JP6478682B2 - Manufacturing method of surface covering member, pretreatment method of member surface, processed member and surface covering member - Google Patents

Description

  The present invention relates to a manufacturing method for manufacturing a surface covering member having at least a part of a surface coated with a hard film. The present invention also relates to a pretreatment method for a member surface and a treated member treated by the pretreatment method. The present invention also relates to a surface covering member having at least a part of the surface coated with a hard film.

  In recent years, in various fields such as transportation equipment parts such as automobiles, product processing tools, and household equipment parts, the surface of the member is coated with a hard film such as diamond-like carbon or chromium nitride to reduce the friction coefficient, It has been proposed to improve wearability.

  Regarding the coating of such a hard film, for example, Patent Documents 1 and 2 disclose that a diamond-like carbon film is coated by performing a predetermined roughening treatment on the surface of a base material.

JP 2004-84014 A JP 2012-41589 A

  In addition to the characteristics of the hard film itself (friction characteristics, corrosion resistance, etc.), the hard film as described above has good adhesion to the member from the viewpoint of preventing peeling from the member and obtaining a long life. It is required to have excellent wear resistance.

  One of the objects of the present invention is to provide a surface covering member that is excellent in wear resistance and in which peeling of a hard film is sufficiently suppressed, and a method for producing the same. Another object of the present invention is to provide a member surface pretreatment method for forming a surface covering member excellent in wear resistance, and a treated member treated by the pretreatment method. .

  One aspect of the present invention relates to a method for manufacturing a surface covering member, which manufactures a surface covering member having at least a part of the surface coated with a hard film. The manufacturing method includes a polishing step of polishing at least a part of a member surface with a polishing film to form a polishing surface, and a coating step of coating the hard film on the polishing surface. The polishing film includes a base material and a polishing portion having a plurality of molded structures protruding on the base material, and the polishing portion includes abrasive particles having an average particle size of 0.3 μm or more and 10 μm or less.

  Another aspect of the present invention relates to a pretreatment method for a surface of a member coated with a hard film. The pretreatment method includes a polishing step of polishing the surface of the member with a polishing film to form a polishing surface. In the pretreatment method, the polishing film includes a base material and a plurality of protrusions protruding on the base material. A polishing portion having a molding structure, and the polishing portion includes abrasive particles having an average particle size of 0.3 μm or more and 10 μm or less.

  Yet another aspect of the present invention relates to a treated member having a surface treated by the pretreatment method. Still another aspect of the present invention relates to a surface covering member obtained by coating the treated member with a hard film.

  ADVANTAGE OF THE INVENTION According to this invention, it is excellent in abrasion resistance, and the surface coating member by which peeling of the hard film was fully suppressed, and its manufacturing method are provided. Moreover, according to this invention, the pre-processing method of the member surface for forming the surface coating member excellent in abrasion resistance, and the processed member processed by the said pre-processing method are provided.

It is a section perspective view showing one mode of an abrasive film. It is a top view which shows typically the example of arrangement | positioning of the shaping | molding structure of an abrasive film. It is process drawing which shows an example of the manufacturing method of an abrasive film typically. It is a schematic diagram which shows an example of the grinding | polishing method of the member surface by an abrasive film.

  A preferred embodiment of the present invention will be described below.

  The surface covering member according to the present embodiment is a member in which at least a part of the surface is coated with a hard film. Further, the method of manufacturing the surface covering member according to the present embodiment includes a polishing step of polishing at least a part of the member surface with a polishing film to form a polishing surface, a coating step of coating the polishing surface with a hard film, including.

  In this embodiment, the polishing film includes a base material and a polishing portion having a plurality of molded structures protruding on the base material, and the polishing portion has an average particle size of 0.3 μm or more and 10 μm or less. It contains abrasive particles. In addition, in this specification, the average particle diameter of abrasive particles indicates the median diameter measured using a laser diffraction / scattering particle size distribution analyzer LA-920 (manufactured by Horiba, Ltd. (Kyoto, Kyoto)). .

  According to the manufacturing method according to the present embodiment, it is possible to manufacture a surface covering member that is excellent in wear resistance and in which peeling of the hard film is sufficiently suppressed.

  In the manufacturing method according to the present embodiment, it is considered that a rough surface shape characteristic of the member surface is formed by polishing the member surface with the specific polishing film. And by coating a hard film on the polished surface on which such a characteristic rough surface shape is formed, the adhesion between the hard film and the member is improved, and a surface-coated member having excellent wear resistance is obtained. It is thought that it is formed.

  As a member provided for the manufacturing method according to the present embodiment, for example, a hard material such as cemented carbide, die steel, powder high speed, high speed steel and other alloy tool steel, stainless steel, aluminum alloy, and hardened steel material. The member containing is mentioned.

  Hereinafter, each process of the manufacturing method which concerns on this embodiment is explained in full detail.

  A grinding | polishing process is a process of grind | polishing at least one part of the member surface with the below-mentioned grinding | polishing film, and forming a grinding | polishing surface.

  In the polishing step, the polishing film includes a base material and a polishing portion having a plurality of molded structures protruding on the base material, and the average particle size of the abrasive particles contained in the polishing portion is 0.3 μm or more and 10 μm or less. A polishing film is used. By polishing with such a polishing film, it is considered that the polished surface has a characteristic rough surface shape, and the wear resistance and peel resistance of the hard film are improved.

  As a base material of the polishing film, for example, a polymer film such as polyester, a metal film, a combination thereof, a processed product thereof, or the like can be used.

  The base material may be subjected to easy adhesion treatment for improving the adhesion of the polishing part to the base material. Examples of the easy adhesion treatment include application of a primer to the substrate surface.

  The thickness of the substrate can be appropriately adjusted according to the material and required properties (flexibility, mechanical strength, etc.) of the polishing film. For example, the thickness of the base material may be 10 to 500 μm, preferably 50 to 150 μm.

  The polishing part of the polishing film may be formed from, for example, a polishing material containing a resin material and abrasive particles dispersed in the resin material. Further, the polishing portion of the polishing film comprises a resin material and an upper layer formed of an abrasive material containing abrasive particles dispersed in the resin material, and a lower layer formed of a bonding material that joins the base material and the upper layer. It may be included.

  The polishing part has a forming structure formed so as to protrude on the base material. By having such a molded structure in the polishing portion, in polishing with the polishing film, polishing can be performed at the top of the polishing portion, and polishing waste generated by polishing can be accumulated in the recess. For this reason, it can fully prevent that grinding | polishing waste penetrate | invades between a member and a grinding | polishing part, and damages the member surface. And in this embodiment, it is thought that the characteristic rough-surface shape which is excellent in adhesiveness with a hard film | membrane can be formed with such a characteristic grinding | polishing mode.

  The polishing portion has a plurality of molding structures, and the plurality of molding structures preferably have substantially the same height from the base material. The height from the base material of the molded structure may be, for example, 5 μm or more, 10 μm or more, 500 μm or less, or 1000 μm or less.

  The molding structure may be, for example, a horizontal triangular prism shape (a triangular prism shape whose side surface is in contact with the base material side). Moreover, at this time, it is preferable that the plurality of molding structures are arranged on the base material so that the sides of each other are substantially parallel. Further, such a molded structure is preferably arranged such that the side thereof forms an angle of 10 ° to 80 ° with respect to the polishing direction.

  As described above, the polishing portion may be formed from a polishing material including a resin material and abrasive particles dispersed in the resin material. In this case, examples of the resin material include cured products such as a photocurable acrylic compound, a thermosetting epoxy compound, and a thermosetting phenol compound.

  The polishing part includes an upper layer formed of a resin material and an abrasive material containing abrasive particles dispersed in the resin material, and a lower layer formed of a bonding material for bonding the base material and the upper layer. There may be. At this time, examples of the bonding material include cured products such as a photocurable acrylate compound and a polyurethane compound.

  Examples of the abrasive particles contained in the polishing part include diamond, alumina, silicon carbide, alumina zirconia, and alumina ceramic.

  The average particle size of the abrasive particles is 0.3 μm or more, preferably 0.4 μm or more, and may be 0.5 μm or more. The average particle size of the abrasive particles is 10 μm or more, preferably 9.5 μm or more, and may be 9 μm or less.

  FIG. 1 is a cross-sectional perspective view showing an aspect of a polishing film according to this embodiment. The polishing film in FIG. 1 includes a base 1 and a polishing portion 2 provided on the base 1. The polishing unit 2 includes an upper layer 4 that contacts a member to be polished, and a lower layer 5 that joins the base material 1 and the upper layer 4. The upper layer 4 has a resin material 5 and abrasive particles 6 dispersed therein. The lower layer 3 is made of a binding material and does not necessarily include abrasive particles. Further, the polishing section 2 has a plurality of triangular prism-shaped forming structures 7 that are in contact with the base material 1 at the side surfaces.

  The lower layer 3 may contain abrasive particles and may have the same composition as the upper layer 4. That is, the polishing film of FIG. 1 is described as the polishing portion 2 including the upper layer 4 and the lower layer 5. However, in the polishing film according to this embodiment, the polishing portion 2 includes the resin material 5 and the abrasive particles 6. It may be a single-layer polishing part formed from an abrasive material.

  The polishing unit 2 has a plurality of rows of molding structures 7 arranged in parallel. The apex angle β of the molded structure 7 is usually 30 ° to 150 °, and may be 45 ° to 140 °. In FIG. 1, the cross section parallel to the longitudinal direction of the forming structure 7 is an isosceles triangle. However, in the present embodiment, the cross section of the forming structure 7 may not be an isosceles triangle. When the cross section of the forming structure 7 is not an isosceles triangle, the forming structure 7 has a steep slope and a gentle slope.

  It is preferable that the top ridge of the forming structure 7 exists on a plane parallel to the substrate surface over almost the entire area of the polishing film. Thereby, the contact of the polishing part 2 with the surface to be polished is made uniform. The symbol h in FIG. 3 indicates the height of the molding structure from the substrate surface. The height h is usually 2 to 600 μm and may be 4 to 300 μm. The variation in the height of the plurality of molded structures is preferably within 20% of the average height of the molded structures, and more preferably within 10%.

  In FIG. 3, the symbol s indicates the height of the upper layer 4 of the polishing unit 2. The height s may be, for example, 5 to 95% of the height h of the molded structure, or 10 to 90%.

  In FIG. 3, the symbol w indicates the length of the short bottom side of the forming structure 7 (that is, the width of the forming structure 7). The length w may be, for example, 2 to 2000 μm, or 4 to 1000 μm. The symbol p indicates the distance between the tops of the forming structure 7 (that is, the pitch of the forming structure). The inter-top distance p may be, for example, 2 to 4000 μm, or 4 to 2000 μm.

  The molding structures 7 may be in contact with each other or may be spaced apart. The symbol u in FIG. 3 indicates the distance between the long bottom sides of the forming structure 7. The distance u may be, for example, 0 to 2000 μm, and may be 0 to 1000 μm.

  The length of the forming structure 7 may be extended over substantially the entire area of the polishing film. Moreover, the shaping | molding structure 7 may be interrupted by appropriate length. The surface in contact with the base material of the forming structure 7 (side surface of the triangular prism) may be an aspect ratio of 2 or more, and preferably 5 or more. The end portions may or may not be aligned. For example, the end portions may be cut with an acute angle from below, and may be formed as a ridge shape having slopes on all sides.

  FIG. 2 is a plan view schematically showing an arrangement example of the molding structure of the polishing film. An arrow A in FIG. 2 indicates a direction parallel to the direction in which the surface to be polished (that is, the member surface) proceeds in the polishing process. The direction indicated by the arrow A can be referred to as the longitudinal direction of the polishing film, and the direction perpendicular to the longitudinal direction can be referred to as the lateral direction of the polishing film. When the member to be polished in the polishing step is a cylindrical member, the lateral direction is parallel to the axis of the cylindrical member.

  In the polishing film 10 of FIG. 2, the molding structure 7 is arranged such that the longitudinal direction (that is, the side of the triangular prism) and the longitudinal direction of the polishing film 10 form an angle γ. The angle γ can be, for example, 10 ° to 80 °. By arranging the molding structure 7 so as to form such an angle γ, it becomes easy to flow into the recesses of the polishing scraps, and a characteristic rough surface shape by the polishing film is easily formed.

  The abrasive film can be produced, for example, by the following method.

  First, an abrasive coating solution containing abrasive particles, a binder that forms a resin material, and a solvent is prepared. The solvent is preferably a volatile solvent capable of dissolving the binder, and may be, for example, an organic solvent exhibiting volatility at room temperature to 170 ° C. Examples of the solvent include methyl ethyl ketone, methyl isobutyl ketone, toluene, xylene, ethanol, isopropyl alcohol, ethyl acetate, butyl acetate, tetrahydrofuran, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and the like.

  Next, a mold sheet having a plurality of concave portions regularly arranged is prepared. The shape of the concave portion may be a shape obtained by inverting the forming structure to be formed. As a material for the mold sheet, for example, a metal such as nickel or a plastic such as polypropylene may be used. When the binder is a photocurable resin, it is preferable to use a material that can transmit ultraviolet rays, visible rays, and the like.

  A polishing film can be produced using these abrasive coating liquid and mold sheet. FIG. 3 is a process diagram schematically showing an example of a method for producing an abrasive film.

  As shown in FIG. 3 (a), the mold sheet 8 is filled with an abrasive coating solution 9. The filling amount is set to an amount sufficient to form the upper layer 4 after the solvent is evaporated and the binder is cured. For example, after evaporating the solvent, it may be filled with an amount such that the depth from the bottom of the recess becomes the dimension s shown in FIG. The filling can be performed, for example, by applying the abrasive coating liquid to the mold sheet with a coating device such as a roll coater.

  As shown in FIG. 3B, the solvent is removed by evaporation from the filled abrasive coating solution. At that time, for example, the mold sheet 8 may be heated to 50 to 150 ° C. The heating time is not particularly limited, and may be, for example, 0.2 to 10 minutes. When the binder is a thermosetting resin, the curing step can be performed simultaneously by heating to the curing temperature. Further, when the volatility of the solvent is high, the solvent may be evaporated by leaving it at room temperature for several minutes to several hours.

  As shown in FIG. 3C, the mold sheet is further filled with a binder coating solution 10 to fill the recesses with the binder. The binder filled at this time is preferably a binder having good adhesion to the substrate and the upper layer. A lower layer made of a bonding material for bonding the base material and the upper layer is formed by the binder. The binder may be a photocurable resin or a thermosetting resin, and is preferably a photocurable resin.

  As shown in FIG. 3D, the base material 1 is stacked on the mold sheet 8 to bond the binder to the base material. Adhesion can be performed, for example, by a method such as roll pressing or laminating.

  Next, the binder is cured by heating or light irradiation to form a bonding material for bonding the base material and the upper layer. FIG. 3D shows the case of light irradiation. In the present embodiment, for example, when a light-transmitting substrate (transparent substrate) is used as the substrate, light such as ultraviolet rays (UV) can be irradiated from above the transparent substrate.

  Thereafter, if necessary, the mold sheet is heated to 50 to 150 ° C. to cure the thermosetting resin in the upper layer 3 of the polishing portion, and the mold sheet 8 is removed as shown in FIG. By removing, a polishing film can be obtained.

  In this embodiment, at a grinding | polishing process, at least one part of the member surface is grind | polished with the above-mentioned grinding | polishing film, and a grinding | polishing surface is formed. At this time, Rz of the polished surface is preferably 0.02 μm or more, and more preferably 0.03 μm or more. Further, the Rz of the polished surface is preferably 0.15 μm or less, and more preferably 0.11 μm or less. That is, in the polishing step, the polishing conditions can be appropriately adjusted so that Rz of the obtained polished surface is within the above range. In addition, in this specification, Rz of a grinding | polishing surface shows the value calculated | required based on JISB0601: 2001.

  The polishing in the polishing step can be performed, for example, by sliding in one direction while pressing the polishing film against the member surface. Moreover, the specific grinding | polishing method can be suitably set according to the shape etc. of a member. For example, when the member is cylindrical, polishing in the polishing step can be performed by the method shown in FIG.

  FIG. 4 is a schematic view showing an example of a method for polishing a member surface with a polishing film. In FIG. 4, the polishing film 11 is unwound from the unwinding roll 12, and is wound on the winding roll 14 through the contact roll 13. The contact roll 13 is pressed against the outer peripheral surface of the cylindrical member 16 by the air cylinder 15. Polishing is performed by rotating the cylindrical member 16 in the direction of the arrow and sending the polishing film 11 in a direction opposite to the direction in which the surface to be polished of the polishing film 11 advances.

  The polishing load can be appropriately adjusted according to the material of the cylindrical member 16 so that the Rz of the polishing surface is within the above range.

  The coating process is a process of coating a hard film on the polished surface formed in the polishing process.

  A coating process can be performed with the formation method of a well-known hard film. For example, the coating process may be a process of coating a hard film on the polished surface by physical vapor deposition such as vacuum vapor deposition or sputtering.

  In the present embodiment, the hard film may have a Vickers hardness of 700 or more, preferably 1000 or more, measured according to ISO14577-4: 2007. In addition, the Vickers hardness of a hard film | membrane may be 3000 or less, for example.

  Examples of the hard film include diamond-like carbon, chromium nitride, and titanium nitride.

  Although the thickness in particular of a hard film is not restrict | limited, For example, it may be 0.1-3.0 micrometers and may be 0.1-5.0 micrometers.

  In the manufacturing method according to the present embodiment, by forming a hard film on the polished surface formed in the polishing step, a surface covering member having excellent wear resistance and sufficiently suppressing peeling of the hard film is manufactured.

  As mentioned above, although preferred embodiment of the surface covering member which concerns on this invention was described, this invention is not limited to the said Example.

  For example, the present invention, in one aspect thereof, relates to a pretreatment method for a surface of a member coated with a hard film. The pretreatment method includes a polishing step of polishing the member surface with the specific polishing film described above. The member on which the polished surface is formed by such a polishing step can be suitably used as a hard film coating target.

  Moreover, this invention may be related with the processed member which has the surface processed by the said pre-processing method in another side surface. In another aspect, the present invention may relate to a surface covering member formed by coating the processed member with a hard film.

  EXAMPLES Hereinafter, although an Example demonstrates this invention more concretely, this invention is not limited to an Example.

Example 1
The cylindrical side surface of a metal shaft (SKH51, φ10 mm × 30 m cylindrical shape) was polished by the method shown in FIG. 3 using a Trizact ^TM diamond wrapping film 662XA (manufactured by 3M Japan, average particle diameter of abrasive particles: 9 μm). . As the polishing equipment, Super Finisher SP-100 (manufactured by Matsuda Seiki Co., Ltd. (Kawasai City, Hyogo Prefecture)) was used. The polishing conditions were as follows, and SIMTECH500 ( 5% diluted solution) was used. When the surface roughness of the cylindrical side surface of the polished metal shaft was measured by a method based on JIS B 0601: 2001, Rz was 0.1053 μm.
<Polishing conditions>
Shaft rotation speed: 960rpm
Film feed speed: 20 mm / min
Cutting depth: 0.5mm
Pressurization: 0.4 MPa
Oscillation: 600 cpm
Backup roll hardness: 70 degrees (Shore A hardness)

  Next, the cylindrical side surface of the polished metal shaft was coated with a hard film of chromium nitride (CrN) to obtain a surface covering member. The thickness of the hard film was 2.8 μm.

  The obtained surface covering member was subjected to a scratch test based on ASTM C1624-05 (2010), and the critical peeling load when the hard film peeled and the surface of the metal shaft began to be exposed was determined. As a result of the measurement, the critical peel load was 101.4N.

(Comparative Example 1)
The polishing of the metal shaft and the surface coating member were performed in the same manner as in Example 1 except that 3M ^TM diamond microfinishing film 675L (manufactured by 3M Japan Co., Ltd., average particle diameter of abrasive particles: 9 μm) was used as the abrasive film. Fabrication was performed. Rz of the cylindrical side surface of the metal shaft after polishing was 0.2669 μm, and the critical peel load of the obtained surface covering member was 96.68 N.

(Comparative Example 2)
Polishing of the metal shaft and preparation of the surface covering member in the same manner as in Example 1 except that 3M ^TM diamond wrapping film 661X (manufactured by 3M Japan Co., Ltd., average particle diameter of abrasive particles: 9 μm) was used as the abrasive film. Went. Rz of the cylindrical side surface of the metal shaft after polishing was 0.0762 μm, and the critical peeling load of the obtained surface covering member was 93.98 N.

  The abrasive film of Comparative Example 1 is an abrasive film in which abrasive grains are arranged on the adhesive layer of the base film by electrostatic coating, and the abrasive film of Comparative Example 2 is based on a coating solution containing abrasive grains. It is a coated abrasive that is applied and cured on a material film.

  Table 1 shows the results of Example 1 and Comparative Examples 1 and 2.

  In Example 1 and Comparative Example 2, the peak count (evaluation length: 2.5 mm) was measured in the surface roughness measurement of the cylindrical side surface after polishing. In Example 1, 264.4 and in Comparative Example 2, 247.5. From the results of Rz and peak count, it was confirmed that the polished surfaces had different rough surface shapes in Example 1 and Comparative Examples 2-3.

(Example 2)
The cylindrical side surface of the metal shaft (SKH51, φ10 mm × 30 m cylindrical shape) was subjected to the same conditions as in Example 1 using a Trizact ^™ diamond wrapping film 662XA (manufactured by 3M Japan, average particle size of abrasive particles: 9 μm). Polished. When the surface roughness of the cylindrical side surface of the polished metal shaft was measured by a method based on JIS B 0601: 2001, Rz was 0.1061 μm.

  Next, the cylindrical side surface of the polished metal shaft was coated with a diamond-like carbon (DLC) hard film to obtain a surface-coated member. Note that the thickness of the hard film was 0.8 μm.

  The obtained surface covering member was subjected to a scratch test based on ASTM C1624-05 (2010), and the critical peeling load when the hard film peeled and the surface of the metal shaft began to be exposed was determined. As a result of the measurement, the critical peel load was 70.91 N.

(Comparative Example 3)
The polishing of the metal shaft and the surface covering member were the same as in Example 2 except that 3M ^TM diamond microfinishing film 675L (manufactured by 3M Japan Co., Ltd., average particle diameter of abrasive particles: 9 μm) was used as the abrasive film. Fabrication was performed. Rz of the cylindrical side surface of the metal shaft after polishing was 0.3249 μm, and the critical peeling load of the obtained surface covering member was 46.69 N.

(Comparative Example 4)
Polishing of the metal shaft and preparation of the surface covering member in the same manner as in Example 2 except that 3M ^TM diamond wrapping film 661X (manufactured by 3M Japan Co., Ltd., average particle diameter of abrasive particles: 9 μm) was used as the abrasive film. Went. Rz of the cylindrical side surface of the metal shaft after polishing was 0.0930 μm, and the critical peel load of the obtained surface covering member was 45.25N.

  The results of Example 2 and Comparative Examples 3 to 4 are shown in Table 2.

(Example 3)
The polishing of the metal shaft and the surface covering member were performed in the same manner as in Example 1 except that Trizacto ^™ diamond wrapping film 662XA (manufactured by 3M Japan Co., Ltd., average particle diameter of abrasive particles: 2 μm) was used as the abrasive film. Fabrication was performed. Rz of the cylindrical side surface of the metal shaft after polishing was 0.0445 μm, and the critical peeling load of the obtained surface covering member was 98.56 N.

Example 4
Polishing and surface coating of a metal shaft in the same manner as in Example 1 except that Trizact ^TM diamond wrapping film 663XA (manufactured by 3M Japan Co., Ltd., average particle diameter of abrasive particles: 0.5 μm) was used as the abrasive film. A member was prepared. Rz of the cylindrical side surface of the metal shaft after polishing was 0.0236 μm, and the critical peeling load of the obtained surface covering member was 96.53N.

(Comparative Example 5)
The polishing of the metal shaft and the surface covering member were performed in the same manner as in Example 1 except that Trizact ^TM diamond wrapping film 663XA (manufactured by 3M Japan Co., Ltd., average particle diameter of abrasive particles: 15 μm) was used as the abrasive film. Fabrication was performed. Rz of the cylindrical side surface of the metal shaft after polishing was 0.2513 μm, and the critical peel load of the obtained surface covering member was 94.35 N.

  The results of Example 1, Example 3, Example 4, and Comparative Example 5 are shown in Table 3.

(Example 5)
The polishing of the metal shaft and the surface covering member were performed in the same manner as in Example 2 except that Trizacto ^™ diamond wrapping film 662XA (manufactured by 3M Japan Co., Ltd., average particle diameter of abrasive particles: 2 μm) was used as the abrasive film. Fabrication was performed. Rz of the cylindrical side surface of the metal shaft after polishing was 0.0478 μm, and the critical peeling load of the obtained surface covering member was 91.10 N.

(Example 6)
Polishing and surface coating of a metal shaft in the same manner as in Example 2 except that Trizact ^TM diamond wrapping film 663XA (manufactured by 3M Japan Co., Ltd., average particle diameter of abrasive particles: 0.5 μm) was used as the abrasive film. A member was prepared. Rz of the cylindrical side surface of the metal shaft after polishing was 0.0259 μm, and the critical peel load of the obtained surface covering member was 70.50 N.

(Comparative Example 6)
The polishing of the metal shaft and the surface coating member were performed in the same manner as in Example 2 except that Trizact ^TM diamond wrapping film 663XA (manufactured by 3M Japan Co., Ltd., average particle diameter of abrasive particles: 15 μm) was used as the abrasive film. Fabrication was performed. Rz of the cylindrical side surface of the metal shaft after polishing was 0.2817 μm, and the critical peel load of the obtained surface covering member was 43.40 N.

  The results of Example 2, Example 5, Example 6, and Comparative Example 6 are shown in Table 4.

  DESCRIPTION OF SYMBOLS 1 ... Base material, 2 ... Polishing part, 3 ... Lower layer, 4 ... Upper layer, 5 ... Resin material, 6 ... Abrasive particle, 7 ... Molding structure, 10 ... Polishing film, 11 ... Polishing film, 12 ... Feeding roll, 13 ... Contact roll, 14 ... take-up roll, 15 ... air cylinder 15.

Claims (8)

A method for producing a surface covering member having at least a part of a surface coated with a hard film,
A polishing step of polishing at least a part of the member surface with an abrasive film to form a polished surface;
A coating step of coating the hard film on the polished surface;
Including
The polishing film comprises a base material, and a polishing portion having a plurality of molded structures protruding on the base material,
The molded structure includes a resin material and an upper layer formed from an abrasive material containing abrasive particles dispersed in the resin material, and a lower layer formed from a bonding material that joins the base material and the upper layer. ,
The upper layer constitutes a top portion for polishing the surface of the member;
A recess sandwiched between the lower layers is formed between a plurality of the molded structures,
The average particle size of the abrasive particles is 0.3μm or more 10μm or less, the manufacturing method of the surface-coated member.   The manufacturing method of Claim 1 whose Rz of the said grinding | polishing surface is 0.02 micrometer or more and 0.15 micrometer or less. A method for producing a surface covering member having at least a part of a surface coated with a hard film,
A polishing step of polishing at least a part of the member surface with an abrasive film to form a polished surface;
A coating step of coating the hard film on the polished surface;
Including
The polishing film comprises a base material, and a polishing portion having a plurality of molded structures protruding on the base material,
The molding structure has a horizontally arranged triangular prism shape,
The plurality of molded structures are arranged such that the heights from the base material are substantially the same, and the sides are substantially parallel to each other ,
The manufacturing method of the surface covering member in which the said grinding | polishing part contains an abrasive particle with an average particle diameter of 0.3 micrometer or more and 10 micrometers or less .   The said shaping | molding structure is a manufacturing method of Claim 3 arrange | positioned so that the side may make an angle of 10 degrees-80 degrees with respect to a grinding | polishing direction.   The manufacturing method according to claim 1, wherein the hard film includes diamond-like carbon, chromium nitride, or titanium nitride. A method for producing a treated member having a polished surface polished for coating with a hard film ,
At least a portion of the member surface polishing to the polishing film comprises a polishing step of forming the abrasive surface,
The polishing film comprises a base material, and a polishing portion having a plurality of molded structures protruding on the base material,
The molded structure includes a resin material and an upper layer formed from an abrasive material containing abrasive particles dispersed in the resin material, and a lower layer formed from a bonding material that joins the base material and the upper layer. ,
The upper layer constitutes a top portion for polishing the surface of the member;
A recess sandwiched between the lower layers is formed between a plurality of the molded structures,
A method for producing a treated member, wherein the abrasive particles have an average particle size of 0.3 μm or more and 10 μm or less .   A method for producing a treated member having a polished surface polished for coating with a hard film,
  A polishing step of forming at least a part of the surface of the member with an abrasive film to form the polished surface;
  The polishing film comprises a base material, and a polishing portion having a plurality of molded structures protruding on the base material,
  The molding structure has a horizontally arranged triangular prism shape,
  The plurality of molded structures are arranged such that the heights from the base material are substantially the same, and the sides are substantially parallel to each other,
  The manufacturing method of the processed member in which the said grinding | polishing part contains the abrasive particle whose average particle diameter is 0.3 micrometer or more and 10 micrometers or less.   The manufacturing method according to claim 7, wherein the forming structure is arranged so that a side of the forming structure forms an angle of 10 ° to 80 ° with respect to a polishing direction.

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