JP6909854B2 - Coating processing equipment, coating processing method and computer storage medium - Google Patents

Description

(Cross-reference of related applications)
This application claims priority based on Japanese Patent Application No. 2017-145753 filed in Japan on July 27, 2017, the contents of which are incorporated herein by reference.

The present invention relates to a coating treatment apparatus for applying a coating liquid containing an optical material to a substrate, a coating treatment method using the coating treatment apparatus, and a computer storage medium.

For example, an organic light emitting diode (OLED) uses a circular polarizing plate to prevent reflection of external light. The circular polarizing plate is manufactured by laminating a linear polarizing plate and a wave plate (phase difference plate) so that their polarization axes intersect at 45 degrees. Further, in a liquid crystal display (LCD), these linear polarizing plates and wave plates are also used in order to control the optical rotation and birefringence in the display.

Further, for example, only the wave plate may be formed so that its polarization axis is tilted at 15 degrees or 75 degrees. Therefore, it is necessary to form the polarizing plate and the wave plate at an arbitrary angle. Further, in order to intersect the polarization axes of the polarizing plate and the wave plate at an arbitrary angle, it is also necessary to form these polarizing plates and the wave plate individually.

Conventionally, such a polarizing plate or a wave plate has been produced by using, for example, a stretched film. A stretched film is a film in which molecules in the material are oriented in one direction by stretching the film in one direction and attaching the film.

By the way, in recent years, with the thinning of OLEDs and LCDs, there is also a demand for thinning of polarizing plates and wave plates. However, when a stretched film is used in producing a polarizing plate or a wave plate as in the conventional case, there is a limit to reducing the film thickness of the stretched film itself, and a sufficient thin film cannot be obtained.

Therefore, a coating liquid having a predetermined material is applied onto the substrate to form a polarizing plate or a wave plate having a required film thickness, thereby thinning the film. Specifically, for example, a coating liquid having a liquid crystal property as a predetermined material is applied to a substrate, and the coating liquid is cast and oriented. The liquid crystal compound forms a supramolecular aggregate in the coating liquid, and when the coating liquid is flowed while applying shear stress, the supramolecular aggregate is oriented in the flow direction in the long axis direction.

For example, the polarizing film printing apparatus described in Patent Document 1 has a table for holding a substrate and a slot die for ejecting ink liquid onto the substrate. The table has a structure in which the surface plate is fitted into a frame plate in which the surface plate is hollowed out, so that the height of the peripheral portion of the surface plate is the same as the surface of the substrate fixed to the surface plate. The slot die is stretched to cover at least the surface plate. Then, the substrate is fixed with the platen arranged in the printing direction, the platen is rotated, the substrate is tilted at a predetermined angle with respect to the printing direction, and then the slot die is moved in the printing direction to fix the substrate. Apply ink solution to.

Japanese Patent Application Laid-Open No. 2005-62502

However, in the polarizing film printing apparatus described in Patent Document 1, the platen on which the substrate is fixed is rotated, and the rotation of the platen causes the substrate to be rotated at a predetermined position (a position parallel to the printing direction). It is for receiving, not for controlling the coating direction. In other words, the application direction of the ink liquid to the substrate is fixed, and the application direction cannot be freely controlled.

Further, when the polarizing film printing apparatus described in Patent Document 1 is used, since the slot die is stretched so as to cover at least the surface plate, the substrate fixed to the surface plate when the ink liquid is applied to the substrate. At the same time as the ink liquid is ejected to the surface plate, the ink liquid is also ejected and adheres to the surface plate on the outside of the substrate and the frame plate around the surface plate. Therefore, it is necessary to clean the surface plate and the frame plate with a single sheet for each coating process of the substrate, which is troublesome.

The present invention has been made in view of this point, and an object of the present invention is to appropriately and efficiently apply a coating liquid containing an optical material to a substrate at an arbitrary angle.

One aspect of the present invention that solves the above problems is a coating processing apparatus that applies a coating liquid containing an optical material to a substrate, and the coating liquid is applied to a holding portion that holds the substrate and a substrate that is held by the holding portion. A coating nozzle for discharging the is to have a, a receiver unit for receiving a said coating liquid, the liquid receiving portion provided on one side in a plan view outside of the substrate, the winding member for winding said coating liquid discharged from the coating nozzle The liquid receiving portion provided on the other side of the substrate on the outside in a plan view has a sealing material for sealing the discharge port of the coating nozzle.
One aspect of the present invention is a coating processing apparatus for applying a coating liquid containing an optical material to a substrate, a holding portion for holding the substrate and a coating nozzle for discharging the coating liquid onto the substrate held by the holding portion. A moving mechanism for relatively moving the holding portion and the coating nozzle in the orthogonal direction, and the coating liquid provided on both sides of the substrate held by the holding portion on both sides of the substrate and discharged from the coating nozzle. It has a liquid receiving portion that receives the liquid, and the liquid receiving portion is provided on the side close to the substrate, and is provided on the winding material that winds up the coating liquid discharged from the coating nozzle and on the side far from the substrate. , A composite material in which a sealing material for sealing the discharge port of the coating nozzle and the sealing material are integrally connected.
One aspect of the present invention is a coating processing apparatus for applying a coating liquid containing an optical material to a substrate, a holding portion for holding the substrate and a coating nozzle for discharging the coating liquid to the substrate held by the holding portion. A moving mechanism for relatively moving the holding portion and the coating nozzle in the orthogonal direction, and the coating liquid provided on both sides of the substrate held by the holding portion on the outside in a plan view and discharged from the coating nozzle. It has a liquid receiving unit and a control unit that receive the liquid, and the control unit controls the relative moving speed of the holding unit and the coating nozzle to apply shear stress to the coating liquid to apply the coating liquid. The holding portion, the coating nozzle, and the moving mechanism are controlled so that the molecules inside are oriented in one direction.
One aspect of the present invention is a coating processing apparatus for applying a coating liquid containing an optical material to a substrate, a holding portion for holding the substrate and a coating nozzle for discharging the coating liquid to the substrate held by the holding portion. A moving mechanism for relatively moving the holding portion and the coating nozzle in the orthogonal direction, and the coating liquid provided on both sides of the substrate held by the holding portion on the outer side of the plan view and discharged from the coating nozzle. The liquid receiving portion has a liquid receiving portion that receives the liquid, and the liquid receiving portion has a winding material that winds up the coating liquid discharged from the coating nozzle, and the winding material is in the moving direction of the holding portion. A roller that extends in an orthogonal direction and rotates in the same direction as the movement direction of the holding portion.
One aspect of the present invention is a coating processing apparatus for applying a coating liquid containing an optical material to a substrate, a holding portion for holding the substrate and a coating nozzle for discharging the coating liquid onto the substrate held by the holding portion. A moving mechanism for relatively moving the holding portion and the coating nozzle in the orthogonal direction, and the coating liquid provided on both sides of the substrate held by the holding portion on both sides of the substrate and discharged from the coating nozzle. It has a liquid receiving portion for receiving the liquid, and the liquid receiving portion has a pair of rollers extending in the moving direction of the holding portion and a belt wound around the pair of rollers.

According to one aspect of the present invention, since the holding portion and the coating nozzle move relatively in the orthogonal direction by the moving mechanism, the coating is applied to the substrate by controlling the relative moving speed of the holding portion and the coating nozzle. The coating direction of the coating liquid can be arbitrarily controlled. With such a simple configuration and simple control, the coating liquid can be applied to the substrate at an arbitrary angle. Further, since the coating liquid is received by the liquid receiving portions on both sides of the substrate held by the holding portion on the outside in the plan view, it is possible to prevent the coating liquid from dripping and adhering to the holding portion. There is no need to wash the retainer with leaves. Therefore, the coating liquid can be appropriately and efficiently applied to the substrate.

One aspect of the present invention from another viewpoint is a coating treatment method in which a coating liquid containing an optical material is applied to a substrate, while the holding portion holding the substrate and the coating nozzle are relatively moved in the orthogonal direction. The coating liquid is discharged from the coating nozzle, the coating liquid is received by the liquid receiving portions on both sides of the outside of the plan view of the substrate, the coating liquid is applied to the substrate, and the coating liquid is provided on one side of the outside of the plan view of the substrate. The liquid receiving portion has a take-up material that winds up the coating liquid discharged from the coating nozzle, and the liquid receiving portion provided on the other side outside the plan view of the substrate discharges the coating nozzle. It has a sealing material that seals the outlet.
One aspect of the present invention is a coating treatment method for applying a coating liquid containing an optical material to a substrate, from the coating nozzle while relatively moving the holding portion holding the substrate and the coating nozzle in the orthogonal direction. The coating liquid is discharged, the coating liquid is received by the liquid receiving portions on both sides outside the plan view of the substrate, the coating liquid is applied to the substrate, and the liquid receiving portions are provided on the side close to the substrate. It has a composite material in which a take-up material that winds up the coating liquid discharged from the coating nozzle and a sealing material that is provided on the far side of the substrate and seals the discharge port of the coating nozzle are integrally connected. ..

Another aspect of the present invention is a readable computer storage medium containing a program running on the computer of the control unit that controls the coating processing apparatus so that the coating processing method is executed by the coating processing apparatus. Is.

According to one aspect of the present invention, a coating liquid containing an optical material can be appropriately and efficiently applied to a substrate at an arbitrary angle.

It is a top view which shows the outline of the structure of the coating processing apparatus which concerns on 1st Embodiment. It is a side view which shows the outline of the structure of the coating processing apparatus which concerns on 1st Embodiment. It is a side view which shows the outline of the structure of the coating processing apparatus which concerns on 1st Embodiment. It is a perspective view which shows the outline of the structure of the coating nozzle which concerns on 1st Embodiment. It is explanatory drawing which shows the state of receiving the coating liquid in the liquid receiving part which concerns on 1st Embodiment. It is a side view which shows the outline of the structure of the liquid receiving part which concerns on 1st Embodiment. It is explanatory drawing which shows the operation of the glass substrate and the coating nozzle at the time of forming a linear polarizing film in 1st Embodiment. It is explanatory drawing which shows the operation of the glass substrate and the coating nozzle at the time of forming a λ / 4 wavelength film in 1st Embodiment. It is a side view which shows the outline of the structure of the coating processing apparatus which concerns on 2nd Embodiment. It is a side view which shows the outline of the structure of the coating processing apparatus which concerns on 2nd Embodiment. It is explanatory drawing which shows the state of receiving the coating liquid in the liquid receiving part which concerns on 2nd Embodiment. It is explanatory drawing which shows the state of receiving the coating liquid in the liquid receiving part which concerns on 3rd Embodiment. It is explanatory drawing which shows the state of receiving the coating liquid in the liquid receiving part which concerns on 4th Embodiment. It is explanatory drawing which shows the state of receiving the coating liquid in the liquid receiving part which concerns on 5th Embodiment. It is explanatory drawing which shows the state of receiving the coating liquid in the liquid receiving part which concerns on 6th Embodiment. It is a side view which shows the outline of the structure of the coating processing apparatus which concerns on 7th Embodiment. It is a side view which shows the outline of the structure of the coating processing apparatus which concerns on 8th Embodiment. It is a side view which shows the outline of the structure of the coating processing apparatus which concerns on 8th Embodiment. It is a top view which shows the outline of the structure of the coating processing apparatus which concerns on 9th Embodiment. It is a top view which shows the outline of the structure of the coating processing apparatus which concerns on tenth embodiment.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the present specification and the drawings, elements having substantially the same functional configuration are designated by the same reference numerals, so that duplicate description will be omitted.

<Optical film formation>
In the present embodiment, when the circular polarizing plate used for the OLED is manufactured, the polarization axes of the linear polarizing film (linear polarizing plate) and the λ / 4 wavelength film (λ / 4 wave plate), which are optical films, are It is formed on a glass substrate so as to intersect at 45 degrees.

When forming the linearly polarizing film and the λ / 4 wavelength film, a coating treatment, a vacuum drying treatment, a heat treatment, a film fixing treatment, and a film removal treatment are sequentially performed, respectively.

First, a linear polarizing film is formed on a glass substrate. In the coating process for a linear polarizing film, a coating liquid (coating liquid for a polarizing film) is applied to the entire surface of a glass substrate. At this time, the molecules are oriented in one direction by applying a unidirectional shear stress to the coating liquid. After that, in the vacuum drying treatment, the solvent in the film is removed by drying the linear polarizing film under reduced pressure, and the orientation state of the molecules in the film is appropriately maintained. After that, in the heat treatment, the solvent remaining in the film is completely removed by heating the linearly polarizing film to a predetermined temperature. After that, in the film fixing process, the fixing material is applied to the pixel area of the glass substrate to inactivate (insolubilize) the linear polarizing film and fix the inactivated linear polarizing film on the glass substrate. After that, in the film removing treatment, a cleaning liquid is supplied to the glass substrate to selectively remove the linearly polarizing film that has not been fixed by the film fixing treatment.

Once the linearly polarizing film is formed on the glass substrate, then a λ / 4 wavelength film is further formed on the glass substrate. In the coating process for the λ / 4 wavelength film, the coating liquid (coating liquid for wavelength film) is applied to the entire surface of the glass substrate. At this time, by applying a shear stress in the direction tilted 45 degrees from one direction (diagonal 45 degrees direction) in the linear polarizing film to the coating liquid, the molecules are oriented in the diagonal 45 degrees direction. The subsequent vacuum drying treatment, heat treatment, film fixing treatment, and film removal treatment are the same as those for forming the linearly polarizing film.

In this way, the linearly polarizing film and the λ / 4 wavelength film are formed on the glass substrate so that their polarization axes intersect at 45 degrees. In the following description, a coating treatment apparatus and a coating treatment method for applying the coating liquid to the glass substrate at an arbitrary angle will be described.

<First Embodiment>
Next, the coating processing apparatus according to the first embodiment of the present invention will be described. FIG. 1 is a plan view showing an outline of the configuration of the coating processing apparatus 1 according to the first embodiment. 2 and 3 are side views showing an outline of the configuration of the coating processing apparatus 1 according to the first embodiment. In the drawings shown below, in order to clarify the positional relationship, the X-axis direction, the Y-axis direction, and the Z-axis direction that are orthogonal to each other are defined, and the Z-axis positive direction is defined as the vertically upward direction.

The coating processing device 1 receives the stage 10 as a holding portion for holding the glass substrate G, the coating nozzle 20 for discharging the coating liquid to the glass substrate G, and the coating liquid discharged from the end of the coating nozzle 20. It has a part 30 and.

The stage 10 adsorbs and holds the back surface of the glass substrate G so that the front surface on which the coating liquid is applied faces upward. The stage 10 has a shape smaller than that of the glass substrate G or the same shape as the glass substrate G in a plan view. The stage 10 is configured to be movable in the Y-axis direction by a moving mechanism (not shown). The moving range of the stage 10 is at least the length of two sheets in the Y-axis direction of the glass substrate G, and the glass substrate G when the stage 10 is located at the end in the negative direction in the Y-axis direction (in FIG. 1). The solid line, substrate position A1) and the glass substrate G (dotted line in FIG. 1, substrate position A2) when the stage 10 is located at the end in the positive direction in the Y-axis direction do not overlap in a plan view.

The coating nozzle 20 is provided above the stage 10 and discharges the coating liquid onto the glass substrate G held on the stage 10. The coating nozzle 20 is a long slit nozzle that extends in a direction (X-axis direction) orthogonal to the moving direction (Y-axis direction) of the glass substrate G held by the stage 10. As shown in FIG. 4, a discharge port 21 for discharging the coating liquid to the glass substrate G is formed on the lower end surface of the coating nozzle 20. The discharge port 21 is a slit-shaped discharge port that extends along the longitudinal direction (X-axis direction) of the coating nozzle 20 longer than the length of the glass substrate G in the X-axis direction.

As shown in FIGS. 1 to 3, the coating nozzle 20 is supported by a support beam 22 extending in the X-axis direction. The coating nozzle 20 is configured to be movable along the support beam 22 by a moving mechanism (not shown). The coating nozzle 20 has a negative side in the X-axis direction of the glass substrate G (solid line in FIG. 1, nozzle position B1) and a positive side in the X-axis direction of the glass substrate G (dotted line in FIG. 1, nozzle position B2). Move between. Then, at any position between the nozzle position B1 and the nozzle position B2, the coating nozzle 20 discharges the coating liquid from the ejection port 21 so as to cover the X-axis direction of the glass substrate G.

In this way, the stage 10 and the coating nozzle 20 move in the orthogonal direction. Then, the coating nozzle 20 can apply the coating liquid to the glass substrate G held on the stage 10. Further, by controlling the moving speed of the stage 10 and the moving speed of the coating nozzle 20, the coating direction of the coating liquid applied to the glass substrate G can be arbitrarily controlled.

The coating liquid discharged from the coating nozzle 20 is a coating liquid containing an optical material. Specifically, it is a coating liquid for a polarizing film for forming a linear polarizing film and a coating liquid for a wavelength film for forming a λ / 4 wavelength film. Any liquid crystal compound such as a compound is included.

The liquid receiving portions 30 are provided on both sides of the glass substrate G held on the stage 10 on the outer side in the X-axis direction. Each of the liquid receiving portions 30 includes a roller 31 as a take-up material for winding the coating liquid discharged from the end of the coating nozzle 20, a recovery tank 32 for collecting the coating liquid wound on the roller 31, and a roller 31. And a support frame 33 as a support structure for supporting the recovery tank 32.

The roller 31 is provided so as to extend in the X-axis direction. The end of the roller 31 on the glass substrate G side is located close to the glass substrate G so as not to come into contact with the glass substrate G. The end of the roller 31 on the opposite side of the glass substrate G is located outside the coating nozzles 20 at the nozzle positions B1 and B2, respectively. Then, as shown in FIG. 5, when the coating liquid P is discharged from the coating nozzle 20 to the glass substrate G, the coating liquid P discharged from the end of the coating nozzle 20 rotates in the same direction as the moving direction of the glass substrate G. It is wound up by a roller 31 and collected.

Further, the roller 31 winds up the coating liquid P with a predetermined gap from the discharge port 21 of the coating nozzle 20. Then, when the coating liquid P is applied to the glass substrate G, the beads of the coating liquid P discharged from the coating nozzle 20 are not disturbed. Further, in the present embodiment, the roller 31 is arranged so that the upper surface of the roller 31 and the upper surface of the glass substrate G held by the stage 10 are at the same height. In other words, the roller 31 acts like an extension (pseudo substrate) of the glass substrate G. In such a case, the distance between the gap between the roller 31 and the coating nozzle 20 and the distance between the gap between the glass substrate G and the coating nozzle 20 become the same, and the state of the coating liquid P in these gaps, for example, the amount of the coating liquid P becomes Since it is the same, the bead of the coating liquid P from the coating nozzle 20 can be more appropriately stabilized.

Although there is a slight gap between the roller 31 and the glass substrate G in the X-axis direction, the coating liquid P does not drip from this gap due to the surface tension of the coating liquid P. Further, when the viscosity of the coating liquid P is high, the gap may be wide, but when the viscosity of the coating liquid P is low, the gap is preferably narrow. Further, for example, in consideration of the movement of the coating nozzle 20 in the X-axis direction, the size of the gap between the roller 31 and the glass substrate G is set to be different on the left and right sides of the glass substrate G (both sides of the coating nozzle 20 in the moving direction). May be good.

As shown in FIG. 6, the recovery tank 32 is provided below the roller 31 so as to cover the roller 31. The upper surface of the recovery tank 32 is opened, and the coating liquid P wound up by the roller 31 is collected and temporarily stored. At this time, in the recovery tank 32, the lower part of the roller 31 is immersed in the coating liquid P. Water may be supplied to the coating liquid P temporarily stored in the recovery tank 32, and the coating liquid P may be dissolved in water.

The bottom surface of the recovery tank 32 is inclined downward toward the central portion, and the drainage pipe 34 of the coating liquid P is connected to the central portion thereof. An overflow pipe (not shown) for preventing the coating liquid P from overflowing is connected to the side surface of the recovery tank 32. Then, the coating liquid P stored in the recovery tank 32 is discharged from the drainage pipe 34 and the overflow pipe. The coating liquid P discharged from the drainage pipe 34 in this way may be reused for the glass substrate G to be processed in the next and subsequent processes.

As shown in FIGS. 2 and 3, the support frame 33 supports the roller 31 and the recovery tank 32 from below. In such a case, for example, during maintenance of the roller 31 and the recovery tank 32, the roller 31 and the recovery tank 32 can be easily replaced together with the support frame 33. Further, since the support frame 33 does not interfere with the coating nozzle 20, the coating nozzle 20 can be easily replaced during maintenance of the coating nozzle 20.

As shown in FIG. 1, the above coating processing apparatus 1 is provided with a control unit 40. The control unit 40 is, for example, a computer and has a program storage unit (not shown). The program storage unit stores a program that controls the coating process in the coating processing device 1. This program was recorded on a computer-readable storage medium H such as a computer-readable hard disk (HD), flexible disk (FD), compact disk (CD), magnet optical desk (MO), or memory card. It may be the one installed in the control unit 40 from the storage medium H.

Next, a coating treatment method for performing the coating treatment apparatus 1 configured as described above will be described.

First, a linear polarizing film is formed on the glass substrate G. Specifically, as shown in FIG. 7, the coating liquid P1 is applied to the entire surface of the glass substrate G in the coating processing apparatus 1. The coating liquid P1 in this case is a coating liquid for a polarizing film for forming a linear polarizing film. Further, in the coating processing apparatus 1, the glass substrate G is moved from the substrate position A1 to the substrate position A2 without moving the coating nozzle 20 from the nozzle position B1. The position of the coating nozzle 20 is not limited to the nozzle position B1, and may be any position between the nozzle position B1 and the nozzle position B2.

As shown in FIG. 7A, the glass substrate G is held by the stage 10 at the substrate position A1. Subsequently, as shown in FIG. 7B, while discharging the coating liquid P1 from the coating nozzle 20, the glass substrate G is moved in the positive direction in the Y-axis direction, and the coating liquid P1 is applied to the glass substrate G. Then, as shown in FIG. 7C, the glass substrate G moves to the substrate position A2, and the coating liquid P1 is applied to the entire surface of the glass substrate G.

At this time, the coating liquid P1 discharged from the end of the coating nozzle 20, that is, the coating liquid P1 discharged to the outside of the glass substrate G is wound up by the roller 31 and collected. Therefore, the coating liquid P1 does not drip downward.

At this time, the coating liquid P1 is applied while applying shear stress (block arrow in FIG. 7). Since the coating nozzle 20 does not move and the glass substrate G moves in the positive direction in the Y-axis direction, the shear stress is applied in the positive direction in the Y-axis direction.

The shear stress (shear rate) is a value obtained by dividing the coating speed (moving speed of the coating nozzle 20 with respect to the glass substrate G) by the distance (gap) between the glass substrate G and the discharge port 21 of the coating nozzle 20. Since a slit nozzle is used for the coating nozzle 20, the coating nozzle 20 can be sufficiently close to the glass substrate G without damaging the glass substrate G. Therefore, the gap can be reduced. Then, by controlling the moving speed of the coating nozzle 20, sufficient shear stress can be applied to the coating liquid P1. As a result, the molecules in the coating liquid P1 can be oriented in one direction (Y-axis direction).

Although a nozzle other than the slit nozzle can be used for the coating nozzle 20, the slit nozzle is preferable from the viewpoint that the gap can be made as small as possible as described above. Further, the film thickness of the coating liquid P1 applied to the glass substrate G is small, and the slit nozzle is suitable from this viewpoint as well.

Next, a λ / 4 wavelength film is formed on the glass substrate G. Specifically, as shown in FIG. 8, the coating liquid P2 is applied to the entire surface of the glass substrate G in the coating processing apparatus 1. The coating liquid P2 in this case is a wavelength film coating for forming a λ / 4 wavelength film. Further, in the coating processing apparatus 1, the glass substrate G is moved from the substrate position A1 to the substrate position A2, and the coating nozzle 20 is moved from the nozzle position B1 to the nozzle position B2. At this time, the moving speed of the glass substrate G and the moving speed of the coating nozzle 20 are the same.

As shown in FIG. 8A, the glass substrate G is held by the stage 10 at the substrate position A1. Subsequently, as shown in FIG. 8B, the glass substrate G is moved in the positive direction in the Y-axis direction, and the coating nozzle 20 is moved in the positive direction in the X-axis direction while discharging the coating liquid P2 from the coating nozzle 20. , The coating liquid P2 is applied to the glass substrate G. Then, as shown in FIG. 8C, the glass substrate G moves to the substrate position A2, and the coating nozzle 20 moves to the nozzle position B2, so that the coating liquid P2 is applied to the entire surface of the glass substrate G.

At this time, even if the coating nozzle 20 moves between the nozzle position B1 and the nozzle position B2, the coating liquid P2 discharged from the end of the coating nozzle 20, that is, the coating liquid P2 discharged to the outside of the glass substrate G. Is wound up by a roller 31 and collected. Therefore, the coating liquid P1 does not drip downward.

At this time, the coating liquid P2 is applied while applying shear stress (block arrow in FIG. 8). That is, since the moving speed of the glass substrate G and the moving speed of the coating nozzle 20 are the same, the shear stress is applied in the positive direction in the Y-axis direction and the positive direction in the X-axis direction at an angle of 45 degrees.

Further, by controlling the moving speed of the glass substrate G and the moving speed of the coating nozzle 20, sufficient shear stress can be applied to the coating liquid P2. As a result, the molecules in the coating liquid P2 can be oriented in one direction (obliquely 45 degrees).

According to the above embodiment, in the coating processing apparatus 1, the glass substrate G and the coating nozzle 20 held on the stage 10 move in the orthogonal directions, respectively, so that the moving speed of the glass substrate G and the movement of the coating nozzle 20 By controlling the speed, it is possible to control the coating direction of the coating liquid applied to the glass substrate G. With such a simple configuration and simple control, the coating liquid can be applied to the glass substrate G at an arbitrary angle. Then, the coating direction of the coating liquid P1 and the coating direction of the coating liquid P2 can be intersected at 45 degrees, and the linear polarizing film and the λ / 4 wavelength film can be formed so that their polarization axes intersect at 45 degrees.

Further, since the coating liquid P is wound and collected by the liquid receiving portions 30 (rollers 31) on both outer sides of the glass substrate G, it is possible to prevent the coating liquid P from dripping. As a result, it is possible to prevent the coating liquid P from dripping and adhering to the stage 10, and it is not necessary to wash the stage 10 with a single leaf as in the conventional case. Further, when the coating liquid P recovered in the recovery tank 32 is reused, it is possible to reduce the amount of the coating liquid P used.

<Second embodiment>
Next, the coating processing apparatus according to the second embodiment of the present invention will be described. 9 and 10 are side views showing an outline of the configuration of the coating processing apparatus 1 according to the second embodiment.

The configuration of the liquid receiving portion in the coating processing apparatus 1 is different between the second embodiment and the first embodiment. That is, in the coating processing device 1 of the second embodiment, the liquid receiving unit 100 is provided in place of the liquid receiving unit 30 of the first embodiment.

The liquid receiving portions 100 are provided on both sides of the glass substrate G held on the stage 10 on the outer side in the X-axis direction. Each liquid receiving portion 100 has a deckle 101 as a sealing material for sealing the discharge port at the end of the coating nozzle 20, and a support frame 102 as a support structure for supporting the deckle 101 from below. There is.

The deckle 101 is provided so as to extend in the X-axis direction. The end portion of the deckle 101 on the glass substrate G side is located close to the glass substrate G so as not to come into contact with the glass substrate G. The end of the deckle 101 on the opposite side of the glass substrate G is located outside the coating nozzles 20 at the nozzle positions B1 and B2, respectively. Then, as shown in FIG. 11, the deckle 101 comes into close contact with the end of the coating nozzle 20, so that the end of the coating nozzle 20 (discharge port 21) is sealed. As a result, the coating liquid P at the end of the coating nozzle 20 is also sealed and is not discharged.

The cross-sectional shape of the deckle 101 is not limited as long as it can be sealed in close contact with the end of the coating nozzle 20. As in the example illustrated in this embodiment, the upper surface may be a flat rectangular shape, or may be, for example, a V-shape described in Japanese Patent Application Laid-Open No. 2013-165137. Further, for the deckle 101, it is preferable to use a material that suppresses the generation of particles when it comes into close contact with the coating nozzle 20, such as silicon rubber or fluororubber.

Also in this embodiment, the same effect as that of the first embodiment can be enjoyed. Moreover, since the Dickel 101 seals the end portion of the coating nozzle 20 and the coating liquid P is not discharged from the end portion of the coating nozzle 20, it is possible to reduce the amount of the coating liquid P used. Further, since the deckle 101 is in close contact with the coating nozzle 20, the coating liquid P adhering to the discharge port 21 can be wiped off, and the discharge port 21 can always be kept clean.

<Third embodiment>
Next, the coating processing apparatus according to the third embodiment of the present invention will be described. FIG. 12 is an explanatory view showing how the liquid receiving unit 110 according to the third embodiment receives the coating liquid P.

The configuration of the liquid receiving portion in the coating processing apparatus 1 is different between the third embodiment and the first embodiment. That is, in the coating processing device 1 of the third embodiment, the liquid receiving unit 110 is provided in place of the liquid receiving unit 30 of the first embodiment.

The liquid receiving portions 110 are provided on both sides of the glass substrate G held on the stage 10 on the outer side in the X-axis direction. Each liquid receiving portion 110 includes a pan 111 as a collection container for collecting the coating liquid P discharged from the end of the coating nozzle 20, and a support frame as a support structure for supporting the pan 111 from below (not shown). And have. The configuration of the support frame is, for example, the same as the configuration of the support frame 33 of the first embodiment.

The pan 111 is provided so as to extend in the X-axis direction. The end of the pan 111 on the glass substrate G side is located close to the glass substrate G so as not to come into contact with the glass substrate G. The end of the pan 111 on the opposite side of the glass substrate G is located outside the coating nozzles 20 at the nozzle positions B1 and B2, respectively. Further, the upper surface of the pan 111 is opened, and the coating liquid P discharged from the end of the coating nozzle 20 is collected and temporarily stored. Then, the coating liquid P stored in the pan 111 is discharged from a drainage pipe (not shown) connected to the pan 111.

Also in this embodiment, the same effect as that of the first embodiment can be enjoyed. However, unlike the recovery tank 32 of the first embodiment, the pan 111 of the present embodiment directly collects the coating liquid P discharged from the end of the coating nozzle 20.

<Fourth Embodiment>
Next, the coating processing apparatus according to the fourth embodiment of the present invention will be described. FIG. 13 is an explanatory view showing how the liquid receiving unit 120 according to the fourth embodiment receives the coating liquid P.

The configuration of the liquid receiving portion in the coating processing apparatus 1 is different between the fourth embodiment and the first embodiment. That is, in the coating processing device 1 of the fourth embodiment, the liquid receiving unit 120 is provided in place of the liquid receiving unit 30 of the first embodiment.

The liquid receiving portions 120 are provided on both sides of the glass substrate G held on the stage 10 on the outer side in the X-axis direction. Each liquid receiving portion 120 includes an absorbent material 121 that absorbs the coating liquid P discharged from the end of the coating nozzle 20, a support frame (not shown) as a support structure that supports the absorbent material 121 from below, and the like. have. The configuration of the support frame is, for example, the same as the configuration of the support frame 33 of the first embodiment.

The absorbent material 121 is provided so as to extend in the X-axis direction. The end portion of the absorbent material 121 on the glass substrate G side is located close to the glass substrate G so as not to come into contact with the glass substrate G. The end of the absorbent material 121 on the opposite side to the glass substrate G is located outside the coating nozzles 20 at the nozzle positions B1 and B2, respectively. Then, in a state where the absorbent material 121 is arranged with a predetermined gap from the end portion of the coating nozzle 20, the coating liquid P discharged from the end portion of the coating nozzle 20 (discharge port 21) is absorbed by the absorbent material 121. Will be done. Further, the coating liquid P absorbed by the absorbent material 121 is recovered by a recovery mechanism (not shown). The absorbent material 121 may be brought into close contact with the end of the coating nozzle 20.

The absorbent material 121 is not particularly limited as long as it can absorb the coating liquid P, but for example, a porous body having a plurality of pores formed therein is used. Further, as the absorbent material 121, it is preferable to use a material that suppresses the generation of particles when it comes into close contact with the coating nozzle 20, for example, polyethylene.

Also in this embodiment, the same effect as that of the first embodiment can be enjoyed.

<Fifth Embodiment>
Next, the coating processing apparatus according to the fifth embodiment of the present invention will be described. FIG. 14 is an explanatory view showing how the liquid receiving unit 130 according to the fifth embodiment receives the coating liquid P.

The configuration of the liquid receiving portion in the coating processing apparatus 1 is different between the fifth embodiment and the first embodiment. That is, in the coating processing device 1 of the fifth embodiment, the liquid receiving unit 130 is provided in place of the liquid receiving unit 30 of the first embodiment.

The liquid receiving portions 130 are provided on both sides of the glass substrate G held on the stage 10 on the outer side in the X-axis direction. Each liquid receiving portion 130 includes a composite material 131 in which a roller 131a as a take-up material and a deckle 131b as a sealing material are integrally connected, and a support frame as a support structure for supporting the composite material 131 from below. (Not shown) and. The configuration of the support frame is, for example, the same as the configuration of the support frame 33 of the first embodiment.

Of the composite material 131, the roller 131a is provided on the side closer to the glass substrate G in the X-axis direction, and the end portion of the roller 131a on the glass substrate G side is close to the glass substrate G so as not to come into contact with the glass substrate G. Is located. The roller 131a winds up the coating liquid P discharged from the end of the coating nozzle 20. The configuration of the roller 131a is the same as the configuration of the roller 31 of the first embodiment. Further, below the roller 131a, a recovery tank (not shown) for collecting the coating liquid P wound around the roller 131a is provided as in the recovery tank 32 of the first embodiment.

Of the composite material 131, the deckle 131b is provided on the side farther from the glass substrate G in the X-axis direction, and the ends of the deckle 131b on the opposite side to the glass substrate G are the coating nozzles 20 at the nozzle positions B1 and B2, respectively. It is located on the outside. The deckle 131b seals the end portion of the coating nozzle 20 (discharge port 21). The configuration of the deckle 131b is the same as the configuration of the deckle 101 of the second embodiment.

In the present embodiment, both the effects of the first embodiment and the effects of the second embodiment can be enjoyed. That is, the roller 131a and the deckle 131b can prevent the coating liquid P from dripping to the outside of the glass substrate G. Further, the roller 131a can more appropriately stabilize the bead of the coating liquid P from the coating nozzle 20. Further, the deckle 131b makes it possible to reduce the amount of the coating liquid P used.

<Sixth Embodiment>
Next, the coating processing apparatus according to the sixth embodiment of the present invention will be described. FIG. 15 is an explanatory view showing how the liquid receiving portion 140 according to the sixth embodiment receives the coating liquid P.

The configuration of the liquid receiving portion in the coating processing apparatus 1 is different between the sixth embodiment and the first embodiment. That is, in the coating processing device 1 of the sixth embodiment, the liquid receiving unit 140 is provided in place of the liquid receiving unit 30 of the first embodiment.

The liquid receiving portions 140 are provided on both sides of the glass substrate G held on the stage 10 on the outer side in the X-axis direction. Each liquid receiving portion 140 serves as a support structure for supporting the pair of rollers 141 and 141 extending in the Y-axis direction, the belt 142 wound around the pair of rollers 141 and 141, and the rollers 141 and 142 from below. It has a support frame (not shown) and. The configuration of the support frame is, for example, the same as the configuration of the support frame 33 of the first embodiment.

The end of the belt 142 on the glass substrate G side is located close to the glass substrate G so as not to come into contact with the glass substrate G. The end of the belt 142 opposite to the glass substrate G is located outside the coating nozzles 20 at the nozzle positions B1 and B2, respectively. Then, the coating liquid P discharged from the end of the coating nozzle 20 is wound around the belt 142 and collected. Further, the coating liquid P wound around the belt 142 is recovered by a recovery tank (not shown).

Also in this embodiment, the same effect as that of the first embodiment can be enjoyed.

<7th Embodiment>
Next, the coating processing apparatus according to the seventh embodiment of the present invention will be described. FIG. 16 is a side view showing an outline of the configuration of the coating processing apparatus 1 according to the seventh embodiment.

The configuration of the liquid receiving portion in the coating processing apparatus 1 is different between the seventh embodiment and the above embodiment. That is, the coating processing device 1 of the seventh embodiment is provided with the liquid receiving unit 30 in the first embodiment and the liquid receiving unit 100 in the second embodiment. The liquid receiving portion 30 is provided on the negative side in the X-axis direction of the glass substrate G held on the stage 10, and winds up and collects the coating liquid P discharged from the end portion of the coating nozzle 20. The liquid receiving portion 100 is provided on the positive side of the glass substrate G in the X-axis direction, and seals the end portion of the coating nozzle 20 (discharge port 21).

In the present embodiment, both the effects of the first embodiment and the effects of the second embodiment can be enjoyed. That is, the roller 31 of the liquid receiving portion 30 and the deckle 101 of the liquid receiving portion 110 can prevent the coating liquid P from dripping to the outside of the glass substrate G. Further, the roller 31 can more appropriately stabilize the bead of the coating liquid P from the coating nozzle 20. Further, the Dickel 101 makes it possible to reduce the amount of the coating liquid P used.

Further, in the liquid receiving unit 30 and the liquid receiving unit 100, since the roller 31 and the recovery tank 32 are supported by the support frame 33 and the deckle 101 is supported by the support frame 102, the liquid receiving unit 30 and the liquid receiving unit 100 are supported. Can be easily replaced.

In this embodiment, the liquid receiving unit 30 and the liquid receiving unit 110 are used in combination, but the liquid receiving units 30, 110, 120, 130, 140 of the above embodiment may be arbitrarily combined. Further, when each of the liquid receiving portions 30, 110, 120, 130, 140 has a support frame, the combination thereof can be easily changed.

<8th Embodiment>
Next, the coating processing apparatus according to the eighth embodiment of the present invention will be described. 17 and 18 are side views showing an outline of the configuration of the coating processing apparatus 1 according to the eighth embodiment.

The configuration of the liquid receiving portion in the coating processing apparatus 1 is different between the eighth embodiment and the above embodiment, and more specifically, a member (for example, a roller 31) that receives the coating liquid P discharged from the end portion of the glass substrate G. , Dickel 101, etc.) are supported differently. The coating processing apparatus 1 of the eighth embodiment is provided with liquid receiving portions 150 and 160.

The liquid receiving unit 150 is provided on the negative side in the X-axis direction of the glass substrate G held on the stage 10. The liquid receiving unit 150 includes a roller 151 for winding the coating liquid P discharged from the end of the coating nozzle 20, a recovery tank 152 for collecting the coating liquid P wound on the roller 151, and a roller 151 and a recovery tank 152. It has a support bracket 153 and a support bracket for supporting the support bracket 153. The roller 151 and the recovery tank 152 have the same configurations as the roller 31 and the recovery tank 32 of the first embodiment, respectively. Further, the roller 151 and the recovery tank 152 are supported by being suspended from the support beam 22 via the support bracket 153.

The liquid receiving unit 160 is provided on the positive side in the X-axis direction of the glass substrate G held on the stage 10. The liquid receiving portion 160 has a deckle 161 for sealing the discharge port at the end of the coating nozzle 20, and a support bracket 162 for supporting the deckle 161. The deckle 161 has the same configuration as the deckle 101 of the second embodiment. Further, the deckle 161 is suspended and supported by the support beam 22 via the support bracket 162.

In this embodiment, both the effects of the first embodiment and the effects of the second embodiment can be enjoyed. Further, since the roller 151 and the recovery tank 152 are suspended and supported by the support beam 22 via the support bracket 153 in the liquid receiving portion 150, a space S is formed below the roller 151 and the recovery tank 152. .. With this space S, maintenance of the roller 151 and the recovery tank 152 can be easily performed. Further, since the space S is formed below the deckle 161 in the liquid receiving unit 160, the maintenance of the deckle 161 can be easily performed.

In this embodiment, the roller 151 similar to the roller 31 of the first embodiment and the deckle 161 similar to the deckle 101 of the second embodiment are used in combination, but the combination is arbitrary. For example, the pan 111 of the third embodiment, the absorbent material 121 of the fourth embodiment, the composite material 131 of the fifth embodiment, the rollers 141 and the belt 142 of the sixth embodiment may be used.

<9th embodiment>
Next, the coating processing apparatus according to the ninth embodiment of the present invention will be described. FIG. 19 is a plan view showing an outline of the configuration of the coating processing apparatus 1 according to the ninth embodiment.

The coating processing apparatus 1 of the ninth embodiment further includes an end removing portion 170 for removing the coating liquid P at the end portion of the glass substrate G in the coating processing apparatus 1 of the above embodiment. The end removing portions 170 are provided on both sides of the glass substrate G in the X-axis direction at the substrate position A2.

The end removing portion 170 has a solvent nozzle (not shown) for supplying the solvent of the coating liquid P. Then, a solvent is supplied to the coating liquid P applied to the end portion of the glass substrate G in the X-axis direction to remove the coating liquid P. A known configuration can be used for the end removing unit 170, and for example, the solvent supply unit described in JP2013-58567A can be used.

Here, depending on the type of the optical film formed on the glass substrate G, the optical film may not be required at the end of the glass substrate G. In this respect, in the present embodiment, after the coating liquid P is applied to the entire surface of the glass substrate G by the coating nozzle 20, the coating liquid P at the end portion of the glass substrate G can be removed by the end removing portion 170.

Further, when the coating liquid P is applied to the entire surface of the glass substrate G, for example, the film thickness of the coating liquid P at the end portion of the glass substrate G is different from the film thickness of the coating liquid P at the portion other than the end portion, and is in the substrate surface. The film thickness may become non-uniform. In such a case, the film thickness of the coating liquid P is adjusted by removing the coating liquid P at the end of the glass substrate G by the desired film thickness using the edge removing portion 170 of the present embodiment. The film thickness can be made uniform in the surface of the substrate. When making the film thickness uniform in the surface of the substrate, the temperature of the end portion of the glass substrate G may be adjusted.

<10th Embodiment>
Next, the coating processing apparatus according to the tenth embodiment of the present invention will be described. FIG. 20 is a plan view showing an outline of the configuration of the coating processing apparatus 1 according to the tenth embodiment.

The coating processing device 1 of the tenth embodiment further includes a priming roller 180 in the coating processing device 1 of the above embodiment. The priming roller 180 is provided at the tip of the stage 10 on the positive side in the Y-axis direction.

The priming roller 180 performs a priming process for equalizing the coating liquid P adhering to the tip of the coating nozzle 20 before discharging the coating liquid P from the coating nozzle 20 to the glass substrate G. Specifically, the discharge port 21 of the coating nozzle 20 is made to face directly above the priming roller 180, and the coating liquid P is discharged from the discharge port 21 to the priming roller 180. Then, by rotating the priming roller 180 to wind up the coating liquid P, the adhered state of the coating liquid P at the discharge port 21 is adjusted, and the discharge state of the coating liquid P at the discharge port 21 can be stabilized.

<11th Embodiment>
Next, the coating processing apparatus according to the eleventh embodiment (another embodiment) of the present invention will be described.

In the coating processing apparatus 1 of the above embodiment, the glass substrate G is moved by moving the stage 10 holding the glass substrate G in the Y-axis direction, but the moving method of the glass substrate G is not limited to this. For example, as described in Japanese Patent Application Laid-Open No. 2012-204500, the glass substrate G may be moved by a so-called floating transfer method. Specifically, for example, a levitation stage (not shown) extending in the Y-axis direction from the substrate position A1 to the substrate position A2 is provided, and a high-pressure gas (usually air) is ejected vertically upward from the upper surface of the levitation stage. The substrate is floated in a horizontal position by the pressure of high-pressure air.
Then, the glass substrate G can be moved while the glass substrate G is floated in the air on the levitation stage.

Further, in the coating processing apparatus 1 of the above embodiment, the glass substrate G held on the stage 10 is moved in the Y-axis direction and the coating nozzle 20 is moved in the X-axis direction. However, the glass substrate G and the coating nozzle 20 are moved. Should be moved relatively in the orthogonal direction. For example, the glass substrate G may move in the Y-axis direction and the X-axis direction, or the coating nozzle 20 may move in the Y-axis direction and the X-axis direction.

Further, in the above embodiment, when the circular polarizing plate used for the OLED is produced, a linear polarizing film (linear polarizing plate) and a λ / 4 wavelength film (λ / 4 wave plate) are formed on the glass substrate as optical films. However, the present invention can be applied to other cases. For example, the present invention can be applied to polarizing plates and wave plates used in LCDs. Further, the wave plate is not limited to the λ / 4 wavelength film, and the present invention can be applied to other wave plates such as the λ / 2 wavelength film.

Although the embodiments of the present invention have been described above, the present invention is not limited to such examples. It is clear that a person skilled in the art can come up with various modifications or modifications within the scope of the technical ideas described in the claims, and these are naturally within the technical scope of the present invention. It is understood that it belongs.

1 Coating processing device 10 Stage 20 Coating nozzle 21 Discharge port 22 Support beam 30, 100, 110, 120, 130, 140, 150, 160 Receiving part 31 Roller 32 Recovery tank 33 Support frame 40 Control unit 101 Dickel 102 Support frame 111 Pan 121 Absorbent 131 Composite 131a Roller 131b Dickel 141 Roller 142 Belt 151 Roller 152 Recovery Tank 153 Support Bracket 161 Dickel 162 Support Bracket 170 End Removal 180 Priming Roller G Glass Substrate P (P1, P2) Coating Liquid

Claims (13)

A coating processing device that applies a coating liquid containing an optical material to a substrate.
A holding part that holds the board and
A coating nozzle that discharges the coating liquid onto the substrate held by the holding portion, and
A moving mechanism that moves the holding portion and the coating nozzle relative to each other in the orthogonal direction,
Provided on both sides in plan view outside of the substrate held by the holding portion, have a, a receiver unit for receiving a said coating liquid discharged from the coating nozzle,
The liquid receiving portion provided on one side of the outside in a plan view of the substrate has a take-up material that winds up the coating liquid discharged from the coating nozzle.
The liquid receiving portion provided on the other side of the substrate on the outside in a plan view has a sealing material for sealing the discharge port of the coating nozzle. A coating processing device that applies a coating liquid containing an optical material to a substrate.
A holding part that holds the board and
A coating nozzle that discharges the coating liquid onto the substrate held by the holding portion, and
A moving mechanism that moves the holding portion and the coating nozzle relative to each other in the orthogonal direction,
It has liquid receiving parts provided on both sides of the substrate held by the holding part on the outside in a plan view and receiving the coating liquid discharged from the coating nozzle.
The liquid receiving portion is provided on the side close to the substrate and is provided on the winding material for winding the coating liquid discharged from the coating nozzle and on the side far from the substrate to seal the discharge port of the coating nozzle. It has a composite material in which the sealing material and the sealing material are integrally connected. In the coating processing apparatus according to claim 1 or 2.
The liquid receiving portion is supported from below by a support structure. In the coating processing apparatus according to claim 1 or 2.
The liquid receiving portion is suspended and supported by a support beam that supports the coating nozzle. In the coating processing apparatus according to claim 1 or 2.
The substrate to which the coating liquid has been applied from the coating nozzle further has an end removing portion for removing the coating liquid at the end of the substrate. A coating processing device that applies a coating liquid containing an optical material to a substrate.
A holding part that holds the board and
A coating nozzle that discharges the coating liquid onto the substrate held by the holding portion, and
A moving mechanism that moves the holding portion and the coating nozzle relative to each other in the orthogonal direction,
A liquid receiving portion provided on both sides of the substrate held by the holding portion on the outside in a plan view and receiving the coating liquid discharged from the coating nozzle, and a liquid receiving portion.
Has a control unit,
The control unit controls the relative moving speed of the holding unit and the coating nozzle, applies shear stress to the coating liquid, and orients the molecules in the coating liquid in one direction. , Control the coating nozzle and the moving mechanism. A coating processing device that applies a coating liquid containing an optical material to a substrate.
A holding part that holds the board and
A coating nozzle that discharges the coating liquid onto the substrate held by the holding portion, and
A moving mechanism that moves the holding portion and the coating nozzle relative to each other in the orthogonal direction,
It has liquid receiving parts provided on both sides of the substrate held by the holding part on the outside in a plan view and receiving the coating liquid discharged from the coating nozzle.
The liquid receiving portion has a take-up material that winds up the coating liquid discharged from the coating nozzle.
The take-up material is a roller that stretches in a direction orthogonal to the moving direction of the holding portion and rotates in the same direction as the moving direction of the holding portion. A coating processing device that applies a coating liquid containing an optical material to a substrate.
A holding part that holds the board and
A coating nozzle that discharges the coating liquid onto the substrate held by the holding portion, and
A moving mechanism that moves the holding portion and the coating nozzle relative to each other in the orthogonal direction,
It has liquid receiving parts provided on both sides of the substrate held by the holding part on the outside in a plan view and receiving the coating liquid discharged from the coating nozzle.
The liquid receiving part is
A pair of rollers extending in the moving direction of the holding portion,
It has a belt wound around the pair of rollers. This is a coating process method in which a coating liquid containing an optical material is applied to a substrate.
While the holding portion holding the substrate and the coating nozzle are relatively moved in the orthogonal direction, the coating liquid is discharged from the coating nozzle, and the coating liquid is received by the liquid receiving portions on both sides outside the plan view of the substrate. , Apply the coating liquid to the substrate ,
The liquid receiving portion provided on one side of the outside in a plan view of the substrate has a take-up material that winds up the coating liquid discharged from the coating nozzle.
The liquid receiving portion provided on the other side of the substrate on the outside in a plan view has a sealing material for sealing the discharge port of the coating nozzle. This is a coating process method in which a coating liquid containing an optical material is applied to a substrate.
While the holding portion holding the substrate and the coating nozzle are relatively moved in the orthogonal direction, the coating liquid is discharged from the coating nozzle, and the coating liquid is received by the liquid receiving portions on both sides outside the plan view of the substrate. , Apply the coating liquid to the substrate,
The liquid receiving portion is provided on the side close to the substrate and is provided on the winding material for winding the coating liquid discharged from the coating nozzle and on the side far from the substrate to seal the discharge port of the coating nozzle. It has a composite material in which the sealing material and the sealing material are integrally connected. In the coating treatment method according to claim 9 or 10.
After applying the coating liquid to the substrate, the coating liquid at the end of the substrate is removed. A readable computer storage medium containing a program running on the computer of the control unit that controls the coating processing apparatus so that the coating processing method of applying the coating liquid containing the optical material to the substrate is executed by the coating processing apparatus. There,
In the coating treatment method, the coating liquid is discharged from the coating nozzle while the holding portion holding the substrate and the coating nozzle are relatively moved in the orthogonal direction, and the liquid receiving portions are on both sides outside the plan view of the substrate. The coating liquid is received, the coating liquid is applied to the substrate, and the coating liquid is applied.
The liquid receiving portion provided on one side of the outside in a plan view of the substrate has a take-up material that winds up the coating liquid discharged from the coating nozzle.
The liquid receiving portion provided on the other side of the substrate on the outside in a plan view has a sealing material for sealing the discharge port of the coating nozzle. A readable computer storage medium containing a program running on the computer of the control unit that controls the coating processing apparatus so that the coating processing method of applying the coating liquid containing the optical material to the substrate is executed by the coating processing apparatus. There,
In the coating treatment method, the coating liquid is discharged from the coating nozzle while the holding portion holding the substrate and the coating nozzle are relatively moved in the orthogonal direction, and the liquid receiving portions are on both sides outside the plan view of the substrate. The coating liquid is received, the coating liquid is applied to the substrate, and the coating liquid is applied.
The liquid receiving portion is provided on the side close to the substrate and is provided on the winding material for winding the coating liquid discharged from the coating nozzle and on the side far from the substrate to seal the discharge port of the coating nozzle. It has a composite material in which the sealing material and the sealing material are integrally connected.

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