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JP6804086B2 - Electrolytic processing equipment and method - Google Patents
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JP6804086B2 - Electrolytic processing equipment and method - Google Patents

Electrolytic processing equipment and method Download PDF

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JP6804086B2
JP6804086B2 JP2017054060A JP2017054060A JP6804086B2 JP 6804086 B2 JP6804086 B2 JP 6804086B2 JP 2017054060 A JP2017054060 A JP 2017054060A JP 2017054060 A JP2017054060 A JP 2017054060A JP 6804086 B2 JP6804086 B2 JP 6804086B2
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electrolytic solution
electrolytic
hollow tube
predetermined time
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義明 井田
義明 井田
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MARUI GALVANIZING CO., LTD
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Description

本発明は電解処理に関し、特に、電解研磨または電解メッキの電解液の循環に関する装置と方法に関するものである。 The present invention relates to an electrolytic treatment, and more particularly to an apparatus and method relating to the circulation of an electrolytic solution for electrolytic polishing or electroplating.

ビッグバン状態を形成する装置としてリニアコライダが建設されようとしている(ILC計画)。リニアコライダには図5に示すように、両端にフランジ101a、101bを有し、軸方向に周期的に径が変化するニオブの空洞管100が使用される。この実験で所定の効果を得るための要素の1つとして、このニオブの空洞管100の内面が平滑になっているか否かがある。 A linear collider is about to be constructed as a device to form the Big Bang state (ILC project). As shown in FIG. 5, a niobium hollow tube 100 having flanges 101a and 101b at both ends and whose diameter changes periodically in the axial direction is used for the linear collider. One of the factors for obtaining a predetermined effect in this experiment is whether or not the inner surface of the niobium cavity tube 100 is smooth.

ところが、空洞管100は、成形時に過大な圧力や熱を掛けるところから、その内表面の組織は不均一に歪んだ状態となっている。この表面状態をこのままにしておくと、電気的特性、磁気的特性も不均一な状態となり、結果として、電子や陽子に所定の速度を与えることができなくなる。そこで、空洞管の内面を所定の厚さ、研磨する方法が開発されている。 However, since the hollow tube 100 is subjected to excessive pressure or heat during molding, the structure on the inner surface thereof is in a non-uniformly distorted state. If this surface state is left as it is, the electrical and magnetic properties will also be non-uniform, and as a result, it will not be possible to give a predetermined velocity to electrons and protons. Therefore, a method of polishing the inner surface of the hollow tube to a predetermined thickness has been developed.

ニオブに限らず、上記のような空洞管を研磨する方法としては、化学研磨と電解研磨が一般的にしようされているが、ここでは電解研磨について記述する。 Chemical polishing and electrolytic polishing are generally used as methods for polishing hollow tubes as described above, not limited to niobium, but electrolytic polishing will be described here.

上記のように空洞管、特に内面がストレートでなく複雑な形状を持った空洞管の内面を電解研磨する場合、研磨液から発生する気泡の処理が重要となる。すなわち、気泡が滞留するとその部分の表面が荒れた状態となり、満足できる状態とはならない。 When the inner surface of a hollow tube, particularly a hollow tube having a complicated shape rather than a straight inner surface, is electropolished as described above, it is important to treat air bubbles generated from the polishing liquid. That is, when air bubbles stay, the surface of the portion becomes rough, and the state is not satisfactory.

特開昭61-23799には、前記管の長手方向中央部に膨らみを持った空洞管(金属製中空体)の内面を研磨する装置が開示されている。すなわち、前記空洞管の長手方向を水平に保持した状態で、当該金属製中空体の中心に通液パイプを通して、当該通液パイプの一方の端から電解液を前記膨らみ部に供給する構成とし、前記中空体の中心軸に対して中空体を回転させながら内部の略下半分が研磨液に浸漬されるように研磨液を給液する構成としている。ここでは、中空体の中心に通した給液パイプの一方から当該給液パイプの下側で中空体の膨らみ部に対応する位置に設けた供給口から電解液を供給し、中空体の他方開口部から抜く構成となっている。したがって、膨らんだ部分に供給される電解液の流れの状態が部分によって異なり、研磨状態に不均一が生じることになる。 Japanese Patent Application Laid-Open No. 61-23799 discloses an apparatus for polishing the inner surface of a hollow tube (metal hollow body) having a bulge in the central portion in the longitudinal direction of the tube. That is, with the longitudinal direction of the hollow pipe held horizontally, the liquid passing pipe is passed through the center of the metal hollow body, and the electrolytic solution is supplied to the bulge from one end of the liquid passing pipe. The polishing liquid is supplied so that substantially the lower half of the inside is immersed in the polishing liquid while rotating the hollow body with respect to the central axis of the hollow body. Here, the electrolytic solution is supplied from one of the supply pipes passed through the center of the hollow body from a supply port provided at a position corresponding to the bulge of the hollow body under the liquid supply pipe, and the other opening of the hollow body is opened. It is configured to be pulled out from the part. Therefore, the state of the flow of the electrolytic solution supplied to the swollen part differs depending on the part, and the polishing state becomes non-uniform.

特開平11-350200では、上記の欠点を改良すべく、給液パイプの上側から電解液を垂直上方向に供給するようにして、電解液の流れを膨らみ部に生じさせないようにして、研磨状態を均一にしようとしている。 In Japanese Patent Application Laid-Open No. 11-350200, in order to improve the above-mentioned drawbacks, the electrolytic solution is supplied vertically upward from the upper side of the liquid supply pipe so that the flow of the electrolytic solution is not generated in the bulge, and the polishing state is obtained. Is trying to be uniform.

しかしながら、上記のように空洞管を水平に配設した場合、上半分が電解液に浸漬されていない状態となり、電解に伴って発生する気泡による表面荒れを無視することはできない。そこで本願出願人は特許5807938にて空洞管の軸を縦に配置して、空洞管の内面全体が電解液に浸される状態で、電解処理(研磨、メッキ)をする装置を開示している。 However, when the hollow tube is arranged horizontally as described above, the upper half is not immersed in the electrolytic solution, and the surface roughness due to the bubbles generated by the electrolysis cannot be ignored. Therefore, in Patent 5807938, the applicant of the present application discloses an apparatus in which the shaft of the hollow tube is vertically arranged and electrolytic treatment (polishing, plating) is performed in a state where the entire inner surface of the hollow tube is immersed in the electrolytic solution. ..

特開昭61-23799号公報JP-A-61-23799 特開平11-350200号公報JP-A-11-350200 特許5807938号公報Japanese Patent No. 5807938

上記特許5807938では、空洞管を縦にし、電解液を空洞管の内部全体に充填して処理するようにしている。加えて、空洞管の内部形状に沿った翼電極を、空洞管の内部で回転させることによって電解研磨をする構成としている。この構成では気泡は空洞管の上に抜けるので、前記気泡による表面荒れはかなりの程度で改善される。しかしながら、発生した気泡の大部分は期待どおりに上方に抜けてはくれるが、空洞管の膨らみ部には水平に近い部分もあり、この部分では気泡の流れが遅くなりって滞溜することになり、表面粗れが生じることになる。 In the above patent 5807938, the hollow tube is made vertical, and the electrolytic solution is filled in the entire inside of the hollow tube for processing. In addition, the blade electrodes that follow the internal shape of the hollow tube are rotated inside the hollow tube for electrolytic polishing. In this configuration, the air bubbles escape above the hollow tube, so that the surface roughness due to the air bubbles is improved to a considerable extent. However, although most of the generated bubbles escape upward as expected, there is also a nearly horizontal part in the bulge of the hollow tube, and in this part the flow of bubbles slows down and accumulates. As a result, surface roughness will occur.

本発明は上記従来の事情に鑑みて提案されたものであって、空洞管の形状に関わらず気泡による表面粗れを抑制した電解研磨ができる電解処理方法と装置を提供することを目的とする。 The present invention has been proposed in view of the above-mentioned conventional circumstances, and an object of the present invention is to provide an electrolytic treatment method and an apparatus capable of performing electrolytic polishing while suppressing surface roughness due to bubbles regardless of the shape of a hollow tube. ..

本発明は、以下の電極と、供給ポンプと第一の弁機構と、戻しポンプと第2の弁機構、液流制御手段と、電解制御手段とを備える。 The present invention includes the following electrodes, a supply pump, a first valve mechanism, a return pump, a second valve mechanism, a liquid flow control means, and an electrolytic control means.

縦方向に配設された空洞管に、当該空洞管の内部の形状に沿う外形の電極が挿入される。液流制御手段は当該空洞管に供給ポンプと第一の弁機構によって、空洞管の一方から電解液を第1の所定時間供給するとともに、戻しポンプと第二の弁機構によって、空洞管の他方から電解液を引き抜いて電解液を液タンクの戻し、その後、第2の休止時間を挟んで、空洞管の前記他方から第1の所定時間、電解液の供給をするとともに、空洞管の前記一方から電解液の引き抜きをする。また、電解処理手段は、前記電解液が空洞管に供給されている期間、電解研磨に必要な電圧を前記空洞管と電極との間に印加する。 An electrode having an outer shape that follows the internal shape of the hollow tube is inserted into the hollow tube arranged in the vertical direction. The liquid flow control means supplies the electrolytic solution from one of the hollow pipes to the hollow pipe for a first predetermined time by the supply pump and the first valve mechanism, and by the return pump and the second valve mechanism, the other of the hollow pipes. The electrolytic solution is pulled out from the hollow tube to return the electrolytic solution to the liquid tank, and then the electrolytic solution is supplied from the other side of the hollow tube for a first predetermined time with a second pause time, and the one side of the hollow tube is supplied. The electrolyte is withdrawn from. Further, the electrolytic treatment means applies a voltage required for electrolytic polishing between the hollow tube and the electrode while the electrolytic solution is being supplied to the hollow tube.

前記空洞管は、周期的に膨らみを持ったニオブ管である場合がある。 The hollow tube may be a niobium tube having a periodic bulge.

上記構成により空洞管内を電解液が下から上に流れる期間と、上から下に流れる期間とを交互に入れ替えるので、発生する気泡が一ヶ所に留まることがない。従って、空洞管の内表面の研磨状態が、発生する気泡の影響を受けることは小さく、表面粗れを抑制できる。 With the above configuration, the period during which the electrolytic solution flows in the cavity tube from bottom to top and the period during which it flows from top to bottom are alternately alternated, so that the generated bubbles do not stay in one place. Therefore, the polished state of the inner surface of the hollow tube is less affected by the generated bubbles, and the surface roughness can be suppressed.

本発明の概要を示す図。The figure which shows the outline of this invention. 本発明の制御系を示す概略図。The schematic which shows the control system of this invention. 本発明に使用する膨らみ部1つの場合の電極を示す図。The figure which shows the electrode in the case of one bulge part used in this invention. 本発明に使用する膨らみ部複数の場合の電極を示す図。The figure which shows the electrode in the case of a plurality of bulges used in the present invention. 空洞管の例を示す図。The figure which shows the example of the hollow tube.

<還流機構>
図1は本願が適用される空洞管の電解研磨システムを示す図である。図5で示した複数の膨らみ部を備えた空洞管を縦に設置し、以下に説明するように電解液を供給する。図2は本発明の制御機構を示す概略図である。
<Reflux mechanism>
FIG. 1 is a diagram showing an electrolytic polishing system for a hollow tube to which the present application is applied. A hollow tube having a plurality of bulging portions shown in FIG. 5 is vertically installed, and an electrolytic solution is supplied as described below. FIG. 2 is a schematic view showing the control mechanism of the present invention.

弁機構は以下に説明するように、空洞管100への電解液の供給をする供給弁機構210と、空洞管100から電解液を抜く戻り弁機構220とよりなる。 As described below, the valve mechanism includes a supply valve mechanism 210 that supplies the electrolytic solution to the hollow tube 100, and a return valve mechanism 220 that drains the electrolytic solution from the hollow tube 100.

図1及び図5で示すように、現実の空洞管100は軸方向に周期的に複数の膨らみ部を持っているが、図2では膨らみ部を1つで表している。 As shown in FIGS. 1 and 5, the actual hollow tube 100 has a plurality of bulges periodically in the axial direction, but in FIG. 2, the bulge is represented by one.

縦方向に配設された空洞管100の下側と上側に給排口110a、110bが設けられ、加えて供給ポンプ120a、戻しポンプ120bが設けられる。 Supply / discharge ports 110a and 110b are provided on the lower and upper sides of the hollow pipe 100 arranged in the vertical direction, and in addition, a supply pump 120a and a return pump 120b are provided.

上下側の給排口110a、110bは、供給弁機構210を介して供給ポンプ120aに接続され、当該供給ポンプ120aは電解液タンク300に接続されている。また、前記上下側の給排口110a、110bは、戻り弁機構220を介して戻しポンプ120bに接続され、当該戻しポンプ120bも当然のことながら電解液タンク300に接続されている。 The upper and lower supply / discharge ports 110a and 110b are connected to the supply pump 120a via the supply valve mechanism 210, and the supply pump 120a is connected to the electrolytic solution tank 300. Further, the upper and lower supply / discharge ports 110a and 110b are connected to the return pump 120b via the return valve mechanism 220, and the return pump 120b is naturally connected to the electrolytic solution tank 300.

前記供給弁機構210、戻り弁機構220の開閉状態は、液流制御装置400で以下のように制御され、また、それと同時に電解制御装置500での電解制御がなされる。 The open / closed state of the supply valve mechanism 210 and the return valve mechanism 220 is controlled by the liquid flow control device 400 as follows, and at the same time, the electrolysis control is performed by the electrolysis control device 500.

まず、空洞管100には以下に説明する電極20が装着される。当該電極20が装着された状態で、液流制御装置400で供給弁機構210を上側の給排口110a側に開、下側の給排口110b側に閉とするとともに、戻り弁機構220を上側の給排口110a側に閉、下側の給排口110b側に開とする。この状態で、所定時間例えば10分、液タンク300から電解液を空洞管100の上から充填するとともに、下側の給排口110b側から抜くように制御する。同時に、電解制御手段500で、空洞管100側に正、上記電極側に負の電圧を印加して、空洞管100の内面を電解研磨する。 First, the cavity 20 is equipped with the electrode 20 described below. With the electrode 20 mounted, the liquid flow control device 400 opens the supply valve mechanism 210 to the upper supply / discharge port 110a side, closes it to the lower supply / discharge port 110b side, and closes the return valve mechanism 220. It is closed on the upper supply / discharge port 110a side and open on the lower supply / discharge port 110b side. In this state, the electrolytic solution is filled from the liquid tank 300 for a predetermined time, for example, 10 minutes from above the hollow pipe 100, and is controlled to be drained from the lower supply / discharge port 110b. At the same time, the electrolytic control means 500 applies a positive voltage to the hollow tube 100 side and a negative voltage to the electrode side to electrolytically polish the inner surface of the hollow tube 100.

次いで、上記所定時間が経過すると、別の所定時間(例えば1分)の間液の供給と、電解研磨を休止する。次いで、液流制御装置400で供給弁機構210を下側の給排口110b側に開、上側の給排口110b側に閉とするとともに、戻り弁機構220を上側の給排口110a側に開、下側の給排口110b側に閉とする。この状態で、電解液を上記所定の時間下から上に流すとともに、電解制御装置で電解研磨に必要な電圧を印加する。 Then, when the predetermined time elapses, the supply of the liquid and the electrolytic polishing are stopped for another predetermined time (for example, 1 minute). Next, the liquid flow control device 400 opens the supply valve mechanism 210 to the lower supply / discharge port 110b side, closes it to the upper supply / discharge port 110b side, and closes the return valve mechanism 220 to the upper supply / discharge port 110a side. It is opened and closed on the lower supply / discharge port 110b side. In this state, the electrolytic solution is flowed from the bottom to the top for the predetermined time, and the voltage required for electrolytic polishing is applied by the electrolytic control device.

次いで、再び別の所定時間の休止を経て、再び、上側から電解液を供給する最初の状態に戻る。液流制御装置400と電解制御装置500はこのサイクルを維持する制御をすることになる。 Then, after another predetermined time of rest, the process returns to the initial state of supplying the electrolytic solution from above again. The liquid flow control device 400 and the electrolytic control device 500 will control to maintain this cycle.

上記のように、制御することで、一方(例えば上から下)に電解液が流れている間に発生し、空洞管100の一部に溜まった気泡が、次の工程(下から上に電解液が流れる工程)で、流れの方向が逆の電解液に押し流され、研磨の状態に悪影響を及ぼすことを避けることができることになる。 By controlling as described above, bubbles generated while the electrolytic solution is flowing to one side (for example, from top to bottom) and accumulated in a part of the cavity tube 100 are electropolished in the next step (from bottom to top). In the process of flowing the liquid), it is possible to avoid being swept away by the electrolytic solution having the opposite flow direction, which adversely affects the polishing state.

<電極>
上記空洞管100の内面を電解研磨するには空洞管100の内部に電極を挿入する必要がある。 図3は、本発明に用いる電極20の斜視図を示すものであり、より詳しくは特許5807938公報に開示されている。
<Electrode>
In order to electropolish the inner surface of the hollow tube 100, it is necessary to insert an electrode inside the hollow tube 100. FIG. 3 shows a perspective view of the electrode 20 used in the present invention, and more details are disclosed in Japanese Patent Application Laid-Open No. 5807938.

電極軸21には、基端が軸方向に所定幅で外周端が、研磨対象物の空洞管100のふくらみ部の内面形状に対応する形状となっており、少なくとも外周端が金属で構成された薄板よりなる単翼22a、22b・・を、1枚もしくは複数枚(図示では2枚)、周方向に等間隔に配置して翼電極22を形成する。 The electrode shaft 21 has a base end having a predetermined width in the axial direction and an outer peripheral end having a shape corresponding to the inner surface shape of the bulging portion of the hollow tube 100 of the object to be polished, and at least the outer peripheral end is made of metal. One or a plurality of single blades 22a, 22b ... Made of thin plates (two in the figure) are arranged at equal intervals in the circumferential direction to form the blade electrodes 22.

翼電極22を構成する各単翼22a、22b・・は、可撓性を有しており、電極軸21に巻回された状態で、最小径となり、この状態で、電極軸21と同心に配置された収納筒29に収納されるようになっている。前記収納筒29に収納された状態の各単翼22a、22b・・の先端に対応する位置に、軸方向のスリット群23(23a、23b・・)が設けられ、当該スリット群を構成する各スリット23a、23b・・に、各単翼22a、22b・・の先端部が、収納筒29の外部に僅かに出る程度に挿通しておく。これによって、電極軸21と収納筒29とを相対的に回転することによって、各単翼22a、22b・・の先端を径方向に挿抜することができ、各単翼22a、22b・・の先端の径を調整できる構成(径調整手段:電極軸21+翼電極22+収納筒29+スリット群23)とする。 Each single blade 22a, 22b ... Constituting the blade electrode 22 has flexibility and has a minimum diameter when wound around the electrode shaft 21, and in this state, is concentric with the electrode shaft 21. It is designed to be stored in the arranged storage cylinder 29. Axial slit groups 23 (23a, 23b ...) Are provided at positions corresponding to the tips of the single blades 22a, 22b ... Stored in the storage cylinder 29, and each of the slit groups constituting the storage cylinder 29 is provided. The tips of the single blades 22a, 22b ... Are inserted into the slits 23a, 23b ... To the extent that they slightly protrude to the outside of the storage cylinder 29. As a result, by rotating the electrode shaft 21 and the storage cylinder 29 relatively, the tips of the single blades 22a, 22b ... Can be inserted and removed in the radial direction, and the tips of the single blades 22a, 22b ... (Diameter adjusting means: electrode shaft 21 + blade electrode 22 + storage cylinder 29 + slit group 23).

尚、前記電極軸21に収納筒29を同心に配置する構成として、例えば、電極軸21に当該電極軸21より径が大きく、収納筒29の径に符合するスペーサ30を嵌める構成とすることが考えられる。 As a configuration in which the storage cylinders 29 are concentrically arranged on the electrode shaft 21, for example, a spacer 30 having a diameter larger than that of the electrode shaft 21 and matching the diameter of the storage cylinder 29 may be fitted to the electrode shaft 21. Conceivable.

更に、各単翼22a、22b・・には合成樹脂製のメッシュ(例えば1μm以下の編み目)が被せられている。 Further, each single blade 22a, 22b ... Is covered with a mesh made of synthetic resin (for example, a stitch of 1 μm or less).

上記のように翼電極22は、収納状態と、稼動状態の2つの態様を採る。すなわち、図示しない収納状態では、各単翼22a、22b・・の先端が、収納筒29の各スリット23a、23b・・から僅かに出た状態を呈する。この状態で、空洞管100への当該電極の装着や、取り外しが行われる。また、図3、に示すように稼動状態では、電極軸21と収納筒29を相対的に回転させ、各単翼22a、22b・・の外周端が、空洞管100の内周面近くに押し出された状態(各単翼22a、22b・・の外周端と空洞管100の内周面との距離が例えば1cm前後)を呈する。 As described above, the blade electrode 22 takes two modes, a retracted state and an operating state. That is, in the stored state (not shown), the tips of the single blades 22a, 22b ... Slightly protrude from the slits 23a, 23b ... Of the storage cylinder 29. In this state, the electrode is attached to or detached from the hollow tube 100. Further, as shown in FIG. 3, in the operating state, the electrode shaft 21 and the storage cylinder 29 are relatively rotated, and the outer peripheral ends of the single blades 22a, 22b ... Are pushed out near the inner peripheral surface of the hollow tube 100. (The distance between the outer peripheral end of each single blade 22a, 22b ... And the inner peripheral surface of the hollow tube 100 is, for example, about 1 cm).

図3では、膨らみ部が1つの場合を示したが、膨らみ部が複数ある場合は、図4に示す形状となる。 FIG. 3 shows a case where there is one bulge, but when there are a plurality of bulges, the shape is as shown in FIG.

<電解研磨>
上記図1、図2に示す経常の空洞管において、表面粗さが最も大きくなる位置は膨らみ部の上側の肩部分である。そこで電極20を用いて、電解液を下の給排口110bから15分供給(上の給排口から吸引)、1分停止、その後、電解液を上の給排口110aから15分供給(下の給排口から吸引)した場合の上記位置の表面粗さは、0.3μm程度であり、他の部分(例えば膨らみの下側の肩部分)の表面粗さも同等であった。それに対して、棒状の電極を用いての実験では上側の肩部分の表面粗さが3μmもあり、他の部分は0.5μm以下であった。
<Electropolishing>
In the ordinary hollow tube shown in FIGS. 1 and 2, the position where the surface roughness is the largest is the upper shoulder portion of the bulging portion. Therefore, using the electrode 20, the electrolytic solution is supplied from the lower supply / discharge port 110b for 15 minutes (suction from the upper supply / discharge port), stopped for 1 minute, and then the electrolytic solution is supplied from the upper supply / discharge port 110a for 15 minutes ( The surface roughness of the above-mentioned position when sucked from the lower air supply / discharge port was about 0.3 μm, and the surface roughness of other portions (for example, the lower shoulder portion of the bulge) was also the same. On the other hand, in the experiment using the rod-shaped electrode, the surface roughness of the upper shoulder portion was as high as 3 μm, and that of the other portion was 0.5 μm or less.

本願のシステムのよる方法が優れていることが理解できる。 It can be understood that the method according to the system of the present application is excellent.

以上説明したように、本願発明に係る装置を用いて、空洞管を電解研磨すると研磨中に発生する気泡の影響を受け易い部分の表面粗さも、それ以外の部分と変わりなくなり、例えば、リニアコライダに使用する空洞管の内面研磨を当該装置で行うと、磁気的、電気的に高いパーフォーマンスを得ることができる。 As described above, when the hollow tube is electrolytically polished using the apparatus according to the present invention, the surface roughness of the portion susceptible to the effects of air bubbles generated during polishing is the same as that of the other portions, for example, in a linear collider. When the inner surface of the hollow tube to be used is polished by the device, high performance can be obtained magnetically and electrically.

20 電極
21 電極軸
22 翼電極
22a、22b 単翼
29 収納筒
23(23a、23b・・) スリット群
100 空洞管
210 供給弁機構
220 戻り弁機構
110a、110b 給排口
120a 供給ポンプ
120b 戻しポンプ
300 電解液タン
400 液流制御装置
500 電解制御手段
20 Electrode 21 Electrode shaft 22 Wing electrode 22a, 22b Single wing 29 Storage cylinder 23 (23a, 23b ...) Slit group 100 Cavity pipe 210 Supply valve mechanism 220 Return valve mechanism 110a, 110b Supply / discharge port 120a Supply pump 120b Return pump 300 Electrode tan 400 Liquid flow control device 500 Electrode control means

Claims (4)

縦方向に配設された空洞管に挿入された電極と、
前記空洞管に電解液を供給する供給ポンプと、
前記空洞管より電解液を液タンクに戻す戻しポンプと、
前記空洞管の一方から前記供給ポンプによって電解液を供給する回路を形成する第一の弁機構と、
前記空洞管の他方から前記戻しポンプによって電解液を引抜く回路を形成する第二の弁機構と、
前記空洞管の一方から電解液を供給状態にするとともに、空洞管の他方からの電解液を引き抜いて液タンクに戻す戻し状態を第1の所定時間継続した後、第2の所定時間休止し、その後空洞管の他方からの電解液を供給状態にするとともに、空洞管の一方から電解液を引き抜いて液タンクに戻す戻し状態を前記第1の所定時間継続するサイクルを制御する液流制御手段と、
前記第1の所定時間の間、電解研磨に必要な電圧と電流を前記電極と空洞管の間に印加し、第2の所定時間前記電圧の印加を休止する電解制御手段と
を備えた電解処理装置。
Electrodes inserted in the hollow tubes arranged in the vertical direction,
A supply pump that supplies the electrolyte to the hollow tube,
A return pump that returns the electrolyte from the hollow tube to the liquid tank,
A first valve mechanism for forming a circuit for supplying an electrolytic solution from one of the hollow tubes by the supply pump,
A second valve mechanism that forms a circuit that draws the electrolytic solution from the other side of the hollow tube by the return pump.
The electrolytic solution is supplied from one of the hollow tubes, and the electrolytic solution is pulled out from the other of the hollow tubes and returned to the liquid tank for a first predetermined time, and then paused for a second predetermined time. After that, the liquid flow control means for controlling the cycle in which the electrolytic solution from the other side of the hollow tube is supplied and the state in which the electrolytic solution is pulled out from one of the hollow tubes and returned to the liquid tank is continued for the first predetermined time. ,
Electrolytic treatment provided with an electrolytic control means for applying a voltage and a current required for electrolytic polishing between the electrode and the cavity tube during the first predetermined time and suspending the application of the voltage for a second predetermined time. apparatus.
前記空洞管が、周期的に膨らみを持ったニオブ管である請求項1に記載の電解処理装置。 The electrolytic treatment apparatus according to claim 1, wherein the hollow tube is a niobium tube having a periodic bulge. 前記電極は、空洞管の内面に沿った形状の単翼を複数備えた翼電極が、電極軸に巻回された状態の収納状態と、前記巻回を解かれて周方向に延伸した状体の稼動状態とをとり、前記電圧、電流の印加は前記稼動状態で実行する請求項1または2に記載の電解処理装置。 The electrodes are a state in which a wing electrode having a plurality of single blades having a shape along the inner surface of a hollow tube is wound around an electrode shaft and a state in which the winding is unwound and extended in the circumferential direction. The electrolytic processing apparatus according to claim 1 or 2, wherein the voltage and the current are applied in the operating state. 請求項1に記載の電解処理装置を用いた電解処理方法であって、
軸が縦方向に配設された空洞管の一方から電解液を供給状態にするとともに、空洞管の他方から電解液を引き抜いて液タンクに戻す戻し状態を第1の所定時間継続し、その間空洞管に対する電解研磨を実行するステップと、
前記第1の所定時間後の第2の所定時間、電解液の供給と電解研磨を休止するステップと、
その後空洞管の前記他方からの電解液を供給状態にするとともに、空洞管の前記一方から電解液を引き抜いて液タンクに戻す戻し状態を前記第1の所定時間継続するとともに、その間空洞管に対する電解研磨を実行するステップと
を備えた電解処理方法。
The electrolytic treatment method using the electrolytic treatment apparatus according to claim 1.
The electrolytic solution is supplied from one of the hollow tubes in which the shafts are arranged in the vertical direction, and the electrolytic solution is pulled out from the other of the hollow tubes and returned to the liquid tank for a first predetermined time. The steps to perform electropolishing on the tube,
A step of stopping the supply of the electrolytic solution and the electrolytic polishing for the second predetermined time after the first predetermined time,
After that, the electrolytic solution from the other side of the hollow tube is supplied, and the state of pulling out the electrolytic solution from the one side of the hollow tube and returning it to the liquid tank is continued for the first predetermined time, and during that time, electrolysis to the hollow tube is performed. An electrolytic treatment method with steps to perform polishing.
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