Ta or Al, 0 ≦ x ≦ 2), and the method for producing a Li-containing composite oxide according to (2) above.
(4) The method for producing a Li-containing composite oxide according to (2), wherein the perovskite complex oxide is represented by the general formula (LiLn) TiO 3 (Ln = rare metal).
(5) The LISICON type composite oxide is Li 14 ZrGe 4 O 16 or a general formula Li 1 + x M 2−x M x III P 3 O 12 (M = Ti, Zr, Ge or Hf; M III = Al, In or The manufacturing method of Li containing complex oxide as described in said (2) shown by Sc, 0 <= x <= 2.
(6) The Li-containing composite oxide according to any one of the above (1) to (5), wherein the starting material of the Li-containing composite oxide is an oxide, hydroxide, metal salt or alkoxide of each metal component Manufacturing method.
(7) The flux is LiOH.H 2 O (melting point: 471 ° C.), Li 2 CO 3 (melting point: 720 ° C.), LiCl (melting point: 605 ° C.), LsiNO 3 (melting point: 873 ° C.), Li 2 SO 4 ( Melting point: 860 ° C.), LiBO 2 (melting point: 849 ° C.), Li 6 B 4 O 9 (melting point: 754 ° C.), KOH (melting point: 406 ° C.), NaCl (melting point: 801 ° C.), KCl (melting point: 770 ° C.) ) Contains at least one selected from KNO 3 (melting point: 334 ° C.), NaNO 3 (melting point: 308 ° C.), K 2 CO 3 (melting point: 633 ° C.), Na 2 CO 3 (melting point: 851 ° C.) The manufacturing method of Li containing complex oxide in any one of said (1)-(6).
(8) a metal film, one of the deposited on the collector electrode active material for a secondary battery, a metal film which is one of the metal components of the Li-containing composite oxide (1) to (7) The manufacturing method of Li containing complex oxide as described in any one of.
( 9 ) The method for producing a Li-containing composite oxide according to ( 8 ), wherein the secondary battery is a lithium ion secondary battery or a sodium ion secondary battery.
( 10 ) The method for producing a Li-containing composite oxide according to (8) or (9) , wherein the metal film that is one of the metal components of the Li-containing composite oxide is Nb or Zr.
(11) A method of manufacturing a Li-containing complex oxide according to any one of the above Li-containing complex oxide is Li 5 La 3 Nb 2 O 12 (1) ~ (10).
(12) A method of manufacturing a Li-containing complex oxide according to any one of the above Li-containing complex oxide is Li 7 La 3 Zr 2 O 12 (1) ~ (10).
( 13 ) The Li-containing composite oxide crystal layer according to any one of the above (1) to ( 12 ), wherein the Li-containing composite oxide crystal layer is a stacked structure in which single crystal particles of the Li-containing composite oxide are stacked. Production method.
本発明によれば、良好なリチウムイオンの拡散経路をもつ高品質なLi5La3Nb2O12結晶等のLi含有複合酸化物を効率よく製造する方法を提供し得、得られるLi5La3Nb2O12結晶等は全固体型リチウムイオン二次電池用固体電解質として好適である。 According to the present invention, a method for efficiently producing a Li-containing composite oxide such as a high-quality Li 5 La 3 Nb 2 O 12 crystal having a good lithium ion diffusion path can be provided, and the resulting Li 5 La can be obtained. 3 Nb 2 O 12 crystal or the like is suitable as a solid electrolyte for an all solid-state lithium ion secondary battery.
本発明のLi含有複合酸化物は、その出発原料およびフラックスを含む溶液または分散体を基板表面に塗布し、塗布された表面を含む基板を加熱し、ついで冷却することにより基板上にLi含有複合酸化物結晶層を形成することにより得られる。 The Li-containing composite oxide of the present invention is obtained by applying a solution or dispersion containing the starting material and the flux to the substrate surface, heating the substrate containing the applied surface, and then cooling the substrate. It is obtained by forming an oxide crystal layer.
Li含有複合酸化物としては、ガーネット型、ペロブスカイト型,LISICON (・-Li3PO4)型、NASICON型またはLi-・-アルミナ型複合酸化物が挙げられるが、ガーネット型複合酸化物またはペロブスカイト型複合酸化物が好適であり、ガーネット型複合酸化物が特に好適である。 Examples of the Li-containing composite oxide include garnet-type, perovskite-type, LISCON (.-Li 3 PO 4 ) -type, NASICON-type, and Li --- alumina-type composite oxides. A composite oxide is preferable, and a garnet-type composite oxide is particularly preferable.
ガーネット型複合酸化物は、一般式Li5La3M2O12(M=Nbおよび/またはTa)またはLi7‐xLa3Zr2−xM’xO12(M'はNb,TaまたはAl、0≦x≦2)で示される。具体的にはLi5La3Nb2O12、Li7La3Zr2O12、Li7−xLa3Zr2−xNbxO12等が挙げられるが、リチウムイオン伝導度の点からLi7−xLa3Zr2−xNbxO12が最も好ましい。 The garnet-type composite oxide has a general formula of Li 5 La 3 M 2 O 12 (M = Nb and / or Ta) or Li 7-x La 3 Zr 2-x M ′ x O 12 (M ′ is Nb, Ta or Al, 0 ≦ x ≦ 2). Specific examples include Li 5 La 3 Nb 2 O 12 , Li 7 La 3 Zr 2 O 12 , Li 7-x La 3 Zr 2−x Nb x O 12, and the like. From the viewpoint of lithium ion conductivity, Li 5 7-x La 3 Zr 2- x Nb x O 12 is most preferred.
ぺロブスカイト型複合酸化物は、一般式(LiLn)TiO3(Ln=レアメタル)で示される。具体的には、Li3xLa(2/3−x)Li3xTiO3(0.05≦x≦0.1)、LiLa1/3Nb1−xTixO3等が挙げられるが、リチウムイオン伝導度の点からLi0.33La0.5TiO3等が好適である。 The perovskite complex oxide is represented by the general formula (LiLn) TiO 3 (Ln = rare metal). Specific examples include Li 3x La (2 / 3-x) Li 3x TiO 3 (0.05 ≦ x ≦ 0.1), LiLa 1/3 Nb 1-x Ti x O 3, and the like. From the viewpoint of ionic conductivity, Li 0.33 La 0.5 TiO 3 or the like is preferable.
LISICON型複合酸化物は、Li 14 ZrGe 4 O 16 または一般式Li 1+x M 2−x M x III P 3 O 12 (M=Ti,Zr,GeまたはHf;MIII=Al,InまたはSc、0≦x≦2)で示される。 The LISICON-type composite oxide is Li 14 ZrGe 4 O 16 or a general formula Li 1 + x M 2−x M x III P 3 O 12 (M = Ti, Zr, Ge or Hf; M III = Al, In or Sc, 0 ≦ x ≦ 2).
Li含有複合酸化物の出発原料は、Li,La,Nb,Ta,Zr、Al等の金属成分の酸化物、水酸化物、金属塩またはアルコキシドであるのが好適である。たとえば、Li成分としては、水酸化リチウム、炭酸リチウム等が挙げられ、La成分としては水酸化ランタン、酸化ランタンLa2O3が挙げられ、Nb成分としては、酸化ニオブNb2O5、塩化ニオブNbCl5、ニオブアルコキシド等が挙げられ、さらにZr成分としてはジルコニアZrO2等が挙げられる。さらに、Ti成分としては、チタンアルコキシド等が挙げられる。Nb,Zr,Ta,Al、Ti成分としては、金属自体も使用し得る。 The starting material for the Li-containing composite oxide is preferably an oxide, hydroxide, metal salt or alkoxide of a metal component such as Li, La, Nb, Ta, Zr, and Al. For example, examples of the Li component include lithium hydroxide and lithium carbonate, examples of the La component include lanthanum hydroxide and lanthanum oxide La 2 O 3 , and examples of the Nb component include niobium oxide Nb 2 O 5 , niobium chloride. Examples thereof include NbCl 5 and niobium alkoxide, and examples of the Zr component include zirconia ZrO 2 . Further, examples of the Ti component include titanium alkoxide. As the Nb, Zr, Ta, Al, and Ti components, metals themselves can also be used.
これらのLi含有複合酸化物の出発原料は、目的とするLi含有複合酸化物の組成比に応じて、量比が決定され配合される。 The starting materials for these Li-containing composite oxides are blended with a quantitative ratio determined in accordance with the composition ratio of the target Li-containing composite oxide.
フラックス法は、溶液からの結晶育成法の一種であり、そこでは高温で融解しているフラックス(溶媒)に溶質を溶解させ、溶液の冷却や溶媒の蒸発による過飽和の増加を利用して結晶を育成する。そして、目的とする結晶を融点より低い温度で育成でき、高品質な結晶を育成でき、さらには特殊な装置や操作を必要としない、等の特長を有する。フラックス法は、通常、るつぼ等の容器内で結晶を育成する。フラックスコーティング法は、このようなフラックス法の原理を応用した結晶層(薄膜)形成方法である。通常、るつぼに充填する出発原料(溶質およびフラックス)に溶媒を加えて、常温で溶液やペーストを作成し、基板表面にこれを塗布して加熱する。塗布された溶質が、加熱によりフラックスに溶解し、フラックスの蒸発または溶液の冷却を駆動力として基材表面で結晶が成長する。 The flux method is a type of crystal growth from a solution, in which the solute is dissolved in a flux (solvent) that is melted at high temperature, and the crystal is formed by utilizing the increase in supersaturation due to cooling of the solution or evaporation of the solvent. Cultivate. The target crystal can be grown at a temperature lower than the melting point, a high-quality crystal can be grown, and no special apparatus or operation is required. In the flux method, crystals are usually grown in a container such as a crucible. The flux coating method is a crystal layer (thin film) forming method that applies the principle of such a flux method. Usually, a solvent is added to the starting materials (solute and flux) filled in the crucible to prepare a solution or paste at room temperature, and this is applied to the substrate surface and heated. The applied solute is dissolved in the flux by heating, and a crystal grows on the surface of the substrate by driving the evaporation of the flux or the cooling of the solution as a driving force.
フラックス法は, 溶液から結晶を析出するために, 結晶構造を反映したフラットな結晶面で囲まれた自形をもつ高品質な単結晶を育成できる。フラックスとしては、アルカリ炭酸塩、アルカリ硝酸塩、アルカリ塩化物塩、アルカリ水酸化物の一種以上を含むのが好適であり、LiOH・H2O(融点:471℃),Li2CO3(融点:720℃),LiCl(融点:605℃),LiNO3(融点:873℃),Li2SO4(融点:860℃),LiBO2(融点:849℃),Li6B4O9(融点:754℃),KOH(融点:406℃),NaCl(融点:801℃),KCl(融点:770℃)
KNO3(融点:334℃),NaNO3(融点:308℃),K2CO3(融点:633℃),Na2CO3(融点:851℃)から選ばれる少なくとも1種を含んでいるものが好適に用いられる。Li含有フラックスはLi源としても用いられる。
The flux method can grow high-quality single crystals with a self-form surrounded by a flat crystal plane that reflects the crystal structure in order to precipitate crystals from solution. The flux preferably contains at least one of alkali carbonate, alkali nitrate, alkali chloride, and alkali hydroxide, and includes LiOH.H 2 O (melting point: 471 ° C.), Li 2 CO 3 (melting point: 720 ° C.), LiCl (melting point: 605 ° C.), LiNO 3 (melting point: 873 ° C.), Li 2 SO 4 (melting point: 860 ° C.), LiBO 2 (melting point: 849 ° C.), Li 6 B 4 O 9 (melting point: 754 ° C), KOH (melting point: 406 ° C), NaCl (melting point: 801 ° C), KCl (melting point: 770 ° C)
Contains at least one selected from KNO 3 (melting point: 334 ° C.), NaNO 3 (melting point: 308 ° C.), K 2 CO 3 (melting point: 633 ° C.), Na 2 CO 3 (melting point: 851 ° C.) Are preferably used. Li-containing flux is also used as a Li source.
塗布方法は、特に制限されないが、スプレー法、浸漬法、コテ刷毛法、等によることができる。塗布後に、室温ないし100℃程度で乾燥され、フラックス量は通常0.01mg・cm−2〜10mg・cm−2とされる。 The application method is not particularly limited, and can be a spray method, a dipping method, a trowel brush method, or the like. After application, it is dried at room temperature to about 100 ° C., the flux amount is usually 0.01mg · cm -2 ~10mg · cm -2 .
ついで、塗布された表面を含む基板は、加熱炉内に導入され、好ましくは高酸素分圧雰囲気中で加熱され、ついで冷却することにより基板上に目的とする結晶層を形成する。得られる結晶層は、Li含有複合酸化物の単結晶粒子が緻密に積層された積層構造体である。 Next, the substrate including the coated surface is introduced into a heating furnace, preferably heated in a high oxygen partial pressure atmosphere, and then cooled to form a target crystal layer on the substrate. The obtained crystal layer is a laminated structure in which single crystal particles of Li-containing composite oxide are densely laminated.
加熱は、500〜1000℃程度から選定され、好ましくは700〜900℃程度で、1分間〜3時間程度保持される。 Heating is selected from about 500 to 1000 ° C., preferably about 700 to 900 ° C. and maintained for about 1 minute to 3 hours.
基板は、二次電池の電極活物質層であるのが好適である。または、基板は、Li含有複合酸化物の金属成分の1つである金属、たとえばNbまたはZr基板であるのが好適である。または、さらに好ましくは、基板が、電極活物質上に成膜されたNbまたはZr層である。すなわち、フラックスコーティング法により電極活物質上にたとえばLi5La3Nb2O12結晶層やLi7La3Zr2O12、Li7−xLa3Zr2−xNbxO12を直接形成することができる。好適には、基板は、リチウムイオン二次電池またはナトリウムイオン二次電池の電極活物質層である。または、基板は、リチウムイオン二次電池またはナトリウムイオン二次電池の電極活物質上に成膜された、Li含有複合酸化物の金属成分の1つである金属膜である。成膜は、スパッタ法、真空蒸着法、等で形成されるが、好適にはスパッタ法によることができる。膜厚は、通常5〜500nm程度から選ばれる。 The substrate is preferably an electrode active material layer of a secondary battery. Alternatively, the substrate is preferably a metal that is one of the metal components of the Li-containing composite oxide, such as an Nb or Zr substrate. Alternatively, more preferably, the substrate is an Nb or Zr layer formed on the electrode active material. That is, for example, Li 5 La 3 Nb 2 O 12 crystal layer, Li 7 La 3 Zr 2 O 12 , Li 7-x La 3 Zr 2−x Nb x O 12 is directly formed on the electrode active material by a flux coating method. be able to. Preferably, the substrate is an electrode active material layer of a lithium ion secondary battery or a sodium ion secondary battery. Alternatively, the substrate is a metal film that is one of the metal components of the Li-containing composite oxide formed on the electrode active material of a lithium ion secondary battery or a sodium ion secondary battery. The film is formed by a sputtering method, a vacuum evaporation method, or the like, but can be preferably formed by a sputtering method. The film thickness is usually selected from about 5 to 500 nm.
上記ナトリウムイオン二次電池には、通常、正極にナトリウム金属酸化物、負極にグラファイト等の炭素材が用いられる。 In the sodium ion secondary battery, a carbon material such as sodium metal oxide is generally used for the positive electrode and graphite is used for the negative electrode.
全固体型LIBの作製法として、作製した電極および電解質材料をプレス加工して積層体を形成する手法が挙げられる。しかし、この手法では良好な電極/ 電解質界面を形成できないことが課題であった。ここでは、簡単なプロセスで良好な電極/ 固体電解質界面を形成し得る。 As a method for producing the all-solid-state LIB, there is a method in which the produced electrode and the electrolyte material are pressed to form a laminate. However, this method has a problem that a good electrode / electrolyte interface cannot be formed. Here, a good electrode / solid electrolyte interface can be formed by a simple process.
このように得られたLi含有複合酸化物は、特に全固体型リチウムイオン二次電池用固体電解質として有用である。すなわち、全固体型リチウムイオン二次電池は、正極、負極、および本発明のLi含有複合酸化物である固体電解質、を備える。正極及び負極は、リチウムイオン二次電池に使用されている公知の正極活物質及び負極活物質を含むことができる。正極活物質としては、たとえばリチウムマンガン複合酸化物、リチウムコバルト複合酸化物、リチウムニッケルコバルト複合酸化物、リチウムマンガンコバルト複合酸化物、オリビン構造を有するリチウムリン酸化合物等が挙げられるが、層状構造をもつLiCoO2、LiNiO2、LiNi0.33Mn0.33Co0.33O2,LiNi0.82Co0.13Al0.05O2、スピネル構造をもつLiMnO4、LiNi0.5Mn1.5O4、オリビン構造をもつLiNiPO4,LiNiPO4等が好適である。負極活物質としては、たとえば、カーボン、金属リチウム(Li),チタン酸リチウム酸(窒)化物等が挙げられる。 The Li-containing composite oxide thus obtained is particularly useful as a solid electrolyte for an all solid-state lithium ion secondary battery. That is, the all solid-state lithium ion secondary battery includes a positive electrode, a negative electrode, and a solid electrolyte that is the Li-containing composite oxide of the present invention. The positive electrode and the negative electrode can include known positive electrode active materials and negative electrode active materials used in lithium ion secondary batteries. Examples of the positive electrode active material include lithium manganese composite oxide, lithium cobalt composite oxide, lithium nickel cobalt composite oxide, lithium manganese cobalt composite oxide, and lithium phosphate compound having an olivine structure. LiCoO 2, LiNiO 2, LiNi 0.33 Mn 0.33 Co 0.33 O 2, LiNi 0.82 Co 0.13 Al 0.05 O 2 having, LiMnO 4, LiNi 0.5 Mn 1.5 O 4 having a spinel structure, LiNiPO 4, LiNiPO 4 or the like having an olivine structure Is preferred. Examples of the negative electrode active material include carbon, metal lithium (Li), lithium titanate (nitride), and the like.
上記のように、本発明において、電極活物質層上にLi含有複合酸化物の単結晶粒子が緻密に積層された積層構造体を得た場合には、たとえば、これを固体電解質として全固体型リチウムイオン二次電池に好適に使用し得る。 As described above, in the present invention, when a laminated structure in which single crystal particles of a Li-containing composite oxide are densely laminated on an electrode active material layer is obtained, for example, this is used as a solid electrolyte for an all solid type It can be suitably used for a lithium ion secondary battery.
以下、実施例により本発明をさらに詳細に説明する。以下の実施例においては、Li含有複合酸化物の一例として、Li5La3Nb2O12についての結果を示すが、本発明はLi5La3Nb2O12に限定されるものではなく、また実施例において選択された実験条件に限定されるものではない。
実施例1
A.LiOHフラックスによるNb基板のLi5La3Nb2O12結晶層への変換
(1)活物質上に固体電解質結晶層を直接形成するためには, 集電体と活物質の耐熱温度を考慮して低温形成するだけでなく,溶質と活物質の反応を抑制して直接形成する必要がある。そこで、活物質LiCoO2上にNb層を積層する。Nbは,Co と固溶体を形成しないため,保護層として利用できる。さらに, Nb源をNb層から供給すれば,基材表面上で結晶成長するため緻密で強固な結晶層を作製し得る。ここでは,モデル実験としてNb 層(Nb 基板)から結晶層を形成することに着目した。Li5La3Nb2O12結晶層の作製には,市販試薬のLiOH・H2O(試薬特級、和光純薬工業)0.295g,La2O3 (光学用,和光純薬工業)0.305gを用いた。また,フラックスとしてLiOH・H2Oを2.431g用いた。LiOH・H2OはLi 源にも用いるが,ここではLi 濃度として取り扱わず便宜上,溶質とフラックスを区別して取り扱う。
Hereinafter, the present invention will be described in more detail with reference to examples. In the following examples, the results for Li 5 La 3 Nb 2 O 12 are shown as an example of the Li-containing composite oxide, but the present invention is not limited to Li 5 La 3 Nb 2 O 12 , Moreover, it is not limited to the experimental condition selected in the Example.
Example 1
A. Conversion of Nb substrate to Li 5 La 3 Nb 2 O 12 crystal layer by LiOH flux (1) In order to directly form a solid electrolyte crystal layer on the active material, the heat resistance temperature of the current collector and the active material should be considered In addition to forming at low temperature, it is necessary to form the film directly while suppressing the reaction between the solute and the active material. Therefore, an Nb layer is stacked on the active material LiCoO 2 . Nb can be used as a protective layer because it does not form a solid solution with Co. Furthermore, if the Nb source is supplied from the Nb layer, the crystal grows on the surface of the substrate, so that a dense and strong crystal layer can be produced. Here, we focused on forming a crystal layer from an Nb layer (Nb substrate) as a model experiment. The Li 5 La 3 Nb 2 O 12 crystal layer was prepared by using commercially available reagents LiOH · H 2 O (special grade reagent, Wako Pure Chemical Industries) 0.295 g, La 2 O 3 (optical, Wako Pure Chemical Industries) 0.305 g Was used. In addition, 2.431 g of LiOH · H 2 O was used as a flux. LiOH / H 2 O is also used as a Li source, but here it is not handled as Li concentration, but for the sake of convenience, solute and flux are distinguished.
Nb 基板(10×15 mm)上にLiOH・H2O およびLa2O3 の混合試薬を塗布した。その後,ふたをして電気炉内に設置した。8.3℃/分で500℃まで昇温し,その温度で0〜10 時間保持した。保持終了後, 200℃/時間で100°C まで冷却し,さらに室温まで放冷した。その後, 電気炉内からるつぼを取り出し,温水中に浸漬してフラックスを溶解除去した。
(2)保持温度500℃でLiOH フラックスを用いてLi5La3Nb2O12結晶層を作製した。作製した結晶層のXRDパターンを図1に示す。図1において、(a)は,保持時間10時間でNb基板上に形成された結晶、(b)は未処理Nb基板および(c)は、Li5La3Nb2O12 ICDD PDF 73-7390のXRD パターンを示す。XRD パターンには, Nb およびLi5La3Nb2O12に起因する回折線が検出された。その結果, 作製した結晶層がLi5La3Nb2O12であることが確認された。図2に,未処理のNb 基板(a)と保持温度10 時間で作製した結晶層((b)および(c))のSEM 像を示す。自形の発達した多面体結晶から成る結晶層がNb 基板表面上に形成できた。作製した結晶層は、基板と強固に接合していた。Nb 源をNb 基板から供給したためと考えられる。断面像から, 結晶層は厚さ方向においては1 個の結晶で構成されていることを確認した。また、緻密に結晶が集積しているため, 基板表面で結晶成長していることが考えられる。
(3)基板表面での結晶成長過程を考察するために,Nb 基板のTG-DTA 分析と温度変化に対するXRD パターンを調査した。いずれも, 昇温速度500℃/時間で500℃まで昇温した。その結果を図3 および4に示す。図4において、(a)はNb 基板、(b)はNb2O5 ICDD PDF 03-0514を示す。
A mixed reagent of LiOH.H 2 O and La 2 O 3 was applied on an Nb substrate (10 × 15 mm). After that, it was covered and installed in the electric furnace. The temperature was raised to 500 ° C at 8.3 ° C / min and held at that temperature for 0-10 hours. After the holding, it was cooled to 100 ° C at 200 ° C / hour and then allowed to cool to room temperature. After that, the crucible was taken out from the electric furnace and immersed in warm water to dissolve and remove the flux.
(2) A Li 5 La 3 Nb 2 O 12 crystal layer was produced using a LiOH flux at a holding temperature of 500 ° C. The XRD pattern of the produced crystal layer is shown in FIG. In FIG. 1, (a) is a crystal formed on an Nb substrate with a holding time of 10 hours, (b) is an untreated Nb substrate, and (c) is Li 5 La 3 Nb 2 O 12 ICDD PDF 73-7390 The XRD pattern is shown. In the XRD pattern, diffraction lines attributed to Nb and Li 5 La 3 Nb 2 O 12 were detected. As a result, it was confirmed that the produced crystal layer was Li 5 La 3 Nb 2 O 12 . Figure 2 shows SEM images of the untreated Nb substrate (a) and the crystal layers ((b) and (c)) produced at a holding temperature of 10 hours. A crystal layer consisting of self-developed polyhedral crystals could be formed on the Nb substrate surface. The produced crystal layer was firmly bonded to the substrate. This is probably because the Nb source was supplied from the Nb substrate. From the cross-sectional image, it was confirmed that the crystal layer was composed of one crystal in the thickness direction. In addition, since crystals are densely accumulated, it is considered that crystals grow on the substrate surface.
(3) In order to consider the crystal growth process on the substrate surface, TG-DTA analysis of the Nb substrate and the XRD pattern with respect to temperature change were investigated. In both cases, the temperature was raised to 500 ° C at a heating rate of 500 ° C / hour. The results are shown in FIGS. 4A shows an Nb substrate, and FIG. 4B shows Nb 2 O 5 ICDD PDF 03-0514.
TG-DTA 分析では,Nb 基板の重量が加熱とともに増加した。また,In-situ XRD 分析では、461〜499°C でNb2O5 の形成に起因する回折線を確認した。フラックスの融点(462℃)とこれらの結果を考慮すると,Nb 源は加熱によって表面に形成される酸化膜であると考えられる。
(4)次に, 保持時間10 時間から保持なし、あるいは保持1 時間に変更して作製した結晶層のXRD パターンを図5 に示す。保持なし(a)では,Li5La3Nb2O12がわずかに生成したが、主相としてLiLa2NbO6が生成した。保持時間1時間(b)では,LiLa2NbO6が副産物となり主相としてLi5La3Nb2O12が生成した。保持時間10 時間(c)では,LiLa2NbO6 に起因する回折線は消失し,Li5La3Nb2O12 のみが生成した(↓:Nb基板)。このことから,Li5La3Nb2O12 結晶層は,LiLa2NbO6を経由して生成すると考えられる。(d)は、LiLa2NbO6 ICDD PDF および(e)はLi5La3Nb2O12 ICDD PDFを示す。
In TG-DTA analysis, the weight of the Nb substrate increased with heating. In addition, in-situ XRD analysis confirmed diffraction lines resulting from the formation of Nb 2 O 5 at 461-499 ° C. Considering the melting point of the flux (462 ° C) and these results, the Nb source is considered to be an oxide film formed on the surface by heating.
(4) Next, Fig. 5 shows the XRD pattern of the crystal layer produced by changing the holding time from 10 hours to no holding or from 1 hour holding. Without retention (a), Li 5 La 3 Nb 2 O 12 was slightly produced, but LiLa 2 NbO 6 was produced as the main phase. At a retention time of 1 hour (b), LiLa 2 NbO 6 became a by-product and Li 5 La 3 Nb 2 O 12 was produced as the main phase. At a retention time of 10 hours (c), the diffraction lines attributed to LiLa 2 NbO 6 disappeared and only Li 5 La 3 Nb 2 O 12 was produced (↓: Nb substrate). From this, it is considered that the Li 5 La 3 Nb 2 O 12 crystal layer is generated via LiLa 2 NbO 6 . (d) shows LiLa 2 NbO 6 ICDD PDF and (e) shows Li 5 La 3 Nb 2 O 12 ICDD PDF.
図6に,それぞれの保持時間で作製したLi5La3Nb2O12結晶層のSEM 像を示す。保持なし(a)では,多面体結晶が一部分で生成し,保持時間1 時間(b)では多面体結晶の数が増加した。保持時間10 時間(c)では多面体結晶が基板表面を完全に占めて、個々の結晶サイズが増大した。
(5)以上の結果から結晶層形成過程を考察する。450℃ 付近でNb 基板表面は酸化膜で覆われる。500℃まで昇温すると,融解したフラック中で溶質が反応してLiLa2NbO6が基板表面に形成され、ついでLi5La3Nb2O12が生成し始める。生成したLi5La3Nb2O12結晶は、フラックス中で成長し、基板表面に緻密なLi5La3Nb2O12結晶層が形成される。すなわち,Li5La3Nb2O12結晶が基板表面に形成された後, 個々の結晶がフラックス中でオストワルド熟成したと考える。
B.LiOHフラックスからの活物質上へのLi5La3Nb2O12結晶層の作製
(1)活物質上へのLi5La3Nb2O12結晶層の作製には,市販試薬のLiOH・H2O(試薬特級, 和光純薬工業)、La2O3 (光学用, 和光純薬工業)を用いた。活物質には市販の正極材として用いられるLiCoO2を用いた。Nb 源には,LiCoO2上にスパッタリング成膜したNb層を用いた。スパッタリング条件は、背圧2.0×10-3 Pa,出力300 W,アルゴン流量3.0 sccm,放電Arガス圧力0.67 Pa,放電時間5 時間 とした。また,フラックスにはLiOH・H2Oを選択した。LiOH・H2Oを0.295g,La2O3を0.305gを用いた。また,フラックスとしてLiOH・H2Oを2.431gをそれぞれ乾式混合し,Nb 被覆したLiCoO2ペレット上に塗布した。電気炉内で,約8.3℃/分で500℃まで昇温し,その温度で10時間保持した。保持終了後,200℃/時間で100℃まで冷却し、さらに室温まで放冷した。その後, 電気炉から取り出し,温水中に浸漬してフラックスを溶解除去した。
(2)図7に未処理のLiCoO2 ペレット、Nb スパッタリング後および結晶層形成後のXRD パターンを示す。図7において、(a)〜(e)は、(a) Li5La3Nb2O12 / LiCoO2 (Run No.2-11)、(b) Nb / LiCoO2 、(c) LiCoO2 、d)Li5La3Nb2O12 ICDD PDFおよび(e)LiLa2NbO6 ICDD PDF 40-0895を示す。Nb スパッタリング後のXRDパターンから, Nb に起因する回折線を確認した。また, Nb 層変換後のXRD パターンから,主相としてLi5La3Nb2O12が生成したが、LiLa2NbO6が副産物として生成したことを確認した。未処理のLiCoO2 ペレット、Nb スパッタリング後および結晶層形成後のSEM 像を図8に示す。スパッタリング後、Nb 膜がLiCoO2 表面に成膜されたことを確認した。また、Nb 層変換後のSEM 像から, 自形の発達した多面体結晶から成る結晶層が緻密に形成できたことを確認した。結晶層を構成する個々の結晶は、基板上での結晶層と同様で{110}および{211}面で囲まれていた。図8において, (a)〜(d)は、(a) LiCoO2 , (b) Nb / LiCoO2 および((c)および(d))Li5La3Nb2O12結晶層/ LiCoO2を示す。
C.以上のように、上記の条件下で、フラックス法によりLi5La3Nb2O12結晶が育成された。結晶育成に用いた保持温度および保持時間は500℃,10 時間程度であり,従来の固相反応法(950℃,24時間)(J.Am.Ceram.Sos., 88,411(2005))と比べ大幅に低温,短時間化できた。生成相,結晶のサイズおよび形態は,フラックス,保持温度に大きく依存した。育成した結晶は,結晶面がフラットで自形の発達した多面体結晶であった。また、結晶は{110}および{221}面で囲まれていた。育成した結晶の格子定数、結晶密度、面角および格子面間隔は,文献値とほぼ同じ値を示した。同条件で育成した結晶は,TEM観察よりシャープな回折パターンと規則正しい原子配列をもつことがわかった。以上のことから低温フラックス育成した結晶は高品質な単結晶であるといえる。高品質な単結晶が育成できたのは,LiOH フラックスが十分に溶質を溶かし、結晶が成長したためと考えられる。結晶層を形成する厚さ方向の結晶の数は1 個であった。さらに基板表面での結晶層形成過程を考察した。昇温, 保持過程においてNb 基板表面はNb、Nb2O5、LiLa2NbO6 の順に生成相が変わり,最終的にLi5La3Nb2O12結晶層が形成される。また,保持過程では,個々のLi5La3Nb2O12結晶がオストワルド熟成していると考えられる。また、Nb 基板上への結晶層形成条件を基に活物質LiCoO2上にLi5La3Nb2O1晶層を形成できた。以上の結果から,フラックス法およびフラックスコーティング法により育成・作製した固体電解質Li5La3Nb2O12結晶(層)は全固体型リチウムイオン二次電池に好適に使用され得る。
実施例2
A.LiOHフラックスによるTa基板のLi5La3Ta2O12結晶層への変換
活物質LiCoO2上にTa層を積層する。Ta は,Co と固溶体を形成しないため,保護層として利用できる。さらに,Ta 源をTa 層から供給すれば,基材表面上で結晶成長するため緻密で強固な結晶層を作製し得る。
(1)活物質上へのLi5La3Ta2O12結晶層の作製には,市販試薬のLiOH・H2O(試薬特級,和光純薬工業),La2O3(光学用,和光純薬工業)を用いた。活物質には市販の正極材として用いられるLiCoO2を用いた。Ta 源には,LiCoO2上にスパッタリング成膜したTa 層を用いた。スパッタリング条件は,背圧2.0×10-3 Pa,出力150 W,アルゴン流量3.0 sccm,放電Ar ガス圧力0.67 Pa,放電時間15 分間とした。また,フラックスにはLiOH・H2Oを選択した。LiOH・H2Oを0.093 g,La2O3を0.188 gを用いた。また,フラックスとしてLiOH・H2Oを1.610 gをそれぞれ乾式混合し,Ta 被覆したLiCoO2ペレット上に塗布した。電気炉内で,約8.3℃/分で500℃まで昇温し,その温度で10時間保持した。保持終了後,200℃/時間で100℃まで冷却し,さらに室温まで放冷した。その後,電気炉から取り出し,温水中に浸漬してフラックスを溶解除去した。
(2)図9に結晶層形成後のXRD パターンを示す。図9において,(a)〜(d)は,(a) Li5La3Ta2O12 / LiCoO2,(b) LiCoO2, (c) Li5La3Ta2O12 ICDD PDF 45-0110,(d) La2Li0.5Co0.5O4 ICDD PDF 89-4701を示す。Ta層変換後のXRD パターンから,La2Li0.5Co0.5O4が副産物として生成したが,主相としてLi5La3Ta2O12が生成したことを確認した。結晶層形成後のSEM 像を図10(a)および(b)に示す。Ta 層変換後のSEM 像から,自形の発達した多面体結晶から成る結晶層が緻密に形成できたことを確認した。
Fig. 6 shows SEM images of Li 5 La 3 Nb 2 O 12 crystal layers fabricated at each retention time. Without retention (a), polyhedral crystals were partially formed, and with a retention time of 1 hour (b), the number of polyhedral crystals increased. At a holding time of 10 hours (c), the polyhedral crystal completely occupied the substrate surface, and the individual crystal size increased.
(5) Consider the crystal layer formation process from the above results. The Nb substrate surface is covered with an oxide film at around 450 ℃. When the temperature is raised to 500 ° C., the solute reacts in the melted flack to form LiLa 2 NbO 6 on the substrate surface, and then Li 5 La 3 Nb 2 O 12 starts to be generated. The generated Li 5 La 3 Nb 2 O 12 crystal grows in the flux, and a dense Li 5 La 3 Nb 2 O 12 crystal layer is formed on the substrate surface. That is, after the Li 5 La 3 Nb 2 O 12 crystal is formed on the substrate surface, it is considered that each crystal is Ostwald ripened in the flux.
B. Preparation of Li 5 La 3 Nb 2 O 12 Crystal Layer on Active Material from LiOH Flux (1) Preparation of Li 5 La 3 Nb 2 O 12 Crystal Layer on Active Material 2 O (special grade reagent, Wako Pure Chemical Industries) and La 2 O 3 (optical, Wako Pure Chemical Industries) were used. LiCoO 2 used as a commercially available positive electrode material was used as the active material. As the Nb source, an Nb layer formed by sputtering on LiCoO 2 was used. The sputtering conditions were a back pressure of 2.0 × 10 −3 Pa, an output of 300 W, an argon flow rate of 3.0 sccm, a discharge Ar gas pressure of 0.67 Pa, and a discharge time of 5 hours. In addition, LiOH · H 2 O was selected as the flux. LiOH · H 2 O (0.295 g) and La 2 O 3 (0.305 g) were used. In addition, 2.431 g of LiOH · H 2 O as a flux was dry mixed and applied onto LiCoO 2 pellets coated with Nb. In the electric furnace, the temperature was raised to 500 ° C at about 8.3 ° C / min and held at that temperature for 10 hours. After completion of the holding, it was cooled to 100 ° C. at 200 ° C./hour and further allowed to cool to room temperature. After that, it was removed from the electric furnace and immersed in warm water to dissolve and remove the flux.
(2) FIG. 7 shows an XRD pattern of untreated LiCoO 2 pellets, after Nb sputtering and after crystal layer formation. In FIG. 7, (a) to (e) are: (a) Li 5 La 3 Nb 2 O 12 / LiCoO 2 (Run No. 2-11), (b) Nb / LiCoO 2 , (c) LiCoO 2 , d) Li 5 La 3 Nb 2 O 12 ICDD PDF and (e) LiLa 2 NbO 6 ICDD PDF 40-0895. The diffraction lines attributed to Nb were confirmed from the XRD pattern after Nb sputtering. Moreover, from the XRD pattern after Nb layer conversion, it was confirmed that Li 5 La 3 Nb 2 O 12 was produced as the main phase, but LiLa 2 NbO 6 was produced as a byproduct. FIG. 8 shows SEM images of untreated LiCoO 2 pellets, Nb after sputtering, and after crystal layer formation. After sputtering, it was confirmed that an Nb film was formed on the LiCoO 2 surface. In addition, it was confirmed from the SEM image after Nb layer conversion that a crystal layer composed of self-developed polyhedral crystals could be densely formed. The individual crystals constituting the crystal layer were surrounded by {110} and {211} planes in the same manner as the crystal layer on the substrate. In FIG. 8, (a) to (d) show (a) LiCoO 2 , (b) Nb / LiCoO 2 and ((c) and (d)) Li 5 La 3 Nb 2 O 12 crystal layer / LiCoO 2 . Show.
C. As described above, under the above conditions, Li 5 La 3 Nb 2 O 12 crystals were grown by the flux method. The holding temperature and holding time used for crystal growth are about 500 ° C for about 10 hours, compared with the conventional solid-phase reaction method (950 ° C, 24 hours) (J. Am. Ceram. Sos., 88, 411 (2005)). We were able to significantly reduce the temperature and time. The formation phase, crystal size and morphology depended greatly on the flux and holding temperature. The grown crystal was a polyhedral crystal with a flat crystal plane and developed self-shape. The crystal was surrounded by {110} and {221} faces. The lattice constant, crystal density, face angle, and lattice spacing of the grown crystal were almost the same as the literature values. Crystals grown under the same conditions were found to have sharp diffraction patterns and ordered atomic arrangements by TEM observation. From the above, it can be said that the crystal grown by low temperature flux is a high quality single crystal. High quality single crystals could be grown because the LiOH flux sufficiently dissolved the solute and the crystals grew. The number of crystals in the thickness direction forming the crystal layer was one. Furthermore, the crystal layer formation process on the substrate surface was considered. In the temperature rising and holding process, the Nb substrate surface changes in phase in the order of Nb, Nb 2 O 5 and LiLa 2 NbO 6 , and finally a Li 5 La 3 Nb 2 O 12 crystal layer is formed. In the holding process, it is considered that individual Li 5 La 3 Nb 2 O 12 crystals are Ostwald-ripened. In addition, a Li 5 La 3 Nb 2 O 1 crystal layer could be formed on the active material LiCoO 2 based on the crystal layer formation conditions on the Nb substrate. From the above results, the solid electrolyte Li 5 La 3 Nb 2 O 12 crystal (layer) grown and produced by the flux method and the flux coating method can be suitably used for an all-solid-state lithium ion secondary battery.
Example 2
A. Conversion of Ta substrate to Li 5 La 3 Ta 2 O 12 crystal layer by LiOH flux A Ta layer is laminated on the active material LiCoO 2 . Ta can be used as a protective layer because it does not form a solid solution with Co. Furthermore, if a Ta source is supplied from the Ta layer, the crystal grows on the surface of the substrate, so that a dense and strong crystal layer can be produced.
(1) Li 5 La 3 Ta 2 O 12 crystal layer on the active material was prepared using commercially available reagents such as LiOH · H 2 O (special grade reagent, Wako Pure Chemical Industries), La 2 O 3 (optical, Hikari Pure Chemical Industries) was used. LiCoO 2 used as a commercially available positive electrode material was used as the active material. As the Ta source, a Ta layer formed by sputtering on LiCoO 2 was used. The sputtering conditions were a back pressure of 2.0 × 10 -3 Pa, an output of 150 W, an argon flow rate of 3.0 sccm, a discharge Ar gas pressure of 0.67 Pa, and a discharge time of 15 minutes. In addition, LiOH · H 2 O was selected as the flux. LiOH · H 2 O (0.093 g) and La 2 O 3 (0.188 g) were used. In addition, 1.610 g of LiOH · H 2 O as a flux was dry-mixed and applied onto Ta-coated LiCoO 2 pellets. In the electric furnace, the temperature was raised to 500 ° C at about 8.3 ° C / min and held at that temperature for 10 hours. After the holding, it was cooled to 100 ° C at 200 ° C / hour and then allowed to cool to room temperature. Thereafter, the flux was removed from the electric furnace and immersed in warm water to dissolve and remove the flux.
(2) FIG. 9 shows the XRD pattern after the crystal layer is formed. In FIG. 9, (a) to (d) are: (a) Li 5 La 3 Ta 2 O 12 / LiCoO 2 , (b) LiCoO 2 , (c) Li 5 La 3 Ta 2 O 12 ICDD PDF 45-0110 , (D) La 2 Li 0.5 Co 0.5 O 4 ICDD PDF 89-4701. From the XRD pattern after Ta layer conversion, it was confirmed that La 2 Li 0.5 Co 0.5 O 4 was formed as a by-product, but Li 5 La 3 Ta 2 O 12 was formed as the main phase. The SEM images after forming the crystal layer are shown in FIGS. 10 (a) and 10 (b). From the SEM image after the Ta layer conversion, it was confirmed that the crystal layer composed of polyhedral crystals with self-development was densely formed .
本発明によれば、良好な正極活物質と固体電解質が直接接合された界面が形成され,界面におけるリチウムイオンの良好な拡散経路をもつ高品質な活物質/固体電解質界面を効率よく製造する方法を提供し得る。 According to the present invention, a method for efficiently producing a high-quality active material / solid electrolyte interface having an interface in which a good positive electrode active material and a solid electrolyte are directly bonded is formed and a lithium ion diffusion path is good at the interface. Can provide.
Claims (13)
KNO3(融点:334℃),NaNO3(融点:308℃),K2CO3(融点:633℃),Na2CO3(融点:851℃)から選ばれる少なくとも1種を含んでいる請求項1〜6のいずれか1項に記載のLi含有複合酸化物の製造方法。 The flux is LiOH.H 2 O (melting point: 471 ° C.), Li 2 CO 3 (melting point: 720 ° C.), LiCl (melting point: 605 ° C.), LiNO 3 (melting point: 873 ° C.), Li 2 SO 4 (melting point: 860 ° C), LiBO 2 (melting point: 849 ° C), Li 6 B 4 O 9 (melting point: 754 ° C), KOH (melting point: 406 ° C), NaCl (melting point: 801 ° C), KCl (melting point: 770 ° C)
A claim containing at least one selected from KNO 3 (melting point: 334 ° C.), NaNO 3 (melting point: 308 ° C.), K 2 CO 3 (melting point: 633 ° C.), Na 2 CO 3 (melting point: 851 ° C.) Item 7. The method for producing a Li-containing composite oxide according to any one of Items 1 to 6.
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