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JP6705252B2 - Imaging device, pixel defect correction device, and pixel defect correction method - Google Patents
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JP6705252B2 - Imaging device, pixel defect correction device, and pixel defect correction method - Google Patents

Imaging device, pixel defect correction device, and pixel defect correction method Download PDF

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JP6705252B2
JP6705252B2 JP2016067959A JP2016067959A JP6705252B2 JP 6705252 B2 JP6705252 B2 JP 6705252B2 JP 2016067959 A JP2016067959 A JP 2016067959A JP 2016067959 A JP2016067959 A JP 2016067959A JP 6705252 B2 JP6705252 B2 JP 6705252B2
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佐藤 公一
公一 佐藤
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Ricoh Imaging Co Ltd
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Description

本発明は、複数の光電変換層を積層させた撮像素子を備えた撮像装置に関し、特に、複数の光電変換層を積層させた撮像素子の画素欠陥補正に関する。 The present invention relates to an image pickup apparatus including an image pickup device in which a plurality of photoelectric conversion layers are stacked, and more particularly, to pixel defect correction of an image pickup device in which a plurality of photoelectric conversion layers are stacked.

デジタルカメラなどに用いられる撮像素子には、半導体基板の光吸収特性が光の波長によって異なることを利用して、画素を構成する複数の光電変換部を2次元配列させた複数のフォトダイオード層を基板内に積層させた撮像素子が知られている。例えば、p型シリコン基板内において、基板表面から順にn型層、p型層、n型層を深さ方向(光路)に沿って形成し、同一画素に対して3つの光電変換部が深さ方向に沿って積層される。 An imaging device used in a digital camera or the like uses a plurality of photodiode layers in which a plurality of photoelectric conversion units forming pixels are two-dimensionally arranged by utilizing that the light absorption characteristic of a semiconductor substrate varies depending on the wavelength of light. An image pickup device stacked in a substrate is known. For example, in a p-type silicon substrate, an n-type layer, a p-type layer, and an n-type layer are sequentially formed from the substrate surface along the depth direction (optical path), and three photoelectric conversion units have the same depth in the same pixel. Stacked along the direction.

このような撮像素子では、暗電流など発生個所が深さ方向で一定しないノイズが生じる。すなわち、同一画素であっても欠陥の生じる光電変換部と欠陥の生じない光電変換部が存在する。しかしながら、欠陥のない光電変換部で生成される画素信号にも、欠陥のある光電変換部によって画素信号劣化の影響が及ぶ。 In such an image pickup device, noise such as dark current in which the generation location is not constant in the depth direction is generated. That is, even in the same pixel, there are a photoelectric conversion unit in which a defect occurs and a photoelectric conversion unit in which no defect occurs. However, the pixel signal generated by the photoelectric conversion unit having no defect is also affected by the pixel signal deterioration due to the defective photoelectric conversion unit.

これを防ぐため、同一画素においていずれか1つの光電変換部で生成される画素信号にノイズが含まれている、すなわちキズがあることが検出された場合、同一画素のキズのない他の光電変換部で生成される画素信号に対しても、補正処理を行う(特許文献1参照)。 In order to prevent this, when it is detected that noise is included in the pixel signal generated by one of the photoelectric conversion units in the same pixel, that is, it is detected that there is a defect, another photoelectric conversion without a defect in the same pixel is performed. The correction process is also performed on the pixel signal generated by the unit (see Patent Document 1).

特開2008−42944号公報JP, 2008-42944, A

同一画素の光電変換部で生成された画素信号がすべて補正されてしまうため、その画素の画素信号情報が完全に失われることになる。その結果、画素欠陥補正によって画質が著しく低下する恐れがある。 Since all the pixel signals generated by the photoelectric conversion unit of the same pixel are corrected, the pixel signal information of that pixel is completely lost. As a result, the pixel defect correction may significantly deteriorate the image quality.

したがって、複数の光電変換層を積層させた撮像素子において、画質低下を抑える画素欠陥補正を行うことが求められる。 Therefore, it is required to perform pixel defect correction that suppresses deterioration of image quality in an image pickup device in which a plurality of photoelectric conversion layers are stacked.

本発明の撮像装置は、複数の光電変換部を2次元配列させた複数の光電変換層を積層させた撮像素子と、複数の光電変換層において欠陥のある光電変換部から出力される画素信号を補正する補正部とを備え、補正部が、欠陥光電変換部のない光電変換層の光電変換部から出力される画素信号に基づいて、補正を行う。 The imaging device of the present invention provides an imaging device in which a plurality of photoelectric conversion layers in which a plurality of photoelectric conversion units are two-dimensionally arranged are stacked, and a pixel signal output from a defective photoelectric conversion unit in the plurality of photoelectric conversion layers. A correction unit that corrects is provided, and the correction unit performs the correction based on the pixel signal output from the photoelectric conversion unit of the photoelectric conversion layer having no defective photoelectric conversion unit.

補正部は、同一画素に含まれる他の光電変換層の光電変換部から出力される画素信号と、その周囲の光電変換部から出力される画素信号との相関に基づいて、補正を行うことができる。例えば補正部は、同一画素に含まれる他の光電変換層の光電変換部から出力される画素信号と、その周囲の光電変換部から出力される画素信号との比に基づいて、補正を行うことができる。あるいは、同一画素に含まれる他の光電変換部から出力される画素信号と、その周囲の光電変換部から出力される画素信号との差分に基づいて、補正を行うことができる。 The correction unit may perform correction based on a correlation between a pixel signal output from a photoelectric conversion unit of another photoelectric conversion layer included in the same pixel and a pixel signal output from a photoelectric conversion unit around the photoelectric conversion unit. it can. For example, the correction unit may perform the correction based on the ratio of the pixel signal output from the photoelectric conversion unit of the other photoelectric conversion layer included in the same pixel and the pixel signal output from the photoelectric conversion unit around it. You can Alternatively, the correction can be performed based on the difference between the pixel signal output from another photoelectric conversion unit included in the same pixel and the pixel signal output from the peripheral photoelectric conversion unit.

また、補正部が、同一画素に含まれる他の光電変換部の画素値に最も近い値をもつ光電変換部から出力される画素信号に基づいて、補正を行うことが可能である。 In addition, the correction unit can perform the correction based on the pixel signal output from the photoelectric conversion unit having a value that is closest to the pixel value of another photoelectric conversion unit included in the same pixel.

一方、補正部は、他の光電変換層において欠陥光電変換部と隣接位置関係にあって欠陥をもつ周辺光電変換部が存在する場合、その周辺光電変換部から出力される画素信号を除いて、補正を行えばよい。 On the other hand, the correction unit, when there is a peripheral photoelectric conversion unit having a defect in the adjacent photoelectric conversion unit in the other photoelectric conversion layer, except for the pixel signal output from the peripheral photoelectric conversion unit, You can make a correction.

本発明の他の態様における画素欠陥補正装置は、複数の光電変換部を2次元配列させた複数の光電変換層を積層させた撮像素子の複数の光電変換層において欠陥のある光電変換部から出力される画素信号を補正する画素欠陥補正装置であって、欠陥光電変換部のない光電変換層の光電変換部から出力される画素信号に基づいて、補正を行う。 A pixel defect correction apparatus according to another aspect of the present invention outputs from a photoelectric conversion unit having a defect in a plurality of photoelectric conversion layers of an image pickup device in which a plurality of photoelectric conversion layers in which a plurality of photoelectric conversion units are two-dimensionally arranged are stacked. The pixel defect correction device corrects the pixel signal to be corrected, and performs the correction based on the pixel signal output from the photoelectric conversion unit of the photoelectric conversion layer having no defective photoelectric conversion unit.

本発明の他の態様における画素欠陥補正方法は、複数の光電変換部を2次元配列させた複数の光電変換層を積層させた撮像素子の複数の光電変換層において欠陥のある光電変換部から出力される画素信号を補正する画素欠陥補正方法であって、欠陥光電変換部のない光電変換層の光電変換部から出力される画素信号に基づいて、補正を行う。 A pixel defect correction method according to another aspect of the present invention is directed to output from a photoelectric conversion unit having a defect in a plurality of photoelectric conversion layers of an imaging device in which a plurality of photoelectric conversion layers in which a plurality of photoelectric conversion units are two-dimensionally arranged are stacked. Pixel defect correction method for correcting a pixel signal that is generated, the correction is performed based on the pixel signal output from the photoelectric conversion unit of the photoelectric conversion layer having no defective photoelectric conversion unit.

本発明によれば、光電変換部を積層させた撮像素子において、画質劣化を抑えながら画素欠陥補正処理を行うことができる。 According to the present invention, it is possible to perform pixel defect correction processing while suppressing deterioration of image quality in an image pickup device in which photoelectric conversion units are stacked.

第1の実施形態であるデジタルカメラのブロック図である。It is a block diagram of the digital camera which is a 1st embodiment. 単板式多層型撮像素子の内部構成を示した図である。It is the figure which showed the internal structure of the single-plate type|mold multilayer image sensor. 撮像素子の所定画素の内部構造を示した図である。It is a figure showing the internal structure of the predetermined pixel of an image sensor. 1つの欠陥光電変換部が1つの光電変換層に存在する場合の配列を示した図である。It is the figure which showed the arrangement|sequence in case one defective photoelectric conversion part exists in one photoelectric conversion layer. 1つの欠陥光電変換部が2つの光電変換層に存在する場合のブロックを示した図である。It is the figure which showed the block when one defective photoelectric conversion part exists in two photoelectric conversion layers. 3つの光電変換層のブロックの中心光電変換部がいずれも欠陥を含むブロックを示した図である。It is the figure which showed the block in which the center photoelectric conversion part of the block of three photoelectric conversion layers has a defect in all. 1つの光電変換層において周辺光電変換部に欠陥が生じているブロックを示した図である。It is the figure which showed the block in which the defect has arisen in the peripheral photoelectric conversion part in one photoelectric conversion layer. 2つの光電変換層において周辺光電変換部に欠陥が生じているブロックを示した図である。It is the figure which showed the block in which the defect has arisen in the peripheral photoelectric conversion part in two photoelectric conversion layers. シリコン基板内にフォトダイオードを積層させた撮像素子の一例を示した図である。It is a figure showing an example of an image sensor which laminated a photodiode in a silicon substrate.

以下では、図面を参照して本実施形態であるデジタルカメラについて説明する。図1は、第1の実施形態であるデジタルカメラのブロック図である。 The digital camera of this embodiment will be described below with reference to the drawings. FIG. 1 is a block diagram of a digital camera according to the first embodiment.

デジタルカメラ10は、カメラ本体30と、カメラ本体30に着脱自在な交換レンズ20とを備える。カメラCPUを含むシステムコントロール回路40は、電源ボタン、レリーズボタン、モード選択ダイヤル(いずれも図示せず)などに対する入力操作に従い、レンズ制御回路56、画像処理回路34などに制御信号を出力し、焦点調整、撮影制御、画像処理、記録処理、再生表示処理など一連のカメラ動作制御を行う。 The digital camera 10 includes a camera body 30 and an interchangeable lens 20 that is detachable from the camera body 30. The system control circuit 40 including the camera CPU outputs a control signal to the lens control circuit 56, the image processing circuit 34, etc. in accordance with an input operation on a power button, a release button, a mode selection dial (none of which is shown), and the focus A series of camera operation controls such as adjustment, shooting control, image processing, recording processing, reproduction display processing are performed.

システムコントロール回路40は、演算部、ROM、RAM、インターフェイス回路など(いずれも図示せず)を有し、カメラ動作制御のプログラムは、ROMなどの記録媒体(図示せず)に記憶されている。操作スイッチ群38は、電源スイッチ、撮影モード選択スイッチ、レリーズスイッチなどによって構成されている。図示しないタイミングジェネレータは、所定周波数のクロックパルス信号を各回路へ出力する。各回路の動作タイミングは、送られてくるクロックパルス信号に従う。 The system control circuit 40 has an arithmetic unit, a ROM, a RAM, an interface circuit and the like (all not shown), and a program for controlling camera operation is stored in a recording medium (not shown) such as a ROM. The operation switch group 38 includes a power switch, a shooting mode selection switch, a release switch, and the like. A timing generator (not shown) outputs a clock pulse signal having a predetermined frequency to each circuit. The operation timing of each circuit follows the clock pulse signal sent.

撮影モードでは、撮影光学系22を通った被写体からの光が撮像素子32の受光面に結像し、被写体像が撮像素子32に形成される。撮像素子32は、ここでは(M×N)の画素を配列させた単板式CMOS型イメージセンサであって、後述するように、複数の光電変換層を積層配置させた多層型撮像素子として構成されている。撮像素子駆動回路36は撮像素子32を駆動し、1フィールドあるいは1フレーム分の画素信号を撮像素子32から所定時間間隔で読み出す。なお、CMOS以外のX−Yアドレス型撮像素子を用いてもよい。 In the shooting mode, the light from the subject that has passed through the shooting optical system 22 forms an image on the light receiving surface of the image sensor 32, and a subject image is formed on the image sensor 32. The image sensor 32 is a single-plate CMOS image sensor in which (M×N) pixels are arrayed here, and is configured as a multilayer image sensor in which a plurality of photoelectric conversion layers are stacked and arranged, as described later. ing. The image sensor drive circuit 36 drives the image sensor 32 and reads pixel signals for one field or one frame from the image sensor 32 at predetermined time intervals. An XY address type image pickup device other than CMOS may be used.

撮像素子32から読み出された1フィールド/フレーム分の画素信号は、AD変換器33によってデジタル信号に変換された後、画像メモリ35へ一時的に格納される。画像処理回路34は、1フィールド/フレーム分の画素信号に対して色補間処理、ガンマ補正処理、ホワイトバランス調整などを施し、カラー画像信号を生成する。システムコントロール回路40は、カラー画像信号に基づいてLCDなどの表示器37を駆動し、これによってスルー画像が表示器37に表示される。 The pixel signal for one field/frame read from the image sensor 32 is converted into a digital signal by the AD converter 33, and then temporarily stored in the image memory 35. The image processing circuit 34 performs color interpolation processing, gamma correction processing, white balance adjustment, and the like on the pixel signal for one field/frame to generate a color image signal. The system control circuit 40 drives the display device 37 such as an LCD based on the color image signal, whereby a through image is displayed on the display device 37.

レリーズボタンが半押しされると、焦点調節が行われる。システムコントロール回路40は、撮像素子32から読み出される画素信号に基づいてAF処理を実行する。すなわち、デフォーカス量を算出して結像面を合焦位置にシフトさせる。また、多点測距によるAF処理が実行可能である。レンズCPU28は、カメラ側マウント接点およびレンズ側マウントを介してレンズ制御回路56と通信可能であり、レンズ制御回路56からの指令に基づきレンズ駆動機構26を制御する。レンズ駆動機構26は、レンズCPU28からの制御信号に従って撮影光学系22のフォーカシングレンズを光軸方向に沿って移動させる。また、レリーズボタン半押しに従い、システムコントロール回路40は撮像素子32から読み出された画素信号に基づいて被写体の明るさを検出し、露出値(シャッタスピード、絞り値など)を算出する。 When the release button is pressed halfway, focus adjustment is performed. The system control circuit 40 executes AF processing based on the pixel signal read from the image sensor 32. That is, the defocus amount is calculated and the image plane is shifted to the in-focus position. Further, AF processing by multi-point distance measurement can be executed. The lens CPU 28 can communicate with the lens control circuit 56 via the camera side mount contact and the lens side mount, and controls the lens drive mechanism 26 based on a command from the lens control circuit 56. The lens driving mechanism 26 moves the focusing lens of the photographing optical system 22 along the optical axis direction in accordance with a control signal from the lens CPU 28. When the release button is pressed halfway down, the system control circuit 40 detects the brightness of the subject based on the pixel signals read from the image sensor 32 and calculates the exposure value (shutter speed, aperture value, etc.).

レリーズボタンが全押しされると、システムコントロール回路40は露出制御を行う。ここでは、撮像素子32の電子シャッタ機能によってシャッタスピード、すなわち露出時間を調整する。レンズCPU28は、送られてくる絞り値データに応じて絞り23の開口度合いを調整し、撮像素子32へ入射する光量を調整する。 When the release button is fully pressed, the system control circuit 40 controls the exposure. Here, the electronic shutter function of the image sensor 32 adjusts the shutter speed, that is, the exposure time. The lens CPU 28 adjusts the opening degree of the diaphragm 23 according to the transmitted aperture value data, and adjusts the amount of light incident on the image sensor 32.

1フレーム分の画素信号が撮像素子32から読み出されると、画像処理回路34は、ホワイトバランス処理、γ補正処理などを1フレーム分の画素信号に対して実行し、静止画像データを生成する。静止画像データは、圧縮処理された後あるいは非圧縮状態で画像メモリ35へ一時的に格納された後、メモリカードなど着脱自在な記録媒体54に記録される。 When the pixel signal for one frame is read from the image sensor 32, the image processing circuit 34 performs white balance processing, γ correction processing, and the like on the pixel signal for one frame to generate still image data. The still image data is recorded in a removable recording medium 54 such as a memory card after being compressed or temporarily stored in the image memory 35 in an uncompressed state.

システムコントロール回路40は、後述するように、欠陥のある画素(光電変換部)によって撮像素子32から送られてくるR,G,Bの画素信号に劣化を生じるのを防ぐため、画素欠陥補正を行う。事前計測などによってあらかじめ欠陥画素の位置を表す画素欠陥データが画素欠陥データメモリ(図示せず)に記憶されており、この情報に基づき、欠陥画素の画素値に対して補正処理を行う。 As will be described later, the system control circuit 40 performs pixel defect correction in order to prevent deterioration of the R, G, and B pixel signals sent from the image sensor 32 due to defective pixels (photoelectric conversion unit). To do. Pixel defect data indicating the position of the defective pixel is stored in advance in a pixel defect data memory (not shown) by prior measurement or the like, and the pixel value of the defective pixel is corrected based on this information.

図2は、撮像素子の積層構造を模式的に示した図である。図3は、撮像素子の所定画素の内部構造を示した図である。 FIG. 2 is a diagram schematically showing a laminated structure of the image sensor. FIG. 3 is a diagram showing an internal structure of a predetermined pixel of the image sensor.

図2に示すように、撮像素子32では、シリコン基板75の上に3つの光電変換層62B、62G、62Rが入射側からこの順で積層配置されており、絶縁膜60、61、62が間に介在する。光電変換層62Bは、Bの波長域に応じた光を選択的に吸収、光電変換し、それ以外の波長域の光(G、Rを含む)に応じた光を透過させる。光電変換層62Gは、Gに応じた波長域の光を吸収、光電変換し、それ以外の波長域の光を透過させる。そして、光電変換層62Rは、Rに応じた波長域の光を吸収、光電変換し、それ以外の波長域の光を透過させる。 As shown in FIG. 2, in the image sensor 32, three photoelectric conversion layers 62B, 62G, and 62R are laminated on the silicon substrate 75 in this order from the incident side, and the insulating films 60, 61, and 62 are interposed between them. Intervene in. The photoelectric conversion layer 62B selectively absorbs and photoelectrically converts light according to the wavelength range of B, and transmits light according to light (including G and R) in other wavelength ranges. The photoelectric conversion layer 62G absorbs and photoelectrically converts light in a wavelength range corresponding to G, and transmits light in other wavelength ranges. The photoelectric conversion layer 62R absorbs and photoelectrically converts light in the wavelength range corresponding to R, and transmits light in the other wavelength ranges.

光電変換層62B、62G,62Rは、それぞれ、B、G、Rに応じた波長域の光を選択的に吸収し、光電変換する薄膜化した光電変換膜によって構成されており、ここでは有機光電変換膜から成る。光電変換層62Bについては、例えばペリレン誘導体を材料とすることが可能であり、光電変換層62Gについては、例えばキナクリドンを材料とし、光電変換層62Rについては、フタロシアニン誘導体を材料とすることが可能である。なお、有機材料ではなく、無機材料、有機無機混合材料によって成形してもよい。 The photoelectric conversion layers 62B, 62G, and 62R are each configured by a thin photoelectric conversion film that selectively absorbs light in a wavelength range corresponding to B, G, and R and photoelectrically converts the light. It consists of a conversion film. The photoelectric conversion layer 62B can be made of, for example, a perylene derivative, the photoelectric conversion layer 62G can be made of, for example, quinacridone, and the photoelectric conversion layer 62R can be made of a phthalocyanine derivative. is there. It should be noted that the molding may be made of an inorganic material or an organic-inorganic mixed material instead of the organic material.

図3に示すように、光電変換層62Bは、画素電極92Bと対向電極91Bとの間に挟まれており、Bに応じた光が入射すると電荷が発生する。発生した電荷は、プラグ63を経由してシリコン基板75に形成されたストレージダイオード66Bに格納される。シリコン基板75には画素信号読み出し回路74が形成されており、駆動パルスによって画素信号がストレージダイオード66Bから読み出される。 As shown in FIG. 3, the photoelectric conversion layer 62B is sandwiched between the pixel electrode 92B and the counter electrode 91B, and when light corresponding to B is incident, charges are generated. The generated charges are stored in the storage diode 66B formed on the silicon substrate 75 via the plug 63. A pixel signal read circuit 74 is formed on the silicon substrate 75, and a pixel signal is read from the storage diode 66B by a drive pulse.

光電変換層62G、62Rも、それぞれ、画素電極82G,72Rと対向電極81G、71Rとに間に挟まれた構造であり、プラグ65、67を経由して電荷がストレージダイオード66G,66Rに格納される。画素電極72R、82G、92Bおよび対向電極71R,81G,91Bは、透明な電極材料によって成形されており、画素電極92B、82G、72Rおよび対向電極71R,81G,91Bをマトリクス状に2次元配置させることによって撮像素子32の画素領域が規定される。 The photoelectric conversion layers 62G and 62R are also sandwiched between the pixel electrodes 82G and 72R and the counter electrodes 81G and 71R, respectively, and charges are stored in the storage diodes 66G and 66R via the plugs 65 and 67. It The pixel electrodes 72R, 82G, 92B and the counter electrodes 71R, 81G, 91B are formed of a transparent electrode material, and the pixel electrodes 92B, 82G, 72R and the counter electrodes 71R, 81G, 91B are two-dimensionally arranged in a matrix. This defines the pixel area of the image sensor 32.

光電変換層62B、62G、62Rの各画素領域は互いに向かい合っており、撮像素子32の各画素は、3つの光電変換層62B、62G、62Rの画素領域(以下、光電変換部という)をもつ。光電変換層62B上には、画素位置に合わせてマイクロレンズアレイが形成されており、各マイクロレンズに入射した光は、光電変換層62B、62G,62Rの深さ方向に沿って同じ位置にある光電変換部に入射する。R,G、Bのカラーフィルタとして機能する光電変換層62B、62G,62Rを撮像素子32の各画素に積層配置することにより、撮像素子32の各画素からR,G,Bの画素信号が出力される。 The pixel regions of the photoelectric conversion layers 62B, 62G, and 62R face each other, and each pixel of the image sensor 32 has the pixel regions of the three photoelectric conversion layers 62B, 62G, and 62R (hereinafter referred to as photoelectric conversion units). A microlens array is formed on the photoelectric conversion layer 62B in accordance with the pixel position, and the light incident on each microlens is at the same position along the depth direction of the photoelectric conversion layers 62B, 62G, and 62R. It is incident on the photoelectric conversion unit. By stacking the photoelectric conversion layers 62B, 62G, and 62R that function as R, G, and B color filters on each pixel of the image sensor 32, the pixel signals of R, G, and B are output from each pixel of the image sensor 32. To be done.

図4は、1つの欠陥光電変換部が1つの光電変換層に存在する場合の配列を示した図である。ここでは、図2に示した撮像素子32の撮像領域IMの一部領域32R、32G,32Bに定められる3×3ブロックを示している。他のブロックについても同様の補正処理が行われる。 FIG. 4 is a diagram showing an arrangement in which one defective photoelectric conversion unit is present in one photoelectric conversion layer. Here, 3×3 blocks defined in the partial regions 32R, 32G, and 32B of the image pickup region IM of the image pickup device 32 shown in FIG. 2 are shown. Similar correction processing is performed on the other blocks.

図4では、光電変換層62Rの3×3ブロックBRにおいて、中心の光電変換部R0に欠陥ある場合を示している。この場合、欠陥光電変換部が含まれない光電変換層62G、62Bの光電変換部から出力される画素信号を用いて、補正処理を施す。 In FIG. 4, in the 3×3 block BR of the photoelectric conversion layer 62R, the case where the central photoelectric conversion portion R 0 has a defect is shown. In this case, the correction process is performed using the pixel signals output from the photoelectric conversion units of the photoelectric conversion layers 62G and 62B that do not include the defective photoelectric conversion unit.

具体的には、最初に、Rn/(Rn+Gn+Bn)(n=1,2,・・,8)を算出し、その平均値あるいはメディアン値をPとして算出する。そして、P=R0/(R0+G0+B0)の式からR0=(G0+B0)/(1/P−1)を得る。 More specifically, initially, R n / (R n + G n + B n) (n = 1,2, ··, 8) , and calculates an average value or median value as P. Then, R 0 =(G 0 +B 0 )/(1/P-1) is obtained from the equation of P=R 0 /(R 0 +G 0 +B 0 ).

すなわち、光電変換層62B、62G,62Rにおける(B0、G0、R0)以外の光電変換部から出力される(Bn,Gn,Rn)の画素信号加算値に対するRの画素値の割合平均が、(B0、G0、R0)における割合平均と等しいものとみなすことによって、欠陥光電変換部R0の画素信号の値を補正する。 That is, the photoelectric conversion layer 62B, 62G, at 62R (0 B, G 0, R 0) other than the output from the photoelectric conversion section (B n, G n, R n) pixel values of R for the pixel signal sum of The value of the pixel signal of the defective photoelectric conversion unit R 0 is corrected by assuming that the ratio average of the defect photoelectric conversion unit R 0 is equal to the ratio average of (B 0 , G 0 , R 0 ).

あるいは、比に基づいて画素欠陥補正処理を行ってもよい。最初に、Bn/Gn(n=1,2,・・・・,8)を算出し、その中でB0/G0の値に最も近いBm/Gmを求めた後、その位置mによるPm=Rm/(Rm+Gm+Bm)を算出する。そして、P=R0/(R0+G0+B0)=Pmの式から、R0を算出する。 Alternatively, the pixel defect correction processing may be performed based on the ratio. First, B n /G n (n=1, 2,..., 8) is calculated, and B m /G m closest to the value of B 0 /G 0 is calculated, and then Calculate P m =R m /(R m +G m +B m ) according to the position m. Then, R 0 is calculated from the equation P=R 0 /(R 0 +G 0 +B 0 )=P m .

中心位置にある光電変換部G0、B0と隣接する光電変換部との間の比を算出し、その中で最も値がB0/G0の値と近い位置、すなわち相関関係が強い位置を検出し、その位置の光電変換部の画素信号に基づいて画素欠陥補正処理を行う。 The ratio between the photoelectric conversion units G 0 and B 0 at the center position and the adjacent photoelectric conversion units is calculated, and the position where the value is the closest to the value of B 0 /G 0 , that is, the position where the correlation is strong. Is detected, and pixel defect correction processing is performed based on the pixel signal of the photoelectric conversion unit at that position.

また、差分に基づいて画素欠陥補正処理を行うことも可能である。最初に、(Bn−Gn)(n=1,2,・・・・,8)を算出し、その中で(B0−G0)の値に最も近い(Bm−Gm)を求め、その位置mに応じた光電変換層62Rの光電変換部RmをR0と定める。ただし、R0=Rm×(B0−G0)/(Bm−Gm)によって求めてもよい。このような差分処理を行うことによって、演算時間の短縮、消費電力の低減が実現される。 It is also possible to perform pixel defect correction processing based on the difference. First, (B n -G n) ( n = 1,2, ····, 8) to calculate the closest to the value of in the (B 0 -G 0) (B m -G m) And the photoelectric conversion part R m of the photoelectric conversion layer 62R corresponding to the position m is determined as R 0 . However, it may be obtained by R 0 =R m ×(B 0 −G 0 )/(B m −G m ). By performing such a difference process, the calculation time and the power consumption can be reduced.

このように本実施形態によれば、B,G,Rに応じた光電変換層62B、62G,62Rに2次元配列させた複数の光電変換部の中の欠陥光電変換部に対し、それを中心とする画素ブロック内で他の光電変換層の欠陥のない光電変換部から出力される画素信号を利用して、画素欠陥補正処理を施す。同一画素に含まれる他の光電変換部に対して補正処理が行われないため、画素欠陥補正による画質劣化を抑えることができる。また、周辺にある相関性の高い光電変換部から出力される画素信号に基づいて補正するため、適正に画素値の補正を行うことができる。 As described above, according to the present embodiment, the defect photoelectric conversion units among the plurality of photoelectric conversion units arranged two-dimensionally in the photoelectric conversion layers 62B, 62G, and 62R corresponding to B, G, and R are centered on the defective photoelectric conversion units. Pixel defect correction processing is performed using a pixel signal output from a photoelectric conversion unit having no defect in another photoelectric conversion layer in the pixel block. Since the correction processing is not performed on the other photoelectric conversion units included in the same pixel, it is possible to suppress the image quality deterioration due to the pixel defect correction. In addition, since the correction is performed based on the pixel signal output from the photoelectric conversion unit having a high correlation in the vicinity, the pixel value can be properly corrected.

次に図5を用いて、第2の実施形態について説明する。第2の実施形態では、2つの光電変換層に欠陥光電変換部がある場合、欠陥光電変換部のない残りの光電変換層の光電変換部から出力される画素信号に基づいて画素欠陥補正を行う。 Next, a second embodiment will be described with reference to FIG. In the second embodiment, when the two photoelectric conversion layers have defective photoelectric conversion units, pixel defect correction is performed based on the pixel signals output from the photoelectric conversion units of the remaining photoelectric conversion layers without defective photoelectric conversion units. ..

図5は、1つの欠陥光電変換部が2つの光電変換層に存在する場合のブロックを示した図である。図5では、光電変換層62Rの光電変換部R0、光電変換層62Bの光電変換部B0に欠陥がある場合を示している。 FIG. 5 is a diagram showing a block when one defective photoelectric conversion unit exists in two photoelectric conversion layers. FIG. 5 shows a case where the photoelectric conversion section R 0 of the photoelectric conversion layer 62R and the photoelectric conversion section B 0 of the photoelectric conversion layer 62B have defects.

最初に、Gn(n=1,2,・・・・,8)の中でG0の値に最も近い光電変換部Gmを求め、その位置mにある光電変換部Rm、Bmを、それぞれR0、B0として定める。ただし、R0=Rm×G0/Gm,B0=Bm×G0/Bmの式によって求めてもよい。このように、欠陥光電変換部と相対的に相関性の強い光電変換部の値で代替することによって、2つに光電変換層に欠陥光電変換部があっても、画質劣化を低減させることができる。 First, in G n (n=1, 2,..., 8), the photoelectric conversion unit G m closest to the value of G 0 is obtained, and the photoelectric conversion units R m and B m at the position m are obtained. Are defined as R 0 and B 0 , respectively. However, it may be obtained by the formulas R 0 =R m ×G 0 /G m and B 0 =B m ×G 0 /B m . As described above, by substituting the value of the photoelectric conversion part having a strong correlation with the defective photoelectric conversion part, even if there are two defective photoelectric conversion parts in the photoelectric conversion layer, deterioration of image quality can be reduced. it can.

図6は、3つの光電変換層のブロックBB、BG、BRの中心光電変換部B0、G0、R0がいずれも欠陥を含むブロックを示した図である。中心光電変換部B0、G0、R0がいずれも欠陥である場合、従来の補正処理に従い、相関性の強い並びに沿って補正処理を行なえばよい。例えば、縦方向に相関性が強い場合、R2、R6、G2、G6、B2、B6によって補正すればよい。 FIG. 6 is a diagram showing a block in which each of the central photoelectric conversion units B 0 , G 0 , and R 0 of the blocks BB, BG, and BR of the three photoelectric conversion layers has a defect. When all of the central photoelectric conversion units B 0 , G 0 , and R 0 are defective, the correction process may be performed according to the conventional correction process along the strong correlation. For example, when the correlation is strong in the vertical direction, it may be corrected by R 2 , R 6 , G 2 , G 6 , B 2 , and B 6 .

次に、図7を用いて、第3の実施形態について説明する。第3の実施形態では、中心に欠陥光電変換部が存在しない他の光電変換層の周辺に欠陥光電変換部が生じている場合、それを除いて画素欠陥補正処理を行う。それ以外の構成については、第1の実施形態と同じである。 Next, a third embodiment will be described with reference to FIG. In the third embodiment, when a defective photoelectric conversion part is formed around another photoelectric conversion layer that does not have a defective photoelectric conversion part in the center, the pixel defect correction process is performed excluding it. The other configuration is the same as that of the first embodiment.

図7は、1つの光電変換層において周辺光電変換部に欠陥が生じているブロックを示した図である。図7では、光電変換層62Rの中心の光電変換部R0と、光電変換層62Bにおいて光電変換部R0と同一画素に当たる光電変換部B0の周辺光電変換部B3とに欠陥が生じている。例えば、R0を補正する場合、欠陥光電変換部B3、およびその位置に応じたR3、G3を除いた補正処理(n=1,2,・・・ ,8(n≠3))を施す。それ以外の演算方法は、第1の実施形態と同じである。このように周辺光電変換部に欠陥光電変換部が存在しても、適正に補正することができる。 FIG. 7 is a diagram showing a block in which a peripheral photoelectric conversion part has a defect in one photoelectric conversion layer. In FIG. 7, defects occur in the photoelectric conversion unit R 0 at the center of the photoelectric conversion layer 62R and the peripheral photoelectric conversion unit B 3 of the photoelectric conversion unit B 0 which corresponds to the same pixel as the photoelectric conversion unit R 0 in the photoelectric conversion layer 62B. There is. For example, in the case of correcting R 0 , the correction process excluding the defective photoelectric conversion unit B 3 and R 3 and G 3 according to the position (n=1, 2,..., 8 (n≠3)) Apply. The other calculation method is the same as that of the first embodiment. As described above, even if the peripheral photoelectric conversion unit has a defective photoelectric conversion unit, it can be appropriately corrected.

図8は、2つの光電変換層において周辺光電変換部に欠陥が生じているブロックを示した図である。図8では、光電変換層62Rの中心の光電変換部R0と、光電変換層62Gにおいて光電変換部R0と同一画素に当たる光電変換部G0の周辺光電変換部G5と、光電変換層62Bにおいて光電変換部R0と同一画素に当たる光電変換部B0の周辺光電変換部B3とに欠陥が生じている。この場合、B5、G5、R5およびB3、G3、R3を除いて第1の実施形態と同様の補正処理を行う。 FIG. 8 is a diagram showing a block in which a peripheral photoelectric conversion section has a defect in two photoelectric conversion layers. In FIG. 8, the photoelectric conversion part R 0 at the center of the photoelectric conversion layer 62R, the peripheral photoelectric conversion part G 5 of the photoelectric conversion part G 0 which corresponds to the same pixel as the photoelectric conversion part R 0 in the photoelectric conversion layer 62G, and the photoelectric conversion layer 62B. In, there is a defect in the photoelectric conversion unit R 0 and the peripheral photoelectric conversion unit B 3 of the photoelectric conversion unit B 0 which corresponds to the same pixel. In this case, the same correction processing as in the first embodiment is performed except for B 5 , G 5 , R 5 and B 3 , G 3 , R 3 .

なお、シリコン基板内に3層のフォトダイオード構造を形成してR,G,Bの光電変換膜を形成することも可能である。図9は、シリコン基板内にフォトダイオードを積層させた撮像素子の一例を示した図である。撮像素子32’では、深さ方向に沿ってn型層、p型層、n型層が順に形成されている。基板表面側から入射した光は波長の長いものほど深く侵入する性質を利用して、R,G,Bの画素信号を出力する。この場合、B,G、Rの波長域の光を上からn型層、p型層、n型層が選択的に吸収するように、pn接合の深さが設計されている。 It is also possible to form a three-layered photodiode structure in the silicon substrate to form the R, G, B photoelectric conversion films. FIG. 9 is a diagram showing an example of an image pickup device in which photodiodes are stacked in a silicon substrate. In the image sensor 32', an n-type layer, a p-type layer, and an n-type layer are sequentially formed along the depth direction. The R, G, and B pixel signals are output by utilizing the property that the light incident from the substrate surface side penetrates deeper as the wavelength increases. In this case, the depth of the pn junction is designed so that the n-type layer, the p-type layer, and the n-type layer selectively absorb light in the B, G, and R wavelength ranges from above.

第1〜第3の実施形態では、光電変換層62Rに存在する欠陥光電変換部データに基づき、その画素の光電変換部を中心として周辺の光電変換部を含むブロックを光電変換層ごとに定め、ブロック内の欠陥のない光電変換部から出力される画素信号に基づいて画素欠陥補正処理を実行しているが、他(所定)の光電変換層の欠陥光電変換部をベースにして補正処理を実行してもよい。 In the first to third embodiments, based on the defective photoelectric conversion unit data existing in the photoelectric conversion layer 62R, a block including a peripheral photoelectric conversion unit around the photoelectric conversion unit of the pixel is defined for each photoelectric conversion layer, Pixel defect correction processing is executed based on the pixel signals output from the defect-free photoelectric conversion unit in the block, but correction processing is executed based on the defect photoelectric conversion unit of the other (predetermined) photoelectric conversion layer. You may.

また、画素欠陥情報をあらかじめデータとして記憶させる構成に限定されず、カメラ製造時、使用状況などによって画素データとして適さなくなるような画素も補正処理することを考慮すれば、欠陥光電変換部の検出部、判定部をカメラ内に設けてもよい。 Further, the detection unit of the defective photoelectric conversion unit is not limited to the configuration in which the pixel defect information is stored in advance as data, and considering that a pixel that becomes unsuitable as the pixel data due to the usage condition of the camera during manufacturing is also corrected. The determination unit may be provided inside the camera.

また、R,G,B以外の光電変換層を形成することも可能であり、互いに波長域の異なる光を選択的に吸収し、光電変換する複数の光電変換層を形成してもよい。 It is also possible to form a photoelectric conversion layer other than R, G, and B, and a plurality of photoelectric conversion layers that selectively absorb light having different wavelength regions and perform photoelectric conversion may be formed.

上述した演算方法以外によって画素欠陥補正処理を行ってもよい。この場合、ある画素エリアを対象としたときに欠陥光電変換部のない光電変換層の光電変換部を少なくとも用いて補正処理を施せばよい。 The pixel defect correction processing may be performed by a method other than the above-described calculation method. In this case, when a certain pixel area is targeted, the correction process may be performed by using at least the photoelectric conversion unit of the photoelectric conversion layer having no defective photoelectric conversion unit.

10 デジタルカメラ
32 撮像素子
62R 光電変換層
62G 光電変換層
62B 光電変換層
n 光電変換部
n 光電変換部
n 光電変換部
10 digital camera 32 image sensor 62R photoelectric conversion layer 62G photoelectric conversion layer 62B photoelectric conversion layer R n photoelectric conversion unit G n photoelectric conversion unit B n photoelectric conversion unit

Claims (8)

複数の光電変換部を2次元配列させた複数の光電変換層を積層させた撮像素子と、
前記複数の光電変換層において欠陥のある光電変換部から出力される画素信号を、同一画素に含まれる他の光電変換層の欠陥のない光電変換部から出力される画素信号と、その周囲の光電変換部から出力される画素信号との相関に基づいて、補正する補正部とを備え、
前記補正部が、前記周囲の光電変換部の中で、前記欠陥のない光電変換部と最も相関関係の強い位置にある光電変換部から出力される画素信号に基づいて、補正を行うことを特徴とする撮像装置。
An image pickup device in which a plurality of photoelectric conversion layers in which a plurality of photoelectric conversion units are two-dimensionally arranged are stacked,
A pixel signal output from a defective photoelectric conversion unit in the plurality of photoelectric conversion layers is a pixel signal output from a defect-free photoelectric conversion unit of another photoelectric conversion layer included in the same pixel, and a photoelectric signal around the pixel signal. A correction unit that corrects based on the correlation with the pixel signal output from the conversion unit,
The correction unit performs correction based on a pixel signal output from the photoelectric conversion unit in the position having the strongest correlation with the defect-free photoelectric conversion unit among the peripheral photoelectric conversion units. Image pickup device.
前記補正部が、複数の光電変換層それぞれの、前記欠陥のない光電変換部から出力される画素信号と、その周囲の光電変換部から出力される画素信号とに基づいて、前記欠陥のない光電変換部と最も相関関係の強い位置にある光電変換部を検出することを特徴とする請求項1に記載の撮像装置。 The correction unit, for each of the plurality of photoelectric conversion layers, based on a pixel signal output from the defect-free photoelectric conversion unit and a pixel signal output from the peripheral photoelectric conversion unit, the defect-free photoelectric conversion unit. The image pickup apparatus according to claim 1, wherein the photoelectric conversion unit located at a position having the strongest correlation with the conversion unit is detected . 前記補正部が、前記複数の光電変換層の間で対応する光電変換部の画素値の比に基づいて、最も相関関係の強い位置にある光電変換部を検出することを特徴とする請求項2に記載の撮像装置。 The correction unit detects a photoelectric conversion unit in a position having the strongest correlation, based on a ratio of pixel values of corresponding photoelectric conversion units among the plurality of photoelectric conversion layers. The imaging device according to. 前記補正部が、前記複数の光電変換層の間で対応する光電変換部の画素値の差分に基づいて、最も相関関係の強い位置にある光電変換部を検出することを特徴とする請求項2に記載の撮像装置。 The correction unit detects a photoelectric conversion unit in a position having the strongest correlation, based on a difference between pixel values of corresponding photoelectric conversion units among the plurality of photoelectric conversion layers. The imaging device according to. 前記補正部が、同一画素に含まれる他の光電変換層の欠陥のない光電変換部の画素値に最も近い画素値をもつ光電変換部から出力される画素信号に基づいて、補正を行うことを特徴とする請求項1に記載の撮像装置。 The correction unit may perform correction based on a pixel signal output from a photoelectric conversion unit having a pixel value closest to a pixel value of a photoelectric conversion unit having no defect in another photoelectric conversion layer included in the same pixel. The image pickup apparatus according to claim 1, wherein the image pickup apparatus is provided. 前記補正部が、他の光電変換層において欠陥光電変換部と隣接位置関係にあって欠陥をもつ周辺光電変換部が存在する場合、その周辺光電変換部から出力される画素信号を除いて、補正を行うことを特徴とする請求項1乃至5のいずれかに記載の撮像装置。 When the correction unit has a peripheral photoelectric conversion unit having a defect in a positional relationship adjacent to the defective photoelectric conversion unit in another photoelectric conversion layer, the correction is performed except for the pixel signal output from the peripheral photoelectric conversion unit. The image pickup apparatus according to claim 1, wherein 複数の光電変換部を2次元配列させた複数の光電変換層を積層させた撮像素子の前記複数の光電変換層において欠陥のある光電変換部から出力される画素信号を、同一画素に含まれる他の光電変換層の欠陥のない光電変換部から出力される画素信号と、その周囲の光電変換部から出力される画素信号との相関に基づいて、補正する画素欠陥補正装置であって、
前記周囲の光電変換部の中で、前記欠陥のない光電変換部と最も相関関係の強い位置にある光電変換部から出力される画素信号に基づいて、補正を行うことを特徴とする画素欠陥補正装置。
Pixel signals output from defective photoelectric conversion units in the plurality of photoelectric conversion layers of the image pickup device in which the plurality of photoelectric conversion layers in which the plurality of photoelectric conversion units are two-dimensionally arranged are stacked are included in the same pixel. A pixel defect correction device for correcting , based on a correlation between a pixel signal output from a photoelectric conversion unit having no defect in the photoelectric conversion layer and a pixel signal output from a photoelectric conversion unit around the photoelectric conversion unit ,
Pixel defect correction characterized by performing a correction based on a pixel signal output from the photoelectric conversion unit in the position having the strongest correlation with the defect-free photoelectric conversion unit in the surrounding photoelectric conversion units. apparatus.
複数の光電変換部を2次元配列させた複数の光電変換層を積層させた撮像素子の前記複数の光電変換層において欠陥のある光電変換部から出力される画素信号を、同一画素に含まれる他の光電変換層の欠陥のない光電変換部から出力される画素信号と、その周囲の光電変換部から出力される画素信号との相関に基づいて、補正する画素欠陥補正方法であって、
前記周囲の光電変換部の中で、前記欠陥のない光電変換部と最も相関関係の強い位置にある光電変換部から出力される画素信号に基づいて、補正を行うことを特徴とする画素欠陥補正方法。
Pixel signals output from defective photoelectric conversion units in the plurality of photoelectric conversion layers of the image pickup device in which the plurality of photoelectric conversion layers in which the plurality of photoelectric conversion units are two-dimensionally arranged are stacked are included in the same pixel. A pixel defect correction method for correcting , based on a correlation between a pixel signal output from a photoelectric conversion unit having no defect of the photoelectric conversion layer and a pixel signal output from a photoelectric conversion unit around the photoelectric conversion unit ,
Pixel defect correction characterized by performing a correction based on a pixel signal output from the photoelectric conversion unit in the position having the strongest correlation with the defect-free photoelectric conversion unit in the surrounding photoelectric conversion units. Method.
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