JP6687342B2 - Atomization device and atomization method - Google Patents

Description

  The present invention relates to an atomizing device and an atomizing method for atomizing a material to be atomized in a liquid material.

  In various fields such as electronic parts, chemical materials, foods, medicines, automobiles and cosmetics, atomizers for atomizing substances such as metal particles, vegetable fibers and carbon black are used. This atomizing device is provided with a discharge means such as a plunger pump and an atomizing means such as an atomizing nozzle. Alternatively, there is one having a minute flow path formed by a space connected to this small hole, a thin groove, or the like. The liquid material in which the material to be atomized such as metal particles is dispersed in the dispersion medium is ejected by the ejection means, and the ejected liquid material is sent to the atomization means from one side and passes to the other side. The material to be atomized contained in the liquid material is atomized as the liquid material passes through the atomization means from one side to the other side (see, for example, Patent Document 1 and Patent Document 2).

  The atomization devices described in Patent Document 1 and Patent Document 2 include atomization means configured by stacking two disks. Each disc has two small holes and a groove connecting these two small holes. The liquid material discharged from the discharging means and sent into the two small holes passes through the small holes at a high pressure, and then collides in the groove connecting the two small holes. In the atomization apparatus described in Patent Document 1 and Patent Document 2, the impact force, the shear force, the collision force, etc. of cavitation act on the minute flow path consisting of two small holes and grooves to atomize the substance to be atomized. It is believed to be done.

  In the atomization device described in Patent Document 1 or Patent Document 2, since the liquid material passes through the minute flow paths such as small holes and narrow grooves having a very small diameter, the atomized substance contained in the liquid material is clogged in the minute flow paths. As a result, the atomization means may be blocked. Here, if the small holes and the like in the atomizing means are made large, it becomes difficult for the material to be atomized to be clogged, and the clogging of the atomizing means can be suppressed. On the other hand, if the small holes and the like are enlarged, the pressure when the liquid material passes through the small holes and the like cannot be sufficiently secured, and there is a possibility that the atomization efficiency of the atomization means is reduced. As described above, it is difficult to prevent clogging of the atomization means without lowering the atomization efficiency, and generally, the small holes are kept to a size that can ensure the atomization efficiency, and the atomization means is blocked. In most cases, the work is done by disassembling the device to remove the finely divided material that has clogged the fine channels.

JP, 05-132567, A JP-A-02-261525

  However, the work of disassembling the apparatus and removing the finely-divided material clogged in the minute flow path is complicated, and the atomization process is interrupted during this work. When performing mass production operation with an atomization device, interruption of atomization processing means a decrease in production efficiency.Therefore, it is required to be able to recover from the interruption of atomization processing in a short time. The complexity and the time required for restoration are regarded as problems more than ever before.

  In view of the above circumstances, it is an object of the present invention to provide an atomizing device and an atomizing method that eliminate the need for disassembling and cleaning the device and can eliminate the blockage of the atomizing means in a short time.

A first atomizing device of the present invention which solves the above-mentioned object,
In an atomization device for atomizing the material to be atomized in a liquid material in which the material to be atomized is dispersed in a dispersion medium,
Discharging means for discharging the liquid material,
Atomizing means for atomizing the material to be atomized contained in the liquid material by passing the liquid material discharged by the discharging means from one side to the other side,
A backwashing liquid supply flow path connecting the discharge port of the discharge means and the other end of the atomization means,
The atomizing means is the same medium as the dispersion medium or the liquid material, which is discharged by the discharging means and has passed through the backwashing liquid supply passage, as a backwashing liquid, from the other side to the one side. der what is sent is,
The discharging means discharges the liquid material stored in the same medium as the dispersion medium or a material tank,
After performing the backwash control for sending the discharge liquid discharged from the discharge means to the atomization means from the other side, the cleaning control for sending the discharge liquid to the atomization means from the one side is executed. A control unit,
It is characterized by further comprising a first recovery flow path for returning the liquid, which has passed through the atomizing means from the one side to the other side, to the material tank during execution of the cleaning control .
A second atomizing device of the present invention which solves the above object,
In an atomization device for atomizing the material to be atomized in a liquid material in which the material to be atomized is dispersed in a dispersion medium,
Discharging means for discharging the liquid material,
Atomizing means for atomizing the material to be atomized contained in the liquid material by passing the liquid material discharged by the discharging means from one side to the other side,
A backwashing liquid supply flow path connecting the discharge port of the discharge means and the other end of the atomization means,
The atomizing means is the same medium as the dispersion medium or the liquid material, which is discharged by the discharging means and has passed through the backwashing liquid supply passage, as a backwashing liquid, from the other side to the one side. Is sent in,
The discharging means discharges the liquid material stored in the same medium as the dispersion medium or a material tank,
A control unit that executes a backwash control in which the liquid discharged from the discharge means is sent to the atomization means from the other side, and then executes a wash control in which the liquid is sent to the atomization means from the one side. When,
A second recovery passage is provided for returning the liquid, which has passed through the atomizing means from the other side to the one side, to the material tank during execution of the backwash control.
Further, as the atomization device of another aspect, in the atomization device for atomizing the atomization target in the liquid material in which the atomization target is dispersed in the dispersion medium,
Discharging means for discharging the liquid material,
By passing the liquid material discharged by the discharging means from one side to the other side, there is provided atomization means for atomizing the material to be atomized contained in the liquid material,
The atomizing means may be characterized in that the backwashing liquid is fed from the other side toward the one side.

  Here, the atomizing means passes the liquid material from one side toward the other side, so that at least one of the impact force due to cavitation, the shear force, and the collision force is applied to the liquid material. It may be one that acts on the contained substance to be atomized to atomize the substance to be atomized. Still further, the atomizing means may be one in which the liquid material discharged by the discharging means passes through a minute flow path that penetrates from the one side to the other side. Further, the fine flow path is provided with a plurality of inflow holes through which the liquid material flows into the fine flow path from one side and a plurality of outflow holes through which the liquid material flows out from the fine flow path to the other side. Good. The plurality of inflow holes and the plurality of outflow holes may be those in which the flow paths are branched or may be joined in the flow paths.

According to these atomizing devices described above , even if the atomizing means contained in the liquid material is clogged and the atomizing means is blocked, the blockage of the atomizing means is eliminated by feeding the backwash liquid. can do. As a result, the disassembling of the device, which has been performed conventionally, of disassembling the device and removing the finely-divided material clogged in the minute flow paths of the atomizing means is eliminated, and the blockage of the atomizing means can be eliminated in a short time. can do. In particular, by feeding the backwashing liquid from the other side toward the one side, it is possible to efficiently carry out the atomization target which is clogged in the minute flow path of the atomizing means to pass from the one side to the other side. Can be removed selectively.

In the atomization device of the another aspect, a backwashing liquid supply flow path is provided between the discharge port of the discharge means and the other end of the atomization means,
In the atomizing means, the same medium as the dispersion medium or the liquid material is ejected by the ejecting means, and the ejected liquid passes through the backwashing liquid supply flow path as the backwashing liquid from the other side. It may be sent toward one side.

  If the liquid material is used as the backwashing liquid, the components and the concentration are the same even if the backwashing liquid is mixed with the liquid material sent to the atomizing means from the one side toward the other side. Can be kept at If the same medium as the dispersion medium is used as the backwash liquid, the concentration does not change even when mixed with the liquid material, but the components do not change. The mixed liquid material can be used, for example, as a material that is returned to the material tank and atomized again.

Further, in the atomization device of the above-mentioned another aspect , the discharging means discharges the liquid material stored in the same medium as the dispersion medium or a material tank,
After performing the backwash control for sending the discharge liquid discharged from the discharge means to the atomization means from the other side, the cleaning control for sending the discharge liquid to the atomization means from the one side is executed. A control unit,
It is also one of the preferable embodiments that the apparatus includes a first recovery flow path for returning the liquid that has passed through the atomizing means from the one side to the other side to the material tank during the execution of the cleaning control. .

  When the liquid material is used as the backwashing liquid, at the time when the execution of the backwashing control is completed, the non-atomized substance to be atomized remains in the atomizing means or the like. Therefore, during the execution of the cleaning control, the liquid that has passed through the atomizing means from the one side to the other side is returned to the material tank by the first recovery flow path, whereby the atomizing means and the like are provided. The remaining non-atomized material to be atomized can also be returned to the material tank. As a result, it is possible to prevent the non-atomized atomized substance from being mixed with the liquid stored in the treated tank, that is, the atomized liquid in which the atomized substance has been atomized.

Furthermore, in the atomization device of the another aspect, after performing the backwash control in which the same medium as the dispersion medium or the liquid material discharged from the discharge means is fed from the other side of the atomization means, A control unit that executes a cleaning control in which the liquid discharged from the discharging unit is fed from the one side of the atomizing unit;
A first discard flow path may be provided for discarding the liquid that has passed through the atomization means from the one side to the other side during execution of the cleaning control.

  When the same medium as the dispersion medium is used for the backwash liquid, the medium remains in the atomizing means or the like when the execution of the backwash control is completed. Here, when the medium is returned to the material tank, the concentration of the liquid material stored in the material tank may change. Therefore, during the execution of the cleaning control, by discarding the liquid that has passed through the atomizing means from the one side to the other side, the concentration change of the liquid material stored in the material tank is avoided. It may be an aspect. In particular, it is preferable when it is necessary to strictly control the concentration of the liquid material stored in the material tank.

Further, in the atomization device of the above-mentioned another aspect , the discharging means discharges the liquid material stored in the same medium as the dispersion medium or a material tank,
A control unit that executes a backwash control in which the liquid discharged from the discharge means is sent to the atomization means from the other side, and then executes a wash control in which the liquid is sent to the atomization means from the one side. When,
It is also preferable to include a second recovery flow path for returning the liquid that has passed through the atomization means from the other side to the one side to the material tank during the execution of the backwash control.

  By returning the liquid to the material tank, it is possible to return the material to be atomized, which has been removed from the atomizing means by the backwashing liquid, to the material tank and atomize again.

Furthermore, in the atomization device of the another aspect, after performing a backwash control in which the same medium as the dispersion medium or the liquid material ejected from the ejection unit is fed to the atomization unit from the other side, A control unit that executes a cleaning control in which the liquid discharged from the discharging unit is sent to the atomizing unit from the one side;
A second discard flow path may be provided to discard the liquid that has passed through the atomization means from the other side to the one side during execution of the backwash control.

  By discarding the liquid, it is possible to prevent the atomization target removed by the backwashing liquid from the atomization unit from clogging the atomization unit again.

Here, a first on-off valve provided in a flow path connecting the discharge port of the discharge means and the one end of the atomization means,
A second on-off valve provided in a flow path connecting the discharge port and the other end of the atomizing means,
The control unit performs control for closing the first on-off valve and opening the second on-off valve as the backwash control, and opens the first on-off valve as the washing control and performs the control for the cleaning control. The control for closing the second opening / closing valve may be executed.

Further, the atomized material contained in the liquid material includes a treated tank for storing the atomized liquid atomized by the atomizing means,
The controller causes the liquid material to be discharged toward the one side of the atomizing means by the discharging means, and the liquid that has passed through the atomizing means from the one side to the other side is the atomized liquid. As the above, the atomization control for storing in the treated tank may be executed.

Further, between a processed flow path connecting the other end of the atomization means and the processed tank, and a first recovery flow path connecting the other end of the atomization means and the material tank. Equipped with a flow path switching valve that switches the flow path,
The control unit may execute, as the atomization control, control of opening the first opening / closing valve and closing the second opening / closing valve, and further switching the flow path switching valve to the processed flow path. .

Further, a third on-off valve provided in the second recovery flow path connecting the one end of the atomizing means and the material tank is provided,
As the control for backwashing, the first opening / closing valve is closed, the second opening / closing valve is opened, the flow path switching valve is closed, and the third opening / closing valve is opened. Control for opening the first opening / closing valve, closing the second opening / closing valve, closing the third opening / closing valve, and switching the flow path switching valve to the first recovery flow path. May be

Furthermore, in these atomizing devices described above, a blockage detecting means for detecting blockage of the atomizing means is provided,
The control unit may execute the backwashing control when the clogging detection unit detects clogging of the atomization unit.

  When the clogging detection means detects clogging of the atomization means, the backwashing control is executed, thereby eliminating the need for the backwashing control when the atomization means is not clogging and atomizing. It is possible to further reduce the processing interruption time.

  Note that the control unit may periodically execute the backwash control even if the blockage detecting unit does not detect the blockage of the atomizing unit. This enables stable long-term continuous operation.

Further, in these atomizing devices described above , the discharge means is a plunger pump,
It is preferable that the blockage detecting unit detects blockage of the atomizing unit based on a length of a stroke time of the plunger pump.

  By doing so, it becomes possible to easily detect the blockage of the atomization means.

The atomization method of the present invention which solves the above object,
In the atomization method for atomizing the material to be atomized in a liquid material in which the material to be atomized is dispersed in a dispersion medium,
Fine particles for ejecting the liquid material toward one side of the atomizing means to allow the liquid material to pass from the one side of the atomizing means to the other side and atomize the material to be atomized contained in the liquid material. Process,
The same medium as the dispersion medium or the liquid material is ejected by an ejecting means, and it has passed through a backwashing liquid supply flow path connecting the ejection port of the ejecting means and the other end of the atomizing means. the liquid discharged from said discharge detecting means, a backwash step of feeding the atomizing means towards the one side from the other side as a backwash liquid,
After performing the backwashing process, a liquid is sent from the one side toward the other side to the atomizing means, and the liquid that has passed through the atomizing means is stored in the material tank in which the liquid material is stored. And a washing step of returning .
Further, as another embodiment of the atomization method, in the atomization method for atomizing the material to be atomized in a liquid material in which the material to be atomized is dispersed in a dispersion medium,
Fine particles for ejecting the liquid material toward one side of the atomizing means to allow the liquid material to pass from the one side of the atomizing means to the other side and atomize the material to be atomized contained in the liquid material. Process,
It may be characterized in that it comprises a backwashing step of feeding the backwashing liquid from the other side toward the one side to the atomizing means.

According to these atomization methods described above, the backwashing liquid is sent from the other side toward the one side even if the atomization means contained in the liquid material is clogged and the atomization means is blocked. The backwashing step can eliminate the blockage of the atomizing means. This eliminates the need for disassembling the device and removing the finely-divided material clogged in the fine flow path, and the blockage of the fine-graining means can be eliminated in a short time.

Further, in the atomization method of the another aspect, after carrying out the backwashing step, a liquid is sent from the one side toward the other side to the atomization means, and the liquid that has passed through the atomization means is It is preferable to have a cleaning step of discarding or returning to the material tank in which the liquid material is stored.

  Immediately after carrying out the backwashing step, there are cases where the non-atomized material to be atomized remains in the atomization means or the like. Therefore, it is preferable to discard the liquid that has passed through the atomizing means or return it to the material tank by performing the cleaning step. As a result, it is possible to prevent the non-atomized object to be atomized from being mixed with the atomized object to be atomized stored in the treated tank or the like.

Furthermore, in these atomizing methods described above , the backwashing step may be performed again after the washing step.

  By doing this, even when the blockage of the atomizing means is not eliminated by the backwashing process once, the backwashing process is performed again after the washing process is performed. It becomes possible to eliminate the blockage.

  The backwashing step is not limited to a mode in which the backwashing step is repeated once after the washing step is performed, and the washing step and the backwashing step may be repeated a plurality of times.

  According to the present invention, it is possible to provide an atomization device and an atomization method that can eliminate the work of disassembling and cleaning the device and can eliminate the blockage of the atomization means in a short time.

(A) is a system diagram which shows the atomization apparatus which is one Embodiment of this invention. (B) is a figure which shows typically the internal structure of the atomization nozzle shown to (a). It is a systematic diagram which shows the flow of the liquid of a backwash process in the atomization apparatus shown to Fig.1 (a). It is a systematic diagram which shows the flow of the liquid of a washing process in the atomization apparatus shown to Fig.1 (a). It is a block diagram showing an example of a circuit configuration in the atomization apparatus shown in FIG. It is a flowchart showing the atomization method using the atomization apparatus shown to Fig.1 (a). It is a systematic diagram which shows 2nd Embodiment in the atomizer of this invention.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. The atomization device which is one embodiment of the present invention atomizes an object to be atomized dispersed in a dispersion medium of a liquid material. Atomization equipment is used in the fields of semiconductors, electronic devices, cosmetics, foods, pharmaceuticals, etc., and specific applications include atomization and dispersion treatment of particles of titanium oxide, aluminum hydroxide, carbon black, etc. Can be illustrated. Further, an atomizer is also used for producing cellulose nanofibers.

  FIG. 1A is a system diagram showing an atomization device 10 according to an embodiment of the present invention.

  As shown in FIG. 1A, the atomizer 10 includes a material tank 2, a plunger pump 3, a manifold 41 on one side, a pair of atomizing nozzles 5 and 5, a manifold 42 on the other side, a heat exchanger 6, and a treated It is equipped with a tank 7. These members are connected by flow passages 81 to 86 formed of pipes, and the flow passages 81 to 86 are provided with check valves CV, CV, open / close valves V1 to V3, a switching valve SV, and the like.

  The material tank 2 stores the liquid material, and is connected to the plunger pump 3 by the first supply passage 81. The liquid material stored in the material tank 2 flows through the first supply passage 81 and is sent to the plunger pump 3. A check valve CV is provided in the first supply passage 81 to prevent backflow from the plunger pump 3 to the material tank 2. In addition, a liquid feed pump for feeding the liquid material stored in the material tank 2 may be provided in the first supply passage 81.

  As the plunger pump 3, a plunger pump driven by a hydraulic cylinder can be used. The plunger pump 3 includes a cylinder 31, a plunger 32 that reciprocates in the cylinder 31, and a limit switch 33 that detects the position of the plunger 32. The cylinder 31 has a discharge port 31a that discharges a liquid material. ing. In the plunger pump 3, when the plunger 32 is pulled (retracted), the liquid material flowing from the material tank 2 through the first supply flow path 81 is sucked into the cylinder 31 through the discharge port 31a, and FIG. Then, as shown by the arrow pointing upward, when the plunger 32 is pushed (advanced), the pressurized liquid material is discharged from the discharge port 31a. That is, the plunger pump 3 corresponds to an example of the discharging means. In the plunger pump 3 of the present embodiment, when the plunger 32 is pushed to the limit (push limit position), it is detected by the limit switch 33. As a result, it is possible to measure the time from when the plunger 32 starts moving forward until it reaches the push limit position. Hereinafter, the time from when the plunger 32 starts moving forward to when it reaches the push limit position may be referred to as stroke time. Although FIG. 1A shows the plunger pump 3 including one cylinder 31 and one plunger 32, a plurality of cylinders 31 and plungers 32 are provided, and the discharge ports 31a alternately or sequentially. A mode in which a liquid material is discharged may be adopted.

  The upstream side of the second supply flow channel 82 is connected to the first supply flow channel 81, and the downstream side of the second supply flow channel 82 is connected to the third supply flow channel 83. Is composed of a branched one side supply flow path 831 and another side supply flow path 832. A check valve CV is provided in the second supply passage 82, the one-side supply passage 831 is connected to the one-side manifold 41 via the first opening / closing valve V1, and the other-side supply passage 832 is provided. , And is connected to the other-side manifold 42 via the second on-off valve V2. The other side supply flow path 832 corresponds to an example of the backwash liquid supply flow path. In the present embodiment, angle type two-way valves are used as the first on-off valve V1 and the second on-off valve V2. Instead of these two two-way valves, a three-way valve like a switching valve SV described later may be adopted.

  A pair of atomizing nozzles 5 and 5 is arranged between the one-side manifold 41 and the other-side manifold 42. In FIG. 1A and FIG. 1B, FIG. 2, FIG. 3 and FIG. 6 described later, the upper side is one side and the lower side is the other side. The atomizing nozzle 5 receives the liquid material flowing from the one-side manifold 41 from one side and atomizes the material to be atomized contained in the received liquid material. Details will be described later. In the present embodiment, the liquid material to be supplied is distributed to the pair of atomizing nozzles 5 and 5 by having the pair of atomizing nozzles 5 and 5 and providing the one side manifold 41 and the other side manifold 42. The mode is adopted. Needless to say, a mode in which the atomizing nozzle 5 is one and the one side manifold 41 and the other side manifold 42 are omitted may be adopted, or three or more atomizing nozzles 5 may be provided.

  The upstream side of the other side discharge flow channel 841 forming the discharge flow channel 84 is connected to the other side manifold 42, and the downstream side of the other side discharge flow channel 841 is connected to the switching valve SV. The switching valve SV of the present embodiment employs a three-way manifold valve, and the processed tank connection flow path 85 and the material tank connection flow path 86 are connected to the switching valve SV. The treated tank connection passage 85 is a passage connected to the treated tank 7, and the heat exchanger 6 is provided on the way. The material tank connection flow path 86 is connected to the material tank 2. The liquid that has passed through the atomizing nozzle 5 from one side to the other side is accommodated in the processed tank 7 through the heat exchanger 6 when switched to the processed tank connection flow path 85 in the switching valve SV, and switched. When the valve SV is switched to the material tank connection channel 86, the material tank 2 collects the material tank. As described above, the switching valve SV is used when flowing the liquid from the other side discharge flow channel 841 to the treated tank connection flow channel 85 and when flowing the liquid from the other side discharge flow channel 841 to the material tank connection flow channel 86. Besides, it is a switching valve that can select a state in which neither of these flows can be taken. The state in which neither of these flows can be taken is hereinafter referred to as fully closed for the convenience of the switching valve SV. Of course, in order to be able to take these states, it is also possible to provide a connection flow path in which a two-way valve is combined and use this instead of the switching valve SV.

  The one-side manifold 41 is connected to the upstream side of the one-side discharge channel 842 that constitutes the discharge channel 84, and the downstream side of the one-side discharge channel 842 is connected to the material tank connection channel 86. Further, the one-side discharge passage 842 is provided with a third opening / closing valve V3 which is a straight type two-way valve. As will be described later in detail with reference to FIG. 2, when the switching valve SV is fully closed, the backwash liquid is sent from the other side manifold 42 to the other side of the atomizing nozzle 5 and the liquid passing through to the one side is The third on-off valve V3 is opened to flow through the one-side discharge passage 842 to be collected in the material tank 2 from the material tank connection passage 86.

  In FIG. 1A, the flow of the liquid material or the like in the atomization step of atomizing the material to be atomized is indicated by an arrow. In this atomization step, as will be described later in detail, atomization control is performed by the control means, the first opening / closing valve V1 is opened, the second opening / closing valve V2 is closed, and the switching valve SV is the processed tank connection flow path. Switched to 85. As a result, the liquid material discharged from the plunger pump 3 flows from the first supply passage 81 into the second supply passage 82, passes through the one-side supply passage 831, and is sent from the one-side manifold 41 to the atomizing nozzle 5. Be done.

  FIG. 1B is a diagram schematically showing the internal structure of the atomizing nozzle 5 shown in FIG.

  As shown in FIG. 1 (b), the atomizing nozzle 5 includes a minute flow channel 51 that penetrates from one side to the other side. The liquid material discharged from the plunger pump 3 which is a discharging means is sent to the inflow hole 51a of the minute flow path 51 on one side of the atomizing nozzle 5, and the liquid material sent in flows through the minute flow path 51. It passes through and flows out from the outflow hole 51b of the minute flow path 51.

  By passing through the minute flow path 51, atomization is performed by the action of cavitation, shearing, collision and the like. That is, the atomizing nozzle 5 atomizes the material to be atomized by passing the liquid material discharged by the discharging means from one side to the other side, and corresponds to an example of the atomizing means. Hereinafter, to promote atomization by passing a liquid material to the atomization means may be referred to as atomization treatment, and the atomized substance atomized by the atomization treatment may be referred to as atomization substance, The liquid material subjected to the atomization treatment may be referred to as an atomization-treated liquid.

  As shown in FIG. 1A, the atomized liquid discharged from the atomizing nozzle 5 to the other side passes from the other side manifold 42 through the other side discharge flow path 841 from the switching valve SV to the treated tank connection flow. It flows into the path 85. Since the temperature of the atomized liquid rises due to the heat generated when atomizing in the atomizing nozzle 5, the atomized liquid is cooled by the heat exchanger 6 provided in the treated tank connection channel 85, and then the treated tank. It is housed in 7. That is, the other side discharge channel 841 and the treated tank connection channel 85 correspond to an example of the treated channel.

  While the liquid material containing the material to be atomized passes through the atomizing nozzle 5, the material to be atomized may be clogged in the minute flow path 51 and the atomizing nozzle 5 may be blocked. If the atomizing nozzle 5 is blocked, the liquid material is not fed in or passed through, or the flow path is narrowed before complete clogging, so the amount of liquid material fed in or passed through is reduced. For this reason, the atomization process of the material to be atomized is stopped or becomes very inefficient. At this time, in the plunger pump 3, the state in which the liquid cannot be discharged from the plunger pump 3 or the discharge decreases, and the forward movement of the plunger 32 is hindered. It is possible to detect the blockage of the atomizing nozzle 5 based on the length of the stroke time. In addition, hereinafter, it may be referred to as blockage, including a situation in which the flow path becomes narrow and the discharge of the liquid from the plunger pump 3 becomes insufficient.

  When the atomizing nozzle 5 is blocked, the backwashing process is performed. As will be described in detail later, when the blockage of the atomizing nozzle 5 is detected, the control unit executes the backwash control.

  FIG. 2 is a system diagram showing the flow of the liquid in the backwash process in the atomizing apparatus 10 shown in FIG.

  When the backwash control is executed by the control means, the first opening / closing valve V1 is closed, the second opening / closing valve V2 is opened, the third opening / closing valve V3 is opened, and the switching valve SV is fully closed. As a result, the liquid material discharged from the plunger pump 3 flows from the first supply flow channel 81 into the second supply flow channel 82, and this time, passes through the other side supply flow channel 832 and from the other side manifold 42 to the atomizing nozzle. 5 is sent to the other side. The liquid material fed to the other side of the atomizing nozzle 5 flows from the other side to the one side as a backwash liquid in the minute flow path 51 (see FIG. 1B). By this backwashing liquid, the atomized substance clogged in the minute flow path 51 is pushed out toward one side of the atomizing nozzle 5, and the clogging of the atomizing nozzle 5 can be eliminated. Here, since the atomized material that has caused the blockage is clogged when passing from one side to the other side as shown in FIG. By flowing, the finely granulated material can be effectively removed from the fine flow path 51. Note that there are some atomized substances that remain in the microchannels 51 without being removed from the microchannels 51 by the backwashing liquid, but such atomized substances are removed from the microchannels 51 by the cleaning step described later. can do.

  The backwashing liquid that has passed through the atomizing nozzle 5 from the other side to the one side, and the atomized material removed from the microchannel 51 by this backwashing liquid flow from the one-side manifold 41 to the one-side discharge channel 842, It is collected in the material tank 2 through the material tank connection flow path 86. That is, the one-side discharge flow channel 842 and the material tank connection flow channel 86 correspond to an example of the second recovery flow channel. The liquid that has passed through the atomizing nozzle 5 from the other side to the one side is recovered in the material tank 2 by the second recovery channel, so that the atomized substance that has not been atomized is mixed with the atomized liquid. This can be avoided, and the atomization process can be performed again.

  Depending on the properties of the material to be finely divided, it may not be in a dispersed state but may be extruded as a large lump when it is blocked. In this case, it is possible to prevent the large lump from being mixed into the material tank 2 by providing a filter for collecting the large lump just before the material tank connection flow path 86 is connected to the material tank 2. it can.

  The backwashing step is followed by the washing step. As will be described later in detail, the cleaning control is executed after the backwash control is executed by the control means.

  FIG. 3 is a system diagram showing the flow of the liquid in the cleaning process in the atomizing apparatus 10 shown in FIG.

  When the cleaning control is executed by the control means, the first opening / closing valve V1 is opened, the second opening / closing valve V2 is closed, the third opening / closing valve V3 is closed, and the switching valve SV is connected to the material tank connection flow path 86. Can be switched. As a result, the liquid material discharged from the plunger pump 3 flows from the first supply flow channel 81 into the second supply flow channel 82, passes through the one side supply flow channel 831, and flows from the one side manifold 41 to one of the atomization nozzles 5. Sent to the side. Immediately after the cleaning process is started, that is, immediately after the backwashing process is finished, the atomized substance contained in the liquid material sent as the backwashing liquid remains in the other-side manifold 42 in a non-atomized state. There is. Further, in the case of the liquid flow in the backwashing step, depending on the characteristics of the atomization nozzle 5 used and the atomization target, the atomization action may not sufficiently occur. If not, fine particles may remain. Similarly, the liquid that has passed through the atomizing nozzle 5 and remains in the one-side manifold 41 is also in a state of containing a large amount of non-atomized material to be atomized. Therefore, if the atomization step shown in FIG. 1A is performed after the backwash step shown in FIG. 2 is performed, the atomized substance remaining in the microchannels 51 and the like that has not been atomized remains in the treated tank. It is sent to No. 7 and mixes with the processed liquid. Therefore, in the present embodiment, by feeding the liquid material from one side to the atomizing nozzle 5, the liquid that has passed through the atomizing nozzle 5 from one side to the other side is supplied to the minute flow path 51, the other side manifold 42, and the like. Along with the remaining atomized material, it flows through the other side discharge flow path 841 shown in FIG. 3 and is collected in the material tank 2 from the switching valve SV through the material tank connection flow path 86. As a result, it is possible to prevent the non-atomized material to be atomized from being mixed with the atomized liquid, and collect the material in the material tank 2 to perform the atomization process. That is, the other side discharge flow path 841 and the material tank connection flow path 86 correspond to an example of the first recovery flow path.

  The cleaning process is continued, and the atomization-processed liquid containing the atomized atomization product is discharged from the atomization nozzle 5, and the atomization-processed liquid remains in the other-side manifold 42, the other-side discharge flow path 841, and the like. After the finely-divided material existing therein has been completely flushed into the material tank 2, the cleaning process is switched to the atomization process. As a result, the atomized material that has been atomized is stored in the treated tank 7.

  FIG. 4 is a block diagram showing an example of a circuit configuration in the atomizing apparatus 10 shown in FIG.

  In this embodiment, a programmable logic controller (hereinafter abbreviated as PLC) 90 is used as the control means. The PLC 90 includes a CPU, a memory, a timer and the like inside. A first opening / closing valve control circuit 91, a second opening / closing valve control circuit 92, a third opening / closing valve control circuit 93, a switching valve control circuit 94, a plunger pump control circuit 95, and a limit switch 33 are connected to the PLC 90.

  The first opening / closing valve control circuit 91, the second opening / closing valve control circuit 92, and the third opening / closing valve control circuit 93 are circuits that control the operation of the actuators of the respective opening / closing valves in accordance with the output signal from the PLC 90. The switching valve control circuit 94 switches a flow path between the processed tank connection flow path 85 and the material tank connection flow path 86 or switches a flow path to a fully closed state according to an output signal from the PLC 90. Is a circuit for controlling the operation of the actuator of. The plunger pump control circuit 95 is a circuit that controls the operation of the drive unit that reciprocates the plunger 32 in accordance with the output signal from the PLC 90. The limit switch 33 detects whether or not the plunger 32 has reached the push limit position, and when it detects that the plunger 32 has reached the push limit position, transmits a reach signal to the PLC 90.

  Then, the atomization method which is one embodiment of the present invention is explained.

  FIG. 5 is a flowchart showing an atomizing method using the atomizing apparatus 10 shown in FIG. In the present embodiment, steps S1 to S5 shown in FIG. 5 correspond to an example of an atomization process, steps S6 to S8 correspond to an example of a backwash process, and steps S9 to S13 are an example of a washing process. Equivalent to.

  When the power of the atomization device 10 is turned on, the PLC 90 executes the atomization control and performs the initial process of the atomization process (step S1). In this initial processing, the PLC 90 issues a command to the first opening / closing valve control circuit 91, the second opening / closing valve control circuit 92, the third opening / closing valve control circuit 93, and the switching valve control circuit 94 to drive each actuator, The first opening / closing valve V1 is opened, the second opening / closing valve V2 is closed, the third opening / closing valve V3 is closed, and the switching valve SV is switched to open the processed tank connection flow path 85 side.

  Next, the PLC 90 issues a command to the plunger pump control circuit 95 to operate the drive means to pull (retract) the plunger 32 and start sucking the liquid material (step S2). When the suction of the plunger pump 3 is completed, the plunger 32 is pushed (moved forward) by the driving means this time, the discharge of the liquid material from the discharge port 31a is started, and the timing is started (step S3). As a result, the liquid material is sent from one side of the atomizing nozzle 5 as shown by the arrow in FIG. By passing from one side to the other side, it is atomized into atomized products. The liquid containing the atomized product is stored in the treated tank 7.

  In the PLC 90, a predetermined stroke time of the plunger 32 of the plunger pump 3 is predetermined as a set time. This setting time is, for example, the time (1) that takes into consideration the variation in the composition and concentration of the liquid material in the average stroke time (about 5 seconds) of the plunger 32 when the atomizing nozzle 5 is not blocked. The time (about 6 seconds) obtained by adding about (seconds) can be adopted. That is, if normal, the plunger 32 reaches the push limit position before the set time elapses. Note that if the liquid material is a liquid material whose viscosity is likely to vary greatly due to the outside air temperature and the heat generated by the operation of the apparatus, a means for sensing the viscosity of the liquid material and changing the set time can be provided.

  The PLC 90 determines whether or not a preset time or more has elapsed since the discharge was started (step S4), and if the preset time or more has not elapsed, whether or not an arrival signal has been received from the limit switch 33, that is, the plunger. It is determined whether 32 has reached the push limit position (step S5). The steps S4 and S5 indicate that the step of determination that is repeated in an extremely short time in the PLC 90 is looped by using the step S3 as a trigger. If the elapsed time is shorter than the preset set time described above (N in step S4) and the arrival signal from the limit switch 33 is received (Y in step S5), the time counting is started. Returning to S2, the atomization process except the initial process (step S1) is performed. Thus, in the state where the plunger 32 reaches the push limit position before the set time or more elapses, that is, in the state where the stroke time of the plunger pump 3 is less than the set time, the atomizing nozzle 5 is not blocked. The determination and the atomization process are repeated.

  On the other hand, when the length of the stroke time of the plunger pump 3 is equal to or longer than the set time and the set time or more is elapsed in step S4, it is determined that the atomizing nozzle 5 is blocked, and the PLC 90 executes the backwash control. First, the PLC 90 performs the initial process of the backwash process to close the first opening / closing valve V1, open the second opening / closing valve V2, open the third opening / closing valve V3, and completely close the switching valve SV. Yes (step S6).

  Next, the PLC 90 issues a command to the plunger pump control circuit 95 to operate the driving means to pull the plunger 32 and suck the liquid material (step S7), and then press the plunger 32 to discharge the liquid material from the discharge port 31a. (Step S8). As a result, the liquid material is fed from the other side of the atomizing nozzle 5, and the fed liquid material flows toward the material to be atomized, which is packed in the microchannel 51, as shown by the flow in FIG. As a result, the material to be atomized, which is clogged in the minute flow path 51, is removed, and the clogging of the atomizing nozzle 5 can be eliminated. The removed material to be atomized and the liquid material passing from the other side to the one side are collected in the material tank 2. In the backwashing process of the present embodiment, the mode in which the plunger 32 reciprocates once is adopted, but the mode in which the plunger 32 reciprocates a plurality of times may be set as one set to perform the backwashing process. That is, it is a process of repeating step S7 and step S8 a plurality of times.

  Next, the PLC 90 executes cleaning control. First, the PLC 90 performs the initial process of the cleaning process to open the first opening / closing valve V1, closes the second opening / closing valve V2, closes the third opening / closing valve V3, and connects the switching valve SV to the material tank connection flow. The road 86 is switched to (step S9).

  Next, the PLC 90 issues a command to the plunger pump control circuit 95 to operate the driving means to pull the plunger 32 and suck the liquid material (step S10), and then pushes the plunger 32 to discharge the liquid material from the discharge port 31a. And the clocking is started (step S11). As a result, the liquid material is fed from one side of the atomizing nozzle 5 as indicated by the arrow in FIG. 3, and the fed liquid material is supplied to the material tank together with the material to be atomized remaining in the atomizing nozzle 5 or the like. Recovered to 2.

  Also in this cleaning process, the PLC 90 determines whether or not the set time has elapsed (step S12). If the set time has not elapsed, the PLC 90 determines whether the arrival signal is received from the limit switch 33, that is, the plunger. It is determined whether 32 has reached the push limit position (step S13). The set time in step S12 may be set to the same length as the set time in step S4, or a length slightly shorter than the set time in step S4 in order to confirm whether or not the blockage is reliably eliminated. You may Step S12 and step S13 are repeatedly looped in the PLC 90 after the start of clocking, and the elapsed time is shorter than the previously set set time and the arrival signal from the limit switch 33 is received. For example, after switching the switching valve SV to the processed tank connection flow path 85 (step S14), the process returns to step S2, and the atomization process except the initial process (step S1) is performed. As described above, in the state where the plunger 32 reaches the push limit position before the set time or more elapses, that is, in the state where the stroke time of the plunger pump 3 is less than the set time, the blockage of the atomizing nozzle 5 is resolved. The determination is made, and the process is returned to the atomization process.

  On the other hand, when the length of the stroke time of the plunger pump 3 is equal to or longer than the set time and the set time or more is elapsed in step S12, it is determined that the blockage of the atomizing nozzle 5 cannot be eliminated, and an alarm is issued (step S15). ), The operation of the atomizer 10 is stopped. When it is determined in step S12 that the set time or more has elapsed, the process returns to step S6, and the backwashing process and steps S9 to S12 of the cleaning process are repeated one or more times, and then the process proceeds to step S15. But it's okay.

  Although illustration is omitted, step S1 and step S2, step S6 and step S7, step S9 and step S10, and step S14 and step S2 may be performed in reverse order or at the same time. Good. Further, a mode may be adopted in which the stroke time of the plunger pump 3 in step S8 of the backwash process is measured and the backwash process is repeated a plurality of times until the stroke time becomes shorter than a predetermined time.

  Next, a second embodiment of the atomizing device of the present invention will be described. In the description of the second embodiment, differences from the atomization device 10 of the first embodiment described so far will be mainly described, and a component having the same name as the component described above will be described as follows. Descriptions will be given with the reference numerals used up to here, and redundant description may be omitted.

  FIG. 6 is a system diagram showing a second embodiment of the atomizing device of the present invention. Further, FIG. 6A shows the liquid flow in the backwashing process, and FIG. 6B shows the liquid flow in the washing process.

  As shown in FIGS. 6A and 6B, in the atomization device 11 of the second embodiment, the second supply valve 81 is provided with the second switching valve SV2, and the second switching valve SV2 is provided. A supply channel for supplying the same medium as the dispersion medium is connected to. In the present embodiment, water is used as an example of the dispersion medium of the liquid material, and in the following description, the same medium as the dispersion medium will be described as water. By switching the second switching valve SV2, the liquid supplied to the plunger pump 3 can be switched between the liquid material stored in the material tank 2 and water, whereby the liquid is discharged from the plunger pump 3. The liquid to be switched is switched between liquid material and water.

  The switching valve SV is connected to the upstream side of the waste flow path 87 instead of the material tank connection flow path, and the downstream side of the waste flow path 87 is connected to a waste port or the like (not shown). The downstream side of the one-side discharge flow channel 842, whose upstream side is connected to the one-side manifold 41, is connected to the waste flow channel 87. Further, the treated tank connection flow path 85 is provided with a first flow meter F1 for measuring the flow rate of the liquid passing therethrough, and the waste flow path 87 is provided with a second flow meter F2 for measuring the flow rate of the passing liquid. ing.

  In the atomization process of the atomization device 11, the second switching valve SV2 is in a state of allowing the liquid material to pass therethrough, which is the same as the liquid flow in the atomization process of the atomization device 10 shown in FIG. However, in the atomization device 10 of the first embodiment, the blockage of the atomization nozzle 5 is detected by the stroke time of the plunger pump 3, whereas in the atomization device 11 of the second embodiment, the treated tank connection flow path 85 is The blockage of the atomizing nozzle 5 is detected by the flow rate of the flowing liquid. Specifically, when the flow rate detected by the first flow meter F1 becomes equal to or lower than the preset flow rate, it is determined that the atomizing nozzle 5 is blocked, and the backwashing process is performed.

  In the backwash process of the atomizer 11, the second switching valve SV2 is switched to a state in which water is supplied, the first opening / closing valve V1 is closed, the second opening / closing valve V2 is opened, and the third opening / closing valve V3. Is opened and the switching valve SV is fully closed. As a result, as shown in FIG. 6A, the water supplied from the second switching valve SV2 is discharged from the plunger pump 3 and passes from the other side of the atomizing nozzle 5 to the one side. The liquid that has passed to this one side contains the material to be atomized that is packed in the minute flow path 51 of the atomization nozzle 5, and this liquid flows from the one side discharge flow path 842 to the waste flow path 87 and is discarded. To be done.

  In the subsequent cleaning process, the second switching valve SV2 is maintained in a state where water is supplied, the first opening / closing valve V1 is opened, the second opening / closing valve V2 is closed, and the third opening / closing valve V3 is opened. When closed, the switching valve SV is switched to the waste flow path 87. As a result, as shown in FIG. 6B, the water supplied from the second switching valve SV2 is discharged from the plunger pump 3 and passes from one side of the atomizing nozzle 5 to the other side. The liquid that has passed to the other side contains a substance to be atomized that is insufficiently atomized, and this liquid flows from the other side discharge flow channel 841 to the discard flow channel 87 and is discarded. At this time, the flow rate of the liquid flowing through the waste flow path 87 is measured by the second flow meter F2, and if the measured flow rate is less than or equal to the preset flow rate, the blockage of the atomizing nozzle 5 has not been eliminated. It is judged and the backwashing process is performed again.

  According to the atomization devices 10 and 11 and the atomization method described above, the work of disassembling the device and cleaning it becomes unnecessary, and the blockage of the atomization means can be eliminated in a short time. When the concentration of the material to be atomized in the liquid material is high, the atomization means is likely to be clogged, while the amount of the material to be atomized per unit time can be increased without the clogging. According to the above-described atomization devices 10 and 11 and the atomization method, it is possible to significantly reduce the adverse effects such as the time required for work and restoration, which are caused by the blockage of the atomization means. For this reason, it is possible to reduce the need to avoid clogging of the atomization means such as using a liquid material in which the concentration of the material to be atomized is lower than in the conventional case, and as a result, the concentration of the material to be atomized in the liquid material is It is also possible to increase the operation amount to increase the processing amount of the material to be atomized per unit time.

  The present invention is not limited to the above-described embodiments, and various modifications can be made within the scope of the claims. For example, in the atomization apparatus 10 of the first embodiment, the liquid that has passed through the atomization nozzle 5 in the backwashing process and the liquid that has passed through the atomization nozzle 5 in the cleaning process are collected in the material tank 2. However, the liquid may be discarded from the waste channel without being collected. In the atomization device 11 of the second embodiment, at least one of the liquid that has passed through the atomization nozzle 5 in the backwash process and the liquid that has passed through the atomization nozzle 5 in the cleaning process is stored in the material tank 2. A mode of collecting may be adopted. Further, the liquid that has passed through the atomization nozzle 5 in the backwash process and the liquid that has passed through the atomization nozzle 5 in the cleaning process can be switched between the flow path for collecting in the material tank 2 and the flow path for discarding. Any configuration may be adopted. Further, although the plunger pump 3 is driven by the hydraulic cylinder in the above-described embodiment, a pneumatic drive type plunger pump may be used. Further, a plunger pump driven by a ball screw or a crank driven by a motor can be applied. In this case, a means for monitoring the load torque of the motor is provided so that the backwash control can be performed when a load torque above a certain level is detected. It is preferable.

  In addition, even if the constituent requirements are included only in the description of each embodiment described above, the constituent requirements may be applied to other embodiments.

10, 11 Atomization device 2 Material tank 3 Plunger pump 32 Plunger 33 Limit switch 5 Atomization nozzle 51 Microchannel 51a Inflow hole 51b Outflow hole 7 Treated tank

Claims (6)

In an atomization device for atomizing the material to be atomized in a liquid material in which the material to be atomized is dispersed in a dispersion medium,
Discharging means for discharging the liquid material,
Atomizing means for atomizing the material to be atomized contained in the liquid material by passing the liquid material discharged by the discharging means from one side to the other side,
A backwashing liquid supply flow path connecting the discharge port of the discharge means and the other end of the atomization means,
The atomizing means is the same medium as the dispersion medium or the liquid material, which is discharged by the discharging means and has passed through the backwashing liquid supply passage, as a backwashing liquid, from the other side to the one side. der what is sent is,
The discharging means discharges the liquid material stored in the same medium as the dispersion medium or a material tank,
After performing the backwash control for sending the discharge liquid discharged from the discharge means to the atomization means from the other side, the cleaning control for sending the discharge liquid to the atomization means from the one side is executed. A control unit,
An atomization device comprising: a first recovery passage for returning the liquid, which has passed through the atomization unit from the one side to the other side, to the material tank during execution of the cleaning control . In an atomization device for atomizing the material to be atomized in a liquid material in which the material to be atomized is dispersed in a dispersion medium,
Discharging means for discharging the liquid material,
Atomizing means for atomizing the material to be atomized contained in the liquid material by passing the liquid material discharged by the discharging means from one side to the other side,
A backwashing liquid supply flow path connecting the discharge port of the discharge means and the other end of the atomization means,
The atomizing means is the same medium as the dispersion medium or the liquid material, which is discharged by the discharging means and has passed through the backwashing liquid supply passage, as a backwashing liquid from the other side toward the one side. Is sent in,
The discharging means discharges the liquid material stored in the same medium as the dispersion medium or a material tank,
A control unit that executes a backwash control in which the liquid discharged from the discharge means is sent to the atomization means from the other side, and then executes a wash control in which the liquid is sent to the atomization means from the one side. When,
Fine granulation, characterized in that the running of the backwash control, and a second recovery flow path for returning the liquid that has passed through the one side of the atomizing means from the other side to the material tank apparatus. A blockage detecting means for detecting blockage of the atomizing means,
3. The atomization device according to claim 1 , wherein the control unit executes the backwashing control when the blockage detection unit detects the blockage of the atomization unit. The discharge means is a plunger pump,
The atomization device according to claim 3 , wherein the blockage detection unit detects blockage of the atomization unit based on a length of a stroke time of the plunger pump .   In the atomization method for atomizing the material to be atomized in a liquid material in which the material to be atomized is dispersed in a dispersion medium,
  Fine particles for ejecting the liquid material toward one side of the atomizing means to allow the liquid material to pass from the one side of the atomizing means to the other side and atomize the material to be atomized contained in the liquid material. Process,
  The same medium as the dispersion medium or the liquid material is ejected by an ejecting means, and it has passed through a backwashing liquid supply flow path connecting the ejection port of the ejecting means and the other end of the atomizing means. A backwashing step in which the liquid discharged from the discharging means is sent to the atomizing means from the other side toward the one side as backwashing liquid;
  After performing the backwashing process, a liquid is sent from the one side toward the other side to the atomizing means, and the liquid that has passed through the atomizing means is stored in the material tank in which the liquid material is stored. And a washing step for returning the same.   The atomization method according to claim 5, wherein the backwashing step is performed again after the washing step is performed.

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