JP6574334B2 - Substrate processing equipment - Google Patents

Description

  The present invention includes a semiconductor wafer, a glass substrate for a liquid crystal display device, a glass substrate for a plasma display, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a glass substrate for a photomask, a substrate for a solar cell, etc. The present invention relates to a substrate processing apparatus that performs processing on a substrate simply).

  As such a substrate processing apparatus, in Patent Documents 1 and 2, a substrate is supplied by supplying a processing liquid to the substrate while rotating a holding member that holds the substrate horizontally from below and a blocking plate that faces the upper surface of the substrate. An apparatus for processing is shown. The shielding plate is slightly larger than the substrate, and is disposed so as to cover the substrate at a position close to the upper side of the substrate. The front end portion of the first engagement portion projecting downward from the peripheral edge portion of the blocking plate and the front end portion of the second engagement portion projecting upward from the peripheral edge portion of the holding member are the substrate and the holding member. Is engaged at a position between. In this manner, the rotation drive unit rotates the holding member in a state where the holding member and the blocking plate are engaged. Thereby, the blocking plate is rotationally driven in the same rotational direction as the holding member at the same rotational speed, thereby preventing dust and mist from adhering to the upper surface of the substrate.

JP 2014-67778 A JP 2014-67780 A

  However, in the devices of Patent Documents 1 and 2, the connection portions of the first and second engaging portions that engage the blocking plate and the holding member are above the holding member. For this reason, the processing liquid supplied to the processing surface of the substrate and discharged to the outside from the peripheral portion of the substrate by centrifugal force is bounced back to the substrate side by a joint or the like of the connection portion and the surface other than the processing surface of the substrate ( There is a problem that defects such as particles are caused by adhering to the non-treated surface.

  The present invention has been made to solve these problems, and an object of the present invention is to provide a technique capable of suppressing the adhesion of the processing liquid supplied to the substrate and discharged from the substrate to the non-processing surface of the substrate. To do.

In order to solve the above problem, a substrate processing apparatus according to a first aspect is a substrate processing apparatus, which holds a substrate substantially horizontally from below, and has an upper surface facing the lower surface of the substrate with a gap therebetween. At least one of a holding member provided rotatably around a predetermined rotation axis, a main body portion facing the upper surface of the substrate held by the holding member with a gap, and a peripheral edge portion of the main body portion. An extending portion extending from the portion to the side of the holding member, and a counter member provided to be rotatable about the rotation shaft, and a distal end side portion of the extending portion and a side surface of the holding member A protrusion is provided in one of the portions, and the other portion is disposed to face the protrusion from the front and rear in the circumferential direction centering on the rotation axis, and the circumferential direction of the protrusion There is a regulatory structure that regulates relative movement Wherein the holding member and the opposing member, the have a relative movement in the circumferential direction around the rotational axis is restricted to one another via the said regulating structure and the protruding portion, the substrate processing apparatus, In a state where the relative movement of the holding member and the opposing member is mutually restricted via the protruding portion and the restricting structure , at least one of the holding member and the opposing member is used as the rotating shaft. And a nozzle that discharges a processing liquid onto a processing surface of the substrate that is held and rotated by the holding member, and the protrusion and the restricting structure include the holding mechanism. It arrange | positions below the upper surface of a member.

  The substrate processing apparatus which concerns on a 2nd aspect is a substrate processing apparatus which concerns on a 1st aspect, Comprising: At least one of the said protrusion part and the said control structure is covered by the elastic member in the part facing the other. ing.

  The substrate processing apparatus which concerns on a 3rd aspect is a substrate processing apparatus which concerns on the 1st or 2nd aspect, Comprising: A said 1st position and 2nd along the said rotating shaft direction with respect to the said holding member as the said opposing member. And further comprising a moving part that moves relative to the position, wherein the restricting structure is arranged except for a moving path in which the protruding part moves relative to the restricting structure by the moving part, When the facing member is disposed at the first position, the restriction structure is disposed to face the protruding portion from the front and rear in the circumferential direction, and when the facing member is disposed at the second position, the restriction is performed. A structure is disposed relatively away from the protrusion along the rotational axis direction.

  A substrate processing apparatus according to a fourth aspect is the substrate processing apparatus according to any one of the first to third aspects, wherein the restricting structure can accommodate at least a part of the protruding portion. It is a dent formed in the other part.

  The substrate processing apparatus which concerns on a 5th aspect is a substrate processing apparatus which concerns on a 3rd aspect, Comprising: While the said other part is extended cyclically | annularly along the circumferential direction centering on the said rotating shaft. A plurality of recesses provided continuously over the entire circumference in the circumferential direction, and each of the plurality of recesses is in a direction along the rotation axis direction to the protrusion protruding from the one portion. It is a recessed part formed in the shape which can be opened and can accommodate at least one part of the above-mentioned projection part, and the width along the peripheral direction of the part by the side of the opening at least among the recessed parts is nearing the opening. At least the tip portion of the projecting portion is opposed to the dent portion along the rotational axis direction, and the width of the tip portion along the circumferential direction becomes narrower as it approaches the tip. .

  The substrate processing apparatus which concerns on a 6th aspect is a substrate processing apparatus which concerns on any one 1st to 4th aspect, Comprising: It arrange | positions before and after the said circumferential direction with respect to the said protrusion part among the said control structures. A plurality of magnets for applying a magnetic repulsive force so as to widen the distance between each portion and the projecting portion, and the magnetic repulsive force causes the projecting portion with respect to the regulating structure to extend in the circumferential direction. Regulate relative movement.

  The substrate processing apparatus which concerns on a 7th aspect is a substrate processing apparatus which concerns on a 6th aspect, Comprising: The said control structure contains the opposing part arrange | positioned facing the said protrusion part along the said rotating shaft direction. The substrate processing apparatus includes a plurality of magnets for applying a magnetic repulsive force so as to widen a distance between the projecting portion and the facing portion along the rotation axis direction, and the countering force is generated by the magnetic repulsive force. The movement which the said protrusion part approaches along the said rotating shaft direction with respect to a part is controlled.

  A substrate processing apparatus according to an eighth aspect is the substrate processing apparatus according to any one of the first to seventh aspects, wherein the extending portion is a cylinder provided along a peripheral edge portion of the facing member. Wall.

The substrate processing apparatus which concerns on a 9th aspect is a substrate processing apparatus which concerns on an 8th aspect, Comprising: The internal peripheral surface of the said cylindrical wall part is continuous with the lower surface of the said opposing member, and the upper surface of the said holding member In contrast, it includes a curved surface that swells obliquely upward and outward.
Further, the substrate processing apparatus according to the tenth aspect is provided to hold the substrate substantially horizontally from below, and to have an upper surface facing the lower surface of the substrate with a gap therebetween and to be rotatable about a predetermined rotation axis. A holding member, a main body portion opposed to the upper surface of the substrate held by the holding member with a gap, and an extending portion extending from at least a part of the peripheral edge portion of the main body portion to the side of the holding member. The counter member provided to be rotatable around the rotation axis, the holding member and the counter member are configured to move relative movement between the peripheral portion of the holding member and a part of the peripheral portion. On the other hand , a relative movement in the circumferential direction of the peripheral edge centered on the rotation shaft is provided in a part of the extending portion so as to be opposed to the front and rear in the circumferential direction centering on the rotation shaft. The holding member in a regulated state through a regulating structure to regulate A rotation mechanism that rotates at least one of the counter member around the rotation axis, and a nozzle that discharges a processing liquid onto a processing surface of the substrate held and rotating by the holding member, The processing liquid discharged from the nozzle is discharged downward through a gap between the peripheral edge portion of the holding member and the extending portion.
A substrate processing apparatus according to an eleventh aspect includes a holding member that holds a substrate substantially horizontally from below and has an upper surface that faces the lower surface of the substrate with a gap therebetween and is rotatable around a predetermined rotation axis. And a main body portion facing the upper surface of the substrate held by the holding member with a gap, and an extending portion extending from at least a part of the peripheral edge portion of the main body portion to the side of the holding member. The counter member provided to be rotatable about the rotation shaft, the holding member and the counter member are provided with relative movements on the peripheral edge of the holding member and a part of the extending portion. And at least one of the holding member and the opposing member in a state of being regulated via a regulation structure that regulates relative movement in the circumferential direction of the peripheral edge around the rotation axis, A rotation mechanism that rotates about a rotation axis, and the holding portion; A nozzle that discharges the processing liquid onto the processing surface of the substrate that is held and rotated, and the processing liquid discharged from the nozzle forms a gap between the peripheral portion of the holding member and the extended portion. It is discharged downward through an upper surface of the tip portion of the side surface portion of the holding member, and a surface facing curved each other of the holding member in the distal portion of the extension portion and the distal end side of the extending portion The curved shape of the opposing surface of the holding member in the portion continues to the restriction portion formed by the peripheral edge portion of the holding member and the restriction structure.
A twelfth aspect is the substrate processing apparatus according to the tenth or eleventh aspect, wherein the restriction structure is disposed below the lower surface of the held substrate.

  According to the invention according to the first aspect, the extending portion extends to the side of the holding member from the peripheral edge portion of the main body portion of the opposing member. A protruding portion is provided at one of the distal end side portion of the extending portion and the side surface portion of the holding member, and a restricting structure is provided at the other portion. The protruding portion and the restricting structure are the upper surface of the holding member. It is arranged below. Therefore, it can suppress that the process liquid discharged | emitted from the board | substrate is bounced off by a protrusion part or a control structure, and adheres to the non-processing surface of a board | substrate.

  According to the second aspect of the present invention, at least one of the projecting portion and the restricting structure is covered with the elastic member at a portion facing the other, so that the impact when the projecting portion and the restricting structure are in contact with each other. Can be suppressed.

  According to the third aspect of the invention, the first position where the restricting structure is disposed to face the protruding portion from the front and rear in the circumferential direction, and the restricting structure is relatively separated from the protruding portion along the rotation axis direction. The opposing member moves relative to the holding member along the rotation axis direction between the second position and the second position. As a result, the regulation structure can easily switch between the regulation state in which the relative movement of the protruding portion in the circumferential direction and the unregulated release state are regulated.

  According to the invention pertaining to the fourth aspect, the restricting structure is a recess formed in the other part so as to accommodate at least a part of the protruding part. Therefore, since the front end side part of the extending part of the opposing member and the side surface part of the holding member can be brought close to each other, the opposing member can be reduced in size.

  According to the fifth aspect of the invention, in the process in which the facing member is relatively moved from the second position to the first position, the projecting portion comes into contact with the facing recessed portion among the plurality of recessed portions. If the opposing member is not in a state where rotation around the rotation axis is restricted, after the tip portion of the protrusion comes into contact with the recess, the protrusion is caused by the shape of the recess and the protrusion. The relative position of the opposing member in the circumferential direction of the opposing member relative to the holding member is corrected so that the portion is guided to a deeper recessed portion of the recessed portion, and the opposing member is relative to the first position along the rotational axis direction. Moved to. After the opposing member is moved to the first position, the concave portion restricts the circumferential movement of the protruding portion, and the relative movement of the opposing member in the circumferential direction with respect to the holding member is restricted. Therefore, even if the relative position in the circumferential direction of the opposing member with respect to the holding member is not aligned, the recessed portion facing the protruding portion among the plurality of recessed portions regulates the relative movement of the protruding portion in the circumferential direction. It becomes a regulatory structure. Thereby, the relative motion to the circumferential direction of the opposing member with respect to a holding member can be controlled.

  According to the sixth aspect of the invention, the plurality of magnets are magnetic so as to widen the intervals between the protrusions and the portions arranged in the circumferential direction with respect to the protrusions in the restricting structure. Apply repulsive force. Thereby, the relative movement to the circumferential direction of the protrusion part with respect to a control structure is controlled. Therefore, contact between the restricting structure and the protruding portion can be suppressed.

  According to the seventh aspect of the invention, the restriction structure includes a facing portion that is disposed to face the protruding portion along the rotation axis direction. A plurality of magnets exert a magnetic repulsive force so as to widen the interval between the protruding portion and the facing portion along the rotation axis direction. Thereby, the movement which a protrusion part approaches along a rotating shaft direction with respect to an opposing part is controlled. Therefore, the contact between the restricting structure and the protruding portion can be further suppressed.

  According to the eighth aspect of the invention, since the extending portion is a cylindrical wall portion provided along the peripheral edge portion of the facing member, the extending portion is discharged from the substrate surface to the outside by centrifugal force. Do not cross the flow of processing liquid. Thereby, since the dispersion of the processing liquid in the extended portion can be suppressed, it is possible to further suppress the processing liquid from being rebounded by the protruding portion or the regulation structure and attached to the non-processing surface of the substrate.

According to the ninth aspect of the invention, the inner peripheral surface of the cylindrical wall portion includes a curved surface that is continuous with the lower surface of the opposing member and that swells and curves obliquely upward and outward with respect to the upper surface of the holding member. Yes. Since the processing liquid discharged from the substrate surface to the outside by centrifugal force tends to flow smoothly along the inner peripheral surface of the cylindrical wall, the processing liquid is discharged to the outside through the gap between the inner peripheral surface and the holding member. Easy to do.
According to the eleventh aspect, the processing liquid is smoothly discharged to the outside through the gap.

It is a schematic diagram for demonstrating the structure of the substrate processing apparatus which concerns on embodiment. It is a perspective view which shows the interruption | blocking board and spin base of FIG. 1 which are arrange | positioned at a process position. It is a perspective view which shows the spin base of FIG. FIG. 3 is a perspective view showing a blocking plate of FIG. 2. It is a perspective view which shows the spin base of FIG. It is a longitudinal cross-sectional view which shows the peripheral part of the interruption | blocking board of FIG. 2, and a spin base. It is another longitudinal cross-sectional view which shows the peripheral part of the interruption | blocking board of FIG. 2, and a spin base. FIG. 7 is a cross-sectional view of the restricting portion in FIG. 6. It is sectional drawing which shows the state by which the control part of FIG. 8 was covered with the elastic member. It is a perspective view which shows the other structural example of the shielding board and spin base which concern on embodiment. It is a perspective view which shows the state by which the interruption | blocking board of FIG. 10 was arrange | positioned in the process position. It is a longitudinal cross-sectional view of the other structural example of the interruption | blocking board which concerns on embodiment, and a spin base. It is a longitudinal cross-sectional view which shows the other cross section of the shielding board of FIG. 12, and a spin base. It is a cross-sectional view which shows the other structural example of the control part which concerns on embodiment. It is a cross-sectional view which shows the other state of the control part of FIG. It is a cross-sectional view which shows the other state of the control part of FIG. It is a cross-sectional view which shows the other state of the control part of FIG. It is sectional drawing which shows the other structural example of the control part which concerns on embodiment. It is sectional drawing which shows the other structural example of the control part which concerns on embodiment.

  Hereinafter, embodiments will be described with reference to the drawings. The following embodiment is an example embodying the present invention, and is not an example of limiting the technical scope of the present invention. In each of the drawings referred to below, the size and number of each part may be exaggerated or simplified for easy understanding. The vertical direction is the vertical direction, and the substrate side is above the spin base.

<About embodiment>
<1. Configuration of Substrate Processing Apparatus 1>
The configuration of the substrate processing apparatus 1 will be described with reference to FIGS. FIG. 1 is a schematic diagram for explaining the configuration of the substrate processing apparatus 1. FIG. 1 shows a state in which the blocking plate 90 is disposed at the retracted position. Further, the shielding plate 90 arranged at the processing position is indicated by a virtual line. FIG. 2 is a schematic perspective view showing the shielding plate 90 and the spin base 21 rotating around the rotation axis a1 in a state where the shielding plate 90 is disposed at the processing position. FIG. 3 is a schematic perspective view of the spin base 21 that holds the substrate 9 and rotates about the rotation axis a1 when viewed obliquely from above. The description of the blocking plate 90 is omitted. The surface shape of the substrate 9 is substantially circular. Loading and unloading of the substrate 9 to and from the substrate processing apparatus 1 is performed by a robot or the like in a state where the blocking plate 90 is disposed at the retracted position. The substrate 9 carried into the substrate processing apparatus 1 is detachably held by the spin base 21. FIG. 4 is a schematic perspective view of the blocking plate 90 as viewed obliquely from below. FIG. 5 is a schematic perspective view of the spin base 21 as viewed obliquely from above.

  In the following description, “processing liquid” includes “chemical liquid” used for chemical liquid processing and “rinsing liquid (also referred to as“ cleaning liquid ”)” used for rinsing for rinsing the chemical liquid. It is.

  The substrate processing apparatus 1 includes a spin chuck 2, a scattering prevention unit 3, a surface protection unit 4, a processing unit 5, and a control unit 130. Each of these units 2 to 5 is electrically connected to the control unit 130 and operates in accordance with an instruction from the control unit 130. As the control unit 130, for example, the same one as a general computer can be adopted. That is, the control unit 130 stores, for example, a CPU that performs various arithmetic processes, a ROM that is a read-only memory that stores basic programs, a RAM that is a readable and writable memory that stores various information, control software, data, and the like. It has a magnetic disk to keep. In the control unit 130, the CPU as the main control unit performs arithmetic processing according to the procedure described in the program, thereby controlling each unit of the substrate processing apparatus 1.

<Spin chuck 2>
The spin chuck 2 is a substrate holding unit that holds the substrate 9 in a substantially horizontal posture with one main surface thereof facing upward, and the substrate 9 is vertically rotated through the center c1 of the main surface. Rotate around axis a1.

  The spin chuck 2 includes a spin base (“holding member”) 21 that is a disk-like member that is slightly larger than the substrate 9. The spin base 21 is formed with a cylindrical through-hole 21a that opens at the center of the upper surface and the lower surface thereof so that the central axis thereof coincides with the rotation axis a1. A cylindrical rotary shaft 22 is connected to the lower opening of the through hole 21a. Thereby, the through-hole 21a and the hollow part of the rotating shaft part 22 are connected. The rotating shaft portion 22 is arranged in such a posture that its axis is along the vertical direction. In addition, a rotation drive unit (for example, a motor) 23 is connected to the rotation shaft unit 22. The rotation drive unit 23 drives the rotation shaft unit 22 to rotate about its axis. The axis of the rotary shaft portion 22 coincides with the rotary shaft a1. Accordingly, the spin base 21 can rotate around the rotation axis a <b> 1 together with the rotation shaft portion 22. The rotating shaft portion 22 and the rotation driving portion 23 are accommodated in a cylindrical casing 24.

  In addition, a plurality of (for example, six) chuck pins 25 are provided in the vicinity of the peripheral edge of the upper surface of the spin base 21 with appropriate intervals. Each chuck pin 25 is attached to the spin base 21 through a plurality of openings 21 b provided on the upper surface of the spin base 21. The chuck pins 25 are in contact with the end surface of the substrate 9 to position the substrate 9 in the horizontal direction, and at a position slightly higher than the upper surface of the spin base 21 (that is, at a predetermined interval from the upper surface of the spin base 21). The substrate 9 is held in a substantially horizontal posture. That is, the spin base 21 holds the substrate 9 substantially horizontally from below via the chuck pins 25. The upper surface of the spin base 21 faces, for example, substantially parallel to the lower surface of the substrate 9 with a gap. Two protrusions 26 are provided at equal intervals along the circumferential direction on the cylindrical side surface portion of the spin base 21. It is sufficient that at least one protrusion 26 is provided, and a large number of protrusions 26 may be provided.

In this configuration, when the rotation drive unit 23 rotates the rotation shaft portion 22 with the spin base 21 holding the substrate 9 by the chuck pin 25 above the spin base 21, the spin base 21 rotates about the axis along the vertical direction. Thus, the substrate 9 held on the spin base 21 is rotated around a vertical rotation axis a1 passing through the center c1 in the plane. The surface protection unit 4 described later is provided with a blocking plate 90 so as to be rotatable in the circumferential direction about the rotation axis a1. The relative position of the spin base 21 and the blocking plate 90 in the circumferential direction can be regulated. When the rotation drive unit 23 rotates the rotation shaft unit 22 in a state where the relative position is regulated, the spin base 21, the substrate 9, and the shielding plate 90 rotate in the same rotation direction at the same rotation speed. A rotation drive unit 23, and the projecting portion 26, the control structure 94 is a mechanism for the blocking plate 90 and the spin base 21, Ru is rotated in the same direction around a rotation axis a1.

  Note that another rotation drive unit that rotates the blocking plate 90 about the rotation axis a <b> 1 in a state where the relative position is regulated may be provided instead of the rotation drive unit 23. In this case, the other rotation drive unit is one of the components of the rotation mechanism 231 instead of the rotation drive unit 23. Moreover, both the rotational drive part 23 and the said other rotational drive part may be provided. That is, the rotation mechanism 231 rotates at least one of the spin base 21 and the blocking plate 90 about the rotation axis a1 in a state where the relative position between the spin base 21 and the blocking plate 90 in the circumferential direction is restricted. If the rotation mechanism 231 rotates the spin base 21 and the shielding plate 90 in the same direction at the same speed, an air flow toward the center c1 side of the substrate 9 is generated between the upper surface of the substrate 9 and the lower surface of the shielding plate 90. Can be suppressed. Thereby, it can suppress that the liquid suitability of the processing liquid is sucked into the upper surface of the substrate.

  The chuck pin 25 and the rotation driving unit 23 are electrically connected to the control unit 130 and operate under the control of the control unit 130. That is, the timing of holding the substrate 9 on the spin base 21, the timing of releasing the held substrate 9, and the rotation mode of the spin base 21 (specifically, the rotation start timing, the rotation end timing, the rotation speed (that is, , Rotation speed), etc. are controlled by the control unit 130.

<Spattering prevention part 3>
The scattering prevention unit 3 receives a processing liquid or the like scattered from the substrate 9 rotated together with the spin base 21.

  The scattering prevention unit 3 includes a splash guard 31. The splash guard 31 is a cylindrical member having an open upper end and is provided so as to surround the spin chuck 2. In this embodiment, the splash guard 31 includes, for example, a bottom member 311, an inner member (also referred to as “inner guard” or simply “guard”) 312, and an outer member (also referred to as “outer guard”) 313. It is configured to include individual members. The external member 313 may not be provided, and conversely, a guard may be further provided outside the outer member 313 so as to surround the spin chuck 2.

  The bottom member 311 is a cylindrical member having an open upper end, and has an annular bottom, a cylindrical inner wall extending upward from the inner edge of the bottom, and a cylinder extending upward from the outer edge of the bottom. A shaped outer wall. At least the vicinity of the tip of the inner wall portion is accommodated in an inner space of a bowl-shaped member 241 provided in the casing 24 of the spin chuck 2.

  A drainage groove (not shown) that communicates with the space between the inner wall portion and the outer wall portion is formed in the bottom portion. The drainage groove is connected to a factory drainage line. The drainage groove is connected to an exhaust fluid mechanism that forcibly exhausts the groove and places the space between the inner wall portion and the outer wall portion in a negative pressure state. The space between the inner wall portion and the outer wall portion is a space for collecting and draining the processing liquid used for processing the substrate 9, and the processing liquid collected in this space is discharged from the drain groove. Drained.

  The inner member 312 is a cylindrical member having an open upper end, and the upper portion (“upper end portion”, “upper end portion”) of the inner member 312 extends inward and upward. That is, the upper part extends obliquely upward toward the rotation axis a1. A cylindrical inner peripheral wall portion extending downward along the upper inner peripheral surface and a cylindrical outer peripheral wall portion extending downward along the upper outer peripheral surface are formed at the lower portion of the inner member 312. In a state where the bottom member 311 and the inner member 312 are close to each other (the state shown in FIG. 1), the outer wall portion of the bottom member 311 is accommodated between the inner peripheral wall portion and the outer peripheral wall portion of the inner member 312. The processing liquid received by the upper part of the inner member 312 is discharged through the bottom member 311.

  The outer member 313 is a cylindrical member having an open upper end and is provided outside the inner member 312. The upper part (“upper end portion”, “upper end portion”) of the external member 313 extends inward and upward. That is, the upper part extends obliquely upward toward the rotation axis a1. The lower portion extends downward along the outer peripheral wall portion of the inner member 312. The processing liquid received by the upper part of the outer member 313 is discharged from the gap between the outer peripheral wall part of the inner member 312 and the lower part of the outer member 313.

  The splash guard 31 is provided with a guard driving mechanism (“elevating drive unit”) 32 that moves the splash guard 31 up and down. The guard drive mechanism 32 is configured by, for example, a stepping motor. In this embodiment, the guard drive mechanism 32 raises and lowers the three members 311, 312, and 313 included in the splash guard 31 independently.

  Each of the inner member 312 and the outer member 313 receives the drive of the guard drive mechanism 32 and is moved between the upper position and the lower position. Here, the upper positions of the members 312 and 313 are positions at which the upper edge portions of the members 312 and 313 are arranged on the side and above the substrate 9 held on the spin base 21. On the other hand, the lower positions of the members 312 and 313 are positions where the upper edge portions of the members 312 and 313 are disposed below the upper surface of the spin base 21. The upper position (lower position) of the external member 313 is located slightly above the upper position (lower position) of the inner member 312. The inner member 312 and the outer member 313 are raised or lowered simultaneously or sequentially so as not to collide with each other. The bottom member 311 is driven by the guard drive mechanism 32 between a position where the inner wall portion is accommodated in the inner space of the flange-shaped member 241 provided in the casing 24 and a position below the bottom member 311. However, the guard driving mechanism 32 is electrically connected to the control unit 130 and operates under the control of the control unit 130. That is, the position of the splash guard 31 (specifically, the position of each of the bottom member 311, the inner member 312, and the outer member 313) is controlled by the control unit 130.

<Surface protector 4>
The surface protection unit 4 supplies gas (cover gas) to the vicinity of the center of the upper surface of the substrate 9 held on the spin base 21, and the atmosphere of the processing liquid supplied to the lower surface of the upper surface of the substrate 9. Protect from etc.

  The surface protection unit 4 includes a cylindrical cover gas nozzle 41 that discharges a gas toward the vicinity of the center of the upper surface of the substrate 9 held on the spin base 21. The cover gas nozzle 41 is attached to a portion near the tip of the arm 42 extending horizontally, and penetrates the arm 42 in the vertical direction. The center axis of the cover gas nozzle 41 coincides with the rotation axis a1. The lower end portion of the cover gas nozzle 41 extends further downward from the lower end surface of the arm 42. A disc-shaped rotating portion 93 is attached to the lower end portion of the cover gas nozzle 41 via a bearing. The central axis of the rotation part 93 coincides with the rotation axis a1. Thereby, the rotation part 93 can rotate in the circumferential direction around the cover gas nozzle 41 around the rotation axis a1.

  A disc-shaped blocking plate (“opposing member”) 90 is attached to the lower portion of the rotating portion 93 so as to be rotatable together with the rotating portion 93. The upper surface of the blocking plate 90 is provided so as to be substantially horizontal, and the shape thereof is a circle slightly larger than that of the spin base 21, and the rotation axis a1 passes through the center thereof. Thereby, the interruption | blocking board 90 can rotate to the circumferential direction centering on the rotating shaft a1. The blocking plate 90 includes a disc-shaped main body portion 91 having the rotation axis a <b> 1 as a central axis, and an extending portion 92 provided at the peripheral edge of the main body portion 91. A through hole 91 a that communicates with the cover gas nozzle 41 is provided at the center of the main body 91. The extending portion 92 is a cylindrical wall portion (annular wall portion) that extends downward from the peripheral edge portion of the main body portion 91, and is provided along the circumferential direction of the peripheral edge portion. The extending portion 92 is a cylindrical member that surrounds the end surface of the substrate 9 from the peripheral edge of the main body 91 and extends toward the spin base 21. The extending portion 92 protrudes toward the spin base 21 from the substrate 9 across the plane including the substrate 9 outside the end surface of the substrate 9.

  The base end portion of the arm 42 is connected to the nozzle base 43. The nozzle base 43 is arranged in such a posture that its axis is along the vertical direction, and is configured to be able to expand and contract along the vertical direction. The base end portion of the arm 42 is connected to the upper end of the nozzle base 43. The nozzle base 43 is provided with a drive unit (“moving unit”) 44 that expands and contracts the nozzle base 43 along its axis. The drive unit 44 includes, for example, a stepping motor.

  The drive unit 44 expands and contracts the nozzle base 43 to rotate the blocking plate 90 between the processing position (“first position”) and the retracted position (“second position”) above the processing position. Move relative to the spin base 21 along the a1 direction. The processing position of the shielding plate 90 is a position above the substrate 9 held on the spin base 21, and the lower surface of the shielding plate 90 faces the upper surface of the substrate 9 and is close to the upper surface in a non-contact state. Position. The retracting position of the blocking plate 90 is a position where the blocking plate 90 does not interfere with the transport path of the substrate 9, and is, for example, a position above the upper edge of the splash guard 31. When the blocking plate 90 is disposed at the processing position, the main body 91 faces the upper surface of the substrate 9 held by the spin base 21 with a gap therebetween, for example, substantially in parallel. The drive unit 44 is electrically connected to the control unit 130 and operates under the control of the control unit 130. That is, the position of the blocking plate 90 is controlled by the control unit 130.

  Two restriction structures 94 are provided at the distal end side portion of the extending portion 92. As the restriction structure 94, for example, as shown in FIG. 4, a recess that opens from the distal end surface of the extending portion 92 to the inner peripheral surface of the extending portion 92 is employed. At least a part of the protruding portion 26 is accommodated in the recess.

  An initial position (initial rotation angle) in each circumferential direction is set in advance on the spin base 21 and the blocking plate 90. When the blocking plate 90 is disposed at the retracted position above the processing position, the spin base 21 and the blocking plate 90 are respectively disposed at the initial positions in the circumferential direction. In this state, the two restricting structures 94, when seen through from above the blocking plate 90, overlap the two projecting portions 26 provided on the side surface portion of the spin base 21, respectively, on the distal end side of the extending portion 92 Each part is provided.

  As shown in FIG. 6, at least a part of the protruding portion 26 is accommodated in the restriction structure 94 in a state where the blocking plate 90 is disposed at the processing position. In this case, the restricting structure 94 is disposed so as to face the protruding portion 26 from the front and rear in the circumferential direction around the rotation axis a <b> 1, and restricts relative movement of the protruding portion 26 in the circumferential direction. In addition, in a state where the blocking plate 90 is disposed at the processing position, the extending portion 92 extends from the peripheral portion of the main body portion 91 to the side of the spin base 21. The restricting structure 94 is disposed below the upper surface of the spin base 21. That is, both the protruding portion 26 and the restricting structure 94 are disposed below the upper surface of the spin base 21. The spin base 21 and the blocking plate 90 are mutually restricted in relative movement in the circumferential direction around the rotation axis a <b> 1 through the protruding portion 26 and the restriction structure 94. That is, the restricting structure 94 and the protruding portion 26 are restricting portions 201 that restrict relative movement of the spin base 21 and the blocking plate 90 in the circumferential direction. In other words, the restricting portion 201 restricts the relative position of the blocking plate 90 with respect to the spin base 21 in the circumferential direction around the rotation axis a1.

  When the blocking plate 90 is disposed at the retracted position, the circumferential rotational positions of the restricting structure 94 and the protrusion 26 around the rotational axis a1 are aligned with each other. The restricting structure 94 is disposed so as to avoid a relative movement path of the protruding portion 26 with respect to the restricting structure 94 in the process of moving the blocking plate 90 from the retracted position to the processing position. Thereby, the collision with the control structure 94 and the protrusion part 26 in the said movement process can be avoided. When the blocking plate 90 is disposed at the processing position, the restricting structure 94 is disposed to face the protruding portion 26 from the front and rear in the circumferential direction around the rotation axis a1. More specifically, when the spin base 21 is stopped immediately after the restricting structure 94 is disposed at the processing position, the restricting structure 94 projects without contacting the projecting portion 26 from the front and rear in the circumferential direction. It is arranged to face the part 26. Thereby, the relative position of the blocking plate 90 with respect to the spin base 21 in the circumferential direction is restricted. Further, when the blocking plate 90 is disposed at the retracted position, the restricting structure 94 is disposed relatively away from the protruding portion 26 along the direction of the rotation axis a1.

  When the blocking plate 90 is arranged at the processing position and the rotation driving unit 23 rotates the rotating shaft unit 22 in a state where the relative position in the circumferential direction of the blocking plate 90 with respect to the spin base 21 is regulated by the regulating unit 201, The spin base 21 rotates with the substrate 9. As a result, the protrusion 26 abuts against the protrusion 26 in the restricting structure 94 on the downstream side in the rotation direction. Thereafter, the blocking plate 90 is driven to rotate in the same rotational direction as the spin base 21 at the same rotational speed.

  Here, for example, consider a case where an emergency stop operation is performed while the substrate processing apparatus 1 is processing while rotating the substrate. For example, in this case, it is assumed that the substrate processing apparatus 1 moves the blocking plate 90 to the retracted position. Thus, even when the blocking plate 90 and the spin base 21 are not at the initial position (initial rotation angle), it is necessary to automatically restart the processing.

  The spin base 21 can be rotated by being driven by the rotation driving unit 23, while the blocking plate 90 is rotated by the rotation of the spin base 21. Therefore, the following operation is required. For example, the control unit 130 controls the driving unit 44 to move the blocking plate 90 in the vertical direction so that the blocking plate 90 slightly contacts the spin base 21. Thereafter, the control unit 130 controls the rotation driving unit 23 to rotate the spin base 21 at a low speed, thereby rotating the shielding plate 90 in the circumferential direction around the rotation axis a1.

  The blocking plate 90 includes a sensor that can detect the initial position of the blocking plate 90 in the circumferential direction. Based on the output of the sensor, the control unit 130 controls the rotation driving unit 23 to stop the rotation of the blocking plate 90 when the blocking plate 90 reaches the initial position.

  Thereafter, the control unit 130 controls the drive unit 44 to move the blocking plate 90 to the upper retracted position, and controls the rotation drive unit 23 to rotate the spin base 21 to the initial position in the circumferential direction. Thereby, the shielding plate 90 and the spin base 21 are disposed at the initial position in the circumferential direction in a state where the shielding plate 90 is disposed at the retracted position. When the shielding plate 90 moves relative to the spin base 21 between the retracted position and the processing position, it is preferable that the shielding plate 90 does not deviate from the initial position in the circumferential direction. For this reason, the surface protection unit 4 is preferably provided with a lock mechanism that fixes the circumferential position of the rotation unit 93 and the shielding plate 90 with respect to the arm 42 in a state where the shielding plate 90 is disposed at the initial position in the circumferential direction. . When the blocking plate 90 is disposed at the processing position, the lock mechanism is released.

  4 and 5, the restricting structure 94 is provided at the front end side portion (lower end side portion) of the extending portion 92 and the protruding portion 26 is provided at the side surface portion of the spin base 21. 94 may be provided on the side surface portion of the spin base 21, and the projecting portion 26 may be provided on the distal end side portion of the extending portion 92. In other words, the protruding portion 26 is provided in one of the distal end side portion of the extending portion 92 of the blocking plate 90 and the side surface portion of the spin base 21, and the restriction structure 94 is provided in the other portion.

  For example, a pair of projecting portions disposed opposite to the projecting portions 26 from the front and rear in the circumferential direction around the rotation axis a <b> 1 may be employed as the restricting structure 94. Also in this case, since the relative movement of the protruding portion 26 in the circumferential direction can be restricted by the restriction structure, the usefulness of the present invention is not impaired. As shown in FIG. 4, when a recess that can accommodate at least a part of the protruding portion 26 is employed as the restricting structure, the distance between the spin base 21 and the extending portion 92 of the blocking plate 90 is made narrower. Therefore, the blocking plate 90 can be made smaller in diameter.

  Moreover, although the extending part 92 shown by FIG. 4 is a cylindrical member, it is distributed in the circumferential direction in the peripheral part of the main-body part 91 as an extending part, and several wall part extended below from a peripheral part. Or a pillar part may be used. The extending portion extends from at least a part of the peripheral edge of the main body 91 to the side of the spin base 21. If the extending portion is a cylindrical member, the flow of the processing liquid supplied to the substrate 9 and discharged from the substrate 9 to the outside is not traversed, so that the processing liquid that rebounds from the extending portion to the substrate 9 side can be reduced. it can.

The cover gas nozzle 41 is connected to a cover gas supply unit 45 which is a piping system for supplying gas (here, for example, nitrogen (N ₂ ) gas). Specifically, for example, the cover gas supply unit 45 is connected to the cover gas nozzle 41 through a pipe 452 in which an on-off valve 453 is inserted, for example, a nitrogen gas supply source 451 that is a supply source for supplying nitrogen gas. It has a configuration. In this configuration, when the on-off valve 453 is opened, the nitrogen gas supplied from the nitrogen gas supply source 451 is discharged from the through hole 91 a provided in the central portion of the blocking plate 90 through the cover gas nozzle 41. The gas supplied to the cover gas nozzle 41 may be a gas other than nitrogen gas (for example, various inert gases other than nitrogen gas, dry air, etc.).

  When gas is supplied from the cover gas supply unit 45 to the cover gas nozzle 41 in a state where the blocking plate 90 is disposed at the processing position, the center of the upper surface of the substrate 9 held on the spin base 21 from the cover gas nozzle 41. A gas (cover gas) is discharged toward the upper surface of the substrate 9 toward the vicinity. However, the on-off valve 453 of the cover gas supply unit 45 is electrically connected to the control unit 130 and is opened and closed under the control of the control unit 130. That is, the discharge mode (specifically, discharge start timing, discharge end timing, discharge flow rate, etc.) of the gas from the cover gas nozzle 41 is controlled by the control unit 130.

<Processing unit 5>
The processing unit 5 performs processing on the processing surface (the lower surface in the example of FIG. 1) of the substrate 9 held on the spin base 21. Specifically, the processing unit 5 supplies the processing liquid to the processing surface of the substrate 9 held on the spin base 21.

  As shown in FIG. 1, the processing unit 5 includes, for example, a supply pipe 81 that is disposed so as to penetrate through the hollow portion of the rotation shaft portion 22 of the spin chuck 2. The tip of the supply pipe 81 is connected to the opening below the through hole 21a so that the supply pipe 81 and the through hole 21a of the spin base 21 communicate with each other. A nozzle 50 is connected to the opening on the upper side (substrate 9 side) of the through hole 21a. The nozzle 50 includes a discharge port on the processing surface of the substrate 9 that is held by the spin base 21 and is rotating. The nozzle 50 discharges the processing liquid supplied through the supply pipe 81 from the discharge port to the lower surface of the substrate. In addition, a nozzle capable of supplying a processing liquid to the upper surface (the whole or a peripheral portion) of the substrate 9 as a processing surface may be employed. Such a nozzle is provided on the blocking plate 90, for example. As the nozzle 50, various nozzles capable of discharging the processing liquid onto the processing surface of the substrate 9 can be employed.

  The supply pipe 81 is connected to a treatment liquid supply unit 83 which is a piping system for supplying a treatment liquid thereto. Specifically, the processing liquid supply unit 83 includes an SC-1 supply source 831a, a DHF supply source 831b, an SC-2 supply source 831c, a rinse liquid supply source 831d, a plurality of pipes 832a, 832b, 832c, 832d, and A plurality of on-off valves 833a, 833b, 833c, and 833d are combined.

  The SC-1 supply source 831a is a supply source that supplies SC-1. The SC-1 supply source 831a is connected to the supply pipe 81 via a pipe 832a in which an on-off valve 833a is inserted. Therefore, when the on-off valve 833a is opened, SC-1 supplied from the SC-1 supply source 831a is discharged from the nozzle 50.

  The DHF supply source 831b is a supply source that supplies DHF. The DHF supply source 831b is connected to the supply pipe 81 via a pipe 832b in which an on-off valve 833b is inserted. Therefore, when the on-off valve 833b is opened, DHF supplied from the DHF supply source 831b is discharged from the nozzle 50.

  The SC-2 supply source 831c is a supply source that supplies SC-2. The SC-2 supply source 831c is connected to the supply pipe 81 via a pipe 832c in which an on-off valve 833c is inserted. Therefore, when the on-off valve 833c is opened, SC-2 supplied from the SC-2 supply source 831c is discharged from the nozzle 50.

  The rinse liquid supply source 831d is a supply source that supplies a rinse liquid. Here, the rinse liquid supply source 831d supplies, for example, pure water as the rinse liquid. The rinse liquid supply source 831d is connected to the supply pipe 81 via a pipe 832d in which an on-off valve 833d is inserted. Therefore, when the on-off valve 833d is opened, the rinse liquid supplied from the rinse liquid supply source 831d is discharged from the nozzle 50. As the rinsing liquid, pure water, warm water, ozone water, magnetic water, reducing water (hydrogen water), various organic solvents (ion water, IPA (isopropyl alcohol), functional water (CO2 water, etc.)), etc. are used. May be.

  When the processing liquid (SC-1, DHF, SC-2, or rinsing liquid) is supplied from the processing liquid supply unit 83 to the supply pipe 81, the processing of the substrate 9 held on the spin base 21 from the nozzle 50 is performed. The treatment liquid is discharged toward the vicinity of the center of the surface. However, each of the on-off valves 833a, 833b, 833c, and 833d provided in the processing liquid supply unit 83 is electrically connected to the control unit 130 and is opened and closed under the control of the control unit 130. That is, the control unit 130 controls the discharge mode of the processing liquid from the nozzle 50 (specifically, the type of processing liquid to be discharged, the discharge start timing, the discharge end timing, the discharge flow rate, etc.). The nozzle 50, the supply pipe 81, and the processing liquid supply unit 83 are a processing liquid discharge unit 83 </ b> A that discharges the processing liquid onto the processing surface of the substrate 9 under the control of the control unit 130.

<2. Structure of shielding plate and spin base>
FIGS. 6 and 7 are longitudinal sectional views showing the configuration of the peripheral portion of the shielding plate 90 and the spin base 21 when the shielding plate 90 is disposed at the processing position. FIG. 6 shows a cross section of the restricting portion 201, and FIG. 7 shows a cross section of a portion other than the restricting portion 201. 6 and 7, the outer member 313 of the splash guard 31 is disposed at the upper position, and the inner member 312 is disposed at the lower position. FIG. 8 is a cross-sectional view showing the restricting portion 201. FIG. 9 is a cross-sectional view showing another restricting portion 201F according to the embodiment.

  The spin base 21 includes a disk-shaped base portion 28 having a circular upper surface shape, and an annular flange portion projecting radially outward from a position slightly below the upper surface of the base portion 28 at the periphery (side surface) of the base portion 28. 29. The base portion 28 and the flange portion 29 are integrally formed of, for example, vinyl chloride. The upper surface and the lower surface of the flange portion 29 (more specifically, the lower surface of the flange portion 29 other than the base end portion, that is, the lower surface of the distal end side portion of the flange portion 29) are formed along the horizontal plane, and the base portion 28 The side surface is a vertical surface. An annular curved surface (“curved surface portion”) 211 along the circumferential direction of the spin base 21 is formed at the proximal end portion of the flange portion 29. The curved surface 211 has, for example, a ¼ arc-shaped cross-section that protrudes obliquely upward toward the rotation axis a1. The radius of the arc is set to 5 mm to 10 mm, for example. The lower surface of the front end side portion of the flange portion 29 and the portion of the side surface of the base portion 28 below the flange portion 29 are gently connected by a curved surface 211.

  An annular recess is formed by the upper surface of the flange portion 29 and the upper portion of the flange portion 29 among the side surfaces of the base portion 28. A draining portion 27, which is an annular plate member, is fixed to the recess by a bolt. The draining portion 27 is preferably formed of, for example, a fluororesin having higher heat resistance than the base portion 28. The outer peripheral edge portion of the draining portion 27 extends outward from the outer peripheral edge of the flange portion 29 in the radial direction of the base portion 28. The diameter of the outer peripheral edge of the draining portion 27, that is, the diameter of the outer peripheral edge of the spin base 21 is larger than the diameter of the substrate 9. The upper surface of the draining portion 27 other than the outer peripheral edge portion (“tip portion”) is the same horizontal plane as the upper surface of the base portion 28. The upper surface of the outer peripheral edge portion of the draining portion 27 is a curved surface that protrudes obliquely upward and outward and is curved. The outer peripheral edge portion gradually decreases in thickness as it approaches the outer peripheral edge. The two protrusions 26 described above are provided so as to protrude from the tip (outer edge) of the outer peripheral edge of the draining portion 27 toward the radially outer side of the blocking plate 90. For example, the protrusion 26 is formed in a quadrangular prism shape as shown in FIGS. 5, 6, and 8. The upper surface 261 of the protruding portion 26 is a rectangular horizontal plane. The front end surface 262 of the protruding portion 26 is a rectangular vertical surface in which a normal line passing through the center of the front end surface 262 intersects with the rotation axis a1. The side surfaces 263 and 264 of the protruding portion 26 are rectangular vertical surfaces that are orthogonal to both the upper surface 261 and the tip surface 262. The upper surface 261 is located below the upper surface of the base portion 28. As a result, the entire protrusion 26 is positioned below the upper surface of the base 28.

  The main body 91 of the blocking plate 90 is a disk-shaped member made of, for example, vinyl chloride. The lower surface 911 other than the peripheral portion of the lower surface of the main body 91 faces the upper surface of the substrate 9 held by the chuck pins 25 of the spin base 21 with a gap. A distance D2 between the lower surface 911 and the upper surface of the substrate 9 is, for example, about 1 mm. An annular recess along the periphery is formed on the periphery of the lower surface of the main body 91. Thereby, the thickness of the peripheral part of the main-body part 91 is about half of the other part. The extending portion 92 has an annular shape that can be fitted into the recess. The extending portion 92 is fitted in the recess and is fixed to the main body portion 91 with a bolt. The extending portion 92 is preferably formed of a material having better heat resistance than the main body portion 91, for example, a fluororesin. The annular inner peripheral surface 921 of the extending portion 92 is erected upward from the lower end thereof, and then extends to the upper side of the peripheral portion of the substrate 9 toward the rotating shaft a1 side. An annular peripheral portion on the rotation axis a1 side of the inner peripheral surface 921 is gently connected to the lower surface 911 of the main body 91, and forms an opposing surface that faces the upper surface of the substrate 9 together with the lower surface 911. The extending portion 92 is a cylindrical wall portion extending downward from the peripheral edge portion of the main body portion 91, and the tip side portion extends to a side portion of the spin base 21. Of the inner peripheral surface 921 of the extending portion 92, the tip side (lower end side) portion of the extending portion 92 extends to the side portion of the spin base 21. The inner peripheral surface 921 on the outer edge side of the extending portion 92 is a curved surface that is curved so as to protrude obliquely upward and outward with respect to the upper surface of the spin base 21. Thereby, the width of the distal end side portion of the extending portion 92 in the radial direction of the blocking plate 90 is gradually reduced toward the lower side, that is, the side portion of the spin base 21. As described above, the inner peripheral surface 921 is continuous with the lower surface of the blocking plate 90 and bulges and curves so as to protrude obliquely upward and outward with respect to the upper surface of the spin base 21.

  A restricting structure 94 is formed at the distal end portion of the extending portion 92. For example, as shown in FIGS. 4, 6, and 8, the restriction structure 94 is a dent that opens from the distal end surface of the extending portion 92 to the inner peripheral surface of the extending portion 92. The restriction structure 94 is formed so as to be able to accommodate at least a part of the protruding portion 26 when the blocking plate 90 is disposed at the processing position. The upper surface 941 of the restriction structure 94 is a rectangular horizontal plane. The bottom surface 942 of the restriction structure 94 is a rectangular vertical surface that is orthogonal to the top surface 941 and whose normal passing through the center intersects the rotation axis a1. The side surfaces 943 and 944 of the restriction structure 94 are rectangular vertical surfaces that are orthogonal to both the upper surface 941 and the bottom surface 942. The upper surface 941 is located below the upper surface of the base portion 28 and above the upper surface 261 of the protruding portion 26. As a result, the entire restriction structure 94 is positioned below the upper surface of the base portion 28.

  When the blocking plate 90 is disposed at the processing position, one of the two restricting structures 94 accommodates at least a part of one of the two projecting portions 26, and the other restricting structure 94 is disposed on the other projecting portion 26. Accommodates at least a portion.

  When the spin base 21 is stopped immediately after the protruding portion 26 is accommodated in the restricting structure 94, the upper surface 941 of the restricting structure 94 and the upper surface 261 of the protruding portion 26 face each other with a gap. At the same time, the bottom surface 942 of the restricting structure 94 and the front end surface 262 of the protruding portion 26 face each other with a gap. The side surface 943 of the restricting structure 94 faces the side surface 263 of the protruding portion 26, and the side surface 944 of the restricting structure 94 faces the side surface 264 of the protruding portion 26. Thereby, the restricting structure 94 is disposed so as to face the protruding portion 26 from the front and rear in the circumferential direction around the rotation axis a <b> 1, and can restrict relative movement of the protruding portion 26 in the circumferential direction. The restricting structure 94 and the protruding portion 26 are restricting portions 201 that restrict the relative movement of the spin base 21 and the blocking plate 90 along the circumferential direction around the rotation axis a1.

  As shown in FIG. 7, in the state where the blocking plate 90 is disposed at the processing position, the distal end side portion of the extending portion 92, the side portion of the spin base 21, more specifically, the distal end portion of the draining portion 27. A gap G1 is formed in a portion other than the restricting portion 201. The width D1 of the gap G1 is, for example, about 1 mm to 5 mm. The processing liquid discharged by the nozzle 50 of the processing unit 5 onto the processing surface of the substrate 9 is discharged to the outside of the substrate 9 along the processing surface, and further discharged to the outside from the peripheral portion of the spin base 21 through the gap G1. The If the tip portion of the extension portion 92 and the top surface of the tip portion of the draining portion 27 of the inner peripheral surface 921 of the extension portion 92 are curved with each other as described above, the processing liquid will be in the gap G1. Is smoothly discharged to the outside.

  The upper end portion of the inner peripheral surface 921 of the extending portion 92 is located above the opposing surface (more specifically, the peripheral edge portion of the opposing surface) of the lower surface of the shielding plate 90, that is, the spin base 21. It exists in the position higher than the said opposing surface with respect to an upper surface. Thereby, an annular recess 922 is formed at the upper end portion of the inner peripheral surface 921. The recess 922 is formed along the circumferential direction with the rotation axis a1 as the center. The recessed portion 922 is formed between the distal end portion of the extending portion 92 and the portion of the blocking plate 90 that faces the substrate 9. That is, the recessed portion 922 is formed in a portion of the inner side surface 901 of the blocking plate 90 between the tip side portion of the extending portion 92 and the facing portion facing the substrate 9. The inner side surface 901 is a surface surrounding the upper surface and the end surface of the substrate 9. The inner side surface 901 includes a lower surface 911 of the main body portion 91 and an inner peripheral surface 921 of the extending portion 92. The recess 922 is recessed above the peripheral edge of the opposing portion of the blocking plate 90 that faces the upper surface of the substrate 9. An annular bulged space (“bulged space”) 923 is formed between the recessed portion 922 and the upper surface of the spin base 21. The space 923 swells above the opposing surface of the blocking plate 90 that faces the substrate 9. A distance D3 between the most recessed portion of the recess 922 and the upper surface of the substrate 9 is longer than the distance D2. The width D4 of the recess 922 in the radial direction of the blocking plate 90 is preferably set to 20 mm or more, for example.

  Of the inner side surface 901 of the blocking plate 90 (more specifically, the inner peripheral surface 921 of the extending portion 92), the portion outside the recessed portion 922 (the radially outer side of the blocking plate 90) with respect to the lower surface 911 As described above, a curved surface that bulges and curves obliquely upward and outward with respect to the upper surface of the spin base 21 is formed. In the illustrated example, the lower surface 911 is parallel to the upper surface of the substrate 9. However, the entire lower surface 911 may not be parallel to the upper surface of the substrate 9, for example, a portion of the lower surface 911 excluding the peripheral edge portion becomes higher from the upper surface of the substrate 9 toward the center of the lower surface 911.

  The processing liquid discharged from the gap G1 may stay in the space between the extending portion 92 and the draining portion 27 depending on the amount of the processing liquid and the width of the gap G1, but is formed by the recess 922. The space 923 becomes a buffer. Thereby, it can suppress that a process liquid rebounds and adheres to the non-processing surface of the board | substrate 9 resulting from the staying process liquid.

  Further, a part of the processing liquid discharged from the tip portion of the draining portion 27 hits the regulation structure 94 and the protruding portion 26 and rebounds. However, in a state where the blocking plate 90 is disposed at the processing position, both the restriction structure 94 of the blocking plate 90 and the protruding portion 26 of the spin base 21 are below the upper surface of the spin base 21, so that they are rebounded. The treatment liquid is prevented from adhering to the main surface (“non-treatment surface”) other than the treatment surface of the substrate 9.

  If the extending portion 92 and the draining portion 27 are formed of a fluororesin or the like having excellent heat resistance, it is possible to suppress damage to the shielding plate 90 and the spin base 21 due to the high temperature even when the treatment liquid is at a high temperature. it can. However, for example, a fluororesin is superior in heat resistance to vinyl chloride but has a low hardness. When the rotation driving unit 23 rotates the spin base 21 via the rotating shaft portion 22 with the blocking plate 90 disposed at the processing position, the projecting portion 26 and the regulating structure 94 contact each other during acceleration and deceleration. Touch. Thereby, the restricting structure 94 and the protrusions 26, that is, the members made of fluororesin may collide, and dust may be generated. When this dust adheres to the substrate 9, it becomes a defect. Note that the extending portion 92 and the spin base 21 may be integrally formed of the same material.

  In the configuration example of FIG. 9, the protruding portion 26 of the spin base 21 is covered with an O-ring formed of an elastic member such as EPDM on the outer peripheral surface other than the tip surface 262. Even when the restricting structure 94 and the protruding portion 26 come into contact with each other when the spin base 21 is accelerated, generation of dust can be suppressed. Note that dust generation can be suppressed if at least one of the protruding portion 26 and the restricting structure 94 is covered with an elastic member at a portion facing the other. Even if neither the protrusion 26 nor the restriction structure 94 is covered with the elastic member, the usefulness of the present invention is not impaired.

  12 and 13 are longitudinal sectional views showing a blocking plate 90B and a spin base 21B as another configuration example of the blocking plate and the spin base of the substrate processing apparatus according to the embodiment. 12 and 13 show the peripheral portions of the blocking plate 90B and the spin base 21B. In FIG. 12, the cross section in the control part 201 is shown, and in FIG. 13, the cross section in parts other than the control part 201 is shown. The blocking plate 90B has the same configuration as the blocking plate 90 except that the extending portion 92B is provided instead of the extending portion 92 of the blocking plate 90. The spin base 21 </ b> B has the same configuration as the spin base 21 except that a draining portion 27 </ b> B is provided instead of the draining portion 27 of the spin base 21.

  The inner peripheral surface (lower surface) 921B of the extending portion 92B is smoothly connected to the lower surface of the main body portion 91 other than the thin peripheral edge portion. The inner peripheral surface 921B is not formed with the recessed portion 922 of the extending portion 92. Moreover, the curved surface provided in the upper surface of the front-end | tip part of the draining part 27 is not formed in the draining part 27B, and the front end surface of the draining part 27B is a vertical surface. The processing liquid is discharged to the outside through the gap G2 between the extending portion 92B and the draining portion 27B through the processing surface of the substrate 9 and the peripheral edge of the upper surface of the spin base 21B. In the portion where the restricting portion 201 is provided, the processing liquid is rebounded by the restricting portion 201 (the restricting structure 94, the protruding portion 26).

  However, the protruding portion 26 provided at the tip portion of the draining portion 27B, that is, the side surface portion of the spin base 21B, and the regulation structure 94 provided at the tip side portion of the extending portion 92B are more than the upper surface of the spin base 21B. It is arranged below. Thereby, the penetration | invasion and adhesion to the non-processing surface of the board | substrate 9 of the processing liquid bounced back are suppressed. Therefore, the blocking plate 90B is used instead of the blocking plate 90, and even if the spin base 21B is used instead of the spin base 21, the usefulness of the present invention is not impaired. Further, the blocking plate 90B may be combined with the spin base 21, and the blocking plate 90 may be combined with the spin base 21B.

<3. About other embodiments>
10 and 11 are perspective views showing a blocking plate 90A and a spin base 21A as another configuration example of the blocking plate and the spin base of the substrate processing apparatus according to the embodiment. FIG. 11 is a perspective view showing the shielding plate 90A and the spin base 21A when the shielding plate 90A is disposed at the processing position.

  The blocking plate 90 </ b> A is configured in the same manner as the blocking plate 90 except that the extending portion 92 </ b> A is provided instead of the extending portion 92 of the blocking plate 90. Similarly to the extending portion 92, the extending portion 92 </ b> A extends from the peripheral portion of the disk-shaped main body portion 91 to the side of the spin base 21 </ b> A, and extends along the circumferential direction about the rotation axis a <b> 1. It is the cylindrical wall part extended cyclically | annularly. The difference between the extending portion 92A and the extending portion 92 is that the blocking plate 90 has two restriction structures 94 at the distal end side portion thereof, whereas the extending portion 92A has a plurality of distal end side portions. The restriction structure 94A is provided.

  The spin base 21A is configured in the same manner as the spin base 21 except that a protrusion 26A is provided in place of the protrusion 26 at the tip of the draining portion 27 of the spin base 21. The restricting structure 94A and the protruding portion 26A are restricting portions 201A that restrict the relative movement of the spin base 21A and the blocking plate 90A in the circumferential direction about the rotation axis a1.

  The plurality of restriction structures 94A are continuously provided over the entire circumference in the circumferential direction of the distal end side portion of the extending portion 92A. Each restricting structure 94A is a recess formed in a shape capable of accommodating at least a part of the protruding portion 26A. Each restricting structure 94A penetrates the distal end portion of the extending portion 92A along the radial direction of the blocking plate 90A, and also opens below the distal end portion. That is, the restricting structure 94A opens in a direction along the direction of the rotation axis a1 to the protruding portion 26A protruding from the side surface portion of the spin base 21A. Note that, even if the restriction structure 94A does not penetrate through the distal end portion of the extending portion 92A along the radial direction of the blocking plate 90A as in the restriction structure 94 shown in FIG. 6, the usefulness of the present invention is impaired. It is not a thing. In this case, the sealing property of the substrate 9 by the blocking plate 90A can be improved.

  The width W1 along the circumferential direction of at least the lower opening portion of the restricting structure 94A becomes wider as the opening approaches. Specifically, the restriction structure 94A includes side surfaces (slopes) 943A and 944A that are diagonally opposed to each other along the circumferential direction around the rotation axis a1. The width W1 along the circumferential direction of the side surface 943A and the side surface 944A becomes wider as approaching downward.

  The protruding portion 26A is formed in a pentagonal column shape, for example, and its axial direction is along the radial direction of the spin base 21A. The protruding portion 26A includes a rectangular horizontal bottom surface 267A, and rectangular side surfaces 265A and 266A provided upright from both ends of the bottom surface 267A in the circumferential direction of the spin base 21A, that is, on the opening side of the restricting structure 94A. Is provided. The side surfaces 265A and 266A are vertical surfaces. Slopes 263A, 264A are connected to the upper ends of the side surfaces 265A, 266A. The slope 263A and the slope 264A form a tip portion (upper end portion) of the protruding portion 26A. The slope 263A and the side surface 943A of the restriction structure 94A are substantially parallel to each other, and the slope 264A and the side surface 944A are also substantially parallel to each other. The width W2 in the circumferential direction centering on the rotation axis a1 between the slope 263A and the slope 264A becomes narrower as approaching upward. That is, at least the tip portion of the protruding portion 26A faces the restriction structure 94A on the tip side portion of the extending portion 92A, and the width W2 along the circumferential direction around the rotation axis a1 of the tip portion has a restriction structure. As it approaches 94, it becomes narrower. Further, the restricting structure 94A and the protruding portion 26A are preferably formed so that at least the tip side portion of the protruding portion 26A can be fitted to at least the opening portion on the protruding portion 26A side of the restricting structure 94A. .

  Here, at least one of the spin base 21A and the blocking plate 90A is not disposed at the initial position in the circumferential direction, and either one is not locked for rotation in the circumferential direction, and the other is Consider the case where the blocking plate 90A is moved from the retracted position to the processing position in the locked state.

  The plurality of restriction structures 94A are continuously provided over the entire circumference in the circumferential direction of the distal end side portion of the extending portion 92A. Accordingly, during the movement of the blocking plate 90A to the processing position, the tip of the protrusion 26A comes into contact with any one of the plurality of restriction structures 94A. In most cases, as shown in FIG. 10, the side surface 944A of the restricting structure 94 and the inclined surface 264A of the protruding portion 26A come into contact with each other, or the side surface 943A of the restricting structure 94 and the inclined surface 263A of the protruding portion 26A Will come into contact. That is, the inclined surfaces having substantially the same inclination contact each other.

  From this state, when the blocking plate 90A is further moved to the processing position, in the process, the extending portion 92A is moved so that the top of the restricting structure 94A and the tip of the protruding portion 26A approach each other in the circumferential direction. Then, it is moved to the processing position while rotating relative to the spin base 21A in the circumferential direction. Then, as shown in FIG. 11, when the blocking plate 90A is disposed at the processing position, the tip end portion of the protruding portion 26A is accommodated in the restricting structure 94A. Thereby, the blocking plate 90A is restricted from moving in the circumferential direction with respect to the spin base 21A.

  When the blocking plate 90A is disposed at the processing position, the upper ends of the restricting structures 94A and the upper ends of the protruding portions 26A are provided below the upper surface of the spin base 21A. Therefore, even when the processing liquid discharged from the processing surface of the substrate 9 hits the regulating portion 201A and rebounds, the rebounding of the processing liquid on the non-processing surface of the substrate 9 can be suppressed.

  A plurality of restricting structures 94A may be provided along the circumferential direction at the side surface portion of the spin base 21A, and the protruding portion 26A may be provided at the tip side portion of the extending portion 92A.

  14 to 17 are cross-sectional views showing a restricting portion 201C of the shield plate 90C and the spin base 21C as another configuration example of the shield plate and the spin base restricting portion of the substrate processing apparatus according to the embodiment. The shielding plate 90C is disposed at the processing position. FIG. 14 shows the restricting portion 201 in a state where the spin base 21 is stationary, and FIG. 15 shows the restricting portion 201C when the spin base 21C is rotating while accelerating. FIG. 16 shows the restricting portion 201C when the spin base 21C rotates at a constant speed, and FIG. 17 shows the restricting portion 201C when the spin base 21C rotates while decelerating.

  The spin base 21 </ b> C is configured in the same manner as the spin base 21 except that the protrusion 26 </ b> C is provided instead of the protrusion 26 of the spin base 21. The protruding portion 26C is configured in the same manner as the protruding portion 26 except that the protruding portion 26C includes a magnet 101a therein. The N pole of the magnet 101a is disposed on the side surface 263 side, and the S pole is disposed on the side surface 264 side. The magnet 101a is provided on the protruding portion 26C so that the N pole and the S pole are sequentially arranged substantially along the circumferential direction around the rotation axis a1.

  The shielding plate 90 </ b> C is configured in the same manner as the shielding plate 90 except that the extending portion 92 </ b> C is provided instead of the extending portion 92 of the shielding plate 90. The extending portion 92C is configured in the same manner as the extending portion 92, except that the magnets 101b and 101c are provided inside. The magnet 101b is configured such that the N pole and the S pole are sequentially arranged substantially along the circumferential direction around the rotation axis a1, and the N pole is closer to the side surface 943 of the restriction structure 94 than the S pole. The structure 94 is provided on the upstream side in the rotation direction of the spin base 21C. The magnet 101c is configured such that the N pole and the S pole are sequentially arranged substantially along the circumferential direction around the rotation axis a1, and the S pole is closer to the side surface 944 of the restriction structure 94 than the N pole. The structure 94 is provided on the downstream side in the rotation direction of the spin base 21C.

  Thus, the magnets 101a to 101c are arranged so that the N pole of the magnet 101b and the N pole of the magnet 101a face each other, and the S pole of the magnet 101a and the S pole of the magnet 101c face each other. And a magnetic repulsion works between N poles and between S poles. Moreover, it is preferable that the magnets 101a to 101c generate magnetic fields having substantially the same strength.

  That is, the magnets 101a to 101c widen the gaps between the protrusions 26C and the side surfaces 943 and 944 disposed on the front and rear in the circumferential direction around the rotation axis a1 with respect to the protrusions 26C of the restricting structure 94. Magnetic repulsive force is applied to By the magnetic repulsive force, the relative movement in the circumferential direction of the protruding portion 26 </ b> C with respect to the restricting structure 94 is restricted. Further, the magnets 101a to 101c may be provided so that the N pole and the S pole of the magnets 101a to 101c are inverted from each other.

  As shown in FIG. 14, when the spin base 21 is at rest, a force that acts to widen the distance between the side surface 943 and the side surface 263 and a force that acts to widen the distance between the side surface 944 and the side surface 264. And are substantially equal to each other, and their intervals are substantially equal. As shown in FIG. 16, even when the spin base 21 is rotating at a constant speed, these intervals are substantially equal.

  As shown in FIG. 15, when the spin base 21 is accelerating, the distance between the side surface 944 and the side surface 264 is reduced by the acceleration of the spin base 21 in addition to the magnetic repulsive force between the magnets. A force that widens the distance between 943 and the side surface 263 further acts. For this reason, the interval between the side surface 944 and the side surface 264 is wider than the interval between the side surface 943 and the side surface 263.

  As shown in FIG. 17, when the spin base 21 is decelerating, in addition to the magnetic repulsive force between the magnets, the spin base 21 is decelerated to widen the distance between the side surface 944 and the side surface 264, and the side surface 943. The force which narrows the space | interval with the side surface 263 acts further. For this reason, the distance between the side surface 944 and the side surface 264 is narrower than the distance between the side surface 943 and the side surface 263.

  Each of the magnets 101a to 101c, the restricting structure 94, and the protruding portion 26C are restricting portions 201C that restrict the relative movement (position) of the blocking plate 90C with respect to the spin base 21C in the circumferential direction around the rotation axis a1. It is.

  As shown in FIGS. 14 to 17, when the blocking plate 90C is disposed at the processing position, the projecting portion 26C and the regulating structure 94 of the extending portion 92C, including during the acceleration and deceleration of the spin base 21, It is preferable to always regulate the circumferential movement around the rotation axis a1 in a non-contact state. In this case, dust generation due to contact between the protruding portion 26C and the restriction structure 94 of the extending portion 92C can be completely prevented. Temporarily, due to the magnitude of repulsive force applied by each magnet and the magnitude of the acceleration of the spin base 21C, the protruding portion 26C and the restricting structure 94 of the extending portion 92C are during the acceleration and deceleration of the spin base 21. Even if it contacts, compared with the case where each magnet 101a-101c is not provided, the impact at the time of a contact can be reduced significantly. Therefore, even if the projecting portion 26C comes into contact with the regulating structure 94 of the extending portion 92C during acceleration or deceleration of the spin base 21, the usefulness of the present invention is not impaired.

  FIG. 18 is a cross-sectional view showing a restricting portion 201D of the extending portion 92D and the spin base 21C as another configuration example of the blocking plate and the spin base restricting portion of the substrate processing apparatus according to the embodiment. FIG. 19 is a cross-sectional view showing a restricting portion 201E of the extending portion 92E and the spin base 21C as another configuration example of the blocking plate and the spin base restricting portion of the substrate processing apparatus according to the embodiment. 18 and 19 are cross-sectional views in which the restricting portions 201D and 201E are cut by a cylinder having the rotation axis a1 as the center.

  The spin base 21C shown in FIGS. 18 and 19 has the same configuration as the spin base 21C shown in FIG. A blocking plate 90D in FIG. 18 is configured in the same manner as the blocking plate 90C except that an extending portion 92D is provided instead of the extending portion 92C of the blocking plate 90C in FIG. The extending portion 92D is configured in the same manner as the extending portion 92C except that the extending portion 92D further includes a magnet 101d. Each of the magnets 101a to 101e preferably generates a magnetic field having substantially the same strength. The magnet 101d is provided such that the N pole and the S pole are sequentially arranged along the upper surface 941 of the restricting structure 94 substantially along the circumferential direction around the rotation axis a1. The north pole of the magnet 101d faces the north pole of the magnet 101a, and the south pole of the magnet 101d faces the south pole of the magnet 101a. As a result, a magnetic repulsive force acts between the magnets 101a and 101d. As a result, a force acts to increase the distance between the upper surface 941 and the upper surface 261.

  The magnets 101a to 101c act on a magnetic repulsive force that widens the intervals between the side surfaces 943 and 944 of the restricting structure 94 and the protruding portion 26C in the circumferential direction around the rotation axis a1. Further, the magnets 101a and 101d apply a magnetic repulsive force so as to widen the distance between the upper surface 941 of the restricting structure 94 and the upper surface 261 of the protruding portion 26C in the direction of the rotation axis a1 (vertical direction). Thereby, the movement of the upper surface 941 and the upper surface 261 approaching each other is restricted, and the mutual contact is also suppressed, so that the generation of dust due to the contact between the restriction structure 94 and the protruding portion 26C can be further suppressed.

  Each of the magnets 101a to 101d, the restricting structure 94, and the protruding portion 26C has a relative movement (position) of the blocking plate 90C with respect to the spin base 21C in both the circumferential direction around the rotation axis a1 and the vertical direction. ) Is a restriction unit 201D.

  A blocking plate 90E in FIG. 19 is configured in the same manner as the blocking plate 90C except that an extending portion 92E is provided instead of the extending portion 92C of the blocking plate 90C in FIG. The extending portion 92E is configured in the same manner as the extending portion 92C, except that magnets 101e and 101f are further provided inside. Each of the magnets 101a to 101c, 101e, and 101f preferably generates a magnetic field having substantially the same strength. The magnet 101e is provided above the upper surface 941 of the restricting structure 94 such that the N pole is close to the upper surface 941 and the S pole is positioned above the upper surface 941. Further, the N pole of the magnet 101d and the N pole of the magnet 101a face each other. The magnet 101f is provided above the upper surface 941 of the restricting structure 94 such that the south pole is close to the upper surface 941 and the north pole is positioned above the upper surface 941. Further, the south pole of the magnet 101d and the south pole of the magnet 101a face each other.

  Thereby, a magnetic repulsive force acts between the magnets 101a and 101e, and a magnetic repulsive force also acts between the magnets 101a and 101f. As a result, a force acts to increase the distance between the upper surface 941 and the upper surface 261.

  The magnets 101a to 101e act on a magnetic repulsive force that widens the intervals between the side surfaces 943 and 944 of the restricting structure 94 and the protruding portion 26C in the circumferential direction around the rotation axis a1. Furthermore, the magnets 101a, 101e, and 101f apply a magnetic repulsive force so as to widen the distance between the upper surface 941 of the restricting structure 94 and the upper surface 261 of the protruding portion 26C in the direction of the rotation axis a1 (vertical direction). Thereby, the movement of the upper surface 941 and the upper surface 261 approaching each other is restricted, and the mutual contact is also suppressed, so that the generation of dust due to the contact between the restriction structure 94 and the protruding portion 26C can be further suppressed.

  The magnets 101a to 101c, 101e, and 101f, the restricting structure 94, and the projecting portion 26C are relative to the spin base 21C relative to the spin base 21C in both the circumferential direction around the rotation axis a1 and the vertical direction. It is the regulation part 201E which regulates a gentle movement (position).

  According to the substrate processing apparatus according to this embodiment configured as described above, the extending portion 92 extends to the side of the spin base 21 from the peripheral edge portion of the main body portion 91 of the shielding plate 90. The projecting portion 26 is provided at one of the tip side portion of the extending portion 92 and the side surface portion of the spin base 21, and the restricting structure 94 is provided at the other portion. The protrusion 26 and the restriction structure 94 are disposed below the upper surface of the spin base 21. Therefore, it is possible to suppress the processing liquid discharged from the substrate 9 from being rebounded by the protruding portion 26 or the restriction structure 94 and adhering to the non-processing surface of the substrate 9.

  Moreover, according to the substrate processing apparatus according to the present embodiment configured as described above, at least one of the protruding portion 26 and the restricting structure 94 is covered with the elastic member at a portion facing the other. Moreover, the impact at the time of the contact of the protrusion part 26 and the control structure 94 can be suppressed.

  Further, according to the substrate processing apparatus according to the present embodiment configured as described above, the processing position where the restricting structure 94 is disposed to face the protruding portion 26 from the front and rear in the circumferential direction around the rotation axis a1. The blocking plate 90 is relative to the spin base 21 along the direction of the rotation axis a1 between the restriction position where the restriction structure 94 is disposed relatively away from the protrusion 26 along the direction of the rotation axis a1. Move to. As a result, the restriction structure 94 can easily switch between a restriction state where the relative movement of the protrusion 26 in the circumferential direction is restricted and a release state where the restriction structure 94 is not restricted.

  Further, according to the substrate processing apparatus according to the present embodiment configured as described above, the restricting structure 94 is a recess formed so as to accommodate at least a part of the protruding portion 26. Therefore, the tip end side portion of the extending portion 92 of the shield plate 90 and the side surface portion of the spin base 21 can be brought close to each other, so that the shield plate 90 can be reduced in size.

  Further, according to the substrate processing apparatus according to the present embodiment configured as described above, the protrusion 26A is moved in the process of moving the blocking plate 90A relative to the spin base 21A from the retracted position to the processing position. , Abut against the opposing dents among the plurality of dents (regulation structure 94A). If the blocking plate 90A is in a state where rotation around the rotation axis a1 is not restricted, after the tip portion of the protruding portion 26A comes into contact with the recessed portion, it results from the respective shapes of the recessed portion and the protruding portion 26A. Then, the relative position in the circumferential direction of the shielding plate 90A with respect to the spin base 21A is corrected so that the protruding portion 26A is guided to a deeper recessed portion of the recess, and the shielding plate 90A is moved in the direction of the rotation axis a1. And moved to the processing position. After the blocking plate 90A is moved to the processing position, the concave portion restricts the circumferential movement of the protrusion 26A, and the relative movement of the blocking plate 90A in the circumferential direction with respect to the spin base 21A is restricted. . Therefore, even if the relative position of the shielding plate 90A in the circumferential direction with respect to the spin base 21A is not aligned, the concave portion that faces the protruding portion 26A among the plurality of concave portions is a relative portion of the protruding portion 26A in the circumferential direction. It becomes a regulatory structure that regulates movement. Thereby, the relative movement of the shielding plate 90A in the circumferential direction with respect to the spin base 21A can be restricted.

  Further, according to the substrate processing apparatus according to the present embodiment configured as described above, each of the portions of the restriction structure 94 that are arranged in the front and rear in the circumferential direction with respect to the protruding portion 26C, and the protruding portion 26C. A plurality of magnets 101a to 101b exert a magnetic repulsive force so as to widen the interval. Thereby, the relative movement in the circumferential direction of the protruding portion 26C with respect to the restriction structure 94 is restricted. Therefore, the contact between the restricting structure 94 and the protruding portion 26C can be suppressed.

  Further, according to the substrate processing apparatus according to the present embodiment configured as described above, the restricting structure 94 includes the upper surface 941 disposed to face the protruding portion 26C along the direction of the rotation axis a1. The plurality of magnets 101a and 101d (101e and 101f) exert a magnetic repulsive force so as to widen the distance between the protruding portion 26C and the upper surface 941 along the direction of the rotation axis a1. As a result, the movement of the protrusion 26C toward the upper surface 941 along the direction of the rotation axis a1 is restricted. Therefore, the contact between the restricting structure restricting structure 94 and the protruding portion 26C can be further suppressed.

  Moreover, according to the substrate processing apparatus according to the present embodiment configured as described above, since the extending portion 92 is a cylindrical wall portion provided along the peripheral edge portion of the shielding plate 90, the extending portion 92 does not cross the flow of the processing liquid discharged to the outside from the surface of the substrate 9 by centrifugal force. Thereby, since the dispersion of the processing liquid in the extending portion 92 can be suppressed, it is possible to further suppress the processing liquid from being rebounded by the protruding portion 26 or the regulation structure 94 and attached to the non-processing surface of the substrate 9.

  Further, according to the substrate processing apparatus according to the present embodiment configured as described above, the inner peripheral surface 921 of the cylindrical wall portion (extending portion 92) is continuous with the lower surface of the shielding plate 90, and the spin base. 21 includes a curved surface that bulges and curves obliquely upward and outward with respect to the upper surface of 21. Since the processing liquid discharged from the surface of the substrate 9 to the outside by the centrifugal force easily flows along the inner peripheral surface 921, the processing liquid is discharged from the gap G 1 between the inner peripheral surface 921 and the spin base 21 to the outside. It becomes easy to discharge.

  Although the invention has been shown and described in detail, the above description is illustrative in all aspects and not restrictive. Therefore, embodiments of the present invention can be modified or omitted as appropriate within the scope of the invention.

1 Substrate processing equipment 21 Spin base (holding member)
23 Rotation Drive Unit 231 Rotation Mechanism 26 Projection Unit 44 Drive Unit (Moving Unit)
50 Nozzle 90 Blocking plate (opposing member)
91 Body portion 92 Extension portion 94 Restriction structure 312 Inner member (guard)
313 External material (outer guard)

Claims (12)

A substrate processing apparatus,
A holding member that holds the substrate substantially horizontally from below and has an upper surface that faces the lower surface of the substrate with a gap therebetween, and is provided to be rotatable around a predetermined rotation axis;
A main body portion opposed to the upper surface of the substrate held by the holding member with a gap; and an extending portion extending from at least a part of the peripheral edge portion of the main body portion to the side of the holding member. A counter member provided to be rotatable around a rotation axis;
With
A projecting portion is provided on one portion of the distal end side portion of the extending portion and the side surface portion of the holding member, and the projecting portion is provided on the other portion from the front and rear in the circumferential direction around the rotating shaft. A restricting structure is provided that restricts the relative movement in the circumferential direction of the projecting part,
The holding member and the opposing member are mutually restricted in relative movement in the circumferential direction around the rotation axis via the protrusion and the restriction structure,
The substrate processing apparatus
In a state where the relative movement of the holding member and the opposing member is mutually restricted via the protruding portion and the restricting structure, at least one of the holding member and the opposing member is used as the rotating shaft. A rotation mechanism that rotates around
A nozzle that discharges a processing liquid onto a processing surface of the substrate that is held and rotated by the holding member;
Further comprising
The said process part and the said control structure are the substrate processing apparatuses arrange | positioned below the upper surface of the said holding member. The substrate processing apparatus according to claim 1,
The substrate processing apparatus, wherein at least one of the protruding portion and the restricting structure is covered with an elastic member at a portion facing the other. The substrate processing apparatus according to claim 1 or 2, wherein
A moving unit that moves the opposing member relative to the holding member along the rotation axis direction between a first position and a second position that is above the first position;
The restriction structure is arranged except for a movement path in which the protruding portion moves relative to the restriction structure by the moving portion,
When the facing member is disposed at the first position, the restriction structure is disposed to face the protruding portion from the front and rear in the circumferential direction, and when the facing member is disposed at the second position, the restriction is performed. A substrate processing apparatus, wherein a structure is disposed relatively away from the protrusion along the rotational axis direction. A substrate processing apparatus according to any one of claims 1 to 3, wherein
The substrate processing apparatus, wherein the restriction structure is a recess formed in the other part so as to accommodate at least a part of the protrusion. The substrate processing apparatus according to claim 3, wherein
The other part includes a plurality of recesses that extend in a ring shape along a circumferential direction around the rotation axis and that are continuously provided over the entire circumference in the circumferential direction.
Each of the plurality of dents is a dent formed in a shape capable of accommodating at least a part of the protrusion by opening in a direction along the rotation axis direction to the protrusion protruding from the one part. The width along the circumferential direction of at least the portion on the opening side of the recess is wider as the opening is approached,
The substrate processing apparatus, wherein at least a tip portion of the projecting portion opposes the recessed portion along the rotation axis direction, and a width along the circumferential direction of the tip portion is narrowed toward the tip. A substrate processing apparatus according to any one of claims 1 to 4, wherein
A plurality of magnets for applying a magnetic repulsive force so as to widen each interval between the protruding portions and the portions arranged in the circumferential direction with respect to the protruding portion of the restricting structure, A substrate processing apparatus that restricts relative movement of the protrusion with respect to the restricting structure in the circumferential direction by a magnetic repulsive force. The substrate processing apparatus according to claim 6,
The restriction structure includes a facing portion disposed to face the protruding portion along the rotation axis direction,
The substrate processing apparatus
A plurality of magnets for applying a magnetic repulsive force so as to widen a distance between the protruding portion and the facing portion along the direction of the rotation axis, and the protruding portion with respect to the facing portion by the magnetic repulsive force; The substrate processing apparatus which regulates the movement which approaches along the said rotating shaft direction. A substrate processing apparatus according to any one of claims 1 to 7,
The substrate processing apparatus, wherein the extending portion is a cylindrical wall portion provided along a peripheral edge portion of the facing member. The substrate processing apparatus according to claim 8, comprising:
The substrate processing apparatus, wherein an inner peripheral surface of the extending portion includes a curved surface that is continuous with a lower surface of the facing member and is curved to bulge obliquely upward and outward with respect to an upper surface of the holding member. A holding member that holds the substrate substantially horizontally from below and has an upper surface that faces the lower surface of the substrate with a gap therebetween, and is provided to be rotatable around a predetermined rotation axis;
A main body portion opposed to the upper surface of the substrate held by the holding member with a gap; and an extending portion extending from at least a part of the peripheral edge portion of the main body portion to the side of the holding member. A counter member provided to be rotatable around a rotation axis;
The holding member and the facing member are opposed to each other such that the relative movement of the holding member and the peripheral portion of the holding member is opposed to a part of the peripheral portion from the front and rear in the circumferential direction around the rotation axis. In a state of being regulated via a regulating structure that is provided in a part of the extending portion and regulates relative movement in the circumferential direction of the peripheral portion around the rotation axis, the holding member and the A rotation mechanism that rotates at least one of the opposing member around the rotation axis;
A nozzle that discharges a processing liquid onto a processing surface of the substrate that is held and rotated by the holding member;
With
The substrate processing apparatus, wherein the processing liquid discharged from the nozzle is discharged downward through a gap between the peripheral portion of the holding member and the extending portion. A holding member that holds the substrate substantially horizontally from below and has an upper surface that faces the lower surface of the substrate with a gap therebetween, and is provided to be rotatable around a predetermined rotation axis;
A main body portion opposed to the upper surface of the substrate held by the holding member with a gap; and an extending portion extending from at least a part of the peripheral edge portion of the main body portion to the side of the holding member. A counter member provided to be rotatable around a rotation axis;
The holding member and the opposing member are moved relative to each other in the circumferential direction of the peripheral edge centered on the rotation axis and provided at a peripheral edge of the holding member and a part of the extended portion. A rotation mechanism that rotates at least one of the holding member and the opposing member around the rotation axis in a state of being regulated through a regulation structure that regulates relative movement;
A nozzle that discharges a processing liquid onto a processing surface of the substrate that is held and rotated by the holding member;
With
The processing liquid discharged from the nozzle is discharged downward through a gap between the peripheral edge portion of the holding member and the extending portion,
The upper surface of the distal end portion of the side surface portion of the holding member and the opposing surface of the holding member in the distal end portion of the extending portion are curved with each other , and the holding member is opposed to the distal end portion of the extending portion. The substrate processing apparatus , wherein the curved shape of the surface continues to a restriction portion formed by a peripheral edge portion of the holding member and the restriction structure . The substrate processing apparatus according to claim 10 or 11,
The substrate processing apparatus, wherein the restriction structure is disposed below a lower surface of the held substrate.

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