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JP6845205B2 - Soft magnetic alloy strips and magnetic parts - Google Patents
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JP6845205B2 - Soft magnetic alloy strips and magnetic parts - Google Patents

Soft magnetic alloy strips and magnetic parts Download PDF

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JP6845205B2
JP6845205B2 JP2018205074A JP2018205074A JP6845205B2 JP 6845205 B2 JP6845205 B2 JP 6845205B2 JP 2018205074 A JP2018205074 A JP 2018205074A JP 2018205074 A JP2018205074 A JP 2018205074A JP 6845205 B2 JP6845205 B2 JP 6845205B2
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soft magnetic
magnetic alloy
alloy strip
thin band
surface roughness
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JP2020070469A (en
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暁斗 長谷川
暁斗 長谷川
広修 熊岡
広修 熊岡
和宏 吉留
和宏 吉留
裕之 松元
裕之 松元
賢治 堀野
賢治 堀野
功 中畑
功 中畑
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TDK Corp
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Priority to PCT/JP2018/044410 priority patent/WO2019138730A1/en
Priority to CN201880086097.9A priority patent/CN111566243A/en
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Description

本発明は、軟磁性合金薄帯および磁性部品に関する。 The present invention relates to soft magnetic alloy strips and magnetic components.

近年、電子・情報・通信機器等において低消費電力化および高効率化が求められている。さらに、低炭素化社会へ向け、上記の要求が一層強くなっている。そのため、電子・情報・通信機器等の電源回路にも、エネルギー損失の低減や電源効率の向上が求められている。 In recent years, low power consumption and high efficiency have been required in electronic, information, communication equipment and the like. Furthermore, the above demands are becoming stronger toward a low-carbon society. Therefore, power supply circuits for electronic, information, and communication equipment are also required to reduce energy loss and improve power supply efficiency.

電源回路に使用される磁性素子のコアを製造するための材料として軟磁性合金薄帯が用いられることが知られている。この場合には、軟磁性合金薄帯自体の軟磁気特性に加えて、軟磁性合金薄帯を用いてコアを作製した後のコアの占積率、すなわち、コアの断面における導体の割合も高いことが求められる。 It is known that a soft magnetic alloy strip is used as a material for manufacturing a core of a magnetic element used in a power supply circuit. In this case, in addition to the soft magnetic properties of the soft magnetic alloy strip itself, the space factor of the core after the core is made using the soft magnetic alloy strip, that is, the proportion of the conductor in the cross section of the core is also high. Is required.

特許文献1には、Fe−B−Si系のFe基アモルファス合金薄帯が記載されている。当該Fe−B−Si系のFe基アモルファス合金薄帯は、表面粗さを制御することにより、薄帯自体の飽和磁束密度を向上させるとともに、コアを作製した後のコアの占積率も高くすることができる。 Patent Document 1 describes a Fe—B—Si based Fe-based amorphous alloy strip. By controlling the surface roughness of the Fe-B-Si-based Fe-based amorphous alloy strip, the saturation magnetic flux density of the strip itself is improved, and the space factor of the core after the core is manufactured is also high. can do.

国際公開第2018/062037号International Publication No. 2018/062037

本発明は、高い飽和磁束密度および低い保磁力を有し、かつ、占積率が高く飽和磁束密度が高いコアを提供できる軟磁性合金薄帯を提供することを目的とする。 An object of the present invention is to provide a soft magnetic alloy strip having a high saturation magnetic flux density and a low coercive force, and capable of providing a core having a high space factor and a high saturation magnetic flux density.

上記の目的を達成するために、本発明の軟磁性合金薄帯は、
組成式(Fe(1−(α+β))X1αX2β(1−(a+b+c+d+e+f))Siからなる主成分を有する軟磁性合金薄帯であって、
X1はCoおよびNiからなる群から選択される1つ以上、
X2はAl,Mn,Ag,Zn,Sn,As,Sb,Cu,Cr,Bi,N,Oおよび希土類元素からなる群より選択される1つ以上、
MはNb,Hf,Zr,Ta,Mo,W,TiおよびVからなる群から選択される1つ以上であり、
0≦a≦0.140
0.020≦b≦0.200
0≦c≦0.150
0≦d≦0.090
0≦e≦0.030
0≦f≦0.030
α≧0
β≧0
0≦α+β≦0.50
であり、
a,cおよびdのうち少なくとも一つ以上が0より大きく、
前記軟磁性合金薄帯はFe基ナノ結晶からなる構造を有し、
前記軟磁性合金薄帯は、厚さ方向に垂直な剥離面および自由面を有し、
前記軟磁性合金薄帯は、幅方向に沿ってエッジ部および中央部を有し、
前記剥離面において幅方向に沿って算術平均粗さを測定する場合に、前記中央部における算術平均粗さの平均値をRa、前記エッジ部における算術平均粗さの平均値をRaとして、
0.85≦Ra/Ra≦1.25
を満たす。
In order to achieve the above object, the soft magnetic alloy strip of the present invention can be used.
Composition formula (Fe (1- (α + β)) X1 α X2 β ) (1- (a + b + c + d + e + f)) M a B b P c S d C e S f A soft magnetic alloy strip having a main component.
X1 is one or more selected from the group consisting of Co and Ni,
X2 is one or more selected from the group consisting of Al, Mn, Ag, Zn, Sn, As, Sb, Cu, Cr, Bi, N, O and rare earth elements.
M is one or more selected from the group consisting of Nb, Hf, Zr, Ta, Mo, W, Ti and V.
0 ≤ a ≤ 0.140
0.020 ≤ b ≤ 0.200
0 ≦ c ≦ 0.150
0 ≦ d ≦ 0.090
0 ≦ e ≦ 0.030
0 ≦ f ≦ 0.030
α ≧ 0
β ≧ 0
0 ≤ α + β ≤ 0.50
And
At least one of a, c and d is greater than 0,
The soft magnetic alloy strip has a structure composed of Fe-based nanocrystals.
The soft magnetic alloy strip has a peeling surface and a free surface perpendicular to the thickness direction.
The soft magnetic alloy strip has an edge portion and a central portion along the width direction, and has an edge portion and a central portion.
When measuring the arithmetic mean roughness along the width direction on the peeled surface, the average value of the arithmetic mean roughness in the central portion is defined as Ra c , and the average value of the arithmetic mean roughness in the edge portion is defined as Ra e .
0.85 ≤ Ra e / Ra c ≤ 1.25
Meet.

本発明の軟磁性合金薄帯は、上記の組成、Fe基ナノ結晶からなる構造、および、上記の平均粗さを有することにより、高い飽和磁束密度および低い保磁力を有し、かつ、占積率が高く飽和磁束密度が高いコアを提供できる軟磁性合金薄帯となる。 The soft magnetic alloy strip of the present invention has a high saturation magnetic flux density and a low coercive force by having the above composition, a structure composed of Fe-based nanocrystals, and the above average roughness, and is occupied. It is a soft magnetic alloy strip that can provide a core with a high rate and a high saturation magnetic flux density.

本発明の軟磁性合金薄帯は、前記Fe基ナノ結晶の平均粒径が5〜30nmであってもよい。 In the soft magnetic alloy strip of the present invention, the average particle size of the Fe-based nanocrystals may be 5 to 30 nm.

本発明の軟磁性合金薄帯は、0.73≦1−(a+b+c+d+e+f)≦0.91であってもよい。 The soft magnetic alloy strip of the present invention may have 0.73 ≦ 1- (a + b + c + d + e + f) ≦ 0.91.

本発明の軟磁性合金薄帯は、0≦α{1−(a+b+c+d+e+f)}≦0.40であってもよい。 The soft magnetic alloy strip of the present invention may be 0 ≦ α {1- (a + b + c + d + e + f)} ≦ 0.40.

本発明の軟磁性合金薄帯は、α=0であってもよい。 The soft magnetic alloy strip of the present invention may have α = 0.

本発明の軟磁性合金薄帯は、0≦β{1−(a+b+c+d+e+f)}≦0.030であってもよい。 The soft magnetic alloy strip of the present invention may be 0 ≦ β {1- (a + b + c + d + e + f)} ≦ 0.030.

本発明の軟磁性合金薄帯は、β=0であってもよい。 The soft magnetic alloy strip of the present invention may have β = 0.

本発明の軟磁性合金薄帯は、α=β=0であってもよい。 The soft magnetic alloy strip of the present invention may have α = β = 0.

本発明の軟磁性合金薄帯は、Raが0.50μm以下であってもよい。 The soft magnetic alloy ribbon of the present invention, Ra c may be not more than 0.50 .mu.m.

本発明の軟磁性合金薄帯は、前記自由面において鋳造方向に沿って最大高さ粗さを測定する場合に、最大高さ粗さの平均値が4.3μm以下であってもよい。 The soft magnetic alloy strip of the present invention may have an average maximum height roughness of 4.3 μm or less when the maximum height roughness is measured along the casting direction on the free surface.

本発明の磁性部品は、上記の軟磁性合金薄帯からなる。 The magnetic component of the present invention comprises the above-mentioned soft magnetic alloy strip.

図1は単ロール法の模式図である。FIG. 1 is a schematic view of the single roll method. 図2は単ロール法の模式図である。FIG. 2 is a schematic view of the single roll method. 図3はエッジ部および中央部の位置を示す模式図である。FIG. 3 is a schematic view showing the positions of the edge portion and the central portion. 図4は、X線結晶構造解析により得られるチャートの一例である。FIG. 4 is an example of a chart obtained by X-ray crystal structure analysis. 図5は、図4のチャートをプロファイルフィッティングすることにより得られるパターンの一例である。FIG. 5 is an example of a pattern obtained by profile fitting the chart of FIG.

以下、本発明の実施形態について図面を用いて説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(軟磁性合金薄帯の寸法)
本実施形態の軟磁性合金薄帯の寸法は任意である。例えば、図3に示す形状の軟磁性合金薄帯24にあっては、厚さ(z軸方向の長さ)が15〜30μm、幅(y軸方向の長さ)が100〜1000mmであってもよい。
(Dimensions of soft magnetic alloy thin band)
The size of the soft magnetic alloy strip of the present embodiment is arbitrary. For example, the soft magnetic alloy strip 24 having the shape shown in FIG. 3 has a thickness (length in the z-axis direction) of 15 to 30 μm and a width (length in the y-axis direction) of 100 to 1000 mm. May be good.

軟磁性合金薄帯24は、厚さが15μm以上であることで機械的強度および加工性を十分に維持しやすくなる。さらに、表面起伏(うねり)を低減しやすくなり、コアの占積率を十分に大きくしやすくなる。厚さが30μm以下であることで鋳造時の脆化を防止しやすくなる。さらに、熱処理前の軟磁性合金薄帯24に粗大な結晶が生じにくくなる。なお、コアの占積率とは、コアの断面における導体の割合のことである。 When the thickness of the soft magnetic alloy strip 24 is 15 μm or more, it becomes easy to sufficiently maintain the mechanical strength and workability. Further, it becomes easy to reduce the surface undulation (waviness), and it becomes easy to sufficiently increase the space factor of the core. When the thickness is 30 μm or less, it becomes easy to prevent embrittlement during casting. Further, coarse crystals are less likely to be formed on the soft magnetic alloy strip 24 before the heat treatment. The space factor of the core is the ratio of conductors in the cross section of the core.

軟磁性合金薄帯24は、幅が100mm以上であることで飽和磁束密度を向上しやすくなる。これは、飽和磁束密度が小さくなりやすいエッジ部41の影響が小さくなるためである。また、幅が1000mm以下であることで飽和磁束密度を向上しやすくなる。後述する鋳造時に冷却速度を薄帯全体で均一にしやすくなるためである。 When the width of the soft magnetic alloy thin band 24 is 100 mm or more, the saturation magnetic flux density can be easily improved. This is because the influence of the edge portion 41, which tends to reduce the saturation magnetic flux density, is reduced. Further, when the width is 1000 mm or less, the saturation magnetic flux density can be easily improved. This is because it is easy to make the cooling rate uniform over the entire thin band during casting, which will be described later.

また、図3に示すように本実施形態の軟磁性合金薄帯24は、幅方向(y軸方向)に沿ってエッジ部41および中央部43を有する。 Further, as shown in FIG. 3, the soft magnetic alloy strip 24 of the present embodiment has an edge portion 41 and a central portion 43 along the width direction (y-axis direction).

軟磁性合金薄帯24のエッジ部41は、軟磁性合金薄帯24のエッジからy軸方向に沿って中央(両方のエッジからの距離が等しい部分)に向かって20mmまでの領域、すなわち一方のエッジからの距離が0〜20mmである領域を指す。 The edge portion 41 of the soft magnetic alloy thin band 24 is a region up to 20 mm from the edge of the soft magnetic alloy thin band 24 toward the center (the portion where the distances from both edges are equal) along the y-axis direction, that is, one of them. Refers to a region where the distance from the edge is 0 to 20 mm.

軟磁性合金薄帯24の中央部43は、軟磁性合金薄帯24の幅をLとして、軟磁性合金薄帯24の一方のエッジからy軸方向に沿って他方のエッジに向かって3L/8〜5L/8の領域、すなわち、両方のエッジからの距離がともに3L/8〜5L/8である領域を指す。 The central portion 43 of the soft magnetic alloy thin band 24 is 3L / 8 from one edge of the soft magnetic alloy thin band 24 toward the other edge along the y-axis direction, where L is the width of the soft magnetic alloy thin band 24. It refers to a region of ~ 5L / 8, i.e. a region where the distances from both edges are both 3L / 8-5L / 8.

(軟磁性合金薄帯の組成)
本実施形態の軟磁性合金薄帯24は、組成式(Fe(1−(α+β))X1αX2β(1−(a+b+c+d+e+f))Siからなる主成分を有し、
X1はCoおよびNiからなる群から選択される1つ以上、
X2はAl,Mn,Ag,Zn,Sn,As,Sb,Cu,Cr,Bi,N,Oおよび希土類元素からなる群より選択される1つ以上、
MはNb,Hf,Zr,Ta,Mo,W,TiおよびVからなる群から選択される1つ以上であり、
0≦a≦0.140
0.020≦b≦0.200
0≦c≦0.150
0≦d≦0.090
0≦e≦0.030
0≦f≦0.030
α≧0
β≧0
0≦α+β≦0.50
であり、
a,cおよびdのうち少なくとも一つ以上が0より大きく、Fe基ナノ結晶からなる構造を有する。
(Composition of soft magnetic alloy strip)
The soft magnetic alloy ribbon 24 of this embodiment, the composition formula (Fe (1- (α + β )) X1 α X2 β) (1- (a + b + c + d + e + f)) The main consisting of M a B b P c Si d C e S f Has ingredients and
X1 is one or more selected from the group consisting of Co and Ni,
X2 is one or more selected from the group consisting of Al, Mn, Ag, Zn, Sn, As, Sb, Cu, Cr, Bi, N, O and rare earth elements.
M is one or more selected from the group consisting of Nb, Hf, Zr, Ta, Mo, W, Ti and V.
0 ≤ a ≤ 0.140
0.020 ≤ b ≤ 0.200
0 ≦ c ≦ 0.150
0 ≦ d ≦ 0.090
0 ≦ e ≦ 0.030
0 ≦ f ≦ 0.030
α ≧ 0
β ≧ 0
0 ≤ α + β ≤ 0.50
And
At least one or more of a, c and d is larger than 0 and has a structure composed of Fe-based nanocrystals.

上記の組成を有する軟磁性合金薄帯を熱処理する場合には、軟磁性合金薄帯24中にFe基ナノ結晶を析出しやすい。言いかえれば、上記の組成を有する軟磁性合金薄帯は、Fe基ナノ結晶を析出させた軟磁性合金薄帯24の出発原料としやすい。 When the soft magnetic alloy strip having the above composition is heat-treated, Fe-based nanocrystals are likely to be precipitated in the soft magnetic alloy strip 24. In other words, the soft magnetic alloy strip having the above composition can be easily used as a starting material for the soft magnetic alloy strip 24 in which Fe-based nanocrystals are precipitated.

なお、上記の組成を有する熱処理前の軟磁性合金薄帯は、アモルファスのみからなる構造を有していてもよく、初期微結晶が非晶質中に存在するナノヘテロ構造を有していてもよい。なお、初期微結晶は平均粒径が0.3〜10nmであってもよい。本実施形態では、後述する非晶質化率が85%以上である場合にアモルファスのみからなる構造を有するか、ナノヘテロ構造を有するとする。 The soft magnetic alloy strip having the above composition before heat treatment may have a structure consisting only of amorphous material, or may have a nanoheterostructure in which initial microcrystals are present in amorphous material. .. The initial microcrystals may have an average particle size of 0.3 to 10 nm. In the present embodiment, when the amorphization rate described later is 85% or more, it is assumed that it has a structure consisting of only amorphous or has a nanoheterostructure.

ここで、Fe基ナノ結晶とは、粒径がナノオーダーであり、Feの結晶構造がbcc(体心立方格子構造)である結晶のことである。本実施形態においては、平均粒径が5〜30nmであるFe基ナノ結晶を析出させることが好ましい。このようなFe基ナノ結晶を析出させた軟磁性合金薄帯24は、飽和磁束密度が高くなりやすく、保磁力が低くなりやすい。本実施形態では、Fe基ナノ結晶を含む構造である場合には、後述する非晶質化率が85%未満である。 Here, the Fe-based nanocrystal is a crystal having a particle size on the nano-order and a Fe crystal structure of bcc (body-centered cubic lattice structure). In this embodiment, it is preferable to precipitate Fe-based nanocrystals having an average particle size of 5 to 30 nm. The soft magnetic alloy strip 24 on which such Fe-based nanocrystals are precipitated tends to have a high saturation magnetic flux density and a low coercive force. In the present embodiment, when the structure contains Fe-based nanocrystals, the amorphization rate described later is less than 85%.

以下、軟磁性合金薄帯が非晶質相からなる構造(非晶質のみからなる構造またはナノヘテロ構造)を有するか、結晶相からなる構造を有するかを確認する方法について説明する。本実施形態において、下記式(1)に示す非晶質化率Xが85%以上である軟磁性合金薄帯は非晶質相からなる構造を有し、非晶質化率Xが85%未満である軟磁性合金薄帯は結晶相からなる構造を有するとする。
X=100−(Ic/(Ic+Ia)×100)…(1)
Ic:結晶性散乱積分強度
Ia:非晶性散乱積分強度
Hereinafter, a method for confirming whether the soft magnetic alloy strip has a structure composed of an amorphous phase (a structure composed only of an amorphous phase or a nanoheterostructure) or a structure composed of a crystalline phase will be described. In the present embodiment, the soft magnetic alloy strip having an amorphization rate X of 85% or more represented by the following formula (1) has a structure composed of an amorphous phase, and the amorphization rate X is 85%. It is assumed that the soft magnetic alloy strip having less than or less than has a structure composed of a crystalline phase.
X = 100- (Ic / (Ic + Ia) x 100) ... (1)
Ic: Crystalline scattering integral strength Ia: Amorphous scattering integral strength

非晶質化率Xは、軟磁性合金薄帯に対してXRDによりX線結晶構造解析を実施し、相の同定を行い、結晶化したFe又は化合物のピーク(Ic:結晶性散乱積分強度、Ia:非晶性散乱積分強度)を読み取り、そのピーク強度から結晶化率を割り出し、上記式(1)により算出する。以下、算出方法をさらに具体的に説明する。 The amorphization rate X is determined by X-ray crystallographic analysis of the soft magnetic alloy strip by XRD to identify the phase, and the peak of the crystallized Fe or compound (Ic: crystalline scattering integrated intensity, Ia: Amorphous scattering integrated intensity) is read, the crystallinity is calculated from the peak intensity, and calculated by the above formula (1). Hereinafter, the calculation method will be described in more detail.

本実施形態に係る軟磁性合金薄帯についてXRDによりX線結晶構造解析を行い、図4に示すようなチャートを得る。これを、下記式(2)のローレンツ関数を用いて、プロファイルフィッティングを行い、図5に示すような結晶性散乱積分強度を示す結晶成分パターンα、非晶性散乱積分強度を示す非晶成分パターンα、およびそれらを合わせたパターンαc+aを得る。得られたパターンの結晶性散乱積分強度および非晶性散乱積分強度から、上記式(1)により非晶質化率Xを求める。なお、測定範囲は、非晶質由来のハローが確認できる回析角2θ=30°〜60°の範囲とする。この範囲で、XRDによる実測の積分強度とローレンツ関数を用いて算出した積分強度との誤差が1%以内になるようにした。 An X-ray crystal structure analysis is performed on the soft magnetic alloy strip according to the present embodiment by XRD to obtain a chart as shown in FIG. This is profile-fitted using the Lorentz function of the following equation (2), and the crystal component pattern α c showing the crystalline scattering integral intensity and the amorphous component showing the amorphous scattering integral intensity as shown in FIG. 5 are performed. A pattern α a and a combined pattern α c + a are obtained. From the crystalline scattering integrated intensity and the amorphous scattering integrated intensity of the obtained pattern, the amorphization rate X is obtained by the above formula (1). The measurement range is a diffraction angle of 2θ = 30 ° to 60 ° at which an amorphous-derived halo can be confirmed. Within this range, the error between the integrated intensity actually measured by XRD and the integrated intensity calculated by using the Lorentz function was set to be within 1%.

Figure 0006845205
Figure 0006845205

以下、本実施形態に係る軟磁性合金薄帯24の各成分について詳細に説明する。 Hereinafter, each component of the soft magnetic alloy strip 24 according to the present embodiment will be described in detail.

MはNb,Hf,Zr,Ta,Mo,W,TiおよびVからなる群から選択される1つ以上である。 M is one or more selected from the group consisting of Nb, Hf, Zr, Ta, Mo, W, Ti and V.

Mの含有量(a)は0≦a≦0.140を満たす。すなわち、Mを含有しなくてもよい。Mの含有量(a)は0.020≦a≦0.120を満たすことが好ましく、0.040≦a≦0.100を満たすことがさらに好ましく、0.060≦a≦0.080を満たすことが特に好ましい。aが大きい場合には、飽和磁束密度が低下しやすくなる。 The content (a) of M satisfies 0 ≦ a ≦ 0.140. That is, it does not have to contain M. The content (a) of M preferably satisfies 0.020 ≦ a ≦ 0.120, more preferably 0.040 ≦ a ≦ 0.100, and more preferably 0.060 ≦ a ≦ 0.080. Is particularly preferred. When a is large, the saturation magnetic flux density tends to decrease.

また、aが小さいほど後述する軟磁性合金薄帯24の表面粗さが大きくなる傾向にある。また、aが大きすぎる場合には後述する表面粗さ比が小さくなる傾向にある。 Further, the smaller a is, the larger the surface roughness of the soft magnetic alloy thin band 24, which will be described later, tends to be. Further, when a is too large, the surface roughness ratio described later tends to be small.

Bの含有量(b)は0.020≦b≦0.200を満たす。また、0.025≦b≦0.200であってもよく、0.060≦b≦0.150であることが好ましく、0.080≦b≦0.120であることがさらに好ましい。bが小さい場合には、熱処理前の軟磁性合金薄帯に粒径30nmよりも大きい結晶からなる結晶相が生じやすく、結晶相が生じる場合には、熱処理によってFe基ナノ結晶を析出させることができない。そして、保磁力が高くなりやすくなる。bが大きい場合には、飽和磁束密度が低下しやすくなる。 The content (b) of B satisfies 0.020 ≦ b ≦ 0.200. Further, 0.025 ≦ b ≦ 0.200 may be set, 0.060 ≦ b ≦ 0.150 is preferable, and 0.080 ≦ b ≦ 0.120 is more preferable. When b is small, a crystal phase composed of crystals having a particle size of more than 30 nm is likely to be formed in the soft magnetic alloy strip before heat treatment, and when a crystal phase is formed, Fe-based nanocrystals may be precipitated by heat treatment. Can not. Then, the coercive force tends to increase. When b is large, the saturation magnetic flux density tends to decrease.

また、bが小さいほど後述する軟磁性合金薄帯24の表面粗さが大きくなる傾向にある。また、bが大きすぎても小さすぎても後述する表面粗さ比が小さくなる傾向にある。 Further, the smaller b is, the larger the surface roughness of the soft magnetic alloy thin band 24, which will be described later, tends to be. Further, if b is too large or too small, the surface roughness ratio described later tends to be small.

Pの含有量(c)は0≦c≦0.150を満たす。すなわち、Pを含有しなくてもよい。また、0.030≦c≦0.100であることが好ましく、0.030≦c≦0.050であることがさらに好ましい。cが大きい場合には、飽和磁束密度が低下しやすくなる。 The content (c) of P satisfies 0 ≦ c ≦ 0.150. That is, it does not have to contain P. Further, 0.030 ≦ c ≦ 0.100 is preferable, and 0.030 ≦ c ≦ 0.050 is more preferable. When c is large, the saturation magnetic flux density tends to decrease.

また、cが小さいほど後述する軟磁性合金薄帯24の表面粗さが大きくなる傾向にある。また、cが大きすぎる場合には後述する表面粗さ比が小さくなる傾向にある。 Further, the smaller c is, the larger the surface roughness of the soft magnetic alloy thin band 24, which will be described later, tends to be. Further, when c is too large, the surface roughness ratio described later tends to be small.

Siの含有量(d)は0≦d≦0.090を満たす。すなわち、Siを含有しなくてもよい。また、0≦d≦0.020であることが好ましい。Siを含有することで、保磁力を低下させやすくなる。dが大きい場合には、保磁力が逆に上昇しやすくなる。 The Si content (d) satisfies 0 ≦ d ≦ 0.090. That is, it does not have to contain Si. Further, it is preferable that 0 ≦ d ≦ 0.020. By containing Si, it becomes easy to reduce the coercive force. When d is large, the coercive force tends to increase on the contrary.

また、dが大きいほど後述する軟磁性合金薄帯24の表面粗さが小さくなる傾向にある。 Further, the larger d is, the smaller the surface roughness of the soft magnetic alloy thin band 24, which will be described later, tends to be.

Cの含有量(e)は0≦e≦0.030を満たす。すなわち、Cは含有しなくてもよい。また、0.001≦e≦0.010であることが好ましい。Cを含有することで、保磁力を低下させやすくなる。eが大きい場合には、熱処理前の軟磁性合金薄帯に粒径30nmよりも大きい結晶からなる結晶相が生じやすく、結晶相が生じる場合には、熱処理によってFe基ナノ結晶を析出させることができない。そして、保磁力が高くなりやすくなる。 The content (e) of C satisfies 0 ≦ e ≦ 0.030. That is, C does not have to be contained. Further, it is preferable that 0.001 ≦ e ≦ 0.010. By containing C, the coercive force can be easily lowered. When e is large, a crystal phase composed of crystals having a particle size of more than 30 nm is likely to be formed in the soft magnetic alloy strip before the heat treatment, and when a crystal phase is formed, Fe-based nanocrystals may be precipitated by the heat treatment. Can not. Then, the coercive force tends to increase.

Sの含有量(f)は0≦f≦0.030を満たす。すなわち、Sは含有しなくてもよい。Sを含有することで、後述する表面粗さを低下させやすくなる。fが大きい場合には、熱処理前の軟磁性合金薄帯に粒径30nmよりも大きい結晶からなる結晶相が生じやすく、結晶相が生じる場合には、熱処理によってFe基ナノ結晶を析出させることができない。そして、保磁力が高くなりやすくなる。 The S content (f) satisfies 0 ≦ f ≦ 0.030. That is, S does not have to be contained. By containing S, it becomes easy to reduce the surface roughness described later. When f is large, a crystal phase composed of crystals having a particle size of more than 30 nm is likely to be formed in the soft magnetic alloy strip before heat treatment, and when a crystal phase is formed, Fe-based nanocrystals may be precipitated by heat treatment. Can not. Then, the coercive force tends to increase.

また、本実施形態の軟磁性合金薄帯では、a,c,dのうち少なくとも一つ以上が0より大きい。すなわち、M,P,Siのうち少なくとも一つ以上を含む。なお、a,c,dのうち少なくとも一つ以上が0より大きいとは、a,c,dのうち少なくとも一つ以上が0.001以上であるという意味である。また、a,cのうち少なくとも一つ以上が0より大きくてもよい。すなわち、MおよびPのうち少なくとも一つ以上を含んでもよい。さらに、保磁力を著しく低下させることを考慮すれば、aが0より大きいことが好ましい。 Further, in the soft magnetic alloy strip of the present embodiment, at least one or more of a, c, and d is greater than 0. That is, it contains at least one or more of M, P, and Si. When at least one or more of a, c, and d is greater than 0, it means that at least one or more of a, c, and d is 0.001 or more. Further, at least one or more of a and c may be larger than 0. That is, at least one or more of M and P may be contained. Further, considering that the coercive force is significantly reduced, a is preferably larger than 0.

Feの含有量(1−(a+b+c+d+e+f))については、特に制限はないが、0.73≦(1−(a+b+c+d+e+f))≦0.95であってもよく、0.73≦(1−(a+b+c+d+e+f))≦0.91であってもよい。(1−(a+b+c+d+e+f))を上記の範囲内とすることで、軟磁性合金薄帯の製造時に粒径30nmよりも大きい結晶からなる結晶相がさらに生じにくくなる。 The Fe content (1- (a + b + c + d + e + f)) is not particularly limited, but may be 0.73 ≦ (1- (a + b + c + d + e + f)) ≦ 0.95, or 0.73 ≦ (1- (a + b + c + d + e + f)). )) ≤ 0.91. By setting (1- (a + b + c + d + e + f)) within the above range, it becomes more difficult for a crystal phase composed of crystals having a particle size of more than 30 nm to occur during the production of the soft magnetic alloy strip.

また、本実施形態の軟磁性合金薄帯においては、Feの一部をX1および/またはX2で置換してもよい。 Further, in the soft magnetic alloy strip of the present embodiment, a part of Fe may be replaced with X1 and / or X2.

X1はCoおよびNiからなる群から選択される1つ以上である。X1の含有量に関してはα=0でもよい。すなわち、X1は含有しなくてもよい。また、X1の原子数は組成全体の原子数を100at%として40at%以下であることが好ましい。すなわち、0≦α{1−(a+b+c+d+e+f)}≦0.40を満たすことが好ましい。 X1 is one or more selected from the group consisting of Co and Ni. The content of X1 may be α = 0. That is, X1 does not have to be contained. Further, the number of atoms of X1 is preferably 40 at% or less, assuming that the number of atoms in the entire composition is 100 at%. That is, it is preferable to satisfy 0 ≦ α {1- (a + b + c + d + e + f)} ≦ 0.40.

X2はAl,Mn,Ag,Zn,Sn,As,Sb,Cu,Cr,Bi,N,Oおよび希土類元素からなる群より選択される1つ以上である。X2の含有量に関してはβ=0でもよい。すなわち、X2は含有しなくてもよい。また、X2の原子数は組成全体の原子数を100at%として3.0at%以下であることが好ましい。すなわち、0≦β{1−(a+b+c+d+e+f)}≦0.030を満たすことが好ましい。 X2 is one or more selected from the group consisting of Al, Mn, Ag, Zn, Sn, As, Sb, Cu, Cr, Bi, N, O and rare earth elements. Regarding the content of X2, β = 0 may be used. That is, X2 does not have to be contained. Further, the number of atoms of X2 is preferably 3.0 at% or less, assuming that the number of atoms in the entire composition is 100 at%. That is, it is preferable to satisfy 0 ≦ β {1- (a + b + c + d + e + f)} ≦ 0.030.

FeをX1および/またはX2に置換する置換量の範囲としては、原子数ベースでFeの半分以下とする。すなわち、0≦α+β≦0.50とする。α+β>0.50の場合には、熱処理により第2実施形態の軟磁性合金を得ることが困難となる。 The range of the substitution amount for substituting Fe with X1 and / or X2 is set to half or less of Fe on the basis of the number of atoms. That is, 0 ≦ α + β ≦ 0.50. When α + β> 0.50, it becomes difficult to obtain the soft magnetic alloy of the second embodiment by heat treatment.

なお、本実施形態の軟磁性合金薄帯は上記以外の元素を不可避的不純物として含んでいてもよい。例えば、軟磁性合金薄帯100重量%に対して0.1重量%以下、含んでいてもよい。 The soft magnetic alloy strip of the present embodiment may contain elements other than the above as unavoidable impurities. For example, 0.1% by weight or less may be contained with respect to 100% by weight of the soft magnetic alloy strip.

(軟磁性合金薄帯の表面形態)
一般的に、図1、図2に示す単ロール法など、ロール23を用いる方法で軟磁性合金薄帯24を製造する場合、軟磁性合金薄帯24の表面形態は、剥離面24a(ロール23の表面に接した面)と自由面24b(ロール23の表面に接しなかった面)とで異なるものとなる。なお、剥離面24aおよび自由面24bは厚さ方向に垂直な面であり、剥離面24aと自由面24bとの区別は目視により行うことができる。
(Surface morphology of soft magnetic alloy strip)
Generally, when the soft magnetic alloy strip 24 is manufactured by a method using a roll 23 such as the single roll method shown in FIGS. 1 and 2, the surface form of the soft magnetic alloy strip 24 is a peeling surface 24a (roll 23). The surface in contact with the surface of the roll 23) and the free surface 24b (the surface not in contact with the surface of the roll 23) are different. The peeling surface 24a and the free surface 24b are surfaces perpendicular to the thickness direction, and the peeling surface 24a and the free surface 24b can be visually distinguished from each other.

(軟磁性合金薄帯の剥離面)
本実施形態に係る軟磁性合金薄帯24は、剥離面24aにおいて幅方向(y軸方向)に沿って算術平均粗さRaを測定する場合に、中央部43におけるRaの平均値をRa、エッジ部41におけるRaの平均値をRaとして、0.85≦Ra/Ra≦1.25を満たす。以下、Ra/Raのことを単に表面粗さ比と呼ぶことがある。
(Peeled surface of soft magnetic alloy thin band)
In the soft magnetic alloy strip 24 according to the present embodiment, when the arithmetic average roughness Ra is measured along the width direction (y-axis direction) on the peeled surface 24a, the average value of Ra in the central portion 43 is Ra c . The average value of Ra in the edge portion 41 is set to Ra e , and 0.85 ≦ Ra e / Ra c ≦ 1.25 is satisfied. Hereinafter, Ra e / Ra c may be simply referred to as a surface roughness ratio.

上記の組成を有し、Fe基ナノ結晶からなる構造を有し、表面粗さ比を上記の範囲内とした軟磁性合金薄帯24は、保磁力が低く、飽和磁束密度が高い軟磁性合金薄帯24となる。すなわち、軟磁気特性に優れた軟磁性合金薄帯24となる。 The soft magnetic alloy strip 24 having the above composition, having a structure composed of Fe-based nanocrystals, and having a surface roughness ratio within the above range has a low coercive force and a high saturation magnetic flux density. It becomes a thin band 24. That is, the soft magnetic alloy strip 24 having excellent soft magnetic characteristics is obtained.

表面粗さ比が上記の範囲外である場合には、軟磁性合金薄帯24の残留応力が大きくなりやすい。また、残留応力により磁気モーメントの回転が制約され、飽和磁束密度が低下しやすくなる。また、表面粗さ比が大きすぎる場合には、軟磁性合金薄帯24を積層してコアを作製する場合に占積率が低下しやすくなる。そして、コアの飽和磁束密度も低下し易くなる。 When the surface roughness ratio is out of the above range, the residual stress of the soft magnetic alloy strip 24 tends to increase. In addition, the residual stress restricts the rotation of the magnetic moment, and the saturation magnetic flux density tends to decrease. On the other hand, if the surface roughness ratio is too large, the space factor tends to decrease when the core is produced by laminating the soft magnetic alloy strips 24. Then, the saturation magnetic flux density of the core tends to decrease.

また、本実施形態に係る軟磁性合金薄帯24は、Raが0.50μm以下であってもよく、0.41μm以下であることが好ましい。Raが0.50μm以下であることにより、軟磁性合金薄帯24の残留応力を小さくしやすくなる。さらに、軟磁性合金薄帯24を積層してコアを作製する場合に占積率を向上させやすくなる。なお、Raの下限は存在しないが、後述する単ロール法によりRaが0.1μm未満である軟磁性合金薄帯24を製造しようとする場合には、ロールが過剰に研磨される場合がある。したがって、軟磁性合金薄帯24の製造安定性の観点からRaが0.1μm以上であってもよい。 Further, the soft magnetic alloy ribbon 24 according to the present embodiment may also be Ra c is 0.50μm or less is preferably less 0.41 .mu.m. By ra c is less than or equal to 0.50 .mu.m, it tends to reduce residual stress of the soft magnetic alloy ribbon 24. Further, when the core is produced by laminating the soft magnetic alloy thin strips 24, the space factor can be easily improved. Incidentally, if not the lower limit of the Ra c is present, when the Ra c is to produce a soft magnetic alloy ribbon 24 is less than 0.1μm by a single roll method to be described later, the roll is excessively polished is there. Therefore, Ra c may also be 0.1μm or more from the viewpoint of production stability of the soft magnetic alloy ribbon 24.

本実施形態に係る軟磁性合金薄帯24の表面粗さの測定方法は、接触式でもよく、非接触式でもよい。表面粗さの測定方法はJIS−B0601に準拠する。具体的には、測定長さを4.0mmとし、カットオフ波長を0.8mmとし、カットオフ種別を2RC(位相非補償)とする。 The method for measuring the surface roughness of the soft magnetic alloy strip 24 according to the present embodiment may be a contact type or a non-contact type. The method for measuring the surface roughness conforms to JIS-B0601. Specifically, the measurement length is 4.0 mm, the cutoff wavelength is 0.8 mm, and the cutoff type is 2RC (phase uncompensated).

Raについては、エッジ部41にて算術平均粗さRaの測定箇所を3か所設定し、測定した算術平均粗さを平均して算出する。なお、測定方向は幅方向(y軸方向)とする。これは、幅方向の算術平均粗さは薄帯形成初期時におけるパドルの密着度を表しており、薄帯の形成に強く影響するためである。 For Ra e , three measurement points of the arithmetic average roughness Ra are set at the edge portion 41, and the measured arithmetic average roughness is averaged and calculated. The measurement direction is the width direction (y-axis direction). This is because the arithmetic mean roughness in the width direction represents the degree of adhesion of the paddle at the initial stage of thin band formation, and strongly affects the thin band formation.

Raについては、中央部43にて算術平均粗さの測定箇所を3か所設定し、測定した算術平均粗さを平均して算出する。なお、測定方向は幅方向(y軸方向)とする。これは、幅方向の算術平均粗さは薄帯形成初期時におけるパドルの密着度を表しており、薄帯の形成に強く影響するためである。 For ra c, it sets three places the measurement point of the arithmetic average roughness at the center portion 43, is calculated by averaging the arithmetic mean roughness measured. The measurement direction is the width direction (y-axis direction). This is because the arithmetic mean roughness in the width direction represents the degree of adhesion of the paddle at the initial stage of thin band formation, and strongly affects the thin band formation.

(軟磁性合金薄帯の自由面)
本実施形態に係る軟磁性合金薄帯24は、自由面24bにおける表面粗さは任意である。ただし、x軸方向(鋳造方向)に沿って最大高さ粗さRzを測定する場合に、中央部43におけるRzの平均値をRzとして、Rzが4.3μm以下であることが好ましい。Rzを小さくすることにより、軟磁性合金薄帯24の飽和磁束密度をさらに向上させやすくなる。なお、Rzの下限は存在しないが、後述する単ロール法によりRzが0.1μm未満である軟磁性合金薄帯24を製造しようとする場合には、ロールが過剰に研磨される場合がある。軟磁性合金薄帯24の製造安定性の観点からRzが0.1μm以上であってもよい
(Free surface of soft magnetic alloy thin band)
The surface roughness of the soft magnetic alloy strip 24 according to the present embodiment on the free surface 24b is arbitrary. However, when the maximum height roughness Rz is measured along the x-axis direction (casting direction), it is preferable that the Rz c is 4.3 μm or less, where the average value of the Rz in the central portion 43 is Rz c. By reducing Rz c , it becomes easier to further improve the saturation magnetic flux density of the soft magnetic alloy thin band 24. Incidentally, if not the lower limit of Rz c is present, when the Rz c attempts to produce a soft magnetic alloy ribbon 24 is less than 0.1μm by a single roll method to be described later, the roll is excessively polished is there. From the viewpoint of manufacturing stability of the soft magnetic alloy strip 24, Rz c may be 0.1 μm or more.

Rzについては、中央部43にて最大高さ粗さRzの測定箇所を3か所設定し、測定した最大高さ粗さを平均して算出する。なお、測定方向は鋳造方向(x軸方向)とする。これは、図1、図2に示す単ロール法など、ロール23を用いる方法で軟磁性合金薄帯24を製造する場合には、自由面24bにおいて鋳造方向において周期的に溝が形成されるためである。

For Rz c , three measurement points of the maximum height roughness Rz are set in the central portion 43, and the measured maximum height roughness is averaged and calculated. The measurement direction is the casting direction (x-axis direction). This is because when the soft magnetic alloy strip 24 is manufactured by a method using a roll 23 such as the single roll method shown in FIGS. 1 and 2, grooves are periodically formed on the free surface 24b in the casting direction. Is.

(軟磁性合金薄帯の製造方法)
以下、本実施形態の軟磁性合金薄帯の製造方法について説明する。
(Manufacturing method of soft magnetic alloy thin band)
Hereinafter, a method for producing the soft magnetic alloy strip of the present embodiment will be described.

本実施形態の軟磁性合金薄帯の製造方法は任意である。例えば単ロール法により軟磁性合金薄帯を製造する方法がある。また、薄帯は連続薄帯であってもよい。 The method for producing the soft magnetic alloy strip of the present embodiment is arbitrary. For example, there is a method of manufacturing a soft magnetic alloy strip by a single roll method. Moreover, the thin band may be a continuous thin band.

単ロール法では、まず、最終的に得られる軟磁性合金薄帯に含まれる各金属元素の純金属を準備し、最終的に得られる軟磁性合金薄帯と同組成となるように秤量する。そして、各金属元素の純金属を溶解し、混合して母合金を作製する。なお、前記純金属の溶解方法は任意であるが、例えばチャンバー内で真空引きした後に高周波加熱にて溶解させる方法がある。なお、母合金と最終的に得られる軟磁性合金薄帯とは通常、同組成となる。 In the single roll method, first, the pure metal of each metal element contained in the finally obtained soft magnetic alloy strip is prepared, and weighed so as to have the same composition as the finally obtained soft magnetic alloy strip. Then, the pure metal of each metal element is melted and mixed to prepare a mother alloy. The method for melting the pure metal is arbitrary, but for example, there is a method in which the pure metal is evacuated in a chamber and then melted by high-frequency heating. The mother alloy and the finally obtained soft magnetic alloy strip have the same composition.

次に、作製した母合金を加熱して溶融させ、溶融金属(溶湯)を得る。溶融金属の温度には特に制限はないが、例えば1200〜1500℃とすることができる。 Next, the produced mother alloy is heated and melted to obtain a molten metal (molten metal). The temperature of the molten metal is not particularly limited, but can be, for example, 1200 to 1500 ° C.

本実施形態に係る単ロール法に用いられる装置の模式図を図1に示す。本実施形態に係る単ロール法において、チャンバー25内部において、ノズル21から溶融金属22を矢印の方向に回転しているロール23へ噴射し供給することでロール23の回転方向へ薄帯24が製造される。なお、本実施形態ではロール23の材質は任意である。例えばCuからなるロールが用いられる。 FIG. 1 shows a schematic view of an apparatus used in the single roll method according to the present embodiment. In the single roll method according to the present embodiment, the thin band 24 is manufactured in the rotation direction of the roll 23 by injecting and supplying the molten metal 22 from the nozzle 21 to the roll 23 rotating in the direction of the arrow inside the chamber 25. Will be done. In this embodiment, the material of the roll 23 is arbitrary. For example, a roll made of Cu is used.

一方、通常行われている単ロール法に用いられる装置の模式図を図2に示す。チャンバー25内部において、ノズル21から溶融金属22を矢印の方向に回転しているロール23へ噴射し供給することでロール23の回転方向へ薄帯24が製造される。 On the other hand, FIG. 2 shows a schematic diagram of an apparatus used in a commonly used single roll method. Inside the chamber 25, the thin band 24 is manufactured in the direction of rotation of the roll 23 by injecting and supplying the molten metal 22 from the nozzle 21 to the roll 23 rotating in the direction of the arrow.

本実施形態では、ロール23の温度を従来よりも高い50〜90℃とし、チャンバー内と噴射ノズル内との差圧(射出圧力)を20〜80kPaとすることで表面粗さ比が所定の範囲内となりやすくなる。射出圧力は30〜80kPaであることが好ましい。 In the present embodiment, the temperature of the roll 23 is set to 50 to 90 ° C., which is higher than the conventional one, and the differential pressure (injection pressure) between the chamber and the injection nozzle is set to 20 to 80 kPa, so that the surface roughness ratio is in a predetermined range. It becomes easy to be inside. The injection pressure is preferably 30 to 80 kPa.

ロール23の温度が低すぎる場合には、ロール23の表面に吸着した水分子の影響により表面粗さが大きくなり、表面粗さ比が小さくなる。表面粗さ比が小さくなるのは、エッジ部41と比べて中央部43の方が水分子の影響が大きくなるためである。ロール23の温度が高すぎる場合には、薄帯24を形成しにくくなる。また、薄帯24を形成できても表面粗さが大きくなる。 If the temperature of the roll 23 is too low, the surface roughness becomes large due to the influence of water molecules adsorbed on the surface of the roll 23, and the surface roughness ratio becomes small. The surface roughness ratio is small because the influence of water molecules is greater in the central portion 43 than in the edge portion 41. If the temperature of the roll 23 is too high, it becomes difficult to form the thin band 24. Further, even if the thin band 24 can be formed, the surface roughness becomes large.

射出圧力が小さすぎる場合には、薄帯24を形成しにくくなる。また、薄帯24を形成できても表面粗さが大きくなり表面粗さ比が小さくなる。射出圧力が大きすぎる場合には、薄帯24のエッジ部41が盛り上がる。その結果、表面粗さが大きくなり表面粗さ比が大きくなる。 If the injection pressure is too small, it becomes difficult to form the thin band 24. Further, even if the thin band 24 can be formed, the surface roughness becomes large and the surface roughness ratio becomes small. If the injection pressure is too high, the edge portion 41 of the thin band 24 rises. As a result, the surface roughness becomes large and the surface roughness ratio becomes large.

本実施形態では、図1に示すとおり剥離ガス噴射装置位置に対して逆側に向かってロールを回転させてもよく、図2に示すとおり剥離ガス噴射装置位置に向かってロールを回転させてもよい。ただし、図1に示すとおり剥離ガス噴射装置位置に対して逆側に向かってロールを回転させることが好ましく、ロール23と薄帯24とが接している時間をさらに長くすることでロール23の温度を50〜90℃程度に高くしても薄帯24を急激に冷却しやすくなる。なお、図1に示す方法で実施する場合には、図2に示す方法で実施する場合と比較して、剥離ガス噴射装置26からの剥離ガス噴射圧力を変化させることでロール23と薄帯24とが接している時間を制御する効果が大きい。 In the present embodiment, the roll may be rotated toward the opposite side with respect to the position of the release gas injection device as shown in FIG. 1, or the roll may be rotated toward the position of the release gas injection device as shown in FIG. Good. However, as shown in FIG. 1, it is preferable to rotate the roll toward the opposite side with respect to the position of the release gas injection device, and the temperature of the roll 23 is increased by further lengthening the time during which the roll 23 and the thin band 24 are in contact with each other. Even if the temperature is raised to about 50 to 90 ° C., the thin band 24 can be easily cooled rapidly. In the case of carrying out by the method shown in FIG. 1, the roll 23 and the thin band 24 are formed by changing the peeling gas injection pressure from the peeling gas injection device 26 as compared with the case of carrying out by the method shown in FIG. The effect of controlling the time of contact with and is great.

また、従来よりもロール23の温度を高くし、かつ、ロール23と薄帯24とが接している時間をさらに長くする場合には、冷却後の薄帯24の均一性を高くし、粒径30nmよりも大きい結晶からなる結晶相が生じにくくなる。その結果、従来の方法では粒径30nmよりも大きい結晶からなる結晶相が生じていた組成でも粒径が30nmよりも大きい結晶からなる結晶相を含まない軟磁性合金薄帯とできるようになる。そして、非晶質のみからなる構造または初期微結晶が非晶質中に存在するナノヘテロ構造を有する軟磁性合金薄帯としやすくなる。 Further, when the temperature of the roll 23 is higher than before and the time during which the roll 23 and the thin band 24 are in contact with each other is further lengthened, the uniformity of the thin band 24 after cooling is increased and the particle size is increased. A crystal phase composed of crystals larger than 30 nm is less likely to occur. As a result, even if the composition is such that a crystal phase composed of crystals having a particle size larger than 30 nm is generated by the conventional method, a soft magnetic alloy strip containing no crystal phase composed of crystals having a particle size larger than 30 nm can be obtained. Then, it becomes easy to form a soft magnetic alloy strip having a structure consisting only of amorphous material or a nanoheterostructure in which initial microcrystals are present in amorphous metal.

単ロール法においては、主にロール23の回転速度を調整することで得られる薄帯24の厚さを調整することができるが、例えばノズル21とロール23との間隔や溶融金属の温度などを調整することでも得られる薄帯24の厚さを調整することができる。また、射出圧力が小さい場合でもノズル21とロール23との間隔や溶融金属の温度などを調整することで薄帯24を形成し得る場合がある。 In the single roll method, the thickness of the thin band 24 obtained mainly by adjusting the rotation speed of the roll 23 can be adjusted, but for example, the distance between the nozzle 21 and the roll 23 and the temperature of the molten metal can be adjusted. The thickness of the thin band 24 obtained by adjusting can also be adjusted. Further, even when the injection pressure is small, the thin band 24 may be formed by adjusting the distance between the nozzle 21 and the roll 23, the temperature of the molten metal, and the like.

チャンバー25内部の蒸気圧には特に制限はない。例えば、露点調整を行ったArガスを用いてチャンバー25内部の蒸気圧を11hPa以下としてもよい。なお、チャンバー25内部の蒸気圧の下限は特に存在しない。露点調整したArガスを充填して蒸気圧を1hPa以下にしてもよく、真空に近い状態として蒸気圧を1hPa以下にしてもよい。 The vapor pressure inside the chamber 25 is not particularly limited. For example, the vapor pressure inside the chamber 25 may be set to 11 hPa or less by using Ar gas having a dew point adjusted. There is no particular lower limit of the vapor pressure inside the chamber 25. The dew point-adjusted Ar gas may be filled to set the vapor pressure to 1 hPa or less, or the vapor pressure may be set to 1 hPa or less in a state close to vacuum.

後述する熱処理前の軟磁性合金薄帯24は粒径が30nmよりも大きい結晶が含まれていない。そして、熱処理前の軟磁性合金薄帯24は非晶質のみからなる構造を有していてもよく、初期微結晶が非晶質中に存在するナノヘテロ構造を有していてもよい。 The soft magnetic alloy strip 24 before heat treatment, which will be described later, does not contain crystals having a particle size larger than 30 nm. The soft magnetic alloy strip 24 before the heat treatment may have a structure consisting only of amorphous material, or may have a nanoheterostructure in which the initial microcrystals are present in the amorphous material.

なお、薄帯24に粒径が30nmよりも大きい結晶が含まれているか否かを確認する方法には特に制限はない。例えば、粒径が30nmよりも大きい結晶の有無については、通常のX線回折測定により確認することができる。 There is no particular limitation on the method for confirming whether or not the thin band 24 contains crystals having a particle size larger than 30 nm. For example, the presence or absence of crystals having a particle size larger than 30 nm can be confirmed by ordinary X-ray diffraction measurement.

また、上記の初期微結晶の有無および平均粒径の観察方法については、特に制限はないが、例えば、イオンミリングにより薄片化した試料に対して、透過電子顕微鏡を用いて、制限視野回折像、ナノビーム回折像、明視野像または高分解能像を得ることで確認できる。制限視野回折像またはナノビーム回折像を用いる場合、回折パターンにおいて非晶質の場合にはリング状の回折が形成されるのに対し、非晶質ではない場合には結晶構造に起因した回折斑点が形成される。また、明視野像または高分解能像を用いる場合には、倍率1.00×10〜3.00×10倍で目視にて観察することで初期微結晶の有無および平均粒径を観察できる。 The presence or absence of the above initial microcrystals and the method of observing the average particle size are not particularly limited, but for example, a selected area diffraction image of a sample sliced by ion milling using a transmission electron microscope. It can be confirmed by obtaining a nanobeam diffraction image, a bright field image or a high resolution image. When a selected area diffraction image or a nanobeam diffraction image is used, ring-shaped diffraction is formed when the diffraction pattern is amorphous, whereas when it is not amorphous, diffraction spots due to the crystal structure are formed. It is formed. In the case of using a bright-field image or a high resolution image can be observed the presence and mean particle size of initial fine crystals by observing visually at a magnification 1.00 × 10 5 ~3.00 × 10 5 fold ..

以下、軟磁性合金薄帯24を熱処理することによりFe基ナノ結晶からなる構造を有する軟磁性合金薄帯を製造する方法について説明する。なお、本実施形態では、Fe基ナノ結晶からなる構造は非晶質化率Xが85%未満である結晶相からなる構造である。上記した通り、非晶質化率XはXRDによりX線結晶構造解析を実施することで測定することができる。 Hereinafter, a method for producing a soft magnetic alloy strip having a structure composed of Fe-based nanocrystals by heat-treating the soft magnetic alloy strip 24 will be described. In the present embodiment, the structure composed of Fe-based nanocrystals is a structure composed of a crystal phase having an amorphization rate X of less than 85%. As described above, the amorphization rate X can be measured by performing X-ray crystal structure analysis by XRD.

本実施形態の軟磁性合金薄帯を製造するための熱処理条件には特に制限はない。軟磁性合金薄帯の組成により好ましい熱処理条件は異なる。通常、好ましい熱処理温度は概ね450〜650℃、好ましい熱処理時間は概ね0.5〜10時間となる。しかし、組成によっては上記の範囲を外れたところに好ましい熱処理温度および熱処理時間が存在する場合もある。また、熱処理時の雰囲気には特に制限はない。大気中のような活性雰囲気下で行ってもよいし、Arガス中のような不活性雰囲気下で行ってもよい。 The heat treatment conditions for producing the soft magnetic alloy strip of the present embodiment are not particularly limited. Preferred heat treatment conditions differ depending on the composition of the soft magnetic alloy strip. Generally, the preferable heat treatment temperature is about 450 to 650 ° C., and the preferable heat treatment time is about 0.5 to 10 hours. However, depending on the composition, there may be a preferable heat treatment temperature and heat treatment time outside the above range. Further, the atmosphere at the time of heat treatment is not particularly limited. It may be carried out in an active atmosphere such as in the air, or in an inert atmosphere such as in Ar gas.

また、熱処理により得られた軟磁性合金薄帯に含まれるFe基ナノ結晶の平均粒径の算出方法には特に制限はない。例えば透過電子顕微鏡を用いて観察することで算出できる。また、結晶構造がbcc(体心立方格子構造)であること確認する方法にも特に制限はない。例えばX線回折測定を用いて確認することができる。 Further, there is no particular limitation on the method of calculating the average particle size of the Fe-based nanocrystals contained in the soft magnetic alloy strip obtained by the heat treatment. For example, it can be calculated by observing with a transmission electron microscope. Further, there is no particular limitation on the method for confirming that the crystal structure is bcc (body-centered cubic lattice structure). For example, it can be confirmed by using X-ray diffraction measurement.

そして、熱処理により得られた軟磁性合金薄帯は表面粗さ比が所定の範囲内となる。表面粗さ比が所定の範囲内である軟磁性合金薄帯を巻き回すことで得られるコアや表面粗さ比が所定の範囲内である軟磁性合金薄帯を積層することで得られるコアは占積率が高くなりやすく、飽和磁束密度が高くなりやすい。したがって、良好なコア(特にトロイダルコア)が得られる。 The surface roughness ratio of the soft magnetic alloy strip obtained by the heat treatment is within a predetermined range. The core obtained by winding a soft magnetic alloy strip having a surface roughness ratio within a predetermined range and the core obtained by laminating a soft magnetic alloy strip having a surface roughness ratio within a predetermined range are The space factor tends to be high, and the saturation magnetic flux density tends to be high. Therefore, a good core (particularly a toroidal core) can be obtained.

なお、非晶質相からなる構造を有する軟磁性合金薄帯を熱処理してFe基ナノ結晶からなる軟磁性合金薄帯とした場合には、剥離面の中央部の表面粗さおよびエッジ部の表面粗さが減少し、表面粗さ比も減少する。そして、当該軟磁性合金薄帯を用いたコアの占積率も上昇する。これに対し、熱処理後も非晶質相からなる構造を有する軟磁性合金薄帯である場合には、剥離面の表面粗さはほとんど変化しない。また、粒径が30nmよりも大きい結晶が生じる場合には、剥離面の中央部の表面粗さおよびエッジ部の表面粗さが減少するが、Fe基ナノ結晶からなる軟磁性合金薄帯とする場合と比較すると減少幅は小さい。そして、当該軟磁性合金薄帯を用いたコアの占積率を上昇させる効果も小さい。 When the soft magnetic alloy strip having a structure composed of an amorphous phase is heat-treated to form a soft magnetic alloy strip composed of Fe-based nanocrystals, the surface roughness of the central portion of the peeled surface and the edge portion are affected. The surface roughness is reduced, and the surface roughness ratio is also reduced. Then, the space factor of the core using the soft magnetic alloy strip also increases. On the other hand, in the case of a soft magnetic alloy strip having a structure composed of an amorphous phase even after heat treatment, the surface roughness of the peeled surface hardly changes. Further, when crystals having a particle size larger than 30 nm are generated, the surface roughness of the central portion and the surface roughness of the edge portion of the peeled surface are reduced, but a soft magnetic alloy thin band composed of Fe-based nanocrystals is used. The amount of decrease is small compared to the case. Further, the effect of increasing the space factor of the core using the soft magnetic alloy strip is also small.

(磁性部品)
本実施形態に係る磁性部品、特にコアおよびインダクタは本実施形態に係る軟磁性合金薄帯から得られる。以下、本実施形態に係るコアおよびインダクタを得る方法について説明するが、軟磁性合金薄帯からコアおよびインダクタを得る方法は下記の方法に限定されない。また、コアの用途としては、インダクタの他にも、トランスおよびモータなどが挙げられる。
(Magnetic parts)
The magnetic components according to the present embodiment, particularly the core and the inductor, are obtained from the soft magnetic alloy strip according to the present embodiment. Hereinafter, the method for obtaining the core and the inductor according to the present embodiment will be described, but the method for obtaining the core and the inductor from the soft magnetic alloy strip is not limited to the following methods. In addition to inductors, core applications include transformers and motors.

軟磁性合金薄帯からコアを得る方法としては、例えば、軟磁性合金薄帯を巻き回す方法や積層する方法が挙げられる。軟磁性合金薄帯を積層する際に絶縁体を介して積層する場合には、さらに特性を向上させたコアを得ることができる。 Examples of the method of obtaining the core from the soft magnetic alloy strip include a method of winding the soft magnetic alloy strip and a method of laminating. When laminating the soft magnetic alloy strips via an insulator, a core having further improved characteristics can be obtained.

また、上記のコアに巻線を施すことでインダクタンス部品が得られる。巻線の施し方およびインダクタンス部品の製造方法には特に制限はない。例えば、上記の方法で製造したコアに巻線を少なくとも1ターン以上巻き回す方法が挙げられる。 Further, an inductance component can be obtained by winding the above core. There are no particular restrictions on the winding method and the manufacturing method of the inductance component. For example, a method of winding the winding around the core manufactured by the above method for at least one turn or more can be mentioned.

以上、本発明の各実施形態について説明したが、本発明は上記の実施形態に限定されない。 Although each embodiment of the present invention has been described above, the present invention is not limited to the above embodiment.

以下、実施例に基づき本発明を具体的に説明する。 Hereinafter, the present invention will be specifically described based on Examples.

(実験例1)
Fe0.84Nb0.070.09の合金組成となるように原料金属を秤量し、高周波加熱にて溶解し、母合金を作製した。
(Experimental Example 1)
The raw material metal was weighed so as to have an alloy composition of Fe 0.84 Nb 0.07 B 0.09 and melted by high frequency heating to prepare a mother alloy.

その後、作製した母合金を加熱して溶融させ、1250℃の溶融状態の金属とした後に、ロールを回転速度25m/sec.で回転させる単ロール法により前記金属をロールに噴射させ、薄帯を作成した。なお、ロールの材質はCuとした。 Then, the prepared mother alloy was heated and melted to obtain a metal in a molten state at 1250 ° C., and then the roll was rotated at a rotation speed of 25 m / sec. The metal was injected onto the roll by the single roll method of rotating with, and a thin band was created. The material of the roll was Cu.

図1に示す方向にロールを回転させ、ロール温度は表1に示す温度とした。チャンバー内と噴射ノズル内との差圧(射出圧力)は表1に示す圧力とした。また、スリットノズルのスリット幅を180mm、スリット開口部からロールまでの距離0.2mm、ロール径φ300mmとすることで、得られる薄帯の厚さを20〜30μm、薄帯の長さを数十mとした。 The roll was rotated in the direction shown in FIG. 1, and the roll temperature was set to the temperature shown in Table 1. The differential pressure (injection pressure) between the inside of the chamber and the inside of the injection nozzle was the pressure shown in Table 1. Further, by setting the slit width of the slit nozzle to 180 mm, the distance from the slit opening to the roll to 0.2 mm, and the roll diameter of φ300 mm, the thickness of the obtained thin band is 20 to 30 μm, and the length of the thin band is several tens. It was set to m.

さらに、熱処理前の薄帯が非晶質相からなるのか結晶相からなるのかを確認した。XRDを用いて各薄帯の非晶質化率Xを測定し、Xが85%以上である場合に非晶質相からなるとした。Xが85%未満である場合に結晶相からなるとした Furthermore, it was confirmed whether the thin band before the heat treatment consisted of an amorphous phase or a crystalline phase. The amorphization rate X of each thin band was measured using XRD, and when X was 85% or more, it was determined to consist of an amorphous phase. When X was less than 85%, it was considered to consist of a crystalline phase .

その後、各実施例および比較例の薄帯に対し、600℃で60分、熱処理を行った。 Then, the thin strips of each Example and Comparative Example were heat-treated at 600 ° C. for 60 minutes.

熱処理後の各薄帯に対し、剥離面の表面粗さ(算術平均粗さ)を測定した。また、剥離面の表面粗さ比を計算により算出した。剥離面の表面粗さは、JIS−B0601に準拠した接触式表面粗さ測定器を用いて接触式でエッジ部と中央部とで3か所ずつ測定し、それぞれの表面粗さを平均した。さらに、表面粗さ比を算出した。 The surface roughness (arithmetic mean roughness) of the peeled surface was measured for each thin band after the heat treatment. Moreover, the surface roughness ratio of the peeled surface was calculated by calculation. The surface roughness of the peeled surface was measured at three points each at the edge portion and the central portion by a contact type using a contact type surface roughness measuring instrument conforming to JIS-B0601, and the surface roughness of each was averaged. Furthermore, the surface roughness ratio was calculated.

さらに、熱処理後の各薄帯に対し、自由面の表面粗さ(最大高さ粗さ)を測定した。自由面の表面粗さは、JIS−B0601に準拠した接触式表面粗さ測定器を用いて接触式で、中央部で3か所測定し、平均した。なお、本明細書に記載した全ての実施例において、自由面の表面粗さは4.3μm以下であった。 Further, the surface roughness (maximum height roughness) of the free surface was measured for each thin band after the heat treatment. The surface roughness of the free surface was measured and averaged at three points in the central portion by a contact type using a contact type surface roughness measuring instrument conforming to JIS-B0601. In all the examples described in the present specification, the surface roughness of the free surface was 4.3 μm or less.

熱処理後の各薄帯の保磁力および飽和磁束密度を測定した。保磁力は(Hcメーター)を用いて測定した。飽和磁束密度は振動試料型磁力計(VSM)を用いて磁場1000kA/mで測定した。保磁力は12.0A/m以下を良好とし、5.0A/m以下を更に良好とし、2.5A/m以下を更に良好とし、2.0A/m以下を特に良好とし、1.5A/m以下を最も良好とした。飽和磁束密度は1.50T以上を良好とした。 The coercive force and saturation magnetic flux density of each thin band after the heat treatment were measured. The coercive force was measured using (Hc meter). The saturation magnetic flux density was measured at a magnetic field of 1000 kA / m using a vibrating sample magnetometer (VSM). The coercive force is good at 12.0 A / m or less, further good at 5.0 A / m or less, further good at 2.5 A / m or less, particularly good at 2.0 A / m or less, and 1.5 A / m. The best was m or less. The saturation magnetic flux density was preferably 1.50 T or higher.

なお、以下に示す実施例の薄帯では特に記載の無い限り、全て平均粒径が5〜30nmであり結晶構造がbccであるFe基ナノ結晶を有していたことをX線回折測定、および透過電子顕微鏡を用いた観察で確認した。また、熱処理の前後で合金組成に変化がないことについてICP分析を用いて確認した。 Unless otherwise specified, the thin bands of the examples shown below all had Fe-based nanocrystals having an average particle size of 5 to 30 nm and a crystal structure of bcc by X-ray diffraction measurement and. It was confirmed by observation using a transmission electron microscope. In addition, it was confirmed by ICP analysis that there was no change in the alloy composition before and after the heat treatment.

さらに、各実施例および比較例の薄帯を用いてコアを作製した。まず、薄帯から鋳造方向の長さが310mmである薄帯片を切り出した。次に、切り出した薄帯片を、外径18mm内径10mmのトロイダル状に120枚打ち抜き、打ち抜いた薄帯片を積層し、高さ約3mm積層トロイダルコアを得た。なお、コア作製時に磁場中での熱処理は行っていない。 In addition, cores were made using the strips of each example and comparative example. First, a thin strip piece having a length of 310 mm in the casting direction was cut out from the thin strip. Next, 120 pieces of the cut out thin strip pieces were punched out in a toroidal shape having an outer diameter of 18 mm and an inner diameter of 10 mm, and the punched thin strip pieces were laminated to obtain a laminated toroidal core having a height of about 3 mm. No heat treatment was performed in a magnetic field when the core was manufactured.

コアの占積率は、コアの寸法密度とあらかじめ測定した薄帯単体のアルキメデス密度との比から求めた。コアの飽和磁束密度は、B−Hアナライザーで測定した。コアの占積率は85.00%以上を良好とし、87.50%以上をさらに良好とした。コアの飽和磁束密度は1.35T以上を良好とした。 The space factor of the core was obtained from the ratio of the dimensional density of the core to the Archimedes density of the thin band alone measured in advance. The saturation magnetic flux density of the core was measured with a BH analyzer. The space factor of the core was good at 85.00% or more, and further good at 87.50% or more. The saturation magnetic flux density of the core was set to 1.35 T or higher.

Figure 0006845205
Figure 0006845205

表1より、ロール温度が50℃以上90℃以下であり、射出圧力が20kPa以上80kPa以下である各実施例は、薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。 From Table 1, in each example in which the roll temperature is 50 ° C. or higher and 90 ° C. or lower and the injection pressure is 20 kPa or higher and 80 kPa or lower, the surface roughness ratio of the thin band is within the range of 0.85 to 1.25. The magnetic characteristics of the thin band became good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good.

これに対し、ロール温度が低すぎる試料1および試料2は、薄帯の表面粗さ比が0.85〜1.25の範囲外となり、薄帯の飽和磁束密度が低下した。さらに、当該薄帯を用いて作製されるコアの占積率も低下し、コアの飽和磁束密度はさらに低下した。 On the other hand, in Sample 1 and Sample 2 in which the roll temperature was too low, the surface roughness ratio of the thin band was out of the range of 0.85 to 1.25, and the saturation magnetic flux density of the thin band decreased. Further, the space factor of the core produced by using the thin band also decreased, and the saturation magnetic flux density of the core further decreased.

(実験例2)
実験例2では、下表に示す各実施例および比較例の合金組成となるように原料金属を秤量し、高周波加熱にて溶解し、母合金を作製した点以外は実験例1と同条件で実施した。なお、ロール温度は70℃、射出圧力は50kPaとした。結果を表2〜表22に示す。
(Experimental Example 2)
In Experimental Example 2, the raw metal was weighed so as to have the alloy composition of each Example and Comparative Example shown in the table below, and melted by high-frequency heating under the same conditions as in Experimental Example 1 except that a mother alloy was prepared. carried out. The roll temperature was 70 ° C. and the injection pressure was 50 kPa. The results are shown in Tables 2 to 22.

Figure 0006845205
Figure 0006845205

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Figure 0006845205

表2〜表3は、Mの含有量(a)を変化させた実施例および比較例を記載したものである。なお、Mの種類はNbとしている。各成分の含有量が所定の範囲内である各実施例は薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。これに対し、Mの含有量(a)が大きすぎる比較例は、薄帯の飽和磁束密度が低下し、コアの磁束密度も低下した。 Tables 2 to 3 show Examples and Comparative Examples in which the M content (a) was changed. The type of M is Nb. In each example in which the content of each component was within a predetermined range, the surface roughness ratio of the thin band was within the range of 0.85 to 1.25, and the magnetic characteristics of the thin band were good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good. On the other hand, in the comparative example in which the M content (a) was too large, the saturation magnetic flux density of the thin band decreased, and the magnetic flux density of the core also decreased.

表4〜表5は、Bの含有量(b)を変化させた実施例および比較例を記載したものである。各成分の含有量が所定の範囲内である各実施例は薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。これに対し、Bの含有量(b)が小さすぎる比較例は、熱処理前の薄帯が結晶相からなり、熱処理後の保磁力が著しく大きくなった。また、表面粗さ比も0.85〜1.25の範囲外となり、コアの占積率も低下した。Bの含有量が大きすぎる比較例は、薄帯の飽和磁束密度が低下し、コアの磁束密度も低下した。 Tables 4 to 5 show Examples and Comparative Examples in which the B content (b) was changed. In each example in which the content of each component was within a predetermined range, the surface roughness ratio of the thin band was within the range of 0.85 to 1.25, and the magnetic characteristics of the thin band were good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good. On the other hand, in the comparative example in which the B content (b) was too small, the thin band before the heat treatment consisted of a crystalline phase, and the coercive force after the heat treatment became remarkably large. In addition, the surface roughness ratio was out of the range of 0.85 to 1.25, and the space factor of the core was also lowered. In the comparative example in which the B content was too large, the saturation magnetic flux density of the thin band decreased, and the magnetic flux density of the core also decreased.

表6〜表7は、Pの含有量(c)を変化させた実施例および比較例を記載したものである。各成分の含有量が所定の範囲内である各実施例は薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。これに対し、Pの含有量(c)が大きすぎる比較例は、薄帯の飽和磁束密度が低下し、コアの磁束密度も低下した。 Tables 6 to 7 show Examples and Comparative Examples in which the P content (c) was changed. In each example in which the content of each component was within a predetermined range, the surface roughness ratio of the thin band was within the range of 0.85 to 1.25, and the magnetic characteristics of the thin band were good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good. On the other hand, in the comparative example in which the P content (c) was too large, the saturation magnetic flux density of the thin band decreased, and the magnetic flux density of the core also decreased.

表8〜表9は、Cの含有量(e)を変化させた実施例および比較例を記載したものである。各成分の含有量が所定の範囲内である各実施例は薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。これに対し、Cの含有量(e)が大きすぎる比較例は、熱処理前の薄帯が結晶相からなり、熱処理後の保磁力が著しく大きくなった。 Tables 8 to 9 show Examples and Comparative Examples in which the C content (e) was changed. In each example in which the content of each component was within a predetermined range, the surface roughness ratio of the thin band was within the range of 0.85 to 1.25, and the magnetic characteristics of the thin band were good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good. On the other hand, in the comparative example in which the C content (e) was too large, the thin band before the heat treatment consisted of a crystalline phase, and the coercive force after the heat treatment became remarkably large.

表10〜表11は、Sの含有量(f)を変化させた実施例および比較例を記載したものである。各成分の含有量が所定の範囲内である各実施例は薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。これに対し、Cの含有量(e)が大きすぎる比較例は、熱処理前の薄帯が結晶相からなり、熱処理後の保磁力が著しく大きくなった。 Tables 10 to 11 show Examples and Comparative Examples in which the S content (f) was changed. In each example in which the content of each component was within a predetermined range, the surface roughness ratio of the thin band was within the range of 0.85 to 1.25, and the magnetic characteristics of the thin band were good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good. On the other hand, in the comparative example in which the C content (e) was too large, the thin band before the heat treatment consisted of a crystalline phase, and the coercive force after the heat treatment became remarkably large.

表12〜表13は、Siの含有量(d)を変化させた実施例を記載したものである。各成分の含有量が所定の範囲内である各実施例は薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。 Tables 12 to 13 show examples in which the Si content (d) is changed. In each example in which the content of each component was within a predetermined range, the surface roughness ratio of the thin band was within the range of 0.85 to 1.25, and the magnetic characteristics of the thin band were good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good.

表14〜表15は、Mの含有量を0として、Siの含有量(d)を変化させた実施例および比較例を記載したものである。なお、試料20は熱処理を行っておらず、従来から知られている組成のFeアモルファス合金薄帯を作製したものである。各成分の含有量が所定の範囲内である各実施例は薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。これに対し、試料20は実施例の各薄帯と比較して保磁力が高くなった。 Tables 14 to 15 show Examples and Comparative Examples in which the Si content (d) was changed with the M content as 0. The sample 20 has not been heat-treated, and a Fe amorphous alloy strip having a conventionally known composition has been prepared. In each example in which the content of each component was within a predetermined range, the surface roughness ratio of the thin band was within the range of 0.85 to 1.25, and the magnetic characteristics of the thin band were good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good. On the other hand, the sample 20 had a higher coercive force than each thin band of the example.

表16〜表17は、表6〜表7に記載した実験例よりもFe量が多くB量が少なくMがZrである組成でPの含有量(c)を変化させた実施例を記載したものである。各成分の含有量が所定の範囲内である各実施例は薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。 Tables 16 to 17 describe examples in which the content (c) of P was changed with a composition in which the amount of Fe was large, the amount of B was small, and M was Zr as compared with the experimental examples shown in Tables 6 to 7. It is a thing. In each example in which the content of each component was within a predetermined range, the surface roughness ratio of the thin band was within the range of 0.85 to 1.25, and the magnetic characteristics of the thin band were good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good.

表18は、Mの種類を変化させた実施例を記載したものである。Mの種類を所定の種類に変化させた各実施例は薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。 Table 18 shows examples in which the type of M is changed. In each example in which the type of M was changed to a predetermined type, the surface roughness ratio of the thin band was in the range of 0.85 to 1.25, and the magnetic characteristics of the thin band were good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good.

表19〜表22は、X1および/またはX2の種類および含有量を変化させた実施例を記載したものである。X1および/またはX2の種類を所定の種類に変化させ、含有量を所定の範囲内に変化させた各実施例は薄帯の表面粗さ比が0.85〜1.25の範囲内となり、薄帯の磁気特性が良好となった。さらに、当該薄帯を用いて作製されるコアの占積率が良好であり、コアの飽和磁束密度も良好となった。 Tables 19 to 22 describe examples in which the types and contents of X1 and / or X2 are changed. In each example in which the types of X1 and / or X2 were changed to a predetermined type and the content was changed within a predetermined range, the surface roughness ratio of the thin band was within the range of 0.85 to 1.25. The magnetic characteristics of the thin band became good. Further, the space factor of the core produced by using the thin band was good, and the saturation magnetic flux density of the core was also good.

(実験例3)
実験例2の試料20(比較例)および試料39(実施例)について、熱処理前後での構造、表面粗さおよび保磁力の変化を観察した。
(Experimental Example 3)
For Sample 20 (Comparative Example) and Sample 39 (Example) of Experimental Example 2, changes in structure, surface roughness and coercive force before and after heat treatment were observed.

実験例2では熱処理を行わなかった試料20について、表23に示す熱処理温度および熱処理時間にて熱処理を行った。そして、熱処理を行う場合の構造、表面粗さおよび保磁力を観察した。構造および表面粗さを表23に示す。なお、表23では、熱処理を行わない試料における熱処理後のXRD測定結果は熱処理前のXRD測定結果と同一であるとした。 In Experimental Example 2, the sample 20 that had not been heat-treated was heat-treated at the heat treatment temperature and heat treatment time shown in Table 23. Then, the structure, surface roughness and coercive force when the heat treatment was performed were observed. The structure and surface roughness are shown in Table 23. In Table 23, it is assumed that the XRD measurement result after the heat treatment in the sample not subjected to the heat treatment is the same as the XRD measurement result before the heat treatment.

実験例2では熱処理を行った試料39について、熱処理を行わない場合の構造、表面粗さおよび保磁力を観察した。構造および表面粗さを表23に示す。なお、表23では、熱処理を行わない試料における熱処理後のXRD測定結果は熱処理前のXRD測定結果と同一であるとした。 In Experimental Example 2, the structure, surface roughness, and coercive force of the heat-treated sample 39 were observed when the heat treatment was not performed. The structure and surface roughness are shown in Table 23. In Table 23, it is assumed that the XRD measurement result after the heat treatment in the sample not subjected to the heat treatment is the same as the XRD measurement result before the heat treatment.

Figure 0006845205
Figure 0006845205

表23に示すように、Mを含まずSiの含有量(d)が本願発明の範囲外である試料20に関して、熱処理後も結晶が発生しなかった試料20aは表面粗さも実質的に変化しなかった。なお、保磁力はわずかに低下した。また、試料20aと比較して熱処理温度を高くした試料20bは熱処理後に粒径が30nmよりも大きい(粗大)結晶が存在した。そして、中央部の表面粗さもエッジ部の表面粗さもわずかに低下した。なお、保磁力は著しく上昇した。 As shown in Table 23, with respect to the sample 20 which does not contain M and the Si content (d) is outside the range of the present invention, the surface roughness of the sample 20a in which no crystals are generated even after the heat treatment is substantially changed. There wasn't. The coercive force was slightly reduced. Further, in the sample 20b in which the heat treatment temperature was higher than that in the sample 20a, crystals having a particle size larger than 30 nm (coarse) were present after the heat treatment. Then, the surface roughness of the central portion and the surface roughness of the edge portion were slightly reduced. The coercive force increased remarkably.

したがって、組成が本願発明の範囲外である試料20は、熱処理を行っても、表面粗さが変化せず保磁力がわずかに低下する程度であるか、大きな結晶が生じて表面粗さがわずかに低下し保磁力が著しく上昇するか、のいずれかである。 Therefore, in the sample 20 whose composition is outside the scope of the present invention, the surface roughness does not change and the coercive force is slightly reduced even after heat treatment, or large crystals are formed and the surface roughness is slight. Either the coercive force is significantly increased and the coercive force is significantly increased.

表23に示すように、熱処理前の試料39(試料39a)と熱処理後の試料39とを比較する。組成が所定の範囲内であり熱処理により平均粒径が5〜30nmであり結晶構造がbccであるFe基ナノ結晶が生じる場合には、熱処理後は中央部の表面粗さもエッジ部の表面粗さも熱処理前と比較して大きく低下する。なお、保磁力も熱処理により大きく低下した。したがって、熱処理によりFe基ナノ結晶が生じることで表面粗さが低下し、保磁力が低下することがわかった。なお、表面粗さ比も低下した。すなわち、中央部の表面粗さよりもエッジ部の表面粗さの方が熱処理による低下幅が少し大きかった。 As shown in Table 23, the sample 39 before the heat treatment (sample 39a) and the sample 39 after the heat treatment are compared. When the composition is within a predetermined range, the heat treatment produces Fe-based nanocrystals having an average particle size of 5 to 30 nm and a crystal structure of bcc, the surface roughness of the central portion and the surface roughness of the edge portion are both after the heat treatment. It is significantly reduced compared to before heat treatment. The coercive force was also significantly reduced by the heat treatment. Therefore, it was found that the surface roughness is lowered and the coercive force is lowered due to the formation of Fe-based nanocrystals by the heat treatment. The surface roughness ratio also decreased. That is, the amount of decrease due to the heat treatment was slightly larger in the surface roughness of the edge portion than in the surface roughness of the central portion.

21… ノズル
22… 溶融金属
23… ロール
24… (軟磁性合金)薄帯
24a… 剥離面
24b… 自由面
25… チャンバー
26… 剥離ガス噴射装置
41…エッジ部
43…中央部
21 ... Nozzle 22 ... Molten metal 23 ... Roll 24 ... (Soft magnetic alloy) Thin band 24a ... Peeling surface 24b ... Free surface 25 ... Chamber 26 ... Peeling gas injection device 41 ... Edge part 43 ... Central part

Claims (11)

組成式(Fe(1−(α+β))X1αX2β(1−(a+b+c+d+e+f))Si(原子数比)からなる成分を有する軟磁性合金薄帯であって、
X1はCoおよびNiからなる群から選択される1つ以上、
X2はAl,Mn,Ag,Zn,Sn,As,Sb,Cu,Cr,Bi,N,Oおよび希土類元素からなる群より選択される1つ以上、
MはNb,Hf,Zr,Ta,Mo,W,TiおよびVからなる群から選択される1つ以上であり、
0≦a≦0.140
0.020≦b≦0.200
0.010≦c≦0.100
0≦d≦0.090
0≦e≦0.030
0≦f≦0.030
α≧0
β≧0
0≦α+β≦0.50
であり、
前記軟磁性合金薄帯100重量%に対して前記成分に含まれる元素以外の元素の含有量が0.1重量%以下であり、
前記軟磁性合金薄帯はFe基ナノ結晶からなる構造を有し、非晶質化率Xが85%未満であり、
前記軟磁性合金薄帯は、厚さ方向に垂直な剥離面および自由面を有し、
前記軟磁性合金薄帯は、幅方向に沿ってエッジ部および中央部を有し、
前記エッジ部は一方のエッジからの距離が0〜20mmである領域であり、
前記中央部は前記軟磁性合金薄帯の幅をLとして、両方のエッジからの距離がともに3L/8〜5L/8である領域であり、
前記剥離面において幅方向に沿って算術平均粗さを測定する場合に、前記中央部における算術平均粗さの平均値をRa、前記エッジ部における算術平均粗さの平均値をRaとして、
0.85≦Ra/Ra≦1.25
を満たす軟磁性合金薄帯。
Composition formula (Fe (1- (α + β)) X1 α X2 β ) (1- (a + b + c + d + e + f)) M a B b P c S d C e S f (atomic number ratio) And
X1 is one or more selected from the group consisting of Co and Ni,
X2 is one or more selected from the group consisting of Al, Mn, Ag, Zn, Sn, As, Sb, Cu, Cr, Bi, N, O and rare earth elements.
M is one or more selected from the group consisting of Nb, Hf, Zr, Ta, Mo, W, Ti and V.
0 ≤ a ≤ 0.140
0.020 ≤ b ≤ 0.200
0.010 ≤ c ≤ 0.100
0 ≦ d ≦ 0.090
0 ≦ e ≦ 0.030
0 ≦ f ≦ 0.030
α ≧ 0
β ≧ 0
0 ≤ α + β ≤ 0.50
And
The content of elements other than the elements contained in the component is 0.1% by weight or less with respect to 100% by weight of the soft magnetic alloy strip.
The soft magnetic alloy strip has a structure composed of Fe-based nanocrystals, and has an amorphization rate X of less than 85%.
The soft magnetic alloy strip has a peeling surface and a free surface perpendicular to the thickness direction.
The soft magnetic alloy strip has an edge portion and a central portion along the width direction, and has an edge portion and a central portion.
The edge portion is a region where the distance from one edge is 0 to 20 mm.
The central portion is a region where the width of the soft magnetic alloy strip is L and the distances from both edges are both 3L / 8 to 5L / 8.
When the arithmetic mean roughness is measured along the width direction on the peeled surface, the average value of the arithmetic mean roughness in the central portion is defined as Ra c , and the average value of the arithmetic mean roughness in the edge portion is defined as Ra e .
0.85 ≤ Ra e / Ra c ≤ 1.25
Soft magnetic alloy strip that meets the requirements.
前記Fe基ナノ結晶の平均粒径が5〜30nmである請求項1に記載の軟磁性合金薄帯。 The soft magnetic alloy strip according to claim 1, wherein the average particle size of the Fe-based nanocrystals is 5 to 30 nm. 0.73≦1−(a+b+c+d+e+f)≦0.91である請求項1または2に記載の軟磁性合金薄帯。 The soft magnetic alloy strip according to claim 1 or 2, wherein 0.73 ≦ 1- (a + b + c + d + e + f) ≦ 0.91. 0≦α{1−(a+b+c+d+e+f)}≦0.40である請求項1〜3のいずれかに記載の軟磁性合金薄帯。 The soft magnetic alloy strip according to any one of claims 1 to 3, wherein 0 ≦ α {1- (a + b + c + d + e + f)} ≦ 0.40. α=0である請求項1〜4のいずれかに記載の軟磁性合金薄帯。 The soft magnetic alloy strip according to any one of claims 1 to 4, wherein α = 0. 0≦β{1−(a+b+c+d+e+f)}≦0.030である請求項1〜5のいずれかに記載の軟磁性合金薄帯。 The soft magnetic alloy strip according to any one of claims 1 to 5, wherein 0 ≦ β {1- (a + b + c + d + e + f)} ≦ 0.030. β=0である請求項1〜6のいずれかに記載の軟磁性合金薄帯。 The soft magnetic alloy strip according to any one of claims 1 to 6, wherein β = 0. α=β=0である請求項1〜7のいずれかに記載の軟磁性合金薄帯。 The soft magnetic alloy strip according to any one of claims 1 to 7, wherein α = β = 0. Raが0.50μm以下である請求項1〜8のいずれかに記載の軟磁性合金薄帯。 The soft magnetic alloy strip according to any one of claims 1 to 8, wherein the Ra c is 0.50 μm or less. 前記自由面において鋳造方向に沿って最大高さ粗さを測定する場合に、最大高さ粗さの平均値が4.3μm以下である請求項1〜9のいずれかに記載の軟磁性合金薄帯。 The soft magnetic alloy according to any one of claims 1 to 9, wherein the average value of the maximum height roughness is 4.3 μm or less when the maximum height roughness is measured along the casting direction on the free surface. Thin band. 請求項1〜10のいずれかに記載の軟磁性合金薄帯からなる磁性部品。 A magnetic component made of a soft magnetic alloy strip according to any one of claims 1 to 10.
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