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JP6847013B2 - Power semiconductor device - Google Patents
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JP6847013B2 - Power semiconductor device - Google Patents

Power semiconductor device Download PDF

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JP6847013B2
JP6847013B2 JP2017189402A JP2017189402A JP6847013B2 JP 6847013 B2 JP6847013 B2 JP 6847013B2 JP 2017189402 A JP2017189402 A JP 2017189402A JP 2017189402 A JP2017189402 A JP 2017189402A JP 6847013 B2 JP6847013 B2 JP 6847013B2
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flow path
heat dissipation
power semiconductor
dissipation base
semiconductor device
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JP2019068533A (en
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西原 淳夫
淳夫 西原
高志 平尾
高志 平尾
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Astemo Ltd
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Hitachi Astemo Ltd
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    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02MAPPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M7/00Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
    • H02M7/42Conversion of DC power input into AC power output without possibility of reversal
    • H02M7/44Conversion of DC power input into AC power output without possibility of reversal by static converters
    • H02M7/48Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00Arrangements for thermal protection or thermal control
    • H10W40/10Arrangements for heating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/761Package configurations characterised by the relative positions of pads or connectors relative to package parts of strap connectors
    • H10W90/763Package configurations characterised by the relative positions of pads or connectors relative to package parts of strap connectors between laterally-adjacent chips

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Inverter Devices (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Description

本発明はパワー半導体装置に関し、特に電気自動車およびハイブリッド自動車への車載用の電力変換装置向けのパワー半導体装置に関する。 The present invention relates to a power semiconductor device, and more particularly to a power semiconductor device for an in-vehicle power conversion device for an electric vehicle and a hybrid vehicle.

電気自動車あるいはハイブリッド自動車においては、車両の動力源としてモータを搭載しており、一般的にモータに供給する電力を制御するために電力変換装置を備えている。 In an electric vehicle or a hybrid vehicle, a motor is mounted as a power source of the vehicle, and generally, a power conversion device is provided to control the electric power supplied to the motor.

電力変換装置は、IGBT(Insulated Gate Bipolar Transistor)などの電力用半導体素子を内蔵したパワー半導体装置、そのパワー半導体装置を駆動する駆動回路、それらを制御する制御回路、および電流平滑化用のコンデンサを備えている。 The power conversion device includes a power semiconductor device having a built-in power semiconductor element such as an IGBT (Insulated Gate Bipolar Transistor), a drive circuit for driving the power semiconductor device, a control circuit for controlling them, and a capacitor for current smoothing. I have.

特にパワー半導体装置は、電力変換の損失のために大量の熱を発生するため、その冷却構造に対して様々な技術開発がなされてきた。 In particular, power semiconductor devices generate a large amount of heat due to the loss of power conversion, and various technological developments have been made for the cooling structure thereof.

パワー半導体素子の冷却技術としては空冷が一般的であるが、自動車に関しては水冷技術も広く用いられており、その中でもパワー半導体装置に放熱ベースを直接取り付けて放熱ベースを冷却流路の中に挿入する直接水冷構造は高い冷却性能が得られる。 Air cooling is generally used as the cooling technology for power semiconductor elements, but water cooling technology is also widely used for automobiles. Among them, the heat dissipation base is directly attached to the power semiconductor device and the heat dissipation base is inserted into the cooling flow path. The direct water cooling structure provides high cooling performance.

また、パワー半導体素子の表裏両面から冷却する両面冷却も能力の高い冷却方法であり、それらを組み合わせた両面直接水冷構造も実用化されている。 Double-sided cooling, which cools both the front and back sides of a power semiconductor element, is also a highly capable cooling method, and a double-sided direct water cooling structure that combines them has also been put into practical use.

例えば、特許文献1(特開2010−212412号公報)では、パワー半導体装置の両面に設けられた放熱ベースを冷却流路に挿入する構造が開示されている。本構造案では、片方の面の水の封止を弾性体で行うことによって、パワー半導体装置の表裏の放熱ベースに発生する公差を弾性体の変形によって吸収している。 For example, Patent Document 1 (Japanese Unexamined Patent Publication No. 2010-214212) discloses a structure in which heat dissipation bases provided on both sides of a power semiconductor device are inserted into a cooling flow path. In this structural proposal, the water on one side is sealed with an elastic body, so that the tolerance generated in the heat dissipation bases on the front and back of the power semiconductor device is absorbed by the deformation of the elastic body.

弾性体の具体例としてはOリング等が考えられるが、Oリングによって封止を行うためにはその周囲に、吸収したい変形量に応じた太さのOリングが収まるOリング溝の幅とOリング溝の両側に必要なスペースが必要であり、ユニットが大きくなってしまうことが課題である。 An O-ring or the like can be considered as a specific example of the elastic body, but in order to seal with the O-ring, the width of the O-ring groove and the O-ring groove in which the O-ring having a thickness corresponding to the amount of deformation to be absorbed can be accommodated around the O-ring. The required space is required on both sides of the ring groove, and the problem is that the unit becomes large.

特開2010−212412号公報Japanese Unexamined Patent Publication No. 2010-21241

本発明に係る課題は、パワー半導体装置の小型化を図るとともに信頼性を向上させることである。 An object of the present invention is to reduce the size of a power semiconductor device and improve its reliability.

本発明に係るパワー半導体装置は、パワー半導体素子を有し当該パワー半導体素子を樹脂部材で封止する回路体と、前記回路体を挟む第1放熱ベース及び第2放熱ベースと、前記回路体を挟んで対向しておりかつ冷媒を流す流路を形成する第1流路形成体及び第2流路形成体と、を備え、前記第1流路形成体は、前記第1放熱ベースに塞がれる第1開口を形成し、前記第2流路形成体は、前記第2放熱ベースに塞がれる第2開口を形成し、前記第1放熱ベース及び前記第2放熱ベースのそれぞれは、主面と、側面と、により形成され、前記第1放熱ベースの前記側面の一部が、前記第1開口の開口空間を形成する前記第1流路形成体の内側面と対向し、前記第2放熱ベースの前記主面の一部が、前記第2開口の周辺を形成する前記第2流路形成体の外面と対向し、互いに対向する前記第1放熱ベースの前記側面の一部と前記第1流路形成体の内側面とが接合され、互いに対向する前記第2放熱ベースの前記主面の一部と前記第2流路形成体の外面とが接合されるThe power semiconductor device according to the present invention includes a circuit body having a power semiconductor element and sealing the power semiconductor element with a resin member, a first heat radiation base and a second heat radiation base sandwiching the circuit body, and the circuit body. A first flow path forming body and a second flow path forming body that are sandwiched and face each other and form a flow path through which a refrigerant flows are provided, and the first flow path forming body is blocked by the first heat dissipation base. The first heat radiation base is formed, the second flow path forming body forms a second opening closed by the second heat radiation base, and each of the first heat radiation base and the second heat radiation base has a main surface. And a side surface, and a part of the side surface of the first heat dissipation base faces the inner side surface of the first flow path forming body forming the opening space of the first opening, and the second heat dissipation A part of the main surface of the base faces the outer surface of the second flow path forming body forming the periphery of the second opening, and a part of the side surface of the first heat dissipation base facing each other and the first. The inner side surface of the flow path forming body is joined, and a part of the main surface of the second heat dissipation base facing each other and the outer surface of the second flow path forming body are joined .

本発明により、パワー半導体装置の小型化を図るとともに信頼性を向上させることができる。 INDUSTRIAL APPLICABILITY According to the present invention, it is possible to reduce the size of a power semiconductor device and improve its reliability.

本実施形態に係るパワー半導体装置1の斜視図である。It is a perspective view of the power semiconductor device 1 which concerns on this embodiment. 図1の平面Aの矢印方向から見たパワー半導体装置の断面図である。It is sectional drawing of the power semiconductor device seen from the arrow direction of the plane A of FIG. パワー半導体装置1の組み立て工程のうちパワーモジュール1aないし1cの配置を示す斜視図である。It is a perspective view which shows the arrangement of the power module 1a to 1c in the assembly process of a power semiconductor device 1. パワー半導体装置1の組み立て工程のうち流路本体部6a及び6bをパワーモジュール1aないし1cに組み付けた状態を示す斜視図である。It is a perspective view which shows the state which the flow path main body part 6a and 6b are assembled to the power module 1a to 1c in the assembly process of a power semiconductor device 1. パワー半導体装置1の組み立て工程における完成斜視図である。It is a completed perspective view in the assembly process of a power semiconductor device 1. 本実施形態に係る流路本体部6aの斜視図である。It is a perspective view of the flow path main body 6a which concerns on this embodiment. 本実施形態に係るパワーモジュール1aの断面図である。It is sectional drawing of the power module 1a which concerns on this embodiment. パワーモジュール1aの製造交差を説明するための断面図である。It is sectional drawing for demonstrating the manufacturing intersection of power module 1a. 流路本体部6aの開口部7a周辺の拡大断面図である。It is an enlarged sectional view around the opening 7a of the flow path main body 6a. 溶接工程後の状態を示すパワー半導体装置1の断面図である。It is sectional drawing of the power semiconductor device 1 which shows the state after a welding process. 流路本体部6aの開口部7a周辺の拡大断面図である。It is an enlarged sectional view around the opening 7a of the flow path main body 6a. 流路本体部6bの開口部7a周辺の拡大断面図である。It is an enlarged sectional view around the opening 7a of the flow path main body 6b.

本発明の実施形態を説示する前に、本発明の背景を説明する。 Prior to explaining embodiments of the present invention, the background of the present invention will be described.

省スペースでパワー半導体装置と冷却流路を接合する手段として、例えばレーザ溶接で接合することが考えられる。 As a means for joining the power semiconductor device and the cooling flow path in a space-saving manner, for example, laser welding can be considered.

レーザ溶接によれば、ビードが細いため非常に省スペースで固定を行うことができる。また、レーザ溶接は、熱が影響する範囲を狭く保てるため、パワー半導体装置に用いられる樹脂部材への影響を小さく抑えることができる。 According to laser welding, since the bead is thin, it can be fixed in a very space-saving manner. Further, in laser welding, since the range affected by heat can be kept narrow, the influence on the resin member used in the power semiconductor device can be suppressed to be small.

しかし、ビードが細いことはすなわち、接合時に吸収できる公差(隙間)が狭いので、接合部分は予め精度よく突き当てた状態で組み立てられる必要がある。 However, since the bead is thin, that is, the tolerance (gap) that can be absorbed at the time of joining is narrow, it is necessary to assemble the joined portion in a state where it is accurately abutted in advance.

ところが、パワー半導体装置は、複数部品をはんだ等で接合して成るため、その表裏の放熱ベースの相対位置はある程度の公差を生じてしまう。具体的には、放熱ベースの位置がちょうど表裏にならず、面に平行方向にずれる面方向の公差と、パワー半導体装置の厚みが設計値からずれる厚さ方向の公差が発生する。 However, since a power semiconductor device is formed by joining a plurality of parts with solder or the like, the relative positions of the heat dissipation bases on the front and back sides have a certain tolerance. Specifically, the position of the heat dissipation base is not exactly on the front and back, and a tolerance in the surface direction that deviates in the direction parallel to the surface and a tolerance in the thickness direction in which the thickness of the power semiconductor device deviates from the design value occurs.

したがって、表裏の冷却流路の開口の構造が同じ場合、放熱ベースを開口に挿入するためには公差分だけ開口を大きく形成し、放熱ベースとの間に隙間を開けておく必要があり、また、厚さ方向にも公差分の隙間が開く。 Therefore, when the structure of the opening of the cooling flow path on the front and back is the same, in order to insert the heat dissipation base into the opening, it is necessary to form a large opening by the tolerance and leave a gap between the heat dissipation base and the heat dissipation base. , There is a gap in the tolerance in the thickness direction as well.

すると、先に述べたようにレーザ溶接では広い隙間を埋めることができないため、接合が困難になる。 Then, as described above, laser welding cannot fill a wide gap, which makes joining difficult.

上記のような背景に基づく本発明に係る本実施形態を説明する。 An embodiment of the present invention based on the above background will be described.

図1は、本実施形態に係るパワー半導体装置1の斜視図である。図2は、図1の平面Aの矢印方向から見たパワー半導体装置の断面図である。 FIG. 1 is a perspective view of the power semiconductor device 1 according to the present embodiment. FIG. 2 is a cross-sectional view of the power semiconductor device seen from the direction of the arrow in the plane A of FIG.

図1に示されるように、パワー半導体装置は、U相交流電流を出力するパワーモジュール1aと、V相交流電流を出力するパワーモジュール1bと、W相交流電流を出力するパワーモジュール1cと、により構成されるインバータ回路を有する。 パワーモジュール1aないし1cは、冷却流路形成体2aと冷却流路形成体2bにより挟まれる。 As shown in FIG. 1, a power semiconductor device includes a power module 1a that outputs a U-phase alternating current, a power module 1b that outputs a V-phase alternating current, and a power module 1c that outputs a W-phase alternating current. It has an inverter circuit that is configured. The power modules 1a to 1c are sandwiched between the cooling flow path forming body 2a and the cooling flow path forming body 2b.

図2に示されるように、冷却水は、冷却水入口パイプ3より流入し、冷却流路形成体2bを流れながらパワーモジュール1c、パワーモジュール1b、パワーモジュール1aの下側の放熱ベースを通過して冷却する。 As shown in FIG. 2, the cooling water flows in from the cooling water inlet pipe 3 and passes through the heat dissipation base under the power module 1c, the power module 1b, and the power module 1a while flowing through the cooling flow path forming body 2b. To cool.

その後、冷却水は中間パイプ5を通して冷却流路形成体2aに流れ込む。さらに冷却水は、冷却流路形成体2aを流れながらパワーモジュール1a、パワーモジュール1b、パワーモジュール1cの上側の放熱ベースを通過して冷却し、冷却水出口パイプ4より流出する。 After that, the cooling water flows into the cooling flow path forming body 2a through the intermediate pipe 5. Further, the cooling water flows through the cooling flow path forming body 2a, passes through the heat dissipation base on the upper side of the power module 1a, the power module 1b, and the power module 1c, cools, and flows out from the cooling water outlet pipe 4.

図3は、パワー半導体装置1の組み立て工程のうちパワーモジュール1aないし1cの配置を示す斜視図である。図4は、パワー半導体装置1の組み立て工程のうち流路本体部6a及び6bをパワーモジュール1aないし1cに組み付けた状態を示す斜視図である。図5は、パワー半導体装置1の組み立て工程における完成斜視図である。図6は、本実施形態に係る流路本体部6aの斜視図である。なお流路本体部6bは、流路本体部6aとは幅方向の長さが異なるがその他の構造は基本的に同じである。 FIG. 3 is a perspective view showing the arrangement of the power modules 1a to 1c in the assembly process of the power semiconductor device 1. FIG. 4 is a perspective view showing a state in which the flow path main bodies 6a and 6b are assembled to the power modules 1a to 1c in the assembly process of the power semiconductor device 1. FIG. 5 is a completed perspective view in the assembly process of the power semiconductor device 1. FIG. 6 is a perspective view of the flow path main body 6a according to the present embodiment. The flow path main body 6b has a different length in the width direction from the flow path main body 6a, but other structures are basically the same.

図6に示されるように、流路本体部6aは、パワーモジュール1aの挿入する開口部7aと、パワーモジュール1bの挿入する開口部7bと、パワーモジュール1cの挿入する開口部7cと、を形成する。 As shown in FIG. 6, the flow path main body 6a forms an opening 7a into which the power module 1a is inserted, an opening 7b into which the power module 1b is inserted, and an opening 7c into which the power module 1c is inserted. To do.

図4に示されるように、パワーモジュール1aないし1cは、流路本体部6a及び6bにより挟まれる。パワーモジュール1aないし1cのそれぞれの放熱ベースが、流路形成体6a及び6bのそれぞれの開口部7aないし7c内に配置される。 As shown in FIG. 4, the power modules 1a to 1c are sandwiched between the flow path main body portions 6a and 6b. The heat dissipation bases of the power modules 1a to 1c are arranged in the openings 7a to 7c of the flow path forming bodies 6a and 6b, respectively.

その後、開口部7aないし7cを形成する流路本体部6a及び6bの縁をそれぞれパワーモジュール1aないし1cの放熱ベースに溶接(例えばレーザー溶接)することによって、パワーモジュール1aないし1cと流路本体部6a及び6bが一体化される。 Then, by welding (for example, laser welding) the edges of the flow path main bodies 6a and 6b forming the openings 7a to 7c to the heat dissipation bases of the power modules 1a to 1c, respectively, the power modules 1a to 1c and the flow path main body are formed. 6a and 6b are integrated.

さらに図5に示されるように、流路蓋8a及び8bのそれぞれは、流路本体部6a及び6bのそれぞれに被せられ、流路蓋8a及び8bの縁が流路本体部6a及び6bに溶接される。 Further, as shown in FIG. 5, each of the flow path lids 8a and 8b is covered with the flow path body portions 6a and 6b, respectively, and the edges of the flow path lids 8a and 8b are welded to the flow path body portions 6a and 6b. Will be done.

図7は、本実施形態に係るパワーモジュール1aの断面図である。なお、パワーモジュール1b及び1cも、パワーモジュール1aと同様な構成及び機能である。 FIG. 7 is a cross-sectional view of the power module 1a according to the present embodiment. The power modules 1b and 1c also have the same configuration and functions as the power module 1a.

パワーモジュール1aは、複数のパワー半導体素子25と、複数のパワー半導体素子25を挟むとともに導電性機能と絶縁機能を有する基板9a及び9bと、基板9a及び9bを挟むとともに放熱機能を有する放熱ベース10a及び10bと、樹脂部材11と、により構成される。樹脂部材11は、複数のパワー半導体素子25、基板9a及び9bと、放熱ベース10a及び10bの一部を封止する。 The power module 1a includes a plurality of power semiconductor elements 25, substrates 9a and 9b that sandwich the plurality of power semiconductor elements 25 and have a conductive function and an insulating function, and a heat dissipation base 10a that sandwiches the substrates 9a and 9b and has a heat dissipation function. And 10b, and the resin member 11. The resin member 11 seals a plurality of power semiconductor elements 25, substrates 9a and 9b, and a part of heat dissipation bases 10a and 10b.

図8は、パワーモジュール1aの製造交差を説明するための断面図である。 FIG. 8 is a cross-sectional view for explaining the manufacturing intersection of the power module 1a.

放熱ベース10aの寸法Aは、型で成形するため、比較的精度よく製造できる。この寸法Aは、比較的小さな公差で流路本体部6aの開口部7aないし7cと一致させられるため、放熱ベース10aの側面は開口部7aないし7cの内側面とほぼ突き当ての状態で組み立てることができる。 Since the dimension A of the heat dissipation base 10a is molded by a mold, it can be manufactured with relatively high accuracy. Since this dimension A can be matched with the openings 7a to 7c of the flow path main body 6a with a relatively small tolerance, the side surface of the heat dissipation base 10a is assembled so as to be substantially abutted against the inner surface of the openings 7a to 7c. Can be done.

この状態を図9、図12及び図13にて説明する。図9及び図11は、流路本体部6aの開口部7a周辺の拡大断面図である。図12は、流路本体部6bの開口部7a周辺の拡大断面図である。 This state will be described with reference to FIGS. 9, 12 and 13. 9 and 11 are enlarged cross-sectional views around the opening 7a of the flow path main body 6a. FIG. 12 is an enlarged cross-sectional view of the periphery of the opening 7a of the flow path main body 6b.

図9及び図11に示されるように、放熱ベース10aの側面12は、開口部7aを形成する内側面と突き当て状態とすることができる。 As shown in FIGS. 9 and 11, the side surface 12 of the heat radiating base 10a can be in contact with the inner side surface forming the opening 7a.

このとき、図8に示された寸法Bと寸法Cは、パワー半導体素子25や基板9a等の複数の部材を接合した結果として、ある程度の公差を生じる。 At this time, the dimensions B and C shown in FIG. 8 have some tolerance as a result of joining a plurality of members such as the power semiconductor element 25 and the substrate 9a.

そこで、図9に示される放熱ベース10aの主面26と流路本体部6aの外面27との間に隙間13を設けることによって、寸法Bの公差を吸収する。 Therefore, the tolerance of dimension B is absorbed by providing a gap 13 between the main surface 26 of the heat dissipation base 10a shown in FIG. 9 and the outer surface 27 of the flow path main body 6a.

また、放熱ベース10bの主面と流路本体部6bの外面とは接触部14のように突き当て構造とする。その代わりに、放熱ベース10bの側面と流路本体部6bの開口部7aとの間は隙間15を開けることによって寸法Cの公差を吸収する。 Further, the main surface of the heat dissipation base 10b and the outer surface of the flow path main body 6b have a contact structure like the contact portion 14. Instead, a tolerance of dimension C is absorbed by opening a gap 15 between the side surface of the heat dissipation base 10b and the opening 7a of the flow path main body 6b.

これをレーザ光線16aおよび16bで溶接することによって、冷却流路一体型のパワー半導体装置1を組み立てることができる。 By welding this with the laser beams 16a and 16b, the power semiconductor device 1 integrated with the cooling flow path can be assembled.

なお、流路本体部6bの開口部7aの縁は、図12の拡大図に示すように、放熱ベース10bに近づく方向に薄くなるように斜めにカットすることによって、溶接のためのレーザ光線16bを真下から当てることができる。 As shown in the enlarged view of FIG. 12, the edge of the opening 7a of the flow path main body 6b is cut diagonally so as to be thinner in the direction closer to the heat dissipation base 10b, so that the laser beam 16b for welding is formed. Can be hit from directly below.

図10は、溶接工程後の状態を示すパワー半導体装置1の断面図である。図10に示されるような位置に溶接ビード17a及び17bを設けることができるため、非常に省スペースでの接合ができるため、パワー半導体装置を小型化することができる。 FIG. 10 is a cross-sectional view of the power semiconductor device 1 showing a state after the welding process. Since the welding beads 17a and 17b can be provided at the positions shown in FIG. 10, the bonding can be performed in a very space-saving manner, so that the power semiconductor device can be miniaturized.

また、この際、パワーモジュール1aは既に樹脂部材11によってモールドされているが、レーザ溶接で接合することで熱影響領域を狭く保つことができるため、溶接に伴って樹脂部材11に損傷を与えることを防止できる。溶接ビード17aは、放熱ベース10aの厚さ方向に樹脂部材11からの距離をとっており、溶接ビード17bは水平方向に樹脂部材11から距離を離すことによって熱の影響を避けることができる。 Further, at this time, although the power module 1a is already molded by the resin member 11, the heat-affected zone can be kept narrow by joining by laser welding, so that the resin member 11 is damaged by welding. Can be prevented. The welding bead 17a takes a distance from the resin member 11 in the thickness direction of the heat dissipation base 10a, and the welding bead 17b can avoid the influence of heat by keeping a distance from the resin member 11 in the horizontal direction.

1…パワー半導体装置、1a〜1c…パワーモジュール、2a及び2b…冷却流路形成体、3…冷却水入口パイプ、4…冷却水出口パイプ、5…中間パイプ、6a及び6b…流路本体部、7aないし7c…開口部、8a及び8b…流路蓋、9a及び9b…基板、10a及び10b…放熱ベース、11…樹脂部材、12…放熱ベース10aの側面、13…隙間、14…接触部、15…隙間、16a及び16b…レーザ光線、17a及び17b…溶接ビード、25…パワー半導体素子、26…放熱ベース10aの主面、27…流路本体部6aの外面 1 ... Power semiconductor device, 1a to 1c ... Power module, 2a and 2b ... Cooling flow path forming body, 3 ... Cooling water inlet pipe, 4 ... Cooling water outlet pipe, 5 ... Intermediate pipe, 6a and 6b ... Flow path main body , 7a to 7c ... openings, 8a and 8b ... flow path lids, 9a and 9b ... substrates, 10a and 10b ... heat dissipation bases, 11 ... resin members, 12 ... side surfaces of heat dissipation bases 10a, 13 ... gaps, 14 ... contacts , 15 ... Gap, 16a and 16b ... Laser beam, 17a and 17b ... Welded bead, 25 ... Power semiconductor element, 26 ... Main surface of heat dissipation base 10a, 27 ... Outer surface of flow path main body 6a

Claims (3)

パワー半導体素子を有し当該パワー半導体素子を樹脂部材で封止する回路体と、
前記回路体を挟む第1放熱ベース及び第2放熱ベースと、
前記回路体を挟んで対向しておりかつ冷媒を流す流路を形成する第1流路形成体及び第2流路形成体と、を備え、
前記第1流路形成体は、前記第1放熱ベースに塞がれる第1開口を形成し、
前記第2流路形成体は、前記第2放熱ベースに塞がれる第2開口を形成し、
前記第1放熱ベース及び前記第2放熱ベースのそれぞれは、主面と、側面と、により形成され、
前記第1放熱ベースの前記側面の一部が、前記第1開口の開口空間を形成する前記第1流路形成体の内側面と対向し、
前記第2放熱ベースの前記主面の一部が、前記第2開口の周辺を形成する前記第2流路形成体の外面と対向し、
互いに対向する前記第1放熱ベースの前記側面の一部と前記第1流路形成体の内側面とが接合され、
互いに対向する前記第2放熱ベースの前記主面の一部と前記第2流路形成体の外面とが接合されるパワー半導体装置。
A circuit body having a power semiconductor element and sealing the power semiconductor element with a resin member,
The first heat dissipation base and the second heat dissipation base that sandwich the circuit body,
A first flow path forming body and a second flow path forming body that face each other across the circuit body and form a flow path through which a refrigerant flows are provided.
The first flow path forming body forms a first opening to be closed by the first heat dissipation base.
The second flow path forming body forms a second opening to be closed by the second heat dissipation base.
Each of the first heat dissipation base and the second heat dissipation base is formed by a main surface and a side surface.
A part of the side surface of the first heat dissipation base faces the inner side surface of the first flow path forming body forming the opening space of the first opening.
A part of the main surface of the second heat dissipation base faces the outer surface of the second flow path forming body forming the periphery of the second opening.
A part of the side surface of the first heat dissipation base facing each other and the inner side surface of the first flow path forming body are joined to each other.
A power semiconductor device in which a part of the main surface of the second heat dissipation base facing each other and an outer surface of the second flow path forming body are joined.
請求項1に記載のパワー半導体装置において、
前記第1放熱ベースと前記第1流路形成体の接合部には金属溶融部が形成され、
前記第2放熱ベースと前記第2流路形成体の接合部には金属溶融部が形成されるパワー半導体装置。
In the power semiconductor device according to claim 1,
A metal melting portion is formed at the joint portion between the first heat dissipation base and the first flow path forming body.
A power semiconductor device in which a metal melting portion is formed at a joint portion between the second heat dissipation base and the second flow path forming body.
請求項1または2に記載のパワー半導体装置において、
前記第2流路形成体は、前記第2開口部の縁が前記第2放熱ベースに向う方向に沿って薄くなるように形成されるパワー半導体装置。
In the power semiconductor device according to claim 1 or 2.
The second flow path forming body is a power semiconductor device formed so that the edge of the second opening becomes thinner along the direction toward the second heat dissipation base.
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