JP6484658B2 - Oxide superconducting wire and superconducting coil - Google Patents
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Description
本発明は、酸化物超電導線材及び超電導コイルに関する。 The present invention relates to an oxide superconducting wire and a superconducting coil.
酸化物超電導線材の中でも、REBa2Cu3O7−δ(RE123)等の一般式で表されるRE−Ba−Cu−O系超電導体(ただし、REは希土類を表す。)をテープ状の基板上に形成した酸化物超電導線材は、磁場中での臨界電流が高く線材の長手方向に高い引張強度を有することから、精力的に開発が進められている。しかし、この種の酸化物超電導線材は、テープ状の基板の主面に垂直な方向の力には比較的弱いことが知られている。基板に垂直な方向の力が作用すると、超電導層の剥離や破壊によって線材の特性が劣化することがある。 Among oxide superconducting wires, a RE-Ba-Cu-O-based superconductor represented by a general formula such as REBa 2 Cu 3 O 7-δ (RE123) (where RE represents a rare earth) is tape-shaped. The oxide superconducting wire formed on the substrate has a high critical current in a magnetic field and a high tensile strength in the longitudinal direction of the wire. However, it is known that this type of oxide superconducting wire is relatively weak against a force perpendicular to the main surface of the tape-shaped substrate. When a force in a direction perpendicular to the substrate is applied, the properties of the wire may be deteriorated by peeling or breaking of the superconducting layer.
このような劣化に対する対策として、特許文献1には、安定化材が上板と下板を備え、上板と下板が長手方向に渡って幅方向両端部で電気的かつ機械的に接続された酸化物超電導線材が開示されている。上板と下板との間に中空部が形成されるか、上板と下板とが重ね合わされることにより、酸化物超電導線材に応力が作用したとしても、応力を緩和できることが記載されている。 As a countermeasure against such deterioration, Patent Document 1 discloses that the stabilizing material includes an upper plate and a lower plate, and the upper plate and the lower plate are electrically and mechanically connected at both ends in the width direction over the longitudinal direction. An oxide superconducting wire is disclosed. It is described that a stress can be relieved even if stress is applied to the oxide superconducting wire by forming a hollow portion between the upper plate and the lower plate or by overlapping the upper plate and the lower plate. Yes.
しかし、特許文献1に記載の構造の場合、安定化材の構造が複雑となり、安定化材の厚さが厚くなることで、電流密度が下がる問題がある。 However, in the case of the structure described in Patent Document 1, the structure of the stabilizing material becomes complicated, and there is a problem that the current density decreases due to the thickening of the stabilizing material.
本発明は、上記事情に鑑みてなされたものであり、基板に垂直な方向の力に対する特性の劣化を抑制することが可能な酸化物超電導線材及び超電導コイルを提供することを課題とする。 This invention is made | formed in view of the said situation, and makes it a subject to provide the oxide superconducting wire and superconducting coil which can suppress the deterioration of the characteristic with respect to the force of the direction perpendicular | vertical to a board | substrate.
前記課題を解決するため、テープ状の基板上に中間層を介して酸化物超電導層が形成され、少なくとも前記酸化物超電導層の表面に保護層及び安定化層が設けられ、前記基板として2枚の基板が重ねられて、前記2枚の基板の幅方向両端部の少なくとも一部が固着され、前記2枚の基板の幅方向中央部が非固着となっていることを特徴とする酸化物超電導線材を提供する。 In order to solve the above problems, an oxide superconducting layer is formed on a tape-like substrate through an intermediate layer, and at least a surface of the oxide superconducting layer is provided with a protective layer and a stabilizing layer. The oxide superconductivity is characterized in that at least a part of both end portions in the width direction of the two substrates is fixed, and a central portion in the width direction of the two substrates is not fixed. Provide wire rods.
前記2枚の基板の幅方向両端部の固着部が、溶接部であってもよい。 The fixing portions at both ends in the width direction of the two substrates may be welded portions.
また、本発明は、前記酸化物超電導線材が使用された超電導コイルを提供する。 The present invention also provides a superconducting coil using the oxide superconducting wire.
本発明によれば、基板に垂直な方向の力が作用したとしても、酸化物超電導層の剥離等による特性の劣化を抑制することができる。 According to the present invention, even when a force in a direction perpendicular to the substrate is applied, it is possible to suppress deterioration of characteristics due to peeling of the oxide superconducting layer.
以下、好適な実施形態に基づき、図面を参照して本発明を説明する。 Hereinafter, based on a preferred embodiment, the present invention will be described with reference to the drawings.
図1に、実施形態の酸化物超電導線材の断面図を示す。この断面図は、酸化物超電導線材10の長手方向に垂直な断面の構造を模式的に示している。本実施形態の酸化物超電導線材10は、基板11上に中間層12を介して酸化物超電導層13が形成された超電導積層体15を含む。 In FIG. 1, sectional drawing of the oxide superconducting wire of embodiment is shown. This sectional view schematically shows the structure of a cross section perpendicular to the longitudinal direction of the oxide superconducting wire 10. The oxide superconducting wire 10 of this embodiment includes a superconducting laminate 15 in which an oxide superconducting layer 13 is formed on a substrate 11 with an intermediate layer 12 interposed.
本実施形態の超電導積層体15は、テープ状の基板11と、基板11の一方の面上に、中間層12と酸化物超電導層13と保護層14がこの順に積層された構成を有する。本明細書において、基板11、中間層12、酸化物超電導層13、保護層14等の各層が積層される方向が厚さ方向である。また、幅方向は、長手方向及び厚さ方向に垂直な方向である。超電導積層体15の側面は、幅方向の両側の各側面の一方又は両方である。 The superconducting laminate 15 of the present embodiment has a configuration in which an intermediate layer 12, an oxide superconducting layer 13, and a protective layer 14 are laminated in this order on a tape-like substrate 11 and one surface of the substrate 11. In this specification, the direction in which the layers such as the substrate 11, the intermediate layer 12, the oxide superconducting layer 13, and the protective layer 14 are laminated is the thickness direction. The width direction is a direction perpendicular to the longitudinal direction and the thickness direction. The side surface of the superconducting laminate 15 is one or both of the side surfaces on both sides in the width direction.
基板11は、幅が10mm程度のテープ状の金属基板であり、厚さ方向の両側に、それぞれ主面を有する。主面は、一方の面及びこれに対向する裏面である。基板11を構成する金属の具体例として、ハステロイ(登録商標)に代表されるニッケル合金、ステンレス鋼、ニッケル合金に集合組織を導入した配向Ni−W合金などが挙げられる。基板11の厚さは、目的に応じて適宜調整すれば良く、例えば10〜500μmの範囲である。 The substrate 11 is a tape-shaped metal substrate having a width of about 10 mm, and has main surfaces on both sides in the thickness direction. The main surface is one surface and the back surface opposite to the one surface. Specific examples of the metal constituting the substrate 11 include a nickel alloy typified by Hastelloy (registered trademark), stainless steel, an oriented Ni—W alloy in which a texture is introduced into the nickel alloy, and the like. What is necessary is just to adjust the thickness of the board | substrate 11 suitably according to the objective, for example, it is the range of 10-500 micrometers.
本実施形態の基板11は、2枚の基板11a,11bが厚さ方向に重ねられた構成である。2枚の基板11a,11bは、幅方向両端部の少なくとも一部が固着された固着部17と、幅方向中央部が非固着となっている非固着部18を有する。中間層12及び酸化物超電導層13は、基板11bの片面上に積層されている。すなわち、本実施形態の超電導積層体15は、中間層12及び酸化物超電導層13が積層された基板11bと、中間層12及び酸化物超電導層13が積層されていない基板11aとを有する。 The substrate 11 of the present embodiment has a configuration in which two substrates 11a and 11b are stacked in the thickness direction. The two substrates 11a and 11b have a fixing portion 17 to which at least a part of both end portions in the width direction is fixed, and a non-fixing portion 18 in which the central portion in the width direction is not fixed. The intermediate layer 12 and the oxide superconducting layer 13 are stacked on one side of the substrate 11b. That is, the superconducting laminate 15 of this embodiment includes a substrate 11b on which the intermediate layer 12 and the oxide superconducting layer 13 are laminated, and a substrate 11a on which the intermediate layer 12 and the oxide superconducting layer 13 are not laminated.
複数枚の基板11a,11bを構成する材料は、互いに同一でもよく、異なってもよい。 The materials constituting the plurality of substrates 11a and 11b may be the same as or different from each other.
固着部17としては、例えば基板11a,11b同士の溶接により形成された溶接部が挙げられる。非固着部18においては、基板11a,11bの対向面が互いに接触していてもよく、基板11a,11b間に隙間を有してもよい。非固着部18には、フッ素樹脂、シリコーン樹脂、オイル等の非付着性材料が塗布、充填等されていてもよい。また、非付着性材料として、酸化物超電導層13が超電導状態となる低温で密着力を有せず、それより高い温度で密着力を有する感温性の粘着剤、接着剤等を採用することも可能である。非固着部18が設けられていることにより、基板に垂直な方向の応力が働いても応力が緩和され、酸化物超電導層13の剥離や破壊を抑制することができる。 Examples of the fixing portion 17 include a welded portion formed by welding the substrates 11a and 11b. In the non-fixed portion 18, the opposing surfaces of the substrates 11a and 11b may be in contact with each other, and there may be a gap between the substrates 11a and 11b. The non-adhering portion 18 may be coated and filled with a non-adhesive material such as a fluorine resin, a silicone resin, or oil. In addition, as a non-adhesive material, a temperature-sensitive pressure-sensitive adhesive, adhesive, or the like that does not have adhesion at a low temperature at which the oxide superconducting layer 13 is in a superconducting state and has adhesion at a higher temperature is used. Is also possible. By providing the non-adhered portion 18, the stress is relaxed even when a stress in a direction perpendicular to the substrate is applied, and peeling and destruction of the oxide superconducting layer 13 can be suppressed.
中間層12は、基板11と酸化物超電導層13との間に設けられる。中間層12は、多層構成でもよく、例えば基板11側から酸化物超電導層13側に向かう順で、拡散防止層、ベッド層、配向層、キャップ層等を有してもよい。これらの層は必ずしも1層ずつ設けられるとは限らず、一部の層を省略する場合や、同種の層を2以上繰り返し積層する場合もある。 The intermediate layer 12 is provided between the substrate 11 and the oxide superconducting layer 13. The intermediate layer 12 may have a multilayer structure, and may include a diffusion prevention layer, a bed layer, an alignment layer, a cap layer, and the like in order from the substrate 11 side to the oxide superconducting layer 13 side. These layers are not necessarily provided one by one, and some layers may be omitted, or two or more of the same kind of layers may be laminated repeatedly.
拡散防止層は、基板11の成分の一部が拡散し、不純物として酸化物超電導層13側に混入することを抑制する機能を有する。拡散防止層は、例えば、Si3N4、Al2O3、GZO(Gd2Zr2O7)等から構成される。拡散防止層の厚さは、例えば10〜400nmである。 The diffusion preventing layer has a function of suppressing a part of the components of the substrate 11 from diffusing and mixing as impurities into the oxide superconducting layer 13 side. The diffusion preventing layer is made of, for example, Si 3 N 4 , Al 2 O 3 , GZO (Gd 2 Zr 2 O 7 ) or the like. The thickness of the diffusion preventing layer is, for example, 10 to 400 nm.
拡散防止層の上には、基板11と酸化物超電導層13との界面における反応を低減し、その上に形成される層の配向性を向上するためにベッド層を形成しても良い。ベッド層の材質としては、例えばY2O3、Er2O3、CeO2、Dy2O3、Eu2O3、Ho2O3、La2O3等が挙げられる。ベッド層の厚さは、例えば10〜100nmである。 A bed layer may be formed on the diffusion prevention layer in order to reduce the reaction at the interface between the substrate 11 and the oxide superconducting layer 13 and improve the orientation of the layer formed thereon. Examples of the material of the bed layer include Y 2 O 3 , Er 2 O 3 , CeO 2 , Dy 2 O 3 , Eu 2 O 3 , Ho 2 O 3 , and La 2 O 3 . The thickness of the bed layer is, for example, 10 to 100 nm.
配向層は、その上のキャップ層の結晶配向性を制御するために2軸配向する物質から形成される。配向層の材質としては、例えば、Gd2Zr2O7、MgO、ZrO2−Y2O3(YSZ)、SrTiO3、CeO2、Y2O3、Al2O3、Gd2O3、Zr2O3、Ho2O3、Nd2O3等の金属酸化物を例示することができる。この配向層はIBAD(Ion-Beam-Assisted Deposition)法で形成することが好ましい。 The orientation layer is formed from a biaxially oriented material in order to control the crystal orientation of the cap layer thereon. Examples of the material of the alignment layer include Gd 2 Zr 2 O 7 , MgO, ZrO 2 —Y 2 O 3 (YSZ), SrTiO 3 , CeO 2 , Y 2 O 3 , Al 2 O 3 , Gd 2 O 3 , Examples thereof include metal oxides such as Zr 2 O 3 , Ho 2 O 3 , and Nd 2 O 3 . This alignment layer is preferably formed by an IBAD (Ion-Beam-Assisted Deposition) method.
キャップ層は、上述の配向層の表面に成膜されて、結晶粒が面内方向に自己配向し得る材料からなる。キャップ層の材質としては、例えば、CeO2、Y2O3、Al2O3、Gd2O3、ZrO2、YSZ、Ho2O3、Nd2O3、LaMnO3等が挙げられる。キャップ層の厚さは、50〜5000nmの範囲が挙げられる。 The cap layer is formed on the surface of the above-described alignment layer, and is made of a material that allows crystal grains to self-align in the in-plane direction. The material of the cap layer, for example, CeO 2, Y 2 O 3 , Al 2 O 3, Gd 2 O 3, ZrO 2, YSZ, Ho 2 O 3, Nd 2 O 3, LaMnO 3 , and the like. Examples of the thickness of the cap layer include a range of 50 to 5000 nm.
酸化物超電導層13は、酸化物超電導体から構成される。酸化物超電導体としては、特に限定されないが、例えば一般式REBa2Cu3OX(RE123)で表されるRE−Ba−Cu−O系酸化物超電導体が挙げられる。希土類元素REとしては、Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Luのうちの1種又は2種以上が挙げられる。中でも、Y、Gd、Eu、Smの1種か、又はこれら元素の2種以上の組み合わせが好ましい。一般に、Xは、7−x(酸素欠損量x:約0〜1程度)である。酸化物超電導層13の厚さは、例えば0.5〜5μm程度である。この厚さは、長手方向に均一であることが好ましい。 The oxide superconducting layer 13 is composed of an oxide superconductor. As an oxide superconductor, particularly, but not limited to, for example, the general formula REBa 2 Cu 3 O X (RE123 ) with REBa-Cu-O based oxide superconductor represented the like. The rare earth element RE may be one or more of Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu. Among these, one of Y, Gd, Eu, and Sm, or a combination of two or more of these elements is preferable. Generally, X is 7-x (oxygen deficiency x: about 0 to 1). The thickness of the oxide superconducting layer 13 is, for example, about 0.5 to 5 μm. This thickness is preferably uniform in the longitudinal direction.
保護層14は、事故時に発生する過電流をバイパスしたり、酸化物超電導層13と保護層14の上に設けられる層との間で起こる化学反応を抑制したりする等の機能を有する。保護層14の材質としては、例えば銀(Ag)、銅(Cu)、金(Au)、金と銀との合金、その他の銀合金、銅合金、金合金などが挙げられる。保護層14は、少なくとも酸化物超電導層13の表面を覆っている。ここで、酸化物超電導層13の表面とは、厚さ方向で、基板11側に対する反対側の面である。 The protective layer 14 has functions such as bypassing overcurrent generated at the time of an accident and suppressing a chemical reaction occurring between the oxide superconducting layer 13 and a layer provided on the protective layer 14. Examples of the material of the protective layer 14 include silver (Ag), copper (Cu), gold (Au), an alloy of gold and silver, other silver alloys, copper alloys, and gold alloys. The protective layer 14 covers at least the surface of the oxide superconducting layer 13. Here, the surface of the oxide superconducting layer 13 is a surface opposite to the substrate 11 side in the thickness direction.
さらに、保護層14は、酸化物超電導層13の側面、中間層12の側面、基板11の側面及び裏面から選択される領域の一部または全部を覆ってもよい。保護層14は2種以上又は2層以上の金属層から構成されてもよい。保護層14の厚さは、特に限定されないが、例えば1〜30μm程度が挙げられる。保護層14を薄くする場合は、10μm以下でもよい。 Furthermore, the protective layer 14 may cover a part or all of a region selected from the side surface of the oxide superconducting layer 13, the side surface of the intermediate layer 12, the side surface and the back surface of the substrate 11. The protective layer 14 may be composed of two or more metal layers or two or more metal layers. Although the thickness of the protective layer 14 is not specifically limited, For example, about 1-30 micrometers is mentioned. When the protective layer 14 is thinned, it may be 10 μm or less.
本実施形態において、超電導積層体15を製造する手順は特に限定されないが、2枚の基板11a,11bに固着部17を形成した後で、一方の基板11b上に中間層12、酸化物超電導層13、保護層14を順に積層してもよい。一方の基板11b上に中間層12、酸化物超電導層13、保護層14を順に積層した後で、基板11bの裏面に他方の基板11aを重ね合わせて固着部17を形成してもよい。 In the present embodiment, the procedure for producing the superconducting laminate 15 is not particularly limited, but after the fixing portion 17 is formed on the two substrates 11a and 11b, the intermediate layer 12 and the oxide superconducting layer are formed on one substrate 11b. 13 and the protective layer 14 may be laminated in order. After the intermediate layer 12, the oxide superconducting layer 13, and the protective layer 14 are sequentially stacked on one substrate 11b, the other substrate 11a may be overlaid on the back surface of the substrate 11b to form the fixing portion 17.
基板11aの厚さは、例えば5〜250μmの範囲である。基板11bの厚さは、例えば5〜250μmの範囲である。基板11a,11bの厚さの比率は特に限定されないが、例えば1%:99%〜99%:1%が挙げられる。基板11a,11bの厚さの比率の具体例として、10%:90%程度、20%:80%程度、30%:70%程度、40%:60%程度、50%:50%程度、60%:40%程度、70%:30%程度、80%:20%程度、90%:10%程度が挙げられる。 The thickness of the board | substrate 11a is the range of 5-250 micrometers, for example. The thickness of the substrate 11b is, for example, in the range of 5 to 250 μm. The ratio of the thicknesses of the substrates 11a and 11b is not particularly limited, and examples thereof include 1%: 99% to 99%: 1%. As specific examples of the ratio of the thicknesses of the substrates 11a and 11b, 10%: about 90%, 20%: about 80%, 30%: about 70%, 40%: about 60%, 50%: about 50%, 60 %: About 40%, 70%: about 30%, 80%: about 20%, 90%: about 10%.
2枚の基板11a,11bを重ね合わせる前の基板11b上に中間層12、酸化物超電導層13、保護層14を積層する場合は、基板11aの厚さより基板11bの厚さが厚いことが好ましい。この場合、酸化物超電導層13が積層される側の基板11bの厚さを確保することにより、中間層12、酸化物超電導層13、保護層14等の成膜が容易になる。つまり、引張強度が高い基板11bを長手方向に移動させながら成膜を行うことにより、長手方向にわたって長尺で均一な成膜を容易に実現することができる。長手方向に移動させながらの成膜を容易に行うためには、例えば基板11bの厚さは10μm以上、好ましくは30μm以上であることが好ましい。 When the intermediate layer 12, the oxide superconducting layer 13, and the protective layer 14 are laminated on the substrate 11b before the two substrates 11a and 11b are overlaid, the thickness of the substrate 11b is preferably larger than the thickness of the substrate 11a. . In this case, by ensuring the thickness of the substrate 11b on the side where the oxide superconducting layer 13 is laminated, the intermediate layer 12, the oxide superconducting layer 13, the protective layer 14 and the like can be easily formed. That is, by performing the film formation while moving the substrate 11b having a high tensile strength in the longitudinal direction, it is possible to easily realize a long and uniform film formation in the longitudinal direction. In order to easily perform film formation while moving in the longitudinal direction, for example, the thickness of the substrate 11b is preferably 10 μm or more, and more preferably 30 μm or more.
2枚の基板11a,11bを重ね合わせた基板11上に中間層12、酸化物超電導層13、保護層14を積層する場合は、各基板11a,11bの厚さを薄くすることが好ましい。重ね合わせた基板11の各基板11a,11bに成膜時の引張荷重を分担させることができるので、基板11a,11bの合計の厚さの増大を抑制することができる。 When the intermediate layer 12, the oxide superconducting layer 13, and the protective layer 14 are stacked on the substrate 11 in which the two substrates 11a and 11b are overlapped, it is preferable to reduce the thickness of each of the substrates 11a and 11b. Since the substrates 11a and 11b of the stacked substrate 11 can share the tensile load during film formation, an increase in the total thickness of the substrates 11a and 11b can be suppressed.
重ね合わせた基板11全体を薄くすることにより、電流密度の低下を抑制することができる。例えば、2枚の基板11a,11bの材料及び厚さが同一であると、異なる基板を用意する必要がなく、コストを低減することができる。また、酸化物超電導層13が積層される側の基板11bよりも、酸化物超電導層13が積層されない側の基板11aを薄くすることにより、基板11aが変形した際、酸化物超電導層13への影響を抑制することができる。 Decreasing the current density can be suppressed by thinning the entire stacked substrate 11. For example, if the materials and thicknesses of the two substrates 11a and 11b are the same, it is not necessary to prepare different substrates, and the cost can be reduced. Further, when the substrate 11a is deformed by making the substrate 11a on the side on which the oxide superconducting layer 13 is not laminated thinner than the substrate 11b on the side on which the oxide superconducting layer 13 is laminated, The influence can be suppressed.
幅方向両端部において固着部17が形成される位置は、長手方向において同じ位置でもよく、異なる位置でもよい。幅方向の一端側の固着部17と他端側の固着部17とが、長手方向に沿って交互に配置されてもよい。交互に配置されることによって、固着部17が形成された一端側と、固着部17が形成されていない他端側とを交互にバランスよく配置することができる。幅方向両端部の固着部17が長手方向に連続して形成される場合、非固着部18に隙間があっても、外部から隙間に物質が入り込みにくくなる。安定化層16を金属めっきで形成する場合は、めっきに用いる薬剤をはじくような非付着性材料を非固着部18に設けてもよい。幅方向両端部の固着部17が長手方向に不連続に、間欠的に形成される場合、固着部17は酸化物超電導線材10の長手方向に10〜100μmの長さで形成され、10〜100μmの間隔をおいて隣の固着部17が形成される。酸化物超電導線材10の断面視において、固着部17の幅は5〜500μm、好ましくは10〜200μmである。酸化物超電導線材10の断面視において、固着部17の幅は、酸化物超電導線材10の幅に対して0.05〜5.0%、好ましくは0.10〜2.0%である。 The positions where the fixing portions 17 are formed at both ends in the width direction may be the same position or different positions in the longitudinal direction. The fixing portions 17 on one end side in the width direction and the fixing portions 17 on the other end side may be alternately arranged along the longitudinal direction. By alternately arranging, one end side where the fixing portion 17 is formed and the other end side where the fixing portion 17 is not formed can be alternately arranged in a well-balanced manner. When the fixing portions 17 at both ends in the width direction are continuously formed in the longitudinal direction, even if there is a gap in the non-fixing portion 18, it is difficult for a substance to enter the gap from the outside. When the stabilization layer 16 is formed by metal plating, a non-adhesive material that repels a chemical used for plating may be provided in the non-fixed portion 18. When the fixing portions 17 at both ends in the width direction are intermittently formed in the longitudinal direction, the fixing portions 17 are formed with a length of 10 to 100 μm in the longitudinal direction of the oxide superconducting wire 10, and 10 to 100 μm. Adjacent adhering portions 17 are formed with an interval of. In the cross-sectional view of the oxide superconducting wire 10, the width of the fixing portion 17 is 5 to 500 μm, preferably 10 to 200 μm. In a cross-sectional view of the oxide superconducting wire 10, the width of the fixing portion 17 is 0.05 to 5.0%, preferably 0.10 to 2.0% with respect to the width of the oxide superconducting wire 10.
本実施形態の酸化物超電導線材10は、超電導積層体15の外周に、金属めっき、金属箔等の金属からなる安定化層16を有する。安定化層16は、保護層14の表面、保護層14の側面、酸化物超電導層13の側面、中間層12の側面、基板11の側面、基板11の裏面から選択される領域の一部または全部を覆ってもよい。ここで、保護層14の表面とは、厚さ方向で、基板11側に対する反対側の面である。安定化層16の厚さとしては、特に限定されないが、例えば10〜300μm程度が挙げられる。 The oxide superconducting wire 10 of this embodiment has a stabilizing layer 16 made of metal such as metal plating or metal foil on the outer periphery of the superconducting laminate 15. The stabilization layer 16 is a part of a region selected from the surface of the protective layer 14, the side surface of the protective layer 14, the side surface of the oxide superconducting layer 13, the side surface of the intermediate layer 12, the side surface of the substrate 11, and the back surface of the substrate 11. You may cover everything. Here, the surface of the protective layer 14 is a surface opposite to the substrate 11 side in the thickness direction. Although it does not specifically limit as thickness of the stabilization layer 16, For example, about 10-300 micrometers is mentioned.
超電導積層体15の各層を形成する工程と、安定化層16を形成する工程の順序は、適宜選択することが可能である。例えば、2枚の基板11a,11bの間に固着部17を形成した後に、安定化層16を形成してもよい。基板11aを有しない超電導積層体15の外周に安定化層16を形成した後で、2枚の基板11a,11bを重ね合わせることも可能である。基板11a,11b間には安定化層16が付着しないように、安定化層16の成膜条件が制御されてもよい。 The order of the process of forming each layer of the superconducting laminate 15 and the process of forming the stabilization layer 16 can be selected as appropriate. For example, the stabilization layer 16 may be formed after the fixing portion 17 is formed between the two substrates 11a and 11b. It is also possible to overlap the two substrates 11a and 11b after the stabilization layer 16 is formed on the outer periphery of the superconducting laminate 15 that does not have the substrate 11a. The film forming conditions of the stabilization layer 16 may be controlled so that the stabilization layer 16 does not adhere between the substrates 11a and 11b.
酸化物超電導線材10の製造工程の一例としては、例えば次の例示が挙げられる。
(1)基板11a,11b間に固着部17を形成した後で、基板11上に中間層12、酸化物超電導層13、保護層14を順に積層し、その後、安定化層16を形成する方法。
(2)基板11b上に中間層12、酸化物超電導層13、保護層14を順に積層した後で、基板11a,11bを重ね合わせて固着部17を形成し、その後、安定化層16を形成する方法。
As an example of the manufacturing process of the oxide superconducting wire 10, the following illustration is mentioned, for example.
(1) A method in which the fixing layer 17 is formed between the substrates 11a and 11b, and then the intermediate layer 12, the oxide superconducting layer 13, and the protective layer 14 are sequentially stacked on the substrate 11 and then the stabilization layer 16 is formed. .
(2) After the intermediate layer 12, the oxide superconducting layer 13, and the protective layer 14 are sequentially laminated on the substrate 11b, the substrates 11a and 11b are overlapped to form the fixing portion 17, and then the stabilization layer 16 is formed. how to.
安定化層16が良導電性の金属から構成される場合、酸化物超電導層13が常電導状態に転移した時に発生する過電流を転流させるバイパス部としての機能を付与することができる。良導電性の金属として、銅、銅合金、アルミニウム、アルミニウム合金、銀等の金属が挙げられる。また、酸化物超電導線材10が超電導限流器に使用される場合は、常電導状態への転移時に発生する過電流を瞬時に抑制する必要があるため、安定化層16に高抵抗金属が好適に用いられる。高抵抗金属として、例えば、Ni−Cr等のNi系合金などが挙げられる。 In the case where the stabilization layer 16 is made of a highly conductive metal, it is possible to provide a function as a bypass part that commutates an overcurrent generated when the oxide superconducting layer 13 transitions to a normal conducting state. Examples of the highly conductive metal include metals such as copper, copper alloy, aluminum, aluminum alloy, and silver. Further, when the oxide superconducting wire 10 is used for a superconducting fault current limiter, it is necessary to instantaneously suppress the overcurrent generated at the time of transition to the normal conducting state, so that a high resistance metal is suitable for the stabilization layer 16. Used for. Examples of the high resistance metal include Ni-based alloys such as Ni-Cr.
安定化層16が、酸化物超電導層13又は保護層14の表面を覆っている場合、酸化物超電導層13と安定化層16との間の電気的接続が良好となる。さらに、安定化層16が、酸化物超電導層13の側面を覆っている場合、酸化物超電導層13の剥離防止性や防水性を向上することができる。安定化層16が金属箔から構成される場合、半田等の接合材を介して超電導積層体15の外周に固着させてもよい。 When the stabilization layer 16 covers the surface of the oxide superconducting layer 13 or the protective layer 14, the electrical connection between the oxide superconducting layer 13 and the stabilization layer 16 is good. Furthermore, when the stabilization layer 16 covers the side surface of the oxide superconducting layer 13, it is possible to improve the peeling prevention property and waterproofness of the oxide superconducting layer 13. When the stabilization layer 16 is made of a metal foil, it may be fixed to the outer periphery of the superconducting laminate 15 via a bonding material such as solder.
テープ状の酸化物超電導線材を使用して超電導コイルを作製するには、超電導線材を巻き枠の外周面に沿って必要な層数巻き付けてコイル形状の多層巻きコイルを構成した後、巻き付けた超電導線材を覆うようにエポキシ樹脂等の樹脂を含浸させて、超電導線材を固定することができる。 To produce a superconducting coil using a tape-shaped oxide superconducting wire, a superconducting wire is wound around the outer peripheral surface of the winding frame to form a coil-shaped multilayer winding coil, and then the wound superconducting coil is formed. The superconducting wire can be fixed by impregnating a resin such as an epoxy resin so as to cover the wire.
酸化物超電導線材がコイル状に巻き回され、エポキシ樹脂などの樹脂が含浸された超電導コイルの場合、冷却時に酸化物超電導線材と樹脂の熱膨張係数の差に起因して、冷却時に基板に垂直な方向の引張応力が働くことがある。また、超電導コイルの通電時に、フープ応力等として、超電導コイルを外側に拡張する方向に作用する応力が働くことがある。本実施形態によれば、2枚の基板11a,11bの間に非固着部を有するので、基板に垂直な方向の応力が働いても応力が緩和され、酸化物超電導層13の剥離や破壊を抑制することができる。その結果、酸化物超電導線材10の特性が劣化しにくくなる。 In the case of a superconducting coil in which an oxide superconducting wire is wound in a coil shape and impregnated with a resin such as an epoxy resin, it is perpendicular to the substrate during cooling due to the difference in thermal expansion coefficient between the oxide superconducting wire and the resin during cooling. Tensile stress in various directions may work. In addition, when the superconducting coil is energized, stress acting in the direction of expanding the superconducting coil outward may act as hoop stress or the like. According to the present embodiment, since the non-adhered portion is provided between the two substrates 11a and 11b, the stress is relieved even if the stress in the direction perpendicular to the substrate is applied, and the oxide superconducting layer 13 is peeled or broken. Can be suppressed. As a result, the characteristics of the oxide superconducting wire 10 are unlikely to deteriorate.
以上、本発明を好適な実施形態に基づいて説明してきたが、本発明は上述の実施形態に限定されるものではなく、本発明の要旨を逸脱しない範囲で種々の改変が可能である。
超電導線材は、外部端子を有することができる。外部端子を有する箇所では、他の箇所と異なる断面構造を有してもよい。
As mentioned above, although this invention has been demonstrated based on suitable embodiment, this invention is not limited to the above-mentioned embodiment, A various change is possible in the range which does not deviate from the summary of this invention.
The superconducting wire can have an external terminal. The portion having the external terminal may have a different cross-sectional structure from other portions.
10…酸化物超電導線材、11,11a,11b…基板、12…中間層、13…酸化物超電導層、14…保護層、15…超電導積層体、16…安定化層、17…固着部、18…非固着部。 DESCRIPTION OF SYMBOLS 10 ... Oxide superconducting wire, 11, 11a, 11b ... Board | substrate, 12 ... Intermediate | middle layer, 13 ... Oxide superconducting layer, 14 ... Protective layer, 15 ... Superconducting laminated body, 16 ... Stabilizing layer, 17 ... Adhering part, 18 ... Non-fixed part.
Claims (3)
前記基板として2枚の基板が重ねられて、前記2枚の基板の幅方向両端部の少なくとも一部が固着され、前記2枚の基板の幅方向中央部が非固着となっていることを特徴とする酸化物超電導線材。 An oxide superconducting layer is formed on the tape-shaped substrate via an intermediate layer, and a protective layer and a stabilizing layer are provided on at least the surface of the oxide superconducting layer,
Two substrates are stacked as the substrate, at least a part of both ends in the width direction of the two substrates is fixed, and a central portion in the width direction of the two substrates is not fixed. Oxide superconducting wire.
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