JP6648376B2 - Optical composition, thin film, molded product and optical device - Google Patents
Optical composition, thin film, molded product and optical device Download PDFInfo
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- JP6648376B2 JP6648376B2 JP2014066269A JP2014066269A JP6648376B2 JP 6648376 B2 JP6648376 B2 JP 6648376B2 JP 2014066269 A JP2014066269 A JP 2014066269A JP 2014066269 A JP2014066269 A JP 2014066269A JP 6648376 B2 JP6648376 B2 JP 6648376B2
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- acid
- resin
- fine particles
- optical
- optical composition
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- 230000003287 optical effect Effects 0.000 title claims description 80
- 239000000203 mixture Substances 0.000 title claims description 60
- 239000010409 thin film Substances 0.000 title claims description 18
- 239000011347 resin Substances 0.000 claims description 86
- 229920005989 resin Polymers 0.000 claims description 86
- 239000010419 fine particle Substances 0.000 claims description 62
- 239000010408 film Substances 0.000 claims description 36
- 239000002253 acid Substances 0.000 claims description 28
- 239000002904 solvent Substances 0.000 claims description 26
- 239000011164 primary particle Substances 0.000 claims description 23
- 239000004593 Epoxy Substances 0.000 claims description 21
- 150000002148 esters Chemical class 0.000 claims description 21
- 239000011230 binding agent Substances 0.000 claims description 19
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 claims description 15
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 claims description 10
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 10
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- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 claims description 7
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- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- DXBHBZVCASKNBY-UHFFFAOYSA-N 1,2-Benz(a)anthracene Chemical compound C1=CC=C2C3=CC4=CC=CC=C4C=C3C=CC2=C1 DXBHBZVCASKNBY-UHFFFAOYSA-N 0.000 claims description 5
- 238000003795 desorption Methods 0.000 claims description 5
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- 150000004706 metal oxides Chemical class 0.000 description 42
- 150000008064 anhydrides Chemical class 0.000 description 34
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- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 5
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
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- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
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- 230000000052 comparative effect Effects 0.000 description 4
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- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
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- 150000000000 tetracarboxylic acids Chemical class 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 3
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 238000010943 off-gassing Methods 0.000 description 3
- 239000012756 surface treatment agent Substances 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- JRPBSTGRRSTANR-UHFFFAOYSA-N 2,6-bis(2-methylpropyl)phenol Chemical compound CC(C)CC1=CC=CC(CC(C)C)=C1O JRPBSTGRRSTANR-UHFFFAOYSA-N 0.000 description 2
- AKEUNCKRJATALU-UHFFFAOYSA-N 2,6-dihydroxybenzoic acid Chemical compound OC(=O)C1=C(O)C=CC=C1O AKEUNCKRJATALU-UHFFFAOYSA-N 0.000 description 2
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 2
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- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
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- SMNDYUVBFMFKNZ-UHFFFAOYSA-N 2-furoic acid Chemical compound OC(=O)C1=CC=CO1 SMNDYUVBFMFKNZ-UHFFFAOYSA-N 0.000 description 2
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 2
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- SHSGDXCJYVZFTP-UHFFFAOYSA-N 4-ethoxybenzoic acid Chemical compound CCOC1=CC=C(C(O)=O)C=C1 SHSGDXCJYVZFTP-UHFFFAOYSA-N 0.000 description 2
- REIDAMBAPLIATC-UHFFFAOYSA-N 4-methoxycarbonylbenzoic acid Chemical compound COC(=O)C1=CC=C(C(O)=O)C=C1 REIDAMBAPLIATC-UHFFFAOYSA-N 0.000 description 2
- MUDSDYNRBDKLGK-UHFFFAOYSA-N 4-methylquinoline Chemical compound C1=CC=C2C(C)=CC=NC2=C1 MUDSDYNRBDKLGK-UHFFFAOYSA-N 0.000 description 2
- GDFUWFOCYZZGQU-UHFFFAOYSA-N 4-propoxybenzoic acid Chemical compound CCCOC1=CC=C(C(O)=O)C=C1 GDFUWFOCYZZGQU-UHFFFAOYSA-N 0.000 description 2
- ASDLSKCKYGVMAI-UHFFFAOYSA-N 9,10-dioxoanthracene-2-carboxylic acid Chemical compound C1=CC=C2C(=O)C3=CC(C(=O)O)=CC=C3C(=O)C2=C1 ASDLSKCKYGVMAI-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
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- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- FPIQZBQZKBKLEI-UHFFFAOYSA-N ethyl 1-[[2-chloroethyl(nitroso)carbamoyl]amino]cyclohexane-1-carboxylate Chemical compound ClCCN(N=O)C(=O)NC1(C(=O)OCC)CCCCC1 FPIQZBQZKBKLEI-UHFFFAOYSA-N 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- BTNMPGBKDVTSJY-UHFFFAOYSA-N keto-phenylpyruvic acid Chemical compound OC(=O)C(=O)CC1=CC=CC=C1 BTNMPGBKDVTSJY-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000003903 lactic acid esters Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FMXYCZVOMYLMKM-UHFFFAOYSA-N methyl 2-hydroxy-2-methylbutanoate Chemical compound CCC(C)(O)C(=O)OC FMXYCZVOMYLMKM-UHFFFAOYSA-N 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- UOELQPIRLNNPNZ-UHFFFAOYSA-N nonane-1,6-diol Chemical compound CCCC(O)CCCCCO UOELQPIRLNNPNZ-UHFFFAOYSA-N 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- 150000003901 oxalic acid esters Chemical class 0.000 description 1
- ZVCCLWOUECKLTG-UHFFFAOYSA-N oxiran-2-ylmethyl 4-ethylbenzoate Chemical compound C(C)C1=CC=C(C(=O)OCC2CO2)C=C1 ZVCCLWOUECKLTG-UHFFFAOYSA-N 0.000 description 1
- JKXONPYJVWEAEL-UHFFFAOYSA-N oxiran-2-ylmethyl acetate Chemical compound CC(=O)OCC1CO1 JKXONPYJVWEAEL-UHFFFAOYSA-N 0.000 description 1
- XRQKARZTFMEBBY-UHFFFAOYSA-N oxiran-2-ylmethyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OCC1CO1 XRQKARZTFMEBBY-UHFFFAOYSA-N 0.000 description 1
- YLNSNVGRSIOCEU-UHFFFAOYSA-N oxiran-2-ylmethyl butanoate Chemical compound CCCC(=O)OCC1CO1 YLNSNVGRSIOCEU-UHFFFAOYSA-N 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- AFDXODALSZRGIH-UHFFFAOYSA-N p-coumaric acid methyl ether Natural products COC1=CC=C(C=CC(O)=O)C=C1 AFDXODALSZRGIH-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- KFDKNTQGTAEZGC-UHFFFAOYSA-N phenanthrene-1-carboxylic acid Chemical compound C1=CC2=CC=CC=C2C2=C1C(C(=O)O)=CC=C2 KFDKNTQGTAEZGC-UHFFFAOYSA-N 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- JSSXHAMIXJGYCS-UHFFFAOYSA-N piperazin-4-ium-2-carboxylate Chemical compound OC(=O)C1CNCCN1 JSSXHAMIXJGYCS-UHFFFAOYSA-N 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- LOAUVZALPPNFOQ-UHFFFAOYSA-N quinaldic acid Chemical compound C1=CC=CC2=NC(C(=O)O)=CC=C21 LOAUVZALPPNFOQ-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- JWHOQZUREKYPBY-UHFFFAOYSA-N rubonic acid Natural products CC1(C)CCC2(CCC3(C)C(=CCC4C5(C)CCC(=O)C(C)(C)C5CC(=O)C34C)C2C1)C(=O)O JWHOQZUREKYPBY-UHFFFAOYSA-N 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- JXOHGGNKMLTUBP-HSUXUTPPSA-N shikimic acid Chemical compound O[C@@H]1CC(C(O)=O)=C[C@@H](O)[C@H]1O JXOHGGNKMLTUBP-HSUXUTPPSA-N 0.000 description 1
- JXOHGGNKMLTUBP-JKUQZMGJSA-N shikimic acid Natural products O[C@@H]1CC(C(O)=O)=C[C@H](O)[C@@H]1O JXOHGGNKMLTUBP-JKUQZMGJSA-N 0.000 description 1
- GRJISGHXMUQUMC-UHFFFAOYSA-N silyl prop-2-enoate Chemical class [SiH3]OC(=O)C=C GRJISGHXMUQUMC-UHFFFAOYSA-N 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- UJJLJRQIPMGXEZ-UHFFFAOYSA-N tetrahydro-2-furoic acid Chemical compound OC(=O)C1CCCO1 UJJLJRQIPMGXEZ-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
本発明は、光学用組成物、該光学用組成物を用いて得られた薄膜又は成形体、及び、該薄膜又は成形体を備えた光学デバイスに関する。 The present invention relates to an optical composition, a thin film or molded article obtained using the optical composition, and an optical device provided with the thin film or molded article.
近年、レンズ材料等の光学材料の分野では、高屈折性、透明性等に優れた光学材料の開発が進められており、例えば、特許文献1には、このような特性を有する光学材料として、粒子サイズ1〜15nmの無機微粒子(酸化ジルコニウム、酸化チタン、これらの混合物等)を1〜70質量%含有し、100ppm以下の濃度で塩素元素を含有し、有機酸か無機酸の少なくとも一方を含有し、かつ、前記有機酸と前記無機酸の合計濃度が前記無機微粒子の固形分濃度に対して0.15倍未満である無機微粒子分散液が提案されている。 In recent years, in the field of optical materials such as lens materials, development of optical materials excellent in high refractive index, transparency and the like has been promoted. For example, Patent Document 1 discloses an optical material having such characteristics. Contains 1 to 70% by mass of inorganic fine particles (zirconium oxide, titanium oxide, a mixture thereof, etc.) having a particle size of 1 to 15 nm, contains a chlorine element at a concentration of 100 ppm or less, and contains at least one of an organic acid and an inorganic acid. In addition, there has been proposed an inorganic fine particle dispersion in which the total concentration of the organic acid and the inorganic acid is less than 0.15 times the solid content of the inorganic fine particles.
一方、光学デバイスの1つである有機EL照明では、光取り出し率の向上を図るべく、金属酸化物からなる微粒子を用いた高屈折材料層を設けることが検討されている。
しかしながら、金属酸化物の微粒子は水分を吸着する性質を有しており、水分を吸着した微粒子を用いて高屈折材料層を形成した場合、微粒子に吸着していた水分が原因でアウトガスが発生し、有機EL素子の性能に悪影響を与えることが考えられる。
On the other hand, in organic EL illumination, which is one of the optical devices, it has been studied to provide a high refractive material layer using fine particles made of a metal oxide in order to improve the light extraction rate.
However, metal oxide fine particles have the property of adsorbing moisture, and when a high refractive material layer is formed using fine particles that have absorbed water, outgas is generated due to the moisture adsorbed on the fine particles. It is conceivable that the performance of the organic EL element is adversely affected.
そのため、特許文献1に記載されたような無機微粒子分散液を用いて、有機EL照明に高屈折材料層を設けた場合、有機EL素子の性能に悪影響を与えることが懸念されたため、高屈折率かつ高透明で、アウトガスの発生が少ない高屈折率膜(高屈折率層)を提供することができる光学材料に対する要望が高まっていた。 Therefore, when a high refractive material layer is provided for organic EL lighting using an inorganic fine particle dispersion as described in Patent Document 1, there is a concern that the performance of the organic EL element may be adversely affected. There has been an increasing demand for an optical material that can provide a high-refractive-index film (high-refractive-index layer) that is highly transparent and generates little outgas.
本発明者らは、高屈折率かつ高透明で、アウトガスの発生が少ない高屈折率膜(高屈折率層)を提供することができる光学材料を提供するために鋭意検討を行い、光学用組成物において、特定の平均1次粒子径を有する金属酸化物微粒子の分散体を用いることによりその目的を達成することができることを見出し、本発明を完成した。 The present inventors have conducted intensive studies to provide an optical material capable of providing a high-refractive-index film (high-refractive-index layer) having a high refractive index, high transparency, and little outgassing, and an optical composition. It has been found that the object can be achieved by using a dispersion of metal oxide fine particles having a specific average primary particle diameter in the product, and the present invention has been completed.
すなわち、本発明は、
[1]金属酸化物微粒子、バインダー樹脂、及び、溶媒を含む光学用組成物であって、
基板上に塗布し、溶媒を除去することで得られた厚み1μmの膜の含水量は、昇温脱離ガス分析装置を用いて、1.0×10−8〜3.5×10−7Paの減圧度で、室温から毎分10℃ずつ200℃まで昇温し30分保持することで測定した場合に、3.0×10−7mol/cm2以下であることを特徴とする、光学用組成物;
[2]平均1次粒子径が15〜300nmである金属酸化物微粒子の分散体を用いて得られる、[1]の光学用組成物;
[3]上記金属酸化物微粒子は、酸化ジルコニウム微粒子、酸化チタン微粒子及びチタン酸バリウム微粒子からなる群より選択される少なくとも1種である、[1]又は[2]の光学用組成物;
[4]上記バインダー樹脂は、インデン、テトラリン、フルオレン、キサンテン、アントラセン及びベンズアントラセンからなる群より選択される少なくとも1種に由来する縮環構造を有する縮環構造含有樹脂である、[1]〜[3]のいずれかの光学用組成物;
[5][1]〜[4]のいずれかの光学用組成物を用いて得られ、屈折率が1.6〜2.1であることを特徴とする薄膜又は成形体;並びに
[6][5]の薄膜又は成形体を備えた光学デバイス
に関する。
That is, the present invention
[1] An optical composition comprising metal oxide fine particles, a binder resin, and a solvent,
The water content of the 1-μm-thick film obtained by applying the solution on the substrate and removing the solvent was determined to be 1.0 × 10 −8 to 3.5 × 10 −7 by using a thermal desorption gas analyzer. When measured by raising the temperature from room temperature to 200 ° C. at a rate of 10 ° C. per minute and maintaining the temperature for 30 minutes at a reduced pressure of Pa, it is 3.0 × 10 −7 mol / cm 2 or less, Optical composition;
[2] The optical composition of [1], obtained using a dispersion of metal oxide fine particles having an average primary particle diameter of 15 to 300 nm;
[3] The optical composition according to [1] or [2], wherein the metal oxide fine particles are at least one selected from the group consisting of zirconium oxide fine particles, titanium oxide fine particles, and barium titanate fine particles;
[4] The binder resin is a resin having a condensed ring structure having a condensed ring structure derived from at least one selected from the group consisting of indene, tetralin, fluorene, xanthene, anthracene, and benzanthracene. The optical composition according to any one of [3];
[5] A thin film or molded article obtained by using the optical composition according to any one of [1] to [4] and having a refractive index of 1.6 to 2.1; and [6]. [5] An optical device including the thin film or the molded body according to [5].
本発明の光学用組成物は、特定の平均1次粒子径を有する金属酸化物微粒子の分散体を用いて得られるものであるため、高屈折率かつ高透明で、水分由来のアウトガスの発生が少ない高屈折率膜を形成するのに適しており、そのため、光学部材や光学デバイスに好適に用いることができる。
また、本発明の薄膜又は成形体は、本発明の光学用組成物を用いて得られたため、高屈折率かつ高透明で、水分由来のアウトガスの発生が少ない高屈折率膜(高屈折率層)となる。
さらに、本発明の光学デバイスは、本発明の薄膜又は成形体を備えるため、光学特性や、水分の存在が悪影響を及ぼし得る有機EL素子等の用途での信頼性に優れる。
Since the optical composition of the present invention is obtained using a dispersion of metal oxide fine particles having a specific average primary particle diameter, it has a high refractive index and high transparency, and generates outgas derived from moisture. It is suitable for forming a small high-refractive-index film, so that it can be suitably used for optical members and optical devices.
In addition, since the thin film or molded article of the present invention is obtained using the optical composition of the present invention, it has a high refractive index and high transparency, and a high refractive index film (high refractive index layer ).
Furthermore, since the optical device of the present invention includes the thin film or the molded product of the present invention, it has excellent optical characteristics and reliability in applications such as an organic EL element to which the presence of moisture may have an adverse effect.
[1]光学用組成物
まず、本発明の光学用組成物について説明する。
本発明の光学用組成物は、金属酸化物微粒子、バインダー樹脂、及び、溶媒を含む光学用組成物であって、
基板上に塗布し、溶媒を除去することで得られた厚み1μmの膜の含水量は、昇温脱離ガス分析装置を用いて、1.0×10−8〜3.5×10−7Paの減圧度で、室温から毎分10℃ずつ200℃まで昇温し30分保持することで測定した場合に、3.0×10−7mol/cm2以下であることを特徴とする。
[1] Optical Composition First, the optical composition of the present invention will be described.
The optical composition of the present invention is an optical composition containing metal oxide fine particles, a binder resin, and a solvent,
The water content of the 1-μm-thick film obtained by applying the solution on the substrate and removing the solvent was determined to be 1.0 × 10 −8 to 3.5 × 10 −7 by using a thermal desorption gas analyzer. When measured by raising the temperature from room temperature to 200 ° C. at a rate of 10 ° C. per minute at a reduced pressure of Pa and holding for 30 minutes, it is characterized by being 3.0 × 10 −7 mol / cm 2 or less.
(金属酸化物微粒子、及び、金属酸化物微粒子の分散体)
上記金属酸化物微粒子は、酸化ジルコニウム微粒子(以下、ZrO2微粒子ともいう)、酸化チタン微粒子(以下、TiO2微粒子ともいう)及びチタン酸バリウム微粒子(以下、BaTiO3微粒子ともいう)からなる群より選択される少なくとも1種であることが好ましい。
上記金属酸化物微粒子の形状は特に限定されず、例えば、球状、楕円球状、直方体や長方体などの四方体状などの粉粒状、円柱状、円盤状、楕円盤状、鱗片状などの多角板状、針状等が挙げられる。これらの微粒子の平均1次粒子径は上記の通りであり、微粒子が球状ではない場合、平均1次粒子径は金属酸化物微粒子の外接球の粒子径とする。
(Metal oxide fine particles and dispersion of metal oxide fine particles)
The metal oxide fine particles are selected from the group consisting of zirconium oxide fine particles (hereinafter also referred to as ZrO 2 fine particles), titanium oxide fine particles (hereinafter also referred to as TiO 2 fine particles), and barium titanate fine particles (hereinafter also referred to as BaTiO 3 fine particles). Preferably, at least one selected from them is used.
The shape of the metal oxide fine particles is not particularly limited, and examples thereof include, for example, spheres, oval spheres, powders and granules such as tetrahedrons such as cuboids and cuboids, columns, discs, ellipsoids, and scales. Plate-like, needle-like, etc. are mentioned. The average primary particle diameter of these fine particles is as described above. When the fine particles are not spherical, the average primary particle diameter is the particle diameter of the circumscribed sphere of the metal oxide fine particles.
本発明の光学用組成物は、平均1次粒子径が15〜300nmである金属酸化物微粒子の分散体を用いて得られることが好ましい。金属酸化物微粒子の平均1次粒子径を上記範囲にすることにより、金属酸化物微粒子の表面積が小さくなる結果、水分の吸着を低減することができるため、膜を形成した際のアウトガスの発生を抑制することができるとともに、高屈折率で、かつ、高い透明性を有する膜を形成することができる。
一方、上記平均1次粒子径が15nm未満では、水分の吸着を十分に低減することができず、また、上記平均1次粒子径が300nmを超えると、膜を形成した際にその透明性が大きく低下することがある。
上記金属酸化物微粒子の平均1次粒子径は、15〜100nmがより好ましく、20〜50nmがさらに好ましい。
The optical composition of the present invention is preferably obtained using a dispersion of metal oxide fine particles having an average primary particle size of 15 to 300 nm. By setting the average primary particle diameter of the metal oxide fine particles in the above range, the surface area of the metal oxide fine particles is reduced, and thus the adsorption of moisture can be reduced. It is possible to form a film having a high refractive index and a high transparency while being suppressed.
On the other hand, if the average primary particle size is less than 15 nm, the adsorption of moisture cannot be sufficiently reduced, and if the average primary particle size exceeds 300 nm, the transparency of the film when formed is reduced. May drop significantly.
The average primary particle diameter of the metal oxide fine particles is more preferably from 15 to 100 nm, further preferably from 20 to 50 nm.
上記金属酸化物微粒子の平均1次粒子径は、透過型電子顕微鏡(TEM)や走査透過型電子顕微鏡(STEM)により測定した観察像から統計処理により算出される値である。
ここで、統計処理による算出は、SEM画像からランダムに選んだ1000個の粒子について、直径を測定し、3nm区分のヒストグラムを作成したときの、下記数式(A)を用いた算出により行ったものである。当該数式(A)で得られた数平均1次粒子径Dnpを、本発明の平均1次粒子径とした。
Dnp=Σnidi/Σni・・・(A)
Dnp: 数平均1次粒子径
di:ヒストグラムのi番目の直径
ni:頻度
The average primary particle diameter of the metal oxide fine particles is a value calculated by statistical processing from an observation image measured by a transmission electron microscope (TEM) or a scanning transmission electron microscope (STEM).
Here, the calculation by the statistical processing is performed by calculating using the following formula (A) when a diameter is measured for 1000 particles randomly selected from the SEM image and a histogram of 3 nm section is created. It is. The number average primary particle diameter Dnp obtained by the formula (A) was defined as the average primary particle diameter of the present invention.
Dnp = Σnidi / Σni (A)
Dnp: number average primary particle diameter di: i-th diameter of histogram ni: frequency
上記平均1次粒子径を有する金属酸化物微粒子の分散体は、平均1次粒子径が15〜300nmの金属酸化物微粒子を分散媒に加え、ビーズミルといった当該分野で通常使用される手段により分散させることで製造することができる。 The dispersion of metal oxide fine particles having the above average primary particle diameter is prepared by adding metal oxide fine particles having an average primary particle diameter of 15 to 300 nm to a dispersion medium and dispersing the dispersion by means commonly used in this field such as a bead mill. It can be manufactured by
また、上記金属酸化物微粒子の分散に用いる分散媒としては、後述の溶媒と同じものを用いることができ、金属酸化物微粒子を分散し得る限り、その使用量は特に制限されるものではない。 In addition, as a dispersion medium used for dispersing the metal oxide fine particles, the same solvent as described later can be used, and the use amount thereof is not particularly limited as long as the metal oxide fine particles can be dispersed.
また、上記金属酸化物微粒子は、表面処理されたものであっても良い。表面処理とは、カップリング剤等、微粒子表面に存在する水酸基と反応し得る化合物を結合させる処理を言う。表面処理は、金属酸化物微粒子を溶媒に分散させた後で、酸性条件下でカップリング剤を混合し、作用させることにより行うことが出来る。
表面処理剤としては、特に限定されないが、シランカップリング剤やチタンカップリング剤が挙げられ、例えば、3−(メタ)アクリロキシプロピルトリメトキシシラン、3−(メタ)アクリロキシプロピルメチルジメトキシシラン等の(メタ)アクリロキシシラン類;3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、3−グリシドキシプロピルメチルジエトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン等のエポキシシラン類;ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリス(β−メトキシエトキシ)シラン、ジメチルビニルメトキシシラン、ビニルトリクロロシラン、ジメチルビニルクロロシラン等のビニルシラン類;N−2−(アミノエチル)−3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリメトキシシラン、N−2−(アミノエチル)−3−アミノプロピルメチルジメトキシシラン等のアミノシラン類;N−(ビニルベンジル)−2−アミノエチル−3−アミノプロピルトリメトキシシランの塩酸塩等の第四級アンモニウム塩類;p−スチリルトリメトキシシラン;フェニルトリメトキシシラン;イソプロピルジメタクリルイソステアロイルチタネート、イソプロピルジアクリルイソステアロイルチタネート等のチタネート類;等が挙げられる。これらの表面処理剤は、単独で使用しても良く、2種以上を併用しても良い。これらの表面処理剤の中では、反応性官能基を有し、縮環構造含有樹脂と共に硬化し、薄膜や成形体中に金属酸化物微粒子を固定化できることから、エポキシシラン類や(メタ)アクリロキシシラン類が好ましい。
The metal oxide fine particles may be surface-treated. The surface treatment refers to a treatment for binding a compound that can react with a hydroxyl group present on the surface of the fine particles, such as a coupling agent. The surface treatment can be performed by dispersing the metal oxide fine particles in a solvent, and then mixing and operating a coupling agent under acidic conditions.
Although it does not specifically limit as a surface treatment agent, A silane coupling agent and a titanium coupling agent are mentioned, for example, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropylmethyldimethoxysilane, etc. (Meth) acryloxysilanes; 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 2- (3,4-epoxycyclohexyl) Epoxysilanes such as ethyltrimethoxysilane; vinylsilanes such as vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, dimethylvinylmethoxysilane, vinyltrichlorosilane, dimethylvinylchlorosilane; N-2- Aminosilanes such as aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, N-2- (aminoethyl) -3-aminopropylmethyldimethoxysilane; N- (vinylbenzyl) -2- Quaternary ammonium salts such as hydrochloride salt of aminoethyl-3-aminopropyltrimethoxysilane; p-styryltrimethoxysilane; phenyltrimethoxysilane; And the like. These surface treatment agents may be used alone or in combination of two or more. Among these surface treatment agents, epoxysilanes and (meth) acrylic compounds having a reactive functional group, are cured together with a resin having a condensed ring structure, and can fix metal oxide fine particles in a thin film or a molded product. Roxysilanes are preferred.
金属酸化物微粒子の含有量は、特に限定されないが、本発明の光学用組成物中30〜90重量%であることが好ましく、50〜80重量%であることがより好ましい。
金属酸化物微粒子の含有量が30重量%未満であると、高屈折な膜を成膜することができず、また、90重量%を超えると、成膜時に粒子が凝集し、成膜が困難となることがある上、光学デバイスとした際にアウトガス量が増えることがある。
The content of the metal oxide fine particles is not particularly limited, but is preferably 30 to 90% by weight, more preferably 50 to 80% by weight in the optical composition of the present invention.
If the content of the metal oxide fine particles is less than 30% by weight, a film having a high refractive index cannot be formed, and if it exceeds 90% by weight, the particles are aggregated during the film formation, making film formation difficult. In addition, the outgas amount may increase when the optical device is used.
(バインダー樹脂)
上記バインダー樹脂は、特に限定されないが、インデン、テトラリン、フルオレン、キサンテン、アントラセン及びベンズアントラセンからなる群より選択される少なくとも1種に由来する縮環構造を有する縮環構造含有樹脂であることが好ましく、例えば、エポキシエステル樹脂(E)、多価カルボン酸樹脂(G)等を用いることができる。
エポキシエステル樹脂(E)は、下記一般式(1)で表されるエポキシ樹脂(A)と単塩基性カルボン酸(B)とを反応させることにより、又は、下記一般式(10) で表されるアルコール化合物(C)とグリシジルエステル化合物(D)とを反応させることにより、得ることができる。エポキシエステル樹脂(E)としては、分散性や耐熱性に優れることから、キサンテン又はフルオレンに由来する縮環構造を有するものが好ましい。
(Binder resin)
The binder resin is not particularly limited, but is preferably a fused ring structure-containing resin having a fused ring structure derived from at least one selected from the group consisting of indene, tetralin, fluorene, xanthene, anthracene and benzanthracene. For example, an epoxy ester resin (E), a polycarboxylic acid resin (G), or the like can be used.
The epoxy ester resin (E) is obtained by reacting an epoxy resin (A) represented by the following general formula (1) with a monobasic carboxylic acid (B), or represented by the following general formula (10). By reacting the alcohol compound (C) with the glycidyl ester compound (D). As the epoxy ester resin (E), a resin having a condensed ring structure derived from xanthene or fluorene is preferable because of its excellent dispersibility and heat resistance.
一般式(1)中、Y1〜4は、各々独立して下記一般式(2)又は下記一般式(3)で表される基であり、p1〜4は、各々独立して0から4の整数である。 In the general formula (1), Y 1-4 are each independently a group represented by the following general formula (2) or the following general formula (3), and p 1-4 are each independently from 0 to 4 is an integer.
一般式(2)中、Y5〜6は、各々独立して一般式(2)又は下記一般式(3)で表される基であり、p5〜6は、各々独立して0から4の整数である。一般式(1)においてY1〜4が一般式(2)で表される基であり、かつ、一般式(2)においてY5〜6が一般式(2)で表される基である場合、一般式(1)におけるY1〜4は、一般式(2)で表される基を構成単位とするオリゴマーを形成している。 In the general formula (2), Y 5 to 6 are each independently a group represented by the general formula (2) or the following general formula (3), and p 5 to 6 are each independently 0 to 4 Is an integer. When Y 1-4 in the general formula (1) is a group represented by the general formula (2), and Y 5-6 in the general formula (2) is a group represented by the general formula (2) And Y 1 to Y 4 in the general formula (1) form an oligomer having a group represented by the general formula (2) as a structural unit.
一般式(1)、(2)中、Zは、下記式(4)〜(9)に示すような、インデン、テトラリン、フルオレン、キサンテン、アントラセン、及び、ベンズアントラセンからなる群から選択される少なくとも1種に由来する縮環構造を含む二価基であり、R1〜6は、各々独立して、炭素数1から10の直鎖状、分岐状若しくは環状のアルキル基若しくはアルケニル基、炭素数1から5のアルコキシ基、置換基を有していてもよいフェニル基、又は、ハロゲン原子であり、q1〜6は、各々独立して0から4の整数であり、s1〜2は、各々独立して0から10の整数である。また、一般式(1)〜(3)中、R7〜14は、各々独立して水素原子又はメチル基であり、m1〜8は、各々独立して0から10の整数である。ここで、複数個のR1〜14、Y1〜6は同一でも良いし、異なっていても良い。また、一般式(1)は、構造式が左右対称であっても、非対称であっても良い。 In the general formulas (1) and (2), Z is at least selected from the group consisting of indene, tetralin, fluorene, xanthene, anthracene, and benzanthracene as shown in the following formulas (4) to (9). A divalent group containing a condensed ring structure derived from one kind, wherein R 1 to R 6 are each independently a linear, branched or cyclic alkyl or alkenyl group having 1 to 10 carbon atoms, 1 to 5 alkoxy groups, which may have a substituent phenyl group or a halogen atom, q 1 to 6 is an integer from 0 to 4 each independently, s 1 to 2, the Each is independently an integer from 0 to 10. In the general formulas (1) to (3), R 7-14 are each independently a hydrogen atom or a methyl group, and m 1 to 8 are each independently an integer of 0 to 10. Here, a plurality of R 1-14 and Y 1-6 may be the same or different. Further, in the general formula (1), the structural formula may be bilaterally symmetric or asymmetric.
一般式(10)中、Zは前記と同じであり、R15〜16は、各々独立して炭素数1から10の直鎖状、分岐状若しくは環状のアルキル基若しくはアルケニル基、炭素数1から5のアルコキシ基、置換基を有していてもよいフェニル基、又は、ハロゲン原子であり、f1〜2は、各々独立して0から4の整数であり、R17〜18は、各々独立して水素原子又はメチル基であり、m9〜10は、各々独立して0から10の整数であり、r1〜2は、各々独立して1から5までの整数である。ここで、複数個のR15〜18は同一でも良いし、異なっていても良い。また、一般式(10)は、構造式が左右対称であっても、非対称であっても良い。 In the general formula (10), Z is the same as described above, and R 15 to R 16 each independently represent a linear, branched or cyclic alkyl or alkenyl group having 1 to 10 carbon atoms, 5 is an alkoxy group, a phenyl group which may have a substituent, or a halogen atom, f 1 to 2 are each independently an integer of 0 to 4, and R 17 to 18 are each independently A hydrogen atom or a methyl group, m 9 to 10 are each independently an integer of 0 to 10, and r 1 to 2 are each independently an integer of 1 to 5. Here, the plurality of R 15 to R 18 may be the same or different. In the general formula (10), the structural formula may be bilaterally symmetric or asymmetric.
単塩基性カルボン酸(B)としては、カルボキシル基を1つ有する化合物であれば特に限定されず、例えば、(メタ)アクリル酸、シクロプロパンカルボン酸、2,2,3,3−テトラメチル−1−シクロプロパンカルボン酸、シクロペンタンカルボン酸、2−シクロペンテニルカルボン酸、2−フランカルボン酸、2−テトラヒドロフランカルボン酸、シクロヘキサンカルボン酸、4−プロピルシクロヘキサンカルボン酸、4−ブチルシクロヘキサンカルボン酸、4−ペンチルシクロヘキサンカルボン酸、4−ヘキシルシクロヘキサンカルボン酸、4−へプチルシクロヘキサンカルボン酸、4−シアノシクロヘキサン−1−カルボン酸、4−ヒドロキシシクロヘキサンカルボン酸、1,3,4,5−テトラヒドロキシシクロヘキサン−1−カルボン酸、2−(1,2−ジヒドロキシ−4−メチルシクロヘキシル)プロピオン酸、シキミ酸、3−ヒドロキシ−3,3−ジフェニルプロピオン酸、3−(2−オキソシクロヘキシル)プロピオン酸、3−シクロヘキセン−1−カルボン酸、4−シクロヘキセン−1,2−ジカルボン酸水素アルキル、シクロヘプタンカルボン酸、ノルボルネンカルボン酸、テトラシクロドデセンカルボン酸、1−アダマンタンカルボン酸、(4−トリシクロ[5.2.1.02.6]デカ−4−イル)酢酸、p−メチル安息香酸、p−エチル安息香酸、p−オクチル安息香酸、p−デシル安息香酸、p−ドデシル安息香酸、p−メトキシ安息香酸、p−エトキシ安息香酸、p−プロポキシ安息香酸、p−ブトキシ安息香酸、p−ペンチルオキシ安息香酸、p−ヘキシルオキシ安息香酸、p−フルオロ安息香酸、p−クロロ安息香酸、p−クロロメチル安息香酸、ペンタフルオロ安息香酸、ペンタクロロ安息香酸、4−アセトキシ安息香酸、2,6−ジヒドロキシ安息香酸、3,5−ジ−t−ブチル−4−ヒドロキシ安息香酸、o−ベンゾイル安息香酸、o−ニトロ安息香酸、o−(アセトキシベンゾイルオキシ)安息香酸、テレフタル酸モノメチルエステル、イソフタル酸モノメチルエステル、イソフタル酸モノシクロヘキシルエステル、フェノキシ酢酸、クロロフェノキシ酢酸、フェニルチオ酢酸、フェニル酢酸、2−オキソ−3−フェニルプロピオン酸、o−ブロモフェニル酢酸、o−ヨードフェニル酢酸、メトキシフェニル酢酸、6−フェニルヘキサン酸、ビフェニルカルボン酸、α−ナフトエ酸、β−ナフトエ酸、アントラセンカルボン酸、フェナントレンカルボン酸、アントラキノン−2−カルボン酸、インダンカルボン酸、1,4−ジオキソ−1,4−ジヒドロナフタレン−2−カルボン酸、3,3−ジフェニルプロピオン酸、ニコチン酸、イソニコチン酸、ケイ皮酸、3−メトキシケイ皮酸、4−メトキシケイ皮酸、キノリンカルボン酸等が挙げられる。これらは単独で用いても良く、2種以上を併用しても良い。特に好適な単塩基性カルボン酸(B)としては、放射線重合性官能基を導入できる不飽和基を含有するものが良く、例えば、(メタ)アクリル酸が好ましい。ここで、放射線重合性官能基とは、各種の放射線により重合反応を起こす性質を有する官能基をいう。「放射線」とは、可視光線、紫外線、遠紫外線、X線、電子線、分子線、γ線、シンクロトロン放射線、プロトンビーム線などを包含する。 The monobasic carboxylic acid (B) is not particularly limited as long as it is a compound having one carboxyl group. For example, (meth) acrylic acid, cyclopropanecarboxylic acid, 2,2,3,3-tetramethyl- 1-cyclopropanecarboxylic acid, cyclopentanecarboxylic acid, 2-cyclopentenylcarboxylic acid, 2-furancarboxylic acid, 2-tetrahydrofurancarboxylic acid, cyclohexanecarboxylic acid, 4-propylcyclohexanecarboxylic acid, 4-butylcyclohexanecarboxylic acid, -Pentylcyclohexanecarboxylic acid, 4-hexylcyclohexanecarboxylic acid, 4-heptylcyclohexanecarboxylic acid, 4-cyanocyclohexane-1-carboxylic acid, 4-hydroxycyclohexanecarboxylic acid, 1,3,4,5-tetrahydroxycyclohexane- 1- Rubonic acid, 2- (1,2-dihydroxy-4-methylcyclohexyl) propionic acid, shikimic acid, 3-hydroxy-3,3-diphenylpropionic acid, 3- (2-oxocyclohexyl) propionic acid, 3-cyclohexene- 1-carboxylic acid, alkyl hydrogen 4-cyclohexene-1,2-dicarboxylate, cycloheptanecarboxylic acid, norbornenecarboxylic acid, tetracyclododecenecarboxylic acid, 1-adamantanecarboxylic acid, (4-tricyclo [5.2.1 2.0 2.6 ] dec-4-yl) acetic acid, p-methylbenzoic acid, p-ethylbenzoic acid, p-octylbenzoic acid, p-decylbenzoic acid, p-dodecylbenzoic acid, p-methoxybenzoic acid, p-ethoxybenzoic acid, p-propoxybenzoic acid, p-butoxybenzoic acid, p-pentyloxybenzoic acid P-hexyloxybenzoic acid, p-fluorobenzoic acid, p-chlorobenzoic acid, p-chloromethylbenzoic acid, pentafluorobenzoic acid, pentachlorobenzoic acid, 4-acetoxybenzoic acid, 2,6-dihydroxybenzoic acid, 3,5-di-t-butyl-4-hydroxybenzoic acid, o-benzoylbenzoic acid, o-nitrobenzoic acid, o- (acetoxybenzoyloxy) benzoic acid, terephthalic acid monomethyl ester, isophthalic acid monomethyl ester, isophthalic acid Monocyclohexyl ester, phenoxyacetic acid, chlorophenoxyacetic acid, phenylthioacetic acid, phenylacetic acid, 2-oxo-3-phenylpropionic acid, o-bromophenylacetic acid, o-iodophenylacetic acid, methoxyphenylacetic acid, 6-phenylhexanoic acid, biphenyl Carboxylic acid, α- Phthoic acid, β-naphthoic acid, anthracene carboxylic acid, phenanthrene carboxylic acid, anthraquinone-2-carboxylic acid, indane carboxylic acid, 1,4-dioxo-1,4-dihydronaphthalene-2-carboxylic acid, 3,3-diphenyl Examples include propionic acid, nicotinic acid, isonicotinic acid, cinnamic acid, 3-methoxycinnamic acid, 4-methoxycinnamic acid, and quinolinecarboxylic acid. These may be used alone or in combination of two or more. Particularly preferred monobasic carboxylic acids (B) are those containing an unsaturated group capable of introducing a radiation-polymerizable functional group, and for example, (meth) acrylic acid is preferred. Here, the radiation polymerizable functional group refers to a functional group having a property of causing a polymerization reaction by various radiations. “Radiation” includes visible light, ultraviolet light, far ultraviolet light, X-rays, electron beams, molecular beams, γ-rays, synchrotron radiation, proton beam rays, and the like.
グリシジルエステル化合物(D)としては、特に限定されないが、例えば、(メタ)アクリル酸グリシジル、酢酸グリシジル、酪酸グリシジル、安息香酸グリシジル、p−エチル安息香酸グリシジル、(テレ)フタル酸グリシジル等が挙げられる。これらは単独で用いても良く、2種以上を併用しても良い。これらの中では、単塩基性カルボン酸グリシジルが特に好適であり、中でも放射線重合性官能基を導入できる不飽和基を含有するものが良く、例えば、(メタ)アクリル酸グリシジルが好ましい。 Although it does not specifically limit as a glycidyl ester compound (D), For example, glycidyl (meth) acrylate, glycidyl acetate, glycidyl butyrate, glycidyl benzoate, glycidyl p-ethylbenzoate, glycidyl (tere) phthalate, etc. are mentioned. . These may be used alone or in combination of two or more. Of these, monobasic glycidyl carboxylate is particularly preferred, and those containing an unsaturated group capable of introducing a radiation-polymerizable functional group are particularly preferable. For example, glycidyl (meth) acrylate is preferred.
一般式(1)で表されるエポキシ樹脂(A)と単塩基性カルボン酸(B)との反応、及び、一般式(10)で表されるアルコール化合物(C)とグリシジルエステル化合物(D)との反応は、いずれも必要に応じて適切な溶媒を用いて、50〜120℃の温度範囲において5〜30時間行なわれる。溶媒としては、例えば、メチルセロソルブアセテート、プロピレングリコールモノメチルエーテルアセテート、エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノブチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノブチルエーテルアセテート、3−メトキシブチル−1−アセテート等のアルキレンモノアルキルエーテルアセテート類;ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールジブチルエーテル等のアルキレンモノアルキルエーテル類;メチルエチルケトン、メチルアミルケトン等のケトン類;コハク酸ジメチル、コハク酸ジエチル、アジピン酸ジエチル、マロン酸ジエチル、シュウ酸ジブチル等のエステル類等が挙げられる。これらの中では、プロピレングリコールモノメチルエーテルアセテート及び3−メトキシブチル−1−アセテートが好ましい。さらに、必要に応じて触媒及び重合禁止剤を用いることが出来る。触媒としては、例えば、ホスホニウム塩類、第4級アンモニウム塩類、ホスフィン化合物類、第3級アミン化合物類、イミダゾール化合物類等が挙げられ、その配合量は、特に限定されないが、反応物全体の0.01〜10重量%であることが好ましい。また、重合禁止剤としては、例えば、ハイドロキノン、メチルハイドロキノン、ハイドロキノンモノメチルエーテル、4−メチルキノリン、フェノチアジン、2,6−ジイソブチルフェノール、2,6−ジ−tert−ブチル−4−メチルフェノール等が挙げられ、その配合量は、通常、反応物全体の5重量%以下である。 Reaction of the epoxy resin (A) represented by the general formula (1) with the monobasic carboxylic acid (B), and the alcohol compound (C) and the glycidyl ester compound (D) represented by the general formula (10) Are carried out in a temperature range of 50 to 120 ° C. for 5 to 30 hours using a suitable solvent as required. Examples of the solvent include alkylene such as methyl cellosolve acetate, propylene glycol monomethyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, and 3-methoxybutyl-1-acetate. Monoalkyl ether acetates; alkylene monoalkyl ethers such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether and diethylene glycol dibutyl ether; ketones such as methyl ethyl ketone and methyl amyl ketone; dimethyl succinate, diethyl succinate, diethyl adipate, malonic acid Diethyl, oxalic acid Esters such as butyl and the like. Of these, propylene glycol monomethyl ether acetate and 3-methoxybutyl-1-acetate are preferred. Further, a catalyst and a polymerization inhibitor can be used as needed. Examples of the catalyst include phosphonium salts, quaternary ammonium salts, phosphine compounds, tertiary amine compounds, imidazole compounds, and the like. The amount of the catalyst is not particularly limited, but is not particularly limited. It is preferably from 0.01 to 10% by weight. Examples of the polymerization inhibitor include hydroquinone, methylhydroquinone, hydroquinone monomethyl ether, 4-methylquinoline, phenothiazine, 2,6-diisobutylphenol, 2,6-di-tert-butyl-4-methylphenol and the like. The amount is usually not more than 5% by weight of the whole reaction product.
多価カルボン酸樹脂(G)は、エポキシエステル樹脂(E)と、多塩基性カルボン酸又はその無水物(F)とを反応させることにより、得ることができる。 The polycarboxylic acid resin (G) can be obtained by reacting the epoxy ester resin (E) with a polybasic carboxylic acid or its anhydride (F).
多塩基性カルボン酸又はその無水物(F)としては、ジカルボン酸、テトラカルボン酸等の複数のカルボキシル基を有するカルボン酸又はその無水物であれば特に限定されず、例えば、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、メチルヘキサヒドロフタル酸、メチルエンドメチレンテトラヒドロフタル酸、クロレンド酸、メチルテトラヒドロフタル酸、グルタル酸等のジカルボン酸又はその無水物;トリメリット酸又はその無水物;ピロメリット酸、ベンゾフェノンテトラカルボン酸、ビフェニルテトラカルボン酸、ジフェニルエーテルテトラカルボン酸等のテトラカルボン酸又はその二無水物等が挙げられる。 The polybasic carboxylic acid or its anhydride (F) is not particularly limited as long as it is a carboxylic acid having a plurality of carboxyl groups such as dicarboxylic acid and tetracarboxylic acid or its anhydride, and examples thereof include maleic acid and succinic acid. Dicarboxylic acids such as, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, methylhexahydrophthalic acid, methylendomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, glutaric acid and anhydrides thereof; Acids or anhydrides thereof: tetracarboxylic acids such as pyromellitic acid, benzophenonetetracarboxylic acid, biphenyltetracarboxylic acid and diphenylethertetracarboxylic acid, and dianhydrides thereof.
多価カルボン酸樹脂(G)としては、例えば、下記一般式(11)又は下記一般式(12)で表される樹脂が挙げられる。 Examples of the polycarboxylic acid resin (G) include a resin represented by the following general formula (11) or the following general formula (12).
一般式(11)、(12)中、Zは、インデン、テトラリン、フルオレン、キサンテン、アントラセン、及び、ベンズアントラセンからなる群から選択される少なくとも1種に由来する縮環構造を含む二価基であり、A1、A3はテトラカルボン酸二無水物の残基、A2、A4はジカルボン酸無水物の残基である。また、u、u2は平均値であり、0から130である。 In the general formulas (11) and (12), Z is a divalent group containing a condensed ring structure derived from at least one selected from the group consisting of indene, tetralin, fluorene, xanthene, anthracene, and benzanthracene. A 1 and A 3 are residues of tetracarboxylic dianhydride, and A 2 and A 4 are residues of dicarboxylic anhydride. U and u 2 are average values, and are 0 to 130.
一般式(11)、(12)において、Zは、キサンテン又はフルオレンに由来する縮環構造を含む二価基であることが好ましい。多価カルボン酸樹脂(G)の屈折率が高く、金属酸化物微粒子との屈折率差を小さくできる点で有利なためである。 In the general formulas (11) and (12), Z is preferably a divalent group containing a condensed ring structure derived from xanthene or fluorene. This is because the polyvalent carboxylic acid resin (G) is advantageous in that the refractive index is high and the difference in refractive index from the metal oxide fine particles can be reduced.
多価カルボン酸樹脂(G)は、エポキシエステル樹脂(E)と多塩基性カルボン酸又はその無水物(F)とを反応させることにより得られる。この反応において、得られる樹脂の耐熱性や耐熱黄変性を向上させるために多価アルコール類を共存させることも出来る。 The polycarboxylic acid resin (G) is obtained by reacting the epoxy ester resin (E) with the polybasic carboxylic acid or its anhydride (F). In this reaction, a polyhydric alcohol can be coexistent to improve the heat resistance and heat yellowing resistance of the obtained resin.
多価アルコール類としては、特に限定されないが、例えば、エチレングリコール、ジエチレングリコール、1,2−プロパンジオール、1,3−プロパンジオール、ジプロピレングリコール、1,3−ブタンジオール、1,4−ブタンジオール、ネオペンチルグリコール、2−メチル−1,3−プロパンジオール、3−メチル−1,5−ペンタンジオール、1,6−ヘキサンジオール、1,6−ノナンジオール、1,9−ノナンジオール等の脂肪族ジオール、1,4−シクロヘキサンジメタノール、トリシクロデカンジメタノール、水添ビスフェノールA等の脂環式ジオール、ビスフェノールAのエチレンオキシド、プロピレンオキシド付加体等の芳香族ジオール、グリセリン、トリメチロールプロパン、トリメチロールエタン、ジトリメチロールプロパン、ペンタエリスリトール、ソルビトール、ジペンタエリスリトール等の三価以上のアルコール等が挙げられる。これらは単独で用いても良いし、2種以上を併用しても良い。 The polyhydric alcohol is not particularly limited, but for example, ethylene glycol, diethylene glycol, 1,2-propanediol, 1,3-propanediol, dipropylene glycol, 1,3-butanediol, 1,4-butanediol , Neopentyl glycol, 2-methyl-1,3-propanediol, 3-methyl-1,5-pentanediol, 1,6-hexanediol, 1,6-nonanediol, and fats such as 1,9-nonanediol Aliphatic diols, 1,4-cyclohexanedimethanol, tricyclodecanedimethanol, alicyclic diols such as hydrogenated bisphenol A, aromatic diols such as ethylene oxide and propylene oxide adducts of bisphenol A, glycerin, trimethylolpropane, Methylolethane, ditrimethy Rupuropan, pentaerythritol, sorbitol, trihydric or higher alcohols such as dipentaerythritol and the like. These may be used alone or in combination of two or more.
この反応において、エポキシエステル樹脂(E)、多価アルコール類、及び、多塩基性カルボン酸又はその無水物(F)の添加順序は特に問わない。例えば、これらを同時に混合して反応させても良いし、エポキシエステル樹脂(E)と多価アルコールとを混合し、次いで、多塩基性カルボン酸又はその無水物(F)を添加、混合しても良い。また、これらの反応生成物にさらに多塩基性カルボン酸を添加し、反応させてもよい。 In this reaction, the order of addition of the epoxy ester resin (E), the polyhydric alcohol, and the polybasic carboxylic acid or its anhydride (F) is not particularly limited. For example, these may be mixed and reacted simultaneously, or the epoxy ester resin (E) and the polyhydric alcohol may be mixed, and then the polybasic carboxylic acid or its anhydride (F) may be added and mixed. Is also good. Further, a polybasic carboxylic acid may be further added to these reaction products to cause a reaction.
多塩基性カルボン酸又はその無水物(F)の種類を適宜選択することによって、構造の異なる種々の縮環構造を有する多価カルボン酸樹脂(G−a)や、多価アルコールを反応させた多価カルボン酸樹脂(G−b)を製造することができる。具体的には、例えば、以下の(G−a−i)〜(G−a−iii)、(G−b−i)〜(G−b−iii)に示す第1〜第6の多価カルボン酸樹脂が調製されるが、これらは例示である。 By appropriately selecting the type of the polybasic carboxylic acid or its anhydride (F), a polyhydric carboxylic acid resin (Ga) having various condensed ring structures having different structures and a polyhydric alcohol were reacted. A polycarboxylic acid resin (Gb) can be produced. Specifically, for example, the first to sixth polyvalents shown in the following (Gai) to (Ga-iii), (Gbi) to (Gb-iii) Carboxylic acid resins are prepared, but these are exemplary.
(G−a−i)第1の多価カルボン酸樹脂:エポキシエステル樹脂(E)と、1種類の多塩基性カルボン酸又はその無水物(F)とを混合し、反応させて得られる樹脂;(G−a−ii)第2の多価カルボン酸樹脂:エポキシエステル樹脂(E)と、2種類以上の多塩基性カルボン酸又はその無水物(F)の混合物(例えば、ジカルボン酸無水物及びテトラカルボン酸二無水物の混合物)とを混合し、反応させて得られる樹脂;及び、(G−a−iii)第3の多価カルボン酸樹脂:エポキシエステル樹脂(E)と、テトラカルボン酸又はその二無水物とを反応させ、得られた反応生成物に、さらにジカルボン酸又はその無水物を反応させて得られる樹脂。 (Gai) First polycarboxylic acid resin: a resin obtained by mixing and reacting an epoxy ester resin (E) with one kind of polybasic carboxylic acid or its anhydride (F) (G-a-ii) a second polycarboxylic acid resin: a mixture of an epoxy ester resin (E) and two or more polybasic carboxylic acids or anhydrides (F) thereof (for example, a dicarboxylic anhydride) (G-a-iii) a third polycarboxylic acid resin: an epoxy ester resin (E) and a tetracarboxylic acid resin. A resin obtained by reacting an acid or a dianhydride thereof and reacting the obtained reaction product with a dicarboxylic acid or an anhydride thereof.
(G−b−i)第4の多価カルボン酸樹脂:エポキシエステル樹脂(E)と、多価アルコールと、1種類の多塩基性カルボン酸又はその無水物(F)とを混合し、反応させて得られる樹脂;(G−b−ii)第5の多価カルボン酸樹脂:エポキシエステル樹脂(E)と、多価アルコールと、2種類以上の多塩基性カルボン酸又はその無水物(F)の混合物(例えば、ジカルボン酸無水物及びテトラカルボン酸二無水物の混合物)とを混合し、反応させて得られる樹脂;及び、(G−b−iii)第6の多価カルボン酸樹脂:エポキシエステル樹脂(E)と、多価アルコールと、テトラカルボン酸又はその二無水物とを反応させ、得られた反応生成物に、さらにジカルボン酸又はその無水物を反応させて得られる樹脂。 (G-bi) Fourth polycarboxylic acid resin: an epoxy ester resin (E), a polyhydric alcohol, and one kind of polybasic carboxylic acid or its anhydride (F) are mixed and reacted. (G-b-ii) Fifth polycarboxylic acid resin: epoxy ester resin (E), polyhydric alcohol, and two or more kinds of polybasic carboxylic acids or anhydrides thereof (F-b-ii). ) (E.g., a mixture of dicarboxylic anhydride and tetracarboxylic dianhydride), and a resin obtained by reacting the mixture; and (G-b-iii) a sixth polycarboxylic acid resin: A resin obtained by reacting an epoxy ester resin (E), a polyhydric alcohol, and a tetracarboxylic acid or a dianhydride thereof, and further reacting the obtained reaction product with a dicarboxylic acid or an anhydride thereof.
このようにして得られる、構造の異なる種々の縮環構造を有する多価カルボン酸樹脂(G−a)又は(G−b)は、それぞれ、目的の用途に応じて利用される。 The polyvalent carboxylic acid resin (Ga) or (Gb) thus obtained having various condensed ring structures having different structures is used depending on the intended use.
なお、「多塩基性カルボン酸又はその無水物(F)」とは、「特定の多塩基性カルボン酸及びそれに対応する無水物のうちの少なくとも一方」という意味であり、例えば、多塩基性カルボン酸がフタル酸であれば、フタル酸及びフタル酸無水物のうちの少なくとも一方を指していう。また、「2種類以上の多塩基性カルボン酸又はその無水物(F)の混合物」とは、少なくとも2種類の多塩基性カルボン酸又はその無水物が同時に存在することをいう。従って、(G−a−ii)及び(G−b−ii)の方法においては、少なくとも2種類の多塩基性カルボン酸又はその無水物(F)が反応に関与する。 In addition, "polybasic carboxylic acid or its anhydride (F)" means "at least one of a specific polybasic carboxylic acid and its corresponding anhydride". If the acid is phthalic acid, it refers to at least one of phthalic acid and phthalic anhydride. Further, “a mixture of two or more kinds of polybasic carboxylic acids or anhydrides (F) thereof” means that at least two kinds of polybasic carboxylic acids or anhydrides thereof are present at the same time. Therefore, in the methods (G-a-ii) and (G-b-ii), at least two kinds of polybasic carboxylic acids or their anhydrides (F) participate in the reaction.
多価カルボン酸樹脂(G)は、上記いずれの方法においても、エポキシエステル樹脂(E)、多価アルコール、多塩基性カルボン酸又はその無水物(F)を、上記例示の方法(順序)で溶媒に溶解(懸濁)し、加熱して反応させることにより製造される。溶媒としては、例えば、エチルセロソルブアセテート、ブチルセロソルブアセテート等のセロソルブ系溶媒、プロピレングリコールモノメチルエーテルアセテート、3−メトキシブチルアセテート等のアルキレングリコールモノアルキルエーテル類と酢酸とのエステル系溶媒、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン系溶媒等が挙げられる。また、必要に応じて触媒を添加することが出来る。触媒としては、例えば、ホスホニウム塩類、第4級アンモニウム塩類、ホスフィン化合物類、第3級アミン化合物類、イミダゾール化合物類が挙げられ、その配合量は、特に限定されないが、反応物全体の0.01〜10重量%であることが好ましい。 In any of the above methods, the polycarboxylic acid resin (G) is obtained by converting the epoxy ester resin (E), the polyhydric alcohol, the polybasic carboxylic acid or its anhydride (F) by the method (order) exemplified above. It is produced by dissolving (suspending) in a solvent and reacting by heating. As the solvent, for example, ethyl cellosolve acetate, cellosolve solvents such as butyl cellosolve acetate, propylene glycol monomethyl ether acetate, ester solvents of alkylene glycol monoalkyl ethers such as 3-methoxybutyl acetate and acetic acid, methyl ethyl ketone, methyl isobutyl ketone And ketone solvents such as cyclohexanone. Further, a catalyst can be added as needed. Examples of the catalyst include phosphonium salts, quaternary ammonium salts, phosphine compounds, tertiary amine compounds, imidazole compounds, and the amount thereof is not particularly limited. It is preferably from 10 to 10% by weight.
上記反応の反応温度は、特に限定されないが、50〜130℃であることが好ましく、70〜120℃であることがより好ましい。反応温度が50℃未満では反応がスムーズに進行せず、未反応の多塩基性カルボン酸又はその無水物(F)が残存することがある。一方、130℃を超えると、カルボキシル基と水酸基の縮合が一部起こり、急激に分子量が増大することがある。 The reaction temperature of the above reaction is not particularly limited, but is preferably from 50 to 130 ° C, more preferably from 70 to 120 ° C. When the reaction temperature is lower than 50 ° C., the reaction does not proceed smoothly, and unreacted polybasic carboxylic acid or its anhydride (F) may remain. On the other hand, when the temperature exceeds 130 ° C., condensation of a carboxyl group and a hydroxyl group partially occurs, and the molecular weight may increase rapidly.
多価カルボン酸樹脂(G)の製造において、多価アルコールを使用する場合、エポキシエステル樹脂(E)の水酸基と多価アルコールの水酸基とのモル比(エポキシエステル樹脂(E)の水酸基/多価アルコールの水酸基)は、特に限定されないが、99/1〜50/50であることが好ましく、95/5〜60/40であることがより好ましい。多価アルコールの水酸基のモル比が50を超えると、多価カルボン酸樹脂(G)の分子量が急激に増大し、ゲル化の恐れがある。また、モル比が1未満では、耐熱性や耐熱変色性を向上させにくい傾向がある。 When a polyhydric alcohol is used in the production of the polyhydric carboxylic acid resin (G), the molar ratio of the hydroxyl group of the epoxy ester resin (E) to the hydroxyl group of the polyhydric alcohol (hydroxyl / polyhydric of the epoxy ester resin (E)) Although the hydroxyl group of the alcohol is not particularly limited, it is preferably from 99/1 to 50/50, and more preferably from 95/5 to 60/40. When the molar ratio of the hydroxyl group of the polyhydric alcohol exceeds 50, the molecular weight of the polyvalent carboxylic acid resin (G) sharply increases, which may cause gelation. If the molar ratio is less than 1, the heat resistance and the heat discoloration resistance tend to be hardly improved.
多塩基性カルボン酸又はその無水物(F)の配合量は、特に限定されないが、エポキシエステル樹脂(E)の水酸基(多価アルコールを使用する場合は、多価アルコールの水酸基との合計)1当量(モル)に対して、酸無水物基換算で0.1〜1当量であることが好ましく、0.4〜1当量であることがより好ましい。配合量が0.1当量未満では、多価カルボン酸樹脂(G)の分子量が充分高くならず、多価カルボン酸樹脂(G)を含む光学用組成物の硬化物の耐熱性が不充分となったり、現像後も光学用組成物が基板上に残存する場合がある。一方、配合量が1当量を超える場合には、未反応の多塩基性カルボン酸又はその無水物(F)が残存し、多価カルボン酸樹脂(G)の分子量が低くなり、多価カルボン酸樹脂(G)を含む光学用組成物の現像性が劣る場合がある。なお、酸無水物基換算とは、使用する多塩基性カルボン酸又はその無水物(F)に含まれるカルボキシル基及び酸無水物基を全て酸無水物基に換算したときの量を示す。 The blending amount of the polybasic carboxylic acid or its anhydride (F) is not particularly limited, but the hydroxyl group of the epoxy ester resin (E) (in the case of using a polyhydric alcohol, the total number of hydroxyl groups of the polyhydric alcohol) is 1 It is preferably 0.1 to 1 equivalent, more preferably 0.4 to 1 equivalent in terms of an acid anhydride group, based on the equivalent (mol). If the compounding amount is less than 0.1 equivalent, the molecular weight of the polyvalent carboxylic acid resin (G) will not be sufficiently high, and the heat resistance of the cured product of the optical composition containing the polyvalent carboxylic acid resin (G) will be insufficient. Or the optical composition may remain on the substrate after development. On the other hand, when the compounding amount exceeds 1 equivalent, unreacted polybasic carboxylic acid or its anhydride (F) remains, the molecular weight of the polyvalent carboxylic acid resin (G) decreases, and The developability of the optical composition containing the resin (G) may be poor. The term "acid anhydride group conversion" refers to the amount when all the carboxyl groups and acid anhydride groups contained in the polybasic carboxylic acid or its anhydride (F) used are converted into acid anhydride groups.
第2、第3、第5、第6の多価カルボン酸樹脂(G)の製造に際しては、2種類以上の多塩基性カルボン酸又はその無水物(F)を用いる。一般的には、ジカルボン酸無水物とテトラカルボン酸二無水物とが用いられる。ジカルボン酸無水物とテトラカルボン酸二無水物との割合(ジカルボン酸無水物/テトラカルボン酸二無水物)は、モル比で1/99〜90/10であることが好ましく、5/95〜80/20であることがより好ましい。ジカルボン酸無水物の割合が1未満では、樹脂粘度が高くなり、作業性が低下するおそれがある。また、多価カルボン酸樹脂(G)の分子量が大きくなりすぎるため、多価カルボン酸樹脂(G)を含む光学用組成物を用いて基板上に塗膜を形成し、露光を行った場合に、露光部が現像液に溶解しにくくなり、目的のパターンが得られにくくなる傾向にある。一方、ジカルボン酸無水物の割合が90を超えると、多価カルボン酸樹脂(G)の分子量が小さくなりすぎるため、多価カルボン酸樹脂(G)を含む光学用組成物を用いて基板上に塗膜を形成した際に、プリベーク後の塗膜にスティッキングが残るなどの問題が生じやすくなる。 In producing the second, third, fifth, and sixth polycarboxylic acid resins (G), two or more kinds of polybasic carboxylic acids or anhydrides (F) thereof are used. Generally, dicarboxylic anhydride and tetracarboxylic dianhydride are used. The ratio of dicarboxylic anhydride to tetracarboxylic dianhydride (dicarboxylic anhydride / tetracarboxylic dianhydride) is preferably from 1/99 to 90/10, and preferably from 5/95 to 80 / molar. / 20 is more preferable. If the ratio of the dicarboxylic anhydride is less than 1, the viscosity of the resin increases, and the workability may be reduced. In addition, since the molecular weight of the polyvalent carboxylic acid resin (G) is too large, when a coating film is formed on a substrate using an optical composition containing the polyvalent carboxylic acid resin (G) and exposure is performed. In addition, the exposed portion is less likely to be dissolved in the developer, and the desired pattern tends to be hardly obtained. On the other hand, if the ratio of the dicarboxylic anhydride exceeds 90, the molecular weight of the polyvalent carboxylic acid resin (G) becomes too small. When a coating film is formed, problems such as sticking remaining in the coating film after prebaking are likely to occur.
本発明の光学用組成物において、多価カルボン酸樹脂(G)は、放射線重合性官能基を含有することが好ましく、具体的には、(メタ)アクリロイル基などの不飽和基を含有することが好ましい。多価カルボン酸樹脂(G)が放射線重合性官能基を含有する樹脂である場合、本発明の光学用組成物は光硬化性を有するため、感光性複合樹脂組成物(H)として利用することが出来る。ここで、感光性とは、各種の放射線により化学反応を起す性質を言い、このような放射線としては、波長の長いものから順に、可視光線、紫外線、電子線、X線、α線、β線、およびγ線が挙げられる。これらの中で、経済性および効率性の点から、実用的には、紫外線が最も好ましい放射線である。紫外線としては、低圧水銀灯、高圧水銀灯、超高圧水銀灯、アーク灯、キセノンランプなどのランプから発振される紫外光を好適に使用することができる。紫外線よりも波長の短い放射線は、化学反応性が高く、理論的には紫外線より優れているが、経済性の観点から紫外線が実用的である。 In the optical composition of the present invention, the polycarboxylic acid resin (G) preferably contains a radiation-polymerizable functional group, and specifically contains an unsaturated group such as a (meth) acryloyl group. Is preferred. When the polycarboxylic acid resin (G) is a resin containing a radiation-polymerizable functional group, the optical composition of the present invention has photocurability, so that it is used as the photosensitive composite resin composition (H). Can be done. Here, the term “photosensitivity” refers to the property of causing a chemical reaction by various types of radiation, and such radiations include visible rays, ultraviolet rays, electron beams, X-rays, α-rays, and β-rays in order of wavelength. , And γ-rays. Of these, ultraviolet rays are the most preferable radiation in practical terms from the viewpoint of economy and efficiency. Ultraviolet light oscillated from a lamp such as a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, an arc lamp, and a xenon lamp can be suitably used as the ultraviolet light. Radiation having a shorter wavelength than ultraviolet light has high chemical reactivity and is theoretically superior to ultraviolet light, but ultraviolet light is practical from the viewpoint of economy.
バインダー樹脂の含有量は、特に限定されないが、本発明の光学用組成物中、上記金属酸化物微粒子100重量部に対して10〜100重量部であることが好ましく、15〜50重量部であることがより好ましい。
バインダー樹脂の含有量が10重量部未満であると、成膜時に微粒子が凝集し、膜にクラックが入ることがあり、また、100重量部を超えると、屈折率が十分に高くならないことがある。
The content of the binder resin is not particularly limited, but is preferably 10 to 100 parts by weight, and more preferably 15 to 50 parts by weight, based on 100 parts by weight of the metal oxide fine particles in the optical composition of the present invention. Is more preferable.
If the content of the binder resin is less than 10 parts by weight, fine particles may aggregate during film formation and cracks may be formed in the film, and if it exceeds 100 parts by weight, the refractive index may not be sufficiently high. .
なお、本発明の光学用組成物は、バインダー樹脂として上述のものを使用するが、硬化物とした際、これらのバインダー樹脂は比較的高い屈折率を示すため、上記バインダー樹脂を使用することで、上記金属酸化物微粒子の使用量を減らせる結果、アウトガス量の発生を低減できる利点がある。
また、本発明の光学用組成物において、上記バインダー樹脂は上記金属酸化物微粒子の分散剤としても作用するため、後述の分散剤を使用しないか、又は使用したとしてもその使用量を減らすことができるため、光学デバイスとした際の屈折率の低下等の不都合を回避することができる利点がある。
In addition, the optical composition of the present invention uses the above-mentioned binder resin as a binder resin.When a cured product is obtained, these binder resins exhibit a relatively high refractive index. As a result, the use amount of the metal oxide fine particles can be reduced, so that there is an advantage that the generation of the outgas amount can be reduced.
Further, in the optical composition of the present invention, since the binder resin also acts as a dispersant for the metal oxide fine particles, the dispersant described below is not used, or even if used, the amount of the dispersant can be reduced. Therefore, there is an advantage that inconveniences such as a decrease in the refractive index of an optical device can be avoided.
(溶媒)
上記溶媒としては、特に限定されず、例えば、メタノール、エタノール等のアルコール類;テトラヒドロフラン等のエーテル類;エチレングリコールモノメチルエーテル、エチレングリコールジメチルエーテル、エチレングリコールメチルエチルエーテル、エチレングリコールモノエチルエーテル等のエチレングリコールエーテル類;メチルセロソルブアセテート、エチルセロソルブアセテート等のエチレングリコールアルキルエーテルアセテート類;ジエチレングリコールジエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールジブチルエーテル、ジエチレングリコールエチルメチルエーテル等のジエチレングリコールジアルキルエーテル類;ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル等のジエチレングリコールモノアルキルエーテル類;プロピレングリコールモノメチルエーテル等のプロピレングリコールモノアルキルエーテル類;プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノブチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノブチルエーテルアセテート、3−メトキシブチル−1−アセテート等のアルキレングリコールモノアルキルエーテルアセテート類;トルエン、キシレン等の芳香族炭化水素類;メチルエチルケトン、メチルアミルケトン、シクロヘキサノン、4−ヒドロキシ−4−メチル−2−ペンタノン等のケトン類;2−ヒドロキシプロピオン酸エチル、2−ヒドロキシ−2−メチルプロピオン酸メチル、2−ヒドロキシ−2−メチルプロピオン酸エチル、エトキシ酢酸エチル、ヒドロキシ酢酸エチル、2−ヒドロキシ−2−メチルブタン酸メチル、3−メトキシプロピオン酸メチル、3−メトキシプロピオン酸エチル、3−エトキシプロピオン酸メチル、3−エトキシプロピオン酸エチル、酢酸エチル、酢酸ブチル、乳酸メチル、乳酸エチル、コハク酸ジメチル、コハク酸ジエチル、アジピン酸ジエチル、マロン酸ジエチル、シュウ酸ジブチル等のエステル類等が挙げられる。これらの中では、エチレングリコールエーテル類、アルキレングリコールモノアルキルエーテルアセテート類、ジエチレングリコールジアルキルエーテル類、ケトン類及びエステル類が好ましく、3−エトキシプロピオン酸エチル、乳酸エチル、プロピレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート及びメチルアミルケトンがより好ましく使用される。これらの溶媒は単独で用いてもよいし、2種以上を併用してもよい。
(solvent)
The solvent is not particularly limited and includes, for example, alcohols such as methanol and ethanol; ethers such as tetrahydrofuran; ethylene glycol such as ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, ethylene glycol methyl ethyl ether, and ethylene glycol monoethyl ether. Ethers; ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; diethylene glycol dialkyl ethers such as diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol dibutyl ether, diethylene glycol ethyl methyl ether; diethylene glycol monomethyl ether, diethylene glycol Diethylene glycol monoalkyl ethers such as noethyl ether and diethylene glycol monobutyl ether; propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether; propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate and ethylene glycol mono Alkylene glycol monoalkyl ether acetates such as butyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate and 3-methoxybutyl-1-acetate; aromatic hydrocarbons such as toluene and xylene; methyl ethyl ketone, methyl amyl ketone, cyclo Ketones such as xanone, 4-hydroxy-4-methyl-2-pentanone; ethyl 2-hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl ethoxyacetate , Ethyl hydroxyacetate, methyl 2-hydroxy-2-methylbutanoate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl acetate, butyl acetate, lactic acid Esters such as methyl, ethyl lactate, dimethyl succinate, diethyl succinate, diethyl adipate, diethyl malonate, dibutyl oxalate and the like can be mentioned. Of these, ethylene glycol ethers, alkylene glycol monoalkyl ether acetates, diethylene glycol dialkyl ethers, ketones and esters are preferred, and ethyl 3-ethoxypropionate, ethyl lactate, propylene glycol monomethyl ether acetate, diethylene glycol monoethyl. Ether acetate and methyl amyl ketone are more preferably used. These solvents may be used alone or in combination of two or more.
溶媒の含有量は、特に限定されないが、本発明の光学用組成物中に5〜95重量%であることが好ましく、30〜90重量%であることがより好ましい。
溶媒の含有量が5重量%未満であると、分散状態の維持が難しくなることがあり、また、95重量%を超えると、厚膜化が難しくなることがある。
The content of the solvent is not particularly limited, but is preferably from 5 to 95% by weight, more preferably from 30 to 90% by weight, in the optical composition of the present invention.
If the content of the solvent is less than 5% by weight, it may be difficult to maintain a dispersed state, and if it exceeds 95% by weight, it may be difficult to form a thick film.
本発明の光学用組成物は、金属酸化物微粒子、バインダー樹脂及び溶媒以外に、必要に応じて、分散剤、硬化剤等の任意成分を含有していてもよい。 The optical composition of the present invention may contain optional components such as a dispersant and a curing agent, as required, in addition to the metal oxide fine particles, the binder resin, and the solvent.
(分散剤)
分散剤としては、特に限定されず、例えば、ポリアクリル酸系分散剤、ポリカルボン酸系分散剤、リン酸系分散剤、シリコン系分散剤等が挙げられる。これらの分散剤は、単独で使用しても良く、2種以上を併用しても良い。
本発明の光学用組成物が分散剤を含有する場合、その含有量は、金属酸化物微粒子100重量部に対して、10重量部以下が好ましく、5重量部以下がより好ましい。
(Dispersant)
The dispersant is not particularly limited, and examples thereof include a polyacrylic acid-based dispersant, a polycarboxylic acid-based dispersant, a phosphoric acid-based dispersant, and a silicon-based dispersant. These dispersants may be used alone or in combination of two or more.
When the optical composition of the present invention contains a dispersant, the content is preferably 10 parts by weight or less, more preferably 5 parts by weight or less based on 100 parts by weight of the metal oxide fine particles.
(硬化剤)
硬化剤としては、特に限定されず、例えば、α−アミノアルキルフェノン系の光重合開始剤等が挙げられる。これらの硬化剤は、単独で使用しても良く、2種以上を併用しても良い。
本発明の光学用組成物が硬化剤を含有する場合、その含有量は、バインダー樹脂100重量部に対して、0.1〜20重量部が好ましく、1〜10重量部がより好ましい。
(Curing agent)
The curing agent is not particularly limited, and examples thereof include α-aminoalkylphenone-based photopolymerization initiators. These curing agents may be used alone or in combination of two or more.
When the optical composition of the present invention contains a curing agent, the content is preferably 0.1 to 20 parts by weight, more preferably 1 to 10 parts by weight, based on 100 parts by weight of the binder resin.
本発明の光学用組成物は、基板上に塗布し、溶媒を除去することで得られた厚み1μmの膜の含水量が、昇温脱離ガス分析装置を用いて、1.0×10−8〜3.5×10−7Paの減圧度で、室温から毎分10℃ずつ200℃まで昇温し30分保持することで測定した場合に、3.0×10−7mol/cm2以下である。
含水量が3.0×10−7mol/cm2以下であることにより、水分の存在が原因となるアウトガスの発生が低いレベルに留まるため、このアウトガスの発生が性能低下を引き起こすことが懸念される光学部材や光学デバイスに好適に用いることができる。
なお、本明細書において、「溶媒を除去する」とは、基材に光学用組成物を塗布後、1分間〜1時間、80〜200℃の加熱処理を行うことをいう。
上記光学用組成物の製膜後の含水量は、用いる金属酸化物微粒子の平均1次粒子径、組成等を適宜選択することにより、制御することができる。
The optical composition of the present invention was applied on a substrate, and the water content of a 1 μm-thick film obtained by removing the solvent was adjusted to 1.0 × 10 − by using a thermal desorption gas analyzer. 3.0 × 10 −7 mol / cm 2 when measured by raising the temperature from room temperature to 200 ° C. at a rate of 10 ° C. per minute at a reduced pressure of 8 to 3.5 × 10 −7 Pa and holding for 30 minutes. It is as follows.
When the water content is 3.0 × 10 −7 mol / cm 2 or less, the generation of outgas due to the presence of water remains at a low level, and there is a concern that the generation of this outgas may cause a decrease in performance. It can be suitably used for optical members and optical devices.
In addition, in this specification, "removing a solvent" means performing a heat treatment at 80 to 200 ° C. for 1 minute to 1 hour after applying the optical composition to a substrate.
The water content of the optical composition after film formation can be controlled by appropriately selecting the average primary particle diameter, the composition, and the like of the metal oxide fine particles to be used.
本発明の光学用組成物を用いて得られた薄膜又は成形体の屈折率は、特に限定されないが、1.6〜2.1であることが好ましい。上記薄膜又は成形体の屈折率は、本発明の光学用組成物が含有する金属酸化物微粒子の平均1次粒子径、バインダー樹脂の配合量等を適宜選択することにより、制御することができる。 The refractive index of the thin film or molded product obtained by using the optical composition of the present invention is not particularly limited, but is preferably from 1.6 to 2.1. The refractive index of the thin film or molded article can be controlled by appropriately selecting the average primary particle diameter of the metal oxide fine particles contained in the optical composition of the present invention, the amount of the binder resin, and the like.
上記光学用組成物の製造方法は特に限定されず、各成分を同時に添加し混合してもよいし、溶媒に他の成分を添加し混合する操作を逐次行ってもよい。また、例えば、金属酸化物微粒子として、2種以上の金属酸化物微粒子を含有する場合は、各金属酸化物微粒子の分散体を同時に又は別々に溶媒に分散させてもよい。 The method for producing the optical composition is not particularly limited, and the components may be added and mixed at the same time, or the operation of adding and mixing other components to the solvent may be sequentially performed. Further, for example, when two or more kinds of metal oxide fine particles are contained as the metal oxide fine particles, a dispersion of each metal oxide fine particle may be dispersed simultaneously or separately in a solvent.
[2]薄膜、成形体及び光学デバイス
上記光学用組成物は、アウトガスの発生の少ない高屈折率材料とすることができるため、光学部材、薄膜や成形体の形で、光学デバイスに極めて好適に用いることができる。
特に、本発明の光学用組成物は、アウトガスの発生により性能が低下するおそれがあり、また、高屈折率や高透明性が要求される光学デバイスに好適に使用される。
このような光学デバイスの具体例としては、例えば、有機EL照明、有機ELディスプレイ、タッチパネル、液晶ディスプレイ、CMOSイメージセンサー等が挙げられる。
[2] Thin Film, Molded Article and Optical Device Since the above-mentioned optical composition can be a high refractive index material with little outgassing, it is extremely suitable for optical devices in the form of optical members, thin films and molded articles. Can be used.
In particular, the optical composition of the present invention may be deteriorated in performance due to generation of outgas, and is suitably used for an optical device that requires a high refractive index and high transparency.
Specific examples of such optical devices include, for example, organic EL lighting, organic EL displays, touch panels, liquid crystal displays, CMOS image sensors, and the like.
以下、光学デバイスが有機EL照明である場合を例に本発明の光学デバイスについてさらに説明する。
有機EL照明は、有機EL素子層とその上に積層された透明電極層及びガラス層とを備えている。そして、有機EL素子層及び透明電極層の屈折率(1.9〜2.0)とガラス層の屈折率(約1.5)とが大きく異なることに起因して光取り出し効率が低くなる。
そのため、本発明の光学デバイスに係る有機EL照明では、上記透明電極層と上記ガラス層との間に高屈折率膜が配設されており、この高屈折率膜が本発明の光学用組成物を用いて形成されている。そのため、上記有機EL照明は光取り出し効率に優れている。
また、有機EL素子は水分により性能低下の悪影響を受けるが上記高屈折率膜はアウトガスの発生が少ないため、上記不都合を回避することができる。
なお、上記有機EL照明において、高屈折率膜の屈折率は、有機EL素子層及び透明電極層の屈折率に近いことが好ましい。
なお、上記光学デバイスは、有機EL照明に限定されるわけではなく、高屈折率膜を備えた光学デバイスであればよい。
Hereinafter, the optical device of the present invention will be further described with an example in which the optical device is an organic EL illumination.
The organic EL lighting includes an organic EL element layer, a transparent electrode layer and a glass layer laminated thereon. Then, the light extraction efficiency is reduced due to a large difference between the refractive index (1.9 to 2.0) of the organic EL element layer and the transparent electrode layer and the refractive index (about 1.5) of the glass layer.
Therefore, in the organic EL lighting according to the optical device of the present invention, a high refractive index film is provided between the transparent electrode layer and the glass layer, and the high refractive index film is formed of the optical composition of the present invention. It is formed using. Therefore, the organic EL lighting is excellent in light extraction efficiency.
The performance of the organic EL element is adversely affected by the moisture, but the high refractive index film generates less outgas, so that the above-mentioned disadvantage can be avoided.
In the organic EL lighting, the refractive index of the high refractive index film is preferably close to the refractive index of the organic EL element layer and the transparent electrode layer.
The optical device is not limited to the organic EL illumination, but may be any optical device provided with a high refractive index film.
上記光学デバイスにおける、上記高屈折率膜は、下記の方法により形成することができる。
すなわち、本発明の光学用組成物を従来公知の種々の方法にて塗布し、その後、組成に応じた加熱処理(乾燥又は硬化処理)や電離放射線の照射を行うことにより形成することができる。
The high refractive index film in the optical device can be formed by the following method.
That is, it can be formed by applying the optical composition of the present invention by various conventionally known methods, and then performing a heating treatment (drying or curing treatment) or irradiation with ionizing radiation according to the composition.
以下に実施例を挙げて本発明を説明するが、本発明はこれら実施例のみに限定されるものではない。 Hereinafter, the present invention will be described with reference to examples, but the present invention is not limited to only these examples.
1.使用原料
1−1.金属酸化物微粒子
酸化ジルコニウム(第一稀元素化学工業株式会社製、UEP−100、平均1次粒子径10nm)
酸化ジルコニウム(第一稀元素化学工業株式会社製、UEP−50、平均1次粒子径20nm)
酸化ジルコニウム(第一稀元素化学工業株式会社製、UEP、平均1次粒子径40nm)
酸化チタン(昭和電工株式会社製、スーパータイタニア F−6、平均1次粒子径15nm)
1. Raw material used 1-1. Metal oxide fine particles zirconium oxide (UEP-100, manufactured by Daiichi Kagaku Kagaku Kogyo Co., Ltd., average primary particle diameter 10 nm)
Zirconium oxide (UEP-50, manufactured by Daiichi Kagaku Kagaku Kogyo Co., Ltd., average primary particle diameter 20 nm)
Zirconium oxide (UEP, average primary particle diameter 40 nm, manufactured by Daiichi Kagaku Kagaku Kogyo KK)
Titanium oxide (manufactured by Showa Denko KK, Super Titania F-6, average primary particle diameter 15 nm)
1−2.溶媒
シクロヘキサノン(シノペック社製)
プロピレングリコールモノメチルエーテル(日本乳化剤株式会社製、PGME)
1-2. Solvent cyclohexanone (Sinopec)
Propylene glycol monomethyl ether (PGME, manufactured by Japan Emulsifier Co., Ltd.)
1−3.分散剤
高分子型分散剤(ビッグケミー・ジャパン株式会社製、BYK−118、有効成分100%)
1-3. Dispersant Polymeric dispersant (BYK-118, manufactured by Big Chemie Japan, 100% active ingredient)
1−4.硬化剤
2−メチル−1−(4−メチルチオフェニル)−2−モルフォリノプロパン−1−オン(BASFジャパン株式会社製、IRGACURE907)
1-4. Curing agent 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one (IRGACURE907, manufactured by BASF Japan Ltd.)
2.縮環構造含有樹脂(バインダー樹脂)の合成
(製造例1)縮環構造含有樹脂Aの合成
300ml四つ口フラスコ中に、ビスフェノールフルオレンジグリシジルエーテル(大阪ガスケミカル株式会社製:オグソールPG)115g(エポキシ当量270g/eq)、触媒としてトリエチルベンジルアンモニウムクロライド600mg、重合禁止剤として2,6−ジイソブチルフェノール30mg、及びアクリル酸36gを仕込み、これに10mL/分の速度で空気を吹き込みながら90〜100℃で加熱溶解した。次に、これを徐々に120℃まで昇温させた。溶液は透明粘稠となったがそのまま攪拌を継続した。この間、酸価を測定し、1.0mgKOH/g未満になるまで加熱攪拌を続け、淡黄色透明で固体状の縮環構造含有エポキシエステル樹脂を得た。酸価が目標に達するまで15時間を要した。この縮環構造含有エポキシエステル樹脂に、プロピレングリコールモノメチルエーテルアセテート(日本乳化剤社株式会製、PGMEA)65gを加えて溶解した後、無水ピロメリット酸(PMDA)15g、テトラヒドロ無水フタル酸(THPA)7.6g及び臭化テトラエチルアンモニウム0.1gを混合し、これを徐々に昇温して110〜115℃で14時間反応させた。このようにして、縮環構造含有樹脂AのPGMEA溶液を得た。酸無水物の消失はIRスペクトルにより確認した。また、この縮環構造含有樹脂Aは、上記多価カルボン酸樹脂(G−a−ii)に相当する。
2. Synthesis of Resin Containing Condensed Ring Structure (Binder Resin) (Production Example 1) Synthesis of Resin A Containing Condensed Ring Structure In a 300 ml four-necked flask, 115 g of bisphenol full orange glycidyl ether (Oxol PG, manufactured by Osaka Gas Chemical Co., Ltd.) ( Epoxy equivalent 270 g / eq), 600 mg of triethylbenzylammonium chloride as a catalyst, 30 mg of 2,6-diisobutylphenol as a polymerization inhibitor, and 36 g of acrylic acid were charged, and 90 to 100 ° C. while blowing air at a rate of 10 mL / min. And dissolved by heating. Next, this was gradually heated to 120 ° C. Although the solution became transparent and viscous, stirring was continued as it was. During this time, the acid value was measured, and heating and stirring were continued until the acid value became less than 1.0 mgKOH / g, to obtain a pale yellow transparent solid epoxy ester resin having a condensed ring structure. It took 15 hours for the acid value to reach the target. 65 g of propylene glycol monomethyl ether acetate (manufactured by Nippon Emulsifier Co., Ltd., PGMEA) was added to and dissolved in the condensed ring structure-containing epoxy ester resin, and then 15 g of pyromellitic anhydride (PMDA) and tetrahydrophthalic anhydride (THPA) 7 were added. And 0.1 g of tetraethylammonium bromide. The mixture was gradually heated and reacted at 110 to 115 ° C. for 14 hours. In this way, a PGMEA solution of the fused ring structure-containing resin A was obtained. The disappearance of the acid anhydride was confirmed by an IR spectrum. The resin A having a condensed ring structure corresponds to the polyvalent carboxylic acid resin (G-a-ii).
3.光学用組成物
(実施例1〜4、比較例1)
表1に示す配合量で溶媒、縮環構造含有樹脂(バインダー樹脂)、分散剤を混合し、その後、金属酸化物微粒子を添加し、メディア型分散機(ビーズミル)を用いて混合し、金属酸化物微粒子を分散させ、さらに硬化剤を混合することにより光学用組成物を得た。得られた光学用組成物を用いて、後述する方法により分散後の平均粒子径、及び、塗膜の含水量を算出した。結果を表1に示す。なお、表1において、溶媒、分散剤及びバインダー樹脂の配合量は、金属酸化物微粒子100重量部に対する重量部を示し、硬化剤の配合量は、バインダー樹脂100重量部に対する重量部を示す。
3. Optical composition (Examples 1 to 4, Comparative example 1)
A solvent, a resin having a condensed ring structure (binder resin), and a dispersant are mixed in the amounts shown in Table 1, and then, metal oxide fine particles are added and mixed using a media-type dispersing machine (bead mill) to form a metal oxide. The fine particles were dispersed, and a curing agent was further mixed to obtain an optical composition. Using the obtained optical composition, the average particle diameter after dispersion and the water content of the coating film were calculated by the method described below. Table 1 shows the results. In Table 1, the compounding amounts of the solvent, the dispersant and the binder resin indicate parts by weight based on 100 parts by weight of the metal oxide fine particles, and the compounding amounts of the curing agent indicate parts by weight based on 100 parts by weight of the binder resin.
4.薄膜の形成方法
各実施例及び比較例で得られた光学用組成物を、スピンナーを用いてガラス基板上に塗布した後、90℃のホットプレート上で2分間プリベークして、厚み約1μmの塗膜を形成した。塗膜表面に、窒素雰囲気下で、250Wの高圧水銀ランプを用いて、波長405nmにて光強度9.5mW/cm2の紫外線を露光量1000mJ/cm2となるように照射し、塗膜を硬化させて薄膜を得た。得られた薄膜について、後述する方法により全光線透過率、ヘイズ値、屈折率を評価した。結果を表1に示す。
4. Method for Forming Thin Film The optical composition obtained in each of Examples and Comparative Examples was applied on a glass substrate using a spinner, and then prebaked on a hot plate at 90 ° C. for 2 minutes to obtain a coating having a thickness of about 1 μm. A film was formed. The surface of the coating film is irradiated with ultraviolet light having a light intensity of 9.5 mW / cm 2 at a wavelength of 405 nm using a high-pressure mercury lamp of 250 W under a nitrogen atmosphere so that the exposure amount becomes 1000 mJ / cm 2. After curing, a thin film was obtained. The resulting thin film was evaluated for total light transmittance, haze value, and refractive index by the methods described below. Table 1 shows the results.
5.評価方法
5−1.分散後の平均粒子径
各実施例及び比較例で得られた光学用組成物について、Malvern社製ゼータサイザーナノZSを用いて、動的光散乱法にて測定した散乱強度分布に基づきZ−平均粒子径を算出した。
5. Evaluation method 5-1. Average particle size after dispersion About the optical composition obtained in each Example and Comparative Example, Z-average was performed based on the scattering intensity distribution measured by the dynamic light scattering method using Zetasizer Nano ZS manufactured by Malvern. The particle size was calculated.
5−2.全光線透過率
スガ試験機株式会社製ヘーズメーターHZ−2を用いて測定した。
5-2. The total light transmittance was measured using a haze meter HZ-2 manufactured by Suga Test Instruments Co., Ltd.
5−3.ヘイズ値
スガ試験機株式会社製ヘーズメーターHZ−2を用いて測定した。
5-3. Haze value was measured using a haze meter HZ-2 manufactured by Suga Test Instruments Co., Ltd.
5−4.屈折率
光干渉式膜質測定機を用いて、波長633nmにおける屈折率を測定した。
5-4. The refractive index at a wavelength of 633 nm was measured using a refractive index light interference type film quality measuring device.
5−5.含水量
各実施例及び比較例で得られた光学用組成物を、スピンナーを用いてシリコン基板上に塗布した後、90℃のホットプレート上で2分間プリベークして、厚み約1μmの塗膜を形成した。塗膜表面に、窒素雰囲気下で、250Wの高圧水銀ランプを用いて、波長405nmにて光強度9.5mW/cm2の紫外線を露光量1000mJ/cm2となるように照射し、塗膜を硬化させて薄膜を得た。
次に、昇温脱離ガス分析装置(電子科学株式会社製、EMD−WA1000S/w)内に、作製した塗膜を基板ごと投入し、装置内を減圧度1.0×10−8〜3.5×10−7Paとした。
その後、装置内を室温から毎分10℃ずつ200℃まで昇温した後に30分保持し、塗膜から蒸発した水分量を測定した。
結果を表1に示した。
5-5. Water content After applying the optical compositions obtained in the respective Examples and Comparative Examples on a silicon substrate using a spinner, prebaking was performed on a hot plate at 90 ° C. for 2 minutes to form a coating film having a thickness of about 1 μm. Formed. The surface of the coating film is irradiated with ultraviolet light having a light intensity of 9.5 mW / cm 2 at a wavelength of 405 nm using a high-pressure mercury lamp of 250 W under a nitrogen atmosphere so that the exposure amount becomes 1000 mJ / cm 2. After curing, a thin film was obtained.
Next, the prepared coating film was put together with the substrate into a thermal desorption gas analyzer (manufactured by Denshi Kagaku Co., Ltd., EMD-WA1000S / w), and the inside of the apparatus was decompressed at 1.0 × 10 −8 -3 0.5 × 10 −7 Pa.
Thereafter, the inside of the apparatus was heated from room temperature to 200 ° C. at a rate of 10 ° C./min, held for 30 minutes, and the amount of water evaporated from the coating film was measured.
The results are shown in Table 1.
表1に示したように、本発明の光学用組成物によれば、高屈折率かつ高透明で、アウトガスの発生の少ない高屈折率膜を提供することができることが明らかとなった。 As shown in Table 1, according to the optical composition of the present invention, it was clarified that a high refractive index film having high refractive index, high transparency, and little outgassing can be provided.
Claims (3)
バインダー樹脂が、インデン、テトラリン、フルオレン、キサンテン、アントラセン及びベンズアントラセンからなる群より選択される少なくとも1種に由来する縮環構造を有するエポキシエステル樹脂または多価カルボン酸樹脂を含み、
基板上に塗布し、1分間〜1時間、80〜200℃の加熱処理により溶媒を除去することで得られた厚み1μmの膜の含水量は、昇温脱離ガス分析装置を用いて、1.0×10−8〜3.5×10−7Paの減圧度で、室温から毎分10℃ずつ200℃まで昇温し30分保持することで測定した場合に、3.0×10−7mol/cm2以下であり、屈折率が1.6〜2.1であることを特徴とする、光学用組成物。 An optical composition comprising 15 to 50 parts by weight of a binder resin and 100 parts by weight of zirconium oxide fine particles having an average primary particle diameter of 15 to 300 nm, and a solvent,
The binder resin comprises an epoxy ester resin or a polycarboxylic acid resin having a condensed ring structure derived from at least one selected from the group consisting of indene, tetralin, fluorene, xanthene, anthracene and benzanthracene,
The water content of the 1 μm-thick film obtained by applying the film on the substrate and removing the solvent by heat treatment at 80 to 200 ° C. for 1 minute to 1 hour was measured using a thermal desorption gas analyzer. When measured by raising the temperature from room temperature to 200 ° C. at a rate of 10 ° C. per minute at a reduced pressure of 0.0 × 10 −8 to 3.5 × 10 −7 Pa and holding for 30 minutes, 3.0 × 10 − An optical composition having a molecular weight of 7 mol / cm 2 or less and a refractive index of 1.6 to 2.1.
An optical device comprising the thin film or the molded body according to claim 2.
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