JP6519693B2 - Pattern exposure method - Google Patents

Description

  The present invention relates to a pattern exposure method.

  In the manufacture of semiconductor devices, liquid crystal display devices and the like, an exposure apparatus is used which exposes a light pattern on a photosensitive layer applied on the surface of a substrate. In this exposure apparatus, in order to improve the resolution and enlarge the depth of focus, for example, as shown in Patent Document 1 below, the liquid such as pure water filled between the projection optical system and the photosensitive substrate is used. An immersion exposure apparatus for exposing a substrate with exposure light is disclosed. This immersion exposure apparatus has a mask stage for supporting a mask and a substrate stage for supporting a substrate, and moves the mask stage and the substrate stage sequentially on the plane while the pattern of the mask is projected through the projection optical system and the liquid. Transfer to the substrate.

  On the other hand, as shown in Patent Document 2 below, there is known a roll-to-roll type exposure apparatus which conveys a long flexible sheet substrate in a long direction and exposes a pattern to the conveyed sheet substrate. ing. In this roll-to-roll type exposure apparatus, a sheet substrate is wound around a cylindrical rotating drum to convey the sheet substrate, and a pattern is drawn and exposed on the sheet substrate wound around the rotating drum.

  Here, also in the roll-to-roll type exposure apparatus, in order to increase the resolution and the depth of focus, it is conceivable to expose the substrate with the exposure light through the liquid. However, while exposure is performed on a planar substrate in Patent Document 1 described above, exposure is performed on a sheet substrate that is curved according to the outer peripheral surface of a rotating drum, whereas exposure is performed in Patent Document 2 described above. Is totally different. Therefore, when the immersion exposure method of Patent Document 1 is applied to the exposure apparatus of Patent Document 2, the liquid is favorably held between the surface of the curved sheet substrate and the tip optical element of the optical system for exposure. It is also conceivable to place the entire rotary drum in a container filled with liquid, but it requires a large amount of liquid and can not be exposed efficiently.

JP 2014-140059 International Publication No. 2013/146184 brochure

  An aspect of the present invention is a pattern exposure method of exposing a pattern on the sheet substrate by irradiating irradiation light while conveying a long flexible sheet substrate in a longitudinal direction, and the sheet substrate A direction in which gravity acts by a rotating drum having a central axis extending in a width direction orthogonal to the longitudinal direction and extending in a direction intersecting the direction of gravity, and a cylindrical outer peripheral surface having a constant radius from the central axis On the opposite side to the outer peripheral surface, while bending and supporting a part of the sheet substrate in the longitudinal direction, while rotating the rotating drum about the central axis, the sheet substrate is elongated The sheet is conveyed in a direction, and the sheet is curved and supported by the rotating drum, and the sheet is within a specific range including an exposure area to which the irradiation light is irradiated in the width direction of the sheet substrate. The seal portion holds the first liquid by the liquid holding portion while preventing leakage of the first liquid to the outside of the specific range so that the surface of the substrate is immersed in the first liquid having a predetermined thickness. And, during transport of the sheet substrate by rotation of the rotary drum, the pattern is formed by irradiating the sheet substrate immersed in the first liquid with the irradiation light through the first liquid. And exposing.

FIG. 1 is a diagram showing a schematic configuration of a device manufacturing system including an exposure apparatus that performs exposure processing on a substrate according to a first embodiment. It is a figure which shows the alignment microscope which detects the scanning line of the spot light scanned on a board | substrate by the exposure head of FIG. 1, and the alignment mark formed on the board | substrate. It is a cross-sectional perspective view which shows the structure of the liquid holding part of FIG. It is a partial cross section figure of the liquid holding part of FIG. It is a figure which shows the structure of the exposure apparatus in 2nd Embodiment. It is sectional drawing which shows the structure of the liquid holding part of FIG. It is a figure which shows the structure of the exposure apparatus in 3rd Embodiment. It is an external appearance perspective view of the liquid holding part and collection | recovery pallet part of FIG. It is the external appearance perspective view which looked at the liquid holding | maintenance part of FIG. 7 from the rotary drum side (-X direction side). It is a fragmentary sectional view of the liquid holding part of FIG. It is an external appearance perspective view of the collection | recovery pallet part of FIG. It is a figure which shows an example at the time of providing multiple liquid holding parts demonstrated in 1st Embodiment around the rotating drum. It is a perspective sectional view of composition of a fluid attaching part by a 4th embodiment.

  A pattern exposure apparatus and a pattern exposure method according to an aspect of the present invention will be described in detail below with reference to preferred embodiments and with reference to the attached drawings. In addition, the aspect of this invention is not limited to these embodiment, What added various change or improvement is also included. That is, the components described below include those which can be easily conceived by those skilled in the art, and substantially the same components, and the components described below can be appropriately combined. In addition, various omissions, replacements or modifications of the components can be made without departing from the scope of the present invention.

First Embodiment
FIG. 1 is a view showing a schematic configuration of a device manufacturing system 10 including an exposure apparatus EX that performs exposure processing on a substrate (object to be exposed) P of the first embodiment. In the following description, an XYZ orthogonal coordinate system is set, and the X direction, the Y direction, and the Z direction will be described according to the arrows shown in the figure.

  The device manufacturing system 10 is, for example, a manufacturing system in which a manufacturing line for manufacturing a flexible display as an electronic device is constructed. Examples of flexible displays include organic EL displays and liquid crystal displays. In the device manufacturing system 10, the substrate P is delivered from a supply roll (not shown) in which a flexible sheet-like substrate (sheet substrate) P is wound in a roll, and various processes are continuously applied to the delivered substrate P. After that, it has a so-called roll-to-roll (roll to roll) structure, in which the substrate P after various treatments is taken up by a recovery roll (not shown). Therefore, the substrate P after various processes is in a state in which a plurality of electronic devices are connected, and is a substrate for multiple chamfering. The substrate P sent from the supply roll is sequentially subjected to various processes by the process apparatus PR1, the exposure apparatus (drawing apparatus, pattern exposure apparatus) EX, the process apparatus PR2, etc., and is taken up by the collection roll. The substrate P has a band-like shape in which the moving direction of the substrate P is the longitudinal direction (long) and the width direction is the short direction (short).

  The X direction is a direction (transport direction) from the process apparatus PR1 to the process apparatus PR2 through the exposure apparatus EX in the horizontal plane. The Y direction is a direction orthogonal to the X direction in the horizontal plane, and is the width direction of the substrate P. The Z direction is a direction (upward direction) orthogonal to the X direction and the Y direction. The -Z direction is a direction in which gravity acts, and the + Z direction is a direction opposite to the direction in which gravity acts.

  As the substrate P, for example, a resin film, a foil made of metal or alloy such as stainless steel, or the like is used. The material of the resin film may be, for example, polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, polystyrene resin, and vinyl acetate resin. Among them, one including at least one or more may be used. The thickness and rigidity (Young's modulus) of the substrate P may be in such a range that the substrate P does not produce a fold or irreversible wrinkles due to buckling when passing through the transport path of the exposure apparatus EX. As a base material of the substrate P, a film of PET (polyethylene terephthalate) or PEN (polyethylene naphthalate) having a thickness of about 10 μm to 200 μm is a typical sheet substrate.

  Since the substrate P may receive heat in each process performed by the process device PR1, the exposure device EX, the process device PR2, etc., it is possible to select a substrate P of a material whose thermal expansion coefficient is not significantly large. preferable. For example, the thermal expansion coefficient can be suppressed by mixing the inorganic filler into the resin film. The inorganic filler may be, for example, titanium oxide, zinc oxide, alumina, or silicon oxide. The substrate P may be a single layer of ultrathin glass with a thickness of about 100 μm manufactured by the float method or the like, or a laminate obtained by bonding the above-mentioned resin film, foil or the like to this ultrathin glass. It may be

  By the way, the flexibility of the substrate P refers to the property that the substrate P can be bent without being sheared or broken even when the substrate P is subjected to a force of about its own weight. In addition, the property of being bent by the force of its own weight is also included in the flexibility. In addition, the degree of flexibility changes according to the material, size, thickness of the substrate P, layer structure formed on the substrate P, environment such as temperature, humidity, and the like. In any case, when the substrate P is properly wound around members for changing the transport direction such as various transport rollers and rotating drums provided in the transport path in the device manufacturing system 10 according to the first embodiment, If the substrate P can be transported smoothly without being bent and creased or broken (breaks or cracks occur), it can be said that the range is flexibility.

  The processing apparatus PR1 performs the processing of the previous step on the substrate P to be exposed by the exposure apparatus EX. The processing apparatus PR1 sends the substrate P subjected to the processing of the previous step toward the exposure apparatus EX. By the processing of this pre-process, the substrate P sent to the exposure apparatus EX is a substrate (photosensitive substrate) P having a photosensitive functional layer (photosensitive layer) formed on its surface.

  The photosensitive functional layer is applied as a solution on the substrate P and dried to form a layer (film). A typical photosensitive functional layer is a photoresist, but a photosensitive silane coupling agent (SAM) in which the lyophobic property of the portion irradiated with ultraviolet light is modified as a material that does not require development processing Or, there is a photosensitive reducing agent or the like in which the plating reducing group is exposed to the portion irradiated with the ultraviolet light. When a photosensitive silane coupling agent is used as the photosensitive functional layer, the portion exposed to ultraviolet light on the substrate P is reformed from lyophobic to lyophilic. Therefore, a pattern layer is formed by selectively applying a conductive ink (ink containing conductive nanoparticles such as silver or copper), a liquid containing a semiconductor material, or the like on the lyophilic portion. be able to. When a photosensitive reducing agent is used as the photosensitive functional layer, the plating reducing group is exposed on the portion of the substrate P exposed to the ultraviolet light. Therefore, after exposure, the substrate P is immediately immersed in a plating solution containing palladium ions or the like for a certain period of time, whereby a pattern layer of palladium is formed (deposited). Such a plating process is an additive process, but in addition, assuming that the etching process is a subtractive process, the substrate P sent to the exposure apparatus EX is made of PET or the base material. It may be PEN, on the surface of which a metal thin film such as aluminum (Al) or copper (Cu) may be deposited entirely or selectively, and further a photoresist layer may be laminated thereon.

  In the first embodiment, the exposure apparatus EX as a drawing apparatus is a direct drawing exposure apparatus that does not use a mask, that is, a so-called raster scan exposure apparatus, and the substrate P supplied from the process apparatus PR1 On the other hand, a predetermined pattern such as a circuit or wiring for display is drawn. The exposure apparatus EX scans the spot light SP of laser light (exposure beam) LB for exposure on the substrate P in a predetermined scanning direction (Y direction) in a one-dimensional direction while transporting the substrate P in the + X direction. At the same time, a predetermined pattern is drawn and exposed on the surface (photosensitive surface) of the substrate P by modulating (on / off) the intensity of the spot light SP at high speed according to the pattern data (drawing data). That is, the spot light SP is relatively two-dimensionally scanned on the substrate P by the conveyance of the substrate P in the + X direction and the scanning of the spot light SP in the scanning direction, and a predetermined pattern is drawn on the substrate P Be done.

  The process apparatus PR2 performs post-process processing (for example, plating processing, development / etching processing, cleaning, drying, and the like) on the substrate P exposed by the exposure apparatus EX. The pattern layer of the electronic device is formed on the substrate P by the subsequent process.

  Next, the exposure apparatus EX will be described in detail. The exposure apparatus EX is stored in the temperature control chamber ECV. By keeping the temperature control chamber ECV at a predetermined temperature, a shape change due to the temperature of the substrate P conveyed inside is suppressed. The temperature control chamber ECV is disposed on the installation surface E of the manufacturing plant via the passive or active vibration isolation units SU1 and SU2. The vibration isolation units SU1 and SU2 reduce the vibration from the installation surface E. The installation surface E may be a surface on the installation base or a floor. The exposure apparatus EX includes a substrate transport mechanism 12, a light source device (pulse light source device) 14, a light introducing optical system 16, an exposure head 18, a control device 20, and alignment microscopes AM (AM1 to AM3).

  The substrate transfer mechanism 12 transfers the substrate P transferred from the process device PR1 to the process device PR2 at a predetermined speed. The substrate transport mechanism 12 sequentially includes a drive roller NR1, an edge position controller EPC, a guide roller R1, a tension adjustment roller RT1, a rotating drum (cylindrical drum) DR, and a tension from the upstream side (-X direction side) in the transport direction of the substrate P. An adjustment roller RT2 and a guide roller R2 are provided.

  The drive roller NR1 transports the substrate P transported from the process device PR1 to the edge position controller EPC. The edge position controller EPC adjusts the position of the transported substrate P in the width direction (the Y direction and the short direction of the substrate P). That is, in the edge position controller EPC, the position at an end (edge) in the width direction of the substrate P being transported with a predetermined tension applied is approximately ± 10s of μm to several tens of μm with respect to the target position The position of the substrate P in the width direction is adjusted by moving the substrate P in the width direction by shifting the transport roller and the supply roll of the substrate P in the Y direction so as to fall within the range of (permissible range). The edge position controller EPC has an edge sensor (not shown) that detects the position of an end (edge) in the width direction of the substrate P. The edge position controller EPC has a drive roller NR2, and the drive rollers NR1 and NR2 give slack to the substrate P. The driving rollers NR1 and NR2 rotate while sandwiching the front and back sides of the substrate P, and transport the substrate P toward the rotating drum DR. The substrate P carried out of the edge position controller EPC is stretched along the longitudinal direction in the order of the guide roller R1 and the tension adjustment roller RT1, and then conveyed to the rotating drum DR. The drive rollers NR <b> 1 and NR <b> 2 rotate according to the control of the control device 20.

  The rotary drum DR has a central axis (rotational axis) AX extending in the Y direction (the width direction of the substrate P) and a cylindrical outer peripheral surface having a constant radius from the central axis AX, and follows the outer peripheral surface (cylindrical surface). The substrate P is transported in the + X direction while being rotated about the central axis AX while being supported by bending a part of the substrate P in the longitudinal direction. Accordingly, the rotary drum DR can move the substrate P relative to the exposure head 18 in the + X direction orthogonal to the scanning direction (Y direction) of the spot light SP. The rotary drum DR supports the substrate P over the approximately half circumferential surface of the outer circumferential surface on the + Z direction side. The rotary drum DR supports an area (portion) on the substrate P on which a predetermined pattern is exposed and an area (portion) on the substrate P imaged by the alignment microscope AM (AM1 to AM3) on its circumferential surface Do. To the central axis AX, rotational torque from a not-shown rotational drive source (for example, a motor, a speed reduction mechanism, etc.) controlled and driven by the control device 20 is given. For convenience, a plane passing through the central axis AX and parallel to the Z direction is referred to as a central plane C.

  The substrate P carried out of the rotary drum DR is stretched along the lengthwise direction in the order of the tension adjustment roller RT2 and the guide roller R2, and is then sent to the process device PR2. The tension adjustment rollers RT1 and RT2 apply a predetermined tension to the substrate P supported by being wound around the rotary drum DR. The tension adjustment rollers RT1 and RT2 are biased in the -Z direction.

  The light source device 14 has a light source (pulsed light source) 14a, and emits a pulsed laser light (pulsed light) LB. The laser beam LB is ultraviolet light having a peak wavelength in a wavelength band of 370 nm or less, and the oscillation frequency of the laser beam LB is Fe (Hz). The oscillation frequency Fe is set such that Fe> Vs / Ds, preferably Fe ≧ Vs, by the effective size Ds (μm) of the spot light SP on the substrate P and the scanning speed Vs (μm / sec). It is set to be 2 Vs / Ds (Hz). Further, a pulsed light source obtained by pulse oscillation of a semiconductor laser with a wavelength of about 800 nm to about 1000 nm at a frequency Fe such that the effective emission time Ts (seconds) of one pulse light is Ts <1 / 2Fe As seed light (seed light), amplified by an optical fiber amplifier, and output as pulse light of several tens of picoseconds to several picoseconds at a wavelength of 370 nm or less by a wavelength conversion element (harmonic conversion element) as laser light LB It may be a fiber laser light source. The laser beam LB emitted from the light source device 14 is guided to the light introducing optical system 16 and is incident on the exposure head 18.

  The exposure head 18 includes a plurality of drawing units U (U1 to U6) to which the laser light LB is incident, and is provided above the rotating drum DR (in the + Z direction). The laser beam LB from the light source device 14 is guided to a light introducing optical system 16 having a reflection mirror, a beam splitter and the like, and is incident on a plurality of drawing units U (U1 to U6) of the exposure head 18. The exposure head 18 draws a predetermined pattern on a part of the substrate P supported by the circumferential surface of the rotary drum DR by a plurality of drawing units U1 to U6. The exposure head 18 is a so-called multi-beam type exposure head by having a plurality of drawing units U1 to U6 having the same configuration. The odd-numbered drawing units U1, U3, and U5 are disposed on the upstream side (-X direction side) in the transport direction of the substrate P with respect to the central plane C, and the even-numbered drawing units U2, U4, and U6 are central planes It is disposed on the downstream side (+ X direction side) of the transport direction of the substrate P with respect to C. Thus, drawing exposure is performed first by the odd-numbered drawing units U1, U3, and U5, and then drawing exposure is performed by the even-numbered drawing units U2, U4, and U6. Although the number of drawing units U is six, the number of drawing units U may be one or three, and the number can be arbitrarily changed.

  The drawing unit U converges the incident laser beam LB on the substrate P to be a spot light SP, and the spot light SP is a predetermined scanning line (drawing line, drawing area) set on the surface of the substrate P While scanning along L, the intensity of the spot light SP irradiated onto the substrate P is modulated to on (high level) / off (low level or 0 level) according to the pattern data. Thereby, a linear pattern is drawn in the scanning line L. The scanning of the spot light SP is performed by, for example, a polygon mirror rotating under the control of the control device 20, and the intensity modulation of the spot light SP is, for example, an acoustooptic device (AOM switching the light path according to the control of the control device 20). Done by). Further, since the substrate P is transported in the + X direction, a two-dimensional pattern can be drawn and exposed on the substrate P by scanning the spot light SP a plurality of times. The traveling direction of the spot light SP irradiated onto the substrate P from each of the drawing units U (U1 to U6) is a direction that linearly advances toward the central axis AX of the rotary drum DR in the XZ plane. The drawing units U (U1 to U6) are set such that the lengths from the exit surface 22 of the terminal optical element of each drawing unit U (U1 to U6) to the central axis AX are the same. The emission surface 22 refers to the surface of the last optical element from which the laser beam LB is emitted.

The scanning lines L of the respective drawing units U are set to be joined together without being separated from each other in the Y direction (the width direction of the substrate P, the scanning direction) as shown in FIG. In FIG. 2, the scanning line L of the drawing unit U1 is represented by L1, and the scanning line L of the drawing unit U2 is represented by L2. Similarly, scan lines L of the drawing units U3, U4, U5, and U6 are represented by L3, L4, L5, and L6. As described above, each of the drawing units U shares a scanning area so as to cover the whole of the width direction of the exposure area W set on the surface of the substrate P in all of the drawing units U1 to U6. For example, assuming that the scanning width (the length of the scanning line L) in the Y direction by one drawing unit U is about 20 to 50 mm, three odd-numbered drawing units U1, U3, and U5 and even-numbered drawing By arranging a total of six drawing units U of three units U2, U4, and U6 in the Y direction, the width in the drawable Y direction is expanded to about 120 to 300 mm. The width (circumferential direction) of the scanning line L has a thickness corresponding to the size Ds (μm) of the spot light SP. For example, in the case where the size Ds (diameter) of the spot light SP is 3 μm at a width at which the maximum light intensity value (peak value) is half or at a level of 1 / e ² , the circumference of the scanning line L The width of the direction is also 3 μm.

  The scanning direction of the spot light SP of the laser light LB scanned along each of the odd-numbered scanning lines L1, L3, and L5 is a one-dimensional direction, and is the same. The scanning direction of the spot light SP of the laser light LB scanned along each of the even-numbered scanning lines L2, L4, and L6 is a one-dimensional direction, which is the same direction. The scanning direction of the spot light SP of the laser light LB scanned along the scanning lines L1, L3 and L5, and the scanning direction of the spot light SP of the laser light LB scanned along the scanning lines L2, L4 and L6 Are opposite to each other. More specifically, the scanning direction of the spot light SP of the laser light LB scanned along the scanning lines L1, L3, L5 is the + Y direction, and the laser light LB scanned along the scanning lines L2, L4, L6. The scanning direction of the spot light SP is the -Y direction. Thus, the drawing start positions of the scan lines L3 and L5 and the drawing start positions of the scan lines L2 and L4 are adjacent in the Y direction. Further, the drawing end positions of the scan lines L1, L3 and L5 and the drawing end positions of the scan lines L2, L4 and L6 are adjacent in the Y direction. The lengths of the scanning lines L1 to L6, that is, the lengths of the scanning distances of the spot lights SP of the drawing units U1 to U6 are the same.

  The drawing unit U is a known technique as disclosed in WO 2013/146184 (see FIG. 36), and thus the description of its specific configuration is omitted. The drawing unit U may draw a pattern using a mask. In that case, the mask may be either transmissive or reflective, and may be planar or cylindrical. Furthermore, in addition to the fixedly formed pattern on a flat substrate (or a cylindrical plate cylinder) which is a base material, the mask also includes a large number of micro mirrors (DMD; digital micro) which are two-dimensionally arrayed at a constant pitch. The mirror device or the micro shutter (LCD, MEMS) may be controlled to dynamically change the pattern drawn on the substrate P. As the micro shutter, for example, one disclosed in JP-A-6-120109 can be used.

  The alignment microscopes AM (AM1 to AM3) are for detecting alignment marks Ks (Ks1 to Ks3) formed on the substrate P as shown in FIG. 2, and three alignment microscopes AM (AM1 to AM3) are provided along the Y direction. ing. Detection regions Vw (Vw1 to Vw3) on the substrate P of the alignment microscope AM (AM1 to AM3) are on the circumferential surface of the rotating drum DR. The alignment mark Ks is a reference mark for relatively aligning (alignment) the pattern drawn in the exposure region W on the substrate P with the substrate P. That is, the position of the substrate P can be detected by detecting the alignment marks Ks (Ks1 to Ks3). The alignment marks Ks are formed on both ends in the width direction of the substrate P at regular intervals along the longitudinal direction of the substrate P and along the longitudinal direction of the substrate P, as shown in FIG. It is also formed at the center in the width direction of the substrate P between the rectangular exposure regions W and the exposure regions W arranged side by side. Note that, since the exposure head 18 repeatedly performs the pattern exposure for the electronic device on the substrate P, a plurality of exposure regions W are provided at predetermined intervals along the longitudinal direction of the substrate P.

  The alignment microscope AM (AM1 to AM3) projects the illumination light for alignment onto the substrate P, and images the reflected light with an imaging device such as a CCD, a CMOS or the like. The alignment microscope AM (AM1 to AM3) as the substrate position detection unit is provided on the upstream side (−X direction side) in the transport direction of the substrate P with respect to the spot light SP irradiated from the exposure head 18. Alignment microscope AM1 images alignment mark Ks1 formed at the end portion on the + Y direction side of substrate P present in detection area (detection field of view) Vw1, and alignment microscope AM2 is a substrate P existing in detection area Vw2. The alignment mark Ks2 formed at the end on the -Y direction side of the image sensor is imaged. Alignment microscope AM3 images alignment mark Ks3 formed in the width direction center of substrate P which exists in detection field Vw3. An imaging signal imaged by the alignment microscope AM (AM1 to AM3) is sent to the control device 20. The control device 20 detects the position of the alignment mark Ks (Ks1 to Ks3) by performing an image recognition process based on the sent imaging signal (image data). Note that the illumination light for alignment is light in a wavelength range that has little sensitivity to the photosensitive functional layer on the substrate P, for example, light with a wavelength of about 500 to 800 nm. The size of the detection area Vw (Vw1 to Vw3) on the substrate P is set according to the size of the alignment mark Ks (Ks1 to Ks3) and the alignment accuracy (position measurement accuracy), but is about 100 to 500 μm square. The size of

  Scale portions ES1 and ES2 are provided at both ends of the rotary drum DR. The scale portion ES1 is provided on the end side of the rotating drum DR in the + Y direction, and the scale portion ES2 is provided on the end side of the rotating drum DR in the -Y direction. The scale portions ES1 and ES2 are diffraction gratings in which concave or convex grating lines are formed at a constant pitch (for example, 20 μm) along the circumferential direction of the outer peripheral surface of the rotary drum DR, and are configured as incremental scale Ru. The scale portions ES1 and ES2 rotate integrally with the rotary drum DR around the central axis AX.

  An encoder head (not shown) that optically detects the rotational position of the rotary drum DR is disposed to face the scale portions ES1 and ES2. The encoder head irradiates a light beam for measurement toward the scale portions ES1 and ES2 and photoelectrically detects the reflected light velocity (diffracted light) according to the rotational position of the scale portions ES1 and ES2 in the circumferential direction. The detection signal is output to the control device 20. Thus, the encoder head can detect the rotation angle (rotational position) of the rotary drum DR.

  The substrate P is wound inside the scale parts ES1 and ES2 at both ends of the rotary drum DR, and the outer peripheral surface of the scale parts ES1 and ES2 and the outer peripheral surface of the substrate P wound around the rotary drum DR are coplanar (central axis The same radius is set from AX. Thereby, the encoder head can detect the scale portions ES1 and ES2 at the same radial position as the drawing surface on the substrate P wound around the rotary drum DR, and the measurement position and the processing position (the scanning position of the spot light SP, etc. The Abbe error that occurs due to the difference in the radial direction of the rotary drum DR can be reduced.

  As shown in FIG. 1, the exposure apparatus EX holds liquid LQ on the upper side of the rotary drum DR in order to perform in-liquid exposure to the substrate P wound around the upper half of the rotary drum DR. A holding unit LQP is provided. The liquid holding portion LQP is provided above the rotating drum DR (in the + Z direction), and is a first liquid so that a part of the surface of the substrate P supported by the rotating drum DR is immersed in the first liquid LQ1. Hold LQ1. The liquid holding unit LQP immerses, in the first liquid LQ1, the surface of the substrate P in an area (drawing area) to be drawn by at least a plurality of drawing units U (U1 to U6). A drying unit 24 is provided between the rotary drum DR and the tension adjustment roller RT2 for removing the liquid LQ adhering to the substrate P by blowing air for drying onto the substrate P and drying it. .

  FIG. 3 is a cross-sectional perspective view showing the configuration of the liquid holding portion LQP. The substrate P is conveyed in the + X direction by the rotation of the rotary drum DR while being in close contact with and supported by approximately half of the outer circumferential surface on the + Z direction side (upper side) of the rotary drum DR. The liquid holding portion LQP is supported above the substrate P by a static pressure gas bearing (air bearing) type or Bernoulli chuck type seal portion SEP provided at the bottom. Although the liquid holding portion LQP is supported above the substrate P by the seal portion SEP, the liquid holding portion LQP is supported by a support mechanism (not shown) for accurately maintaining the three-dimensional positional relationship between the liquid holding portion LQP and the rotary drum DR. The LQP may be supported above the substrate P (rotary drum DR).

  A fixed gap (gap) WS1 is formed at the bottom of the liquid holding portion LQP with respect to the surface of the substrate P (or the outer peripheral surface of the rotating drum DR) supported by the rotating drum DR and curved in a cylindrical shape. A cylindrical surface CU1 is provided. Therefore, the radius of curvature of the cylindrical surface (bottom surface of the liquid holding portion LQP) CU1 is set larger than the radius of curvature of the cylindrically curved substrate P (the radius of curvature of the outer peripheral surface of the rotary drum DR) by the gap WS1. Ru. The range (specific range) in which the cylindrical surface CU1 is formed covers all the scan areas (scan lines L1 to L6) on the substrate P where the spot light SP is scanned by the plurality of drawing units U (U1 to U6). It is set to. That is, the scanning line L (drawing area) in which the spot light SP is scanned by the plurality of drawing units U (U1 to U6) is included in the range (specific range) of the cylindrical surface CU1 along the outer peripheral surface of the rotating drum DR. It is done.

  The liquid holding unit LQP holds the first liquid LQ1 in the gap WS1 between the cylindrical surface CU1 and the substrate P. As a result, the first liquid LQ1 is held in the range (specific range) in which the cylindrical surface CU1 is formed, and the surface of the substrate P is immersed in the first liquid LQ1 within this specific range. Therefore, the surface on the substrate P on which the spot light SP is scanned along the scanning line L (L1 to L6) is in a state of being immersed in the first liquid LQ1. Further, since the first liquid LQ1 is held by the gap WS1 between the cylindrical surface CU1 and the substrate P, the liquid holding portion LQP is from the surface (or the outer peripheral surface of the rotating drum DR) of the substrate P curved in a cylindrical shape. The first liquid LQ1 can be held so as to have a predetermined thickness (constant) in the radial direction. Thus, even when the drawing units U1, U3, U5 and the drawing units U2, U4, U6 are provided along the rotational direction of the rotary drum DR, the laser beams emitted from the drawing units U1, U3, U5 It is possible to equalize the distance that LB passes through the first liquid LQ1 and the distance that the laser light LB emitted from the drawing units U2, U4, and U6 passes through the first liquid LQ1, and the pattern drawing accuracy is improved ((1) Uniformly stable). The gap WS1 differs depending on the lyophobic property of the surface of the substrate P and the cylindrical surface CU1, the type of the first liquid LQ1 to be held, the concentration, the viscosity, etc. Although it differs depending on whether the first liquid LQ1 is aqueous or oily (organic solvent type), when the first liquid LQ1 is aqueous, the first liquid LQ1 receives the action of gravity when the gap WS1 becomes 1 mm or less. The capillary phenomenon (or surface tension) tries to stay in the minute gap WS1. Therefore, when the gap WS1 is made small, there is also an advantage that the adjustment (control) for flowing the first liquid LQ1 filled in the gap WS1 in a predetermined state becomes easy.

  The seal portion SEP is provided at the bottom of the liquid holding portion LQP so as to surround the region where the liquid holding portion LQP holds the first liquid LQ1, that is, the specific range in which the cylindrical surface CU1 is formed. The seal portion SEP can seal the held first liquid LQ1 so as not to leak from the liquid holding portion LQP. That is, the seal part SEP prevents leakage of the first liquid LQ1 out of the specific range. More specifically, at both ends of the liquid holding portion LQP in the circumferential direction of the rotary drum DR, the seal portion SEP is provided at the bottom of the liquid holding portion LQP so as to extend in the Y direction. Further, although not shown, at both ends in the Y direction of the liquid holding portion LQP, the sealing portion SEP has the same curvature as the curvature of the cylindrically curved substrate P (the outer peripheral surface of the rotating drum DR) in the circumferential direction It is provided at the bottom of the liquid holding portion LQP so as to have an arc shape.

  In the liquid holding unit LQP, a plurality of laser beams LB emitted from the emission surface 22 of the terminal optical element of the plurality of drawing units U (U1 to U6) of the exposure head 18 are formed to be irradiated onto the substrate P The openings AH (AH1 to AH6) are provided. That is, the laser beam LB emitted from the drawing unit U6 reaches the substrate P through the opening AH6, and the laser beam LB emitted from the drawing unit U5 reaches the substrate P through the opening AH5. Similarly, the laser beam LB emitted from the drawing units U1 to U4 reaches the substrate P through the openings AH1 to AH4. In FIG. 3, only the openings AH5 and AH6 are shown. The plurality of drawing units U (U1 to U6) are arranged in two lines on the upstream side (−X direction side) and the downstream side (+ X direction side) of the transport direction of the substrate P with respect to the central plane C (central axis AX). Since they are arranged in a staggered arrangement, the openings AH (AH1 to AH6) corresponding thereto are also located upstream (−X direction side) and downstream of the transport direction of the substrate P with respect to the central plane C (central axis AX) They are arranged in a staggered arrangement in two rows on the side (+ X direction side).

  The openings AH (AH1 to AH6) are formed to penetrate the liquid holding portion LQP, and on the cylindrical surface CU1 side are formed of a transparent material for closing the openings of the openings AH (AH1 to AH6). A seal plate GS (GS1 to GS6) is provided. The seal plate GS6 closes the opening of the opening AH6, and the seal plate GS5 closes the opening of the opening AH5. Similarly, although not shown, the seal plates GS1 to GS4 close the openings of the openings AH1 to AH4. The seal plate GS may be a single plate closing the openings of all the openings AH (AH1 to AH6). The bottom surface (lower surface) of the seal plate GS (GS1 to GS6) constitutes a cylindrical surface (curved surface) CU1. That is, the seal plate GS is embedded in the cylindrical surface CU1 by the thickness of the seal plate GS such that the surface facing the rotary drum DR of the seal plate GS is a surface (flash surface) aligned with the cylindrical surface CU1. Alternatively, the sealing plate GS may be disposed on the cylindrical surface CU1 so as to close the opening AH without simply embedding the sealing plate GS. The seal plate GS transmits the laser beam LB emitted from the drawing unit U and seals the first liquid LQ1 held in the gap WS1 so as not to enter the opening AH. The seal plate GS has a transmittance of 90% or more in the wavelength range of ultraviolet light (laser light LB) for exposure, a thickness of about 100 to 50 μm, and a bendable minimum radius of curvature of about 10 cm. It is also good. The seal plate GS may be, for example, a thin glass plate that can be curved to a curvature of the cylindrical surface CU1 or less.

  The tip portion (including the terminal optical element) Ua of the drawing unit U (U1 to U6) may be inserted downward into the opening AH (AH1 to AH6). At this time, the tip end portion Ua is inserted into the openings AH (AH1 to AH6) so as not to contact with the seal plate GS (GS1 to GS6). In addition, the openings AH (AH1 to AH6) may hold the second liquid LQ2. Specifically, the second liquid LQ2 is held by the openings AH (AH1 to AH6) and the seal plate GS. In this case, the first liquid LQ1 and the second liquid LQ2 are separated by the seal plate GS. When the tip end portion Ua of the drawing unit U (U1 to U6) is inserted into the opening AH (AH1 to AH6), the opening AH (AH1 to AH6) is the terminal optical element of the drawing unit U (U1 to U6) The second liquid LQ2 may be held so that the ejection surface 22 of the second liquid LQ2 is immersed in the second liquid LQ2. Thereby, the laser beam LB emitted from the terminal optical element reaches the substrate P through the second liquid LQ2, the seal plate GS, and the first liquid LQ1 without passing through the air, so that the liquid is liquid When LQ1 and LQ2 are made of degassed ultrapure water or the like, there are advantages such as improvement in resolution (miniaturization of the size of the spot light SP) and enlargement of the depth of focus.

  A clearance WS1 is provided along the circumferential direction of the rotary drum DR (along the transport direction of the substrate P) between the openings AH1, AH3, AH5 and the openings AH2, AH4, AH6 of the liquid holding portion LQP. A liquid supply unit SUP is provided as a port for supplying one liquid LQ1. The liquid supply unit SUP is provided above the liquid holding unit LQP, and supplies the first liquid LQ1 held by the liquid holding unit LQP at a predetermined flow rate. The liquid supply unit SUP is provided on the central axis AX of the rotary drum DR in the XY plane, that is, on the central plane C. Thereby, the first liquid LQ1 can be supplied from the uppermost position of the rotary drum DR. A plurality of liquid supply units SUP are provided along the Y direction. The liquid supply unit SUP is connected to a liquid supply device (not shown) such as a pump that outputs the first liquid LQ1.

  The first liquid LQ1 present in the gap WS1 at both end portions of the liquid holding portion LQP in the circumferential direction of the rotary drum DR, that is, a liquid as a port for recovering the first liquid LQ1 held by the liquid holding portion LQP A recovery unit DRP is provided. A plurality of liquid recovery units DRP are provided along the Y direction. In the cylindrical surface CU1, groove portions DRC extending in the Y direction are provided at both end sides of the rotary drum DR in the circumferential direction and at positions adjacent to the seal portion SEP. A liquid recovery unit DRP is connected to the groove DRC. The groove portion DRC on the transport direction side (+ X direction side) of the substrate P is DRC1, and the groove portion DRC on the side (-X direction side) opposite to the transport direction of the substrate P is DRC2. The liquid recovery unit DRP is connected to a liquid suction device (not shown) that sucks the first liquid LQ1.

  The first liquid LQ1 supplied to the gap WS1 from the uppermost position of the rotary drum DR by the liquid supply unit SUP flows in the gap WS1 along the rotational direction (+ X direction) of the rotary drum DR according to gravity. The air flows in the gap WS1 along the direction (-X direction) opposite to the rotation direction of the rotary drum DR. The first liquid LQ1 having flowed along the rotational direction of the rotary drum DR reaches the groove DRC1 below the openings AH2, AH4, AH6 (seal plates GS2, GS4, GS6), and the rotary drum DR rotates. The first liquid LQ1 that has flowed in the direction opposite to the direction passes below the openings AH1, AH3, AH5 (seal plates GS1, GS3, GS5) and reaches the groove DRC2. The first liquid LQ1 having reached the groove portions DRC1 and DRC2 is discharged to the outside of the liquid holding portion LQP at a predetermined flow rate by the liquid recovery portion DRP.

  By having such a configuration, the flow rate, timing, interval, and the like of the first liquid LQ1 supplied from the liquid supply unit SUP and the first liquid LQ1 recovered by the liquid recovery unit DRP can be controlled. A state in which the inside of the gap WS1 surrounded by the seal portion SEP is filled with the first liquid LQ1 can be created, and a predetermined flow can also be created. In addition, since the first liquid LQ1 and the second liquid LQ2 are partitioned by the seal plate GS, the flow of the first liquid LQ1 does not affect the second liquid LQ2, and the first liquid It is possible to prevent the position of the end optical element of the drawing unit U (U1 to U6) from being shifted or vibrated by the flow of LQ1. Similarly, the influence of the flow of the second liquid LQ2 generated for any reason on the first liquid LQ1 can also be prevented.

  The first liquid LQ1 collected through the liquid recovery unit DRP may change in concentration or may be contaminated with impurities (such as dust), so removal of impurities and recovery of concentration may be performed. It is sent to the liquid regeneration (refresh) processing unit to be performed. The first liquid LQ1 refreshed to the predetermined state by the regeneration processing unit is again sent to the liquid supply unit SUP. By providing such a circulation system, the liquid to be treated as waste liquid can be reduced.

  FIG. 4 is a partial cross-sectional view of the liquid holding unit LQP. The seal portion SEP is a gas that supplies a gas for generating a static pressure gas layer (gas layer) between the surface CU2 facing the surface (pad surface, pad portion) CU2 facing the surface of the substrate P and the surface CU2. And a supply unit ARB. The inner end EG of the sealing portion SEP is formed in a sharp fin shape like a knife edge. The surface (cylindrical surface) CU2 of the seal portion SEP and the substrate P have a fixed gap (gap) WS2. That is, the curvature of the surface (curved surface) CU2 of the sealing portion SEP is the same as the curvature of the cylindrically curved substrate P (curvature of the outer peripheral surface of the rotating drum DR). The gap WS2 is extremely smaller than the gap WS1, and for example, is set to about several μm to about several tens of μm. Therefore, when the gas supply unit ARB supplies the gas to the gap WS2, the pressure of the gas in the gap WS2 becomes high, and the entry of the first liquid LQ1 from the end EG side to the gap WS2 is prevented. Thereby, the seal portion SEP can prevent the first liquid LQ1 from leaking from the liquid holding portion LQP by the air bearing method or the Bernoulli chuck method, and supports the liquid holding portion LQP on the rotating drum DR. can do. In addition, since the transport speed of the substrate P is 5 to 10 mm / sec, and at most several tens of mm / sec at the same time, the wettability of the surface of the substrate P is increased (when the liquid repellency is decreased) Also, if the surface CU2 of the seal portion SEP is made highly liquid repellent with respect to the first liquid LQ1, the intrusion of the first liquid LQ1 into the gap WS2 can be suppressed. Thus, the first liquid LQ1 can be continuously captured in the gap WS1 by the seal portion SEP. The gas supply unit ARB is connected to a gas supply device (not shown) such as a pump that outputs a gas (for example, compressed gas). In addition, the seal portion SEP prevents the first liquid LQ1 from leaking by the air bearing method or the Bernoulli chuck method by generating a static pressure gas layer, but the seal portion SEP may be a magnetic fluid seal. Good.

  The degree of liquid repellency of the surface of the substrate P to the first liquid LQ1 also differs depending on the coating layer formed on the surface of the substrate P. When a typical photoresist is used as a photosensitive coating layer (photosensitive functional layer) and pure water is used as the first liquid LQ1, a cylindrical surface CU1 facing the surface of the substrate P at the bottom of the liquid holding portion LQP The surfaces in the grooves DRC1 and DRC2 may be made of a metal surface (eg, titanium) or the like that is highly lyophilic to water. At the same time, it is preferable that the side of the seal plate GS in contact with the first liquid LQ1 be surface-processed so as to be lyophilic.

  Here, when a photoresist is used as the photosensitive film layer, pure water (pure water subjected to electrolytic treatment and degassing, the same applies hereinafter) as the first liquid LQ1 is held in the gap WS1. The pure water may be held as the second liquid LQ2 by the openings AH (AH1 to AH6). In this case, at least the exit surface 22 of the last optical element of the drawing unit U (U1 to U6) is immersed in the second liquid LQ2. As a result, the NA (numerical aperture) of the spot light SP irradiated to the substrate P is increased, so that the resolution is improved and the focal depth is expanded. Also in the case of using a film layer from which a portion irradiated with ultraviolet light collected with high NA is removed as the photosensitive film layer, similarly, the liquid holding portion LQP is the first and second liquid LQ1 of pure water, By holding LQ2, the portion irradiated with the laser beam LB (spot beam SP) can be removed. In this case, since the first liquid LQ1 held by the liquid holding unit LQP is supplied from the liquid supply unit SUP and collected by the liquid collection unit DRP, the first liquid LQ1 is removed by irradiation with the laser light LB (spot light SP) The removed material of the coated layer can be recovered by the liquid recovery unit DRP. Therefore, the first liquid LQ1 held by the liquid holding unit LQP can be kept clean. The refractive index of the exposure light (laser beam LB) of the first and second liquids LQ1 and LQ2 and the seal plate GS (GS1 to GS6) which are held to improve the resolution and expand the focal depth The refractive index needs to be the same or within a certain tolerance (for example, within ± 20%) as the refractive index of the end optical element of the drawing unit U.

  When a positive photoresist is used as the photosensitive film layer, the developer may be held in the gap WS1 as the first liquid LQ1. As a result, the portion irradiated with the laser beam LB (spot beam SP) by the drawing unit U (U1 to U6) is immediately dissolved by the developer (processing solution), so exposure of the substrate P and formation of a photoresist pattern It can be done at about the same time. Moreover, although the formation precision of the pattern of a photoresist deteriorates according to the elapsed time from the time of irradiation of laser beam LB (spot light SP), since exposure and formation of a pattern of a photoresist are performed at the substantially same time. The pattern of the photorest can be accurately formed. In addition, when forming the pattern of the photoresist by a developing solution, it is not necessary to hold | maintain 2nd liquid LQ2 by opening part AH (AH1-AH6). That is, the atmosphere (or nitrogen gas) may remain between the seal plate GS (GS1 to GS6) and each of the end optical elements of the drawing unit U (U1 to U6).

When a silane coupling agent having a plating reducing group is used as a photosensitive coating layer, a plating nucleus deposition solution (plating solution, processing solution, etc.) containing palladium ion (Pd ⁺ ) or the like as the first liquid LQ1 in the gap WS1 ) May be held. As a result, palladium is deposited on the portion irradiated with the laser beam LB (spot beam SP) by the drawing unit U (U1 to U6), so exposure of the substrate P and plating (deposition of a pattern) are substantially simultaneous. Can be done. In addition, although the deposition accuracy of palladium deteriorates according to the elapsed time from the irradiation time of the laser beam LB (spot beam SP), since the exposure and plating are performed at substantially the same time, the pattern is efficiently and accurately. It can be deposited. In addition, when depositing the pattern by a plating solution, it is not necessary to hold | maintain 2nd liquid LQ2 by opening part AH (AH1-AH6). When a silane coupling agent having a plating reducing group is used as the photosensitive film layer, the portion of the film layer not irradiated with the exposure light (laser beam LB) has liquid repellency to the first liquid LQ1. It will be relatively high.

  As described above, in the first embodiment, the liquid holding portion LQP has a predetermined thickness in the radial direction from the surface of the cylindrically curved substrate P supported by the outer peripheral surface of the rotary drum DR. 1 liquid LQ1 is held. Thereby, the laser beams LB emitted to the substrate P from the plurality of drawing units U arranged along the rotation direction of the rotary drum DR (the transport direction of the substrate P) have equal distances through the first liquid LQ1. And the pattern drawing accuracy can be improved. As a result, in-liquid exposure can be performed efficiently.

  In addition, since the liquid holding portion LQP has the sealing portion SEP that seals the held first liquid LQ1 so as not to leak, the first liquid LQ1 can be held above the rotating drum DR (in the + Z direction). it can. Since this seal portion SEP has a gas supply portion ARB that generates a static pressure gas layer between the substrate P and the bottom surface CU2 of the seal portion SEP, the seal portion SEP is a first air bearing type or Bernoulli chuck type. The liquid LQ1 can be prevented from leaking from the liquid holding portion LQP, and the in-liquid exposure can be efficiently performed above the rotary drum DR.

  Since the exposure apparatus EX includes the liquid supply unit SUP for supplying the first liquid LQ1 to the liquid holding unit LQP, and the liquid recovery unit DRP for collecting the first liquid LQ1 held by the liquid holding unit LQP, The first liquid LQ1 held by the liquid holding unit LQP can be kept clean. The liquid holding portion LQP separates the first liquid LQ1 and the second liquid LQ2 by the seal plate GS when holding the second liquid LQ2 in which the exit surface 22 of the last optical element of the drawing unit U is immersed. It is done. As a result, since the laser beam LB (spot beam SP) emitted from the emission surface 22 is irradiated to the substrate P without passing through the air, the resolution is improved, and the focal depth can be expanded. And, by making the refractive index of the first liquid LQ1, the second liquid LQ2 and the seal plate GS within the same or a certain allowable range as the refractive index of the terminal optical element, the resolution is improved and the depth of focus Will expand. Even when the liquid holding unit LQP does not hold the second liquid LQ2, exposure and development or plating can be performed substantially simultaneously by holding the developing solution or the plating solution as the first liquid LQ1. .

  The first liquid LQ1 supplied from the uppermost position of the rotary drum DR by the liquid supply unit SUP of the liquid holding unit LQ is in the gap WS1 according to the gravity in the + X direction side and the −X direction side And the flow is recovered by the liquid recovery unit DRP via the grooves DRC1 and DRC2 located below the liquid supply unit SUP, but the present invention is not limited thereto. For example, the first liquid LQ1 may be supplied from the groove DRC2 side so that the first liquid LQ1 flows in the same direction as the transport direction of the substrate P, and the first liquid LQ1 may be recovered on the groove DRC1 side. In this case, the liquid supply unit SUP provided between the openings AH1, AH3 and AH5 and the openings AH2, AH4 and AH6 becomes unnecessary, and instead, the first liquid LQ1 is supplied to the groove DRC2. A liquid supply unit SUP as a port is provided. The groove portion DRC1 is provided with a liquid recovery portion DRP as a port for recovering the first liquid LQ1 as it is. As described above, when flowing the first liquid LQ1 in one direction from the groove DRC2 toward the groove DRC1, for example, the state of plating deposition is adjusted by changing the flow velocity with respect to the transport speed of the substrate P. Is also possible.

  In addition, the first liquid LQ1 may be supplied from both the groove portions DRC1 and DRC2 and may be recovered in the liquid supply portion SUP in reverse flow. In this case, if microbubbles (small air bubbles) are mixed in the first liquid LQ1 supplied from the groove portions DRC1 and DRC2, the liquid supply portion SUP at the top is provided so as not to stay in the gap WS1. It can be discharged quickly. In this case, the port serving as the liquid supply unit SUP functions as a liquid recovery unit. In addition, when the exposure head 18 is disposed below the rotary drum DR and drawing exposure of a pattern is performed on the substrate P from the lower side, the liquid holding portion LQP is turned upside down and the lower side of the rotary drum DR It should be placed in

  Furthermore, in the first embodiment, as shown in FIG. 4 in particular, the first liquid LQ1 in contact with the surface of the substrate P is a cylindrical surface CU1 inside the liquid holding portion LQP and the surface of the substrate P (cylindrical surface The liquid layer can be stably held as a liquid layer defined by the thickness of the gap WS1 with the shape of the substrate P, and can be set to a relatively wide range of flow velocity without depending on the transport speed of the substrate P. In addition, when the first liquid LQ1 is a developer or plating solution, the amount used can be significantly reduced as compared with the conventional shower system or bath (pad) system development process or plating process, and further, It is also possible to miniaturize the waste liquid treatment equipment by using it together with the liquid regeneration processing unit.

Second Embodiment
In the second embodiment, an exposure apparatus EX for drawing and exposing a pattern on a substrate P from the lower side by providing the exposure head 18 below the rotary drum DR will be described. FIG. 5 is a view showing the arrangement of an exposure apparatus EX according to the second embodiment. The same components as those in the first embodiment are given the same reference numerals, and the description thereof is omitted. In addition, there is also a configuration in which the illustration is omitted for a configuration that is not necessary for describing the second embodiment.

  The substrate transport mechanism 12 has a drive roller NR1, an edge position controller EPC, guide rollers R11 to R17, and a rotary drum DR. The substrate P carried out of the edge position controller EPC is stretched along the longitudinal direction in the order of the guide rollers R11, R12, R13 and R14, so that it passes through the lower side (-Z direction) of the rotary drum DR and + X direction After going forward, the paper is conveyed from the rotary drum DR to the position in the + Z direction while going back in the -X direction, and is conveyed to the rotary drum DR. The substrate P is carried into the rotary drum DR from the + X direction and + Z direction side of the rotary drum DR. Thus, the substrate P, which has been transported from the process apparatus PR1 so that the photosensitive surface (the surface of the substrate P on which the photosensitive functional layer is formed) is on the upper side, has the photosensitive surface on the lower side on the rotating drum DR. It becomes. The rotary drum DR rotates around the central axis AX to transport the substrate P in the −X direction while supporting the substrate P over the approximately half circumferential surface of the outer circumferential surface on the −Z direction side (exposure head 18 side) . The rotating drum DR is an area (portion) on the substrate P on which a predetermined pattern is exposed by the drawing unit U (U1 to U6), and an area on the substrate P imaged by the alignment microscope AM (AM1 to AM3) The part is supported by its circumferential surface. The substrate P carried out of the rotary drum DR is stretched along the long direction in the order of the guide rollers R15, R16, R17, and advances in the + X direction through the upper side (+ Z direction) of the rotary drum DR. It is transported to the device PR2. Thereby, the substrate P can be carried into the process apparatus PR2 such that the photosensitive surface is on the upper side. Therefore, since the process apparatuses PR1 and PR2 of the device manufacturing system 10 only need to process the substrate P from the upper side (+ Z direction side) of the substrate P, each process with the process apparatuses PR1 and PR2 is easy to perform Become.

  The exposure head 18 is provided below the rotating drum DR (in the -Z direction), and each drawing unit U (U1 to U6) of the exposure head 18 directs the laser light LB (spot light SP) toward the substrate P from below. Irradiate. The odd-numbered drawing units U1, U3, and U5 are disposed on the + X direction side with respect to the center plane C, and the even-numbered drawing units U2, U4, and U6 are disposed on the −X direction side with respect to the center plane C. ing. Thus, drawing exposure is performed first by the odd-numbered drawing units U1, U3, and U5, and then drawing exposure is performed by the even-numbered drawing units U2, U4, and U6. Although the number of drawing units U is six, the number of drawing units U may be one or three, and the number can be arbitrarily changed. As in the first embodiment, the traveling direction of the spot light SP irradiated from the drawing unit U (U1 to U6) to the substrate P is linear toward the central axis AX of the rotating drum DR in the XZ plane. Direction to Further, each drawing unit U (U1 to U6) is set such that the lengths from the exit surface 22 of the terminal optical element of each drawing unit U (U1 to U6) to the central axis AX become the same distance. . The alignment microscopes AM (AM1 to AM3) are disposed upstream of the drawing units U1, U3, and U5 in the transport direction of the substrate P.

  Also in the second embodiment, the exposure apparatus EX includes a liquid holding unit LQPa that holds the liquid LQ. The liquid holding portion LQPa of the second embodiment holds the liquid LQ on the lower side of the rotary drum DR in order to perform in-liquid exposure to the substrate P wound around the lower half surface of the rotary drum DR. Do. The liquid holding portion LQPa is provided below the rotating drum DR (in the -Z direction), and holds the first liquid LQ1 for immersing a part of the surface of the substrate P supported by the rotating drum DR. The liquid holding portion LQPa has a box-like shape covering the entire lower part of the rotary drum DR, for example, a substantially semi-cylindrical shape obtained by cutting a cylindrical drum or the like at a plane parallel to the central axis. The drying unit 24 is provided between the guide rollers R15 and R16.

  FIG. 6 is a cross-sectional view showing the configuration of the liquid holding unit LQPa of the second embodiment. The liquid holding portion LQPa is fixedly supported below the substrate P (the rotating drum DR) by a support mechanism (not shown) for accurately maintaining the three-dimensional positional relationship between the liquid holding portion LQPa and the rotating drum DR. The substrate P is supported in close contact with about a half circumferential surface of the outer circumferential surface on the −Z direction side (lower side) of the rotary drum DR, and the −X direction from the + X direction side of the rotary drum DR by the rotation of the rotary drum DR. Towards the The liquid holding portion LQPa is curved in a circular arc (a part of a cylinder) in the XZ plane so as to face the outer peripheral surface of the rotary drum DR supporting the substrate P about half a circumference. The cylindrical surface CU1a is formed above the liquid holding portion LQPa so that a fixed gap (gap) WS1a is formed with respect to the surface (photosensitive surface side) of the substrate P supported by the rotary drum DR and curved in a cylindrical shape. It is provided. Therefore, the curvature of the cylindrically curved substrate P (curvature of the outer peripheral surface of the rotary drum DR) and the curvature of the cylindrical surface (upper surface of the liquid holding portion LQPa) CU1a are the same. The range (specific range) in which the cylindrical surface CU1a is formed is to cover all the scan areas (scan lines L1 to L6) on the substrate P on which the spot light SP is scanned by the plurality of drawing units U (U1 to U6). It is set. That is, the scanning line L (drawing area) in which the spot light SP is scanned by the plurality of drawing units U (U1 to U6) is included in the range (specific range) of the cylindrical surface CU1a along the outer peripheral surface of the rotating drum DR. It is done.

  The liquid holding unit LQPa holds the first liquid LQ1 in the gap WS1a between the cylindrical surface CU1a and the substrate P. Thereby, the liquid holding portion LQPa holds the first liquid LQ1 so as to have a predetermined thickness (constant thickness) in the radial direction from the surface (or the outer peripheral surface of the rotating drum DR) of the substrate P curved in a cylindrical shape. can do. Therefore, even when the drawing units U1, U3, U5 and the drawing units U2, U4, U6 are provided along the rotational direction of the rotary drum DR, the laser light LB emitted from the drawing units U1, U3, U5 Can equalize the distance through the first liquid LQ1 and the distance through which the laser light LB emitted from the drawing units U2, U4, and U6 passes through the first liquid LQ1, and improve the drawing accuracy of the pattern. Can. In addition, since the liquid holding portion LQPa is provided below the rotating drum DR (in the -Z direction), the first liquid LQ1 can be provided without providing the seal portion SEP as in the first embodiment. There is no leakage from the liquid holding portion LQPa.

  A plurality of liquid holding portions LQPa are formed such that the laser light LB emitted from the emission surface 22 of the last optical element of the plurality of drawing units U (U1 to U6) of the exposure head 18 is irradiated onto the substrate P. The openings AH (AH1 to AH6) are provided. The plurality of drawing units U (U1 to U6) are arranged in a staggered arrangement in two rows on the upstream side and the downstream side in the transport direction of the substrate P with respect to the central plane C (central axis AX). The openings AH (AH1 to AH6) are also arranged in a staggered arrangement in two rows on the upstream side and the downstream side in the transport direction of the substrate P with respect to the central plane C (central axis AX). The openings AH (AH1 to AH6) are formed to penetrate the liquid holding portion LQPa, and are formed on the cylindrical surface CU1a side with a transparent material for closing the openings of the openings AH (AH1 to AH6). A seal plate GS (GS1 to GS6) is provided. The seal plate GS may be embedded in the cylindrical surface CU1a by the thickness thereof so that the surface facing the rotary drum DR is a surface (flash surface) aligned with the cylindrical surface CU1a. The seal plate GS may be a single plate closing the openings of all the openings AH (AH1 to AH6).

  The tip portion (including the terminal optical element) Ua of the drawing unit U (U1 to U6) may be inserted into the opening AH (AH1 to AH6) from the lower side to the upper side. At this time, the tip end portion Ua is inserted so as not to be in contact with the seal plate GS (GS1 to GS6). Also, the opening AH (AH1 to AH6) holds the second liquid LQ2 so that the exit surface 22 of the last optical element is immersed in the state where the drawing unit U (U1 to U6) is inserted. Good. In this case, between the opening AH (AH1 to AH6) and the tip portion Ua of the drawing unit U (U1 to U6) so that the second liquid LQ2 does not leak from the opening AH (AH1 to AH6). A seal portion RS such as an O-ring or a magnetic fluid seal formed of a flexible resin or the like (for example, rubber) is provided.

  In the liquid holding unit LQPa, the first liquid LQ1 present in the gap WS1a on the + X direction side of the drawing units U1, U3, U5, that is, the first liquid LQ1 held by the liquid holding unit LQPa is specified. A liquid supply unit SUP is provided as a port for supplying a flow rate. In addition, the liquid holding unit LQPa is a liquid collection unit as a port for collecting the first liquid LQ1 held by the liquid holding unit LQPa at a predetermined flow rate on the -X direction side of the drawing units U2, U4, and U6. DRP is provided. Thus, by providing the liquid supply unit SUP and the liquid recovery unit DRP at positions on both sides in the circumferential direction of the rotary drum DR from the plurality of drawing units U (U1 to U6) of the liquid holding unit LQPa, at least a plurality of drawings The surface of the substrate P to which the spot light SP is irradiated by the unit U (U1 to U6) can be immersed in the first liquid LQ1. A plurality of liquid supply units SUP and liquid recovery units DRP are provided along the Y direction.

  The first liquid LQ1 supplied from the + X direction side of the drawing units U1, U3 and U5 by the liquid supply unit SUP flows along the transport direction (−X direction) of the substrate P, and the plurality of seal plates GS (GS1 The light is collected from the liquid recovery unit DRP through the upper side of ~ GS6) and released to the outside of the liquid holding unit LQPa. By having such a configuration, the flow rate, timing, interval, and the like of the first liquid LQ1 supplied from the liquid supply unit SUP and the first liquid LQ1 recovered by the liquid recovery unit DRP can be controlled. A state where at least the inside of the gap WS1a from the liquid supply unit SUP to the liquid recovery unit DRP can be filled with the first liquid LQ1 can be made.

  A dust collection for collecting mixed dust of the first liquid LQ1 between the openings AH1, AH3, AH5 and the openings AH2, AH4, AH6 on the central surface C of the liquid holding part LQPa A part GA is provided. The dust collection portion GA has a shape which is recessed in the −Z direction with respect to the cylindrical surface CU1a. Since the dust collection unit GA is provided on the central surface C, the dust collection unit GA is provided below the lowermost position of the rotary drum DR. Therefore, dust contained in the first liquid LQ1 and not collected by the liquid collection unit DRP is collected in the dust collection unit GA according to gravity due to its own weight. The bottom surface GAa of the dust collection unit GA can be opened and closed, and dust collected in the dust collection unit GA is periodically discharged from the bottom surface GAa.

  The supply port AP1 for supplying gas (compressed air) and the discharge port AP2 for discharging gas are close to positions on both sides in the circumferential direction of the rotary drum DR from the liquid supply unit SUP and the liquid recovery unit DRP of the liquid holding unit LQPa. Provided. The supply port AP1 blows a gas onto the substrate P to blow away dust or liquid (for example, the first liquid LQ1) attached to the substrate P, and the discharge port AP2 externally discharges the blown dust or liquid along with the gas To discharge. Thereby, dust and liquid adhering to the substrate P can be removed, and the surface of the substrate P can be cleaned.

As in the first embodiment, when a photoresist is used as the photosensitive film layer, pure water is held in the gap WS1a as the first liquid LQ1, and the openings AH (AH1 to AH6 are used. ) May hold pure water as the second liquid LQ2, and the exit surface 22 of the last optical element of the drawing unit U (U1 to U6) may be immersed in the second liquid LQ2. Also in the case of using a film layer from which a portion irradiated with ultraviolet light collected with high NA is removed as the photosensitive film layer, similarly, the liquid holding portion LQPa is the first and second liquid LQ1, which is pure water, By holding LQ2, the portion irradiated with the laser beam LB (spot beam SP) can be removed. When a photoresist is used as the photosensitive coating layer, the developer may be held in the gap WS1a as the first liquid LQ1. A photosensitive coating layer may be formed of a photosensitive silane coupling agent having a plating reducing group, and a plating nucleus deposition solution (plating solution) containing palladium ions (Pd ⁺ ) or the like may be used as the first liquid LQ1. The liquid holding unit LQPa may not hold the second liquid LQ2 when holding the developer and the plating solution.

  As described above, in the second embodiment, the liquid holding portion LQPa has a predetermined thickness in the radial direction from the surface of the cylindrically curved substrate P supported by the outer peripheral surface of the rotary drum DR. Since the liquid LQ1 of 1 is held, it is possible to equalize the distances of the laser light LB emitted to the substrate P from the plurality of drawing units U arranged along the rotation direction of the rotary drum DR (the transport direction of the substrate P). And the pattern drawing accuracy can be improved. As a result, in-liquid exposure can be performed efficiently.

  In the second embodiment, the liquid holding portion LQPa is provided below the rotary drum DR, and the liquid holding portion LQPa has a box shape covering the lower portion of the rotary drum DR. Even if the seal portion SEP described in the above is not provided, the held first liquid LQ1 does not leak from the liquid holding portion LQPa.

  The exposure apparatus EX includes the liquid supply unit SUP for supplying the first liquid LQ1 to the liquid holding unit LQPa and the liquid recovery unit DRP for collecting the first liquid LQ1 held by the liquid holding unit LQPa. The first liquid LQ1 held by the liquid holding unit LQPa can be kept clean. When holding the second liquid LQ2 in which the ejection surface 22 of the last optical element of the drawing unit U is immersed, the liquid holding portion LQPa divides the first liquid LQ1 and the second liquid LQ2 by the seal plate GS. It is done. As a result, since the laser beam LB (spot beam SP) emitted from the emission surface 22 is irradiated to the substrate P without passing through the air, the resolution is improved, and the focal depth can be expanded. Then, by setting the refractive index of the first liquid LQ1, the second liquid LQ2, and the seal plate GS within the same or a predetermined range as the refractive index of the terminal optical element, the resolution is improved and the focal depth is Expanding. Even when the second liquid LQ2 is not held, the liquid holding unit LQPa can perform exposure and development or plating substantially simultaneously by holding the developer or the plating solution as the first liquid LQ1. .

  Also in the second embodiment described above, as shown in FIG. 6 in particular, as in the first embodiment, the first liquid LQ1 in contact with the surface of the substrate P is a cylinder inside the liquid holding portion LQPa. A relatively wide range of flow velocity can be stably held as a liquid layer defined by the thickness of the gap WS1a between the surface CU1a and the surface (cylindrical surface) of the substrate P and without depending on the transport speed of the substrate P It can be set to Furthermore, when the first liquid LQ1 is a developer or plating solution, the amount used can be significantly reduced as compared with the conventional shower or bath (pad) type development processing or plating processing, and further, It is also possible to miniaturize the waste liquid treatment equipment by using it together with the liquid regeneration processing unit.

Third Embodiment
In the third embodiment, an exposure apparatus EX for drawing and exposing a pattern on a substrate P from the side by providing the exposure head 18 on the side (X direction) of the rotary drum DR will be described. FIG. 7 is a view showing the arrangement of an exposure apparatus EX according to the third embodiment. The same components as those in the first embodiment are given the same reference numerals, and the description thereof is omitted. In addition, there is also a configuration in which the illustration is omitted for the configuration which is not necessary for describing the third embodiment.

  The substrate transport mechanism 12 has an NR 1, an edge position controller EPC, guide rollers R 21 to R 26, and a rotary drum DR. The substrate P carried out of the edge position controller EPC is carried along the longitudinal direction in the order of the guide rollers R21 and R22, and carried in parallel to the X direction from the −X direction side to the upper part of the rotating drum DR. . The rotary drum DR rotates around the central axis AX while supporting the substrate P over the approximately half circumferential surface of the outer circumferential surface on the + X direction side (exposure head 18 side) and rotates the substrate P from the lower portion of the rotary drum DR. Transport in the -X direction side in parallel with the direction. The rotating drum DR is an area (portion) on the substrate P on which a predetermined pattern is exposed by the drawing unit U (U1 to U6), and an area on the substrate P imaged by the alignment microscope AM (AM1 to AM3) The part is supported by its circumferential surface. The substrate P carried out of the rotary drum DR is stretched along the long direction in the order of the guide rollers R23, R24, R25, R26, so that it passes through the lower side (-Z direction) of the rotary drum DR in the + X direction. Then, it is transported to the process device PR2.

  The exposure head 18 is provided on the right side (+ X direction side) of the rotary drum DR, and each drawing unit U (U1 to U3) of the exposure head 18 faces the substrate P from the right side (+ X direction side). It irradiates LB (spot light SP). In the third embodiment, the exposure head 18 has three drawing units U (U1 to U3). The plurality of drawing units U (U1 to U3) are arranged in a staggered arrangement in two columns, and the even-numbered drawing units U2 are arranged on the + Z direction side with respect to the odd-numbered drawing units U1 and U3. There is. Thus, drawing exposure is performed by the even-numbered drawing unit U2 first, and then drawing exposure is performed by the odd-numbered drawing units U1 and U3. The plurality of drawing units U (U1 to U3) are preferably arranged on the + Z direction side with respect to the central axis AX in the YZ plane. Although the number of drawing units U is three, the number of drawing units U may be one or six, and the number may be arbitrarily changed. The drawing units U (U1 to U3) are set such that the lengths from the exit surface 22 of the terminal optical element of each drawing unit U (U1 to U3) to the central axis AX become the same distance. The traveling direction of the spot light SP irradiated onto the substrate P from the drawing unit U (U1 to U6) is a direction that linearly advances toward the central axis AX of the rotary drum DR in the XZ plane.

  Also in the third embodiment, the exposure apparatus EX includes a liquid holding unit LQPb that holds the liquid LQ. The liquid holding portion LQPb of the third embodiment is provided on the right side of the rotating drum DR in order to perform in-liquid exposure with respect to the substrate P wound around about a half circumferential surface on the right side (+ X direction side) of the rotating drum DR. It is for holding the liquid LQ. The liquid holding portion LQPb is provided on the right side (+ X direction side) of the rotary drum DR, and holds the first liquid LQ1 for immersing a part of the surface of the substrate P supported by the rotary drum DR. The first liquid LQ1 discharged from the liquid holding unit LQPb is recovered by the recovery pallet unit LQE. The drying unit 24 is provided between the guide rollers R24 and R25.

  FIG. 8 is an external perspective view of the liquid holding portion LQPb and the recovery pallet portion LQE of the third embodiment, and FIG. 9 is an external appearance perspective view of the liquid holding portion LQPb as viewed from the rotary drum DR side (−X direction side). FIG. 10 is a partial cross-sectional view of the liquid holding portion LQPb, and FIG. 11 is an external perspective view of the recovery pallet portion LQE. As a rule, although it demonstrates using FIG. 8, the component which can not be demonstrated in FIG. 8 is referred to FIGS. 9-11.

  The liquid holding portion LQPb and the rotating drum DR are supported by a support mechanism (not shown) for accurately maintaining the three-dimensional positional relationship between the liquid holding portion LQPb and the rotating drum DR, and the recovery pallet portion LQE is also supported by the support mechanism. It is supported. The substrate P is conveyed horizontally in the + X direction, tightly wound about half a circumference along the outer peripheral surface from the upper side of the rotary drum DR, and conveyed in the −X direction from the lower side of the rotary drum DR. On both sides in the Y direction of the rotary drum DR, shafts Sf supported by bearings so as to rotate around the central axis AX are provided. In the first and second embodiments as well, the rotary drum DR similarly has the shaft Sf. On both ends in the Y direction of the outer peripheral surface of the rotary drum DR, flange portions FR having a diameter larger than that of the outer peripheral surface supporting the substrate P are provided over the entire periphery. The flange portion FR functions as a bank (seal member) that prevents the first liquid LQ1 from leaking in the Y direction.

  The liquid holding portion LQPb is curved in a circular arc (a part of a cylinder) in the XZ plane so as to be opposed to follow the outer peripheral surface of about half a circumference of the rotary drum DR supporting the substrate P. As shown in FIGS. 9 and 10, the surface (surface on the side in the −X direction) of the liquid holding portion LQPb facing the rotary drum DR is a surface of the substrate P curved in a cylindrical shape supported by the rotary drum DR. It is a cylindrical surface (curved surface) CU1b formed such that a fixed gap (gap) WS1b is formed with respect to the surface side). Accordingly, the curvature of the cylindrically curved substrate P (curvature of the outer peripheral surface of the rotary drum DR) and the curvature of the cylindrical surface CU1 b are the same. The range (specific range) in which the cylindrical surface CU1 b is formed is to cover all the scan areas (scan lines L1 to L3) on the substrate P where the spot light SP is scanned by the plurality of drawing units U (U1 to U3). It is set. That is, the scanning line L (drawing area) in which the spot light SP is scanned by the plurality of drawing units U (U1 to U3) is included in the range (specific range) of the cylindrical surface CU1b along the outer peripheral surface of the rotating drum DR. It is done.

  The liquid holding unit LQPb holds the first liquid LQ1 supplied from the liquid supply unit SUP with the gap WS1b between the cylindrical surface CU1b and the substrate P. Thereby, the liquid holding portion LQPb holds the first liquid LQ1 so as to have a predetermined thickness (constant thickness) in the radial direction from the surface (or the outer peripheral surface of the rotating drum DR) of the substrate P curved into a cylindrical surface. can do. Thereby, even in the case where the drawing units U1 and U3 and the drawing unit U2 are provided along the rotation direction of the rotary drum DR, the laser light LB emitted from the drawing units U1 and U3 forms the first liquid LQ1. It is possible to equalize the passing distance and the distance through which the laser beam LB emitted from the drawing unit U2 passes through the first liquid LQ1, and the drawing accuracy of the pattern can be improved. The gap WS1b may be narrowed as much as possible in consideration of reducing the usage amount (volume) of the liquid LQ held by the liquid holding portion LQPb and also when the working distance (working distance) of the drawing unit U is small. For example, it is set to 10 mm or less, preferably 5 mm or less. The working distance is a distance by which the laser beam LB emitted from the emission surface 22 of the tip optical element provided at the tip portion Ua of the drawing unit U reaches the substrate P.

  In terms of the design of the device, the gap WS1b is set so that the distance in the radial direction between the inner cylindrical surface CU1b of the liquid holding portion LQPb and the outer peripheral surface of the rotary drum DR is a constant value (Wsd). Assuming that the thickness of the substrate P is Tp, WS1b = WSd−Tp. The narrower the gap WS1b, the less the usage amount (substantial volume) of the first liquid LQ1 is economical, but if it is extremely narrowed, the average value of the thickness Tp of the substrate P and the thickness tolerance ΔTp This may cause the liquid layer to become extremely thin and to inhibit the free flow of the first liquid LQ1 in the space of the gap WS1b. Therefore, in consideration of the maximum value of thickness Tp of substrate P to be processed and thickness tolerance ΔTp, interval WSd is set to such an extent that first liquid LQ1 flows freely under the influence of gravity in the space of gap WS1b. That's good.

  Contrary to such a concept, free flow of the first liquid LQ1 in the space of the gap WS1b may be limited to some extent. The degree of liquid repellency (or lyophilicity) of each of the inner cylindrical surface CU1b of the liquid holding portion LQPb and the surface of the substrate P, and the kind and viscosity of the first liquid LQ1 are shown in FIGS. 8 and 9. In the case of the liquid holding portion LQPb, when the gap WS1b becomes, for example, 1 mm or less, the first liquid LQ1 in the space of the gap WS1b is retained in the space by capillary action (surface tension) even if it is affected by gravity. I will try. Even in such a case, in the present embodiment, since the first liquid LQ1 can be supplied from the liquid supply unit SUP at a predetermined pressure, a controlled flow of the first liquid LQ1 in the space of the gap WS1b can be obtained. It is possible to wake up. As described above, the first liquid LQ1 is made into a gap that allows the first liquid LQ1 to freely flow in the space of the gap WS1b under the influence of gravity, or a gap that still remains in the space of the gap WS1b even under the influence of gravity. The setting of the gap WS1 by the liquid holding portion LQP shown in FIG. 4 of the first embodiment or the setting of the gap WS1a by the liquid holding portion LQPa of the second embodiment shown in FIG. The same applies to the above, and any case may be applied.

  Now, on the inner side (rotary drum DR side) of both ends in the Y direction of the liquid holding portion LQPb, it is formed in an arc in the XZ plane so as to face the outer peripheral surface (cylindrical) FRa of the flange portion FR The sealed portion SEPb is provided. The sealing portion SEPb seals the first liquid LQ1 held by the liquid holding portion LQPb so as not to leak from both ends in the Y direction of the liquid holding portion LQPb. That is, the seal part SEPb prevents leakage of the first liquid LQ1 out of the specific range in the Y direction.

  As shown in FIGS. 9 and 10, the seal portion SEPb has a cylindrical curved surface (hereinafter, cylindrical surface) CU2b opposed to the outer peripheral surface FRa of the flange portion FR, and the cylindrical surface (pad surface, pad portion) The CU 2 b and the outer peripheral surface FRa of the flange portion FR have a fixed gap (gap) WS 2 b. That is, the curvature of the cylindrical surface CU2b of the seal portion SEPb is the same as the curvature of the outer peripheral surface FRa of the flange portion FR (the curvature of the outer peripheral surface of the rotary drum DR). As shown in FIG. 10, the cylindrical surface CU2b is formed to cover the outer peripheral surface FRa of the flange portion FR. The gap WS2b is extremely smaller than the gap WS1b, and is set to, for example, several μm to several tens of μm.

  Further, a jet port (gas (compressed gas) is supplied to the seal portion SEPb so that a static pressure gas layer (gas layer) is generated between the cylindrical surface CU2b and the outer peripheral surface FRa of the flange portion FR. A plurality of gas supply units) AS and a plurality of suction ports VA for suctioning the supplied gas are formed in the circumferential direction. Therefore, the pressure of the gas becomes high in the gap WS2b by the spout AS and the suction port VA, and the first liquid LQ1 can be sealed so as not to leak from the gap WS2b between the flange portion FR and the seal portion SEPb. . Thus, the seal portion SEPb can prevent the first liquid LQ1 from leaking from both ends in the Y direction of the liquid holding portion LQPb by the air bearing method or the Bernoulli chuck method. Further, as shown in FIG. 10, a plurality of ejection ports AS1 for ejecting high-pressure gas (compressed gas) toward the cylindrical surface CU1b on the inner side in the Y direction from the flange portion FR may be provided in the seal portion SEPb in the circumferential direction. . The jet port AS1 can further seal the first liquid LQ1 so as not to leak from the gap WS2b between the flange portion FR and the seal portion SEPb. The gas outlets AS, AS1 are connected to a gas supply device (not shown) such as a pump for outputting gas, and the suction port VA is connected to a gas suction device (not shown) such as a vacuum generator for suctioning gas.

  The static pressure gas layer formed by the seal portion SEPb may be formed on the side wall surface (surface parallel to the XZ plane) of the flange portion FR. Further, instead of the flange portion FR, a groove having a certain depth may be formed over the entire circumference of the outer peripheral surface of the rotary drum DR, and the seal portion SEPb may form a static pressure gas layer in this groove. Further, the seal part SEPb may be a magnetic fluid seal.

  A plurality of liquid holding portions LQPb are formed such that the laser light LB emitted from the emission surface 22 of the last optical element of the plurality of drawing units U (U1 to U3) of the exposure head 18 is irradiated onto the substrate P. The openings AHb (AHb1 to AHb3) are provided. That is, the laser beam LB emitted from the drawing unit U1 reaches the substrate P through the opening AHb1. Similarly, the laser light LB emitted from the drawing units U2 and U3 reaches the substrate P through the openings AHb2 and AHb3. Since the plurality of drawing units U (U1 to U3) are arranged in a staggered arrangement in two rows, the openings AHb (AHb1 to AHb3) are also arranged in a staggered arrangement in two rows correspondingly. The center lines LAX1, LAX2, LAX3 passing through the centers of the openings AHb1 to AHb3 indicate chief rays passing through the optical axis of the laser beam LB emitted from the drawing units U1 to U3 or the center of the drawing area. FIG. 10 shows a cross section of the liquid holding portion LQPb sheared in a plane passing through the central line LAX1 passing through the opening AHb1 and the central axis AX of the rotary drum DR.

  The openings AHb (AHb1 to AHb3) are formed to penetrate the liquid holding portion LQPb, and are formed on the cylindrical surface CU1b side with a transparent material for closing the openings of the openings AHb (AHb1 to AHb3). A seal plate GS (GS1 to GS3) is provided. The seal plate GS1 closes the opening of the opening AHb1, and similarly, the seal plates GS2 and GS3 close the opening of the openings AHb2 and AHb3. As shown in FIG. 10, the seal plate GS is embedded in the cylindrical surface CU1b by the thickness so that the surface facing the rotary drum DR of the seal plate GS is a surface (flash surface) aligned with the cylindrical surface CU1b. May be. The seal plate GS may be a single plate closing the openings of all the openings AHb (AHb1 to AHb3).

  In the opening AHb (AHb1 to AHb3), the tip portion (including the terminal optical element) Ua of the drawing unit U (U1 to U3) is inserted from the right (+ X direction) to the left (−X direction) (See FIG. 10). At this time, the tip end portion Ua is inserted into the openings AHb (AHb1 to AHb3) so as not to contact the seal plates GS (GS1 to GS3). Also, even if the opening AHb (AHb1 to AHb3) holds the second liquid LQ2 so that the exit surface 22 of the last optical element is immersed in the state where the drawing unit U (U1 to U3) is inserted. Good. In this case, as shown in FIG. 10, the tips of the openings AHb (AHb1 to AHb3) and the drawing unit U (U1 to U3) as shown in FIG. 10 so that the second liquid LQ2 does not leak from the openings AHb (AHb1 to AHb3). Between the portion Ua and the sealing portion RS such as an O-ring or a magnetic fluid seal formed of a flexible resin or the like (for example, rubber) is provided.

  A liquid supply unit SUP as a port for supplying the first liquid LQ1 at a predetermined flow rate to the upper end portion (+ Z direction side) of the liquid holding unit LQPb, and the first liquid LQ1 supplied from the liquid supply unit SUP A diffusion portion LQD for uniformly diffusing and flowing in the width direction of the substrate P is provided. In the upper part of the cylindrical surface CU1b of the liquid holding portion LQPb, as shown in FIG. 9, a slit-like nozzle (opening) LSH for supplying the first liquid LQ1 having flowed to the diffusion portion LQD to the gap WS1b is Y direction ( Many are provided along the axial direction of the central axis AX. From the plurality of nozzles LSH, the first liquid LQ1 is ejected at a uniform flow rate and supplied to the gap WS1b. The nozzle LSH is provided above the openings AHb (AHb1 to AHb3) (in the + Z direction).

  At the lower end portion (−Z direction side) of the liquid holding portion LQPb, a recovery slot portion (liquid recovery portion) LQS for recovering the held first liquid LQ1 is provided. In the recovery slot portion LQS, as shown in FIG. 9, the slot portion ST for discharging the first liquid LQ1 held by the liquid holding portion LQP downward (in the −Z direction) is in the Y direction (the central axis AX). (A plurality of axial directions). In addition, as shown in FIG. 9, the recessed portion BP is on the upper side (+ Z direction) of the recovery slot portion LQS and on both end sides in the Y direction of the lower side (−Z direction side) of the cylindrical surface CU1 b of the liquid holding portion LQPb. May be provided. The concave portion BP is recessed in the direction away from the outer peripheral surface of the rotary drum DR so that an edge portion EE inclined toward the center of the cylindrical surface CU1b in the Y direction as it goes downward (-Z direction) is formed. . The recessed portion BP can collect the first liquid LQ1 recovered by the recovery slot LQS on the center side of the gap WS1b in the Y direction. This utilizes the characteristic that the liquid tends to come closer to the narrower gap when the gap WS1b between the cylindrical surface CU1b of the liquid holding portion LQPb and the substrate P in the radial direction is narrowed to about 1 mm. Further, in this case, the cylindrical surface CU1b and the surface of the seal plate GS facing the rotary drum DR are subjected to surface treatment so as to be highly lyophilic with respect to the first liquid LQ1, and the concave portion BP is The liquid LQ1 may be coated with, for example, a fluorine-based thin film so as to be highly liquid repellent to the liquid LQ1.

  Note that, in FIG. 9, the recessed portion BP is formed on both end sides in the Y direction on the lower side (−Z direction side) of the cylindrical surface CU1 b of the liquid holding portion LQPb to recover the first portion by the recovery slot portion LQS. Liquid LQ1 is collected (centered) in the center in the Y direction on the lower side of the cylindrical surface CU1b, but depending on the degree of the gap WS1b between the cylindrical surface CU1b and the substrate P, the first configuration may be similarly applied. Liquid LQ1 can be centrally collected. For example, in the case of the dimension (for example, 2 mm or more) of the gap WS1b where the liquid flows freely due to the influence of gravity, it is difficult to collect the liquid LQ1 in the center in the Y direction in the concave portion BP as shown in FIG. Therefore, in such a case, a thin line having an upper end face such that the gap with the surface of the substrate P is 1 mm or less on the surface on the lower side (−Z direction side) of the cylindrical surface CU1b instead of the recess BP. Even if a plurality of protuberances (rims) are formed side by side in the circumferential direction so as to incline from the end in the Y direction of the cylindrical surface CU1b toward the center at the position of the edge EE in FIG. Good.

  The first liquid LQ1 supplied by the liquid supply unit SUP is supplied to the gap WS1b via the diffusion unit LQD and the plurality of nozzles LSH provided on the cylindrical surface CU1b, and the first liquid LQ1 is supplied by gravity or the first liquid supply unit SUP. The liquid LQ1 flows into the rotating drum DR in the -Z direction along the outer peripheral surface by the delivery pressure of the liquid LQ1. The first liquid LQ1 having flowed along the outer peripheral surface of the rotary drum DR passes between the seal plates GS1 to GS3 and the substrate P, and reaches the recovery slot LQS. Note that although part of the first liquid LQ1 supplied to the gap WS1b reaches the flanges FR on both sides but is sealed by the seal part SEPb, the first liquid LQ1 having reached the flanges FR on both ends Does not leak from both ends in the Y direction of the liquid holding portion LQPb. In addition, the first liquid LQ1 that flows downward from the top and reaches the recovery slot LQS by gravity or the delivery pressure of the liquid LQ1 has an edge EE with the recess BP or a plurality of linear protrusions (rim ) Is collected at the center of the recovery slot LQS in the Y direction. Then, the first liquid LQ1 having reached the recovery slot portion LQS flows into the plurality of slot portions ST provided along the Y direction, and is discharged downward through the plurality of slot portions ST. Accordingly, the first liquid LQ1 held by the liquid holding unit LQPb is collected by the collection slot LQS.

  An adjustable valve mechanism for adjusting the flow rate is provided in the slot portion ST of the recovery slot portion LQS, and control of the flow rate of the first liquid LQ1 flowing through the valve mechanism and the first liquid supplied from the nozzle LSH By balance with the control of the flow rate of LQ1, the flow rate of the first liquid LQ1 flowing from the top to the bottom in the gap WS1b may be controlled. Further, since the force in the direction of separating from the rotary drum DR (substrate P) also acts on the liquid holding portion LQPb by the pressure of the first liquid LQ1 in the gap WS1b, the liquid holding portion You may provide in the said support mechanism which supports part LQPb. The same applies to the first and second embodiments.

  Below the recovery slot portion LQS (in the -Z direction), a recovery pallet portion LQE for recovering the first liquid LQ1 recovered (discharged) by the recovery slot portion LQS is provided. The recovery pallet portion LQE has a dimension covering the entire width of the rotary drum DR in the Y direction, and remains on the substrate P or the rotary drum DR as well as the first liquid LQ1 flowing from the recovery slot portion LQS. Droplets and the like of the adhering first liquid LQ1 are also recovered.

  As shown in FIG. 11, the first liquid LQ1 flowing from the recovery slot portion LQS and the drops of the first liquid LQ1 remaining and attached to the substrate P are collected in a dust collection form. The first liquid LQ1 stored and stored on the bottom LQEa of the LQE is discharged from the discharge port DP. A high pressure gas (compressed gas, air jet) is jetted toward the substrate P and the rotary drum DR on the inclined wall portion LQEb on the −X direction side of the recovery pallet portion LQE, and remains on the substrate P and the rotary drum DR. A plurality of nozzles AN are provided in the Y direction to blow away the deposited droplets of the first liquid LQ1. As a result, the droplets of the first liquid LQ1 attached to the substrate P and the rotary drum DR are recovered by the recovery pallet unit LQE. A gas supply device (not shown) for supplying high pressure gas (compressed gas) is connected to the nozzle AN.

As in the first embodiment, when a photoresist is used as the photosensitive film layer, pure water is held in the gap WS1b as the first liquid LQ1, and the openings AHb (AHb1 to AHb3 are used. ) May hold pure water as the second liquid LQ2, and the exit surface 22 of the last optical element of the drawing unit U (U1 to U3) may be immersed in the second liquid LQ2. Also in the case of using a film layer from which a portion irradiated with ultraviolet light collected with high NA is removed as the photosensitive film layer, similarly, the liquid holding portion LQPb is the first and second liquid LQ1, which is pure water, By holding LQ2, the portion irradiated with the laser beam LB (spot beam SP) can be removed. When a photoresist is used as the photosensitive coating layer, a developer may be held in the gap WS1b as the first liquid LQ1. When the photosensitive film layer is formed of a photosensitive silane coupling agent having a plating reducing group, a plating nucleus deposition solution (plating solution) containing palladium ions (Pd ⁺ ) or the like may be used as the first liquid LQ1. . The liquid holding unit LQPb may not hold the second liquid LQ2 when holding the developer and the plating solution.

  Thus, in the third embodiment, the liquid holding portion LQPb has a predetermined thickness (gap WS1b) in the radial direction from the surface of the cylindrically curved substrate P supported by the outer peripheral surface of the rotary drum DR. Since the first liquid LQ1 is held as described above, the distances of the laser light LB emitted to the substrate P from the plurality of drawing units U arranged along the rotation direction of the rotary drum DR (the transport direction of the substrate P) It can be made equal and the drawing accuracy of a pattern can be improved. As a result, in-liquid exposure can be performed efficiently.

  In the third embodiment, the liquid holding portion LQPb is provided on the side (X direction) of the rotary drum DR, and the liquid holding portion LQPb causes the first liquid LQ1 to leak from both ends in the Y direction. Since the seal part SEPb to be prevented is provided, the first liquid LQ1 can be held on the side (X direction) of the rotary drum DR. Since this seal portion SEPb has the jet port AS that generates a static pressure gas layer, it is possible to prevent the first liquid LQ1 from leaking from both ends in the Y direction by the air bearing method or the Bernoulli chuck method. The in-liquid exposure can be efficiently performed on the side of the rotary drum DR.

  Since the exposure apparatus EX includes the liquid supply unit SUP that supplies the first liquid LQ1 to the liquid holding unit LQPb, and the collection slot unit LQS that collects the first liquid LQ1 held by the liquid holding unit LQPb, The first liquid LQ1 held by the liquid holding unit LQPb can be kept clean. The liquid holding portion LQPb separates the first liquid LQ1 and the second liquid LQ2 by the seal plate GS when holding the second liquid LQ2 in which the ejection surface 22 of the last optical element of the drawing unit U is immersed. It is done. As a result, the flows of the first liquid LQ1 and the second liquid LQ2 can be prevented from affecting each other. Further, since the laser light LB (spot light SP) emitted from the emission surface 22 is irradiated to the substrate P without passing through the air, the resolution is improved, and the focal depth can be expanded. And, by making the refractive index of the first liquid LQ1, the second liquid LQ2 and the seal plate GS within the same or a certain allowable range as the refractive index of the terminal optical element, the resolution is improved and the depth of focus Will expand. Even when the liquid holding unit LQPb does not hold the second liquid LQ2, exposure and development or plating can be performed substantially simultaneously by holding the developer or the plating solution as the first liquid LQ1. .

  Also in the third embodiment described above, as shown in FIG. 10, as in the first embodiment or the second embodiment, the first liquid LQ1 in contact with the surface of the substrate P is a liquid The liquid layer can be stably held as the liquid layer defined by the thickness of the gap WS1b between the inner cylindrical surface CU1b of the holding portion LQPb and the surface (cylindrical surface) of the substrate P, and without depending on the transport speed of the substrate P It can be set to a relatively wide range of flow rates. Furthermore, when the first liquid LQ1 is a developer or plating solution, the amount used can be significantly reduced as compared with the conventional shower or bath (pad) type development processing or plating processing, and further, It is also possible to miniaturize the waste liquid treatment equipment by using it together with the liquid regeneration processing unit.

[Modification]
The first to third embodiments may be modified as follows.

  Although the liquid holding portions LQP, LQPa, and LQPb are provided one around the rotary drum DR in the above-described embodiments, a plurality of liquid holders LQP, LQPa, and LQPb may be provided around the rotary drum DR. FIG. 12 shows an example in which a plurality of liquid holding portions LQP described in the first embodiment are provided around the rotary drum DR. Three liquid holding parts LQP are provided along the rotation direction of the rotary drum DR (along the conveyance direction of the substrate P), and for convenience, the three liquid holding parts LQP are provided upstream of the conveyance direction of the substrate P In order from the side, they are called LQP1, LQP2, and LQP3.

  The liquid holding unit LQP1 holds, for example, a developer as the first liquid LQ1. Therefore, the laser light (spot light SP) emitted from the tip end portion Ua of the plurality of drawing units U is irradiated to the surface of the substrate P through the first liquid LQ1 held by the liquid holding unit LQP1. Exposure and development can be performed substantially simultaneously. The first liquid LQ1, which is a developer, is supplied from the groove DRC2 and collected by the groove DRC1. The liquid holding unit LQP1 may hold the plating solution as the first liquid LQ1 instead of the developer. Thereby, exposure and plating can be performed substantially simultaneously.

  The liquid holding unit LQP2, for example, holds pure water as the first liquid LQ1, thereby cleaning the substrate P subjected to the exposure and development. That is, the liquid holding unit LQP2 holds the first liquid LQ1, which is pure water, to clean the substrate P, not the in-liquid exposure. Therefore, even if the liquid holding portion LQP2 is not provided with the opening AH and the seal plate GS provided so that the substrate P is irradiated with the laser beam LB (spot light SP) from the tip portion Ua of the drawing unit U. Good. The first liquid LQ1, which is pure water, is supplied from the groove DRC2 and collected by the groove DRC1.

  The liquid holding unit LQP3, for example, holds the gas, not the liquid LQ, to remove and dry the liquid (droplets, liquid film) attached to the surface of the cleaned substrate P. Therefore, even if the liquid holding portion LQP3 is not provided with the opening AH and the seal plate GS provided so that the substrate P is irradiated with the laser light LB (spot light SP) from the tip portion Ua of the drawing unit U. Good. The temperature-controlled gas, which is dry air, is supplied from the groove DRC2 and collected by the groove DRC1. By having such a configuration, processing such as exposure and development (or exposure and plating), washing, and drying can be performed on the rotating drum DR.

  The liquid holding unit LQPb described in the third embodiment may be used instead of the liquid holding units LQP1 and LQP3. Also, the liquid holding unit LQPa described in the second embodiment may be used instead of the liquid holding unit LQP2. Also, two or four or more liquid holding portions LQP, LQPa, LQPb may be provided around the rotary drum DR instead of three.

Further, in FIG. 12, for example, the liquid holding unit LQP1 holds ultrapure water as the first liquid LQ1, and dips the film layer of the photosensitive silane coupling agent having the plating reducing group on the surface of the substrate P. The exposure unit to be exposed and the liquid holding unit LQP2 hold a plating nucleus deposition solution (plating solution) containing palladium ions (Pd ⁺ ) etc. as the second liquid LQ2, and the area on the substrate P exposed by the exposure unit The plating processing unit for depositing palladium in a (processed region) according to the pattern, and the liquid holding unit LQP3 hold pure water (cleaning liquid) as the third liquid LQ3 and perform plating on the substrate P by plating. It may be a washing processing unit that removes the liquid. According to the configuration as shown in FIG. 12, in the state where the sheet-like substrate P is wound around the outer peripheral surface of one rotary drum DR, the exposure processing and the wet processing (development, electroless plating, cleaning, etc.) are sequentially performed It is possible to compact the series of process devices PR.

  In the case of development processing in which the liquid holding unit LQP1 holds a developer, the liquid holding unit LQP2 holds pure water for cleaning, and the liquid holding unit LQP3 holds a drying gas, a general liquid photoresist The developing time (dipping time in developing solution) depends on the layer thickness of the photoresist, but is about 10 seconds to 20 seconds when the layer thickness is 1 to several .mu.m. Therefore, when the transport speed of the substrate P is 5 mm / sec, the circumferential length (long circumferential distance) in which the liquid holding unit LQP1 holds the developer is about 5 to 10 cm. Furthermore, it is sufficient if the length of the circumferential direction in which the liquid holding portion LQP2 holds pure water for washing and the circumferential length in which the liquid holding portion LQP3 holds the drying gas are also about 10 cm (20 seconds). From this, in order to arrange the liquid holding portion LQP1, the liquid holding portion LQP2, and the liquid holding portion LQP3 over substantially a half of the lower side (gravity direction side) of the rotating drum DR as shown in FIG. The diameter of DR should be about 30 cm, which is a realistic value.

Fourth Embodiment
FIG. 13 is a perspective sectional view showing the configuration of the liquid holding portion LQPc according to the fourth embodiment, and here, as shown in FIGS. 5 and 6, the lower side of the rotary drum DR (the same as the direction of gravity -Z The liquid holding portion LQPc is arranged over about a half turn in the direction. FIG. 13 shows the liquid holding portion LQPc broken in parallel with the XZ plane at an appropriate position in the Y direction in which the rotation center AX extends. As in the case of FIGS. 5 and 6, on the inner side of the liquid holding portion LQPc, the transparent seal plates GS1, GS2, GS3 disposed between the tip portions Ua of the plurality of drawing units U and the substrate P. , ... are provided. In each of the embodiments described above, the sealing plates GS1, GS2, GS3,... Are thin glass plates curved in a cylindrical shape so as to be parallel to the surface of the curved substrate P. In the form of (1), a relatively thick parallel flat glass is used.

  Therefore, in the inner surface (surface in contact with the liquid LQ1) of the liquid holding portion LQPc, the area where the seal plates GS1, GS2, GS3 are provided is not a cylindrical surface but flat surfaces FS1, FS2. That is, the seal plates GS1, GS3,... Corresponding to the odd-numbered drawing units U1, U3,... Arranged in a line in the Y direction have the center lines LAX1, LAX3,. · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · It is fixed flush with a plane FS1 that is perpendicular to each of the two and parallel to the tangent plane of the cylindrical surface CU1b inside the liquid holding portion LQPc Similarly, the seal plates GS2,... Corresponding to the even-numbered drawing units U2,... Arranged in a line in the Y direction are perpendicular to the center line LAX2,. And, it is fixed to be flush with a plane FS2 parallel to the tangent plane of the cylindrical surface CU1b inside the liquid holding portion LQPc. However, the radial position of the flat surfaces FS1 and FS2 is set to be outside the radial position of the cylindrical surface (pad surface, pad portion) CU4b of the seal portion SEPd.

  An arc-shaped seal portion SEPd protruding in a rim shape in the radial direction is formed at both ends in the Y direction of the flat surfaces FS1 and FS2, and a cylindrical surface CU4b facing the central axis AX of the seal portion SEPd is for air bearing use. It is a pad surface. The planes FS1 and FS2 extend in the Y direction so as to be connected to the inner side surface SS of the seal portion SEPd, and the first liquid LQ1 flows over the seal portion SEPd to the outside of the liquid holding portion LQPc by the inner side surface SS. It is blocked so as not to go out. The cylindrical surface CU4b is set to face the surface near both ends in the Y direction (width direction) of the substrate P supported on the outer peripheral surface of the rotating drum DR, and between the cylindrical surface CU4b and the surface of the substrate P A static pressure gas layer of about several μm to several tens of μm is formed to prevent the liquid LQ1 exceeding the seal part SEPd from leaking to the outside of the liquid holding part LQPc. Therefore, in FIG. 13, the substrate P is transported in the −Z direction as indicated by the arrow Pi, and advances in a U-shape along the arc-shaped cylindrical surface CU4 b of the seal portion SEPd. The liquid LQ1 is held (filled) in a space (gap) surrounded by the substrate P curved along the cylindrical surface CU4b, and the cylindrical surface CU1b and the planes FS1 and FS2.

  The flange portion FRG (a rim-like portion protruding toward the center AX) located outside the seal portion SEPd with respect to the cylindrical surface CU1b holding the first liquid LQ1 and the flat surfaces FS1 and FS2 is the liquid LQ1. Temporarily traps the leaked liquid LQ1 and prevents it from falling outside the liquid holding portion LQPc when the static pressure gas layer formed on the surface CU4b of the sealing portion SEPd is leaked to the outside It is a bank for Therefore, a recovery port (opening) for recovering the leaked liquid LQ1 is also provided in the vicinity of the bottom of the flange portion FRG in the -Z direction.

  As described above, the surface in contact with the liquid LQ1 on the inner side of the liquid holding portion LQPc does not necessarily have to be a continuous cylindrical surface following the outer peripheral surface of the rotary drum DR, and is partially planar in the circumferential direction It is also good. That is, in the liquid holding portion LQPc in the present embodiment, not only the inner surface formed cylindrically in the circumferential direction with a predetermined gap in the radial direction from the outer peripheral surface of the rotary drum DR, but also the inner surface formed in a planar shape (FS1, FS2) may be continuous in the circumferential direction and may be an inner surface curved in a polygonal shape (a state in which two or more planes are connected at an angle). In addition, the entire inner surface (surface in contact with the liquid LQ1) of the liquid holding portion LQPc is flat only in a certain range in the circumferential direction, and the other portion is a cylindrical surface CU1b, but the curvature in the circumferential direction Since surfaces with different radii (one radius of curvature is finite and the other radius of curvature is infinite) are connected, they are called polygonal. Furthermore, the inner surface of the liquid holding portion LQPc may not have a cylindrical surface having a finite curvature radius, and may be in the form of a polyhedron in which all the surfaces are connected by a plurality of planes divided in the circumferential direction.

  Further, in the liquid holding portion LQPc of FIG. 13, the cylindrical surface CU4b of the sealing portion SEPd is installed to face the surface near both ends of the substrate P in the Y direction. A static pressure gas layer for preventing leakage of the liquid may be formed between the surface CU 4 b and the outer peripheral surface of the rotary drum DR so as to face the surface (near the end portion in the Y direction where the substrate P does not exist). Further, in FIG. 13, of the inner surface of the liquid holding portion LQPc, the portion where the planes FS1 and FS2 are formed is the portion where the flat seal plates GS1, GS2, GS3,. It is not necessarily limited to such a case. For example, also in the liquid holding unit LQP2 or the liquid holding unit LQP3 that performs only the liquid processing shown in FIG. 12, the inner surface (the surface in contact with the liquid) may be polygonal or polyhedral. In this case, since only the liquid processing is performed, the openings AHb1, AHBb2, AHb3,..., The seal plates GS1, GS2, GS3,. Further, in the modification, the liquid holding unit LQPc described in the fourth embodiment may be used.

DESCRIPTION OF SYMBOLS 10 ... Device manufacturing system 12 ... Substrate conveyance mechanism 14 ... Light source device 14a ... Light introduction optical system 18 ... Exposure head 20 ... Control device 22 ... Emitting surface 24 ... Drying unit AH, AH1-AH6, AHb, AHb1-AHb3 ... Openings AN, LSH ... Nozzles ARB ... Gas supply units AX ... Central axes CU1, CU1a, CU1b, CU2, CU2b, CU4b ... Curved surfaces DR ... Rotating drums DRC, DRC1, DRC2 ... Grooves DRP ... Liquid recovery unit EPC ... Edge position Controller ES1, ES2 Scale portion EX Exposure device FR, FRG Flange portion FS1, FS2 Plane GS, GS1 to GS6 Seal plate L, L1 to L6 Scan line LB Laser light LQ1 First liquid LQ2 Second liquid LQD: Diffusion part LQE: Recovery pallet part LQP, LQPa LQPb, LQPc, LQP1 to 3 ... Liquid holding part LQS ... Recovery slot part P ... Substrate PR1, PR2 ... Process device RS, SEP, SEPb, SEPd ... Seal part SP ... Spot light ST ... Slot part SUP ... Liquid supply part U, U1 to U6: Drawing unit Ua: Tip portion WS1, WS1a, WS1b, WS2, WS2b: Gap

Claims (9)

A pattern exposure method of exposing a pattern on the sheet substrate by irradiating irradiation light while conveying a long flexible sheet substrate in a longitudinal direction,
Gravity of gravity by a rotating drum having a central axis extending in a width direction orthogonal to the longitudinal direction of the sheet substrate and extending in a direction intersecting the direction of gravity, and a cylindrical outer peripheral surface having a constant radius from the central axis On the side opposite to the direction in which the roller works, a portion of the sheet substrate is curved and supported in the longitudinal direction according to the outer peripheral surface, and the rotary drum is rotated around the central axis to support the sheet substrate Conveying in the longitudinal direction;
The surface of the sheet substrate has a predetermined thickness within a specific range including an exposure region in which the sheet substrate is curved and supported by the rotating drum and in which the irradiation light is irradiated in the width direction of the sheet substrate. Holding the first liquid by the liquid holding portion while preventing leakage of the first liquid to the outside of the specific range by the seal portion so as to be immersed in the first liquid;
Exposing the pattern by irradiating the sheet substrate, which is immersed in the first liquid, with the irradiation light through the first liquid while the sheet substrate is conveyed by the rotation of the rotary drum; ,
Pattern exposure method, including: The pattern exposure method according to claim 1,
The pattern exposure method, wherein the seal portion is provided at the bottom of the liquid holding portion so as to surround the specific range in which the first liquid is held and to face the curved surface of the sheet substrate. The pattern exposure method according to claim 2,
A gas layer is formed between the curved surface of the sheet substrate and the bottom surface of the seal portion by an air bearing method or a Bernoulli chuck method, and the gas layer leaks the first liquid to the outside of the specific range. Prevent pattern exposure method. The pattern exposure method according to claim 1,
The pattern exposure method, wherein the seal portion is a magnetic fluid seal provided at the bottom of the liquid holding portion so as to surround the specific range in which the first liquid is held. The pattern exposure method according to any one of claims 1 to 4, wherein
The first liquid supplied from the liquid supply unit to the liquid holding unit and the flow rate of the first liquid collected from the liquid holding unit by the liquid recovery unit are controlled to be held by the liquid holding unit. A pattern exposure method of flowing the first liquid at a predetermined flow velocity along the circumferential direction of the curved surface of the sheet substrate while maintaining the first liquid at the predetermined thickness. The pattern exposure method according to claim 5,
The pattern exposure method which set said predetermined thickness of said 1st liquid hold | maintained by said liquid holding | maintenance part to several 10 micrometers-several mm. The pattern exposure method according to any one of claims 1 to 6, wherein
The liquid holding unit includes an opening through which the irradiation light travels from the exposure unit for exposing the pattern to the sheet substrate, and a seal plate made of a transparent material that transmits the irradiation light and blocks the opening. ,
The liquid holding portion holds the first liquid to be filled between the surface of the sheet substrate and the seal plate, and also fills the space between the exit surface of the last optical element of the exposure unit and the seal plate. Pattern exposure method, wherein the second liquid is held. The pattern exposure method according to any one of claims 1 to 6, wherein
The liquid holding portion is an inner cylindrical surface provided such that a gap corresponding to the predetermined thickness is formed from the surface of the sheet substrate which is supported by being curved in a cylindrical shape by the outer peripheral surface of the rotating drum. Have
The pattern exposure method, wherein the first liquid is filled in a gap between the inner cylindrical surface and the sheet substrate. The pattern exposure method according to any one of claims 1 to 6, wherein
A pattern exposure method, wherein the first liquid is any one of pure water, a developer and a plating solution.

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