JP6900523B2 - Dresser for abrasive cloth - Google Patents

Description

The present invention is used in the process of chemical and mechanical polishing (hereinafter abbreviated as "CMP polishing") to maintain the flatness of the polishing pad and to remove clogging and foreign matter. Regarding dressers for abrasive cloths to be made.

Equipment for polishing the surface of semiconductor wafers, equipment for flattening the surface of wiring and insulating layers in the process of manufacturing integrated circuits, equipment for flattening the surface of Al plates and glass plates used for magnetic hard disk substrates, CMP polishing is used in the above. In this CMP polishing, for example, a surface to be polished is pressed against a rotating substrate to which a urethane polishing pad is attached while supplying a slurry liquid containing fine abrasive grains to flatten the surface to be polished. The method. As a matter of course, the polishing ability of this polishing pad decreases with the usage time, but in order to suppress this decrease, the surface layer of the polishing pad is ground at regular intervals to maintain the flatness of the polishing pad. , I always dress so that a new side comes out. The parts used for this dressing are called dressers, and the dressers are obtained by joining abrasive grains (diamond abrasive grains, etc.) to a metal substrate by brazing or the like. As a brazing material used for brazing diamond abrasive grains, for example, a Ni-Cr-Si-BP-based brazing material is described in Patent Document 1.

Recently, scratch scratches generated on the surface to be polished have been eliminated due to the shallow depth of focus of the pattern exposure device due to the extremely narrowing of the line / space of the integrated circuit or the increase in the recording capacity of the magnetic hard disk. In addition to the demand from the above, the demand for flatness is increasing more and more, such as reducing the waviness of the surface to be polished. In order to meet these demands, it is required to uniformly grind the pad surface by dressing to maintain the flatness of the pad. Furthermore, dressing is also required to have a pad grinding speed that can quickly clear pad clogging and foreign matter.

Patent Document 2 states that a dresser having d ≦ L <2d can achieve both a high pad grinding speed and a high pad flatness in terms of the particle size d of diamond abrasive grains and the distance L between centers of adjacent abrasive grains. To disclose. In Patent Documents 3 and 4, a dresser in which diamond abrasive grains are fixed to a single layer by a resin, a metal layer exists between the diamond abrasive grains and the resin, and the surface of the metal layer in contact with the resin has an uneven portion. However, it discloses that a high pad grinding speed and a high pad flatness can be achieved at the same time.

Japanese Unexamined Patent Publication No. 2007-83352 Japanese Unexamined Patent Publication No. 2009-196025 Japanese Unexamined Patent Publication No. 2012-223388 Japanese Unexamined Patent Publication No. 2014-14898

As described above, although a dresser that uniformly grinds the pad surface has been disclosed, there is a high demand for a dresser that satisfies both a higher pad grinding speed and a higher pad flatness. However, there is a trade-off between pad grinding speed and pad flatness, and it is not easy to increase both at the same time. For example, if diamond abrasive grains having a smaller abrasive particle size are used in order to improve pad flatness, the protruding height of the tip of the diamond abrasive grains becomes smaller, so that the pad grinding force is reduced and the CMP process is performed. Productivity may decrease. On the other hand, if an attempt is made to reduce the thickness of the brazing material and increase the protrusion height of the abrasive grains in order to obtain a larger pad grinding force with a small abrasive particle size, the bonding force between the brazing material and the abrasive grains decreases. Abrasive particles may easily fall off.

An object of the present invention is to provide a dresser that simultaneously satisfies a high pad grinding speed and a high pad flatness in order to solve the above-mentioned problems.

In view of the above problems, the first of the present invention is the following dresser for polishing cloth.
[1] A dresser for polishing cloth in which a plurality of diamond abrasive grains are fixed in a single layer on the surface of a metal support material.
The diamond abrasive grains are bonded and fixed to the surface of the metal support material via a brazing material layer containing a brazing material.
The composition of the brazing material is mass%,
70% ≤ Ni + Fe ≤ 95% (however, 0 ≤ Fe / (Ni + Fe) ≤ 0.4),
2% ≤ Si + B ≤ 15% (however, 0 ≤ B / (Si + B) ≤ 0.8),
1% ≤ Cr ≤ 15%,
0.5% ≤ P ≤ 4%, and
0.2% ≤ X ≤ 3%
(However, X is at least one element selected from the group consisting of Ti, Nb, Ta, V and Zr, and 0.2 ≦ X / P ≦ 4.)
A dresser for polishing cloth, which is characterized by being.
[2] The dresser for polishing cloth according to [1], wherein the composition of the brazing material is 0.4 ≦ X / P ≦ 2.0.
[3] The brazing material contains at least Ti as the element X, and the content of Ti is 0.5% ≤ Ti ≤ 3% in mass% [1] or [2]. ] The dresser for polishing cloth described in.
[4] The brazing material contains at least Ti as the element X, and the content of Ti is 0.5% ≤ Ti ≤ 1% in mass% [1] to [3]. ], The dresser for polishing cloth described in any of the above.
[5] The dresser for polishing cloth according to any one of [1] to [4], wherein the average particle size d of the diamond abrasive grains is 3 μm or more and less than 100 μm.
[6] The dresser for polishing cloth according to any one of [1] to [5], wherein the thickness of the brazing filler metal layer is 0.1 d or more and less than 0.4 d.
[7] When the distance between the centers of adjacent diamond abrasive grains is L,
The ratio of the abrasive grains arranged so that the L of the adjacent abrasive grains is d ≦ L <2d with respect to the total number of abrasive grains of the dresser for polishing cloth is 70% or more with respect to the total number of abrasive grains. Characterized by being
The dresser for polishing cloth according to any one of [1] to [6].
[8] The dresser for polishing cloth according to any one of [1] to [7], wherein the metal support material is made of stainless steel.

According to the present invention, there is provided a dresser that simultaneously satisfies high pad grinding speed and high pad flatness.

FIG. 1 is a graph showing a quantitative relationship between P and element X contained in a brazing material used in a preferred embodiment of the present invention.

The dresser for polishing cloth according to the present invention is a dresser for polishing cloth in which a plurality of diamond abrasive grains are fixed in a single layer on the surface of a metal support material. In the dresser for abrasive cloth according to the present invention, the diamond abrasive grains are bonded and fixed to the surface of the metal support material via a brazing material layer, and the average particle size d of the diamond abrasive grains is 3 μm or more and 100 μm. The thickness of the brazing filler metal layer is less than 0.1d and less than 0.4d.

In the dresser for abrasive cloth according to the present invention, the average particle size d of diamond abrasive grains is reduced in order to improve the flatness of the ground pad. On the other hand, in the dresser for polishing pad according to the present invention, in order to increase the grinding speed of the dresser for polishing pad, the ratio of the thickness of the brazing material layer to the average particle size d of the diamond abrasive grains is reduced. However, as described above, there is a trade-off relationship between the flatness of the pad and the grinding speed of the pad. As a result of searching for conditions that satisfy both of them, the present inventor has set the average particle size d of the diamond abrasive grains to be 3 μm or more and less than 100 μm, and the thickness of the brazing material layer to be 0.1 d or more and less than 0.4 d. So, I found that the flatness of the ground pad can be improved and at the same time, the grinding speed can be increased.

The average particle size d of the diamond abrasive grains can be set to the number average particle size by measuring the particle size of any number of diamond abrasive grains. The particle size of the diamond abrasive grains may be a value obtained by measuring the abrasive grains that are not adhered to the dresser for polishing cloth, or may be a value obtained by measuring the particle size of the adhered abrasive grains as they are. The particle size of the abrasive grains not adhered to the dresser for abrasive cloth may be obtained by measuring the abrasive grains before being adhered to the dresser for abrasive cloth, or the abrasive grains collected by peeling from the dresser for abrasive cloth may be obtained. It may be obtained by measurement, and can be measured by a direct observation method including a sieve classification method, a laser diffraction method, a centrifugal sedimentation method and a scanning electron microscope (SEM). The particle size of the adhered abrasive grains can be a circle-equivalent diameter obtained by a direct observation method using an SEM.

By setting the average particle size d to 3 μm or more, it becomes easy to arrange one crystal habit surface of the diamond abrasive grains substantially parallel to the surface of the metal support material, and the pad surface can be polished more flatly. Become. Further, by setting the average particle size d to less than 100 μm, diamond abrasive grains having a small particle size can be arranged at a higher density on the surface of the metal support material, so that the pad surface can be polished more flatly. It will be possible. From the above viewpoint, if the average particle size d is 3 μm or more and less than 50 μm, a grinding speed of 2.0 μm / min or more and a pad flatness of 0.5 μm or less can be obtained. It is more preferable because pad flatness of 0.2 μm or less can be obtained while maintaining a grinding speed of 0 μm / min or more.

By setting the thickness of the brazing material layer to 0.1 d or more, the diamond abrasive grains can be fixed to the surface of the metal support material with sufficient holding force. Further, by setting the thickness of the brazing material layer to less than 0.4d, the height of the diamond abrasive grains protruding above the brazing material layer can be made larger than that of the conventional dresser for abrasive cloth, so that the grinding force can be further increased. It becomes possible to increase and increase the grinding speed. From the above viewpoint, if the thickness of the brazing filler metal layer is 0.14d or more and less than 0.38d, it is preferable that the balance between the pad grinding speed and the pad flatness is optimized in the average particle size of each abrasive grain. , 0.32d or more and less than 0.38d is more preferable.

From the viewpoint of increasing the grinding speed in the range of the average particle size d, the diamond abrasive grains adjacent to each other are adjacent to each other with respect to the total number of abrasive grains in the dresser for polishing cloth when the distance between the centers is L. The ratio of the abrasive grains arranged so that the distance L between the centers of the abrasive grains is d ≦ L <2d is preferably 70% or more with respect to the total number of abrasive grains. This is because when the average particle size d of the diamond abrasive grains is as small as less than 100 μm, the grinding speed can be increased and the flatness of the pad can be improved by reducing the distance between the diamond abrasive grains. Based on the findings of the present inventor. By setting the center-to-center distance L to 2d or more, the distance between diamond abrasive grains can be reduced and the grinding speed can be increased. When the center-to-center distance L is smaller than the average particle size d of the diamond abrasive grains, the single-layer abrasive grains can no longer be arranged on the surface of the metal support material.

The material of the brazing material layer may be any material as long as diamond abrasive grains having the average particle diameter d can be sufficiently adhered to the surface of the metal support material with the thickness of the brazing material layer. For example, according to the new findings of the present inventors, the brazing material having a Ni—Fe—Cr—Si system composition is at least one selected from the group consisting of P and Ti, Nb, Ta, V and Zr. The brazing material containing the seed element can sufficiently adhere the diamond abrasive grains to the surface of the metal support material.

Preferably, the brazing filler metal has the following composition in% by mass.
70% ≤ Ni + Fe ≤ 95%
(However, 0 ≦ Fe / (Ni + Fe) ≦ 0.4),
2% ≤ Si + B ≤ 15%
(However, 0 ≦ B / (Si + B) ≦ 0.8),
1% ≤ Cr ≤ 15%,
0.5% ≤ P ≤ 4%, and
0.2% ≤ X ≤ 3%,
(However, X is at least one element selected from the group consisting of Ti, Nb, Ta, V and Zr, and 0.2 ≦ X / P ≦ 4.)

Ni is the main element of the brazing filler metal. When the total content of Ni and Fe is 70% or more and 95% or less and the ratio of Fe to the total of (Ni + Fe) is 0.4 or less, the melting point of the brazing material can be lowered. Since it is possible to prevent warpage and poor bonding due to thermal deformation of the metal support material due to an increase in brazing temperature, the grinding speed is increased, the ground pad is made flatter, and diamond abrasive grains are also dropped. It can be made difficult. The preferable contents of Ni and Fe are 72% or more and 93% or less, and the more preferable content is 75% or more and 93% or less. When stainless steel or the like is used as the metal support material, it is preferable that 0 <Fe / (Ni + Fe) ≦ 0.4. This is because Fe is contained in the metal support material, and therefore, when Fe is also contained in the brazing material, the bondability between the brazing material and the support material is improved.

Cr is contained in order to increase the corrosion resistance of the brazing material. Abrasive cloth dressers are typically used under acidic or alkaline slurries. Therefore, by setting the Cr content to 1% or more, the corrosion resistance of the brazing material to acids or alkalis can be further enhanced. The Cr content may be increased to 15% or less, but no further improvement in corrosion resistance is observed.

Si and B are included to lower the melting point of the brazing filler metal. When the total content of Si and B is 2% or more and 15% or less and the ratio of B to the total of (Si + B) is 0.8 or less, the melting point of the brazing material can be lowered. Since it is possible to prevent warpage and poor bonding due to thermal deformation of the metal support material due to an increase in brazing temperature, the grinding speed is increased, the ground pad is made flatter, and diamond abrasive grains are also dropped. It can be made difficult. The preferable contents of Si and B are 3% or more and 15% or less.

There are two types of brazing filler metal, foil-shaped and powder-shaped. In order to obtain a foil-shaped form, for example, a manufacturing method of forming an amorphous foil by a single-roll quenching method is generally used. There is. Since B is an element necessary for forming an amorphous material, it is necessary to contain at least 1% or more of B in the case of producing a foil-like brazing material. When producing a powdery brazing material, B does not necessarily have to be contained as long as a desired melting point can be obtained. Even if the ratio of B to the total of (Si + B) is more than 0.8, the formation of amorphous material is not further improved, and the foil itself tends to be brittle.

X is an element that easily forms carbides, and is added in order to form carbides with diamond to increase the bonding strength between diamond and brazing material and to prevent diamond abrasive grains from falling off. The Xs Ti, Nb, Ta, V and Zr tend to form carbides such as titanium carbide, niobium carbide, tantalum carbide, vanadium carbide and zirconium carbide, which are formed at the interface between diamond and the bonding alloy. , An effective metal for joining diamonds. When the content of X is 0.2% or more, when the brazing material becomes hot, X diffuses into diamond to form carbide (for example, titanium carbide when X is Ti). The bonding strength between the diamond and the brazing material layer can be further increased. Even if the content of X is increased to more than 3.0%, the above effect is not added. X is Ti, Nb, Ta, V or Zr, and the brazing material may contain only one type or two or more types. When the brazing material contains two or more types of X, the total content of the two or more types of X is 0.2% or more and 3.0% or less. The preferable content of X is 0.5% or more and 3% or less.

From the viewpoint of increasing the bonding strength and more efficiently achieving the above effect, the brazing material contains at least Ti as X, and the content of Ti in the brazing material is 0.5% or more and 3.0%. The following is preferable. From the above viewpoint, it is more preferable that the brazing material contains at least Ti as X and the content of Ti in the brazing material is 0.5% or more and 1% or less.

P is contained in order to eliminate the difference between the melting point measured by the brazing material alone and the melting point measured by joining the brazing material to the metal support material and to stabilize the melting temperature. In order to make it possible to stabilize the melting temperature even when the thickness of the brazing material, the joining temperature, and the joining time change, P lowers the brazing temperature, which was conventionally set higher with a margin. It makes it possible and reduces the deformation of the metal support material due to heat. Further, when the abrasive grains are brazed to the metal support material, P enhances the wettability between the abrasive grains and the brazing material, so that the bondability is stabilized and the falling of the abrasive grains is also suppressed. By setting the P content to 0.5% or more, such an effect of stabilizing the melting point can be obtained. By setting the P content to 4% or less, the wettability between the abrasive grains and the brazing material can be adjusted within an appropriate range, and the brazing material can be prevented from covering the abrasive grains. A more preferable range of P content is 0.5% ≦ P ≦ 4%. The smaller the abrasive grain size, the easier it is for the abrasive grains to be covered with the brazing material, but by setting the upper limit of P to 4%, this can be prevented more reliably.

The present inventor has also found that P prevents graphitization of the diamond surface due to the addition of X. When X is added to the brazing material, as described above, the carbon constituting the diamond becomes a carbide with X and the bonding strength between the brazing material and the diamond is increased, but on the other hand, the crystal structure of the carbon is changed. Since it is graphitized, there is a limit to the improvement of bonding strength. On the other hand, by adding X and P in combination to the brazing material, it is possible to further increase the bonding strength of diamond and prevent the diamond abrasive grains from falling off. It is considered that this is because the addition of P suppresses the graphitization of the diamond by X. When the ratio of the contents of X and P (X / P) is 0.2 or more, the effect of suppressing the graphitization of diamond by P can be seen. Further, by setting X / P to 4.0 or less, a sufficient amount of P is present in the brazing material with respect to X, and the wettability between the diamond abrasive grains and the brazing material does not become too large. Therefore, P can sufficiently suppress the graphitization of the diamond by X, and the bonding strength between the diamond and the brazing material layer can be increased. The preferred X / P range is 0.4 or more and 2.0 or less.

FIG. 1 is a graph showing the quantitative relationship between P and element X contained in the brazing material used in the preferred embodiment of the present invention, and the region surrounded by abdefh is 0.5% ≦ P ≦ 4.0%. , 0.2% ≦ X ≦ 3.0%, and 0.2 ≦ X / P ≦ 4.0. As is clear from this graph, the lower limit of X increases as the content of P increases. The reason is that as P increases, so does compound PX, which consumes part of the X that should be spent on carbide formation. In the present invention, the more preferable range is all three conditions of 0.5% ≦ P ≦ 4.0%, 0.2% ≦ X ≦ 3.0%, and 0.4 ≦ X / P ≦ 2.0. The area enclosed by cdghi in the graph to be filled. In this region, as the P content increases, the lower limit of X further increases.

Since the brazing material layer having the above composition has a high bonding force to diamond, the average particle size d of the diamond abrasive grains is 3 μm or more and less than 100 μm, and the thickness of the brazing material layer is 0.1d or more and less than 0.4d. Even when the diamond abrasive grains are sufficiently fixed to the surface of the metal support material.

The metal support material preferably does not easily react with an acidic or alkaline slurry, and specifically, stainless steel is preferable. Examples of stainless steels preferably used for metal supports include representative stainless steels SUS304, SUS316 and SUS430. Further, a steel having a plating such as Ni on the surface of general structural steel such as carbon steel can also be used.

The shape of the metal support material is not particularly limited and may be a polygonal shape such as an octagon or an icosagon, but since the metal support material itself grinds the pad while rotating, uniform grindability It is preferable that it has a disk shape in order to secure the above.

The dresser for polishing cloth according to the present invention can be manufactured as follows. First, a brazing material is temporarily attached to the surface of the metal support material. Then, the diamond abrasive grains are arranged at predetermined intervals on the surface of the metal support material to which the brazing material is temporarily attached. At this time, the diamond abrasive grains may be temporarily fixed with glue or the like so as not to shift. Next, ^{after vacuuming to about 10-3} Pa, the environment is raised to a temperature at which the brazing filler metal melts. Most of the glue and the like vaporize during the temperature rise. The temperature at which the brazing material is melted is preferably equal to or higher than the melting point of the brazing material and is as low as possible. Even if it is high, the liquidus temperature of the brazing material is preferably within about + 20 ° C. This is because when the temperature is high, the metal support material is greatly deformed by heat. It is sufficient that the holding time at the brazing temperature is about 5 to 30 minutes.

Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto. Although the display of "%" is used in the examples, it represents "mass%" unless otherwise specified.

[Example 1]
As the diamond abrasive grains, those having an average particle diameter d of 1.5 μm, 3.5 μm, 7.5 μm, 15 μm, 50 μm, 75 μm, 95 μm, and 110 μm are used, respectively, and the brazing material thickness is 0.2 μm to 80 μm. A dresser for polishing cloth was produced.

The composition of the brazing filler metal was Ni-4.2% Si-3.0% B-7.0% Cr-1.0% P-2.0% Ti.

1. 1. Manufacture of dresser An alloy having the composition of the above brazing material was melted to prepare a mother alloy. Using this mother alloy, a foil having a thickness of 15 μm to 40 μm and a width of 50 mm was produced by a known single-roll quenching method. Specifically, a mother alloy melted in a quartz crucible equipped with a 0.4 mm to 0.6 mm × 50 mm slot nozzle is melted and placed on a Cu cooling roll rotating at a peripheral speed of 20 to 30 mm / sec. A foil was manufactured by ejecting molten metal through a slot nozzle. The thickness of the foil obtained by this method was 15 to 40 μm. Among these foils, those having a desired thickness were selected to obtain a brazing material having a brazing material thickness of 15 to 40 μm. Further, these foils were etched with a hydrofluoric acid-based or hydrochloric acid-based chemical etching solution to produce a brazing filler metal having a brazing filler metal thickness of less than 15 μm. The foil obtained by the single roll method is amorphous, and since the composition in the foil is uniform, it can be uniformly thinned by etching. Further, a plurality of the above foils were laminated to produce a brazing material having a brazing material thickness of more than 40 μm.

As the metal support material, a disk made of SUS304 stainless steel having a diameter of 100 mm and a thickness of 4 mm was used. Abrasive grains were arranged in a donut-shaped region between a circle having a radius of 35 mm and a circle having a radius of 48 mm drawn on one side of the metal support material. At that time, the donut-shaped region was divided into six arc-shaped regions at an equal angle when viewed from the center of the metal support material, and a region having a width of 2 mm and not arranging abrasive grains was provided in the arc-shaped regions adjacent to each other. The arrangement pattern of the diamond abrasive grains was a square arrangement.

In order to arrange the abrasive grains, a sieve is prepared according to the same pattern as the arrangement pattern of the size d of the abrasive grains to be fixed to each dresser and the predetermined abrasive grain spacing L, and the abrasive grains are supported by metal through this sieve. I placed it on the material. Specifically, a brazing material having a predetermined thickness is temporarily fixed in a spot region in a region where abrasive grains are arranged. An organic binder was applied on this foil, and abrasive grains were placed on the foil through a sieve. Then, using a heating furnace, brazing treatment was performed at 1000 ° C. for 20 minutes in ^{a vacuum of 10-3 Pa.} The thickness of the brazing material was measured by observing the cross section with an optical microscope or SEM.

In this way, the respective dressers shown in Tables 1 and 2 were manufactured.

2. Evaluation of dresser The pad was actually ground using the dresser produced above, and the grinding speed of the pad, the flatness of the pad, and the number of diamond abrasive grains dropped were obtained from the amount of decrease in pad thickness after grinding. The pad was made of foamed polyurethane and the diameter of the pad was 250 mm.

This pad was attached on the polishing machine. The dresser was fixed to a device equipped with a rotating mechanism and a mechanism for swinging in the radial direction of the pad, and a load of 1 kg was applied by a pressurizing mechanism to press the dresser against the pad. The center of the dresser was swung in the radial direction of the pad in the range of 30 mm to 90 mm from the center of the pad. The pad rotation speed was 90 rpm, the dresser rotation speed was 80 rpm, and the swing was 10 reciprocations / minute. The direction of rotation of the pad and the direction of rotation of the dresser are the same. Water was supplied to the extent that the entire surface of the grinding surface was covered with a film of water.

When 5 minutes had passed from the start of grinding, grinding was interrupted once, and the pad thickness was measured with a length measuring microscope along two diameters orthogonal to each other. One diameter was divided into 10 equal parts at equal intervals, and a total of 20 points were measured near the center of the equally divided parts, and the average value was calculated. Grinding was continued again and similar measurements were made 15 hours later. From the average value of the pad thickness, the average pad grinding speed during the grinding time of 5 minutes to 15 hours after the start of grinding was obtained. The flatness was determined as a value obtained by subtracting the minimum value from the maximum value among the values of 20 points measured after 15 hours.

The number of diamond abrasive grains that have fallen off is counted by observing the number of diamond abrasive grains that are stuck to the dresser with a microscope before and after grinding, and from the number of diamond abrasive grains that are stuck before grinding, after grinding. It was obtained by subtracting the number of fixed diamond abrasive grains.

The results of the measured pad grinding speed, pad flatness, and the number of diamond abrasive grains dropped are shown as the average grain size d, brazing filler metal thickness, brazing filler metal layer thickness / d, L / d, and d≤L <2d. Tables 1 and 2 show the abrasive grain ratios satisfying the above conditions.

As is clear from Tables 1 and 2, the dresser of the invention example in which the average particle size d of the diamond abrasive grains is 3 μm or more and less than 100 μm and the thickness of the brazing material layer is 0.1 d or more and less than 0.4 d. The grinding speed was high, the ground pad was flatter, and the diamond abrasive grains did not fall off.
On the other hand, Comparative Example No. in which the average particle size d of the diamond abrasive grains is less than 3 μm. 1 and Comparative Example No. In the dresser No. 2, the number of diamond abrasive grains dropped was 12 or more. Further, Comparative Example No. in which the average particle size d of the diamond abrasive grains is larger than 100 μm. 32 to Comparative Example No. The dresser of 35 had a large difference in pad thickness, and the flatness was deteriorated as compared with other dressers.

Comparative Example No. in which the thickness of the brazing filler metal layer is smaller than 0.1 d. 3. Comparative Example No. 7. Comparative Example No. 12. Comparative Example No. 17, Comparative Example No. 22, Comparative Example No. 27, Comparative Example No. In No. 32, the number of diamond abrasive grains dropped was 5 or more, probably because the bonding strength of the diamond abrasive grains was lowered.

Comparative Example No. in which the thickness of the brazing filler metal layer is larger than 0.4 d. 2. Comparative Example No. 6. Comparative Example No. 11. Comparative Example No. 16. Comparative Example No. 21, Comparative Example No. 26, Comparative Example No. 31, Comparative Example No. The dresser of 35 has the same L / d value in Comparative Example No. 1. Invention Example No. 5. Invention Example No. 9. Invention Example No. 14. Invention Example No. 19. Invention Example No. 24. Invention Example No. 29, Invention Example No. When compared with 34, the pad grinding speed was 0.78 to 0.85 times slower.

Invention Example No. 1 in which the ratio of the abrasive grains arranged so that the L of the adjacent abrasive grains is d ≦ L <2d is 70% or more with respect to the total number of abrasive grains. 9. Invention Example No. 14. Invention Example No. 19. Invention Example No. 24. Invention Example No. The dresser of Invention No. 29 has an abrasive grain ratio of less than 70%. 10. Invention Example No. 15. Invention Example No. 20. Invention Example No. 25, Invention Example No. When compared with 30, the pad grinding speed was almost the same, while the pad flatness was as small as 0.59 to 0.66 times.

[Example 2]
As the diamond abrasive grains, those having an average particle diameter d of 15 μm were used, and a dresser was manufactured in the same manner as in Example 1, and the pad grinding speed, pad flatness, and diamond abrasive grains fell off in the same manner as in Example 1. The number was measured.

At this time, the composition of the brazing material was changed as shown in Tables 3 and 4, except that P was 1.0% and Ti was 2.0%. The thickness of the brazing material layer was adjusted so that the thickness / d of the brazing material layer was in the range of 0.32 to 0.37. L / d was 1.5. The ratio of the abrasive grains arranged so that the distance L between the centers of the adjacent abrasive grains was d ≦ L <2d was 100% with respect to the total number of abrasive grains.

The results of the measured pad grinding speed, pad flatness and the number of diamond abrasive grains dropped out are shown in Tables 3 and 4 together with the composition of the brazing filler metal layer.

As is clear from the results of Tables 3 and 4, the content of Ni + Fe in the brazing material is 70% or more and 95% or less, Fe / (Ni + Fe) is 0.4% or less, and the content of Si + B is 2% or more and 15% or less, B / (Si + B) is 0.8% or less, P content is 0.5% or more and 4% or less, and X (Ti) content is 0.2. In the dresser of the invention example having% or more and 3% or less, the grinding speed was high, the ground pad was flatter, and the diamond abrasive grains did not fall off.

On the other hand, Invention Example No. which does not satisfy the condition that the content of Ni + Fe is 70% or more and 95% or less, or Fe / (Ni + Fe) is 0.4% or less. 41. Invention Example No. 52, Invention Example No. In the dresser of 56, one or more and three or less diamond abrasive grains were shed.

Invention Example No. which does not satisfy the condition that the Si + B content is 2% or more and 15% or less. 42, Invention Example No. At No. 51, the melting point of the brazing material probably increased, and at a brazing temperature of 1000 ° C., poor bonding of diamond abrasive grains occurred, so that one or more and three or less diamond abrasive grains fell off.

Invention Example No. in which B / (Si + B) is more than 0.8%. At 61, probably because the brazing material became brittle, three diamond abrasive grains fell off.

[Example 3]
As the diamond abrasive grains, those having an average particle diameter d of 50 μm were used, and a dresser was manufactured in the same manner as in Example 1. The number was measured.

At this time, the composition of the brazing material was changed as shown in Table 5, except that P was 3.7% and Ti was 2.8%. The thickness of the brazing material layer was adjusted so that the thickness / d of the brazing material layer was in the range of 0.32 to 0.37. L / d was set to 1.7. The ratio of the abrasive grains arranged so that the distance L between the centers of the adjacent abrasive grains was d ≦ L <2d was 100% with respect to the total number of abrasive grains.

The results of the measured pad grinding speed, pad flatness and the number of diamond abrasive grains dropped out are shown in Table 5 together with the composition of the brazing filler metal layer.

As is clear from the results in Table 5, the content of Ni + Fe in the brazing material is 70% or more and 95% or less, Fe / (Ni + Fe) is 0.4% or less, and the content of Si + B is 2% or more. 15% or less, B / (Si + B) 0.8% or less, P content 0.5% or more and 4% or less, X (Ti) content 0.2% or more 3 In the dresser of the invention example of% or less, even if the average particle size d of the diamond abrasive grains was 50 μm, the grinding speed was high, the ground pad was flatter, and the diamond abrasive grains did not fall off.

[Example 4]
As the diamond abrasive grains, those having an average particle diameter d of 15 μm were used, and a dresser was manufactured in the same manner as in Example 1, and the pad grinding speed, pad flatness, and diamond abrasive grains fell off in the same manner as in Example 1. The number was measured.

At this time, the composition of the brazing material was 0.08% for Fe, 4.2% for Si, 3.0% for B, 7.0 for Cr, and the amounts shown in Tables 6 and 7 for P and X. Ni was used as the remaining amount. The thickness of the brazing material layer was adjusted so that the thickness / d of the brazing material layer was in the range of 0.32 to 0.37. L / d was 1.5. The ratio of the abrasive grains arranged so that the distance L between the centers of the adjacent abrasive grains was d ≦ L <2d was 100% with respect to the total number of abrasive grains.

The results of the measured pad grinding speed, pad flatness and number of diamond abrasive grains dropped are shown in Tables 6 and 7 together with the composition of the brazing filler metal layer.

In Tables 6 and 7, in the column of "range of FIG. 1", the content of X and P within the range surrounded by cdghi in FIG. 1 is within the range surrounded by "A" and abci. The thing is described as "B1", the case is described as "B2" in the range surrounded by defg, and the case outside these range is described as "C". Further, in the column of "X", the element used as X is shown in parentheses.

As is clear from the results of Tables 6 and 7, the content of Ni + Fe in the brazing material is 70% or more and 95% or less, Fe / (Ni + Fe) is 0.4% or less, and the content of Si + B is 2% or more and 15% or less, B / (Si + B) is 0.8% or less, P content is 0.5% or more and 4% or less, and X (Ti) content is 0.2. In the dresser of the invention example having% or more and 3% or less, even if the average particle size d of the diamond abrasive grains is 50 μm, the grinding speed is high, the ground pad is flatter, and the diamond abrasive grains fall off 2 It was as few as less than one.

Further, Invention Example No. 1 in which X / P is 0.4 or more and 2.0 or less and is included in the range surrounded by cdghi in FIG. 89, Invention Example No. 90, Invention Example No. 94-Invention Example No. 96, Invention Example No. 99, Invention Example No. 100, Invention Example No. 103-Invention Example No. 105, Invention Example No. In 107, the diamond abrasive grains did not fall off. This is because when the X / P is in this range, the carbide that contributes to the bonding is sufficiently formed to increase the bonding strength, and the effect of suppressing the graphitization of the diamond surface by P is more sufficiently exhibited. Conceivable.

On the other hand, Invention Example No. in which the content of P is less than 0.5%. 81, Invention Example No. 86, Invention Example No. 92, Invention Example No. 98, Invention Example No. In 106, probably because the effect of suppressing graphitization by P was small, two or three diamond abrasive grains fell off.

Invention Example No. in which the content of P is more than 4.0%. 85, Invention Example No. 91, Invention Example No. 97, Invention Example No. In 102, the wetting property between the diamond abrasive grains and the brazing material was probably excessive, and the protrusion height of the diamond abrasive grains was not sufficient, so that the grinding speed tended to decrease.

Invention Example No. in which the content of X (Ti) is less than 0.2%. 110, Invention Example No. At 111, the content of carbide-forming elements was probably low, and the bonding strength due to carbide was lower, resulting in the loss of four diamond abrasive grains.

Invention Example No. in which the content of X (Ti) is greater than 3.0%. 81-Invention Example No. At 85, there was no change in grinding speed, pad flatness, or diamond abrasive grain shedding. Therefore, it is considered that the effect of X (Ti) is saturated at 3.0%.

Invention Example No. in which X / P is smaller than 0.2. 109, Invention Example No. 110, Invention Example No. At 111, the content of carbide-forming elements was probably low and the bonding strength by carbide was lower, resulting in the loss of 3 or 4 diamond abrasive grains.

[Example 5]
Among the dressers manufactured in Example 4, the number of diamond abrasive grains dropped was measured in the same manner as in Example 4 except that the load when grinding the pad was 3.5 kg for the dresser shown in Table 8.

The results of the measured number of diamond abrasive grains dropped out are shown in Table 8 together with the composition of the brazing filler metal layer.

In Table 8, in the column of "range of FIG. 1", the contents of X and P within the range surrounded by cdghi in FIG. 1 are those within the range surrounded by "A" and abci. "B1", the case within the range surrounded by defg is described as "B2", and the case outside these ranges is described as "C". Further, in the column of "X", the element used as X is shown in parentheses.

As is clear from the results in Table 8, Invention No. 1 containing Ti as the element X and having a Ti content of 0.5% or more and 3% or less. 89, Invention Example No. 90, Invention Example No. 94-Invention Example No. 96, Invention Example No. 100, Invention Example No. 103-Invention Example No. At 105, even if the load was increased to 3.5 kg, the diamond abrasive grains were less likely to fall off.

Further, Invention No. 1 containing Ti as the element X and having a Ti content of 0.5% or more and 1% or less. 103-Invention Example No. In 105, even if the load was increased to 3.5 kg, the diamond abrasive grains did not fall off.

On the other hand, Invention Example No. in which the Ti content is less than 0.5%. 107, Invention Example No. In 108, when the load was increased to 3.5 kg, the number of diamond abrasive grains dropped increased.

[Example 6]
As the diamond abrasive grains, those having an average particle diameter d of 15 μm were used, and a dresser was manufactured in the same manner as in Example 1, and the pad grinding speed, pad flatness, and diamond abrasive grains fell off in the same manner as in Example 1. The number was measured.

At this time, the composition of the brazing material was 0.08% for Fe, 4.2% for Si, 3.0% for B, 7.0 for Cr, and the amounts shown in Tables 9 and 10 for P and X. Ni was used as the remaining amount. The thickness of the brazing material layer was adjusted so that the thickness / d of the brazing material layer was in the range of 0.32 to 0.37. L / d was 1.5. The ratio of the abrasive grains arranged so that the distance L between the centers of the adjacent abrasive grains was d ≦ L <2d was 100% with respect to the total number of abrasive grains.

The results of the measured pad grinding speed, pad flatness and number of diamond abrasive grains dropped are shown in Tables 9 and 10 together with the composition of the brazing filler metal layer.

In Tables 9 and 10, in the column of "range of FIG. 1", the content of X and P within the range surrounded by cdghi in FIG. 1 is within the range surrounded by "A" and abci. The thing is described as "B1", the case is described as "B2" in the range surrounded by defg, and the case outside these range is described as "C". Further, in the column of "X", the element used as X is shown in parentheses.

As is clear from the results in Tables 9 and 10, the dresser of the invention example containing Nb, Ta, V or Zr as X also has a high grinding speed, the ground pad is flatter, and the diamond abrasive grains. The number of dropouts was as small as 2 or less.

Further, as in the case where X is Ti, X / P is 0.4 or more and 2.0 or less, and the invention example No. 1 included in the range surrounded by cdghi in FIG. 122-Invention Example No. 124, Invention Example No. 126, Invention Example No. 128-Invention Example No. 130, Invention Example No. 132, Invention Example No. 134-Invention Example No. 136, Invention Example No. 138, Invention Example No. 140-Invention Example No. 142, Invention Example No. At 144, the diamond abrasive grains did not fall off. This is because when the X / P is in this range, the carbide that contributes to the bonding is sufficiently formed to increase the bonding strength, and the effect of suppressing the graphitization of the diamond surface by P is more sufficiently exhibited. Conceivable.

[Example 7]
As the diamond abrasive grains, those having an average particle diameter d of 15 μm were used, and a dresser was manufactured in the same manner as in Example 1, and the pad grinding speed, pad flatness, and diamond abrasive grains fell off in the same manner as in Example 1. The number was measured. However, the number of diamond abrasive grains dropped was measured both when the load when grinding the pad was 1.0 kg and when the load was 3.5 kg.

At this time, the composition of the brazing filler metal is 0.08% for Fe, 4.2% for Si, 3.0% for B, 7.0 for Cr, and P and X are shown in Table 11, Table 12 and Table 13. The amount of Ni was used as the remaining amount. The thickness of the brazing material layer was adjusted so that the thickness / d of the brazing material layer was in the range of 0.32 to 0.37. L / d was 1.5. The ratio of the abrasive grains arranged so that the distance L between the centers of the adjacent abrasive grains was d ≦ L <2d was 100% with respect to the total number of abrasive grains.

The results of the measured pad grinding speed, pad flatness and number of diamond abrasive grains dropped are shown in Tables 11, 12 and 13 together with the composition of the brazing filler metal layer.

In addition, in Table 11, Table 12, and Table 13, in the column of "range of FIG. 1", the content of X and P within the range surrounded by cdghi of FIG. 1 is indicated as "A". Further, in the column of "X", the element used as X is shown in parentheses.

As is clear from the results in Tables 11 to 13, the dresser of the present invention containing two or more elements of Ti, Nb, Ta, V or Zr as X also has a high grinding speed and is ground. It was flatter and no diamond abrasive grains fell off at a weight of 1 kg.

However, Invention Example No. that does not contain Ti. 167-Invention Example No. In the dresser of 178, when the load was 3.5 kg, 2 or more and 4 or less diamond abrasive grains were found to fall off.

Further, Invention No. 1 in which the content of X is in the range of 0.2% or more and 3% or less, and the content of Ti is less than 0.5% even if at least Ti is contained as X. 151, Invention Example No. 155, Invention Example No. 159, Invention Example No. On the 163 dresser, two diamond abrasive grains were found to fall off when the load was 3.5 kg.

Further, Invention No. 1 in which the content of X is in the range of 0.2% or more and 3% or less, and the content of Ti is more than 1.0% even if at least Ti is contained as X. 154, Invention Example No. 158, Invention Example No. 162, Invention Example No. On the 166 dresser, one diamond abrasive grain was found to fall off when the load was 3.5 kg.

From these results, when at least Ti is contained as the element X and the Ti content is 0.5% ≤ Ti ≤ 1%, the bonding force of the diamond abrasive grains is increased and the diamond abrasive grains can be suppressed from falling off. I understood.

[Example 8]
A brazing filler metal layer was produced in the same manner as in Example 1.

As the metal support material, a disk made of SUS304 stainless steel having a diameter of 100 mm and a thickness of 4 mm was used. Diamond abrasive grains having an average particle diameter d of 50 μm were arranged in a donut-shaped region between a circle having a radius of 35 mm and a circle having a radius of 48 mm drawn on one side of the metal support material. At that time, the donut-shaped region was divided into six arc-shaped regions at an equal angle when viewed from the center of the metal support material, and a region having a width of 2 mm and not arranging abrasive grains was provided in the arc-shaped regions adjacent to each other.

A mesh was drawn in a grid pattern in the diamond abrasive grain arrangement area, and diamond abrasive grains were arranged at the intersections. The lattice spacing corresponds to the distance L between the centers of the abrasive grains. At that time, the lattice spacing was set to 85 μm (L = 1.7d) and 160 μm (L = 3.2d), and both were randomly arranged at a predetermined ratio. Specifically, first, a foil-like brazing material was temporarily attached to the diamond arrangement region of the stainless steel support material by spot welding. Next, a sieve having holes through which the diamond could pass was prepared, and the sieve was placed on a support material and the diamond was placed through the sieve. For positioning in the holes when making holes in the sieve, a grid in which a grid having an interval of 85 μm and a grid having a spacing of 160 μm were randomly arranged was drawn, and a hole was made in each of the grid points. When the number of lattice sides where L is 85 μm is N85 and the number where L is 160 μm is N160, {N85 / (N85 + N160)} × 100 (%) is designed to be the value shown in Table 8.

In this way, each dresser shown in Table 14 was manufactured.

For each dresser shown in Table 14, the pad grinding speed, pad flatness and the number of diamond abrasive grains dropped were measured in the same manner as in Example 1.

The results of the measured pad grinding speed, pad flatness and the number of diamond abrasive grains dropped are shown in Table 14 together with {N85 / (N85 + N160)} × 100 (%).

As is clear from the results in Table 14, the invention in which the ratio of the abrasive grains arranged so that the L of the adjacent abrasive grains is d ≦ L <2d is 70% or more with respect to the total number of abrasive grains. Example No. 181-Invention Example No. With the 183 dresser, the grinding speed was faster and the ground pads were flatter.

Therefore, the dresser for polishing cloth of the present invention can be applied to dressing of polishing pads of various polishing devices.

Claims (7)

A dresser for polishing cloth in which a plurality of diamond abrasive grains are fixed in a single layer on the surface of a metal support material.
The diamond abrasive grains are bonded and fixed to the surface of the metal support material via a brazing material layer containing a brazing material.
The composition of the brazing filler metal is% by mass.
70% ≤ Ni + Fe ≤ 95% (however, 0 ≤ Fe / (Ni + Fe) ≤ 0.4),
2% ≤ Si + B ≤ 15% (however, 0 ≤ B / (Si + B) ≤ 0.8),
1% ≤ Cr ≤ 15%,
0.5% ≤ P ≤ 4%, and
0.2% ≤ X ≤ 3%
(However, X is at least one element selected from the group consisting of Ti, Nb, Ta, V and Zr, and 0.4 ≦ X / P ≦ 2.0 )
A dresser for polishing cloth, which is characterized by being. The polishing cloth according to claim 1, wherein the brazing material contains at least Ti as the element X, and the content of Ti is 0.5% ≤ Ti ≤ 3% in mass%. dresser. The polishing according to claim 1 or 2 , wherein the brazing material contains at least Ti as the element X, and the content of Ti is 0.5% ≤ Ti ≤ 1% in mass%. Dresser for cloth. The dresser for a polishing cloth according to any one of claims 1 to 3 , wherein the average particle size d of the diamond abrasive grains is 3 μm or more and less than 100 μm. The dresser for polishing cloth according to any one of claims 1 to 4 , wherein the thickness of the brazing filler metal layer is 0.1 d or more and less than 0.4 d. When the distance between the centers of adjacent diamond abrasive grains is L,
The ratio of the abrasive grains arranged so that the L of the adjacent abrasive grains is d ≦ L <2d with respect to the total number of abrasive grains of the dresser for polishing cloth is 70% or more with respect to the total number of abrasive grains. Characterized by being
The dresser for polishing cloth according to any one of claims 1 to 5. The dresser for a polishing cloth according to any one of claims 1 to 6 , wherein the metal support material is made of stainless steel.

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