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JP6640764B2 - Transfer arm, substrate transfer device and substrate processing device - Google Patents
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JP6640764B2 - Transfer arm, substrate transfer device and substrate processing device - Google Patents

Transfer arm, substrate transfer device and substrate processing device Download PDF

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JP6640764B2
JP6640764B2 JP2017015391A JP2017015391A JP6640764B2 JP 6640764 B2 JP6640764 B2 JP 6640764B2 JP 2017015391 A JP2017015391 A JP 2017015391A JP 2017015391 A JP2017015391 A JP 2017015391A JP 6640764 B2 JP6640764 B2 JP 6640764B2
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main body
metal plate
transfer arm
connecting portion
substrate
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JP2018125374A (en
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吉田 政生
政生 吉田
田中 拓也
拓也 田中
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Kyocera Corp
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Description

本開示は、搬送アーム、基板搬送装置および基板処理装置に関する。   The present disclosure relates to a transfer arm, a substrate transfer device, and a substrate processing device.

半導体ウェハ(以下、半導体ウェハをウェハという。)の処理装置では、特許文献1に示すように多数のウェハが載置されたカセットと処理装置に装着されたウェハの支持部材との間で各ウェハを搬送する搬送アームが取り付けられた搬送装置が用いられており、搬送アームとして、耐熱性が高いセラミックスが用いられている。   In a processing apparatus for a semiconductor wafer (hereinafter, a semiconductor wafer is referred to as a wafer), as shown in Patent Document 1, each wafer is placed between a cassette on which a large number of wafers are mounted and a supporting member of the wafer mounted on the processing apparatus. A transfer device provided with a transfer arm for transferring a sheet is used, and ceramic having high heat resistance is used as the transfer arm.

特開2011―211063号公報JP 2011-211063 A

このような搬送装置においては、搬送効率を上げるため、搬送アームを高速で動かすことが求められている。搬送アームは、カセットなどに接触することがないようにその動きをプログラムされている。しかしながら、誤動作による他部材との接触や、高速で動いている最中にカセットなどに接触して、搬送アームに大きな力が加わることがある。このような場合に、搬送アームが搬送装置に固定されている部分に力が集中し、セラミックス製の搬送アームが破損することがあった。それ故、今般の搬送アームには、搬送装置に固定されている部分に力が集中したとしても破損しにくいものとしなければならないという課題があった。   In such a transfer device, it is required to move the transfer arm at high speed in order to increase transfer efficiency. The movement of the transfer arm is programmed so as not to contact the cassette or the like. However, a large force may be applied to the transfer arm by contact with another member due to malfunction or contact with a cassette or the like while moving at high speed. In such a case, the force is concentrated on a portion where the transfer arm is fixed to the transfer device, and the transfer arm made of ceramic may be damaged. For this reason, there has been a problem in the transfer arm of the related art that it is difficult to break even if a force is concentrated on a portion fixed to the transfer device.

本開示は、上記課題に鑑みて案出されたものであり、破損しにくい搬送アーム、この搬送アームを備えた基板搬送装置、この基板搬送装置を備えた基板処理装置を提供することを目的とするものである。   The present disclosure has been devised in view of the above problems, and has as its object to provide a transfer arm that is not easily damaged, a substrate transfer device including the transfer arm, and a substrate processing apparatus including the substrate transfer device. Is what you do.

本開示の搬送アームは、セラミックスからなる板状の本体を有する、基板搬送装置に連結される搬送アームであって、本体は、搬送物に対向する第1面と、該第1面の反対に位置する第2面とを備える。本体は、連結部と、前記搬送物に対向する部分にあたる載置部と、連結部および載置部のそれぞれに繋がっているとともに、連結部および載置部の間に位置する中間部とを有する。そして、第1面および第2面の少なくとも一方において、連結部から中間部にわたる位置に金属板を備える。また、前記載置部における前記第1面の上に、前記搬送物を支持する支持部材を備え、前記金属板が、前記連結部から前記中間部に続いて前記載置部における前記支持部材の近くにまで位置している。 A transfer arm according to the present disclosure is a transfer arm having a plate-shaped main body made of ceramics and connected to a substrate transfer device, wherein the main body has a first surface facing a conveyed object and a first surface opposite to the first surface. And a second surface located thereon. The main body has a connecting portion, a mounting portion corresponding to a portion facing the article, and an intermediate portion connected to each of the connecting portion and the mounting portion and located between the connecting portion and the mounting portion. . Then, a metal plate is provided at a position extending from the connecting portion to the intermediate portion on at least one of the first surface and the second surface. In addition, a support member for supporting the conveyed object is provided on the first surface of the mounting portion, wherein the metal plate is formed of the supporting member of the mounting portion following the intermediate portion from the connecting portion. It is position to close.

本開示の基板搬送装置は、前述の搬送アームを備える。また、本開示の基板処理装置は、前述の基板搬送装置を備える。   A substrate transfer device according to the present disclosure includes the above-described transfer arm. Further, a substrate processing apparatus according to the present disclosure includes the above-described substrate transfer device.

本開示の搬送アームは、搬送装置に固定されている部分に力が集中したとしても破損しにくい。   The transfer arm according to the present disclosure is less likely to be damaged even when force is concentrated on a portion fixed to the transfer device.

本開示の基板搬送装置および基板処理装置は、搬送アームが破損しにくいため、長期間にわたって使用することができる。   The substrate transfer device and the substrate processing apparatus according to the present disclosure can be used for a long period of time because the transfer arm is not easily damaged.

本開示の搬送アームの一例を示す、(a)は搬送アームの第1面の平面図であり、(b)は搬送アームの第2面の平面図であり、(c)は(a)におけるA−A’線での断面図であり、(d)は(c)におけるB−B’線での断面図である。(A) is a plan view of a first surface of the transfer arm, (b) is a plan view of a second surface of the transfer arm, and (c) is an example of the transfer arm of the present disclosure. It is sectional drawing in the AA 'line, and (d) is sectional drawing in the BB' line in (c). 本開示の搬送アームの他の例を示す、(a)は搬送アームの第1面の平面図であり、(b)は搬送アームの第2面の平面図であり、(c)は(a)におけるC−C’線での断面図である。(A) is a plan view of a first surface of the transfer arm, (b) is a plan view of a second surface of the transfer arm, and (c) is (a) illustrating another example of the transfer arm of the present disclosure. FIG. 7 is a sectional view taken along line CC ′ in FIG. 本開示の搬送アームの他の例を示す、(a)は搬送アームの第1面の平面図であり、(b)は(a)におけるD−D’線での断面図である。(A) is a plan view of a first surface of the transfer arm, and (b) is a cross-sectional view taken along line D-D 'in (a), illustrating another example of the transfer arm of the present disclosure. 本開示の搬送アームの他の例を示す、(a)は搬送アームの第1面の平面図であり、(b)は搬送アームの第2面の平面図であり、(c)は(a)におけるE−E‘線での断面図である。(A) is a plan view of a first surface of the transfer arm, (b) is a plan view of a second surface of the transfer arm, and (c) is (a) illustrating another example of the transfer arm of the present disclosure. () Is a sectional view taken along line EE ′. 本開示の基板処理装置の一例を示す上面図である。1 is a top view illustrating an example of a substrate processing apparatus according to the present disclosure. (a)は支持部材となる成形体、(b)、(c)は本体の一部となる成形体の平面図である。(A) is a plan view of a molded body that becomes a support member, and (b) and (c) are plan views of a molded body that becomes a part of a main body. (a)は、図6に示した各成形体の積層状態を示す断面図であり、(b)は積層後の積層体を示す断面図であり、(c)は(b)の積層体に金属板を備える搬送アームの断面図である。FIG. 7A is a cross-sectional view illustrating a state of lamination of the respective molded bodies illustrated in FIG. 6, FIG. 7B is a cross-sectional view illustrating a laminated body after lamination, and FIG. It is sectional drawing of the transfer arm provided with a metal plate.

以下、図面を参照して、本発明の実施形態について詳細に説明する。ただし、本明細書の全図において、混同を生じない限り、同一部分には同一符号を付し、その説明を適時省略する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. However, in all the drawings of the present specification, the same parts are denoted by the same reference numerals and the description thereof will be appropriately omitted unless confusion occurs.

本実施形態の搬送アーム31は、図1に示すように、第1面1と、第1面1と反対の面に位置する第2面2を備える板状の本体3を有する。そして、本体3はセラミックスからなる。本体3は、基板搬送装置に連結される連結部7と、本体の第2端部9に位置し、搬送物11に対向する部分にあたる載置部13と、連結部7および載置部13のそれぞれに繋がっているとともに、連結部7および載置部13の間に位置する中間部15を有する。   As shown in FIG. 1, the transfer arm 31 of the present embodiment has a plate-shaped main body 3 having a first surface 1 and a second surface 2 located on a surface opposite to the first surface 1. The main body 3 is made of ceramics. The main body 3 includes a connecting portion 7 connected to the substrate transfer device, a mounting portion 13 located at the second end 9 of the main body and facing a portion to be transferred 11, and a connecting portion 7 and a mounting portion 13. It has an intermediate portion 15 that is connected to each other and is located between the connecting portion 7 and the placing portion 13.

言い換えれば、連結される基板搬送装置に近い方の端部を第1端部5、遠い方の端部を第2端部9としたとき、連結部7は第1端部5側に位置し、載置部13は第2端部9側に位置する。なお、第1面1とは、搬送物11に対向する面でもあるため、載置面ということもできる。また、連結部7とは、基板搬送装置の連結対象物と重なり合う部分であり、図1(a)においては、上記重なり合う部分に線を入れて、連結部7と中間部15の境界を示している。また、図2(a)、図3(a)、図4(a)においても、同様に連結部7と中間部15の境界を示している。   In other words, when the end closer to the substrate transfer device to be connected is the first end 5 and the end farther away is the second end 9, the connecting portion 7 is located on the first end 5 side. The mounting portion 13 is located on the second end portion 9 side. Note that the first surface 1 is also a surface facing the conveyed object 11, and thus can be referred to as a mounting surface. The connecting portion 7 is a portion that overlaps with the object to be connected of the substrate transfer device. In FIG. 1A, a line is drawn in the overlapping portion to indicate a boundary between the connecting portion 7 and the intermediate portion 15. I have. 2 (a), 3 (a) and 4 (a) also show the boundary between the connecting portion 7 and the intermediate portion 15.

そして、本実施形態の搬送アーム31は、第1面1および第2面2の少なくとも一方において、連結部7から中間部15にわたる位置に金属板29を備えている。図1においては、第2面2に金属板29を備えている例を示している。金属板29は、エポキシ系の接着剤を用いて本体3に接合されていてもよいし、本体3の連結部7と同様に、基板搬送装置に把持されるものであってもよい。   The transfer arm 31 of the present embodiment includes the metal plate 29 at a position extending from the connecting portion 7 to the intermediate portion 15 on at least one of the first surface 1 and the second surface 2. FIG. 1 shows an example in which a metal plate 29 is provided on the second surface 2. The metal plate 29 may be joined to the main body 3 using an epoxy-based adhesive, or may be gripped by the board transfer device, similarly to the connecting portion 7 of the main body 3.

本実施形態の搬送アーム31は、このような構成を満たしていることにより、本体3に大きな力が加わって、本体3の連結部7と中間部15の境界に応力が集中したとしても、脆性破壊しやすいセラミックスからなる本体3が脆性破壊しない金属板29の存在により破損しにくい。なお、連結部7から中間部15にわたる位置に存在する金属板29の幅(本体3の長手方向に直交する部分の長さ)は、連結部7および中間部15の幅が同じであるとき、連結部7および中間部15の幅に対する金属板29の幅との比が0.8以上であることが好ましい。   By satisfying such a configuration, the transfer arm 31 of the present embodiment is brittle even if a large force is applied to the main body 3 and stress concentrates on the boundary between the connecting portion 7 and the intermediate portion 15 of the main body 3. The main body 3 made of easily breakable ceramics is not easily broken due to the presence of the metal plate 29 that does not break brittlely. The width of the metal plate 29 (the length of the portion orthogonal to the longitudinal direction of the main body 3) existing at a position extending from the connecting portion 7 to the intermediate portion 15 is determined when the width of the connecting portion 7 and the width of the intermediate portion 15 are the same. The ratio of the width of the metal plate 29 to the width of the connecting portion 7 and the intermediate portion 15 is preferably 0.8 or more.

また、図2に示すように、金属板29が連結部7から中間部15に続いて載置部13にまで位置しているときには、本体3の連結部7と中間部15の境界のみならず、中間部15と載置部13との境界においても破損しにくくなる。   As shown in FIG. 2, when the metal plate 29 is located from the connecting portion 7 to the mounting portion 13 following the intermediate portion 15, not only the boundary between the connecting portion 7 of the main body 3 and the intermediate portion 15, but also Also, even at the boundary between the intermediate portion 15 and the mounting portion 13, it is hard to be damaged.

また、図3に示すように、載置部13における第1面1の上に、搬送物11を支持する支持部材19を備え、金属板29が中間部15に続いて載置部13における支持部材19の近くにまで位置していてもよい。このような構成であると、中間部15から載置部13にかけても破損しにくい搬送アーム31となる。なお、金属板29は、支持部材19に接していてもよいが、支持部材19と金属板29の間に1〜2mm程度の隙間を空けておくと、搬送アーム31を製造しやすくなる。なお、図3においては、支持部材19と金属板29の間の隙間は省略している。   As shown in FIG. 3, a support member 19 for supporting the transported object 11 is provided on the first surface 1 of the mounting portion 13, and the metal plate 29 is supported by the mounting portion 13 following the intermediate portion 15. It may be located near the member 19. With such a configuration, the transfer arm 31 is hardly damaged even from the intermediate portion 15 to the mounting portion 13. Note that the metal plate 29 may be in contact with the support member 19, but if a gap of about 1 to 2 mm is provided between the support member 19 and the metal plate 29, the transfer arm 31 can be easily manufactured. In FIG. 3, a gap between the support member 19 and the metal plate 29 is omitted.

また、図4に示すように、本体3の両面に金属板29を接合してもよい。このような構成であると、応力がかかる方向によらず、破損しにくくなる。図4の例では、第1面1に接合する金属板29の外部形状および厚みと第2面3に接合する金属板29の外部形状および厚みは、同じとなっているが、これらが異なっていてもよい。   Further, as shown in FIG. 4, metal plates 29 may be joined to both surfaces of the main body 3. With such a configuration, breakage becomes difficult regardless of the direction in which the stress is applied. In the example of FIG. 4, the external shape and thickness of the metal plate 29 joined to the first surface 1 and the external shape and thickness of the metal plate 29 joined to the second surface 3 are the same, but they are different. You may.

また、連結部7と中間部15との境界にあたる部分において、本体3の厚みを1.0mm以上、5.0mm以下とし、金属板29の厚みを50μm以上、0.5mm以下としてもよい。なお、金属板29を本体3の両面に接合したときの金属板29の厚みとは、それぞれの金属板29の厚みを意味する。   Further, in a portion corresponding to a boundary between the connecting portion 7 and the intermediate portion 15, the thickness of the main body 3 may be set to 1.0 mm or more and 5.0 mm or less, and the thickness of the metal plate 29 may be set to 50 μm or more and 0.5 mm or less. In addition, the thickness of the metal plate 29 when the metal plate 29 is joined to both surfaces of the main body 3 means the thickness of each metal plate 29.

このような関係を充足すると、金属板29の厚みは、金属板29による補強の効果を維持しつつ、金属板29の厚みは、本体3に対して薄いため、金属板29の質量が抑制され、搬送アーム31の質量を抑制できる。少ない質量増加でありながら、破損しにくい搬送アーム31とすることができる。   When such a relationship is satisfied, the thickness of the metal plate 29 is reduced with respect to the body 3 because the thickness of the metal plate 29 is small with respect to the main body 3 while the reinforcing effect of the metal plate 29 is maintained. In addition, the mass of the transfer arm 31 can be reduced. It is possible to provide the transfer arm 31 that is hardly damaged while having a small increase in mass.

また、図4に示すように連結部7と中間部13との境界を除く部分に凹部33を設けてもよい。このような構成とすると、応力が集中しにくい部分における金属板29の質量を凹部33の分、減らすことができ、搬送アーム31の質量を抑制することができる。なお、凹部33は金属板29を貫通する貫通孔であってもよい。   Further, as shown in FIG. 4, a concave portion 33 may be provided in a portion except for a boundary between the connecting portion 7 and the intermediate portion 13. With such a configuration, the mass of the metal plate 29 in a portion where stress is unlikely to concentrate can be reduced by the amount of the concave portion 33, and the mass of the transfer arm 31 can be suppressed. The recess 33 may be a through-hole penetrating the metal plate 29.

また、金属板29は、露出している面のうち最も大きな面29aが鏡面であってもよい。なお、最も大きいとは、面積が最も大きいということである。このような構成とすると、露出している面のうち最も大きな面29aから金属が脱粒しにくくなるとともに、付着する汚染物質が少なくなるため、振動、衝撃等を受けることによって、脱粒した金属や汚染物質が浮遊粒子となって内部空間を汚染するおそれが低減する。   The largest surface 29a of the exposed surfaces of the metal plate 29 may be a mirror surface. Note that the largest means that the area is the largest. With such a configuration, it is difficult for the metal to fall off from the largest surface 29a among the exposed surfaces, and the amount of contaminants adhered to the surface is reduced. The possibility that the substance becomes suspended particles and contaminates the internal space is reduced.

なお、鏡面とは、算術平均粗さRaが0.4μm以下の面をいう。算術平均粗さRaは、JIS B 0601:2013(ISO 4287−1997)に準拠して測定すればよい。触針式の表面粗さ計を用いて測定する場合であれば、測定長さを5mm、カットオフ値を0.8mmとし、触針先端半径が2μmの触針を当て、触針の走査速度を0.5mm/秒に設定すればよい。この測定で得られた5箇所の平均値を算術平均粗さRaとする。   The mirror surface refers to a surface having an arithmetic average roughness Ra of 0.4 μm or less. The arithmetic average roughness Ra may be measured in accordance with JIS B 0601: 2013 (ISO 4287-1997). When measuring using a stylus type surface roughness meter, a measuring length is 5 mm, a cutoff value is 0.8 mm, a stylus having a stylus tip radius of 2 μm is applied, and a scanning speed of the stylus is applied. May be set to 0.5 mm / sec. The average value of the five points obtained by this measurement is defined as arithmetic average roughness Ra.

また、金属板29は、本体3に対向していない面がポリイミド樹脂、ポリテトラフロロエチレン樹脂、ポリ三フッ化塩化エチレン樹脂、ポリビニリデンフルオライド樹脂またはポリベンゾイミダゾール樹脂(図示せず)によって被覆されていてもよい。ここで、本体3に対向していない面とは、図1〜4に示す面29aや、本体3に対向している面と本体
3に対向していない面とのそれぞれに繋がる側面の少なくともいずれかの面のことである。このような構成であると、搬送アーム31が振動、衝撃等を受けたとしても、上記樹脂によって被覆されている部分の金属板29からの脱粒は無いため、この脱粒による内部空間の汚染を抑制することができる。
The surface of the metal plate 29 not facing the main body 3 is covered with a polyimide resin, a polytetrafluoroethylene resin, a poly (chlorotrifluoroethylene) resin, a polyvinylidene fluoride resin, or a polybenzimidazole resin (not shown). It may be. Here, the surface not facing the main body 3 is at least one of the surface 29a shown in FIGS. 1 to 4 and a side surface connected to each of the surface facing the main body 3 and the surface not facing the main body 3. That aspect. With such a configuration, even if the transfer arm 31 is subjected to vibration, impact, or the like, since the portion covered with the resin does not fall off the metal plate 29, the contamination of the internal space due to the falling is suppressed. can do.

載置部13の形状は、搬送する基板11の大きさなどに応じて選択すればよい。図1〜4では、載置部13は第2端部9に向って二股に分岐しており、第2端部9の近傍および分岐部の3カ所に、搬送物9を吸着するための吸着孔17を有する支持部材19を備えている例を示している。なお、図1〜4では、第2端部9の近傍および分岐部の3カ所に、支持部材19を備える搬送アーム31を示したが、支持部材19は、これに限定されるものではない。   What is necessary is just to select the shape of the mounting part 13 according to the magnitude | size of the board | substrate 11 to convey. In FIGS. 1 to 4, the mounting portion 13 bifurcates toward the second end portion 9, and is provided at three locations near the second end portion 9 and at the branch portion for adsorbing the transported object 9. An example in which a support member 19 having a hole 17 is provided is shown. In addition, in FIGS. 1 to 4, the transfer arm 31 including the support member 19 is shown in three places near the second end 9 and at the branch portion, but the support member 19 is not limited to this.

また、図1〜4では、連結部7における第1面1に、吸引機構(図示しない)に接続する吸気孔21が開口し、この吸気孔21の周辺4カ所に、基板搬送装置のシャフト等に締結するためのボルト(図示しない)を挿通するための挿通孔23が開口している例を示している。   1 to 4, an intake hole 21 connected to a suction mechanism (not shown) is opened in the first surface 1 of the connecting portion 7, and a shaft or the like of the substrate transfer device is provided at four locations around the intake hole 21. An example is shown in which an insertion hole 23 for inserting a bolt (not shown) for fastening to an opening is opened.

また、搬送アーム31は、いずれも本体3の内部には吸着孔17と吸気孔21とを連通する吸引路25が内設されている。   In each of the transfer arms 31, a suction passage 25 that connects the suction hole 17 and the suction hole 21 is provided inside the main body 3.

これらの図1〜4に示す搬送アーム31を用いた搬送物の搬送は、この搬送アーム31に接続された吸引機構(図示せず)を作動させることによって、吸気口21と吸引路25とを介して3カ所の吸着孔17で吸引して、このときに発生する吸着力によって載置面1aに搬送物を吸着し、次工程に搬送するものである。   The transfer of the conveyed object using the transfer arm 31 shown in FIGS. 1 to 4 is performed by operating a suction mechanism (not shown) connected to the transfer arm 31 so that the suction port 21 and the suction path 25 are connected. The object is sucked by the suction holes 17 at three places, and the conveyed object is adsorbed on the mounting surface 1a by the attraction force generated at this time, and is conveyed to the next step.

ここで、本体3は、例えば、酸化アルミニウム、炭化珪素等を主成分とするセラミックスからなる。金属板29は、例えば、S15C、S45C、S50C、S60C等の炭素鋼またはSUS304、SUS316、SUS630等のステンレス鋼からなる。   Here, main body 3 is made of, for example, ceramics containing aluminum oxide, silicon carbide, or the like as a main component. The metal plate 29 is made of, for example, carbon steel such as S15C, S45C, S50C, and S60C or stainless steel such as SUS304, SUS316, and SUS630.

本実施形態における主成分とは、セラミックスを構成する成分100質量%のうち、60質量%以上を占める成分をいう。セラミックスを構成する各成分は、X線回折装置(XRD)を用いて同定した後、各成分の含有量は、蛍光X線分析装置(XRF)またはICP発光分光分析装置(ICP)を用いて、元素の含有量を求め、同定された成分の含有量に換算すればよい。   The main component in the present embodiment refers to a component occupying 60% by mass or more of 100% by mass of the component constituting the ceramic. After each component constituting the ceramics was identified using an X-ray diffractometer (XRD), the content of each component was determined using a fluorescent X-ray analyzer (XRF) or an ICP emission spectrometer (ICP). What is necessary is just to determine the content of the element and convert it to the content of the identified component.

図5は、本実施形態の搬送アーム31を用いた基板搬送装置39およびこの基板搬送装置39を用いた基板処理装置55の実施の形態の一例を示す上面図である。   FIG. 5 is a top view illustrating an example of an embodiment of the substrate transfer device 39 using the transfer arm 31 of the present embodiment and the substrate processing device 55 using the substrate transfer device 39.

基板処理装置35は、搬送室37のほぼ中央に基板搬送装置39を有する。また、基板処理装置35は、搬送室37の周囲にゲートバルブ41を介して複数の処理室43a〜43dおよび処理前後の基板11を収納する基板カセット45を備えた2個の基板カセット室47を有する。そして、基板処理装置35は、基板11を1枚ごとに連続的に処理するマルチチャンバ方式の基板処理装置35である。   The substrate processing device 35 has a substrate transfer device 39 substantially at the center of the transfer chamber 37. Further, the substrate processing apparatus 35 includes a plurality of processing chambers 43a to 43d around the transfer chamber 37 via a gate valve 41 and two substrate cassette chambers 47 each including a substrate cassette 45 for storing the substrates 11 before and after processing. Have. The substrate processing apparatus 35 is a multi-chamber type substrate processing apparatus 35 that continuously processes the substrates 11 one by one.

ここで、各処理室43a〜43dでは、例えば以下のような処理が行なわれる。処理室43aでは、基板11としてのシリコン単結晶基板に対して酸化処理が施され、その表面にシリコン酸化膜が形成される。あるいは、形成する薄膜の種類に応じて原料を気相状態で供給し、気相反応により薄膜が形成される。また、処理室43bでは、プラズマドライエッチング装置を用いて、基板11上に形成された酸化膜が除去される。また、処理室43cでは、エピタキシャル層を形成するためのエピタキシャル処理が行なわれる。また、処理室43dでは、例えば、アルミニウム、チタン、窒化チタン等からなる層がスパッタリング法により基板11上に形成される。   Here, in each of the processing chambers 43a to 43d, for example, the following processing is performed. In the processing chamber 43a, an oxidation treatment is performed on the silicon single crystal substrate as the substrate 11, and a silicon oxide film is formed on the surface thereof. Alternatively, raw materials are supplied in a gaseous state according to the type of a thin film to be formed, and the thin film is formed by a gas phase reaction. In the processing chamber 43b, the oxide film formed on the substrate 11 is removed using a plasma dry etching apparatus. Further, in the processing chamber 43c, an epitaxial process for forming an epitaxial layer is performed. In the processing chamber 43d, a layer made of, for example, aluminum, titanium, titanium nitride, or the like is formed on the substrate 11 by a sputtering method.

そして、基板搬送装置39は、軸方向に回転するシャフト51と、シャフト51に対して回転可能に取り付けられた第1のアーム52と、第1のアーム52の先端に同じく回転可能に取り付けられた第2のアーム53と、第2のアーム53の先端に回転可能に取り付けられた第3のアーム54と、第3のアーム54に、連結部が連結された搬送アーム31とを備えている。搬送アーム31には、連結部から中間部15にわたる位置に金属板29備えている。   The substrate transfer device 39 is rotatably attached to a shaft 51 that rotates in the axial direction, a first arm 52 that is rotatably attached to the shaft 51, and a tip of the first arm 52. A second arm 53, a third arm 54 rotatably attached to the tip of the second arm 53, and a transfer arm 31 having a connection portion connected to the third arm 54 are provided. The transfer arm 31 is provided with a metal plate 29 at a position extending from the connecting portion to the intermediate portion 15.

この基板搬送装置39は、処理室43および基板カセット室47のゲートバルブ41が開口した後、第2のアーム53を伸長させ、処理室43内に進入させるまたは基板カセット室47内の基板カセット45に収納された基板11の間隙に搬送アーム31を進入させて、その搬出および搬入を行なう。   After the gate valves 41 of the processing chamber 43 and the substrate cassette chamber 47 are opened, the substrate transfer device 39 extends the second arm 53 to enter the processing chamber 43 or the substrate cassette 45 in the substrate cassette chamber 47. The transport arm 31 is caused to enter the gap between the substrates 11 stored in the container, and is carried out and carried out.

そして、これらを備えた本実施形態の基板処理装置35を用いた基板11の処理は、まず処理前の基板11がカセット単位で基板カセット室47内に運び込まれる。   In the processing of the substrate 11 using the substrate processing apparatus 35 of the present embodiment provided with these, first, the substrate 11 before processing is carried into the substrate cassette chamber 47 in cassette units.

そして、基板カセット室47内で真空引きまたは不活性ガスとの置換が行なわれた後、搬送室37と基板カセット室47との間のゲートバルブ41が開き、基板搬送装置39によって基板カセット45に複数収納された基板11同士の間隙に搬送アーム31を進入させて基板11を1枚取り出し、搬送室37内に搬送する。   Then, after evacuation or replacement with an inert gas is performed in the substrate cassette chamber 47, the gate valve 41 between the transfer chamber 37 and the substrate cassette chamber 47 is opened, and the substrate transfer device 39 moves the substrate cassette 45 to the substrate cassette 45. The transfer arm 31 is advanced into the gap between the plurality of stored substrates 11, and one substrate 11 is taken out and transferred into the transfer chamber 37.

次に、所定の処理室43a〜43d内で真空引きまたは不活性ガスとの置換が行なわれた後、搬送室37と処理室43a〜43dとの間のゲートバルブ41が開き、基板11が各処理室43a〜43d内に搬入されて、成膜やエッチング等の処理が行なわれる。そして、最終的に処理が終わった基板11は、基板搬送装置39により搬送されて基板カセット室47内の基板カセット45に収納される。このようにして、基板11は外気に晒されることなく、所定の雰囲気中で一連の処理が行なわれる。   Next, after evacuation or replacement with an inert gas is performed in predetermined processing chambers 43a to 43d, the gate valve 41 between the transfer chamber 37 and the processing chambers 43a to 43d is opened, and the substrate 11 The wafer is carried into the processing chambers 43a to 43d, and processing such as film formation and etching is performed. The substrate 11 finally processed is transferred by the substrate transfer device 39 and stored in the substrate cassette 45 in the substrate cassette chamber 47. In this manner, a series of processing is performed in a predetermined atmosphere without exposing the substrate 11 to the outside air.

この本実施形態の基板搬送装置39に、本開示の搬送アーム31を用いることにより、本体3は破損しにくくなっているので、長期間の使用が可能となっており、搬送アーム31の破損による部品交換の手間が省け、効率の高い基板搬送装置39とすることができる。   By using the transfer arm 31 of the present disclosure in the substrate transfer device 39 of the present embodiment, the main body 3 is hardly damaged, so that it can be used for a long period of time. The trouble of replacing parts can be eliminated, and the board transfer device 39 with high efficiency can be obtained.

また、本実施形態の基板処理装置35においても、破損しにくい本開示の搬送アーム31を用いた、本実施形態の基板搬送装置39を設置していることにより、長期間の使用が可能となっており、効率の高い基板処理装置35となっている。   Also, in the substrate processing apparatus 35 of the present embodiment, the long-term use is possible by installing the substrate transfer apparatus 39 of the present embodiment using the transfer arm 31 of the present disclosure that is hard to be damaged. Thus, the substrate processing apparatus 35 has high efficiency.

次に、本実施形態の搬送アーム31を得るための製造方法について図6および図7を用いて説明する。   Next, a manufacturing method for obtaining the transfer arm 31 of the present embodiment will be described with reference to FIGS.

図6に、図1に示す搬送アーム31を構成する本体3となる成形体を示す。それぞれ、(a)は焼成後に支持部19となる成形体3a、(b)は焼成後に本体3の一部となる成形体3b、(c)は焼成後に本体3の一部となる成形体3cの平面図である。図7において(a)は、図6に示した各成形体の積層状態を示す断面図であり、(b)は積層後の積層体を示す断面図であり、(c)は(b)の積層体に金属板を備える搬送アームの断面図である。   FIG. 6 shows a molded body that becomes the main body 3 constituting the transfer arm 31 shown in FIG. (A) is a molded body 3a that becomes a support portion 19 after firing, (b) is a molded body 3b that becomes a part of the main body 3 after firing, and (c) is a molded body 3c that becomes a part of the main body 3 after firing. FIG. 7A is a cross-sectional view showing the state of lamination of the respective molded bodies shown in FIG. 6, FIG. 7B is a cross-sectional view showing the laminated body after lamination, and FIG. It is sectional drawing of the conveyance arm provided with a metal plate in a laminated body.

図6、7に示すように、本体3は、複数の部材に分けて成形した成形体を積層して焼成
することで得られるものである。
As shown in FIGS. 6 and 7, the main body 3 is obtained by laminating and firing a formed body divided into a plurality of members.

本実施形態の搬送アーム31の製造方法は、まず純度が99.9質量%以上で、平均粒径が0.5μm以上、1.0μm以下の酸化アルミニウムの粉末と、酸化カルシウム、酸化珪素および酸化マグネシウムの各粉末とを用意する。そして、酸化アルミニウムの含有量が99.5質量%以上であり、酸化カルシウム、酸化珪素および酸化マグネシウムの各粉末の合計100質量%のうち、酸化カルシウムおよび酸化珪素の含有量がそれぞれ20質量%以上37.5質量%以下であって残部が酸化マグネシウムとなるように秤量した混合粉末を水などの溶媒ともに回転ミルに投入して、純度が99.5質量%以上、99.99質量%以下の酸化アルミニウムからなるセラミックボールで混合を行なう。   The method for manufacturing the transfer arm 31 according to the present embodiment includes, first, a powder of aluminum oxide having a purity of 99.9% by mass or more and an average particle diameter of 0.5 μm or more and 1.0 μm or less; Prepare each powder of magnesium. The content of aluminum oxide is 99.5% by mass or more, and the content of calcium oxide and silicon oxide is 20% by mass or more, respectively, of the total 100% by mass of each powder of calcium oxide, silicon oxide, and magnesium oxide. A mixed powder weighed so as to be 37.5% by mass or less and the remainder being magnesium oxide was put into a rotary mill together with a solvent such as water, and the purity was 99.5% by mass or more and 99.99% by mass or less. Mixing is performed with ceramic balls made of aluminum oxide.

次に、ポリビニルアルコール、ポリエチレングリコールやアクリル樹脂などの成形用バインダを溶媒に添加した後、混合してスラリーを得る。ここで、成形用バインダの添加量は混合粉末100質量部に対して合計2質量部以上10質量部以下とする。成形用バインダの添加量が2質量部未満であれば、成形体に求められる強度や可とう性が得られず脆い成形体となる。また、成形用バインダの添加量が10質量部を超えると焼成で成形用バインダが焼失しにくくなり、クラックなどの不具合が発生するおそれが大きくなる。成形用バインダの添加量を混合粉末100質量部に対して合計2質量部以上10質量部下とすることにより、成形体に求められる強度や可とう性が得られ、クラックなどの不具合が発生しにくい成形体を得ることができる。   Next, a binder for molding such as polyvinyl alcohol, polyethylene glycol or acrylic resin is added to the solvent, and then mixed to obtain a slurry. Here, the addition amount of the molding binder is 2 to 10 parts by mass in total with respect to 100 parts by mass of the mixed powder. If the amount of the molding binder is less than 2 parts by mass, the molded article does not have the required strength and flexibility, resulting in a brittle molded article. On the other hand, when the addition amount of the molding binder exceeds 10 parts by mass, the molding binder is less likely to be burned off by firing, and the possibility of occurrence of defects such as cracks increases. By setting the addition amount of the molding binder to 2 parts by mass or more and 10 parts by mass or less with respect to 100 parts by mass of the mixed powder, the strength and flexibility required for the molded body can be obtained, and defects such as cracks are less likely to occur. A molded article can be obtained.

次に、混合粉末、成形用バインダ等を混合したスラリーをドクターブレード法で成形したシートを成形体の形状に打ち抜くか、または混合粉末、成形用バインダ等を混合したスラリーを噴霧乾燥した顆粒を用いてプレス成形する。さらに、必要に応じて切削加工を施して、図6に示すように、焼成後に円筒状の支持部19となる成形体3aと、焼成後に本体3の一部となる吸着孔17、吸気孔21、吸引路25となる溝および挿通孔23を有する板状の成形体3bと、焼成後に本体3の一部となる挿通孔23を有する板状の成型体3cとを得る。   Next, a sheet obtained by forming a mixed powder, a slurry obtained by mixing a forming binder and the like by a doctor blade method is punched into a shape of a formed body, or a mixed powder, a slurry obtained by mixing a slurry obtained by mixing a forming binder, and the like is used by granulation. Press molding. Further, if necessary, a cutting process is performed, and as shown in FIG. 6, a molded body 3a that becomes a cylindrical support portion 19 after firing, an adsorption hole 17 that becomes a part of the main body 3 after firing, and an intake hole 21 as shown in FIG. Then, a plate-shaped molded body 3b having a groove serving as the suction path 25 and the insertion hole 23 and a plate-shaped molded body 3c having the insertion hole 23 which becomes a part of the main body 3 after firing are obtained.

次に、これらの成形体が互いに対向する面に密着液を塗布し、吸着孔17、吸引路25および挿通孔23の位置を図7(a)に示すように合わせて積層する。なお、これらを積層するときの向きは、図6(a)および(c)に示す部材は図示している面が上向きとなるように、図6(b)に示す部材は図示している面が下向きとなるように積層して、積層体を得る。そして、この積層体を加圧した後、1580℃以上1650℃以下の温度で焼成して図7(b)に示す本体3を得ることができる。そして、金属板29の1つの主面に、エポキシ系の接着剤を塗布した後、連結部から中間部にわたる位置に接触させて、厚み方向から加圧することで、図7(c)に示す搬送アーム31を得ることができる。   Next, a contact liquid is applied to the surfaces of these molded bodies facing each other, and the positions of the suction holes 17, the suction passages 25 and the insertion holes 23 are aligned as shown in FIG. 6A and 6C, the members shown in FIGS. 6B and 6C are oriented such that the surface shown in FIG. 6B faces upward. Are laminated so as to face downward to obtain a laminate. After the laminate is pressed, it is fired at a temperature of 1580 ° C. or more and 1650 ° C. or less to obtain the main body 3 shown in FIG. 7B. Then, after applying an epoxy-based adhesive to one main surface of the metal plate 29, it is brought into contact with a position extending from the connecting portion to the intermediate portion, and is pressed from the thickness direction, thereby carrying the carrier shown in FIG. The arm 31 can be obtained.

金属板29は、所定の厚みの金属の板を金型で打ち抜くなどして必要な形状とすることができる。例えば、図1〜4に示すように、吸気口21や挿通孔23に対応する部分には、金型による打ち抜きの際に貫通孔が形成されるようにすればよい。また、所定の厚みの板にマスキングを施した後に薬剤を用いたエッチング等により、必要な形状とすることができる。また、予め、一方の面が鏡面仕上げされた金属の板を金型で打ち抜いたり、エッチングを施したりすることで、鏡面を有する金属板29を用意することができる。また、金属板29に凹部33を設けるには、凹部33を設ける部分を除いて、マスキングを施し、ブラスト加工やエッチングを施して、凹部33となる部分の金属を除去するとよい。   The metal plate 29 can be formed into a required shape by, for example, punching a metal plate having a predetermined thickness with a mold. For example, as shown in FIGS. 1 to 4, a portion corresponding to the intake port 21 and the insertion hole 23 may be formed with a through hole when punching with a die. Further, after a plate having a predetermined thickness is masked, a required shape can be formed by etching or the like using a chemical. In addition, a metal plate 29 having a mirror surface can be prepared by punching out a metal plate whose one surface is mirror-finished in advance with a mold or performing etching. Further, in order to provide the concave portion 33 in the metal plate 29, it is preferable to perform masking, blasting or etching to remove the metal in the portion to be the concave portion 33 except for the portion where the concave portion 33 is provided.

また、金属板29の本体3に対向していない面を樹脂で被覆する場合は、プライマー(下地剤)を塗装した後で、プライマーを乾燥させてから、ポリイミド樹脂、ポリテトラフルオロエチレン樹脂、ポリ三フッ化塩化エチレン樹脂、ポリビニリデンフルオライド樹脂またはポリベンゾイミダゾール樹脂をスプレーにより塗布し、塗布した樹脂のガラス転位点や融点を超える温度で熱処理すればよい。なお、樹脂の被覆が不要な部分については、プライマー(下地剤)を塗装する前にマスキングを施し、熱処理後にマスキングを取り除けばよい。   When the surface of the metal plate 29 which is not opposed to the main body 3 is coated with a resin, the primer (base material) is applied, the primer is dried, and then the polyimide resin, the polytetrafluoroethylene resin, What is necessary is just to apply a trifluorinated ethylene resin, a polyvinylidene fluoride resin or a polybenzimidazole resin by spraying and heat-treat it at a temperature exceeding the glass transition point or melting point of the applied resin. It is to be noted that a portion that does not require resin coating may be masked before applying a primer (base material), and the masking may be removed after heat treatment.

以上、本発明の実施形態について説明したが、本発明は上述の実施形態に限定されず、本発明の要旨を逸脱しない範囲において、各種の改良および変更を行なってもよい。例えば、搬送アーム31は、吸気以外の手段により、搬送物11を保持する機構を有するものであってもよい。また、搬送アーム31の形状は、搬送物11や目的に応じて選択すればよい。   Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various improvements and modifications may be made without departing from the spirit of the present invention. For example, the transport arm 31 may have a mechanism for holding the transported object 11 by means other than suction. Further, the shape of the transfer arm 31 may be selected according to the transferred object 11 and the purpose.

1 第1面
2 第2面
3 本体
3a、3b、3c 焼成後に本体の一部となる成形体
5 第1端部
7 連結部
9 第2端部
11 搬送物(基板)
13 載置部
15 中間部
17 吸着孔
19 支持部
21 吸気孔
23 挿通孔
25 吸引路
27 切欠き部
29 金属板
31 搬送アーム
33 凹部
35 基板処理装置
37 搬送室
39 基板搬送装置
DESCRIPTION OF SYMBOLS 1 1st surface 2 2nd surface 3 Main body 3a, 3b, 3c Molded body 5 which becomes a part of a main body after baking 5 1st end 7 Connecting part 9 2nd end 11 Conveyed object (substrate)
13 Placement part 15 Intermediate part 17 Suction hole 19 Support part 21 Intake hole 23 Insertion hole 25 Suction path 27 Notch 29 Metal plate 31 Transfer arm 33 Depression 35 Substrate processing unit 37 Transfer chamber 39 Substrate transfer unit

Claims (10)

セラミックスからなる板状の本体を有する、基板搬送装置に連結される搬送アームであって、
前記本体は、搬送物に対向する第1面と、該第1面の反対に位置する第2面とを備え、
前記本体は、連結部と、前記搬送物に対向する部分にあたる載置部と、前記連結部および前記載置部のそれぞれに繋がっているとともに、前記連結部および前記載置部の間に位置する中間部とを有し、
前記第1面および前記第2面の少なくとも一方において、前記連結部から前記中間部にわたる位置に金属板を備え
前記載置部における前記第1面の上に、前記搬送物を支持する支持部材を備え、前記金属板が、前記連結部から前記中間部に続いて前記載置部における前記支持部材の近くにまで位置している、搬送アーム。
A transfer arm connected to a substrate transfer device, having a plate-shaped main body made of ceramics,
The main body includes a first surface facing the article to be transported, and a second surface opposite to the first surface,
The main body is connected to each of the connecting portion, the mounting portion corresponding to the portion facing the transported object, and the connecting portion and the mounting portion, and is located between the connecting portion and the mounting portion. And an intermediate part,
On at least one of the first surface and the second surface, a metal plate is provided at a position extending from the connection portion to the intermediate portion ,
A support member for supporting the transported object is provided on the first surface of the placement section, and the metal plate is provided near the support member of the placement section following the intermediate section from the connection section. The transfer arm is located up to .
前記金属板は、前記連結部と前記中間部との境界を除く部分に凹部を備える、請求項に記載の搬送アーム。 2. The transfer arm according to claim 1 , wherein the metal plate includes a concave portion at a portion other than a boundary between the connecting portion and the intermediate portion. 3. 前記金属板は、露出している面のうち最も大きな面が鏡面である、請求項1または請求項2に記載の搬送アーム。 The transfer arm according to claim 1, wherein the largest surface of the exposed surfaces of the metal plate is a mirror surface. 前記金属板は、前記本体に対向していない面が、ポリイミド樹脂、ポリテトラフロロエチレン樹脂、ポリ三フッ化塩化エチレン樹脂、ポリビニリデンフルオライド樹脂またはポリベンゾイミダゾール樹脂によって被覆されている、請求項1乃至請求項のいずれかに記載の搬送アーム。 The metal plate has a surface not facing the main body, which is coated with a polyimide resin, a polytetrafluoroethylene resin, a polychlorofluoroethylene resin, a polyvinylidene fluoride resin, or a polybenzimidazole resin. 1 to conveying arm according to claim 3. セラミックスからなる板状の本体を有する、基板搬送装置に連結される搬送アームであって、  A transfer arm connected to a substrate transfer device, having a plate-shaped main body made of ceramics,
前記本体は、搬送物に対向する第1面と、該第1面の反対に位置する第2面とを備え、  The main body includes a first surface facing the article to be transported, and a second surface opposite to the first surface,
前記本体は、連結部と、前記搬送物に対向する部分にあたる載置部と、前記連結部および前記載置部のそれぞれに繋がっているとともに、前記連結部および前記載置部の間に位置する中間部とを有し、  The main body is connected to each of the connecting portion, the mounting portion corresponding to the portion facing the transported object, and the connecting portion and the mounting portion, and is located between the connecting portion and the mounting portion. And an intermediate part,
前記第1面および前記第2面の少なくとも一方において、前記連結部から前記中間部にわたる位置に金属板を備え、  On at least one of the first surface and the second surface, a metal plate is provided at a position extending from the connection portion to the intermediate portion,
前記金属板は、前記連結部と前記中間部との境界を除く部分に凹部を備える、搬送アー  The metal plate has a concave portion in a portion other than a boundary between the connecting portion and the intermediate portion,
ム。M
セラミックスからなる板状の本体を有する、基板搬送装置に連結される搬送アームであって、  A transfer arm connected to a substrate transfer device, having a plate-shaped main body made of ceramics,
前記本体は、搬送物に対向する第1面と、該第1面の反対に位置する第2面とを備え、  The main body includes a first surface facing the article to be transported, and a second surface opposite to the first surface,
前記本体は、連結部と、前記搬送物に対向する部分にあたる載置部と、前記連結部および前記載置部のそれぞれに繋がっているとともに、前記連結部および前記載置部の間に位置する中間部とを有し、  The main body is connected to each of the connecting portion, the mounting portion corresponding to the portion facing the transported object, and the connecting portion and the mounting portion, and is located between the connecting portion and the mounting portion. And an intermediate part,
前記第1面および前記第2面の少なくとも一方において、前記連結部から前記中間部にわたる位置に金属板を備え、  On at least one of the first surface and the second surface, a metal plate is provided at a position extending from the connection portion to the intermediate portion,
前記金属板は、露出している面のうち最も大きな面が鏡面である、搬送アーム。  The transfer arm, wherein the largest surface of the exposed surface of the metal plate is a mirror surface.
セラミックスからなる板状の本体を有する、基板搬送装置に連結される搬送アームであって、  A transfer arm connected to a substrate transfer device, having a plate-shaped main body made of ceramics,
前記本体は、搬送物に対向する第1面と、該第1面の反対に位置する第2面とを備え、  The main body includes a first surface facing the article to be transported, and a second surface opposite to the first surface,
前記本体は、連結部と、前記搬送物に対向する部分にあたる載置部と、前記連結部および前記載置部のそれぞれに繋がっているとともに、前記連結部および前記載置部の間に位置する中間部とを有し、  The main body is connected to each of the connecting portion, the mounting portion corresponding to the portion facing the transported object, and the connecting portion and the mounting portion, and is located between the connecting portion and the mounting portion. And an intermediate part,
前記第1面および前記第2面の少なくとも一方において、前記連結部から前記中間部にわたる位置に金属板を備え、  On at least one of the first surface and the second surface, a metal plate is provided at a position extending from the connection portion to the intermediate portion,
前記金属板は、前記本体に対向していない面が、ポリイミド樹脂、ポリテトラフロロエチレン樹脂、ポリ三フッ化塩化エチレン樹脂、ポリビニリデンフルオライド樹脂またはポリベンゾイミダゾール樹脂によって被覆されている、搬送アーム。  The transfer arm, wherein the metal plate has a surface not facing the main body coated with a polyimide resin, a polytetrafluoroethylene resin, a polychlorotrifluoroethylene resin, a polyvinylidene fluoride resin or a polybenzimidazole resin. .
前記連結部と前記中間部との境界にあたる部分において、前記本体の厚みが1.0mm以上5.0mm以下であり、前記金属板の厚みが50μm以上0.5mm以下である、請求項1乃至7のいずれかに記載の搬送アーム。 In the boundary portion corresponding to between the connecting portion and the intermediate portion, wherein it is the thickness of the body is less than 1.0mm 5.0mm or less, the thickness of the metal plate is 50μm or more 0.5mm or less, according to claim 1 to 7 The transfer arm according to any one of the above. 請求項1乃至請求項のいずれかに記載の搬送アームを備える、基板搬送装置。 Comprising a conveying arm according to any one of claims 1 to 8, the substrate transfer apparatus. 請求項に記載の基板搬送装置を備える、基板処理装置。 A substrate processing apparatus comprising the substrate transfer device according to claim 9 .
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