JP6635575B2 - Phenolic compound having good stability and method for producing the same - Google Patents
Phenolic compound having good stability and method for producing the same Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
- C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
- C07C39/16—Bis-(hydroxyphenyl) alkanes; Tris-(hydroxyphenyl)alkanes
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C37/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
- C07C37/11—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms
- C07C37/16—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms by condensation involving hydroxy groups of phenols or alcohols or the ether or mineral ester group derived therefrom
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C37/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
- C07C37/11—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms
- C07C37/20—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms using aldehydes or ketones
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/02—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring monocyclic with no unsaturation outside the aromatic ring
- C07C39/04—Phenol
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C47/00—Compounds having —CHO groups
- C07C47/02—Saturated compounds having —CHO groups bound to acyclic carbon atoms or to hydrogen
- C07C47/04—Formaldehyde
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Description
本発明は、アルデヒド類(以下、単にアルデヒドという場合がある)またはケトン類(以下、単にケトンという場合がある)とフェノール類(以下、単にフェノールという場合がある)より製造される熱および/または酸素に対して安定性の良いフェノール化合物に関する。 The present invention relates to heat and / or heat produced from aldehydes (hereinafter sometimes simply referred to as aldehyde) or ketones (hereinafter sometimes simply referred to as ketone) and phenols (hereinafter sometimes simply referred to as phenol). It relates to a phenol compound having good stability to oxygen.
ビスフェノールやフェノールノボラック樹脂は、エピクロルヒドリンと反応させてグリシジルエーテル化して、エポキシ樹脂として広く利用されている。これらのフェノール化合物は熱及び酸素に敏感に反応することが公知であり、熱および/または酸素に暴露した際にこれらのフェノール化合物は分解生成物を形成し、この分解生成物を含むフェノール化合物より製造されたエポキシ樹脂の物性に対しても悪影響を与える。特に、ビスフェノールFやフェノールノボラック樹脂は、フェノールにホルマリンを加え、酸触媒を用いて縮合させることによって製造されるが、これらを長期間保存すると着色が著しい。また、このように着色したフェノール化合物を用いて得られるエポキシ樹脂も着色し、製品価値を著しく損なってしまう。そのため、反応液の溶存酸素を制御することで得られるフェノール化合物の着色を防止する提案がされ、現在では標準的な手法となっており、得られるフェノール化合物の色相はきれいである(特許文献1)。しかしながらその方法で得られたフェノール化合物であっても、長期間保存すると着色する傾向や、熱時の分解性の解決にはなっていない。 Bisphenol and phenol novolak resins are widely used as epoxy resins by reacting with epichlorohydrin to form glycidyl ether. These phenolic compounds are known to be sensitive to heat and oxygen, and upon exposure to heat and / or oxygen, these phenolic compounds form decomposition products, which are more abundant than phenolic compounds containing these decomposition products. It also has an adverse effect on the physical properties of the manufactured epoxy resin. In particular, bisphenol F and phenol novolak resins are produced by adding formalin to phenol and condensing it using an acid catalyst, but when these are stored for a long period of time, coloring is remarkable. Further, the epoxy resin obtained by using such a colored phenol compound is also colored, which significantly impairs the product value. Therefore, it has been proposed to prevent the coloring of the phenol compound obtained by controlling the dissolved oxygen in the reaction solution, which is now a standard method, and the hue of the obtained phenol compound is clear (Patent Document 1) ). However, even the phenol compound obtained by that method does not solve the tendency to color when stored for a long period of time or the decomposability when heated.
そこで、これらのフェノール化合物を安定化させるため、安定剤として、乳酸、リンゴ酸、グリセリン酸、またはその金属塩を添加する方法(特許文献2)や、無水フタル酸や無水フタル酸誘導体を添加する方法(特許文献3)や、L−アスコルビン酸やDL−α−トコフエロールを添加する方法(特許文献4)が提案されている。しかしながら、これらの方法では、安定剤が不純物として混入するため、いわゆる間接法と呼ばれる低分子エポキシ樹脂とフェノール化合物との反応で得られるエポキシ樹脂の製造方法では、エポキシ樹脂に安定剤が混入し、物性を悪化させる場合がある。
また、ビスフェノールF及びフェノールノボラック樹脂を併産する製造方法では、蒸留工程が必ず含まれるため、熱の影響を受ける可能性が大きいが、従来方法では特に配慮された製法にはなっていなかった(特許文献5、特許文献6)。
Therefore, in order to stabilize these phenol compounds, a method of adding lactic acid, malic acid, glyceric acid or a metal salt thereof (Patent Document 2), or adding phthalic anhydride or a phthalic anhydride derivative as a stabilizer is used. A method (Patent Document 3) and a method of adding L-ascorbic acid or DL-α-tocopherol (Patent Document 4) have been proposed. However, in these methods, since the stabilizer is mixed as an impurity, in the so-called indirect method, a method for producing an epoxy resin obtained by a reaction between a low-molecular epoxy resin and a phenol compound, the stabilizer is mixed into the epoxy resin, Physical properties may be deteriorated.
Further, in a production method in which bisphenol F and a phenol novolak resin are co-produced, since a distillation step is always included, there is a high possibility of being affected by heat, but the conventional method has not been a production method in which special consideration has been given ( Patent Document 5, Patent Document 6).
本発明は、上記事情に鑑み開発されたものであり、目的とするところは、アルデヒドまたはケトンとフェノールより製造されるフェノール化合物において、特別な安定剤を使用することなく、熱および/または酸素に対して安定性の良いフェノール化合物を得ることにある。 The present invention has been developed in view of the above circumstances, and it is an object of the present invention to provide a phenol compound produced from an aldehyde or ketone and phenol without heat and / or oxygen without using a special stabilizer. An object of the present invention is to obtain a phenol compound having good stability.
本発明者らは、アルデヒドまたはケトンとフェノールより製造されるフェノール化合物において、フェノール化合物中の金属イオンと溶存酸素濃度を従来より大幅に低減させた一定範囲で制御すれば、特別な安定剤を使用することなく、熱および/または酸素に対して安定性の良いフェノール化合物を得られることを見出し、本発明に完成した。 The present inventors use a special stabilizer in phenol compounds produced from aldehydes or ketones and phenol, if the concentration of metal ions and dissolved oxygen in the phenol compounds is controlled within a certain range that is significantly reduced from the conventional level. It has been found that a phenol compound having good stability to heat and / or oxygen can be obtained without performing the method, and the present invention has been completed.
即ち、本発明は、
触媒の存在下、アルデヒド類またはケトン類、及びフェノール類より得られる、エポキシ樹脂原料用のフェノール類化合物(1)の製造方法であって、使用する原料中の金属イオン濃度を0.1〜10mg/kgの範囲とする一方、上記フェノール類化合物(1)中の溶存酸素濃度を0.01〜1.0mg/Lの範囲となるように、溶融状態の該フェノール類化合物(1)に酸素以外の気体をバブリングすること、または溶融状態の該フェノール類化合物(1)を減圧脱気することを特徴とする熱および/または酸素に対して安定性の良い、エポキシ樹脂原料用のフェノール類化合物(1)の製造方法である。
That is, the present invention
A method for producing a phenolic compound (1) for an epoxy resin raw material , which is obtained from an aldehyde or a ketone and a phenol in the presence of a catalyst, wherein the metal ion concentration in the raw material used is 0.1 to 10 mg. / Kg, while the phenolic compound (1) in a molten state is added with oxygen other than oxygen so that the dissolved oxygen concentration in the phenolic compound (1) is in the range of 0.01 to 1.0 mg / L. B) bubbling the gas or degassing the phenolic compound (1) in a molten state under reduced pressure, characterized in that the phenolic compound for an epoxy resin raw material has good heat and / or oxygen stability ( This is the manufacturing method of 1).
上記フェノール類化合物は、ビスフェノールFまたはフェノールノボラック樹脂が好ましく、 The phenol compound is preferably bisphenol F or phenol novolak resin,
上記フェノール類化合物は、ビスフェノールF及びフェノールノボラック樹脂を併産する製造方法で得られるビスフェノールF及びフェノールノボラック樹脂がより好ましい。 The phenolic compound is more preferably bisphenol F and a phenol novolak resin obtained by a production method that produces bisphenol F and a phenol novolak resin together.
上記アルデヒド類はホルムアルデヒドが好ましく、上記フェノール類はフェノールが好ましい。The aldehydes are preferably formaldehyde, and the phenols are preferably phenol.
本発明の熱および/または酸素に対して安定性の良いフェノール類化合物は、特別な安定剤を必要としないため、その後の使用時にほとんど悪影響を及ぼさないフェノール類化合物が得られ、いわゆる間接法によるエポキシ樹脂の製造方法の原料として適したフェノール類化合物である。 The heat and / or oxygen stable phenolic compound of the present invention does not require a special stabilizer, so that a phenolic compound having little adverse effect upon subsequent use can be obtained. It is a phenolic compound suitable as a raw material in a method for producing an epoxy resin.
以下、本発明の実施形態について詳細に説明する。
本発明のフェノール類化合物とは、下記一般式(1)で示される、アルデヒド類またはケトン類、及びフェノール類より製造されるフェノール類化合物であり、そのフェノール類化合物中の金属イオン濃度は0.1〜10mg/kgであり、溶存酸素濃度は0.01〜1.0mg/Lであるフェノール類化合物を指す。
Hereinafter, embodiments of the present invention will be described in detail.
The phenolic compound of the present invention is a phenolic compound represented by the following general formula (1) and produced from aldehydes or ketones and phenols, and the metal ion concentration in the phenolic compound is 0.1%. 1 to 10 mg / kg, and refers to a phenol compound having a dissolved oxygen concentration of 0.01 to 1.0 mg / L.
原料のフェノール類はフェノールの他に例えば、クレゾール、エチルフェノール、ブチルフェノール、オクチルフェノール、ノニルフェノール、ドデシルフェノール等のアルキルフェノール類や、その(オルソ、メタ、パラ)位置置換体、(n−、sec−、tert−等の)置換基構造異性体を使用することもできる。中でも、反応性や蒸留回収の容易さから、フェノールが好ましい。フェノールは単独で使用しても2種以上を併用しても良い。 In addition to phenol, the raw material phenols include, for example, alkyl phenols such as cresol, ethyl phenol, butyl phenol, octyl phenol, nonyl phenol, dodecyl phenol, and their (ortho, meta, para) position-substituted products, (n-, sec-, tert) Substituent structural isomers (eg-) can also be used. Among them, phenol is preferred from the viewpoint of reactivity and ease of recovery by distillation. Phenol may be used alone or in combination of two or more.
原料のアルデヒド類は、例えば、ホルムアルデヒド(ホルマリン)、アセトアルデヒド、プロピオンアルデヒド、ベンズアルデヒド等が挙げられるが、これらに限定されるわけではない。 Examples of the raw material aldehydes include, but are not limited to, formaldehyde (formalin), acetaldehyde, propionaldehyde, benzaldehyde, and the like.
原料のケトン類は、例えば、アセトン、ブタノン、シクロヘキサノン、ベンゾフェノン、ヘキサフルオロアセトン等が挙げられるが、これらに限定されるわけではない。 Ketones as a raw material include, for example, acetone, butanone, cyclohexanone, benzophenone, hexafluoroacetone and the like, but are not limited thereto.
本発明のフェノール類化合物の製造には、一般的なフェノール化合物の製造と同様に、触媒が用いることが好ましい。用いることのできる触媒として具体的には、塩酸、硫酸、リン酸等の無機酸、サリチル酸、パラトルエンスルホン酸、シュウ酸等の有機酸等の酸触媒や、水酸化ナトリウム、水酸化リチウム、水酸化カリウム等のアルカリ金属の水酸化物、アンモニア水、トリエチルアミン等の第3級アミン、カルシウム、マグネシウム、バリウム等アルカリ土類金属の酸化物及び水酸化物、炭酸ナトリウム等の塩基性触媒が挙げられる。また、イオン交換樹脂のような固体触媒の固定床であっても良い。本発明では特に触媒の規定はないが酸触媒が好ましく、具体的にはシュウ酸、パラトルエンスルホン酸が好ましい。 In the production of the phenol compound of the present invention, it is preferable to use a catalyst as in the production of a general phenol compound. Specific examples of the catalyst that can be used include acid catalysts such as inorganic acids such as hydrochloric acid, sulfuric acid, and phosphoric acid, organic acids such as salicylic acid, paratoluenesulfonic acid, and oxalic acid; sodium hydroxide, lithium hydroxide, and water. Basic catalysts such as hydroxides of alkali metals such as potassium oxide, tertiary amines such as aqueous ammonia and triethylamine, oxides and hydroxides of alkaline earth metals such as calcium, magnesium and barium, and sodium carbonate and the like. . Further, it may be a fixed bed of a solid catalyst such as an ion exchange resin. In the present invention, although there is no particular limitation on the catalyst, an acid catalyst is preferable, and specifically, oxalic acid and p-toluenesulfonic acid are preferable.
また、製造における反応温度や反応時間は、用いる触媒の種類、量または反応モル比〔フェノール類/アルデヒド類またはケトン類〕等によっても異なるが、反応温度は通常50〜110℃であり、反応時間は通常0.5〜10時間である。 The reaction temperature and the reaction time in the production vary depending on the type, amount or reaction molar ratio of the catalyst used (phenols / aldehydes or ketones), etc., but the reaction temperature is usually 50 to 110 ° C. Is usually 0.5 to 10 hours.
具体的なフェノール類化合物には、フェノールとアセトンから得られるビスフェノールA、フェノールとホルマリンから得られるビスフェノールF、フェノールとアセトフェノンから得られるビスフェノールAP、フェノールとヘキサフルオロアセトンから得られるビスフェノールAF、フェノールとブタノンから得られるビスフェノールB、フェノールとベンゾフェノンから得られるビスフェノールBP、クレゾールとアセトンから得られるビスフェノールC、フェノールとアセトアルデヒドから得られるビスフェノールE、2−イソプロプルフェノールとアセトンから得られるビスフェノールG、2−フェニルフェノールとアセトンから得られるビスフェノールPH、フェノールとシクロヘキサノンから得られるビスフェノールZ等のビスフェノールや、フェノールとホルマリンから得られるフェノールノボラック、クレゾールとホルマリンから得られるクレゾールノボラック、オクチルフェノールとホルマリンから得られるオクチルフェノールノボラック等のフェノールノボラック等が挙げられるが、これらに限定されるものではない。なお、明細書中でフェノール化合物というときは、特に断りがない限り、これら本発明のフェノール化合物を指す。本発明以外のフェノール化合物や本発明以外のフェノール化合物を含む場合は、その都度明確に区別する。 Specific phenolic compounds include bisphenol A obtained from phenol and acetone, bisphenol F obtained from phenol and formalin, bisphenol AP obtained from phenol and acetophenone, bisphenol AF obtained from phenol and hexafluoroacetone, phenol and butanone Bisphenol B obtained from phenol and benzophenone, bisphenol C obtained from cresol and acetone, bisphenol E obtained from phenol and acetaldehyde, bisphenol G obtained from 2-isopropylphenol and acetone, 2-phenylphenol Such as bisphenol PH obtained from phenol and acetone, and bisphenol Z obtained from phenol and cyclohexanone. Phenol or phenol novolak derived from phenol and formaldehyde, cresol novolac obtained from cresol and formaldehyde, although phenol novolac such as octylphenol novolak obtained from octylphenol and formaldehyde and the like, but is not limited thereto. The phenol compound in the specification refers to these phenol compounds of the present invention unless otherwise specified. When a phenol compound other than the present invention or a phenol compound other than the present invention is contained, it is clearly distinguished in each case.
これらのフェノール化合物中に含まれる金属イオン濃度が0.1〜10mg/kgの範囲であり、フェノール化合物中の溶存酸素濃度が0.01〜1.0mg/Lの範囲を満足すれば、これらのフェノール化合物は、熱および/または酸素に対して安定性の良いフェノール化合物であり、長期間の保管でも着色せず、高温に保持されても熱分解が起こりにくい。 If the concentration of metal ions contained in these phenol compounds is in the range of 0.1 to 10 mg / kg and the concentration of dissolved oxygen in the phenol compounds satisfies the range of 0.01 to 1.0 mg / L, A phenol compound is a phenol compound having good stability to heat and / or oxygen, does not discolor even during long-term storage, and hardly undergoes thermal decomposition even when kept at a high temperature.
フェノール化合物中の金属イオン濃度は、0.1〜10mg/kgの範囲であれば、特に熱に対する安定性が向上し、熱分解が起こりにくい。熱分解は残存する酸触媒量の影響が大きく、残存量が多いと熱分解が起こりやすい。また、熱分解の起こりやすくなる量は酸触媒の種類によって異なるが、本発明では、その種類に関係なく、その対となる金属イオン濃度を制御することで、熱分解が起こりにくい範囲を見出した。そのフェノール化合物中の金属イオン濃度の範囲は、0.1〜10mg/kgであり、0.1〜7mg/kgがより好ましく、0.1〜5mg/kgがさらに好ましく、0.1〜3mg/kgが特に好ましい。この金属イオン濃度は、フェノール化合物合成時に使用される酸触媒の残存量の指標であり酸触媒の種類には関係なく、金属イオンは少ないほど残存する酸触媒量が少なくなる。しかしながら、金属イオン濃度を強制的に減らすには、水洗等の工程が必要になるので、工程の煩雑さや収率低下が懸念され実製造上好ましくない。ほとんどの場合、原料のフェノール、アルデヒド、またはケトン中の金属イオンの総量がそのままフェノール化合物中に残存するため、原料中の金属イオン量の制御が現実的であり、使用する原料の総金属イオン濃度を0.1〜10mg/kgの範囲に調整することが好ましい。 When the metal ion concentration in the phenol compound is in the range of 0.1 to 10 mg / kg, stability against heat is particularly improved, and thermal decomposition hardly occurs. Thermal decomposition is greatly affected by the amount of residual acid catalyst, and if the residual amount is large, thermal decomposition tends to occur. In addition, the amount by which thermal decomposition is likely to occur varies depending on the type of acid catalyst, but in the present invention, regardless of the type, by controlling the concentration of the metal ion that forms the pair, a range in which thermal decomposition does not easily occur was found. . The range of the metal ion concentration in the phenol compound is 0.1 to 10 mg / kg, preferably 0.1 to 7 mg / kg, more preferably 0.1 to 5 mg / kg, and 0.1 to 3 mg / kg. kg is particularly preferred. This metal ion concentration is an index of the remaining amount of the acid catalyst used in synthesizing the phenol compound. Regardless of the type of the acid catalyst, the smaller the metal ion, the smaller the remaining amount of the acid catalyst. However, in order to forcibly reduce the metal ion concentration, a step such as washing with water is required. In most cases, the total amount of metal ions in the raw material phenol, aldehyde, or ketone remains in the phenol compound as it is, so it is realistic to control the amount of metal ions in the raw material, and the total metal ion concentration of the raw material used Is preferably adjusted to the range of 0.1 to 10 mg / kg.
なお、金属イオン濃度は蛍光X線法で求めるが、ほとんどの金属イオンが検出以下なので、リチウムイオン、ナトリウムイオン、カリウムイオン、マグネシウムイオン、およびカルシウムイオンの各濃度の総合計としてもよい。その場合、簡便的にイオンクロマトグラフィーによる定量法を用いてもよい。 Although the metal ion concentration is determined by the fluorescent X-ray method, since most of the metal ions are not detected, a total sum of the concentrations of lithium ion, sodium ion, potassium ion, magnesium ion, and calcium ion may be used. In that case, a simple quantitative method by ion chromatography may be used.
フェノール化合物中の溶存酸素濃度が、0.01〜1.0mg/Lの範囲であれば、熱に対する安定性が向上し、熱分解が起こりにくくなり、また、酸素に対する安定性が向上し、長期間の保管でも着色しなくなる。溶存酸素は熱分解の起因となりやすく、多いほど熱分解が促進される。さらに、溶存酸素は、フェノール化合物の着色要因に大きくかかわり、着色は酸化によるものと考えられている。そのため、従来は酸化防止剤を添加して酸化を抑制していたが、本発明では、フェノール化合物中の溶存酸素の範囲を制御することで酸化自体が起こりづらく、着色しづらいことを見出した。そのフェノール化合物中の溶存酸素濃度の範囲は、0.01〜1.0mg/Lであり、0.01〜0.7mg/Lが好ましく、0.01〜0.5mg/Lがより好ましく、0.01〜0.3mg/Lがさらに好ましい。この溶存酸素濃度は長期保管時の着色度合の目安となる。0.01〜1.0mg/Lの範囲であれば、60℃の保管でも、60日間は着色はほとんど認められないが、溶存酸素が多くなると、それに従い、着色が始まる期間が短くなる。この溶存酸素はフェノール化合物の製品化前に、酸素以外の気体、具体的には、水蒸気(水)、二酸化炭素、ヘリウム、窒素等の気体で置換すればよく、コストや入手の容易さから置換する気体は窒素が好ましい。溶存酸素を減らす目的では、水蒸気でも問題ないが、その手法で得られたフェノール化合物は、水分量を嫌がる用途では使用できない。また、フェノール化合物を溶融液状化させ減圧による脱気も考えられるが、気体置換の手法よりは効率が悪い。いずれの手法を使用しても良いが、フェノール化合物中の溶存酸素濃度を、0.01〜1.0mg/Lにすることが重要である。 When the concentration of dissolved oxygen in the phenol compound is in the range of 0.01 to 1.0 mg / L, stability against heat is improved, thermal decomposition is unlikely to occur, and stability against oxygen is improved. No coloration even after storage for a period. Dissolved oxygen tends to cause thermal decomposition, and the more it is, the more the thermal decomposition is promoted. Further, the dissolved oxygen greatly affects the coloring factor of the phenol compound, and the coloring is considered to be due to oxidation. Therefore, conventionally, oxidation was suppressed by adding an antioxidant, but in the present invention, it was found that by controlling the range of dissolved oxygen in the phenol compound, the oxidation itself hardly occurred and coloring was difficult. The range of the concentration of dissolved oxygen in the phenol compound is 0.01 to 1.0 mg / L, preferably 0.01 to 0.7 mg / L, more preferably 0.01 to 0.5 mg / L, and 0.01 to 0.3 mg / L is more preferred. This dissolved oxygen concentration is a measure of the degree of coloring during long-term storage. In the range of 0.01 to 1.0 mg / L, even if stored at 60 ° C., coloring is hardly recognized for 60 days. However, as the amount of dissolved oxygen increases, the period during which coloring starts is shortened accordingly. This dissolved oxygen may be replaced by a gas other than oxygen, specifically, a gas such as water vapor (water), carbon dioxide, helium, nitrogen, etc. before commercialization of the phenol compound. The gas used is preferably nitrogen. For the purpose of reducing dissolved oxygen, there is no problem with water vapor, but the phenolic compound obtained by that method cannot be used in applications where the amount of water is not desired. It is also conceivable that the phenol compound is melted and liquefied and deaerated by decompression, but the efficiency is lower than the gas replacement method. Either method may be used, but it is important that the concentration of dissolved oxygen in the phenol compound be 0.01 to 1.0 mg / L.
なお、フェノール化合物中の溶存酸素濃度は、以下の測定方法によって求める。
フェノール化合物70質量部を精秤し、密閉できる容器に投入する。あらかじめ精秤しておいたN,N−ジメチルホルムアミド30質量部を、空気を巻き込まないように静かに同じ容器に添加する。その際、同容器の空隙率が5容量%以下になるようにする。同容器を密閉した後、振盪機で完全に溶解する。完全に溶解した不揮発分70質量%のフェノール化合物のN,N−ジメチルホルムアミド溶液を25℃にて溶存酸素計を用いて溶存酸素を測定する。それとは別に、使用したN,N−ジメチルホルムアミドも同じ溶存酸素計で溶存酸素を測定する。なお、N,N−ジメチルホルムアミドは予め窒素バブリングを10分以上行い溶存酸素を減らしたものを使用する。フェノール化合物中の溶存酸素濃度は次式によって計算する。
In addition, the dissolved oxygen concentration in the phenol compound is determined by the following measuring method.
70 parts by mass of the phenol compound are precisely weighed and put into a sealable container. 30 parts by mass of N, N-dimethylformamide, which has been precisely weighed in advance, are gently added to the same container so as not to entrap air. At this time, the porosity of the container is set to 5% by volume or less. After sealing the container, dissolve completely with a shaker. Dissolved oxygen is measured using a dissolved oxygen meter at 25 ° C. of a completely dissolved N, N-dimethylformamide solution of a phenol compound having a nonvolatile content of 70% by mass. Separately, the dissolved oxygen of the used N, N-dimethylformamide is measured by the same dissolved oxygen meter. As N, N-dimethylformamide, nitrogen bubbling is performed for 10 minutes or more to reduce dissolved oxygen. The dissolved oxygen concentration in the phenol compound is calculated by the following equation.
DO :フェノール化合物中の溶存酸素濃度(mg/L)
DO1:フェノール化合物のN,N−ジメチルホルムアミド溶液の溶存酸素濃度(mg/L)
DO0:N,N−ジメチルホルムアミドの溶存酸素濃度(mg/L)
w :フェノール化合物の質量部(kg)
w0:N,N−ジメチルホルムアミドの質量部(kg)
ρ :フェノール化合物の密度(kg/L)
ρ0:N,N−ジメチルホルムアミドの密度、0.944(kg/L)
DO: concentration of dissolved oxygen in phenolic compound (mg / L)
DO 1 : dissolved oxygen concentration (mg / L) of N, N-dimethylformamide solution of phenol compound
DO 0 : dissolved oxygen concentration of N, N-dimethylformamide (mg / L)
w: parts by mass of phenol compound (kg)
w 0 : parts by mass of N, N-dimethylformamide (kg)
ρ: density of phenol compound (kg / L)
ρ 0 : density of N, N-dimethylformamide, 0.944 (kg / L)
本発明は、安定性の悪いビスフェノールFやフェノールノボラック樹脂に有効であり、ビスフェノールFを蒸留して高純度ビスフェノールFを得る製法や、ビスフェノールFとフェノールノボラック樹脂を併産する製法に特に有効である。ビスフェノールFを蒸留して高純度ビスフェノールFを得る製法では、使用するビスフェノールFが本発明のフェノール化合物であれば、着色も分解も起こらずに高純度ビスフェノールFが得られる。また、ビスフェノールFとフェノールノボラック樹脂を併産する製法では、蒸留工程、即ちビスフェノールFとフェノールノボラック樹脂を分離する工程に、本発明のフェノール化合物を供給すれば着色も分解も起こらずにビスフェノールFとフェノールノボラック樹脂が得られる。 INDUSTRIAL APPLICABILITY The present invention is effective for bisphenol F or phenol novolak resin having poor stability, and is particularly effective for a method for distilling bisphenol F to obtain high-purity bisphenol F or a method for simultaneously producing bisphenol F and phenol novolak resin. . In the production method of obtaining high-purity bisphenol F by distilling bisphenol F, if bisphenol F used is the phenol compound of the present invention, high-purity bisphenol F can be obtained without coloring or decomposition. In addition, in the production method in which bisphenol F and phenol novolak resin are co-produced, if the phenol compound of the present invention is supplied to the distillation step, ie, the step of separating bisphenol F and phenol novolak resin, bisphenol F and bisphenol F can be produced without coloring or decomposition. A phenol novolak resin is obtained.
以下、本発明を実施例に基づいて具体的に説明するが本発明はこれに限定されるものではない。実施例において、特に断りがない限り「部」は質量部を表し、「%」は質量%を表す。なお、実施例及び比較例における各種特性値の測定は、下記(1)〜(3)の方法により実施した。 Hereinafter, the present invention will be specifically described based on examples, but the present invention is not limited thereto. In Examples, unless otherwise specified, "parts" represents parts by mass, and "%" represents% by mass. The measurement of various characteristic values in the examples and comparative examples was performed by the following methods (1) to (3).
(1)金属イオン濃度:遠沈管(フッ素樹脂製、蓋付き、50ml)に試料約1gを精秤採取した後、メチルイソブチルケトン(以下MIBKという)20mlを加えて完全に溶解した後、純水10mlを加えて蓋を閉めて、5分間以上激しく振って水層に金属イオンを抽出した後、遠心分離装置を使用して、MIBK層と水層に遠心分離し、分離した水層をイオンクロマトグラフィーによる定量法を用いて、リチウムイオン、ナトリウムイオン、カリウムイオン、マグネシウムイオン、およびカルシウムイオンの各濃度を求めた。各イオン濃度の合計をフェノール化合物中の金属イオン濃度に換算した。 (1) Metal ion concentration: After accurately weighing about 1 g of a sample in a centrifuge tube (made of fluororesin, with a lid, 50 ml), adding 20 ml of methyl isobutyl ketone (hereinafter referred to as MIBK) to completely dissolve, and then purifying with pure water. Add 10 ml, close the lid, shake vigorously for more than 5 minutes to extract metal ions into the aqueous layer, and then centrifuge using a centrifugal separator into the MIBK layer and the aqueous layer. The concentrations of lithium ion, sodium ion, potassium ion, magnesium ion, and calcium ion were determined using a quantitative method by chromatography. The total of each ion concentration was converted to the metal ion concentration in the phenol compound.
(2)溶存酸素濃度:上記の溶存酸素濃度の測定方法に従った。 (2) Dissolved oxygen concentration: In accordance with the above-described method for measuring the dissolved oxygen concentration.
(3)ガードナー色数:JIS K−0071−2に準拠して、フェノール化合物の溶融色を測定した。 (3) Gardner color number: The melt color of the phenol compound was measured according to JIS K-0071-2.
実施例1
撹拌機、温度調節装置、還流冷却器、全縮器、減圧装置等を備えた撹拌槽型反応機に、フェノール(金属イオン濃度3.0mg/kg)を1300部を加えて80℃まで昇温した後、3.9部のシュウ酸2水和物(金属イオン濃度1.1mg/kg)を添加し、10分間撹拌溶解した後、246部の37.5%ホルマリン(金属イオン濃度3.5mg/kg)を30分間かけて滴下した。その後、反応温度を92℃に維持して3時間反応を続けた。反応終了後、110℃まで温度を上げ、脱水を行った後、残存するフェノールを150℃、60mmHgの回収条件で約90%回収した後、5mmHgの回収条件で回収した後、さらに160℃、80mmHgの条件下で水10部を90分間かけて滴下して残存するフェノールを除去した後、溶融しているフェノールノボラック樹脂中に窒素ガスを60分間バブリングして、フェノールノボラック樹脂を得た。
Example 1
1300 parts of phenol (metal ion concentration: 3.0 mg / kg) was added to a stirred tank reactor equipped with a stirrer, a temperature control device, a reflux condenser, a full contractor, a decompression device, etc., and the temperature was raised to 80 ° C. After that, 3.9 parts of oxalic acid dihydrate (metal ion concentration: 1.1 mg / kg) was added and dissolved by stirring for 10 minutes, and then 246 parts of 37.5% formalin (metal ion concentration: 3.5 mg / kg) / Kg) was added dropwise over 30 minutes. Thereafter, the reaction was continued for 3 hours while maintaining the reaction temperature at 92 ° C. After the completion of the reaction, the temperature was raised to 110 ° C., dehydration was performed, and about 90% of the remaining phenol was recovered under the conditions of 150 ° C. and 60 mmHg, then recovered under the conditions of 5 mmHg, and then further recovered at 160 ° C. and 80 mmHg. Then, 10 parts of water was added dropwise over 90 minutes to remove residual phenol, and nitrogen gas was bubbled through the molten phenol novolak resin for 60 minutes to obtain a phenol novolak resin.
実施例2
実施例1で得られたフェノールノボラック樹脂を、ロータ回転数を250rpmとし、真空度が3〜5mmHgで運転される遠心薄膜蒸発器に21kg/hrで連続的に1時間供給し、蒸発成分および缶出成分を連続的に抜き出し、それぞれ、ビスフェノールFおよびフェノールノボラック樹脂を得た。遠心薄膜蒸発器はジャケット付で、加熱伝面が0.21m2でジャケットには260℃の熱媒を流した。また、遠心薄膜蒸発器は外部コンデンサーを有し、冷却伝面が1.3m2で120℃の加温水を流し、蒸発成分の全量を凝縮させて抜出した。
Example 2
The phenol novolak resin obtained in Example 1 was continuously supplied at 21 kg / hr for 1 hour to a centrifugal thin-film evaporator operated at a rotor rotation speed of 250 rpm and a degree of vacuum of 3 to 5 mmHg. The discharged components were continuously extracted to obtain bisphenol F and phenol novolak resin, respectively. The centrifugal thin-film evaporator was equipped with a jacket, the heat transfer surface was 0.21 m 2 , and a heating medium at 260 ° C. was passed through the jacket. The centrifugal thin-film evaporator had an external condenser, a cooling transfer surface was 1.3 m 2 , and heated water at 120 ° C. was flowed to condense and extract all the evaporated components.
実施例3
撹拌機、温度調節装置、還流冷却器、全縮器、減圧装置等を備えた撹拌槽型反応機に、フェノール(金属イオン濃度4.0mg/kg)を1300部を加えて80℃まで昇温した後、3.9部のパラトルエンスルホン酸(金属イオン濃度0.8mg/kg)を10質量%の水溶液として添加し、10分間撹拌溶解した後、246部の37.5%ホルマリン(金属イオン濃度4.5mg/kg)を30分間かけて滴下した。その後、反応温度を92℃に維持して3時間反応を続けた。反応終了後、48%の水酸化ナトリウム水溶液で中和後、水洗を1回行い、110℃まで温度を上げ、脱水を行った後、残存するフェノールを150℃、60mmHgの回収条件で約90%回収した後、5mmHgの回収条件で回収した後、さらに160℃、80mmHgの条件下で水10部を90分間かけて滴下して残存するフェノールを除去した後、溶融しているフェノールノボラック樹脂中に窒素ガスを40分間バブリングして、フェノールノボラック樹脂を得た。
Example 3
1300 parts of phenol (metal ion concentration: 4.0 mg / kg) was added to a stirred tank reactor equipped with a stirrer, a temperature control device, a reflux condenser, a full contractor, a decompression device, etc., and the temperature was raised to 80 ° C. After that, 3.9 parts of paratoluenesulfonic acid (metal ion concentration: 0.8 mg / kg) was added as a 10% by mass aqueous solution, and the mixture was stirred and dissolved for 10 minutes, and then 246 parts of 37.5% formalin (metal ion) was added. (A concentration of 4.5 mg / kg) was added dropwise over 30 minutes. Thereafter, the reaction was continued for 3 hours while maintaining the reaction temperature at 92 ° C. After completion of the reaction, the reaction mixture was neutralized with a 48% aqueous sodium hydroxide solution, washed once with water, heated to 110 ° C., dehydrated, and the remaining phenol was recovered at 150 ° C. under a recovery condition of 60 mmHg at about 90%. After collection, the mixture was collected under the collection conditions of 5 mmHg, and then 10 parts of water was added dropwise over 90 minutes at 160 ° C. and 80 mmHg to remove the remaining phenol. Nitrogen gas was bubbled for 40 minutes to obtain a phenol novolak resin.
実施例4
撹拌機、温度調節装置、還流冷却器、全縮器、減圧装置等を備えた撹拌槽型反応機に、フェノール(金属イオン濃度6.0mg/kg)を1500部を加えて80℃まで昇温した後、65部のシュウ酸2水和物(金属イオン濃度1.1mg/kg)を10質量%の水溶液として添加し、10分間撹拌溶解した後、246部の37.5%ホルマリン(金属イオン濃度4.5mg/kg)を30分間かけて滴下した。その後、反応温度を92℃に維持して3時間反応を続けた。反応終了後、110℃まで温度を上げ、脱水を行った後、残存するフェノールを150℃、60mmHgの回収条件で約90%回収した後、5mmHgの回収条件で回収した後、さらに160℃、80mmHgの条件下で水10部を90分間かけて滴下して残存するフェノールを除去した後、溶融しているビスフェノールFに窒素ガスを20分間バブリングして、ビスフェノールFを得た。
Example 4
1500 parts of phenol (metal ion concentration: 6.0 mg / kg) was added to a stirred tank reactor equipped with a stirrer, a temperature controller, a reflux condenser, a full contractor, a decompressor, etc., and the temperature was raised to 80 ° C. After that, 65 parts of oxalic acid dihydrate (metal ion concentration: 1.1 mg / kg) was added as a 10% by mass aqueous solution, and the mixture was stirred and dissolved for 10 minutes, and then 246 parts of 37.5% formalin (metal ion) was added. (A concentration of 4.5 mg / kg) was added dropwise over 30 minutes. Thereafter, the reaction was continued for 3 hours while maintaining the reaction temperature at 92 ° C. After the completion of the reaction, the temperature was raised to 110 ° C., dehydration was performed, and about 90% of the remaining phenol was recovered under the conditions of 150 ° C. and 60 mmHg, then recovered under the conditions of 5 mmHg, and then further recovered at 160 ° C. and 80 mmHg. Then, 10 parts of water was added dropwise over 90 minutes to remove residual phenol, and then nitrogen gas was bubbled through the melted bisphenol F for 20 minutes to obtain bisphenol F.
比較例1
溶融しているフェノールノボラック樹脂中に窒素ガスによるバブリングを全く行わなかったこと以外は、実施例1と全く同様の操作でフェノールノボラック樹脂を得た。
Comparative Example 1
A phenol novolak resin was obtained in exactly the same manner as in Example 1, except that no bubbling with nitrogen gas was performed in the molten phenol novolak resin.
比較例2
比較例1で得られたフェノールノボラック樹脂を使用した以外は、実施例2と全く同様の操作でビスフェノールFとフェノールノボラック樹脂を得た。
Comparative Example 2
Bisphenol F and a phenol novolak resin were obtained in exactly the same manner as in Example 2, except that the phenol novolak resin obtained in Comparative Example 1 was used.
比較例3
使用した原料をフェノール(金属イオン濃度11mg/kg含有)、シュウ酸2水和物(金属イオン濃度1.1mg/kg含有)、37.5%ホルマリン(金属イオン濃度13mg/kg含有)とした以外は、実施例1と全く同様の操作でフェノールノボラック樹脂を得た。
Comparative Example 3
Raw materials used were phenol (containing 11 mg / kg of metal ion), oxalic acid dihydrate (containing 1.1 mg / kg of metal ion), and 37.5% formalin (containing 13 mg / kg of metal ion) A phenol novolak resin was obtained in exactly the same manner as in Example 1.
比較例4
使用した原料をフェノール(金属イオン濃度11mg/kg含有)、シュウ酸2水和物(金属イオン濃度1.1mg/kg含有)、37.5%ホルマリン(金属イオン濃度13mg/kg含有)とし、かつ、溶融しているビスフェノールFに窒素ガスによるバブリングを全く行わなかったこと以外は、実施例4と全く同様の操作でビスフェノールFを得た。
Comparative Example 4
The raw materials used were phenol (containing 11 mg / kg of metal ion), oxalic acid dihydrate (containing 1.1 mg / kg of metal ion), 37.5% formalin (containing 13 mg / kg of metal ion), and Bisphenol F was obtained in exactly the same manner as in Example 4, except that no bubbling with nitrogen gas was performed on the molten bisphenol F.
実施例1〜4、及び比較例1〜4で得られたフェノール化合物の金属イオン濃度、溶存酸素濃度、ガードナー色数を表1に示す。なお、表中のPNはフェノールノボラック樹脂を、BPFはビスフェノールFをそれぞれ示す。 Table 1 shows the metal ion concentration, dissolved oxygen concentration, and Gardner color number of the phenol compounds obtained in Examples 1 to 4 and Comparative Examples 1 to 4. In the table, PN indicates phenol novolak resin, and BPF indicates bisphenol F.
実施例5〜8、比較例5〜8
実施例1、実施例3、比較例1、および比較例3のフェノールノボラック樹脂と実施例2、実施例4、比較例2、および比較例4で得られたビスフェノールFを、それぞれ密閉できる容器に入れ、60℃の恒温に管理されている恒温装置に保管して、着色度合いを確認した。その結果を表2に示した。なお、表中のPNはフェノールノボラック樹脂を、BPFはビスフェノールFをそれぞれ示す。
Examples 5 to 8, Comparative Examples 5 to 8
The phenol novolak resin of Example 1, Example 3, Comparative Example 1, and Comparative Example 3 and the bisphenol F obtained in Example 2, Example 4, Comparative Example 2, and Comparative Example 4 were respectively sealed in containers that can be sealed. It was stored in a thermostat controlled at a constant temperature of 60 ° C., and the degree of coloring was confirmed. The results are shown in Table 2. In the table, PN indicates phenol novolak resin, and BPF indicates bisphenol F.
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| CN201510194032.4A CN105037101B (en) | 2014-04-25 | 2015-04-22 | The good phenolic compounds of stability and its manufacturing method |
| TW104113176A TWI537243B (en) | 2014-04-25 | 2015-04-24 | A phenolic compound having good stability against heat and / or oxygen, and a method for producing the same |
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| CN110312698A (en) * | 2017-01-23 | 2019-10-08 | 鲁汶天主教大学 | Between producing high-purity, bis- (4- alkylphenol) derivatives of m- coupling and application thereof |
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| JPS55151526A (en) | 1979-05-15 | 1980-11-26 | Gen Electric | Bisphenol stabilization |
| JPS5669190A (en) * | 1979-11-13 | 1981-06-10 | Mitsui Toatsu Chem Inc | Developing sheet for pressure-sensitive copying paper |
| JPS6053516A (en) * | 1983-09-05 | 1985-03-27 | Sumitomo Bakelite Co Ltd | High-purity phenolic resin and its preparation |
| JPS60262815A (en) * | 1984-06-11 | 1985-12-26 | Sumitomo Deyurezu Kk | Production of novolak resin |
| JPH0667998B2 (en) * | 1986-02-21 | 1994-08-31 | 東洋インキ製造株式会社 | Method for producing phenol resin |
| US4894486A (en) * | 1988-12-22 | 1990-01-16 | The Dow Chemical Company | Stabilizer for bisphenols and process of using same |
| US5091591A (en) * | 1990-11-13 | 1992-02-25 | General Electric Company | Process and composition |
| JP3008374B2 (en) | 1991-03-15 | 2000-02-14 | 本州化学工業株式会社 | Method for preventing coloration of dihydroxydiphenylmethane |
| JP3190388B2 (en) * | 1991-10-25 | 2001-07-23 | 千代田化工建設株式会社 | Method for producing high-grade bisphenol A |
| CN1024542C (en) * | 1992-01-22 | 1994-05-18 | 沈阳化工综合利用研究所 | Method for preparing polycarbonate-grade bisphenol A |
| JPH06128183A (en) * | 1992-02-27 | 1994-05-10 | Mitsui Toatsu Chem Inc | Method for co-producing bisphenol F and novolac type phenol resin |
| JP3181110B2 (en) * | 1992-04-20 | 2001-07-03 | 新日鐵化学株式会社 | Method for producing bisphenol A with excellent thermal stability |
| JP2863386B2 (en) * | 1992-04-20 | 1999-03-03 | 新日鐵化学株式会社 | Method for producing bisphenol A with excellent thermal stability |
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| US5414149A (en) * | 1994-03-02 | 1995-05-09 | General Electric Company | Color stable bisphenols |
| DE4413396A1 (en) * | 1994-04-18 | 1995-10-19 | Bayer Ag | Process for the preparation of ultra-pure bisphenol-A and its use |
| WO1998027462A1 (en) * | 1996-12-18 | 1998-06-25 | Clariant International Ltd. | Photoresist composition containing a polymeric additive |
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| JP2001253924A (en) * | 2000-03-13 | 2001-09-18 | Sumitomo Durez Co Ltd | Phenolic resin composition |
| JP4293360B2 (en) * | 2004-03-18 | 2009-07-08 | エア・ウォーター株式会社 | Method and apparatus for removing foreign matter from thermosetting resin |
| KR101215553B1 (en) | 2009-12-16 | 2012-12-26 | 보그워너베루시스템즈코리아 주식회사 | Actuator |
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