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JP6854638B2 - Manufacturing methods for optics, exposure equipment, and articles - Google Patents
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JP6854638B2 - Manufacturing methods for optics, exposure equipment, and articles - Google Patents

Manufacturing methods for optics, exposure equipment, and articles Download PDF

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JP6854638B2
JP6854638B2 JP2016248395A JP2016248395A JP6854638B2 JP 6854638 B2 JP6854638 B2 JP 6854638B2 JP 2016248395 A JP2016248395 A JP 2016248395A JP 2016248395 A JP2016248395 A JP 2016248395A JP 6854638 B2 JP6854638 B2 JP 6854638B2
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mirror
magnet
optical device
actuator
area
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JP2018101112A5 (en
JP2018101112A (en
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春見　和之
和之 春見
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Canon Inc
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Canon Inc
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Priority to JP2016248395A priority Critical patent/JP6854638B2/en
Priority to KR1020170169969A priority patent/KR102266120B1/en
Priority to CN201711361028.8A priority patent/CN108227401B/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Optical Elements Other Than Lenses (AREA)

Description

本発明は、ミラーを変形させる光学装置、それを用いた露光装置、および物品の製造方法に関する。 The present invention relates to an optical device that deforms a mirror, an exposure device using the optical device, and a method for manufacturing an article.

半導体デバイスなどの製造に用いられる露光装置では、解像度を向上させるため、投影光学系に設けられたミラーを変形させて、投影光学系の光学収差を補正することが好ましい。また、望遠鏡においても、大気の揺らぎなどに起因した光学収差が生じるため、望遠鏡に設けられたミラーを変形させて光学収差を補正することが好ましい。特許文献１には、アクチュエータを用いてミラーを変形させる光学装置が提案されている。 In an exposure apparatus used for manufacturing a semiconductor device or the like, in order to improve the resolution, it is preferable to deform the mirror provided in the projection optical system to correct the optical aberration of the projection optical system. In addition, since optical aberrations occur in the telescope due to fluctuations in the atmosphere and the like, it is preferable to deform the mirror provided in the telescope to correct the optical aberrations. Patent Document 1 proposes an optical device that deforms a mirror by using an actuator.

特開２０１０−１０７６５８号公報JP-A-2010-107658

光学装置では、互いに対向するコイルと磁石とを有するボイスコイルモータ（ＶＣＭ）などのアクチュエータを用いることが好ましい。このようなアクチュエータではヒステリシスが起こりにくいため、磁石をミラーに接合し、コイルの電流を制御することにより、コイルの電流値に応じてミラーの形状を容易に制御することができる。しかしながら、コイルは、電流の供給によって発熱するため、その熱が磁石に伝わると、磁石が変形し、磁石が取り付けられたミラーの箇所において局所的な変形が生じうる。 In the optical device, it is preferable to use an actuator such as a voice coil motor (VCM) having coils and magnets facing each other. Since hysteresis is unlikely to occur in such an actuator, the shape of the mirror can be easily controlled according to the current value of the coil by joining a magnet to the mirror and controlling the current of the coil. However, since the coil generates heat due to the supply of an electric current, when the heat is transferred to the magnet, the magnet is deformed, and local deformation may occur at the position of the mirror to which the magnet is attached.

そこで、本発明は、アクチュエータのコイルの熱に起因するミラーの変形を低減するために有利な光学装置を提供することを目的とする。 Therefore, an object of the present invention is to provide an optical device that is advantageous for reducing deformation of the mirror due to heat of the coil of the actuator.

上記目的を達成するために、本発明の一側面としての光学装置は、ミラーを変形させる光学装置であって、前記ミラーに力を加えるアクチュエータを含み、前記アクチュエータは、互いに対向して配置された磁石とコイルとを有し、前記磁石は、部材を介して前記ミラーによって支持され、前記磁石と接合している前記部材の接合面の面積は、前記磁石の前記部材側の面の面積より小さく、前記部材は、前記ミラーを構成する材質と同じ材質によって構成されている、ことを特徴とする。 In order to achieve the above object, the optical device as one aspect of the present invention is an optical device that deforms a mirror and includes an actuator that applies a force to the mirror, and the actuators are arranged so as to face each other. It has a magnet and a coil, the magnet is supported by the mirror via a member, and the area of the joint surface of the member joined to the magnet is smaller than the area of the surface of the magnet on the member side. The member is made of the same material as the material constituting the mirror .

本発明の更なる目的又はその他の側面は、以下、添付図面を参照して説明される好ましい実施形態によって明らかにされるであろう。 Further objects or other aspects of the invention will be manifested in the preferred embodiments described below with reference to the accompanying drawings.

本発明によれば、例えば、アクチュエータのコイルの熱に起因するミラーの変形を低減するために有利な光学装置を提供することができる。 According to the present invention, for example, it is possible to provide an optical device that is advantageous for reducing deformation of the mirror due to heat of the coil of the actuator.

第１実施形態の光学装置の構成を示す概略図である。It is the schematic which shows the structure of the optical apparatus of 1st Embodiment. 磁石の変形によるミラーの局所的な変形を説明するための図である。It is a figure for demonstrating the local deformation of a mirror by the deformation of a magnet. 実施例１に係る部材の構成を示す図である。It is a figure which shows the structure of the member which concerns on Example 1. FIG. 実施例２に係る部材の構成を示す図である。It is a figure which shows the structure of the member which concerns on Example 2. FIG. 実施例３に係る部材の構成を示す図である。It is a figure which shows the structure of the member which concerns on Example 3. FIG. 実施例４に係る部材の構成を示す図である。It is a figure which shows the structure of the member which concerns on Example 4. FIG. 第２実施形態の光学装置の構成を示す概略図である。It is the schematic which shows the structure of the optical apparatus of 2nd Embodiment. 光学装置の変形例を示す図である。It is a figure which shows the modification of the optical apparatus. 露光装置を示す図である。It is a figure which shows the exposure apparatus.

以下、添付図面を参照して、本発明の好適な実施の形態について説明する。なお、各図において、同一の部材ないし要素については同一の参照番号を付し、重複する説明は省略する。 Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. In each figure, the same member or element is given the same reference number, and duplicate description is omitted.

＜第１実施形態＞
本発明に係る第１実施形態の光学装置１０について、図１を参照しながら説明する。図１は、第１実施形態の光学装置１０の構成を示す概略図である。光学装置１０は、ミラー１を変形させる装置であり、例えば、ベース定盤２と、ミラー１を支持する支持部材３と、ミラー１に力を加える複数のアクチュエータ４と、制御部５とを含みうる。制御部５は、例えばＣＰＵやメモリなどを有するコンピュータを含み、複数のアクチュエータ４の各々を制御する。ここで、本実施形態の光学装置１０は、例えば、露光装置の投影光学系に含まれるミラーを変形させて、投影光学系の光学収差や、投影像の倍率、歪み、フォーカスなどを補正するために用いられうる。しかしながら、それに限られるものではなく、例えば、望遠鏡に含まれるミラーを変形させて、当該望遠鏡の光学収差を補正するために用いられてもよい。また、本実施形態の光学装置１０は、例えばヤング率が５０ＭＰａ程度のミラー１を変形させるように構成されうる。 <First Embodiment>
The optical device 10 of the first embodiment according to the present invention will be described with reference to FIG. FIG. 1 is a schematic view showing the configuration of the optical device 10 of the first embodiment. The optical device 10 is a device that deforms the mirror 1, and includes, for example, a base surface plate 2, a support member 3 that supports the mirror 1, a plurality of actuators 4 that apply a force to the mirror 1, and a control unit 5. sell. The control unit 5 includes, for example, a computer having a CPU, a memory, or the like, and controls each of the plurality of actuators 4. Here, the optical device 10 of the present embodiment deforms, for example, a mirror included in the projection optical system of the exposure device to correct the optical aberration of the projection optical system, the magnification, distortion, focus, and the like of the projected image. Can be used for. However, the present invention is not limited to this, and for example, the mirror included in the telescope may be deformed and used to correct the optical aberration of the telescope. Further, the optical device 10 of the present embodiment can be configured to deform, for example, a mirror 1 having a Young's modulus of about 50 MPa.

ミラー１は、光を反射する反射面１ａと、反射面１ａの反対側の面である裏面１ｂとを有し、ベース定盤２に固定された支持部材３によって支持されている。即ち、ミラー１は、支持部材３を介してベース定盤２によって支持されていると言うこともできる。ここで、本実施形態（図１）では、ミラー１の中心を含むミラー１の一部（以下、中心部）が支持部材３によって支持されている。しかしながら、これに限られるものではなく、ミラー１の中心部以外の部分が支持部材３によって支持されてもよい。また、本実施形態のミラー１は、平行平板の形状を有するが、その形状に限定されるものではなく、凹形状または凸形状を有してもよい。 The mirror 1 has a reflecting surface 1a that reflects light and a back surface 1b that is a surface opposite to the reflecting surface 1a, and is supported by a support member 3 fixed to a base surface plate 2. That is, it can be said that the mirror 1 is supported by the base surface plate 2 via the support member 3. Here, in the present embodiment (FIG. 1), a part of the mirror 1 (hereinafter, the central portion) including the center of the mirror 1 is supported by the support member 3. However, the present invention is not limited to this, and a portion other than the central portion of the mirror 1 may be supported by the support member 3. Further, the mirror 1 of the present embodiment has the shape of a parallel flat plate, but is not limited to that shape, and may have a concave shape or a convex shape.

複数のアクチュエータ４は、ミラー１とベース定盤２との間に配置され、ミラー１の裏面１ｂに力を加えてミラー１を変形させる。複数のアクチュエータ４はそれぞれ、互いに対向して配置された磁石４ａ（可動子）とコイル４ｂ（固定子）とを有し、コイル４ｂに電流を供給して磁石４ａとコイル４ｂとの間にローレンツ力や電磁力を発生させることによりミラー１の裏面１ｂに力を加える。磁石４ａおよびコイル４ｂは、磁石４ａとコイル４ｂとの間に例えば０．１ｍｍ程度の隙間が形成されるように、ミラー１の裏面１ｂに力を加える方向（Ｚ方向）に離隔して配置されうる。各アクチュエータ４としては、例えばボイスコイルモータ（以下、ＶＣＭ）が用いられうる。このように磁石４ａとコイル４ｂとを有するＶＣＭなどのアクチュエータではヒステリシスが起こりにくいため、アクチュエータ４におけるコイル４ｂの電流値を制御することにより、当該電流値に応じてミラー１の形状を容易に制御することができる。 The plurality of actuators 4 are arranged between the mirror 1 and the base surface plate 2, and apply a force to the back surface 1b of the mirror 1 to deform the mirror 1. Each of the plurality of actuators 4 has a magnet 4a (movable element) and a coil 4b (stator) arranged so as to face each other, and supplies a current to the coil 4b to Lorentz between the magnet 4a and the coil 4b. A force is applied to the back surface 1b of the mirror 1 by generating a force or an electromagnetic force. The magnet 4a and the coil 4b are arranged apart from each other in the direction (Z direction) in which a force is applied to the back surface 1b of the mirror 1 so that a gap of, for example, about 0.1 mm is formed between the magnet 4a and the coil 4b. sell. As each actuator 4, for example, a voice coil motor (hereinafter, VCM) can be used. Since hysteresis is unlikely to occur in an actuator such as a VCM having a magnet 4a and a coil 4b, the shape of the mirror 1 can be easily controlled according to the current value by controlling the current value of the coil 4b in the actuator 4. can do.

ここで、本実施形態の光学装置１０では、磁石４ａがミラー１によって支持され、コイル４ｂがベース定盤２によって支持されている。磁石４ａがベース定盤２によって支持され、コイル４ｂがミラー１によって支持されていてもよいが、コイル４ｂがミラー１によって支持される構成では、コイル４ｂに電流を流すための配線をミラー１に形成する必要があり、構成が複雑化しうる。そのため、図１に示すように、コイル４ｂがベース定盤２によって支持されていることが好ましい。また、アクチュエータ４では、可能な限りコイル４ｂの電流値を小さくするため、可能な限り大きな磁束密度を有する磁石４ａが用いられることが好ましい。アクチュエータ４の磁石４ａとしては、例えばネオジム磁石が用いられうる。 Here, in the optical device 10 of the present embodiment, the magnet 4a is supported by the mirror 1 and the coil 4b is supported by the base surface plate 2. The magnet 4a may be supported by the base platen 2 and the coil 4b may be supported by the mirror 1, but in a configuration in which the coil 4b is supported by the mirror 1, the wiring for passing a current through the coil 4b is provided in the mirror 1. It needs to be formed and the configuration can be complicated. Therefore, as shown in FIG. 1, it is preferable that the coil 4b is supported by the base surface plate 2. Further, in the actuator 4, in order to reduce the current value of the coil 4b as much as possible, it is preferable to use a magnet 4a having a magnetic flux density as large as possible. As the magnet 4a of the actuator 4, for example, a neodymium magnet can be used.

制御部５は、ミラー１の形状が目標形状になるように、アクチュエータ４のコイル４ｂの電流値を制御する。例えば、制御部５は、コイル４ｂの電流を調整する（増減させる）電流アンプ５ａを有し、アクチュエータ４に推力を発生させてミラー１の形状が目標形状になるように、電流アンプ５ａによってコイル４ｂの電流値をフィードフォワード制御する。ここで、本実施形態の光学装置１０では、アクチュエータ４のコイル４ｂの電流値をフィードフォワード制御するように構成されているが、それに限られるものではない。例えば、ミラー１の形状（または、ミラー１とベース定盤２との間の距離）を計測する計測部を設け、計測部の計測結果に基づいてコイル４ｂの電流値をフィードバック制御するように構成されてもよい。また、図１では、２つのコイル４ｂにのみが電流アンプ５ａ（制御部５）に接続されているが、これは図を簡略化しているだけであり、実際には、全てのコイル４ｂが電流アンプ５ａに接続されうる。 The control unit 5 controls the current value of the coil 4b of the actuator 4 so that the shape of the mirror 1 becomes the target shape. For example, the control unit 5 has a current amplifier 5a that adjusts (increases or decreases) the current of the coil 4b, and is coiled by the current amplifier 5a so that the actuator 4 generates a thrust and the shape of the mirror 1 becomes the target shape. The current value of 4b is feed-forward controlled. Here, the optical device 10 of the present embodiment is configured to feedforward control the current value of the coil 4b of the actuator 4, but is not limited thereto. For example, a measuring unit for measuring the shape of the mirror 1 (or the distance between the mirror 1 and the base surface plate 2) is provided, and the current value of the coil 4b is feedback-controlled based on the measurement result of the measuring unit. May be done. Further, in FIG. 1, only two coils 4b are connected to the current amplifier 5a (control unit 5), but this is only a simplification of the figure, and in reality, all the coils 4b are currents. It can be connected to the amplifier 5a.

このような光学装置では、アクチュエータ４のコイル４ｂが電流の供給によって発熱するため、その熱が磁石４ａに伝わると、磁石４ａが変形し、ミラー１に（意図しない）局所的な変形が生じうる。例えば、光学装置１０を露光装置に用いる場合、露光光の照射によってミラー１が熱変形することを低減するため、ミラー１は、線膨張係数が小さい材質（例えば１ｐｐｍ／℃以下）によって構成されることが好ましい。その一方で、アクチュエータ４の磁石４ａとしては、前述のとおりネオジム磁石が用いられることが好ましく、ネオジム磁石の線膨張係数は、１０ｐｐｍ／℃程度である。このように線膨張係数が互いに異なるミラー１と磁石４ａとを用い、それらを図２（ａ）に示すように直接接合させる場合を想定する。この場合、コイル４ｂで発生した熱が磁石４ａに伝わり磁石４ａが変形すると、ミラー１と磁石４ａとの線膨張係数の違いに起因するバイメタル効果により、図２（ｂ）に示すように、磁石４ａが接合されたミラー１の箇所で局所的な変形が生じうる。したがって、光学装置１０では、磁石４ａの変形に起因するミラー１の局所的な変形が低減されるように、磁石４ａがミラー１によって支持されていることが好ましい。 In such an optical device, the coil 4b of the actuator 4 generates heat due to the supply of an electric current, and when the heat is transferred to the magnet 4a, the magnet 4a is deformed and the mirror 1 may be (unintended) locally deformed. .. For example, when the optical device 10 is used as an exposure device, the mirror 1 is made of a material having a small coefficient of linear expansion (for example, 1 ppm / ° C. or less) in order to reduce thermal deformation of the mirror 1 due to irradiation of exposure light. Is preferable. On the other hand, as the magnet 4a of the actuator 4, a neodymium magnet is preferably used as described above, and the linear expansion coefficient of the neodymium magnet is about 10 ppm / ° C. As described above, it is assumed that the mirror 1 and the magnet 4a having different linear expansion coefficients are used and they are directly joined as shown in FIG. 2 (a). In this case, when the heat generated by the coil 4b is transferred to the magnet 4a and the magnet 4a is deformed, the magnet is as shown in FIG. 2 (b) due to the bimetal effect caused by the difference in the coefficient of linear expansion between the mirror 1 and the magnet 4a. Local deformation can occur at the location of the mirror 1 to which the 4a is joined. Therefore, in the optical device 10, it is preferable that the magnet 4a is supported by the mirror 1 so that the local deformation of the mirror 1 due to the deformation of the magnet 4a is reduced.

そこで、本実施形態の光学装置１０では、図１に示すように、アクチュエータ４の磁石４ａが部材６を介してミラー１によって支持（固定）されている。そして、当該部材６は、ミラー１との接触面（ミラー１と接触する当該部材６の面）に平行な断面の面積が、当該接触面に平行な磁石４ａの断面の面積より小さい部分を含むように構成される。例えば、当該部材６は、ミラー１との接触面に平行な断面の面積が、磁石４ａをミラー１の裏面１ｂに投影したときの投影領域の面積より小さい部分を含むように構成されうる。このように構成された部材６を介して磁石４ａがミラー１によって支持されることにより、磁石４ａの変形がミラー１に伝わりミラー１に局所的な変形が生じること（即ち、磁石４ａの変形に起因したミラー１の変形）を低減させることができる。ここで、本実施形態において、ミラー１との接触面に平行な断面はＸＹ断面のことであり、以下では、ミラー１との接触面に平行な断面のことを、単に「断面」と称することがある。 Therefore, in the optical device 10 of the present embodiment, as shown in FIG. 1, the magnet 4a of the actuator 4 is supported (fixed) by the mirror 1 via the member 6. The member 6 includes a portion whose cross-sectional area parallel to the contact surface with the mirror 1 (the surface of the member 6 in contact with the mirror 1) is smaller than the cross-sectional area of the magnet 4a parallel to the contact surface. It is configured as follows. For example, the member 6 may be configured such that the area of the cross section parallel to the contact surface with the mirror 1 is smaller than the area of the projected area when the magnet 4a is projected onto the back surface 1b of the mirror 1. When the magnet 4a is supported by the mirror 1 via the member 6 configured in this way, the deformation of the magnet 4a is transmitted to the mirror 1 and the mirror 1 is locally deformed (that is, the deformation of the magnet 4a occurs. The resulting deformation of the mirror 1) can be reduced. Here, in the present embodiment, the cross section parallel to the contact surface with the mirror 1 is the XY cross section, and hereinafter, the cross section parallel to the contact surface with the mirror 1 is simply referred to as "cross section". There is.

部材６は、ミラー１と磁石４ａとの間に配置され、ミラー１および磁石４ａにそれぞれ接合される。「接合」とは、「接着」および「溶着」を含みうる。例えば、本実施形態におけるミラー１と部材６とは、ミラー１と部材６との間に接着剤（結合部材）を介在させて接着（結合）されてもよいし、溶着されてもよい。同様に、本実施形態における磁石４ａと部材６とは、磁石４ａと部材６との間に接着剤（結合部材）を介在させて接着（結合）されてもよいし、溶着されてもよい。ミラー１と部材６とを接着させる接着剤、および磁石４ａと部材６とを接着させる接着剤としては、例えば、ヤング率が５ＭＰａ程度の接着剤が用いられうる。それらの接着剤の厚さは、部材６の厚さよりも薄いことが好ましく、部材６の厚さの１／５以下であるとよく、部材６の厚さの１／１０以下であると更によい。 The member 6 is arranged between the mirror 1 and the magnet 4a, and is joined to the mirror 1 and the magnet 4a, respectively. "Joining" can include "adhesion" and "welding". For example, the mirror 1 and the member 6 in the present embodiment may be bonded (bonded) or welded with an adhesive (bonding member) interposed between the mirror 1 and the member 6. Similarly, the magnet 4a and the member 6 in the present embodiment may be bonded (bonded) or welded with an adhesive (bonding member) interposed between the magnet 4a and the member 6. As the adhesive for adhering the mirror 1 and the member 6 and the adhesive for adhering the magnet 4a and the member 6, for example, an adhesive having a Young ratio of about 5 MPa can be used. The thickness of these adhesives is preferably thinner than the thickness of the member 6, preferably 1/5 or less of the thickness of the member 6, and even more preferably 1/10 or less of the thickness of the member 6. ..

また、部材６は、ミラー１と部材６との線膨張係数の差が、ミラー１と磁石４ａとの線膨張係数の差より小さくなる材質によって構成されることが好ましい。即ち、部材６の線膨張係数が、ミラー１の線膨張係数と磁石４ａの線膨張係数との間の値（例えば、磁石４ａの線膨張係数の１／５以下）であるとよい。より好ましくは、ミラー１を構成する材質と同じ材質によって部材６が構成されるとよい。これにより、磁石４ａの変形に起因するミラー１の変形を低減させる効果をより向上させることができる。 Further, the member 6 is preferably made of a material in which the difference in the coefficient of linear expansion between the mirror 1 and the member 6 is smaller than the difference in the coefficient of linear expansion between the mirror 1 and the magnet 4a. That is, the coefficient of linear expansion of the member 6 may be a value between the coefficient of linear expansion of the mirror 1 and the coefficient of linear expansion of the magnet 4a (for example, 1/5 or less of the coefficient of linear expansion of the magnet 4a). More preferably, the member 6 is made of the same material as that of the mirror 1. Thereby, the effect of reducing the deformation of the mirror 1 due to the deformation of the magnet 4a can be further improved.

ここで、本実施形態の磁石４ａは、円柱形状を有するが、それに限られるものではなく、円柱形状とは異なる形状を有していてもよい。この場合、部材６は、断面の面積が磁石４ａの断面の最小面積より小さい部分を含むように構成されることが好ましい。また、部材６の当該部分における断面の面積が、磁石４ａの断面の面積（例えば最小面積）の１／４以下であると、磁石４ａの変形に起因するミラー１の変形を低減させる効果をより向上させることができる。 Here, the magnet 4a of the present embodiment has a cylindrical shape, but is not limited to the cylindrical shape, and may have a shape different from the cylindrical shape. In this case, the member 6 is preferably configured so that the cross-sectional area includes a portion smaller than the minimum cross-sectional area of the magnet 4a. Further, when the cross-sectional area of the member 6 in the portion is 1/4 or less of the cross-sectional area (for example, the minimum area) of the magnet 4a, the effect of reducing the deformation of the mirror 1 due to the deformation of the magnet 4a is further increased. Can be improved.

以下に、本実施形態に係る部材６の構成例（実施例）について説明する。 Hereinafter, a configuration example (example) of the member 6 according to the present embodiment will be described.

［実施例１］
図３は、実施例１に係る部材６の構成を示す図である。図３（ａ）は、ミラー１、部材６および磁石４ａの構成を示すＸＺ断面図であり、図３（ｂ）は、コイル４ｂの発熱により磁石４ａが変形した状態を示す図である。実施例１に係る部材６は、円柱形状を有しており、図３（ａ）に示すように、部材６の断面の面積は、部材６の全体にわたって、磁石４ａの断面の面積より小さい。即ち、実施例１に係る部材６では、当該部材６の全体が、断面の面積が磁石４ａの断面の面積より小さい部分に対応しうる。このように構成された部材６を介して磁石４ａをミラー１に支持させることで、図３（ｂ）に示すように、磁石４ａの変形がミラー１に伝わることを部材６によって緩和させることができる。そのため、磁石４ａをミラー１に直接接合した場合に比べて、ミラー１の局所的な変形を低減させることができる。 [Example 1]
FIG. 3 is a diagram showing the configuration of the member 6 according to the first embodiment. FIG. 3A is an XZ cross-sectional view showing the configurations of the mirror 1, the member 6, and the magnet 4a, and FIG. 3B is a diagram showing a state in which the magnet 4a is deformed by the heat generated by the coil 4b. The member 6 according to the first embodiment has a cylindrical shape, and as shown in FIG. 3A, the cross-sectional area of the member 6 is smaller than the cross-sectional area of the magnet 4a over the entire member 6. That is, in the member 6 according to the first embodiment, the entire member 6 can correspond to a portion whose cross-sectional area is smaller than the cross-sectional area of the magnet 4a. By supporting the magnet 4a on the mirror 1 via the member 6 configured in this way, as shown in FIG. 3B, the member 6 can alleviate the deformation of the magnet 4a being transmitted to the mirror 1. it can. Therefore, the local deformation of the mirror 1 can be reduced as compared with the case where the magnet 4a is directly bonded to the mirror 1.

［実施例２］
図４は、実施例２に係る部材６の構成を示す図である。図４（ａ）は、ミラー１、部材６および磁石４ａの構成を示すＸＺ断面図であり、図４（ｂ）は、部材６および磁石４ａの構成を示す斜視図である。実施例２に係る部材６は、磁石４ａに接合される第１接合面６ａと、ミラー１に接合される第２接合面６ｂとを有し、第１接合面６ａが第２接合面６ｂより小さいテーパ形状を有する。即ち、実施例２に係る部材６では、第１接合面６ａを含む部分６ｃ（第１接合面６ａとその付近とを含む部分）が、断面の面積が磁石４ａの断面の面積より小さい部分に対応しうる。このように構成された部材６を介して磁石４ａをミラー１に支持させることで、磁石４ａの変形がミラー１に伝わることを部材６によって緩和させることができる。そのため、磁石４ａをミラー１に直接接合した場合に比べて、ミラー１の局所的な変形を低減させることができる。 [Example 2]
FIG. 4 is a diagram showing the configuration of the member 6 according to the second embodiment. FIG. 4A is an XZ cross-sectional view showing the configurations of the mirror 1, the member 6 and the magnet 4a, and FIG. 4B is a perspective view showing the configurations of the member 6 and the magnet 4a. The member 6 according to the second embodiment has a first joint surface 6a joined to the magnet 4a and a second joint surface 6b to be joined to the mirror 1, and the first joint surface 6a is formed from the second joint surface 6b. It has a small tapered shape. That is, in the member 6 according to the second embodiment, the portion 6c including the first joint surface 6a (the portion including the first joint surface 6a and its vicinity) has a cross-sectional area smaller than the cross-sectional area of the magnet 4a. It can be handled. By supporting the magnet 4a on the mirror 1 via the member 6 configured in this way, the member 6 can alleviate the deformation of the magnet 4a from being transmitted to the mirror 1. Therefore, the local deformation of the mirror 1 can be reduced as compared with the case where the magnet 4a is directly bonded to the mirror 1.

［実施例３］
図５は、実施例３に係る部材６の構成を示す図である。図５（ａ）は、ミラー１、部材６および磁石４ａの構成を示すＸＺ断面図であり、図５（ｂ）は、部材６および磁石４ａの構成を示す斜視図である。実施例３に係る部材６は、磁石４ａに接合される第１接合面６ａと、ミラー１に接合される第２接合面６ｂとを有し、第１接合面６ａが第２接合面６ｂより大きいテーパ形状を有する。即ち、実施例３に係る部材６では、第２接合面６ｂを含む部分６ｄ（第２接合面６ｂとその付近とを含む部分）が、断面の面積が磁石４ａの断面の面積より小さい部分に対応しうる。このように構成された部材６を介して磁石４ａをミラー１に支持させることで、磁石４ａの変形がミラー１に伝わることを部材６によって緩和させることができる。そのため、磁石４ａをミラー１に直接接合した場合に比べて、ミラー１の局所的な変形を低減させることができる。 [Example 3]
FIG. 5 is a diagram showing the configuration of the member 6 according to the third embodiment. FIG. 5A is an XZ cross-sectional view showing the configurations of the mirror 1, the member 6 and the magnet 4a, and FIG. 5B is a perspective view showing the configurations of the member 6 and the magnet 4a. The member 6 according to the third embodiment has a first joint surface 6a joined to the magnet 4a and a second joint surface 6b to be joined to the mirror 1, and the first joint surface 6a is formed from the second joint surface 6b. It has a large tapered shape. That is, in the member 6 according to the third embodiment, the portion 6d including the second joint surface 6b (the portion including the second joint surface 6b and its vicinity) has a cross-sectional area smaller than the cross-sectional area of the magnet 4a. It can be handled. By supporting the magnet 4a on the mirror 1 via the member 6 configured in this way, the member 6 can alleviate the deformation of the magnet 4a from being transmitted to the mirror 1. Therefore, the local deformation of the mirror 1 can be reduced as compared with the case where the magnet 4a is directly bonded to the mirror 1.

［実施例４］
図６は、実施例４に係る部材６の構成を示す図である。図６（ａ）は、ミラー１、部材６および磁石４ａの構成を示すＸＺ断面図であり、図６（ｂ）は、部材６および磁石４ａの構成を示す斜視図である。実施例４に係る部材６は、磁石４ａに接合される第１接合面６ａと、ミラー１に接合される第２接合面６ｂとを有し、第１接合面６ａと第２接合面６ｂとの間に、第１接合面６ａおよび第２接合面６ｂより断面の面積が小さいくびれ部分６ｅを有する。即ち、実施例４に係る部材６では、当該くびれ部分６ｅが、断面の面積が磁石４ａの断面の面積より小さい部分に該当しうる。このように構成された部材６を介して磁石４ａをミラー１に支持させることで、磁石４ａの変形がミラー１に伝わることを部材６によって緩和させることができる。そのため、磁石４ａをミラー１に直接接合した場合に比べて、ミラー１の局所的な変形を低減させることができる。 [Example 4]
FIG. 6 is a diagram showing the configuration of the member 6 according to the fourth embodiment. FIG. 6A is an XZ cross-sectional view showing the configurations of the mirror 1, the member 6 and the magnet 4a, and FIG. 6B is a perspective view showing the configurations of the member 6 and the magnet 4a. The member 6 according to the fourth embodiment has a first joint surface 6a joined to the magnet 4a and a second joint surface 6b to be joined to the mirror 1, and includes the first joint surface 6a and the second joint surface 6b. It has a constricted portion 6e having a cross-sectional area smaller than that of the first joint surface 6a and the second joint surface 6b. That is, in the member 6 according to the fourth embodiment, the constricted portion 6e may correspond to a portion whose cross-sectional area is smaller than the cross-sectional area of the magnet 4a. By supporting the magnet 4a on the mirror 1 via the member 6 configured in this way, the member 6 can alleviate the deformation of the magnet 4a from being transmitted to the mirror 1. Therefore, the local deformation of the mirror 1 can be reduced as compared with the case where the magnet 4a is directly bonded to the mirror 1.

＜第２実施形態＞
光学装置では、支持部材３によってミラー１が支持されていると、当該支持部材３に近いほどミラー１の剛性が高くなり、ミラー１を変形しづらくなる。つまり、光学装置に設けられた複数のアクチュエータ４では、支持部材３に近いアクチュエータ４ほど、ミラー１を所定量だけ変形させるためにコイル４ｂに供給する電流値が大きくなり、それに伴ってコイル４ｂの発熱量が大きくなりうる。その結果、磁石４ａの変形量も大きくなるとともに、ミラー１の局所的な変形が大きくなりうる。そこで、第２実施形態の光学装置２０では、複数のアクチュエータ４のうち支持部材３に近いアクチュエータ４において、ミラー１と磁石４ａとの間に設けられた部材６の厚さ（Ｚ方向の長さ）を厚くしている。これにより、磁石４ａの変形をミラー１に伝わりにくくして、ミラー１の局所的な変形を低減させることができる。ここで、第２実施形態の光学装置２０は、以下で説明する構成以外の構成は第１実施形態の光学装置１０と同様である。 <Second Embodiment>
In the optical device, when the mirror 1 is supported by the support member 3, the closer to the support member 3, the higher the rigidity of the mirror 1, and the more difficult it is to deform the mirror 1. That is, in the plurality of actuators 4 provided in the optical device, the closer the actuator 4 is to the support member 3, the larger the current value supplied to the coil 4b in order to deform the mirror 1 by a predetermined amount, and the coil 4b The amount of heat generated can be large. As a result, the amount of deformation of the magnet 4a can be increased, and the local deformation of the mirror 1 can be increased. Therefore, in the optical device 20 of the second embodiment, in the actuator 4 which is close to the support member 3 among the plurality of actuators 4, the thickness of the member 6 provided between the mirror 1 and the magnet 4a (the length in the Z direction). ) Is thickened. As a result, the deformation of the magnet 4a is less likely to be transmitted to the mirror 1, and the local deformation of the mirror 1 can be reduced. Here, the optical device 20 of the second embodiment has the same configuration as the optical device 10 of the first embodiment except for the configuration described below.

図７は、第２実施形態の光学装置２０を示す図である。例えば、複数のアクチュエータ４が、第１アクチュエータ４１と、第１アクチュエータ４１より支持部材３に近い第２アクチュエータ４２とを含む場合を想定する。即ち、第２アクチュエータ４２の磁石４ａ２が部材６２を介して支持されたミラー１の第２箇所１２が、第１アクチュエータ４１の磁石４ａ１が部材６１を介して支持されたミラー１の第１箇所１１より支持部材３に近い場合を想定する。この場合、第２箇所１２の剛性は第１箇所１１の剛性より大きいため、例えば第１箇所１１と第２箇所１２とで同じ変形量を生じさせるには、第２アクチュエータ４２の推力が、第１アクチュエータ４１の推力より大きくなりうる。つまり、第２アクチュエータ４２のコイル４ｂ２に供給される電流値が、第１アクチュエータ４１のコイル４ｂ１に供給される電流値より大きくなりうる。したがって、第１アクチュエータ４１より第２アクチュエータ４２の方が、コイル４ｂの発熱量が大きくなり、それに伴って磁石４ａの変形が大きくなる。 FIG. 7 is a diagram showing the optical device 20 of the second embodiment. For example, a plurality of actuators 4, a case comprising a first actuator 4 1, and a second actuator 4 2 close to the first actuator 4 1 from the support member 3. That is, the magnets 4a 2 of the second actuator 4 2 second positions 1 second mirror 1 which is supported through the member 6 2, magnets 4a 1 of the first actuator 4 1 is supported through the member 61 it is assumed that the closer to the first location 1 1 from the support member 3 of the mirror 1. In this case, the rigidity of the two positions 1 2 is greater than the first location 1 1 rigid, for example, the first location 1 1 To produce the same amount of deformation at the two points 1 2, a second actuator 4 2 thrust is, it may be larger than the first actuator 4 1 thrust. That is, the current value supplied to the coil 4b 2 of the second actuator 4 2 can be larger than the current value supplied to the coil 4b 1 of the first actuator 4 1. Therefore, it from the first actuator 4 1 of the second actuator 4 2, the calorific value of the coil 4b is increased, the deformation of the magnet 4a is increased accordingly.

そのため、本実施形態の光学装置２０では、第２アクチュエータ４２の磁石４ａ２に設けられた部材６２の厚さを、第１アクチュエータ４１の磁石４ａ１に設けられた部材６１の厚さよりも厚くしている。また、第１アクチュエータ４１と第２アクチュエータ４２とでは、コイル４ｂの電流値に対する推力の発生量がそれらの間で同様になるように、磁石４ａとコイル４ｂとの間隔を同じにすることが、ミラー１の変形を制御する際の容易性の観点から好ましい。そのため、本実施形態の光学装置２０では、図７に示すように、ベース定盤２に設けられた凹部２ａの内側に第２アクチュエータ４２のコイル４ｂ２が配置されうる。つまり、第２アクチュエータ４２では、第１アクチュエータ４１と比べて、部材６の厚さを厚くした分だけ、コイル４ｂがベース定盤２に埋め込まれている。 Therefore, in the optical device 20 of the present embodiment, the thickness of the member 6 2 provided on the magnet 4a 2 of the second actuator 4 2 is changed to the thickness of the member 6 1 provided on the magnet 4a 1 of the first actuator 4 1. It is thicker than the magnet. Further, in the first actuator 4 1 and the second actuator 4 2 , the distance between the magnet 4a and the coil 4b should be the same so that the amount of thrust generated with respect to the current value of the coil 4b is the same between them. However, it is preferable from the viewpoint of ease of controlling the deformation of the mirror 1. Therefore, in the optical device 20 of the present embodiment, as shown in FIG. 7, the coil 4b 2 of the second actuator 4 2 it can be disposed inside the recess 2a provided on the base plate 2. That is, in the second actuator 4 2, compared first actuator 4 1, by the amount of thickening the thickness of the member 6, the coil 4b is embedded in the base plate 2.

ここで、本実施形態（図７）の光学装置２０は、複数のアクチュエータ４のうち支持部材３に最も近いアクチュエータを第２アクチュエータ４２とし、当該アクチュエータの磁石４ａに設けられた部材６のみが厚くなるように構成されている。しかしながら、それに限られるものではなく、例えば、図８に示すように、複数のアクチュエータ４の各々における磁石４ａに設けられた部材６が、アクチュエータ４の位置が支持部材３に近づくにつれて徐々に厚くなるように構成されてもよい。 Here, the optical device 20 of the present embodiment (FIG. 7) is the nearest actuator to the support member 3 of the plurality of actuators 4 and second actuator 4 2, only members 6 provided on the magnet 4a of the actuator It is configured to be thicker. However, the present invention is not limited to this, and for example, as shown in FIG. 8, the member 6 provided on the magnet 4a in each of the plurality of actuators 4 gradually becomes thicker as the position of the actuator 4 approaches the support member 3. It may be configured as follows.

＜露光装置の実施形態＞
本実施形態の露光装置５０について、図９を参照しながら説明する。本実施形態の露光装置５０は、照明光学系ＩＬと、投影光学系ＰＯと、マスク５５を保持して移動可能なマスクステージＭＳと、基板５６を保持して移動可能な基板ステージＷＳとを含みうる。また、露光装置５０は、基板５６を露光する処理を制御する制御部５１を含みうる。 <Implementation of Exposure Device>
The exposure device 50 of the present embodiment will be described with reference to FIG. The exposure apparatus 50 of the present embodiment includes an illumination optical system IL, a projection optical system PO, a mask stage MS that holds and moves the mask 55, and a substrate stage WS that holds and moves the substrate 56. sell. Further, the exposure apparatus 50 may include a control unit 51 that controls a process of exposing the substrate 56.

照明光学系ＩＬに含まれる光源（不図示）から射出された光は、照明光学系ＩＬに含まれるスリット（不図示）によって、例えば、Ｙ方向に長い円弧状の照明領域をマスク５５上に形成することができる。マスク５５および基板５６は、マスクステージＭＳおよび基板ステージＷＳによってそれぞれ保持されており、投影光学系ＰＯを介して光学的にほぼ共役な位置（投影光学系ＰＯの物体面および像面の位置）に配置される。投影光学系ＰＯは、所定の投影倍率を有し、マスク５５に形成されたパターンを基板５６に投影する。そして、マスクステージＭＳおよび基板ステージＷＳを、投影光学系ＰＯの物体面と平行な方向（例えば図５のＸ方向）に、投影光学系ＰＯの投影倍率に応じた速度比で走査させる。これにより、マスク５５に形成されたパターンを基板５６に転写することができる。 The light emitted from the light source (not shown) included in the illumination optical system IL forms, for example, an arc-shaped illumination region long in the Y direction on the mask 55 by the slit (not shown) included in the illumination optical system IL. can do. The mask 55 and the substrate 56 are held by the mask stage MS and the substrate stage WS, respectively, and are optically coupled to each other via the projection optical system PO (positions of the object plane and the image plane of the projection optical system PO). Be placed. The projection optical system PO has a predetermined projection magnification and projects the pattern formed on the mask 55 onto the substrate 56. Then, the mask stage MS and the substrate stage WS are scanned in a direction parallel to the object surface of the projection optical system PO (for example, the X direction in FIG. 5) at a speed ratio corresponding to the projection magnification of the projection optical system PO. As a result, the pattern formed on the mask 55 can be transferred to the substrate 56.

投影光学系ＰＯは、例えば、図９に示すように、平面鏡５２と、凹面鏡５３と、凸面鏡５４とを含むように構成されうる。照明光学系ＩＬから出射し、マスク５５を透過した露光光は、平面鏡５２の第１面５２ａにより光路を折り曲げられ、凹面鏡５３の第１面５３ａに入射する。凹面鏡５３の第１面５３ａにおいて反射した露光光は、凸面鏡５４において反射し、凹面鏡５３の第２面５３ｂに入射する。凹面鏡５３の第２面５３ｂにおいて反射した露光光は、平面鏡５２の第２面５２ｂにより光路を折り曲げられ、基板上に結像する。このように構成された投影光学系ＰＯでは、凸面鏡５４の表面が光学的な瞳となる。 The projection optical system PO may be configured to include, for example, a plane mirror 52, a concave mirror 53, and a convex mirror 54, as shown in FIG. The exposure light emitted from the illumination optical system IL and transmitted through the mask 55 has its optical path bent by the first surface 52a of the plane mirror 52 and is incident on the first surface 53a of the concave mirror 53. The exposure light reflected on the first surface 53a of the concave mirror 53 is reflected by the convex mirror 54 and is incident on the second surface 53b of the concave mirror 53. The exposure light reflected on the second surface 53b of the concave mirror 53 is formed on the substrate by bending the optical path by the second surface 52b of the plane mirror 52. In the projection optical system PO configured in this way, the surface of the convex mirror 54 becomes an optical pupil.

上述した露光装置５０の構成において、上述の実施形態に係る光学装置は、例えば、ミラー１としての凹面鏡５３の反射面を変形する装置として用いられうる。上述の実施形態に係る光学装置を露光装置５０に用いることにより、凹面鏡５３の反射面（第１面５３ａおよび第２面５３ｂ）を高精度に変形させることができ、投影光学系ＰＯにおける光学収差を高精度に補正することができる。ここで、露光装置５０における制御部５１は、上述の実施形態に係る光学装置におけるアクチュエータ４を制御するための制御部５を含むように構成されてもよい。なお、上述の実施形態に係る光学装置が凹面鏡５３の反射面を変形する装置として用いられる場合、図９におけるＸ方向、Ｙ方向およびＺ方向は、図１〜図８における−Ｚ方向、Ｙ方向およびＸ方向にそれぞれ対応する。 In the configuration of the exposure device 50 described above, the optical device according to the above embodiment can be used, for example, as a device for deforming the reflecting surface of the concave mirror 53 as the mirror 1. By using the optical device according to the above-described embodiment for the exposure device 50, the reflective surfaces (first surface 53a and second surface 53b) of the concave mirror 53 can be deformed with high accuracy, and optical aberration in the projection optical system PO can be obtained. Can be corrected with high accuracy. Here, the control unit 51 in the exposure device 50 may be configured to include a control unit 5 for controlling the actuator 4 in the optical device according to the above-described embodiment. When the optical device according to the above embodiment is used as a device for deforming the reflecting surface of the concave mirror 53, the X direction, the Y direction and the Z direction in FIGS. 9 are the −Z direction and the Y direction in FIGS. 1 to 8. And corresponds to the X direction, respectively.

＜物品の製造方法の実施形態＞
本発明の実施形態に係る物品の製造方法は、例えば、半導体デバイス等のマイクロデバイスや微細構造を有する素子等の物品を製造するのに好適である。本実施形態の物品の製造方法は、基板に塗布された感光剤に上記の露光装置を用いて潜像パターンを形成する工程（基板を露光する工程）と、かかる工程で潜像パターンが形成された基板を現像する工程とを含む。更に、かかる製造方法は、他の周知の工程（酸化、成膜、蒸着、ドーピング、平坦化、エッチング、レジスト剥離、ダイシング、ボンディング、パッケージング等）を含む。本実施形態の物品の製造方法は、従来の方法に比べて、物品の性能・品質・生産性・生産コストの少なくとも１つにおいて有利である。 <Embodiment of manufacturing method of goods>
The method for manufacturing an article according to an embodiment of the present invention is suitable for producing an article such as a microdevice such as a semiconductor device or an element having a fine structure, for example. The method for manufacturing an article of the present embodiment includes a step of forming a latent image pattern on a photosensitive agent applied to a substrate (a step of exposing the substrate) using the above-mentioned exposure apparatus, and a step of forming a latent image pattern in such a step. Includes the process of developing the substrate. Further, such a manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, flattening, etching, resist peeling, dicing, bonding, packaging, etc.). The method for producing an article of the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

以上、本発明の好ましい実施形態について説明したが、本発明はこれらの実施形態に限定されないことはいうまでもなく、その要旨の範囲内で種々の変形および変更が可能である。 Although the preferred embodiments of the present invention have been described above, it goes without saying that the present invention is not limited to these embodiments, and various modifications and modifications can be made within the scope of the gist thereof.

１：ミラー、２：ベース定盤、３：支持部材、４：アクチュエータ、４ａ：磁石、４ｂ：コイル、５：制御部、１０（２０）：光学装置 1: Mirror, 2: Base surface plate, 3: Support member, 4: Actuator, 4a: Magnet, 4b: Coil, 5: Control unit, 10 (20): Optical device

Claims (15)

ミラーを変形させる光学装置であって、
前記ミラーに力を加えるアクチュエータを含み、
前記アクチュエータは、互いに対向して配置された磁石とコイルとを有し、
前記磁石は、部材を介して前記ミラーによって支持され、
前記磁石と接合している前記部材の接合面の面積は、前記磁石の前記部材側の面の面積より小さく、
前記部材は、前記ミラーを構成する材質と同じ材質によって構成されている、
ことを特徴とする光学装置。 An optical device that deforms a mirror
Includes an actuator that applies force to the mirror
The actuator has magnets and coils arranged so as to face each other.
The magnet is supported by the mirror via a member and
The area of the joint surface of the member which is joined to the magnet, rather smaller than the area of said member side surface of the magnet,
The member is made of the same material as the material constituting the mirror.
An optical device characterized by that. ミラーを変形させる光学装置であって、An optical device that deforms a mirror
前記ミラーに力を加えるアクチュエータを含み、Includes an actuator that applies force to the mirror
前記アクチュエータは、互いに対向して配置された磁石とコイルとを有し、The actuator has magnets and coils arranged so as to face each other.
前記磁石は、部材を介して前記ミラーによって支持され、The magnet is supported by the mirror via a member and
前記磁石と接合している前記部材の接合面の面積は、前記磁石の前記部材側の面の面積より小さく、The area of the joint surface of the member bonded to the magnet is smaller than the area of the surface of the magnet on the member side.
前記部材と前記ミラーとの線膨張係数の差は、前記磁石と前記ミラーとの線膨張係数の差より小さい、The difference in the coefficient of linear expansion between the member and the mirror is smaller than the difference in the coefficient of linear expansion between the magnet and the mirror.
ことを特徴とする光学装置。An optical device characterized by that. 前記接合面の面積は、前記磁石の前記部材側の面の面積の１／４以下である、ことを特徴とする請求項１又は２に記載の光学装置。 Area of the junction surface is 1/4 or less of the area of the surface of said member side of the magnet, the optical device according to claim 1 or 2, characterized and this. 前記ミラーと前記部材とを結合する結合部材を、前記ミラーと前記部材との間に更に含む、ことを特徴とする請求項１乃至３のうちいずれか１項に記載の光学装置。 The optical device according to any one of claims 1 to 3 , further comprising a connecting member for connecting the mirror and the member between the mirror and the member. 前記結合部材の厚さは、前記部材の厚さより薄い、ことを特徴とする請求項４に記載の光学装置。 The optical device according to claim 4 , wherein the thickness of the coupling member is thinner than the thickness of the member. 前記接合面に平行な前記部材の断面形状が一定である、ことを特徴とする請求項１乃至５のうちいずれか１項に記載の光学装置。 The optical device according to any one of claims 1 to 5 , wherein the cross-sectional shape of the member parallel to the joint surface is constant. 前記部材は円柱形状である、ことを特徴とする請求項１乃至６のうちいずれか１項に記載の光学装置。 The optical device according to any one of claims 1 to 6 , wherein the member has a cylindrical shape. 前記部材は、前記部材と前記磁石との接合面が、前記部材と前記ミラーとの接合面より小さいテーパ形状である、ことを特徴とする請求項１乃至７のうちいずれか１項に記載の光学装置。 The member according to any one of claims 1 to 7 , wherein the joint surface between the member and the magnet has a tapered shape smaller than the joint surface between the member and the mirror. Optical device. 前記部材は、前記部材と前記磁石との接合面と平行な断面積が前記磁石の前記部材側の面の面積より小さい部分を一部に含む、ことを特徴とする請求項８に記載の光学装置。The optics according to claim 8, wherein the member includes a portion whose cross-sectional area parallel to the joint surface between the member and the magnet is smaller than the area of the surface of the magnet on the member side. apparatus. 前記ミラーの形状が目標形状となるように前記アクチュエータを制御する制御部を更に含む、ことを特徴とする請求項１乃至９のうちいずれか１項に記載の光学装置。 The optical device according to any one of claims 1 to 9 , further comprising a control unit that controls the actuator so that the shape of the mirror becomes a target shape. 前記光学装置は、前記ミラーを支持する支持部材と、前記支持部材に近づく方向に沿って配置された複数の前記アクチュエータとを含み、The optical device includes a support member that supports the mirror and a plurality of actuators that are arranged along a direction approaching the support member.
複数の前記アクチュエータにそれぞれ設けられた部材は、前記アクチュエータの位置が前記支持部材に近づくにつれて厚くなるように構成されている、ことを特徴とする請求項１乃至１０のいずれか１項に記載の光学装置。The member according to any one of claims 1 to 10, wherein the member provided on each of the plurality of actuators is configured to become thicker as the position of the actuator approaches the support member. Optical device. ミラーを変形させる光学装置であって、An optical device that deforms a mirror
前記ミラーを支持する支持部材と、A support member that supports the mirror and
前記ミラーに力を加えるアクチュエータと、を含み、Includes an actuator that applies force to the mirror.
前記アクチュエータは、互いに対向して配置された第１磁石と第１コイルとを有する第１アクチュエータと、互いに対向して配置された第２磁石と第２コイルとを有し、前記第１アクチュエータより前記支持部材に近い位置に配置される第２アクチュエータとを含み、The actuator has a first actuator having a first magnet and a first coil arranged to face each other, and a second magnet and a second coil arranged to face each other, from the first actuator. Including a second actuator arranged at a position close to the support member
前記第１磁石は、第１部材を介して前記ミラーによって支持され、The first magnet is supported by the mirror via the first member.
前記第２磁石は、第２部材を介して前記ミラーによって支持され、The second magnet is supported by the mirror via the second member.
前記第１磁石と接合している前記第１部材の第１接合面の面積は、前記第１磁石の前記第１部材側の面の面積より小さく、The area of the first joint surface of the first member bonded to the first magnet is smaller than the area of the surface of the first magnet on the first member side.
前記第２磁石と接合している前記第２部材の第２接合面の面積は、前記第２磁石の前記第２部材側の面の面積より小さく、The area of the second joint surface of the second member bonded to the second magnet is smaller than the area of the surface of the second magnet on the second member side.
前記第２部材は、前記第１部材より厚い、The second member is thicker than the first member.
ことを特徴とする光学装置。An optical device characterized by that. 前記第１コイル及び前記第２コイルを支持するベース定盤を更に含み、The base platen supporting the first coil and the second coil is further included.
前記第２コイルは、前記ベース定盤に設けられた凹部の内側に配置されている、ことを特徴とする請求項１２に記載の光学装置。The optical device according to claim 12, wherein the second coil is arranged inside a recess provided in the base surface plate. 基板を露光する露光装置であって、
マスクのパターンを前記基板に投影する投影光学系を含み、
前記投影光学系は、請求項１乃至１３のうちいずれか１項に記載の光学装置を含む、ことを特徴とする露光装置。 An exposure device that exposes a substrate
Includes a projection optical system that projects a mask pattern onto the substrate.
The exposure optical system includes the optical device according to any one of claims 1 to 13. 請求項１４に記載の露光装置を用いて基板を露光する工程と、
前記工程で露光された前記基板を現像する工程と、を含み、
現像された前記基板から物品を製造することを特徴とする物品の製造方法。 A step of exposing a substrate using the exposure apparatus according to claim 14.
Including a step of developing the substrate exposed in the step.
A method for producing an article, which comprises producing the article from the developed substrate.
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