JP6476780B2 - Imprint mold and imprint method - Google Patents

Description

  The present invention relates to an imprint mold and an imprint method.

  In recent years, a pattern forming technique using an imprint method has attracted attention as a pattern forming technique that replaces the photolithography technique. The imprint method uses, for example, an imprint mold (hereinafter referred to as a mold) having a pattern region in which a fine uneven shape is formed, and the fine uneven shape is transferred by transferring the uneven shape to a molding material. This is a pattern forming technique for transferring at the same magnification.

  For example, an imprint method using a photocurable resin composition as a molding material is performed as follows. First, droplets of the photocurable resin composition are supplied to the surface of the transfer substrate. Next, the photocurable resin composition is filled in the concavo-convex shape by bringing the mold having the pattern region in which the desired concavo-convex shape is formed and the photocurable resin composition close to or in contact with each other to a predetermined distance. . In this state, the resin layer is formed by irradiating light from the mold side to cure the photocurable resin composition. Then, the pattern structure which has the uneven | corrugated shape in which the uneven | corrugated shape in the pattern area | region of a mold was reversed is formed by separating a mold and a resin layer. Thereafter, the transfer substrate may be etched using such a pattern structure as an etching resist.

  Conventionally known molds for imprinting include a mold made of quartz or the like that does not have flexibility (see Patent Document 1), and a mold made of resin or the like that has flexibility (see Patent Document 1). Patent Document 2).

  In an imprint using a mold that does not have flexibility, it is required that the mold and the transfer substrate be kept parallel to make the residual film thickness uniform in the resin layer separated from the mold. However, when the area of such a mold that does not have flexibility is increased, a large peeling stress acts upon separation from the resin layer, so that it is difficult to release the mold without causing a defect in the pattern. For this reason, it is difficult to increase the area of an imprint mold that does not have flexibility, and it is not suitable for forming a large pattern structure.

  On the other hand, when using a mold having flexibility, roller imprinting can be performed. In this roller imprint, a mold is formed by forming a pattern region including a fine concavo-convex shape on a flexible substrate, and the mold is formed with a roller from the back surface (the surface where the concavo-convex shape is not formed) of the mold. For example, a mold is brought into contact with a resin composition such as an etching resist, the resin composition is cured after the contact, and then the resin layer cured with the resin composition is released from the mold. It is. When adopting such a roller imprint, it is not always necessary to maintain the parallelism between the mold and the transfer substrate at the time of releasing, so that the area is larger than the imprint method using a non-flexible mold. Is easy.

  In recent years, an imprint method using such an imprint mold is expected to be employed in the manufacture of various products. For example, a wire grid polarizer can be mentioned as a product that can be manufactured by the imprint method.

  The wire grid polarizer is provided with a plurality of fine metal wires in parallel and is used for photo-alignment processing (Patent Document 3). For example, in Patent Document 4, a polarizing element unit is configured by arranging a plurality of wire grid polarizers in a holding frame so that fine metal wires are aligned in one direction, and the polarizing element unit is irradiated with ultraviolet rays. It is disclosed that a photo-alignment treatment is performed by giving anisotropy by irradiating a curable resin composition with emitted linearly polarized light. Such a wire grid polarizer can be used for various applications such as a member for improving the luminance of a display in addition to the photo-alignment treatment. The wire grid polarizer may be required to have a large area, and when manufacturing a large area wire grid polarizer, roller imprint using a mold having flexibility is suitable.

JP 2013-161893 A JP 2011-183782 A JP 2009-265290 A JP 2012-203294 A

  By the way, the conventional mold used in the roller imprint as described above generally has flexibility. Thereby, the conventional mold is ensured in flexibility and can be easily bent when pressed by a roller.

  However, the inventor of the present invention is prone to deformation such as tilt and waviness due to the flexibility of the conventional mold, and when such deformation occurs, the film thickness is locally localized in the resin composition in contact with the mold. It has been found that a defect region that becomes thinner is more likely to occur.

  In detail, in the mold, when the outer peripheral portion of the uneven shape of the pattern region is formed on a flat surface, and the height of the flat surface is formed lower than the height of the pattern region, in particular, the uneven shape. It was found that the boundary between the flat surface and the vicinity thereof is easily deformed, and in particular, a defect region is likely to occur in the resin composition in contact with the boundary or the vicinity thereof.

  Such a defective area is assumed to be caused by the following phenomenon.

  First, when the mold and the resin composition are brought into contact with each other, the concavo-convex convex portion of the mold receives resistance from the resin composition. Thereby, in the concavo-convex shape, while it takes time to reach the resin composition in the concave portion, on the flat surface located in the outer peripheral portion of the concavo-convex shape, there is no resistance, so the time until contact with the resin composition It does not take. Due to this time difference, the flat surface tilts or undulates toward the resin composition starting from the boundary with the concavo-convex shape or the vicinity thereof. And when such inclination and a wave | undulation arise, a pressure nonuniformity arises between a mold and a resin composition, a space | gap arises in the area | region where a pressure is low, and the film thickness of a resin composition becomes non-uniform | heterogenous. As a result, it is presumed that a defective region having a locally thin film thickness occurs in the resin composition.

  Moreover, when making a mold and a resin composition contact, a resin composition flows. Due to the influence of such a flow, the mold is inclined so as to be recessed toward the resin composition side, or undulation is generated. And when such inclination and a wave | undulation arise, a pressure nonuniformity arises between a mold and a resin composition, a space | gap arises in the area | region where a pressure is low, and the film thickness of a resin composition becomes non-uniform | heterogenous. As a result, it is presumed that a defective region having a locally thin film thickness occurs in the resin composition.

  When such a defective region occurs, not only a defect occurs in the resin composition, but also a formed product formed thereafter may have a defect. For example, the resin composition is an etching resist (hereinafter referred to as a resist) for forming a mask, and when the above-described defect region is formed in the resist, the formed product after etching the resist Also defects can occur. Specifically, for example, when a defect region such as that described above occurs in the manufacture of a wire grid polarizer by roller imprinting, defects may also occur in the wire grid polarizer formed after etching. There is a risk of quality degradation.

  The present invention has been made in consideration of the above circumstances, and its purpose is to form a defect region on a molding material that is in contact with a pattern region of an imprint mold by deformation due to the flexibility of the mold. It is an object of the present invention to provide an imprint mold and an imprint method that can prevent the occurrence of the above.

  The present invention is an imprint mold having a first pattern region and a second pattern region that are adjacent to each other and having flexibility as a whole, and a first pattern portion that forms the first pattern region; A second pattern portion that forms the second pattern region, and an uneven shape is formed in each of the first pattern region and the second pattern region, and the uneven shape of the second pattern region is a dummy pattern The imprint mold is characterized in that the first pattern portion and the second pattern portion have the same height.

Each of the concavo-convex shape of the first pattern region and the concavo-convex shape of the second pattern region may be formed by a line and space pattern.
In this case, the direction in which the concavo-convex recesses and projections in the first pattern region are aligned and the direction in which the concavo-convex recesses and projections in the second pattern region are aligned may be the same.
Furthermore, the concavo-convex shape of the second pattern region includes a plurality of concavo-convex shapes having different pitches, and the concavo-convex shape of the second pattern region has the pitch in the direction in which the concave portion and the convex portion are arranged. It may be formed so as to increase as the distance from the first pattern region increases.
In this case, it is preferable that the concave / convex shape duty ratio of the first pattern region and the concave / convex shape duty ratio of the second pattern region are the same.
Moreover, it is preferable that the pitch of the uneven shape of the second pattern region is larger than the pitch of the uneven shape of the first pattern region.
In this case, it is preferable that the concavo-convex shape pitch of the second pattern region is 10 to 20 times the concavo-convex shape pitch of the first pattern region.

On the other hand, the total width of the concave portions and the convex portions arranged in the first direction is defined as the first direction pitch, and the total width of the concave portions and the convex portions arranged in the second direction orthogonal to the first direction is defined as the second width. A plan pitch in a rectangle defined by a pair of opposing sides having the same length as the first direction pitch and a pair of opposing sides having the same length as the second direction pitch. In the dot pattern in which the ratio of the convex portion is a duty ratio, and the concave portion and the convex portion are arranged by setting a predetermined value in each of the first direction pitch, the second direction pitch, and the duty ratio, Each of the concavo-convex shape of the first pattern region and the concavo-convex shape of the second pattern region may be formed.
In this case, the concavo-convex shape of the second pattern region includes a plurality of types of concavo-convex shapes having different first direction pitches and second direction pitches, and the concavo-convex shape of the second pattern region is the first concavo-convex shape. The direction pitch and the second direction pitch may be formed to increase as the distance from the first pattern region increases.
Also, the duty ratio of the concavo-convex shape of the first pattern region and the duty ratio of the concavo-convex shape of the second pattern region may be the same.
Further, the ratio of the first direction pitch and the second direction pitch of the concavo-convex shape of the first pattern region is the same as the ratio of the first direction pitch and the second direction pitch of the concavo-convex shape of the second pattern region. There may be.
In addition, the first direction pitch and the second direction pitch of the uneven shape of the second pattern region may be larger than the horizontal pitch and the vertical pitch of the uneven shape of the first pattern region.

  In the imprint mold, the concave / convex shape duty ratio of the first pattern region and the concave / convex shape duty ratio of the second pattern region are the same, and the concave / convex shape of the first pattern region is the same. And an uneven pattern of the second pattern region may be formed in a different arrangement pattern.

Further, the bending rigidity of the imprint mold may be 0.35 Nm ² or less as a whole. The imprint mold may be a mold used for roller transfer type imprint.

The present invention also provides:
A preparation step for preparing the imprint mold;
The first pattern region and the second pattern region of the imprint mold are transferred by pressing with a roller from the surface opposite to the surface on which the first pattern region and the second pattern region are provided. A contact step of contacting a molding material located on one side of the substrate;
A curing step in which the molding material brought into contact with the imprint mold is cured to form a transfer layer to which a pattern corresponding to the first pattern region and the second pattern region is transferred;
An imprinting method comprising: a releasing step of separating the transfer layer from the imprint mold to place the pattern structure as the transfer layer on the transfer substrate. .

  ADVANTAGE OF THE INVENTION According to this invention, it can prevent that a defect area | region arises in the to-be-molded material contacted with the pattern area | region of the mold for imprints by the deformation | transformation resulting from the flexibility of the said mold.

It is a top view of the mold for imprint concerning the 1st Embodiment of this invention. It is sectional drawing which follows the II-II line | wire of FIG. It is the top view to which the principal part of the mold for imprint of FIG. 1 was expanded. It is process drawing of the imprint method concerning 1st Embodiment. It is process drawing of the imprint method concerning 1st Embodiment. It is a fragmentary sectional view which follows the VI-VI line of FIG. It is a figure explaining the effect of 1st Embodiment. It is a figure explaining the mode of the imprint in the mold for imprint by a comparative example. It is a longitudinal cross-sectional view of the mold for imprint concerning the 2nd Embodiment of this invention. It is a top view of the principal part of the mold for imprint concerning 2nd Embodiment. It is a top view of the principal part of the mold for imprint concerning the 3rd Embodiment of this invention. It is a top view of the mold for imprint concerning the 4th Embodiment of this invention.

  Embodiments of the present invention will be described below with reference to the drawings. Drawing is an illustration and may exaggerate a characteristic part for explanation, and may differ from an actual thing. In the following drawings, the same parts are denoted by the same reference numerals.

  In addition, as used in this specification, the shape and geometric conditions and the degree thereof are specified, for example, terms such as “parallel”, “orthogonal”, “identical”, length and angle values, etc. are strictly Without being bound by meaning, it should be interpreted including the extent to which similar functions can be expected.

(First embodiment)
1 is a plan view of an imprint mold 11 according to a first embodiment of the present invention, FIG. 2 is a cross-sectional view taken along line II-II in FIG. 1, and FIG. It is the top view which expanded the principal part of the mold 11 for imprint in the area | region enclosed with the dashed-two dotted line shown by the code | symbol III of this. The imprint mold 11 has flexibility as a whole and is used for roller transfer imprint, that is, roller imprint. First, the imprint mold 11 according to the first embodiment will be described with reference to FIGS. 1 to 3.

[Imprint mold]
As shown in FIGS. 1 to 3, the imprint mold 11 according to the present embodiment is formed in a sheet shape, and is adjacent to each other on one surface of a pair of opposed surfaces. 12 and the second pattern region 13 are formed. In the example of FIG. 1, a rectangular area indicated by dots indicates the first pattern area 12, and a rectangular frame area surrounding the first pattern area 12 indicates the second pattern area 13. Show. In the present embodiment, as an example, the outlines of the first pattern area 12 and the second pattern area 13 are both formed in a rectangular shape, but they may be formed in other shapes.

  1 to 3, reference numeral 22 denotes a first pattern portion that forms the first pattern region 12 of the imprint mold 11, and reference numeral 23 denotes a second pattern of the imprint mold 11. The 2nd pattern part which forms the area | region 13 is shown. In the illustrated example, the first pattern portion 22 and the second pattern portion 23 are integrally formed from the same material.

  The imprint mold 11 may be formed with a single layer structure or a multilayer structure. For example, the imprint mold 11 includes a sheet-like base material formed from a resin composition such as PET (polyethylene terephthalate), and the first pattern region 12 and the second pattern region formed on one surface of the base material. 13 and a resin layer that forms 13. In this case, the 1st pattern part 22 and the 2nd pattern part 23 may each be comprised by 2 layer structure which consists of a part of base material and a part of resin layer.

  As shown in FIGS. 2 and 3, the first pattern region 12 and the second pattern region 13 are provided with uneven shapes 32 and 33, and the uneven shapes 32 and 33 of the present embodiment are formed as lines. It is formed in an and space pattern.

  Specifically, in the first pattern region 12, a recess 32A having a width W1 and extending in a line shape in a direction indicated by an arrow A, and a protrusion 32B having a width W2 and extending in a line shape in a direction indicated by an arrow A. The concave-convex shape 32 is formed by arranging the concave-convex pairs formed of and in the arrow B direction. On the other hand, the second pattern region 13 includes a recess 33A having a width W3 and extending in a line shape in the direction indicated by an arrow A, and a protrusion 33B having a width W4 and extending in a line shape in the direction indicated by an arrow A. The uneven | corrugated shape 33 comprised by arranging the uneven | corrugated pair comprised by in the arrow B direction is formed. As apparent from FIGS. 2 and 3, in the present embodiment, the direction in which the concave portions 32 </ b> A and the convex portions 32 </ b> B of the concave / convex shape 32 in the first pattern region 12 are aligned and the concave portion of the concave / convex shape 33 in the second pattern region 13. The direction in which 33A and the convex portion 33B are arranged is the same.

  In the example shown in the drawing, a concavo-convex shape 32 is formed over the entire first pattern region 12, and the first pattern region 12 includes a plurality of concavo-convex pairs composed of concave portions 32 </ b> A and convex portions 32 </ b> B. Each concave portion 32A and each convex portion 32B extend across both ends of the first pattern region 12 in the arrow A direction. On the other hand, an uneven shape 33 is also formed in the entire second pattern region 13. The second pattern region 13 also includes a plurality of concave / convex pairs composed of the concave portions 33A and the convex portions 33B.

  In the present embodiment, the concavo-convex shape 33 of the second pattern region 13 is formed so as to surround the entire outer peripheral portion of the first pattern region 12, but the concavo-convex shape 33 of the second pattern region 13 is The first pattern region 12 may be formed so as to partially surround the outer peripheral portion of the first pattern region 12 in a state adjacent to the first pattern region 12. For example, the concavo-convex shape 33 of the second pattern region may be formed only on one side of the first pattern region 12 in the B direction, or only on both sides of the first pattern region 12 in the B direction. The concavo-convex shape 33 may be formed, or other modes may be used.

  In the present embodiment, the uneven shape 32 of the first pattern region 12 and the uneven shape 33 of the second pattern region 13 are both formed materials 103 (positioned on one surface 101a of the transfer substrate 101 described later ( 4 and 5), the pattern is transferred to the molding material 103. Among these, the uneven shape 32 of the first pattern region 12 functions as a “main pattern”, and the uneven shape 33 of the second pattern region 13 functions as a “dummy pattern”.

  The “main pattern” as used in this embodiment refers to a base portion (resist pattern layer) for producing a pattern having a specific function on the molding material 103 or for producing a pattern having a specific function on the transfer substrate 101. And the like) means a portion where a pattern is transferred to the molding material 103 for the purpose of producing the molding material 103. On the other hand, the “dummy pattern” means a portion where the pattern is transferred to the molding material 103 without having the above-described purpose.

  Here, as shown in FIG. 2, in the present embodiment, the height H1 of the first pattern portion 22 forming the first pattern region 12 corresponding to the “main pattern” and the first corresponding to the “dummy pattern”. The height H2 of the second pattern portion 23 that forms the two pattern regions 13 is the same. Thereby, in this Embodiment, when the uneven | corrugated shape 32 of the 1st pattern area | region 12 and the uneven | corrugated shape 33 of the 2nd pattern area | region 13 are made to contact the molding material 103, uneven | corrugated shape 32 (especially convex part 32B) and The uneven shape 33 (particularly the convex portion 33B) can be brought into contact with the molding material 103 at the same timing.

  As described above, when the uneven shape 32 of the first pattern region 12 and the uneven shape 33 of the second pattern region 13 can be brought into contact with the molding material 103 at the same timing, the convex portion 32B of the uneven shape 32 is obtained. And the convex portion 33B of the concavo-convex shape 33 are similarly subjected to resistance from the molding material 103, and it is possible to suppress the occurrence of a difference in time until the molding material 103 reaches each of the concave portions 32A and 33A. it can. Thereby, the imprint mold 11 according to the present embodiment is prevented from tilting or undulating toward the molding material 103 starting from the boundary between the first pattern region 12 and the second pattern region 13 or the vicinity thereof. As a result, it is possible to suppress the generation of a defective region in the molding material 103.

  In the present embodiment, the concavo-convex shape 32 of the first pattern region 12 and the concavo-convex shape 33 of the second pattern region 13 are both formed in a line and space pattern, and the concavo-convex shape 32 of the first pattern region 12 is formed. The duty ratio of the concave / convex shape 33 of the second pattern region 13 is the same. In the case of a line and space pattern, the duty ratio of the uneven shape 32 of the first pattern region 12 is represented by “W2 / W1 + W2”, and the duty ratio of the uneven shape 33 of the second pattern region 13 is , “W4 / W3 + W4”.

  When the concavo-convex shape 32 of the first pattern region 12 and the concavo-convex shape 33 of the second pattern region 13 are brought into contact with the molding material 103, the molding material 103 in contact with the convex portion flows into the concave portion. Here, when the duty ratio of the concavo-convex shape 32 of the first pattern region 12 and the duty ratio of the concavo-convex shape 33 of the second pattern region 13 are the same, the first pattern region 12 With each of the uneven shape 32 and the uneven shape 33 of the second pattern region 13, the flow of the molding material 103 in contact with the convex portion can be made uniform or approximated. Thereby, the resistance received by the convex portion 32B of the concave / convex shape 32 from the molding material 103 and the resistance received by the convex portion 33B of the concave / convex shape 33 from the molding material 103 can be made uniform. For this reason, in the present embodiment, the imprint mold 11 is effectively prevented from being inclined or wavy.

  In the present embodiment, the pitch P2 of the uneven shape 33 of the second pattern region 13 is larger than the pitch P1 of the uneven shape 32 of the first pattern region 12. The pitch P1 of the concave / convex shape 32 of the first pattern region 12 is represented by “W1 + W2”, and the pitch P2 of the concave / convex shape 33 of the second pattern region 13 is represented by “W3 + W4”.

  The pitch P2 of the concavo-convex shape 33 of the second pattern region 13 is preferably 10 to 100 times, more preferably 10 to 20 times the pitch P1 of the concavo-convex shape 32 of the first pattern region 12. The pitch P2 may be less than 10 times the pitch P1 (in the case of being smaller than the pitch P1, including the case of being equal to the pitch P1), but in this case, the boundary between the uneven shape 33 and the uneven shape 32 is visually recognized. It becomes difficult to do. When the pitch P2 is 10 times or more the pitch P1, the boundary between the uneven shape 33 and the uneven shape 32 can be easily visually recognized, so that the handleability is improved. Therefore, the pitch P2 is preferably 10 times or more the pitch P1.

  On the other hand, the pitch P2 may be larger than 100 times the pitch P1, but in this case, the width of the concave portion 33A of the concavo-convex shape 33 becomes too large, and there is a possibility that deformation is likely to occur. Therefore, the pitch P2 is preferably 100 times or less of the pitch P1. If importance is attached to suppressing deformation as much as possible, the pitch P2 is more preferably 20 times or less of the pitch P1.

Moreover, such an imprint mold 11 has flexibility that can be used for roller imprinting. Specifically, the bending rigidity thereof is preferably 0.35 Nm ² or less as a whole. Further, the bending rigidity is more preferably and 0.0055Nm ² more than 0.35 nm ² or less. This is because if the bending rigidity of the imprint mold 11 is less than 0.0055 Nm ² , the imprint mold 11 is easily bent easily and the handling property is not good. The imprint mold 11 is bent by a roller at the time of roller imprinting, and at least the bending rigidity in the direction of bending by the roller is preferably 0.35 Nm ² or less as a whole.

  Moreover, in this Embodiment, since a photocurable resin composition is used for the to-be-molded material 103 mentioned later in roller imprint, it has the light transmittance which can permeate | transmit light, for example, an ultraviolet-ray, etc. as the mold 11 for imprint. It is preferred that the material be selected. In addition, the above-mentioned light transmittance means that the light transmittance in the wavelength 200-400 nm is 50% or more, Preferably it is 70% or more. The light transmittance can be measured using V-650 manufactured by JASCO Corporation. In addition, when using a thermosetting resin composition as the molding material 103 in the roller imprint, light transmittance is not particularly required. As an example, the imprint mold 11 can be composed of a transparent base material made of polyethylene terephthalate (PET) having excellent optical characteristics and a resin layer provided on the transparent base material to form the pattern regions 12 and 13. In this case, as the transparent substrate, other flexible resin materials such as transparent resin film and thin glass can be used as long as they have flexibility. Moreover, when light transmittance is not requested | required, flexible materials, such as a colored resin film and a colored thin plate glass, can also be used.

  In the imprint mold 11 described above, the height H1 of the first pattern portion 22 and the height H2 of the second pattern portion 23 are the same, so that the first pattern region 12 and the second pattern The imprint mold 11 can be prevented from tilting or undulating toward the molding material 103 starting from the boundary with the region 13 or the vicinity thereof, and as a result, the generation of a defective region in the molding material 103 can be suppressed. . Such an imprint mold 11 is useful when used in normal imprinting performed close to and away from the imprint mold 11 or in roller imprinting, but is particularly useful when used in roller imprinting. is there. Hereinafter, roller imprinting using the imprint mold 11 will be described.

[Imprint method]
The imprint method using the imprint mold 11 described above, that is, the roller imprint will be described below. In the present embodiment, optical roller imprint using a photocurable resin composition as a molding material in roller imprint will be described.

  In the imprint method of the present embodiment, as a general rule, the above-described imprint mold 11 is used, and the back surface of the imprint mold 11 (the surface on which the first pattern region 12 and the second pattern region 13 are not formed). ), The imprint mold 11 is brought into contact with the molding material 103 (see FIGS. 4 and 5), and the molding material 103 is cured after the contact, and then the cured transfer layer 104 (see FIG. 4). 4 and FIG. 5) and the imprint mold 11 are released. 4 and 5 are process diagrams for explaining the imprint method of the present embodiment. FIG. 6 is a cross-sectional view taken along line VI-VI of the transfer substrate shown in FIG. Hereinafter, each process is explained in full detail.

<Preparation process>
In this embodiment, first, the imprint mold 11 shown in FIGS. 1 to 3 is prepared. Further, a transfer substrate 101 shown in FIG. 4A is prepared. In the transfer substrate 101, an etching target layer 102 is provided on one surface 101 a, and a molding material 103 is positioned on the etching target layer 102.

  The transfer substrate 101 used here can be selected as appropriate, for example, glass such as quartz, soda lime glass, borosilicate glass, semiconductor such as silicon, gallium arsenide, gallium nitride, resin such as polycarbonate, polypropylene, polyethylene, etc. A substrate, a metal substrate, or a composite substrate made of any combination of these materials can be used. Further, for example, a desired pattern structure such as a fine wiring used in a semiconductor or a display, a photonic crystal structure, an optical waveguide, or an optical structure such as holography may be formed. The etched layer 102 may be a thin film made of a material required as a pattern material formed on the transfer substrate 101. For example, an inorganic thin film, an organic thin film, an organic-inorganic composite thin film, or the like can be selected as appropriate. it can. In addition, although the shape of the transfer substrate 101 is a flat plate shape in the illustrated example, for example, it may be a mesa structure having a convex structure plane portion protruding from the periphery on one surface 101a.

  Further, the molding material 103 is formed by using a desired resin composition, for example, a photocurable resin composition, a thermosetting resin composition, etc., using a spin coating method, a dispense coating method, a dip coating method, a spray coating method, It can be formed by a known coating means such as an ink jet method. In the present embodiment, since the optical roller imprint using the photocurable resin composition is performed as the molding material 103, the molding material 103 is a photocurable resin composition. The thickness of the molding material 103 is the height of the convex portion, the depth of the concave portion in each of the concave and convex shape 32 of the first pattern region 12 and the concave and convex shape 33 of the second pattern region of the imprint mold 11 to be used. And it can be set in consideration of the allowable range of the thickness of the remaining film (site located between the convex portions) generated in the pattern structure to be formed. Note that the thickness of the remaining film is preferably less than 100 nm, and more preferably less than 20 nm.

<Contact process>
Next, in the contact step, by pressing the imprint mold 11 with a roller 151 from the surface where the first pattern area 12 and the second pattern area 13 of the flexible imprint mold 11 are not formed, The first pattern region 12 and the second pattern region 13 of the imprint mold 11 are brought into contact with the molding material 103 (FIGS. 4B and 5A).

  As shown in FIGS. 4 (B) and 5 (A), when the first pattern region 12 and the second pattern region 13 of the imprint mold 11 are brought into contact with the molding material 103 by the pressure of the roller 151, the transfer is performed. The substrate 101 is conveyed in the direction of arrow a shown in FIG. 4B, and the roller 151 is rotated in the direction of arrow b shown in FIG. 103 is moved at the same speed so that no deviation occurs between them. And in this contact process, in each concavo-convex shape of the first pattern region 12 and the second pattern region 13 of the imprint mold 11, the concave portion and the convex portion are in a direction indicated by an arrow A (see FIG. 3 etc.) extending in a line shape. Then, the imprint mold 11 is brought into contact with the molding material 103. Thereby, deformation of each uneven shape of the first pattern region 12 and the second pattern region 13 of the imprint mold 11 can be prevented.

  Further, the pressure applied by the roller 151 can be appropriately set within a range in which each uneven shape of the first pattern region 12 and the second pattern region 13 of the imprint mold 11 can be completely embedded in the molding material 103. . Therefore, for example, the distance from the stage (not shown) that conveys the transfer substrate 101 to the roller 151 is fixed to a desired value, and the transfer substrate 101 and the imprint mold 11 pass between the stage and the roller 151. Thus, when the unevenness of the first pattern region 12 and the second pattern region 13 of the imprint mold 11 is completely embedded in the molding material 103, the roller 151 is urged toward the transfer substrate 101 to apply pressure. There is no need to press.

<Curing process>
Next, by curing the molding material 103 that is in contact with the imprint mold 11, patterns corresponding to the uneven shapes of the first pattern region 12 and the second pattern region 13 of the imprint mold 11 are transferred. The transferred layer 104 is obtained. In the example shown in FIG. 4B and FIG. 5A, light is irradiated from the light irradiation device 161 through the imprint mold 11 immediately after contact with the imprint mold 11, thereby Although the molding material 103 is cured to form the transfer layer 104, the molding material 103 may be cured after the contact between the imprint mold 11 and the molding material 103 is completed to form the transfer layer 104. In addition, when the transfer substrate 101 is light transmissive, a light irradiation device 161 is provided on the back side of the transfer substrate 101, and the transfer substrate 101 can be applied to the molding material 103 that has completed contact with the imprint mold 11. Light may be irradiated from the light irradiation device 161 via 101 to cure the molding material 103. Further, the light irradiation from the light irradiation device 161 via the imprint mold 11 and the light irradiation from the light irradiation device 161 via the transfer substrate 101 are used together to complete the contact with the imprint mold 11. The molding material 103 may be cured.

<Mold release process>
Next, by separating the transfer layer 104 and the imprint mold 11 from each other, the pattern structure as the transfer layer 104 is placed on the transfer substrate 101 (FIGS. 4C and 5B). ). As shown in FIG. 6, the transfer layer 104 formed in this way has a first pattern portion 115 and a first pattern portion 115 in which the concavo-convex shapes of the first pattern region 12 and the second pattern region 13 of the imprint mold 11 are reversed. Two pattern portions 116 are provided. A line and space pattern having a different pitch is transferred to each of the pattern portions 115 and 116.

  The direction of separation between the transfer layer 104 and the imprint mold 11 is the concave and convex portions of the concave and convex shapes of the first pattern region 12 and the second pattern region 13 of the imprint mold 11 as in the above-described contact process. Preferably, the line direction is Thereby, generation | occurrence | production of the pattern defect by deformation | transformation and damage of each pattern part 115,116 of the transfer layer 104 can be prevented.

  The transfer layer 104 and the imprint mold 11 can be separated after the contact of the imprint mold 11 with the molding material 103 and the formation of the transfer layer 104 by curing of the molding material 103 are completed. Further, before the contact of the imprint mold 11 with the molding material 103 is completed, the imprinting material 103 is imprinted from the transfer layer 104 formed by curing the molding material 103 that is already in contact with the imprint mold 11. The mold 11 may be separated as appropriate. Further, after the transfer layer 104 and the imprint mold 11 are separated from each other, additional exposure may be performed to completely cure the transfer layer 104.

  After that, the remaining film is removed from each of the pattern portions 115 and 116 of the pattern structure 104 which is the transfer layer 104 formed as described above, and then the etched layer 102 is formed using the pattern structure 104 as a mask. A desired pattern can be formed on the transfer substrate 101 by etching. In addition, a concavo-convex structure can be formed on the transfer substrate 101 by etching the transfer substrate 101 using the pattern thus formed as a mask.

  In the present embodiment described above, in the imprint mold 11, the height H1 of the first pattern portion 22 and the height H2 of the second pattern portion 23 are the same, so that the first pattern The imprint mold 11 is prevented from tilting or undulating toward the molding material 103 starting from the boundary between the region 12 and the second pattern region 13 or the vicinity thereof, and as a result, a defective region is generated in the molding material 103. Can be suppressed. This will be described in detail below.

  FIG. 7 is a diagram for explaining the effects of the first embodiment. That is, in imprinting using the imprint mold 11, the imprint mold 11 is brought into contact with the molding material 103 as shown in FIG. 7B from the state shown in FIG. The imprint mold 11 is pressed toward the molding material 103 so that the concave / convex shape 32 of the pattern region 12 and the concave / convex shape 33 of the second pattern region 13 are embedded in the molding material 103. At this time, as shown in FIG. 7B, the uneven shape 32 of the first pattern region 12 and the uneven shape 33 of the second pattern region 13 can be brought into contact with the molding material 103 at the same timing. In the subsequent embedding operation, as shown in FIG. 7C, the protrusions 32 </ b> B having the concavo-convex shape 32 and the protrusions 33 </ b> B having the concavo-convex shape 33 similarly receive resistance from the molding material 103. Thereby, as shown to FIG. 7 (D), it can suppress that a difference arises in the time until it reaches the to-be-molded material 103 to each of each recessed part 32A, 33A. As a result, the imprint mold 11 of the present embodiment is prevented from tilting or undulating toward the molding material 103 starting from the boundary between the first pattern region 12 and the second pattern region 13 or the vicinity thereof. . Further, in the present embodiment, since the second pattern region 13 has the concavo-convex shape 33, the moment that the molding material 103 in contact with the convex portion 33B flows into the concave portion 33A is alleviated. The imprint mold 11 is also prevented from tilting or undulating due to the flow of the material 103. As a result, as shown in FIG. 7E, it is possible to suppress the generation of a defective region in the molding material 103.

  On the other hand, FIG. 8 is a diagram for explaining a state of imprinting in an imprint mold 1000 in which the concave and convex shapes are not provided in the second pattern region as a comparative example. In the imprint mold 1000 according to the comparative example, when the mold and the molding material are brought into contact with each other, as shown in FIG. 8A, the concavo-convex convex portion of the mold receives resistance from the molding material. As a result, in the concavo-convex shape, it takes time until the molding material reaches the concave portion, but on the flat surface located in the outer peripheral portion of the concavo-convex shape, there is no resistance, so it takes time to contact the molding material. It does not take. Due to this time difference, as shown in FIG. 8B, the flat surface can be inclined or swelled toward the material to be molded starting from the boundary with the concavo-convex shape. As a result, a defect region having a locally thin film thickness may occur in the molding material.

  Moreover, in this Embodiment, the duty ratio of the uneven | corrugated shape 32 of the 1st pattern area | region 12 and the duty ratio of the uneven | corrugated shape 33 of the 2nd pattern area | region 13 are mutually the same, The unevenness shape 32 of the first pattern region 12 and the unevenness shape 33 of the second pattern region 13 can make the flow of the molding material 103 in contact with the protrusions uniform or approximate. Thereby, the resistance received by the convex part 32B of the concave / convex shape 32 from the molding material 103 and the resistance received by the convex part 33B of the concave / convex shape 33 from the molding material 103 can be made uniform. 11 can be effectively suppressed from tilting or undulating. As a result, it can suppress more effectively that a defect area | region arises in the to-be-molded material 103. FIG.

  In the present embodiment, the pitch P2 of the concavo-convex shape 33 of the second pattern region 13 is larger than the pitch P1 of the concavo-convex shape 32 of the first pattern region 12, and is 10 to 20 times the pitch P1. . Thereby, since the boundary between the uneven shape 33 and the uneven shape 32 can be easily visually recognized, the handleability of the imprint mold 11 can be improved. Moreover, the deformation | transformation resulting from the flexibility of the imprint mold 11 can be effectively suppressed by not making the pitch P2 extremely large with respect to the pitch P1.

(Second Embodiment)
Next, a second embodiment of the present invention will be described. FIG. 9 is a longitudinal cross-sectional view of an imprint mold 51 according to the second embodiment, and FIG. 10 is a plan view of a main part of the imprint mold 51. Of the components of the present embodiment, the same components as those of the first embodiment are denoted by the same reference numerals, and a part of the description is omitted.

  As shown in FIGS. 9 and 10, in the imprint mold 51 according to the second embodiment of the present invention, the uneven shape 33 of the second pattern region 13 has different pitches P21, P22, P23. A plurality of uneven shapes 331, 332, 333... Are included. And as for the uneven | corrugated shape 33 (uneven | corrugated shape 331,332,332 ...) of the 2nd pattern area | region 13, the distance from the 1st pattern area | region 12 becomes long in the pitch in the direction where a recessed part and a convex part are located in a line. It is formed to be large. That is, the pitch P22 of the uneven shape 332 is larger than the pitch P21 of the uneven shape 331, and the pitch P23 of the uneven shape 333 is larger than the pitch P22 of the uneven shape 332. In the illustrated example, only one pair of concave and convex portions is formed in each of the concave and convex shapes 331, 332, and 333, but a plurality of pairs of concave and convex portions are formed in each of the concave and convex shapes 331, 332, and 333. May be formed.

  Also in the present embodiment, as in the first embodiment described above, the duty ratio of each of the uneven shapes 331, 332, 332... In the second pattern region 13 is the unevenness of the first pattern region 12. The duty ratio of the shape 32 is the same. Further, as shown in the figure, the pitches P21, P22, P23,... Of each uneven shape 331, 332, 332,... In the second pattern region 13 are larger than the pitch P1 of the uneven shape 32 in the first pattern region 12. It is getting bigger.

  In the second embodiment as described above, the same operational effects as those of the first embodiment described above can be obtained. Moreover, in this Embodiment, the pitch of the uneven | corrugated shape 33 (irregular shape 331,332,332 ...) of the 2nd pattern area | region 13 is the distance from the 1st pattern area | region 12 in the direction where a recessed part and a convex part are located in a line. By increasing the distance as the distance increases, it is possible to form a region where a fine pattern is not formed on the outer peripheral side, thereby improving the handleability. In addition, the larger the pitch, the easier the production of the uneven shape, so that the production efficiency of the mold with the dummy pattern can be improved.

(Third embodiment)
Next, a third embodiment of the present invention will be described. FIG. 11 is a plan view of a main part of an imprint mold 61 according to the third embodiment of the present invention. Of the constituent parts of the present embodiment, the same parts as those of the first and second embodiments are denoted by the same reference numerals, and a part of the description is omitted.

  In the present embodiment, for convenience of explanation, the A direction in the figure of the imprint mold 61 is referred to as a “first direction”, and the B direction in the figure is referred to as a “second direction”.

  As shown in FIG. 11, in the present embodiment, the total width of the concave portions and the convex portions arranged in the first direction (A direction) is defined as a first direction pitch, and a second direction orthogonal to the first direction ( The total width of the concave and convex portions arranged in the (B direction) is defined as the second direction pitch, and a pair of opposing sides having the same length as the first direction pitch and the same length as the second direction pitch. The ratio of convex portions in plan view in a rectangle defined by a pair of opposing sides is a duty ratio, and each of the first direction pitch, the second direction pitch, and the duty ratio has a predetermined value. In the dot pattern in which the concave and convex portions are arranged by setting the concave and convex shapes 32 of the first pattern region 12 and the concave and convex shapes 33 of the second pattern region 13 are formed.

  Specifically, the concave / convex shape 32 of the first pattern region 12 includes a plurality of pairs of concave portions 632A1 and convex portions 632B arranged in the first direction (A direction) and the concave portions 632A2 and convex portions in the second direction (B direction). A plurality of pairs with 632B are arranged. The first direction pitch of the concavo-convex shape 32 is the total width in the first direction of the concave portion 632A1 and the convex portion 632B, and is indicated by P11 in the drawing, and the second direction pitch is the concave portion 632A2 and the convex portion 632B. The total width in the second direction is indicated by P12 in the figure.

  The duty ratio of the concavo-convex shape 32 is defined by the ratio of the convex portion 632B in the unit rectangle defined by the pair of sides having a length of P11 and the pair of sides having a length of P12. In this example, the shape of the projection 632B in the concavo-convex shape 32 in a plan view is a rectangle, and all have the same size. Further, the positions of the convex portions 632B in the unit rectangle are all the same. Therefore, it can be said that the uneven shape 32 is configured by repeatedly arranging unit rectangles including the convex portion 632B.

  On the other hand, in the illustrated example, the uneven shape 33 of the second pattern region 13 includes a plurality of types of uneven shapes having different first direction pitches and second direction pitches. 33 is formed so that the first direction pitch and the second direction pitch increase as the distance from the first pattern region 12 increases. In this example, all the first direction pitches of the plurality of uneven shapes included in the uneven shape 33 of the second pattern region 13 are larger than the first direction pitch P11 of the uneven shape 32 of the first pattern region 12, All the second direction pitches of the plurality of uneven shapes included in the uneven shape 33 of the second pattern region 13 are larger than the second direction pitch P12 of the uneven shape 32 of the first pattern region 12.

  Specifically, in the illustrated uneven shape 33, the uneven shape 331 ′ of the dot pattern formed on the outer peripheral portion of the first pattern region 12 closest to the first pattern region 12 and having the first direction pitch P13 and the second direction pitch P14. And the concavo-convex shape 332 ′ of the dot pattern formed on the outer peripheral portion of the concavo-convex shape 331 ′ and having the first direction pitch P15 and the second direction pitch P16, and the first directional pitch P17 and the outer peripheral portion of the concavo-convex shape 332 ′. An uneven shape 333 ′ of a dot pattern having a second direction pitch 18 is included. As is clear from the figure, the relationship is P11 <P13 <P15 <P17, and the relationship is P12 <P14 <P16 <P18.

  In the present embodiment, the duty ratio of the concavo-convex shape 32 of the first pattern region 12 is equal to the duty ratio of each of the concavo-convex shape 331 ′, the concavo-convex shape 332 ′, and the concavo-convex shape 333 ′ of the second pattern region 13. It is the same as the tee ratio. Further, the ratio of the first direction pitch P11 and the second direction pitch P12 of the concave / convex shape 32 of the first pattern region 12 is also the same as the concave / convex shape 331 ′, the concave / convex shape 332 ′, and the concave / convex shape 333 ′ of the second pattern region 13. The ratio between the first direction pitch and the second direction pitch is the same.

  Also in this embodiment, the uneven shape 32 of the first pattern region 12 functions as a “main pattern”, and the uneven shape 33 of the second pattern region 13 functions as a “dummy pattern”. Yes. The height of the first pattern portion 22 that forms the first pattern region 12 and the height of the second pattern portion 23 that forms the second pattern region 13 are the same.

  In the third embodiment as described above, the same function and effect as those of the first embodiment described above can be obtained.

(Fourth embodiment)
Next, a fourth embodiment of the present invention will be described. FIG. 12 is a plan view of a main part of an imprint mold 71 according to the fourth embodiment of the present invention. Of the constituent parts of the present embodiment, the same parts as those of the first, second and third embodiments are denoted by the same reference numerals, and a part of the description is omitted.

  As shown in FIG. 12, in the imprint mold 71 of the present embodiment, a plurality of first pattern regions 12 and a plurality of second pattern regions 13 adjacent to the plurality of first pattern regions 12 are formed. ing. In the example of FIG. 1, a rectangular area or the like indicated by dots indicates the first pattern area 12, and a rectangular frame-like area or the like surrounding the first pattern area 12 is the second pattern area. 13 is shown.

  Also in the present embodiment, the uneven shape 12 of the plurality of first pattern regions 12 functions as a “main pattern”, and the uneven shape 33 of the plurality of second pattern regions 13 functions as a “dummy pattern”. It has become. The height of the first pattern portion 22 that forms the first pattern region 12 and the height of the second pattern portion 23 that forms the second pattern region 13 are the same.

  The uneven shape 32 formed in the first pattern region 12 and the uneven shape 33 formed in the second pattern region may be formed by line and space or may be formed by a dot pattern. Good.

  In the fourth embodiment as described above, the same function and effect as those of the first embodiment described above can be obtained. In addition, since the plurality of first pattern regions 12 are provided, a pattern structure having a plurality of patterns can be obtained by one imprint, and productivity can be improved.

11, 51, 61, 71 Imprint mold 12 First pattern region 13 Second pattern region 22 First pattern portion 23 Second pattern portion 32 Concave shape 32A Concave portion 32B Convex portion 33 Concave shape 33A Concave portion 33B Convex portions 331, 331 'Uneven shape 332, 332' Uneven shape 333,333 'Uneven shape 101 Transfer substrate 101a One surface 102 Etched layer 103 Molded material 104 Transfer layer 115 First pattern portion 116 Second pattern portion 151 Roller 161 Light irradiation device 632A1 Concave part 632A2 Concave part 632B Convex part

Claims (16)

A first pattern region and a second pattern region which are adjacent to each other are formed, and an imprint mold having flexibility as a whole,
A first pattern portion that forms the first pattern region; and a second pattern portion that forms the second pattern region;
An uneven shape is formed in each of the first pattern region and the second pattern region,
The uneven shape of the second pattern region functions as a dummy pattern,
The height of the first pattern portion and the height of the second pattern portion are the same.
An imprint mold characterized by the above. Each of the concavo-convex shape of the first pattern region and the concavo-convex shape of the second pattern region is formed by a line and space pattern,
The imprint mold according to claim 1, wherein the mold is an imprint mold. The direction in which the concavo-convex recesses and projections in the first pattern region are aligned is the same as the direction in which the concavo-convex recesses and projections in the second pattern region are aligned.
The imprint mold according to claim 2, wherein the mold is an imprint mold. The uneven shape of the second pattern region includes a plurality of uneven shapes with different pitches,
The concavo-convex shape of the second pattern region is formed such that the pitch increases as the distance from the first pattern region increases in the direction in which the concave portion and the convex portion are arranged. The imprint mold according to claim 3. The concave / convex shape duty ratio of the first pattern region and the concave / convex shape duty ratio of the second pattern region are the same.
The imprint mold according to any one of claims 2 to 4, wherein the mold is an imprint mold. The uneven pattern pitch of the second pattern region is larger than the uneven pattern pitch of the first pattern region,
The imprint mold according to claim 2, wherein the mold is an imprint mold. The pitch of the concavo-convex shape of the second pattern region is 10 to 20 times the pitch of the concavo-convex shape of the first pattern region.
The imprint mold according to claim 6. The total width of the recesses and projections arranged in the first direction is defined as a first direction pitch, and the total width of the recesses and projections arranged in a second direction orthogonal to the first direction is defined as a second direction pitch. The projections in plan view in a rectangle defined by a pair of opposing sides having the same length as the first direction pitch and a pair of opposing sides having the same length as the second direction pitch The first pattern is a dot pattern in which concave portions and convex portions are arranged by setting a predetermined value for each of the first direction pitch, the second direction pitch, and the duty ratio. Each of the concavo-convex shape of the pattern region and the concavo-convex shape of the second pattern region is formed,
The imprint mold according to claim 1, wherein the mold is an imprint mold. The uneven shape of the second pattern region includes a plurality of types of uneven shapes having different first direction pitches and second direction pitches,
The concavo-convex shape of the second pattern region is formed such that the first direction pitch and the second direction pitch increase as the distance from the first pattern region increases. Item 9. The imprint mold according to Item 8. The concave / convex shape duty ratio of the first pattern region and the concave / convex shape duty ratio of the second pattern region are the same.
The mold for imprinting according to claim 8 or 9, characterized by the above-mentioned. The ratio of the first direction pitch and the second direction pitch of the concavo-convex shape of the first pattern region is the same as the ratio of the first direction pitch and the second direction pitch of the concavo-convex shape of the second pattern region,
The imprint mold according to claim 8, wherein the mold is an imprint mold. The first direction pitch and the second direction pitch of the concavo-convex shape of the second pattern region are larger than the first direction pitch and the second direction pitch of the concavo-convex shape of the first pattern region,
The imprint mold according to claim 8, wherein the mold is an imprint mold. The concave / convex shape duty ratio of the first pattern region and the concave / convex shape duty ratio of the second pattern region are the same.
The imprint mold according to claim 1, wherein the mold is an imprint mold. The imprint mold according to any one of claims 1 to 13, wherein the bending rigidity of the imprint mold is 0.35 Nm ² or less as a whole. The imprint mold is a mold used for roller transfer imprint.
The imprint mold according to claim 1, wherein the mold is an imprint mold. In the imprint method,
A preparation step of preparing the imprint mold according to any one of claims 1 to 15,
The first pattern region and the second pattern region of the imprint mold are transferred by pressing with a roller from the surface opposite to the surface on which the first pattern region and the second pattern region are provided. A contact step of contacting a molding material located on one side of the substrate;
A curing step in which the molding material brought into contact with the imprint mold is cured to form a transfer layer to which a pattern corresponding to the first pattern region and the second pattern region is transferred;
An imprinting method comprising: a releasing step of separating the transfer layer from the imprint mold to place the pattern structure as the transfer layer on the transfer substrate. .

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