JP6703866B2 - Method for producing silicon carbide based composite - Google Patents
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本発明は、炭化ケイ素系複合体の製造方法に関する。さらに詳細には、本発明は、簡便な処理で優れた曲げ強度を有する炭化ケイ素系複合体が得られる炭化ケイ素系複合体の製造方法に関する。 The present invention relates to a method for manufacturing a silicon carbide based composite. More particularly, the present invention relates to a process for the production of simple and convenient silicon carbide based composite material having excellent bending strength in the process to obtain a silicon carbide based composite material.
従来、炭化ケイ素系複合体は、以下のような製造方法によって製造されていた(特許文献1参照。)。まず、炭化ケイ素繊維(SiC繊維)に対して、窒化ホウ素−化学気相成長(BN−CVD:Boron nitride−Chemical Vaper Deposition)によって、窒化ホウ素からなる界面層を形成する。次いで、得られた繊維を製織して、所望形状を有する炭化ケイ素繊維製のプリフォームを作成する。しかる後、得られたプリフォームに、ポリマー含浸焼成(PIP:Polymer Infiltration Pyrolysis)によって、炭化ケイ素を生成させて、炭化ケイ素系複合体を得る。 Conventionally, a silicon carbide-based composite has been manufactured by the following manufacturing method (see Patent Document 1). First, an interface layer made of boron nitride is formed on a silicon carbide fiber (SiC fiber) by boron nitride-chemical vapor deposition (BN-CVD: Boron nitride-Chemical Vapor Deposition). Next, the obtained fiber is woven to form a preform made of silicon carbide fiber having a desired shape. After that, silicon carbide is produced in the obtained preform by polymer impregnation firing (PIP), and a silicon carbide-based composite is obtained.
しかしながら、特許文献1に記載の製造方法においては、BN−CVDを利用するため、製造コストが高く、また、BN−CVDを織物へ適用することが困難であった。 However, in the manufacturing method described in Patent Document 1, since BN-CVD is used, the manufacturing cost is high, and it is difficult to apply BN-CVD to the fabric.
本発明は、このような従来技術の有する課題に鑑みてなされたものである。そして、本発明は、簡便な処理で優れた曲げ強度を有する炭化ケイ素系複合体が得られる炭化ケイ素系複合体の製造方法を提供することを目的とする。 The present invention has been made in view of the above problems of the conventional technology. The present invention aims to provide a method for producing a simple and convenient silicon carbide based composite material having excellent bending strength in the process to obtain a silicon carbide based composite material.
本発明者らは、上記目的を達成すべく鋭意検討を重ねた。その結果、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む芯部と、芯部の表面に形成され、炭素を含む被覆部とからなる構造を有する炭化ケイ素繊維からなるプリフォームに、ケイ素、窒素、ホウ素及び炭素を含む界面層を形成することなどにより、上記目的が達成できることを見出し、本発明を完成するに至った。 The present inventors have earnestly studied to achieve the above object. As a result, a silicon carbide fiber having a content of oxygen element of 5 to 15% by mass and having a structure including a core portion containing silicon carbide and a coating portion formed on the surface of the core portion and containing carbon is formed. The inventors have found that the above object can be achieved by forming an interface layer containing silicon, nitrogen, boron and carbon on the reform, and have completed the present invention.
そして、本発明の炭化ケイ素系複合体の製造方法は、炭化ケイ素繊維からなる骨格と、前記骨格を被覆する界面層及びマトリックス層とを備える炭化ケイ素系複合体を製造する方法であって、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む芯部と、前記芯部の表面に形成され、炭素を含む被覆部とからなる構造を有する炭化ケイ素繊維からなるプリフォームに、ケイ素、窒素、ホウ素及び炭素を含む化合物を含浸、乾燥及び焼成する界面層形成処理を施してプレ複合体を得、次いで、前記プレ複合体に、炭素及びケイ素を含む化合物を含浸させて加熱するマトリックス層形成処理を施す、ことを特徴とする。 The method for producing a silicon carbide-based composite of the present invention is a method for producing a silicon carbide-based composite including a skeleton made of silicon carbide fibers, an interface layer covering the skeleton, and a matrix layer, wherein oxygen A preform made of a silicon carbide fiber having a structure having an element content of 5 to 15 mass% and containing silicon carbide, and a coating part formed on the surface of the core and containing carbon, An interfacial layer forming treatment of impregnating a compound containing silicon, nitrogen, boron and carbon, drying and firing is performed to obtain a pre-composite, and then the pre-composite is impregnated with a compound containing carbon and silicon and heated. A matrix layer forming process is performed.
また、本発明の炭化ケイ素系複合体の製造方法の好適形態は、前記ケイ素、窒素、ホウ素及び炭素を含む化合物が、ポリボロオルガノシラザンであることを特徴とする。 Further, a preferred embodiment of the method for producing a silicon carbide-based composite of the present invention is characterized in that the compound containing silicon, nitrogen, boron and carbon is polyboroorganosilazane.
さらに、本発明の炭化ケイ素系複合体の製造方法の他の好適形態は、前記炭素及びケイ素を含む化合物が、ポリカルボシランであることを特徴とする。 Furthermore, another preferred embodiment of the method for producing a silicon carbide-based composite of the present invention is characterized in that the compound containing carbon and silicon is polycarbosilane.
本発明によれば、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む芯部と、芯部の表面に形成され、炭素を含む被覆部とからなる構造を有する炭化ケイ素繊維からなるプリフォームに、ケイ素、窒素、ホウ素及び炭素を含む界面層を形成した。そのため、簡便な処理で優れた曲げ強度を有する炭化ケイ素系複合体が得られる炭化ケイ素系複合体の製造方法を提供することができる。 According to the present invention, a silicon carbide fiber having a content of oxygen element of 5 to 15 mass% and having a structure including a core portion containing silicon carbide and a coating portion formed on the surface of the core portion and containing carbon. An interfacial layer containing silicon, nitrogen, boron and carbon was formed on the preform consisting of. Therefore, it is possible to provide a method for producing a simple and convenient silicon carbide based composite material having excellent bending strength in the process to obtain a silicon carbide based composite material.
以下、炭化ケイ素系複合体及び本発明の一実施形態に係る炭化ケイ素系複合体の製造方法について詳細に説明する。 A method for fabricating a silicon carbide based composite material is described in detail according to an embodiment of the carbonization silicon-based composite and the present invention.
まず、炭化ケイ素系複合体について詳細に説明する。炭化ケイ素系複合体は、炭化ケイ素繊維からなる骨格と、骨格を被覆する界面層及びマトリックス層とを備える。そして、炭化ケイ素繊維は、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む芯部と、芯部の表面に形成され、炭素を含む被覆部とからなる構造を有する。また、界面層は、ケイ素、窒素、ホウ素及び炭素を含む。さらに、マトリックス層は、炭化ケイ素を含む。 First, it will be described in detail charcoal of silicon-based complex. Carbonization silicon-based complex includes a skeleton made of silicon carbide fibers, and an interfacial layer and the matrix layer covering the skeleton. The silicon carbide fiber has an oxygen element content of 5 to 15% by mass, and has a structure including a core portion containing silicon carbide and a coating portion formed on the surface of the core portion and containing carbon. The interface layer also contains silicon, nitrogen, boron and carbon. Furthermore, the matrix layer contains silicon carbide.
酸素元素の含有量が5〜15質量%、好ましくは5〜13質量%であり、炭化ケイ素を含む芯部と、芯部の表面に形成され、炭素を含む被覆部とからなる構造を有する炭化ケイ素繊維からなるプリフォームに、ケイ素、窒素、ホウ素及び炭素を含む界面層を形成した後、炭化ケイ素を含むマトリックス層を形成することにより、優れた曲げ強度を有する炭化ケイ素系複合体となる。 Carbonization having a content of oxygen element of 5 to 15% by mass, preferably 5 to 13% by mass, and a structure including a core portion containing silicon carbide and a coating portion formed on the surface of the core portion and containing carbon. By forming an interface layer containing silicon, nitrogen, boron and carbon on a preform made of silicon fibers and then forming a matrix layer containing silicon carbide, a silicon carbide based composite having excellent bending strength is obtained.
なお、芯部における酸素元素の含有量が5質量%未満や15質量%超の場合には、優れた曲げ強度を有する炭化ケイ素系複合体とならない。これは、特に限定されるものではないが、炭素を含む被覆部と炭化ケイ素を含む芯部との接合強度が十分なものとならないためと考えられる。また、ケイ素、窒素、ホウ素及び炭素を含む界面層を有しない場合にも、優れた曲げ強度を有する炭化ケイ素系複合体とならない。さらに、炭素を含む被覆部を有さず、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む炭化ケイ素繊維からなるプリフォームに、ケイ素、窒素、ホウ素及び炭素を含む界面層を形成した後、炭化ケイ素を含むマトリックス層を形成して得られる炭化ケイ素系複合体は、炭素を含む被覆部を有さず、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む炭化ケイ素繊維からなるプリフォームに、ケイ素、窒素、ホウ素及び炭素を含む界面層を形成せずに、炭化ケイ素を含むマトリックス層を形成して得られる炭化ケイ素系複合体と比較して、曲げ強度が低い傾向を有する。これは、特に限定されるものではないが、酸素と窒素とが反応するためと考えられる。また、特に限定されるものではないが、炭素を含む被覆層とケイ素、窒素、ホウ素及び炭素を含む界面層とを有するため、ケイ素、窒素、ホウ素及び炭素を含む界面層を有しない場合より、被覆層と界面層との界面でより滑り易くなり、曲げ強度が向上したとも考えられる。さらに、特に限定されるものではないが、ケイ素、窒素、ホウ素及び炭素を含む4元系の界面層であるため、窒素及びホウ素を含む2元系の界面層と比較して、マトリックス層の組成に近く、マトリックス層と一体化し易い。これにより、被覆層と界面層との界面でより滑り易くなり、曲げ強度が向上したとも考えられる。 When the oxygen element content in the core is less than 5% by mass or more than 15% by mass, the silicon carbide-based composite does not have excellent bending strength. This is not particularly limited, but it is considered that the bonding strength between the coating portion containing carbon and the core portion containing silicon carbide is not sufficient. Further, even when the interface layer containing silicon, nitrogen, boron and carbon is not provided, a silicon carbide based composite having excellent bending strength cannot be obtained. Furthermore, an interfacial layer containing silicon, nitrogen, boron, and carbon in a preform made of silicon carbide fibers containing 5 to 15% by mass of oxygen element and having no carbon-containing coating portion and containing silicon carbide. The silicon carbide-based composite obtained by forming a matrix layer containing silicon carbide after forming the above does not have a coating part containing carbon, and has an oxygen element content of 5 to 15 mass%. In a preform consisting of silicon carbide fibers containing, silicon, nitrogen, without forming an interface layer containing boron and carbon, compared with a silicon carbide-based composite obtained by forming a matrix layer containing silicon carbide, Bending strength tends to be low. Although it is not particularly limited, it is considered that oxygen reacts with nitrogen. In addition, although not particularly limited, since it has a coating layer containing carbon and silicon, nitrogen, an interface layer containing boron and carbon, than when not having an interface layer containing silicon, nitrogen, boron and carbon, It is also considered that the interface between the coating layer and the interface layer became more slippery and the bending strength was improved. Further, although not particularly limited, since it is a quaternary interface layer containing silicon, nitrogen, boron and carbon, the composition of the matrix layer is greater than that of a binary interface layer containing nitrogen and boron. And is easy to integrate with the matrix layer. It is considered that, as a result, slippage became easier at the interface between the coating layer and the interface layer, and bending strength was improved.
また、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む芯部と、芯部の表面に形成され、炭素を含む被覆部とからなる構造を有する炭化ケイ素繊維からなるプリフォームを用いることとしたため、優れた曲げ強度を有するだけでなく、BN−CVDを利用する必要がないため、製造コストを低減することができるという副次的な利点がある。 Further, a preform made of silicon carbide fibers having a content of oxygen element of 5 to 15% by mass and having a core portion containing silicon carbide and a coating portion formed on the surface of the core portion and containing carbon. Since it has been decided to use, it not only has excellent bending strength, but there is no need to use BN-CVD, so there is a secondary advantage that the manufacturing cost can be reduced.
さらに、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む芯部と、芯部の表面に形成され、炭素を含む被覆部とからなる構造を有する炭化ケイ素繊維からなるプリフォームを用いることとしたため、優れた曲げ強度を有するだけでなく、製造コストが高くなる要因の1つである酸素元素の含有量が5質量%未満、特に1質量%未満の炭化ケイ素繊維を利用する必要がないため、製造コストを低減することができるという副次的な利点がある。 Further, a preform made of a silicon carbide fiber having a content of oxygen element of 5 to 15% by mass and having a core portion containing silicon carbide and a coating portion formed on the surface of the core portion and containing carbon. Therefore, the use of silicon carbide fibers having not only excellent bending strength but also having an oxygen element content of less than 5% by mass, particularly less than 1% by mass, which is one of the factors that increase the manufacturing cost. Since it is not necessary, there is a secondary advantage that the manufacturing cost can be reduced.
次に、本発明の一実施形態に係る炭化ケイ素系複合体の製造方法について詳細に説明する。本実施形態の炭化ケイ素系複合体の製造方法は、炭化ケイ素繊維からなる骨格と、骨格を被覆する界面層及びマトリックス層とを備える炭化ケイ素系複合体を製造する方法であって、上述した炭化ケイ素系複合体を製造する方法の一実施形態である。 Next, a method for manufacturing the silicon carbide based composite according to one embodiment of the present invention will be described in detail. The method for producing a silicon carbide-based composite of the present embodiment is a method for producing a silicon carbide-based composite including a skeleton made of silicon carbide fibers, an interface layer that covers the skeleton, and a matrix layer, and is described above . is one embodiment of a method of manufacturing a carbonization silicon-based complex.
本実施形態の炭化ケイ素系複合体の製造方法は、以下の工程(1)及び工程(2)を含む。 The method for manufacturing the silicon carbide based composite according to the present embodiment includes the following step (1) and step (2).
工程(1)は、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む芯部と、芯部の表面に形成され、炭素を含む被覆部とからなる構造を有する炭化ケイ素繊維からなるプリフォームに、ケイ素、窒素、ホウ素及び炭素を含む化合物を含浸、乾燥及び焼成する界面層形成処理を施してプレ複合体を得る工程、すなわち、目的とする炭化ケイ素系複合体における界面層を形成する工程である。 In the step (1), the content of oxygen element is 5 to 15% by mass, and the silicon carbide fiber has a structure composed of a core portion containing silicon carbide and a coating portion formed on the surface of the core portion and containing carbon. To obtain a pre-composite by impregnating a preform comprising the above with a compound containing silicon, nitrogen, boron and carbon, and drying and firing to obtain a pre-composite, that is, an interface layer in the intended silicon carbide-based composite. Is a step of forming.
工程(2)は、工程(1)の後に実行され、プレ複合体に、炭素及びケイ素を含む化合物を含浸させて加熱するマトリックス層形成処理を施す工程、すなわち、目的とする炭化ケイ素系複合体におけるマトリックス層を形成して、目的とする炭化ケイ素系複合体を得る工程である。 The step (2) is performed after the step (1), and is a step of subjecting the pre-composite to a matrix layer forming treatment in which a compound containing carbon and silicon is impregnated and heated, that is, a target silicon carbide-based composite. Is a step of forming a matrix layer to obtain the intended silicon carbide-based composite.
このような工程(1)及び工程(2)を経ることにより、BN−CVDを利用する必要がないため、製造コストを低減することができる。また、製造コストが高くなる要因の1つである酸素元素の含有量が5質量%未満、特に1質量%未満の炭化ケイ素繊維を利用する必要がないため、製造コストを低減することができる。さらに、織物に対してBN−CVDを適用する必要がなく、優れた曲げ強度を有する炭化ケイ素系複合体を得ることができる。 By going through such steps (1) and (2), it is not necessary to use BN-CVD, so that the manufacturing cost can be reduced. In addition, since it is not necessary to use silicon carbide fibers having an oxygen element content of less than 5% by mass, particularly less than 1% by mass, which is one of the factors that increase the manufacturing cost, the manufacturing cost can be reduced. Furthermore, it is not necessary to apply BN-CVD to the woven fabric, and a silicon carbide-based composite having excellent bending strength can be obtained.
ここで、(1)工程におけるプリフォームとしては、特に限定されるものではなく、例えば、所定の炭化ケイ素繊維を用い、ブレード織法、フィラメントワインディング法、2D積層法など従来公知の方法によって得られたものを適用することができる。また、所定の炭化ケイ素繊維は、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む芯部と、芯部の表面に形成され、炭素を含む被覆部とからなる構造を有するものであれば、特に限定されるものではないが、例えば、酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む炭化ケイ素繊維に、化学気相成長によって炭素を被覆したものを適用することができる。さらに、(1)工程におけるケイ素、窒素、ホウ素及び炭素を含む化合物としては、特に限定されるものではないが、例えば、ポリボロオルガノシラザンを挙げることができる。この化合物は、上述した炭素ケイ素繊維からなる骨格に界面層を形成し、この点からは、ポリボロオルガノシラザンは界面層前駆体と言ってもよい。 Here, the preform in the step (1) is not particularly limited, and for example, it can be obtained by a known method such as a blade weaving method, a filament winding method, a 2D laminating method using a predetermined silicon carbide fiber. It can be applied. Further, the predetermined silicon carbide fiber has an oxygen element content of 5 to 15% by mass, and has a structure including a core portion containing silicon carbide and a coating portion formed on the surface of the core portion and containing carbon. It is not particularly limited as long as it is one, but for example, a silicon carbide fiber having a content of oxygen element of 5 to 15 mass% and containing silicon carbide coated with carbon by chemical vapor deposition. Can be applied. Furthermore, the compound containing silicon, nitrogen, boron and carbon in the step (1) is not particularly limited, but examples thereof include polyboroorganosilazane. This compound forms an interfacial layer on the skeleton made of carbon silicon fibers described above, and from this point, polyboroorganosilazane may be called an interfacial layer precursor.
界面層前駆体の被覆は、BN−CVDより簡便なディッピングなど従来公知の湿式法によって行うことができる。例えば、乾燥は150〜200℃、焼成は800〜1000℃で行うことができる。また、これらの含浸、乾燥及び焼成は、いわゆるPIPによって行ってもよい。また、湿式法であれば、BN−CVDでは困難であった織物に対して直接処理することができる。 The interface layer precursor can be coated by a conventionally known wet method such as dipping which is simpler than BN-CVD. For example, drying can be performed at 150 to 200°C, and firing can be performed at 800 to 1000°C. The impregnation, drying and firing of these may be performed by so-called PIP. Further, the wet method can directly process the woven fabric, which has been difficult by BN-CVD.
上記ポリボロオルガノシラザンは、以下の反応式で合成されるものである。SiNBC系ポリマーと表記することがあり、Si/B=1/2の混合比のものを「SiNBC−1/2」と略記することがある。 The polyboroorganosilazane is synthesized by the following reaction formula. It may be referred to as a SiNBC-based polymer, and one having a mixing ratio of Si/B=1/2 may be abbreviated as "SiNBC-1/2".
また、(2)工程における炭素及びケイ素を含む化合物としては、特に限定されるものではないが、例えば、ポリカルボシラン(PCS)を適用することができる。なお、上記の化合物は、マトリックス層前駆体として機能するが、トルエンやキシレンなどの希釈溶媒で希釈して使用することができる。また、キシレンで希釈することが好ましい。さらに、希釈する際には、ポリカルボシランの濃度が20〜40質量%であることが好ましく、30〜40質量%であることがより好ましい。 Further, the compound containing carbon and silicon in the step (2) is not particularly limited, but for example, polycarbosilane (PCS) can be applied. Although the above compound functions as a matrix layer precursor, it can be used after diluting it with a diluting solvent such as toluene or xylene. It is also preferable to dilute with xylene. Furthermore, when diluting, the concentration of polycarbosilane is preferably 20 to 40% by mass, and more preferably 30 to 40% by mass.
ポリカルボシランは、例えば、日本カーボン製PCS−UHを用いても良い。 As the polycarbosilane, for example, PCS-UH manufactured by Nippon Carbon Co., Ltd. may be used.
プレ複合体に化合物を含浸させて加熱するマトリックス層の形成は、繰り返すことにより複数回行うことができ、例えば、6〜12回程度行うことが好ましい。これらの含浸、加熱は、いわゆるPIPによって行ってもよい。また、例えば、加熱は、通常、乾燥と焼成で行うことができ、乾燥は80〜120℃程度、焼成は窒素ガス(N2)雰囲気下800〜1000℃程度で行うことができる。なお、乾燥及び焼成は窒素ガス(N2)雰囲気下に室温から昇温し1000℃程度に加熱することによって行ってもよい。 The formation of the matrix layer in which the compound is impregnated in the pre-composite and heated can be repeated a plurality of times, and for example, it is preferably performed about 6 to 12 times. The impregnation and heating of these may be performed by so-called PIP. Further, for example, heating can be usually performed by drying and firing, drying can be performed at about 80 to 120° C., and firing can be performed at about 800 to 1000° C. in a nitrogen gas (N 2 ) atmosphere. The drying and firing may be performed by raising the temperature from room temperature to about 1000° C. in a nitrogen gas (N 2 ) atmosphere.
また、本実施形態の製造方法においては、所要に応じて、(2)工程の後にさらに所定の熱処理を行うことができる。所定の熱処理は、(2)工程で得られた炭化ケイ素系複合体を不活性ガス中1000〜1500℃で加熱処理するものであるが、これにより、炭化ケイ素系複合体を結晶化させて品質の均一化を図ることができる。 Further, in the manufacturing method of the present embodiment, if necessary, a predetermined heat treatment can be further performed after the step (2). The predetermined heat treatment is to heat-treat the silicon carbide-based composite obtained in the step (2) at 1000 to 1500° C. in an inert gas, whereby the silicon carbide-based composite is crystallized and the quality is improved. Can be made uniform.
以下、本発明を実施例及び比較例によりさらに詳細に説明するが、本発明はこのような実施例に限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to such Examples.
(実施例1)
炭化ケイ素繊維織物として、炭素被覆された炭化ケイ素繊維織物(NGSアドバンストファイバー株式会社製、グレード:タイプCG(Cコート有り)、NL501−5HS、5枚朱子織を用いた。具体的な仕様は、寸法:1000mm×2000mm、打ち込み本数:経糸;22本/inch、緯糸;22本/inch、厚さ:0.29mm、目付388g/m2、サイジング剤種類:P、布強度:経糸方向;2087N/25mm、緯糸方向;2274N/25mmである。また、仕様糸特性(代表値)は、糸の製品名:NL−501、平均繊維径:14μm、密度:2.55g/cm3、引張強度:3GPa、引張弾性率:220GPaである。
(Example 1)
As the silicon carbide fiber woven fabric, carbon-coated silicon carbide fiber woven fabric (manufactured by NGS Advanced Fiber Co., Ltd., grade: type CG (with C coat), NL501-5HS, 5 sheets satin weave was used. Dimensions: 1000 mm x 2000 mm, Number of threads: warp; 22 threads/inch, weft: 22 threads/inch, thickness: 0.29 mm, basis weight 388 g/m 2 , sizing agent type: P, cloth strength: warp direction; 2087 N/ 25 mm, weft direction: 2274 N/25 mm, and the specified yarn characteristics (representative value) are: yarn product name: NL-501, average fiber diameter: 14 μm, density: 2.55 g/cm 3 , tensile strength: 3 GPa. And tensile elastic modulus: 220 GPa.
また、界面層前駆体として、ポリボロオルガノシラザン(原子数比Si/B=1/2の「SiNBC−1/2」)の40質量%トルエン溶液(株式会社アート科学製)を用いた。 A 40 mass% toluene solution of polyboroorganosilazane (“SiNBC-1/2” having an atomic ratio of Si/B=1/2) (manufactured by Art Science Co., Ltd.) was used as the interface layer precursor.
さらに、マトリックス層前駆体として、ポリカルボシラン(PCS)(NGSアドバンストファイバー株式会社製、グレードUH)の40質量%キシレン溶液を用いた。 Further, as a matrix layer precursor, a 40 mass% xylene solution of polycarbosilane (PCS) (manufactured by NGS Advanced Fiber Co., Ltd., grade UH) was used.
まず、炭素被覆された炭化ケイ素繊維織物を50mm×70mmの大きさに切断し、12枚積層した。次いで、グローブボックス中で、得られた織物積層体に、SiNBC−1/2の40質量%トルエン溶液を真空含浸させた。さらに、得られた含浸済み織物積層体を金型にセットし、加圧成形を行った。しかる後、得られた織物成形体を100℃で乾燥して余剰のトルエンを蒸発させ、窒素ガス雰囲気下200℃/hrの昇温速度で1000℃まで加熱して焼成し、プレ複合体を得た。 First, carbon-coated silicon carbide fiber woven fabric was cut into a size of 50 mm×70 mm, and 12 sheets were laminated. Next, in the glove box, the obtained woven fabric laminate was vacuum impregnated with a 40% by mass toluene solution of SiNBC-1/2. Further, the obtained impregnated woven fabric laminate was set in a mold and pressure-molded. After that, the obtained woven fabric molded body is dried at 100° C. to evaporate the excess toluene, and heated to 1000° C. at a temperature rising rate of 200° C./hr in a nitrogen gas atmosphere and baked to obtain a pre-composite body. It was
次に、グローブボックス中で、得られたプレ成形体に、PCS−UHの40質量%キシレン溶液を真空含浸させた。次いで、得られた含浸済みプレ複合体を金型にセットし、含浸済みプレ複合体を100℃で乾燥して余剰のキシレンを蒸発させ、さらに、窒素ガス雰囲気下200℃/hrの昇温速度で1000℃まで加熱して焼成した。 Next, in the glove box, the obtained pre-molded body was vacuum-impregnated with a 40 mass% xylene solution of PCS-UH. Then, the obtained impregnated pre-composite is set in a mold, the impregnated pre-composite is dried at 100° C. to evaporate the excess xylene, and the temperature rising rate is 200° C./hr in a nitrogen gas atmosphere. It was heated to 1000° C. and baked.
上記PCS含浸と焼成を12回繰り返し、本例の炭化ケイ素系複合体を得た。 The above PCS impregnation and firing were repeated 12 times to obtain a silicon carbide based composite of this example.
(比較例1)
まず、炭素被覆された炭化ケイ素繊維織物を50mm×70mmの大きさに切断し、12枚積層した。次いで、得られた織物積層体を金型にセットし、加圧成形を行った。さらに、得られた織物成形体を100℃で乾燥し、窒素ガス雰囲気下200℃/hrの昇温速度で1000℃まで加熱し、プレ複合体を得た。
さらに、グローブボックス中で、得られたプレ成形体に、PCS−UHの40質量%キシレン溶液を真空含浸させた。さらに、得られた含浸済みプレ複合体を金型にセットし、含浸済みプレ複合体を100℃で乾燥して余剰のキシレンを蒸発させ、さらに、窒素ガス雰囲気下200℃/hrの昇温速度で1000℃まで加熱して焼成した。
上記PCS含浸と焼成を12回繰り返し、本例の炭化ケイ素系複合体を得た。
(Comparative Example 1)
First, carbon-coated silicon carbide fiber woven fabric was cut into a size of 50 mm×70 mm, and 12 sheets were laminated. Next, the obtained woven fabric laminate was set in a mold and pressure-molded. Further, the obtained woven fabric formed body was dried at 100° C. and heated to 1000° C. at a temperature rising rate of 200° C./hr in a nitrogen gas atmosphere to obtain a pre-composite body.
Further, in the glove box, the obtained pre-molded body was vacuum impregnated with a 40 mass% xylene solution of PCS-UH. Further, the obtained impregnated pre-composite is set in a mold, the impregnated pre-composite is dried at 100° C. to evaporate the excess xylene, and further, the temperature rising rate of 200° C./hr in a nitrogen gas atmosphere. It was heated to 1000° C. and baked.
The above PCS impregnation and firing were repeated 12 times to obtain a silicon carbide based composite of this example.
(比較例2)
まず、炭素被覆された炭化ケイ素繊維織物を50mm×70mmの大きさに切断し、12枚積層した。次いで、得られた織物積層体を金型にセットし、加圧成形を行った。さらに、得られた織物成形体を100℃で乾燥し、窒素ガス雰囲気下200℃/hrの昇温速度で1000℃まで加熱し、プレ複合体を得た。
さらに、グローブボックス中で、得られたプレ成形体に、PCS−UHの40質量%キシレン溶液を真空含浸させた。さらに、得られた含浸済みプレ複合体を金型にセットし、含浸済みプレ複合体を100℃で乾燥して余剰のキシレンを蒸発させ、さらに、窒素ガス雰囲気下200℃/hrの昇温速度で1000℃まで加熱して焼成した。
上記PCS含浸と焼成を6回繰り返し、本例の炭化ケイ素系複合体を得た。
(Comparative example 2)
First, carbon-coated silicon carbide fiber woven fabric was cut into a size of 50 mm×70 mm, and 12 sheets were laminated. Next, the obtained woven fabric laminate was set in a mold and pressure-molded. Further, the obtained woven fabric formed body was dried at 100° C. and heated to 1000° C. at a temperature rising rate of 200° C./hr in a nitrogen gas atmosphere to obtain a pre-composite body.
Further, in the glove box, the obtained pre-molded body was vacuum impregnated with a 40 mass% xylene solution of PCS-UH. Further, the obtained impregnated pre-composite is set in a mold, the impregnated pre-composite is dried at 100° C. to evaporate the excess xylene, and further, the temperature rising rate of 200° C./hr in a nitrogen gas atmosphere. It was heated to 1000° C. and baked.
The above PCS impregnation and firing were repeated 6 times to obtain a silicon carbide based composite of this example.
(比較例3)
炭化ケイ素繊維織物として、炭素被覆されていない炭化ケイ素繊維織物(NGSアドバンストファイバー株式会社製、グレード:タイプCG(Cコート無し)、NL201−8HS)、8枚朱子織を用いた。具体的な仕様は、寸法:1000mm×2000mm、打ち込み本数:経糸;22本/inch、緯糸;22本/inch、厚さ:0.29mm、目付388g/m2、サイジング剤種類:P、布強度:経糸方向;2087N/25mm、緯糸方向;2274N/25mmである。また、仕様糸特性(代表値)は、糸の製品名:NL−201、平均繊維径:14μm、密度:2.56g/cm3、引張強度:2.95GPa、引張弾性率:194GPa、サイジング付着量:1.2質量%である。
(Comparative example 3)
As the silicon carbide fiber woven fabric, a silicon carbide fiber woven fabric not coated with carbon (manufactured by NGS Advanced Fiber Co., Ltd., grade: type CG (without C coat), NL201-8HS), 8 sheets satin weave was used. Specific specifications are dimensions: 1000 mm x 2000 mm, number of threads: warp; 22 threads/inch, weft: 22 threads/inch, thickness: 0.29 mm, basis weight 388 g/m 2 , sizing agent type: P, cloth strength : Warp direction: 2087 N/25 mm, weft direction: 2274 N/25 mm. In addition, the specified yarn characteristics (representative value) are as follows: yarn product name: NL-201, average fiber diameter: 14 μm, density: 2.56 g/cm 3 , tensile strength: 2.95 GPa, tensile elastic modulus: 194 GPa, sizing adhesion Amount: 1.2% by mass.
まず、炭素被覆されていない炭化ケイ素繊維織物を50mm×70mmの大きさに切断し、12枚積層した。次いで、グローブボックス中で、得られた織物積層体に、SiNBC−1/2の40質量%トルエン溶液を真空含浸させた。さらに、得られた含浸済み織物積層体を金型にセットし、加圧成形を行った。しかる後、得られた織物成形体を100℃で乾燥して余剰のトルエンを蒸発させ、窒素ガス雰囲気下200℃/hrの昇温速度で1000℃まで加熱して焼成し、プレ複合体を得た。 First, a silicon carbide fiber woven fabric not coated with carbon was cut into a size of 50 mm×70 mm, and 12 sheets were laminated. Next, in the glove box, the obtained woven fabric laminate was vacuum impregnated with a 40% by mass toluene solution of SiNBC-1/2. Further, the obtained impregnated woven fabric laminate was set in a mold and pressure-molded. After that, the obtained woven fabric molded body is dried at 100° C. to evaporate the excess toluene, and heated to 1000° C. at a temperature rising rate of 200° C./hr in a nitrogen gas atmosphere and fired to obtain a pre-composite body. It was
次に、グローブボックス中で、得られたプレ成形体に、PCS−UHの40質量%キシレン溶液を真空含浸させた。次いで、得られた含浸済みプレ複合体を金型にセットし、含浸済みプレ複合体を100℃で乾燥して余剰のキシレンを蒸発させ、さらに、窒素ガス雰囲気下200℃/hrの昇温速度で1000℃まで加熱して焼成した。 Next, in the glove box, the obtained pre-molded body was vacuum-impregnated with a 40 mass% xylene solution of PCS-UH. Then, the obtained impregnated pre-composite is set in a mold, the impregnated pre-composite is dried at 100° C. to evaporate the excess xylene, and the temperature rising rate is 200° C./hr in a nitrogen gas atmosphere. It was heated to 1000° C. and baked.
上記PCS含浸と焼成を6回繰り返し、本例の炭化ケイ素系複合体を得た。 The above PCS impregnation and firing were repeated 6 times to obtain a silicon carbide based composite of this example.
(比較例4)
まず、炭素被覆されていない炭化ケイ素繊維織物を50mm×70mmの大きさに切断し、12枚積層した。次いで、得られた織物積層体を金型にセットし、加圧成形を行った。さらに、得られた織物成形体を100℃で乾燥し、窒素ガス雰囲気下200℃/hrの昇温速度で1000℃まで加熱し、プレ複合体を得た。
さらに、グローブボックス中で、得られたプレ成形体に、PCS−UHの40質量%キシレン溶液を真空含浸させた。さらに、得られた含浸済みプレ複合体を金型にセットし、含浸済みプレ複合体を100℃で乾燥して余剰のキシレンを蒸発させ、さらに、窒素ガス雰囲気下200℃/hrの昇温速度で1000℃まで加熱して焼成した。
上記PCS含浸と焼成を6回繰り返し、本例の炭化ケイ素系複合体を得た。
(Comparative example 4)
First, a silicon carbide fiber woven fabric not coated with carbon was cut into a size of 50 mm×70 mm, and 12 sheets were laminated. Next, the obtained woven fabric laminate was set in a mold and pressure-molded. Further, the obtained woven fabric formed body was dried at 100° C. and heated to 1000° C. at a temperature rising rate of 200° C./hr in a nitrogen gas atmosphere to obtain a pre-composite body.
Further, in the glove box, the obtained pre-molded body was vacuum impregnated with a 40 mass% xylene solution of PCS-UH. Further, the obtained impregnated pre-composite is set in a mold, the impregnated pre-composite is dried at 100° C. to evaporate the excess xylene, and further, the temperature rising rate of 200° C./hr in a nitrogen gas atmosphere. It was heated to 1000° C. and baked.
The above PCS impregnation and firing were repeated 6 times to obtain a silicon carbide based composite of this example.
[性能評価]
各例の炭化ケイ素系複合体から5×50×2(厚み)mmの試験片を切り出し、この試験片を室温(25℃)で3点曲げ試験に供した。得られた結果を表1に示す。
[Performance evaluation]
A test piece of 5×50×2 (thickness) mm was cut out from the silicon carbide-based composite of each example, and the test piece was subjected to a three-point bending test at room temperature (25° C.). The results obtained are shown in Table 1.
表1より、本発明の範囲に属する実施例1の炭化ケイ素系複合体は、本発明の範囲外の比較例1の炭化ケイ素系複合体よりも優れた曲げ強度を有することが分かる。また、炭素被覆されていない炭化ケイ素繊維織物に対して、ケイ素、窒素、ホウ素及び炭素を含む化合物を含浸、乾燥及び焼成する界面層形成処理を施してプレ複合体を得、次いで、プレ複合体に、炭素及びケイ素を含む化合物を含浸させて加熱するマトリックス層形成処理を施しても、複合体の強度発現が認められなかった。さらに、PIPによる処理回数を増やすことにより、複合体の強度発現効果が顕著となることが分かった。 From Table 1, it can be seen that the silicon carbide-based composite of Example 1 belonging to the scope of the present invention has a bending strength superior to that of the silicon carbide-based composite of Comparative Example 1 outside the scope of the present invention. Further, a silicon carbide fiber woven fabric not coated with carbon is subjected to an interface layer forming treatment of impregnating a compound containing silicon, nitrogen, boron and carbon, drying and firing to obtain a precomposite, and then a precomposite. Even when the matrix layer formation treatment of impregnating with a compound containing carbon and silicon and heating was carried out, the strength development of the composite was not recognized. Furthermore, it was found that the strength manifestation effect of the composite becomes remarkable by increasing the number of times of treatment with PIP.
以上、本発明を若干の実施形態及び実施例によって説明したが、本発明はこれらに限定されるものではなく、本発明の要旨の範囲内で種々の変形が可能である。 Although the present invention has been described above with reference to some embodiments and examples, the present invention is not limited to these and various modifications can be made within the scope of the gist of the present invention.
炭化ケイ素系複合体は、例えば、ガス発電機用や原子力発電機用のタービン翼などに応用することができ、緻密・高密度な製品を製造効率良く得ることができる。 Carbonization silicon-based complexes, for example, can be applied, such as a turbine blade for a gas generator for and nuclear generators, can be dense, high density products obtained with good production efficiency.
Claims (3)
酸素元素の含有量が5〜15質量%であり、炭化ケイ素を含む芯部と、前記芯部の表面に形成され、炭素を含む被覆部とからなる構造を有する炭化ケイ素繊維からなるプリフォームに、ケイ素、窒素、ホウ素及び炭素を含む化合物を含浸、乾燥及び焼成する界面層形成処理を施してプレ複合体を得、
次いで、前記プレ複合体に、炭素及びケイ素を含む化合物を含浸させて加熱するマトリックス層形成処理を施す
ことを特徴とする炭化ケイ素系複合体の製造方法。 A method for producing a silicon carbide based composite comprising a skeleton made of silicon carbide fibers, and an interface layer and a matrix layer covering the skeleton,
A preform made of a silicon carbide fiber having a structure including an oxygen element content of 5 to 15% by mass, a core portion containing silicon carbide, and a coating portion formed on the surface of the core portion and containing carbon. , A compound containing silicon, nitrogen, boron and carbon is impregnated, dried and baked to obtain an interfacial layer forming treatment to obtain a pre-composite,
Next, a method for producing a silicon carbide based composite, which comprises subjecting the pre-composite to a matrix layer forming treatment in which a compound containing carbon and silicon is impregnated and heated.
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