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JP6487644B2 - Polishing equipment - Google Patents
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JP6487644B2 - Polishing equipment - Google Patents

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Publication number
JP6487644B2
JP6487644B2 JP2014137169A JP2014137169A JP6487644B2 JP 6487644 B2 JP6487644 B2 JP 6487644B2 JP 2014137169 A JP2014137169 A JP 2014137169A JP 2014137169 A JP2014137169 A JP 2014137169A JP 6487644 B2 JP6487644 B2 JP 6487644B2
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Prior art keywords
polishing
polishing member
polished
diamond
base
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Expired - Fee Related
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JP2014137169A
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Japanese (ja)
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JP2016013599A (en
Inventor
亮蔵 城石
亮蔵 城石
健一 高尾
健一 高尾
崇弘 山内
崇弘 山内
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Toyo Seikan Group Holdings Ltd
Toyo Seikan Group Engineering Co Ltd
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Toyo Seikan Group Holdings Ltd
Toyo Seikan Group Engineering Co Ltd
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Priority to JP2014137169A priority Critical patent/JP6487644B2/en
Application filed by Toyo Seikan Group Holdings Ltd, Toyo Seikan Group Engineering Co Ltd filed Critical Toyo Seikan Group Holdings Ltd
Priority to CN201580035426.3A priority patent/CN106457504A/en
Priority to KR1020177001497A priority patent/KR20170021299A/en
Priority to PCT/JP2015/067681 priority patent/WO2016002537A1/en
Priority to BR112016030826A priority patent/BR112016030826A2/en
Priority to EP15814434.5A priority patent/EP3165330A4/en
Publication of JP2016013599A publication Critical patent/JP2016013599A/en
Priority to US15/395,168 priority patent/US20170106494A1/en
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Publication of JP6487644B2 publication Critical patent/JP6487644B2/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/04Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
    • B24B21/12Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces involving a contact wheel or roller pressing the belt against the work
    • B24B21/14Contact wheels; Contact rollers; Belt supporting rolls
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/006Machines or devices using grinding or polishing belts; Accessories therefor for special purposes, e.g. for television tubes, car bumpers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/16Machines or devices using grinding or polishing belts; Accessories therefor for grinding other surfaces of particular shape
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/18Accessories
    • B24B21/22Accessories for producing a reciprocation of the grinding belt normal to its direction of movement
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/34Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/16Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of diamonds; of jewels or the like; Diamond grinders' dops; Dop holders or tongs

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Description

本発明は、ダイヤモンド表面の研磨装置に関するものであり、より詳細には、各種のダイヤモンド製品の表面を研磨する装置に関する。   The present invention relates to a diamond surface polishing apparatus, and more particularly to an apparatus for polishing the surface of various diamond products.

炭素結晶であるダイヤモンドの物性は、硬度が極めて高く、耐摩耗性に優れているばかりか、滑り性や熱伝導性にも優れ、さらには高屈折率である。この様な物性を備えていることからダイヤモンドは、例えば、バイト、エンドミル、やすりなどの切削用工具、パンチ、ダイなどの塑性加工金型、バルブリフタ、軸受けなどの摺動部材、ヒートシンクなどの放熱部材、電子基盤、レンズ、ウインドウなどの光学部品等に使用されているが、このようなダイヤモンド製品は、用途に合わせて加工されるが、一般にはその表面を研磨して平滑な面とすることが求められることが多い。   Diamond, which is a carbon crystal, has extremely high hardness, excellent wear resistance, excellent slipperiness and thermal conductivity, and a high refractive index. Because of these physical properties, diamond is, for example, cutting tools such as tools, end mills, and files, plastic working dies such as punches and dies, sliding members such as valve lifters and bearings, and heat dissipation members such as heat sinks. It is used for optical parts such as electronic boards, lenses, windows, etc., but such diamond products are processed according to the application, but generally the surface can be polished to a smooth surface. Often required.

ダイヤモンド表面の研磨は、古くは研磨手段にもダイヤモンド製の砥粒や砥石を用いた機械的研磨方法が採用されていたが、研磨に時間を要するばかりか、共削りとなるため、ツール寿命が短という問題があり、また研磨されるダイヤモンド表面が平面ではなく凹凸のある立体的な表面の研磨には不向きであるという問題もあった。このため、現在では、機械的研磨ではなく化学的処理による研磨方法が提案されている。まず、加工部分を高温状態にし、ダイヤモンド表面を高反応性金属または金属酸化物で擦り、反応させ除去するというステップの研磨方法である。
特許文献1には、ダイヤモンド結晶中の炭素と反応し易い金属から構成された研磨部材を使用し、この研磨部材に超音波を印加し、該研磨部材を超音波振動させながら加熱し、ダイヤモンド表面に押し付けて研磨を行っていく研磨方法が開示され、研磨部材となる炭素と反応し易い金属としては、γ−Feを含むステンレス鋼や、チタン(Ti)、ジルコニウム(Zr)、タンタル(Ta)が例示されている。
In the past, the polishing of diamond surfaces used mechanical polishing methods that used diamond abrasive grains and stones as the polishing means. There is also a problem that the surface of the diamond to be polished is not suitable for polishing a three-dimensional surface having irregularities rather than a flat surface. For this reason, at present, a polishing method using chemical treatment instead of mechanical polishing has been proposed. First, the polishing method is a step in which a processed part is brought to a high temperature state, and the diamond surface is rubbed with a highly reactive metal or metal oxide to be reacted and removed.
Patent Document 1 uses a polishing member composed of a metal that easily reacts with carbon in diamond crystals, applies ultrasonic waves to the polishing member, and heats the polishing member while ultrasonically vibrating the diamond member. A polishing method is disclosed in which polishing is performed by pressing onto a metal, and metals that easily react with carbon serving as a polishing member include stainless steel containing γ-Fe, titanium (Ti), zirconium (Zr), and tantalum (Ta). Is illustrated.

上記した加熱法に超音波振動による摩擦熱を利用したものは、温度コントロールを振動数や押圧力によって行わなければならず、その制御が非常に難しく、安定して一定の効率で研磨を行うことが困難であること、また、摩擦熱を使用しているため、そのエネルギー効率が低く、温度を上昇させるためには、かなりの押圧力で研磨部材をダイヤモンド表面に押し付けることが必要であり、この研磨部材を構成している金属の硬度がダイヤモンドに比してかなり低いこともあり、研磨部材の摩耗が著しく、その寿命が短いという欠点がある。この点に鑑み、加熱方法として、ダイヤモンド表面が焦点となるようにレーザー光を集束させて照射してダイヤモンド表面を研磨する方法も提案されている。図6はこの種の研磨装置を示したもので、ダイヤモンド表面を有する被加工部材1の加工面1a近傍に加熱手段2でレーザー光2aを集光させて加熱すると共に、固定研磨部材3aを被加工部材1の加工面に押圧しながら被加工部材1を回転させて研磨を行っている。加熱効率については改善されているが、研磨部材が固定であるため、その摩耗が著しく、寿命が短いという欠点は依然として残った。   For the above heating method that uses frictional heat due to ultrasonic vibration, temperature control must be performed by frequency and pressing force, which is very difficult to control, and polishing is performed stably and with constant efficiency. In addition, the frictional heat is used, the energy efficiency is low, and in order to raise the temperature, it is necessary to press the abrasive member against the diamond surface with a considerable pressing force. Since the hardness of the metal constituting the polishing member is considerably lower than that of diamond, there is a disadvantage that the wear of the polishing member is remarkable and its life is short. In view of this point, as a heating method, a method of polishing the diamond surface by converging and irradiating laser light so that the diamond surface becomes a focal point has been proposed. FIG. 6 shows a polishing apparatus of this type, in which a laser beam 2a is condensed and heated by a heating means 2 near the processing surface 1a of a workpiece 1 having a diamond surface, and a fixed polishing member 3a is covered. The workpiece 1 is rotated while being pressed against the machining surface of the workpiece 1 for polishing. Although the heating efficiency has been improved, since the abrasive member is fixed, there still remains a drawback that its wear is significant and the life is short.

特許文献2に示されたものは、レーザー照射による事前加熱法を採用し、研磨部材を構成している金属をダイヤモンド表面の炭素と化学反応させることによって研磨を行うものであるが、この発明の目的は、研磨部材の寿命が長く、その制御も容易であり、平滑度の高い表面を得ることができるばかりか、凹凸のある立体的な表面の研磨にも容易に適用することができるダイヤモンド表面の研磨方法を提供すること、また、金属間化合物のように、特殊な製法により得られる高価な材料を使用せず、安価な金属単体で形成された研磨部材を用いることにより研磨を行うことが可能なダイヤモンド表面の研磨方法を提供することにある。そのために、この発明は、図5のB,Cに示すように研磨部材による研磨に先立って、該研磨部材3または被加工面(ダイヤモンド表面)1aをレーザー光等によって加熱すると共に、前記研磨部材3には、線状3b、ベルト状3cの形状を有しており且つ少なくとも表面が炭素と易反応性の金属または浸炭性金属からなる素材を使用し、プーリー4aやローラー4bといった研磨部材支持具4に該研磨部材3を巻き付けて研磨表面を連続的もしくは間歇的に変位させながら研磨部材支持具4を介してダイヤモンド表面に押圧しながら、被研磨部材1を移動させて研磨を行うダイヤモンド表面の研磨方法が提供されている。   The thing shown by patent document 2 employ | adopts the preheating method by laser irradiation, and grind | polishes by making the metal which comprises the grinding | polishing member chemically react with carbon of the diamond surface. The purpose is a diamond surface that can be easily applied to polishing uneven three-dimensional surfaces as well as providing a smooth surface with a long polishing member life and easy control. It is possible to provide a polishing method, and to perform polishing by using a polishing member formed of an inexpensive metal alone without using an expensive material obtained by a special manufacturing method such as an intermetallic compound. It is an object of the present invention to provide a possible diamond surface polishing method. For this purpose, as shown in FIGS. 5B and 5C, the present invention heats the polishing member 3 or the surface to be processed (diamond surface) 1a with a laser beam or the like prior to polishing by the polishing member, 3 is a linear member 3b, a belt member 3c, and at least the surface is made of a material that is easily reactive with carbon or a carburizing metal, and a polishing member support such as a pulley 4a or a roller 4b. The polishing member 3 is wound around 4 and the polishing surface is pressed against the diamond surface via the polishing member support 4 while continuously or intermittently displacing the polishing surface. A polishing method is provided.

この研磨方法は、前述した金属素材により形成されている線状、又はベルト状の形状を有した研磨部材が用いられ、該研磨部材の接触部を変位させてダイヤモンド表面を摺擦するため、摩耗した研磨部材は順次更新され、易反応性金属とダイヤモンド表面の炭素との反応或いは該炭素の拡散浸透が飽和状態に達せず、または磨耗により面圧が変化することなく、常に安定して研磨が進行することとなる。この結果、長期間にわたって、持続して安定な研磨を行うことが可能となるという効果を奏するのであるが、図5のAに示されるように、研磨部材支持具4に巻き付けた研磨部材3を順次送り出し巻き取りながら被加工面(ダイヤモンド表面)1aに向けて外側から押圧して研磨する形態であるため、加工面の外側には研磨部材3を巻き付けたプーリーやローラーといった研磨部材支持具4に、上記研磨部材を送り出し巻き取る送出巻取手段6と押圧手段7を備えた大型の研磨装置が対峙することになる。したがって、被研磨部材1の加工面1aは構造上解放されている必要があり、円筒部材やリング部材の内周面のような半閉空間をこの様な機構の研磨装置で研磨加工することができない。   In this polishing method, a polishing member having a linear or belt shape formed of the metal material described above is used, and the contact portion of the polishing member is displaced to rub the diamond surface. The polished members are renewed sequentially, so that the reaction between the reactive metal and the carbon on the diamond surface or the diffusion and penetration of the carbon does not reach a saturated state, or the surface pressure does not change due to wear, and the polishing is always performed stably. Will progress. As a result, there is an effect that stable polishing can be performed continuously over a long period of time. However, as shown in FIG. 5A, the polishing member 3 wound around the polishing member support 4 is removed. Since it is the form which presses and grinds toward the to-be-processed surface (diamond surface) 1a while feeding and winding sequentially, the polishing member support 4 such as a pulley or a roller around which the polishing member 3 is wound is disposed on the outside of the processing surface. The large-sized polishing apparatus provided with the sending-up winding means 6 for sending out and winding up the polishing member and the pressing means 7 faces each other. Therefore, the processed surface 1a of the member to be polished 1 needs to be structurally free, and a semi-closed space such as the inner peripheral surface of a cylindrical member or a ring member can be polished by a polishing apparatus having such a mechanism. Can not.

特開2005−231022号公報 「ダイヤモンドの研磨方法と装置」 平成17年9月2日公開JP 2005-231022 A "Diamond Polishing Method and Apparatus" Published September 2, 2005 特開2011−177883号公報 「ダイヤモンド表面の研磨方法」 平成23年9月15日公開JP 2011-177883 A "Diamond Surface Polishing Method" Published on September 15, 2011

本発明の課題は、線状、ベルト状といった長尺形状の研磨部材を用い、研磨部材支持具に巻き付けて研磨表面を連続的もしくは間歇的に変位させながら前記研磨支持具を介し被研磨部材の表面に押圧しながら、研磨を行うダイヤモンド研磨装置において、円筒部材やリング部材の内周面のような半閉空間の表面をも研磨加工が可能な機能を備えたものを提供することにある。   An object of the present invention is to use a long-shaped polishing member such as a linear shape or a belt shape, and wrap around the polishing member support tool to discontinue the polishing surface continuously or intermittently. An object of the present invention is to provide a diamond polishing apparatus that performs polishing while pressing against a surface, and has a function capable of polishing a surface of a semi-closed space such as an inner peripheral surface of a cylindrical member or a ring member.

本発明の研磨装置は、線状またはベルト状の研磨部材と、該研磨部材を連続的もしくは間歇的に変位させる送り出し巻き取る手段と、前記研磨部材を巻き付け変位可能にする研磨部材支持具と、該研磨部材支持具が取り付けられている基台と、該基台を被研磨部材の加工面に向けて押圧する押圧手段とからなり、前記基台は前記押圧手段の付設位置とは反対側の位置で付勢する押圧力の方向とは異なる方向に延びる延在部を備え、該延在部の先端部に前記被研磨部材の加工内周面と当接可能となるように前記研磨部材支持具が配置され、前記研磨部材が前記研磨部材支持具を巻くように前記送り出し巻き取る手段との間に架け渡されており、前記送り出し巻き取る手段と前記押圧手段は前記加工面とずれて配置されていることにより、半閉空間のダイヤモンド表面の加工を可能としたことを特徴とする。 A polishing apparatus according to the present invention includes a linear or belt-shaped polishing member, a feeding and winding means for displacing the polishing member continuously or intermittently , a polishing member support that enables the polishing member to be wound and displaced, A base on which the polishing member support is attached; and pressing means for pressing the base toward the processing surface of the member to be polished, the base being opposite to the attachment position of the pressing means. An extending portion extending in a direction different from the direction of the pressing force biased at the position, and supporting the polishing member so that the tip end portion of the extending portion can come into contact with the processing inner peripheral surface of the member to be polished A tool is disposed, and the polishing member is bridged between the feeding and winding means so as to wind the polishing member support tool, and the feeding and winding means and the pressing means are arranged so as to be shifted from the processing surface. Semi-closed by being And characterized in that enabling machining of the diamond surface.

本発明の1実施形態は、前記研磨部材を送り出し巻き取る手段が前記基台上に取り付けられるものとした。
本発明の更なる実施形態は、前記研磨部材が被研磨部材の加工面に向けて押圧する方向が水平であるものとした。
本発明の更なる実施形態は、前記研磨部材が炭素と易反応性の金属、浸炭性金属或は、金属酸化物からなる表面を有したものであるものとした。更なる実施形態は、ダイヤモンド又はダイヤモンド膜の研磨用とした。また更なる実施形態は、前記研磨部材および/または被研磨部材を加熱する加熱手段を有する構成を採用した。
In one embodiment of the present invention, a means for feeding and winding the polishing member is mounted on the base.
In a further embodiment of the present invention, the direction in which the polishing member presses the processed surface of the member to be polished is horizontal.
In a further embodiment of the present invention, the polishing member has a surface made of a metal easily reactive with carbon, a carburizable metal, or a metal oxide. A further embodiment was for polishing diamond or diamond film. In a further embodiment, a configuration having a heating means for heating the polishing member and / or the member to be polished is employed.

本発明に係る研磨装置の基台は、被加工面に対する押圧方向とは異なる方向に延びる延在部を備え、該延在部の先端部に前記研磨部材支持具が配置される構成が採られているので、研磨部材支持具が配置された加工位置と基台の本体部や押圧手段の位置をずらすことができ、前記基台の本体部や押圧手段が被研磨部材との干渉を避けられ、円筒部材やリング部材の内周面のような半閉空間を研磨加工することができるという格別の効果を奏する。   The base of the polishing apparatus according to the present invention has a configuration in which an extending portion extending in a direction different from the pressing direction with respect to the processing surface is provided, and the polishing member support is disposed at a distal end portion of the extending portion. Therefore, the processing position where the polishing member support tool is disposed can be shifted from the position of the main body portion and the pressing means of the base, and the main body portion and the pressing means of the base can avoid interference with the member to be polished. The semi-closed space such as the inner peripheral surface of the cylindrical member or the ring member can be polished.

前記研磨部材を送り出し巻き取る手段が前記基台上に取り付けられた構成を採用した本発明の研磨装置は、研磨部材支持具と研磨部材を送り出し巻き取る手段が同じ基台上に取り付けられているため、動作中も両者間に架け渡される研磨部材の張力に変化が生じることがなく、加工面への押圧力が安定となる。
前記研磨部材が被研磨部材の加工面に向けて押圧する方向が水平である形態の本発明の研磨装置は、加工面を押圧方向が重力方向に直交するため、装置各部材にかかる重力の影響を受けることなく研磨を行うことができる。
In the polishing apparatus of the present invention adopting a configuration in which the means for feeding and winding the polishing member is mounted on the base, the polishing member support and the means for feeding and winding the polishing member are mounted on the same base. Therefore, there is no change in the tension of the polishing member spanned between the two during operation, and the pressing force on the processing surface becomes stable.
In the polishing apparatus of the present invention in which the direction in which the polishing member presses toward the processing surface of the member to be polished is horizontal, the pressing direction of the processing surface is orthogonal to the direction of gravity, so the influence of gravity on each member of the apparatus Polishing can be performed without receiving.

前記研磨部材として炭素と易反応性の金属、浸炭性金属或は、金属酸化物からなる表面を有したものを採用した本発明の研磨装置は、ダイヤモンド又はダイヤモンド膜の研磨用に用いる際に、機械的加工ではなく、化学的な処理によって効果的な研磨が可能となる。
また、前記研磨部材および/または被研磨部材を加熱する加熱手段を付加した本発明の研磨装置は、化学的処理が促進され、加工時間が短縮される。
When the polishing apparatus of the present invention adopting a material having a surface made of carbon, a carburizable metal, or a metal oxide as the polishing member is used for polishing diamond or diamond film, Effective polishing is possible by chemical treatment, not by mechanical processing.
Further, in the polishing apparatus of the present invention to which a heating means for heating the polishing member and / or the member to be polished is added, chemical treatment is promoted and processing time is shortened.

本発明に係る研磨装置によって、リング部材の内周面を加工する形態を示した図である。It is the figure which showed the form which processes the internal peripheral surface of a ring member with the grinding | polishing apparatus which concerns on this invention. 本発明に係る研磨装置の2つの実施形態を示す図である。It is a figure which shows two embodiment of the grinding | polishing apparatus which concerns on this invention. 本発明に係る研磨装置によって、リング部材の内周面を加工する際に、重力の影響を受けない形態を説明する図である。It is a figure explaining the form which is not influenced by gravity, when processing the internal peripheral surface of a ring member with the polisher concerning the present invention. 加熱装置を付加した本発明に係る研磨装置の1実施形態を示す図である。It is a figure which shows one Embodiment of the grinding | polishing apparatus based on this invention which added the heating apparatus. 研磨部材を送り出す従来の研磨装置を説明する図である。It is a figure explaining the conventional grinding | polishing apparatus which sends out a grinding | polishing member. 従来の化学研磨方式の研磨装置の基本構成を示す図である。It is a figure which shows the basic composition of the polisher of the conventional chemical polishing system.

以下、本発明の実施の形態について、詳細に説明する。
長尺形状の研磨部材を研磨部材支持具に巻き付けて研磨表面を連続的もしくは間歇的に変位させながら前記研磨部材支持具を介し被研磨部材の表面に押圧しながら、研磨を行う形態のダイヤモンド研磨装置が、円筒部材やリング部材の内周面のような半閉空間の表面をも研磨加工が可能な機能を備えるために、本発明が採用した基本的特徴点は、この種のダイヤモンド研磨装置には付属部材である長尺研磨部材の送出・巻取手段と被研磨部材の加工面に向けて押圧する押圧手段の存在が被加工部材の構造に干渉しないように、研磨部材を巻き付けた研磨部材支持具を加圧手段による押圧方向と異なる方向に延在する基台の延在部に取り付けるようにした構成にある。本発明の基台は、被加工面に対する押圧方向とは異なる方向に延びる延在部を備え、該延在部の先端部に前記研磨部材支持具が配置される構成が採られているので、研磨部材支持具が配置された加工位置と基台の本体部や押圧手段の位置をずらすことができ、前記基台の本体部や加圧手段が被研磨部材との干渉を避けられ、円筒部材やリング部材の内周面のような半閉空間を研磨加工することができるのである。
Hereinafter, embodiments of the present invention will be described in detail.
A diamond polishing in which a long polishing member is wound around a polishing member support and the polishing surface is continuously or intermittently displaced and pressed against the surface of the member to be polished through the polishing member support. Since the apparatus has a function capable of polishing even the surface of a semi-closed space such as the inner peripheral surface of a cylindrical member or ring member, the basic feature adopted by the present invention is this kind of diamond polishing apparatus. Polishing by winding the polishing member so that the presence of the feeding and winding means of the long polishing member which is an accessory member and the pressing means for pressing toward the processing surface of the member to be polished do not interfere with the structure of the member to be processed The member support is attached to the extending portion of the base extending in a direction different from the pressing direction by the pressing means. Since the base of the present invention is provided with an extending portion extending in a direction different from the pressing direction with respect to the work surface, and the polishing member support is disposed at the distal end portion of the extending portion, The processing position at which the polishing member support is disposed can be shifted from the position of the main body of the base and the pressing means, and the main body of the base and the pressing means can be prevented from interfering with the member to be polished. In addition, a semi-closed space such as the inner peripheral surface of the ring member can be polished.

図1を参照して、本発明の代表的な実施形態例によって、リング部材の内周面を研磨する態様を説明する。この実施形態の装置は基台5に研磨部材3を送り出し巻き取る送出巻取手段6が取り付けられると共に、該基台5を被加工面1aに向けて押圧するための加圧手段7が付設されている。そして、前記基台5には前記加圧手段7の付設位置とは反対側の位置で付勢する押しつけ力の方向とは直交する方向に延在する延在部5aが備えられ、その先端部近傍にプーリーやローラーといった研磨部材支持具4が取り付けられている。更に該研磨部材支持具4には線状やベルト状といった長尺形状の研磨部材3が前記研磨部材支持具4を巻くように前記送出巻取手段6と間に架け渡されている。本発明の研磨装置は加圧手段の付設位置とは反対側の位置で付勢する押しつけ力の方向とは直交する方向に延在する延在部に研磨部材支持具4が取り付けられ、それに巻かれた研磨部材3で被研磨部材1の表面を研磨する構造となっているため、大型装置となる送出巻取手段6や加圧手段7の位置を研磨加工部とずらせることが可能となり、被加工部材1との干渉を避けることができる。したがって、図1に示されるように、被加工部材1がリング状であっても、その内周面に研磨部材支持具4を当接することができ、研磨加工が可能となる。   With reference to FIG. 1, the aspect which grind | polishes the internal peripheral surface of a ring member is demonstrated by the typical embodiment of this invention. The apparatus of this embodiment is provided with a delivery winding means 6 for feeding and winding the polishing member 3 to the base 5 and a pressurizing means 7 for pressing the base 5 toward the work surface 1a. ing. The base 5 is provided with an extending portion 5a extending in a direction perpendicular to the direction of the pressing force urging at a position opposite to the position where the pressurizing means 7 is provided. An abrasive member support 4 such as a pulley or a roller is attached in the vicinity. Further, a long polishing member 3 such as a linear shape or a belt shape is spanned between the polishing member support 4 and the delivery winding means 6 so as to wind the polishing member support 4. In the polishing apparatus of the present invention, the polishing member support 4 is attached to an extending portion extending in a direction orthogonal to the direction of the pressing force urging at a position opposite to the position where the pressurizing means is attached, and the polishing member support 4 is wound thereon. Since the polishing member 3 is structured to polish the surface of the member 1 to be polished, it is possible to shift the position of the take-up winding means 6 and the pressurizing means 7 that are large-sized devices with the polishing processing part, Interference with the workpiece 1 can be avoided. Therefore, as shown in FIG. 1, even if the workpiece 1 is ring-shaped, the polishing member support 4 can be brought into contact with the inner peripheral surface thereof, and polishing can be performed.

本発明の研磨装置は先に説明した実施形態例に限られず、多様な変形が可能である。図1に示した例では、基台5に研磨部材3を送り出し巻き取る送出巻取手段6が取り付けられる形態を採用しているが、円筒部材やリング部材の内周面のような半閉空間の表面をも研磨加工が可能な機能を備えた研磨装置を提供するという、本発明の課題に対しては上記の構成は必ずしも必至要件とはならない。図2のAに示すように基台5に押し付け方向とは異なる方向に延在部5aを設け、その先端に近傍に研磨部材支持具4を取り付け、研磨部材3を送り出し巻き取る送出巻取手段6は基台5に取り付けない形態であってもよい。ただし、図1のように基台5に取り付けた場合には、研磨部材支持具4と送出巻取手段6の位置は固定の関係となるため、動作中に両部材の相対変位によって研磨部材に係る張力が変化して、研磨加工に影響を与えるということがないため、より好ましい形態であるといえる。研磨加工において被研磨部材の表面にかかる研磨部材の押圧力は研磨状況や加熱状況に大きく影響を与えるため、重要な要件となる。   The polishing apparatus of the present invention is not limited to the embodiment described above, and various modifications can be made. In the example shown in FIG. 1, a configuration is adopted in which a delivery winding means 6 that feeds and winds the polishing member 3 to the base 5 is adopted, but a semi-closed space such as an inner peripheral surface of a cylindrical member or a ring member. The above configuration is not necessarily an indispensable requirement for the object of the present invention to provide a polishing apparatus having a function capable of polishing the surface of the surface. As shown in FIG. 2A, the base 5 is provided with an extending portion 5a in a direction different from the pressing direction, the polishing member support 4 is attached to the tip of the extending portion 5a, and the polishing member 3 is sent out and wound up. 6 may be a form that is not attached to the base 5. However, when attached to the base 5 as shown in FIG. 1, the positions of the polishing member support 4 and the delivery winding means 6 are fixed, so that the relative displacement of both members during operation causes the polishing member to move to the polishing member. Since the tension does not change and does not affect the polishing process, it can be said to be a more preferable form. In the polishing process, the pressing force of the polishing member applied to the surface of the member to be polished greatly affects the polishing state and the heating state, which is an important requirement.

また、基台の延在部5aは、必ずしも基台5において加圧手段7の付設位置とは反対側の位置で付勢する押しつけ力の方向とは直交する方向に延在するものである必要はなく、加圧手段による押圧方向と異なる方向に延在する形態であればよい。要するに、研磨部材を巻き付けた研磨部材支持具の位置が大型装置となる送出巻取手段6や加圧手段7の位置とずらせることができればよく、図2のBに示すような形態でもよい。   Further, the extending part 5a of the base must necessarily extend in a direction orthogonal to the direction of the pressing force that biases the base 5 at a position opposite to the position where the pressing means 7 is attached. There is no limitation as long as it extends in a direction different from the pressing direction by the pressing means. In short, it is sufficient that the position of the polishing member support around which the polishing member is wound can be shifted from the position of the take-up winding means 6 and the pressurizing means 7 which are large-sized devices, and the form shown in FIG.

本発明の研磨装置の更に好ましい形態について図3を用いて説明する。この実施形態は加圧手段7により押し付け力の方向を水平方向として装置各部材に働く重力の影響を受けないようにするものである。錘や空気圧等を用いた釣り合い装置を用いて、重力の影響を除去することも可能ではあるが、部品点数の増加や、研磨部材の摩耗による重量変化に対して制御する必要がある等、装置の複雑化を招いてしまうため好ましくない。被研磨部材1の加工面1aが鉛直方向にセットされ、研磨部材3の押し付け力が水平方向に作用する。したがって、単純な構造で研磨部材の摩耗量に依らず、鉛直方向に作用する重力の影響を除外できることから、研磨される加工面には影響を及ぼすことがない。前述したように、研磨加工において被研磨部材の表面にかかる研磨部材の押圧力は研磨状況や加熱状況に大きく影響を与えるため、これも重要な意義を有することになる。   A more preferred embodiment of the polishing apparatus of the present invention will be described with reference to FIG. In this embodiment, the direction of the pressing force by the pressurizing means 7 is set to the horizontal direction so as not to be affected by the gravity acting on each member of the apparatus. Although it is possible to remove the influence of gravity by using a balance device using weight, air pressure, etc., it is necessary to control the increase in the number of parts and the change in weight due to abrasion of the polishing member, etc. This is not preferable because of complicating the process. The processed surface 1a of the member 1 to be polished is set in the vertical direction, and the pressing force of the polishing member 3 acts in the horizontal direction. Therefore, since the influence of gravity acting in the vertical direction can be excluded regardless of the wear amount of the polishing member with a simple structure, the processed surface to be polished is not affected. As described above, since the pressing force of the polishing member applied to the surface of the member to be polished in the polishing process greatly affects the polishing state and the heating state, this also has an important significance.

更に、加熱手段を付加した本発明の研磨装置の更に好ましい形態について図4を用いて説明する。加熱手段2はレーザー発振器でレーザービーム2aを加工部に集束させて加熱する。加工部にレーザー光が照射されるため、被研磨素材のダイヤモンドと研磨部材の素材である炭素易反応性の金属、浸炭性金属或は、金属酸化物との反応は促進され、研磨時間を短くすることができる。更に、加熱手段として研磨部材支持具4が配置されている基台の延在部5a先端部にヒーターを併設すると加熱効果はさらに高くなり研磨時間を更に短くすることができる。   Furthermore, a further preferred embodiment of the polishing apparatus of the present invention to which a heating means is added will be described with reference to FIG. The heating means 2 uses a laser oscillator to focus the laser beam 2a on the processing part and heat it. Since the processing part is irradiated with laser light, the reaction between the diamond to be polished and the carbon readily reactive metal, carburizing metal or metal oxide of the polishing member is promoted, and the polishing time is shortened. can do. Furthermore, if a heater is provided at the tip of the extending portion 5a of the base on which the polishing member support 4 is disposed as a heating means, the heating effect is further increased and the polishing time can be further shortened.

本明細書では本発明の研磨部材が炭素と易反応性の金属又は浸炭性の金属をその表面に有し、化学的研磨をするものとして説明してきたが、これに限らず、長尺状の研磨部材が連続的若しくは間歇的に送り出し巻き取られる形態であれば、ダイヤモンド研磨紙、ベルト研磨材、或はダイヤモンドワイヤー等を用いた機械的研磨方式のものにも適応できる。   In the present specification, the polishing member of the present invention has been described as having a metal that is easily reactive with carbon or a carburizing metal on the surface thereof, and chemical polishing is performed. As long as the polishing member is continuously or intermittently fed and wound, it can be applied to a mechanical polishing method using diamond polishing paper, belt polishing material, diamond wire or the like.

1 被研磨(加工)部材 1a 被加工面(ダイヤモンド表面)
2 加熱手段 2a レーザー光
3 研磨部材 3a 固定研磨部材
3b 線状研磨部材 3c ベルト状研磨部材
4 研磨部材支持具 4a プーリー
4b ローラー
5 基台 5a 延在部
6 送出巻取手段
7 加圧手段
1 Polished (machined) member
2 Heating means 2a Laser light 3 Polishing member 3a Fixed polishing member
3b Linear Abrasive Member 3c Belt Abrasive Member 4 Abrasive Member Support 4a Pulley
4b Roller 5 Base 5a Extension 6 Sending winding means 7 Pressurizing means

Claims (5)

線状またはベルト状の研磨部材と、該研磨部材を連続的もしくは間歇的に変位させる送り出し巻き取る手段と、前記研磨部材を巻き付け変位可能に保持する研磨部材支持具と、該研磨部材支持具が取り付けられている基台と、該基台を被研磨部材の加工面に向けて押圧する押圧手段とからなり、前記基台は前記押圧手段の付設位置とは反対側の位置で付勢する押圧力の方向とは異なる方向に延びる延在部を備え、該延在部の先端部に前記被研磨部材の加工内周面と当接可能となるように前記研磨部材支持具が配置され、前記研磨部材が前記研磨部材支持具を巻くように前記送り出し巻き取る手段との間に架け渡されており、前記送り出し巻き取る手段と前記押圧手段は前記加工面とずれて配置されていることにより、半閉空間のダイヤモンド表面の加工を可能としたことを特徴とする研磨装置。 A linear or belt-shaped polishing member, a feeding and winding means for continuously or intermittently displacing the polishing member, a polishing member support that holds the polishing member in a displaceable manner, and the polishing member support And a pressing means that presses the base toward the processed surface of the member to be polished, and the base is pressed at a position opposite to the position where the pressing means is attached. An extending portion extending in a direction different from the direction of the pressure, and the polishing member support is disposed at a distal end portion of the extending portion so as to be in contact with a processing inner peripheral surface of the polished member, The polishing member is stretched between the feeding and winding means so as to wind the polishing member support, and the feeding and winding means and the pressing means are arranged so as to be shifted from the processing surface. Semi-closed diamond Polishing apparatus is characterized in that it possible to process the surface. 前記研磨部材を連続的もしくは間歇的に変位させる送り出し巻き取る手段が前記基台上に取り付けられたものである請求項1に記載の研磨装置。 The polishing apparatus according to claim 1, wherein a feeding and winding means for continuously or intermittently displacing the polishing member is mounted on the base. 前記研磨部材を被研磨部材の加工面に向けて押圧する方向が水平であることを特徴とする請求項1または2に記載の研磨装置。   The polishing apparatus according to claim 1, wherein a direction in which the polishing member is pressed toward a processed surface of the member to be polished is horizontal. 前記研磨部材が炭素と易反応性の金属、浸炭性金属或は、金属酸化物からなる表面を有したものである請求項1乃至3に記載の研磨装置。   The polishing apparatus according to any one of claims 1 to 3, wherein the polishing member has a surface made of a metal easily reactive with carbon, a carburizable metal, or a metal oxide. 前記研磨部材および/または被研磨部材を加熱する加熱手段を有することを特徴とする請求項4に記載の研磨装置。   The polishing apparatus according to claim 4, further comprising a heating unit configured to heat the polishing member and / or the member to be polished.
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