JP6605797B2 - Fluid plasma generation method and fluid plasma generator - Google Patents

Description

  The present invention relates to an in-fluid plasma generation method and an in-fluid plasma generation apparatus that generate plasma in a fluid such as a water flow.

  For example, in a purification device for sewage treatment or factory wastewater treatment, wastewater treatment using underwater discharge is performed in addition to purification treatment by an activated sludge treatment method using microorganisms. Patent Document 1 discloses a treatment liquid purification method for killing E. coli by applying a high voltage to domestic wastewater.

JP-A-61-136484

  In the case of a conventional underwater discharge type purification apparatus, it is necessary to generate a very high potential difference between the electrode pairs in order to pass a current for sterilizing coliform bacteria between the electrode pairs in the water to be treated. For this reason, there has been a problem that the amount of power consumption increases and the purification cost increases. In addition, since only the current is conducted, it is difficult to improve the water quality itself in a controllable manner even if sterilization is possible.

  An object of the present invention is to provide an in-fluid plasma generation method and an in-fluid plasma generation apparatus capable of performing plasma treatment inexpensively and easily, for example, in improving water quality.

  In the first aspect of the present invention, an electrode is provided in a flow path of a fluid in which a liquid substance is flowed, a high voltage is applied to the fluid by the electrode, and bubbles that are converted into plasma by a gas component contained in the fluid are formed. This is a method for generating plasma in a fluid to be generated.

  In the second aspect of the present invention, an electrode is provided in a flow path of a fluid in which a liquid substance is flowed, the fluid is foamed by foaming means, and a high voltage is applied to the foamed fluid by the electrode. Thus, the in-fluid plasma generating method is for converting the bubbles in the foamed fluid into plasma.

  According to a third aspect of the present invention, the foaming means is constituted by a nozzle device provided with an orifice on the nozzle outlet side, and the in-fluid plasma is generated by the orifice while allowing the fluid to flow through the nozzle device. Is the method.

  According to a fourth aspect of the present invention, the foaming means is constituted by a fluid stirring device that stirs the fluid, and the in-fluid plasma generation that causes the fluid stirred by the fluid stirring device to flow through the flow path to foam. Is the method.

  According to a fifth aspect of the present invention, a gas is injected into a fluid to generate bubbles of the gas, a high voltage is applied to the fluid including the bubbles of the gas and bubbles by the foaming by the electrode, This is a method for generating plasma in a fluid in which the gas bubbles and the bubbles generated by foaming are turned into plasma.

  According to a sixth aspect of the present invention, an electrode is provided in a flow path of a fluid in which a liquid substance is flowed, a gas is injected into the fluid to generate bubbles of the gas, and the fluid containing the bubbles is This is a method for generating plasma in a fluid by applying a high voltage to turn the bubbles into plasma.

A seventh aspect of the present invention is the in-fluid plasma generation method, wherein the gas is any one of an active gas such as air and oxygen, an inert gas such as nitrogen, helium and argon, or a mixed gas of these gases.

  An eighth aspect of the present invention is the in-fluid plasma generation method, wherein the liquid substance is any one of liquids including city water, river water, pond water, distilled water, ion-exchanged water, alcohol, or medicine.

  A ninth aspect of the present invention includes an electrode provided in a flow path of a fluid in which a liquid substance is flowed, and a high voltage applying unit that applies a high voltage to the fluid by the electrode, and the high voltage is It is an in-fluid plasma generator that generates bubbles by applying gas to a fluid to convert a gas component contained in the fluid into plasma.

  According to a tenth aspect of the present invention, there is provided an electrode provided in a fluid flow path in which a liquid substance is flowed, foaming means for foaming the fluid, and a high voltage applied to the foamed fluid by the electrode. An in-fluid plasma generator that applies voltage to the foamed fluid and converts the bubbles in the foamed fluid into plasma.

  In an eleventh aspect of the present invention, the foaming means has a nozzle device provided with an orifice on the nozzle outlet side, and plasma generation in fluid is performed by the orifice while foaming the fluid through the nozzle device. Device.

  In a twelfth aspect of the present invention, the foaming means has a fluid stirring device that stirs the fluid, and the in-fluid plasma generation that causes the fluid stirred by the fluid stirring device to flow through the flow path to foam Device.

  A thirteenth aspect of the present invention has bubble generating means for injecting gas into a fluid to generate bubbles of the gas, and the electrode is used to increase the fluid containing the bubbles of the gas and bubbles by the foaming. The in-fluid plasma generator is configured to apply a voltage to convert the gas bubbles into bubbles.

  A fourteenth aspect of the present invention includes an electrode provided in a flow path of a fluid in which a liquid substance is flowed, and bubble generating means for injecting gas into the fluid to generate bubbles of the gas. The in-fluid plasma generator generates plasma of the bubbles by applying a high voltage to the fluid containing the gas.

A fifteenth aspect of the present invention is the in-fluid plasma generator, wherein the gas is any one of an active gas such as air and oxygen, an inert gas such as nitrogen, helium and argon, or a mixed gas of these gases.

  A sixteenth aspect of the present invention is the in-fluid plasma generator, wherein the liquid substance is any one of liquids including city water, river water, pond water, distilled water, ion-exchanged water, alcohol or chemicals.

  According to the first aspect of the present invention, for example, an electrode is provided in a flow path of a fluid in which a liquid substance such as water or a solution is flowed, and a high voltage is applied to the fluid by the electrode to be contained in the fluid. Since the gas bubbles generated by the generated gas component are generated, for example, it is suitable for improving the water quality, and the plasma treatment can be performed easily and inexpensively.

According to the second aspect of the present invention, for example, an electrode is provided in a flow path of a fluid in which a liquid substance such as water or a solution is flowed, and the fluid is foamed by foaming means. Then, a high voltage is applied by the electrode to convert the bubbles in the foamed fluid into plasma, which is suitable, for example, for improving the water quality, and allows plasma processing to be performed easily and inexpensively.

  According to the third aspect of the present invention, the foaming means is constituted by a nozzle device provided with an orifice on the nozzle outlet side, and foams by the orifice while circulating the fluid in the nozzle device. With a simple and inexpensive configuration, for example, it is suitable for water quality improvement and the like, and plasma processing can be performed easily and inexpensively.

  According to the fourth aspect of the present invention, the foaming means is constituted by a fluid stirring device that stirs the fluid, and the fluid stirred by the fluid stirring device is circulated through the flow path to foam. With a simple and inexpensive configuration, for example, it is suitable for water quality improvement and the like, and plasma processing can be performed easily and inexpensively.

  As the stirring member of the fluid stirring device, a screw, a blade, a spiral member, a coiled member, or the like can be used.

  According to the fifth aspect of the present invention, a gas is injected into a fluid to generate bubbles of the gas, and a high voltage is applied to the fluid including the bubbles of the gas and bubbles by the foaming by the electrode. Since the gas bubbles and the bubbles resulting from the foaming are converted into plasma, high-efficiency plasma processing can be performed using bubbles having a high content.

  According to the sixth aspect of the present invention, an electrode is provided in a flow path of a fluid in which a liquid substance is flowed, and a gas is injected into the fluid to generate bubbles of the gas. Since the high-voltage is applied by the electrodes and the bubbles are turned into plasma, for example, it is suitable for water quality improvement and the like, and plasma processing can be performed easily and inexpensively.

According to the seventh aspect of the present invention, the gas is any one of an active gas such as air and oxygen, an inert gas such as nitrogen, helium and argon, or a mixed gas of these gases. Various plasma synthesis according to the kind of gas can be performed inexpensively and easily.

  The above-described method for generating plasma in a fluid according to the present invention is not limited to water quality improvement and can be applied to various plasma treatments. For example, by using a solvent composed of either a liquid containing a hydroxyl group such as water or a liquid containing an amino group such as aqueous ammonia, the surface of the carbon nanomaterial (CNM) using, for example, a liquid containing a hydroxyl group CNM, which is a hardly soluble powder, generates radicals capable of binding OH groups to a fluid in a fluid, or generates radicals capable of binding amino groups using a liquid containing amino groups. The surface modification treatment of the material can be speeded up and processed in large quantities. The surface modification treatment can be applied not only to water but also to solvents such as alcohol, various organic solvents, and sodium-containing liquids. Moreover, as the hardly soluble powder, fine powder derived from carbon or nanoparticles having carbon solubility, ceramic particles coated with carbon, and the like can be used.

  According to the eighth aspect of the present invention, as the liquid substance, any one of liquids including city water, river water, pond water, distilled water, ion-exchanged water, alcohol or chemicals is used for water purification treatment and water quality improvement. Processing, chemical processing, etc. can be performed inexpensively and easily.

According to a ninth aspect of the present invention, there is provided an electrode provided in a flow path of a fluid in which a liquid substance is flowed, and a high voltage applying means for applying a high voltage to the fluid by the electrode, the high voltage Is applied to the fluid to generate a bubble obtained by converting the gas component contained in the fluid into a plasma. For example, an in-fluid plasma generator that is suitable for improving water quality and can perform plasma processing at low cost is realized. be able to.

  According to the tenth aspect of the present invention, the electrode provided in the flow path of the fluid in which the liquid substance is flowed, the foaming means for foaming the fluid, and the high voltage is applied to the foamed fluid by the electrode. And applying high voltage to the foamed fluid to convert the bubbles in the foamed fluid into plasma, which is suitable for improving water quality, for example, and inexpensively and easily. An in-fluid plasma generator capable of processing can be realized.

  According to the eleventh aspect of the present invention, the foaming means has a nozzle device provided with an orifice on the nozzle outlet side, and foams by the orifice while circulating the fluid in the nozzle device. For example, an in-fluid plasma generator that is suitable for improving water quality and that can perform plasma treatment at low cost and simply can be realized with a simple structure.

  According to the twelfth aspect of the present invention, the foaming means has a fluid stirring device that stirs the fluid, and the fluid stirred by the fluid stirring device is circulated through the flow path to foam. With a simple and inexpensive configuration, for example, it is possible to realize an in-fluid plasma generator that is suitable for improving water quality and that can perform plasma processing easily and inexpensively.

  According to a thirteenth aspect of the present invention, there is provided bubble generating means for injecting gas into a fluid to generate bubbles of the gas, and the electrode with respect to a fluid including the bubbles of gas and bubbles generated by the foaming By applying a high voltage, the gas bubbles and the bubbles resulting from the foaming are turned into plasma, thereby realizing a plasma generator in fluid that can be plasmatized efficiently using bubbles with a high content. be able to.

  According to the fourteenth aspect of the present invention, it has an electrode provided in a flow path of a fluid in which a liquid substance is flowed, and bubble generating means for injecting gas into the fluid to generate bubbles of the gas, Since a high voltage is applied to the fluid containing the bubbles by the electrodes to convert the bubbles into plasma, for example, an in-fluid plasma generator that is suitable for water quality improvement and can perform plasma processing at low cost is realized. be able to.

According to the fifteenth aspect of the present invention, as the gas, an active gas such as air or oxygen, an inert gas such as nitrogen, helium or argon, or a mixed gas of these gases is used. It is possible to realize a plasma synthesizer that can perform various plasma synthesis according to the kind of gas.

  The in-fluid plasma generation apparatus according to the present invention is not limited to being usable as a water quality improvement apparatus, and can be applied to various plasma processing apparatuses. For example, the present invention can be applied to a surface modification processing apparatus that can increase the speed and mass processing of the surface modification processing of the above-described CNM material or the like.

  According to the sixteenth aspect of the present invention, the liquid substance is any one of liquids containing city water, river water, pond water, distilled water, ion exchange water, alcohol, chemicals, etc., for water purification treatment, water quality improvement. An in-fluid plasma generator that can perform processing, chemical processing, and the like at low cost can be realized.

It is a schematic block diagram of the flowing water plasma processing apparatus which concerns on one Embodiment of this invention. It is a longitudinal cross-sectional structure figure of the flowing water plasma-ized apparatus 1 used for the said embodiment. It is the external appearance perspective view (3A) which shows the electrode structure of the high voltage application electrode members 14 and 15 used for the flowing water plasma-ized apparatus 1, and the external appearance perspective view (3B, 3C) which shows the electrode structure of another Example. 3 is an enlarged cross-sectional view of the periphery of the electrode pair of the flowing water plasma generator 1. FIG. It is a schematic block diagram of the control apparatus of the said flowing water plasma processing apparatus. It is a flowchart which shows the flowing water plasma-ized process procedure in the said flowing water plasma processing apparatus. It is a measurement graph by the gas chromatography analysis method which shows the example of the plasma processing result of the said flowing water plasma processing apparatus. It is a measurement graph by the gas chromatography analysis method which shows the density | concentration change of the production | generation nitride according to plasma processing time. It is a longitudinal cross-sectional structure figure of the flowing water plasma-ized apparatus which concerns on another Example. It is a longitudinal cross-sectional structure figure of the flowing water plasma-ized apparatus which concerns on another Example. It is a longitudinal cross-sectional structure figure of the flowing water plasma processing apparatus using the flowing water which supplied nitrogen gas from the outside and was foamed.

  Hereinafter, a flowing water plasma processing apparatus according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

  FIG. 1 shows a schematic configuration of a flowing water plasma processing apparatus according to the present embodiment.

  The flowing water plasma processing apparatus according to this embodiment includes a flowing water plasma generating apparatus 1, a circulation pump apparatus 2, and a water tank 10. The circulation pump device 2 includes a water intake pipe 5 and a water supply pipe 6, and is an electric pump device that takes in the stored water 4 in the water tank 10 through the water pipe 5 and discharges it through the water supply pipe 6. A pumping pipe 7 is connected to the open end of the water intake pipe 5. The open end of the pumping pipe 7 is disposed in the water tank 10 and is immersed in the stored water 4. One end of the water supply pipe 6 is connected to an extension pipe 9 via a water supply valve 8. The flowing water plasmarization apparatus 1 is connected to the drain end of the extension pipe 9 through a water supply pipe 11.

  FIG. 2 shows a longitudinal sectional structure of the flowing water plasma generator 1.

  The flowing water plasma generating apparatus 1 includes electrode members 14 and 15 each having electrodes 12 and 13 for applying a high voltage to flowing water, and a hollow member 20 to which the electrode members 14 and 15 are attached and which forms a part of a flow path. And a nozzle device 19 connected to the upper part 29 of the hollow member 20.

  The hollow member 20 has a cylindrical shape as a whole, and has a hollow portion through which flow paths having different inner diameters are formed. The hollow member 20 is preferably made of a material having high electrical insulation and low water permeability, such as various plastic materials (for example, thermosetting resins such as epoxy resins, heat resins such as acrylic resins and ABS resins). Plastic resin) can be used. In order to reduce corrosion, it is preferable to use a SUS material for the pipe members constituting the circulation flow path.

  A concave portion 18 into which the nozzle device 19 is inserted is formed in the upper portion 29 of the hollow member 20. In the middle portion of the hollow member 20, a reduced diameter portion 21 that is in communication with the recess 18 and has a reduced inner diameter is formed. A lower hole 30 on the lower side from the reduced diameter portion 21 is formed with an enlarged through hole portion 22. The inner diameter of the reduced diameter portion 21 is 10 mm.

A pair of screw holes 16 and 17 are formed through the reduced diameter portion 21 in the diameter direction. Electrode members 14 and 15 are attached to the screw holes 16 and 17, respectively. The electrode members 14 and 15 are constituted by electrode holding screw members. The electrode member 14 includes a screw member including a screw head 25 and a screw portion 27. A through hole 36 is formed in the screw head portion 25 and the screw portion 27 along the central axis. Similarly to the electrode member 14, the electrode member 15 is configured by a screw member including a screw head portion 26 and a screw portion 28. A through hole 37 is formed in the screw head portion 26 and the screw portion 28 along the central axis.

  (3A) in FIG. 3 shows the electrode structure of the electrode members 14 and 15.

  The electrode members 14 and 15 have rod-axis-shaped electrodes 12 and 13 in which one ends of energization axes 23 and 24 are bent, respectively. The energizing axes 23 and 24 and the electrodes 12 and 13 are made of conductive wires such as copper or copper alloy. For example, a conductive wire having a shaft diameter of 1 to 5 mm can be used as the shaft wire. A lead frame material can be used instead of the energizing axis. Gold, tungsten, molybdenum, aluminum, copper, carbon, or alloys thereof, stainless steel, or the like can be used as the material for the electrodes 12 and 13.

  As shown in (3A), the electrodes 12 and 13 each have an outwardly curved shape, the upper end distance L1 between the electrodes is 3 mm, the curved height L2 is 20 mm, and the open width L3 of the electrode pair is 15 mm. It has a form.

  The electrode structure is not limited to a rod-shaft shape, and various shapes can be used.

  FIG. 3 (3B) shows an electrode structure of electrode members 14 and 15 according to another embodiment. The electrodes 12a and 13b are curved conductive plate pieces whose upper sides are welded to one end of the current-carrying axes 23 and 24, respectively, and curved from the one end. Since the electrodes 12a and 13b have electrode surfaces with a width L4, the plasma discharge region can be expanded.

  Mounting of the electrode 12 to the hollow member 20 is performed as follows.

  The screw portion 27 of the electrode member 14 is screwed by turning the screw head 25 into the screw hole 16 of the reduced diameter portion 21. As shown in FIG. 2, the open end of the current-carrying axis 23 opposite to the electrode 12 is inserted into the threaded screw portion 27 from the hollow portion side of the hollow member 20 and pulled out from the screw head 25. The electrode 12 is set in an open direction on the inner wall side of the part.

  The mounting of the electrode 13 to the hollow member 20 is performed in the same manner as in the case of the electrode 12. That is, the screw portion 28 of the electrode member 15 is screwed into the screw hole 17 of the reduced diameter portion 21 by turning the screw head 26. As shown in FIG. 2, the open end of the current-carrying axis 24 opposite to the electrode 13 is inserted into the threaded screw portion 28 from the hollow portion side of the hollow member 20 and pulled out from the screw head 26. The electrode 13 is set in an open direction on the inner wall side of the part. By the position adjustment, the shortest facing distance between the electrodes 12 and 13 (the upper end distance L1 in (3A) of FIG. 3) is set to 3 mm. In a state where the positions of the electrodes 12 and 13 are set, the portions where the energizing axes 23 and 24 are exposed from the screw members are sealed in a sealed manner by adhesives 23a, 23b, 24a and 24b, respectively.

  As shown in (3C) of FIG. 3, parallel electrode plates 97 and 98 having energizing axes 95 and 96 can be used as the plasma generating electrodes. In addition, the shortest opposing space | interval between the electrodes used for this invention is not limited to 3 mm, It can be 0.5-5 mm.

  The mounting of the electrode members 14 and 15 is not limited to the screwed structure by the screw portions 27 and 28, but a holding member that holds the current-carrying axes 23 and 24 horizontally by forming a through hole in the radial direction in the hollow member 20. Are inserted and fixed in the through-holes, and the screw portions 27 and 28 and the holding member are integrally formed with the hollow member 20, and the current-carrying axes 23 and 24 are inserted and fixed in the middle portion of the hollow member 20. You may make it do.

The set position of the electrodes 12 and 13 in the hollow portion can be adjusted by the drawing amount of the energizing axes 23 and 24. Further, when the electrode positions are adjusted even if the screw portions 27 and 28 are rotated, it is necessary to adjust the direction of the electrodes 12 and 13 when the electrodes 12 and 13 are rotated together during the screw rotation.

  The nozzle device 19 includes a through hole 31 formed in the upper portion 34 and an orifice portion 32 communicating with the through hole 31. The nozzle device 19 is fixed to the hollow member 20 by screwing the outer peripheral flange 35 to the upper end of the hollow member 20 in a state where the lower portion of the nozzle device 19 is inserted and fitted into the recess 18. A male screw part may be formed in the lower part of the nozzle device 19 and a female screw part may be formed in the concave part 18, and the lower part may be screwed into the concave part 18 to fix the nozzle device 19 to the hollow member 20. A water supply pipe 11 is fitted on the upper part of the nozzle device 19, and an outer fitting portion of the water supply pipe 11 is fixed to the upper part by a fastening member 39 so that the water supply pipe 11 does not come off.

  As shown in FIG. 2, in the state where the nozzle device 19 is inserted into the hollow member 20, the water 38 supplied from the water supply pipe 11 is introduced into the orifice portion 32 through the through hole 31 as indicated by an arrow A, As shown by the arrow B, it is ejected from the orifice (small diameter hole) 33 of the orifice portion 32 toward the reduced diameter portion 21. Bubbles C contained in water can be generated in the water flow through the reduced diameter portion 21 by the cavitation (depressurized boiling) phenomenon caused by the orifice 33.

  FIG. 4 shows an enlarged cross section around the electrode pair of the flowing water plasma generator 1.

  When the water introduced into the orifice portion 32 is ejected as a jet jet from the orifice 33, the jet jet w flows through the reduced diameter portion 21. There is a slight gap in the screwed portions of the electrode members 14 and 15, that is, in the screwed portions of the screw holes 16 and the screw portions 27 and the screwed portions of the screw holes 17 and the screw portions 28, although there is no water leakage. Therefore, when the jet jet w is generated, the space between the orifice 33 and the reduced diameter portion 21 is depressurized, and as shown by the arrow a in FIG. Part of

  The water flow that takes in air as a plasma species by the pressure reducing effect passes between the electrodes 12 and 13 and is subjected to plasma treatment by the flowing water plasma generator 1. As shown by the broken line b in FIG. 4, the water flow region between the electrodes 12 and 13 and the vicinity thereof become a plasma generation region where plasma discharge occurs. The water that has passed through the reduced diameter portion 21 passes through the lower portion 30 of the hollow member 20 and is sent out from the open end of the lower portion 30 to the water tank 10. The open end of the lower portion 30 is located above the water surface, but the open end may be immersed in the stored water 4 as long as the electrode members 14 and 15 are not wetted by water.

  In the flowing water plasma processing apparatus according to the present embodiment, the stored water 4 in the water tank 10 is pumped up through the water intake pipe 5 and the pumping pipe 7 by the circulation pump apparatus 2 and supplied through the water supply pipe 6, the extension pipe 9 and the water supply pipe 11. In addition, a circulation flow path is formed in which a bubble flow is generated by the flowing water plasma generator 1 when passing through the hollow member 20 and the plasma-treated treated water 3 is returned to the water tank 10 again. .

  FIG. 5 shows a schematic configuration of a control device of the flowing water plasma processing apparatus according to the present embodiment.

  The control device of the flowing water plasma processing apparatus has a control unit 40 configured by a microprocessor including a CPU, a ROM for storing a flowing water plasma control program, and a working memory RAM. The control unit 40 can be configured using a programmable logic device (PLD). The control unit 40 controls the high-voltage, high-frequency pulse generator by executing the flowing water plasma control program. The control unit 40 also performs water circulation control in the circulation channel.

The high voltage high frequency pulse generator is configured to generate a high voltage high frequency pulse generation circuit 41 that generates a high voltage high frequency pulse based on a reference frequency of the oscillator 42, an RF power source 43, and an RF voltage of the RF power source 43. Has a superimposing device 44 for superimposing on the high-frequency pulse generated by. The high-voltage, high-frequency pulse on which the RF power supply voltage is superimposed by the superimposing device 44 can be applied as the applied voltage V between the electrodes 12 and 13 via the energizing axes 23 and 24.

  In the present invention, the applied power for plasma discharge is not limited to the case of applying the high-voltage high-frequency pulse on which the RF power supply voltage is superimposed, and only the high-voltage high-frequency pulse can be applied.

  An input signal from the start switch 45 is input to the control unit 40. By pressing the start switch 45, the flowing water plasma control program can be started. The control unit 40 is connected to a key input device 46 for inputting various data settings. The setting data by the key input device 46 is output to the liquid crystal display device 47 and can be displayed. .

  From the control unit 40, an open / close control signal Cv1 of the water supply valve 8 is output according to the execution contents of the flowing water plasma control program, and a drive control signal Cv2 of the circulation pump device 2 can be output.

The composite voltage V generated by the high-voltage high-frequency pulse generator is applied between the electrodes 12 and 13, thereby generating plasma discharge for the bubbles C generated by the orifice 33. In particular, according to the synthesized voltage V, the plasma discharge is activated by the high-voltage high-frequency pulse, and the induction of radicals and ions in the plasma can be promoted by the RF power, so that the water current plasma discharge can be generated more efficiently. Become. When the energy generated by plasma discharge is increased, radicals such as OH ^{− as} well as N ions and H ⁺ can be generated. By adjusting the applied power, the ionization state of the plasma in the fluid can be changed to various modes.

  For the generation of the water plasma discharge, the discharge can be efficiently induced by increasing the frequency of the high-voltage, high-frequency pulse (synthetic voltage V) or by making the rise steep. In the present embodiment, in order to increase the generation efficiency of the plasma discharge, a high voltage high frequency pulse (synthetic voltage V) is output from the high voltage high frequency pulse generator based on the following pulse generation conditions.

  The high voltage high frequency pulse Va of the high voltage high frequency pulse generation circuit 41 is set to any peak-to-peak voltage value Vpp in the range of 0.1 kV to 20 kV. The frequency F of the high voltage high frequency pulse Va is set to any frequency value in the range of 0.1 kHz to 300 kHz. The pulse width W of the high voltage high frequency pulse Va is set to any pulse width value in the range of 0.1 μS to 100 μS. The RF voltage Vb of the RF power source 43 can be generated based on any frequency from 1 MHz to 2.45 GHz.

  The flowing water plasma processing apparatus having the above-described configuration is configured such that the flowing water passes through the circulation flow path constituted by the water tank 10, the circulation pump device 2, the intake pipe 5, the pumping pipe 7, the water supply pipe 6, the extension pipe 9, the water supply pipe 11 and the hollow member 20. It has a circulating flowing water plasma treatment function for continuously treating the plasma.

  FIG. 6 shows a flowing water plasma processing procedure by the control unit 40.

In the present embodiment, during a preset circulation time, circulation of running water through the circulation flow path and plasma treatment by application of the composite voltage V can be performed. Prior to the execution of the plasma processing, in the timer setting mode, which is one of the pre-startup processing (step S8), the key input device 46 is operated to input the execution time T of the plasma processing. In the startup pre-processing (step S8), the peak-to-peak voltage value Vpp, the frequency F, the pulse width W, and the frequency of the RF power source 43 of the high-voltage high-frequency pulse Va can be set. The start condition is satisfied by inputting each setting item of the pre-start process.

  If the start condition is satisfied, the plasma processing control program is started by turning on the start switch 45 (step S1). With this activation, the circulation pump device 2 starts to be driven and the water supply valve 8 is opened (steps S2 and S3). Next, generation of a high frequency high voltage pulse by the high voltage high frequency pulse generator is started (step S4).

  Flowing water circulated through the circulation flow path by driving the circulation pump device 2 passes through the hollow member 20, and a high frequency high voltage pulse is applied between the electrodes 12 and 13, thereby causing plasma discharge to bubbles in the flowing water. The generated water is converted into plasma. During the preset execution time T, the circulating water circulation and the plasma treatment are continuously executed (step S5). As the execution time T elapses, the generation of the high frequency high voltage pulse is stopped (step S6), and the plasma treatment is stopped. A termination process (stopping the circulation pump device 2 and closing the water supply valve 8) is executed by stopping the plasma process (step S7). The plasma-treated water can be taken out from the water tank 10 and recovered. As shown in FIG. 1, an electric three-way valve is used instead of the water supply valve 8, and the electric three-way valve can be switched between a water supply channel to the water tank 10 side and a recovery channel P. Alternatively, the plasma-treated water may be automatically collected by driving the circulation pump device 2.

  According to the flowing water plasma processing apparatus according to the present embodiment, since the above circulating flowing water plasma processing function is provided, the water reforming process can be executed smoothly and with high accuracy.

  A water treatment example using the flowing water plasma processing apparatus according to this embodiment will be described below. This water treatment example is an experimental example of a water treatment technique suitable for nitrogen fixation in which nitrogen components essential for growing plants such as agricultural crops are taken in and fixed in water.

  In this experiment, ion-exchanged water was introduced into the water tank 10 and circulated through the circulation channel to perform plasma treatment, and changes in water quality due to nitrogen uptake were observed.

  The high-voltage high-frequency pulse Va used in this experiment was a power supply voltage of 10 kW, the peak-to-peak voltage value Vpp was set to 20 kV, the frequency F was set to 60 kHz, and 1 kW of power was applied between the electrodes 12 and 13.

  The evaluation of the treated water after the plasma treatment was performed based on (a) a tetratest method using a commercially available Tetratest (registered trademark) test paper and (b) a gas chromatographic analysis method.

In the case where the plasma treatment apparatus is driven to circulate ion-exchanged water and perform continuous plasma treatment, treated water when 15 minutes, 30 minutes, 45 minutes, 60 minutes, 90 minutes, and 115 minutes have passed since the start. Evaluation by the tetra test method was performed. The tetratest method uses a discoloration reaction when a tetratest test paper is immersed in a liquid, resulting in a nitrite component (NO ₂ ) concentration, a nitrate component (NO ₃ ), an ammonia component (NH ₃ ) concentration, an ammonia ion component (NH ₄ + ) A simple water quality inspection method that allows visual discrimination of concentration.

  As a result of the evaluation by the tetra test method, it was observed that the color change reaction by each density test paper shifted to a higher density as the plasma treatment time progressed. For example, when the plasma treatment time exceeded 1 hour, the corresponding color change reaction of the nitrite component concentration test paper was obtained when the nitrite component concentration was 5 to 10 mg / L. Further, when the nitrate component concentration was 10 mg / L or less, a corresponding color change reaction of the nitrate component concentration test paper was obtained.

  FIG. 7 shows an example of the plasma processing result of the flowing water plasma processing apparatus according to this embodiment.

(7A) and (7B) in FIG. 7 show measurement graphs and analytical data for nitrogen oxides (NO ₂ , NO ₃ ) by gas chromatography analysis, respectively. FIGS. 7C and 7D respectively show a measurement graph and analytical data by the gas chromatography method for the ammonia component (NH ₄ ). The horizontal and vertical axes of the measurement graphs (7A) and (7C) indicate the analysis time (minutes) and chromatogram values (μS / cm), respectively. As the measurement sample, ion-exchanged water treated for 175 minutes and subjected to continuous plasma treatment was used.

From the analysis value of (7B), a quantitative analysis result in which nitrogen oxides of NO ₂ and NO ₃ were produced at concentrations of 6.989 ppm and 15.521 ppm in the treated water of the analysis sample was obtained. As a result of this quantitative analysis, the circulating water flowing through the circulation channel is continuously subjected to plasma treatment by the flowing water plasma generator 1, and nitrogen and oxygen contained in the flowing water react to generate the nitrogen oxides. This is due to being fixed in water.

From the analysis value of (7D), a quantitative analysis result in which 0.405 ppm of the ammonia component of NH ₄ was generated in the treated water of the measurement sample was obtained. As a result of this quantitative analysis, the circulating flowing water flowing through the circulating flow path is continuously subjected to the plasma treatment by the flowing water plasma generator 1, and nitrogen and hydrogen contained in the flowing water react to generate the ammonia component, This is due to being fixed in water.

(8A) of FIG. 8 shows a measurement graph showing a change in concentration of nitrides (NO ₂ , NO ₃ , NH ₄ ) generated when the plasma treatment is performed for 2 hours. The measurement graph of (8A) is created based on the analysis data of the gas chromatography analysis method of FIG. This measurement was performed every time the plasma treatment was performed for 15 minutes. Graphs D1 to D3 shown in (8A) show changes in concentration (ppm) of NO ₂ , NO ₃ , and NH ₄ , respectively, and graph D4 shows changes in the total amount of these nitrides as a whole. The continuous treatment experiment of FIG. 8 was performed by circulating 7 L / min with a total water volume of 30 L using the flowing water plasma processing apparatus of FIG. 1. In this experiment, plasma discharge was generated by a plasma species that took in air under the applied power conditions of about 500 W of plasma generation power and a discharge frequency of 60 kHz.

From the continuous concentration change of D1 and D2, it was found that the nitrogen oxides of NO ₂ and NO ₃ were generated while increasing with time according to the plasma treatment time. From the continuous concentration change of D3, it was found that the ammonia component (NH ₄ ) was slightly generated with a small increasing gradient.

The following findings (1) to (3) were obtained from the evaluation results of the treated water subjected to the plasma treatment.
(1) According to the flowing water plasma processing apparatus according to the present embodiment, the nitrogen component can be freely taken in (immobilized) as the plasma processing time elapses. As shown in the experimental results of FIG. 8, when the plasma generating power energy is kept constant, the concentration of nitrogen oxides and ammonia components can be controlled with high accuracy by the plasma treatment time. Of course, the content concentration can also be controlled by changing the power energy for plasma generation and the circulation speed of water.
(2) According to the present embodiment, since not only nitrogen and oxygen contained in water but also nitrogen and oxygen in the outside air can be taken into plasma and treated water containing nitrogen oxides can be generated, nitrogen fertilizer Unnecessary plant growth water can be produced in large quantities and at low cost.

Conventionally, nitrogen components essential for plant growth have been incorporated into soil using organic fertilizers and chemical fertilizers. In the case of chemical fertilizers such as ammonium sulfate and ammonium sulfate, the main component ammonia nitrogen (NH ₄ ) is easily absorbed and retained in the soil, but nitrate nitrogen (NO ₃ ) is caused by nitrifying bacteria of soil microorganisms (bacteria etc.) in the soil. When it changes, it is difficult to be absorbed and retained by the soil and run away. On the other hand, in organic fertilizers such as cow dung, chicken dung, and mulch, soil microorganisms nitrifying bacteria play an active role in converting ammonia nitrogen to nitrate nitrogen. It is influenced by environmental conditions such as temperature and cannot be artificially controlled, and requires a lot of time (days). In addition, due to natural changes, a large amount of nitrate nitrogen was generated, and it was washed away from the soil and accumulated in groundwater, rivers, and ponds, which could cause environmental problems.

In this embodiment, since the nitrate component (NO ₃ ) concentration can be adjusted by setting the plasma treatment time, chemical fertilizer and organic fertilizer can be obtained by performing the above plasma treatment using ion exchange water or the like as a raw material liquid. Therefore, a large amount of nitrogen-containing treated water suitable for plant growth can be easily produced at low cost and in a short time. In particular, the treated water has an advantage that the immobilization of the nitrate nitrogen component can be adjusted and controlled in a state where the ammonia nitrogen concentration is extremely low, and the influence on the environment can be minimized. Since the nitrite component (NO ₂ ) generated in the plasma treatment process and contained in the treated water can be converted to nitrate nitrogen by bubbling with air or oxygen, it is parallel to the plasma treatment. By performing the bubbling, it is possible to adjust the nitrate component (NO ₃ ) concentration including the converted component with high accuracy.
(3) In this embodiment, it has the foaming means which foams the water flow comprised by the nozzle apparatus 19 provided with the orifice part 32, and foams flowing water by jetting discharge of flowing water by the nozzle apparatus 19. (Generation of water bubbles) can be easily performed, and the bubbles C can be supplied to the plasma generation region between the electrodes 12 and 13 to perform plasma processing, so that plasma processing water can be obtained at low cost with a simple configuration.

  The foaming means in the present invention is not limited to the nozzle device 19, and various forms of foaming means can be used as long as they are applicable to running water.

  FIG. 9 shows a longitudinal sectional structure of a flowing water plasma generator 50 according to another embodiment. In FIG. 9, the same members as those in the above embodiment are denoted by the same reference numerals.

  In this embodiment, nitrogen gas can be supplied from the outside to the hollow portion of the hollow member 20, and a large amount of nitrogen component is contained in the running water to promote the plasma treatment of the running water. Nitrogen gas supplied to the hollow portion is generated by a nitrogen gas generator 51. Nitrogen gas can be supplied from a nitrogen gas cylinder instead of the nitrogen gas generator 51.

  The nitrogen gas generator 51 can discharge the generated nitrogen gas to the outside through a gas supply pipe 52. The discharge end 53 of the gas supply pipe 52 is hermetically disposed so as to face the gap region 54 between the lower end of the nozzle device 19 and the upper portion of the reduced diameter portion 21.

  According to the flowing water plasma generator 50, the water flow is foamed by the nozzle device 19 in the gap region 54, and the supply of nitrogen gas is externally supplied and introduced during the foamed state. By supplying flowing water with an increased nitrogen content to the plasma generation region of the reduced diameter portion 21, a plasma treatment with an increased amount of synthesis of nitrogen oxides and the like can be performed with high efficiency. Of course, foaming can also be performed by supplying nitrogen gas to the gap region 54 without using the nozzle device 19.

Instead of the nitrogen gas generator 51, a hollow portion of the hollow member 20 is formed through a gas supply pipe 52 using a gas source of an active gas such as air, oxygen, an inert gas such as helium or argon, or a mixed gas of these gases. By supplying to the plasma, it is possible to perform plasma treatment using these various gases as plasma species.

  FIG. 10 shows a schematic longitudinal sectional structure of a flowing water plasma processing apparatus using simple foaming means by high-speed stirring. In FIG. 10, the same members as those in the above-described embodiment are denoted by the same reference numerals.

  In the running water plasma processing apparatus of FIG. 10, a propeller stirring device is provided in the upstream flow path of the hollow member 20 as a simple foaming means, and the running water is agitated by driving the propeller of the propeller stirring device. Is called.

  A stirring tank 60 is connected to the upper part 29 of the hollow member 20 through a communication pipe 61 so as to be able to flow. The communication pipe 61 is provided with an open / close electromagnetic valve 74, and the lower part of the communication pipe 61 is fixed to the upper portion 29 by a fixing fitting 75. By opening the open / close electromagnetic valve 74, the water in the agitation tank 60 is supplied to the upper portion 29 through the communication pipe 61 as shown by an arrow so that the hollow member 20 can be circulated.

  A water supply port 63, an air intake port 64, and a shaft hole 65 are formed in the upper lid portion 62 of the stirring tank 60. The water supply pipe 11 is connected to the water supply port 63 so that water can be supplied. The treated water 76 that has passed through the hollow member 20 is converted into a plasma as in the above embodiment, and then discharged into a water tank (not shown), circulated by a circulation pump device (not shown), and circulated water 77. As shown by an arrow 71, the water is discharged and supplied to the stirring tank 60 through the water supply pipe 11 from the water supply port 63.

  A rotating shaft 67 having two stirring blades 68 and 69 attached to the lower end side is inserted into the shaft hole 65. The upper end of the rotary shaft 67 is fixed and connected to the rotary shaft of the rotary motor 66 by a connecting member 70. When the rotation motor 66 is driven to rotate the rotating shaft 67 at a high speed, the water 72 in the stirring tank 60 is foamed by the high speed stirring by the rotation of the stirring blades 68 and 69, and a large number of bubbles 73 are generated. The flowing water containing the bubbles 73 flows into the hollow member 20 through the communication pipe 61, and a high-frequency high-voltage pulse is applied between the electrodes 12 and 13 in the same manner as in the above-described embodiment, so that plasma discharge is performed on the bubbles in the flowing water. Is generated and the plasma treatment of the flowing water is executed.

  According to the flowing water plasma processing apparatus of FIG. 10, the stored water in the stirring tank 60 is constituted by the high-speed stirring device constituted by the rotating shaft 67 attached with the stirring blades 68 and 69 and the rotating motor 66 that rotates the rotating shaft 67 at high speed. Since 72 is foamed by high-speed stirring to generate a large amount of bubbles, flowing water containing a large amount of bubbles can be supplied to the plasma generation region of the reduced diameter portion 21 so that the plasma treatment can be performed efficiently and smoothly.

  FIG. 11 shows a schematic longitudinal cross-sectional structure of a flowing water plasma processing apparatus using flowing water that is foamed by supplying nitrogen gas from the outside in advance. In FIG. 11, the same members as those in the embodiment and FIG.

  In the flowing water plasma processing apparatus of FIG. 11, the gas mixing tank 80 which mixes the gas introduced externally as a simple foaming means is provided in the upstream flow path of the hollow member 20, and foaming of flowing water is performed.

  The gas mixing tank 80 is connected to the upper part 29 of the hollow member 20 through the communication pipe 61 so as to be able to circulate. By opening the open / close electromagnetic valve 74, the water 89 in the gas mixing tank 80 is supplied to the upper portion 29 through the communication pipe 61 as shown by the arrow, and can flow through the hollow member 20.

A water supply port 82 and an insertion hole 83 for a gas supply pipe 85 are formed in the upper lid portion 81 of the gas mixing tank 80. The water supply pipe 11 is connected to the water supply port 82 so that water can be supplied. The water supplied to the hollow member 20 is converted into a plasma and then discharged into a water tank (not shown) as in the above embodiment and the examples of FIGS. 9 and 10, and a circulation pump device (not shown). The circulating water 91 flows through the water supply pipe 11 as indicated by an arrow 92 and is discharged and supplied to the gas mixing tank 80 from the water supply port 82 as indicated by an arrow 88.

  The open end portion 86 of the supply pipe 85 is immersed in the water 89 of the gas mixing tank 80, and the open end portion 86 has many pores 87 formed therein. Nitrogen gas generated by the nitrogen gas generator 84 is discharged into the supply pipe 85 and is ejected from the pores 87 into the water. Due to the ejection of nitrogen gas, the stored water 89 in the nitrogen gas mixing tank 80 is foamed, and bubbles 90 are generated by a large amount of nitrogen gas. The flowing water containing the bubbles 90 flows into the hollow member 20 through the communication pipe 61, and a high frequency high voltage pulse is applied between the electrodes 12 and 13 in the same manner as in the above embodiment and the examples of FIGS. 9 and 10. Plasma discharge is generated with respect to the bubbles in the flowing water, and the plasma treatment of the flowing water is executed.

  According to the flowing water plasma processing apparatus of FIG. 11, the gas mixing tank 80 in which the nitrogen gas generated by the nitrogen gas generating apparatus 84 is ejected through the supply pipe 85 is provided in the upstream flow path of the hollow member 20 to foam the flowing water. Since the stored water 89 containing bubbles 90 of a large amount of nitrogen gas is supplied to the plasma generation region of the reduced diameter portion 21, the plasma treatment can be performed efficiently and smoothly.

  As in the case of FIG. 9, instead of the nitrogen gas generator 51, supply is performed using a gas source of an active gas such as air or oxygen, an inert gas such as helium or argon, or a mixed gas of these gases. By supplying the hollow part of the hollow member 20 through the tube 85, plasma treatment using these various gases as plasma species can be performed.

  Each of the foaming means of flowing water shown in FIGS. 10 and 11 can be used alone, but in combination with the nozzle device 19 or in combination with the foaming means shown in FIG. Alternatively, all of them can be used in combination.

  The plasma treatment generated by the in-fluid plasma generation method according to the present invention is not limited to obtaining nitrogen-immobilized treated water suitable for plant growth and the like, depending on the applied power power between the electrodes 12 and 13. Since various ionization states can be obtained, it can be applied to various plasma treatments using them. The plasma treatment target is not limited to a liquid, but can include a mixed liquid containing powder and fine particles of an object to be processed. For example, surface modification treatment for poorly soluble powders such as carbon nanomaterials made of conductive materials such as carbon nanotubes (CNT), carbon nanoballs (CNB), fullerenes, non-conductive such as diamond-like carbon (DLC), nanodia powders, etc. It can be used for the surface modification treatment for hardly soluble powders made of soluble substances.

As an example of the surface modification treatment, in the case of performing CNT hydrophilization (solubilization) treatment, CNT is introduced into running water, and high-frequency high-voltage pulses with high power power are applied between the electrodes 12 and 13 against running water containing bubbles. By applying, CNT can be introduced into a plasma generation region where plasma discharge is generated with respect to bubbles in flowing water. In this case, the active electrode water vapor containing radicals such as H ⁺ and OH ⁻ is generated by the plasma discharge in the plasma generation region, and the active water vapor or the plasma is brought into contact with the CNT fine particles. A hydration layer can be formed and hydrophilized. By collecting the modified CNT deposited in the water tank 10, a highly functional binding material composed of the modified CNT can be obtained. It is also possible to continuously perform the CNT surface modification treatment by collecting the modified CNTs that have been made hydrophilic and supplying water and adding CNTs. For example, the stirring tank 60 shown in FIG. 10 or the nitrogen gas mixing tank 80 shown in FIG. 11 can be used as the mixing member mixed in the flowing water of the plasma processing object (CNT).

The plasma treatment produced by the in-fluid plasma generation method according to the present invention can be applied to water resource purification treatment. For example, using the flowing water plasma processing apparatus according to the embodiment of FIG. 1, the electric power applied between the electrodes 12 and 13 is changed to a plasma generation state in which OH ⁻ or H ⁺ is ionized, and the city water or river water that is not pure water is used as the water source. Supply pond water and run it. Thereby, when flowing between the electrodes 12 and 13, fungi and microorganisms contained in city water or the like can be decomposed and sterilized with OH ^- or H ⁺ active ions to purify the water. The present invention is not limited to the purification of drinking water and sewers, but can also be applied to purification treatments such as manure and factory wastewater.

  The liquid material to which the method for generating plasma in a fluid according to the present invention can be applied is not limited to pure water such as ion-exchanged water and other waters, and various solutions such as alcohols and surfactant-containing solutions are used. be able to. In particular, a grafting treatment in which the surfactant is uniformly dispersed can be performed by flowing a solution containing the surfactant between the electrodes 12 and 13 and exposing it to plasma.

  In the fluid in the present invention, an inert gas such as helium or argon can be mixed in the fluid in addition to air, oxygen and nitrogen, and various plasma synthesis can be performed according to the type of the gas. . In addition, the hollow member 20 is provided with a plasma generation region by a pair of electrodes 12 and 13, but a plurality of electrode pairs are provided to form a larger plasma generation region in order to improve the efficiency of plasma treatment. It may be.

  The present invention is not limited to the above-described embodiments and modifications, and includes various modifications and design changes within the technical scope without departing from the technical idea of the present invention. Needless to say.

  According to the present invention, it is possible to provide an in-fluid plasma generation method and an in-fluid plasma generation apparatus suitable for various plasma processing such as water quality improvement and CNM surface modification processing.

DESCRIPTION OF SYMBOLS 1 Flowing water plasma apparatus 2 Circulation pump apparatus 3 Treated water 4 Accommodating water 5 Intake pipe 6 Water supply pipe 7 Pumping pipe 8 Water supply valve 9 Extension pipe 10 Water tank 11 Water supply pipe 12 Electrode 13 Electrode 14 Electrode member 15 Electrode member 16 Screw hole 17 Screw Hole 18 Recess 19 Nozzle device 20 Hollow member 21 Reduced diameter portion 22 Through-hole portion 23 Current-carrying axis 24 Current-carrying axis 25 Screw head 26 Screw head 27 Screw portion 28 Screw portion 29 Upper 30 Lower 31 Through-hole 32 Orifice portion 33 Orifice 34 Upper part 35 Hear part 36 Through hole 37 Through hole 38 Water 39 Fastening member 40 Control part 41 High voltage high frequency pulse generation circuit 42 Oscillator 43 RF power supply 44 Superimposition device 45 Start switch 46 Key input device 47 Liquid crystal display device 50 Flowing water plasma generation device 51 Nitrogen gas generator 52 Gas supply pipe 53 Discharge end 5 Gap area 60 Stirring tank 61 Communication pipe 62 Upper lid portion 63 Water supply port 64 Air intake port 65 Shaft hole 66 Rotating motor 67 Rotating shaft 68 Stirring blade 69 Stirring blade 70 Connecting member 71 Arrow 72 Accommodating water 73 Bubbles 74 Opening and closing solenoid valve 75 Fixing bracket 76 Treated water 77 Circulating water 80 Gas mixing tank 81 Upper lid portion 82 Water supply port 83 Insertion hole 84 Nitrogen gas generator 85 Supply pipe 86 Open end 87 Pore 88 Arrow 89 Accommodating water 90 Bubble 91 Circulating water 92 Arrow

Claims (14)

In the middle part of the hollow member having a hollow part through which the flow path is formed, a reduced diameter part with a reduced inner diameter is formed, and left and right electrode members are attached to the reduced diameter part in the diametrical direction. Each of the members has opposed bent electrodes, and the left and right electrodes are set in an open direction on the inner wall side of the hollow portion so that the open width of the electrode pair is larger than the upper end distance between the electrodes,
The electrode is provided in a flow path of a liquid fluid in which a liquid substance is flowed from the upper end distance side to the open width side,
A high voltage is applied to the fluid by the electrodes;
A method of generating plasma in a fluid, wherein bubbles formed into plasma by a gas component contained in the fluid are generated. The in-fluid plasma generation method according to claim 1, wherein the fluid is foamed by a foaming unit, and bubbles generated by the foaming are converted into plasma. The method for generating plasma in fluid according to claim 1 or 2, wherein gas is injected into the fluid to generate bubbles of the gas, and the bubbles of gas are converted into plasma. The in-fluid plasma generating method according to claim 2, wherein the foaming means is configured by a nozzle device provided with an orifice on a nozzle outlet side, and foams the fluid by the orifice while circulating the fluid in the nozzle device. The in-fluid plasma generating method according to claim 2, wherein the foaming means is configured by a fluid stirring device that stirs the fluid, and causes the fluid stirred by the fluid stirring device to flow through the flow path to foam. The method for generating plasma in fluid according to claim 3, wherein the gas is any one of an active gas, an inert gas, and a mixed gas of these gases. The method for generating plasma in fluid according to any one of claims 1 to 6, wherein the liquid substance is any one of water containing city water, river water, pond water, distilled water, ion-exchanged water, alcohol, or a drug. In the middle part of the hollow member having a hollow part through which the flow path is formed, a reduced diameter part with a reduced inner diameter is formed, and left and right electrode members are attached to the reduced diameter part in the diametrical direction. Each of the members has opposed bent electrodes, and the left and right electrodes are set in an open direction on the inner wall side of the hollow portion so that the open width of the electrode pair is larger than the upper end distance between the electrodes,
The electrode provided in the flow path of the liquid fluid in which the liquid substance is flowed from the upper end distance side to the open width side;
A high voltage applying means for applying a high voltage to the fluid by the electrode;
An in-fluid plasma generating apparatus, wherein a high voltage is applied to the fluid by the electrode to generate bubbles that are turned into plasma by a gas component contained in the fluid. The in-fluid plasma generation device according to claim 8, further comprising a foaming unit configured to foam the fluid, wherein the fluid is foamed by the foaming unit, and the bubbles generated by the foaming are converted into plasma. A bubble generating means for injecting a gas into the fluid to generate bubbles of the gas, the bubble generating means generating the bubbles of the gas in the fluid, and converting the bubbles of the gas into plasma. The in-fluid plasma generator according to 8 or 9. The in-fluid plasma generator according to claim 9, wherein the foaming means is a nozzle device having an orifice on a nozzle outlet side, and foams the fluid by the orifice while circulating the fluid in the nozzle device. The in-fluid plasma generating device according to claim 9, wherein the foaming means is a fluid stirring device that stirs the fluid, and the fluid stirred by the fluid stirring device is caused to flow through the flow path to foam. The in-fluid plasma generator according to claim 10, wherein the gas is any one of an active gas, an inert gas, and a mixed gas of these gases. The in-fluid plasma generator according to any one of claims 8 to 13, wherein the liquid substance is any one of city water, river water, pond water, distilled water, ion-exchanged water, alcohol, or a liquid containing a drug.

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