JP6767211B2 - A metal member for a piezoelectric / electrostrictive film and a method for manufacturing the metal member for a piezoelectric / electrostrictive film. - Google Patents
A metal member for a piezoelectric / electrostrictive film and a method for manufacturing the metal member for a piezoelectric / electrostrictive film. Download PDFInfo
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Description
本発明は、圧電/電歪膜用金属部材 及び該圧電/電歪膜用金属部材の製造方法に係り、更に詳細には、表面に圧電/電歪膜を直接形成可能な絶縁性被膜を備える圧電/電歪膜用金属部材 及び該圧電/電歪膜用金属部材の製造方法に関する。 The present invention relates to a metal member for a piezoelectric / electrostrictive film and a method for manufacturing the metal member for a piezoelectric / electrostrictive film, and more specifically, includes an insulating film capable of directly forming a piezoelectric / electrostrictive film on the surface. The present invention relates to a metal member for a piezoelectric / electrolytic film and a method for manufacturing the metal member for a piezoelectric / electrolytic film.
上記圧電/電歪膜は、導体又は半導体に電界を加えることとで歪が生じることや、導体又は半導体が伸び縮みすることで電気抵抗値が変化することを利用するものであるため、ステンレス等の金属基材に圧電/電歪膜を設ける場合、電気的な絶縁層が必要であり、上記絶縁層としては、樹脂等の有機膜や酸化ケイ素等の無機膜が用いられている。 The piezoelectric / electrolytic strain film utilizes the fact that distortion is generated by applying an electric field to a conductor or semiconductor, and that the electric resistance value changes due to expansion and contraction of the conductor or semiconductor. When a piezoelectric / electrostrictive film is provided on the metal substrate of the above, an electrical insulating layer is required, and as the insulating layer, an organic film such as a resin or an inorganic film such as silicon oxide is used.
上記有機膜は耐熱性が低いため、スパッタリング等で圧電/電歪膜薄膜を形成することが困難であり、形成できる圧電/電歪膜が制限される。 Since the organic film has low heat resistance, it is difficult to form a piezoelectric / electrolytic strain film thin film by sputtering or the like, and the piezoelectric / electrolytic strain film that can be formed is limited.
また、酸化ケイ素の絶縁膜は、耐熱性を有するものであるが、CVDや熱酸化で形成する場合は時間とコストがかかるという問題ある。さらに、ゾルゲル法等のウエットプロセスで酸化ケイ素の絶縁膜を形成する場合は、塗膜焼成時に亀裂が発生し易く緻密な絶縁膜を形成することが困難で、製造歩留りを低下させるという問題がある。 Further, although the insulating film of silicon oxide has heat resistance, there is a problem that it takes time and cost when it is formed by CVD or thermal oxidation. Further, when an insulating film of silicon oxide is formed by a wet process such as a sol-gel method, cracks are likely to occur during firing of the coating film, it is difficult to form a dense insulating film, and there is a problem that the manufacturing yield is lowered. ..
そこで、ウエットプロセスで形成可能な緻密で絶縁性の高い無機膜が期待される。
特許文献1の特開2006−188408号公報には、耐熱性が高く電気絶縁性に優れる粘土膜が開示されている。
Therefore, a dense and highly insulating inorganic film that can be formed by a wet process is expected.
Japanese Unexamined Patent Publication No. 2006-188408 of
特許文献1に記載のものは、層状粘土鉱物の分散液は、乾燥することで、層状粘土鉱物が重なり合って膜状になることを応用して層状粘土鉱物の自立膜を得るものである。
そして、上記特許文献1に開示される技術によれば、層状粘土鉱物により電気絶縁性に優れた自立膜を作製することができる。
The one described in
Then, according to the technique disclosed in
しかしながら、上記自立膜は、膜の強度や柔軟性を保つために高分子樹脂が配合されたものであるため、充分な耐熱性を有するものであるとは云えない。また、上記自立膜は、樹脂を配合した層状粘土鉱物の自立膜であり、金属基材に密着した絶縁膜ではない。 However, since the self-supporting film contains a polymer resin in order to maintain the strength and flexibility of the film, it cannot be said that the self-supporting film has sufficient heat resistance. Further, the self-supporting film is a self-supporting film of a layered clay mineral containing a resin, and is not an insulating film in close contact with a metal substrate.
本発明は、このような従来技術の有する課題に鑑みてなされたものであり、その目的とするところは、金属基材表面に簡単に形成でき、緻密で絶縁性が高く、圧電/電歪膜の形成が可能な耐熱性絶縁被膜を備える圧電/電歪膜用金属部材を提供することを目的とする。 The present invention has been made in view of the problems of the prior art, and an object of the present invention is that it can be easily formed on the surface of a metal substrate, is dense and has high insulating properties, and is a piezoelectric / electrolytic strain film. It is an object of the present invention to provide a metal member for a piezoelectric / electrostrictive film having a heat-resistant insulating film capable of forming the above.
本発明者は、上記目的を達成すべく鋭意検討を重ねた結果、スメクタイト粘土鉱物は、板状又は円盤状の粒子が密着した積層した構造の塗布膜となって、焼成しても亀裂が発生せずに緻密で絶縁性が高い被膜を形成できることを見出し、本発明を完成するに至った。 As a result of diligent studies to achieve the above object, the present inventor has formed a coating film having a laminated structure in which plate-shaped or disk-shaped particles are in close contact with each other, and cracks occur even when fired. We have found that a dense and highly insulating film can be formed without using the above, and have completed the present invention.
即ち、本発明の圧電/電歪膜用金属部材は、金属基材表面に絶縁性被膜を備える。
そして、上記金属基材がSUS材であり、上記絶縁性被膜が、スメクタイト粘土鉱物由来の粘土層を備えるものであり、上記絶縁性被膜の膜厚が0.7μm以上20μm以下であり、その抵抗値が1.00×109Ω以上であることを特徴とする。
That is, the metal member for a piezoelectric / electrostrictive film of the present invention has an insulating film on the surface of the metal base material.
Then, a SUS material the metal substrate, the insulating film is a shall comprise a clay layer from smectite clay minerals, the thickness of the insulating film is at 0.7μm or 20μm or less, the wherein the resistance value is 1.00 × 10 9 Ω or more.
また、本発明の絶縁性被膜付圧電/電歪膜用金属部材の製造方法は、絶縁性被膜組成物の塗布膜を形成した金属基材を焼成し、絶縁性被膜を形成する工程を有する。
そして、上記金属基材が、SUS材であり、上記絶縁性被膜組成物が、スメクタイト粘土鉱物と、減粘剤と、分散媒とを含み、pHが10.0以上であるものであり、上記焼成温度が500℃以上であることを特徴とする。
Further, the method for manufacturing a metal member for a piezoelectric / electrolytic film with an insulating film of the present invention includes a step of firing a metal base material on which a coating film of an insulating film composition is formed to form an insulating film.
The metal base material is a SUS material, and the insulating coating composition contains a smectite clay mineral, a thickener, and a dispersion medium, and has a pH of 10.0 or more. It is characterized in that the firing temperature is 500 ° C. or higher.
本発明によれば、SUS材表面にスメクタイト粘土鉱物由来の粘土層を備える絶縁性被膜を形成することとしたため、抵抗値が1.00×109Ω以上の耐熱性絶縁被膜を備える圧電/電歪膜用金属部材を提供することができる。 According to the present invention, since it was decided to form an insulating coating comprising a clay layer from smectite clay minerals SUS material surface, the piezoelectric / electrostrictive whose resistance comprises 1.00 × least 10 9 Omega heat-resistant insulating coating A metal member for a strain film can be provided.
圧電/電歪膜は、電圧を加えると伸縮する電歪効果や、逆に力を加えると電圧が発生する圧電効果を有するものであり、機械的エネルギー−電気的エネルギー間の変換を行うものである。 Piezoelectric / piezoelectric films have an electrolytic strain effect that expands and contracts when a voltage is applied, and a piezoelectric effect that generates a voltage when a force is applied, and performs conversion between mechanical energy and electrical energy. is there.
上記圧電/電歪膜は、アクチュエーターやセンサなどのエネルギー変換の分野に広く応用され、例えば、ロードセルや、ロボットに用いられる接触センサや滑りセンサ等の歪センサの他、発電回路、駆動装置、ジャイロセンサ、圧力センサ、インクジェットプリンタ等に用いられる。 The piezoelectric / electrolytic strain film is widely applied in the field of energy conversion such as actuators and sensors. For example, in addition to strain sensors such as load cells and contact sensors and slip sensors used in robots, power generation circuits, drive devices, and gyros. Used in sensors, pressure sensors, inkjet printers, etc.
本発明の圧電/電歪膜用金属部材は、金属基材表面に絶縁性被膜を備える。
上記圧電/電歪膜用金属部材を、歪センサを例に詳細に説明する。
The metal member for a piezoelectric / electrostrictive film of the present invention has an insulating film on the surface of a metal base material.
The metal member for a piezoelectric / electrostrictive film will be described in detail by taking a strain sensor as an example.
一般に歪センサは、グリッド状あるいはロゼット状に配置した10〜30μm程度の金属細線または3〜5μm程度の金属箔を紙や樹脂などのベースに接着したものが知られており、これらは接着剤を用いて被測定物に接着して用いられる。 Generally, strain sensors are known to have a grid-shaped or rosette-shaped metal wire of about 10 to 30 μm or a metal foil of about 3 to 5 μm bonded to a base such as paper or resin. It is used by adhering to the object to be measured.
接着剤によって歪センサを被測定物に接着する場合は、接着剤の影響等によって歪センサの特性にバラツキが生じるため、接着剤を用いずに、被測定物に金属膜を形成し、歪センサを構築することが望ましい。 When the strain sensor is adhered to the object to be measured with an adhesive, the characteristics of the strain sensor vary due to the influence of the adhesive, so a metal film is formed on the object to be measured without using an adhesive, and the strain sensor It is desirable to build.
被測定物に歪センサとなる金属膜(以下、歪センサということがある。)を形成する方法としては、蒸着法、スパッタリング法や分子線エピタキシー(MBE)法などの物理的手法や化学気相堆積(CVD)法やホットウォール法などの化学的手法等の薄い金属膜を形成できる方法の他、塗布や印刷後に焼成する方法等の厚い金属膜を形成できる方法が挙げられる。 As a method for forming a metal film (hereinafter, may be referred to as a strain sensor) as a strain sensor on an object to be measured, a physical method such as a vapor deposition method, a sputtering method or a molecular beam epitaxy (MBE) method, or a chemical vapor deposition method is used. In addition to a method capable of forming a thin metal film such as a chemical method such as a deposition (CVD) method and a hot wall method, a method capable of forming a thick metal film such as a method of firing after coating or printing can be mentioned.
そして、歪センサは、被測定物の変形に伴って金属膜の比電気抵抗(ρ)の変化量Δρ/ρが変化することを利用して、被測定物に生じた歪を間接的に測定するため、被測定物が金属基材である場合は、歪センサと金属基材とを電気的に絶縁する絶縁性被膜が必要となる。 Then, the strain sensor indirectly measures the strain generated in the object to be measured by utilizing the fact that the amount of change Δρ / ρ in the specific electrical resistance (ρ) of the metal film changes with the deformation of the object to be measured. Therefore, when the object to be measured is a metal base material, an insulating coating that electrically insulates the strain sensor and the metal base material is required.
上記絶縁性被膜は、金属基材との密着性に優れるだけでなく、歪センサを形成可能な耐薬品性等が要求される。 The insulating coating is required not only to have excellent adhesion to a metal base material but also to have chemical resistance capable of forming a strain sensor.
また、上記歪センサは、歪以外の物理量、特に温度に対する電気抵抗の変化量(抵抗温度係数(TCR))が大きいものであってはならない。温度変化に対する特性変化が小さな歪センサに用いられる金属膜としては、Cr−N合金薄膜、Cu−Ni合金、Ni−Cr合金等を挙げることができる。 Further, the strain sensor must not have a physical quantity other than strain, particularly a large amount of change in electrical resistance with respect to temperature (resistance temperature coefficient (TCR)). Examples of the metal film used for the strain sensor having a small change in characteristics with respect to a temperature change include a Cr—N alloy thin film, a Cu—Ni alloy, and a Ni—Cr alloy.
上記金属膜のうち、Cr−N合金薄膜は、上記比電気抵抗(ρ)の変化量Δρ/ρが大きく、歪感度(ゲージ率)が大きいものであるため、高感度な歪センサ用の金属膜として好適に使用することができる。
すなわち、Cr−N合金薄膜は、剛性の高い金属基材に形成した場合でも十分な出力が得られ、機械の構造材など剛性が必要な箇所のひずみを検知可能である。
Among the above metal films, the Cr—N alloy thin film has a large change amount Δρ / ρ of the specific electrical resistivity (ρ) and a large strain sensitivity (gauge ratio), and therefore is a metal for a highly sensitive strain sensor. It can be suitably used as a film.
That is, the Cr—N alloy thin film can obtain a sufficient output even when it is formed on a metal base material having high rigidity, and can detect strain in a portion requiring rigidity such as a structural material of a machine.
上記Cr−N合金薄膜は、抵抗温度係数(TCR)が、熱処理温度によって変化するものであり、通常、歪センサ形成後に熱処理が必要になるため、Cr−N合金薄膜を用いた歪センサの形成を可能にするには、絶縁性被膜が耐熱性を有することが好ましい。 The resistance temperature coefficient (TCR) of the Cr—N alloy thin film changes depending on the heat treatment temperature, and heat treatment is usually required after the strain sensor is formed. Therefore, a strain sensor is formed using the Cr—N alloy thin film. It is preferable that the insulating coating has heat resistance to enable the above.
<絶縁性被膜>
本発明の圧電/電歪膜用金属部材における絶縁性被膜は、スメクタイト粘土鉱物由来の粘土層を備え、上記粘土層は、スメクタイト粘土鉱物の板状粒子が配向し密着して積層した構造を有するものである。
<Insulating film>
The insulating film in the metal member for a piezoelectric / electrostrictive film of the present invention includes a clay layer derived from a smectite clay mineral, and the clay layer has a structure in which plate-like particles of the smectite clay mineral are oriented and closely laminated. It is a thing.
上記絶縁性被膜の構造は、金属部材の断面をTEM及びTEM−EDSなどで観察することで確認することができる。 The structure of the insulating coating can be confirmed by observing the cross section of the metal member with TEM, TEM-EDS, or the like.
上記絶縁性被膜は、スメクタイト粘土鉱物を主成分とし、有機物をほとんど含まないため、耐薬品性、耐熱性を有し、上記歪センサとなる圧電/電歪膜を直接形成可能なものであるだけでなく、1.00×109Ω以上の高い抵抗値を有する。 Since the insulating film contains smectite clay mineral as a main component and contains almost no organic substances, it has chemical resistance and heat resistance, and can only directly form a piezoelectric / electrolytic strain film to be the strain sensor. not having a 1.00 × 10 9 Ω or more high resistance value.
したがって、絶縁性被膜上に形成した金属薄膜を、エッチング液によりグリッド状又はロゼット状に腐食整形して歪センサを形成することができる。 Therefore, the metal thin film formed on the insulating film can be corroded and shaped into a grid shape or a rosette shape with an etching solution to form a strain sensor.
また、絶縁性被膜上に形成した歪センサに対して、大気中や真空中の非酸化性雰囲気中において、200℃以上スメクタイト粘土鉱物の熱分解が始まる700℃以下の温度範囲で熱処理することができ、上記抵抗温度係数(TCR)を調整することができる。 Further, the strain sensor formed on the insulating coating can be heat-treated in a non-oxidizing atmosphere in the air or vacuum in a temperature range of 200 ° C. or higher and 700 ° C. or lower at which thermal decomposition of smectite clay minerals begins. The resistance temperature coefficient (TCR) can be adjusted.
さらに、上記絶縁性被膜は、金属基材との密着性に優れ金属基材の変形による剥離を抑制できる。上記絶縁性被膜が密着性に優れる理由が明らかにされているわけではないが、金属基材と絶縁性被膜との間に金属基材の構成元素とスメクタイト粘土鉱物の構成元素とを含む固溶層が形成され、アンカー効果が得られるためであると推察される。 Further, the insulating coating has excellent adhesion to the metal base material and can suppress peeling due to deformation of the metal base material. Although the reason why the above-mentioned insulating coating has excellent adhesion has not been clarified, a solid solution containing a constituent element of the metal base material and a constituent element of the smectite clay mineral between the metal base material and the insulating coating has not been clarified. It is presumed that this is because the layer is formed and the anchor effect is obtained.
上記絶縁性被膜の膜厚は、0.7μm以上20μm以下であることが好ましい。膜厚が0.7μm以上であることで、抵抗値が1.00×109Ω以上の欠陥のない絶縁性被膜とすることができ、また、20μm以下であることで、金属基材の変形に追従し高感度な歪センサを形成することができる。 The film thickness of the insulating coating is preferably 0.7 μm or more and 20 μm or less. Thickness that is 0.7μm or more, the resistance value can not insulating coating of 1.00 × 10 9 Ω or more defects, also by at 20μm or less, deformation of the metal substrate It is possible to form a highly sensitive distortion sensor by following the above.
<金属基材>
上記金属基材としてはSUS材を使用することができる。SUS材としては、SUS304等のオーステナイト系ステンレス、SUS430等のフェライト系ステンレス、SUS403、SUS410等のマルテンサイト系ステンレスの他、SUS630等の析出硬化型ステンレスを使用することができる。
上記析出硬化型ステンレスは基材強度が高く、外力に対する高速応答性に優れるため、ロボット用歪センサ用金属部材として好適に用いられる。
<Metal base material>
A SUS material can be used as the metal base material. As the SUS material, austenitic stainless steel such as SUS304, ferritic stainless steel such as SUS430, martensitic stainless steel such as SUS403 and SUS410, and precipitation hardening stainless steel such as SUS630 can be used.
Since the precipitation hardening stainless steel has high substrate strength and excellent high-speed response to external force, it is suitably used as a metal member for a strain sensor for robots.
上記SUS材は、プラズマ処理や研磨等により表面が親水化処理されたものであることが好ましい。SUS材の表面を親水化処理することで、後述する絶縁性被膜組成物の塗布膜を均一に形成することができ、バラツキのない歪センサを形成できる。 The surface of the SUS material is preferably hydrophilized by plasma treatment, polishing or the like. By hydrophilizing the surface of the SUS material, a coating film of the insulating coating composition described later can be uniformly formed, and a strain sensor without variation can be formed.
<製造方法>
次に、本発明の圧電/電歪膜用金属部材の製造方法について説明する。
上記圧電/電歪膜用金属部材は、金属基材表面に絶縁性被膜組成物の塗布膜を形成して500℃以上焼成することで形成できる。
<Manufacturing method>
Next, a method for manufacturing the metal member for a piezoelectric / electrostrictive film of the present invention will be described.
The above-mentioned metal member for piezoelectric / electrolytic strain film can be formed by forming a coating film of an insulating coating composition on the surface of a metal base material and firing at 500 ° C. or higher.
上記絶縁性被膜組成物は、pHが10.0以上であり、スメクタイト粘土鉱物と、減粘剤と、分散剤とを含み、必要に応じて他の添加剤を含有して成る。 The insulating coating composition has a pH of 10.0 or higher, contains a smectite clay mineral, a thickener, a dispersant, and if necessary, contains other additives.
上記スメクタイト粘土鉱物は、層状の粘土鉱物であり、厚さが1nm程度の板状又は円盤状の一次粒子(以下、単に「板状粒子」ということがある。)が積み重なった層状構造を形成したものである。 The smectite clay mineral is a layered clay mineral, and forms a layered structure in which plate-like or disk-like primary particles having a thickness of about 1 nm (hereinafter, may be simply referred to as “plate-like particles”) are stacked. It is a thing.
上記スメクタイト粘土鉱物は、水相中に分散されることで、板状粒子の板面が負電荷を帯び、板状の一次粒子間のイオンが水和して一次粒子の間隔が拡がり、一次粒子間に静電気的な反発が生じて層状のスメクタイト粘土鉱物が板状の一次粒子にまで細分化される。
そして、接近した板状粒子同士は、静電気的に反発して低粘度のゾルを形成する。
When the smectite clay mineral is dispersed in the aqueous phase, the plate surface of the plate-shaped particles becomes negatively charged, the ions between the plate-shaped primary particles are hydrated, and the distance between the primary particles is widened. Electrostatic repulsion occurs between them, and the layered smectite clay mineral is subdivided into plate-like primary particles.
Then, the plate-like particles that are close to each other are electrostatically repelled to form a low-viscosity sol.
しかし、上記スメクタイト粘土鉱物の板状粒子は、その縁に弱い正電荷を有するものであるため、時間の経過と共に、正電荷が隣接する板状粒子の板面の負電荷と相互反応して、イオン結合によるカードハウス構造を形成して高粘度のゲルとなるため、塗工することが困難である。 However, since the plate-like particles of the smectite clay mineral have a weak positive charge at the edge thereof, the positive charge interacts with the negative charge on the plate surface of the adjacent plate-like particles with the passage of time. It is difficult to apply because it forms a card house structure by ionic bonding and becomes a highly viscous gel.
なお、上記ゲルはチキソ性を有し、再攪拌によって流動性を復元さることができるものであるが、撹拌を止めるとゲル化して粘度が上昇してしまう。 The gel has thixotropic properties and its fluidity can be restored by re-stirring, but when the stirring is stopped, it gels and its viscosity increases.
上記絶縁性被膜組成物は減粘剤を含有するため、上記水相に分散したスメクタイト粘土鉱物がゲル化せずにゾル状態が維持されて、粘度上昇が防止されたものであるため容易に塗工することができる。 Since the insulating coating composition contains a thickener, the smectite clay mineral dispersed in the aqueous phase is maintained in a sol state without gelation, and an increase in viscosity is prevented, so that the coating can be easily applied. Can be constructed.
上記絶縁性被膜組成物を金属基材表面に塗布し乾燥すると、図1に示すように、上記板状粒子が配向し、クーロン力及びファンデルワールス力により互いに結合して、板状粒子同士が密着した積層した構造の塗布膜となる。 When the insulating coating composition is applied to the surface of a metal substrate and dried, as shown in FIG. 1, the plate-like particles are oriented and bonded to each other by Coulomb force and Van der Waals force, and the plate-like particles are bonded to each other. It becomes a coating film with a tightly laminated structure.
上記塗布膜は、アルカリ環境下で板状粒子が僅かに溶け、該板状粒子同士密着したものであるためか、吸着水等によるイオン濃度の高い箇所が板状粒子の層間等に存在せず、高い絶縁性を有する。 In the coating film, the plate-like particles are slightly dissolved in an alkaline environment, and the plate-like particles are in close contact with each other. Probably, there are no places having a high ion concentration due to adsorbed water or the like between the layers of the plate-like particles. , Has high insulation.
そして、上記塗布膜を500℃以上の温度で焼成することで、上記板状粒子間の水分等、絶縁抵抗を低下させるものが除去され、アルカリ環境下で僅かに溶けた板状粒子成分が結着材として作用すると共に、上記板状粒子同士が密着して溶融して一体化するため、高い絶縁性を有する被膜となると考えられる。 Then, by firing the coating film at a temperature of 500 ° C. or higher, substances that reduce the insulating resistance such as moisture between the plate-shaped particles are removed, and the plate-shaped particle components slightly dissolved in an alkaline environment are formed. It is considered that the film has high insulating properties because it acts as a material and the plate-like particles adhere to each other and melt and integrate with each other.
上記、SUS材として、上記基材強度が高い、析出硬化型ステンレスを用いる場合の焼成温度は、熱処理により析出硬化型ステンレスとしたきの析出硬化熱処理温度以下であることが好ましい。上記析出硬化型ステンレスの析出硬化熱処理温度以下で焼成することで、SUS材に対する硬化処理の効果を維持することができる。 When the precipitation hardening stainless steel having high substrate strength is used as the SUS material, the firing temperature is preferably equal to or lower than the precipitation hardening heat treatment temperature for making the precipitation hardening stainless steel by heat treatment. By firing at less precipitation hardening heat treatment temperature of the precipitation hardening type stainless steel, it is possible to maintain the effect of the curing process for SUS material.
上記絶縁性被膜組成物の金属基材への塗布は従来公知の方法で行うことができ、例えば、スピンコート法、ギャップコーター塗工法、浸漬塗工法、ビードコート法、リングコート法等が挙げられる。 The above insulating coating composition can be applied to a metal substrate by a conventionally known method, and examples thereof include a spin coating method, a gap coater coating method, a dip coating method, a bead coating method, and a ring coating method. ..
また、絶縁性被膜組成物の塗工膜の乾燥方法としては、室温での静置や温風乾燥を挙げることができ、焼成方法としては焼成炉やオーブンを挙げることができる。 Further, examples of the method for drying the coating film of the insulating coating composition include standing at room temperature and drying with warm air, and examples of the firing method include a firing furnace and an oven.
(スメクタイト粘土鉱物)
上記絶縁性被膜組成物に使用できるスメクタイト粘土鉱物としては、例えば、サポナイト、ヘクトライト、ソーコナイト、スチーブンサイト、スインホルダイト、モンモリロナイト、バイデライト、ノントロナイト、ボルコンストアイトを挙げることができる。
(Smectite clay mineral)
Examples of smectite clay minerals that can be used in the insulating coating composition include saponite, hectorite, saponite, stevensite, sine holderite, montmorillonite, biderite, nontronite, and volconstite.
なかでもヘクトライト、スチーブンサイト、モンモリロナイトは成膜性に優れ好ましく使用できる。これらは、合成物、天然物のいずれであってもよいが、一次粒径が制御された合成物を好ましく使用できる。 Among them, hectorite, stephensite, and montmorillonite have excellent film forming properties and can be preferably used. These may be either synthetic or natural products, but synthetic products having a controlled primary particle size can be preferably used.
一般に、スメクタイト粘土鉱物の粒子径は、一次粒子径(メディアン径)が10nm〜500nmであるが、本発明の絶縁性被膜組成物のスメクタイト粘土鉱物の一次粒子径(メディアン径)は、10nm以上150nm以下であることが好ましい。一次粒子径(メディアン径)が上記範囲内であると金属基材に対する成膜性・耐剥離性が向上する。 Generally, the particle size of the smectite clay mineral has a primary particle size (median diameter) of 10 nm to 500 nm, but the primary particle size (median size) of the smectite clay mineral of the insulating coating composition of the present invention is 10 nm or more and 150 nm. The following is preferable. When the primary particle diameter (median diameter) is within the above range, the film forming property and peeling resistance to the metal substrate are improved.
上記範囲内の粒径であると、成膜性・耐剥離性が向上する理由は明らかではないが、上記粒径の粒子は、上記ゲル化抑止効果と相俟って、金属基材表面の微細な凹凸に入り込んで引っかかるためであると考えられる。 The reason why the film forming property and the peeling resistance are improved when the particle size is within the above range is not clear, but the particles having the above particle size, in combination with the gelation suppressing effect, are on the surface of the metal substrate. It is thought that this is because it gets caught in the fine irregularities.
スメクタイト粘土鉱物の粒子径は、動的光散乱法やレーザー回折散乱法により測定することが可能である。ホモディスパーや超音波発生装置などを用いて強攪拌してスメクタイト粘土鉱物の水分散液を作製して、動的光散乱法やレーザー回折散乱式の測定装置により粒子径の測定を行う。粒子径の測定結果は体積基準で表示される。 The particle size of smectite clay minerals can be measured by dynamic light scattering or laser diffraction scattering. An aqueous dispersion of smectite clay minerals is prepared by vigorous stirring using a homodisper or an ultrasonic generator, and the particle size is measured by a dynamic light scattering method or a laser diffraction scattering type measuring device. The measurement result of the particle size is displayed on a volume basis.
上記絶縁性被膜組成物におけるスメクタイト粘土鉱物の含有量は、10質量%以上30質量%以下であることが好ましく、15質量%以上20質量%以下であることがより好ましい。 The content of smectite clay mineral in the insulating coating composition is preferably 10% by mass or more and 30% by mass or less, and more preferably 15% by mass or more and 20% by mass or less.
スメクタイト粘土鉱物の含有量が10質量%未満では、塗工膜を形成する板状粒子の密着性が低下し、絶縁性が低下する虞が生じる。また、30質量%を超えると粘土鉱物を完全に濡らすことが困難で充分水和せずに沈殿して低粘度のゾルを形成しないことがあり、塗工困難にする。 If the content of the smectite clay mineral is less than 10% by mass, the adhesion of the plate-like particles forming the coating film may decrease, and the insulating property may decrease. Further, if it exceeds 30% by mass, it is difficult to completely wet the clay mineral, and it may precipitate without sufficient hydration to form a low-viscosity sol, which makes coating difficult.
(減粘剤)
上記減粘剤としては、リン酸塩化合物やホスホン酸及びその誘導体、低分子量のアミンの塩等を挙げることができる。
上記のリン酸塩化合物としては、トリポリリン酸、ヘキサメタリン酸、ピロリン酸のナトリウム塩やカリウム塩を挙げることができる。
また、ホスホン酸及びその誘導体としては、ホスホン酸及びその誘導体のナトリウム塩、カリウム塩、アンモニウム塩、アミン塩を挙げることができ、なかでも、エチドロン酸ナトリウムを好ましく使用することができる。
(Thickening agent)
Examples of the slimming agent include phosphate compounds, phosphonic acids and derivatives thereof, and low molecular weight amine salts.
Examples of the above-mentioned phosphate compound include sodium and potassium salts of tripolyphosphoric acid, hexamethaphosphoric acid, and pyrophosphoric acid.
Examples of the phosphonic acid and its derivative include sodium salts, potassium salts, ammonium salts and amine salts of phosphonic acid and its derivatives, and among them, sodium etidronate can be preferably used.
上記減粘剤の絶縁性被膜組成物中の含有量は、用いる減粘剤やスメクタイト粘土鉱物にもよるが、0.1〜2質量%であることが好ましい。 The content of the thickener in the insulating coating composition depends on the thickener used and the smectite clay mineral, but is preferably 0.1 to 2% by mass.
上記範囲の減粘剤を含有することで、スメクタイト粘土鉱物の水分散液がゲル化することなく粘度が低いゾル状態が維持されて塗工性が向上し、均一な絶縁性被膜を形成できる。 By containing the thickener in the above range, the aqueous dispersion of smectite clay mineral does not gel, the sol state with low viscosity is maintained, the coatability is improved, and a uniform insulating film can be formed.
また、減粘剤を含み、ゲル化が抑止された水分散安定性を有するスメクタイト粘土鉱物を用いることもできる。水分散安定性を有するスメクタイト粘土鉱物は、は一般に上市されており、Laponite S482、Laponite SL25(いずれもBYK Additives & instruments社製)を挙げることができる。 It is also possible to use smectite clay minerals containing a thickener and having water dispersion stability in which gelation is suppressed. Smectite clay minerals having water dispersion stability are generally on the market, and examples thereof include Laponite S482 and Laponite SL25 (both manufactured by BYK Adaptives & instruments).
(pH調整剤)
上記pH調整剤は、絶縁性被膜組成物のpHを調整するものである。
絶縁性被膜組成物のpHを10.0以上にすることで、絶縁性被膜の抵抗値を1.00×109Ω以上にすることができる。
(PH regulator)
The pH adjuster adjusts the pH of the insulating coating composition.
By the pH of the insulating coating composition above 10.0, can be the resistance of the insulating coating 1.00 × least 10 9 Omega.
上記pH調整剤としては、例えば、水酸化ナトリウム(NaOH)や水酸化アンモニウム(NH4OH)等のアルカリ成分を挙げることができる。 Examples of the pH adjuster include alkaline components such as sodium hydroxide (NaOH) and ammonium hydroxide (NH 4 OH).
上記pH調整剤の添加量は、上記アルカリ成分等にもよるが上記スメクタイト粘土鉱物1g当たり、0.1〜5.0mmolであることが好ましい。
なお、絶縁性被膜組成物のpHは、上記pH調整剤を添加するだけでなく、アルカリ性の減粘剤を用いることでも調整できる。
(添加剤)
本発明の金属表面コーティング組成物は、必要に応じて、水溶性有機溶媒、界面活性剤等の添加剤を含有することができる。
上記水溶性有機溶媒は、絶縁性被膜組成物と金属基材表面との親和性を向上させ、ハジキ、塗工ムラの発生を防止すると共に、絶縁性被膜組成物の乾燥性を向上させるものである。
The amount of the pH adjuster added depends on the alkaline component and the like, but is preferably 0.1 to 5.0 mmol per 1 g of the smectite clay mineral.
The pH of the insulating coating composition can be adjusted not only by adding the above pH adjuster but also by using an alkaline slimming agent.
(Additive)
The metal surface coating composition of the present invention can contain additives such as a water-soluble organic solvent and a surfactant, if necessary.
The above-mentioned water-soluble organic solvent improves the affinity between the insulating coating composition and the surface of the metal base material, prevents the occurrence of repellent and uneven coating, and improves the drying property of the insulating coating composition. is there.
上記金属基材自体の表面は親水性であるが、金属基材を大気中に保存することで大気中に存在する有機物質(ハイドロカーボン)等が金属基材表面に吸着して金属基材の表面が疎水性になる。
したがって、有機基を有する水溶性有機溶媒を含有することで金属基材表面との親和性が向上し、コーティング性が向上する。
The surface of the metal base material itself is hydrophilic, but by storing the metal base material in the atmosphere, organic substances (hydrocarbons) and the like existing in the atmosphere are adsorbed on the surface of the metal base material, and the metal base material has a surface. The surface becomes hydrophobic.
Therefore, by containing a water-soluble organic solvent having an organic group, the affinity with the surface of the metal substrate is improved, and the coating property is improved.
また、上記水溶性有機溶媒が揮発性を有するものであると乾燥性が向上し、金属基材表面に形成した塗工膜の焼成時に膜内部でガスが発生して膜が剥離することが防止され、絶縁性被膜と金属基材との密着性が向上する。 Further, if the water-soluble organic solvent is volatile, the drying property is improved, and gas is generated inside the coating film formed on the surface of the metal substrate to prevent the film from peeling off. Therefore, the adhesion between the insulating film and the metal substrate is improved.
上記水溶性有機溶媒としては、例えば、メチルアルコール、エチルアルコール、イソプロパノール、ブタノール等のアルコール系溶媒、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル等のグリコールエーテル系溶媒、アセトン、メチルエチルケトン等のケトン系溶媒が挙げられ、これらは一種又は二種以上を混合して用いてもよい。
なかでも、グリコールエーテル系溶媒は、引火点が高く安全性に優れ、減粘効果も有するため好ましく使用でき、特にエチレングリコールモノブチルエーテルを好ましく使用できる。
Examples of the water-soluble organic solvent include alcohol solvents such as methyl alcohol, ethyl alcohol, isopropanol and butanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether and propylene glycol monomethyl. Examples thereof include glycol ether solvents such as ether and ketone solvents such as acetone and methyl ethyl ketone, and these may be used alone or in admixture of two or more.
Among them, the glycol ether-based solvent can be preferably used because it has a high flash point, is excellent in safety, and has a thickening effect, and especially ethylene glycol monobutyl ether can be preferably used.
上記水溶性有機溶媒の絶縁性被膜組成物中の含有量は、使用する水溶性有機溶媒にもよるが1質量%以上30質量%以下であることが好ましく、3質量%以上10質量%以下であることが好ましい。1質量%未満ではハジキが生じたり乾燥性が低下したりすることがあり、30質量%を超えるとスメクタイト粘土鉱物の分散性が低下して沈降することがある。 The content of the water-soluble organic solvent in the insulating coating composition is preferably 1% by mass or more and 30% by mass or less, depending on the water-soluble organic solvent used, and is 3% by mass or more and 10% by mass or less. It is preferable to have. If it is less than 1% by mass, repelling may occur or the drying property may be lowered, and if it exceeds 30% by mass, the dispersibility of smectite clay mineral may be lowered and sedimentation may occur.
上記界面活性剤は、絶縁性被膜組成物の表面エネルギーを低下させ、金属基材表面への濡れ性を向上させて塗工膜の成膜性を向上させ、金属基材との密着性を向上させるものである。界面活性剤を含有することで均一な塗工膜を形成できる。 The above-mentioned surfactant lowers the surface energy of the insulating coating composition, improves the wettability to the surface of the metal substrate, improves the film-forming property of the coating film, and improves the adhesion to the metal substrate. It is something to make. A uniform coating film can be formed by containing a surfactant.
上記界面活性剤としては、スメクタイト粘土鉱物のゲル化抑止を阻害しなければ特に制限はないが、中でも、ノニオン系界面活性剤が一番好ましい。ノニオン系界面活性剤はイオンとならず、スメクタイト粘土鉱物の分散状態に影響を及ぼさないため特に好ましい。 The surfactant is not particularly limited as long as it does not inhibit the inhibition of gelation of smectite clay minerals, but among them, a nonionic surfactant is most preferable. Nonionic surfactants are particularly preferable because they do not become ions and do not affect the dispersed state of smectite clay minerals.
ノニオン系界面活性剤としては、エステル型、エーテル型、又は分子中にエステル結合とエーテル結合の両方を持つエステル・エーテル型のいずれであってもよいが、HLB値が4〜16であるものが好ましい。 The nonionic surfactant may be an ester type, an ether type, or an ester / ether type having both an ester bond and an ether bond in the molecule, but those having an HLB value of 4 to 16 are used. preferable.
上記ノニオン系界面活性剤としては、例えば、ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルアリルエーテル、ポリオキシエチレンポリオキシプロピレングリコール、グリセリンエステル、ソルビタンエステル、ショ糖エステル、グリセリンエステルのポリオキシエチレンエーテル、ソルビタンエステルのポリオキシエチレンエーテル、ソルビトールエステルのポリオキシエチレンエーテル等が挙げられ、これらは一種又は二種以上を混合して用いてもよい。 Examples of the nonionic surfactant include polyoxyethylene alkyl ether, polyoxyethylene alkyl allyl ether, polyoxyethylene polyoxypropylene glycol, glycerin ester, sorbitol ester, sucrose ester, and polyoxyethylene ether of glycerin ester. Examples thereof include polyoxyethylene ether of sorbitol ester and polyoxyethylene ether of sorbitol ester, and these may be used alone or in combination of two or more.
上記界面活性剤の絶縁性被膜組成物中の含有量は、0.1質量%以上5質量%以下であることが好ましく、0.2質量%以上3質量%以下であることが好ましい。
上記範囲内にあることで、スメクタイト粘土鉱物の分散性が低下することなく、金属基材表面への濡れ性を向上させることができる。
The content of the surfactant in the insulating coating composition is preferably 0.1% by mass or more and 5% by mass or less, and preferably 0.2% by mass or more and 3% by mass or less.
Within the above range, the wettability to the surface of the metal substrate can be improved without lowering the dispersibility of the smectite clay mineral.
上記絶縁性組成物は、減粘剤を含む水相を撹拌しなからスメクタイト粘土鉱物を添加して、水相にスメクタイト粘土鉱物を均一に分散させることで作製することができ、必要に応じて、スメクタイト粘土鉱物の分散液に添加剤を添加して作製する。 The insulating composition can be prepared by adding smectite clay mineral without stirring the aqueous phase containing the thickener and uniformly dispersing the smectite clay mineral in the aqueous phase, if necessary. , Smectite It is prepared by adding an additive to a dispersion of clay minerals.
具体的には、減粘剤を含むイオン交換水にスメクタイト粘土鉱物を加えたものを、攪拌と脱泡が同時に行える遊星式攪拌・脱泡装置で十分に攪拌脱泡することで作製できる。
この方法によって、スメクタイト粘土鉱物が高濃度のゲル化が抑止された絶縁性組成物(低粘性ゾル)を作製することができる。
Specifically, it can be produced by adding smectite clay mineral to ion-exchanged water containing a thickener and sufficiently stirring and defoaming with a planetary stirrer / defoaming device capable of stirring and defoaming at the same time.
By this method, it is possible to prepare an insulating composition (low-viscosity sol) in which gelation of smectite clay mineral is suppressed at a high concentration.
以下、本発明を実施例により詳細に説明するが、本発明は下記実施例に限定されるものではない。 Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not limited to the following Examples.
[絶縁性被膜組成物A]
ディスパーを用いて、85.7質量部のイオン交換水を1000rpmで撹拌しながら、減粘剤含有スメクタイト粘土鉱物(BYK Additives & instruments社製:ラポナイトS482:一次粒子径(メディアン径)60nm)5.5質量部、及び、天然層状粘土鉱物(ベントナイト:クニピアM:クニミネ工業製)2.5質量部を少量ずつ添加し、粘土鉱物を均一に分散した。
次に、界面活性材(第一工業製薬社製:DKS NL−40)0.4質量部、エチレングリコールモノブチルエーテル4.4質量部、エタノール1.5質量部の混合溶液を添加し、自転・公転ミキサーで撹拌脱泡して粘土固形分が8質量%の[絶縁性被膜組成物A]を得た。
[Insulating coating composition A]
5. Using a disper, while stirring 85.7 parts by mass of ion-exchanged water at 1000 rpm, a slimming agent-containing smectite clay mineral (manufactured by BYK Adaptives & instruments: Laponite S482: primary particle diameter (median diameter) 60 nm). 5 parts by mass and 2.5 parts by mass of a natural layered clay mineral (bentonite: Kunipia M: manufactured by Kunimine Kogyo) were added little by little to uniformly disperse the clay mineral.
Next, a mixed solution of 0.4 parts by mass of a surfactant (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd .: DKS NL-40), 4.4 parts by mass of ethylene glycol monobutyl ether, and 1.5 parts by mass of ethanol was added, and the mixture was rotated. [Insulating film composition A] having a clay solid content of 8% by mass was obtained by stirring and defoaming with a revolving mixer.
[絶縁性被膜組成物B]
ディスパーを用いて、80質量部のイオン交換水を1000rpmで撹拌しながら、減粘剤含有スメクタイト粘土鉱物(BYK Additives & instruments社製:ラポナイトS482:一次粒子径(メディアン径)60nm)17.5質量部、及び、天然層状粘土鉱物(ベントナイト:クニピアM:クニミネ工業製)2.5質量部を少量ずつ添加し、粘土鉱物を均一に分散し、自転・公転ミキサーで撹拌脱泡して粘土固形分が20質量%の[絶縁性被膜組成物B]を得た。
[Insulating coating composition B]
Using a disper, while stirring 80 parts by mass of ion-exchanged water at 1000 rpm, a thickener-containing smectite clay mineral (manufactured by BYK Adaptives & instruments: Laponite S482: primary particle diameter (median diameter) 60 nm) 17.5 mass Part and 2.5 parts by mass of natural layered clay mineral (bentonite: Kunipia M: manufactured by Kunimine Kogyo) are added little by little, the clay mineral is uniformly dispersed, and the clay solid content is stirred and defoamed with a rotation / revolution mixer. Obtained [insulating coating composition B] in an amount of 20% by mass.
[絶縁性被膜組成物C]
ディスパーを用いて、77.1質量部のイオン交換水に減粘剤(エチドロン酸四ナトリウム;キレスト社製:PH−214)2質量部を添加し、1000rpmで撹拌しながら、減粘剤含有スメクタイト粘土鉱物(BYK Additives & instruments社製:ラポナイトS482:一次粒子径(メディアン径)60nm)15質量部を少量ずつ添加し、粘土鉱物を均一に分散した。
次に、界面活性材(第一工業製薬社製:DKS NL−40)0.4質量部、エチレングリコールモノブチルエーテル4質量部、エタノール1.5質量部の混合溶液を添加して自転・公転ミキサーで撹拌脱泡して粘土固形分が15質量%の[絶縁性被膜組成物C]を得た。
[Insulating coating composition C]
Using a disper, add 2 parts by mass of a thickener (tetrasodium etidroate; PH-214 manufactured by Killest) to 77.1 parts by mass of ion-exchanged water, and while stirring at 1000 rpm, a thickener-containing smectite. 15 parts by mass of clay mineral (manufactured by BYK Adaptives & instruments: Laponite S482: primary particle diameter (median diameter) 60 nm) was added little by little, and the clay mineral was uniformly dispersed.
Next, a mixed solution of 0.4 parts by mass of a surfactant (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd .: DKS NL-40), 4 parts by mass of ethylene glycol monobutyl ether, and 1.5 parts by mass of ethanol is added to a rotation / revolution mixer. [Insulating film composition C] having a clay solid content of 15% by mass was obtained by stirring and defoaming with.
[絶縁性被膜組成物D]
ディスパーを用いて、75.6質量部のイオン交換水に減粘剤(エチドロン酸四ナトリウム;キレスト社製:PH−214)3.5質量部を添加し、1000rpmで撹拌しながら、減粘剤含有スメクタイト粘土鉱物(BYK Additives & instruments社製:ラポナイトS482:一次粒子径(メディアン径)60nm)15質量部を少量ずつ添加し、粘土鉱物を均一に分散した。
次に、界面活性材(第一工業製薬社製:DKS NL−40)0.4質量部、エチレングリコールモノブチルエーテル4質量部、エタノール1.5質量部の混合溶液を添加して自転・公転ミキサーで撹拌脱泡して粘土固形分が15質量%の[絶縁性被膜組成物D]を得た。
[Insulating coating composition D]
Using a disper, add 3.5 parts by mass of a thickener (tetrasodium etidroate; PH-214 manufactured by Killest) to 75.6 parts by mass of ion-exchanged water, and stir at 1000 rpm to reduce the thickener. 15 parts by mass of smectite clay mineral (manufactured by BYK Adaptives & instruments: Laponite S482: primary particle diameter (median diameter) 60 nm) was added little by little, and the clay mineral was uniformly dispersed.
Next, a mixed solution of 0.4 parts by mass of a surfactant (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd .: DKS NL-40), 4 parts by mass of ethylene glycol monobutyl ether, and 1.5 parts by mass of ethanol is added to a rotation / revolution mixer. [Insulating film composition D] having a clay solid content of 15% by mass was obtained by stirring and defoaming with.
[絶縁性被膜組成物E]
ディスパーを用いて、77.1質量部のイオン交換水を1000rpmで撹拌しながら、減粘剤含有スメクタイト粘土鉱物(BYK Additives & instruments社製:ラポナイトS482:一次粒子径(メディアン径)60nm)15質量部を少量ずつ添加し、粘土鉱物を均一に分散した。
次に、界面活性材(第一工業製薬社製:DKS NL−40)0.4質量部、エチレングリコールモノブチルエーテル4質量部、エタノール1.5質量部の混合溶液を添加した。
さらに、10%水酸化ナトリウムを1.77質量部添加して自転・公転ミキサーで撹拌脱泡して粘土固形分が15.03質量%の[絶縁性被膜組成物E]を得た。
[Insulating film composition E]
Using a disper, while stirring 77.1 parts by mass of ion-exchanged water at 1000 rpm, a thickener-containing smectite clay mineral (BYK Adaptives & instruments): Laponite S482: primary particle size (median size) 60 nm) 15 mass Parts were added little by little to evenly disperse the clay minerals.
Next, a mixed solution of 0.4 parts by mass of a surfactant (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd .: DKS NL-40), 4 parts by mass of ethylene glycol monobutyl ether, and 1.5 parts by mass of ethanol was added.
Further, 1.77 parts by mass of 10% sodium hydroxide was added, and the mixture was stirred and defoamed with a rotation / revolution mixer to obtain [insulating coating composition E] having a clay solid content of 15.03% by mass.
[絶縁性被膜組成物F]
ディスパーを用いて、74.6質量部のイオン交換水を1000rpmで撹拌しながら、減粘剤含有スメクタイト粘土鉱物(BYK Additives & instruments社製:ラポナイトS482:一次粒子径(メディアン径)60nm)17質量部を少量ずつ添加し、粘土鉱物を均一に分散した。
次に、界面活性材(第一工業製薬社製:DKS NL−40)0.4質量部、エチレングリコールモノブチルエーテル4質量部、エタノール1.5質量部の混合溶液を添加した。
さらに、10%水酸化ナトリウムを2.5質量部添加して自転・公転ミキサーで撹拌脱泡して粘土固形分が17質量%の[絶縁性被膜組成物F]を得た。
[Insulating film composition F]
Using a disper, while stirring 74.6 parts by mass of ion-exchanged water at 1000 rpm, a thickener-containing smectite clay mineral (BYK Adaptives & instruments: Laponite S482: primary particle diameter (median diameter) 60 nm) 17 mass Parts were added little by little to evenly disperse the clay minerals.
Next, a mixed solution of 0.4 parts by mass of a surfactant (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd .: DKS NL-40), 4 parts by mass of ethylene glycol monobutyl ether, and 1.5 parts by mass of ethanol was added.
Further, 2.5 parts by mass of 10% sodium hydroxide was added, and the mixture was stirred and defoamed with a rotation / revolution mixer to obtain [insulating coating composition F] having a clay solid content of 17% by mass.
[絶縁性被膜組成物G]
ディスパーを用いて、73.6質量部のイオン交換水を1000rpmで撹拌しながら、減粘剤含有スメクタイト粘土鉱物(BYK Additives & instruments社製:ラポナイトS482:一次粒子径(メディアン径)60nm)18質量部を少量ずつ添加し、粘土鉱物を均一に分散した。
次に、界面活性材(第一工業製薬社製:DKS NL−40)0.4質量部、エチレングリコールモノブチルエーテル4質量部、エタノール1.5質量部の混合溶液を添加した。
さらに、10%水酸化ナトリウムを2.5質量部添加して自転・公転ミキサーで撹拌脱泡して粘土固形分が17質量%の[絶縁性被膜組成物G]を得た。
[Insulating film composition G]
Using a disper, while stirring 73.6 parts by mass of ion-exchanged water at 1000 rpm, a thickener-containing smectite clay mineral (BYK Adaptives & instruments: Laponite S482: primary particle size (median diameter) 60 nm) 18 mass Parts were added little by little to evenly disperse the clay minerals.
Next, a mixed solution of 0.4 parts by mass of a surfactant (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd .: DKS NL-40), 4 parts by mass of ethylene glycol monobutyl ether, and 1.5 parts by mass of ethanol was added.
Further, 2.5 parts by mass of 10% sodium hydroxide was added, and the mixture was stirred and defoamed with a rotation / revolution mixer to obtain [insulating coating composition G] having a clay solid content of 17% by mass.
絶縁性被膜組成物A〜Gの処方を表1に示す。 The formulations of the insulating coating compositions A to G are shown in Table 1.
[比較例1]
上記絶縁性被膜組成物Aを、SUS304の表面にスピンコート(1000rpm、10秒)した後、室温で1時間放置して乾燥し、さらに105℃で1時間乾燥した後、600℃で2時間焼成して、圧電/電歪膜用金属部材を得た。
[Comparative Example 1]
The insulating coating composition A is spin-coated (1000 rpm, 10 seconds) on the surface of SUS304, left at room temperature for 1 hour to dry, further dried at 105 ° C. for 1 hour, and then fired at 600 ° C. for 2 hours. Then, a metal member for a piezoelectric / electrostrictive film was obtained.
[比較例2]
金属基材をプラズマ処理により親水化したSUS444に変え、絶縁性被膜組成物Aを上記絶縁性被膜組成物Bに変える他は比較例1と同様にして圧電/電歪膜用金属部材を得た。
[Comparative Example 2]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Comparative Example 1 except that the metal base material was changed to SUS444 hydrolyzed by plasma treatment and the insulating coating composition A was changed to the insulating coating composition B. ..
[比較例3]
金属基材をプラズマ処理により親水化したSUS304に変え、焼成温度を500℃にする他は比較例2と同様にして圧電/電歪膜用金属部材を得た。
[Comparative Example 3]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Comparative Example 2 except that the metal base material was changed to SUS304 which was hydrophilized by plasma treatment and the firing temperature was set to 500 ° C.
[比較例4]
絶縁性被膜組成物Bを上記絶縁性被膜組成物Cに変え、焼成温度を600℃にする他は比較例3と同様にして圧電/電歪膜用金属部材を得た。
[Comparative Example 4]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Comparative Example 3 except that the insulating coating composition B was changed to the insulating coating composition C and the firing temperature was set to 600 ° C.
[比較例5]
絶縁性被膜組成物Cを上記絶縁性被膜組成物Dに変える他は比較例4と同様にして圧電/電歪膜用金属部材を得た。
[Comparative Example 5]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Comparative Example 4 except that the insulating coating composition C was changed to the insulating coating composition D.
[実施例1]
絶縁性被膜組成物Cを上記絶縁性被膜組成物Eに変える他は比較例4と同様にして圧電/電歪膜用金属部材を得た。
[Example 1]
A metal member for a piezoelectric / electric strain film was obtained in the same manner as in Comparative Example 4 except that the insulating coating composition C was changed to the insulating coating composition E.
[比較例6]
絶縁性被膜組成物Eを上記絶縁性被膜組成物Fに変え、焼成温度を400℃にする他は実施例1と同様にして圧電/電歪膜用金属部材を得た。
[Comparative Example 6]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Example 1 except that the insulating coating composition E was changed to the insulating coating composition F and the firing temperature was set to 400 ° C.
[実施例2]
焼成温度を500℃にする他は比較例6と同様にして圧電/電歪膜用金属部材を得た。
[Example 2]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Comparative Example 6 except that the firing temperature was set to 500 ° C.
[実施例3]
焼成温度を550℃にする他は比較例6と同様にして圧電/電歪膜用金属部材を得た。
[Example 3]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Comparative Example 6 except that the firing temperature was set to 550 ° C.
[実施例4]
焼成温度を600℃にする他は比較例6と同様にして圧電/電歪膜用金属部材を得た。
[Example 4]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Comparative Example 6 except that the firing temperature was set to 600 ° C.
[実施例5]
焼成時間を10分にする他は実施例4と同様にして圧電/電歪膜用金属部材を得た。
[Example 5]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Example 4 except that the firing time was set to 10 minutes.
[実施例6]
焼成時間を30分にする他は実施例4と同様にして圧電/電歪膜用金属部材を得た。
[Example 6]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Example 4 except that the firing time was set to 30 minutes.
[実施例7]
焼成時間を60分にする他は実施例4と同様にして圧電/電歪膜用金属部材を得た。
[Example 7]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Example 4 except that the firing time was set to 60 minutes.
[実施例8]
絶縁性被膜組成物Fを上記絶縁性被膜組成物Gに変える他は実施例4と同様にして圧電/電歪膜用金属部材を得た。
[Example 8]
A metal member for a piezoelectric / electrostrictive film was obtained in the same manner as in Example 4 except that the insulating coating composition F was changed to the insulating coating composition G.
[比較例7]
パーヒドロポリシラザン(AZエレクトロニックマテリアル株式会社製:AZ−NAX120−20)溶液を、イソプロピルアルコールで脱脂したSUS304表面にギャップアプリケーターで塗布し、50℃で30分乾燥させた後、500℃で30分焼成して圧電/電歪膜用金属部材を得た。
[Comparative Example 7]
A solution of perhydropolysilazane (manufactured by AZ Electronic Materials Co., Ltd .: AZ-NAX120-20) is applied to the surface of SUS304 degreased with isopropyl alcohol with a gap applicator, dried at 50 ° C. for 30 minutes, and then calcined at 500 ° C. for 30 minutes. A metal member for a piezoelectric / electrolytic strain film was obtained.
<圧電/電歪膜の形成>
上記実施例及び比較例の圧電/電歪膜用金属部材に、以下のようにして歪センサを形成した。
<Piezoelectric / electrostrictive film formation>
A strain sensor was formed on the metal member for the piezoelectric / electrostrictive film of the above Examples and Comparative Examples as follows.
上記圧電/電歪膜用金属部材の絶縁性被膜上に、アルゴンガスと共に微量の窒素ガスを導入して成膜を行う反応性スパッタリング法により、厚さ約500nmのCr−N合金薄膜を形成した。
スパッタリングの条件としては、ターゲットには公称純度99.9%のCr円盤を用い、成膜前真空度(背景真空度)、ターゲット−基板間距離(T−S距離)、成膜ガス圧および入力電力をそれぞれ2×10−5Pa、70mm、2.1Paおよび100Wとし、クロムに添加する窒素の添加量を、導入する窒素ガス流量比(N2/(Ar+N2))により0.03%に制御して行った。
A Cr—N alloy thin film having a thickness of about 500 nm was formed by a reactive sputtering method in which a small amount of nitrogen gas was introduced together with argon gas onto the insulating film of the metal member for a piezoelectric / electrostrictive film to form a film. ..
As the sputtering conditions, a Cr disk with a nominal purity of 99.9% was used as the target, and the degree of vacuum before film formation (background vacuum degree), the distance between the target and the substrate (TS distance), the film formation gas pressure, and the input. The electric power is 2 × 10-5 Pa, 70 mm, 2.1 Pa and 100 W, respectively, and the amount of nitrogen added to chromium is 0.03% depending on the nitrogen gas flow rate ratio (N 2 / (Ar + N 2 )) to be introduced. It was controlled.
次に、フォトリソグラフィー技術とCrエッチング液による腐食整形により、8回折返した格子状で、線幅および間隔が共に0.05mmで、長さが2mmの受感部を形成し、大気中200℃の温度で30分間熱処理した。 Next, by photolithography technology and corrosion shaping with Cr etching solution, a grid-like structure with 8 diffractions, a line width and spacing of 0.05 mm, and a length of 2 mm was formed, and the temperature was 200 ° C. in the atmosphere. Heat-treated at the same temperature for 30 minutes.
そして、リフトオフ法により、上記Cr−N合金薄膜の所定の位置に抵抗測定のためのNi薄膜電極を重ねて形成してCr−N合金薄膜歪センサを得た。 Then, a Cr—N alloy thin film strain sensor was obtained by superimposing a Ni thin film electrode for resistance measurement on a predetermined position of the Cr—N alloy thin film by the lift-off method.
比較例7の圧電/電歪膜用金属部材は、塗工ムラが多く、焼成により絶縁性被膜にひび割れが生じているため、Cr−N合金薄膜歪センサを形成できなかった。
実施例1と比較例7の圧電/電歪膜用金属部材表面の撮影像を図2に示す。
図2より、実施例1の圧電/電歪膜用金属部材の絶縁性被膜は、光沢があり平滑な表面を有するのに対し、比較例7のポリシラザン膜は光沢がなく表面が荒れていることがわかる。
The metal member for the piezoelectric / electrolytic strain film of Comparative Example 7 had a lot of uneven coating, and the insulating film was cracked by firing, so that the Cr—N alloy thin film strain sensor could not be formed.
FIG. 2 shows photographed images of the surfaces of the metal members for the piezoelectric / electrostrictive film of Example 1 and Comparative Example 7.
From FIG. 2, the insulating film of the metal member for the piezoelectric / electrostrictive film of Example 1 has a glossy and smooth surface, whereas the polysilazane film of Comparative Example 7 is not glossy and has a rough surface. I understand.
<評価>
上記Cr−N合金薄膜歪センサを形成した絶縁性被膜の状況を光学顕微鏡で観察し絶縁性被膜の剥離の有無を確認した。また、絶縁性被膜の抵抗値及び膜厚を以下のようにして測定した。
評価結果を表2に示す。
<Evaluation>
The state of the insulating coating on which the Cr—N alloy thin film strain sensor was formed was observed with an optical microscope to confirm the presence or absence of peeling of the insulating coating. Moreover, the resistance value and the film thickness of the insulating coating were measured as follows.
The evaluation results are shown in Table 2.
(絶縁性被膜の膜厚)
絶縁性被膜の膜厚は、膜厚測定装置(フェリメトリクス社製;F20)を用いて測定した。
(Film thickness of insulating film)
The film thickness of the insulating film was measured using a film thickness measuring device (manufactured by Ferimetrics Co., Ltd .; F20).
(絶縁性被膜の抵抗値)
絶縁性被膜の抵抗値は、絶縁性被膜上に、スパッタ装置(JEOL社製;JFC1600Auto Fine coater)を用いて2mm角の金を2ヵ所蒸着し、その上に導電テープを貼り、テスターの端子を当てる部分とした。
絶縁抵抗値は、絶縁抵抗計(アドバンテスト社製;高抵抗計R8340A ULTRA HIGH REGISTANCE METER)を使用し、PROG.1 10Vの設定で行った。
(Resistance value of insulating film)
The resistance value of the insulating film is determined by depositing 2 mm square gold in two places on the insulating film using a sputtering device (JEOL; JFC1600 Auto Fine coater), pasting conductive tape on it, and attaching the tester terminals. It was the part to hit.
For the insulation resistance value, an insulation resistance tester (manufactured by Advantest Co., Ltd .; high resistance tester R8340A ULTRA HIGH REGISTANCE METER) was used, and PROG. The setting was 110V.
(曲げ試験計測)
Cr−N合金薄膜歪センサ膜を形成した金属部材の、歪センサ膜の面とは反対側の面の同じ位置に市販の歪ゲージを接着し、図3に示す荷重印加機構を用いて曲げ試験計測を行った。
具体的には、金属部材の一端を固定し、他端を万能試験機の先端で押し込むことにより力を印加して金属部材を曲げて撓ませ、その荷重印加時の電圧(抵抗)変化をセンサ出力として測定し、裏側の市販の歪ゲージで測定したひずみ量を用いてゲージ率を求めた。
実施例8のCr−N合金薄膜歪センサのひずみ量と電圧(抵抗)との関係を図4に示す。直線性は良好でヒステリシスも小さく、直線の傾きから求めたゲージ率は6.9と大きな値を示した。
(Bending test measurement)
A commercially available strain gauge is attached to the same position on the surface of the metal member on which the Cr—N alloy thin film strain sensor film is formed, which is opposite to the surface of the strain sensor film, and a bending test is performed using the load application mechanism shown in FIG. The measurement was performed.
Specifically, one end of the metal member is fixed, and the other end is pushed by the tip of the universal testing machine to apply force to bend and bend the metal member, and the voltage (resistance) change when the load is applied is sensed. The gauge ratio was determined using the amount of strain measured as an output and measured with a commercially available strain gauge on the back side.
FIG. 4 shows the relationship between the strain amount and the voltage (resistance) of the Cr—N alloy thin film strain sensor of Example 8. The linearity was good, the hysteresis was small, and the gauge ratio obtained from the slope of the straight line showed a large value of 6.9.
上記の結果から、本発明の圧電/電歪膜用金属部材は、剥離や亀裂のない薄膜素子が形成できることがわかる。
また、絶縁性被膜は、ステンレス基材表面の圧延痕レベルの微細な凹凸をほぼ滑らかに均しており、ステンレス基材表面のミクロな欠陥による段差が緩和され、良好なセンサ薄膜を形成することができた。
From the above results, it can be seen that the metal member for a piezoelectric / electrostrictive film of the present invention can form a thin film element without peeling or cracking.
In addition, the insulating coating almost smoothly smoothes out fine irregularities at the rolling mark level on the surface of the stainless steel base material, alleviates steps due to micro defects on the surface of the stainless steel base material, and forms a good sensor thin film. Was made.
1 金属基材
2 スメクタイト粘土鉱物
1
Claims (5)
上記金属基材が、SUS材であり、
上記絶縁性被膜が、スメクタイト粘土鉱物由来の粘土層を備えるものであり、
上記絶縁性被膜の膜厚が0.7μm以上20μm以下であり、その抵抗値が1.00×109Ω以上であることを特徴とする圧電/電歪膜用金属部材。 A metal member for a piezoelectric / electrostrictive film having an insulating film on the surface of a metal substrate.
The metal base material is a SUS material,
The insulating film is a shall comprise a clay layer from smectite clay minerals,
The thickness of the insulating coating is at 0.7μm or 20μm or less, the piezoelectric / electrostrictive film metal member whose resistance value is equal to or is 1.00 × 10 9 Ω or more.
上記金属基材が、SUS材であり、
上記絶縁性被膜組成物が、スメクタイト粘土鉱物と、減粘剤と、分散剤と、を含み、pHが10.0以上であるものであり、
上記焼成する焼成温度が500℃以上であることを特徴とする圧電/電歪膜用金属部材の製造方法。 A method for manufacturing a metal member for a piezoelectric / electrostrictive film that forms an insulating film by firing a metal base material on which a coating film of the insulating film composition is formed.
The metal base material is a SUS material,
The insulating coating composition contains a smectite clay mineral, a thickener, and a dispersant, and has a pH of 10.0 or higher.
A method for manufacturing a metal member for a piezoelectric / electrostrictive film, wherein the firing temperature for firing is 500 ° C. or higher.
上記焼成温度が上記析出硬化型ステンレスの析出硬化熱処理温度以下であることを特徴とする請求項4に記載の圧電/電歪膜用金属部材の製造方法。The method for manufacturing a metal member for a piezoelectric / electrolytic strain film according to claim 4, wherein the firing temperature is equal to or lower than the precipitation hardening heat treatment temperature of the precipitation hardening stainless steel.
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