JP6598015B2 - Film surface treatment apparatus and surface treatment method - Google Patents

Description

  The present invention relates to a film surface treatment apparatus and a surface treatment method.

  Conventionally, vapor-deposited films in which various thin films such as metals and metal oxides are formed on the surface of polymer films are used for packaging of food, pharmaceuticals, industrial products, etc., as well as various applications such as electrical appliances, electronic equipment, and building materials. Widely used in The required properties such as gas barrier properties, light-shielding properties, transparency, conductivity, and bending resistance differ depending on the use of the deposited film, but polymer is one of the properties that are often required in many applications. The adhesiveness between a film and the thin film formed on the surface is mentioned. If there is a problem with the adhesion of the vapor-deposited film, the reliability of the final product cannot be ensured, and so far, many means for improving and improving the adhesion have been studied.

  As a method for improving adhesion, for example, a method of forming a thin film after corona treatment is applied to the surface of the polymer film, or a method of forming a thin film after forming an easy adhesion layer on the surface of the polymer film by wet coating. And a method of continuously forming a thin film after performing a plasma treatment on the surface of the polymer film in a vacuum. Moreover, like patent document 1, the method of forming a thin film continuously after performing the ion irradiation process to the surface of a polymer film in a vacuum etc. is mentioned. Among these, those using ion irradiation treatment are processed using ions with high energy accelerated by the ion generating electrode, so that a high modification effect is brought about on the surface of the polymer film and a good adhesion improving effect is obtained. Is a way that can be.

  However, when high energy ions are irradiated on the surface of the polymer film, there is a problem that a low molecular weight substance is knocked out from the surface of the polymer film and flies to and adheres to the ion generating electrode side and the electrode surface becomes dirty. . The substance adhering to the electrode surface forms an insulating film. When the insulating film is charged up by charged particles generated during ion irradiation and exceeds the dielectric breakdown voltage of the film, arc discharge occurs and the operation of the ion generating electrode becomes unstable or the broken film is scattered. Then, there was a problem of causing contamination.

  With respect to this problem, Patent Document 2 discloses a method of electrically insulating the cathode of the ion generating electrode from the ground potential, and Patent Document 3 discloses a method of previously forming an insulating film on the cathode surface of the ion generating electrode. ing. However, in any method, it is inevitable that an insulating film adheres to the ion generating electrode and its peripheral members, abnormal discharge cannot be suppressed in the ion generating electrode and its surroundings, or the adhered insulating film is removed. There was a problem that labor and time were required. This problem becomes more prominent especially when a long polymer film is continuously treated for a long time.

JP 2013-199314 A JP 2008-127610 A JP 2008-127611 A

  An object of the present invention is a film surface treatment apparatus capable of performing stable ion irradiation treatment by suppressing the occurrence of abnormal discharge or the like even when a long polymer film is continuously treated for a long time. And a surface treatment method.

  In order to achieve the above object, the present invention irradiates the surface of the polymer long film with an ion beam generated by an ion beam generating electrode while transporting the polymer long film in a vacuum vessel. In the surface treatment apparatus for modifying the surface of the polymer long film, a state in which the surface of the polymer long film is irradiated with the ion beam while keeping the inside of the vacuum vessel in a vacuum state, and the ion beam A film surface treatment apparatus capable of switching between a state of irradiating the surface of the polymer long film other than the surface thereof.

  According to a preferred embodiment of the present invention, there is provided a film surface treatment apparatus, wherein the ion beam generating electrode is rotatable about a rotation axis parallel to the width direction of the polymer long film. To do.

  According to a preferred embodiment of the present invention, there is provided a film comprising an ion beam irradiation wall that is irradiated with the ion beam in a state in which the ion beam is irradiated on a surface other than the surface of the polymer long film. A surface treatment apparatus is provided.

  Moreover, according to the preferable form of this invention, the said ion beam irradiation wall is provided with the cooling function, The surface treatment apparatus of the film characterized by the above-mentioned is provided.

  According to a preferred embodiment of the present invention, there is provided a film surface treatment apparatus comprising an ion beam current measuring electrode on a surface of the ion beam irradiation wall on the ion beam generating electrode side.

  According to a preferred embodiment of the present invention, there is provided a film comprising a thin film forming mechanism for continuously forming a thin film on the surface after irradiating the surface of the polymer long film with the ion beam. A surface treatment apparatus is provided.

According to the present invention, a stable ion beam is obtained by suppressing abnormal discharge of an ion beam generating electrode even when a long polymer film is continuously irradiated with an ion beam for a long time. providing a surface treatment equipment of irradiation treatment are possible film.

It is a schematic sectional drawing which shows an example of the surface treatment apparatus of the film of this invention. It is a schematic sectional drawing which shows another example of the surface treatment apparatus of the film of this invention. It is an external view of the general structure of an anode layer type ion source. It is sectional drawing of the general structure of an anode layer type ion source. It is a schematic sectional drawing which shows another example of the surface treatment apparatus of the film of this invention. It is the schematic which shows an example of the ion beam current measurement electrode in the shutter board | plate in this invention. It is the schematic which shows an example of the method of measuring the ion beam current which flows into the ion beam current measurement electrode in this invention. It is a schematic sectional drawing which shows another example of the surface treatment apparatus of the film of this invention. It is a schematic sectional drawing which shows another example of the surface treatment apparatus of the film of this invention. It is a schematic sectional drawing which shows another example of the surface treatment apparatus of the film of this invention. It is the schematic which shows an example of the ion beam current measurement electrode in the ion beam irradiation wall in this invention. It is the schematic which shows another example of the method of measuring the ion beam current which flows into the ion beam current measurement electrode in this invention. It is a schematic sectional drawing which shows another example of the surface treatment apparatus of the film of this invention. It is a schematic sectional drawing which shows the example of the surface treatment apparatus of the conventional film.

  Hereinafter, an example of the best mode of the present invention will be described with reference to the drawings.

  FIG. 1 is a schematic sectional view showing an example of the film surface treatment apparatus of the present invention. Inside the vacuum vessel 1 that can be evacuated, a transport roll 3 for transporting the polymer long film 2 is provided. The long polymer film 2 unwound from the unwinding roll 4 is wound on the winding roll 5 via the transport roll 3. And the ion beam generating electrode 7 is arrange | positioned so that the ion beam 6 may be irradiated to the surface of the polymer long film 2 currently conveyed.

  FIG. 2 is a schematic cross-sectional view showing another example of the film surface treatment apparatus of the present invention. The ion beam generating electrode 7 may be installed at an arbitrary position in the transport path of the long polymer film 2, but the ion beam generating electrode 7 is placed in the middle of the transport path of the polymer long film 2 as shown in FIG. You may install so that the provided cooling roll 8 may be opposed. If the ion beam 6 is irradiated on the surface of the long polymer film 2 conveyed along the surface of the cooling roll 8 in this way, the temperature of the long polymer film 2 due to the irradiation treatment of the ion beam 6 will be described. Since the rise is suppressed and the risk of the polymer long film 2 being deformed or torn by heat is reduced, stronger ion beam irradiation treatment is possible, which is preferable. Further, when the polymer long film 2 is irradiated with the ion beam 6, the potential of the polymer long film 2 rises due to the attachment or implantation of ions to the surface, so that the flying ions receive a repulsive force and the treatment effect decreases. If there is a conductive material on the opposite side of the ion beam treatment surface, such as the polymer long film 2 conveyed along the cooling roll 8, the potential of the polymer long film 2 increases. This is also preferable from the viewpoint that the reduction of the intensity of the ion beam irradiation treatment can be prevented.

  As the ion beam generating electrode 7, an electrode capable of generating the ion beam 6 can be selected by an arbitrary method, but it is particularly preferable to use an ion source called an anode layer type. FIG. 3 shows an external view of a general configuration of an anode layer type ion source. FIG. 4 shows a sectional view of a general configuration of an anode layer type ion source. The anode layer type ion source includes a circumferential or racetrack-shaped slit 9 on the front surface thereof, and a magnet 10 for forming a magnetic field in the gap of the slit 9 and an anode 11 to which a high voltage can be applied. Prepare. Although not shown, the anode layer type ion source can be irradiated with an ion beam from the slit 9 by supplying a gas from a gas supply source and applying a high voltage to the anode 11. Since the electrode structure of the anode layer type ion source can be elongated linearly, it is possible to generate a wide and uniform ion beam. If the transport direction of the polymer long film 2 and the longitudinal direction of the anode layer type ion source are arranged at right angles, the polymer long film 2 is transported to transport the polymer long film 2 in the width direction and transport. This is preferable because the ion beam 6 can be uniformly irradiated over the entire region in the direction.

  In general, the ion beam generating electrode 7 such as an anode layer type ion source is first subjected to a so-called break-in discharge of several minutes to several tens of minutes when the vacuum evacuation inside the vacuum vessel 1 is completed and the use is started. The foreign matter and insulating film adhering to the surface of the ion beam generating electrode 7 are removed and cleaned, and abnormal discharge is reduced and stable ion beam irradiation becomes possible. However, if the polymer long film 2 is not transported during this break-in discharge, the same portion of the polymer long film 2 is irradiated with an ion beam for a long time, resulting in heat damage. There may be a problem that the film 2 is cut. In order to avoid this, it is necessary to transport the long polymer film 2 at a low speed during the break-in discharge. However, the break-in discharge part is a part where the ion beam is irradiated more excessively than the normal processing part. As a result, a loss occurs. Further, a large amount of low molecular weight substance is knocked out from the surface of the break-in discharge portion of the long polymer film 2, and it also flies in the direction of the ion beam generating electrode 7 and adheres to the surface, thereby contaminating the electrode. In other words, there is a contradiction that the break-in discharge for cleaning the electrode surface causes the electrode surface to become dirty.

  Therefore, in the present invention, the state in which the inside of the vacuum vessel 1 is kept in a vacuum state and the ion beam 6 is irradiated on the surface of the polymer long film 2 and the ion beam 6 is applied to the polymer long film. The mechanism which enables it to switch the state irradiated other than the surface of 2 is provided. By this mechanism, the ion beam 6 is prevented from being irradiated onto the surface of the polymer long film 2 during the break-in discharge at the start of use of the ion beam generating electrode 7, thereby This is preferable because the electrode can be prevented from being contaminated by the emission. Further, it is not necessary to transport the long polymer film 2 at a low speed during the break-in discharge, and the loss of the long polymer film 2 is reduced, which is preferable. Furthermore, since the irradiation state of the ion beam 6 onto the surface of the long polymer film 2 can be switched while the inside of the vacuum vessel 1 is kept in a vacuum state, the vacuum vessel 1 is temporarily put into the atmosphere after the break-in discharge is completed. It is possible to switch to a normal machining state without introducing and releasing. In other words, it is preferable because time loss due to release of the vacuum vessel to the atmosphere and evacuation after the break-in discharge can be reduced.

  Any material can be used as the material of the polymer long film 2, and examples thereof include polyethylene terephthalate, polyethylene naphthalate, polyethylene, polypropylene, polyimide, polyamide and the like, but are not limited thereto. . Also, the thickness of the polymer long film can be freely selected.

  As a mechanism for switching between a state in which the ion beam 6 is irradiated on the surface of the polymer long film 2 and a state in which the ion beam 6 is irradiated on a surface other than the surface of the polymer long film 2, In the present invention, as shown in FIGS. 1 and 2, a shutter plate 12 that can be opened and closed is provided between the long polymer film 2 and the ion beam generating electrode 7. If such a shutter plate 12 is provided, the ion beam 6 can be easily irradiated onto the surface of the long polymer film 2 by closing the shutter plate 12 during the break-in discharge at the start of use of the ion beam generating electrode 7. Therefore, it is preferable because the break-in discharge of the ion beam generating electrode 7 can be performed in a state where the conveyance of the polymer long film 2 is stopped.

  In the present invention, the shutter plate 12 preferably includes a cooling mechanism. FIG. 5 is a schematic cross-sectional view showing another example of the film surface treatment apparatus of the present invention. If the break-in discharge of the ion beam generating electrode 7 is continued while the shutter plate 12 is closed, the ion beam 6 is continuously irradiated to the shutter plate 12 for a long time, so that there is a risk that the shutter plate 12 is deformed at a high temperature. Therefore, it is preferable that the shutter plate 12 includes the cooling mechanism 13 as in the example of FIG. 5 because the shutter plate 12 can be prevented from being deformed by heat. As shown in FIG. 5, the cooling mechanism 13 has a structure in which a metal pipe is joined to the surface of the shutter plate 12 by welding and a coolant such as cooling water is passed therethrough, and a hole is formed in the shutter plate 12. However, it is possible to provide a cooling water flow path and allow a coolant such as cooling water to pass therethrough, but is not limited thereto.

  In the present invention, the ion beam current measuring electrode 14 is preferably provided on the surface of the shutter plate 8 on the ion beam generating electrode 7 side. FIG. 6 is a schematic view showing an example of the ion beam current measuring electrode 14 in the shutter plate 8 according to the present invention. If the ion beam current measuring electrode 14 is used, it becomes possible to monitor the amount of current due to the ion beam 6 during the break-in discharge of the ion beam generating electrode 7, judging whether the break-in discharge is complete or not and the daily operation of the ion beam generating electrode 7. Since it can be used for state management, it is preferable. The material of the ion beam current measuring electrode 14 is preferably a metal from the viewpoint of high electrical conductivity and high heat resistance, and stainless steel, copper, aluminum, etc. can be used, but are not limited thereto. is not. If the ion beam current measuring electrode 14 is divided into a plurality of parts in the longitudinal direction of the ion beam generating electrode 7, the ion beam current intensity distribution with respect to the longitudinal direction of the ion beam generating electrode 7 can be grasped. Since the state of the electrode 7 is poor and the ion beam 6 is not uniformly generated, it can be detected early, which is preferable. At this time, it is preferable that the ion beam current measuring electrode 14 divided into a plurality of electrodes is electrically insulated and fixed so that the current flowing into each electrode can be individually measured. For example, as shown in FIG. 6, if an insulating plate 15 made of ceramics or the like having high electrical resistance is attached on the shutter plate 12 and the ion beam current measuring electrode 14 divided into a plurality of portions is arranged on the insulating plate 15, the shutter plate 12 Even a metal is preferable because the ion beam current measuring electrodes 14 can be electrically insulated and fixed individually. The ion beam current flowing into the ion beam current measuring electrode 14 can be measured by an arbitrary method. For example, as shown in FIG. Is connected to one end of the current detection resistor 17 on the atmosphere side, the other end of the current detection resistor 17 is connected to the ground, and the amount of voltage drop due to the current flowing through the current detection resistor 17 is measured by reading with a voltmeter. Is possible.

  8 and 9 are schematic sectional views showing another example of the film surface treatment apparatus of the present invention. As another mechanism that enables switching between a state in which the surface of the polymer long film 2 is irradiated with the ion beam 6 and a state in which the ion beam 6 is irradiated on a surface other than the surface of the polymer long film 2. Then, as shown in FIGS. 8 and 9, the ion beam generating electrode 7 is preferably rotatable around a rotation axis parallel to the width direction of the polymer long film 2. During break-in discharge of the ion beam generating electrode 7, if the ion beam generating electrode 7 is rotated as shown in FIG. Since the surface of the ion beam generating electrode 7 can be prevented from being contaminated by the discharge from the film 2, and the break-in of the ion beam generating electrode 7 can be performed by stopping the transport of the polymer long film 2, the polymer length It is preferable because waste of the length film 2 can be suppressed. When the break-in discharge of the ion beam generating electrode 7 is finished, the ion beam 6 from the ion beam generating electrode 7 is applied to the surface of the long polymer film 2 as shown in FIG. The ion beam generating electrode 7 is rotated so as to be irradiated. By doing in this way, since the surface treatment of a polymer long film can be implemented, without producing the time loss by air | atmosphere release of the vacuum vessel 1 and evacuation after break-in discharge, it is preferable.

  Moreover, in this invention, in the state which irradiates the ion beam 6 other than the surface of the polymer elongate film 2, the ion beam irradiation wall 18 with which the said ion beam 6 is irradiated is provided. Without the ion beam irradiation wall 18, the ion beam 6 is inadvertently diffused inside the vacuum vessel 1, damaging other components inside the vacuum vessel 1, and volatiles and particles from deposits in the apparatus. May cause contamination of the ion beam generating electrode 7 and the polymer long film 2. Therefore, when the ion beam irradiation wall 18 is provided to irradiate the ion beam 6 other than the surface of the polymer long film 2 during the break-in discharge of the ion beam generating electrode 7, as shown in FIG. It is preferable to irradiate the irradiation wall 18 because inadvertent diffusion of the ion beam 6 as described above can be prevented.

  In the present invention, it is preferable that the ion beam irradiation wall 18 includes a cooling mechanism. FIG. 10 is a schematic sectional view showing still another example of the film surface treatment apparatus of the present invention. During the break-in discharge of the ion beam generating electrode 7, the ion beam irradiation wall 18 is irradiated with the ion beam 6 for a long time, so that the temperature of the ion beam irradiation wall 18 rises and may be deformed or outgas may be generated. is there. Therefore, it is preferable that the ion beam irradiation wall 18 includes the cooling mechanism 13 as in the example of FIG. 10 because deformation of the ion beam irradiation wall 18 due to heat and generation of outgas can be prevented. As the cooling mechanism 13, as shown in FIG. 10, a hole for passing cooling water is made inside the ion beam irradiation wall 18 to flow cooling water, and a metal pipe through which cooling water is passed is used as an ion beam. Although welding to the surface of the irradiation wall 18 is mention | raise | lifted etc., it is not limited to these.

  In the present invention, the ion beam current measuring electrode 14 is preferably provided on the surface of the ion beam irradiation wall 18 on the ion beam generating electrode 7 side. FIG. 11 is a schematic view showing an example of the ion beam current measuring electrode 14 on the ion beam irradiation wall 18 in the present invention. If the ion beam current measuring electrode 14 is used, the current amount by the ion beam 6 can be monitored during the break-in discharge of the ion beam generation electrode 7, so whether the break-in discharge is completed or not and the ion beam generation electrode 7 is operated daily. Since it can be used for state management, it is preferable. The material of the ion beam current measuring electrode 14 is preferably a metal from the viewpoint of high electrical conductivity and high heat resistance, and stainless steel, copper, aluminum, etc. can be used, but are not limited thereto. is not. If the ion beam current measuring electrode 14 is divided into a plurality of parts in the longitudinal direction of the ion beam generating electrode 7, the intensity distribution of the ion beam current with respect to the longitudinal direction of the ion beam 6 can be grasped. Since the state of 7 is bad and the state where the ion beam is not uniformly generated can be detected early, it is preferable. At this time, it is preferable that the ion beam current measuring electrode 14 divided into a plurality of parts be installed with the individual electrodes electrically insulated so that the current flowing into the individual electrodes can be individually measured. For example, as shown in FIG. 11, if the ion beam current measurement electrode 14 divided into a plurality is separated from the ion beam irradiation wall 18 and the ion beam current measurement electrodes 14 are arranged apart from each other, the ion beam is measured. Even if the irradiation wall 18 is a metal, it is preferable because the individual ion beam current measuring electrodes 14 can be electrically insulated. The ion beam current flowing into the ion beam current measuring electrode 14 can be measured by an arbitrary method. For example, as shown in FIG. Is connected to one end of the current detection resistor 17 on the atmosphere side, the other end of the current detection resistor 17 is connected to the ground, and the amount of voltage drop due to the current flowing through the current detection resistor 17 is measured by reading with a voltmeter. Is possible.

  In the present invention, it is preferable to continuously form a thin film on the surface of the polymer long film after irradiation with the ion beam. FIG. 13 is a schematic sectional view showing another example of the film surface treatment apparatus of the present invention. If the thin film forming mechanism 19 is installed on the downstream side of the ion beam generating electrode 7 in the transport direction of the polymer long film 2 so as to face the cooling roll 8, the ion beam 6 is applied to the polymer long film 2. After irradiation, a thin film can be formed subsequently. In addition, since the polymer long film 2 may be deformed or broken due to heat when the thin film is formed, it is preferable that the thin film forming mechanism is installed facing the cooling roll 8. With such a configuration, the thin film can be formed in a state in which the surface of the polymer long film 2 processed by the ion beam 6 is clean and the modified state by the processing is reliably ensured. And high adhesion between the surface of the polymer long film and the surface of the polymer long film are ensured with high reliability. In addition, the fact that surface treatment by ion beam and formation of a thin film can be performed simultaneously in the same vacuum vessel 1 have advantages such as reduction in the area occupied by the apparatus and reduction in standby time such as evacuation.

  Any kind of thin film can be selected, but examples include metals such as aluminum, copper, nickel, zinc, silver, aluminum oxide, silicon oxide, zinc oxide, copper oxide, copper nitride, NiCr, ITO And the like.

  As the thin film forming mechanism 19, any method such as vapor deposition, sputtering, CVD, ion plating, etc. may be used as long as it is a method capable of forming a thin film in a vacuum.

  In the example of FIG. 13, the thin film forming mechanism is placed opposite to the cooling roll 8 provided separately to form a thin film separately from the cooling roll 8 that performs the ion beam irradiation treatment. Both may be used for both ion beam irradiation treatment and thin film formation.

  In the present invention, in the surface treatment method for modifying the surface of the long polymer film by irradiating the surface of the long polymer film with an ion beam generated by an ion beam generating electrode in vacuum, After the ion beam generating electrode is operated in a state where the ion beam is irradiated on the surface other than the surface of the polymer long film, the state is switched to a state where the surface of the polymer long film being conveyed is irradiated with the ion beam. It is preferable to perform surface treatment. According to such a surface treatment method, since the ion beam is not irradiated onto the surface of the polymer long film during the break-in discharge of the ion beam generating electrode, the emission from the polymer long film is not generated. Does not adhere to the ion beam generating electrode, which makes it possible to stably discharge the ion beam generating electrode for a long time. Further, it is not necessary to transport a long polymer film during the break-in discharge of the ion beam generating electrode, which is preferable because the film loss can be reduced and the production cost can be reduced.

  In the break-in discharge of the ion beam generating electrode, the current value of the power source connected to the ion beam generating electrode is stable with respect to the time for which the ion beam generating electrode is operated in a state where the ion beam is irradiated on the surface other than the surface of the polymer long film. However, it is preferably 5 minutes or more, more preferably 10 minutes or more from the viewpoint of long-term discharge stability. If the break-in time is less than 5 minutes, the cleaning effect of the ion beam generating electrode tends to be insufficient, and the reliability for the subsequent long-term stable discharge often decreases, which is not preferable. In addition, the output value of the power supply voltage, current, power, etc. during the break-in discharge may be set to any value, but from the viewpoint of ensuring the effect of cleaning the electrode by break-in discharge, the output of voltage or power The set value is preferably 50% or more of the rated output value of the ion beam irradiation electrode, and more preferably 70% or more.

  During the break-in time of the ion beam irradiation electrode, measure the ion beam current amount with the ion beam current measurement electrode installed on the shutter irradiated with the ion beam from the ion beam irradiation electrode or the ion beam irradiation wall. Is preferred. Control the processing status by checking the ion beam electrode cleaning state and current value stabilization status, ion beam current distribution in the longitudinal direction of the electrode, and electrode abnormalities from the measured value of the ion beam current. It can be used for.

  When the break-in time of the ion beam irradiation electrode is completed, the transport of the polymer long film is started, and the surface of the polymer long film is irradiated with the vacuum container kept in vacuum. What is necessary is just to switch to a state. According to such a procedure, there is no loss of time due to release of the vacuum vessel to the atmosphere or evacuation, which is preferable.

  The present invention can be applied not only to a film surface treatment apparatus but also to various thin film forming apparatuses for films and various thin film forming methods for films, but the application range is not limited thereto.

  EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated, this invention is not necessarily limited to these.

[Example 1 (reference example) ]
The result of performing the surface treatment by ion beam of the polymer long film using the film surface treatment apparatus shown in FIG. 2 will be described. As the polymer long film 2, a polyethylene terephthalate (PET) film (“Lumirror” (registered trademark) P60, manufactured by Toray Industries, Inc.) having a length of 10,000 m and a thickness of 12 μm was used. As the ion beam generating electrode 7, an anode layer type ion source was applied. After the vacuum evacuation of the vacuum vessel 1 was completed, the output of the ion beam generating electrode 7 was set to 75% of the rated voltage with the shutter plate 12 closed, and a break-in discharge was performed for 15 minutes. During the break-in time, the polymer long film 2 was stopped without being conveyed. After the break-in discharge was completed, the polymer long film was conveyed at a speed of 100 m / min, the shutter plate 12 was opened, the surface of the polymer long film 2 was irradiated with the ion beam 6, and the surface treatment was performed for about 100 minutes. .

  When an abnormal discharge occurs in the ion beam generating electrode 7, the emission of the ion beam 6 blinks and an excessive current flows due to a short circuit, so that the voltage value applied to the ion beam generating electrode 7 varies. Therefore, the voltage applied to the anode of the ion beam generating electrode 7 is measured with a digital oscilloscope (DL1640, manufactured by Yokogawa Electric Corporation), and the number of times the measured voltage value falls below 70% of the power supply output set value is the number of abnormal discharge occurrences. As a result, the discharge stability of the ion beam generating electrode 7 was quantified. Specifically, the number of occurrences of abnormal discharge during the period in which the polymer long film 2 is irradiated with the ion beam 6 (excluding the break-in discharge period) is set as the time during which the polymer long film 2 is irradiated with the ion beam 6. The number of abnormal discharge occurrences per unit time was obtained by dividing by.

  The number of occurrences of abnormal discharge in Example 1 was as good as 0.5 times / minute.

[Example 2 (reference example) ]
Using the film surface treatment apparatus shown in FIG. 5, the surface treatment of the polymer long film with an ion beam was performed. A cooling water passage metal pipe was used as the cooling mechanism 13 and was welded to the metal shutter plate 12 for use. After the vacuum evacuation of the vacuum vessel 1 was completed, the output of the ion beam generating electrode 7 was set to 95% of the rated voltage with the shutter plate 12 closed, and a break-in discharge was performed for 30 minutes. Otherwise, the surface treatment of the film was carried out in the same manner as in Example 1 (Reference Example) .

  As described above, even when the accelerating discharge was performed for a relatively long time with the output of the ion beam generating electrode 7 being high, the shutter plate 12 was not deformed, and the opening / closing operation of the shutter could be performed smoothly. . Also, no particular abnormality was observed in the long polymer film 2 that had been stopped during the break-in discharge.

[Example 3 (reference example) ]
Using a film surface treatment apparatus shown in FIG. 7, the surface treatment of the polymer long film with an ion beam was performed. As the shutter plate 12, an aluminum plate having a thickness of 10 mm is used. As shown in FIG. 6, a ceramic insulating plate 15 having a thickness of 5 mm is fixed, and a strip-like ion beam current having a width of 30 mm and a length of 130 mm is formed thereon. Measurement electrodes 14 were attached at a pitch of 100 mm. A 1 kΩ current detection resistor 17 was connected to all the ion beam current measurement electrodes 14. Otherwise, the surface treatment of the film was carried out in the same manner as in Example 1 (Reference Example) . During the break-in discharge, the current flowing into each ion beam current measuring electrode 14 was measured by measuring the voltage of the current detection resistor 17, and only one location was found to be reduced by 40% or more from the average of all current values. As a result, when the ion beam generating electrode was investigated, it was found that the magnetic field strength of the magnet decreased at the relevant part.

[Example 4]
Using the film surface treatment apparatus shown in FIG. 8 and FIG. 9, the surface treatment of the long polymer film with an ion beam was performed. After the evacuation of the vacuum vessel 1 is completed, the output of the ion beam generating electrode 7 is set to 75% of the rated voltage in the state shown in FIG. 9 with the ion beam generating electrode 7 facing the ion beam irradiation wall. Discharging was carried out for 15 minutes. During the break-in time, the polymer long film 2 was stopped without being conveyed. After the break-in discharge is completed, the polymer long film is conveyed at a speed of 100 m / min, and the ion beam generating electrode is rotated so that the surface of the polymer long film 2 is irradiated with the ion beam 6 as shown in FIG. The surface treatment was performed for about 100 minutes.

  At this time, no diffusion of the ion beam in the vacuum vessel occurred during the break-in discharge. Further, the number of abnormal discharge occurrences in this example was as good as 0.6 times / minute.

[Example 5]
Using a film surface treatment apparatus shown in FIG. 10, the surface treatment of the polymer long film with an ion beam was performed. As the cooling mechanism 13, a hole for allowing the cooling water to flow was made inside the ion beam irradiation wall 18 to flow the cooling water. After the vacuum evacuation of the vacuum vessel 1 is completed, the ion beam generating electrode 7 is set to 95% of the rated voltage with the ion beam generating electrode 7 facing the ion beam irradiation wall, and a break-in discharge is performed for 30 minutes. did. Otherwise, the surface treatment of the film was carried out in the same manner as in Example 4.

  In this way, even when the running-in discharge is carried out for a relatively long time with the output of the ion beam generating electrode 7 being high, deformation of the ion beam irradiation wall, temperature rise, etc. are not seen, and transport is carried out during the running-in discharge. No particular abnormality was observed in the long polymer film 2 that had been stopped.

[Example 6]
Using the film surface treatment apparatus shown in FIG. 12, the polymer long film was subjected to surface treatment with an ion beam. As an ion beam current measurement electrode, a strip-shaped plate having a width of 30 mm and a length of 130 mm was installed at a pitch of 100 mm, 5 mm away from the ion beam irradiation wall. A 1 kΩ current detection resistor 17 was connected to all the ion beam current measurement electrodes 14. Otherwise, the surface treatment of the film was carried out in the same manner as in Example 4. When the current flowing into each ion beam current measurement electrode 14 was measured by measuring the voltage of the current detection resistor 17 during the break-in discharge, only one location changed by 30% or more from the average of all current values. As a result, when the ion beam generating electrode was investigated, it was found that metal foreign matter adhered to the relevant part. When the foreign matter was removed, the current fluctuation was resolved.

[Comparative Example 1]
Using the film surface treatment apparatus shown in FIG. 14, the surface treatment of the polymer long film with an ion beam was performed. After the vacuum evacuation of the vacuum vessel 1 is completed, the break-in discharge is performed by setting the output of the ion beam generating electrode 7 to 75% of the rated voltage while conveying the long polymer film at a low speed of 0.5 m / s. For 15 minutes. Otherwise, the surface treatment of the film was carried out in the same manner as in Example 1 (Reference Example) .

When the number of occurrences of abnormal discharge was determined in the same manner as in Example 1 (Reference Example) , the number of occurrences was as high as 20 times / minute, and the discharge flickered and was unstable. When the surface of the ion beam generating electrode 7 was observed after completion of the surface treatment, a large amount of dark brown film-like substance was adhered. Also, the 450 m long polymer film transported during the break-in discharge could not be used as a product due to excessive ion beam treatment.

  The present invention has a high utility value in the field of manufacturing a deposited film.

DESCRIPTION OF SYMBOLS 1 Vacuum container 2 Polymer long film 3 Conveyance roll 4 Unwinding roll 5 Winding roll 6 Ion beam 7 Ion beam generating electrode 8 Cooling roll 9 Slit 10 Magnet 11 Anode 12 Shutter plate 13 Cooling mechanism 14 Ion beam current measuring electrode 15 Insulating plate 16 Current introduction terminal 17 Current detection resistor 18 Ion beam irradiation wall 19 Thin film formation mechanism

Claims (5)

The surface of the polymer long film is modified by irradiating the surface of the polymer long film with the ion beam generated by the ion beam generating electrode while transporting the polymer long film in a vacuum vessel. In the surface treatment apparatus, the ion beam generating electrode is rotatable about a rotation axis parallel to the width direction of the polymer long film, and the ion beam is rotated to rotate the ion beam to the polymer long film. A state in which the ion beam can be irradiated on the surface of the polymer long film while the inside of the vacuum vessel can be kept in a vacuum state, and the ion beam can be irradiated on the surface of the polymer long film. The surface treatment apparatus of the film which can switch the state irradiated other than the surface. In a state of irradiating the ion beam on the other surface of the polymeric elongated film, a surface treatment apparatus of the film according to claim 1, wherein the ion beam is characterized in that it comprises an ion beam irradiation wall to be irradiated. The film surface treatment apparatus according to claim 2 , wherein the ion beam irradiation wall has a cooling function. Surface treatment apparatus of the film according to claim 2 or 3, characterized in that it comprises the ion beam generator electrode side ion beam current measuring electrode to the surface of the said ion beam irradiation wall. The film surface treatment apparatus according to any one of claims 1 to 4 , further comprising a thin film forming mechanism for continuously forming a thin film on the surface after irradiating the surface of the polymer long film with the ion beam. .

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