JP6519694B2 - Device manufacturing method - Google Patents

Description

The present invention relates to a device manufacturing method.
Priority is claimed on Japanese Patent Application No. 2012-157810, filed Jul. 13, 2012, and Japanese Patent Application No. 2012-157811, filed Jul. 13, 2012, the contents of which are incorporated herein by reference. Is incorporated herein by reference.

  A precise exposure apparatus is widely used as a substrate processing apparatus for patterning electronic circuits such as semiconductor integrated devices and display panels. In general, the exposure apparatus optically transfers a pattern of an electronic circuit formed on a mask onto a photosensitive substrate such as a semiconductor wafer or a glass substrate via a projection optical system. The mask used there is usually a flat quartz plate on which a circuit pattern is formed of a light shielding material such as chromium. In a scanning type projection exposure apparatus, the mask is moved in one dimension and reciprocated to obtain photosensitivity. The substrate is moved step-and-scan to transfer the circuit pattern of the mask on the substrate in a matrix (two-dimensional) alignment.

  In such step-and-scan type projection exposure apparatus, it is known that throughput (productivity) can be increased by reducing the number of steppings (number of accelerations / decelerations of the movable stage moving the substrate). . Therefore, an exposure apparatus for achieving high throughput by preparing a reflective cylindrical mask and repeatedly arranging a plurality of circuit patterns in the circumferential direction of the cylindrical surface is described, for example, in Patent Document 1 below.

  On the other hand, in the field where large display panels are produced, a scanning exposure apparatus having a movable stage on which a large glass substrate (2 m × 2 m or more) is mounted and a large glass substrate are developed, etched, deposited. Are used, and various process devices and transport devices are used. The exposure apparatus, the process apparatus, and the transfer apparatus are not only extremely large and expensive, but also the total cost of manufacturing the display panel (expenses of various utilities associated with the operation of the apparatus, maintenance costs of a large clean room, It is difficult to suppress waste etc. due to the process of material disposal such as etching.

  Therefore, attention has been focused on a more resource-saving manufacturing method of printed electronics, which directly forms electronic circuits on flexible resin substrates and plastic substrates using high-precision printing technology. It is a technology. A method of manufacturing a display panel by an organic EL by a roll-to-roll method using this technology is described, for example, in Patent Document 2 below. In the roll-to-roll method, various processes are performed on the substrate along the transport path in which a flexible (flexible) long substrate (film) is drawn from the supply roll and wound up on the collection roll. is there.

  In addition, as a substrate processing apparatus such as an exposure apparatus, for example, as described in Patent Document 1 below, in order to improve throughput when continuously projecting and exposing a plurality of chip devices on a semiconductor wafer by a scan method In addition, an apparatus using a cylindrical rotating mask has been proposed. Further, as one of methods for manufacturing an electronic device such as a display panel or a solar cell, a roll-to-roll method as described in, for example, Patent Document 2 below is known. The roll-to-roll system is a system in which various processes are performed on a substrate on a transport path while transporting a flexible substrate such as a film from a delivery roll to a recovery roll.

WO 2008/029917 International Publication No. 2008/129819

  In the exposure apparatus disclosed in Patent Document 1, for example, a plurality of shot areas aligned in a line in the direction of scanning exposure can be collectively scanned and exposed on a substrate (wafer) while rotating a cylindrical mask. The number of steps is drastically reduced, and exposure processing with high throughput can be performed. However, in the projection optical system of the exposure apparatus disclosed in Patent Document 1, since the pattern formed on the outer peripheral surface of the cylindrical mask has a cylindrical shape, the quality (image quality) of the pattern image projected on the substrate is degraded. Or, the minimum line width that can be projected may be thick, and high precision (faithful) transfer may not be expected.

  Also, in the roll-to-roll method of manufacturing a display panel disclosed in Patent Document 2, when a high definition patterning can not be performed only by a printing method or an inkjet (droplet) method, an exposure apparatus is introduced. It will be. In that case, it is necessary to stably transport the flexible sheet substrate under the projection system. A powerful system for that purpose is, for example, a system in which the sheet substrate is wound around a part of the surface of the rotating drum while being tensioned in the longitudinal direction. Also in this method, since the pattern image of the mask by the projection system is projected onto the cylindrically curved sheet substrate, the quality (image quality) of the pattern image on the substrate may be similarly degraded or projected. The minimum line width may be too thick, and high precision (faithful) transfer may not be expected.

  Aspects of the present invention provide a device manufacturing method capable of exposing a projected image on a substrate with high precision in the projection of a pattern on a cylindrically curved mask surface or the projection of a pattern onto a cylindrically curved substrate. The purpose is to

  Further, the exposure apparatus as described above can perform efficient exposure processing by scanning and moving the substrate (wafer) in synchronization with the rotation while continuously rotating, for example, a mask pattern curved in a roll shape. . However, since the mask pattern is curved in a cylindrical surface, when a part of the mask pattern is projected onto a planar semiconductor wafer through a normal projection optical system, the quality of the projected image (distortion error, inequality There is a possibility that the lateral magnification error, the focus error, etc.) is reduced.

  Another object of the present invention is to provide a device manufacturing method capable of performing accurate projection exposure without degrading the quality of a projected image by using a curved mask pattern (cylindrical mask).

  According to a first aspect of the present invention, a drum mask holding a mask pattern for an electronic device is rotated around the first central axis along an outer peripheral surface having a constant radius from the first central axis, An image of the mask pattern is exposed by rotating a rotating drum supporting a sensitive substrate along a peripheral surface of a constant radius from a second central axis parallel to the central axis and rotating it about the second central axis. A device manufacturing method for transferring to the sensitive substrate via the projection system, the alignment characteristic of the illumination light irradiated to the illumination area on the outer peripheral surface of the drum mask by the illumination optical system of the exposure apparatus; The mask pattern generated from the illumination area by making it non-telecentric with respect to the circumferential direction of the outer peripheral surface and making it telecentric with respect to the direction in which the first central axis extends. Causing the reflected beam to enter the projection system in a telecentric state in each of the circumferential direction of the outer peripheral surface and the direction in which the first central axis extends, and the first projection of the projection system to receive the reflected beam. An image of the mask pattern is formed on an intermediate image plane by an optical system, and the reflected light flux reflected by a concave cylindrical surface mirror disposed at or near the position of the intermediate image plane is incident on the second of the projection system And projecting the image of the mask pattern formed on the intermediate image plane by a projection optical system onto the curved surface of the sensitive substrate.

  According to an aspect of the present invention, it is possible to provide a device manufacturing method capable of exposing a projection image on a substrate with high accuracy and efficiently exposing the image.

  Further, according to another aspect of the present invention, a device capable of projecting an image of a curved mask pattern with high quality, and capable of highly precise projection exposure when patterning a high definition, fine display device, etc. A manufacturing method can be provided.

It is a figure showing the device manufacturing system by a 1st embodiment. It is a schematic diagram for demonstrating the outline of the optical system of exposure apparatus. It is a figure which shows the light beam which injects into an illumination area | region, and the light beam radiate | emitted from an illumination area | region. It is a figure which shows the structure of a substrate processing apparatus (exposure apparatus). It is a figure which shows the structure from the light source to the 2nd aperture member of an illumination optical system. It is a figure which shows the structure of the 1st aperture member of an illumination optical system. It is a figure which shows the structure from the 1st aperture stop member of an illumination optical system to a light separation part. It is a figure which shows the structure from the 1st aperture stop member of an illumination optical system to a light separation part. It is a figure which shows the structure from the light separation part of an illumination optical system to the image surface of a projection optical system. It is a figure which shows the light separation part by 1st Embodiment. It is a figure which shows the light beam which injects into an illumination area | region, and the light beam radiate | emitted from an illumination area | region. It is a top view which shows the light beam radiate | emitted from an illumination area | region. It is a figure which shows the representative position of the illumination area | region referred by description of a spot. It is a figure which shows the spot in a 1st conjugate surface conjugate with a light source image. It is a figure which shows the structure of the substrate processing apparatus by 2nd Embodiment. It is a figure which expands and shows a part of optical system of exposure apparatus. It is a figure which shows the device manufacturing system by 3rd Embodiment. It is a schematic diagram for demonstrating the optical system of the exposure apparatus by 3rd Embodiment. It is a figure which shows the light beam which injects into an illumination area | region, and the light beam radiate | emitted from an illumination area | region. It is a figure which shows the structure of the substrate processing apparatus (exposure apparatus) by 3rd Embodiment. It is a figure which shows the structure of a equalization | homogenization optical system. It is a figure which shows the structure of a 1st aperture member. It is a figure which shows the structure from a 1st aperture stop member to a light separation part. It is a figure which shows the structure from a 1st aperture stop member to a light separation part. It is a figure which shows the structure of a light separation part. It is a figure which shows the light beam which injects into an illumination area | region, and the light beam radiate | emitted from an illumination area | region. It is a figure which shows the light beam radiate | emitted from an illumination area | region. It is a figure which shows the representative position of the illumination area | region referred by description of a spot. It is a figure which shows the spot in a 1st conjugate surface conjugate with a light source image. It is a figure which shows the optical path in a 1st projection optical system. It is a figure which shows the optical path in a 2nd projection optical system. It is a figure which shows the structure of the substrate processing apparatus (exposure apparatus) by 4th Embodiment. It is a figure which shows the optical path in an illumination optical system. It is a figure which shows the optical path in a 1st projection optical system. It is a figure which shows the optical path in a 2nd projection optical system. It is a flowchart which shows a device manufacturing method.

First Embodiment
FIG. 1 is a diagram showing a configuration according to an example of a device manufacturing system SYS (flexible display manufacturing line) of the present embodiment. Here, the flexible substrate P (sheet, film, etc.) pulled out from the supply roll FR1 sequentially passes through n processing apparatuses U1, U2, U3, U4, U5,. An example is shown until it is wound up to FR2.

  In the following description, the XYZ orthogonal coordinate system is set such that the front surface (or the back surface) of the substrate P is perpendicular to the XZ plane, and the width direction orthogonal to the transport direction (long direction) of the substrate P is the Y axis direction Shall be set to In the following description, the rotational direction around the X-axis direction is taken as the θX-axis direction, and similarly, the rotational directions around the Y-axis direction and the Z-axis direction are taken as the θY-axis direction and the θZ-axis direction.

  The substrate P wound around the supply roll FR1 is pulled out by the nipped drive roller DR1 and conveyed to the processing device U1. The center of the substrate P in the Y-axis direction (width direction) is servo-controlled by the edge position controller EPC1 so as to fall within a range of about ± dozen μm to several tens μm with respect to the target position.

  The processing device U1 is a printing method for photosensitive functional liquid (photoresist, photosensitive coupling material, photosensitive plating reducing agent, UV curing resin liquid, etc.) on the surface of the substrate P, and the transport direction of the substrate P (long direction) ) Is a coating device for applying continuously or selectively. In the processing unit U1, an impression cylinder roller DR2 around which the substrate P is wound, and on the impression cylinder roller DR2, a photosensitive functional liquid (sensitive functional liquid) is uniformly or partially applied to the surface of the substrate P A coating device Gp1 including a coating roller and the like, and a drying device Gp2 and the like for rapidly removing a solvent or moisture contained in the photosensitive functional liquid coated on the substrate P are provided.

  The processing unit U2 heats the substrate P transferred from the processing unit U1 to a predetermined temperature (for example, several tens of degrees C. to about 120 degrees C.) to form a photosensitive functional layer (sensitive functional layer) coated on the surface. It is a heating device for fixing stably. In the processing unit U2, a plurality of rollers and an air turn bar for conveying the substrate P back and forth, a heating chamber HA1 for heating the carried-in substrate P, and the temperature of the heated substrate P A cooling chamber portion HA2 for lowering the temperature to be in line with the environmental temperature of the post process (the processing unit U3 and the substrate processing unit), a nipped drive roller DR3 and the like are provided.

  The processing unit U3 (substrate processing unit) includes an exposure device, and corresponds to a circuit pattern or a wiring pattern for display with respect to the photosensitive functional layer (sensitive functional layer) of the substrate P transferred from the processing unit U2. UV patterning light is emitted. In the processing unit U3, an edge position controller EPC2 for controlling the center of the substrate P in the Y-axis direction (width direction) at a constant position, a nipped drive roller DR4, a substrate P at a position where the patterning light is irradiated A substrate support roll DR5 (substrate support member) for supporting the substrate P, and two sets of drive rollers DR6 and DR7 for giving a predetermined slack (play) DL to the substrate P are provided.

  In the processing unit U3, a reflective mask pattern M is formed on the cylindrical outer peripheral surface, and a drum mask DM which rotates around a center line parallel to the Y-axis direction and a mask pattern M of the drum mask DM are used. An image of a circumferential portion of the mask pattern M of the drum mask DM is projected onto a portion of the substrate P supported by the substrate support roll DR5 and an illumination unit IU for irradiating the slit-like exposure illumination light extending in the axial direction A projection optical system PL, and an alignment microscope AM for detecting an alignment mark or the like formed in advance on the substrate P in order to relatively align the image of a part of a pattern to be projected and the substrate P , Is provided.

  The processing unit U4 is a wet processing unit that performs at least one of various wet processing such as wet development processing, electroless plating processing, and the like on the photosensitive functional layer of the substrate P transferred from the processing apparatus U3. It is. In the processing unit U4, three processing tanks BT1, BT2 and BT3 hierarchized in the Z-axis direction, a plurality of rollers for bending and transporting the substrate P, and a drive roller DR8 nipped are provided. .

  The processing unit U5 is a heating / drying unit that warms the substrate P transferred from the processing unit U4 and adjusts the moisture content of the substrate P wet by a wet process to a predetermined value, but the details will be omitted. Thereafter, after passing through several processing devices, the substrate P which has passed through the last processing device Un of the series of processes is wound up on the recovery roll FR2 through the nipped drive roller DR9. The edge position controller EPC3 controls the drive roller DR9 and the recovery roll so that the center of the substrate P in the Y-axis direction (width direction) or the substrate end in the Y-axis direction does not vary in the Y-axis direction. The relative position of the FR 2 in the Y-axis direction is sequentially corrected and controlled.

  The upper control device CONT centrally controls the operation of each of the processing devices U1 to Un constituting the manufacturing line. The host controller CONT monitors the processing status and processing state of each processing unit U1 to Un, monitors the transport state of the substrate P between the processing units, and performs feedback correction and feedforward based on the result of the pre / post inspection and measurement. It also makes corrections.

  The substrate P used in the present embodiment is, for example, a flexible substrate such as a resin film, a foil made of metal or alloy such as stainless steel, or the like. The material of the resin film is, for example, one of polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, polystyrene resin, and vinyl acetate resin. Or 2 or more.

  It is desirable to select a substrate P whose thermal expansion coefficient is not significantly large so that the amount of deformation due to heat received in various processing steps can be substantially ignored. The thermal expansion coefficient may be set smaller than the threshold according to the process temperature or the like, for example, by mixing an inorganic filler into the resin film. The inorganic filler may be, for example, titanium oxide, zinc oxide, alumina, silicon oxide or the like. The substrate P may be a single layer of ultrathin glass with a thickness of about 100 μm manufactured by the float method or the like, or a laminate obtained by bonding the above-mentioned resin film, foil or the like to this ultrathin glass. It may be In addition, the substrate P is obtained by modifying and activating the surface in advance by a predetermined pretreatment, or by forming a fine partition structure (concave and convex structure) for precise patterning on the surface by an imprinting method May be.

  The device manufacturing system SYS of the present embodiment repeatedly or continuously executes various processes for manufacturing a device (display panel or the like) on the substrate P. The substrate P on which various processes have been performed is divided into devices (dicing) to become a plurality of devices. The dimensions of the substrate P are, for example, about 10 cm to 2 m in the width direction (the short Y-axis direction), and 10 m or more in the length direction (the long X-axis direction). 10 cm or less may be sufficient as the dimension of the width direction (Y-axis direction which becomes short) of the board | substrate P, and 2 m or more may be sufficient as it. The dimension of the substrate P in the longitudinal direction (long X axis direction) may be 10 m or less.

  Next, the principle of exposure by the processing apparatus U3 (exposure apparatus EX, substrate processing apparatus) will be described. FIG. 2 is a schematic view for explaining a schematic configuration of an optical system of the exposure apparatus EX. FIG. 3 is an explanatory view showing the state of the luminous flux incident on the illumination area IR and the luminous flux emitted from the illumination area IR.

  The exposure apparatus EX shown in FIG. 2 includes a drum mask DM, an illumination optical system IL, a projection optical system PL, a light separation unit 10, and a deflection member 11. The drum mask DM has a cylindrical outer peripheral surface (hereinafter referred to as a cylindrical surface 12), and is formed by curving the reflective mask pattern M along the cylindrical surface 12. The cylindrical surface 12 is a surface curved at a predetermined radius around a predetermined center line, and is, for example, at least a part of the outer circumferential surface of a cylinder or a cylinder. The drum mask DM is rotatable around a rotation center axis AX1 (center line).

  The illumination optical system IL epi-illuminates the illumination area IR on the mask pattern M held by the drum mask DM with the illumination light L1 through a part of the projection optical system PL. The illumination optical system IL includes a first optical system 13 for forming a light source image L0 serving as a source of illumination light L1, and a second optical system 14 which also serves as a part of the projection optical system PL (whose optical axis is 14a). And. The illumination light L1 from the light source image L0 is incident on the second optical system 14 through the passage portion 15 of the light separation portion 10 made of a glass material which is a base material of the concave mirror disposed on the pupil plane of the projection optical system PL. After being deflected at the upper reflection plane of the deflection member 11 through the second optical system 14, the illumination area IR is irradiated. The projection optical system PL includes a light separation unit 10, and a second optical system (optical system) 14 disposed in the light path between the light separation unit 10 and the illumination region IR.

  Although the details will be described later, in the light separation unit 10, the upper half from the optical axis 14a in FIG. 2 is a passage unit (transmission unit) 15, and a light source image L0 (for example, a large number of points formed by A collection of light source images is formed. Alternatively, in FIG. 2, the lower half from the optical axis 14 a of the light separating portion 10 is a concave reflecting portion 16.

  The projection optical system PL (including the second optical system 14) projects the reflected light flux generated in the illumination area IR toward the substrate P, thereby a part of the image of the mask pattern M appearing in the illumination area IR being the substrate Project to P. In the following description, a light flux generated from the mask pattern M and projected onto the substrate by the irradiation of the illumination light L1 is appropriately referred to as an imaging light flux L2.

  The imaging light beam L2 generated in the illumination area IR is deflected by the upper reflection plane of the deflection member 11, enters the second optical system 14, passes through the second optical system 14, and is reflected by the reflection unit 16 of the light separation unit 10. After reflection, it passes through the second optical system 14 again to reach the lower reflection plane of the deflection member 11. The imaging light beam L2 reflected by the lower reflection plane of the deflecting member 11 forms an intermediate image Im corresponding to a part of the mask pattern M appearing in the illumination area IR at a position conjugate with the illumination area IR. The intermediate image Im is re-imaged on the substrate P by a projection optical system (indicated by reference numeral PL2 in FIG. 4) disposed thereafter.

  By the way, since the illumination area IR is curved in a cylindrical surface as shown in FIG. 3, the incident angle of the chief ray L1a of the illumination light L1 to the illumination area IR is the incidence of the chief ray L1a in the circumferential direction of the cylindrical surface 12. Make it different depending on the position. This is to make the principal rays L2a of the imaging light beam L2 generated from the illumination area IR parallel to each other in a plane perpendicular to the rotation center axis AX1.

  In the present embodiment, the illumination optical system IL sets the chief ray L1a in a plane perpendicular to the rotation center axis AX1 so that the respective chief rays L2a of the imaging light beam L2 are in a state close to parallel (telecentric state). The non-parallel illumination light L1 is configured to illuminate the illumination region IR. That is, the illumination optical system IL is configured such that the illumination light L1 incident on the illumination region IR is non-telecentric so as to make the incident side of the imaging light beam L2 into the projection optical system PL telecentric.

  In order to obtain such an illumination state, each principal ray L1a of the illumination light L1 converges at an intermediate position between the cylindrical surface 12 and the rotation center axis AX1 (near the position of 1/2 of the radius of the cylindrical surface 12) Set to Therefore, the intermediate position is a position conjugate with the pupil plane of the illumination optical system IL (the passage portion 15 of the light separation unit 10 in FIG. 2).

  Further, the traveling direction of each chief ray L2a of the imaging light beam L2 in a plane perpendicular to the rotation center axis AX1 is, for example, a line connecting the generation position of each chief ray L2a on the illumination region IR and the rotation center axis AX1 It is set to be inclined with respect to the radial direction). This is because, as shown in FIG. 2, it is necessary to separate the illumination light L1 and the imaging light flux L2 at the position of the light separation unit 10, with the optical axis 14a interposed therebetween. Therefore, as shown in FIG. 2, the traveling direction of each principal ray L2a of the imaging light beam L2 in a plane perpendicular to the rotation center axis AX1 is a plane perpendicular to the optical axis 14a of the second optical system In this plane (paper surface), it is inclined at a certain angle with respect to the vertical).

  Next, the configuration of the processing device U3 (exposure device EX) will be described in more detail. FIG. 4 is a view showing the arrangement of the exposure apparatus EX. The exposure apparatus EX holds a mask pattern M and rotates a drum mask DM (mask holding member) rotatable around a rotation center axis AX1 and a rotating drum supporting a substrate P and rotatable around a rotation center axis AX2. And DP (substrate support member). The illumination optical system IL illuminates the illumination area IR on the mask pattern M held by the drum mask DM with Koehler illumination with uniform brightness.

  The projection optical system PL projects a portion of the mask pattern M (in the illumination area IR) by projecting the imaging light beam L2 generated from the illumination area IR toward the projection area PR on the substrate P supported by the rotating drum DP. ) Is formed on the substrate P.

  The projection optical system PL shown in FIG. 4 includes a first projection optical system PL1 that forms an intermediate image Im of the mask pattern M in the illumination region IR, and a second projection optical system PL2 that projects the intermediate image Im onto the substrate P. Equipped with The first projection optical system PL1 and the second projection optical system PL2 shown in FIG. 4 are, for example, half-image field type reflection mirrors obtained by dividing a circular image field by upper and lower reflection planes of a prism mirror (deflection members 11 and 35). It is configured telecentric as a sexual projection optical system.

  The exposure apparatus EX is a so-called scanning exposure apparatus, and the image of the mask pattern M held on the drum mask DM is rotated by rotating the drum mask DM and the rotating drum DP synchronously at a predetermined rotational speed ratio. Is continuously and repeatedly exposed on the surface of the substrate P (curved surface along the cylindrical surface) supported by the.

  The drum mask DM is a cylindrical or cylindrical member, and the reflective mask pattern M may be formed along the outer circumferential surface (cylindrical surface 12) of the drum mask DM.

  The mask pattern M is formed as, for example, a sheet-like mask in which a highly reflective metal film deposited on a flexible glass sheet having a thickness of about 100 μm is patterned, and wound around the outer peripheral surface of the drum mask DM. Alternatively, the drum mask DM may be exchangeably attached to the drum mask DM.

  The rotary drum DP (substrate support roll DR5 in FIG. 1) is a cylindrical or cylindrical member, and the outer peripheral surface thereof is cylindrical. The substrate P is supported by the rotating drum DP, for example, by being wound around a part of the outer peripheral surface of the rotating drum DP. A projection area PR on which an image of the mask pattern M is projected is disposed in the vicinity of the outer peripheral surface of the rotary drum DP.

  The substrate P may be supported by being suspended by a plurality of transport rollers, and in this case, the projection area PR may be disposed between the plurality of transport rollers.

  The exposure apparatus EX has, for example, a drive unit for rotating and driving the drum mask DM and the rotating drum DP, a detecting unit for detecting the positions of the drum mask DM and the rotating drum DP, the drum mask DM and the rotating drum DP, for example. And a controller for controlling each part of the exposure apparatus EX.

  The control unit of the exposure apparatus EX synchronously rotates the drum mask DM and the rotating drum DP at a predetermined rotational speed ratio by controlling the drive unit based on the detection result of the detection unit. Further, the control unit controls the moving unit based on the detection result of the detection unit to adjust the relative position of the drum mask DM and the rotating drum DP.

  The illumination unit IU shown in FIG. 1 includes the light source 20 shown in FIG. 4 and the first optical system 13 of the illumination optical system IL. The first optical system 13 of the illumination optical system IL forms a light source image L0 which is a source of the illumination light L1 by the light emitted from the light source 20, and makes the light intensity distribution of the illumination light L1 uniform.

  The light source 20 includes, for example, a lamp light source such as a mercury lamp, or a solid light source such as a laser diode or a light emitting diode (LED). The illumination light L1 emitted from the light source 20 is, for example, a bright line (g line, h line, i line), far ultraviolet light (DUV light) such as KrF excimer laser light (wavelength 248 nm), ArF excimer laser light (wavelength 193 nm) Etc.

  FIG. 5 is a view showing a configuration from the light source 20 shown also in FIG. 4 to the second diaphragm member 26 of the illumination optical system IL. The first optical system 13 shown in FIG. 5 includes an input lens 21, a fly's eye lens 22, a first diaphragm member 23, a relay lens 24, a cylindrical lens 25, and a second diaphragm member 26.

  The input lens 21 is disposed at a position where the illumination light L1 emitted from the light source 20 is incident. The input lens 21 condenses the illumination light L 1 so as to be contained in the incident end face 22 a of the fly's eye lens 22. The fly's-eye lens 22 has a plurality of lens elements 22 b two-dimensionally arranged in a plane orthogonal to the optical axis of the input lens 21.

  The fly's eye lens 22 spatially divides the illumination light L1 emitted from the input lens 21 for each lens element 22b. A primary light source image (a converging point light source or the like) is formed on each of the lens elements 22 b on the emission end face 22 c from which light is emitted from the fly eye lens 22. The plane on which this primary light source image is formed is the light separation portion 10 near the pupil plane of the first projection optical system PL1 in FIG. 4 (which is also the pupil plane of the illumination optical system IL), and the conjugate plane described later. 40 (first conjugate surface, shown in FIG. 10 etc.) optically conjugate.

  The first stop member 23 is a so-called aperture stop (illumination σ stop), and is disposed at or near the output end face 22 c of the fly-eye lens 22.

  FIG. 6 is a view showing the configuration of the first diaphragm member 23 of the illumination optical system IL. As shown in FIG. 6, the first diaphragm member 23 has an oval or elliptical opening 23 a through which at least a part of the illumination light L 1 from the fly's eye lens 22 passes.

  In FIGS. 5 and 6, the first diaphragm member 23 is disposed on a plane (parallel to the XY plane) orthogonal to the optical axis of the relay lens 24. Further, the opening 23a has an inner dimension (dimension) D1 in a first direction (X-axis direction) than an inner dimension (dimension) D2 in a second direction (Y-axis direction) corresponding to a direction parallel to the rotation center axis AX1. small. The first direction of the inner dimension (dimension) D1 coincides with the circumferential direction of the cylindrical surface 12 in the illumination area IR on the drum mask DM in FIG. 2 or 4.

  The first direction is a direction projected in the circumferential direction on the cylindrical surface 12, and the second direction is a direction projected in a direction parallel to the rotation center axis AX1 of the cylindrical surface 12. That is, the first stop member 23 has a spread angle (NA) of the illumination light L1 in the circumferential direction of the cylindrical surface 12 from a spread angle (NA) of the illumination light L1 in the direction parallel to the rotation center axis AX1 of the cylindrical surface 12. Is also provided to make it smaller.

  FIGS. 7A and 7B are diagrams showing an example of a specific optical system (lens arrangement) from the first diaphragm member 23 to the light separation unit 10 of the illumination optical system IL shown in FIGS. 4 and 5. FIG. 7A shows a plan view in a plane orthogonal to the rotation center axis AX1. FIG. 7B shows a plan view in a plane parallel to the rotation center axis AX1.

  As shown in FIG. 7A, the opening 23a of the first diaphragm member 23 is arranged to be biased to one side (+ X axis side) with respect to the optical axis 13a parallel to the Z axis of the first optical system 13. Further, as shown in FIG. 7B, the openings 23a of the first diaphragm member 23 are arranged symmetrically with respect to the optical axis 13a of the first optical system 13 in the Y-axis direction. That is, the first stop member 23 is disposed such that the optical axis 13a of the first optical system 13 passes through the center of the opening 23a as viewed in the X-axis direction.

  The relay lens 24 is disposed at a position where the light passing through the first diaphragm member 23 is incident. The relay lens 24 is provided so as to superimpose light beams from a plurality of primary light source images formed on the fly's eye lens 22. The light intensity distribution of the light from the plurality of primary light source images formed on the exit side of the fly's eye lens 22 is made uniform at the superimposed position.

  The cylindrical lens 25 is disposed in the optical path from the position where the primary light source image is formed in the fly-eye lens 22 to the second diaphragm member 26.

  Similar to the cylindrical lens 25 in FIG. 4 and FIG. 5, in the cylindrical lens 25 in FIG. 7A and FIG. 7B, the power (refractive power) in the XZ plane is in the YZ plane parallel to the rotation center axis AX1. Is an optical member larger than the power (refractive power) of The direction in which the power (refractive power) of the cylindrical lens 25 is large coincides with the circumferential direction of the cylindrical surface 12 in the illumination region IR on the drum mask DM in FIG. 2 or 4.

  The second diaphragm member 26 is a so-called field diaphragm and defines the position and shape of the illumination region IR. The second diaphragm member 26 is disposed at or near a position conjugate to the illumination region IR. The light from the plurality of primary light source images formed on the fly's eye lens 22 is superimposed on the position of the second diaphragm member 26 by the relay lens 24 and the cylindrical lens 25, and the light intensity distribution in the second diaphragm member 26 is made uniform. Ru. That is, the input lens 21, the fly's eye lens 22, the relay lens 24, and the cylindrical lens 25 constitute a homogenizing optical system 19 that homogenizes the light intensity distribution of the illumination light L 1.

  The illumination optical system IL is disposed in at least a part of the optical path from the primary light source image to the second diaphragm member 26 and the light intensity distribution of the illumination light L1 originating from the primary light source image is the position of the second diaphragm member 26. Or the homogenization optical system 19 which makes uniform in the vicinity. In addition, the illumination optical system IL may not include the second diaphragm member 26. The homogenizing optical system 19 can also be configured using a rod lens instead of the fly's eye lens 22. In this case, the configuration of the illumination optical system IL is appropriately changed such that the emission end face of the rod lens from which light is emitted is optically conjugate to the illumination region IR.

  As shown in FIGS. 7A and 7B, the first optical system 13 includes a lens group 27 disposed in the light path between the second diaphragm member 26 and the light separation unit 10. The lens group 27 is composed of, for example, a plurality of axially symmetric lenses whose center of rotation is the optical axis 13 a of the first optical system 13. As shown in FIG. 7B, the lens group 27 forms a pupil plane 28 (second conjugate plane) optically conjugate with the first stop member 23 when viewed in the X-axis direction. On the pupil plane 28, as shown in FIG. 2 (or FIG. 4), a light source image L0 (secondary light source image) serving as a source of the illumination light L1 irradiated to the illumination region IR is formed.

  The secondary light source image L0 formed on the pupil plane 28 of the projection optical system PL has a dimension in the X axis direction in FIG. 2 (or FIG. 4), FIG. 7A, and FIG. It is set to be larger than the dimension in the parallel Y-axis direction. The X-axis direction in which the size of the secondary light source image L0 is increased coincides with the circumferential direction of the cylindrical surface 12 in the illumination region IR on the drum mask DM in FIG. 2 or 4.

  In FIGS. 7A and 7B, the distribution range of the secondary light source image L0 formed on the second conjugate surface (the pupil surface 28) has a dimension in the Y-axis direction parallel to the rotation center axis (center line) AX1. It is set to be smaller than the dimension in the X-axis direction. The X-axis direction in which the size of the distribution range of the secondary light source image L0 becomes relatively large coincides with the circumferential direction of the cylindrical surface 12 in the illumination area IR on the drum mask DM in FIG. 2 or 4 .

  The lens group 27 is configured to converge a component spreading in the Y-axis direction on the pupil plane 28 in the light flux from the primary light source image formed on the first stop member 23. Here, since the power of the cylindrical lens 25 is different between the X-axis direction and the Y-axis direction, the component spreading in the X-axis direction from each point of the primary light source image (the opening of the first diaphragm member 23) is shown in FIG. As shown in FIG. 2, the light beam does not converge to one point on the pupil plane 28. In other words, the pupil plane 28 is in a non-optically conjugate relationship with the first stop member 23 when viewed from the Y-axis direction.

  The light separation unit 10 is arranged at or near the position of the pupil plane 28 so that at least a part of the light separation unit 10 is arranged at the pupil plane 28. Here, the position of the pupil plane 28 or its vicinity is a plane substantially corresponding to a Fourier transform plane with respect to the illumination region IR. Therefore, the direction of the chief ray L1a of the illumination light L1 incident on the illumination area IR on the drum mask DM is defined by defining the range (the passage 15 in FIG. 2) through which the illumination light L1 passes in the light separation unit 10. (Alignment characteristics) can be defined. As described with reference to FIG. 3, the light separating unit 10 (the defining unit) is configured such that the incident side of the illumination light L1 to the illumination region IR is telecentric so that the incident side of the imaging light flux L2 to the projection optical system PL is telecentric. A passing range (distribution range) of the illumination light L1 in the light separation unit 10 is defined so as to be non-telecentric. The light separation unit 10 is disposed in the light path of the projection optical system PL to perform epi-illumination on the illumination region IR.

  FIG. 8 is a diagram showing a configuration from the light separation unit 10 of the illumination optical system IL to the intermediate image plane 32 (Im) of the projection optical system PL. FIG. 9 is a plan view showing the light separation unit 10 according to the present embodiment.

  The light separation unit 10 shown in FIG. 8 includes a lens member 30 made of a material through which light is transmitted, and a reflection film 31 (corresponding to the reflection unit 16 in FIG. 2) formed on the surface of the lens member 30. The lens member 30 has, for example, a shape like a meniscus lens, the surface 30a side from which the illumination light L1 is incident from the first optical system 13 is a convex surface, and the surface 30b side facing the opposite surface 30a is a concave surface. The reflective film 31 is provided on the surface 30 b of the lens member 30.

  As shown in FIG. 9, the light separation unit 10 includes a passage unit 15 through which at least a part of the illumination light L1 from the first optical system 13 passes, and an imaging light beam L2 generated in the illumination area IR on the mask pattern M. (Refer FIG. 2) and the reflection part 16 to reflect. In the light separation unit 10, the reflection film 31 is formed excluding a part of the surface 30b of the lens member 30, and the passage unit 15 is formed by the reflection film 31 when viewed from the Z-axis direction in the light separation unit 10. It is located in the area that is not.

  The passage portion 15 is disposed on the −X axis side with respect to the intersection 13 b of the optical axis 13 a of the first optical system 13 and the surface 30 b. Passage part 15 is arranged in a field which does not overlap with intersection 13b among fields 30b. The passage portion 15 (light passage window) is formed in an oblong shape in which the X axis direction is the longitudinal direction in FIG. 8 and the Y axis direction parallel to the rotation center axis AX1 of the drum mask DM is the lateral direction. . Accordingly, the longitudinal direction of the oblong passage portion 15 corresponds to the circumferential direction of the cylindrical surface 12 in the illumination region IR on the drum mask DM in FIG. 2 (or FIG. 4) or FIG.

  Of the light separation unit 10, the region where the reflective film 31 is formed when viewed from the Z-axis direction is used for the reflection unit 16 where the imaging light beam L2 is reflected, and the illumination region IR via the passage unit 15. It is also used as a defining unit that defines the passing range of the illuminating light L1 to be directed. In other words, the reflection film 31 is provided such that the illumination light L1 does not pass through the area of the light separation unit 10 other than the passage unit 15. In addition, the reflection film 31 is disposed so as to include at least a region of the light separation unit 10 that exists at a position substantially symmetrical to the passage unit 15 with respect to the intersection 13 b so as to reflect the imaging light beam L2.

  Returning to the description of FIG. 8, the second optical system 14 is disposed at a position where the illumination light L1 that has passed through the passage portion 15 of the light separation unit 10 is incident. The second optical system 14 condenses the illumination light L1 so that the illumination area IR is optically conjugate to the first diaphragm member 23. That is, the second optical system 14 and the lens group 27 shown in FIGS. 7A and 7B form a plane optically conjugate with the second diaphragm member 26 in the illumination region IR.

  The second optical system 14 is configured of, for example, a plurality of lenses that are axially symmetric around a predetermined central axis (optical axis 14a). The optical axis 14 a of the second optical system 14 is set, for example, coaxially with the optical axis 13 a of the first optical system 13. The illumination light L1 incident on the second optical system 14 is emitted from the second optical system 14 through one side with respect to the plane (YZ plane) including the optical axis 14a of the second optical system 14.

  The deflection member 11 is disposed at a position where the illumination light L1 emitted from the second optical system 14 is incident. The deflection member 11 is, for example, a triangular prism-like member, and has a first reflection surface 11a and a second reflection surface 11b orthogonal to each other. The first reflection surface 11a and the second reflection surface 11b are disposed, for example, at an angle of about 45 ° with the optical axis 14a of the second optical system 14, respectively.

  The illumination light L1 emitted from the second optical system 14 is reflected and deflected by the first reflection surface 11a, and enters the illumination area IR on the mask pattern M held by the drum mask DM. The illumination light L1 is reflected and diffracted by the mask pattern M to generate an imaging light flux L2. The illumination light L1 incident on the illumination area IR and the imaging light flux L2 emitted from the illumination area IR will be described in detail later with reference to FIGS. 9 to 14.

  The imaging light beam L <b> 2 emitted from the illumination area IR is incident on the first reflection surface 11 a of the deflection member 11. The imaging light beam L 2 is deflected by being reflected by the first reflection surface 11 a and enters the second optical system 14. The imaging light beam L2 incident on the second optical system 14 passes through a different optical path from the illumination light L1 directed to the illumination region IR, as described in FIGS. 2 and 3 above. The optical path of the imaging light beam L2 in the second optical system 14 is disposed on the side (+ X axis side) substantially opposite to the optical path of the illumination light L1 with respect to the plane (YZ plane) including the optical axis 14a of the second optical system 14 Be done.

  The imaging light beam L2 that has passed through the second optical system 14 enters the light separation unit 10. As shown in FIG. 9, the range R1 in which the imaging light beam L2 is incident in the light separation unit 10 does not overlap with the range R2 (passage unit 15) in which the illumination light L1 is incident on the light separation unit 10 from the first optical system 13. So is set. The range R1 in which the image forming light beam L2 is incident is, for example, set on the opposite side to the passage part 15 with respect to the YZ plane, and is the reflection part 16 of the light separation part 10. The reflecting portion 16 is disposed at or near the pupil plane 28 and, as shown in FIG. 3, the chief rays L2a emitted from the respective points of the illumination region IR are in a substantially parallel relationship with each other, The luminous flux generated at each point in the region IR is incident on the reflecting portion 16 so that the spots are overlapped in the range R2.

  As shown in FIG. 8, the imaging light beam L2 incident on the reflection unit 16 is reflected by the reflection unit 16 and is incident on the second optical system 14 again. The imaging light beam L2 having passed through the second optical system 14 is incident on the second reflection surface 11b of the deflection member 11, and is reflected and deflected by the second reflection surface 11b. The traveling direction of the chief ray of the imaging light beam L2 reflected by the second reflection surface 11b is a direction substantially parallel to the traveling direction of the chief ray when emitted from the illumination region IR, and the optical axis 14a of the second optical system 14 Is a direction that intersects non-perpendicular to.

  The luminous flux emitted from each point of the illumination area IR among the imaging luminous flux L2 converges to approximately one point on the intermediate image plane 32 optically conjugate with the illumination area IR by passing through the second optical system 14 twice. Do. Thus, the first projection optical system PL1 shown in FIG. 4 of the projection optical system PL forms an intermediate image of a part (illumination region IR) of the mask pattern M on the intermediate image plane 32 (Im). . The intermediate image plane 32 is also a plane optically conjugate with the projection area PR, and a field stop (third stop member) for defining the position and shape of the projection area PR may be arranged.

  In the second projection optical system PL2 shown in FIG. 4, for example, the concave mirror 33 is disposed at a position optically conjugate with the light separation unit 10 instead of the light separation unit 10 in the light path of the first projection optical system PL1. It consists of That is, the second projection optical system PL2 includes the third optical system 34 similar to the second optical system 14 of the first projection optical system PL1. The imaging light beam L2 having passed through the intermediate image plane 32 is reflected and deflected by the first reflection surface 35a of the deflection member 35, and enters the concave mirror 33 through the third optical system 34. The imaging light beam L2 incident on the concave mirror 33 is reflected by the concave mirror 33 and passes again through the third optical system 34, and then is reflected and deflected by the second reflecting surface 35b of the deflection member 35 and supported by the rotating drum DP. The light is incident on the projection area PR on the substrate P. The luminous fluxes of the imaging luminous flux L2 emitted from each point of the intermediate image plane 32 pass through the third optical system 34 twice, so that each corresponding point in the projection area PR optically conjugate with the intermediate image plane 32 Converge on Thus, the second projection optical system PL2 projects the intermediate image Im formed by the first projection optical system PL1 onto the projection area PR.

  Next, the state of the illumination light L1 when entering the illumination area IR and the state of the imaging light flux L2 emitted from the illumination area IR will be described in more detail.

  FIG. 10 shows the light flux (illumination light L1) incident on the illumination area IR and the imaging light flux L2 emitted from the illumination area IR from the direction of the rotation center axis AX1 of the drum mask DM (in the XZ plane perpendicular to the Y axis) FIG. FIG. 11 is a top view of the imaging light beam L2 emitted from the illumination region IR, as viewed from the direction (Z-axis direction) orthogonal to FIG.

  As shown in FIG. 10 (see FIG. 3), the chief ray L1a of the illumination light L1 is viewed from the direction (Y-axis direction) of the rotation center axis AX1 of the drum mask DM. Illumination such that a conjugate surface 40 (a conjugate with the pupil surface 28 of the first projection optical system PL1 on which the secondary light source image is formed) conjugate to the primary light source image (the first diaphragm member 23) is formed between Incident to the region IR. The conjugate plane 40 (first conjugate plane) is disposed, for example, at or near the center of the rotation center axis AX1 and the illumination region IR. That is, when the radius of the mask pattern M is r, the positional relationship between the passing portion 15 of the light separating portion 10 and the reflecting portion 16 is such that the distance D3 from the rotation center axis AX1 to the conjugate plane 40 is about half of the radius r. To be set.

  Here, the extension lines 41 of the principal ray L1a of the illumination light L1 are arranged to intersect on the conjugate plane 40 in a cross section orthogonal to the rotation center axis AX1 of the drum mask DM. The intersections 142 of the extension lines 41 of the chief ray L1a are continuously arranged in a line parallel to the rotation center axis AX1 of the drum mask DM. That is, the positional relationship between the passing portion 15 of the light separating portion 10 and the reflecting portion 16 is a conjugate plane in which the extension line 41 of the principal ray L1a distributed in the circumferential direction of the cylindrical surface 12 in the illumination light L1 is parallel to the rotation center axis AX1. It is set to intersect the line on 40. That is, the illumination optical system IL radiates the illumination light L1 generated from the light source 20 to the illumination region IR through the light separation unit 10, and also transmits the chief ray L1a of the illumination light L1 to the rotation center axis AX1 and the cylindrical surface 12 And inclined with respect to the circumferential direction of the cylindrical surface 12 so as to be directed to a predetermined position therebetween.

  Further, among the illumination light L1, chief rays L1a distributed in a direction parallel to the rotation center axis AX1 of the drum mask DM are incident on the illumination area IR in a substantially parallel relationship. Then, as shown in FIG. 11, the chief rays L2a of the image forming light beam L2 are substantially parallel to each other when viewed from the direction (Z-axis direction) orthogonal to the rotation center axis AX1 of the drum mask DM. It emits from IR. Here, the chief ray L1a of the illumination light L1 enters the illumination area IR from the substantially normal direction (X-axis direction) of the cylindrical surface 12 of the drum mask DM seen from the Z-axis direction, and the chief ray of the imaging light beam L2. L2a emerges from the illumination area IR in a direction substantially normal to the cylindrical surface 12 of the drum mask DM (in the X-axis direction) when viewed from the Z-axis direction.

  Next, the shape of the pupil in the plane conjugate with the light source image will be described with reference to FIGS. 9, 12, and 13. FIG. FIG. 12 is a view showing a representative position of the illumination region IR referred to in the description of the pupil. FIG. 13 is a view showing a spot on the conjugate plane 40 conjugate to the light source image. Here, for convenience of explanation, the light flux (the illumination light L1 and the imaging light flux L2) passing through each point of the illumination region IR has a circular spot shape on the plane (the pupil plane 28 and the conjugate plane 40) conjugate with the light source image. There shall be.

  In FIG. 12, reference symbols P1 to P9 indicate points on the illumination region IR viewed in plan in the X-axis direction. The points P1, P2, and P3 are groups (referred to as a first group) of points arranged in the circumferential direction of the cylindrical surface 12 shown in FIG. The point P1 is located at the end on the + Z axis side of the illumination area IR, the point P3 is located at the end on the −Z axis side of the illumination area IR, and the point P2 is located at the center between the points P1 and P3. Similarly, point P4, point P5, and the second group of point P6, point P7, point P8, and the third group of point P9 are groups of points aligned in the circumferential direction of the cylindrical surface 12, respectively. The first group of points P1 to P3 is disposed at the end on the −Y axis side of the illumination area IR, and the third group of points P7 to P9 is disposed at the end on the + Y axis side of the illumination area IR The second group of points P4 to P6 is disposed between the first group and the third group.

  First, the passing range of the illumination light L1 on the pupil plane 28 will be described with reference to FIGS. 9 and 12. In the illumination area IR shown in FIG. 12, chief rays of the illumination light L1 incident on points P1, P4 and P7 aligned in a direction parallel to the rotation center axis AX1 have substantially the same incident position in the circumferential direction of the illumination area IR. And the incident angles to the illumination region IR are substantially the same.

  Therefore, in the light fluxes incident on the points P1, P4 and P7, the positions of the passing ranges on the pupil plane 28 are substantially the same in the X-axis direction, also referring to FIG. Therefore, the luminous fluxes incident on the points P1, P4 and P7 in the illumination area IR on the drum mask DM become luminous fluxes advancing from substantially the same direction as viewed from the illumination area IR side. Here, the luminous fluxes incident on the point P1, the point P4 and the point P7 all pass through substantially the same range R3 on the pupil plane 28 shown in FIG. Similarly, light fluxes incident on points P3, P6, and P9 aligned in a direction parallel to the rotation center axis AX1 all pass through substantially the same range R4 on the pupil plane 28.

  The chief ray of the illumination light L1 entering the point P1 and the chief ray of the illumination light L1 entering the point P3 are different in the incident position in the circumferential direction of the illumination area IR, and the incident angle with respect to the illumination area IR is different. There is.

  Therefore, the light flux entering the point P1 in the illumination area IR passes through the pupil plane 28 and the light flux entering the point P3 in the illumination area IR passes through the pupil plane 28. (Range R4) deviates in the X-axis direction.

  In FIG. 9, the position in the Y-axis direction of the range R3 is substantially the same as the range R4. Further, the position in the X-axis direction of the range R3 is farther from the intersection 13b of the optical axis 13a of the first optical system 13 and the light separation unit 10 than the position in the X-axis direction of the range R4.

  In the illumination region IR shown in FIG. 12, the passing ranges of the light beams entering the points P2, P5, and P8 aligned in a direction parallel to the rotation center axis AX1 are not shown in FIG. It is arranged between the range R4. Similarly, a light flux passing through any point on the line connecting point P1 and point P3 passes through the range shifted from range R3 toward range R4 according to the amount of shift from point P1 of this arbitrary point. become. Therefore, the passage range on the pupil plane 28 of the illumination light L1 incident on the illumination region IR is, for example, an oval range R2 connecting the range R3 and the range R4.

  As described above, when the range R2 of the passage portion 15 is formed in an oval shape, the chief ray L2a of the imaging light beam L2 distributed in the circumferential direction of the rotation center axis AX1 is more than the case where the illumination light is incident on the illumination area as a parallel light beam Also, it becomes close to a mutually parallel relationship (telecentric state). This is achieved in combination with setting of the light separation unit 10 and the illumination optical system before it so that the conjugate plane 40 is disposed at or near the central position between the rotation center axis AX1 and the illumination region IR. Ru.

  Next, the shape of the pupil in the conjugate plane 40 will be described with reference to FIGS. 10, 12 and 13. The shape of the pupil in the conjugate plane 40 corresponds to the shape of the secondary light source image formed on the conjugate plane 40 when the illumination light L1 incident on the illumination area IR virtually propagates inside the drum mask DM It is.

  At the points P1, P2 and P3 aligned in the circumferential direction in the illumination area IR on the cylindrical surface 12, the extension line 41 of the chief ray L1a substantially overlaps with one point on the conjugate plane 40. The chief ray L1a is incident. Therefore, assuming that the light beams incident on the points P1, P2 and P3 respectively propagate to the inside of the cylindrical surface 12, the positions of the passing ranges on the conjugate surface 40 are aligned, as shown in FIG. It will pass through the range R5 shown. For the same reason, the luminous fluxes incident on points P4, P5, and P6 aligned in the circumferential direction in the illumination area IR on the cylindrical surface 12 all pass through the same range R6, and the illumination area IR on the cylindrical surface 12 The luminous fluxes incident on points P7, P8 and P9 arranged in the inner circumferential direction all pass through the same range R7.

  The chief rays L1a of the illumination light L1 are incident on the points P1, P4 and P7 aligned in a direction (Y-axis direction) parallel to the rotation center axis AX1 in substantially parallel relation. Therefore, assuming that the light beams incident on the points P1, P4 and P7 propagate to the inside of the cylindrical surface 12, respectively, the luminous flux passing through the conjugate plane 40 in the Y-axis direction parallel to the rotation center axis AX1. The position will shift. That is, the range R5 is disposed at the end on the −Y axis side on the conjugate plane 40, the range R7 is disposed at the end on the + Y axis side on the conjugate plane 40, and the range R6 is the center of the range R5 and the range R7 Will be placed in As a result, in the illumination light L1 incident on the illumination region IR, the shape of the pupil in the conjugate plane 40 becomes an oval range R8 connecting the range R5 and the range R7.

  As described above, the chief ray L2a generated at each position of the illumination area IR in the imaging light flux L2 is in the circumferential direction of the cylindrical surface 12 and in the direction parallel to the rotation center axis AX1 (Y axis direction). At approximately parallel to one another. Therefore, the projection optical system PL can be configured to be telecentric on the incident side (the exit side of the illumination region IR).

  In the processing apparatus U3 (exposure apparatus EX) of the present embodiment as described above, the illumination optical system IL is configured such that the imaging light flux L2 incident on the projection optical system PL is close to a parallel light flux. The image of the curved mask pattern M can be accurately projected and exposed without complicating the system PL. Therefore, the processing apparatus U3 can efficiently expose the substrate P by performing the exposure process while rotating the mask pattern M.

  Further, since the processing unit U3 arranges the light separation unit 10 on the pupil plane 28 of the projection optical system PL, the light path of the illumination light L1 and the light path of the imaging light flux L2 can be separated. Therefore, the processing unit U3 can reduce the loss of light quantity and the generation of stray light in the PBS, as compared with the configuration in which the optical path is divided using, for example, a polarization separation splitter (PBS) or the like. The light separation unit 10 may be configured of PBS or the like.

  Further, since the light separation unit 10 defines the passing range of the illumination light L1 toward the illumination region IR via the passage unit 15, the direction of the chief ray L1a of the illumination light L1 when entering the illumination region IR is highly accurate. It can be defined in Further, since the light separation unit 10 defines the passing range of the illumination light L1 using the reflection unit 16, the configuration can be simplified.

  The relationship (for example, parallel to each other) of the principal rays L1a distributed in the direction parallel to the rotation center axis AX1 among the illumination light L1 is the principal ray distributed in the direction parallel to the rotation center axis AX1 among the imaging light beams L2. It is also maintained in L2a relationship (e.g., parallel to each other). Further, the relationship (for example, parallel to each other) of principal rays L2a distributed in the circumferential direction of cylindrical surface 12 in imaging light flux L2 is the relationship (for example, principal rays L1a distributed in the circumferential direction of cylindrical surface 12 in illumination light L1) , Non-parallel to each other). Therefore, for example, an optical member having a spread angle (NA) of the illumination light L1 with an isotropic power so that the principal rays L2a distributed in the circumferential direction of the cylindrical surface 12 in the imaging light flux L2 become parallel to each other. If adjusted, the principal ray L2a relationship distributed in the direction parallel to the rotation center axis AX1 among the imaging light flux L2 will not be parallel to each other.

  In the present embodiment, the spread angle of the illumination light L1 reaching the illumination area IR on the cylindrical surface 12 of the drum mask DM by the cylindrical lens 25 in the direction (Y-axis direction) corresponding to the rotation center axis AX1; The circumferential direction of the cylindrical surface 12 in the IR is different.

  That is, among the chief rays L1a of the illumination light L1 reaching the illumination region IR, the principal rays L1a of the cylindrical lens 25 aligned in a direction parallel to the rotation center axis AX1 are parallel to one another and the principal rays L1a aligned in the circumferential direction of the cylindrical surface 12 The light ray L1a is deflected so that the extension line 41 intersects a line on the conjugate plane 40 parallel to the rotation center axis AX1. Therefore, while making chief rays L2a of image forming light flux L2 distributed in a direction parallel to rotation center axis AX1 substantially parallel to each other, main rays L2a of image forming light flux L2 distributed in the circumferential direction of cylindrical surface 12 also approximately parallel to each other Can be In addition, as a method of giving anisotropy to the spread angle of the illumination light L1, using a light guide member obtained by bundling optical fibers, for example, the shape of the light emission side of the light guide member may be the first in FIG. The light emitting side may be disposed at the position of the first diaphragm member 23 in FIG. 6 in the shape of an oval or an ellipse like the opening 23 a of the diaphragm member 23.

Second Embodiment
Next, a second embodiment will be described. In the present embodiment, the same components as those in the above embodiment are denoted by the same reference numerals, and the description thereof will be simplified or omitted.

  FIG. 14 is a view showing the arrangement of a processing apparatus (exposure apparatus EX2) according to this embodiment. The exposure apparatus EX2 shown in FIG. 14 is different from the first embodiment in that the projection optical system PL is formed of an optical system such as an Offner optical system.

  The projection optical system PL is a projection area on the substrate P on which the intermediate image formed by the first projection optical system PL1 forming the intermediate image Im of a part of the mask pattern M (illumination area IR) and the first projection optical system PL1 And a second projection optical system PL2 that projects onto PR. Here, each of the first projection optical system PL1 and the second projection optical system PL2 is configured by an optical system such as an Offner optical system.

  The illumination optical system IL can be configured in the same manner as in the first embodiment for the elements disposed from the light source 20 to the light separation unit 50. The illumination light L1 emitted from the light source 20 passes through the homogenizing optical system 19, and the light intensity distribution in the second stop member 26 is homogenized. The illumination light L1 that has passed through the second diaphragm member 26 passes through the lens group 27 and enters the light separation unit 50.

  FIG. 15 is an enlarged view of a part of the illumination optical system IL in FIG. 14 and the first projection optical system PL1. The light separating unit 50 includes the passing unit 15 and the reflecting unit 16 as described in the first embodiment. The light separation unit 50 is disposed at or near the position of the pupil plane where the light source image to be the source of the illumination light L1 is formed. The arrangement of the passage portion 15 and the reflection portion 16 is the same as that of the first embodiment.

  The light separation unit 50 has a surface 50a on which the illumination light L1 is incident, and a surface 50b facing the surface 50a. The surface 50b is a surface on which the imaging light flux L2 is incident in the optical path of the first projection optical system PL1, and is convex toward the outside (the incident side of the imaging light flux L2).

  The illumination light L1 that has passed through the passage portion 15 of the light separation unit 50 is incident on the reflection surface 53a of the concave mirror 53 through the lens group 51 used for aberration correction and the like. The reflective surface 53 a is disposed to face the surface 50 b of the light separation unit 50. The reflecting surface 53a of the concave mirror 53 and the surface 50b of the light separating portion 50 are curved surfaces disposed at substantially the same positions of the centers of curvature.

  The illumination light L1 incident on the reflection surface 53a is condensed by being reflected by the reflection surface 53a, and is converged and incident on the reflection surface 54a of the deflection member (planar reflection mirror) 54 while being converged. The illumination light L1 incident on the reflection surface 54a of the deflection member 54 is deflected by being reflected by the reflection surface 54a, and enters the illumination region IR through the image adjustment member 55. The image adjusting member 55 is an optical member (a lens element having a power) used for adjusting the light intensity distribution, adjusting the spread angle, correcting the aberration, and the like.

  The illumination optical system IL as described above, as described with reference to FIG. 3, illuminates the illumination light L1 incident on the illumination area IR in order to make the principal rays of the imaging light flux L2 generated in the illumination area IR parallel to each other. The extension lines of the chief rays of L are configured to intersect inside the drum mask DM.

  The imaging light beam L2 generated in the illumination area IR is incident on the reflecting surface 54a of the deflecting member 54 through the image adjusting member 55, is reflected on the reflecting surface 54a, and is incident on the reflecting surface 53a of the concave mirror 53. The imaging light beam L2 incident on the reflection surface 53a is condensed by being reflected by the reflection surface 53a, and is converged through the lens group 51 to be incident on the reflection portion 16 of the light separation portion 50 while being converged. The imaging light beam L2 incident on the reflection unit 16 is reflected by the reflection unit 16, passes through the lens group 51, and is incident on the reflection surface 53 a of the concave mirror 53. The imaging light flux L2 incident on the reflection surface 53a is condensed by being reflected by the reflection surface 53a, and is converged and incident on the reflection surface 56a of the deflection member (planar reflection mirror) 56 while being converged.

  Here, the deflecting member 54 and the deflecting member 56 are provided between the deflecting member 54 and the deflecting member 56 so as to allow the imaging light beam L2 to pass therethrough. The imaging light beam L2 incident on the reflection surface 56a of the deflection member 56 is deflected by being reflected by the reflection surface 56a, and is incident on the intermediate image surface 32 through the image adjustment member 57. The image adjustment member 57 is an optical member having the same function as the image adjustment member 55. Thus, the first projection optical system PL1 forms an intermediate image Im of a part (illumination region IR) of the mask pattern M on the intermediate image plane 32.

  Returning to the description of FIG. 14, the second projection optical system PL2 is configured, for example, by disposing a convex mirror 60 instead of the light separation unit 50. The imaging light beam L2 having passed through the intermediate image plane 32 is reflected by the first reflection surface 61a of the deflection member 61 and enters the concave mirror 62, and is reflected by the concave mirror 62 and enters the convex mirror 60. The imaging light beam L2 incident on the convex mirror 60 is reflected by the convex mirror 60 and incident on the concave mirror 62, then reflected by the concave mirror 62 and then reflected by the second reflection surface 61b of the deflection member 61 and supported by the rotating drum DP It is incident on the projection area PR on the substrate P where it is located. Thus, the second projection optical system PL2 projects the intermediate image Im of the illumination area IR of the mask pattern M onto the projection area PR on the substrate P.

Third Embodiment
Next, a third embodiment will be described. In the present embodiment, the same components as those in the above embodiment are denoted by the same reference numerals, and the description thereof will be simplified or omitted.

  FIG. 16 is a diagram showing a configuration of a device manufacturing system SYS2 (flexible display manufacturing line) of the present embodiment. Here, the flexible substrate P (sheet, film, etc.) pulled out from the supply roll FR1 sequentially passes through n processing apparatuses U1, U2, U3, U4, U5,. An example is shown until it is wound up to FR2.

  Also in FIG. 16, the XYZ orthogonal coordinate system is set such that the front surface (or the back surface) of the substrate P is perpendicular to the XZ plane, and the direction (width direction) orthogonal to the transport direction (long direction) of the substrate P is It shall be set in the Y-axis direction.

  Next, the principle of exposure by the processing apparatus U3 (exposure apparatus EX, substrate processing apparatus) of the device manufacturing system SYS2 of the present embodiment will be described. FIG. 17 is a schematic view for explaining an optical system of the exposure apparatus EX3. FIG. 18 is a view showing the illumination light L1 incident on the illumination area IR and the imaging light flux L2 emitted from the illumination area IR.

  An exposure apparatus EX3 shown in FIG. 17 includes a drum mask DM for holding a mask pattern M, an illumination optical system IL, a projection optical system PL, and a rotary drum DP for supporting a substrate P (a substrate support roll DR5 shown in FIG. 16). Prepare.

  The drum mask DM has a cylindrical outer peripheral surface (hereinafter also referred to as a cylindrical surface 12), and curves and holds the reflective mask pattern M along the cylindrical surface 12 in a cylindrical shape. The cylindrical surface is a surface curved at a predetermined radius around a predetermined center line (rotation center axis AX1), and is, for example, at least a part of the outer peripheral surface of a cylinder or a cylinder.

  The illumination optical system IL epi-illuminates the illumination area IR on the mask pattern M held by the drum mask DM with the illumination light L1 through a part of the projection optical system PL. The illumination optical system IL includes a first optical system 13 that forms a light source image L0 that is a source of the illumination light L1, and a second optical system 14 that doubles as a part of the projection optical system PL. The light source image L0 formed by the first optical system 13 is formed in the vicinity of the passage portion 15 (transmission portion) of the light separation unit 10, and the illumination light L1 advancing from the light source image L0 is transmitted through the passage portion 15 It enters the optical system 14, passes through the second optical system 14, and enters the illumination region IR.

  The projection optical system PL projects the image of the illumination area IR on the mask pattern M onto the substrate P by projecting the reflected light flux generated in the illumination area IR onto the substrate P supported by the rotating drum DP. The projection optical system PL includes a first projection optical system PL1 that forms an intermediate image Im of the illumination region IR, and a second projection optical system PL2 that projects the intermediate image Im formed by the first projection optical system PL1 onto the substrate P. Prepare. The first projection optical system PL includes a light separation unit 10, and a second optical system (optical system) 14 disposed in the light path between the light separation unit 10 and the illumination region IR. In the following description, a light flux generated by the mask pattern M illuminated by the illumination light L1 and projected onto the substrate is appropriately referred to as an imaging light flux L2.

  The imaging light beam L2 generated in the illumination area IR passes through the second optical system 14 of the first projection optical system PL1 and is reflected by the reflection unit 16 of the light separation unit 10, passes through the second optical system 14 again, and is deflected. The light is incident on the member 17. The imaging light beam L2 incident on the deflecting member 17 is deflected by the deflecting member 17 and is incident on the concave mirror 18.

  The luminous flux (imaging luminous flux L2) generated from a certain point in the illumination area IR passes through the second optical system 14 twice, thereby corresponding points on the intermediate image plane 42 optically conjugate with the illumination area IR Converge to the conjugate point). Thus, the first projection optical system PL1 forms an intermediate image Im of a part (illumination region IR) of the mask pattern M illuminated by the illumination light L1 on the intermediate image plane 42. Since the illumination region IR is in the form of a cylindrical surface convex toward the light emission side, the intermediate image surface 42 is in the form of a cylindrical surface concave toward the light incident side (the deflection member 17 side).

  A concave cylindrical surface mirror (hereinafter simply referred to as a concave mirror) 18 is disposed at or near the position of the intermediate image plane 42. The concave mirror 18 is curved in a cylindrical surface concave toward the light incident side along the intermediate image plane 42. The imaging light beam L2 reflected by the concave mirror 18 is projected onto the projection area PR via the optical member (lens, mirror or the like) of the second projection optical system PL2. Thus, the image of the illumination area IR of the mask pattern M is projected onto the projection area PR on the substrate P supported by the rotating drum DP.

  Here, it is assumed that the concave mirror 18 is not provided (in the case of a mere plane mirror). In this configuration, the image plane of the second projection optical system PL2 has a cylindrical surface concave toward the light incident side, similar to the image plane (intermediate image plane) of the first projection optical system PL1, and the tangent of the projection area It will be curved to the opposite side to a projection field to a plane (the projection field and the direction of unevenness become reverse). Therefore, the defocus increases as the distance from the tangent to the tangent plane in the circumferential direction of the curved projection area increases.

  In the exposure apparatus EX3 shown in FIG. 17, the concave mirror 18 converts the image plane so that the image plane of the second projection optical system PL2 is convex toward the light incident side. In other words, the concave mirror 18 is an image of the second projection optical system PL2 such that the center of curvature of the image plane of the second projection optical system PL2 is disposed on the same side as the center of curvature of the projection region PR with respect to the projection region PR. Convert faces Therefore, the image plane of the second projection optical system PL2 has a shape that follows the projection area PR on the substrate P curved in a cylindrical surface shape, and as a result, the exposure apparatus EX3 accurately reflects the desired pattern. It can be transferred, and high definition pattern exposure becomes possible.

  By the way, since the illumination area IR is curved in a cylindrical surface shape as shown in FIG. 18, in the present embodiment, the incident angle of the chief ray L1a of the illumination light L1 to the illumination area IR is determined in the circumferential direction of the cylindrical surface 12 It differs according to the incident position of the chief ray L1a. That is, the principal rays of the illumination light incident on the object plane are not parallel to each other as in the Koehler illumination method by a general illumination system, but are chief rays converged to approximately half the radius of the cylindrical surface 12 Do. In this way, the chief rays L2a of the reflected light flux (imaging light flux L2) generated at each point in the illumination area IR become parallel (telecentric) with respect to the circumferential direction of the cylindrical surface 12.

  In the present embodiment, the illumination optical system IL is configured as a non-telecentric system in which the chief ray of the illumination light L1 is not parallel with respect to the circumferential direction of the cylindrical surface 12, and the chief ray of the imaging light beam L2 is parallel to the circumferential direction. To be Therefore, as shown in FIG. 18, the extension line 41 extending the principal ray L1a of the illumination light L1 is configured to intersect inside the cylindrical surface 12 at a position about half the radius.

  In such an imaging light flux L2, chief rays L2a generated at respective points on the illumination area IR exit from the illumination area IR, for example, in a mutually parallel relationship. The traveling direction of each chief ray L2a when viewed from the direction of the center line (rotation center axis AX1) of the drum mask DM connects, for example, the generation position of each chief ray L2a on the illumination region IR and the rotation center axis AX1. It is a direction intersecting with the line (radial direction). Further, as shown in FIG. 17, the traveling direction of each principal ray L2a when viewed from the direction of the rotation center axis AX1 is, for example, a direction intersecting non-perpendicularly with the optical axis 14a of the second optical system 14. .

  As described above, the illumination optical system IL is configured to be telecentric on the incident side of the first projection optical system PL1, but the imaging light beam L2 passing through the projection optical system PL is, for example, the first projection optical system PL1. The telecentric relationship may be broken due to the aberration that occurs in The concave mirror 18 is provided to adjust the characteristics of the image projected onto the substrate P, for example, in consideration of the aberration and the like generated in the first projection optical system PL1. Therefore, the exposure apparatus EX3 can perform exposure with high accuracy even when using the curved mask pattern M.

  Further, the first projection optical system PL1 is configured, for example, as a reduction optical system having a magnification of N (where N <1). That is, the first projection optical system PL1 forms an image of a part of the mask pattern M on the intermediate image plane 42 at a reduction ratio. With such a configuration, it is possible to reduce the amount of deviation of the chief ray L2a from the telecentric relationship in the imaging light flux L2. The projection optical system PL is, for example, an equal magnification optical system that forms an image of a portion of the projection area PR of the mask pattern M in the projection area PR with equal magnification, and the second projection optical system PL2 has a magnification of 1 / N. It is configured as a magnifying optical system of

  When the projection optical system PL as a whole is an equal-magnification optical system, both of the first projection optical system PL1 and the second projection optical system PL2 may be an equal-magnification optical system, and one of them is a reduction optical system. The other may be a magnifying optical system. The projection optical system PL may be a reduction optical system as a whole, or may be a magnification optical system as a whole.

  Next, the configuration of processing apparatus U3 (exposure apparatus EX3) will be described in more detail.

  FIG. 19 is a view showing the arrangement of the exposure apparatus EX3. The exposure apparatus EX3 holds a mask pattern M and rotates a drum mask DM (mask holding member) rotatable around a rotation center axis AX1 and a rotating drum supporting a substrate P and rotatable around a rotation center axis AX2. And DP (substrate support member). The rotation center axis AX2 of the rotary drum DP is set, for example, substantially parallel to the rotation center axis AX1 of the drum mask DM.

  The drum mask DM is a cylindrical or cylindrical member with a constant radius, and the outer peripheral surface is the cylindrical surface 12. The mask pattern M is, for example, wound around the outer peripheral surface of the drum mask DM and releasably attached to the drum mask DM. The mask pattern M may be formed, for example, on the surface of the drum mask DM using a vapor deposition method or the like, and may not be released from the drum mask DM. As the releasable mask pattern M, a pattern obtained by patterning a chromium layer deposited on a very thin glass sheet (about 100 μm thick), or a pattern made of a transparent resin or plastic sheet with a light shielding layer is used. In the case of winding such a sheet-like mask pattern M around the drum mask DM or drawing and forming the mask pattern M directly on the surface of the drum mask DM, the radius of the cylindrically curved mask pattern M ( It is important to know the diameter precisely.

  The rotary drum DP is a cylindrical or cylindrical member having a constant radius, and the outer peripheral surface thereof is cylindrical. The substrate P is supported by the rotating drum DP, for example, by being wound around a part of the outer peripheral surface of the rotating drum DP. A projection area PR on which an image of the mask pattern M is projected is disposed in the vicinity of the outer peripheral surface of the rotary drum DP. The configuration of the substrate support member that supports the substrate P can be changed as appropriate. For example, the substrate P may be supported by being suspended by a plurality of transport rollers, and in this case, the projection area PR may be planarly disposed between the plurality of transport rollers.

  As shown in FIG. 19, the illumination optical system IL illuminates the illumination area IR on the mask pattern M held by the drum mask DM with uniform brightness by an illumination method such as Koehler illumination. The projection optical system PL projects a portion of the mask pattern M (in the illumination region IR) by projecting the imaging light beam L2 generated in the illumination region IR toward the projection region PR on the substrate P supported by the rotating drum DP. ) On the projection area PR on the substrate P.

  The exposure apparatus EX3 is a so-called scanning exposure apparatus, which synchronously rotates the drum mask DM and the rotary drum DP at a predetermined rotational speed ratio to rotate the image of the mask pattern M held on the drum mask DM by the rotary drum DP. Is repeatedly and repeatedly exposed on the surface of the substrate P (curved surface along the cylindrical surface) supported thereon.

  The exposure apparatus EX3 includes, for example, a rotation drive unit for rotating and driving the drum mask DM and the rotation drum DP, and a position detection unit (rotary encoder or the like) for detecting the positions of the drum mask DM and the rotation drum DP. A moving unit for adjusting the respective positions of the drum mask DM and the rotating drum DP, and a control unit for controlling each unit of the exposure apparatus EX3.

  The control unit of the exposure apparatus EX3 controls the rotational drive unit based on the rotational position of the drum mask DM and the rotational drum DP detected by the position detection unit, to thereby set the drum mask DM and the rotational drum DP to a predetermined rotational speed ratio. Synchronize rotation with. Further, the control unit can adjust the relative position of the drum mask DM and the rotating drum DP by controlling the moving unit based on the detection result of the position detection unit.

  Next, the illumination optical system IL will be described in more detail. The first optical system 13 of the illumination optical system IL is disposed in the optical path from the homogenization optical system 19 to the light separation section 10, and the homogenization optical system 19 disposed in the optical path from the light source 20 to the light separation section 10. And a lens group 27.

  The homogenizing optical system 19 forms a plurality of primary light source images by the light emitted from the light source 20, and makes the light intensity distribution uniform by superimposing light fluxes from the plurality of primary light source images. The illumination light L 1 emitted from the uniformizing optical system 19 travels in a direction nonparallel to the optical axis 27 a of the lens group 27 and enters the lens group 27. The lens group 27 forms a secondary light source image conjugate to the primary light source image formed by the homogenizing optical system 19. Here, the lens group 27 is an axially symmetric optical system, and the optical axis 27 a of the lens group 27 is the optical axis 13 a of the first optical system 13.

  The light source 20 of the present embodiment can be configured, for example, in the same manner as the first embodiment. In the present embodiment, the illumination unit IU illustrated in FIG. 16 includes, for example, the light source 20 and the first optical system 13.

  FIG. 20 is a diagram showing the configuration of the homogenizing optical system 19. The uniforming optical system 19 shown in FIG. 20 includes an input lens 21, a fly eye lens 22, a first stop member 23, a relay lens (condenser lens) 24, a cylindrical lens 25, and a second stop member 26.

  The input lens 21 of the present embodiment can be configured, for example, in the same manner as the first embodiment. Note that the optical axis 21a of the input lens 21 of this embodiment is substantially parallel to the optical axis 27a of the lens group 27 (see FIG. 19), and from the optical axis 27a to the + X axis in the X axis direction orthogonal to the optical axis 27a. It is off to the side.

  The fly's eye lens 22 of the present embodiment can be configured, for example, in the same manner as the first embodiment. The fly's eye lens 22 of the present embodiment spatially divides the illumination light L1 emitted from the input lens 21 for each lens element 22b. A primary light source image (focusing point) is formed on each of the lens elements 22 b on an emission end face 22 c from which light is emitted from the fly's eye lens 22. The surface on which the primary light source image is formed is optically conjugate to a conjugate surface (first conjugate surface) 40 (shown in FIG. 24 and the like) described later.

  The first stop member 23 is a so-called aperture stop, and is disposed at or near the output end face 22c of the fly's eye lens 22 (see FIG. 20). FIG. 21 is a view showing the configuration of the first diaphragm member 23. The first diaphragm member 23 has an oval or elliptical opening 23a through which at least a part of the illumination light L1 from the fly's eye lens 22 passes, and the center of the opening 23a is, for example, the input lens 21 (see FIG. 20). ) Is set substantially coaxial with the optical axis 21a.

  As shown in FIG. 20, the first diaphragm member 23 is disposed on a plane (parallel to the XY plane) orthogonal to the optical axis 21 a of the input lens 21. Further, the opening 23a has an inner dimension (dimension) D1 in a first direction (X-axis direction) than an inner dimension (dimension) D2 in a second direction (Y-axis direction) corresponding to a direction parallel to the rotation center axis AX1. small. The first direction of the inner dimension (dimension) D1 coincides with the circumferential direction of the cylindrical surface 12 in the illumination area IR on the drum mask DM in FIG. 17 or 19.

  In the present embodiment, the first direction and the second direction can be defined as in the first embodiment.

  22A and 22B are diagrams showing the configuration from the first diaphragm member 23 to the light separation unit 10. FIG. FIG. 22A shows a plan view in a plane orthogonal to the rotation center axis AX1. FIG. 22B shows a plan view in a plane parallel to the rotation center axis AX1.

  As shown in FIG. 22A, the opening 23a of the first diaphragm member 23 is arranged to be biased to one side (+ X axis side) with respect to the optical axis 13a of the first optical system 13. Further, as shown in FIG. 22B, the openings 23a of the first diaphragm member 23 are arranged symmetrically with respect to the optical axis 13a of the first optical system 13 in the Y-axis direction. That is, the first stop member 23 is disposed such that the optical axis 13a of the first optical system 13 passes through the center of the opening 23a as viewed in the X-axis direction.

  The relay lens (condenser lens) 24 is disposed at a position where the light passing through the first diaphragm member 23 is incident. The relay lens 24 is provided so as to superimpose light beams from a plurality of primary light source images (focusing points) formed on the fly's eye lens 22. The illumination light L1 from the plurality of primary light source images formed on the fly's eye lens 22 has a uniform light intensity distribution at the superimposed position.

  The cylindrical lens 25 is disposed in the optical path from the position where the primary light source image is formed in the fly-eye lens 22 to the second diaphragm member 26. The cylindrical lens 25 rotates the refractive power (power) of the surface including the circular arc in the circumferential direction of the cylindrical surface 12 (mask pattern surface) of the drum mask DM (see FIG. 17), that is, the XZ surface perpendicular to the rotation center axis AX1. The optical member (lens group) is configured to be larger than the refractive power (power) of the YZ plane in the direction parallel to the central axis AX1.

  The second diaphragm member 26 is a so-called field diaphragm and defines the position and shape of the illumination region IR. The second diaphragm member 26 is disposed at or near a position conjugate to the illumination region IR. As shown in FIG. 22A, the center position of the opening through which the illumination light L1 passes in the second diaphragm member 26 is also shifted to the + X axis side with respect to the optical axis 13a of the first optical system 13. Further, as shown in FIG. 22B, the central position of the opening through which the illumination light L1 passes in the second diaphragm member 26 is disposed at substantially the same position as the optical axis 13a of the first optical system 13.

  The light from the plurality of primary light source images formed on the fly's eye lens 22 is superimposed on the position of the second diaphragm member 26 by the relay lens 24 and the cylindrical lens 25, and the light intensity distribution in the second diaphragm member 26 is made uniform. Ru. That is, the input lens 21, the fly's eye lens 22, the relay lens 24, and the cylindrical lens 25 make the light intensity distribution of the illumination light L1 uniform.

  The illumination optical system IL is disposed in at least a part of the optical path from the primary light source image to the second diaphragm member 26 and the light intensity distribution of the illumination light L1 originating from the primary light source image is the position of the second diaphragm member 26. Or the homogenization optical system 19 which makes uniform in the vicinity. In addition, the illumination optical system IL may not include the second diaphragm member 26 when, for example, the projection optical system PL includes a field stop. The homogenizing optical system 19 can also be configured using a rod lens instead of the fly's eye lens 22. In this case, the configuration of the illumination optical system IL is appropriately changed such that the exit end surface of the rod lens from which light is emitted is optically conjugate to the illumination region IR.

  The lens group 27 is composed of, for example, a plurality of axially symmetric lenses whose centers of rotation are a predetermined axis. As shown in FIG. 22B, the lens group 27 forms a pupil plane 28 that is optically conjugate with the first stop member 23 when viewed in the X-axis direction. On the pupil plane 28, as shown in FIG. 17, a light source image L0 (secondary light source image) serving as a source of the illumination light L1 irradiated to the illumination region IR is formed.

  The secondary light source image L0 formed on the pupil plane 28 of the first projection optical system PL1 has a dimension in the circumferential direction of the cylindrical surface 12 when projected onto the cylindrical surface 12 of the drum mask DM along the illumination light path. It is set larger than the dimension in the direction of the rotation center axis (center line) AX1.

  Further, the distribution range of the secondary light source image L0 formed on the second conjugate surface (the pupil surface 28) projects the distribution range of the secondary light source image L0 onto the cylindrical surface 12 of the drum mask DM along the illumination light path. When it sees, it is set up so that the size of the direction of rotation central axis (center line) AX1 may become smaller than the size of the peripheral direction of cylindrical surface 12. As shown in FIG.

  The lens group 27 is configured to converge a component spreading in the Y-axis direction on the pupil plane 28 in the light flux from the primary light source image formed on the first stop member 23. Here, since the power of the cylindrical lens 25 is different between the X-axis direction and the Y-axis direction, the component spreading in the X-axis direction from each point of the primary light source image (the opening 23a of the first diaphragm member 23) is shown in FIG. It does not converge on each corresponding point on the pupil plane 28 as shown at 22A. In other words, the pupil plane 28 has an optically conjugate relationship with the first stop member 23 when viewed from the X-axis direction, and is optically conjugate with the first stop member 23 when viewed from the Y-axis direction. It does not have to be.

  The light separation unit 10 of the present embodiment can be configured, for example, in the same manner as the first embodiment. The light separation unit 10 of the present embodiment includes a lens member 30 made of a material through which light is transmitted, and a reflection film 31 formed on the surface of the lens member 30. The lens member 30 has, for example, a shape like a meniscus lens, the surface 30a side from which the illumination light L1 is incident from the first optical system 13 is a convex surface, and the surface 30b side facing the opposite surface 30a is a concave surface. The surface 30 b is, for example, a curved surface including a part of a spherical surface. The reflective film 31 is provided on the surface 30 b of the lens member 30.

  FIG. 23 is a plan view showing the configuration of the light separation unit 10. As shown in FIG. 23, in the light separation unit 10, a passage unit 15 through which at least a part of the illumination light L1 from the first optical system 13 passes, and an imaging light beam L2 generated in the illumination region IR on the mask pattern M. And a reflecting portion 16 for reflecting (see FIG. 17). The light separation unit 10 is disposed across the optical path from the primary light source image to the illumination area IR and the optical path from the illumination area IR to the intermediate image plane 42. The reflection part 16 of the light separation part 10 of the present embodiment includes, for example, a reflection surface (reflection film 31) curved in a concave shape including a part of a spherical surface.

  As shown in FIG. 19, the second optical system 14 is disposed at a position where the illumination light L1 that has passed through the passage portion 15 of the light separation unit 10 is incident. The second optical system 14 condenses the illumination light L1 so that the illumination area IR is optically conjugate to the first diaphragm member 23. That is, the lens group 27 and the second optical system 14 form a plane optically conjugate with the second diaphragm member 26 in the illumination region IR.

  The second optical system 14 is configured of, for example, a plurality of lenses that are axially symmetric around a predetermined central axis. In this embodiment, this predetermined central axis is taken as the optical axis 14 a of the second optical system 14. The optical axis 14 a of the second optical system 14 is set, for example, coaxially with the optical axis 13 a of the first optical system 13. The illumination light L1 having entered the second optical system 14 passes through one side with respect to the plane (YZ plane) including the optical axis 14a of the second optical system 14, and exits from the second optical system 14. The illumination light L1 emitted from the second optical system 14 is incident on the illumination area IR on the mask pattern M held by the drum mask DM. The illumination light L1 is reflected and diffracted by the mask pattern M to generate an imaging light flux L2.

  Here, the illumination light L1 when entering the illumination area IR and the imaging light flux L2 emitted from the illumination area IR will be described in more detail.

  FIG. 24 is a side view of the luminous flux (illumination light L1) entering the illumination area IR and the imaging luminous flux L2 emitted from the illumination area IR as viewed from the direction (Y-axis direction) of the rotation center axis AX1 of the drum mask DM. is there. FIG. 25 is a top view of the imaging light flux L2 emitted from the illumination region IR, as viewed from the direction (Z-axis direction) orthogonal to FIG. In the present embodiment, the descriptions of the illumination light L1 and the imaging light flux L2 in FIGS. 24 and 25 are the same as the descriptions of the first embodiment in FIGS. 10 and 11, and thus the descriptions thereof will be omitted here.

  Next, the shape of the pupil in the plane (the pupil plane 28 and the conjugate plane 40) conjugate with the light source image will be described. FIG. 26 is a view showing a representative position of the illumination area IR referred to in the description of the pupil. FIG. 27 is a diagram showing the shape of the pupil in the conjugate plane 40 conjugate to the light source image. Here, for convenience of explanation, the light flux (the illumination light L1 and the imaging light flux L2) passing through each point of the illumination region IR has a circular spot shape on the plane (the pupil plane 28 and the conjugate plane 40) conjugate with the light source image. There shall be.

  In FIG. 26, symbols P1 to P9 indicate points on the illumination region IR viewed in plan in the X-axis direction. The points P1, P2, and P3 are groups (referred to as a first group) of points arranged in the circumferential direction (X direction when viewed in plan) of the cylindrical surface 12 of the drum mask DM. The point P1 is located at the end on the + X axis side of the illumination area IR, the point P3 is located at the end on the −X axis side of the illumination area IR, and the point P2 is located at the center between the points P1 and P3. Similarly, point P4, point P5, and the second group of point P6, point P7, point P8, and the third group of point P9 are groups of points aligned in the circumferential direction of the cylindrical surface 12, respectively. The first group of points P1 to P3 is disposed at the end on the −Y axis side of the illumination area IR, and the third group of points P7 to P9 is disposed at the end on the + Y axis side of the illumination area IR The second group of points P4 to P6 is disposed between the first group and the third group.

  First, the passing range of the illumination light L1 on the pupil plane 28 (light separation unit 10) will be described. The chief ray of the illumination light L1 incident on points P1, P4 and P7 aligned in a direction parallel to the rotation center axis AX1 (Y-axis direction) on the periphery of the illumination area IR shown in FIG. The incident positions in the circumferential direction are substantially the same, and the incident angles with respect to the illumination region IR are substantially the same. Therefore, the positions of the passing ranges on the light separation unit 10 (the pupil plane 28) are aligned in the X axis direction in FIG. Therefore, as shown in FIG. 23, all the light fluxes incident on the point P1, the point P4 and the point P7 pass through the range R3 on the light separation unit 10 (pupil plane 28). Similarly, all the light fluxes incident on the point P 3, the point P 6 and the point P 9 in the illumination region IR aligned in the direction parallel to the rotation center axis AX 1 pass through the range R 4 on the pupil plane 28.

  Further, the chief ray of the illumination light L1 incident on the point P1 and the chief ray of the illumination light L1 incident on the point P3 have different incident positions in the circumferential direction of the illumination area IR (cylindrical surface 12). The incident angles are different.

  Therefore, the passing range (range R3) on the light separation unit 10 (pupil plane 28) through which the light beam incident on the point P1 passes and the passing range on the light separation unit 10 (pupil plane 28) through which the light beam incident on the point P3 passes The “range R4” is shifted in the X-axis direction on the pupil plane 28 and in the circumferential direction of the cylindrical surface 12 in the illumination region IR.

  In FIG. 23, the position in the Y-axis direction of the range R3 on the pupil plane 28 is substantially the same as the range R4. Further, the position in the X-axis direction of the range R3 is farther from the intersection 13b of the optical axis 13a of the first optical system 13 and the light separation unit 10 than the position in the X-axis direction of the range R4.

  In addition, in the illumination region IR shown in FIG. 26, the passing ranges of the light flux incident on points P2, P5 and P8 aligned in the Y-axis direction parallel to the rotation center axis AX1 are not shown in FIG. It is arranged between R3 and the range R4. Similarly, a light flux passing through any point on the line connecting point P1 and point P3 passes through the range shifted from range R3 toward range R4 according to the amount of shift from point P1 of this arbitrary point. become. Therefore, the passage range on the pupil plane 28 of the illumination light L1 incident on the illumination region IR is, for example, an oval range R2 connecting the range R3 and the range R4.

  As described above, when the range R2 of the passage portion 15 is formed in an oval shape, the chief ray L2a of the imaging light beam L2 distributed in the circumferential direction of the rotation center axis AX1 is more than the case where the illumination light is incident on the illumination area as a parallel light beam Also, it becomes close to a mutually parallel relationship (telecentric state). This is achieved in combination with setting of the light separation unit 10 and the illumination optical system before it so that the conjugate plane 40 is disposed at or near the central position between the rotation center axis AX1 and the illumination region IR. Ru.

  Next, the shape of the pupil in the conjugate plane 40 will be described. The shape of the pupil in the conjugate plane 40 is substantially the same as the shape of the spot formed in the conjugate plane 40 when the illumination light L1 incident on the illumination area IR virtually propagates inside the drum mask DM.

  An extended line 41 (see FIG. 24) of the chief ray L1a is overlapped approximately at one point on the conjugate plane 40 at points P1, P2 and P3 in the illumination region IR arranged in the circumferential direction of the cylindrical surface 12. The chief ray L1a of the illumination light L1 is incident. Therefore, assuming that the light fluxes entering point P1, point P2 and point P3 respectively propagate to the inside of the cylindrical surface 12, the positions of the passing ranges on the conjugate plane 40 are aligned, as shown in FIG. It will pass through the range R5 shown. For the same reason, the luminous fluxes incident on point P4, point P5, and point P6 in the illumination region IR aligned in the circumferential direction of the cylindrical surface 12 pass through the range R6 and point P7 aligned in the circumferential direction of the cylindrical surface 12 The luminous fluxes incident on the point P8 and the point P9 all pass through the range R7.

  In addition, principal rays L1a of the illumination light L1 are incident on the points P1, P4, and P7 in the illumination region IR aligned in a direction (Y-axis direction) parallel to the rotation center axis AX1 in a substantially parallel relationship. come. Therefore, assuming that the light beams incident on the points P1, P4 and P7 propagate to the inside of the cylindrical surface 12, respectively, the luminous flux passing through the conjugate plane 40 in the Y-axis direction parallel to the rotation center axis AX1. The position will shift. That is, the range R5 is disposed at the end on the −Y axis side on the conjugate plane 40, the range R7 is disposed at the end on the + Y axis side on the conjugate plane 40, and the range R6 is the center of the range R5 and the range R7 Will be placed in As a result, as shown in FIG. 27, in the illumination light L1 incident on the illumination region IR, the shape of the pupil in the conjugate plane 40 is an oval range R8 connecting the range R5 and the range R7.

  As described above, the chief ray L2a generated at each position of the illumination area IR in the imaging light flux L2 is in the circumferential direction of the cylindrical surface 12 and in the direction parallel to the rotation center axis AX1 (Y axis direction). At approximately parallel to one another. Therefore, the projection optical system PL can be configured to be telecentric on the incident side (illumination region IR side). As shown in FIG. 19 and the like, the traveling direction of the chief ray L2a of the imaging light beam L2 when emitted from the illumination region IR is the light of the second optical system 14 when viewed from the direction of the rotation center axis AX1. It is a direction that intersects the axis 14 a non-perpendicularly.

  Next, the projection optical system PL will be described in more detail. FIG. 28 is a view showing an optical path functioning as a first projection optical system. FIG. 29 is a view showing an optical path functioning as a second projection optical system.

  The projection optical system PL includes a first projection optical system PL1 that forms an intermediate image Im as shown in FIG. 28 and a second projection optical system PL2 that projects the intermediate image Im onto a substrate P as shown in FIG. . The first projection optical system PL1 and the second projection optical system PL2 are configured to be telecentric as, for example, a half image field type of catadioptric projection optical system obtained by dividing a circular image field.

  The first projection optical system PL1 shown in FIG. 28 includes a second optical system 14, a light separation unit 10, a deflection member 17, a lens group 43, and a deflection member 44.

  The second optical system 14 doubles as a part of the illumination optical system IL as described above, and includes the lens group 45 and the lens group 46. The lens group 45 and the lens group 46 form a plane (the pupil plane 28 of the first projection optical system PL1) conjugate with the light source image formed by the illumination optical system IL.

  The lens group 45 includes the optical axis PL2a of the second projection optical system PL2 on the same side as the illumination area IR (drum mask DM) with respect to a plane (XY plane) parallel to the rotation center axis AX1 (see FIG. 19). It is arranged. The lens group 46 includes the optical axis PL2a of the second projection optical system PL2 and is opposite to the illumination area IR (drum mask DM) with respect to a plane (XY plane) parallel to the rotation center axis AX1 (see FIG. 19). It is arranged.

  The imaging light beam L2 incident on the second optical system 14 passes through a light path different from the illumination light L1 (see FIG. 19) directed to the illumination area IR. The optical path of the imaging light beam L2 in the second optical system 14 is disposed on the side (+ X axis side) substantially opposite to the optical path of the illumination light L1 with respect to the plane (YZ plane) including the optical axis 14a of the second optical system 14 Be done.

  The imaging light beam L2 that has passed through the second optical system 14 enters the light separation unit 10. In the light separation unit 10 (see FIG. 23), the range R1 in which the imaging light beam L2 is incident does not overlap with the range R2 (passage unit 15) in which the illumination light L1 is incident on the light separation unit 10 from the first optical system 13. , Is set. The range R1 in which the image forming light beam L2 is incident is, for example, set on the opposite side to the passage part 15 with respect to the YZ plane, and is the reflection part 16 of the light separation part 10. The reflecting portion 16 is disposed at or near the pupil plane 28, and as shown in FIG. 18, the chief rays L2a emitted from the respective points in the illumination region IR are in a substantially parallel relationship with each other, The luminous flux generated at each point in the region IR is incident on the reflecting portion 16 so that the spots are overlapped in the range R2.

  As shown in FIG. 28, the imaging light beam L2 incident on the reflection unit 16 of the light separation unit 10 is reflected by the reflection unit 16, passes through the lens group 46 of the second optical system 14, and is incident on the deflection member 17. The deflection member 17 is, for example, a prism mirror, and the surface on which the imaging light beam L2 is incident from the light separation unit 10 is a flat reflecting surface.

  The deflection member 17 is disposed at a position deviated from the light path of the illumination light L1 so as not to block the illumination light L1 (see FIG. 19) which passes through the second optical system 14 and goes to the illumination region IR. Here, the deflecting member 17 shields the imaging light beam L2 reflected by the light separating unit 10 so as not to face the drum mask DM. The imaging light beam L 2 incident on the deflection member 17 is deflected by being reflected by the deflection member 17 and is incident on the lens group 43.

  The lens group 43 condenses the imaging light flux L2 reflected by the deflection member 17 so as to form an intermediate image plane 42 conjugate to the illumination region IR. The lens group 43 is disposed, for example, on the same side as the projection area PR (rotary drum DP) with respect to a plane (YZ plane) including the optical axis 14a of the second optical system 14 and the rotation center axis AX1 (see FIG. 19). . The lens group 43 is configured to be optically equivalent to, for example, the lens group 45 of the second optical system 14. The lens group 43 is formed of, for example, an optical member such as a lens rotationally symmetrical around a predetermined axis (optical axis PL2a of the second projection optical system PL2). The optical axis PL2a of the second projection optical system PL2 is set, for example, to be orthogonal to the optical axis 14a of the second optical system 14.

  The imaging light beam L2 reflected by the deflection member 17 and passing through the lens group 43 enters the reflection surface 44a of the deflection member 44, is reflected by the reflection surface 44a, is deflected, and enters the concave mirror 18. The deflection member 17 is, for example, a prism mirror, and the reflecting surface 44a is substantially planar.

  The second projection optical system PL2 shown in FIG. 29 includes a concave mirror 18, a deflection member 44, a lens group 43, a lens group 47, and a concave mirror 48.

  The concave mirror 18 shown in FIGS. 28 and 29 is disposed at or near the position of the intermediate image plane 42 where the intermediate image Im is formed by the first projection optical system PL1. That is, among the imaging light flux L2, the light flux emitted from each point on the illumination area IR is converged to each corresponding point (conjugate point) on the concave mirror 18, and is reflected at each point. In the concave mirror 18, the surface on which the imaging light beam L2 is incident from the deflecting member 44 is a substantially cylindrical reflecting surface. The radius of curvature of the concave mirror 18 is set to be substantially the same as the radius of curvature of the illumination region IR regardless of the magnification of the first projection optical system PL1.

  The imaging light beam L2 reflected by the concave mirror 18 travels in a direction not parallel to the traveling direction at the time of incidence on the concave mirror 18 and enters the deflection member 44. Therefore, the incident angle of the imaging light flux L2 reflected by the concave mirror 18 with respect to the deflecting member 44 is different from the incident angle with respect to the deflecting member 44 toward the concave mirror 18. As a result, the imaging light beam L2 reflected by the concave mirror 18 and the deflecting member 44 passes through an optical path different from the light path (see FIG. 28) of the imaging light beam L2 when going from the deflecting member 17 to the deflecting member 44 Incident to

  The imaging light beam L2 having passed through the lens group 43 enters the lens group 47 without being blocked by the deflection member 17. In other words, the deflection member 17 is disposed at a position where the imaging light beam L2 reflected by the light separation unit 10 is incident and at a position where the imaging light beam L2 reflected by the deflection member 44 after being reflected by the concave mirror 18 is not incident It is done.

  The lens group 47 reflects the imaging light flux L2 reflected by the deflection member 44 and having passed through the lens group 43 such that a pupil plane 47a conjugate to the pupil plane 28 of the first projection optical system PL1 is formed. The lens group 47 is configured to be optically equivalent to, for example, the lens group 46 of the second optical system 14. The lens group 47 is formed of, for example, a lens rotationally symmetric about a predetermined axis (optical axis PL2a of the second projection optical system PL2).

  The imaging light beam L2 reflected by the deflection member 44 and passing through the lens group 43 and the lens group 47 enters the concave mirror 48. The concave mirror 48 is disposed, for example, at or near the position of the pupil plane 47a in the second projection optical system PL2. The concave mirror 48 is configured, for example, as a reflecting surface in which the incident end face on the side where the imaging light beam L2 is incident is spherically curved. In the concave mirror 48, at least a region of the incident end surface where the imaging light beam L2 is incident is a reflection surface.

  In the concave mirror 48, a part of the area on the incident end face where the imaging light beam L2 is incident may not be a reflection surface. For example, the concave mirror 48 can function as a stop member by forming a part of a region of the incident end face where the imaging light flux L2 is incident as a transmission part through which the imaging light flux L2 passes. Instead of at least a part of the transmission part, an absorption part that absorbs the imaging light flux L2 may be provided.

  The imaging light beam L2 reflected by the concave mirror 48 is projected to the projection area PR through the lens group 47 and the lens group 43. The light flux from each point on the intermediate image plane 42 of the imaging light flux L2 passes through the lens group 43 and the lens group 47 twice each, so that a plane conjugate with the intermediate image plane 42 (the second projection optical system PL2 Converges to each of the corresponding points (conjugate points) on the image plane). Thus, the intermediate image Im formed on the intermediate image plane 42 by the first projection optical system PL1 is projected on the image plane of the second projection optical system PL2.

  The image plane of the second projection optical system PL2 is set at substantially the same position as the projection area PR on the substrate P supported by the outer peripheral surface of the rotary drum DP, and the image of the illumination area IR on the mask pattern M is Projection exposure is performed on the projection area PR. In such an exposure apparatus EX3, the concave mirror 18 transforms the image plane of the second projection optical system PL2 to conform to the shape of the projection area PR, so that the image of the illumination area IR is accurately projected with accuracy.

  As described with reference to FIG. 25 and the like, the illumination optical system IL is configured such that the chief rays L2a of the imaging light beam L2 when entering the projection optical system PL are substantially parallel to each other. However, in the imaging light flux L2 that has passed through at least a part of the projection optical system PL, the chief rays may deviate from the parallel relationship with each other due to, for example, an aberration or the like. As the relationship between the chief rays of the imaging light beam L2 when entering the projection area PR deviates from the parallel relationship, the accuracy of exposure may be lowered.

  Therefore, the projection optical system PL may include a correction unit that corrects the directions of the chief rays of the image forming light beam L2 so as to approximate substantially parallel relationship with each other. The correction unit may be disposed at any position in the optical path from the illumination area IR to the projection area PR. However, the closer to the intermediate image plane 42, the more effectively the direction of the chief ray L2a of the imaging light beam L2 can be corrected.

  For example, the concave mirror 18 is an optical member disposed closest to the intermediate image plane 42 in the projection optical system PL, and the correction unit described above can be configured using the concave mirror 18. For example, even if one or both of the shape and the position of the reflecting surface of the concave mirror 18 are set such that the chief rays of the imaging light beam L2 reaching the pupil plane 47a of the second projection optical system PL2 become parallel to each other. Good.

  That is, the shape of the concave mirror 18 may be set, for example, in an elliptical shape different from a circular cross-sectional shape orthogonal to the Y-axis direction so that the chief rays of the imaging light beam L2 become parallel to each other. Further, the position of the concave mirror 18 is an intermediate image within a range in which the distance between the image plane of the second projection optical system PL2 and the projection area PR is equal to or less than the focal depth so that the chief rays of the imaging light beam L2 are parallel It may be disposed offset from the surface 42.

  The above-described correction unit may include one or both of the deflecting member 17 and the deflecting member 44. For example, the reflecting surface 44a of the deflecting member 44 may be curved so that the chief rays of the imaging light beam L2 reaching the pupil plane 47a of the second projection optical system PL2 are parallel to each other. The same applies to the deflection member 17.

  Since the deflecting member 44 is disposed closer to the intermediate image plane 42 than the deflecting member 17, the direction of the chief ray can be effectively adjusted by using the above-described correction unit. Further, since the imaging light beam L2 directed to the intermediate image plane 42 is incident and the imaging light beam L2 emitted from the intermediate image plane 42 is not incident, the deflection member 17 adjusts the direction of the chief ray of the imaging light beam L2. Design freedom is high. In addition, the correction unit described above may or may not include the optical member other than the concave mirror 18, the deflection member 17 and the deflection member 44.

  In the processing apparatus U3 (exposure apparatus EX3) of the present embodiment as described above, the illumination optical system IL is configured such that the imaging light flux L2 incident on the projection optical system PL is close to a parallel light flux. The image of the curved mask pattern M can be accurately projected and exposed without complicating the system PL. Therefore, by performing the exposure process while rotating the mask pattern M, the processing apparatus U3 can expose the substrate P efficiently and accurately.

  Further, in order to project the image of the mask pattern M curved in a cylindrical shape onto the substrate P curved in a cylindrical shape, the concave mirror 18 having a cylindrical reflection surface is provided at the position of the intermediate image plane. The image plane of the optical system PL2 is converted along the projection area PR, and the processing unit U3 sets the widths of the illumination area IR and the projection area PR in the scanning exposure direction (the circumferential direction of the mask pattern M). It becomes possible to secure widely, and high productivity and high precision exposure processing can be performed.

  Further, since the processing unit U3 arranges the light separation unit 10 on the pupil plane 28 of the first projection optical system PL1, adopting the epi-illumination method in which the light path of the illumination light L1 and the light path of the imaging light beam L2 are separated. it can. Therefore, the processing unit U3 can reduce the loss of light quantity and the generation of stray light in the PBS, as compared with the configuration in which the optical path is divided using, for example, a polarization separation splitter (PBS) or the like. In the case where the light source 20 is a laser light source or the like and the loss of light quantity can be reduced by utilizing the polarization characteristic of the illumination light, such a light separation unit 10 may be configured of PBS or the like.

  Further, since the light separation unit 10 (definition unit) defines the passage range of the illumination light L1 directed to the illumination region IR via the passage unit 15, the light separation unit 10 (definition unit) The orientation can be defined with high accuracy. Further, since the light separation unit 10 defines the passing range of the illumination light L1 using the reflection unit 16, the configuration can be simplified.

  The relationship (for example, parallel to each other) of the principal rays L1a distributed in the direction parallel to the rotation center axis AX1 among the illumination light L1 is the principal ray distributed in the direction parallel to the rotation center axis AX1 among the imaging light beams L2. It is also maintained in L2a relationship (e.g., parallel to each other). Further, the relationship (for example, parallel to each other) of principal rays L2a distributed in the circumferential direction of cylindrical surface 12 in imaging light flux L2 is the relationship (for example, principal rays L1a distributed in the circumferential direction of cylindrical surface 12 in illumination light L1) , Non-parallel to each other). Therefore, for example, an optical member having a spread angle (NA) of the illumination light L1 with an isotropic power so that the principal rays L2a distributed in the circumferential direction of the cylindrical surface 12 in the imaging light flux L2 become parallel to each other. If adjusted, the principal ray L2a relationship distributed in the direction parallel to the rotation center axis AX1 among the imaging light flux L2 will not be parallel to each other.

  In the present embodiment, the spread angle of the illumination light L1 (principal ray) is made different between the direction in which the rotation center axis AX1 of the drum mask DM extends and the circumferential direction of the cylindrical surface 12 by the cylindrical lens 25. That is, among the chief rays L1a of the illumination light L1 reaching the illumination region IR, the cylindrical lenses 25 are aligned in the circumferential direction of the cylindrical surface 12 with the chief rays L1a aligned in a direction parallel to the rotation center axis AX1 The chief ray L1a (distributed) is deflected (set) such that its extension line 41 intersects a line on the conjugate plane 40 parallel to the rotation center axis AX1. Therefore, while making chief rays L2a of image forming light flux L2 distributed in a direction parallel to rotation center axis AX1 substantially parallel to each other, main rays L2a of image forming light flux L2 distributed in the circumferential direction of cylindrical surface 12 also approximately parallel to each other Can be In addition, as a method of making the spread angle of the illumination light L1 anisotropic, as in the first embodiment, the shape of the light emission side of the light guide member using the light guide member in which the optical fibers are bundled. It is also possible to use a method of adjusting the

Fourth Embodiment
Next, a fourth embodiment will be described. In the present embodiment, the same components as those in the above embodiment are denoted by the same reference numerals, and the description thereof will be simplified or omitted.

  FIG. 30 is a view showing the arrangement of a processing apparatus (exposure apparatus EX4) according to this embodiment. FIG. 31 is a diagram showing an optical path functioning as the illumination optical system IL in the configuration of FIG. FIG. 32 is a view showing an optical path functioning as the first projection optical system PL1 in the configuration of FIG. FIG. 33 is a diagram showing an optical path which functions as the second projection optical system PL2 in the configuration of FIG.

  The projection optical system PL is a projection area on the substrate P on which the intermediate image formed by the first projection optical system PL1 forming the intermediate image Im of a part of the mask pattern M (illumination area IR) and the first projection optical system PL1 And a second projection optical system PL2 that projects onto PR. Here, each of the first projection optical system PL1 and the second projection optical system PL2 is configured by an optical system such as an Offner optical system. The illumination optical system IL illuminates the illumination region IR with the illumination light L1 through a part of the first projection optical system PL1.

  The illumination optical system IL can be configured, for example, in the same manner as in the third embodiment for the elements (homogenization optical system 19) disposed from the light source to the first diaphragm member 23. The illumination light L1 emitted from the light source passes through the homogenizing optical system 19, and the light intensity distribution in the first diaphragm member 23 is homogenized.

  The illumination optical system IL shown in FIG. 31 includes a light separation unit 50, an image adjustment member 51, a concave mirror 52, a lens group 53, a convex mirror 54, a deflection member 55, and an image adjustment member 56.

  The illumination light L <b> 1 having passed through the first diaphragm member 23 passes through the image adjustment member 51 and is incident on the reflection part 57 of the light separation part 50. The image adjusting member 51 is provided in consideration of aberration and the like in order to adjust the image characteristics of the secondary light source image formed on a plane conjugate to the primary light source image. The image adjustment member 51 can be omitted as appropriate.

  The reflecting portion 57 of the light separating portion 50 is disposed at a position where the illumination light L1 is incident from the homogenizing optical system 19 and at a position where the imaging light beam L2 (see FIG. 30) passing through the projection optical system PL is not incident. There is. The reflection part 57 of the light separation part 50 is, for example, a prism mirror, and the surface on which the illumination light L1 is incident from the homogenization optical system 19 is a flat reflection surface.

  The illumination light L1 incident on the reflection unit 57 is deflected by being reflected by the reflection unit 57 and is incident on the concave mirror 52. The illumination light L 1 reflected by the reflection unit 57 and incident on the concave mirror 52 is reflected by the concave mirror 52, passes through the lens group 53, and is incident on the convex mirror 54.

  The concave mirror 52 has a reflecting surface including, for example, a part of a spherical surface, and forms a pupil plane 28 conjugate with the primary light source image (the first diaphragm member 23 shown in FIG. 20) formed in the homogenizing optical system 19 And condense the illumination light L1. That is, a secondary light source image is formed on the pupil plane 28.

  The lens group 53 is appropriately provided to adjust the image characteristics of the secondary light source image on the pupil plane 28 and includes, for example, a field lens. The convex mirror 54 has, for example, a reflecting surface including a part of a spherical surface, and is provided so that the concave mirror 52 and the center of curvature coincide. Here, an axis connecting the center of the concave mirror 52 and the center of the convex mirror 54 is an optical axis ILa of the illumination optical system IL (the optical axis PL1a of the first projection optical system PL1). The convex mirror 54 and the concave mirror 52 are provided so that the light (illumination light L1, imaging light flux L2) reflected by the convex mirror 54 is incident on the concave mirror 52 again.

  The illumination light L1 from the concave mirror 52 is incident on the −X axis side of the convex mirror 54 with respect to the optical axis ILa of the illumination optical system IL, is reflected by the convex mirror 54, and is incident on the concave mirror 52 again. Then, the illumination light L1 incident on the concave mirror 52 is reflected by the concave mirror 52 and incident on the deflection member 55, is reflected by the deflection member 55, is deflected, and is incident on the illumination region IR through the image adjustment member 56. .

  The deflection member 55 is, for example, a prism mirror, and the surface on which the illumination light L1 is incident from the concave mirror 52 is a flat reflection surface. The image adjustment member 56 is appropriately provided in consideration of aberration and the like as in the image adjustment member 51.

  As shown in FIG. 32, the first projection optical system PL1 includes an image adjustment member 56, a deflection member 55, a concave mirror 52, a lens group 53, a convex mirror 54, and an image adjustment member 58.

  The imaging light beam L2 emitted from the illumination area IR is incident on the deflecting member 55 through the image adjusting member 56 and is deflected by being reflected by the deflecting member 55. The imaging light beam L2 deflected by the deflecting member 55 enters the concave mirror 52 through an optical path different from the optical path of the illumination light L1 traveling from the concave mirror 52 to the deflecting member 55 shown in FIG. The imaging light beam L2 which has entered the concave mirror 52 passes through the optical path different from the illumination light L1 and passes through the lens group 53 and enters the convex mirror 54. The position where the imaging light beam L2 is incident on the convex mirror 54 is disposed on the side (+ X axis side) opposite to the incident position of the illumination light L1 with respect to the optical axis PL1a of the first projection optical system PL1.

  The imaging light beam L2 reflected by the convex mirror 54 is incident on the concave mirror 52 through the lens group 53 and is reflected by the concave mirror 52. The imaging light beam L2 reflected by the concave mirror 52 passes through the passing portion 59 of the light separating portion 50 and enters the image adjusting member 58. Here, the passage part 59 of the light separation part 50 is an area where the reflection part 57 is not provided. That is, the reflection unit 57 is disposed at a position where the imaging light beam L2 reflected by the concave mirror 52 after being reflected by the convex mirror 54 is not incident. As described above, the light separation unit 50 is provided to define the passing range of the illumination light L1.

  The luminous flux emitted from each point on the illumination area IR in the imaging luminous flux L2 converges to approximately one point on the intermediate image plane 42 conjugate with the illumination area IR by passing through the above optical path. In other words, on the intermediate image plane 42, an image of the illumination area IR is formed. The image adjusting member 56 and the image adjusting member 58 are appropriately provided in consideration of aberration and the like so as to adjust the image characteristics of the intermediate image Im. One or both of the image adjusting member 56 and the image adjusting member 58 may be omitted as appropriate.

  As shown in FIG. 33, the second projection optical system PL2 includes a concave mirror 60, an image adjustment member 58, a deflection member 61, a concave mirror 62, a lens group 63, a convex mirror 64, a deflection member 65, and an image adjustment member 66.

  The concave mirror 60 is disposed at or near the position of the intermediate image plane 42. It is formed in a cylindrical surface shape concave toward the incident side of the imaging light beam L2 so as to follow the shape of the intermediate image Im formed by the first projection optical system PL1. The concave mirror 60 converts the shape of the image plane of the second projection optical system PL2 along the projection area PR, as described in the third embodiment.

  The imaging light beam L2 incident on the concave mirror 60 is reflected by the concave mirror 60, and is incident on the deflection member 61 through the image adjustment member 58. The deflection member 61 is, for example, a prism mirror, and the surface on which the image forming light beam L2 from the concave mirror 60 is incident is a flat reflecting surface. The deflection member 61 is at a position where the imaging light beam L2 reflected by the concave mirror 60 is incident and at a position not blocking the imaging light beam L2 directed from the concave mirror 52 (see FIG. 32) of the first projection optical system PL1 to the concave mirror 60. It is arranged.

  The imaging light beam L2 incident on the deflection member 61 is deflected by being reflected by the deflection member 61, and is incident on the concave mirror 62. The imaging light beam L2 incident on the concave mirror 62 is reflected by the concave mirror 62, passes through the lens group 63, and is incident on the convex mirror 64.

  The concave mirror 62 condenses the imaging light beam L2 so as to form a pupil plane 67 conjugate to the pupil plane 28 of the first projection optical system PL1 shown in FIG. The concave mirror 62 is configured, for example, to be optically equivalent to the concave mirror 52 of the first projection optical system PL1. The concave mirror 62 has a curved reflective surface including, for example, a part of a spherical surface.

  The lens group 63 is appropriately provided, for example, in consideration of aberration and the like so as to adjust the characteristics of the image formed in the projection region PR, and includes a field lens and the like.

  The convex mirror 64 is disposed at or near a position conjugate with the pupil plane 67. The convex mirror 64 is configured, for example, to be optically equivalent to the convex mirror 54 of the first projection optical system PL1. The convex mirror 64 has, for example, a curved reflecting surface including a part of a spherical surface, and the center of curvature of this reflecting surface is set to be substantially the same as the center of curvature of the concave mirror 62.

  The imaging light beam L2 reflected by the convex mirror 64 is again incident on the concave mirror 62 through the lens group 63, is reflected on the concave mirror 62, and is incident on the deflection member 65. The imaging light beam L2 incident on the deflection member 65 is deflected by being reflected by the deflection member 65, and is incident on the projection area PR through the image adjustment member 66.

  As described above, the second projection optical system PL2 forms the intermediate image Im of the illumination area IR formed on the intermediate image surface 42 on the image plane of the second projection optical system PL2. The image plane is set at or near the position of the projection area PR on the substrate P supported by the rotary drum DP, and the image of the illumination area IR is projected and exposed onto the projection area PR on the substrate P.

  In the processing apparatus U3 (exposure apparatus EX4) of the present embodiment as described above, the illumination optical system IL is configured such that the principal ray of the imaging light flux L2 incident on the projection optical system PL is close to a parallel system. Even if the projection optical system PL is not complicated, the image of the curved mask pattern M can be accurately projected and exposed. Therefore, by performing the exposure process while rotating the mask pattern M, the processing apparatus U3 can expose the substrate P efficiently and accurately.

  Further, the processing device U3 projects the image of the curved mask pattern M onto the curved substrate P. Further, in the processing unit U3, the concave mirror 18 converts the image plane of the second projection optical system PL2 along the projection area PR, so that the processing unit U3 can perform exposure with high accuracy. Further, for example, by providing the correction unit so that the imaging light flux L2 approaches telecentricity, the processing device U3 can perform exposure with high accuracy. The correction unit can be configured, for example, using at least one of the concave mirror 60, the image adjustment member 58, and the deflection member 61.

  Further, since the processing unit U3 arranges the light separation unit 10 on the pupil plane 28 of the first projection optical system PL1, the light path of the illumination light L1 and the light path of the imaging light beam L2 can be separated. Therefore, the processing unit U3 can reduce the loss of light quantity and the generation of stray light, as compared with the configuration in which the optical path is divided by using, for example, a polarization separation splitter or the like.

  The technical scope of the present invention is not limited to the embodiments described above. For example, one or more of the elements described in the above embodiments may be omitted. Further, the elements described in each of the above-described embodiments can be combined as appropriate.

  In each of the embodiments described above, the projection area PR on the substrate P is curved in a cylindrical shape, but the projection area PR may be flat.

  That is, in the case where the substrate P is a rigid substrate which does not substantially deform, or in the case where a flexible sheet-like substrate can maintain a certain range including the projection area PR flat (flat), These flat (planar) substrates P can likewise be exposed by the exposure device.

  For example, the exposure apparatus may expose the substrate P, for example, a rigid substrate in which the substrate P does not substantially deform. Further, the substrate P may be transported such that the projection area PR on the substrate P is flat, and the exposure apparatus may expose such a substrate P.

  In each embodiment described above, an example of a single lens type exposure apparatus in which the number of illumination optical systems is one and the number of projection optical systems is one has been described. A plurality of sets of the illumination optical system and the projection optical system may be arranged in the direction in which the rotation center axes AX2 and AX1 of the drum mask DM and the rotary drum DP extend, a so-called multilens type exposure apparatus.

  In the first embodiment and the third embodiment, although the passing range of the illumination light L1 is defined using the reflecting portion 16 of the light separating portion 10, the light shielding provided separately from the reflecting portion 16 The section may define the passage range. For example, the light blocking portion may block the light so as not to pass through the light separating portion 10 by absorbing the light incident to the outside of the passing portion 15. In addition, the passing portion 15 may be, for example, an air gap (opening) arranged to pass the illumination light L1.

[Device manufacturing method]
Next, the device manufacturing method of the above embodiment will be described. FIG. 34 is a flowchart showing the device manufacturing method of the above embodiment. Some steps in this flowchart are implemented in the device manufacturing system SYS, SYS2 (flexible display manufacturing line) shown in FIG. 1 and FIG. However, in order to carry out all the steps of the flowchart of FIG. 34, it is necessary to prepare a plurality of more manufacturing processing devices.

  In the device manufacturing method shown in FIG. 34, first, function / performance design of a device such as an organic EL display panel is performed (step 201). Then, based on the design of the device, a mask pattern M is manufactured (step 202). In addition, a substrate such as a transparent film or sheet or an ultrathin metal foil, which is a substrate of the device, is prepared by purchase, manufacture, or the like (Step 203).

  Next, the prepared substrate is introduced into a roll-type or patch-type production line, and on the substrate, TFT backplane layers such as electrodes and wirings, insulating films and semiconductor films that constitute devices, and organic EL luminescence to be a pixel portion Form a layer (step 204). Step 204 typically includes forming a resist pattern on the film on the substrate and etching the film using the resist pattern as a mask. In the formation of the resist pattern, a step of uniformly forming a resist film on the substrate surface, a step of exposing the resist film of the substrate with exposure light patterned through the mask pattern M according to each of the above embodiments, And a step of developing the resist film on which the latent image of the mask pattern has been formed by the exposure.

  In the case of flexible device manufacturing that combines printing technology etc. as a typical example of Additive process that does not use a resist process for resource saving, a functional photosensitive layer (function Forming a photosensitive photosensitive layer, a photosensitive silane coupling material, etc.) by a coating method, and using the exposure apparatus shown in each of the above embodiments, the exposure light patterned via the drum mask DM is flexible Irradiating the functional photosensitive layer (functional sensitive layer) on the substrate to form a hydrophilized portion and a water-repellent portion according to the pattern shape in the functional photosensitive layer; hydrophilicity of the functional photosensitive layer A step of applying a plating base solution or the like to the high portion and depositing and forming a metallic pattern by electroless plating, a so-called low temperature wet process of 120 ° C. or less or the like is performed.

  Then, depending on the device to be manufactured, for example, dicing or cutting the substrate, or attaching another substrate manufactured in another process, for example, a sheet-like color filter having a sealing function, a thin glass substrate, etc. The combining step is performed to assemble the device (display panel) (step 205). Next, the device is subjected to post-processing such as inspection (step 206). The device can be manufactured as described above. In the device manufacturing method according to the above embodiment, the photosensitive substrate is conveyed in a predetermined direction while the drum mask (mask holding member) is rotated by the processing apparatus (substrate processing apparatus), and the mask pattern is continuously formed on the sensitive substrate. And performing the subsequent processing using the change of the sensitive layer of the exposed sensitive substrate.

  DESCRIPTION OF SYMBOLS 10 ... light separation part, 12 ... cylindrical surface, 15 ... passage part, 16 ... reflection part, 18 ... concave mirror, 19 ... equalization | homogenization optical system, 23 ... 1st Aperture member 25 Cylindrical lens 26 Second aperture member 28 Pupil surface 40 Conjugate surface 41 Extension line 42 Intermediate image surface 50 · · · Light separation unit, 57 · · · reflection unit, 60 · · · concave mirror, IL · · · illumination optical system, IR · · · illumination area, Im · · · intermediate image, L0 · · · light source image, L1 · · · · · Illumination light, L 2 · · · Imaging light beam, L 2a · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · ... First projection optical system, PL2... Second projection optical system U3.

Claims (10)

A drum mask holding a mask pattern for an electronic device along an outer peripheral surface having a constant radius from a first central axis is rotated about the first central axis, and is constant from a second central axis parallel to the first central axis A rotating drum supporting and bending the sensitive substrate along the outer peripheral surface of the radius is rotated about the second central axis, and an image of the mask pattern is transferred onto the sensitive substrate through the projection system of the exposure apparatus. A device manufacturing method for transferring
The orientation characteristic of the illumination light irradiated to the illumination area on the outer peripheral surface of the drum mask by the illumination optical system of the exposure apparatus is made non-telecentric with respect to the peripheral direction of the outer peripheral surface, and the first central axis By making the light telecentric state with respect to the extending direction, the reflected light flux of the mask pattern generated from the illumination area is made telecentric in each of the circumferential direction of the outer peripheral surface and the direction in which the first central axis extends. Light incident on the projection system;
An image of the mask pattern is formed on an intermediate image plane by a first projection optical system of the projection system which receives the reflected light beam, and is reflected by a concave cylindrical surface mirror disposed at or near the position of the intermediate image plane Projecting the image of the mask pattern formed on the intermediate image plane according to the curved surface of the sensitive substrate by the second projection optical system of the projection system which receives the reflected light flux. ,
A device manufacturing method including: The device manufacturing method according to claim 1,
A first optical member provided in the illumination optical system in order to make the reflected light flux from the mask pattern telecentric in each of the circumferential direction of the outer peripheral surface and the direction in which the first central axis extends. The principal rays of the illumination light distributed in the direction in which the first central axis extends are made substantially parallel to each other, and the principal rays distributed in the circumferential direction of the outer peripheral surface are extended with the first central axis The mutually inclined state is made to intersect at a position at or near the center between the drum mask and the outer peripheral surface of the drum mask.
Device manufacturing method. The device manufacturing method according to claim 2,
The first optical member includes a cylindrical lens in which the refractive power in the direction in which the first central axis extends and the refractive power in the circumferential direction of the outer peripheral surface of the drum mask are different.
The refractive power of the cylindrical lens in the circumferential direction of the outer peripheral surface of the drum mask is the distance from the position where the extension of the chief ray distributed in the circumferential direction of the outer peripheral surface intersects the first central axis is the outer periphery of the drum mask Set to be about 1/2 of the radius of the surface,
Device manufacturing method. The device manufacturing method according to any one of claims 1 to 3, wherein
In the illumination optical system, a circumferential direction of an outer peripheral surface of the drum mask and a direction in which the first central axis extends by a second optical member which sets a shape of a light source image formed by a light source generating the illumination light Making the spread angle of the illumination light to illuminate the illumination area different,
Device manufacturing method. The device manufacturing method according to claim 4,
The illumination optical system includes a fly's eye lens that forms the light source image on the exit end face as a collection of many point light source images,
The second optical member is an aperture stop disposed in the exit end face of the fly's-eye lens or in the vicinity thereof, and the inner dimension in the first direction corresponding to the circumferential direction of the outer peripheral surface of the drum mask is 1 has an oval or elliptical opening smaller than the inner dimension in the second direction corresponding to the direction in which the central axis extends
Device manufacturing method. The device manufacturing method according to any one of claims 1 to 5, wherein
The radius of curvature of the concave cylindrical mirror is set to be substantially the same as the radius of curvature of the illumination area on the outer peripheral surface of the drum mask.
Device manufacturing method. The device manufacturing method according to claim 6, wherein
The concave cylindrical surface mirror is provided such that chief rays of the reflected light beam reaching the pupil plane of the second projection optical system are parallel to one another.
Device manufacturing method. The device manufacturing method according to any one of claims 1 to 7, wherein
The first projection optical system forms an image of the mask pattern on the intermediate image plane at a reduction ratio.
Device manufacturing method. The device manufacturing method according to claim 8,
The projection system including the first projection optical system and the second projection optical system forms an image of the mask pattern on the sensitive substrate at equal magnification.
Device manufacturing method. The device manufacturing method according to any one of claims 1 to 9, wherein
A photosensitive layer is formed on the sensitive substrate by any one of a photoresist, a photosensitive silane coupling agent, a photosensitive plating reducing agent, and a UV curing resin.
Device manufacturing method.

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